Multi-channel epitaxial growth in-situ monitoring apparatus controller
CN309638317SActive Publication Date: 2025-11-28SHANGHAI CHEYITIAN TECH CO LTD
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Patent Information
- Application Number
- CN202530211614.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-18
- Publication Date
- 2025-11-28
- Estimated Expiration
- 2040-04-18
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Figure 000007_ABST
Abstract
1. The name of the design product: multi-channel epitaxial growth in-situ detection equipment controller. 2. The use of the design product: used for collecting process parameter information in the process of semiconductor epitaxial growth and processing and outputting detection signals. 3. The design points of the design product: the combination of shape and pattern. 4. The picture or photo that best shows the design points: perspective view.
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