Monocrystalline silicon scrap cleaning and drying integrated automatic processing equipment

Abstract

The utility model relates to monocrystal silicon technical field especially is monocrystal silicon broken material cleaning drying integration automatic processing equipment, mainly includes: base, cleaning mechanism, drying mechanism, rotating mechanism, lifting mechanism and contains a few parts such as accommodating cylinder, accommodating cylinder carries out position transfer under the cooperation of rotating mechanism and lifting mechanism, reaches cleaning mechanism and drying mechanism integrated in turn, thereby realizes the continuous automation cleaning and drying of monocrystal silicon broken material in accommodating cylinder, the utility model discloses an integrated design of cleaning mechanism and drying mechanism makes accommodating cylinder only need to switch between cleaning mechanism and drying mechanism through the cooperation of rotating mechanism and lifting mechanism, simplifies the equipment structure, shortens the process transfer time, improves the cooperativity and work efficiency of equipment. Meanwhile, through accommodating cylinder itself as the transfer carrier, directly avoids the accumulation and material jam problem of wet broken material in traditional transmission system.

Description

Technical Field

[0001] This utility model relates to the field of monocrystalline silicon technology, and in particular to an integrated automatic processing equipment for cleaning and drying monocrystalline silicon fragments. Background Technology

[0002] In semiconductor material processing, single-crystal silicon scraps (including cutting waste, fragments, etc.) need to undergo cleaning and drying processes to remove surface-adhered metallic impurities and chemical residues. The quality of cleaning directly affects the yield and material properties of subsequent processing.

[0003] Currently, the industry still relies mainly on manual operation for cleaning and drying monocrystalline silicon scrap, which results in low efficiency, high workload, and difficulty in ensuring batch consistency and process stability, leading to poor cleaning quality and affecting the yield of subsequent processing.

[0004] Although some manufacturers have begun to introduce automated equipment, the technological maturity of these devices in terms of functional integration and processing efficiency still needs improvement. The main reason for insufficient functional integration is that existing equipment mostly adopts a modular and discrete design, resulting in poor coordination. The low processing efficiency stems from the material transfer process between washing and drying: the washed scraps are in a wet state, which easily leads to accumulation and jamming, resulting in reduced transmission efficiency and affecting the overall processing efficiency. Utility Model Content

[0005] The purpose of this invention is to provide an integrated automatic processing equipment for cleaning and drying single-crystal silicon fragments, so as to solve the problems mentioned in the background art.

[0006] The technical solution adopted in this utility model is:

[0007] An integrated automatic processing equipment for cleaning and drying single-crystal silicon scrap includes:

[0008] The base is provided with a cleaning mechanism, a drying mechanism, a rotating mechanism, and a lifting mechanism provided on the rotating mechanism;

[0009] A container cylinder is used to hold single-crystal silicon fragments and has several through holes. The container cylinder and the lifting mechanism can be detachably connected.

[0010] in,

[0011] The container can be moved in position with the cooperation of the rotating mechanism and the lifting mechanism, so as to be placed in the cleaning mechanism and / or the drying mechanism.

[0012] Optionally, the cleaning mechanism includes:

[0013] The cleaning body is mounted on the base.

[0014] An ultrasonic transducer is mounted on the cleaning body.

[0015] Optionally, the drying mechanism includes:

[0016] The drying body is mounted on the base.

[0017] A vacuum pump is mounted on the drying unit.

[0018] Optionally, the rotating mechanism includes:

[0019] A mounting base is provided on the base, and a receiving groove is provided thereon;

[0020] A first motor is installed in the mounting base, and its output end is connected to a worm gear.

[0021] A transmission rod is rotatably disposed within the mounting base, with one end passing through the receiving groove and extending to the outside of the mounting base;

[0022] A worm gear is disposed at one end of the transmission rod located inside the mounting base and meshes with the worm.

[0023] A support plate is disposed at the end of the transmission rod located outside the mounting base, and the support plate is not in contact with the mounting base.

[0024] Optionally, the lifting mechanism includes:

[0025] A support frame is disposed on the support plate and has a sliding groove thereon;

[0026] A second motor is located inside the support frame, and its output end is connected to a screw rod, which is rotatably connected to the support frame.

[0027] A slider is fitted onto the screw and helically engages with the screw, with one end of it passing through the sliding groove.

[0028] Optionally, the lifting mechanism further includes a hydraulic cylinder, and the support frame is mounted on the support plate via the hydraulic cylinder.

[0029] Optionally, a connecting mechanism may also be included, which is connected to the slider.

[0030] Optionally, the connecting mechanism specifically includes:

[0031] A connecting rod is mounted on the slider, and a support member is mounted on it;

[0032] A cylinder is symmetrically arranged on both sides of the support member, and its output end is connected to a connecting rod;

[0033] A clamping element is provided at the end of the connecting rod.

[0034] Optionally, the support member is provided with a stirring mechanism, which can extend into the receiving cylinder.

[0035] Optionally, the base is further provided with a rinsing mechanism, which works in conjunction with the cleaning mechanism on the receiving cylinder.

[0036] Compared with the prior art, the beneficial effects of this utility model are:

[0037] The container is moved in position by the coordination of the rotating mechanism and the lifting mechanism, and arrives in sequence at the integrated cleaning mechanism and drying mechanism, thereby realizing the continuous automated cleaning and drying of the monocrystalline silicon fragments in the container.

[0038] This invention integrates the cleaning and drying mechanisms into a single unit, allowing the container to switch between the two modes simply through a rotating and lifting mechanism. This simplifies the equipment structure, shortens process transfer time, and improves equipment synergy and efficiency. Furthermore, by using the container itself as a transfer carrier, it directly avoids the accumulation and jamming problems associated with wet materials in traditional conveying systems. Attached Figure Description

[0039] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0040] Figure 1 This is a schematic diagram of the overall structure of this application;

[0041] Figure 2 for Figure 1 Another perspective structural diagram;

[0042] Figure 3 This is a schematic diagram of the overall structure of the rotating mechanism in this application;

[0043] Figure 4 This is a schematic diagram showing the position and structure of the lifting mechanism and the lifting mechanism and the rotating mechanism in this application;

[0044] Figure 5 This is a schematic diagram of the connecting mechanism and the positional structure of the connecting mechanism and the receiving cylinder in this application;

[0045] Figure 6 for Figure 5 A schematic diagram of the explosive structure;

[0046] Figure 7 This is a schematic diagram of the overall structure of the rinsing mechanism in this application;

[0047] Figure 8 This is a schematic diagram of the overall structure of the accommodating cylinder in this application.

[0048] Figure label:

[0049] 1. Base;

[0050] 2. Cleaning mechanism; 21. Cleaning body; 22. Ultrasonic transducer; 23. Drain pipe;

[0051] 3. Drying mechanism; 31. Drying body; 32. Vacuum pump;

[0052] 4. Rotating mechanism; 41. Mounting base; 411. Receiving groove; 42. First motor; 43. Worm gear; 44. Transmission rod; 45. Worm wheel; 46. Support plate;

[0053] 5. Lifting mechanism; 51. Hydraulic cylinder; 52. Support frame; 521. Sliding groove; 53. Second motor; 54. Screw; 55. Slider;

[0054] 6. Connecting mechanism; 61. Connecting rod; 62. Support component; 63. Cylinder; 64. Connecting rod; 65. Clamping component;

[0055] 7. Mixing mechanism;

[0056] 71. The third motor;

[0057] 72. Transmission assembly; 721. Drive gear; 722. First driven gear; 723. Second driven gear;

[0058] 73. Stirring assembly; 731. First stirring rod; 732. Second stirring rod; 733. Third stirring rod;

[0059] 8. Flushing mechanism; 81. Water tank; 82. Water pump; 83. Spray pipe; 84. Graduation marks;

[0060] 9. Receptacle tube; 91. Through hole; 92. Flange. Detailed Implementation

[0061] In the following description, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments can be modified in various ways without departing from the spirit or scope of this invention. Therefore, the drawings and description are considered exemplary in nature and not restrictive.

[0062] Currently, the cleaning and drying of monocrystalline silicon scrap is still mainly done manually. Although some manufacturers have begun to introduce automated equipment, the technological maturity in terms of functional integration and processing efficiency still needs to be improved.

[0063] like Figures 1-2 As shown in the figure, this utility model embodiment provides an integrated automatic processing equipment for cleaning and drying single crystal silicon scrap, which mainly includes: a base 1, a cleaning mechanism 2, a drying mechanism 3, a rotating mechanism 4, a lifting mechanism 5, and a container cylinder 9.

[0064] The base 1 is equipped with a cleaning mechanism 2, a drying mechanism 3, and a rotating mechanism 4. The cleaning mechanism 2 is configured to clean the monocrystalline silicon fragments. The drying mechanism 3 is configured to dry the cleaned monocrystalline silicon fragments.

[0065] A lifting mechanism 5 is provided on the rotating mechanism 4, and the lifting mechanism 5 is functionally connected to the receiving cylinder 9. The receiving cylinder 9 is configured as a container to hold single-crystal silicon fragments.

[0066] The container 9 is moved in position in coordination with the rotating mechanism 4 and the lifting mechanism 5. When the container 9 is moved to the cleaning mechanism 2, the cleaning mechanism 2 cleans the monocrystalline silicon fragments inside the container 9; when the container 9 is moved to the drying mechanism 3, the drying mechanism 3 dries the monocrystalline silicon fragments inside the container 9. By integrating the cleaning mechanism 2 and the drying mechanism 3 into a single unit, continuous operation of cleaning and drying monocrystalline silicon fragments is achieved; and the position movement of the container 9 is achieved through the cooperation of the rotating mechanism 4 and the lifting mechanism 5, thus realizing the transfer of monocrystalline silicon fragments.

[0067] Specifically, such as Figure 2 As shown, the cleaning mechanism 2 mainly includes several parts such as the cleaning body 21, the ultrasonic transducer 22, and the drain pipe 23.

[0068] The cleaning body 21 is mounted on the base 1 and is roughly cylindrical in shape. The internal cavity of the cleaning body 21 is used to hold the container 9 and the cleaning fluid.

[0069] An ultrasonic transducer 22 is installed on the cleaning body 21. The ultrasonic transducer 22 is configured to convert the input electrical energy (usually high-frequency alternating current) into high-frequency mechanical vibration (i.e., ultrasound). This mechanical vibration is transmitted to the cleaning fluid through the cleaning body 21, generating alternating high-pressure and low-pressure waves in the liquid, thereby forming and exciting countless tiny cavitation bubbles. These bubbles burst instantaneously in the high-pressure zone, generating strong shock waves and localized high temperature and pressure, which violently impact the surface and crevices of the monocrystalline silicon fragments, rapidly peeling off and crushing the impurities on them, thereby achieving a comprehensive and efficient cleaning effect.

[0070] The drain pipe 23 is located at the bottom of the cleaning body 21 and communicates with the internal cavity of the cleaning body 21. After cleaning, the cleaning fluid in the cavity is discharged through the drain pipe 23.

[0071] like Figure 1 As shown, the drying mechanism 3 mainly includes several parts such as the drying body 31 and the vacuum pump 32.

[0072] The drying body 31 is mounted on the base 1 and is roughly tank-shaped. The internal cavity of the drying body 31 houses the container cylinder 9. A vacuum pump 32 is installed on the drying body 31, which removes air and water vapor from inside the drying body 31, creating a low-pressure (vacuum) environment. Under this environment, the boiling point of the monocrystalline silicon fragments is significantly reduced, allowing internal moisture to rapidly vaporize at low temperatures. Simultaneously, the vacuum pump 32 continuously operates, constantly expelling the vaporized water vapor and maintaining a low vapor partial pressure within the cavity. This creates a strong driving force inside and outside the monocrystalline silicon fragments, promoting continuous migration and evaporation of moisture to the surface, ultimately achieving efficient, low-temperature, and deep drying of the monocrystalline silicon fragments.

[0073] like Figure 3 As shown, the rotating mechanism 4 mainly includes: mounting base 41, first motor 42, worm gear 43, transmission rod 44, worm wheel 45, and support plate 46.

[0074] The mounting base 41 is mounted on the base 1 and has a hollow interior. A receiving groove 411 is formed through the top wall of the mounting base 41. The first motor 42 is mounted on the inner wall of the mounting base 41, and its output end is equipped with a worm gear 43. One end of a transmission rod 44 is rotatably mounted on the inner bottom wall of the mounting base 41, and the other end extends through the receiving groove 411 to the outside of the mounting base 41. A worm wheel 45 is provided at the end of the transmission rod 44 inside the mounting base 41, and the worm wheel 45 meshes with the worm gear 43. A support plate 46 is provided at the end of the transmission rod 44 outside the mounting base 41, and the support plate 46 does not contact the mounting base 41.

[0075] During operation, the first motor 42 drives the worm gear 43 to rotate, the worm gear 43 drives the worm wheel 45 to rotate, and then the worm wheel 45 drives the transmission rod 44 to rotate, which in turn drives the support plate 46 to rotate.

[0076] like Figure 4 As shown, the lifting mechanism 5 mainly includes several parts such as a hydraulic cylinder 51, a support frame 52, a second motor 53, a screw 54, and a slider 55.

[0077] The hydraulic cylinder 51 is mounted on the support plate 46, and its output end is equipped with a support frame 52. A vertical sliding groove 521 is formed on the side wall of the support frame 52. The second motor 53 is fixed inside the support frame 52, and its output end is equipped with a screw 54. The screw 54 is arranged axially along the support frame 52, and its top end is rotatably connected to the top wall of the support frame 52 via a bearing. A slider 55 is sleeved on the screw 54 and screw-fitted to it. One end of the slider 55 passes through the sliding groove 521 and extends out of the support frame 52 for connection with other components.

[0078] The second motor 53 drives the screw 54 to rotate, causing the slider 55 to move up and down linearly along the sliding groove 521. When a significant adjustment of the height of the support frame 52 is required, the hydraulic cylinder 51 is activated, which drives the entire support frame 52 to rise and fall. In other words, the lifting mechanism 5 can achieve "two-stage height adjustment".

[0079] The receiving cylinder 9 is connected to the slider 55 in the lifting mechanism 5. Furthermore, the receiving cylinder 9 is connected to the slider 55 via the connecting mechanism 6.

[0080] Specifically, such as Figure 8 As shown, the bottom and side walls of the container 9 are provided with multiple through holes 91 for liquid and impurities to pass through.

[0081] like Figure 5 As shown, the connecting mechanism 6 mainly includes several parts such as a connecting rod 61, a support member 62, a cylinder 63, a connecting rod 64, and an arc-shaped clamping member 65.

[0082] One end of the connecting rod 61 is mounted on the slider 55, and the other end is mounted on a support member 62, which has a hollow interior. A cylinder 63 is mounted on each of the opposite side walls of the support member 62. The output end of the cylinder 63 is connected to a connecting rod 64, and the end of the connecting rod 64 is fitted with an arc-shaped clamping member 65.

[0083] The two cylinders 63 can operate synchronously, driving the two sets of connecting rods 64 and their arc-shaped clamping parts 65 at the ends to move towards or away from each other, thereby achieving the clamping and releasing of the accommodating cylinder 9.

[0084] Furthermore, to prevent the arc-shaped clamping member 65 from detaching from the receiving cylinder 9 during operation, this embodiment adds a flange 92 (or flange edge) at the opening of the receiving cylinder 9. This flange 92 structure can form a mechanical limit with the arc-shaped clamping member 65, thereby effectively preventing its axial detachment.

[0085] Furthermore, to ensure that the monocrystalline silicon fragments in the container 9 can come into more thorough contact with the cleaning solution, thereby more efficiently removing impurities adhering to the surface of the monocrystalline silicon fragments, the device in this embodiment also includes a stirring mechanism 7.

[0086] Specifically, such as Figure 6 As shown, the stirring mechanism 7 mainly includes several parts such as a third motor 71, a transmission component 72, and a stirring component 73.

[0087] The third motor 71 is mounted on the support member 62, and its output end is equipped with a transmission component 72. The transmission component 72 is located inside the support member 62, and a stirring component 73 is mounted on it. The transmission component 72 can drive the stirring component 73 to rotate. The stirring component 73 extends downward from the support member 62 and enters the receiving cylinder 9 to stir the single crystal silicon fragments.

[0088] More specifically, the transmission assembly 72 mainly includes several parts such as: a driving gear 721, a first driven gear 722, and a second driven gear 723.

[0089] The driving gear 721 is connected to the output end of the third motor 71. The first driven gear 722 is located on one side of the driving gear 721 and meshes with one side of the driving gear 721. The second driven gear 723 is located on the other side of the driving gear 721 and meshes with the other side of the driving gear 721. When the third motor 71 is running, it drives the driving gear 721 and simultaneously drives the first driven gear 722 and the second driven gear 723 to rotate in opposite directions.

[0090] The stirring assembly 73 mainly includes several parts such as the first stirring rod 731, the second stirring rod 732, and the third stirring rod 733.

[0091] The first stirring rod 731 is connected to the driving gear 721, the second stirring rod 732 is connected to the first driven gear 722, and the third stirring rod 733 is connected to the second driven gear 723. The first stirring rod 731, the second stirring rod 732, and the third stirring rod 733 rotate synchronously under the drive of their respective driving gears 721, 722, and 723, thereby achieving the stirring function of the monocrystalline silicon fragments in the container cylinder 9.

[0092] Furthermore, to improve the cleaning effect on monocrystalline silicon fragments, the device in this embodiment also includes a rinsing mechanism 8.

[0093] Specifically, such as Figure 7 As shown, the rinsing mechanism 8 mainly includes several parts such as a water tank 81, a water pump 82, and a spray pipe 83.

[0094] The water tank 81 is mounted on the base 1, and a water pump 82 is mounted on it. A spray pipe 83 is mounted on the outlet end of the water pump 82. The spray pipe 83 extends to the top of the cleaning body 21, and its pipe wall is provided with several nozzles (not shown in the figure) facing the container 9 inside the cleaning body 21.

[0095] When it is necessary to rinse the monocrystalline silicon fragments in the container 9, the water pump 82 is started. The water pump 82 pumps water from the water tank 81 into the spray pipe 83, and finally forms a high-pressure water flow through the nozzles to rinse the monocrystalline silicon fragments evenly and thoroughly.

[0096] Furthermore, to facilitate observation of the water level inside the water tank 81, this embodiment provides a transparent observation window with graduated lines 84 on one side wall of the water tank 81.

[0097] In use, first, activate the rotating mechanism 4 to drive the lifting mechanism 5 and the connecting mechanism 6 to rotate together, so that the connecting mechanism 6 is precisely positioned directly above the receiving cylinder 9 (at this time, the position of the receiving cylinder 9 can be understood as being in the loading position). Then, activate the lifting mechanism 5 to lower the connecting mechanism 6, so that the two sets of arc-shaped clamping parts 65 in the connecting mechanism 6 are respectively located on both sides of the receiving cylinder 9. At this time, the stirring component 73 in the stirring mechanism 7 is located in the receiving cylinder 9. Pour the single-crystal silicon fragments into the receiving cylinder 9. Activate the cylinder 63 in the connecting mechanism 6 to drive the two sets of arc-shaped clamping parts 65 to move towards each other, firmly clamping the receiving cylinder 9.

[0098] Subsequently, the lifting mechanism 5 raises the container cylinder 9, and the rotating mechanism 4 transfers it above the cleaning body 21. Then, the lifting mechanism 5 descends, immersing the container cylinder 9 into the cleaning body 21 containing cleaning fluid. The cleaning fluid in the cleaning body 21 flows into the container cylinder 9 through the through-hole 91, contacting the monocrystalline silicon fragments. The cylinder 63 reverses its movement, and the clamping member 65 releases the container cylinder 9. The ultrasonic transducer 22 and the stirring mechanism 7 are activated, utilizing cavitation and mechanical agitation to thoroughly mix the monocrystalline silicon fragments with the cleaning fluid, efficiently removing surface impurities. During the cleaning process, the rinsing mechanism 8 can be activated, working in conjunction with the stirring action of the stirring mechanism 7 to efficiently spray and rinse the monocrystalline silicon fragments.

[0099] After cleaning, the lifting mechanism 5 and the connecting mechanism 6 work together to lift the container 9 to a predetermined height for draining. The cleaning fluid flows back into the cleaning body 21 through the through-hole 91 under gravity, and is finally discharged through the drain pipe 23. After draining, the rotating mechanism 4 and the lifting mechanism 5 work together to transfer the container 9 into the drying body 31. The cylinder 63 reverses its movement, and the clamping member 65 releases the container 9. The lifting mechanism 5 is activated, and the stirring mechanism 7, along with the connecting mechanism 6, simultaneously disengages from the container 9. The vacuum pump 32 is activated to perform low-temperature, deep, and efficient drying of the monocrystalline silicon fragments inside the container 9.

[0100] After completion, the rotating mechanism 4 cooperates with the lifting mechanism 5 to precisely position the connecting mechanism 6 directly above the receiving cylinder 9. The lifting mechanism 5 then activates, simultaneously starting the stirring mechanism 7, which enters the receiving cylinder 9 in a rotating manner. Since the monocrystalline silicon fragments in the receiving cylinder 9 have been completely dried and are in a loose state, the stirring mechanism 7 can easily enter the receiving cylinder 9 in a rotating manner. The cylinder 63 in the connecting mechanism 6 is activated, driving the two sets of arc-shaped clamping parts 65 to move towards each other, firmly clamping the receiving cylinder 9. The lifting mechanism 5 and the rotating mechanism 4 are then activated to move the receiving cylinder 9 out of the drying body 31 and transfer it to the next conveying equipment, which then transports it to the next workstation.

[0101] It should be noted that the cleaning solution in this embodiment can be water, acid, or any other suitable solution, as long as it can remove impurities from the surface of the monocrystalline silicon fragments. The particle size of the monocrystalline silicon fragments in this embodiment is 1-10 mm.

[0102] Finally, it should be noted that the above description is merely a preferred embodiment of this utility model and is not intended to limit the utility model. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. An integrated automatic processing equipment for cleaning and drying single-crystal silicon scrap, characterized in that, include: The base is provided with a cleaning mechanism, a drying mechanism, a rotating mechanism, and a lifting mechanism provided on the rotating mechanism; A container for holding single-crystal silicon fragments, having several through holes thereon, is detachably connected to the lifting mechanism; wherein, the container can be moved in position with the cooperation of the rotating mechanism and the lifting mechanism, and thus be placed in the cleaning mechanism and / or the drying mechanism.

2. The device according to claim 1, characterized in that, The cleaning mechanism includes: a cleaning body disposed on the base; and an ultrasonic transducer disposed on the cleaning body.

3. The device according to claim 1, characterized in that, The drying mechanism includes: a drying body disposed on the base; and a vacuum pump disposed on the drying body.

4. The device according to claim 1, characterized in that, The rotating mechanism includes: a mounting base disposed on the base, having a receiving groove thereon; a first motor disposed within the mounting base, with its output end connected to a worm gear; a transmission rod rotatably disposed within the mounting base, one end of which passes through the receiving groove and extends to the outside of the mounting base; a worm wheel disposed at the end of the transmission rod located inside the mounting base, meshing with the worm gear; and a support plate disposed at the end of the transmission rod located outside the mounting base, the support plate not contacting the mounting base.

5. The device according to claim 4, characterized in that, The lifting mechanism includes: a support frame disposed on the support plate, having a sliding groove thereon; a second motor disposed inside the support frame, having a screw connected to its output end, the screw being rotatably connected to the support frame; and a slider sleeved on the screw, helically engaging with the screw, one end of which passes through the sliding groove.

6. The device according to claim 5, characterized in that, The lifting mechanism also includes a hydraulic cylinder, and the support frame is mounted on the support plate via the hydraulic cylinder.

7. The device according to claim 5, characterized in that, It also includes a connecting mechanism that is connected to the slider.

8. The device according to claim 7, characterized in that, The connecting mechanism specifically includes: a connecting rod, which is disposed on the slider and has a support member thereon; a cylinder, which is symmetrically disposed on both sides of the support member and has a connecting rod connected to its output end; and a clamping member, which is disposed at the end of the connecting rod.

9. The device according to claim 8, characterized in that, The support member is equipped with a stirring mechanism that can extend into the accommodating cylinder.

10. The device according to claim 1, characterized in that, The base is also provided with a rinsing mechanism, which works in conjunction with the cleaning mechanism on the receiving cylinder.

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