The present invention is a temporary
adhesive material for
wafer processing, used for temporarily bonding a support and a
wafer having a circuit-forming surface on a front side and a backside to be processed, including a composite temporary
adhesive material layer having a two-
layered structure that includes a first temporary
adhesive layer including a
thermoplastic resin layer (A) capable of peelably adhering to the front side of the
wafer, and a second temporary adhesive layer including a thermosetting
siloxane polymer layer (B) laminated on the first temporary adhesive layer. Accordingly, the present invention provides a temporary adhesive material for wafer
processing that has, irrespective of the surface treatment of the wafer substrate, stable wafer processability, excellent peelability of the support, and easy cleaning removability of the temporary adhesive material layer after peeling of the support, can be formed with uniform film thickness even on a substrate with a large
step height, exhibits high process compatibility with TSV formation and wafer backside wiring processes, and furthermore exhibits excellent resistance to wafer thermal processes such as
chemical vapor deposition (CVD), thereby enhancing the productivity of thin wafers.