X-ray diffraction stress meter
CN309791613SActive Publication Date: 2026-02-13SHENZHEN XPECTVISION TECH CO LTD
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Patent Information
- Application Number
- CN202530404091.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-10
- Publication Date
- 2026-02-13
- Estimated Expiration
- 2040-07-10
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: X-ray diffraction stress meter. 2. The use of the design product: The design product is used for X-ray diffraction imaging to determine the stress of materials. 3. The design points of the design product: lie in the shape of the product. 4. The picture or photo that best indicates the design points: perspective view 1.
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