Alkaline etching liquid recovery processing system

Abstract

The utility model relates to the technical field of waste liquid treatment, in particular to an alkaline etching liquid recovery treatment system which comprises a first reaction tank, a second reaction tank, a gas storage tank and a liquid storage tank, alkaline copper chloride etching waste liquid is added into the first reaction tank, and a tank body heating mechanism heats the first reaction tank; after the copper chloride etching waste liquid in the first reaction tank is heated, ammonia gas in the copper chloride etching waste liquid is evaporated out and is introduced into the gas storage pipe to be collected, and residual liquid enters the second reaction tank through the liquid outlet. The second reaction tank cools the liquid through a tank body cooling mechanism, hydrochloric acid is added into the second reaction tank for a neutralization reaction until crystals are separated out, a filter plate can intercept the crystals, and the remaining liquid is discharged into the liquid storage tank. The gas in the gas storage tank is pumped into the liquid storage tank through the gas pump to react, and the reacted liquid can be returned to the etching process to be continuously used, so that the effective components in the waste alkaline etching liquid are fully and effectively utilized.

Description

Technical Field

[0001] This utility model relates to the technical field of waste liquid treatment, specifically to an alkaline etching solution recovery and treatment system. Background Technology

[0002] During the production of circuit boards, copper foil substrates are etched, generating alkaline etching waste liquid. This waste liquid is produced during the copper etching process and is typically alkaline, hence it is called alkaline copper chloride etching waste liquid. To protect the environment and reduce costs, the etching waste liquid is collected and treated.

[0003] Traditional alkaline copper chloride etching waste liquid is typically extracted by displacement, and the extracted waste liquid is then treated and discharged for centralized disposal. However, other substances contained in this extracted waste liquid cannot be recycled, resulting in a significant waste of resources. Utility Model Content

[0004] The purpose of this invention is to provide an alkaline etching solution recycling system that can reuse the extracted waste liquid, thereby saving resources and avoiding waste.

[0005] To achieve the above objectives, the present invention provides an alkaline etching solution recovery and treatment system, comprising a first reaction tank, a second reaction tank, a gas storage tank, and a liquid storage tank. The first reaction tank is equipped with a first stirring mechanism inside and a tank heating mechanism outside, which heats the first reaction tank. The first stirring mechanism stirs the liquid inside the first reaction tank. The first reaction tank has a gas outlet and a liquid outlet. The second reaction tank is connected to the liquid outlet and is equipped with a second stirring mechanism inside and a tank cooling mechanism outside, which cools the second reaction tank. The second stirring mechanism stirs the liquid inside the second reaction tank. The second reaction tank has a filter plate inside and a drain outlet located below the filter plate. The bottom of the second reaction tank has a collection port connected to a collection pipe. The gas storage tank is connected to the gas outlet. The liquid storage tank is connected to the drain outlet. Gas in the gas storage tank is drawn into the liquid storage tank by a vacuum pump and reacts.

[0006] Furthermore, the gas storage tank is equipped with a drying module, and the gas outlet is connected to the drying module, which can absorb water vapor.

[0007] Furthermore, a one-way valve is provided on the pipe connecting the air outlet to the drying module, and a pressure gauge is provided on the air storage tank for detecting the air pressure inside the air storage tank.

[0008] Furthermore, the heating mechanism is a heating tube, which is arranged around the first reaction vessel, and a heat source is circulated through the heating tube for heating.

[0009] Furthermore, the second reaction vessel is provided with a cover plate on top, which can be opened and closed.

[0010] Furthermore, the second reaction vessel includes a reaction vessel body and a filter vessel body, the filter vessel body being located at the bottom of the reaction vessel body and the two being connected by a connecting valve, the filter plate being disposed in the filter vessel body, and the drain port and the collection port being connected to the filter vessel body.

[0011] Furthermore, both the drain port and the collection port are equipped with switching valves, allowing the filter plate to be opened and closed.

[0012] Furthermore, the cooling mechanism includes a cooling pipe that surrounds the second reaction vessel, and a cold source is circulated through the cooling pipe for refrigeration.

[0013] The beneficial effects of this utility model are as follows:

[0014] 1. Alkaline copper chloride etching waste liquid is added to the first reaction tank. The tank heating mechanism heats the first reaction tank, and the first stirring mechanism stirs the liquid to ensure uniform heating. After heating, the ammonia gas in the copper chloride etching waste liquid in the first reaction tank evaporates and is collected in a gas storage pipe. The remaining liquid enters the second reaction tank through the outlet. The second reaction tank cools the liquid through a tank cooling mechanism, and hydrochloric acid is added to the second reaction tank for neutralization. The tank cooling equipment continues to cool the liquid until crystals precipitate in the second reaction tank. The precipitated crystals are copper chloride ammonium double salt crystals, which are intercepted by a filter plate. The remaining liquid is discharged into a storage tank. The gas in the gas storage tank is drawn into the storage tank by a vacuum pump and reacts. The reacted liquid can be returned to the etching process for reuse, thus making full and effective use of the effective components in the waste alkaline etching solution.

[0015] 2. The gas storage tank is equipped with a drying module, and the gas outlet is connected to the drying module, which absorbs water vapor. A one-way valve is installed on the pipe connecting the gas outlet and the drying module. The gas storage tank is equipped with a pressure gauge to detect the gas pressure inside the tank. When the pressure gauge reading stops increasing, it indicates that ammonia is no longer being produced in the first reaction tank, and the tank heating mechanism can be turned off at this time.

[0016] 3. The top of the second reaction vessel is equipped with a cover plate that can be opened and closed to facilitate the addition of acidic reaction liquid into the second vessel. Attached Figure Description

[0017] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0018] Figure 1 A schematic diagram of the overall structure of an alkaline etching solution recovery and treatment system provided in this embodiment of the present invention;

[0019] Figure 2 This is a schematic diagram of the overall structure of an alkaline etching solution recovery and treatment system provided in an embodiment of the present invention.

[0020] Explanation of reference numerals in the attached figures:

[0021] 1. First reaction vessel; 11. First stirring mechanism; 12. Tank heating mechanism; 13. Gas outlet; 14. Liquid outlet; 2. Second reaction vessel; 21. Second stirring mechanism; 22. Tank cooling mechanism; 23. Liquid drain; 24. Collection port; 25. Collection pipe; 26. Cover plate; 3. Gas storage tank; 4. Liquid storage tank; 5. Vacuum pump. Detailed Implementation

[0022] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0023] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0024] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0025] Furthermore, the technical features involved in the different embodiments of this utility model described below can be combined with each other as long as they do not conflict with each other.

[0026] Reference Figure 1 and Figure 2 As an embodiment of this utility model, an alkaline etching solution recovery and treatment system includes a first reaction tank 1, a second reaction tank 2, a gas storage tank 3, and a liquid storage tank 4. The first reaction tank 1 is equipped with a first stirring mechanism 11 inside and a tank heating mechanism 12 outside, which heats the first reaction tank 1. The first stirring mechanism 11 stirs the liquid inside the first reaction tank 1. The first reaction tank 1 is equipped with a gas outlet 13 and a liquid outlet 14. The second reaction tank 2 is connected to the liquid outlet 14, and is equipped with a second stirring mechanism 21 inside and a gas storage tank 3 outside. The tank cooling mechanism 22 cools the second reaction tank 2. The second stirring mechanism 21 stirs the liquid in the second reaction tank 2. The second reaction tank 2 is equipped with a filter plate and a drain port 23 located below the filter plate. The bottom of the second reaction tank 2 is equipped with a collection port 24 connected to a collection pipe 25. The gas storage tank 3 is connected to the gas outlet 13. The liquid storage tank 4 is connected to the drain port 23. The gas in the gas storage tank 3 is drawn into the liquid storage tank 4 by the vacuum pump 5 and reacts.

[0027] Alkaline copper chloride etching waste liquid is added to the first reaction tank 1. The tank heating mechanism 12 heats the first reaction tank 1, and the first stirring mechanism 11 stirs the liquid to ensure uniform heating. After heating, the ammonia gas in the copper chloride etching waste liquid in the first reaction tank 1 evaporates and is collected in the gas storage pipe. The remaining liquid enters the second reaction tank 2 through the liquid outlet 14. The second reaction tank 2 cools the liquid through the tank cooling mechanism 22, and hydrochloric acid is added to the second reaction tank 2 for neutralization. The tank cooling equipment continues to cool the liquid. Crystals precipitate in the second reaction tank 2. The precipitated crystals are copper chloride ammonium double salt crystals. The filter plate can intercept the crystals, and the remaining liquid is discharged into the liquid storage tank 4. The gas in the gas storage tank 3 is drawn into the liquid storage tank 4 by the gas pump 5 and reacts. The reacted liquid can be returned to the etching process for reuse, thus making full and effective use of the effective components in the waste alkaline etching solution.

[0028] Specifically, the gas storage tank 3 is equipped with a drying module, and the gas outlet 13 is connected to the drying module, which can absorb water vapor. A one-way valve is installed on the pipe connecting the gas outlet 13 and the drying module. The gas storage tank 3 is equipped with a pressure gauge to detect the gas pressure inside the tank. When the pressure gauge reading stops increasing, it indicates that ammonia is no longer being produced in the first reaction tank 1, at which point the tank heating mechanism 12 can be shut off. In this embodiment, the tank heating mechanism 12 is a heating pipe that surrounds the first reaction tank 1. A heat source is circulated through the heating pipe for heating, resulting in good heating effect and stable heating.

[0029] Furthermore, the top of the second reaction vessel 2 is provided with a cover plate 26, which can be opened and closed to facilitate the addition of acidic reaction liquid into the second vessel.

[0030] Specifically, the second reaction vessel 2 includes a reaction vessel body and a filter vessel body. The filter vessel body is located at the bottom of the reaction vessel body, and the two are connected by a connecting valve. A filter plate is installed inside the filter vessel body, and both the drain port 23 and the collection port 24 are connected to the filter vessel body. Switch valves are installed at both the drain port 23 and the collection port 24, allowing the filter plate to be opened and closed. When the liquid from the first reaction vessel 1 is discharged into the second reaction vessel 2, the connecting valve is closed. At this time, the tank cooling mechanism 22 cools the liquid, and simultaneously, the cover plate 26 is opened to add hydrochloric acid to the second reaction vessel 2 for neutralization. The tank cooling equipment continues to cool the liquid until crystals precipitate in the second reaction vessel 2. The precipitated crystals are copper chloride ammonium double salt crystals. After a period of reaction, when no more crystals precipitate, the tank cooling equipment stops working, the connecting valve is opened, the switch valve of the drain port 23 is opened, and the switch valve of the collection port 24 is closed. At this time, the liquid flows into the storage tank 4 for collection. To prevent liquid backflow, a check valve is installed on the pipe of the drain port 23. After the liquid collection tank 4 completes the collection, the gas in the gas storage tank 3 is drawn into the liquid storage tank 4 by the air pump 5 and reacts. The reacted liquid can then be returned to the etching process for continued use, so that the effective components in the waste alkaline etching solution can be fully and effectively utilized, and secondary pollution can be avoided.

[0031] The cooling mechanism includes cooling pipes that surround the second reaction tank 2. A cold source is circulated inside the cooling pipes for cooling, resulting in good cooling effect and stable cooling.

[0032] After all the liquid has been drained into the storage tank 4, the valves at the drain port 23 and the collection port 24 are closed. At this point, copper chloride ammonium double salt crystals are present on the filter plate. Water is then added to the second reaction tank 2 by opening the cover plate 26. The water reacts with the copper chloride ammonium double salt crystals to obtain copper extracted from the alkaline copper chloride etching waste liquid. Water is then added again, the valve at the collection port 24 is opened, the valve at the drain port 23 is closed, and the filter plate is opened. Under the flushing effect of the water flow, the extracted copper flows into the collection pipe 25 and is ultimately collected. After the copper is collected, the filter plate is closed, and the collection port 24 is shut off for the next operation.

[0033] The workflow of the alkaline etching solution recovery system in this embodiment is as follows:

[0034] Alkaline copper chloride etching waste liquid is added to the first reaction tank 1. The tank heating mechanism 12 heats the first reaction tank 1, and the first stirring mechanism 11 stirs the liquid to ensure uniform heating. After heating, the ammonia gas in the copper chloride etching waste liquid in the first reaction tank 1 evaporates and is collected in the gas storage pipe. The remaining liquid enters the second reaction tank 2 through the liquid outlet 14. The second reaction tank 2 cools the liquid through the tank cooling mechanism 22. At the same time, hydrochloric acid is added to the second reaction tank 2 for neutralization. The tank cooling equipment continues to cool the liquid until crystals precipitate in the second reaction tank 2. The precipitated crystals are copper chloride ammonium double salt crystals, which are intercepted by the filter plate. The remaining liquid is discharged into the liquid storage tank 4. The gas in the gas storage tank 3 is drawn into the liquid storage tank 4 by the gas pump 5 and reacts. The reacted liquid can be returned to the etching process for reuse, so that the effective components in the waste alkaline etching solution are fully and effectively utilized, and secondary pollution is avoided.

[0035] The embodiments described herein are preferred embodiments of this utility model and are not intended to limit the scope of protection of this utility model. Therefore, all equivalent changes made to the structure, shape, and principle of this utility model should be included within the scope of protection of this utility model.

Claims

1. An alkaline etching solution recovery and treatment system, characterized in that, include: The first reaction vessel (1) is provided with a first stirring mechanism (11) inside and a tank heating mechanism (12) outside. The tank heating mechanism (12) can heat the first reaction vessel (1). The first stirring mechanism (11) stirs the liquid in the first reaction vessel (1). The first reaction vessel (1) is provided with an air outlet (13) and a liquid outlet (14). The second reaction vessel (2) is connected to the liquid outlet (14). It is equipped with a second stirring mechanism (21) inside and a tank cooling mechanism (22) outside. The tank cooling mechanism (22) cools the second reaction vessel (2). The second stirring mechanism (21) stirs the liquid in the second reaction vessel (2). The second reaction vessel (2) is equipped with a filter plate inside and a drain port (23) on the second reaction vessel (2). The drain port (23) is located below the filter plate. The bottom of the second reaction vessel (2) is equipped with a collection port (24). The collection port (24) is connected to a collection pipe (25). The gas storage tank (3) is connected to the gas outlet (13); The liquid storage tank (4) is connected to the drain port (23). The gas in the gas storage tank (3) is drawn into the liquid storage tank (4) by the gas pump (5) and reacts.

2. The alkaline etching solution recovery and treatment system as described in claim 1, characterized in that, The gas storage tank (3) is equipped with a drying module, and the gas outlet (13) is connected to the drying module. The drying module can absorb water vapor.

3. The alkaline etching solution recovery and treatment system as described in claim 2, characterized in that, A one-way valve is provided on the pipe connecting the air outlet (13) to the drying module, and a barometer is provided on the air storage tank (3) for detecting the air pressure inside the air storage tank (3).

4. The alkaline etching solution recovery and treatment system as described in claim 1, characterized in that, The tank heating mechanism (12) is a heating pipe, which is arranged around the first reaction tank (1), and a heat source is introduced into the heating pipe for circulating heating.

5. The alkaline etching solution recovery and treatment system as described in claim 1, characterized in that, The second reaction vessel (2) is provided with a cover plate (26) on the top, which can be opened and closed.

6. The alkaline etching solution recovery and treatment system as described in claim 1, characterized in that, The second reaction vessel (2) includes a reaction vessel body and a filter vessel body. The filter vessel body is located at the bottom of the reaction vessel body and the two are connected by a connecting valve. The filter plate is disposed in the filter vessel body. The drain port (23) and the collection port (24) are both connected to the filter vessel body.

7. The alkaline etching solution recovery and treatment system as described in claim 6, characterized in that, Both the drain port (23) and the collection port (24) are equipped with switch valves, and the filter plate can be opened and closed.

8. The alkaline etching solution recovery and treatment system as described in claim 1, characterized in that, The cooling mechanism has a cooling pipe that surrounds the second reaction vessel (2), and a cold source is circulated through the cooling pipe for refrigeration.

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