Shading device

Abstract

Shading device (1) comprising a shading surface (10) for a system (2) for treating substrates (30), wherein the system (2) comprises: - a holding device (20) for arranging substrates (20) to be treated, - at least one source (25), - a plane (21) mounted between the at least one source (25) and the substrates (30) arranged on the holding device (20) for treatment, - a cross-sectional area (22) spanned by the intersection points of the plane (21) with the direct connecting lines (23) emanating from the at least one source (25) to the substrates (30) arranged on the holding device, wherein the shading device (1) is mounted in the plane (21) between the holding device (20), on which the substrates (30) to be treated can be arranged, and the at least one source (25), and that the shading surface (10) of the shading device (1) partially interrupts the particle flow emanating from the at least one source (25) through the cross-sectional area (22), wherein the shading surface (10) is continuously variable with regard to its extent and wherein the shading surface (10) has an immovable part (100) and at least one part (101) that is movable with respect to the immovable part, and in that the extent of the shading surface can be changed by relative movement of the at least one movable part (101) with respect to the immovable part (100).

Description

[0001] The present invention relates to a shading device for a plant for treating substrates, a method for treating substrates and a method for operating a plant for treating substrates.

[0002] The treatment of substrates generally takes place in a dedicated system, preferably a plasma treatment system or a coating system in which substrates are coated. It is known to equip such systems with appropriate shading devices capable of partially interrupting a particle flow from a source to the substrates to be treated, thus achieving a more uniform or homogeneous treatment of all substrates, i.e., to compensate for geometric differences resulting from the shape or arrangement of the components in the system or the positioning of the substrates relative to a source.Such shading devices are usually immobile components, mostly sheets made of stainless steel, for example, which have a constant expansion and can be used under both atmospheric and vacuum conditions.

[0003] The disadvantage of these known shading devices is that they are not variable in terms of the size of their shading area and, once manufactured, only have a predetermined shading area. If the size of the shading area needs to be increased or decreased to achieve a greater or lower degree of shading, i.e., to reduce or increase the particle flow from a source to the substrates, the manufacture or assembly of a new shading device with an adapted shading area is required, which is not only time-consuming but also costly.

[0004] The document DE 10 2018 204 033 A1 discloses an apparatus for coating a plurality of substrates, wherein the plurality of substrates are arranged on a holding device, wherein the apparatus has a coating source, wherein the holding device holds the plurality of substrates such that they can be coated in a direct line from the coating source, wherein an adjustable shutter can be used to select which of the plurality of substrates can be coated, wherein the shutter interrupts the direct line between the substrate and the coating source.

[0005] The document DD 287 277 A5 discloses a method for producing optical elements with a spatially variable background, wherein a diaphragm with direct contact with the substrate to be coated is used in a vapor deposition system with planetary rotation.

[0006] Against this background, it is the object of the invention to provide a shading device and a method which do not have the disadvantages mentioned above.

[0007] This object is achieved by the shading device having the features of claim 1, a system having the features of claim 6, and by a method having the features of claim 9.

[0008] One aspect relates to a shading device having a shading surface for a system for treating substrates, wherein the system comprises a holding device for arranging substrates to be treated, as well as at least one source, and a plane which is mounted between the at least one source and the substrates arranged on the holding device and a cross-sectional area spanned by the intersection points of the plane with the direct connecting lines emanating from the at least one source to the substrates arranged on the holding device, wherein the shading device is mounted in the system in such a way that the shading surface of the shading device partially interrupts the particle flow emanating from the at least one source through the cross-sectional area, wherein the shading surface is variable with regard to its extent, in particular continuously or stepwise.

[0009] Substrates within the meaning of the invention are any articles, preferably glass bodies or optical articles or optical elements, in particular optical lenses, which are to be treated.

[0010] For the purposes of the application, the treatment of a substrate is understood to mean that the substrate undergoes a treatment characterized by the substrate having a different quality after such treatment than before. The result of such treatment can be determined by determining physical and / or chemical and / or mechanical properties.

[0011] Such a treatment can be understood as any conceivable type of surface modification by attacking the surface of a substrate by energetic and / or reactive species for the purpose of a physical surface attack and / or a chemical surface modification and / or mechanical surface modification, such as the treatment of a substrate with plasma.

[0012] On the other hand, such a treatment can also be understood as the deposition or application of a coating consisting of a single layer or the deposition of a sequence or application of a coating consisting of several individual layers, i.e., the deposition or application of a multi-layer system consisting of several individual layers, on the surface of a substrate. This particularly includes the application of an optical coating for the purpose of reducing reflection (anti-reflection coating) or increasing reflection (mirroring).

[0013] Depending on the type of treatment, the person skilled in the art will be familiar with various methods for determining the result of treating a substrate. If the treatment involves surface modification, the result of the treatment can be determined using methods for characterizing a surface that are familiar to the person skilled in the art, such as, in particular, determining the surface energy and / or the surface roughness of the treated substrate. If, on the other hand, the treatment involves applying a coating consisting of one or more individual layers, the person skilled in the art will also be familiar with various methods, such as, in particular, determining a transmission and / or reflection spectrum of the treated substrate and / or measuring layer thicknesses of the applied coating using surface profilometry and / or interferometry, such as, for example, the Tolansky method.

[0014] A system for treating substrates within the meaning of the application comprises at least one source suitable for treating the substrates within the meaning of the application. In addition, the system comprises a holding device having holding elements for receiving the substrates to be treated. When the phrase "substrates are arranged on a holding device" is used below, this is to be understood as meaning that the substrates are placed in holding elements of the holding device.

[0015] Depending on the geometry of the system, this holding device can in particular be hemispherical. Particularly preferably, in a hemispherical holding device, the holding elements for receiving the substrates are arranged such that the centers of the holding elements are arranged along a first circle around the center of the holding device, thus forming a first ring of holding elements. Depending on the size of the holding device, further holding elements can be arranged with their respective centers along a next circle around the center of the holding device, wherein the radius of the next circle is larger than that of the first circle and is selected such that the holding elements do not overlap and thus form a further ring of holding elements. As a result, a plurality of holding elements can be arranged with their respective centers along corresponding, concentric circles around the center of the holding device.In particular, such a holding device can have a number of rings less than 10, preferably less than or equal to 7, particularly preferably exactly 5. The holding device can, in particular, be mounted in a rotating manner and, during the treatment of substrates, perform a rotational movement having a speed of less than 50 revolutions per minute, preferably less than 40 revolutions per minute.

[0016] Furthermore, the system comprises a plane mounted between the holding device and the at least one source. The intersection points of the direct connecting lines extending from the at least one source to the substrates arranged on the holding device form a cross-sectional area lying in the plane. Particles emanating from a source during a treatment as defined in the application form a particle stream that passes through the cross-sectional area to the substrates. The source can additionally comprise a shutter positioned directly above the source to completely block the particle stream emanating from the source before it can pass through the cross-sectional area.

[0017] A shading device within the meaning of the application has a shading surface. The shading device is mounted in the system in such a way that the shading surface of the shading device at least partially interrupts or partially shades the particle stream emanating from a source through the cross-sectional area.

[0018] For this purpose, the shading device is mounted in the system such that the orientation of the shading surface forms an angle with the cross-sectional area that is less than 90°, preferably less than 70°, and particularly preferably between 10° and 45°. By arranging its shading surface as closely as possible to the cross-sectional area, the shading device advantageously achieves a higher degree of shading efficiency while simultaneously achieving a compact and space-saving design than if mounted in the system at a larger angle.

[0019] An interruption or shading of the particle stream within the meaning of the application means a local interruption or local shading, i.e., the shading surface, due to its position within the cross-sectional area, shades a portion of the particle stream that flows from a source through the cross-sectional area to the substrates. The particle stream is deliberately cut off from its rotationally symmetrical, circular shape by incorporating the shading surface of the shading device into the cross-sectional area.

[0020] By varying the size of the shading area, the degree of shading achieved is changed, thus altering the particle flow from a source to the substrates to be treated, which can be arranged on the holding device. Increasing the size of the shading area leads to a greater degree of shading and thus to a reduction in the particle flow through the cross-sectional area, thereby reducing the treatment result of the substrates. Conversely, reducing the size of the shading area leads to a lower degree of shading and thus to an increase in the particle flow through the cross-sectional area, thereby intensifying or amplifying the treatment result of the substrates.

[0021] The change in the extent of the shading area can be continuous or stepwise between a first end point at which the extent of the shading area is minimal and a second end point at which the extent of the shading area is maximal.

[0022] A continuous change means that the extent of the shading area can be changed at will. This means that any settings for the extent of the shading area can be set between the two endpoints, and there are no defined distances, steps, grids, increments, or setting positions. A stepwise change means that the change in the extent of the shading area between the two endpoints cannot be made at will. Instead, there are defined distances, steps, grids, increments, or setting positions between the minimum and maximum extent of the shading area to which the extent of the shading area can be set.

[0023] The shading device preferably comprises a stationary part and at least one part that is movable relative to the stationary part. The stationary part and the at least one movable part together form the shading surface of the shading device. The extent of the shading surface can be varied by relative movement of the at least one movable part relative to the stationary part.

[0024] Relative movement of the movable part with respect to the immovable part preferably means pivotable, particularly preferably displaceable, in particular rotatable and generally displaceable.

[0025] Preferably, the parts forming the shading surface are realized as flat, rectangular metal sheets, wherein the movable part is mounted such that it is located directly behind the immovable part and the center point of the movable part can be displaced in relation to the center point of the immovable part, i.e., relative thereto, along an axis. As a result, the position of the center point of the movable part can be displaced between two end points defined by the point at which the center point of the movable part coincides with the center point of the immovable part, thus minimizing the extent of the shading surface, and the point at which the centers of the movable part and the immovable part are at their maximum distance from one another, thus maximizing the extent of the shading surface.

[0026] Other embodiments are also conceivable, for example, in which the movable part is rotatably mounted and pivotable relative to the stationary part. In such a case, the extent of the shading surface would be changed by pivoting the movable part relative to the stationary part. An embodiment would also be conceivable in which the movable part is rotatably mounted relative to the stationary part about its longitudinal axis, and the extent of the shading surface is changed by rotating the movable part.

[0027] Preferably, the shading device is firmly screwed to a holding element of the system at its immovable part by means of a screw as the preferred fastening means, whereby a fixed installation in the system is advantageously achieved while at the same time allowing unrestricted freedom of movement of the at least one movable part.

[0028] Preferably, the shading device comprises, in addition to a stationary part, exactly two parts that are movable relative to the stationary part. The shading surface of the shading device is formed by the stationary part and the two movable parts.

[0029] Preferably, the stationary part forming the shading surface and the two movable parts also forming the shading surface are implemented as flat sheets with a substantially rectangular or oval shape. Preferably, the stationary part is arranged centrally, and the movable parts are arranged on either side of the stationary part. In this case, the change in the extent of the shading surface occurs either by relative movement of one of the two movable parts with respect to the stationary part or by relative movement of both movable parts with respect to the stationary part.

[0030] In a particularly preferred embodiment, the movable parts are arranged in a plane behind the stationary part and are displaceable relative to the transverse axis of the stationary part. This allows the extent of the shading area to be varied between two endpoints. At a first endpoint, the centers of the three parts forming the shading area are as close to each other as possible, thereby minimizing the extent of the shading area. At a second endpoint, the centers of the three parts forming the shading area are as far apart as possible, thereby maximizing the extent of the shading area.

[0031] The extent of the shading surface is preferably changed manually by mechanical displacement. For this purpose, the at least one movable part(s) have at least one lateral milling or notch which serves as an elongated hole, and the stationary part has an opening at the corresponding location for receiving a fastening means. Advantageously, the movable parts can thus be moved with respect to the stationary part along a rigid axis perpendicular to the longitudinal axis of the stationary part. For this purpose, a screw, as the preferred fastening means, is inserted into the holding opening of the stationary part, and the movable parts are inserted via the lateral milling between the screw head and the stationary part. By tightening the screw, the extent of the shading surface adjusted by displacement of the movable parts can be adjusted and fixed.To adjust the shading area to a different extent, loosen the screw and move the moving parts relative to the stationary part.

[0032] For a step-by-step change, the milling can in turn be realized in particular with lateral millings, which act as snap-in positions and thus allow a recurring fixed positioning of the moving parts in relation to the immovable part and thus allow a manually step-by-step adjustable extension of the shading area of ​​the shading device.

[0033] Preferably, the movement of one of the movable parts is effected by means of a hydraulic, pneumatic, or electric actuator. This advantageously allows not only more precise adjustment of the expansion but also modification, particularly under vacuum conditions.

[0034] The actuator preferably comprises an electric motor, which, via its drive shaft, drives a threaded rod that is firmly connected to the part of the shading surface to be moved. By changing the direction of rotation of the electric motor, the extent of the shading surface of the shading device can be changed by pushing the movable parts away from or toward the stationary part, thereby increasing or decreasing the extent of the shading surface.

[0035] The movable parts preferably have an edge geometry that deviates from a rectangular shape. This shape is preferably semicircular. Particularly preferably, the edge geometry is shaped such that the movable part provided therewith has a non-constant width along the longitudinal axis. Particularly with a source positioned off-center beneath the holding device, it may be necessary, despite a rotating holding device, to impart a gradual width along the longitudinal axis of the shading surface via a corresponding edge geometry of the movable parts in order to achieve a more homogeneous treatment on the substrates arranged at different positions on the holding device.

[0036] The system preferably comprises at least one source that enables the system to perform a treatment of the substrates as defined in the application. The source may be an electron beam gun for electron beam-assisted physical vapor deposition, a thermal evaporator, a chemical vapor deposition, molecular beam epitaxy, a sputtering source, in particular a sputtering source in conjunction with a particle stream, a source for ion beam-assisted deposition, or a plasma source or another source for emitting energetic and / or reactive species suitable for performing a physical surface attack and / or chemical surface modification and / or mechanical surface modification.

[0037] Preferably, the system is a vacuum system, and the treatment within the meaning of the application takes place under vacuum conditions. Preferably, the extent of the shading area of ​​the system is variable under vacuum, which advantageously allows the extent to be changed without having to bring the system to atmospheric conditions. This not only saves time but also allows the extent of the shading area to be changed during a treatment.

[0038] Preferably, the actuator receives control commands by radio using a wireless transmission technology, whereby advantageously no cable connection is required between the actuator located within the system and during treatment under vacuum conditions and an external control unit as a command transmitter.

[0039] A further aspect is a method for treating substrates in a system with a shading device, wherein the result of the treatment of the substrates is influenced by changing the extent of the shading surface of the shading device, and wherein the method comprises the following steps: - Adjusting the extent of the shading area of ​​the shading device depending on the desired result of the treatment of the substrates, - Treating the substrates in the plant.

[0040] The method is used for treating substrates in a system, which includes both a surface attack or surface modification of the surface of the substrates and the application of a coating to the surface of the untreated substrates, provided that the result of the treatment is influenced by changing the extent of the shading surface of the shading device.

[0041] The treatment to be performed is not severely restricted, as it only needs to meet the requirement that the result of this treatment is influenced by changing the extent of the shading area of ​​the shading device. All types of treatment are conceivable here that have in common that they are based on a substantially directed particle stream, which originates from a source and passes through a cross-sectional area to the substrates to be treated. This particle stream is partially shaded by the cross-sectional area by the introduction of a shading device with a variable shading area.

[0042] At the beginning of the process, the size of the shading area of ​​the shading device in the system is adjusted. This adjustment can be made using empirically determined values ​​for the shading area depending on the treatment to be performed, or the shading area can be set to an intermediate value between the minimum and maximum size, which allows for subsequent adjustment of the shading area in both directions, i.e., the shading area can be increased or decreased.

[0043] Subsequently, the substrates, which are arranged on the holding device in the system, are treated. The process optimizes the treatment of the substrates, as the shading device partially shades the particle flow through the cross-sectional area using its shading surface, thus enabling a more homogeneous or otherwise optimized treatment.

[0044] The treatment carried out is preferably a physical surface attack and / or a chemical surface modification and / or mechanical surface modification of the substrates with high-energy and / or reactive species. By means of such a treatment, the surface of the substrates is modified in order, for example, to clean the surface of the substrates or to activate the surface of the substrates in order to improve the adhesion properties of the surface for a subsequent treatment step. By adjusting the extent of the shading area of ​​the shading device in the preceding method step, the particle flow is influenced by the cross-sectional area, which leads to less surface attack orleads to a weaker surface modification and when the extent of the shading area is reduced, leads to a stronger surface attack or a stronger surface modification.

[0045] Preferably, the treatment carried out involves coating the substrates with a layer system consisting of a single layer or several successive single layers, which are coated one after the other onto the substrates in a time-ordered manner.

[0046] Preferably, this is an optical layer system consisting of alternating low-index and high-index individual layers. A low-index individual layer is a single layer made of a material with a refractive index of less than 1.6, determined at a reference wavelength of 550 nm, and a high-index individual layer is a single layer made of a material with a refractive index of greater than or equal to 1.6, determined at a reference wavelength of 550 nm.

[0047] By adjusting the extent of the shading area of ​​the shading device in the first method step, the particle flow, here in particular the flow of coating material, starting from a source through the cross-sectional area is influenced, which leads to a lower particle flow and thus to a reduction in the physical layer thickness of the respective individual layer deposited on the substrates when the extent of the shading area is increased, and which leads to a higher particle flow through the cross-sectional area and thus to an increase in the physical layer thickness of the respective individual layer deposited on the substrates when the extent of the shading area is reduced.

[0048] A further aspect comprises a method for operating a plant for treating substrates, the method comprising the following steps: - Configuring the system and setting the appropriate system parameters to carry out a treatment of substrates to obtain defined physical and / or chemical and / or mechanical target properties on substrates after treatment in the system, - Adjusting the extent of the shading area of ​​the shading device depending on the desired result of the treatment of the substrates, - Treating the substrates in the plant, - Determining actual physical and / or chemical and / or mechanical properties of the substrates, preferably determining actual physical and / or chemical and / or mechanical properties on a substrate of the substrates, particularly preferably determining actual optical properties on a substrate of the substrates, - Calculating a deviation between physical and / or chemical and / or mechanical target properties and the determined physical and / or chemical and / or mechanical actual properties, - Adjusting or, in particular, changing the extent of the shading area of ​​the shading device in a suitable manner to compensate for the deviation calculated in the previous step for a next process cycle.

[0049] The method is used to operate a system for treating substrates, which includes both a surface attack or surface modification of the surface of the substrates and the application of a coating to the surface of the substrates, provided that the result of the treatment is influenced by changing the extent of the shading surface of the shading device.

[0050] The treatment to be performed is not severely restricted, as it only needs to meet the requirement that the result of this treatment is influenced by changing the extent of the shading area of ​​the shading device. All types of treatment are conceivable here that have in common that they are based on a substantially directed particle stream, which originates from a source and passes through a cross-sectional area to the substrates to be treated. This particle stream is partially shaded by the cross-sectional area by the introduction of a shading device with a variable shading area.

[0051] The advantage of the method for operating a system is that, for a deviation determined during a first process cycle between the target properties to be obtained on the substrates as the objective of the treatment and the actual properties determined after the treatment, a correction or adjustment of the extent of the shading surface of the shading device takes place in order to achieve an optimized treatment in a next, second process cycle in which the determined deviation from a previous process cycle was taken into account in order to obtain a better treatment result, which is understood to mean a smaller deviation between the target and actual properties of the substrates.

[0052] The procedure is divided into individual steps, which are explained in more detail below.

[0053] In a first step, the system is configured for substrate treatment. This means that a corresponding process for treating substrates is programmed into the system. Depending on the treatment to be performed, this preferably means configuring the system to perform a treatment with predefined parameters, such as, in particular, the power of the plasma source for a plasma treatment. Depending on the system and source, this can include setting process parameters such as process gas flows, emission currents of an electron source or an electron-emitting filament, setting power values ​​for a radio-frequency generator for generating a plasma, and / or an accelerating voltage.

[0054] If the treatment to be performed involves applying a coating to substrates, this step involves setting the coating parameters for depositing the individual layer(s) or multiple consecutive individual layers on the system. In addition to parameters for the source(s) required for coating in the system, this particularly includes setting the physical layer thicknesses for the individual layers to be coated.

[0055] It is not particularly relevant for understanding, but it should be mentioned that the specialist can adjust a multitude of other parameters on a system depending on the type of treatment to be carried out.

[0056] In the next step, the shading area of ​​the shading device is adjusted. If no specific parameters are passed to this method step, such as, in particular, an empirically determined setting value for the extent of the shading area, the extent of the shading area is preferably set to a medium extent, i.e., to a value between the minimum and maximum extent. This advantageously allows the extent of the shading area to be corrected in both directions if necessary, i.e., the extent of the shading area can be both increased and decreased.

[0057] In a subsequent process step, the actual treatment of the substrates takes place in the system. The system sets the process parameters programmed in the first step, and the substrates are treated. This treatment is characterized in particular by the fact that during the treatment, a particle stream originating from a source flows through a cross-sectional area to the substrates arranged on the holding device. This particle stream is partially shaded by the shading device, whose shading surface is inserted into the cross-sectional area.

[0058] The treatment carried out is preferably a physical surface attack and / or a chemical surface modification and / or mechanical surface modification of the substrates with high-energy and / or reactive species. By means of such a treatment, the surface of the substrates is modified in order, for example, to clean the surface of the substrates or to activate the surface of the substrates in order to improve the adhesion properties of the surface for a subsequent treatment step. By adjusting the extent of the shading area of ​​the shading device in the preceding method step, the particle flow is influenced by the cross-sectional area, which, in other words, leads to less surface attack orleads to a weaker surface modification and when the extent of the shading area is reduced, leads to a stronger surface attack or a stronger surface modification.

[0059] Preferably, the treatment carried out involves coating the substrates with a layer system consisting of a single layer or several successive single layers which are deposited or coated one after the other on the surface of the substrates in a time-ordered manner.

[0060] Preferably, this is an optical layer system consisting of alternating low-index and high-index individual layers. A low-index individual layer is a single layer made of a material with a refractive index of less than 1.6, determined at a reference wavelength of 550 nm, and a high-index individual layer is a single layer made of a material with a refractive index of greater than or equal to 1.6, determined at a reference wavelength of 550 nm.

[0061] By adjusting the extent of the shading area of ​​the shading device in the previous method step, the particle flow, here in particular the flow of coating material, starting from a source through the cross-sectional area is influenced, which, when the extent of the shading area is increased, leads to a lower particle flow and thus to a reduction in the physical layer thickness of the respective individual layer deposited on the substrates, and which, when the extent of the shading area is reduced, leads to a higher particle flow through the cross-sectional area and thus to an increase in the physical layer thickness of the respective individual layer deposited on the substrates.

[0062] In a subsequent process step, the actual physical and / or chemical and / or mechanical properties of the substrates are determined. Depending on the treatment performed, the expert selects a suitable measurement or determination method to determine the actual physical and / or chemical and / or mechanical properties of the substrates.

[0063] Preferably, the actual properties are not determined for all substrates arranged on the holding device of the treatment system, but rather only for a selection of substrates, in particular for one substrate. For reasons of cost and time savings, the determination is advantageously performed only on a selection of substrates.

[0064] Preferably, the holding device has several rows or columns or, particularly in the case of a hemispherical holding device, several rings with corresponding holding elements in which substrates can be arranged. In this case, it is expedient to select a substrate from each row or column or ring, on which the actual properties are determined as representative of the respective row or column or ring.

[0065] Depending on the treatment carried out, this may include, for example, the determination of a surface energy, a transmission or reflection spectrum, the stack height of the deposited coating determined by surface profilometry or otherwise, such as interferometrically according to the Tolansky method, and / or the determination of color values ​​of the coating in a color space, such as the CIE Lab color space.

[0066] The deviation between the measured actual properties and the target properties to be achieved during treatment is then calculated. The specialist selects a suitable method to calculate the deviation.

[0067] According to the calculated deviation, the extent of the shading area of ​​the shading device in the system is then adjusted, i.e. the extent of the shading area is set to a new value.

[0068] Preferably, the deviation can be directly correlated with a desired dimension of the shading area. Advantageously, the correction can thus be performed not only phenomenologically and qualitatively, i.e., it can only determine whether the particle flow should be increased, i.e., the shading area of ​​the shading device should be reduced, or whether the particle flow should be reduced, i.e., the shading area of ​​the shading device should be increased, but also determine the setting value by which the dimension of the shading area should be adjusted.

[0069] This adjustment represents an optimization loop. Based on the deviation determined from a previous process cycle, a correction can be made, which specifically involves optimizing the desired result of the substrate treatment. Using this correction from the deviation determined in a previous process cycle, an attempt is made to optimize the treatment result for the next process cycle by specifically changing or correcting the extent of the shading area.

[0070] In other words, this adjustment ensures that, for the next process cycle with a new number of substrates, a corresponding correction of the extent of the shading surface of the shading device is made based on the deviation determined in a previous process cycle, in order to continuously optimize the desired result of the substrate treatment, i.e., from process cycle to process cycle. In the optimal case, the determined deviation is so small that no change in the extent of the shading surface of the shading device is necessary.

[0071] Preferred embodiments are described below in the figures. They show: - Fig. 1 shows an embodiment of a shading device 1, the shading surface 10 of which consists of a stationary part 100 and a movable part 101 with respect to the stationary part, - Fig.2 an embodiment of a plant 2 for the treatment of substrates 30, - Fig. 3 shows a further embodiment of a shading device 1, the shading surface 10 of which consists of a stationary part 100 and two parts 101a, 101b that are movable relative to the stationary part, - Fig. 4 shows a further embodiment of a shading device 1, the shading surface 10 of which consists of a stationary part 100 and two parts 101a, 101b that are movable relative to the stationary part, the movable parts 101a, 101b having an adapted edge geometry 103, - Fig. 5 a schematic drawing of a process for treating substrates 30, - Fig. 6 a schematic drawing of a method for operating a plant 2 for treating substrates, - Fig.7 a comparison between desired properties of the result of a treatment (solid line), in this embodiment a reflection spectrum, and actual properties of the result of a treatment (dashed line), in this embodiment also a reflection spectrum.

[0072] Fig. 1 shows an embodiment of a shading device 1 for a system 2, which has a shading surface 10 comprising a stationary part 100 and a part 101 that is movable relative to the stationary part. The shading surface 10 is changed by the relative movement of the movable part 101 relative to the stationary part 100. This movement can be performed either manually by mechanical displacement or automatically by an actuator, hydraulically, pneumatically, or electrically.

[0073] Fig.2 shows an embodiment of a system 2 for treating substrates 30 that can be arranged on a holding device 20. A shading device 1 is mounted in the system. A preferred mounting position for such a shading device 1 is in a plane 21 that is mounted between a holding device 20, on which the substrates 30 to be treated can be arranged, and at least one source 25. A preferred mounting position is characterized in that the shading surface 10 of the shading device 1 at least partially interrupts the particle flow that originates from at least one source 25 to the substrates 30 that can be arranged on the holding device 20, through a cross-sectional area 22 spanned by the intersection points of the direct connecting lines 23 from a source 25 to the substrates 30.The shading device 1 is screwed to a holding element 29 of the system 2 by means of a screw as the preferred fastening means 28.

[0074] Fig.Figure 3 shows a further embodiment of a shading device 1, in which the shading surface 10 is formed from exactly two movable parts 101a, 101b and one stationary part 100. The two movable parts 101a, 101b are movable relative to the stationary part 100, and the extent of the shading surface 10 of the shading device 1 is changed by the relative movement of either one or both movable parts 101a, 101b. This relative movement occurs mechanically by manually moving one of the two or both movable parts 101a, 101b of the shading device 1 relative to the stationary part 100, or it occurs pneumatically and / or hydraulically and / or electrically by means of an actuator 14.Preferably, the shading device 1 is screwed to a holding element 29 of the system 2 by means of a screw as the preferred fastening means 28, which is guided through the fastening opening 102 of the shading device 1.

[0075] Fig.Figure 4 shows a further embodiment of a shading device 1, in which the movable parts 101a, 101b have an edge geometry 103, which, starting from a rectangular shape, shown here as a dotted line, has been adapted to achieve a more homogeneous treatment on the substrates 30 that can be arranged on the holding device 20. Depending on their position on the holding device 20, the substrates 30 have different distances from a source 25 and would thus experience different exposure, particularly in the case of a holding device rotating during treatment. By appropriately adapting the edge geometry 103, the degree of shading of the shading device 1 can be adapted accordingly to the position of the substrates.

[0076] A process for treating substrates 30 in a plant 2 is described in Fig.5 shown schematically. The method consists of a first method step S102, which comprises adjusting the extent of the shading surface 10 of the shading device 1. Subsequently, as a second method step S104, the substrates 30 are treated. This can be a treatment in the sense of a surface treatment, i.e. a surface modification by energetic and / or reactive species, or a treatment which is characterized in that, after the treatment has taken place, a single layer and / or a plurality of successive single layers have been deposited, coated or applied to the substrates 30. The method is characterized in that the result of the treatment of the substrates 30 is influenced by changing the extent of the shading surface 10 of the shading device 1.

[0077] In Fig.Figure 6 schematically illustrates a method for operating a system for treating substrates. Within the method, a corrective treatment process is implemented in which, as the final step of each process cycle, a deviation from a target value is calculated. Based on this, a correction is determined, which is then taken into account for the next process cycle.

[0078] In Fig.Figure 7 shows an embodiment of a method for a corrective treatment process. Shown are the expected target properties as a result of a treatment of a substrate, which in this embodiment comprises providing substrates with an anti-reflective coating. Therefore, the target properties as a result of the treatment consequently represent a target reflection spectrum (solid line, designated "Target"). For comparison, an actual reflection spectrum (dashed line, designated "Run 1") is shown, which represents the actual properties obtained as a result of the treatment. The calculated deviation between the target and actual reflection spectrum is used as a correction value and is taken into account to adjust the extent of the shading device for a subsequent process cycle.

[0079] The following describes the method for operating a plant for treating substrates, in particular with reference to the Fig. 6 and Fig. 7. In the present case, the treatment comprises coating the substrates 30 with an anti-reflective coating, ie, with an optical multilayer coating system that imparts reduced reflectivity to the substrates 30, ie, the result of the treatment is providing the substrates 30 with an anti-reflective coating, which can be determined by recording a reflection spectrum.

[0080] System 2 is a vacuum coating system (Leybold-Bühler Model 904) with a hemispherical holding device 20, on which substrates 30 can be placed in holding elements arranged in five rings around the center of the holding device. System 2 is equipped with a shading device 1, which is mounted in system 2 such that the variable shading surface 10 of the shading device 1 is located in the cross-sectional area 22 and partially shades the particle stream. The substrates 30 are plastic spectacle lenses with a refractive index of 1.598 determined at a reference wavelength of 550 nm.

[0081] It may be advantageous to provide the plastic substrates 30 with a scratch-resistant layer before applying a coating. Those skilled in the art will know suitable means and methods for applying such a scratch-resistant layer. It may also be advantageous to activate the surface of the substrates 30 by plasma treatment prior to the actual coating in order to improve the adhesion of the subsequent anti-reflective coating to the substrates 30. Here, too, those skilled in the art will know the appropriate setting values ​​for performing such a plasma treatment in a system 2.

[0082] The anti-reflective coating to be applied during the treatment consists of two alternating, consecutive high- and low-refractive-index layers. The high-refractive-index layers consist of Ta2O5 and have a refractive index of 2.018, determined at a reference wavelength of 550 nm. The low-refractive-index layers consist of SiO2 and have a refractive index of 1.460, determined at a reference wavelength of 550 nm. Both the high- and low-refractive-index layers are applied by electron beam evaporation. For this purpose, coating material is placed in a corresponding receiving element in system 2, which is then evaporated by an electron beam provided by an electron beam source 25.Evaporating material leaves source 25 and reaches the substrates 30 arranged on the holding device 20 for treatment via cross-sectional area 22. Furthermore, system 2 has a plasma source 25, with which a plasma can be generated. While the low-refractive individual layers are coated conventionally, i.e., without the presence of a plasma, the high-refractive individual layers are coated in the presence of an argon-oxygen plasma.

[0083] As the final and outermost layer of the coating, a hydrophobic and / or oleophobic care layer is applied, which imparts a dirt-repellent effect to the substrates 30, coupled with improved cleanability. This care layer is coated using a thermal evaporator as a further source 25, in which a corresponding coating material is evaporated by introducing a high electric current and the electrical heat output, which decreases with the electrical resistance. Evaporation of the coating material of the care layer using an electron beam is not possible, since the care layer consists primarily of fluorine-containing molecular chains, which would dissociate upon application of an electron beam.

[0084] The coating structure is shown in Table 1. The table should be read as follows: starting with a substrate 30 to be coated, the individual layers are successively coated as shown in the table. The first individual layer consisting of Ta2O5, referred to as the first high-index layer, is therefore the first individual layer to be coated onto the substrates 30 during the treatment. Table 1: Structure of a coating to obtain a reflection-reducing plastic substrate Designation material Refractive index n at wavelength 550 nm Physical layer thickness in nm First high-index layer Ta2O5 2,018 12 First breaking layer SiO2 1,460 18 Second high-index layer Ta2O5 2,018 115 Second precipitating layer SiO2 1,460 80 Care shift Fluorine-containing substance 1,299 8

[0085] For this purpose, in a first step S100, the coating sequence shown in Table 1 was programmed into system 2. For this purpose, a coating process was programmed on system 2, which coats the substrates 30 with a Ta2O5 layer with a physical layer thickness of 12 nm Ta2O5 as the first layer. This is followed by an SiO2 layer with a physical layer thickness of 18 nm. This is followed by another high-index Ta2O5 layer with a physical layer thickness of 115 nm and then an SiO2 layer with a physical layer thickness of 80 nm. Finally, a maintenance layer with a physical layer thickness of 8 nm is applied.

[0086] System-specific parameters, such as the respective parameters for operating the individual sources (electron beam source, plasma source, thermal evaporator), are deliberately omitted here, as they explicitly depend on the respective installed units and do not contribute to a further understanding of the invention. A person skilled in the art will be familiar with typical setting values ​​or can obtain appropriate information if unfamiliar with them.

[0087] In a next method step S102, the extent of the shading surface 10 of the shading device 1 was set to a medium value, ie to a value that lies midway between the minimum extent and the maximum extent.

[0088] Subsequently, the substrates 30 to be coated were arranged on the holding device 20 of the system 2 and, as the next process step S104, the coating was started with the coating process programmed in the first process step S100 to carry out a treatment of the substrates 30 on the system 2.

[0089] After coating, a substrate was selected in the next process step S106, from which a reflection spectrum of the coated substrate was recorded using a spectrometer (PerkinElmer Lambda 1050) in a wavelength interval between 300 and 800 nm. This is shown in Fig. 7 is shown as a dashed line labeled “Run 1”.

[0090] The recorded reflection spectrum, i.e. the actual properties of the substrate, was first compared with the desired reflection spectrum, i.e. the target properties. The target properties are shown as a solid line labeled "Target" in Fig. 7. It was evident that the optical layer system applied to the substrates 30 was shifted into the long-wavelength range, i.e., toward longer wavelengths. Consequently, the size of the shading surface 10 had to be increased for correction in order to achieve greater shading.

[0091] To determine the difference between the target and actual properties in process step S108, the positions of the local maximum in the wavelength interval between 480 and 540 nm were compared between the target and actual properties. The target reflection curve exhibits a local maximum with a reflection value of approximately 0.86% at a wavelength of approximately 496 nm. The actual reflection curve, on the other hand, exhibits a local maximum with a reflection value of approximately 0.86% at a wavelength of approximately 506 nm. The position of the local reflection maximum of the actual reflection curve is therefore shifted by 2% with respect to the target reflection curve, based on the respective wavelength values ​​of the local maximum in the corresponding reflection curves.

[0092] In accordance with the determined deviation, the extent of the shading surface 10 of the shading device 1 in the system 2 was then adjusted as a correction for a subsequent process cycle in the next step S102. Since the shading surface in the specific example had an extent of approximately 20 cm, the extent was adjusted accordingly and increased by approximately 2%, which roughly corresponded to an increase in the extent of the shading surface 10 by approximately 0.5 cm.

[0093] By appropriately correcting the extent of the shading surface 10 of the shading device 1, a correction, i.e., a corrective measure, is determined from the deviation S108, i.e., an error, determined in a previous process cycle. This correction, i.e., a corrective measure, is established in step S102. This correction leads to an optimized, i.e., improved, treatment of the substrates in the next process cycle. In this way, an optimized treatment process is implemented.

Claims

[1] Shading device (1) comprising a shading surface (10) for a system (2) for treating substrates (30), wherein the system (2) comprises: - a holding device (20) for arranging substrates (20) to be treated, - at least one source (25), - a plane (21) mounted between the at least one source (25) and the substrates (30) arranged on the holding device (20) for treatment, - a cross-sectional area (22) spanned by the intersection points of the plane (21) with the direct connecting lines (23) emanating from the at least one source (25) to the substrates (30) arranged on the holding device, wherein the shading device (1) is mounted in the plane (21) between the holding device (20), on which the substrates (30) to be treated can be arranged, and the at least one source (25), and that the shading surface (10) of the shading device (1) partially interrupts the particle flow emanating from the at least one source (25) through the cross-sectional area (22), wherein the shading surface (10) is continuously variable with regard to its extent and wherein the shading surface (10) has an immovable part (100) and at least one part (101) that is movable with respect to the immovable part, and in that the extent of the shading surface can be changed by relative movement of the at least one movable part (101) with respect to the immovable part (100). [2] Shading device (1) according to claim 1, wherein the shading surface (10) has in particular exactly two movable parts (101a, 101b). [3] Shading device (1) according to claim 2, wherein the extent of the shading surface (10) is variable by relative movement of either both or only one of the two movable parts (101a, 101b). [4] Shading device (1) according to one of the preceding claims, wherein the relative movement is effected hydraulically, pneumatically or electrically by means of an actuator (14). [5] Shading device (1) according to one of the preceding claims, wherein the immovable part (100) forming the shading surface (10) and / or the movable parts (101, 101a, 101b) forming the shading surface have an edge geometry (103) which is designed to compensate for differences in distance between the substrates (30) which can be arranged on the holding device (20) and the at least one source (25) in a suitable manner, with the aim of obtaining the most homogeneous treatment possible on all substrates (30) which can be arranged on the holding device (20). [6] Plant (2) with a shading device (1) according to one of the preceding claims, wherein the at least one source (25) is an electron beam gun for electron beam-assisted physical vapor deposition, a thermal evaporator, a chemical vapor deposition, molecular beam epitaxy, a sputtering source, in particular a sputtering source in conjunction with a particle stream, a source for ion beam-assisted deposition, or that this source is a plasma source or a source of another nature for emitting energetic and / or reactive species, suitable for carrying out a physical surface attack and / or a chemical surface modification and / or mechanical surface modification. [7] System (2) according to claim 6, wherein the system (2) is a vacuum system for treating substrates and the extent of the shading surface (10) of the shading device (1) is also variable under vacuum. [8] System (2) according to one of claims 6 or 7, wherein the substrates (30) are optical elements, in particular optical lenses. [9] Method for treating substrates (30) in a plant (2) according to one of claims 6 to 8, comprising the following steps: - adjusting (S102) the extent of the shading surface (10) of the shading device (1) depending on the result to be achieved from the treatment of the substrates (30), - treating (S104) the substrates (30) in the system (2), wherein the result of the treatment of the substrates (30) is influenced by changing the extent of the shading surface (10) of the shading device (1). [10] The method according to claim 9, wherein the method step of treating (S104) the substrates (30) comprises a physical surface attack and / or a chemical surface modification and / or mechanical surface modification of the substrates (30) with energetic and / or reactive species. [11] Method for operating a plant (2) for treating substrates (30) according to a method according to one of claims 9 or 10, comprising the following steps: - Configuring (S100) the system (2) and setting corresponding system parameters for carrying out a treatment of substrates (30) to obtain defined physical and / or chemical and / or mechanical target properties on substrates (30) after treatment in the system (2), - adjusting (S102) the extent of the shading surface (10) of the shading device (1) depending on the result to be achieved from the treatment of the substrates (30), - treating (S104) the substrates (30) in the plant (2), - determining (S106) actual physical and / or chemical and / or mechanical properties of the substrates (30), preferably determining actual physical and / or chemical and / or mechanical properties on a substrate of the substrates (30), particularly preferably determining actual optical properties on a substrate of the substrates (30), - Calculating (S108) a deviation between physical and / or chemical and / or mechanical target properties and the determined physical and / or chemical and / or mechanical actual properties, - Adjusting or in particular changing (S102) the extent of the shading surface (10) of the shading device (1) in a suitable manner to compensate for the deviation calculated in step (S108) for a next process cycle.

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