Device for detecting internal pollution of wafer box
By designing a contamination detection device inside the wafer cell, which utilizes a limiting strip for fixation, a measuring plate for measurement, and a dust detector for scanning, the problem of existing devices being unable to detect slot contamination and surface deformation has been solved, enabling comprehensive inspection of the wafer cell.
Patent Information
- Application Number
- CN202520690673.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-14
- Publication Date
- 2026-05-05
- Estimated Expiration
- 2035-04-14
AI Technical Summary
Existing wafer cell inspection equipment can only inspect slots, but cannot detect contaminants on the slot surface, nor can it detect whether there is deformation in the overall appearance and dimensions of the wafer cell.
A device for detecting contamination inside a wafer cassette is designed, comprising a base, side plates, a detection frame, a limiting strip, a measuring plate, a dust detector, and a detection probe. The wafer cassette is fixed by the limiting strip, the measuring plate measures the dimensions, and the dust detector and detection probe perform laser scanning to achieve comprehensive detection of the inside and outside of the wafer cassette.
It enables the detection of contamination on the inner slot surface of the wafer box and the precise measurement of its external dimensions, ensuring that the wafer box does not deform or become contaminated during use.