Ultrasonic cleaning instrument for hydrothermal synthesis reaction kettle
By using ultrasonic cleaning equipment, the reaction vessel can be cleaned in a comprehensive, non-contact manner through ultrasonic cavitation and mechanical scrubbing. This eliminates the risk of cleaning personnel coming into contact with acidic chemicals and improves both cleaning effectiveness and safety.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- HUBEI MINGSHI HIGH PURITY MATERIALS TECHNOLOGY CO LTD
- Filing Date
- 2025-06-12
- Publication Date
- 2026-05-15
AI Technical Summary
Existing methods for cleaning reactors pose a risk of personnel coming into contact with acidic chemicals, potentially leading to skin burns.
An ultrasonic cleaner is used for non-contact cleaning. The ultrasonic waves generate cavitation in the cleaning solution to remove chemical residues from the inner wall of the reactor. Combined with mechanical brushing and acid treatment, a comprehensive and fully automated cleaning process is achieved.
It completely avoids the danger of cleaning personnel coming into contact with acidic residues, improves operational safety, and provides more comprehensive and thorough cleaning, especially suitable for complex structures or strongly adhered dirt.
Smart Images
Figure CN224237790U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the technical field of reactor cleaning, specifically to an ultrasonic cleaner for hydrothermal synthesis reactors. Background Technology
[0002] In the chemical industry, reaction vessels are often used as containers for reactions to enable chemical reaction processes to proceed continuously or intermittently.
[0003] After prolonged use, unreacted chemical substances accumulate on the inner walls of a reactor, requiring manual cleaning. Current cleaning methods involve manual labor. First, the reactor lid is opened, and the gaskets are removed. Then, cleaning personnel, wearing acid-resistant gloves, reach into the reactor to scrub. However, some chemical substances remain on the inner walls. If these substances are acidic, prolonged contact with the acid can corrode the gloves, leading to burns on the cleaning personnel's hands and hindering the cleaning process. Utility Model Content
[0004] This invention provides an ultrasonic cleaner for hydrothermal synthesis reactors to solve the above-mentioned technical problems.
[0005] To achieve the above objectives, this utility model provides an ultrasonic cleaner for hydrothermal synthesis reactors, comprising:
[0006] The box body has a cleaning chamber inside;
[0007] The cover has a water inlet and is placed on the box body;
[0008] An ultrasonic cleaning component is housed within the chamber.
[0009] During cleaning, the ultrasonic cleaning component performs ultrasonic treatment on the reaction vessel inside the cleaning chamber to separate the dirt on the reaction vessel from the reaction vessel.
[0010] Preferably, the ultrasonic cleaning component is disposed on two opposite side walls of the housing.
[0011] Preferably, the housing has a water outlet, which is located away from the cover.
[0012] Preferably, the ultrasonic cleaner for the hydrothermal synthesis reactor further includes:
[0013] The washing assembly has one end mounted on the cover and the other end extending to the side of the cover near the box.
[0014] Preferably, the scrubbing assembly includes:
[0015] A drive motor is installed on the side of the cover away from the box body;
[0016] An output shaft is rotatably connected to the drive motor and is located on the side of the cover closer to the housing; the output shaft is rotatably connected to the cover.
[0017] The brush head is located on the output shaft.
[0018] Preferably, the housing is provided with a limiting block, which is disposed on the bottom wall of the housing, and the side of the limiting block away from the bottom wall of the housing is at a distance from the bottom wall of the housing, so as to separate the reactor from the bottom wall of the housing.
[0019] Preferably, the cover has an acid inlet, which is connected to the cleaning chamber.
[0020] Preferably, the ultrasonic cleaner for the hydrothermal synthesis reactor further includes:
[0021] A water level sensor is located inside the cleaning chamber and is positioned close to the cover.
[0022] Preferably, the ultrasonic cleaner for the hydrothermal synthesis reactor further includes:
[0023] The control panel is located on the cover and is electrically connected to the ultrasonic cleaning component and the scrubbing assembly.
[0024] Preferably, the ultrasonic cleaning component is provided on both the peripheral wall and the bottom wall of the housing.
[0025] The ultrasonic cleaner for hydrothermal synthesis reactors proposed in this invention has the following beneficial effects:
[0026] 1. The ultrasonic cleaner for hydrothermal synthesis reactor proposed in this utility model allows the user to place the hydrothermal synthesis reactor to be cleaned into the cleaning chamber, and cover the chamber with the lid. The lid has a water inlet, through which cleaning fluid, such as an aqueous solution, can be injected into the cleaning chamber to enhance the cleaning effect.
[0027] The ultrasonic cleaning component is located inside the chamber. When the equipment is started, the ultrasonic cleaning component begins to work, releasing high-frequency ultrasonic signals into the cleaning fluid.
[0028] When ultrasound propagates in a liquid, it creates cavitation, where tiny bubbles are rapidly generated and burst. This energy impact effectively removes chemical residues from the inner wall of the reactor.
[0029] The removed stains float or settle in the liquid, gradually separating from the main body of the reactor, thus completing the cleaning process.
[0030] Ultrasonic cleaning enables non-contact cleaning, completely eliminating the risk of cleaning personnel coming into contact with acidic residues and improving operational safety from the source.
[0031] Ultrasonic cleaning works on the entire inner wall surface through a liquid medium, including hard-to-reach corners. Compared with simple brushing, it is more comprehensive and removes dirt more thoroughly, and is especially suitable for complex structures or reaction vessels with strong residual adhesion.
[0032] 2. The ultrasonic cleaner for hydrothermal synthesis reactor proposed in this utility model uses multi-directional propagating ultrasonic waves to create complex fluctuations and micro-flows in the cleaning fluid within the cleaning chamber, acting on all surfaces of the reactor, including the inner wall, outer wall, and bottom.
[0033] The reactor is slightly lifted by the limiting block, leaving a gap between it and the bottom wall, ensuring that the bottom ultrasonic waves can smoothly penetrate the cleaning fluid and act on the bottom of the reactor. The peripheral ultrasonic cleaning components mainly act on the circumferential wall and edge of the reactor, ensuring all-round coverage.
[0034] The dual ultrasonic cleaning layout of the bottom and side walls enables 360° cleaning coverage, effectively removing contaminants, especially from the bottom and side walls, significantly improving the cleanliness.
[0035] After arranging ultrasonic transducers on multiple sides, multi-source interference and superimposed wave fields are formed in the cleaning fluid, which can produce a stronger cavitation effect and improve the encapsulation and impact of the cleaning fluid on the entire vessel. Attached Figure Description
[0036] Figure 1 This is a schematic diagram of the ultrasonic cleaner for the hydrothermal synthesis reactor in this utility model;
[0037] Figure 2 for Figure 1 Cross-sectional view of an ultrasonic cleaner for a hydrothermal synthesis reactor;
[0038] Figure 3 for Figure 1 A partial structural diagram of an ultrasonic cleaner for a hydrothermal synthesis reactor.
[0039] Figure 4 for Figure 1 A schematic diagram of the middle box structure.
[0040] In the picture:
[0041] 100. Ultrasonic cleaner for hydrothermal synthesis reactor;
[0042] 110. Housing; 110a. Cleaning chamber; 110b. Water outlet; 111. Limiting block;
[0043] 120, Cover; 120a, Water inlet; 120b, Acid inlet;
[0044] 130. Ultrasonic cleaning components;
[0045] 140. Washing components;
[0046] 150. Water level sensor;
[0047] 160. Control Panel.
[0048] The realization of the purpose, functional features and advantages of this utility model will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation
[0049] It should be understood that the specific embodiments described herein are merely illustrative of the present invention and are not intended to limit the present invention.
[0050] It should be noted that in the description of this utility model, the terms "lateral," "longitudinal," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used solely for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0051] This utility model provides an ultrasonic cleaner 100 for hydrothermal synthesis reactors, comprising:
[0052] The housing 110 has a cleaning chamber 110a inside;
[0053] The cover 120 has a water inlet 120a, and the cover 120 is placed on the box 110;
[0054] An ultrasonic cleaning component 130 is disposed inside the housing 110;
[0055] During cleaning, the ultrasonic cleaning component 130 performs ultrasonic treatment on the reaction vessel inside the cleaning chamber 110a to separate the dirt on the reaction vessel from the reaction vessel.
[0056] Please refer to Figures 1-4 In this embodiment, the user places the hydrothermal synthesis reactor to be cleaned into the cleaning chamber 110a, and the cover 120 is placed on the box 110. The cover 120 has a water inlet 120a, through which cleaning liquid, such as an aqueous solution, is injected into the cleaning chamber 110a to enhance the cleaning effect.
[0057] The ultrasonic cleaning component 130 is located inside the housing 110. When the equipment is started, the ultrasonic cleaning component 130 begins to work, releasing high-frequency ultrasonic signals into the cleaning fluid.
[0058] When ultrasound propagates in a liquid, it creates cavitation, where tiny bubbles are rapidly generated and burst. This energy impact effectively removes chemical residues from the inner wall of the reactor.
[0059] The removed contaminants float or settle in the liquid, gradually separating from the reactor body, completing the cleaning process. The dirty liquid can be discharged through outlet 110b for replacement or recycling.
[0060] Ultrasonic cleaning enables non-contact cleaning, completely eliminating the risk of cleaning personnel coming into contact with acidic residues and improving operational safety from the source.
[0061] Ultrasonic cleaning works on the entire inner wall surface through a liquid medium, including hard-to-reach corners. Compared with simple brushing, it is more comprehensive and removes dirt more thoroughly, and is especially suitable for complex structures or reaction vessels with strong residual adhesion.
[0062] It should be noted that the housing 110 is roughly rectangular in shape, with one end open to form a cleaning chamber 110a; the cover 120 is roughly rectangular, the water inlet 120a is a through hole, and the ultrasonic cleaning component 130 is roughly an ultrasonic generator.
[0063] Preferably, the ultrasonic cleaning component 130 is disposed on two opposite side walls of the housing 110.
[0064] Please refer to Figures 1-4 In this embodiment, after the equipment is started, the ultrasonic cleaning components 130 on both sides of the wall emit high-frequency ultrasonic waves simultaneously or alternately, so that the cleaning fluid produces a stronger and more uniform cavitation effect in the cavity.
[0065] Ultrasonic waves propagate alternately from both sides, acting on the surface of the reactor. In particular, they can achieve more even wave coverage on the outer walls, recessed structures, or other curved areas of the reactor, ensuring that the cleaning fluid can effectively act on every area where stains adhere.
[0066] Simultaneous action from multiple directions can enhance the convective motion of cavitation bubbles in the liquid, promote particle shedding and reduce blind spots, thereby shortening the cleaning time and improving the consistency of the cleaning effect.
[0067] The simultaneous operation of both sides creates an interlaced ultrasonic field, preventing energy from being concentrated in a single area and causing waste. At the same time, it ensures that every part of the reactor surface is subjected to uniform force, improving energy utilization efficiency.
[0068] Applying force from both sides simultaneously can create a relatively balanced physical force field, preventing the reactor from tilting, rolling, or being damaged by single-sided ultrasonic vibration, thus improving structural stability.
[0069] Preferably, the housing 110 has a water outlet 110b, which is located away from the cover 120.
[0070] Please refer to Figures 1-4 In this embodiment, before cleaning, the operator injects cleaning fluid, such as water or other solution, into the cleaning chamber 110a inside the box 110 through the water inlet 120a provided on the cover 120. The liquid fills the cleaning chamber 110a from top to bottom.
[0071] The reactor is placed in the cleaning chamber 110a. Under the combined action of the ultrasonic cleaning component 130 and / or the scrubbing assembly 140, the residues on the inner and outer surfaces of the reactor gradually fall off and become suspended in the cleaning solution. At this point, the cleaning solution already contains a large amount of dirt or corrosive impurities.
[0072] After cleaning, the contaminated cleaning solution is discharged naturally from the bottom of the cleaning chamber 110a by gravity through the water outlet 110b located at the bottom of the housing 110 away from the cover 120. This eliminates the need for manual emptying or scooping, making it convenient and quick.
[0073] The operator can further flush the cavity by injecting clean water through the inlet 120a. The clean water enters from the top and carries away the residue from the bottom outlet 110b. After completing the internal flushing cycle, the liquid is refilled for the next use.
[0074] The outlet 110b is located at the bottom away from the cover 120, that is, at the lowest point of the cleaning chamber 110a, which allows the sewage to be discharged naturally without the need for tilting equipment or suction device, thereby improving drainage efficiency and reducing the residue rate after cleaning.
[0075] It should be noted that the outlet 110b is a through-hole, and valves or other structures can be installed at the outlet 110b to control the opening or closing of the outlet 110b.
[0076] Preferably, the ultrasonic cleaner 100 for the hydrothermal synthesis reactor further includes:
[0077] The washing assembly 140 is mounted on the cover 120 at one end and extends to the side of the cover 120 near the box 110 at the other end.
[0078] Please refer to Figures 1-4In this embodiment, when the operator places the reactor into the cleaning chamber 110a and closes the cover 120, the brush head (or rotating part) of the washing assembly 140 is located at the opening of the reactor or close to its inner wall, so that it can physically reach the parts that need to be cleaned, such as the inner opening of the reactor, the edge transition, the protruding parts, etc.
[0079] The output shaft is driven by a drive motor to rotate, and the brush head rotates or reciprocates synchronously to perform targeted mechanical brushing on specific areas, in order to help remove stains that are tightly attached or difficult to remove with ultrasonic waves.
[0080] Based on the ultrasonic cavitation effect, the scrubbing component 140 is mechanically strengthened, so that the stains are first loosened by ultrasonic waves and then removed by the brush head, or the stubborn residues that have not been fully softened are directly brushed away by physical means, thereby improving the overall cleaning quality.
[0081] Preferably, the scrubbing assembly 140 includes:
[0082] A drive motor is installed on the side of the cover 120 away from the box 110;
[0083] The output shaft is rotatably connected to the drive motor and is located on the side of the cover 120 near the box 110. The output shaft is rotatably connected to the cover 120.
[0084] The brush head is located on the output shaft.
[0085] Please refer to Figures 1-4 In this embodiment, after the washing system is started, the drive motor drives the output shaft to rotate at high or low speed (depending on the material and adhesion of the object being cleaned).
[0086] The output shaft synchronously drives the brush head to rotate, and the brush head makes slight contact or close contact with the surface of the reactor to perform a rotating brushing action.
[0087] The scrubbing process can be run continuously for a certain period of time, or alternated with the ultrasonic cleaning stage, to achieve the best cleaning effect.
[0088] The automatic rotating brush head achieves internal wall cleaning, completely eliminating the operation step of personnel directly contacting acidic residues, which essentially improves the safety of the operation.
[0089] It should be noted that the drive motor is mounted on the top exterior of the cover 120 (on the side away from the housing 110) as a power source, avoiding direct exposure to cleaning fluid or acidic vapors and extending its service life. The output shaft passes through the cover 120, extending from the outside to the inside, and is rotatably connected to the drive motor; its bearings or sealing structure ensures that no liquid leakage occurs during rotation. The brush head is located at the inner end of the output shaft, i.e., inside the cleaning chamber 110a, positioned near the reactor inlet or inner cavity.
[0090] Preferably, the housing 110 is provided with a limiting block 111 protruding from it. The limiting block 111 is disposed on the bottom wall of the housing 110, and the side of the limiting block 111 away from the bottom wall of the housing 110 is at a distance from the bottom wall of the housing 110, so as to separate the reactor from the bottom wall of the housing 110.
[0091] Please refer to Figures 1-4 In this embodiment, a number of limiting blocks 111 are provided on the bottom wall of the box 110. These blocks have a protruding structure, and their tops are a certain distance away from the bottom wall, forming a suspended support surface.
[0092] Multiple limiting blocks 111 are distributed at different positions at the bottom of the cleaning chamber 110a to limit the placement area of the reactor and form a stable support.
[0093] When the operator places the reactor to be cleaned into the housing 110, the reactor does not directly contact the bottom wall of the housing 110, but rests on the upper surface of the limiting block 111.
[0094] Therefore, the reactor as a whole is positioned slightly above the bottom wall, forming a certain gap space between it and the bottom wall.
[0095] After the cleaning fluid flows into the cleaning chamber 110a, it can flow into the bottom of the reactor through the gap between the limiting blocks 111. The ultrasonic waves released by the ultrasonic cleaning component 130 (such as those set on the bottom wall or the peripheral wall) can act on the bottom of the reactor from multiple directions through the liquid to achieve comprehensive cleaning.
[0096] The limiting block 111 structure suspends the vessel body, allowing the cleaning fluid and ultrasonic waves to flow around or penetrate from below to reach the bottom of the reactor, improving the cleaning effect in blind areas and ensuring thorough cleaning.
[0097] The limiting block 111 serves as a buffer support structure, reducing impact, avoiding collisions, and extending the service life of the ultrasonic cleaner 100 for the reactor and hydrothermal synthesis reactor.
[0098] The suspended design allows dirt or particles detached during the cleaning process to settle smoothly to the bottom and not remain at the bottom of the reactor. When used in conjunction with the bottom outlet 110b, it facilitates efficient discharge of waste liquid, improving cleaning efficiency and thoroughness of drainage.
[0099] Preferably, the cover 120 has an acid inlet 120b, which is connected to the cleaning chamber 110a.
[0100] Please refer to Figures 1-4 In this embodiment, the acid inlet 120b is used to inject an acidic cleaning solution (such as dilute nitric acid, hydrochloric acid, or other acid suitable for removing chemical residues) into the cavity.
[0101] Before cleaning, the operator determines whether acid is needed for enhanced cleaning based on the nature of the residue inside the reactor.
[0102] If necessary, a fixed amount of acid can be injected through the acid inlet 120b without opening the cap 120 or manually operating the inside of the container. The entire acid injection process can be carried out in a closed manner through the pipeline system, reducing the risk of acid evaporation or splashing.
[0103] The injected acid solution is mixed with water or other cleaning solutions, and under the action of ultrasonic cavitation, a dual cleaning mechanism of chemical and brush cleaning is formed, which is particularly suitable for treating stubborn contaminants such as metal ions, inorganic salt crystals, and oxide films.
[0104] After cleaning, the pickling waste liquid is discharged through the bottom outlet 110b of the equipment, and can be connected to a waste liquid treatment system for neutralization treatment.
[0105] The independent acid inlet 120b is connected to the cleaning chamber 110a, which can be used with acid pipelines or automatic acid dosing systems to achieve remote, closed, and safe acid injection, significantly improving the safety of operators.
[0106] Preferably, the ultrasonic cleaner 100 for the hydrothermal synthesis reactor further includes:
[0107] A water level sensor 150 is disposed in the cleaning chamber 110a and is located close to the cover 120.
[0108] Please refer to Figures 1-4 In this embodiment, when the operator injects liquid through the water inlet 120a or the acid inlet 120b, the water level sensor 150 detects the liquid level in real time. When the set upper limit water level is reached, the system can automatically send a stop injection signal through the control panel 160 or an external control system to prevent liquid overflow.
[0109] The ultrasonic cleaning component 130 needs to operate in a liquid medium. If the liquid level is too low, it may cause dry burning, air vibration, etc., which will affect its service life. The water level sensor 150 is set near the cover 120, which can detect whether the liquid level is lower than the safety line in a timely manner, ensuring the normal operation and durability of the equipment.
[0110] Setting a water level sensor 150 ensures that the liquid covers all ultrasonic emission areas, maintaining cleaning uniformity and preventing some areas from being uncleaned or the equipment from being damaged by vibration due to low liquid level.
[0111] It should be noted that the water level sensor 150 can use common liquid level monitoring technologies such as electrode type, float type, photoelectric type or capacitive type to continuously monitor the liquid level status of the cleaning fluid.
[0112] Preferably, the ultrasonic cleaner 100 for the hydrothermal synthesis reactor further includes:
[0113] A control panel 160 is disposed on the cover 120 and is electrically connected to the ultrasonic cleaning component 130 and the scrubbing assembly 140.
[0114] Please refer to Figures 1-4 In this embodiment, the control panel 160 is integrated on the upper surface of the cover 120 of the cleaning equipment, that is, in a position away from the cleaning chamber 110a and convenient for the operator to operate. It is electrically connected to the ultrasonic cleaning component 130 and the scrubbing assembly 140 via a cable or integrated circuit to realize function control and status feedback.
[0115] Operators can start the device via buttons, knobs, or touch interfaces on the control panel 160 and select different cleaning modes, such as: ultrasonic cleaning alone, brush head cleaning only, ultrasonic cleaning and brush cleaning running simultaneously or in stages, timed cleaning, and cyclic cleaning.
[0116] After the cleaning task is completed, the control panel 160 controls each component to stop operating in an orderly manner and can issue prompt sounds or indicator light signals. The entire operation can be completed without opening the cover 120, which improves safety and operational efficiency.
[0117] Preferably, the ultrasonic cleaning component 130 is provided on both the peripheral wall and the bottom wall of the housing 110.
[0118] Please refer to Figures 1-4 In this embodiment, ultrasonic cleaning components 130 are provided on the bottom wall and the peripheral wall (i.e., side wall or side surface) of the housing 110, so that ultrasonic signals can act on the reaction vessel in the cleaning chamber 110a from multiple directions (vertical and horizontal) at the same time.
[0119] After the cleaning fluid fills the cavity, the ultrasonic cleaning component 130 is powered on and emits high-frequency vibrations into the cleaning fluid from the bottom and circumferential directions, generating a dense cavitation effect in the liquid.
[0120] The multi-directional propagating ultrasound causes the cleaning fluid to form complex fluctuations and microflows within the cleaning chamber 110a, acting on all surfaces of the reactor, including the inner wall, outer wall, and bottom.
[0121] The reactor is slightly lifted by the limiting block 111, leaving a gap between it and the bottom wall, ensuring that the bottom ultrasonic waves can smoothly penetrate the cleaning fluid and act on the bottom of the reactor. The peripheral ultrasonic cleaning component 130 mainly acts on the circumferential wall and edge of the reactor, ensuring all-round coverage.
[0122] The dual ultrasonic cleaning layout of the bottom and side walls enables 360° cleaning coverage, effectively removing contaminants, especially from the bottom and side walls, significantly improving the cleanliness.
[0123] After arranging ultrasonic transducers on multiple sides, multi-source interference and superimposed wave fields are formed in the cleaning fluid, which can produce a stronger cavitation effect and improve the encapsulation and impact of the cleaning fluid on the entire vessel.
[0124] The above are merely preferred embodiments of this utility model and do not limit the patent scope of this utility model. Any equivalent structural transformations made based on the description and drawings of this utility model, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this utility model.
Claims
1. An ultrasonic cleaner for a hydrothermal synthesis reactor, characterized in that, include: The box body has a cleaning chamber inside; The cover has a water inlet and is placed on the box body; An ultrasonic cleaning component is housed within the chamber. During cleaning, the ultrasonic cleaning component performs ultrasonic treatment on the reaction vessel inside the cleaning chamber to separate the dirt on the reaction vessel from the reaction vessel.
2. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 1, characterized in that, The ultrasonic cleaning components are mounted on two opposite side walls of the housing.
3. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 1, characterized in that, The box body has a water outlet, which is located away from the cover.
4. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 1, characterized in that, The ultrasonic cleaner for the hydrothermal synthesis reactor also includes: The washing assembly has one end mounted on the cover and the other end extending to the side of the cover near the box.
5. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 4, characterized in that, The scrubbing assembly includes: A drive motor is installed on the side of the cover away from the box body; An output shaft is rotatably connected to the drive motor and is located on the side of the cover closer to the housing; the output shaft is rotatably connected to the cover. The brush head is located on the output shaft.
6. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 5, characterized in that, The container body is provided with a limiting block, which is located on the bottom wall of the container body. The side of the limiting block away from the bottom wall of the container body is at a distance from the bottom wall of the container body, so as to separate the reactor from the bottom wall of the container body.
7. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 1, characterized in that, The cover has an acid inlet, which is connected to the cleaning chamber.
8. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 1, characterized in that, The ultrasonic cleaner for the hydrothermal synthesis reactor also includes: A water level sensor is located inside the cleaning chamber and is positioned close to the cover.
9. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 4, characterized in that, The ultrasonic cleaner for the hydrothermal synthesis reactor also includes: The control panel is located on the cover and is electrically connected to the ultrasonic cleaning component and the scrubbing assembly.
10. The ultrasonic cleaner for hydrothermal synthesis reactor as described in claim 1, characterized in that, The ultrasonic cleaning components are provided on both the peripheral wall and the bottom wall of the box.