Gas supply nozzle head for substrate processing equipment
CN309493152SActive Publication Date: 2025-09-12KOKUSAI DENKI KK
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Patent Information
- Application Number
- CN202130830779.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2021-06-16
- Filing Date
- 2021-12-15
- Publication Date
- 2025-09-12
- Estimated Expiration
- 2036-12-15
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Figure 000007_ABST
Abstract
1. Name of the product of this design: Nozzle for a gas supply nozzle for a substrate processing device. 2. Purpose of this design product: This product as a whole is a gas supply nozzle for a substrate processing device used to process multiple sections of substrates held vertically inside a reaction tube. The portion indicated by the solid line is the nozzle head of the gas supply nozzle for the substrate processing apparatus. 3. The key design features of this design product lie in the shape of the product shown by the solid line. 4. The picture or photo that best illustrates the design points: three-dimensional picture. 5. Other situations that require explanation: The portion indicated by the solid line in the view is the portion that is desired to be protected, and the dotted line is the boundary line used to distinguish the portion that is desired to be protected as a partial appearance from other portions.
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