Process furnace and process plant

Abstract

The present disclosure relates to the technical field of semiconductor and photovoltaic, and particularly relates to a process furnace and process equipment, which solves the problem of low process efficiency caused by the fact that the sheet needs to be transferred to different process furnaces for different process treatment due to the single function of the process furnace in the prior art. The process furnace comprises a furnace body, a uniform flow assembly, an electrode assembly and a control assembly, the furnace body has a furnace cavity, the uniform flow assembly is insulatedly connected in the furnace cavity, the uniform flow assembly divides the furnace cavity into a process chamber and a uniform flow chamber, the electrode assembly is conductively connected with the uniform flow assembly, the control assembly is electrically connected with the electrode assembly, the control assembly is configured to control the electrode assembly to be electrically connected with a radio frequency power source so as to make the process furnace enter a plasma reaction mode, or to control the electrode assembly to be disconnected from the radio frequency power source so as to make the process furnace enter a normal reaction mode. The process furnace and process equipment provided by the present disclosure can complete multiple process treatments through the process furnace, thereby improving the process efficiency.

Images