Quartz cover vacuum reaction chamber
CN309385941SActive Publication Date: 2025-07-15JIANGSU FEYNMAN SEMICON TECH CO LTD
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Patent Information
- Application Number
- CN202430730931.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-19
- Publication Date
- 2025-07-15
- Estimated Expiration
- 2039-11-19
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Figure 000007_ABST
Abstract
1. The name of this design product: Quartz cover vacuum reaction chamber. 2. The use of this design product: It is used for the vapor deposition preparation of two-dimensional materials, especially suitable for the efficient synthesis of nanostructures such as graphene and carbon nanotubes, and is commonly used in the production of advanced electronic devices and functional materials. 3. The design key points of this design product: lies in the shape. 4. The picture or photo that best shows the design key points: Stereogram 1. 5. Other situations that need to be explained: Other explanations: The cover is made of high-temperature resistant quartz transparent material.
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