Gas supply nozzle head for substrate processing equipment

CN309493152SActive Publication Date: 2025-09-12KOKUSAI DENKI KK
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Patent Information

Application Number
CN202130830779.0
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Priority Date
2021-06-16
Filing Date
2021-12-15
Publication Date
2025-09-12
Estimated Expiration
2036-12-15

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Abstract

1. Name of the product of this design: Nozzle for a gas supply nozzle for a substrate processing device. 2. Purpose of this design product: This product as a whole is a gas supply nozzle for a substrate processing device used to process multiple sections of substrates held vertically inside a reaction tube. The portion indicated by the solid line is the nozzle head of the gas supply nozzle for the substrate processing apparatus. 3. The key design features of this design product lie in the shape of the product shown by the solid line. 4. The picture or photo that best illustrates the design points: three-dimensional picture. 5. Other situations that require explanation: The portion indicated by the solid line in the view is the portion that is desired to be protected, and the dotted line is the boundary line used to distinguish the portion that is desired to be protected as a partial appearance from other portions.
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