Susceptor arrangement for a CVD reactor

Abstract

The invention relates to a susceptor arrangement for a device for depositing a layer on a substrate (1), comprising a susceptor (2) extending in a horizontal plane, which is carried by a rotationally driven shaft (3), wherein a tension plate (4) is arranged rotationally symmetrically about the center (C) of the susceptor (2) and is rotatably adjustable, wherein a first gas flow is fed from a gas inlet zone (5) into a process zone (8), which first gas flow flows in a flow direction (S1) over a storage location (6) of the susceptor (2) carrying the substrate (1), having gas outlet openings (7) arranged downstream of the gas inlet zone (5) and upstream of the storage location (6) in a defined position relative to the storage location (6) for feeding a second gas flow into the process zone (8), wherein the gas outlet openings (7) are connected by feeds connected to one or more sources of one or different gases (9) are fed,which are guided through the susceptor (2) and / or the wall of the rotationally driven shaft (3), wherein the feeds (9) are connected to the gas outlet openings (7) by connecting elements (11) forming a flow channel (10).

Description

field of technology

[0001] The invention relates to a susceptor arrangement for a device for depositing a layer on a substrate, comprising a susceptor extending in a horizontal plane, which is carried by a support, and comprising a cover covering a volume, wherein a first gas flow is fed from a gas inlet zone into a process zone, which first gas flow flows in a flow direction over a storage location of the susceptor carrying the substrate, with gas outlet openings arranged downstream of the gas inlet zone and upstream of the storage location for feeding a second gas flow into the process zone. State of the art

[0002] Such a device is described in DE 10 2023 107 111 A1. A first gas flow is fed into a process chamber by means of a gas inlet element. The substrate is arranged on a susceptor extending in a horizontal plane, which is supported by a radially projecting collar of a carrier. A rotatably adjustable cover is arranged around the center of the susceptor, covering a gas distribution volume arranged between the carrier, the susceptor, and the cover. The cover, designed as a tension plate, forms gas outlet openings through which a second gas flow from the gas distribution volume can be fed into the process chamber. The position of the gas outlet openings is adjustable relative to the storage location. The second gas flow is fed into the gas distribution volume via supply lines guided through the carrier, designed as a rotary shaft.

[0003] In this device, the radially outer edge of the cover rests on a radially inner step of the susceptor. The resulting gap contains leaks through which the second gas flow from the gas distribution volume can flow uncontrolled into the process chamber.

[0004] DE 10 2018 124 957 A1 describes a susceptor on which a substrate holder rests, supported on a gas cushion, for holding a substrate. Several gas outlet openings are arranged in the surface of the susceptor facing the process chamber, through which various purge gas flows used to generate the gas cushion are introduced into the process chamber. The gas outlet openings are each connected to inlets that extend through the susceptor. Summary of the invention

[0005] The invention is based on the object of further developing the device described above in a manner that is advantageous in use and, in particular, of avoiding the formation of leaks.

[0006] The problem is solved by the invention specified in the claims, wherein the subclaims represent not only advantageous developments of the invention characterized in the independent claims, but also independent solutions to the problem.

[0007] First and foremost, a susceptor arrangement is provided, which includes a susceptor extending in a horizontal plane and having at least one storage location for substrates, which is supported by a carrier. The carrier can, for example, be a rotationally driven shaft. A gas inlet zone is arranged in the center of the susceptor, from which a first gas flow flows in a flow direction over the susceptor storage location supporting the substrate. The storage location is located in a process zone of the process chamber. Downstream of the gas inlet zone and upstream of the storage location, gas outlet openings are arranged for feeding a second gas flow into the process chamber or process zone. The gas outlet openings can, for example, be assigned to the susceptor and / or an upper side of a cover covering a volume.The volume can, for example, be arranged between a cover arranged around the center of the susceptor and the support, or between the susceptor and a cover plate arranged on the susceptor. While in the prior art, a doping gas flow is fed into a central gas distribution volume via inlets connected to one or more gas sources and from there flows into the process zone via the gas outlet openings, the invention proposes that the gas outlet openings be fed by inlets that are connected to the gas outlet openings by connecting elements that each form a flow channel and cross the volume. The inlets can preferably be formed by channels running in a wall of the support and / or the susceptor. The inlets can, for example, be bores in the wall of the support.The support can have a radially projecting collar at an end portion facing the process zone, through which the feeds can be routed. The connecting elements are provided to connect the gas outlet openings assigned to the cover and / or the susceptor with the feeds. The gas outlet openings can also be arranged in end faces of the connecting elements facing the process chamber. The connecting elements bridge volumes arranged between the susceptor and the cover plate and / or between the support and the cover. The connecting elements can have a flow channel through which the second gas flow can flow out of the feeds and into the gas outlet openings and thus into the process zone. The connecting elements are arranged such that the second gas flow cannot flow into these volumes.

[0008] The connecting elements can be connected to one another via bores extending through the carrier, the susceptor, and the covers. The connecting elements can, for example, be inserts that can be inserted into the bores of the components of the susceptor arrangement to be connected. Components are referred to below in particular as the carrier, the susceptor, and the covers. For example, a first insertion section of the connecting element can be arranged in a bore in the covers, and a second insertion section of the connecting element can be arranged in a bore in the susceptor or in a bore in the carrier. The inserts can be inserted into the bores in such a way that the second gas flow flowing through the bores cannot flow uncontrollably out of the bores into the spaces between the components.The connecting elements can also be designed as projections projecting from the components, onto which the respective other component can be placed. The connecting element can, for example, be a projection projecting from a surface of the susceptor, a surface of the cover, and / or a surface of the carrier. For example, the projections can be formed from the components of the susceptor arrangement itself. The connecting elements can thus be separate parts from the cover, the susceptor, or the carrier. However, they can also be connected to the carrier, the susceptor, or the cover using the same material.

[0009] The body of the connecting element can take on any shape. Preferably, the connecting element can have twofold symmetry. For example, the connecting element can be a cylindrical or oval-cylindrical body. However, the connecting element can also be cuboid-shaped or conical. The insertion sections of the connecting element can be separated from one another by a collar. The diameter or outline of the collar can be larger than the diameter or outline of the insertion sections. The diameter can be large enough that the collar, when inserted, rests on the top side of one component or rests against the back of the other component. The collar can thus form a support surface for the surfaces of the components. The thickness of the collar can correspond to the height of the volumes arranged between the components.

[0010] The connecting element can have two end faces, each with an opening. The openings can be connected to one another by the flow channel. The area of ​​the two openings can be different sizes. The openings can be axially offset or arranged along a common axis. The flow channel can have an axial center. Sections of the flow channel can run offset from this axial center. When inserted, the connecting element can assume various rotational positions, whereby the position of the gas outlet openings changes relative to the center of the substrates, so that the second gas flow flows over different regions of the substrate. The inner diameter of the flow channel of the connecting element can also have sections with different cross-sectional areas.The connecting element can thus be repositioned and inserted into an opening without rotation, and then reinserted into the opening in a different rotational position by pulling it out of the opening, thus changing the position of the gas outlet. For this purpose, it can be advantageous if the opening through which an upper section of the connecting element extends in the cover is wider than the upper section, so that the upper section is inserted into the opening with air.

[0011] To prevent leaks from forming in the area of ​​the openings of the bores in the various components connected by the connecting element, the connecting elements can have sealing elements. For example, the collar of the connecting element can be a sealing element that seals an opening in a first component, for example the carrier, with a first sealing surface and an opening in a second component, for example the cover, with a second sealing surface. The connecting elements can thus create a gas-tight connection between various components of the susceptor arrangement, in particular even when plug-in sections of the connecting elements do not fit precisely into their assigned openings, but rather with minimal play.

[0012] In a first embodiment of the invention, in which the connecting element can be designed as an insert, the insert can connect bores designed as flow channels through the susceptor and through cover plates arranged on the susceptor. For this purpose, the susceptor and the cover plates can have insertion openings that are aligned with the bores. The bores can have a first and a second bore section. The first bore section can directly border the insertion opening. The second bore section can border the first bore section and, in the case of the susceptor, extend to an opening arranged on the surface of the susceptor. The second bore section running through the cover plate can extend to the gas outlet opening arranged on the surface of the cover plate. The second bore section running through the cover plate thus opens into the process zone.The connecting element can also open directly into the process zone, so that the opening on the end face of the connecting element facing the process zone corresponds to the gas outlet opening.

[0013] The insertion openings and the adjacent first bore section can have a larger cross-sectional area than the second bore section. In this way, the second bore section can adjoin the first bore section, forming a step. The end faces of the insertion section of the connecting element can rest on this step.

[0014] The cross-sectional area of ​​the connecting elements is only slightly smaller than that of the insertion opening and the first bore section, so that the inner wall of the first bore section encloses the connecting element in such a way that the second gas flow through the flow channel cannot flow uncontrollably into the volume arranged between the susceptor and the cover plates. The first bore section can, for example, also be lined with a sealing material that creates a gas-tight seal for the space formed between the inner wall of the first bore section and the insertion section of the connecting element.

[0015] The flow channels extending through the susceptor and the cover plates can each be aligned with the flow channel of a connecting element. The flow channels can preferably run perpendicular to the surface normal of the susceptor or, in the case of a rotationally driven susceptor, parallel to the axis through the center of the susceptor's rotational axis. However, the flow channels can also extend along an axis that runs at a non-zero angle to the surface normal of the susceptor.

[0016] The flow channels formed by the bores can have the same cross-sectional area as the flow channel formed by the inserts. However, the cross-sectional areas can also be different sizes. The cross-sectional areas are designed in such a way that a homogeneous flow profile of the second gas flow through the bores is formed.

[0017] In a further embodiment of the invention, the connecting elements can connect bores running through the carrier with bores running through the cover. The connecting elements can cross the volume arranged between the carrier and the cover. The radially projecting collar of the carrier can have insertion openings, which are adjacent to a bore that forms a flow channel. This flow channel is directly connected to the feed lines guided through the wall or the collar. Insertion openings arranged in the cover, which border bores opening into the process zone, can be aligned with these insertion openings. An insertion section of the connecting element can be inserted into each insertion opening. The connecting elements can thus connect feed lines running through the carrier with gas outlet openings arranged in the surface of the cover.The length of the insert sections inserted into the bores can essentially correspond to the length of the corresponding bore. The end face of the insert section inserted into the bore of the tension plate can be in the same plane as the gas outlet opening leading into the process zone.

[0018] Each gas outlet opening can be connected to its associated supply via a connecting element. However, multiple gas outlet openings can also be connected to a single supply via a connecting element. The connecting elements can, for example, be connected to a central gas distribution volume fed by a supply.

[0019] In a further embodiment of the invention, a plurality of gas outlet openings arranged in the surface of the tension plate facing the process zone can each be connected to such a gas distribution volume via a connecting element. The gas distribution volume can, for example, be a volume formed by the wall of the support. The gas distribution volume can, for example, be a volume extending along a circular path around the center of the susceptor within the collar of the support. A plurality of insertion openings, each of which can receive a connecting element, can be provided in the volume, aligned with the gas outlet openings. The gas supply volume can be fed by one or more inlets extending through the wall of the shaft.This, in particular circular, volume can be formed by two components lying one above the other and the resulting joint is then not in a flow connection to the process chamber, but to a space arranged below the process chamber.

[0020] Several gas outlet openings can be provided, evenly spaced from one another on a circular path around the susceptor in the surface of the cover facing the process zone, the susceptor, and / or covers arranged on the susceptor. However, the gas outlet openings can also be arranged differently, for example, in pairs or randomly.

[0021] In addition, further inlets can be provided through the wall and / or collar of the support, through which a third gas flow flows. This third gas flow can create a gas cushion that supports substrate supports arranged on the susceptor and flows out of openings arranged in the broad side surface of the susceptor facing the process zone. In particular, the broad side surface can have spiral-shaped channels, into the bottoms of which gas outlet openings open. To guide this third gas flow to the gas outlet opening, the susceptor can have flow channels formed by bores drilled from the outer surface of the susceptor in a radially inward direction. These bores can be fluidly connected to inlets guided through the wall and collar of the support. These inlets can be arranged separately from the inlets through which the second gas flow flows.The inlets through which the third gas flow flows can be arranged in a plane of the collar of the support that runs perpendicular to the rotational axis of the susceptor and parallel to another plane in which the inlets through which the second gas flow flows run. However, the inlets can also be located in a common plane. The third gas flow generating the gas cushions can also be fed from the volume formed between the tension plate forming the cover and the shaft into the flow channels running through the susceptor. For this purpose, the inlets can be routed through the shaft.

[0022] The invention also relates to a CVD reactor having a gas inlet element. The gas inlet zone can be arranged in the gas inlet element. The gas inlet element can be arranged in the center of the CVD reactor. For example, a circular process chamber with the susceptor as the process chamber floor can extend around the gas inlet element. The process zone can be arranged in the process chamber. Storage locations for each receiving a substrate can be arranged on the susceptor in a ring around the center of the susceptor. The storage locations can be formed by substrate holders, which are supported, for example, by a gas cushion. The susceptor and the substrate holders can be rotationally driven so that they rotate during the deposition of a layer. The susceptor can be heated by means of a heating device.A control device may be provided to control mass flow controllers and valves to feed carrier gases, inert gases and reactive gases into the process chamber. Short description of the drawings

[0023] The invention is explained in more detail below using exemplary embodiments. They show: Fig. 1 schematically shows a cross section through a CVD reactor, as well as a section of the area in which a connecting element 11 designed as an insert piece fluidically connects the bores extending through a susceptor 2 and cover plates 12 arranged thereon; Fig. 2 a plan view along the sectional plane II-II of the upper side of a support 3 carrying the susceptor 2, wherein the connecting elements 11 protrude through openings in the cover plates 12 arranged on the susceptor 2; Fig. 3 a section along the line III-III in Fig. 2; Fig. 4 a section along the line IV-IV in Fig. 2; Fig. 5 a section along the line VV in Fig. 2; Fig. 6 a schematic representation of the susceptor 2 partially covered with cover plates 12, wherein the connecting elements 12 are inserted into bores of the susceptor 2 and the cover plates 12. Fig. 7 is a plan view of the upper side of the support 3 carrying the susceptor 2, wherein the connecting elements 12 protrude from the support 3; Fig. 8 a section along the line VIII-VIII in Fig. 7; Fig. 9 shows a further embodiment, wherein the connecting elements 11 are projections projecting from the susceptor 2; Fig. 10 shows a further embodiment, wherein the connecting elements 11 are projections projecting from the carrier 3; Fig. 11 shows a further embodiment in which the connecting elements 11 are connected to a single annular channel 26 guided through a radially projecting collar of the carrier 3; Fig. 12 a section along the line XII-XII in Fig. 11. Description of the embodiments

[0024] In Fig. 1 schematically shows a CVD reactor 17 with a housing 23, which is part of a coating device having a control device (not shown) and a gas supply system.

[0025] The one in the Fig. The CVD reactor 17 shown in Figure 1 has a process chamber 4, which is bounded at the top by a process chamber ceiling 18 and at the bottom by a susceptor 2. The susceptor 2 is supported by a support 3. The support 3 can be a rotary shaft that is driven for rotation about an axis C. A tension rod (not shown) can be guided centrally through the support 3, exerting a tensile force on a cover 4 to thereby force a radially inner step of the susceptor 2 against a radially projecting collar of the support 3. The cover 4 forms a tension plate here.

[0026] The susceptor 2 can be heated to a process temperature by means of a heating device 19 arranged below the susceptor 2. The susceptor 2 extends rotationally symmetrically in a horizontal plane around a gas inlet element 5 protruding through the process chamber ceiling. Reactive and inert gases, for example carbon, silicon, and nitrogen, as well as gases containing hydrogen, are fed into the process chamber 8 by means of the gas inlet element 3. Supply lines (not shown) connected to gas sources open into the gas inlet element 5. The gas outlet surface of the gas inlet element 5 is porous or has a large number of evenly distributed and, in particular, equally sized openings through which a gas mixture of prescribed gases is fed into the process chamber 8.

[0027] The Fig. The gas inlet element 5 shown in Figure 1 has a single gas inlet zone through which a homogeneous gas mixture flows laminarly into the process chamber 8. However, several gas inlet zones can also be arranged one above the other, through which a gas mixture flows into the process chamber 8, forming a homogeneous or inhomogeneous, laminar flow. Downstream of the gas inlet element 5, a gas outlet element 20 is provided, through which the process gas fed into the process chamber 8 via the gas inlet element 5, or decomposition products of the process gas, can be led out of the process chamber 8. This is done by a pump (not shown), which can generate a negative pressure within the process chamber 8.

[0028] In the Fig. In the embodiment illustrated in Figure 1, a first gas flow fed through the gas inlet element 5 flows in a flow direction S1 from a center C located within the gas inlet element 5, radially outwardly via storage locations 6 formed downstream of the susceptor 2, which support substrates 1. The exit surface corresponds to a cylindrical surface extending from a floor of the process chamber 8 formed by the susceptor 2 to the process chamber ceiling 18. However, the gas exit surface can also be a rectangular surface if, for example, the process chamber is not flowed through in a radial direction, but linearly. The width of the gas exit surface extending in the flow direction S1 is greater than the diameter of the substrates 1.

[0029] Gas outlet openings 7 are arranged downstream of the gas inlet element 5 and upstream of the storage location 6, in a defined position relative to the storage location 6. A second gas flow can be fed into the process chamber 8 through these openings. The gas outlet openings 7 are fed by inlets 9, which are guided through the wall and the radially projecting collar of the support 3. The inlets 9 are connected to the gas outlet openings 7 by connecting elements 11 forming a flow channel 10. The connecting element 11 crosses a volume 28 arranged between the cover plate 12 and the susceptor 2.

[0030] In the Fig. In the embodiment shown in Figure 1, the gas outlet openings 7 are arranged in cover plates 12 arranged on the susceptor 2. The connecting elements 11 are designed as inserts that connect bores formed as flow channels through the susceptor 2 and through cover plates 12 arranged on the susceptor 2.

[0031] Susceptor 2 can be driven in rotation. Fig. In the embodiment shown in Figure 1, the flow channel 10 of the insert 11 is oriented parallel to the rotational axis C of the susceptor 2. Thus, the flow direction S1 of the first gas flow and the flow direction S2 of the second gas flow fed through the gas outlet openings 7 run perpendicular to one another. However, the longitudinal axis of the flow channel 10 can also have an angle of less than 90° to a plane running parallel to the flow direction S1 of the first gas flow, so that the flow direction S1 of the first gas flow and the flow direction S2 of the second gas flow enclose an angle of less than 90°. However, this also includes an arrangement in which the angle is equal to 90°. Arrangements in which the flow channel 10 opens in the flow direction S1 are also conceivable. In such a configuration, the connecting element can protrude from the cover plate 12 so that the gas is provided parallel to the first gas flow.Alternatively, the cover plate 12 can also have a recess in the form of an inlet, which can be significantly larger than the connecting element itself, so that even in such a configuration the gas emerging from the flow channel 10 is fed in parallel to the first gas flow.

[0032] As in Fig. As can be seen in Figure 2, each gas outlet opening 7 or each connecting element 11 is assigned a respective supply line 9, which is guided through the wall and the radially projecting collar of the carrier 3. The connecting elements 11 have an oval-cylindrical body. The flow channel 10 formed by the connecting element 11 opens into an opening 15, 15' on the end faces 16, 16' of the connecting element 11. The openings 15, 15' can, as in Fig. 2, extend axially offset from an axial center of the connecting element 11. The connecting element 11 can assume various rotational positions. In particular, it can be rotatably inserted into an associated bore 24 of the susceptor 2. In this way, the second gas flow can flow along different flow lines over the substrate 1.

[0033] As in Fig. 3, the connecting element 11 has two insertion sections 14, 14' separated from one another by a collar 13. The diameter of the collar 13 is larger than the diameter of the insertion sections 14, 14', so that the collar 13 rests on the surface of the susceptor 2 facing the process chamber ceiling 28. The collar 13 also forms a support surface for the rear side of the cover plates 12 facing the susceptor 2. The collar 13 lies within the volume 28 and forms a spacer element between the cover plate 12 and the susceptor 2.

[0034] The susceptor 2 and the cover plates 12 have bores designed as flow channels, which are connected by the connecting element 11. The connecting element 11 intersects the volume 28 arranged between the cover plate 12 and the susceptor 2. The bores have a first bore section 24 and a second bore section 24', which are adjacent to one another. A first insertion section 14 of the connecting element 11 is inserted into the first bore section 24 of the bore extending through the cover plate 12, and a second insertion section 14' is inserted into the first bore section of the bore extending through the susceptor 2. The second bore section of the cover plate 12 opens into the gas outlet opening 7. The second bore section 24' of the susceptor 2 opens into the feed line 7, which runs through the radially projecting collar of the carrier 3 and is assigned to the connecting element 11.

[0035] The first bore section 24 has a larger cross-sectional area than the second bore section 24'. This creates a step between the bore sections 24, 24'. The end faces 16, 16' of the insertion sections 14, 14' of the connecting element 11 can rest on this step. In the exemplary embodiment, however, the end faces 16, 16' are spaced from the bottom of the bore sections 24, so that the surfaces of the collar 13 facing away from each other form support surfaces.

[0036] In the Fig. 1, Fig. 3 and Fig. 4, whose flow channel 10 runs along the axial center of the connecting element 11, the cross-sectional area of ​​the second bore sections 24' corresponds essentially to the cross-sectional area of ​​the flow channel 10 running through the connecting element 11.

[0037] Fig. Figure 5, on the other hand, shows a connecting element 11 in which the flow channel 10 extends axially offset from the axial center of the connecting element 11 in sections. The two sections of the flow channel 10 have different cross-sectional areas. Accordingly, the second bore sections 24' of the bores extending through the cover plate 12 and the susceptor 2, which directly border the flow channel 10, also have different cross-sectional areas, wherein the cross-sectional area of ​​the second bore section 24' extending through the cover plate 12 is smaller than the cross-sectional area of ​​the second bore section 24' extending through the susceptor 2.

[0038] In a variant of the Fig. 5, the end face 16 is aligned with the surface of the cover plate 22 facing the process chamber. Here, too, the opening width of the bore section 24 can be larger than the outline of the insertion section 14, so that the latter is inserted into the bore section 24 with circumferential clearance.

[0039] Fig. 6 shows the connecting elements 11 inserted into the susceptor 2. The susceptor 2 is partially covered with cover plates 12. A bore extends through each of the cover plates 12, with the cross-sectional area of ​​the first bore section 24 and the second bore section 24' being oval. The opening 15 in the end face 16 of the connecting element 11 is smaller than the gas outlet opening 7, which lies in a plane with the upper sides of the cover plates 12 facing the process chamber ceiling 28. The connecting element 11 prevents the gas flowing through the bore of the susceptor 2 from flowing uncontrolled into the volume 28 and thus into the process chamber 8.

[0040] The connecting elements 11 are arranged rotationally symmetrically around the center C of the susceptor 2. Each storage location 6 is assigned a connecting element 11. However, more than one connecting element 11 can be assigned to each storage location 6. The storage locations 6 are arranged in a ring shape at a fixed pitch angle to each other around the center C. The connecting elements 11 are in the Fig. 6 are arranged at the same pitch angle to each other on the susceptor 2.

[0041] Fig. 7 shows a plan view of the upper side of the radially projecting collar of the carrier 3 facing the process chamber ceiling 28. Unlike in the Fig. In the embodiment shown in Figure 2, the connecting elements 11 are not inserted into the susceptor 2, but rather into the collar of the support 3. The connecting elements 11 are arranged rotationally symmetrically around the center C. The connecting elements 11 each lie on an imaginary center line that runs through the center C and the center point of a storage location. However, the connecting elements 11 can also lie on a line offset from this imaginary center line, which also runs through the center C. Each of the connecting elements 11 is assigned a feed line 9, which is guided through the radially projecting collar of the support 3 and runs radially inward along the imaginary center line. Starting from a position spaced from the radially inner edge of the collar, the feed line 9 runs through the wall of the support 3.Gas inlet openings (not shown) can be arranged in the wall of the carrier 3, through which a gas from a source can be fed into the feeds 9.

[0042] Fig. 8 shows a connecting element 11 inserted into a collar of the carrier 3. The connecting element 11 connects a bore extending through the collar of the carrier 3 with a bore extending through the cover 4. The connecting element 11 crosses the volume 22 arranged between the cover 4 and the carrier 3. The first insertion section 14 of the connecting element 11 is inserted into the first bore section 24 of the bore extending through the collar of the carrier 3, and the second insertion section 14' is inserted into the first bore section 24 of the bore extending through the cover 4. Here, too, the connecting element crosses a volume 22 to which a joint is assigned, which may have leaks, so that the volume 22 is fluidly connected to the process chamber via these unavoidable leaks.

[0043] The collar 13 of the connecting element 11 is in the Fig. 8, the sealing element 13 is designed as a sealing element. The sealing element 13 seals, with a first sealing surface 25, an opening in the bore extending through the cover 4, which opens into the volume arranged between the cover 4 and the collar of the carrier 3. With a second sealing surface 25', the sealing element 13 seals an opening in the upper side of the collar of the carrier 3 facing the process chamber 28. The sealing element 13 thus prevents the second process gas from penetrating in an uncontrolled manner into the volume 22 arranged between the tension plate 4 and the carrier 3. The sealing element 13 can also prevent the uncontrolled flow of gas into the volume 28 arranged between the cover plates 12 and the susceptor 2.

[0044] Fig. 9 shows a further embodiment of the invention, in which the connecting element 11 is designed as a projection protruding from the susceptor 2, onto which the cover plate 12 can be placed. The projection 11 can be formed by the susceptor 2 itself or be a projection 11 firmly connected to the susceptor 2. The end face 16 is located below the upper side of the cover plate 12 facing the process chamber. It can also be provided here that the end face 16 runs flush with the upper side of the cover plate 12.

[0045] Analogous to the Fig. 9, the connecting element 11 can be arranged in a Fig. 10, the connecting element 11 can be designed as a projection protruding from the collar of the support 3. Here, the cover 4, which can be formed by a tension plate, rests on the collar 13, which in this case can be a sealing element that can have a ring shape. Here, too, the end face 16 of the connecting element 11 can extend below the top side of the cover 4. However, it can also lie flush with the top side of the cover 4.

[0046] The connecting elements 11 can, as in Fig. 2 and Fig. 7 are not only fed by a feeder 9, but as shown in the Fig. 11 and Fig. 12 also shows a central gas distribution volume, which in this case is designed as an annular channel 26 arranged on a circular line around the center C of the susceptor within the collar of the carrier 3. The annular channel 26 is fed by only one feed guide 9 guided through the wall of the carrier 3. The annular channel 26 can have openings 27 facing the process chamber ceiling 28, into which the second insertion section 14' of the connecting element 11 can be inserted (see Fig. 12). The first insertion section 14 is inserted into the first bore section 24 of the bore extending through the cover 4. For manufacturing reasons, the annular channel can be formed by two components that lie one above the other. This is shown in the Fig. 12, however, is not shown. For this purpose, for example, an annular groove can be milled into the carrier 3 from below, which is closed by a second component.

[0047] The above statements serve to explain the inventions covered by the application as a whole, which each independently develop the state of the art by at least the following combinations of features, whereby two, several or all of these combinations of features can also be combined, namely:

[0048] A susceptor arrangement for a device for depositing a layer on a substrate 1, comprising a susceptor 2 extending in a horizontal plane, which is carried by a carrier 3, and comprising a cover 4, 12 covering a volume 22, 28, wherein a first gas flow is fed from a gas inlet zone 5 into a process zone 8, which first gas flow flows in a flow direction S1 over a storage location 6 of the susceptor 2 carrying the substrate 1, comprising a gas outlet opening 7 arranged downstream of the gas inlet zone 5 and upstream of the storage location 6 for feeding a second gas flow into the process zone 8, wherein the gas outlet opening 7 is fed by a feed 9 connected to one or more sources of one or more different gases, wherein the feed 9 is connected by a connecting element forming a flow channel 10 and crossing the volume 22, 28 11 is connected to the gas outlet opening 7.

[0049] A susceptor arrangement characterized in that the feed 9 is guided through the susceptor 2 and / or the wall of the carrier 3.

[0050] A susceptor arrangement, which is characterized in that a first insertion section 14 of the connecting element 11 is arranged in a bore of the covers 4, 12 and a second insertion section 14' of the connecting element 11 is arranged in a bore of the susceptor 2 or in a bore of the carrier 3.

[0051] A susceptor arrangement characterized in that the connecting element 11 is a projection projecting from a surface of the susceptor 2, a surface of the cover 4, 12 and / or a surface of the carrier 3.

[0052] A susceptor arrangement characterized by a collar 13 arranged between two insertion sections 14, 14', wherein a plan view of the collar 13 is larger than a plan view of one of the insertion sections 14, 14', so that the collar 13 rests on the upper side of the susceptor 2 or the carrier 3 when the connecting element 11 is in the inserted state.

[0053] A susceptor arrangement, which is characterized in that the collar 13 has a sealing element which, with a first sealing surface 25, seals a bore opening into the volume 22, 28 and extending through the cover 4, 12, and with the second sealing surface 25' seals a bore opening into the volume 22, 28 and extending through the carrier 3 or the susceptor 2.

[0054] A susceptor arrangement which is characterized in that the flow channel 10 of the connecting element 11 is arranged between two end faces 16, 16' of the connecting element 11 and opens into an opening 15, 15' on each of the end faces 16, 16', wherein the flow channel 10 runs offset in sections from a center of the connecting element 11 and / or the connecting element 11 can assume different rotational positions relative to the cover 4, 12.

[0055] A susceptor arrangement which is characterized in that the openings 15, 15' each have different opening areas and / or the flow channel 10 of the connecting element 11 has sections with different inner diameters.

[0056] A CVD reactor 17 with a susceptor arrangement according to one of the preceding claims, with a process chamber 8 arranged in a housing and the process zone arranged therein, wherein the process chamber 8 is bounded downwards by the susceptor 2 and upwards by a ceiling plate 18, with a gas inlet element 5 in which the gas inlet zone 5 is arranged, and with a heating device 19 for heating the susceptor 2.

[0057] A susceptor 2 with a circular disk-shaped base body extending in a horizontal plane, the upper side of which forms one or more storage locations 6 for substrates 1, wherein on the upper side around the center C of the base body, in particular on a circular arc line, one or more connecting elements 11 each forming a flow channel 10 protrude or are inserted in sections into bores of the base body.

[0058] A connecting piece, with a body which has two insertion sections 14, 14' separated from one another by a collar (13), with a flow channel 10 extending between two end faces, which opens into an opening 15, 15' in each end face 16, 16', wherein the body is designed such that it can be inserted into a susceptor 2 carrying a substrate 1 and / or a carrier 3 carrying the susceptor 2 and / or into a cover 4, 12 of a CVD reactor 17.

[0059] All disclosed features are essential to the invention (individually, but also in combination with one another). The disclosure of the application hereby fully incorporates the disclosure content of the associated / attached priority documents (copy of the prior application), also for the purpose of incorporating features of these documents into claims of the present application. The subclaims, even without the features of a referenced claim, characterize independent inventive developments of the prior art with their features, in particular for filing divisional applications based on these claims. The invention specified in each claim may additionally comprise one or more of the features provided in the above description, in particular with reference numerals, and / or specified in the list of reference numerals.The invention also relates to designs in which individual features mentioned in the above description are not implemented, in particular insofar as they are clearly unnecessary for the respective intended use or can be replaced by other technically equivalent means. List of reference symbols 1 substrate 2 susceptor 3 carriers 4 Cover 5 Gas inlet zone, gas inlet element 6 storage space 7 Gas outlet opening 8 Process zone, process chamber 9 Feed 10 flow channel 11 Connecting element 12 Cover plate 13 collars 14, 14' insertion section 15, 15' opening 16, 16' front side 17 CVD reactor 18 Process chamber ceiling 19 Heinz facility 20 Gas inlet organ 21 axial center 22 volumes 23 housings 24 first drilling section 24' second drilling section 25 first sealing surface 25' second sealing surface 26 Ring Canal 27 Opening 28 volumes C Center Susceptor S1 Flow direction first gas flow S2 Flow direction second gas flow QUOTES CONTAINED IN THE DESCRIPTION

[0000] This list of documents submitted by the applicant was generated automatically and is included solely for the convenience of the reader. This list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions. Cited patent literature

[0000] DE 10 2023 107 111 A1

[0002] DE 10 2018 124 957 A1

[0004]

Claims

[1] Susceptor arrangement for a device for depositing a layer on a substrate (1), with a susceptor (2) extending in a horizontal plane, which is carried by a carrier (3), and with a cover (4, 12) covering a volume (22, 28), wherein a first gas flow is fed from a gas inlet zone (5) into a process zone (8), which first gas flow flows in a flow direction (S1) over a storage location (6) of the susceptor (2) carrying the substrate (1), with a gas outlet opening (7) arranged downstream of the gas inlet zone (5) and upstream of the storage location (6) for feeding a second gas flow into the process zone (8), wherein the gas outlet opening (7) is fed by a feed (9) connected to one or more sources of one or more different gases, wherein the feed (9) is connected by a flow channel (10) forming connecting element (11) crossing the volume (22, 28) is connected to the gas outlet opening (7). [2] Susceptor arrangement according to claim 1, characterized by that the feed (9) is guided through the susceptor (2) and / or the wall of the carrier (3). [3] Susceptor arrangement according to one of the preceding claims, characterized by that a first insertion section (14) of the connecting element (11) is arranged in a bore of the covers (4, 12) and a second insertion section (14') of the connecting element (11) is arranged in a bore of the susceptor (2) or in a bore of the carrier (3). [4] Susceptor arrangement according to one of the preceding claims, characterized by that the connecting element (11) is a projection projecting from a surface of the susceptor (2), a surface of the cover (4, 12) and / or a surface of the carrier (3). [5] Susceptor arrangement according to one of claims 3 or 4, characterized bya collar (13) arranged between two insertion sections (14, 14'), wherein a plan view of the collar (13) is larger than a plan view of one of the insertion sections (14, 14'), so that the collar (13) rests on the upper side of the susceptor (2) or the carrier (3) when the connecting element (11) is in the inserted state. [6] Susceptor arrangement according to claim 5, characterized by that the collar (13) has a sealing element which, with a first sealing surface (25), seals a bore opening into the volume (22, 28) and extending through the cover (4, 12), and which, with the second sealing surface (25'), seals a bore opening into the volume (22, 28) and extending through the support (3) or the susceptor (2). [7] Susceptor arrangement according to one of the preceding claims, characterized bythat the flow channel (10) of the connecting element (11) is arranged between two end faces (16, 16') of the connecting element (11) and opens into an opening (15, 15') on each of the end faces (16, 16'), wherein the flow channel (10) runs offset in sections from a center of the connecting element (11) and / or the connecting element (11) can assume different rotational positions relative to the cover (4, 12). [8] Susceptor arrangement according to claim 7, characterized by that the openings (15, 15') each have different opening areas and / or the flow channel (10) of the connecting element (11) has sections with different inner diameters. [9] CVD reactor (17) with a susceptor arrangement according to one of the preceding claims, with a process chamber (8) arranged in a housing and the process zone arranged therein, wherein the process chamber (8) is bounded at the bottom by the susceptor (2) and at the top by a cover plate (18), with a gas inlet element (5) in which the gas inlet zone (5) is arranged, and with a heating device (19) for heating the susceptor (2). [10] Susceptor (2) with a circular disk-shaped base body extending in a horizontal plane, the upper side of which forms one or more storage locations (6) for substrates (1), wherein on the upper side around the center (C) of the base body, in particular on a circular arc line, one or more connecting elements (11) each forming a flow channel (10) protrude or are inserted in sections into bores of the base body. [11] Connecting piece, with a body which has two insertion sections (14, 14') separated from one another by a collar (13), with a flow channel (10) extending between two end faces, which opens into an opening (15, 15') in each end face (16, 16'), wherein the body is designed in such a way that it can be inserted into a susceptor (2) carrying substrates (1) and / or a support (3) carrying the susceptor (2) and / or into a cover (4, 12) of a CVD reactor (17). [12] Susceptor assembly or CVD reactor or susceptor or connector, characterized by one or more of the characterizing features of any of the preceding claims.

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