Vacuum partition door device of bipolar splayed magnetron sputtering machine table

Abstract

The utility model provides a vacuum partition door device of a bipolar splayed magnetron sputtering machine table, which is characterized in that a plurality of vacuum partition door modules are obliquely arranged in a first main cavity module and a second main cavity module at intervals, one end of each vacuum partition door module is connected with a frame structure of the main cavity module, and the other end of each vacuum partition door module is connected with an input end of a processing cavity module; the vacuum partition door modules are arranged in an inclined mode by 30-45 degrees, occupied horizontal space is reduced, meanwhile, the inclined angle enables the stress direction of a sealing flashboard to be matched with the gravity direction, the load of a driving mechanism is reduced, and the service life is prolonged. The vacuum partition door module adopts inclined driving and sealing ring design, efficient isolation of the vacuum environment between the cavities is achieved, cross contamination of process gas is avoided, and the coating uniformity is improved.

Description

Technical Field

[0001] This utility model relates to the field of vacuum equipment technology, and more specifically, to a vacuum isolation door device for a bipolar figure-eight magnetron sputtering machine. Background Technology

[0002] With the development of science and technology, vacuum coating technology has advanced rapidly. Thin film technology can modify the surface properties of workpieces, improving their wear resistance, oxidation resistance, and corrosion resistance, thereby extending their service life. Thin film technology can also be used to fabricate optical, electrical, and semiconductor thin film devices, possessing high economic value. Magnetron sputtering technology can prepare various superhard films, corrosion-resistant friction films, superconducting films, magnetic films, optical films, and various films with special functions, and its applications in industrial thin film preparation are very extensive.

[0003] The patent closest to the prior art, application publication number: CN118374778A, discloses a sputtering coating system, including a vacuum transfer chamber, at least one sputtering coating device, a sample transfer arm mechanism, and a vacuum drive mechanism. The sputtering coating device includes a vacuum coating chamber, a substrate support mechanism, and a cathode target. The vacuum coating chamber is connected to the vacuum transfer chamber. The substrate support mechanism is located at the top of the vacuum coating chamber and is used to support the substrate. The cathode target is vacuum-sealed to the vacuum coating chamber and is disposed opposite to the substrate support mechanism. The sample transfer arm mechanism is at least partially disposed within the vacuum transfer chamber. The vacuum drive mechanism is connected to the sample transfer arm mechanism and is used to drive the sample transfer arm mechanism to transfer the substrate between at least one sputtering coating device.

[0004] Existing sputtering coating technology uses a sample transfer arm mechanism to transfer the substrate between chambers. The vacuum requirements for each chamber are different. Even if valves are used between the chambers, it will still affect the vacuum level between the chambers. It takes a long time to restore the required vacuum level.

[0005] In view of this, the present invention proposes a vacuum partition door device for a bipolar figure-eight magnetron sputtering machine that effectively isolates space and occupies a small area. Utility Model Content

[0006] In view of this, the present invention proposes a vacuum partition door device for a bipolar figure-eight magnetron sputtering machine that effectively isolates space and occupies a small area.

[0007] A vacuum isolation door device for a bipolar figure-eight magnetron sputtering machine includes a first main cavity module 2 and a second main cavity module 3, characterized in that:

[0008] A transfer buffer chamber module 4 is formed in the central region between the first main cavity module 2 and the second main cavity module 3, and multiple processing chamber modules 5 are radially distributed around its outer periphery.

[0009] Multiple vacuum isolation door modules 8 are inclinedly spaced within the first main cavity module 2 and the second main cavity module 3. One end of each vacuum isolation door module 8 is connected to the frame structure 7 of the main cavity module, and the other end is connected to the input end of the processing chamber module 5.

[0010] The vacuum isolation door module 8 includes a drive mechanism 82, a sealing gate 83, and a sealing assembly. The sealing gate 83 abuts against the sealing block in the channel between the first main cavity module 2 and the second main cavity module 3. The drive mechanism 82 drives the sealing gate 83 to move in an inclined direction to open and close the channel between the processing chamber module 5 and the corresponding first main cavity module 2 and second main cavity module 3. The sealing assembly is located on the contact surface of the sealing gate 83 and is used to isolate the environment between the chambers when closed.

[0011] In some embodiments, a sealing block is provided in the channel between the processing chamber module 5 and the corresponding first main chamber module 2 and second main chamber module 3. The contact surface of the sealing block is an inclined surface that matches the tilt angle of the vacuum isolation door module 8, and the surface roughness Ra≤0.8μm.

[0012] In some embodiments, the tilt angle of the vacuum partition door module 8 is 30°-45°, which reduces the floor space occupied and distributes the force evenly.

[0013] In some embodiments, each vacuum partition door module 8 is fixed below the main cavity module by a mounting base 81, and the drive mechanism 82 is a cylinder or hydraulic cylinder, whose drive shaft is rigidly connected to the sealing gate 83.

[0014] In some embodiments, the contact surface of the sealing gate 83 is provided with a double-layer sealing ring 84.

[0015] Furthermore, the outer layer of the double-layer sealing ring 84 is made of high-temperature resistant fluororubber, and the inner layer is made of metal elastic sheet. The sealing ring 84 is fitted into the edge of the sealing gate 83 through a groove.

[0016] In some embodiments, the processing chamber module 5 includes a processing chamber body 51 and a movable transport frame 52. The processing chamber body 51 is fixedly mounted on the movable transport frame 52. The processing chamber body 51 is detachably connected to the first main chamber module 2 and the second main chamber module 3 through fasteners. When the fasteners are released, the processing chamber body 51 is moved by moving the movable transport frame 52, and the processing chamber module 5 can be replaced according to processing requirements.

[0017] In some embodiments, the processing chamber module 5 includes at least one of a magnetron sputtering chamber, a plasma cleaning chamber, and an ion plating chamber, and the process sequence of each chamber is arranged by a programmable logic controller.

[0018] The beneficial effects of this utility model are as follows: This utility model proposes a vacuum isolation door device for a bipolar figure-eight magnetron sputtering machine. Multiple vacuum isolation door modules 8 are inclinedly spaced within the first main cavity module 2 and the second main cavity module 3. One end of each vacuum isolation door module 8 is connected to the frame structure 7 of the main cavity module, and the other end is connected to the input end of the processing chamber module 5. The vacuum isolation door modules 8 are inclined at 30°-45°, reducing the horizontal space occupied. At the same time, the inclination angle makes the force direction of the sealing gate 83 match the gravity direction, reducing the load on the drive mechanism 82 and extending its service life. The vacuum isolation door module 8 adopts an inclined drive and sealing ring design to achieve efficient isolation of the vacuum environment between chambers, avoid cross-contamination of process gases, and improve the uniformity of coating. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall structure of the vacuum isolation door device of the bipolar figure-eight magnetron sputtering machine of this utility model.

[0020] Figure 2 This is a cross-sectional view showing the connection between the first main cavity module, the second main cavity module, and the vacuum isolation door module of the bipolar figure-eight magnetron sputtering machine of this utility model.

[0021] Figure 3 This is a schematic diagram of the vacuum isolation door module of the vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine of this utility model.

[0022] Explanation of main component symbols

[0023] First main cavity module 2, second main cavity module 3, transfer buffer chamber module 4, processing chamber module 5, processing chamber body 51, movable transport frame 52, frame structure 7, vacuum partition door module 8, mounting base 81, drive cylinder 82, sealing gate 83, sealing ring 84.

[0024] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this utility model. Detailed Implementation Example 1:

[0025] like Figure 1 The diagram shown is a schematic representation of the overall structure of the vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine of this invention; as shown... Figure 2 The image shown is a cross-sectional view of the connection between the first main cavity module, the second main cavity module, and the vacuum isolation door module of the bipolar figure-eight magnetron sputtering machine of this invention; as shown... Figure 3 The diagram shown is a structural schematic of the vacuum isolation door module of the vacuum isolation door device of the bipolar figure-eight magnetron sputtering machine of this utility model.

[0026] A vacuum isolation door device for a bipolar figure-eight magnetron sputtering machine includes a first main cavity module 2 and a second main cavity module 3, characterized in that:

[0027] A transfer buffer chamber module 4 is formed in the central region between the first main cavity module 2 and the second main cavity module 3, and multiple processing chamber modules 5 are radially distributed around its outer periphery.

[0028] Multiple vacuum isolation door modules 8 are inclinedly spaced within the first main cavity module 2 and the second main cavity module 3. One end of each vacuum isolation door module 8 is connected to the frame structure 7 of the main cavity module, and the other end is connected to the input end of the processing chamber module 5.

[0029] The vacuum isolation door module 8 includes a drive mechanism 82, a sealing gate 83, and a sealing assembly. The sealing gate 83 abuts against the sealing block in the channel between the first main cavity module 2 and the second main cavity module 3. The drive mechanism 82 drives the sealing gate 83 to move in an inclined direction to open and close the channel between the processing chamber module 5 and the corresponding first main cavity module 2 and second main cavity module 3. The sealing assembly is located on the contact surface of the sealing gate 83 and is used to isolate the environment between the chambers when closed.

[0030] A sealing block is provided in the channel between the processing chamber module 5 and the corresponding first main chamber module 2 and second main chamber module 3. The contact surface of the sealing block is an inclined surface that matches the tilt angle of the vacuum isolation door module 8, and the surface roughness Ra≤0.8μm.

[0031] The tilt angle of the vacuum partition door module 8 is 30°-45°, which reduces the floor space occupied and distributes the force evenly.

[0032] Each vacuum partition door module 8 is fixed below the main cavity module by a mounting base 81. The drive mechanism 82 is a cylinder or hydraulic cylinder, and its drive shaft is rigidly connected to the sealing gate 83.

[0033] The contact surface of the sealing gate 83 is provided with a double-layer sealing ring 84.

[0034] The outer layer of the double-layer sealing ring 84 is made of high-temperature resistant fluororubber, and the inner layer is made of metal elastic sheet. The sealing ring 84 is fitted into the edge of the sealing gate 83 through a groove.

[0035] The processing chamber module 5 includes a processing chamber body 51 and a movable transport frame 52. The processing chamber body 51 is fixedly mounted on the movable transport frame 52. The processing chamber body 51 is detachably connected to the first main chamber module 2 and the second main chamber module 3 through fasteners. When the fasteners are released, the processing chamber body 51 is moved by moving the movable transport frame 52, and the processing chamber module 5 can be replaced according to processing requirements.

[0036] The processing chamber module 5 includes at least one of a magnetron sputtering chamber, a plasma cleaning chamber, and an ion plating chamber, and the process sequence of each chamber is arranged by a programmable logic controller.

[0037] The beneficial effects of this utility model are as follows: This utility model proposes a vacuum isolation door device for a bipolar figure-eight magnetron sputtering machine. Multiple vacuum isolation door modules 8 are inclinedly spaced within the first main cavity module 2 and the second main cavity module 3. One end of each vacuum isolation door module 8 is connected to the frame structure 7 of the main cavity module, and the other end is connected to the input end of the processing chamber module 5. The vacuum isolation door modules 8 are inclined at 30°-45°, reducing the horizontal space occupied. At the same time, the inclination angle makes the force direction of the sealing gate 83 match the gravity direction, reducing the load on the drive mechanism 82 and extending its service life. The vacuum isolation door module 8 adopts an inclined drive and sealing ring design to achieve efficient isolation of the vacuum environment between chambers, avoid cross-contamination of process gases, and improve the uniformity of coating.

[0038] The embodiments described above are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of this utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A vacuum isolation door device for a bipolar figure-eight magnetron sputtering machine, comprising a first main cavity module (2) and a second main cavity module (3), characterized in that: A transfer buffer chamber module (4) is formed in the central area between the first main cavity module (2) and the second main cavity module (3), and multiple processing chamber modules (5) are distributed radially around its periphery; Multiple vacuum partition door modules (8) are inclinedly spaced inside the first main cavity module (2) and the second main cavity module (3). One end of each vacuum partition door module (8) is connected to the frame structure (7) of the main cavity module, and the other end is connected to the input end of the processing chamber module (5). The vacuum isolation door module (8) includes a drive mechanism (82), a sealing gate (83), and a sealing assembly. The sealing gate (83) abuts against the sealing block in the channel between the first main cavity module (2) and the second main cavity module (3). The drive mechanism (82) drives the sealing gate (83) to move in an inclined direction to open and close the channel between the processing chamber module (5) and the corresponding first main cavity module (2) and second main cavity module (3). The sealing assembly is located on the contact surface of the sealing gate (83) and is used to isolate the environment between the chambers when closed.

2. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 1, characterized in that: A sealing block is provided in the channel between the processing chamber module (5) and the corresponding first main chamber module (2) and second main chamber module (3). The contact surface of the sealing block is an inclined surface that matches the tilt angle of the vacuum isolation door module (8). The surface roughness Ra≤0.8μm.

3. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 1, characterized in that: The tilt angle of the vacuum partition door module (8) is 30°-45°, which reduces the ground footprint and ensures uniform force distribution.

4. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 1, characterized in that: Each vacuum partition door module (8) is fixed below the main cavity module by a mounting base (81). The drive mechanism (82) is a cylinder or hydraulic cylinder, and its drive shaft is rigidly connected to the sealing gate (83).

5. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 1, characterized in that: The contact surface of the sealing gate (83) is provided with a double-layer sealing ring (84).

6. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 5, characterized in that: The outer layer of the double-layer sealing ring (84) is high-temperature resistant fluororubber, and the inner layer is a metal elastic sheet. The double-layer sealing ring (84) is fitted into the edge of the sealing gate (83) through a groove.

7. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 1, characterized in that: The processing chamber module (5) includes a processing chamber body (51) and a movable transport frame (52). The processing chamber body (51) is fixedly mounted on the movable transport frame (52). The processing chamber body (51) is detachably connected to the first main chamber module (2) and the second main chamber module (3) through a fastener. When the fastener is released, the processing chamber body (51) is moved by moving the movable transport frame (52). The processing chamber module (5) is replaced according to the processing requirements.

8. The vacuum isolation door device for the bipolar figure-eight magnetron sputtering machine as described in claim 1, characterized in that: The processing chamber module (5) includes at least one of a magnetron sputtering chamber, a plasma cleaning chamber, and an ion plating chamber. The process sequence of each chamber is arranged by a programmable logic controller.

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