Cleaning chamber and method for cleaning components, in particular components of projection lighting systems, using the cleaning chamber

Abstract

The present invention relates to a cleaning chamber for cleaning components (4), in particular components of projection exposure systems, and a cleaning method with a housing (2) which is gas-tight and defines an interior space (3) for arranging at least one component (4) to be cleaned, wherein the cleaning chamber (1) further comprises at least one extraction device (5) for evacuating the interior space (3) of the housing (2) and at least one heating device (6, 7, 19) for heating the at least one component to be cleaned, wherein the cleaning chamber further comprises at least one gas supply device (8) and at least one gas inlet (10), wherein the gas supply device (8) is arranged outside the housing (2) and is thus connected to the at least one gas inlet (10) which is arranged on the housing.that gas supplied by the gas supply device (8) can be introduced into the interior (3) of the housing (2) via the at least one gas inlet (10), , wherein the cleaning chamber (1) comprises at least one gas outlet (14) on the housing (2) through which gas can be discharged from the housing (2), and wherein the cleaning chamber further comprises at least one compressor module (9) which is connected to the at least one gas inlet (10) and the at least one gas outlet (14) so ​​that gas discharged through the gas outlet (14) can be recirculated and circulated and can be supplied again at a minimum flow velocity at the gas inlet (10) and introduced into the interior (3) to form a defined gas convection in the interior (3).

Description

BACKGROUND OF THE INVENTION FIELD OF THE INVENTION

[0001] The present invention relates to a cleaning chamber for cleaning components, in particular components of projection exposure systems for microlithography, and to a method for cleaning components, in particular components of projection exposure systems for microlithography. STATE OF THE ART

[0002] In the manufacture of projection exposure systems for microlithography, and in particular EUV projection exposure systems that operate with extreme ultraviolet light (EUV light), components must be manufactured and assembled that meet the highest purity requirements, since even the slightest contamination can cause a significant impairment of the function of the corresponding component and / or damage to the component during operation.

[0003] Accordingly, it is already known to clean such components, for example by heating them in an ultra-high vacuum, so that contaminants, such as organic compounds or the like, evaporate from the component to be cleaned.

[0004] However, in bake-out processes for the dry cleaning of components in vacuum degassing systems, the heating rate of the components can be limited by the slow heat transfer under vacuum conditions, meaning that a corresponding cleaning process can be very complex due to the long process times. Even if heating is carried out in an inert gas atmosphere, heat transfer is limited due to the low gas movement. Accordingly, it is difficult to set a defined temperature profile during heating. However, fans for improved gas movement have critical disadvantages, as drives are usually not suitable for ultra-high vacuum or the high temperatures in the relevant temperature range of 45 to 250°C, and drives located outside the cleaning chamber carry the risk of leaks at the rotary union.In addition, mechanical movements can create particles through friction that are counterproductive to the cleaning purpose, making fans unsuitable. DISCLOSURE OF THE INVENTION OBJECT OF THE INVENTION

[0005] It is therefore an object of the present invention to provide a cleaning chamber and a method for cleaning components, particularly of projection exposure systems, which avoid the disadvantages of the prior art, such as long processing times and problems with cleaning due to particle generation and leaks. In particular, a cleaning chamber and a cleaning method are to be provided that enable efficient and effective cleaning of components for use in projection exposure systems with the shortest possible processing times. TECHNICAL SOLUTION

[0006] This object is achieved with a cleaning chamber having the features of claim 1 and a method for cleaning having the features of claim 14. Advantageous embodiments of the invention are the subject of the dependent claims.

[0007] The invention proposes a cleaning chamber and a cleaning method with a corresponding cleaning chamber, in which the cleaning chamber has a housing that defines an interior space corresponding to the cleaning space and can accordingly accommodate the component to be cleaned. According to the invention, gas convection is effected in the cleaning space or interior space of the housing without any moving parts being arranged in the interior or cleaning space, so that, on the one hand, heat transfer is improved and, on the other hand, particle generation due to mechanical movement or corresponding leaks due to additional housing penetrations are avoided. Accordingly, a gas circulation system is realized without any moving parts inside the process plant.

[0008] Accordingly, the cleaning chamber for cleaning components, in particular components of projection exposure systems, has a housing that can be closed in a gas-tight manner and defines an interior space that serves to accommodate at least one component to be cleaned. The cleaning chamber further has at least one suction device for evacuating the interior space of the housing and at least one heating device for heating the at least one component to be cleaned, wherein the cleaning chamber further comprises at least one gas supply device and at least one gas inlet. The gas supply device is arranged outside the housing and is connected to the gas inlet arranged on the housing in such a way that gas provided by the gas supply device can be introduced into the interior space of the housing via the gas inlet.

[0009] Accordingly, the cleaning chamber comprises at least one gas outlet on the housing through which gas can be discharged from the housing, as well as at least one compressor module that is connected to at least one gas inlet and the at least one gas outlet, so that gas discharged from the interior via the gas outlet can be circulated and recirculated and can be made available again at a minimum flow rate at the gas inlet and introduced into the interior to form defined gas convection in the interior. Gas convection is ensured by the minimum flow rate. Accordingly, the advantageous gas convection in the interior can be achieved with the compressor module acting as a circulating device, independently of the gas supply device or in combination with it.This allows the circulation function to be used even without a net gas inlet from outside into the chamber, maintaining a constant gas volume in the chamber. For example, gas can be introduced into the chamber for a short period of a few minutes to set a defined pressure, e.g., 800 mbar. After that, the net gas supply can be stopped, while the heating phase can continue to be accompanied by gas circulation over a significantly longer period, e.g., several hours.

[0010] This saves space, as no additional components need to be installed in the interior or cleaning chamber. Furthermore, the gas supply system can be flexibly mounted on small or large systems. Time is saved in the cleaning process through improved temperature transfer. This also enables homogeneous heating of components and rapid, even heating of the component to be cleaned, as well as minimizing temperature gradients on the component to be cleaned. The risk of particle ingress due to friction between mechanical components is eliminated, and there is no risk of leaks through mechanical feedthroughs, thus improving the reliability of the cleaning chamber. Furthermore, electrical drives inside the chamber are no longer required.

[0011] Accordingly, the at least one compressor module can be coupled to the gas supply device so that gas can be provided to the gas supply device and from the gas outlet at the minimum flow rate at the gas inlet, wherein the compressor module can preferably comprise at least one diaphragm pump or particle-free pump, such as a dry-running vacuum backing pump.

[0012] The at least one gas inlet and the housing as well as the at least one heating device can be designed such that the gas flow is guided past the at least one heating device, so that heat transfer is promoted.

[0013] The flow through at least one gas inlet can be adjusted in the range of 100 - 1000 slm (standard liters per minute).

[0014] The cleaning chamber can have multiple gas inlets on the housing, each of which is connected either via the at least one compressor module to the at least one gas outlet and / or to the gas supply device, allowing gas to be introduced into the interior for the first time and / or circulated, allowing the gas extracted from the interior via the outlet to be recirculated into the interior via the gas inlet. This ensures reliable convection without the need for constant replenishment of new gas.

[0015] The cleaning chamber can have multiple gas inlets and / or gas outlets, particularly along a gas flow path along which gas convection occurs. A shut-off valve for gas-tight sealing can be arranged at each gas inlet and / or gas outlet. Multiple gas inlets and / or gas outlets can ensure homogeneous gas distribution and convection.

[0016] The at least one gas supply device and / or the compressor module and / or the at least one gas inlet can comprise at least one gas heating device for preheating the gas delivered to or from the gas inlet. The gas heating device can also form the heating device for heating the component to be cleaned, so that heating is carried out only with the preheated gas, eliminating the need for additional heating devices in the interior or on the housing.

[0017] The at least one gas supply device and / or the at least one compressor module and / or the at least one gas inlet can comprise at least one particle filter and / or at least one gas purification system, so that the gas released into the interior via the gas inlet can be purified beforehand. In particular, the particle filter can be a diffuser filter and / or the gas purification system can comprise zeolites or activated carbon. The additional filtration and / or purification of the gas can achieve an additional purification effect. This also reduces the need for particle purification during system preparation, thus enabling further time savings.

[0018] The at least one gas supply device and / or the at least one compressor module can be detachably connected to the gas inlet and / or housing or a gas outlet arranged thereon via flange connections, so that flexible use is possible.

[0019] The at least one gas inlet can have a nozzle for adjusting a gas flow, wherein in particular the gas inlet and / or the nozzle can be movable and / or deformable and in particular can be pivotally mounted about at least one, preferably multiple, axes, so that the gas inlet and / or nozzle can discharge the gas in many different directions. Preferably, the at least one gas inlet and / or the nozzle can each comprise one or more drives or actuators for adjustment, so that automatic adjustment is possible, for example, via a central control and / or regulating device.

[0020] The interior of the housing can have a cylindrical or spherical segment shape and / or the housing delimiting the interior can be curved and / or round in cross-section, in particular circular or oval, wherein the at least one gas inlet can be designed and / or arranged such that the gas flowing through the gas inlet into the interior flows into the housing tangentially to the latter and / or forms a particularly laminar or turbulent gas flow along the housing.

[0021] The at least one heating device can comprise one or more radiant heaters, which are preferably arranged distributed on the housing, and / or a wall heater, in particular a resistance heater or continuous heater on or in the housing.

[0022] The suction device, which can be designed independently of the at least one gas outlet, can comprise a vacuum generating device with which a vacuum, in particular an ultra-high vacuum, can be generated in the interior of the housing.

[0023] The cleaning chamber can comprise one or more sensors with which in particular the temperature and / or the gas flow and / or the pressure in the interior can be detected, and / or a control and / or regulating device with which the at least one heating device and / or extraction device and / or gas supply device and / or compressor module (9) can be controlled in particular as a function of the measurement results of the sensors.

[0024] The method for cleaning components, in particular components of projection exposure systems, preferably provides for the use of the cleaning chamber described above. According to the method, after the component to be cleaned has been arranged in the interior of the cleaning chamber, the chamber is evacuated using the suction device, and the component to be cleaned is heated. In particular, before and / or at least partially during the heating of the component to be cleaned, gas provided by the gas supply device is introduced into the interior of the housing via the gas inlet. The gas at the gas inlet preferably flows into the interior at a minimum flow rate above a defined limit, so that defined gas convection takes place in the interior.

[0025] The gas is discharged from the housing via a gas outlet on the housing, which is connected to the compressor module. The compressor module is connected to the gas inlet, so that gas discharged via the gas outlet is at least partially circulated and recirculated, either quantitatively or temporally, and is then made available again at a minimum flow rate at the gas inlet and introduced into the interior to form defined gas convection within the interior. The gas is thus at least partially circulated, in which the gas is repeatedly introduced into and discharged from the interior, whereby gas convection can be maintained even without further gas supply.

[0026] Gas convection can take place continuously or discontinuously during heating, whereby the gas flow can be controlled in particular depending on the temperature of the component to be cleaned or in the interior of the housing.

[0027] The gas introduced into the interior of the housing can be filtered and / or cleaned and / or preheated and / or the gas can be passed past the at least one heating device in a laminar or turbulent flow.

[0028] The method can be carried out in such a way that in a first step the component to be cleaned is arranged in the interior of the housing, in a second step the interior is evacuated, in a third step the component to be cleaned is heated; in a fourth step gas is introduced into the interior, wherein in particular the third step and the fourth step can take place at least partially simultaneously and / or in reverse order, and wherein in a fifth step after a certain component or interior temperature has been reached the gas introduction is stopped and in a sixth step the interior is evacuated, preferably to a high or ultra-high vacuum. The gas introduction can also be stopped during or before the third step as soon as the desired pressure in the interior is reached.Accordingly, it is possible to continuously introduce gas into the interior during the entire heating of the component to be cleaned, either from the gas supply system and / or in a circuit from the interior and back into it, or to introduce only a specific amount of gas into the interior before or during the heating of the component to be cleaned. Furthermore, it is also possible to circulate gas out of the interior and back into the interior, at least partially or during the entire heating of the component to be cleaned.

[0029] The third to sixth steps can be repeated, especially for different component or interior temperatures.

[0030] An inert gas such as nitrogen, helium, neon, or argon can be used. The component or interior temperature can be adjusted between 45 and 250°C. BRIEF DESCRIPTION OF THE CHARACTERS

[0031] The attached drawings show in a purely schematic manner in Fig. 1 a sectional view of a first embodiment of a cleaning chamber according to the invention, Fig. 2 a sectional view of a second embodiment of a cleaning chamber according to the invention, Fig. 3 a sectional view of a third embodiment of a cleaning chamber according to the invention, Fig. 4 is a sectional view of a fourth embodiment of a cleaning chamber according to the invention, and in Fig. 5 a flow diagram of a cleaning method according to the invention. EXAMPLES OF IMPLEMENTATION

[0032] Further advantages, characteristics, and features of the present invention will become apparent from the following detailed description of the embodiments. However, the invention is not limited to these embodiments.

[0033] The Fig. 1 shows a first embodiment of a cleaning chamber 1 according to the invention, comprising a housing 2 with a circular cross-section, which defines an interior 3 for accommodating a component 4 to be cleaned. The cleaning chamber 1 further comprises an extraction device in the form of a vacuum generation device 5, with which a high vacuum and in particular an ultra-high vacuum can be generated in the interior 3 of the housing 2. Furthermore, the cleaning chamber 1 comprises, within the housing 2, radiant heaters 6, such as infrared radiators, which are distributed along the housing 2 in the interior 3 of the cleaning chamber 1. In addition to the radiant heaters 6, a wall heater 7 is provided, which is accommodated in the wall of the housing 2.The wall heating 7 can be realized by an electrical resistance heater or a flow-through heater, in which, for example, a liquid or gaseous heating medium flows through a channel in the housing 2 or an intermediate space of the double-walled housing 2.

[0034] The cleaning chamber 1 further comprises a gas supply device 8, which provides an inert gas, such as nitrogen or argon, and a compressor module 9, which compresses or pumps the gas provided by the gas supply device 8 in order to discharge it through the gas inlet 10 into the interior 3 of the housing 2 of the cleaning chamber 1. The compressor module 9 ensures that the gas passes through the gas inlet 10 into the interior 3 of the cleaning chamber 1 at a minimum flow rate, so that appropriate gas convection can be achieved in the interior 3 of the housing 2.

[0035] The gas inlet 10 is detachably arranged on the compressor module 9, such as via a flange connection, and has a shut-off valve 13 so that the gas inlet 10 can be sealed gas-tight.

[0036] The gas inlet 10, which is essentially designed as a conduit or pipe through the wall of the housing 2, has a nozzle 11 at the end located in the interior space 3 to enable the formation of a defined gas flow with a specific cross-sectional shape. Furthermore, the gas inlet 10 has a particle filter 20 and / or a gas purification system 12, for example, a molecular sieve with zeolites, to remove particles and / or other contaminants, such as organic molecules, from the gas being introduced.

[0037] As in the Fig. 1, the gas inlet 10 is arranged such that the gas flow flows tangentially to the circular cross-section of the housing 2 into the interior 3 of the cleaning chamber 1 and gas convection is generated according to the arrow shown along the inner wall of the housing 2 and past the radiant heaters 6 and along the wall heater 7.

[0038] In the illustrated embodiment of the Fig. 1, a gas outlet 14 is provided, which is also detachably connected to the compressor module 9, wherein a shut-off valve 15 is again arranged between the compressor module 9 and the gas outlet 14 in order to be able to seal the gas outlet 14 in a gas-tight manner. The gas located in the interior 3 of the housing 2 of the cleaning chamber 1 can be discharged from the latter via the gas outlet 14. The connection to the compressor module 9 or a corresponding pump, such as a dry-running vacuum backing pump or a diaphragm pump, allows the gas to be circulated through the interior 3 of the cleaning chamber 1, so that the gas escaping from the gas inlet 10 via the nozzle 11, after passing the heating device with the radiant heaters 6 and the wall heater 7, is sucked back into the compressor module 9 and then released from there via the gas inlet 10 back into the interior 3.This enables rapid and homogeneous heating of the component 4 to be cleaned.

[0039] Gas convection via the particle-free pumping device of the compressor module 9, located outside the interior 2, can be maintained continuously or discontinuously throughout the entire heating process for the component 4 to be cleaned. Gas convection ensures homogeneous and rapid heating of the component 4 to be cleaned, while simultaneously avoiding additional particle sources caused by moving mechanical parts in the interior or possible leaks caused by additional penetrations through the housing wall.

[0040] To control the gas supply device 8 and / or the compressor module 9, a control and / or regulating device 16 is provided, which is connected to the gas supply device 8 and / or the compressor module 9 via a signal and / or control line 17. In addition, as shown in the Fig. 1, additional sensors 18 may be arranged in the interior 3 to measure, for example, the temperature, pressure, or flow rate of the gas in the interior 3. Corresponding sensors may also be provided at the gas inlet 10 and / or gas outlet 14. Such sensors may also be connected to the control and / or regulating device 16 via signal and / or control lines.

[0041] The Fig. 2 shows a further embodiment of a cleaning chamber 1 according to the invention, wherein identical components are provided with identical reference numerals and are no longer described explicitly to avoid repetition. The second embodiment differs from the first embodiment in that the gas supply device 8 is provided separately from the compressor module 9, so that circulation of the gas in the interior 3 is possible independently of the gas supply device 8. Although operation with circulation of the gas in the interior 3 is also possible in the first embodiment without gas being supplied from the gas supply device 8 if a suitable valve is provided and closed between the gas supply device 8 and the compressor module 9, a structural separation is realized in the second embodiment.

[0042] The Fig. Figure 3 shows a further embodiment of a cleaning chamber 1 according to the invention. Like components are provided with identical reference numerals and will not be described explicitly to avoid repetition. The third embodiment differs from the first embodiment in that not only one gas supply device 8 with a gas inlet 10 and a gas outlet 14 is arranged in the cleaning chamber 1 on the housing 2, but three are distributed around the circumference of the housing 2.

[0043] Although each of the compressor modules 9 is shown with a gas supply device 8, it is actually also possible to use a central gas supply and to provide only corresponding compressor modules 9 and / or gas inlets and outlets 10, 14, as partially shown in Fig. 2 shown.

[0044] In addition, the design of the Fig. 3 exemplified by the compressor module 9, which is located in the left part of the Fig. 3, a gas preheating device 19 is shown, which can be implemented, for example, as a continuous-flow heater or the like. This allows fresh or repeatedly circulated gas to be preheated before entering the interior 3 of the housing 2 of the cleaning chamber 1, further contributing to rapid heating of the component 4 to be cleaned.

[0045] The Fig. Figure 4 shows a further embodiment of a cleaning chamber 1 according to the invention, in which the same components are provided with identical reference numerals and are not explicitly described again. The embodiment of the Fig. 4 differs from the design of the Fig. 3 in that the gas pre-heating device 19 is not shown and the gas inlets 10 are designed in such a way that the nozzle 11 and / or the entire gas inlet 10 are designed to be movable and / or deformable in order to be able to adapt the shape of the nozzle 11 and / or the inlet device of the gas into the interior 3. Thus, in the Fig. 4 left and upper gas inlets 10, that the nozzle 11 is pivotable about a rotation axis that is perpendicular to the image plane, so that the gas flow is directed more towards the center of the interior 3 in one case and more towards the inner wall of the housing 2 in the other case. At the gas inlet 10, which is located at the bottom right in the Fig. 4, a dashed representation of the gas inlet 10 also shows the pivoting of the entire gas inlet 10 about a rotational axis arranged perpendicular to the image plane. Of course, other rotational axes and other possibilities for deforming the gas inlet 10 and / or the nozzle 11 to influence the gas flow are also conceivable.

[0046] For the automatic adjustment of the gas inlet 10 and / or the nozzle 11, corresponding drives and / or actuators can be provided, which are not shown in detail.

[0047] The cleaning of the component 4 to be cleaned was now carried out in such a way that in a first step 21, as shown in the flow chart of the Fig. 5, the component 4 to be cleaned is arranged in the interior 3 of the housing 2. After the gas-tight sealing of the housing 2, in a second step 22 the interior 3 of the housing 2 can be evacuated by the suction device or the vacuum generation device 5 until a desired vacuum, such as a fine vacuum or high vacuum or ultra-high vacuum, is achieved. Thereafter, in a third step 23, the heating devices in the form of the infrared radiators 6 and the wall heater 7 can be operated to heat the component to be cleaned. At the same time, in a fourth step 24, gas can be introduced into the interior 3 of the housing 2 via the gas supply devices 8 and the gas inlets 10 in order to initiate gas convection according to the arrow shown in Fig.4 in order to accelerate and homogenize the heat transfer to the component 4 to be cleaned. Conversely, gas can also initially be introduced into the interior 3 in the fourth step 24 and, simultaneously or after a certain pressure has been reached, the heating or warming can take place in the third step 23. As soon as the desired interior temperature or component temperature, which can be detected, for example, by means of the sensor 18, has been reached, the gas introduction can be stopped in a fifth step 25 by switching off the compressor module 9 and / or closing the shut-off valves 13 and 15 of the gas supply devices 8 or the gas inlets and outlets 10, 14. Thereafter, in a sixth step 26, the interior 3 can be evacuated via the vacuum generation device 5 and the contaminants evaporating from the component 4 to be cleaned can be removed.

[0048] The fifth step 25, in which the gas introduction is stopped, can also take place before or during the third step 23 if no continuous gas supply is desired and the gas convection in the interior space 3 is achieved by circulation.

[0049] The third to sixth steps 23 to 26 can be repeated several times in combination and / or independently of one another, whereby different component or interior temperatures can be set, which can, for example, be increased gradually in order to gradually improve the cleaning performance or cleaning effect.

[0050] Although the present invention has been described in detail with reference to the exemplary embodiments, it will be understood by those skilled in the art that the invention is not limited to these exemplary embodiments, but rather that modifications are possible in such a way that individual features can be omitted or other combinations of features can be implemented without departing from the scope of the appended claims. In particular, the present disclosure includes all combinations of the individual features shown in the various exemplary embodiments, so that individual features that are described only in connection with one exemplary embodiment can also be used in other exemplary embodiments or in combinations of individual features not explicitly shown. LIST OF REFERENCE SYMBOLS 1 cleaning chamber 2 housings 3 Interior 4 component to be cleaned 5 Suction device, vacuum generation device 6 radiant heaters, infrared heaters 7 Wall heating 8 Gas supply facility 9 Compressor module, pump 10 Gas inlet 11 Nozzle 12 Gas cleaning plant 13 Shut-off valve 14 Gas outlet 15 Shut-off valve 16 Control and / or regulating device 17 Signal and / or control line 18 Sensor 19 Gas preheating 20 particle filters 21 first step 22 second step 23 third step 24 fourth step 25 fifth step 26 sixth step

Claims

[1] Cleaning chamber (1) for cleaning components (4), in particular components of projection exposure systems, comprising a housing (2) which can be closed in a gas-tight manner and which defines an interior space (3) which serves for the arrangement of at least one component (4) to be cleaned, wherein the cleaning chamber (1) further comprises at least one suction device (5) for evacuating the interior space (3) of the housing (2) and at least one heating device (6, 7, 19) for heating the at least one component to be cleaned, wherein the cleaning chamber further comprises at least one gas supply device (8) and at least one gas inlet (10), wherein the gas supply device (8) is arranged outside the housing (2) and is thus connected to the at least one gas inlet (10) arranged on the housing,that gas provided by the gas supply device (8) can be introduced into the interior (3) of the housing (2) via the at least one gas inlet (10), and wherein, the cleaning chamber (1) comprises at least one gas outlet (14) on the housing (2), via which gas can be discharged from the housing (2), characterized by , that the cleaning chamber further comprises at least one compressor module (9) which is connected to the at least one gas inlet (10) and the at least one gas outlet (14), so that gas discharged via the gas outlet (14) can be circulated and circulated and can be made available again at a minimum flow rate at the gas inlet (10) and introduced into the interior space (3) to form a defined gas convection in the interior space (3). [2] Cleaning chamber according to claim 1, characterized bythat the at least one compressor module (9) is coupled to the gas supply device (8) so that gas can be provided to the gas supply device (8) and / or from the gas outlet (14) at the minimum flow rate at the gas inlet (10), wherein the compressor module (9) preferably comprises at least one diaphragm pump or particle-free pump. [3] Cleaning chamber according to one of the preceding claims, characterized by that the at least one gas inlet (10) and the housing (2) as well as the at least one heating device (6, 7, 19) are designed such that the gas flow is guided past the at least one heating device [4] Cleaning chamber according to one of the preceding claims, characterized bythat the cleaning chamber has a plurality of gas inlets (10) on the housing (2), of which the individual gas inlet (10) is connected either via the at least one compressor module (9) to the at least one gas outlet (14) and / or to the gas supply device (8). [5] Cleaning chamber according to one of the preceding claims, characterized by that the cleaning chamber (1) has a plurality of gas inlets (10) and / or gas outlets (14), in particular along a gas flow path along which the gas convection takes place, wherein in particular a shut-off valve (13, 15) for gas-tight blocking is arranged at each gas inlet (10) and / or gas outlet (14). [6] Cleaning chamber according to one of the preceding claims, characterized by that the gas supply device (8) and / or the compressor module (9) and / or the gas inlet (10) comprises at least one gas heating device (19) for preheating the gas delivered to the gas inlet (10) or from it. [7] Cleaning chamber according to one of the preceding claims, characterized by that the gas supply device (8,) and / or the compressor module (9) and / or the gas inlet (10) comprise at least one particle filter (20) and / or at least one gas purification system (12), so that the gas released into the interior (3) via the gas inlet (10) can be cleaned beforehand, wherein in particular the particle filter (20) is a diffuser filter and / or the gas purification system (12) comprises zeolites or activated carbon. [8] Cleaning chamber according to one of the preceding claims, characterized by that the gas supply device (8) and / or the compressor module (9) is decoupleably connected to the gas inlet (10) and / or housing (2) or a gas outlet (14) arranged thereon, in particular via flange connections. [9] Cleaning chamber according to one of the preceding claims, characterized byin that the gas inlet (10) has a nozzle (11) for adjusting a gas flow, wherein in particular the gas inlet (10) and / or the nozzle (11) are movable and / or deformable and in particular are mounted so as to be pivotable about at least one, preferably about several axes, wherein preferably the gas inlet (10) and / or the nozzle (11) each comprise one or more drives or actuators for adjustment. [10] Cleaning chamber according to one of the preceding claims, characterized bythat the interior space (3) of the housing (2) has a cylindrical or spherical segment-shaped shape and / or the housing (2) delimiting the interior space (3) is curved and / or round in cross-section, in particular circular or oval, wherein the at least one gas inlet (10) is designed and / or arranged such that the gas flowing through the gas inlet (10) into the interior space (3) flows into the housing (2) tangentially to the latter and / or forms a particularly laminar or turbulent gas flow along the housing (2). [11] Cleaning chamber according to one of the preceding claims, characterized by that the at least one heating device comprises one or more radiant heaters (6), which are preferably arranged distributed on the housing (2), and / or a wall heater (7), in particular a resistance heater or continuous heater on or in the housing (2). [12] Cleaning chamber according to one of the preceding claims, characterized bythat the suction device (5) comprises a vacuum generating device with which a vacuum, in particular an ultra-high vacuum, can be generated in the interior (3) of the housing (2). [13] Cleaning chamber according to one of the preceding claims, characterized by that the cleaning chamber (1) comprises one or more sensors (18) with which in particular the temperature and / or the gas flow and / or the pressure in the interior (3) are detected, and / or a control and / or regulating device (16) with which the at least one heating device (6, 7, 19) and / or suction device (5) and / or gas supply device (8) and / or compressor module (9) are controlled. [14] A method for cleaning components, in particular components of projection exposure systems, preferably using the cleaning chamber (1) according to one of the preceding claims, wherein a cleaning chamber (1) is provided with a housing (2) defining an interior space (3) in which a component (4) to be cleaned is arranged, wherein the cleaning chamber (1) further comprises at least one suction device (5) for evacuating the interior space (2) of the housing (3) and at least one heating device (6, 7, 19) for heating the at least one component (4) to be cleaned, so that after the component to be cleaned has been arranged in the interior space, it is evacuated by the suction device and the component is heated, wherein the provided cleaning chamber further comprises at least one gas supply device (8) arranged outside the housing and at least one gas inlet (10),wherein the gas supply device (8) is connected to the gas inlet (10) arranged on the housing (2) in such a way that gas provided by the gas supply device is introduced into the interior of the housing via the gas inlet before and / or at least partially during the heating of the component, wherein the gas is discharged from the housing (2) via at least one gas outlet (14), characterized by , that in terms of quantity and / or time, at least a portion of the gas discharged from the interior space (3) at the gas outlet (14) is guided through the interior space (3) in a circuit, in particular in a circuit in which the gas is repeatedly introduced into and discharged from the interior space, so that a defined gas convection takes place in the interior space (3). [15] Method according to claim 14, characterized bythat the gas convection takes place continuously or discontinuously during heating, the gas flow being controlled in particular as a function of the temperature of the component (4) to be cleaned or in the interior (3) of the housing (2). [16] Method according to one of claims 14 to 15, characterized by that the gas introduced into the interior (3) of the housing (2) is filtered and / or cleaned and / or preheated. [17] Method according to one of claims 14 to 16, characterized by that the gas is passed in a laminar or turbulent flow past the at least one heating device (6,7,19). [18] Method according to one of claims 14 to 17, characterized by , that in a first step, the component (4) to be cleaned is arranged in the interior (3) of the housing (2), in a second step the interior (3) is evacuated, in a third step the component to be cleaned (4) is heated; in a fourth step, gas is introduced into the interior space (3), wherein in particular the third step and the fourth step take place at least partially simultaneously, wherein in a fifth step, after a certain component or interior space temperature has been reached, the gas introduction is stopped and the interior space (3) is evacuated, preferably to a high or ultra-high vacuum, and wherein preferably the third to fifth steps are carried out repeatedly, in particular for different component or interior space temperatures. [19] Method according to one of claims 14 to 18, characterized by that an inert gas from the group comprising nitrogen, helium, neon and argon is used as the gas and / or the component or interior temperature is set in the range of 45 to 250°C.

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