Protective structure of photomask transmission module and photoetching equipment

By setting an observation window and an opaque cover plate in the photomask transport module, the efficiency and safety issues of the photomask transport module in the lithography machine during abnormal shutdown or maintenance are solved, enabling rapid and safe status confirmation and reducing equipment downtime.

CN224203567UActive Publication Date: 2026-05-05CHONGQING XINLIAN MICROELECTRONICS CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
CHONGQING XINLIAN MICROELECTRONICS CO LTD
Filing Date
2025-04-22
Publication Date
2026-05-05

AI Technical Summary

Technical Problem

When the existing lithography machine's photomask transport module is shut down or under maintenance, the frame needs to be opened frequently, which affects the equipment maintenance efficiency and poses a risk of damage from collisions between the robotic arm and the photomask. There is also a lack of a fast and safe method for monitoring the status.

Method used

An observation window with an opaque cover is provided in the protective structure of the photomask conveying module. The cover can be opened in a light-blocking state, and the position of the robotic arm and photomask can be confirmed through the observation window to avoid damage.

Benefits of technology

It improves equipment maintenance efficiency, reduces equipment downtime, ensures operational safety, and avoids collision damage between the robotic arm and the photomask.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a protection structure of a photomask transmission module and photoetching equipment. A non-transparent light-proof cover plate is arranged in the photomask transmission module; an observation window and a non-transparent cover plate are arranged on the light-proof cover plate, and the non-transparent cover plate can completely cover the observation window. When the opaque cover plate is in a closed state, the internal shading requirement of the equipment is met; before the photomask conveying is abnormally stopped or equipment needs to be opened for maintenance, the non-transparent cover plate can be opened firstly, whether the positions of the mechanical arm and the photomask are safe or not is confirmed through the observation window, the damage to the arm and the photomask is avoided, and the downtime of the equipment is shortened.
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Description

Technical Field

[0001] This utility model belongs to the field of semiconductor manufacturing, and in particular relates to a protective structure for a photomask transmission module and a photolithography device. Background Technology

[0002] In the semiconductor manufacturing field, the photomask transport module (RH) of a lithography machine typically employs a black, enclosed, opaque cover design to meet the internal light-shielding and dust-proof process requirements. However, when abnormal shutdowns occur during photomask transport or when equipment maintenance is needed, manual inspection requires opening the independent photomask loading frame (IRL frame) or photomask storage frame (library frame). Each frame opening usually takes 5-10 minutes, severely impacting equipment maintenance efficiency and increasing the risk of mechanical wear due to frequent frame opening and closing. Furthermore, if the robotic arm happens to be inside the frame and the safety detection device malfunctions, forcibly opening the frame without the operator's knowledge can easily lead to collisions and damage between the robotic arm and the photomask, delaying production. Existing designs lack a rapid and safe method for observing the internal status, resulting in efficiency and safety issues in troubleshooting and maintenance. Based on these problems, there is an urgent need for a protective structure for the photomask transport module and a lithography device to improve operational efficiency and safety. Utility Model Content

[0003] The purpose of this utility model is to solve all or part of the above-mentioned problems by providing a protective structure for a photomask conveying module and a photolithography device. An observation window is opened on the first light shield and an opaque cover is hinged thereon. The opaque cover can completely cover the observation window. When the opaque cover is closed, it meets the internal light shielding requirements during production. Before the photomask conveying device stops abnormally or needs to be opened for maintenance, the opaque cover can be opened first to check whether the position of the robotic arm and photomask is safe through the observation window, so as to avoid damage to the arm and photomask and reduce the downtime of the equipment.

[0004] This invention provides a protective structure for a photomask conveying module. The module includes an opaque light-proof cover. The light-proof cover has an observation window and an opaque cover that completely covers the observation window. When the opaque cover is closed, it meets the internal light-shielding requirements during production. When the equipment needs to be opened, the opaque cover can be opened first, and the position of the robotic arm and photomask can be checked through the observation window to ensure safety, thus preventing damage to the arm and photomask and reducing equipment downtime.

[0005] The light-blocking cover includes a first light-blocking plate, with a second light-blocking plate and a third light-blocking plate respectively sealed at both ends of the first light-blocking plate. The first light-blocking plate, the second light-blocking plate, and the third light-blocking plate are all opaque protective plates. The observation window is set on the first light-blocking plate to facilitate observation of the position and status of the robotic arm and the light cover.

[0006] The opaque cover is hinged to the first light shield to meet the light-shielding requirements inside the equipment and to facilitate the opening and closing of the opaque cover.

[0007] It also includes a fixing structure comprising mutually attracting magnetic pieces respectively disposed on the edge of the observation window and the opaque cover, ensuring a tight fit between the observation window and the opaque cover. The hinge and magnetic structure work together to ensure convenient opening and closing of the opaque cover while preventing accidental opening due to vibration or accidental contact.

[0008] The viewing window's field of view covers the movement space of the robotic arm within the protective structure and the displacement path of the photomask, providing an unobstructed viewing angle that allows for a comprehensive observation of the position and status of the internal robotic arm and photomask, avoiding blind spots.

[0009] The opaque cover is mounted on the first light shield via a hinge, and the opaque cover is opened by flipping, which facilitates quick opening and closing of the opaque cover.

[0010] The observation window is 25-35cm wide and 35-45cm long; the opaque cover is 27-37cm wide and 37-47cm long; the bottom edge of the opaque cover is 40-60cm away from the bottom edge of the first light shield, allowing for complete observation of the position and status of the internal robotic arm and light shield, avoiding blind spots; the opaque cover can completely cover the observation window when closed, meeting the internal light shielding requirements of the equipment.

[0011] The opaque cover is equipped with a handle for easy opening and closing.

[0012] A lithography apparatus is also provided, including a photomask transport module. Using the aforementioned protective structure, the position of the transport arm and photomask can be quickly confirmed through a transparent window to ensure safety.

[0013] The photomask conveying module includes a photomask loading port located within the protective structure. When the opaque cover is closed, an opaque area is formed within the protective structure. When the opaque cover is open, the status of the robotic arm and photomask at the loading port can be observed without affecting internal light-shielding requirements. When the equipment needs to be opened, the opaque cover can be opened to confirm the position and status of the conveying arm and photomask. With the opaque cover closed, the internal light-shielding requirements of the equipment are met. When the equipment needs to be opened, the opaque cover is opened first, and the position of the robotic arm and photomask is confirmed through the observation window to ensure safety, avoiding damage to the arm and photomask and reducing equipment downtime. Compared with the prior art, the beneficial effects of this utility model are: an observation window is opened on the first light shield and an opaque cover is hinged thereon. The opaque cover can completely cover the observation window and meet the light shielding requirements inside the equipment when closed; if the photomask transmission malfunctions and stops or the equipment needs to be opened for maintenance, the opaque cover can be opened first, and the position of the robotic arm and photomask can be confirmed through the observation window to avoid damage to the arm and photomask and reduce the downtime of the equipment. Attached Figure Description

[0014] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0015] Figure 1 A top view of the protective structure of the photomask transmission module provided by this utility model.

[0016] Figure 2 This is a first-view structural schematic diagram of the photomask transmission module provided by this utility model.

[0017] Figure 3 This is a schematic diagram of the second-view structure of the photomask transmission module provided by this utility model.

[0018] Figure 4 This is a diagram showing the opaque cover in the closed state.

[0019] Figure 5 This is a schematic diagram showing the opaque cover in the open state. Reference numerals: 1-shielding cover, 11-first shielding plate, 12-second shielding plate, 13-third shielding plate, 2-observation window, 3-opaque cover, 4-fixed structure, 5-light cover loading port. Detailed Implementation

[0020] The following description and accompanying drawings fully illustrate specific embodiments of the invention to enable those skilled in the art to practice them. Other embodiments may include structural, logical, electrical, procedural, and other changes. The embodiments represent only possible variations. Individual components and functions are optional unless explicitly required, and the order of operation may vary. Some portions and features of some embodiments may be included in or replace portions and features of other embodiments.

[0021] Example 1

[0022] This embodiment provides a protective structure for a photomask transmission module, such as... Figure 1-3 As shown, the photomask conveying module is equipped with an opaque light-proof cover plate 1; the light-proof cover plate has an observation window 2 and an opaque cover plate 3, which can completely cover the observation window 2. When the opaque cover plate 3 is closed, it meets the light-shielding requirements of the equipment; when the photomask conveying system experiences an abnormal shutdown or equipment maintenance, the opaque cover plate can be opened before the equipment is opened, and the position of the robotic arm and photomask can be checked through the observation window to ensure safety, thus avoiding damage to the arm and photomask and reducing equipment downtime.

[0023] The light shield 1 includes a first light shield 11, with a second light shield 12 and a third light shield 13 respectively sealed at both ends of the first light shield 11. The first light shield 11, the second light shield 12 and the third light shield 13 are all opaque protective plates; the observation window 2 is set on the first light shield 11.

[0024] It also includes a fixing structure 4, which includes mutually attractive magnetic pieces respectively set on the edge of the observation window 2 and the opaque cover plate 3, so that the observation window 2 and the opaque cover plate 3 are tightly fitted. The hinge and magnetic structure are designed in a coordinated manner to ensure that the opaque cover plate 3 is easy to open and close, while preventing accidental opening due to vibration or accidental contact.

[0025] The viewing angle of observation window 2 covers the movement space of the robotic arm and the displacement path of the photomask within the protective structure. The position of the robotic arm and photomask within the protective structure can be observed through observation window 2. The width of observation window 2 is 25-35cm, and the length is 35-45cm. It allows for complete observation of the position of the internal robotic arm and photomask, avoiding blind spots. In this embodiment, the width of observation window 2 is 30cm, and the length is 40cm. The width of opaque cover plate 3 is 27-37cm, and the length is 37-47cm. The distance between the bottom edge of opaque cover plate 3 and the bottom edge of the first light-blocking plate 11 is 40-60cm. In this embodiment, the width of opaque cover plate 3 is 32cm, the length is 42cm, and the distance between the bottom edge of opaque cover plate 3 and the bottom edge of the first light-blocking plate 11 is 50cm. The opaque cover plate 3 completely covers observation window 2, meeting the internal light-blocking requirements of the equipment. Figure 4-5As shown, the opaque cover 3 is hinged to the first light shield 11. The opaque cover 3 is installed on the first light shield 11 by a hinge and can be opened by flipping. The opaque cover 3 is equipped with a handle to facilitate opening and closing.

[0026] Example 2

[0027] This embodiment provides a photolithography apparatus, including a photomask transport module, employing the protective structure described in Embodiment 1. The photomask transport module includes a photomask loading port 5, located within the protective structure. When the opaque cover 3 is closed, an opaque area is formed within the protective structure. When the opaque cover 3 is open, the status of the robotic arm and photomask on the photomask loading port 5 can be observed. Before opening the equipment for maintenance or repair due to abnormal shutdown of the photomask transport, the opaque cover 3 can be opened first, and the position of the robotic arm and photomask can be confirmed through the observation window 4 to ensure safety, thus avoiding damage to the arm and photomask and reducing equipment downtime. It should be understood that some commonly used English terms or letters used in this application for clarity are merely illustrative and not limiting or specific, and should not be construed as limiting the scope of protection of this application based on their possible Chinese translations or specific letters. It should also be noted that in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations.

Claims

1. A protective structure for a photomask transmission module, characterized in that, The photomask transmission module is equipped with an opaque light-proof cover plate (1). An observation window (2) and an opaque cover plate (3) are provided on the light-proof cover plate, and the opaque cover plate (3) can completely cover the observation window (2). The light shield (1) includes a first light shield (11), and a second light shield (12) and a third light shield (13) are respectively sealed and connected at both ends of the first light shield (11). The first light shield (11), the second light shield (12) and the third light shield (13) are all opaque protective plates. The observation window (2) is set on the first light shield (11).

2. The protective structure of the photomask transmission module according to claim 1, characterized in that, The opaque cover plate (3) is hinged to the first light shield plate (11).

3. The protective structure of the photomask transmission module according to claim 1, characterized in that, It also includes a fixing structure (4), which includes mutually attractive magnets respectively disposed on the edge of the observation window (2) and the opaque cover plate (3), so that the observation window (2) and the opaque cover plate (3) fit tightly together.

4. The protective structure of the photomask transmission module according to claim 1, characterized in that, The viewing angle of the observation window (2) covers the movement space of the manipulator inside the protective structure and the displacement path of the photomask.

5. The protective structure of the photomask transmission module according to claim 1, characterized in that, The opaque cover (3) is mounted on the first light shield (11) by a hinge, and the opaque cover (3) is opened by flipping.

6. The protective structure of the photomask transmission module according to claim 1, characterized in that, The width of the observation window (2) is 25-35cm and the length is 35-45cm; the width of the opaque cover plate (3) is 27-37cm and the length is 37-47cm; the distance between the bottom edge of the opaque cover plate (3) and the bottom edge of the first light shield plate (11) is 40-60cm.

7. The protective structure of the photomask transmission module according to claim 1, characterized in that, A handle is installed on the opaque cover plate (3).

8. A photolithography apparatus, comprising a photomask transport module, characterized in that, The protective structure described in any one of claims 1-7 is adopted.

9. The photolithography apparatus according to claim 8, characterized in that, The photomask conveying module includes a photomask loading port (5), which is located inside the protective structure. When the opaque cover (3) is closed, an opaque area is formed inside the protective structure. When the opaque cover (3) is open, the status of the robotic arm and the photomask on the photomask loading port (5) can be observed.