Cleaning mechanism for substrate slice

Abstract

The utility model relates to the technical field of biochip manufacturing equipment, in particular to a cleaning mechanism for a substrate slice, which comprises at least one cleaning tank, a tank cavity for accommodating the substrate slice is arranged in the cleaning tank, a cleaning head is mounted on the cleaning tank, at least one liquid inlet and a liquid outlet pipe are arranged on the cleaning head, and the liquid inlet and the liquid outlet pipe are communicated with each other. The output ends of the liquid inlets are respectively communicated with liquid outlet pipes, and the liquid outlet pipes are communicated to the groove cavity; and a liquid outlet is formed in the bottom surface of the groove cavity. The mechanism is simple in structure, convenient to install, completely adaptive to the cleaning process of the substrate, free of damage to the surface of the substrate and high in cleaning efficiency.

Description

Technical Field

[0001] This utility model relates to the field of biochip manufacturing equipment technology, specifically a substrate cleaning mechanism. Background Technology

[0002] Biochips generally consist of a substrate and a protective layer. The substrate is mostly made of materials such as glass or silicon, serving as a carrier for biomolecules. Biomolecules can be fixed on the substrate through covalent bonding, adsorption, and affinity. The protective layer is generally made of transparent polymer materials or biocompatible coating materials, such as PDMS (polydimethylsiloxane) or epoxy resin, and is used to cover the substrate to protect biomolecules from degradation, oxidation, and interference from contaminants such as dust and moisture.

[0003] The manufacturing process of substrates mainly includes surface pretreatment, immobilization of biomolecules, and post-treatment (sealing). Post-treatment involves immersing (incubating) the substrate in a specific molecular solution for a certain period to reduce non-specific adsorption. After immersion, the substrate needs to be cleaned with various buffer solutions to remove unbound or excess molecules. Currently, the common cleaning method is manual handheld sprayers or syringes, which are inefficient and produce poor cleaning results, hindering the industrial production of biochips. Furthermore, the size of substrates is basically the same as commonly used laboratory slides. While slide washers can be used, the presence of biomolecules on the substrate makes them inconvenient to handle and can easily damage the substrate surface. Therefore, a dedicated substrate cleaning mechanism is needed. Summary of the Invention

[0004] To address the aforementioned problems, this invention provides a substrate cleaning mechanism that is highly efficient and easy to use. The technical solution adopted by this invention is as follows:

[0005] A substrate cleaning mechanism includes at least one cleaning tank, the cleaning tank having a cavity for accommodating the substrate, a cleaning head mounted on the cleaning tank, the cleaning head having at least one inlet and one outlet pipe, the output end of the inlet being connected to the outlet pipe, the outlet pipe being connected to the cavity; and a drain outlet being provided on the bottom surface of the cavity.

[0006] The aforementioned substrate cleaning mechanism has several support blocks protruding from its bottom surface inside the cavity.

[0007] The aforementioned substrate cleaning mechanism has a support block made of soft rubber, and an elastic element is provided below the support block to move up and down within the cavity. The elastic element is installed at the bottom of the cleaning tank.

[0008] The aforementioned substrate cleaning mechanism has outwardly recessed relief grooves on both sides of the cavity, and the top opening of the cavity is flared.

[0009] The aforementioned substrate cleaning mechanism has a downwardly recessed groove on the bottom surface of the tank cavity, and the drain outlet is located within the area of ​​the groove.

[0010] The above-mentioned substrate cleaning mechanism has a notch on the side of the cleaning tank, and the cleaning head is installed in the notch; the cleaning head has 2 to 4 liquid inlets, and the liquid outlet pipe has several spray holes.

[0011] The aforementioned substrate cleaning mechanism also includes a mounting plate, and all the cleaning tanks are mounted on the mounting plate.

[0012] The beneficial effects of this utility model are: the structure of the mechanism is simple and easy to install, it is fully compatible with the substrate cleaning process, it will not damage the substrate surface, and the cleaning efficiency is high. Attached Figure Description

[0013] Figure 1 and Figure 2 This is a three-dimensional structural diagram of an embodiment of the present utility model;

[0014] Figure 3 This is a bottom view of an embodiment of the present utility model;

[0015] Figure 4 This is a side view schematic diagram of an embodiment of the present utility model;

[0016] Figure 5 for Figure 4 Diagram of section cut along line A in the middle;

[0017] Figure 6 This is a top view schematic diagram of an embodiment of the present utility model;

[0018] Figure 7 for Figure 6 Diagram of section cut along line B in the middle;

[0019] Figure 8 This is a schematic diagram of the cleaning tank structure according to an embodiment of the present utility model;

[0020] Figure 9 and Figure 10 This is a three-dimensional structural diagram of the cleaning head according to an embodiment of the present utility model;

[0021] Figure 11 This is a side view of the cleaning head according to an embodiment of the present invention;

[0022] Figure 12 for Figure 11 Schematic diagram of cross section in the middle C direction.

[0023] In the diagram: 1 is the cleaning tank, 2 is the cleaning head, 3 is the mounting plate, 4 is the support block, 5 is the pressure plate, 6 is the spring, 11 is the drain outlet, 12 is the groove, 13 is the clearance groove, 21 is the inlet I, 22 is the inlet II, 23 is the inlet III, 24 is the outlet pipe, and 25 is the spray hole. Detailed Implementation

[0024] The present invention will now be described in detail with reference to the accompanying drawings. The following embodiments are illustrative and intended to provide further explanation of this application. Unless otherwise specified, all technical terms used have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains. It should be noted that the terminology used is for the purpose of describing particular embodiments only and is not intended to be limiting according to this application.

[0025] This embodiment describes a substrate cleaning mechanism, such as... Figures 1 to 5 As shown, the system includes at least one cleaning tank 1, which is mounted on a mounting plate 3. It can be used with related automated equipment; the mounting plate 3 can be directly assembled onto a workbench, which is very convenient. Each cleaning tank 1 has a cavity for accommodating the substrate. A cleaning head 2 is mounted on each cleaning tank 1. (Refer to...) Figures 9 to 12 The cleaning head 2 is equipped with at least one inlet and one outlet pipe 24. The inlet is connected to a liquid delivery device, and the outlet is connected to the outlet pipe 24. The outlet pipe 24 is connected to the tank cavity. The buffer solution for cleaning the substrates is supplied to the tank cavity via the liquid delivery device, the inlet, and the outlet pipe 24. The bottom surface of the tank cavity is provided with a drain port 11, through which the buffer waste liquid after cleaning is discharged to the waste liquid tank. In this embodiment, the structure, start-stop control, etc. of the liquid delivery device (including pipelines, pumps, various hydraulic valves, electrical components, etc.) and waste liquid tank all adopt conventional technologies. For example, there are relatively mature products on the market for liquid delivery devices. The liquid delivery system of existing slide cleaners can be referenced or directly used, or customized from automation equipment manufacturers. There are no technical obstacles.

[0026] The cavity is provided with several support blocks 4 protruding from its bottom surface to support the substrate. Figure 5 The dotted-line structure inside the central cleaning tank allows for cleaning of both the upper and lower surfaces of the substrate, resulting in a more thorough cleaning. The support block 4, made of soft rubber, acts as a buffer during substrate placement and rinsing, preventing damage to the substrate.

[0027] Furthermore, such as Figure 3 , Figure 6 and Figure 7 As shown, the support block 4 is designed to be movable, meaning that an elastic element, such as a spring 6, is installed below the support block 4. The elastic element is mounted at the bottom of the cleaning tank 1 by a pressure plate 5, which is screwed onto the cleaning tank 1. The support block 4 can be a pin-shaped component.

[0028] Furthermore, in combination Figure 1 , Figure 2 , Figure 5 and Figure 6 The cavity has outwardly recessed relief grooves 13 on both sides, which can be used with tweezers, mechanical grippers, etc. to pick up and put in the substrate, avoiding damage; the top opening of the cavity is flared, which facilitates the entry and exit of the substrate in the cavity.

[0029] like Figure 5 and Figure 6 As shown, the bottom surface of the tank cavity is provided with a downwardly recessed groove 12, and the drain port 11 is located in the area of ​​the groove 12 to facilitate the discharge of waste liquid.

[0030] refer to Figure 1 , Figure 2 and Figure 8 The cleaning tank 1 has a notch on its left side, and the cleaning head 2 is installed inside the notch. (Reference) Figures 9 to 12 In this embodiment, the cleaning head 2 is equipped with three liquid inlets: inlets I 21 on the left and right sides, inlet II 22, and inlet III 23 at the bottom. Different buffer solutions (mostly pure water during the final cleaning) can be introduced sequentially. The outlet pipe 24 is equipped with several spray holes 25 to make the liquid spraying range more uniform. The pipeline connecting the input end of the liquid inlet to the liquid delivery equipment can be equipped with a one-way valve or other conventional technology to prevent backflow of different buffer solutions. The spraying time of each buffer solution is controllable and adjustable (achieved by controlling the on / off state of the corresponding hydraulic valve, which is a conventional technology).

[0031] The above are merely preferred embodiments of this application. It should be noted that those skilled in the art can make various changes or improvements without departing from the principles of this application, and these changes or improvements should also be considered within the scope of protection of this application.

Claims

1. A substrate cleaning mechanism, characterized in that: It includes at least one cleaning tank (1), the cleaning tank (1) is provided with a cavity for accommodating the substrate, the cleaning tank (1) is equipped with a cleaning head (2), the cleaning head (2) is provided with at least one liquid inlet and liquid outlet (24), the output end of the liquid inlet is connected to the liquid outlet (24), and the liquid outlet (24) is connected to the cavity; the bottom surface of the cavity is provided with a drain port (11), the two sides of the cavity are provided with outwardly recessed relief grooves (13), and the cavity is provided with several support blocks (4) protruding from its bottom surface.

2. The substrate cleaning mechanism according to claim 1, characterized in that: The support block (4) is made of soft rubber. An elastic element is provided below the support block (4) to move up and down in the groove cavity. The elastic element is installed at the bottom of the cleaning tank (1).

3. The substrate cleaning mechanism according to claim 1, characterized in that: The top opening of the cavity is funnel-shaped.

4. The substrate cleaning mechanism according to claim 1, characterized in that: The bottom surface of the cavity is provided with a downward recessed groove (12), and the drain port (11) is located in the area of ​​the groove (12).

5. The substrate cleaning mechanism according to claim 1, characterized in that: The side of the cleaning tank (1) is provided with a notch, and the cleaning head (2) is installed in the notch; the cleaning head (2) is provided with 2 to 4 liquid inlets, and the liquid outlet pipe (24) is provided with several spray holes (25).

6. The substrate cleaning mechanism according to claim 1, characterized in that: It also includes a mounting plate (3), on which the cleaning tanks (1) are all mounted.

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