Granular silicon layered cleaning device
By designing a layered cleaning device for granular silicon, a spraying and vibrating screen device is used to shake the dust off the granular silicon and then spray it on the flipped side. Combined with a dust collection component, a comprehensive cleaning is achieved, which solves the problem of poor dust removal effect of existing equipment and improves work efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- XUZHOU MALONG ENERGY SAVING ENVIRONMENTAL PROTECTION EQUIP
- Filing Date
- 2025-02-14
- Publication Date
- 2026-05-01
AI Technical Summary
Existing dust removal equipment has poor dust removal efficiency when dealing with particulate silicon, especially when there is a large amount of particulate silicon, and cannot effectively spray it onto all surfaces.
A particulate silicon layer cleaning device was designed, comprising a spray assembly, a vibrating screen assembly, and a dust collection assembly. The device uses vibration and spraying to dislodge dust from the particulate silicon and flip it over so that it can be sprayed onto other surfaces. Combined with the dust collection assembly, it achieves comprehensive cleaning.
It improves dust removal efficiency, ensuring that all surfaces of the granular silicon can be effectively cleaned. It has a simple structure and high working efficiency.
Smart Images

Figure CN224181486U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of particulate silicon cleaning technology, and in particular to a particulate silicon layer cleaning device. Background Technology
[0002] Particulate silicon is a polycrystalline silicon material produced through techniques such as grinding and processing, resulting in a small particle size and relatively high surface area. Due to its small particle size, particulate silicon can be incorporated into other materials to increase their electrical conductivity, and is therefore commonly used in the manufacture of solar panels. Furthermore, particulate silicon also features high photoelectric conversion efficiency and low energy consumption.
[0003] Existing dust removal equipment typically uses conveyor belts for transport, which means that when atomizing the surface of granular silicon, other surfaces of the granular silicon cannot be sprayed. Furthermore, when there is a large amount of granular silicon, some of it cannot be sprayed, resulting in poor dust removal efficiency.
[0004] Therefore, it is necessary to improve some existing particulate silicon dust removal equipment in order to solve the related problems mentioned above as much as possible. Summary of the Invention
[0005] This utility model aims to at least partially solve one of the technical problems in the above-mentioned technologies.
[0006] To achieve the above objectives, the first aspect of this utility model provides a particulate silicon layering cleaning device, comprising: a housing, a spray assembly, a vibrating screen device, and a dust collection assembly. The housing is a hollow frame with an inlet and an outlet on opposite sides, and limiting holes are provided on both sides adjacent to the inlet and outlet. The spray assembly is disposed at the top of the housing. The vibrating screen device and the dust collection assembly are disposed within the housing, with the dust collection assembly located below the vibrating screen device. The vibrating screen device includes a support column, a first support plate, a vibration damping assembly, a second support plate, a vibration motor, a connecting rod, a transmission plate, and a limiting rod. The two support columns are respectively disposed opposite to each other at the bottom of the housing; the first support plate is disposed at the top of the two support columns; the two vibration damping components are respectively disposed opposite to each other at the top of the first support plate; the second support plate is disposed at the top of the two vibration damping components; the vibration motor is disposed at the top of the second support plate through a fixing frame, and the driving end of the vibration motor passes through the fixing frame and extends upward; the connecting rod is disposed on the driving end of the vibration motor; the transmission plate is disposed at the top of the connecting rod; the four limiting rods are respectively disposed opposite to each other on one side of the transmission plate, and the opposite ends of the four limiting rods pass through the four limiting holes and extend upward.
[0007] In addition, the particulate silicon layer cleaning device proposed above according to this utility model may also have the following additional technical features:
[0008] Furthermore, the vibration damping assembly includes a telescopic rod and a spring, wherein the telescopic rod is disposed on one side of the top of the first support plate, and the extended end of the telescopic rod is connected to the bottom of the second support plate; the spring is sleeved on the telescopic rod, and the two ends of the spring are respectively connected to the first support plate and the second support plate.
[0009] Furthermore, the spray assembly includes a water pump, a connecting pipe, a tee pipe, and spray pipes, wherein the water pump is located at the top of the tank; the connecting pipe is located at the outlet end of the water pump, and one end of the connecting pipe extends into the interior of the tank; the tee pipe is located at the extended end of the connecting pipe; and the three spray pipes are respectively located at the outlet end of the tee pipe.
[0010] Furthermore, the dust collection assembly includes a fan, a dust collection box, a baffle, and a suction pipe, wherein the fan is located at the bottom of the housing; the dust collection box is detachably located on one side of the fan, and the outlet end of the fan is connected to the inlet end of the dust collection box via a flexible hose; the baffle is located on the other side of the fan; the suction pipe is located on one side of the baffle, and the other end of the suction pipe is connected to the inlet end of the fan via a flexible hose.
[0011] Furthermore, a feed plate is provided at the feed inlet of the box.
[0012] Furthermore, an inclined plate is provided on one side of the baffle, and one end of the inclined plate extends toward the discharge port.
[0013] According to the present invention, the particulate silicon layer cleaning device uses a spray assembly and a vibrating screen device to vibrate the dust off the particulate silicon. The vibrating screen device flips the particulate silicon so that the other sides of the particulate silicon are sprayed, thereby effectively solving the problem of poor dust removal effect. The device has a simple structure, high practicality and high working efficiency. Attached Figure Description
[0014] The above and / or additional aspects and advantages of this utility model will become apparent and readily understood from the following description of the embodiments taken in conjunction with the accompanying drawings, in which:
[0015] Figure 1 This is a front view structural schematic diagram of a particulate silicon layer cleaning device according to an embodiment of the present invention;
[0016] Figure 2 This is a side view of a particle silicon layer cleaning device according to an embodiment of the present invention;
[0017] Figure 3 This is a schematic diagram of the internal structure of a particulate silicon layer cleaning device according to an embodiment of the present invention;
[0018] Figure 4 This is an enlarged structural schematic diagram of part A of a particulate silicon layer cleaning device according to an embodiment of the present invention;
[0019] Figure 5 This is an enlarged structural schematic diagram of part B of a particulate silicon layer cleaning device according to an embodiment of the present invention;
[0020] Figure 6 This is an enlarged structural schematic diagram of part C of a particulate silicon layer cleaning device according to an embodiment of the present invention;
[0021] Figure 7 This is a partial enlarged structural schematic diagram of a particle silicon layer cleaning device according to an embodiment of the present invention;
[0022] As shown in the figure:
[0023] 1. Box body; 11. Feed inlet; 111. Feed plate; 12. Discharge outlet; 13. Limiting hole; 2. Spray assembly; 21. Water pump; 22. Connecting pipe; 23. T-pipe; 24. Spray pipe; 3. Vibrating screen device; 31. Support column; 32. First support plate; 33. Vibration damping assembly; 331. Telescopic rod; 332. Spring; 34. Second support plate; 35. Vibration motor; 36. Connecting rod; 37. Transmission plate; 38. Limiting rod; 4. Dust collection assembly; 41. Fan; 42. Dust collection box; 43. Baffle; 431. Inclined plate; 44. Dust collection pipe. Detailed Implementation
[0024] The embodiments of this utility model are described in detail below, with examples of the embodiments shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain this utility model, and should not be construed as limiting this utility model.
[0025] The particle silicon layering cleaning device of this utility model embodiment will be described below with reference to the accompanying drawings.
[0026] like Figures 1 to 7 As shown, the particulate silicon layer cleaning device of this utility model embodiment may include a housing 1, a spray assembly 2, a vibrating screen device 3, and a dust collection assembly 4.
[0027] The box 1 is a hollow frame, and the opposite sides of the box 1 are respectively provided with a feed inlet 11 and a discharge outlet 12. Limiting holes 13 are respectively provided on both sides of the adjacent side of the feed inlet 11 and the discharge outlet 12. The spray assembly 2 is set on the top of the box 1. The vibrating screen device 3 and the dust collection assembly 4 are respectively set inside the box 1, and the dust collection assembly 4 is located below the vibrating screen device 3.
[0028] It should be noted that a feed plate 111 is provided at the feed inlet 11 of the housing 1, so that relevant personnel can put the silicon particles into the feed inlet 11 through the feed plate 111, so that the silicon particles fall onto the transfer plate 37.
[0029] It should be noted that an openable door is provided on one side of the housing 1, located below the feed inlet 11, which facilitates relevant personnel to open the door to carry out maintenance on the inside of the housing 1 and remove the dust collection box 42.
[0030] It should be noted that casters are provided at the bottom of the housing 1, which facilitates the movement of the particulate silicon layer cleaning device of this utility model embodiment by relevant personnel.
[0031] It should be noted that a push-pull handle is provided on the other side of the housing 1, and is located above the discharge port 12, so that relevant personnel can move the particulate silicon layer cleaning device of this utility model embodiment by holding the push-pull handle.
[0032] The spray assembly 2 includes a water pump 21, a connecting pipe 22, a tee pipe 23, and a spray pipe 24.
[0033] The water pump 21 is located on the top of the tank 1, the connecting pipe 22 is located at the outlet end of the water pump 21, and one end of the connecting pipe 22 extends into the interior of the tank 1. The three-way pipe 23 is located at the extension end of the connecting pipe 22, and the three spray pipes 24 are respectively located at the outlet end of the three-way pipe 23.
[0034] The vibrating screen device 3 includes a support column 31, a first support plate 32, a vibration damping component 33, a second support plate 34, a vibrating motor 35, a connecting rod 36, a transmission plate 37, and a limiting rod 38.
[0035] Two support columns 31 are respectively positioned opposite each other at the bottom of the housing 1. A first support plate 32 is positioned at the top of the two support columns 31. Two vibration damping components 33 are respectively positioned opposite each other at the top of the first support plate 32. A second support plate 34 is positioned at the top of the two vibration damping components 33. A vibration motor 35 is mounted on the top of the second support plate 34 via a fixing frame, and the drive end of the vibration motor 35 passes through the fixing frame and extends upward. A connecting rod 36 is mounted on the drive end of the vibration motor 35. A transmission plate 37 is positioned on the top of the connecting rod 36. Four limiting rods 38 are respectively positioned opposite each other on one side of the transmission plate 37, and the opposite ends of the four limiting rods 38 pass through the four limiting holes 13 and extend upward.
[0036] The vibration damping assembly 33 includes a telescopic rod 331 and a spring 332.
[0037] The telescopic rod 331 is located on one side of the top of the first support plate 32, and the extended end of the telescopic rod 331 is connected to the bottom of the second support plate 34. The spring 332 is sleeved on the telescopic rod 331, and the two ends of the spring 332 are respectively connected to the first support plate 32 and the second support plate 34.
[0038] The vacuuming assembly 4 includes a fan 41, a dust collection box 42, a baffle 43, and a vacuuming pipe 44.
[0039] The fan 41 is located at the bottom of the housing 1, the dust collection box 42 is detachably located on one side of the fan 41, and the outlet end of the fan 41 is connected to the inlet end of the dust collection box 42 through a hose. The baffle 43 is located on the other side of the fan 41, the suction pipe 44 is located on one side of the baffle 43, and the other end of the suction pipe 44 is connected to the inlet end of the fan 41 through a hose.
[0040] It should be noted that an inclined plate 431 is provided on one side of the baffle 43, and one end of the inclined plate 431 extends toward the discharge port 12, so that the cleaned silicon particles can slide off the discharge port 12 along the inclined plate 431.
[0041] It should be noted that a rubber pad is provided on the inclined plate 431 to prevent the silicon particles from falling from the transmission plate 37 onto the inclined plate 431 and causing damage.
[0042] Specifically, when relevant personnel need to use a particulate silicon layer cleaning device according to an embodiment of this utility model to clean particulate silicon, they only need to connect the water inlet of the water pump 21 to the water pipe, then place the container at the discharge port 12 on one side of the box 1, and turn on the vibration motor 35, the water pump 21 and the fan 41 in sequence, and finally place the particulate silicon on the feed plate 111.
[0043] At this time, the silicon particles slide down the feed plate 111 and through the feed port 11 onto the transfer plate 37. Simultaneously, the vibration motor 35 operates, and the drive end of the vibration motor 35 drives the connecting rod 36 to vibrate, which in turn drives the transfer plate 37 to vibrate, thereby causing the silicon particles to vibrate continuously on the transfer plate 37 and move along one end of the transfer plate 37 to the other end.
[0044] It should be noted that when the vibration motor 35 is working, the telescopic ends of the two telescopic rods 331 reciprocate, while the spring 332 is deformed by force, reciprocating to open and close, thereby controlling the direction of vibration of the vibration motor 35 and preventing tilting.
[0045] It should be noted that during the vibration of the transmission plate 37, the four limiting rods 38 located on both sides of the transmission plate 37 slide back and forth along the limiting hole 13.
[0046] At the same time, the water pump 21 starts to work, and the water flow sequentially sprays along the water pump 21, the connecting pipe 22, and the three-way pipe 23 onto the granular silicon located on the transmission plate 37, so that the dust on the granular silicon is separated from the granular silicon during the vibration process.
[0047] Meanwhile, the silicon particles and the separated dust slide down from the other end of the transfer plate 37. During the sliding process, the fan 41 starts to work. At this time, the dust is sucked into the dust collection box 42 by the fan 41 along the dust suction pipe 44. At this time, the silicon particles fall onto the inclined plate 431 on one side of the baffle 43 and slide down along the inclined plate 431 to the discharge port 12, and finally slide into the placement box.
[0048] In summary, the particulate silicon layer cleaning device according to the present invention uses a spray assembly 2 and a vibrating screen device 3 to vibrate the dust off the particulate silicon. The vibrating screen device 3 is also used to flip the particulate silicon so that the other sides of the particulate silicon are sprayed, thereby effectively solving the problem of poor dust removal effect. The device has a simple structure, high practicality, and high working efficiency.
[0049] In the description of this specification, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0050] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.
[0051] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.
Claims
1. A granular silicon delamination cleaning apparatus, characterized by, include: The components include a housing (1), a spray assembly (2), a vibrating screen device (3), and a dust collection assembly (4), among which... The box (1) is a hollow frame, and the opposite sides of the box (1) are respectively provided with a feed inlet (11) and a discharge outlet (12), and limit holes (13) are respectively provided on both sides of the adjacent side of the feed inlet (11) and the discharge outlet (12). The spray assembly (2) is disposed on the top of the housing (1); The vibrating screen device (3) and the dust collection assembly (4) are respectively disposed inside the housing (1), and the dust collection assembly (4) is located below the vibrating screen device (3); The vibrating screen device (3) includes a support column (31), a first support plate (32), a vibration damping component (33), a second support plate (34), a vibrating motor (35), a connecting rod (36), a transmission plate (37), and a limiting rod (38), wherein, The two support columns (31) are respectively disposed opposite to each other at the bottom of the box (1); The first support plate (32) is disposed at the top of the two support columns (31); The two vibration damping components (33) are respectively disposed opposite to each other on the top of the first support plate (32); The second support plate (34) is disposed on top of the two vibration damping components (33); The vibration motor (35) is mounted on the top of the second support plate (34) by a fixing frame, and the driving end of the vibration motor (35) passes through the fixing frame and extends upward; The connecting rod (36) is disposed on the drive end of the vibration motor (35); The transmission plate (37) is disposed on the top of the connecting rod (36); The four limiting rods (38) are respectively arranged opposite to each other on one side of the transmission plate (37), and the opposite ends of the four limiting rods (38) pass through the four limiting holes (13) and extend.
2. The granular silicon delamination cleaning apparatus of claim 1, wherein, The vibration damping assembly (33) includes a telescopic rod (331) and a spring (332), wherein, The telescopic rod (331) is disposed on one side of the top of the first support plate (32), and the extension end of the telescopic rod (331) is connected to the bottom of the second support plate (34); The spring (332) is sleeved on the telescopic rod (331), and the two ends of the spring (332) are respectively connected to the first support plate (32) and the second support plate (34).
3. The particulate silicon delayering cleaning apparatus of claim 2, wherein, The spray assembly (2) includes a water pump (21), a connecting pipe (22), a tee pipe (23), and a spray pipe (24), wherein, The water pump (21) is located on the top of the housing (1); The connecting pipe (22) is installed at the outlet end of the water pump (21), and one end of the connecting pipe (22) extends into the interior of the housing (1); The tee pipe (23) is disposed on the extension end of the connecting pipe (22); The three spray pipes (24) are respectively installed at the outlet end of the three-way pipe (23).
4. The particulate silicon delayering cleaning apparatus of claim 3, wherein, The dust collection assembly (4) includes a fan (41), a dust collection box (42), a baffle (43), and a suction pipe (44), wherein, The fan (41) is located at the bottom of the housing (1); The dust collection box (42) is detachably installed on one side of the fan (41), and the outlet end of the fan (41) is connected to the inlet end of the dust collection box (42) through a flexible hose; The baffle (43) is disposed on the other side of the fan (41); The suction pipe (44) is located on one side of the baffle (43), and the other end of the suction pipe (44) is connected to the inlet end of the fan (41) through a hose.
5. The granular silicon delamination cleaning apparatus of claim 1, wherein, A feed plate (111) is provided at the feed inlet (11) of the box (1).
6. The granular silicon delamination cleaning apparatus of claim 4, wherein, An inclined plate (431) is provided on one side of the baffle (43), and one end of the inclined plate (431) extends toward the discharge port (12).