Multi-channel epitaxial growth in-situ monitoring apparatus controller

CN309638317SActive Publication Date: 2025-11-28SHANGHAI CHEYITIAN TECH CO LTD
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Patent Information

Application Number
CN202530211614.3
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2025-04-18
Publication Date
2025-11-28
Estimated Expiration
2040-04-18

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Abstract

1. The name of the design product: multi-channel epitaxial growth in-situ detection equipment controller. 2. The use of the design product: used for collecting process parameter information in the process of semiconductor epitaxial growth and processing and outputting detection signals. 3. The design points of the design product: the combination of shape and pattern. 4. The picture or photo that best shows the design points: perspective view.
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