Jig for inspecting photomask substrate

Abstract

The utility model relates to a jig for inspecting a photomask substrate, which relates to the technical field of semiconductors, and comprises a rack, a frame and four rotating mechanisms, and two ends of the frame are rotatably connected to the rack respectively; the frame is provided with a cavity used for containing a photomask substrate, and the cavity penetrates through the front end and the rear end of the frame. The four rotating mechanisms are respectively arranged on the frame, are oppositely arranged in pairs, and are respectively and uniformly distributed along the circumferential direction of the frame; the rotating mechanism comprises a rotating head, the rotating head is rotatably arranged on the frame, the rotating head can move relative to the frame and is used for stretching into or withdrawing from the cavity, a clamping groove matched with the photomask substrate is formed in the end, facing the cavity, of the rotating head, and the clamping groove is used for restraining the photomask substrate; the jig not only can more stably restrain the photomask substrate and prevent the photomask substrate from falling off, but also can adjust the direction of the photomask substrate in all directions, so that the photomask substrate can be conveniently and comprehensively inspected, and missing inspection caused by shadow of the jig can be effectively prevented.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, and specifically to a fixture for inspecting photomask substrates. Background Technology

[0002] The photomask substrate (or simply substrate) plays a crucial role in semiconductor manufacturing and other fields as a key component of photomasks. It is typically made of high-purity, low-reflectivity, and low-thermal-expansion-coefficient quartz glass to ensure stability and precision during the photolithography process. In the photolithography process, the photomask substrate is usually inspected. Firstly, it is checked for defects such as particles, pinholes, scratches, and contamination, as these flaws can potentially transfer to the wafer during photolithography, leading to malfunctions or abnormal operation of semiconductor devices. Secondly, for photomask substrates with etched circuit patterns, the accuracy and precision of the patterns must be evaluated to confirm that the etched or deposited patterns faithfully represent the intended circuit design, and to check for anomalies such as pattern deviations and missing features. This is crucial to the quality of the semiconductor manufacturing process. Only through a comprehensive and rigorous inspection process can the photomask substrate be guaranteed to meet high-precision production standards, laying a solid foundation for subsequent photolithography processes.

[0003] Existing photomask substrates are typically square in structure, as shown in the attached image. Figure 1 As shown, in the prior art, the photomask substrate usually needs to be placed in a fixture for transfer and inspection. Currently, F-type, I-type or V-type fixtures are commonly used. However, in the actual inspection process, the photomask substrate is easy to fall off the fixture and be damaged. At the same time, the existing fixtures are not convenient for adjusting the position of the photomask substrate, which not only makes it difficult to fully inspect the photomask substrate, but also makes it easy for the fixture to cast shadows under strong light, resulting in missed inspections. These issues urgently need to be addressed. Utility Model Content

[0004] The first aspect of this utility model is to solve the above-mentioned technical problems by providing a more convenient fixture that not only more stably constrains the photomask substrate and prevents it from falling, but also allows for omnidirectional adjustment of the photomask substrate's orientation. This enables convenient and comprehensive inspection of the photomask substrate and effectively prevents missed inspections caused by fixture shadows. The main concept is as follows:

[0005] A fixture for inspecting photomask substrates includes a frame, a housing, and four rotating mechanisms. The two ends of the housing are rotatably connected to the housing, and the housing supports the housing. The housing is rotatable relative to the housing. The housing has cavities for accommodating the photomask substrate, extending through both ends of the housing. The four rotating mechanisms are respectively disposed on the housing and arranged in pairs opposite each other, evenly distributed along the circumference of the housing. Each rotating mechanism includes a rotating head, rotatably disposed on the housing and movable relative to the housing for inserting into or withdrawing from the cavity. One end of the rotating head facing the cavity has a slot adapted to the photomask substrate, which constrains one corner of the photomask substrate. In this solution, by rotatably connecting both ends of the frame to the rack, the frame can rotate arbitrarily in the X-direction relative to the rack, allowing the photomask substrate mounted on the frame to rotate synchronously in the X-direction to adjust its orientation. By constructing cavities in the frame to accommodate the photomask substrate, with these cavities extending through both ends of the frame, sufficient space is provided for the placement and orientation adjustment of the photomask substrate. This also helps reduce the probability of shadows under strong light, thus preventing missed detections. By arranging four rotating mechanisms in pairs opposite each other, and evenly distributed along the circumference of the frame, the four rotating mechanisms can form a square to accommodate the square-structured photomask substrate. Each rotating mechanism corresponds to a corner of the photomask substrate, thus constraining that corner. The rotating mechanism is configured to include a rotatable rotating head, with a slot at one end of the rotating head that adapts to the photomask substrate and constrains a corner of it. The rotating head is also movable. The rotating head is positioned within the frame, allowing it to move relative to the frame and extend into or out of the cavity. This design not only utilizes slots in at least one set of opposing rotating mechanisms to constrain the photomask substrate, effectively preventing it from falling during inspection, but also allows the user to select a set of opposing rotating mechanisms to constrain the photomask substrate. This ensures the constrained substrate rotates synchronously with the rotating head, adjusting its orientation. This allows for omnidirectional adjustment of the photomask substrate's orientation to meet different inspection needs or achieve better inspection results. Furthermore, the multi-degree-of-freedom adjustment of the substrate's orientation avoids or eliminates shadows cast under strong light during inspection, effectively preventing missed inspections. Additionally, the rotating head's ability to extend and retract relative to the frame to enter or exit the cavity effectively prevents interference with the photomask substrate's rotation and avoids collisions between the substrate and the rotating head, thus protecting the photomask substrate.

[0006] Preferably, two rotating mechanisms are respectively located at the upper and lower ends of the frame, and the other two rotating mechanisms are respectively located at the left and right ends of the frame. This allows the rotating mechanisms to constrain the upper and lower ends or the left and right ends of the frame, so that the photomask substrate has a degree of freedom of rotation in the Z direction or in the X direction, depending on the on-site inspection requirements.

[0007] Preferably, the slot is a V-shaped groove. This facilitates both processing and shaping, and also helps to constrain the photomask substrate. The photomask substrate can be effectively constrained by the cooperation of two sets of oppositely arranged rotating mechanisms, preventing it from falling off during inspection.

[0008] Preferably, the included angle between the two sides of the V-groove is 90-120 degrees. This not only makes it easier to quickly insert one corner of the photomask substrate into the corresponding slot of the rotating head to constrain that corner, but also effectively prevents the photomask substrate from coming out of the rotating head, thereby effectively preventing the photomask substrate from falling off during the inspection process.

[0009] The second aspect of this invention addresses the problem of simpler and more convenient use. Further, the rotating mechanism includes an adjusting component, a guide hole and a threaded hole constructed within the frame. One end of the guide hole communicates with the cavity, and the other end communicates with the threaded hole, which penetrates the outer side of the frame. The rotating head also includes a slider adapted to the threaded hole and a constraint rod connected to the slider. The slot is constructed at the end of the constraint rod. The slider and the threaded hole form a sliding pair, and / or the constraint rod and the guide hole form a sliding pair, with at least the constraint rod capable of rotating relative to the guide hole. A return spring is sleeved on the constraint rod, with one end abutting against the frame and the other end abutting against the slider. The adjusting component is threaded into the threaded hole and abuts against the slider. With this structure, simply adjusting the rotating adjusting component allows the drive rotating head to extend into the cavity to smoothly engage the photomask substrate, or to withdraw from the cavity to smoothly unlock the photomask substrate, making it very simple and convenient.

[0010] To address the problem of preventing the photomask substrate from being accidentally damaged by the rotating head, the third aspect of the utility model further includes a reset hole constructed within the frame. The two ends of the reset hole are connected to a guide hole and a threaded hole, respectively. The inner diameter of the reset hole is larger than the inner diameter of the guide hole, forming a first step between the guide hole and the reset hole. The inner diameter of the threaded hole is larger than the inner diameter of the reset hole, forming a second step between the threaded hole and the reset hole. One end of the reset spring abuts against the first step. The outer diameter of the slider is larger than the inner diameter of the reset hole. This not only facilitates the installation and replacement of the reset spring but also limits the maximum insertion distance of the rotating head by restricting the slider through the second step, thereby effectively preventing the photomask substrate from being accidentally damaged by the rotating head and protecting the photomask substrate.

[0011] Preferably, the guide hole, reset hole, and threaded hole are all round holes, the outer diameter of the slider is smaller than the inner diameter of the threaded hole, and the outer diameter of the constraint rod is smaller than the inner diameter of the guide hole. This allows the rotating head to rotate relative to the guide hole to adjust the orientation of the photomask substrate.

[0012] To address the issue of ease of use, preferably, the constraint rod is rotatably connected to the slider. This allows the constraint rod to rotate freely relative to the slider, preventing the rotating head from being accidentally compressed and locked during the tightening of the adjusting component.

[0013] The fourth aspect of this invention addresses the problem of preventing the constrained photomask substrate from rotating relative to the frame. Further, the slider has a mounting groove, and the upper end of the constraint rod is fitted with a rubber ring that fits the mounting groove and increases friction. The upper end of the constraint rod is inserted into the mounting groove, and the rubber ring presses against the side wall of the mounting groove. This not only allows the constraint rod to rotate synchronously with the rubber ring relative to the slider under external force, but also effectively increases the friction between the constraint rod and the slider, ensuring the constraint rod remains stably in the desired position without rotating on its own. This facilitates accurate inspection and prevents the rotating head from being accidentally pressed and locked, making it simpler and more convenient to use.

[0014] Furthermore, the adjusting component includes a knob, a connecting shaft connected to the knob, and a screw connected to the connecting shaft. The outer diameter of the connecting shaft is smaller than the outer diameter of the screw. The screw has an external thread that adapts to the threaded hole. The adjusting component is threadedly connected to the threaded hole of the frame through the screw.

[0015] Furthermore, the frame is provided with hinge shafts at its left and right ends respectively, and the frame is constructed with hinge holes adapted to the hinge shafts. The frame is rotatably connected to the frame through the cooperation of the hinge shafts and the hinge holes. The threaded holes in the rotation mechanisms at the left and right ends of the frame correspond to the hinge shafts respectively and pass through the hinge shafts respectively.

[0016] Preferably, the frame adopts a circular ring structure. This not only forms a circular cavity, thus better fitting the square-structured photomask substrate, but also facilitates faster and more precise adjustment of the photomask substrate's orientation during the inspection process.

[0017] Preferably, the frame includes a bracket, a support member, and a base that adapt to the frame. The upper end of the support member is connected to the bracket, and the lower end of the support member is connected to the base. Both ends of the frame are rotatably connected to the bracket. The base is used to support the entire fixture and prevent it from tipping over.

[0018] Preferably, the bracket adopts a U-shaped or arc-shaped structure. This allows the frame to be positioned inside the bracket, which not only does not affect the rotation of the frame, but also reduces the overall size of the fixture and helps protect the internal photomask substrate.

[0019] Preferably, the frame is provided with hinge shafts at both ends, and the bracket is provided with hinge holes at both ends to accommodate the hinge shafts. The frame is rotatably connected to the bracket through the engagement of the hinge shafts and the hinge holes. This allows the frame to rotate arbitrarily relative to the bracket along the X-axis.

[0020] Preferably, the support member is height-adjustable, allowing for adjustment of the overall frame height, thereby effectively adjusting the height of the photomask substrate to meet inspection requirements in different situations.

[0021] The fifth aspect of this utility model addresses the problem of a frame easily rotating due to its own weight. Furthermore, a pre-tightening layer is provided between the hinge shaft and the hinge hole to increase friction. This pre-tightening layer is elastic and is in a state of elastic compression. In this solution, by configuring an elastic pre-tightening layer and placing it in a state of elastic compression, a certain elastic pre-tightening force is created between the hinge shaft and the hinge hole. This elastic pre-tightening force effectively increases the friction between the hinge shaft and the hinge hole, allowing the frame to stably remain in the required position during actual use. This effectively prevents the frame from rotating under its own weight, facilitating more convenient, efficient, and accurate inspection work.

[0022] Preferably, the preload layer is a rubber ring to generate an elastic preload force.

[0023] Compared with the prior art, the fixture for inspecting photomask substrates provided by this utility model can not only more stably constrain the photomask substrate and prevent it from falling, but also adjust the orientation of the photomask substrate in all directions. This allows for convenient and comprehensive inspection of the photomask substrate and effectively prevents missed inspections caused by fixture shadows. Attached Figure Description

[0024] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a schematic diagram of the structure of an existing photomask substrate.

[0026] Figure 2 This is a front view of a fixture provided in Embodiment 1 of this utility model.

[0027] Figure 3 for Figure 2 The left view.

[0028] Figure 4 for Figure 3 A schematic diagram of the middle frame rotating relative to the support.

[0029] Figure 5 This is a schematic diagram showing how the four corners of the photomask substrate are constrained by the fixture.

[0030] Figure 6 This is a schematic diagram showing the upper and lower corners of the photomask substrate constrained by the fixture.

[0031] Figure 7 This is a schematic diagram showing the left and right corners of the photomask substrate constrained by the fixture.

[0032] Figure 8 for Figure 5 A partial sectional view at point I in the middle.

[0033] Figure 9 for Figure 5 Another partial sectional view at point I.

[0034] Figure 10 This is a schematic diagram of the structure of a rotating head in a fixture provided in Embodiment 1 of this utility model.

[0035] Figure 11 This is a partial sectional view of the rotating head.

[0036] Figure 12 for Figure 5 A partial sectional view at point II.

[0037] Figure 13 for Figure 5 Another partial sectional view at point II.

[0038] Figure 14 for Figure 5 Another partial sectional view at point I.

[0039] Figure 15 This is a cross-sectional view of a rotating head provided in Embodiment 3 of this utility model.

[0040] Figure 16 This is a cross-sectional view of the hinge hole in a fixture provided in Embodiment 4 of this utility model.

[0041] Explanation of markings in the diagram:

[0042] 11. Base, 12. Support, 13. Lifting rod, 14. Sleeve, 15. Locking component, 16. Bracket, 17. Hinge hole, 18. Tightening component; 2. Frame, 21. Cavity, 22. Hinge shaft, 23. Guide hole, 24. Reset hole, 25. Threaded hole, 26. First step, 27. Second step; 3. Rotating mechanism; 4. Rotating head, 41. Slider, 42. Mounting groove, 43. Constraint rod, 44. Slot, 45. Reset spring; 5. Adjusting component, 61. Knob, 62. Connecting shaft, 63. Screw; 7. Pre-tightening layer, 71. Rubber ring; 8. Photomask substrate, 81. Detailed Implementation

[0043] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The components of the embodiments of the present invention described and shown in the accompanying drawings can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0044] Example 1

[0045] This embodiment provides a fixture for inspecting photomask substrates, including a frame, a frame 2, and four rotating mechanisms 3, wherein, as shown... Figures 2-4 As shown, the two ends of frame 2 are rotatably connected to the frame, which supports frame 2. Frame 2 can rotate relative to the frame along the X-axis (i.e., the rotation center of frame 2 is along the X-axis). In implementation, the frame includes a bracket 16 adapted to frame 2, a support member 12, and a base 11. The upper end of the support member 12 is connected to the bracket 16, and the lower end of the support member 12 is connected to the base 11. Figures 2-4 As shown, the base 11 is used to support the entire fixture and prevent it from tipping over.

[0046] like Figures 2-4 As shown, both ends of frame 2 are rotatably connected to bracket 16. Bracket 16 is adapted to frame 2, and its rotation along the X-axis is not affected. In implementation, bracket 16 can preferably adopt a U-shaped structure or an arc-shaped structure, for example, Figure 2 As shown, the bracket 16 adopts a U-shaped structure so that the frame 2 is placed inside the bracket 16, which will not affect the rotation of the frame 2, can reduce the volume of the entire fixture, and also helps to protect the internal photomask substrate 8.

[0047] In implementation, a cavity 21 adapted to the photomask substrate 8 is constructed within the frame 2, and the cavity 21 extends through both the front and rear ends of the frame 2, as shown below. Figure 2 and Figure 5 As shown, this is to accommodate the photomask substrate 8 and allow it to rotate; in implementation, the frame 2 can preferably be constructed as a closed ring structure, such as... Figures 2-5 As shown, the cavity 21 is formed on the inner side of the annular structure; in implementation, the shape of the frame 2 can be determined according to actual needs. For example, the frame 2 can preferably adopt a circular annular structure, an elliptical annular structure, or a square annular structure. As an example, in this embodiment, the frame 2 adopts a circular annular structure, such as... Figure 2 and Figure 5 As shown, not only can a circular cavity 21 be formed, which can better fit the square structure of the photomask substrate 8, but it also facilitates faster and more accurate adjustment of the orientation of the photomask substrate 8 during the inspection process.

[0048] In implementation, hinge shafts 22 are respectively provided at the left and right ends of the frame 2. Correspondingly, hinge holes 17 adapted to the hinge shafts 22 are respectively constructed at both ends of the bracket 16. The inner diameter of the hinge hole 17 is larger than the outer diameter of the hinge shaft 22. The frame 2 is rotatably connected to the bracket 16 through the cooperation of the hinge shafts 22 and the hinge holes 17. Figure 5 and Figure 8 As shown, this allows the frame 2 to rotate arbitrarily relative to the bracket 16 along the X-axis. In a further embodiment, a pre-tightening layer 7 for increasing friction is also provided between the hinge shaft 22 and the hinge hole 17, such as... Figure 5 and Figure 9 As shown, in implementation, the pre-tightening layer 7 can preferably be made of rubber rings. The rubber rings can be fixed to the hinge shaft 22 or to the inner surface of the hinge hole 17. The pre-tightening layer 7 is in a state of elastic compression, resulting in a certain elastic pre-tightening force between the hinge shaft 22 and the hinge hole 17. This elastic pre-tightening force effectively increases the friction between the hinge shaft 22 and the hinge hole 17, allowing the frame 2 to stably remain in the required position during actual use. This effectively prevents the frame 2 from rotating under its own weight, facilitating more convenient, efficient, and accurate inspection work. Of course, the pre-tightening layer 7 can also be made of elastic materials such as silicone rings; examples will not be provided here.

[0049] In implementation, the four rotating mechanisms 3 are respectively installed on the frame 2, such as... Figure 2 As shown, the four rotating mechanisms 3 are arranged in pairs facing each other, and the four rotating mechanisms 3 are evenly distributed along the circumference of the frame 2, so that the four rotating mechanisms 3 can form a square, as shown. Figure 2As shown, this is to accommodate the square structure of the photomask substrate 8. In use, each rotating mechanism 3 corresponds to one corner 81 of the photomask substrate 8, so as to constrain one corner 81 of the photomask substrate 8 respectively.

[0050] In this embodiment, the two rotating mechanisms 3 are respectively arranged vertically and opposite to each other, such as... Figure 2 As shown, the two rotating mechanisms 3 are used to constrain the upper and lower ends of the rotating mechanism 3 respectively. Correspondingly, two other rotating mechanisms 3 are respectively arranged in the horizontal direction and opposite to each other, as shown. Figure 2 As shown, the two rotating mechanisms 3 are used to constrain the left and right ends of the rotating mechanism 3 respectively.

[0051] In this embodiment, the rotating mechanism 3 includes a rotating head 4, which is rotatably mounted on the frame 2 and can move relative to the frame 2 to extend into and exit the cavity 21. It can be understood that when the cavity 21 is circular, the rotating head 4 can move radially along the frame 2 to extend into and exit the cavity 21 radially, effectively preventing the rotating head 4 from interfering with the rotation of the photomask substrate 8 and preventing the photomask substrate 8 from colliding with the rotating head 4, thus effectively protecting the photomask substrate 8.

[0052] In implementation, the end of the rotating head 4 facing the cavity 21 is provided with a slot 44, such as... Figures 10-12 As shown, since the four corners 81 of the photomask substrate 8 are all right angles, in implementation, the slot 44 can preferably be constructed as a V-shaped slot, such as... Figure 10 and Figure 11 As shown, in implementation, the included angle between the two sides of the V-groove is preferably constructed to be 90-120 degrees (e.g., as shown in the figure). Figure 10 and Figure 11 As shown, the included angle between the two sides of the V-shaped groove is 90 degrees. This not only makes it easier to quickly insert one corner 81 of the photomask substrate 8 into the corresponding slot 44 of the rotating head 4 to constrain one corner 81 of the photomask substrate 8, but also effectively prevents the photomask substrate 8 from coming out of the rotating head 4, thereby effectively preventing the photomask substrate 8 from falling off during the inspection process.

[0053] As an example, in one specific embodiment, the rotating mechanism 3 further includes a guide hole 23, a reset hole 24, and a threaded hole 25 constructed in the frame 2. The guide hole 23 communicates with the cavity 21. Figure 12 As shown, the two ends of the reset hole 24 are connected to the guide hole 23 and the threaded hole 25 respectively, and are coaxial. The threaded hole 25 penetrates the outer side of the frame 2. In implementation, the guide hole 23 is preferably arranged radially along the frame 2, as shown. Figure 12As shown, the guide hole 23, reset hole 24, and threaded hole 25 are preferably round holes, and the inner diameter of the reset hole 24 is larger than the inner diameter of the guide hole 23, so as to form a first step 26 between the guide hole 23 and the reset hole 24. Figure 12 As shown, the inner diameter of the threaded hole 25 is larger than the inner diameter of the reset hole 24, so as to form a second step 27 between the threaded hole 25 and the reset hole 24, as shown. Figure 12 As shown. Accordingly, the rotating head 4 can preferably be constructed as a rotating body structure. The rotating head 4 includes a slider 41 that adapts to the threaded hole 25 and a constraint rod 43 connected to the slider 41. A slot 44 is constructed at the end of the constraint rod 43, as shown. Figures 10-12 As shown, the outer diameter of the slider 41 is smaller than the inner diameter of the threaded hole 25, allowing the slider 41 to form a sliding pair with the threaded hole 25 and / or the constraint rod 43 to form a sliding pair with the guide hole 23, enabling the adapter to move along the guide hole 23 to achieve the purpose of extending into or out of the cavity 21; in implementation, as Figure 12 As shown, the constraint rod 43 is fitted with a return spring 5, one end of which abuts against the first step 26, as... Figure 12 As shown, the other end of the return spring 5 abuts against the slider 41, and the return spring 5 is preferably a compression spring.

[0054] In this embodiment, the rotating mechanism 3 further includes an adjusting member 6, which includes a knob 61, a connecting shaft 62 connected to the knob 61, and a screw 63 connected to the connecting shaft 62, such as... Figure 12 As shown, the outer diameter of the connecting shaft 62 is smaller than the outer diameter of the screw 63 to reduce friction during use. The screw 63 is constructed with an external thread that fits the threaded hole 25, such as... Figure 12 As shown, the adjusting member 6 is threadedly connected to the threaded hole 25 of the frame 2 via a screw 63. In actual use, by rotating the adjusting member 6, it is gradually screwed into the threaded hole 25, thereby driving the rotating head 4 to move inward. During this inward movement of the rotating head 4, the return spring 5 is gradually compressed, causing its elastic potential energy to gradually increase. Simultaneously, the end of the rotating head 4 gradually extends into the cavity 21, causing one corner 81 of the photomask substrate 8 to gradually engage with the slot 44 at the end of the rotating head 4. Figure 12 As shown, this achieves the purpose of constraining the photomask substrate 8. In actual use, the slider 41 can be constructed as a cylindrical structure, which is beneficial for the overall rotation of the rotating head 4. The outer diameter of the slider 41 is larger than the inner diameter of the reset hole 24. The second step 27 can restrict the slider 41, thereby limiting the maximum insertion distance of the rotating head 4, effectively preventing the photomask substrate 8 from being crushed, and thus protecting the photomask substrate 8. As an example, in this embodiment, when the slider 41 of the rotating head 4 abuts against the second step 27, as... Figure 12As shown, immediately stop screwing in the adjusting member 6, so that the rotating head 4 is not fully clamped, allowing the rotating head 4 to rotate relative to the guide hole 23 to adjust the orientation of the photomask substrate 8 for better inspection. For ease of description, the position of the rotating head 4 at this time can be referred to as the first position, such as... Figure 12 As shown.

[0055] In practical use, by rotating the adjusting member 6, it gradually moves away from the cavity 21. Correspondingly, the elastic potential energy of the return spring 5 is released synchronously and continuously, causing the rotating head 4 to gradually move away from the cavity 21, at least allowing the rotating head 4 to retract into the guide hole 23. Figure 13 As shown, this not only allows the rotating head 4 to detach from the photomask substrate 8, achieving the purpose of unlocking the photomask substrate 8, but also prevents the rotating head 4 from being exposed, thereby effectively preventing interference or collision with the photomask substrate 8. For ease of description, the position of the rotating head 4 at this time can be referred to as the second position, as shown below. Figure 13 As shown.

[0056] In this embodiment, as Figure 2 and Figure 5 As shown, the two rotating mechanisms 3 are respectively located at the upper and lower ends of the frame 2. In this case, the threaded holes 25 of these two rotating mechanisms 3 can pass through the outer side of the frame 2, allowing the knob 61 of the adjusting component 6 to be located on the outer side of the frame 2, making it easier to use and operate; correspondingly, as... Figure 2 and Figure 5 As shown, the other two rotating mechanisms 3 are respectively located at the left and right ends of the frame 2. In this case, the threaded holes 25 of these two rotating mechanisms 3 correspond to the hinge shaft 22 and pass through it, as shown. Figure 14 As shown, this not only makes the knob 61 of the adjusting component 6 located outside the hinge shaft 22, making it easier to use and operate, but also does not interfere with the rotatable connection between the frame 2 and the bracket 16.

[0057] In practical use, when the two opposing rotating mechanisms 3 on the frame 2 are both in the first position, they can effectively constrain the two opposing corners 81 on the photomask substrate 8, thereby stably constraining the photomask substrate 8 between the two rotating mechanisms 3; and when the photomask substrate 8 is rotated, the two rotating mechanisms 3 can rotate synchronously with the photomask substrate 8, so as to smoothly adjust the orientation of the photomask substrate 8 according to actual needs. For example, as Figure 6As shown, when both rotating mechanisms 3 located at the upper and lower ends of frame 2 are in the first position, the two corners 81 at the upper and lower ends of the photomask substrate 8 are precisely constrained between these two rotating mechanisms 3. This not only effectively prevents the photomask substrate 8 from falling, but also, when both rotating mechanisms 3 located at the left and right ends of frame 2 are in the second position, the photomask substrate 8 can rotate in the Z direction to adjust its orientation, preventing missed detections due to the shadow of the fixture (such as frame 2). Furthermore, after adjustment, the adjusting member 6 can be tightened to press the rotating head 4, thereby locking the orientation of the photomask substrate 8 and preventing any changes in its orientation. For example, as... Figure 7 As shown, when both rotating mechanisms 3 located at the left and right ends of frame 2 are in the first position, the two corners 81 at the left and right ends of photomask substrate 8 are precisely constrained between these two rotating mechanisms 3. This not only effectively prevents photomask substrate 8 from falling, but also allows photomask substrate 8 to rotate in the X direction when both rotating mechanisms 3 located at the upper and lower ends of frame 2 are in the second position. This adjusts the orientation of photomask substrate 8 and prevents missed detections due to the shadow of the fixture (such as frame 2). Similarly, after adjustment, photomask substrate 8 can be locked using adjusting member 6, which will not be elaborated further here.

[0058] Of course, in implementation, frame 2 can also adopt an open ring structure, as long as it can meet the installation requirements of the four rotating mechanisms 3.

[0059] Example 2

[0060] To address the issue of greater ease of use, the main difference between Embodiment 2 and Embodiment 1 is that, in the fixture provided in this embodiment, the constraint rod 43 is rotatably connected to the slider 41, giving the constraint rod 43 a degree of freedom to rotate relative to the slider 41. This ensures that during the tightening of the adjusting member 6, the rotating head 4 will not be accidentally pressed and locked, preventing it from rotating.

[0061] In practice, there are various implementation methods. For example, the upper end of the constraint rod 43 can be connected to the slider 41 via a bearing to achieve a rotatable connection between the constraint rod 43 and the slider 41. Another example is... Figure 15 As shown, the lower end of the slider 41 is provided with a mounting groove 42. Correspondingly, the upper end of the constraint rod 43 is fitted with a rubber ring 71 that fits the mounting groove 42 and is used to increase friction. Figure 15As shown, the upper end of the constraint rod 43 is inserted into the mounting groove 42, and the rubber ring 71 is pressed between the constraint rod 43 and the side wall of the mounting groove 42. The rubber ring 71 is in a compressed state and has elasticity. This not only allows the constraint rod 43 to rotate synchronously with the rubber ring 71 relative to the slider 41 under the action of external force, but also effectively increases the friction between the constraint rod 43 and the slider 41. This allows the constraint rod 43 to stay stably in the required position without rotating on its own. This is beneficial for accurate inspection and prevents the rotating head 4 from being accidentally pressed and locked, making it simpler and more convenient to use.

[0062] Furthermore, in a more refined implementation, a pressure plate 45 is also included, such as... Figure 15 As shown, the pressure plate 45 is fixed to the lower end of the slider 41 to limit and constrain the rubber ring 71, preventing the rubber ring 71 and the constraint rod 43 from falling off. It can be understood that, in practice, the pressure plate 45 can be glued to the slider 41, or it can be fixed to the slider 41 with fasteners such as bolts or screws.

[0063] Example 3

[0064] The main difference between this embodiment 3 and embodiment 1 or 2 is that, in the fixture provided in this embodiment, the support member 12 is a support member 12 that can be raised and lowered in the vertical direction (Z direction) so as to adjust the height of the entire frame 2, thereby effectively adjusting the height of the photomask substrate 8 to meet the inspection requirements of different occasions.

[0065] In implementation, existing technologies can be used to achieve the lifting function of the support member 12. For example, in one embodiment, the support member 12 includes a lifting rod 13, a sleeve 14, and a locking member 15, with the lower end of the sleeve fixed to the base 11. Figure 2 and Figure 3 As shown, the sleeve 14 has a guide rail extending through its upper end, and the upper end of the lifting rod 13 is connected to the bracket 16, as shown. Figure 2 and Figure 3 As shown, the lower end of the lifting rod 13 is configured to fit a guide rail, allowing the lower end of the lifting rod 13 to insert into the guide rail of the sleeve 14 and move along the guide rail; as Figure 2 and Figure 3 As shown, the sleeve 14 has a locking hole on its side that communicates with the guide slide. The locking hole has an internal thread. The locking member 15 has a screw 63 that matches the locking hole and a handle connected to the screw 63. The locking member 15 is threadedly connected to the locking hole. In use, the lifting rod 13 can be unlocked by loosening the locking member 15 so that the height of the lifting rod 13 can be adjusted. After adjustment, tightening the locking member 15 can lock the lifting rod 13 so that the lifting rod 13 can be stably maintained in the required position.

[0066] In implementation, the cross-section of the guide slide can be constructed as a square, and correspondingly, the lifting rod 13 is constructed as a rectangular tube; or, in implementation, the cross-section of the guide slide can be constructed as a circle, and correspondingly, the lifting rod 13 is constructed as a round rod. The lifting rod 13 can not only be raised and lowered relative to the sleeve 14, but also rotate relative to the sleeve 14 in order to adjust the orientation of the photomask substrate 8, making it easier to perform inspection.

[0067] Example 4

[0068] To improve the stability of frame 2 at any position, the main difference between this embodiment 3 and embodiments 1, 2, or 3 is that, in the fixture provided in this embodiment, the bracket 16 is further constructed with a threaded hole 25 that communicates with the hinge hole 17, such as... Figure 16 As shown, the threaded hole 25 is internally threaded with a bolt or screw and other tightening member 18. The end of the tightening member 18 corresponds to the side of the hinge shaft 22 or the side of the pre-tightening layer 7, such as... Figure 16 As shown, once the frame 2 is adjusted to the correct position, tightening the clamping part 18 can further press the hinge shaft 22, effectively preventing the hinge shaft 22 from continuing to rotate, so that the frame 2 can be stably stopped at any position.

[0069] The above description is only a specific embodiment of this utility model, but the protection scope of this utility model is not limited thereto. Any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this utility model should be included within the protection scope of this utility model.

Claims

1. A fixture for inspecting photomask substrates, characterized in that, It includes a frame, a housing, and four rotating mechanisms. The two ends of the housing are rotatably connected to the housing. The housing supports the housing, and the housing can rotate relative to the housing. The frame is constructed with cavities for accommodating the photomask substrate, the cavities extending through both the front and rear ends of the frame; Four rotating mechanisms are respectively set on the frame and arranged in pairs opposite each other. The four rotating mechanisms are evenly distributed along the circumference of the frame. Each rotating mechanism includes a rotating head, which is rotatably set on the frame and can move relative to the frame to extend into or out of the cavity. One end of the rotating head facing the cavity is constructed with a slot adapted to the photomask substrate. The slot is used to constrain one corner of the photomask substrate.

2. The fixture for inspecting photomask substrates according to claim 1, characterized in that, Two of the rotating mechanisms are located at the top and bottom of the frame, respectively, while the other two rotating mechanisms are located at the left and right ends of the frame, respectively.

3. The fixture for inspecting photomask substrates according to claim 1, characterized in that, The slot is constructed as a V-shaped groove, and the included angle between the two sides of the V-shaped groove is 90-120 degrees. And / or, the frame adopts a ring-shaped structure.

4. The fixture for inspecting photomask substrates according to any one of claims 1-3, characterized in that, The rotating mechanism also includes an adjusting element, a guide hole and a threaded hole constructed in the frame, one end of the guide hole communicating with the cavity and the other end communicating with the threaded hole, and the threaded hole penetrating the outer side of the frame. The rotating head also includes a slider adapted to a threaded hole and a constraint rod connected to the slider. The slot is constructed at the end of the constraint rod. The slider and the threaded hole form a sliding pair and / or the constraint rod and the guide hole form a sliding pair, and at least the constraint rod can rotate relative to the guide hole. The constraint rod is fitted with a return spring, one end of which abuts against the frame and the other end of which abuts against the slider; The adjusting element is threaded into the threaded hole and abuts against the slider.

5. The fixture for inspecting photomask substrates according to claim 4, characterized in that, The rotating mechanism also includes a reset hole constructed in the frame. The two ends of the reset hole are connected to a guide hole and a threaded hole, respectively. The inner diameter of the reset hole is larger than the inner diameter of the guide hole, and a first step is formed between the guide hole and the reset hole. The inner diameter of the threaded hole is larger than the inner diameter of the reset hole, and a second step is formed between the threaded hole and the reset hole. One end of the reset spring abuts against the first step. The outer diameter of the slider is larger than the inner diameter of the reset hole.

6. The fixture for inspecting photomask substrates according to claim 5, characterized in that, The guide hole, reset hole, and threaded hole are all round holes. The outer diameter of the slider is smaller than the inner diameter of the threaded hole, and the outer diameter of the constraint rod is smaller than the inner diameter of the guide hole. Alternatively, the constraint rod can be rotatably connected to the slider.

7. The fixture for inspecting photomask substrates according to claim 6, characterized in that, The slider has a mounting groove, and the upper end of the constraint rod is fitted with a rubber ring that fits the mounting groove and is used to increase friction. The upper end of the constraint rod is inserted into the mounting groove, and the rubber ring is pressed between the constraint rod and the side wall of the mounting groove.

8. The fixture for inspecting photomask substrates according to claim 4, characterized in that, The frame is provided with hinge shafts at both the left and right ends, and the frame is constructed with hinge holes that are adapted to the hinge shafts. The frame is rotatably connected to the frame through the cooperation of the hinge shafts and the hinge holes. The threaded holes in the rotating mechanisms at the left and right ends of the frame correspond to the hinge shafts and pass through the hinge shafts respectively. And / or, the adjusting component includes a knob, a connecting shaft connected to the knob, and a screw connected to the connecting shaft. The outer diameter of the connecting shaft is smaller than the outer diameter of the screw. The screw has an external thread that adapts to a threaded hole. The adjusting component is threadedly connected to the threaded hole of the frame via the screw.

9. The fixture for inspecting photomask substrates according to claim 1, characterized in that, The frame includes a bracket, a support member, and a base that are adapted to the frame. The upper end of the support member is connected to the bracket, and the lower end of the support member is connected to the base. Both ends of the frame are rotatably connected to the bracket. The support structure adopts a U-shaped structure or an arc structure; The frame is provided with hinge shafts at its left and right ends, and the bracket is provided with hinge holes at both ends that are adapted to the hinge shafts. The frame is rotatably connected to the bracket through the cooperation of the hinge shafts and the hinge holes.

10. The fixture for inspecting photomask substrates according to claim 9, characterized in that, A pre-tightening layer for increasing friction is also provided between the hinge shaft and the hinge hole. The pre-tightening layer is elastic and is in a state of elastic compression. And / or, the support member can be raised or lowered.

Images