Method for producing an optical system

Abstract

Method for producing an optical system (30) comprising at least one beam deflection element (13), at least one diaphragm element (36) and at least one holder (17) for fixing the beam deflection element (13) and the diaphragm element (36) in a predetermined arrangement relative to one another, wherein (i) the beam deflection element (13) and a shielding element (15) are provided, (ii) the beam deflection element (13) and the shielding element (15) are fixed by means of the holder (17) such that the actual arrangement of the shielding element (15) relative to the beam deflection element (13) corresponds to the predetermined arrangement of the diaphragm element (36) relative to the beam deflection element (13), and (iii) the shielding element (15) is processed by means of processing light beams to form the aperture element (36), wherein (iv) the beam deflection element (13) is irradiated with the processing light beams in such a way that the processing light beams, after deflection by the beam deflection element (13), impinge on a functional region of the shielding element (15) and change its optical properties by releasing energy, wherein in step (i) a lens array, a combination of a lens array and a lens, or a combination of a lens array and a mirror optics is provided as the beam deflection element (13).

Description

The present invention relates to a method for producing an optical system, which comprises at least one beam deflection element, at least one aperture element and at least one holder for fixing the beam deflection element and the aperture element in a predefined arrangement relative to one another.Optical systems of the aforementioned type are used in many ways for influencing the propagation of light, for example for focusing and collimating light beams. The aperture element serves here to delimit the cross-sectional area of a light beam bundle. Optical systems with aperture elements are used in different instruments, in particular in optoelectronic sensors such as light scanners, light barriers, light grids, color sensors or scanners. The aperture element generally has a functional region which differs from the surrounding regions with regard to its optical properties. For example, a shutter element may have a central hole in a non-transparent body or a reflective spot on a transparent body.For an acceptable performance of the optical system, it is important that the predetermined arrangement of the beam deflection element relative to the aperture element is exactly maintained. An exact alignment of the two mentioned elements is particularly important in the case of light gratings and the like, because these are multi-beam sensors. In addition, a slight offset of the diaphragm opening is associated with a noticeable beam offset because of the large light path. Furthermore, light gratings, in particular reflection light gratings, triangulation light gratings and time of flight (TOF) light gratings, must have either collimated transmitter beams or a small range of view. If there is no exact positioning between diaphragm apertures and beam deflection elements, the collimated beams are not aligned relative to one another. Under certain circumstances they may even overlap. For example, a height of an object to be measured cannot then be specified exactly, so that the performance of the relevant light grid is correspondingly low. Usually, therefore, a positioning step is necessary in the production of optical systems.Positioning beam deflection elements and / or aperture elements by manual adjustment is time consuming and difficult. In addition, the construction of adjustable systems is generally complex and bulky. In multi-beam systems, which can have, for example, 100 and more beams, individual positioning can hardly be carried out with reasonable effort.DE 10 2017 116 492 A1 published after the filing of the present application discloses a method for producing an optoelectronic sensor, the diaphragm of which is produced using the receiving optics.DE 10 2017 204 073 A1 discloses a distance-sensitive camera which has a lens array with individually shaped individual elements.It is an object of the invention to provide a possibility for the faster and simpler production of an optical system of the type mentioned at the beginning.The object is achieved by a method having the features of claim 1.The invention provides that(i) providing the beam deflection element and a shielding element,(ii) the beam deflection element and the shielding element are fixed by means of the holder in such a way that the actual arrangement of the shielding element relative to the beam deflection element corresponds to the predefined arrangement of the aperture element relative to the beam deflection element, and(iii) processing the shielding member by processing light beams to form the aperture member, wherein(iv) irradiating the beam deflection element with the processing light beams in such a way that the processing light beams, after deflection by the beam deflection element, impinge on a functional region of the shielding element and change the optical properties thereof by outputting energy.According to the invention, the aperture element is therefore not provided as a finished component and aligned relative to the beam deflection element, but a preliminary stage in the form of the shielding element is fixed together with the beam deflection element in the desired position and is only finished in the fixed state. The functional region, i.e. for example the aperture hole, is generated here precisely where the fixed beam deflection element deflects the machining light beams. During operation of an optical system produced in this way, the functional range is thus exactly matched to the beam deflection element. Preferably, the fixation is no longer released after the production of the optical system. This means that the beam path is practically identical during production and operation. Subsequent positioning of the aperture element or of the beam deflection element is therefore not necessary.When fixing the beam deflection element and the shielding element in step (ii), exact positioning of the shielding element transversely to the optical axis of the beam deflection element is not necessarily required, since the aperture opening decisive for the function of the optical system is only prepared or generated at all in step (iv). However, it is desirable that the shielding member be relatively accurately positioned in position on the optical axis of the beam deflection member. Such a restriction to the exact axial positioning enables particularly simple production.The correspondence of the actual arrangement of the aperture element and the shielding element in each case relative to the beam deflection element mentioned in step (ii) thus includes a preferably exact axial correspondence that is as exact as possible and only preferably also a preferably exact correspondence of the lateral arrangement that is as exact as possible, in each case within the scope of the manufacturing accuracy.Preferably, in step (i), a collection optics is provided as beam deflection element. A collection optics, i.e. for example a collecting lens or an objective, focuses the machining light beams onto a relatively small spot and thus generates a high local radiation intensity, which facilitates the changing of the optical properties of the functional region.In order to provide collimated transmission and / or reception beams or for a small range of view, a diaphragm element having a diaphragm diameter of approximately 50 μm to approximately 200 μm and / or a converging lens having a focal length of approximately 10 mm can be provided in particular.In particular, in step (ii), the beam deflection element and the shielding element can be fixed by means of the holder in such a way that the shielding element is arranged at least approximately in a focal plane of the collection optics. When a parallel beam of processing light beams is irradiated onto the collection optics, a particularly small functional range is generated in this embodiment, namely essentially restricted to the focal spot generated by the collection optics. It has been found that diaphragm elements can be formed in this way, which have diaphragm apertures or point diaphragms of 0.5 mm diameter or less.The aperture shape provided by the functional region can be, in particular, circular, elliptical, rectangular, cruciform or annular. Furthermore, the aperture element can be composed of a plurality of individual apertures.In step (i), a lens array, a combination of a lens array and a lens, or a combination of a lens array and a mirror optics is provided as the beam deflection element. In particular, a lens or a lens array made of plastic, for example of polymethyl methacrylate (PMMA) or of a polycarbonate (PC), can be provided. It is advantageous to use a plastic with low internal absorption (low volume absorption). In principle, a lens made of glass is also possible. In particular, a gold-coated plastic part can be provided as mirror optics. A lens or array of lenses having an anti-reflective layer applied thereon may also be provided. The antireflection layer can be optimized with respect to the processing light beams and / or with respect to the light beams provided for the intended operation of the optical system.Preferably, in step (ii), the beam deflection element and the shielding element are fixed by means of the, preferably one-piece, holder in such a way that a fixed connection is produced between the beam deflection element and the shielding element. The fixed connection can be designed for permanent fixing. The beam deflection element and the shielding element can be immovable relative to one another on account of the fixed connection and / or be non-detachably coupled to one another.Since the holder does not necessarily have to be designed for an adjustment possibility, it can be designed in a particularly simple manner. In particular, a tubular, tube bundle-shaped, profile-like or grid-like component made of plastic or metal can be provided as a holder. The holder can additionally have advantageous optical properties. For example, the mount may have a low reflectance surface.In step (i), a one-piece component, preferably made of plastic or metal, can be provided, on which the shielding element and the holder are formed as sections. This enables a particularly simple construction in which the shielding element does not have to be mounted separately in the holder, but is held on it from the home.In step (ii), the beam deflection element and the shielding element may be fixed by the holder such that the beam deflection element and the aperture element are arranged coaxially with respect to an optical axis. That is, an optical system can be manufactured in which the function region, e.g., the diaphragm aperture, of the diaphragm element is located on the optical axis of the beam deflection element. Such optical systems are installed in many devices and instruments, in particular in optoelectronic sensors. Should it require the application, however, the beam deflection element and the shielding element and, in this respect, also the aperture element to be formed can also be arranged offset or tilted.Preferably, the machining light beams are generated by a laser system. With a laser system, a material change can be made on the shielding element in various ways, as is fundamentally known in the field of material processing. In particular, a laser system comprising a solid state laser can be used.In step (i), a plurality of separate beam deflection elements can be provided, which are fixed in step (ii) by means of a common holder.This enables simplified production of multi-beam optical systems, as are required for multi-beam sensors such as sensing light gratings or reflex light gratings, for example. Due to the fixation in the common holder, during operation of a corresponding sensor, all the beams are aligned correctly relative to each other. The beam deflection elements can be fixed in particular in such a way that after the aperture elements have been formed, the respective optical axes are parallel to one another. Furthermore, in step (i), a plurality of beam deflection elements can be provided, which are integrated into a common beam deflection component. For example, a lens array having a plurality of parallel lenses may be provided.By means of the arrangement of a plurality of fixed beam deflection elements, a diaphragm element having a plurality of functional regions, that is to say, for example, a diaphragm element having a plurality of diaphragm holes, can be formed. For this purpose, the beam deflection elements can be irradiated simultaneously or successively with the machining light beams. In particular, for sequential irradiation, the holder with the beam deflection elements and the shielding element can be displaced relative to a processing light source by means of a travel table or a movable processing light source can be used. However, it is also possible to simultaneously irradiate all functional regions and provide for this purpose a beam splitting.Preferably, in step (i) an at least substantially non-transparent output element is provided, wherein in step (iv) a transparency or partial transparency is generated in the functional region by the deflected machining light beams. The transparent or partially transparent functional region forms an aperture opening of the aperture element.In step (iv), the transparency or partial transparency can be produced by removing material by means of the processing light beams. That is, non-transparent material can be removed from the shielding member by energy output. This is relatively simple to achieve, for example, with solid-state laser systems.In particular, in step (iv), the transparency or partial transparency can be produced by laser cutting and / or laser drilling of an aperture in the shielding element. In this way, a pinhole, slit diaphragm or the like can be produced as is required in numerous optical devices.One embodiment of the invention provides that in step (i) an at least substantially transparent carrier with an applied non-transparent layer, in particular a metal layer, is provided as shielding element and in step (iv) the transparency or partial transparency is produced by at least partial removal of the non-transparent layer. The non-transparent layer can be designed as a vapor-deposited thin layer, so that relatively little energy output is necessary for removal. In particular, a plate-shaped carrier made of glass or plastic with a vapor-deposited chromium layer can be provided as a shielding element.It can be provided that in step (i) an at least substantially transparent carrier with an applied photoresist layer is provided as shielding element and in step (iv) the transparency or partial transparency is produced by activating the photoresist layer and subsequent removal of the activated photoresist layer by means of a solvent treatment.A further embodiment of the invention provides that in step (i) a photographic film is provided as shielding element and in step (iv) the transparency or partial transparency is produced by exposure of the photographic film and optionally subsequent development of the photographic film.Preferably, a positive photographic film is provided. In this case, no wet processes are required, so that only a small amount of effort is required for forming the aperture element.In general and also in this embodiment, the invention advantageously enables the realization of very thin diaphragms.According to a special embodiment, in step (iii), the processing of the shielding element is monitored by an image capturing device. In particular, a camera connected to an image processing system can record the region of the shielding element in which the aperture is formed. The recording can be evaluated in order to control the processing, in particular the power and / or the exposure time, if necessary. In this way, the reliability and accuracy of the method can be further increased.The invention also relates to a method for producing an optoelectronic sensor, which has at least one light transmitter or light receiver and at least one optical system, wherein the optical system comprises at least one beam deflection element, at least one aperture element and at least one holder for fixing the beam deflection element and the aperture element in a predefined arrangement relative to one another.According to the invention, the optical system is manufactured using a method as described above. For producing the optoelectronic sensor, the correspondingly produced optical system with the light transmitter or light receiver and an electronic control device can be mounted in a sensor housing.According to one configuration of the invention, the processing of the shielding element is carried out in a partially or fully installed state of the optoelectronic sensor. For example, the arrangement of beam deflection element, shielding element and holder can be provided as a prefabricated optical module and can be fastened to an electronic card comprising the light transmitter or light receiver. The electronic card with the optics module can be installed in a sensor housing before the shielding element is processed to form the aperture element. This enables particularly efficient production. The automatic elimination of tolerances of the electronic card and of the sensor housing during diaphragm production is particularly advantageous.It may be provided that the light transmitter or light receiver is shielded by a protective element during the processing of the shielding element and the protective element is removed when the forming of the aperture element is completed. This enables the use of machining light of high power without having to fear damage to electronic components.Preferably, the light transmitter or light receiver, or a light guide connected to the light transmitter or light receiver, is arranged directly on the functional region of the shielding element. The mounting is thus preferably carried out in such a way that an aperture opening of the aperture element is located directly on the light source or on the receiving surface.The invention also relates to an optical system comprising at least one beam deflection element, at least one aperture element and at least one holder for fixing the beam deflection element and the aperture element in a predetermined arrangement relative to one another.According to the invention, the optical system is produced using a method as described above. An optical system according to the invention accordingly has those device features which result from the respective embodiments of the production method according to the invention.The invention further relates to an optoelectronic sensor, in particular a light grating, having at least one light transmitter or light receiver and at least one optical system.An optoelectronic sensor according to the invention can be a light grating which is designed as a transmitter-receiver system and accordingly comprises at least one light transmitter and at least one light receiver in respective separate housings. An optoelectronic sensor according to the invention can, however, also be designed as a reflection light grating which comprises a housing with a light transmitter and a light receiver and a passive reflector, or as a sensing triangulation light grating which has at least one light transmitter and at least one light receiver in a housing and is designed for direct detection of an object. Furthermore, an optoelectronic sensor according to the invention can be embodied as a TOF (time of flight) light grating, which has at least one light transmitter and at least one light receiver in a housing and is designed for direct detection of an object by means of a runtime measurement. An optoelectronic sensor according to the invention preferably comprises at least one light transmitter and at least one light receiver in a common housing. Particularly preferably, an optoelectronic sensor according to the invention is designed as a reflection light grating or as a sensing light grating.According to the invention, the optical system is configured as described above.Further developments of the invention are also specified in the dependent claims, the description and the appended drawing.The invention is described below by way of example with reference to the drawings. The representations in the figures are not to be understood as true to scale. FIG. 1 is a schematic diagram of an arrangement for producing an optical system according to the invention. Fig. 2 shows an optical system manufactured by a method according to the present invention. FIG. 3 shows a first embodiment of an optoelectronic sensor according to the invention, which is produced by a method according to the invention. FIG. 4 shows a second embodiment of an optoelectronic sensor according to the invention, which is produced by a method according to the invention. FIG. 5 shows a third embodiment of an optoelectronic sensor according to the invention, which is produced by a method according to the invention, in a front view. FIG. 6 shows the optoelectronic sensor according to FIG. 5 in a side view. FIG. 7 shows an optoelectronic sensor produced according to the prior art in a side view. FIG. 8 shows an apparatus which is designed to carry out a method according to the invention for producing an optical system. FIG. 9 shows a fourth embodiment of an optoelectronic sensor according to the invention, which is produced by a method according to the invention.FIG. 1 shows an optical module 11 comprising an arrangement of lenses 13 and a shielding element 15 in the form of a non-transparent plate. The array of lenses 13 and the shielding member 15 are fixed relative to each other in a predetermined arrangement by a holder 17. In the exemplary embodiment shown, the arrangement is such that the lenses 13 are arranged at least substantially in a common lens plane 18 and a plate plane 19 of the shielding element 15 runs parallel to the lens plane 18. The lenses 13 and the shielding element 15 can be glued and / or clamped into the holder 17. Preferably, the holder 17 is a simple component made of plastic or metal. As shown, the lenses 13 are formed as converging lenses, each of which has a focal plane 20. The plate plane 19 coincides with the focal planes 20. In principle, the lenses 13 could also have different focal lengths 20.According to a provision of the optical module 11 shown in FIG. 1, an embodiment of a method according to the invention for producing an optical system provides that a bundle 25 of at least substantially parallel processing light beams is directed onto one of the lenses 13 from the side of the optical module 11 facing away from the shielding element 15. Preferably, a laser system, not shown, is used to generate the beam 25 of machining light beams.The lens 13 focuses the machining light beams onto a focal spot. The focal spot is located on the shielding element 15 and has a high radiation intensity. In particular, the radiation power of the processing light beams is selected to be so high that material removal takes place in the region of the focal spot. The irradiation is carried out in such a way that, as can be seen in FIG. 2, an aperture 27 is produced in the shielding element 15, the size of which aperture corresponds approximately to the size of the focal spot. After completion of the aperture 27, the laser system is moved relative to the optical module 11 in such a way that the bundle 25 of processing light beams is incident on another lens 13. In this way, a through hole 27 is produced in each case using each of the lenses 13 and the optical system 30 illustrated in FIG. 2 is thereby produced. The apertures 27 form functional regions--in the exemplary embodiment shown, aperture openings 33 which are located in each case on the optical axes 35 of the lenses 13. In principle, the production of the diaphragm openings 33 can also take place synchronously when the machining light beams are divided.FIG. 3 schematically shows an optoelectronic sensor 37 into which the optical system 30 illustrated in FIG. 2 is installed. The optoelectronic sensor 37 has an arrangement of light receivers 39 for receiving received light beams 41. The light receivers 39 can be designed as simple photodiodes or as spatially resolving detectors. The light receivers 39 are preferably mounted on an electronic card, not shown, which is accommodated together with the optical system 30 in a sensor housing, likewise not shown, of the optoelectronic sensor 37. As shown, the light receivers 39 are each located directly in front of the diaphragm apertures 33. Preferably, the light-sensitive surfaces of the light receivers 39 are each larger than the associated diaphragm aperture 33. The received light regions 45 of the light receivers 39 are aligned exactly relative to one another. It is not otherwise necessary to align the beams 25 (FIG. 1 ) of processing light beams with maximum accuracy, because the spatial resolution takes place via the light receivers 39.FIG. 4 shows the transmission arrangement of an alternatively designed optoelectronic sensor 37', in which the optical system 30 shown in FIG. 2 is installed. The optoelectronic sensor 37' shown in FIG. 4 has, instead of an arrangement of light receivers, an arrangement of light transmitters 49 for emitting transmitted light beams 55. The light emitters 49 can be designed as light-emitting diodes or laser diodes. The light emitters 49 are preferably mounted on an electronics card, which is accommodated together with the optical system 30 in a sensor housing of the optoelectronic sensor 37'. As shown, the light emitters 49 are each located directly at the diaphragm openings 33. The lenses 13 collimate the transmitted light beams 55 into parallel beam bundles 57 which are aligned exactly relative to one another.It is understood that there are a large number of further possible applications of aligned received light regions 45 (FIG. 3 ) and aligned parallel beam bundles 57 of transmitted beams 55 (FIG. 4 ). The subject matter of FIG. 5 is a further optoelectronic sensor 37" designed according to the invention. The plan view of the light emitters 49 and light receivers 39 arranged in combination is shown in FIG. 5. this optoelectronic sensor 37" is designed as a reflection light grating or a scanning light grating and has an arrangement of light emitters 49 and an arrangement of light receivers 39 located next to it. The light emitters 49 and the light receivers 39 are preferably accommodated in a sensor housing, not shown. The light receivers 39 receive the light emitted from the light emitters 49 after being reflected by a reflector or an object.As can be seen in the side view according to FIG. 6, the received light regions 45 are exactly aligned due to the exactly positioned diaphragm openings 33. The performance of the optoelectronic sensor 37" is therefore sufficiently high even if the transmission beams 58 slip relative to one another to a certain extent, as illustrated (the associated light emitters 49 are not shown in FIG. 6). That is, the positioning accuracy requirement can be reduced on the transmitter side so as to save cost. A conventional manufacturing method may be used on the transmitter side. An advantage over an embodiment in which a production method according to the invention is used on the transmitter side and a conventional production method is used on the receiver side is that the energy loss is only low.An optoelectronic sensor 67 with an optical module 71 produced in a conventional manner is illustrated in FIG. 7. The aperture elements 66 and the lenses 13 are here embodied as separately manufactured injection-molded components. Due to position tolerances, the optical axes 35 are hatched relative to one another without adjustment, as is indicated by the hatched angle 70. The transmission beams 58 may even cross. Viewed absolutely, i.e. with respect to the sensor housing, which is not shown, an undesired shingling also occurs. Typical lateral position tolerances between the lenses 13 and the apertures 33 are ±0.1 mm or more. At a typical focal length of 10 mm, this results in a slip angle of ±0.6°. In this case, displacements of the light spots of ±10% occur at a distance of approximately 1 m from the conventional optoelectronic sensor 67, which is associated with a perceptible performance impairment of the optoelectronic sensor 67.An embodiment of the invention, not shown, provides an autocollimation arrangement in which the light transmitter and the light receiver are arranged coaxially.Since during production the lenses 13 are firmly connected to the later diaphragm element 36 via the holder 17 and the laser system provided for processing can be aligned with high accuracy relative to the optical module 11, in an optical system 30 produced according to the invention the diaphragm apertures 33 and the lenses 13 are aligned precisely with respect to one another. In particular, position and shape tolerances of the lenses 13 have hardly any effect on the performance of the respective optoelectronic sensor 37, 37', 37". The centers of the diaphragm openings 33 are always located relatively exactly on the optical axes 35 (FIG. 2 ). If a plurality of optical modules 11 are positioned relative to one another in the sensor housing, received light regions 45 and emitted parallel beams 57 can be aligned exactly with respect to one another. The performance of an optoelectronic sensor 37, 37', 37", in particular with regard to range, reflection protection and simultaneous scanning capability, can be considerably increased as a result.FIG. 8 shows an apparatus 80 with which a method according to the invention can be carried out. The device 80 comprises a module receptacle 81 in which an optical module 11 is fixed using module alignment elements 83. The module alignment elements 83 are arranged on an outer side of the holder 17 of the optical module 11 as illustrated. They can be designed, for example, for mechanical alignment with corresponding adjustment screws. A machining laser 85 can be positioned with respect to the module receptacle 81 by means of a positioning system 87. To form a diaphragm element 36, the processing laser 85 is aligned and activated as desired until the laser beam focused by the lens 13 has produced a diaphragm aperture 33.As can be seen in FIG. 9, the finished optical module 11 is preferably fixed in a sensor housing 89 in the same way as before in the module receptacle 81 (FIG. 8 ) using the module alignment elements 83. This ensures exact alignment of the lens 13, the diaphragm opening 33 and the sensor housing 89 relative to one another. For this purpose, it is advantageous if the sensor housing 89 and the module receptacle 81 have substantially the same internal dimensions.Instead of apertures 27, other functional regions can also be produced on a shielding element 15 by emitting energy of the machining light beams, which functional regions differ from the regions surrounding them with regard to their optical properties. For example, a transparent plate with a vapor-deposited metal layer could be provided as the shielding element 15, transparent regions being produced as apertures 33 by selective removal of the metal layer. Alternatively, a transparent carrier with a photoresist layer applied could also be provided as the shielding element 15, transparent regions being produced as apertures 33 by selective activation of the photoresist layer and a subsequent solvent treatment. A further alternative is to provide a photographic film as the shielding element 15, transparent regions being produced as apertures 33 by selective exposure and, if appropriate, subsequent development of the photographic film.In principle, it is also possible by means of a method according to the invention to form non-transparent regions on a transparent carrier instead of diaphragm apertures 33 and thus to produce point diaphragms or point mirrors. In addition, instead of lenses 13, other optical components can also be provided which deflect light beams in some form, for example objectives or mirror optics.Optical systems produced according to the invention can operate not only with collimated beams as shown in FIGS. 3, 4 and 7, but also with convergent or divergent beams.The invention enables the production of diaphragms of various types which are positioned with low tolerances with respect to the optical axes of lenses or similar optics. Furthermore, the invention supports the creation of individual diaphragm shapes and sizes. The principles of the invention are particularly important in multi-beam sensors such as light gratings, because all the transmission beams and all the reception fields of view can be aligned exactly with one another, which in particular allows simultaneous operation of all channels with a corresponding increase in the switching speed.List of reference numbers:11 Optical module 13 Lens 15 Shielding element 17 Holder 18 Lens plane 19 Plate plane 20 Focal plane 25 Bundle of processing light beams 27 Aperture 30 Optical system 33 Aperture opening 35 Optical axis 36 Aperture element 37, 37', 37" Optoelectronic sensor 39 Light receiver 41 Received light beams 45 Received light region 49 Light transmitter 55 Transmitted light beams 57 Parallel beam bundle 58 Transmitted beam bundle 66 Aperture element 67 Optoelectronic sensor 70 Slit angle 71 Optical module 80 Device 81 Module receptacle 83 Module alignment element 85 Processing laser 87 Positioning system 89 Sensor housing

Claims

A method of manufacturing an optical system (30) comprising at least one beam deflection element (13), at least one aperture element (36) and at least one holder (17) for fixing the beam deflection element (13) and the aperture element (36) in a predetermined arrangement relative to each other, wherein (i) the beam deflection element (13) and a shielding element (15) are provided, (ii) the beam deflection element (13) and the shielding element (15) are fixed by means of the holder (17) such that the actual arrangement of the shielding element (15) relative to the beam deflection element (13) corresponds to the predetermined arrangement of the aperture element (36) relative to the beam deflection element (13), and (iii) the shielding element (15) is processed by means of processing light beams to form the aperture element (36), wherein (iv) the beam deflection element (13) is irradiated with the processing light beams such that, the processing light beams, after deflection by the beam deflection element (13), impinge on a functional region of the shielding element (15) and change the optical properties thereof by energy emission, wherein in step (i) a lens array, a combination of a lens array and a lens or a combination of a lens array and a mirror optics is provided as the beam deflection element (13).Method according to Claim 1, characterized in that in step (i) a collection optical unit is provided as beam deflection element (13).Method according to Claim 2, characterized in that, in step (ii), the beam deflection element (13) and the shielding element (15) are fixed by means of the holder (17) in such a way that the shielding element (15) is arranged at least approximately in a focal plane (20) of the collection optics.Method according to at least one of the preceding claims, characterized in that in step (ii) the beam deflection element (13) and the shielding element (15) are fixed by means of the, preferably one-piece, holder (17) in such a way that a fixed connection is produced between the beam deflection element (13) and the shielding element (15).Method according to at least one of the preceding claims, characterized in that in step (i) a one-piece component is provided, on which the shielding element (15) and the holder (17) are formed as sections.Method according to at least one of the preceding claims, characterized in that the machining light beams are generated by a laser system (85).Method according to at least one of the preceding claims, characterized in that in step (i) a plurality of separate beam deflection elements (13) are provided, which are fixed in step (ii) by means of a common holder (17).Method according to at least one of the preceding claims, characterized in that in step (i) an at least substantially non-transparent output element (15) is provided and in step (iv) a transparency or partial transparency is produced in the functional region (33) by the deflected machining light beams.Method according to Claim 8, characterized in that, in step (iv), the transparency or partial transparency is produced by removal of material by means of the processing light beams.Method according to claim 9, characterised in that in step (iv) the transparency or partial transparency is produced by laser cutting and / or laser drilling of an aperture (27) in the shielding element (15).Method according to Claim 9, characterized in that in step (i) an at least substantially transparent carrier with an applied non-transparent layer, in particular metal layer, is provided as shielding element, and in step (iv) the transparency or partial transparency is produced by at least partial removal of the non-transparent layer.Method according to Claim 11, characterized in that in step (i) an at least substantially transparent carrier with an applied photoresist layer is provided as shielding element, and in step (iv) the transparency or partial transparency is produced by activating the photoresist layer and subsequent removal of the activated photoresist layer by means of a solvent treatment.Process according to Claim 8, characterized in that in step (i) a photographic film is provided as shielding element and in step (iv) the transparency or partial transparency is produced by exposure of the photographic film and optionally subsequent development of the photographic film.Method according to at least one of the preceding claims, characterized in that in step (iii) the processing of the shielding element (15) is monitored by an image capturing device.Method for producing an optoelectronic sensor (37, 37', 37") which has at least one light transmitter (49) or light receiver (39) and at least one optical system (30), wherein the optical system (30) comprises at least one beam deflection element (13), at least one aperture element (36) and at least one holder (17) for fixing the beam deflection element (13) and the aperture element (36) in a predefined arrangement relative to one another, characterized in that the optical system (30) is produced using a method according to one of the preceding claims.Method according to Claim 15, characterized in that the shielding element (15) is processed in a partially or fully installed state of the optoelectronic sensor (37, 37', 37").The method according to claim 15 or 16, characterized in that the light emitter (49) or light receiver (39) is shielded by a protection member during the processing of the shielding member (15), and the protection member is removed when the forming of the aperture member (36) is completed.Method according to at least one of Claims 15 to 17, characterized in that the light transmitter (49) or light receiver (39), or a light guide connected to the light transmitter (49) or light receiver (39), is arranged directly on the functional region (33) of the shielding element (15).An optical system (30) comprising at least one beam deflection element (13), at least one aperture element (36) and at least one holder (17) for fixing the beam deflection element (13) and the aperture element (36) in a predetermined arrangement relative to each other, characterized in that the optical system (30) is manufactured using a method according to any of the preceding claims.Optoelectronic sensor (37, 37', 37"), in particular a light grating, having at least one light transmitter (49) or light receiver (39) and at least one optical system (30), characterized in that the optical system is designed according to claim 19.

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