Vacuum chamber housing and vacuum assembly

Abstract

According to various embodiments, a vacuum chamber housing comprises: several substrate transfer openings (812a, 812b) arranged one after the other along a direction (101); a chamber wall (230, 820); a first vacuum chamber (802h) and a second vacuum chamber (802n) which adjoin the chamber wall (230, 820) of the chamber housing; wherein the chamber wall (230, 820) is penetrated by a series of through-openings arranged one after the other along the direction (101), each through-opening opening opening into the first vacuum chamber (802h) and into the second vacuum chamber (802b).

Description

Various embodiments relate to a vacuum chamber housing and a vacuum arrangement.Generally, a substrate may be treated (processed), e.g., coated, in a vacuum such that the chemical and / or physical properties of the substrate may be altered. For coating a substrate, various coating methods may be performed to deposit one or more layers on one or more substrates by chemical and / or physical vapor deposition.Before and / or after the coating, it may be advantageous to heat the substrate in vacuo by means of a heating device. As a heating device, usually electrothermal transducers are used which emit thermal radiation into the vacuum and are supplied by means of electrical power along a current path which leads out of the vacuum into the atmosphere. The better the current path is encapsulated, the less installation space is required and the less risk of forming a leak and / or a glow discharge is incurred.According to various embodiments, it has been clearly recognized that this encapsulation of the current path, however, complicates maintenance and assembly. However, easily accessible electrical contacting in the atmosphere or in the process vacuum frequently tends to glow, which is difficult to control, e.g. suppress. A regulation suppression of glowing would in turn increase the costs and temporarily interrupt the power supply to the heating device.This dilemma is addressed by various embodiments provided herein. Inter alia, maintainability is improved without significantly increasing the requirement for installation space, increasing the risk of undesired excitation of a glow discharge (also referred to as glow discharge) and / or increasing the outlay for sealing. It is further promoted that as many identical components as possible can be used, which saves costs.Illustratively, a vacuum chamber (also referred to as contacting chamber) separated from the processing chamber is provided, in which the contacting of the heating device takes place. This separates the electrical contacting of the heating device from the processing chamber without necessarily requiring an atmosphere passage. Furthermore, this makes it easier to carry out an assembly and / or a visual inspection of the contacting without contaminating the processing chamber.The volume of the contacting chamber can also be small compared to the processing chamber, which makes it easier to operate it, e.g. pump it off. Alternatively or additionally, the contacting chamber can be pumped off separately, which inhibits contamination of the processing chamber (e.g. by water).Various examples relating to that described herein and illustrated in the figures will be described below.Example 1 is a vacuum chamber housing, comprising: a plurality of substrate transfer openings arranged one behind the other along a direction; a chamber wall (also referred to as a separating wall), which preferably extends along the direction; a first vacuum chamber (process chamber) and a second vacuum chamber (contacting chamber), which adjoin the chamber wall; wherein the chamber wall is penetrated by a row (also referred to as an opening row) of through-openings arranged one behind the other along the direction (also referred to as inner openings), each through-opening of which opens into the first vacuum chamber and into the second vacuum chamber.Example 2 (e.g. a vacuum chamber housing) is configured according to example 1, further comprising: one or more than one first vacuum pump connection, which opens into the first vacuum chamber; and / or one or more than one second vacuum pump connection, which opens into the second vacuum chamber (e.g. along the transport direction).Example 3 (e.g. a vacuum chamber housing) is configured according to example 1 or 2, further comprising: an additional chamber wall (also referred to as outer wall) adjoining the second vacuum chamber and / or extending away from the first vacuum chamber; an additional through-opening (also referred to as outer opening) penetrating the additional chamber wall and opening into an environment of the vacuum chamber housing; wherein the additional chamber wall preferably comprises a flange protruding into the second vacuum chamber and being penetrated by the additional through-opening. This facilitates the mounting of the contacting.Example 4 (e.g. a vacuum chamber housing) is configured according to one of Examples 1 to 3, further comprising: a chamber opening which opens into the second vacuum chamber and / or exposes (preferably is accessible) the row of passage openings arranged one behind the other along the direction, and a chamber cover which is configured to close the chamber opening in a vacuum-tight manner. An extension of the chamber opening along the transport direction can be greater than an extension of each of the through openings and / or the row, for example.Example 5 is a vacuum arrangement comprising: a vacuum chamber housing (e.g. according to claim 4) providing a first vacuum chamber and a second vacuum chamber adjacent to a chamber wall of the vacuum chamber housing; wherein the chamber wall is penetrated by a row of through-opening opening opening into the first vacuum chamber and into the second vacuum chamber; an electrical (e.g. metallic) supply line extending through the through-opening.Example 6 (e.g. a vacuum arrangement) is configured according to example 5 further comprising: a pump line (e.g. fore-vacuum line) and / or vacuum pump (e.g. high-vacuum pump), which is mounted on the first vacuum pump connection and / or on the second vacuum pump connection.Example 7 (e.g. a vacuum arrangement) is configured according to one of Examples 1 or 6, further comprising: a heating device which is arranged in the first vacuum chamber and is electrically (ohmically) coupled to the supply line or comprises the latter.Example 8 (e.g. a vacuum arrangement) is configured according to any one of Examples 1 to 7, further comprising: an electrical feedthrough (which does not necessarily have to be a vacuum feedthrough, but can) which is coupled to the supply line; wherein the feedthrough preferably protrudes beyond an edge of the through opening (e.g. has a greater extent than the through opening), and / or wherein the feedthrough preferably adjoins the through opening.Example 9 (e.g. a vacuum arrangement) is set up according to example 8, wherein the feedthrough preferably seals the passage opening in a vacuum-tight manner; and / or wherein the feedthrough is preferably applied (e.g. plugged on and / or clamped on) to the supply line.Example 10 (e.g. a vacuum arrangement) is configured according to one of Examples 1 to 9, further comprising: a first electrical connection terminal which is arranged in the second vacuum chamber and / or is mounted on a flange of the vacuum chamber housing.Example 11 (e.g. a vacuum arrangement) is configured according to one of Examples 1 to 10, further comprising a second electrical connection terminal which is arranged outside the chamber housing and / or is mounted on a flange of the vacuum chamber housing.Example 12 (e.g. a vacuum arrangement) is set up according to Examples 1 to 11, wherein the second electrical connection terminal is electrically (ohmically) coupled to the supply line, preferably by means of the first electrical connection terminal, preferably by means of an electrical (e.g. ohmic) contacting (e.g. comprising a cable).Example 13 (e.g. a vacuum arrangement) is configured according to one of Examples 1 to 12, wherein a segment (e.g. a chamber wall) of the vacuum chamber housing, which delimits the second vacuum chamber, is configured as a stiffening (also referred to as a chamber stiffening) and / or protrudes from the chamber wall.Example 14 (e.g. a vacuum arrangement) is configured according to one of Examples 1 to 13, wherein the direction is transverse to an additional direction (e.g. direction of gravity) along which the chamber wall is penetrated by the passage openings.Example 15 (e.g. a vacuum arrangement) is configured according to one of Examples 1 to 14, further comprising a transport device for transporting a substrate in the first vacuum chamber, wherein the transport device preferably comprises one or more than one transport roller which is rotatably mounted about an axis of rotation which is, for example, transverse to the direction and / or the additional direction.Example 16 (e.g. a vacuum arrangement) is configured according to any one of examples 1 to 15, wherein the second vacuum chamber has a smaller volume than the first vacuum chamber, e.g. less than 50% (or than 10%, e.g. as 2%) of the volume of the first vacuum chamber.Example 17 (e.g. a vacuum arrangement) is configured according to one of Examples 1 to 16, further comprising a dielectric and / or tubular cladding in which the supply line is accommodated, wherein the cladding preferably protrudes into the second vacuum chamber.Example 18 (e.g. a vacuum arrangement) is set up according to example 17, wherein a metallic section of the supply line which protrudes from the casing is arranged in the second vacuum chamber and / or is electrically coupled (e.g. by means of an electrical contacting) to the first connection terminal, e.g. by means of a contacting.Example 19 is configured according to any one of Examples 1 to 18, wherein the through-openings have more than 5 (e.g., more than 10 or more than 20) through-openings arranged one behind the other in a row along the direction.Example 20 is configured according to any of Examples 1 to 19, wherein the chamber wall is a chamber ceiling of the first vacuum chamber or is a portion of the chamber ceiling of the first vacuum chamber.Example 21 is configured according to any one of Examples 1 to 20, wherein each of the through openings has a greater extent along the direction than transversely to the direction. This facilitates assembly.Example 22 is configured according to any of Examples 1 to 21, wherein each of the through openings is configured to receive a plurality of supply lines.Example 23 is configured according to one of Examples 1 to 22, wherein the chamber wall is penetrated by an additional row of additional through-opening arranged one behind the other along the direction, which row has a distance (e.g. transversely to the direction) from the row (which is, for example, greater than the distance of mutually directly adjacent through-opening along the direction from one another) and / or which has an additional through-opening per through-opening of the row.Example 24 is configured according to any one of Examples 1 to 23, wherein the chamber wall is arranged between the first vacuum chamber and the second vacuum chamber; and / or wherein the chamber wall is configured to withstand a pressure difference of at least 1 bar (e.g. remains in the elastic deformation range). For example, a pressure difference may be set between the first and second vacuum chambers, but does not necessarily have to be set. It is advantageous for this purpose if the chamber wall can thus withstand a maximum pressure difference between vacuum and atmosphere.Example 25 is set up according to one of Examples 1 to 24, wherein a first pressure of the first vacuum chamber during operation is less than 0.1 bar, e.g. than 10 mbar (millibar), e.g. than 1 mbar, and / or as a second pressure of the second vacuum chamber during operation, preferably around 0.1 mbar (e.g. 1 mbar).Example 26 is configured according to any one of Examples 1 to 25, wherein a second pressure of the second vacuum chamber during operation is in a range from about 0.1 bar (e.g. 1 mbar) to about 10 -5 mbar (e.g. 10 -2 mbar).Example 27 illustrates a method for operating any one of Examples 1 to 26, the method comprising: mounting or dismantling a contact (also referred to as contact structure) which is arranged within the second vacuum chamber and couples a heating device arranged in the first vacuum chamber to a first electrical connection terminal (e.g. ohmic), wherein the first first electrical connection terminal is preferably arranged in the second vacuum chamber and / or is coupled to an electrical generator by means of a second connection terminal (e.g. arranged outside the vacuum chamber housing); and supplying electrical power, which is generated by means of the generator, to the heating device by means of the contact, preferably when the contact is exposed to the second pressure and / or the heating device is exposed to the first pressure.Example 28 is configured according to one of Examples 1 to 27, wherein the contacting has an electrically conductive mounting device which is configured to be coupled to the supply line in a positive-locking and / or non-positive-locking manner.Example 29 is configured according to one of Examples 1 to 28, wherein the contacting has one or more than one electrical line, wherein the mounting device is configured to couple the line to the supply line in a positive-locking and / or non-positive-locking manner, such that they are electrically conductively connected to one another.Example 30 is configured according to any one of Examples 1 to 29, wherein the feedthrough blocks movement of the supply line in the direction of gravity.They show FIGS. 1A and B each show a vacuum chamber housing according to various embodiments in different schematic views; FIG. 2A shows a vacuum chamber housing according to various embodiments in a schematic side view or cross-sectional view; FIG. 2B shows a vacuum arrangement according to various embodiments in a schematic side view or cross-sectional view; FIG. 3 shows a vacuum arrangement according to various embodiments in a schematic cross-sectional view and detailed view; and FIGS. 4A and B each show a vacuum arrangement according to various embodiments in various schematic views.In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the figure(s) described. Since components of embodiments may be positioned in a number of different orientations, the direction terminology is for the purpose of illustration and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other, unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.In the context of this description, the terms "connected", "connected" and "coupled" are used to describe both a direct and an indirect connection (e.g. ohmic and / or electrically conductive, e.g. an electrically conductive connection), a direct or indirect connection and a direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate. According to various embodiments, the term "coupled" or "coupling" may be understood in the sense of a (e.g. mechanical, hydrostatic, thermal and / or electrical), e.g. direct or indirect, connection and / or interaction. A plurality of elements can be coupled to one another, for example, along an interaction chain along which the interaction can be exchanged, for example a fluid (then also referred to as a fluid-conductingly coupled). For example, two elements coupled to one another can exchange an interaction with one another, e.g. a mechanical, hydrostatic, thermal and / or electrical interaction. Coupling a plurality of vacuum components (e.g., valves, pumps, chambers, etc.) to one another may include being fluidly coupled to one another. According to various embodiments, "coupled" can be understood in the sense of a mechanical (e.g. physical or physical) coupling, e.g. by means of a direct physical contact. A clutch may be configured to transmit a mechanical interaction (e.g., force, torque, etc.).According to various embodiments, the vacuum chamber may be provided by means of a chamber housing (then also referred to as vacuum chamber housing) in which one chamber or a plurality of chambers may be provided. The chamber housing can be coupled, for example, to a pump arrangement, e.g. a vacuum pump arrangement (e.g. gas-conducting) for providing a reduced pressure or a vacuum (vacuum chamber housing) and can be configured so stably that it resists the action of the air pressure in the pumped-off state. The pump arrangement (having at least one vacuum pump, e.g. a high vacuum pump, e.g. a turbomolecular pump) can make it possible to pump off a part of the gas from the interior of the processing chamber, e.g. from the processing space. Accordingly, one or more vacuum chambers may be provided in one chamber housing. In other words, the chamber housing can be configured as a vacuum chamber housing or a coating chamber can be configured as a vacuum chamber.The term "vacuum pressure" herein denotes a reduced pressure in the range of vacuum (i.e. a pressure of less than 0.3 bar), e.g. a pressure in a range of about 10 mbar to about 1 mbar (in other words coarse vacuum) or less, e.g. a pressure in a range of about 1 mbar to about 10 -3 mbar (in other words fine vacuum) or less, e.g. a pressure in a range of about 10 -3 mbar to about 10 -7 mbar (in other words high vacuum) or less, e.g. a pressure of less than high vacuum, e.g. less than about 10 -7 mbar.A mounting device is understood herein to mean a device which is configured for mounting, for example for mounting on a mounting device complementary thereto (also referred to as a counter-mounting device). During mounting, a (e.g. rigid) connection of a plurality of components to one another takes place, e.g. by means of their mounting devices. The mounting can be effected (for example exclusively) in a form-fitting and / or force-fitting manner, which is releasable. Examples of components of the mounting device include: a thread, a groove (e.g. for the key reception and / or dovetail groove), a latching nose, a bayonet lock, a pin, etc.An exemplary implementation of the mounting device is configured as a flange, e.g. as a vacuum flange. The flange may be configured for rigid and / or releasable connection to another flange. Two interconnected flanges form a so-called flange connection. The flange may have a (e.g. planar) mounting surface. Optionally, the flange may be penetrated by an opening (also referred to as flange opening) which is surrounded by the mounting surface, e.g. along a closed path. The flange connection can have two flanges arranged with their mounting surfaces facing each other, e.g. contacting each other. The flange opening of a vacuum chamber housing can open into the chamber interior of the vacuum chamber housing, e.g. adjoining the latter. Optionally, the flange can have a groove which surrounds the flange opening, e.g. along the closed path encircling the flange opening, and / or adjoining the mounting surface. A seal can optionally be accommodated in the groove, e.g. a metal seal or a plastic seal. Optionally, the flange may include a protrusion including the mounting surface. For example, the mounting surface may protrude.The term "heating device" is understood herein as an electrothermal converter which is configured to absorb electrical power and to emit thermal power generated based thereon (e.g. by means of thermal radiation). The heating device can have two electrical connections, by means of which the electrical power can be supplied. An exemplary implementation of the heating device comprises a (e.g. transparent) tube (also referred to as heating tube) in which a (e.g. wound) heating wire is arranged, which electrically couples the terminals to one another, e.g. monolithically. The heating tube can be closed in a vacuum-tight manner, for example, and / or filled with an inert gas.Each connection of the heating device can be provided, for example, as a section of a supply line which is embedded in the heating tube and / or protrudes at the end face out of the heating tube. Alternatively or additionally, each supply line can be monolithically connected to the heating wire. For example, the heating device may comprise an electrical conductor extending through the transparent tube, wherein the portion of the conductor arranged within the heating tube provides the heating wire and each of the two end portions of the conductor protruding from the heating tube provides one of the two supply lines (or at least one of the terminals) of the heating device.FIG. 1A illustrates a vacuum chamber housing according to various embodiments 100 ain a schematic side view or cross-sectional view, preferably configured according to Example 1.An exemplary implementation of the vacuum chamber housing has two (e.g. end-face) chamber walls 802 a, 802 b(also referred to as end-face walls) arranged one behind the other along direction 101 (also referred to as substrate transport direction or, for short, as transport direction 101), between which, for example, the process chamber 802 his arranged (e.g. delimiting it). Of the two end face walls 802 a, 802 b, a first outer wall 802 a(also referred to as input-side chamber wall 802 a) has a first substrate transfer opening 812 a(also referred to as input-side substrate transfer opening) and a second outer wall 802 b(also referred to as output-side chamber wall 802 b) has a second substrate transfer opening 812 b(also referred to as output-side substrate transfer opening). The two end side walls 802 a, 802 bmay be arranged opposite one another, for example.An exemplary implementation of each of the substrate transfer openings has a through opening that penetrates the outer wall.Furthermore, the vacuum chamber housing has a process chamber 802 hand one or more contacting chambers 802 n(see also FIG. 2A ), each contacting chamber 802 nbeing provided together with the associated components by means of an assembly (also referred to as a chamber assembly). Each chamber assembly includes a contacting chamber 802n, one or more than one row of interior openings 820o, and a baffle 820. In this regard, for easier understanding, reference is made to a chamber assembly and components thereof (e.g. partition wall), wherein the description thereof can analogously apply to each of a plurality of chamber assemblies.An example implementation (preferably according to example 16) of the (e.g., each) contacting chamber 802nhas a volume that is less than the volume (e.g., as 25% of, e.g., as 10% of, e.g., as 1% of) the processing chamber 802h.An exemplary implementation of the or each partition wall is arranged between the process chamber 802 hand the contacting chamber 802 n, e.g. adjacent to and / or separating the process chamber 802 hand the contacting chamber 802 n. Alternatively or additionally, the partition wall can, for example, delimit the processing chamber upwards (i.e. counter to the direction of gravity 105) and / or delimit the contacting chamber 802 ndown (e.g. in the direction of gravity) (also referred to as a vertical configuration).According to an exemplary implementation of the vertical configuration, the partition wall is configured as a chamber ceiling of the process chamber 802 h(or at least part thereof), which extends in the transport direction 101 from the first outer wall 802 ato the second outer wall 802 b. For example, the partition wall is a section (then also referred to as wall section) of the chamber ceiling.An exemplary implementation of the (e.g. each) chamber assembly comprises (e.g. per contacting chamber) one or more than one group of inner openings 820 o, of which each group of inner openings 820 oare arranged one behind the other along the transport direction 101 as a row (also referred to as an opening row). Each row of openings has, for example, more than 5 (e.g. more than 10, e.g. more than 20, e.g. more than 50, e.g. more than 100) inner openings 820 o. Each of the inner openings penetrates the partition 820, e.g., in the vertical configuration along the gravity direction 105, such that the inner opening opens into the process chamber 802 hand the contacting chamber 802 n.FIG. 1B illustrates a vacuum chamber housing according to various embodiments 100 bin a schematic side view or cross-sectional view, preferably configured according to embodiments 100 aand / or example 2.An exemplary implementation of the vacuum chamber housing has a plurality of vacuum pump connections, of which one or more than one first vacuum pump connection 152 hopens into the process chamber 802 hand one or more than one second vacuum pump connection 152 nopens into the contacting chamber 152 n. This makes it easier to pump off the contacting chamber 152 nseparate from the process chamber 802 h.Each of the vacuum pump connections is configured (e.g. by means of a vacuum tube) such that a vacuum pump, e.g. a high vacuum pump and / or by means of a pump line, can be mounted thereon. During operation, gas can be extracted from the process chamber 802 hby means of the vacuum pump connected to the first vacuum pump connection 152 h, so that the latter can be brought to a vacuum pressure (e.g. as a first pressure). By means of the vacuum pump connected to the second vacuum pump connection 152 n, gas can be extracted from the contacting chamber 802 nduring operation, so that the latter can be brought to a vacuum pressure (e.g. as a second pressure).FIG. 2A illustrates a vacuum chamber housing according to various embodiments 200 ain a schematic side view or cross-sectional view as seen from the transport direction 101, preferably configured according to one of the embodiments 100 ato 100 band / or Example 3.An exemplary implementation of the vacuum chamber housing comprises two chamber assemblies which are spaced apart from one another along a transverse direction 103 (which is transverse to the transport direction 101 and / or to the gravity direction 105). Each of the chamber assemblies has an opening row 820 oand a contacting chamber 802 n, in which the inner openings of the opening row open.An exemplary implementation of each chamber assembly (e.g., according to Example 3) includes an outer wall 202 that defines the contacting chamber. Each chamber assembly has a row of inner openings 820o and, per inner opening 820o, an outer opening 202o assigned to it, which penetrates the outer wall 202 and opens into the contacting chamber 802n. The inner opening 820 oand the outer opening 202 oassociated therewith are coupled to one another in a fluid-conducting manner by means of the inner space of the contacting chamber 802 n. Each of the outer openings 202 orun through the outer wall 202, e.g. along the transverse direction 103, so that the outer opening opens into the contacting chamber 802 n.An exemplary implementation of the outer wall 202 includes a flange that protrudes into the contacting chamber 802n and is penetrated by the outer opening 202o. This simplifies the assembly.An exemplary implementation of the contacting chamber 802nis bounded by two outer walls 202, 212, one or more of which are configured as a chamber stiffener. The chamber stiffener may be configured to absorb mechanical force and inhibit deformation of the chamber ceiling 230. For this purpose, the chamber reinforcement can be extended away from the chamber ceiling 230, e.g. can have a partition 820 of the chamber ceiling 230.FIG. 2B illustrates a vacuum arrangement according to various embodiments 200 ain a schematic side view or cross-sectional view looking in the transport direction 101, preferably configured according to example 5 and / or comprising the vacuum chamber housing according to one of embodiments 100 ato 200 aand / or example 4.An exemplary implementation of the vacuum chamber housing has (e.g. per contacting chamber and / or as a component of a chamber assembly) a chamber opening 252 and an associated chamber cover 252 nwhich is configured for vacuum-tight closing of the chamber opening. The chamber opening 252 facilitates access to the contacting chamber 802nand thus assembly.An exemplary implementation of the chamber cover has a circumferential sealing surface which has, for example, a groove for receiving a seal. The sealing surface, or at least the seal, can, for example, rest against the outer wall 202 in the closed state of the chamber opening 252.The vacuum arrangement comprises a plurality of heating systems, each heating system comprising a heating device and components for electrically supplying the heating device.The chamber assembly has, for example, per heating system (e.g. per connection of the heating device), at least one (i.e. one or more than one) inner opening 820 oand at least one outer opening 202 o. Reference is made below by way of example to a heating system, wherein the description for this can apply analogously to each of the heating systems.An exemplary implementation of the (e.g., each) heating system includes (e.g., per terminal of the heater) one or more than one electrical supply line 270 that extends through the interior opening 820 oand / or is galvanically separated from the bulkhead 802. For example, a first feedthrough 272 (also referred to as an inner feedthrough) can be provided per inner opening 820 o, which is plugged onto the supply line 270 and seals the inner opening 820 oin a vacuum-tight manner. The internal feedthrough may be, but need not necessarily be, a vacuum feedthrough.An exemplary implementation of the internal passage 272 has two plates, between which an annular seal 274 is arranged and of which one plate bears in a vacuum-tight manner against the separating wall 820. The internal passage 272 further includes an actuator (e.g., including one or more set screws) configured to affect, e.g., be actuated in response to, a force acting on the ring seal 274 imparted between the two plates. The ring seal 274 can be deformed by means of the force, so that the supply line 270 presses against the supply line 270 extending through the ring seal 274, which improves the sealing and clamps the supply line 270 in a force-fit manner.An exemplary implementation of the (e.g., each) heating system includes (e.g., per terminal of the heater) one or more electrical terminal terminals 282, 284, a first terminal terminal 282 of which is disposed in the contacting chamber 802 nand / or a second terminal terminal 284 of which is disposed outside the chamber housing. The first terminal 282 and the second terminal 284 may be galvanically separated from the outer wall 202 and / or electrically coupled to each other.An exemplary implementation of the second terminal 284 is ohmically coupled to the first terminal 282 by a second vacuum feedthrough (also referred to as an outer feedthrough) disposed in the outer opening 202 oor mounted to a flange 886 of the outer wall 202. Alternatively or additionally, the second connection terminal 284 is ohmically coupled to the supply line 270 by means of the first connection terminal 282. The outer feedthrough 890 can close the outer opening 202 oin a vacuum-tight manner.FIG. 3 illustrates a vacuum arrangement according to various embodiments 300 in a schematic cross-sectional view 300 aand a detailed view 300 b, viewed in the transport direction 101, preferably configured according to one of the embodiments 100 ato 200 band / or example 16.An exemplary implementation of the transport device has a multiplicity of transport rollers 312 which are arranged one behind the other along the transport direction 101. Each of the transport rollers 312 can have an axis of rotation, e.g. be mounted rotatably with respect to the latter, wherein the axis of rotation is transverse to the transport direction 101.An exemplary implementation of the heating device 350 comprises two electrical terminals 356, each terminal 356 being provided by means of an exposed metallic end portion of the supply line. The supply line may be arranged in a dielectric hose 354 s(also referred to as electrical passivation) as a casing, from which the electrical connection 356 protrudes. The tube 354 smay, for example, be adjacent to, e.g., embedded within, the transparent tube 358 of the heater 350.An exemplary implementation of the electrical passivation protrudes into the contacting chamber. This inhibits excitation of glow discharge.An exemplary implementation of the transparent heating tube 358 of the heater 350 is fused silica (also referred to as fused silica tube). The heating wire 352 is arranged within the heating tube, by means of which the two electrical terminals 356 are ohmically coupled to one another. The heating tube is closed in a vacuum-tight manner and filled with an inert gas.In operation, the vacuum assembly may include an electric generator 302 configured to supply electric power to the heater 350. For this purpose, the generator 302 can be ohmically coupled to the terminals 356 of the heating device 350 by means of the connection terminals. The two connection terminals may be ohmically coupled to one another by means of an electrical connection 370 (also referred to as contacting) arranged in the contacting chamber 802 n. This simplifies the assembly.FIG. 4A illustrates a vacuum arrangement according to various embodiments 400 ain a schematic cross-sectional view as seen in the gravity direction 101 onto the chamber ceiling 230 of the processing chamber, preferably configured according to one of the embodiments 100 ato 300 b, wherein each inner opening 820 ohas an elongate shape and / or is configured to receive a plurality of supply lines.FIG. 4B illustrates a vacuum arrangement according to various embodiments 400 ain a schematic side view or cross-sectional view looking in the transport direction 101, preferably configured according to example 5 and / or having the vacuum chamber housing according to one of the embodiments 100 ato 400 a, wherein the contacting chamber has a triangular cross-section, which increases the stability. The second vacuum pump connection 152 nthat opens out in the contacting chamber 152 nalong the transport direction can also be seen.Various working examples relating to that described herein and illustrated in the figures will be described below.According to a working example 1, those portions of the current path from and to the heating device which are arranged within the processing chamber are sheathed by means of a dielectric (also referred to as electrical passivation). This inhibits excitation of a glow discharge in the processing chamber.According to a working example 2, a plurality (e.g., more than 5, 10, or 20) of heaters are arranged one after another in the processing chamber along the transport direction, each heater including a quartz glass tube and a heating wire arranged inside the quartz glass tube. Each quartz glass tube adjoins the casing of the supply line, which is angled and is coupled (e.g. clamped) in a force-fitting manner to a feedthrough. The feedthrough rests on the partition wall, so that the quartz glass tube is supported suspended from the partition wall by means of the feedthrough.According to a working example 3, each heating device is arranged in the processing chamber and is electrically supplied during operation by means of a contact which is coupled to the supply line in a force-fitting and / or form-fitting manner. The contacting is arranged in the contacting chamber and outside the processing chamber. During operation, the contacting chamber is pumped out by means of a high vacuum pump which is mounted on an outer wall of the contacting chamber, so that the contacting is exposed to a vacuum. This helps to maintain the pressure in the contacting chamber within a range where excitation of glow discharge is inhibited (see Paschen's Law).According to a working example 4, the inner feedthrough acts sealingly, so that a gas exchange between the processing chamber and the contacting chamber is inhibited by means of the inner feedthrough. This makes it easier to maintain the pressure in the contacting chamber independently of the pressure in the processing chamber, at least in a range in which excitation of glow discharge is inhibited (see Paschen's law).According to a working example 5, the quartz glass tube of the heating device is spatially separated from the chamber ceiling by means of the supply line. This promotes the hot sections of the heating device during operation being arranged in the processing chamber and the end section of the supply line which is arranged in the contacting chamber having the lowest possible temperature. This simplifies the contacting and maintenance.

Claims

Vacuum chamber housing, comprising: • a plurality of substrate transfer openings (812a, 812b) arranged one behind the other along a transport direction (101); • a first vacuum chamber (802h) and a second vacuum chamber (802n); • a chamber wall (230, 820) to which the first vacuum chamber (802h) and the second vacuum chamber (802n) adjoin and which is penetrated by a row of passage openings arranged one behind the other along the direction (101), each passage opening opening into the first vacuum chamber (802h) and into the second vacuum chamber (802b).The vacuum chamber enclosure of claim 1, further comprising: • a first vacuum pump port opening into the first vacuum chamber (802h); and • a second vacuum pump port opening into the second vacuum chamber (802n).The vacuum chamber housing according to claim 1 or 2, further comprising: • an additional chamber wall (202) adjoining the second vacuum chamber (802b); • an additional through opening penetrating the additional chamber wall (202) and opening into a vicinity of the vacuum chamber housing.Vacuum chamber housing according to one of claims 1 to 3, further comprising: • a chamber opening which opens into the second vacuum chamber (802n) and / or exposes the row of through-openings arranged one behind the other along the direction (101), and • a chamber cover which is configured to close the chamber opening in a vacuum-tight manner.The vacuum chamber enclosure of any of claims 1 to 4, further comprising: • a first electrical connection terminal disposed in the second vacuum chamber (802n); and • a second electrical connection terminal disposed outside the chamber enclosure and electrically coupled to the supply line by the first electrical connection terminal.The vacuum chamber housing according to any one of claims 1 to 5, wherein a segment of the vacuum chamber housing delimiting the second vacuum chamber (802n) is configured as a chamber stiffener and / or protrudes from the chamber wall (230, 820).The vacuum chamber enclosure of any one of claims 1 to 6, wherein the second vacuum chamber (802n) has a smaller volume than the first vacuum chamber (802h).Vacuum arrangement, comprising: • a vacuum chamber housing which is configured according to one of claims 1 or 7; • an electrical supply line which extends through a through-opening of the through-openings.The vacuum assembly of claim 8, further comprising a heater disposed in the first vacuum chamber (802h) and electrically coupled to or comprising the supply line.Vacuum arrangement according to claim 9, further comprising an electrical feedthrough which is plugged onto the supply line and is arranged in the second vacuum chamber.

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