Quartz cover vacuum reaction chamber

CN309385941SActive Publication Date: 2025-07-15JIANGSU FEYNMAN SEMICON TECH CO LTD
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Patent Information

Application Number
CN202430730931.1
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-11-19
Publication Date
2025-07-15
Estimated Expiration
2039-11-19

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Abstract

1. The name of this design product: Quartz cover vacuum reaction chamber. 2. The use of this design product: It is used for the vapor deposition preparation of two-dimensional materials, especially suitable for the efficient synthesis of nanostructures such as graphene and carbon nanotubes, and is commonly used in the production of advanced electronic devices and functional materials. 3. The design key points of this design product: lies in the shape. 4. The picture or photo that best shows the design key points: Stereogram 1. 5. Other situations that need to be explained: Other explanations: The cover is made of high-temperature resistant quartz transparent material.
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