ELECTRON BEAM RADIATION DEVICE

Abstract

An electron beam irradiation device is provided, which has a simplified vacuum chamber structure. An electron beam irradiation device (1) comprises: a cylindrical vacuum chamber (10) which accommodates an electrode assembly (14) for generating an electron beam; and a vacuum pump (20) which evacuates the interior of the vacuum chamber (10). An air inlet port (22) of the vacuum pump (20) is connected to an evacuation port (13) of the vacuum chamber (10).

Description

Technical field

[0001] The present disclosure relates to an electron beam irradiation device. State of the art

[0002] Electron beam irradiation devices are used in a wide variety of fields, such as reducing the weight of motor vehicle tires, improving quality, increasing the heat resistance of wire sheathing, or sterilizing medical devices. One known technology related to electron beam irradiation devices is an invention disclosed in the patent literature cited below.

[0003] The electron beam irradiation device described in patent literature 1 supports the electrode section in such a way that it can be inserted into and withdrawn from the electron beam irradiation device. Bibliography Patent literature

[0004] Patent literature 1: Japanese patent application publication no. 2005-300327 (published on October 27, 2005) BRIEF DESCRIPTION OF THE INVENTION Technical Problem

[0005] According to the electron beam irradiation device described in patent literature 1, the extraction tube 18, which extends from the main body section of the vacuum chamber 2 and forms part of the vacuum chamber 2, is connected to a vacuum pump that is integrated as part of the vacuum chamber 2. However, since the extraction tube 18 extends from the main body section of the vacuum chamber 2 with a bend, the vacuum chamber structure becomes more complex.

[0006] One embodiment of the present disclosure has the objective of providing an electron beam irradiation device with a simplified vacuum chamber structure. Solution to the problem

[0007] An electron beam irradiation device according to one embodiment of the present disclosure comprises a cylindrical vacuum chamber that accommodates an electrode section for generating an electron beam, and a vacuum pump that empties the vacuum chamber. An air inlet port of the vacuum pump is connected to an emptying port of the vacuum chamber. BRIEF DESCRIPTION OF THE DRAWINGS [ Fig. Figure 1 shows a side view of an electron beam irradiation device according to the present disclosure. [ Fig. 2] is a diagram to describe the beneficial effects obtained by the electron beam irradiation device according to the present disclosure. [ Fig. Figure 3] is a schematic side view of another electron beam irradiation device according to the present disclosure. DESCRIPTION OF EXECUTION FORMS

[0008] In the following, an electron beam irradiation device 1 according to an embodiment of the present disclosure is described with reference to Fig. 1 and others described. In the following description, "upper" and "lower" refer to the direction of gravity as the underside and the side opposite the direction of gravity as the top. In the figures, the underside of the drawing is assumed to represent the direction of gravity. (Overview of the electron beam irradiation device)

[0009] Fig. Figure 1 shows a side view of the electron beam irradiation device 1 according to the present disclosure. The electron beam irradiation device 1 comprises a cylindrical vacuum chamber 10, which accommodates an electrode section (not shown) that generates an electron beam, and a vacuum pump 20, which empties the interior of the vacuum chamber 10. Each part is described below.

[0010] The vacuum chamber 10 comprises a chamber main body 11, an outlet window 12 and a discharge port 13.

[0011] The chamber body 11 is hollow and cylindrical (for example, essentially cylindrical) and supports, for example, the electrode section on the inner wall side at one end of the chamber body 11. A DC voltage from a DC power supply is applied to the electrode section, and the DC power supply is connected to an accelerating voltage monitor and an electron flow monitor. Since known technologies can be used for the electrode section, the DC power supply, the accelerating voltage monitor, and the electron flow monitor, their detailed description is omitted here.

[0012] The vacuum chamber 10 includes an exit window 12 below the main chamber body 11 for releasing the accelerated electron beam into the atmosphere. The electron beam exiting the exit window 12 is directed onto the surface of the object being treated. When the electron beam is directed onto the surface of the object being treated, polymerization or cross-linking reactions occur in polymer materials as irradiated substances, or cells in cellular materials are activated (destroyed). Utilizing this principle, the electron beam irradiation device 1 is used in a wide variety of fields, such as reducing the weight of motor vehicle tires, improving quality, increasing the heat resistance of wire sheathing, or sterilizing medical devices.

[0013] Exit window 12 is in Fig. 1 to Fig. The outlet window 12 is provided below the main chamber body 11, but is not limited to a specific position and can also be provided above or on the side of the main chamber body 11. In the following description, it is assumed that the outlet window 12 is provided below the main chamber body 11.

[0014] The vacuum chamber 10 has a drain port 13, which is connected to a vacuum pump 20 to drain (depressurize) the interior of the chamber body 11. The drain port 13 is connected to the air inlet port 22 of the vacuum pump 20. The drain port 13 can be connected to the air inlet port 22 of the vacuum pump 20 via a shielding section 30. The outlet window 12 and the drain port 13 can be formed integrally with the chamber body 11. The drain port 13 and the air inlet port 22 are each formed, for example, by flanges. Two end sections of the shielding section 30, which is connected to the drain port 13 and the air inlet port 22, are also formed, for example, by flanges. This allows the drain port 13 and the shielding section 30 and the air inlet port 22 and the shielding section 30 to be connected by flange connections.

[0015] The vacuum pump 20 reduces the pressure inside the chamber body 11 to a predefined vacuum level. The vacuum pump 20 can be a vacuum pump of the type commonly used in electron beam irradiation devices, such as a turbomolecular pump, an ion pump, a getter pump, or a cryopump. The vacuum pump 20 has an air inlet port 22. The air inlet port 22 is connected to the discharge port 13 of the vacuum chamber 10. The air inlet port 22 can also be connected to the shielding section 30.

[0016] The shielding section 30 is connected at one end to the discharge port 13 of the vacuum chamber 10 and at the other end to the air inlet port 22 of the vacuum pump 20, and shields electrons (heat) radiated by the electrode section. In other words, the air inlet port 22 is connected to the discharge port 13 via the shielding section 30, which shields the heat radiated by the electrode section. Specifically, the electrode section, which is housed in the main chamber body 11, comprises a wire and several filaments branching off from the wire. By reducing the pressure in the main chamber body 11 to a predetermined vacuum level using the vacuum pump 20 and applying a high-voltage direct current from a direct current supply to the electrode section, thermally excited electrons are released from the surface of the filaments.At this point, the shielding section 30 blocks electrons flying from the surface of the filaments towards the vacuum pump 20. For strength and / or durability, the shielding section 30 is made of, for example, stainless steel.

[0017] The shielding section 30 can, for example, be implemented as a flange incorporating water cooling, with one end connected to the drain port 13 and the other end to the air port 22. In this configuration, the shielding section 30 can reduce the high temperature of the shielding section 30 main body, caused by heat emitted from the electrode section, by circulating water within it. Furthermore, the shielding section 30 is also useful for preventing damage to parts used in the electron beam irradiation device 1, as it can reduce the burning of O-rings used for connection to the drain port 13 and the air inlet port 22, and / or the high temperatures of the vacuum pump 20, which is located downstream of the shielding section 30.Thanks to these beneficial effects, the shielding section 30 is also useful for improving the vacuum, as the vacuum state formed inside the vacuum chamber 10 maintains a favorable status.

[0018] Shielding section 30 will be described later with reference to Fig. 2 described.

[0019] In Fig. 1 denotes S as the central axis of the cylindrical chamber main body 11. The flange axis of the air inlet port 22 of the vacuum pump 20 is arranged coaxially with the central axis S. The “flange axis of the air inlet port 22” denotes a line (axis) that passes through the cross-sectional center of the air inlet port 22, which is formed by a flange. “Coaxial” means that the central axis S of the chamber main body 11 and the flange axis of the air inlet port 22 coincide (or substantially coincide). In the electron beam irradiation device 1 of Fig. 1. The air inlet port 22 of the vacuum pump 20 has essentially the same diameter as the drain port 13 of the vacuum chamber 10. The air inlet port 22 of the vacuum pump 20 does not need to have the same diameter (essentially the same diameter) as the drain port 13 of the vacuum chamber 10, and this configuration will be discussed later with reference to Fig. 3 described.

[0020] The configuration of the electron beam irradiation device 1 according to the present disclosure has been described above. Next, with reference to Fig. 2. The beneficial effects obtained by the electron beam irradiation device 1 are described. Fig. Figure 2 is a diagram to describe the beneficial effects obtained by the electron beam irradiation device 1.

[0021] In Fig. Reference numeral 2 denotes electrons (light / thermal radiation) released from electrode section 14. Reference numeral 50 schematically represents an X-ray shielding section that protects the electron beam irradiation device 1 from X-rays.

[0022] For better understanding, a conventional electron beam irradiation device will first be described. According to a conventional electron beam irradiation device (see the patent literature cited above 1), a pull-out tube, which extends from the main body section of the vacuum chamber and forms part of the vacuum chamber, is connected to a vacuum pump that is integrally formed as part of the vacuum chamber. In this case, the pull-out tube is bent and extends from the main body section of the vacuum chamber. As a result, the shape and / or structure of the vacuum chamber becomes complicated due to the bending of the pull-out tube. The vacuum chamber, which is no longer cylindrical, becomes difficult to manufacture.

[0023] In contrast, in the electron beam irradiation device 1 according to the present disclosure, the discharge port 13 of the vacuum chamber 10 is directly connected to the air inlet port 22 of the vacuum pump 20. Alternatively, the discharge port 13 is connected to the air inlet port 22 of the vacuum pump 20 via the shielding section 30. Thus, the electron beam irradiation device 1 does not require a conventionally necessary extraction tube and can simplify the shape and structure of the chamber body 11 (i.e., the electron beam irradiation device 1).Simplifying the electron beam irradiation device 1 results in further benefits, such as a reduction in the installation area of ​​the electron beam irradiation device 1, a reduction in the materials from which the X-ray shielding section 50 is formed for shielding the electron beam irradiation device 1 from X-rays, and a simplification of the support structure around the electron beam irradiation device 1 including the X-ray shielding section 50.

[0024] Traditionally, measures to reduce thermal radiation from the electrode section to the vacuum pump and to reduce the risk of vacuum pump failure were only taken by rerouting the extraction tube away from the vacuum chamber. However, in cases where thermal radiation to the vacuum pump is low, such as when there is a distance between the electrode section and the vacuum pump, the shielding section 30 is not used, while in cases where thermal radiation is high, the shielding section 30 is used. Further improvements to the shielding section 30 can achieve the beneficial effect of reducing thermal radiation to the vacuum pump.

[0025] Furthermore, the specifications of the vacuum pump used in the electron beam irradiation device were conventionally determined taking into account the diameter and / or length of the extraction tube. Therefore, in electron beam irradiation device 1, where no extraction tube is required, other benefits can be expected, such as a reduction in the rate of loss of the extraction rate of the vacuum pump 20 or the selection of a vacuum pump with a lower extraction rate than conventional vacuum pumps. In cases where a vacuum pump with a lower extraction rate than conventional vacuum pumps can be selected, the installation area of ​​the vacuum pump can also be reduced. Thus, in addition to the benefit of simplifying the vacuum chamber structure, electron beam irradiation device 1 can expect various other benefits.

[0026] With reference to Fig. Section 2 now describes the configuration of the shielding section 30 and its beneficial effects. As in Fig. As shown in Figure 2, the air inlet port 22 of the vacuum pump 20 can be configured to be connected to the discharge port 13 of the vacuum chamber 10 via the shielding section 30, which shields heat radiated from the electrode section 14.

[0027] The shielding section 30 has several inclined plates 31 which are inclined with respect to the central axis S of the main chamber body 11. The inclined plates 31 are supported on the inner wall of the shielding section 30. The inclined plates 31 can be formed integrally with the shielding section 30. The number of inclined plates 31 can be expendably determined.

[0028] In Fig. In Figure 2, the outlet window 12 is provided below the main chamber body 11. In this case, each inclined plate 31 (though not limited to this configuration) is shaped such that the side of the main chamber body 11 is higher and the side of the vacuum pump 20 is lower. Although not shown, in cases where the outlet window 12 is provided above the main chamber body 11, each inclined plate 31 (though not limited to this configuration) is shaped such that the side of the main chamber body 11 is lower and the side of the vacuum pump 20 is higher. Alternatively, the inclined plates 31 can be provided such that the vacuum pump 20 is not visually detectable from the electrode section 14 and / or the vacuum pump 20 is not visually detectable from the outlet window 12. To implement this configuration, the angle and / or size of the inclined plates 31 can be adjusted as appropriate.

[0029] According to the above configuration, the shielding section 30 can reduce the heat transfer to (the heat load) of the vacuum pump 20 due to electron emission from the electrode section 14 and can consequently reduce the risk of failure of the vacuum pump 20.

[0030] In cases where the thermal radiation from the electrode section 14 is low, the electron beam irradiation device 1 need not have the shielding section 30. The shielding section 30 in the electron beam irradiation device 1 may be detachably mounted. (Other electron beam irradiation device)

[0031] Next, with reference to Fig. 3 a further electron beam irradiation device 100 described in the present disclosure. Fig. Figure 3 is a schematic side view of the electron beam irradiation device 100. Descriptions already provided with reference to Fig. The figures 1 and other characters that were given are omitted.

[0032] The electron beam irradiation device 100 comprises a vacuum chamber 10, a vacuum pump 20, a shielding section 30, and a conversion flange 70. The electron beam irradiation device 100 need not include the shielding section 30, but it can be included in Fig. Figure 3 illustrates an example of the electron beam irradiation device 100, which has the shielding section 30. The electron beam irradiation device 100 differs from the previously described electron beam irradiation device 1 in the following aspects.

[0033] In the electron beam irradiation device 1, the air inlet port 22 of the vacuum pump 20 has the same diameter (or substantially the same diameter) as the discharge port 13 of the vacuum chamber 10. That is, in cases where the shielding section 30 is used in the electron beam irradiation device 1, the discharge port 13, the air inlet port 22, and the shielding section 30 are configured to have the same diameter (or substantially the same diameter).

[0034] In contrast, in the electron beam irradiation device 100, the air inlet port 22 of the vacuum pump 20 and the discharge port 13 of the vacuum chamber 10 have different diameters. Therefore, in the electron beam irradiation device 100, the air inlet port 22 is connected to the discharge port 13 via a conversion flange 70 for the purpose of diameter adaptation. In the example of Fig. 3 The drain port 13 has a larger diameter than the air inlet port 22, and the air inlet port 22 has the same diameter (or substantially the same diameter) as the shielding section 30. Thus, the conversion flange 70 is configured such that the side of the drain port 13 has a larger diameter than the side of the shielding section 30, and viewed from the side of the chamber main body 11, they are arranged in the order drain port 13, conversion flange 70, shielding section 30, and air inlet port 22.In cases where the discharge port 13 and the shielding section 30 have the same diameter (or substantially the same diameter) and the air inlet port 22 has a smaller diameter than the shielding section 30, they are arranged, viewed from the side of the main chamber body 11, in the following order: discharge port 13, shielding section 30, conversion flange 70, and air inlet port 22. In this way, the electron beam irradiation device 100 can connect the air inlet port 22 and the discharge port 13 by inserting the conversion flange 70, even in cases where the diameters of the air inlet port 22 and the discharge port 13 are different. Thus, the same beneficial effects as with the electron beam irradiation device 1 mentioned above can be achieved.

[0035] Next, as with reference to Fig. As described in Figure 2, we consider a case where, in the shielding section 30 of the electron beam irradiation device 100, each inclined plate 31 is positioned such that the side of the chamber main body 11 is higher and the side of the vacuum pump 20 is lower. In this case, as described in Figure 2, the shielding section 30 of the electron beam irradiation device 100 is positioned such that the side of the chamber main body 11 is higher and the side of the vacuum pump 20 is lower. Fig.As shown in Figure 3, if the central axis of the chamber main body 11 is designated S1 and the flange axis of the air inlet port 22 is designated S2, it is preferred that the flange axis S2 of the air inlet port 22 is positioned above the central axis S1 of the chamber main body 11. "Above" refers to the side opposite the direction of gravity (the top side in the drawing). According to this configuration, the failure risk of the vacuum pump 20 can be reduced because the thermal load on the vacuum pump 20 is further reduced by the inclined plate 31, which is positioned such that the side of the chamber main body 11 is higher and the side of the vacuum pump 20 is lower.

[0036] The flange axis S2 of the air inlet port 22 can also be configured to be positioned laterally to the central axis S1 of the chamber main body 11. "Laterally" refers to a direction perpendicular to the direction of gravity (the direction from the front to the back of the drawing). In this configuration, compared to cases where the flange axis S2 of the shielding section 30 is positioned below the central axis S1 of the chamber main body 11, the thermal load on the vacuum pump 20 from the inclined plate 31 is reduced, thereby reducing the risk of failure of the vacuum pump 20.

[0037] Furthermore, regardless of the presence or absence of the shielding section 30, the flange axis S2 of the air inlet port 22 can be configured to extend in one direction away from the outlet window 12 of the vacuum chamber 11, starting at the central axis S1 of the vacuum chamber 11. Specifically, if the outlet window 12 is located at the bottom of the vacuum chamber 11, the flange axis S2 of the air inlet port 22 is positioned above, but not limited to, the central axis S1 of the vacuum chamber 11. If the outlet window 12 is located at the top of the vacuum chamber 11, the flange axis S2 of the air inlet port 22 is positioned below, but not limited to, the central axis S1 of the vacuum chamber 11.In the case where the outlet window 12 is provided on the side of the vacuum chamber 11, the flange axis S2 of the air inlet port 22 is positioned relative to the central axis S1 of the vacuum chamber 11 on the side opposite the side where the outlet window 12 is provided, without being restricted to it. According to the above configuration, the distance from the outlet window 12 to the vacuum pump 20 is increased, resulting in a lower thermal load on the vacuum pump 20 and thus reducing the possibility of failure of the vacuum pump 20. [Summary]

[0038] The electron beam irradiation device according to embodiment 1 of the present disclosure comprises a cylindrical vacuum chamber that accommodates an electrode section for generating an electron beam, and a vacuum pump that empties the vacuum chamber. An air inlet port of the vacuum pump is connected to an emptying port of the vacuum chamber.

[0039] According to the configuration above, the electron beam irradiation device according to embodiment 1 of the present disclosure does not require a draw-out tube as part of the vacuum chamber, which was conventionally necessary, thus simplifying the vacuum chamber structure. As a result, the electron beam irradiation device according to embodiment 1 of the present disclosure can achieve further benefits, such as a reduction in the installation area, a reduction in the X-ray shielding material, or a simplification of the peripheral structures.

[0040] In the electron beam irradiation device according to embodiment 2 of the present disclosure, in the above embodiment 1 the air inlet port is connected to the discharge port via a shielding section which shields heat radiated from the electrode section.

[0041] According to the above configuration, the electron beam irradiation device according to embodiment 2 of the present disclosure can reduce the heat transfer to (the heat load) of the vacuum pump due to electron emission from the electrode section, resulting in a reduced risk of failure of the vacuum pump.

[0042] In the electron beam irradiation device according to embodiment 3 of the present disclosure, in the above embodiment 2 the shielding section comprises several inclined plates which are inclined with respect to a central axis of the vacuum chamber.

[0043] According to the above configuration, the electron beam irradiation device according to embodiment 3 of the present disclosure can reduce the heat load on the vacuum pump, resulting in a reduced risk of vacuum pump failure.

[0044] In the electron beam irradiation device according to embodiment 4 of the present disclosure, in the above embodiment 3 the several inclined plates are provided such that the vacuum pump is not visually detectable from the electrode section or the vacuum pump is not visually detectable from an exit window of the vacuum chamber.

[0045] According to the above configuration, in the electron beam irradiation device according to embodiment 4 of the present disclosure, the heat load on the vacuum pump can be further reduced by the multiple inclined plates, thereby further reducing the possibility of failure of the vacuum pump.

[0046] The electron beam irradiation device according to embodiment 5 of the present disclosure comprises, in one of the above embodiments 1 to 4, the flange axis of the air inlet port, which is provided coaxially to the central axis of the vacuum chamber.

[0047] According to the above configuration, the electron beam irradiation device according to embodiment 4 of the present disclosure makes the simplification of the vacuum chamber structure easier.

[0048] In the electron beam irradiation device according to embodiment 6 of the present disclosure, in one of the above embodiments 1 to 4, a flange axis of the air inlet port is provided such that it is displaced in one direction away from an exit window of the vacuum chamber, wherein a central axis of the vacuum chamber serves as an exit point.

[0049] According to the above configuration, in the electron beam irradiation device according to embodiment 6 of the present disclosure, the heat load on the vacuum pump can be reduced by extending the distance from the exit window to the vacuum pump, thereby reducing the possibility of failure of the vacuum pump.

[0050] In the electron beam irradiation device according to embodiment 7 of the present disclosure, in the above embodiment 6 the air inlet port is connected to the discharge port via a conversion flange for the purpose of diameter adjustment.

[0051] According to the configuration above, the electron beam irradiation device of embodiment 7 of the present disclosure can connect the air inlet port and the discharge port using the conversion flange, even if the diameters of the air inlet port and the discharge port are different. Thus, the electron beam irradiation device of embodiment 7 of the present disclosure can achieve the above benefits while simultaneously possessing a high degree of design freedom.

[0052] The present disclosure is not limited to the embodiments described above, and various modifications are possible within the scope of protection set out in the claims. Embodiments obtained by suitably combining the disclosed technical means are also included within the technical scope of protection of the present disclosure. Furthermore, new technical features can be formed by combining any of the disclosed technical means. List of reference symbols 1,100 electron beam irradiation device 10 Vacuum chamber 11 Main chamber body 12 exit windows 13 emptying ports 14 Electrode section 20 vacuum pump 22 Air intake port 30 Shielding section 31 Inclined plate 50 X-ray shielding section 70 Conversion flange S1 central axis S2 flange axle QUOTES INCLUDED IN THE DESCRIPTION

[0000] This list of documents cited by the applicant was automatically generated and is included solely for the reader's convenience. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions. Cited patent literature

[0000] JP 2005-300327

[0004]

Claims

[1] Electron beam irradiation device comprising: a cylindrical vacuum chamber that accommodates an electrode section for generating an electron beam; and a vacuum pump that empties the vacuum chamber, wherein an air inlet port of the vacuum pump is connected to a discharge port of the vacuum chamber. [2] Electron beam irradiation device according to claim 1, wherein the air inlet port is connected to the discharge port via a shielding section which shields heat radiated from the electrode section. [3] Electron beam irradiation device according to claim 2, wherein the shielding section comprises several inclined plates which are inclined with respect to a central axis of the vacuum chamber. [4] Electron beam irradiation device according to claim 3, wherein the multiple inclined plates are provided such that the vacuum pump is not visually detectable from the electrode section or the vacuum pump is not visually detectable from an exit window of the vacuum chamber. [5] Electron beam irradiation device according to claim 1 or 2, wherein a flange axis of the air inlet port is provided coaxially to a central axis of the vacuum chamber. [6] Electron beam irradiation device according to claim 1 or 2, wherein a flange axis of the air inlet port is provided such that it is displaced in a direction away from an exit window of the vacuum chamber, wherein a central axis of the vacuum chamber serves as an exit point. [7] Electron beam irradiation device according to claim 6, wherein the air inlet port is connected to the discharge port via a conversion flange for the purpose of diameter adjustment.

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