Polishing device for straight lines

Abstract

The utility model relates to a polishing device suitable for straight line route, and the workpiece has the polishing area of linear extension, and the polishing device includes the base, the slide that slides in the base, sets up in the slide and is with the synchronous movement of the slide polishing part, wherein the workpiece is positioned on the base and sets up from the polishing area to the upward, and the movement direction of the slide is consistent with the extension direction of the polishing area, the polishing part forms the polishing end surface of imitating finger tip from the bottom surface, and the polishing end surface of the polishing part is contacted with the polishing area. The utility model positions the workpiece on the base on one hand, and based on the linear motion of the slide, makes the profiling polishing end surface of the finger tip formed by the polishing part to the workpiece one -way linear polishing, reduces the operation error, effectively promotes the stability of polishing quality, and promotes the product yield rate, on the other hand, the requirement of the operation proficiency is low, and the operation is simple, convenient, and the polishing efficiency is improved obviously.

Description

Technical Field

[0001] This utility model belongs to the field of precision machining technology, specifically relating to a polishing device suitable for straight lines. Background Technology

[0002] Polishing is a processing method that uses mechanical, chemical, or electrochemical processes to reduce the surface roughness of a workpiece, thereby obtaining a bright and smooth surface. It involves using polishing tools and abrasive particles or other polishing media to refine the surface of a workpiece. Common polishing methods use a high-speed rotating polishing wheel (circumferential speed exceeding 20 meters per second) pressed against the workpiece, causing the abrasive to roll and perform micro-cutting on the workpiece surface, thus obtaining a bright finished surface.

[0003] However, for some rectangular products with high sealing requirements (such as gas distribution blocks and vacuum components), in order to improve the sealing performance, it is required that the area in contact with the sealing ring be polished with a unidirectional straight line pattern. Therefore, the traditional process is to make a template, then fix the template on the workpiece, and rely on manual labor to use hand tools to hold sandpaper and make a unidirectional straight line movement along the sealing area (the pattern in the sealing area can only be unidirectional and cannot have radial patterns, otherwise it is easy to fail to meet the leakage rate requirements during vacuum pressure testing).

[0004] However, in actual processing, the existing process requires a high level of technical proficiency from the operators. It is easy to make mistakes and fail to ensure stable polishing pressure, resulting in unstable polishing quality, low product yield, high labor intensity, and low polishing efficiency. Summary of the Invention

[0005] The technical problem to be solved by this utility model is to overcome the shortcomings of the prior art and provide a brand-new polishing device suitable for straight lines.

[0006] To solve the above technical problems, the present invention adopts the following technical solution:

[0007] A polishing apparatus suitable for straight-line patterns is disclosed. The workpiece has a straight-line extending area to be polished. The polishing apparatus includes a base, a slide block slidably connected to the base, and a polishing component disposed on the slide block and moving synchronously with the slide block. The workpiece is positioned on the base and faces upward from the area to be polished. The movement direction of the slide block is consistent with the extension direction of the area to be polished. The polishing component forms a polishing end face from its bottom surface that imitates the fingertip. The polishing component contacts the area to be polished from its polishing end face, and as the slide block moves linearly, the polishing end face synchronously forms a unidirectional straight-line polishing pattern on the area to be polished.

[0008] Preferably, the base has a positioning groove that matches the workpiece, and the workpiece is inserted into and positioned in the positioning groove from top to bottom. This facilitates rapid positioning of the workpiece and makes the operation simple and convenient.

[0009] Preferably, the base also has guide rails located on opposite sides of the positioning groove and extending along the area to be polished, with the slide block slidably connected to the guide rails on both sides. This facilitates the installation of the polishing components for precise alignment with the area to be polished on the workpiece.

[0010] Preferably, the bottom of the base is further provided with multiple adjusting pads spaced apart along the direction of the area to be polished for leveling. This allows the base to be placed on any flat or uneven work surface, ensuring stability during the polishing process.

[0011] Preferably, the width of the polishing end face is greater than or equal to the width of the area to be polished. Here, the polished surface formed in a single movement covers the entire area of ​​the workpiece to be polished, which helps to improve polishing efficiency.

[0012] Preferably, the polishing component includes a contouring module connected to the slide and aligned vertically with the area to be polished, and a polishing element covering the bottom surface of the contouring module and forming a polishing end face. This facilitates assembly to form a polishing end face that meets the requirements.

[0013] Specifically, the contouring module is movably connected to the slide, and the polishing components also include an adjusting element for adjusting the contouring module up and down to regulate the pressure between the polishing end face and the area to be polished. Here, the operator can flexibly adjust the pressure according to feel to achieve the desired polishing effect.

[0014] Preferably, the polished part is made of sandpaper and is detachably connected to the contouring module. Here, different grit sandpapers can be selected according to process requirements to gradually implement rough polishing and fine polishing.

[0015] Specifically, the contouring module is connected to the bottom surface of the slide; the polishing component also includes a clamping member fixedly connected to the upper surface of the slide, with the sandpaper wrapping around the contouring module from both ends and clamped onto the clamping member. This ensures the sandpaper's fit with the bottom surface of the contouring module; at the same time, the clamping member can use quick-release clamps corresponding to both ends of the sandpaper, making operation simple and convenient.

[0016] Furthermore, the bottom surface of the contour module also has limiting portions on both sides opposite to the width of the sandpaper, with the sandpaper confined between these limiting portions. This prevents the sandpaper from deviating from the polishing area during polishing, ensuring precise polishing.

[0017] Due to the implementation of the above technical solution, this utility model has the following advantages compared with the prior art:

[0018] Existing technologies require a high level of operator skill, making it easy for operational errors to compromise stable polishing pressure, leading to inconsistent polishing quality, low product yield, high labor intensity, and low polishing efficiency. This application addresses these shortcomings by redesigning the structure of a polishing device suitable for straight-line patterns, cleverly resolving the deficiencies of existing technologies. With this device, the workpiece is positioned on the base with the area to be polished facing upwards. The polishing end face formed by the bottom surface of the polishing component, mimicking the tip of a finger, aligns with the area to be polished. Manual or mechanical transmission drives the slide to move linearly along the direction of the area to be polished, and the polishing component simultaneously forms a unidirectional straight polishing pattern on the area. Therefore, compared to existing technologies, this invention, on the one hand, positions the workpiece on the base, and based on the linear movement of the slide, allows the polishing end face formed by the polishing component to perform unidirectional straight polishing on the workpiece, reducing operational errors, effectively improving the stability of polishing quality, and increasing product yield. On the other hand, it requires less operator skill, is simple and convenient to operate, and significantly improves polishing efficiency. Attached Figure Description

[0019] Figure 1 This is a top view schematic diagram of the polishing device of this utility model suitable for straight lines;

[0020] Figure 2 This is a front view schematic diagram of the polishing device of this utility model suitable for straight lines;

[0021] Figure 3 for Figure 1 Enlarged structural diagram of the polishing component;

[0022] Figure 4 for Figure 3 Enlarged structural diagram of the contouring module;

[0023] Figure 5 for Figure 4 A diagram showing the view from below;

[0024] Wherein: 1. Base; c. Positioning groove; g. Guide rail; d. Adjusting pad; 2. Slide; k. Slider; 3. Polishing component; 30. Contouring module; 300. Limiting part; 31. Polishing part; m. Polishing end face; 32. Adjusting component; 33. Clamping component; J. Workpiece; J0. Area to be polished. Detailed Implementation

[0025] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0026] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0027] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0028] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0029] In this application, unless otherwise expressly specified and limited, "above" or "below" a second feature can mean that the first and second features are in direct contact, or that they are in indirect contact through an intermediate medium. Furthermore, "above," "over," and "on top" of a second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" a second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature. It should be noted that when an element is referred to as "fixed to" or "set on" another element, it can be directly on the other element or there may be an intermediate element present. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there may be an intermediate element present. The terms "vertical," "horizontal," "above," "below," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible embodiments.

[0030] like Figures 1 to 5 As shown, the polishing device for straight lines involved in this embodiment includes a base 1, a slide 2, and a polishing component 3; the workpiece in this embodiment is a rectangular workpiece J, and its upper surface has a long strip-shaped area J0 to be polished with straight lines extending outwards.

[0031] Specifically, the base 1 is recessed inward from the top surface to form a positioning groove c that matches the workpiece J. The workpiece J is inserted from top to bottom and positioned in the positioning groove c, with the workpiece J facing upward from the area J0 to be polished. This facilitates rapid workpiece positioning and makes operation simple and convenient.

[0032] Meanwhile, guide rails g are formed on the base 1, located on opposite sides of the positioning groove c and extending along the polishing area J0. The slide block 2 is slidably connected to the guide rails g from opposite sides via slider k. To strictly control the polishing distance, stops can be set on the guide rails g to limit the displacement of the slide block 2. This facilitates the installation of the polishing components for precise alignment with the polishing area on the workpiece. It should be noted that the guide rails g are detachably connected to the base 1 by bolts. If the extension direction of the polishing area J0 changes, the installation direction of the guide rails g can be changed to match the extension direction of the polishing area J0.

[0033] For ease of implementation, the bottom of the base 1 is also equipped with multiple adjusting pads d, spaced apart along the extension direction of the area J0 to be polished, for leveling purposes. This allows the base to be placed on any flat or uneven work surface, ensuring stability during the polishing process.

[0034] In this example, the slide 2 is perpendicular to the extension direction of the area J0 to be polished, and the middle part of the slide 2 is suspended. The slide 2 moves along the guide rail g through manual or mechanical transmission (that is, the movement direction of the slide 2 is consistent with the extension direction of the area J0 to be polished). The polishing component 3 is set on the slide and moves synchronously with the slide 2. The polishing component 3 arches downward from the bottom to form a polishing end face m that imitates the fingertip. The polishing component 3 contacts the area J0 to be polished from the polishing end face m. As the slide 2 moves linearly, the polishing end face m synchronously forms a unidirectional straight polishing pattern in the area J0 to be polished.

[0035] In some specific embodiments, the width of the polishing end face m is equal to the width of the area J0 to be polished. Here, the polished surface formed in one movement covers the entire area to be polished of the workpiece, which helps to improve polishing efficiency.

[0036] The polishing component 3 includes a contouring module 30 connected to the slide 2 and aligned vertically with the area J0 to be polished, and a polishing element 31 covering the bottom surface of the contouring module 30 and forming a polishing end face m. This facilitates assembly to form a polishing end face that meets the requirements. If there are multiple areas J0 to be polished, multiple polishing components 3 are provided accordingly.

[0037] The contouring module 30 is connected to the bottom surface of the suspended portion of the slide 2; the polishing part 31 is made of sandpaper and is detachably connected to the contouring module 30, covering the bottom of the contouring module 30. Here, sandpaper of different grits can be selected according to process requirements to gradually implement rough polishing and fine polishing.

[0038] Meanwhile, the bottom surface of the contour module 30 also has limiting portions 300 located on opposite sides in the width direction of the sandpaper, with the sandpaper confined between the two limiting portions 300. This prevents the sandpaper from deviating from the polishing area under force during polishing, ensuring precise polishing.

[0039] To further facilitate implementation, the contouring module 30 is made of elastic material and is vertically and movably connected to the bottom of the slide block 2. The polishing component 3 also includes an adjusting element 32 for adjusting the contouring module 30 vertically to adjust the pressure between the polishing end face m and the area J0 to be polished. The adjusting element 32 uses an adjusting screw or other components that can adjust the height of the contouring module. The specific adjustment method is conventional technology and will not be described in detail here. Here, not only can the contouring module be raised to avoid accidental contact when placing the workpiece, but also when the contouring module is lowered for polishing, the operator can flexibly adjust the pressure according to feel to achieve the desired polishing effect.

[0040] In addition, the polishing component 3 also includes a clamping member 33 fixedly connected to the upper surface of the slide block 2. The sandpaper passes over the contouring module 30 from both ends and is clamped on the clamping member 33. Here, the clamping at both ends ensures the fit between the sandpaper and the bottom surface of the contouring module; at the same time, the clamping member 33 can be two quick clamps corresponding to both ends of the sandpaper, and the quick clamps are commercially available products.

[0041] According to the actual operation results, for the workpiece J in this embodiment, in the traditional process, the polishing is done manually by holding sandpaper with a hand tool. One person can only process 3 workpieces J per day. However, with the polishing device of this embodiment, each person can polish 15 workpieces J per day, which increases the efficiency by 5 times. Moreover, even inexperienced personnel can achieve a 100% success rate after 1-2 hours of training. The operation is very simple and easy to learn.

[0042] In summary, when using this polishing device, the workpiece is positioned on the base with the area to be polished facing upwards, and the polishing end face formed by the bottom surface of the polishing component, which imitates the fingertip, is aligned and in contact with the area to be polished. The slide is driven by manual or mechanical transmission to move linearly along the extension direction of the area to be polished, and the polishing component simultaneously forms a unidirectional straight polishing pattern on the area to be polished from the polishing end face. Therefore, compared with the prior art, this utility model has several advantages. First, it positions the workpiece on the base, and based on the linear movement of the slide, the polishing end face formed by the fingertip of the polishing component performs unidirectional linear polishing on the workpiece, reducing operational errors, effectively improving the stability of polishing quality, and increasing product yield. Second, it requires less operator skill, is simple and convenient to operate, and significantly improves polishing efficiency. Third, it allows the base to be placed on any flat or uneven work surface, ensuring stability during polishing. Fourth, the polishing surface formed in one movement covers the entire area of ​​the workpiece to be polished, which helps to improve polishing efficiency. Fifth, it not only allows the contouring module to be raised when placing the workpiece to avoid accidental contact, but also allows the operator to flexibly adjust the pressure according to feel when lowering the contouring module for polishing to achieve the desired polishing effect.

[0043] The present utility model has been described in detail above, with the aim of enabling those skilled in the art to understand its contents and implement it. However, this description should not be construed as limiting the scope of protection of the present utility model. All equivalent changes or modifications made in accordance with the spirit and essence of the present utility model should be included within the scope of protection of the present utility model.

Claims

1. A polishing apparatus suitable for straight-line textures, wherein the workpiece has a straight-line extending area to be polished, characterized in that, The polishing device includes a base, a slide block slidably connected to the base, and a polishing component disposed on the slide block and moving synchronously with the slide block. The workpiece is positioned on the base and faces upward from the area to be polished. The movement direction of the slide block is consistent with the extension direction of the area to be polished. The polishing component forms a polishing end face from its bottom surface that mimics the fingertip. The polishing component contacts the area to be polished from its polishing end face, and as the slide block moves linearly, the polishing end face synchronously forms a unidirectional linear polishing pattern on the area to be polished.

2. The polishing apparatus for straight lines according to claim 1, characterized in that, The base has a positioning groove that matches the workpiece, and the workpiece is inserted into and positioned in the positioning groove from top to bottom.

3. The polishing apparatus for straight lines according to claim 2, characterized in that, The base also has guide rails located on opposite sides of the positioning groove and extending along the area to be polished, and the slide block is slidably connected to the guide rails on both sides from opposite sides.

4. The polishing apparatus for straight lines according to claim 1, 2, or 3, characterized in that, The bottom of the base is also provided with multiple adjusting pads that are spaced apart along the direction of the area to be polished and are used for leveling.

5. The polishing apparatus for straight lines according to claim 1, characterized in that, The width of the polished end face is greater than or equal to the width of the area to be polished.

6. The polishing apparatus for straight lines according to claim 1 or 5, characterized in that, The polishing component includes a contouring module connected to the slide and aligned vertically with the area to be polished, and a polishing element covering the bottom surface of the contouring module and forming the polishing end face.

7. The polishing apparatus for straight lines according to claim 6, characterized in that, The contouring module is movably connected to the slide block, and the polishing component also includes an adjusting element for adjusting the contouring module up and down to adjust the pressure between the polishing end face and the area to be polished.

8. The polishing apparatus for straight lines according to claim 6, characterized in that, The polishing part is made of sandpaper and is detachably connected to the contouring module.

9. The polishing apparatus for straight lines according to claim 8, characterized in that, The contouring module is connected to the bottom surface of the slide block; the polishing component also includes a clamping member fixedly connected to the upper surface of the slide block, and the sandpaper passes around the contouring module from both ends and is clamped on the clamping member.

10. The polishing apparatus for straight lines according to claim 8, characterized in that, The bottom surface of the contouring module also has limiting portions located on opposite sides in the width direction of the sandpaper, with the sandpaper positioned between the limiting portions on both sides.

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