An apparatus for regulating cleaning gas distribution and a thin film deposition apparatus thereof

Abstract

The utility model discloses a device for adjusting clean gas distribution and thin film deposition equipment thereof, and the device for adjusting clean gas distribution comprises: air inlet block and the air distribution block connected in air inlet block, be equipped with the air inlet channel for clean gas input in air inlet block, be equipped with the air distribution channel in air distribution block, the air distribution channel is connected in air inlet channel, wherein, be equipped with side partial gas port and bottom partial gas port on air distribution block, side partial gas port with bottom partial gas port all are connected in air distribution channel, so that clean gas is sent from the side wall and the bottom of air distribution block and exports, the device for adjusting clean gas distribution and thin film deposition equipment thereof of the utility model, through a kind of air distribution device, clean gas is exported from the side and bottom of air distribution block respectively, so that the clean gas entering process chamber is more uniform, cleaning effect is better, efficiency is higher, and the quality and capacity of thin film deposition process are simultaneously improved.

Description

Technical Field

[0001] This utility model relates to the field of thin film deposition equipment technology, and in particular to a device for regulating the distribution of clean gas and its thin film deposition equipment. Background Technology

[0002] In semiconductor thin film deposition equipment, the cleaning gas (used to clean the process chamber) typically enters the process chamber from the top and is eventually extracted from the bottom through the exhaust port after cleaning. The uniformity of the cleaning gas distribution within the process chamber is crucial, as it affects the cleaning effect, cleaning time and frequency, and consequently, the quality and throughput of the thin film deposition process. Utility Model Content

[0003] The purpose of this invention is to overcome the shortcomings of the prior art and provide a device for adjusting the distribution of clean gas and its thin film deposition equipment, so as to solve the technical problem of uneven distribution of clean gas in the process chamber.

[0004] To achieve the above objectives, the present invention adopts the following technical solution:

[0005] In a first aspect, embodiments of the present invention provide a device for adjusting the distribution of clean gas, comprising: an air inlet block and an air distribution block connected to the air inlet block;

[0006] The air intake block is provided with an air intake channel for the input of clean gas, and the air distribution block is provided with an air distribution channel, which is connected to the air intake channel.

[0007] The gas distribution block is provided with a side gas outlet and a bottom gas outlet, both of which are connected to the gas distribution channel, so that clean gas can be delivered from the side wall and bottom of the gas distribution block.

[0008] The flow resistance of the bottom air inlet to the cleaning gas is greater than that of the side air inlet.

[0009] The number of side air inlets is at least two, and the at least two side air inlets are evenly distributed around the side wall of the air distribution block.

[0010] The bottom air outlet includes a central air outlet and several peripheral air outlets surrounding the central air outlet, with the peripheral air outlets arranged at equal intervals.

[0011] The air intake channel and the air distribution channel are coaxially aligned and connected.

[0012] The air intake block includes a disc-shaped body, and the air intake channel is located at the axial center of the disc-shaped body. The air intake channel is a cylindrical channel.

[0013] The disc-shaped body is also provided with several process gas channels, which are arranged through the top and bottom surfaces of the disc-shaped body, and the process gas channels are distributed in a circular pattern on the outside of the air inlet channel.

[0014] The air distribution block is connected to the bottom surface of the disc-shaped body and protrudes from the air intake block.

[0015] The central air distribution port is a circular hole, and the peripheral air distribution port is an oblong hole extending along the edge of the central air distribution port.

[0016] Secondly, embodiments of the present invention provide a thin film deposition apparatus, the thin film deposition apparatus including the device for adjusting the distribution of clean gas as described in any of the above claims.

[0017] The present invention relates to a device for adjusting the distribution of cleaning gas and its thin film deposition equipment. The device uses a gas distribution device to output the cleaning gas from the side and bottom of the gas distribution block, so that the cleaning gas entering the process chamber is more uniform, the cleaning effect is better, the efficiency is higher, and the quality and production capacity of the thin film deposition process are improved simultaneously.

[0018] The above description is only an overview of the technical solution of this utility model. In order to better understand the technical means of this utility model, it can be implemented according to the contents of the specification. In order to make the above and other objects, features and advantages of this utility model more obvious and easy to understand, the following are preferred embodiments, which are described in detail below. Attached Figure Description

[0019] Figures 1 to 3 These are schematic diagrams of the device for adjusting the distribution of clean gas according to embodiments of the present invention, taken from different perspectives.

[0020] Figure 4 This is a bottom view of a device for adjusting the distribution of clean gas according to an embodiment of the present invention.

[0021] Figure 5 This is a top view of a device for adjusting the distribution of clean gas according to an embodiment of the present invention.

[0022] Figure 6 for Figure 2 A magnified schematic diagram of part A in the middle.

[0023] Figure 7 This is a side view of a device for adjusting the distribution of clean gas according to an embodiment of the present invention.

[0024] Figure 8 for Figure 7 The sectional view shown is along line AA.

[0025] Figure 9 This is a bottom view of a device for adjusting the distribution of clean gas according to an embodiment of the present invention.

[0026] Figure 10 for Figure 9 The BB-directed sectional view is shown.

[0027] Explanation of reference numerals in the attached figures:

[0028] Air inlet block 1, air distribution block 2, disc-shaped body 11, air inlet channel 12, process gas channel 13, connecting hole 14, annular groove 15, air distribution channel 20, side air outlet 21, bottom air outlet 22, top surface 111, bottom surface 112, air inlet 131, air outlet 132, first side air outlet 211, second side air outlet 212, third side air outlet 213, central air outlet 221, peripheral air outlet 222, and device 100 for adjusting the distribution of clean gas. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present utility model.

[0031] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0032] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0033] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral molding; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0034] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0035] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. The illustrative expressions of the above terms in this specification should not be construed as necessarily referring to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0036] In semiconductor thin film deposition equipment, the cleaning gas (used to clean the process chamber) typically enters the process chamber from the top and is eventually extracted from the bottom exhaust port after cleaning. Therefore, the uniform distribution of the cleaning gas within the process chamber is crucial, as it affects the cleaning effect, cleaning time and frequency, and consequently, the quality and throughput of the thin film deposition process. To address these issues, this embodiment discloses a device 100 for adjusting the distribution of the cleaning gas.

[0037] Please refer to the following first. Figures 1 to 10 This embodiment discloses a device 100 for adjusting the distribution of clean gas, comprising: an air inlet block 1 and a gas distribution block 2 connected to the air inlet block 1. The air inlet block 1 is used to communicate with an external clean gas source and to deliver the clean gas to the gas distribution block 2. The gas distribution block 2 is used to output the clean gas again in multiple directions to the process chamber, where the process chamber refers to the thin film deposition process chamber of a thin film deposition equipment. It is understood that the air inlet block 1 and the gas distribution block 2 can be an integrally formed structure or two independent structures fixedly connected. In this embodiment, the air inlet block 1 and the gas distribution block 2 are described as an integrally formed structure.

[0038] The air intake block 1 is provided with an air intake channel 12 for inputting clean gas, and the air distribution block 2 is provided with an air distribution channel 20, which is connected to the air intake channel 12.

[0039] The gas distribution block 2 is provided with side air inlets 21 and bottom air inlets 22, both of which are connected to the gas distribution channel 20, so that clean gas is delivered and output from the side wall and bottom of the gas distribution block 2. After the device 100 for adjusting the distribution of clean gas is assembled with the process chamber, the gas distribution block 2 extends into the interior of the process chamber. The cavity of the process chamber is generally a cylindrical cavity. The side air inlets 21 face the side wall of the cylindrical cavity, and the bottom air inlets 22 face the bottom wall of the cylindrical cavity. Therefore, the device 100 for adjusting the distribution of clean gas outputs the input clean gas into the process chamber from both the side and the periphery and from the bottom through the side air inlets 21 and the bottom air inlets 22 on the gas distribution block 2. This makes the output clean gas distribution more uniform, and the clean gas can fully contact all corners of the cavity, improving its cleaning effect. Because the clean gas has sufficient contact within the cavity, the entire cleaning process takes less time and has higher cleaning efficiency.

[0040] To further improve the uniformity of the cleaning gas distribution, the flow resistance of the bottom air inlet 22 to the cleaning gas is greater than that of the side air inlet 21. That is, after the cleaning gas input from the air inlet channel 12 of the air inlet block 1 passes through the gas distribution channel 20, the cleaning gas output from the bottom air inlet 22 experiences greater flow resistance than that from the side air inlet 21. Therefore, the gas diverted from the bottom air inlet 22 is less than that diverted from the side air inlet 21. Combined with the cylindrical cavity structure of the process chamber, more cleaning gas is diverted from the side air inlet 21 to the peripheral space of the process chamber. Since the exhaust port is located at the bottom of the process chamber, the cleaning gas diverted to the peripheral and bottom spaces of the process chamber eventually flows downwards to the exhaust port and is extracted. Based on the flow direction and distribution pattern of the cleaning gas, it can be seen that the gas distribution block 2 can improve the uniformity of the cleaning gas distribution within the process chamber and maintain a relatively balanced state during the cleaning gas flow, thus significantly improving the cleaning effect and efficiency.

[0041] like Figure 6 As shown, the number of side air vents 21 is at least two, and at least two side air vents 21 are equally spaced and distributed around the side wall of the air distribution block 2. Specifically, the side air vents 21 include a first side air vent 211, a second side air vent 212, and a third side air vent 213. In other embodiments, the number of side air vents 21 may be increased or decreased depending on the size of the air distribution block 2 and the application scenario, and is not limited to the three in this embodiment.

[0042] The bottom air inlet 22 includes a central air inlet 221 and a plurality of peripheral air inlets 222 surrounding the central air inlet 221, with the plurality of peripheral air inlets 222 being arranged at equal intervals.

[0043] Both the side air inlet 21 and the bottom air inlet 22 have the core function of uniformly outputting clean gas into the process chamber. Therefore, the specific distribution of the side air inlet 21 and the bottom air inlet 22 should be kept as uniform as possible. The side air inlet 21 and the bottom air inlet 22 divert the clean gas from two major directions to make its output uniform. The specific outlet distribution and shape of the side air inlet 21 and the bottom air inlet 22 further maintain the balance of the clean gas output in a single direction, which can further improve the uniformity of the clean gas output into the process chamber and further improve the cleaning effect and quality.

[0044] Please refer to it again. Figure 8 The air intake channel 12 and the air distribution channel 20 are coaxially aligned and connected. That is, the air intake channel 12 and the air distribution channel 20 are in a straight-through state in the vertical direction. The straight-through design can reduce the resistance encountered by the clean gas during transportation and improve the transportation efficiency of the clean gas.

[0045] Please refer to it again. Figures 2 to 4 The air intake block 1 includes a disc-shaped body 11, and the air intake channel 12 is opened at the axial center of the disc-shaped body 11. The air intake channel 12 is a cylindrical channel, such as a cylindrical or straight prism. In this embodiment, the air intake channel 12 is a cylindrical channel.

[0046] The disc-shaped body 11 is further provided with a plurality of process gas channels 13, which extend from the top surface 111 to the bottom surface 112 of the disc-shaped body 11, and are arranged in a circular pattern on the outer side of the air inlet channel 12. The circular ring containing the plurality of process gas channels 13 is coaxially arranged with the air outlet channel 12, forming an inner and outer concentric ring structure. The air inlet 131 of the process gas channel 13 is located on the top surface 111 of the disc-shaped body 11, and the air outlet 132 is located on the bottom surface 112 of the disc-shaped body 11, which is used to uniformly deliver the process gas into the process chamber.

[0047] The top surface 111 of the disc-shaped body 11 is also recessed with an annular groove 15. The air inlet 131 of the process gas channel 13 extends to the bottom of the annular groove 15. The annular groove 15 is used to collect and distribute the process gas, and it has the function of making the process gas output uniformly.

[0048] The top surface 111 of the disc-shaped body 11 is also provided with a connection hole 14. The connection hole 14 surrounds the outside of the air intake channel 12. The connection hole 14 can be connected to an external connector to fix the air intake block 1 to the air source output end of the clean gas.

[0049] like Figure 1 As shown, the air distribution block 2 is connected to the bottom surface 112 of the disc-shaped body 11 and protrudes from the air intake block 1.

[0050] like Figure 4 As shown, the central air distribution port 221 is a circular hole, and the peripheral air distribution port 222 is an oblong hole extending along the edge of the central air distribution port 221. In other embodiments, the shapes of the central air distribution port 221 and the peripheral air distribution port 222 can also be other shapes, and their distribution pattern can also be other uniform and symmetrical distribution patterns.

[0051] In this embodiment, when the air intake channel 12 is a cylindrical channel, its diameter is 44 mm, and the diameter of the corresponding air distribution channel 20 on the air distribution block 2 is 48 mm. The height of the air distribution channel 48 protruding from the bottom surface 112 of the air intake block 1 is 38 mm. It is understood that in other embodiments, the diameters of the air intake channel 12 and the air distribution channel 20 are not limited to the values ​​in this embodiment, and their size can be adjusted according to the application scenario. When the device 100 for adjusting the distribution of clean gas is assembled in the process chamber, the length of the air distribution block 2 extending into the cavity of the process chamber is 6 mm.

[0052] In this embodiment, the side air inlet 21 is a longitudinally extending rectangular hole, and the rectangular hole should be designed to be as large as possible according to the size of the air distribution block 2.

[0053] Secondly, embodiments of this utility model provide a thin film deposition apparatus, which includes the device 100 for adjusting the distribution of clean gas as described in any of the above claims. Other structures of this thin film deposition apparatus employ existing and publicly disclosed technical solutions, and will not be elaborated upon here.

[0054] Existing air intake structures often employ a method where clean gas flows in from the center of the air intake block. After colliding with the baffle, the clean gas continues to flow downwards into the process chamber. Due to the small distance between the air intake block and the baffle, this space is insufficient to allow the clean gas to diffuse rapidly on the baffle. As a result, the clean gas is more concentrated in the central area of ​​the process chamber than in the peripheral area. If the peripheral area is to meet the qualified cleaning standards, the cleaning time must be longer, thus extending the cleaning cycle and affecting efficiency and equipment capacity.

[0055] The device for adjusting the distribution of cleaning gas and its thin film deposition equipment in this embodiment use a gas distribution device to output the cleaning gas from the side and bottom of the gas distribution block, so that the cleaning gas entering the process chamber is more uniform, the cleaning effect is better and the efficiency is higher, and the quality and production capacity of the thin film deposition process are improved simultaneously.

[0056] The above examples are merely illustrative of the technical content of this utility model to facilitate reader understanding, but do not imply that the implementation of this utility model is limited to these embodiments. Any technical extensions or re-creations made based on this utility model are protected by this utility model. The scope of protection of this utility model is defined by the claims.

Claims

1. A device for regulating the distribution of clean gas, characterized in that, include: An air intake block and an air distribution block connected to the air intake block; The air intake block is provided with an air intake channel for the input of clean gas, and the air distribution block is provided with an air distribution channel, which is connected to the air intake channel. The gas distribution block is provided with a side gas outlet and a bottom gas outlet, both of which are connected to the gas distribution channel so that clean gas can be delivered from the side wall and bottom of the gas distribution block.

2. The device for adjusting the distribution of clean gas according to claim 1, characterized in that, The flow resistance of the bottom air inlet to the cleaning gas is greater than that of the side air inlet.

3. The apparatus for adjusting the distribution of clean gas according to claim 2, characterized in that, The number of side air vents is at least two, and the at least two side air vents are equally spaced and distributed around the side wall of the air distribution block.

4. The apparatus for adjusting the distribution of clean gas according to claim 2, characterized in that, The bottom air outlet includes: a central air outlet and several peripheral air outlets surrounding the central air outlet, with the peripheral air outlets arranged at equal intervals.

5. The apparatus for regulating the distribution of clean gas according to any one of claims 2 to 4, characterized in that, The air intake channel and the air distribution channel are coaxially aligned and connected.

6. The apparatus for regulating the distribution of clean gas according to claim 2, characterized in that, The air intake block includes a disc-shaped body, and the air intake channel is located at the axial center of the disc-shaped body. The air intake channel is a cylindrical channel.

7. The apparatus for regulating the distribution of clean gas according to claim 6, characterized in that, The disc-shaped body is also provided with several process gas channels, which are arranged through the top and bottom surfaces of the disc-shaped body, and the process gas channels are distributed in a circular pattern on the outside of the air inlet channel.

8. The apparatus for adjusting the distribution of clean gas according to claim 6, characterized in that, The air distribution block is connected to the bottom surface of the disc-shaped body and protrudes from the air intake block.

9. The apparatus for adjusting the distribution of clean gas according to claim 4, characterized in that, The central air distribution port is a circular hole, and the peripheral air distribution port is an oblong hole extending along the edge of the central air distribution port.

10. A thin film deposition apparatus, characterized in that, The thin film deposition apparatus includes the means for adjusting the distribution of clean gas as described in any one of claims 1 to 9.

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