Sewing, embroidery or quilting machine

Abstract

The invention relates to a machine (M) for sewing, embroidery, or quilting, wherein a planar partial area (T1) of a textile structure (T) is pressed in a stretched state against a textile structure support area (TA) adjacent to a stitch plate (SP) and / or against the stitch plate (SP) and can be moved in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP), so that the planar partial area (T1) lies flat against the stitch plate (SP). The machine (M) includes a detector module (DM) with which a property and / or state of the moving planar partial area (T1) of the textile structure (T) can be detected, and a detector module control unit (SE1) with which an operating mode of the machine (M) can be adapted depending on the detected property or state of the moving planar partial area (T1) of the textile structure (T).

Description

[0001] The invention relates to a machine for sewing, embroidery or quilting, hereinafter also referred to simply as the "machine".

[0002] Such a machine has a needle bar arranged above a stitch plate, which can be moved up and down, and to which a needle is attached that has an eyelet for receiving an upper thread.

[0003] The machine also has a rotatable or reciprocating gripper system located below the stitch plate, to which a gripper is attached that has a gripper tip for taking the upper thread.

[0004] The needle plate contains an opening / recess for the needle and eyelet to pass through the needle plate from top to bottom and back.

[0005] In sewing, embroidery, or quilting, a flat section of a textile fabric can be pressed in a stretched state against a textile support area adjacent to the needle plate and / or against the needle plate itself. It can then be moved in a plane parallel to the needle plate at a speed relative to the needle plate, ensuring that the flat section lies flat against the needle plate. During sewing, embroidery, or quilting, it is possible that a textile fabric moving along the needle plate may exhibit different properties and / or states over time in the area of ​​the opening / recess. This can be caused, for example, by irregularities in the structure of the textile fabric (weaving defects, damage) or irregularities in the way the textile fabric moves (uneven speed, wrinkled or wavy deformation).Such irregularities, which are usually unwanted, impair the result of sewing, embroidery or quilting.

[0006] The invention is based on the objective of avoiding or at least reducing such impairments that occur during sewing, embroidery or quilting.

[0007] To solve the problem, the invention provides a machine (M) for sewing, embroidery or quilting, which has: a needle bar (NS) arranged above a stitch plate (SP), movable up and down, to which a needle (N) is attached, having an eye for receiving an upper thread; a rotatable or reciprocating hook system (GS) arranged below the stitch plate (SP), to which a hook is attached, having a hook point for taking the upper thread; wherein the stitch plate (SP) has an opening / recess (A0) for passage of the needle (N) and the eye through the stitch plate (SP) from top to bottom and back;and wherein a planar partial area (T1) of a textile structure (T) in a stretched state can be pressed against a textile structure support area (TA) adjacent to the stitch plate (SP) and / or against the stitch plate (SP) and moved in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP), so that the planar partial area (T1) lies flat against the stitch plate (SP), wherein the machine (M) according to the invention also comprises: a detector module (DM) with which a property and / or a state of the moving planar partial area (T1) of the textile structure (T) can be detected;and a control unit (SE) with which an operating mode of the machine (M) can be adapted depending on the detected property or state of the moving planar section (T1) of the textile structure (T). The needle bar (NS) is part of a sewing head or an "upper thread assembly" which provides an upper thread for sewing, embroidery or quilting.

[0008] The gripper system (GS) is part of a "lower thread assembly" which provides a lower thread and brings the upper thread together with the lower thread when sewing, embroidering or quilting.

[0009] By adjusting the operating mode of the machine according to the invention, the aforementioned irregularities, which usually lead to an impairment of the sewing, embroidery or quilting result, can be compensated for, thereby avoiding or reducing the impairment.

[0010] Preferably the detector module (DM) is arranged in an area below the needle plate and / or flush with the upper surface of the needle plate (SP), wherein the detector module (DM) is preferably arranged next to the gripper system (GS).

[0011] This means that the working area above the needle plate, apart from the up-and-down moving needle, is free of obstructions in the immediate vicinity of the needle. This facilitates visibility and largely unimpeded movement of the textile structure by the machine operator's hands. In contrast to other areas below the needle plate, which contain several mechanical machine components, the area next to the gripper system (GS) offers a relatively large amount of free space.

[0012] Preferably, the detector module control unit (SE1) and another control unit, in particular a bobbin thread monitoring unit (SE2), are arranged on a common circuit board (GP). This eliminates the need for additional installation space for the detector module control unit (SE1), thus contributing to the compactness of the detector module (DM). Advantageously, the detector module (DM) can detect a characteristic, in particular a fabric structure or color structure, an end or edge, a bead, a fabric defect or damage, or a speed and deformation, e.g., lifting due to compression, of the moving planar section (T1) of the textile structure (T). This allows the control unit to adapt a suitable operating mode of the machine (M) depending on such detected properties or states of the moving planar textile structure (T).

[0013] Advantageously, the detector module control unit (SE1) can detect at least one machine stop, in particular with needle (N) at the top or with needle (N) in the textile structure (T), or an adjustment of a stitch frequency (f) of the needle (N) depending on the properties, in particular the fabric structure or the color structure, the end or the edge, the bead, the fabric defect or the fabric damage, or the speed of the moving planar part (T1) of the textile structure (T).

[0014] The machine stop with the needle up allows the textile structure to be moved away from the needle plate, while the machine stop with the needle in the textile structure allows the textile structure to be twisted around the needle.

[0015] Preferably, the needle stitch frequency (f) can be adjusted to the speed or the magnitude of the speed (v) such that the instantaneous needle stitch frequency (f) is essentially proportional to the instantaneous speed or the instantaneous magnitude of the speed (v). This ensures that the product of sewing, embroidery, or quilting has a uniform stitch length even with uneven movement speeds of the textile structure during sewing, embroidery, or quilting. Preferably, a proportionality factor between the needle stitch frequency (f) and the magnitude of the speed (v) is adjustable.

[0016] This adjustability allows for the production of items with both short and long stitch lengths while maintaining a constant movement speed of the fabric during sewing, embroidery, or quilting. Furthermore, this adjustability makes sewing, embroidery, or quilting easier for the user.

[0017] Preferably, the detector module (DM) contains the following components: on the one hand an E / M source (EMQ) that can emit an electromagnetic forward signal (S1) which can pass through the stitch plate (SP) at a first passage area (DB1) of the stitch plate (SP) to a bottom side of the planar sub-area (T1) of the textile structure (T) facing the stitch plate and can be radiated onto the bottom side of the planar sub-area (T1) in order to generate an electromagnetic return signal (S2) reflected or scattered from the bottom side of the moving planar sub-area (T1); and on the other hand an E / M sensor (EMS) that can absorb the electromagnetic feedback signal (S2) reflected or scattered from the underside of the moving planar sub-area (T1), which can pass through the stitch plate (SP) at the first passage area (DB1) or at a second passage area (DB2) of the stitch plate (SP) towards the E / M sensor (EMS).

[0018] The use of electromagnetic waves or radiation as a signal or...

[0019] The use of an information carrier for capturing information about the properties, in particular the fabric structure or color structure, an end or edge, a bead, a fabric defect or damage of the moving textile structure, or about the speed and deformation, e.g., lifting due to compression, of the moving planar section (T1) of the textile structure (T) is particularly advantageous because electromagnetic waves can carry several types of information. For example, different types of information about the moving textile structure can be obtained by selecting the frequency or wavelength and / or the depth of field of the waves / beams.

[0020] Furthermore, by timing (repeatedly switching on / off) the E / M source, information about the state of motion, in particular the horizontal speed and the vertical speed of deformation, of the moving textile structure can be captured in the signal.

[0021] Preferably, at least one first beam deflection means (SA1) is arranged as a component of the detector module (DM) in a hin propagation path (PF1) of the hin signal (S1) extending from the E / M source (EMQ) to the underside of the planar sub-area (T1).

[0022] Preferably, at least one second beam deflection means (SA2) is arranged in a similar manner in a return propagation path (PF2) of the return signal (S2) extending from the underside of the planar sub-area (T1) to the E / M sensor (EMS).

[0023] The use of a beam deflection device in the forward propagation path and / or in the reverse propagation path allows for great flexibility in integrating the detector module and its components into complicated and confined installation environments of the machine below its needle plate.

[0024] Preferably, the back-propagation path (PF2) is telecentric on the object side or towards the plane of the textile structure (T).

[0025] This ensures that the magnification of the illuminated planar section (T1) of the textile structure (T) remains constant during optical imaging, even at varying distances of the textile structure from the needle plate, such as when the textile structure is lifted due to compression. This increases the robustness of the detector module's (DM) detection of a property and / or state of the moving planar section (T1) of the textile structure (T).

[0026] Preferably, the first beam deflection means (SA1) is designed such that it can direct a minimum proportion, in particular more than 20%, and preferably a large proportion, in particular more than 80%, of the energy of the forward signal (S1) to the underside of the planar sub-area (T1).

[0027] Such a beam deflection device, acting as a beam splitter in the forward propagation path, makes it possible to direct a first part of the forward signal emitted by the E / M source to a first section or sub-area of ​​the moving planar sub-area (T1) of the textile structure (T), and a second part of the forward signal emitted by the E / M source to a second section or sub-area of ​​the moving planar sub-area (T1) of the textile structure (T). In this way, more detailed information about the moving planar sub-area of ​​the textile structure can be obtained. Preferably, the second beam deflection device (SA2) is similarly designed such that it can direct a minimum proportion, in particular more than 20%, and preferably a large proportion, in particular more than 80%, of the energy of the return signal (S2) towards the E / M sensor (EMS).

[0028] Such a beam deflection device, acting as a beam splitter in the back propagation path, makes it possible to direct a first part of the forward signal reflected or scattered by the moving planar section (T1) of the textile structure (T) to a first E / M sensor, and a second part of the forward signal reflected or scattered by the moving planar section (T1) of the textile structure (T) to a second E / M sensor. The first and second E / M sensors can be of the same type or different. Such redundancy in the detector module increases its robustness.

[0029] Preferably, the second beam deflection means (SA2) in the back propagation path can map the electromagnetic back signal (S2) reflected or scattered from the underside of the moving planar sub-area (T1) onto the E / M sensor (EMS), wherein pixels on the E / M sensor (EMS) correspond to the respective scattering object points of the underside of the planar sub-area (T1).

[0030] This allows for the repeated acquisition of two-dimensional images, i.e., snapshots, of the movement of the moving planar sub-area, from which, as mentioned above, information is obtained on the one hand about a quality or on the other hand about a speed as well as a deformation of the moving planar sub-area (T1) of the textile structure (T).

[0031] Preferably, the E / M source (EMQ) can emit an optical signal (S1) in the UV range, visible range or IR range, and the E / M sensor (EMS) can absorb a corresponding optical signal (S2) in the UV range, visible range or IR range.

[0032] A light-emitting diode and / or a laser diode can be used as the E / M source. Preferably, a laser diode is used which emits coherent radiation, creating a speckle pattern on the illuminated surface of the textile structure, even on very smooth surfaces (coated textile structures), which provides a high contrast or a high-contrast pattern even on a smooth surface.

[0033] An optical CCD sensor or an optical CMOS sensor can be used as the E / M sensor, preferably including an integrated image processing unit. This unit calculates the direction and speed of the textile's movement along the stitch plate from the differences between successively captured images of the moving textile.

[0034] The use of optical frequencies or wavelengths ensures a resolution suitable for capturing both structural properties and movements of textile structures.

[0035] Advantageously, the at least one first beam deflection means (SA1) includes at least one of the following components along the forward propagation path (PF1): a converging lens, a diverging lens, a converging mirror, a diverging mirror, a deflecting mirror, a deflecting prism, a beam splitter.

[0036] Advantageously, the at least one second beam deflection device (SA2) includes at least one of the following components along the back-propagation path (PF2): a converging lens, a diverging lens, a converging mirror, a diverging mirror, a deflecting mirror, a deflecting prism, a beam splitter.

[0037] This allows the detector module to be designed to suit the specific installation environment of the machine by using a suitable component.

[0038] Preferably, only one or two such components are used together with the E / M source.

[0039] The forward propagation path (PF1) and the reverse propagation path (PF2) can be identical or congruent, at least along a common sub-area (TPF=TPF1=TPF2), where the forward signal (S1) can traverse the sub-area (TPF) in a first direction and the reverse signal (S2) can traverse the sub-area (TPF) in a second direction opposite to the first. In other words, a sub-area (TPF1) of the forward propagation path (PF1) extending along the forward propagation path (PF1) and a sub-area (TPF2) of the reverse propagation path (PF2) extending along the reverse propagation path (PF2) can be identical.

[0040] This contributes to the compactness of the detector module.

[0041] The at least one first beam deflection means (SA1) and the at least one second beam deflection means (SA2) can be identical in construction or be formed by a single beam deflection means, which is traversed by the forward signal (S1) in a first direction and by the return signal (S2) in a second direction, in particular opposite to the first direction.

[0042] This also contributes to the compactness of the detector module.

[0043] The first passage area (DB1) and the second passage area (DB2) of the textile structure support area (TA) adjacent to the stitch plate (SP) and / or the stitch plate (SP) can be arranged in two different locations.

[0044] This makes it possible to direct a first part of the forward signal emitted by the E / M source to a first section or sub-area of ​​the moving two-dimensional part (T1) of the textile structure (T), and a second part of the forward signal emitted by the E / M source to a second section or sub-area of ​​the moving two-dimensional part (T1) of the textile structure (T). In this way, more differentiated information about the entire moving two-dimensional part of the textile structure can be obtained.

[0045] Alternatively, the first passage area (DB1) and the second passage area (DB2) of the textile structure support area (TA) adjacent to the needle plate (SP) and / or the needle plate (SP) can be identical or congruent. This, in turn, contributes to the compactness of the detector module.

[0046] Preferably, the distance measured along the upper surface of the textile structure support area (TA) and / or the needle plate (SP) between the opening / recess (A0) for the passage of the needle (N) and a passage area (DB1, DB2) is less than 30 mm, preferably less than 25 mm, more preferably less than 20 mm, and most preferably less than 15 mm. This ensures that the detected property and / or the detected state of the moving planar section (T1) of the textile structure (T) corresponds as closely as possible to the actual property and / or the actual state of the moving planar section (T1) of the textile structure (T) below the needle (N).

[0047] This also allows the control unit (SE), which adapts the operating mode of the machine (M) depending on the detected property or state of the moving planar sub-area (T1) of the textile structure (T), to carry out this adaptation based on information about the textile structure at the relevant location practically below the needle.

[0048] Preferably, a passage area (DB1 and / or DB2) is located between two adjacent conveyor rows (TR1, TR2, TR3) of the needle plate (SP).

[0049] In this case, the distance defined above between the opening / recess (A0) for the passage of the needle (N) and a passage area (DB1, DB2) can be less than 15mm or even less than 10mm.

[0050] In a special design, a passage area (DB1, DB2) and the opening / recess (A0) for the passage of the needle (N) are identical or congruent.

[0051] In this case, the distance defined above between the opening / recess (A0) for the passage of the needle (N) and a passage area (DB1, DB2) can even be significantly smaller than 10mm.

[0052] This allows the detected property and / or state of the moving planar section (T1) of the textile structure (T) to correspond very closely to the actual property and / or state of the moving planar section (T1) of the textile structure (T) below the needle (N). The detected property and / or state of the moving planar section (T1) of the textile structure (T) on the one hand, and the actual property and / or state of the moving planar section (T1) of the textile structure (T) below the needle (N) on the other hand, are then practically identical.

[0053] The first passage area (DB1) and / or the second passage area (DB2) can be formed by an opening (A1, A2) permeable to the first signal (S1) and the second signal (S2) in the textile support area (TA) adjacent to the stitch plate (SP) and / or in the stitch plate (SP). This allows the respective signal to pass unimpeded through the textile support area (TA) adjacent to the stitch plate (SP) and / or through the stitch plate.

[0054] Alternatively, the first passage area (DB1) and / or the second passage area (DB2) can be formed by a window permeable to the first signal (S1) and to the second signal (S2) in the textile structure support area (TA) adjacent to the stitch plate (SP) and / or in the stitch plate (SP).

[0055] This has the advantage that no particles can penetrate the space containing the detector module below the needle plate. Such particles include, for example, foreign bodies or contaminants adhering to and carried by the textile structure, or abrasion originating from the fibers of the textile structure.

[0056] The textile structure support area (TA) adjacent to the stitch plate (SP) and / or the stitch plate (SP) can also be made of a material permeable to the first signal (S1) and to the second signal (S2).

[0057] Preferably, the permeable window or permeable material is a scratch-resistant material such as glass (SiO2), sapphire (Al2O3) or a polymer, in particular a polyacrylate, e.g. with hard nanoparticles distributed therein, in particular made of glass or sapphire.

[0058] The first passage area (DB1) and / or the second passage area (DB2) may contain a beam deflection means (SA1 or SA2), wherein the beam deflection means in particular comprises or is formed as one of the following components: a converging lens, a diverging lens, a deflecting prism, a beam splitter.

[0059] This functionalization of a passage area also contributes to the compactness of the detector module.

[0060] Preferably the detector module (DM) has a housing (G) in which the components of the detector module (DM) are arranged or which surrounds the components of the detector module, wherein the components are preferably fixed in the housing.

[0061] Similar to what was described above, this has the advantage that virtually no particles can penetrate the detector module, such as foreign bodies or contaminants adhering to and carried by the textile structure, or abrasion originating from the fibers of the textile structure. Furthermore, such a housing protects the components of the detector module from damage caused by external mechanical impacts, such as penetrating buttons, needles, scissors, knives, etc., or fragments thereof.

[0062] Preferably, the forward propagation path (PF1) and / or the reverse propagation path (PF2) includes an aperture (B).

[0063] A field stop (FB), in particular a field stop and / or illuminated field stop, and / or a stray light stop (SB) may be included in the forward propagation path (PF1) and / or in the back propagation path (PF2).

[0064] By using an aperture in the forward propagation path, the cross-sectional area of ​​the forward propagation path extending perpendicular to the optical axis, or the degree of illumination, or the size of the illuminated area on the underside of the planar section of the textile structure, can be determined. This prevents additional areas inside the detector module from being illuminated beyond those illuminated by the moving textile structure, thus preventing the generation of additional interfering stray light (extraneous scattering) that would enter the E / M sensor and increase the noise level in the return signal reflected or scattered by the textile structure.

[0065] An aperture in the back propagation path can intercept any interfering stray light (residual extraneous scattered light) that may still occur despite the aperture in the forward propagation path, preventing it from reaching the E / M sensor. The aperture in the back propagation path increases the depth of field of the image by means of the reflected or scattered electromagnetic back signal (stray light) onto the E / M sensor (EMS). This allows even object points on the underside of the planar section (T1) of the textile structure (T), which protrude from the image plane parallel to the (horizontal) stitch plate in one direction or the other (downwards or upwards) due to local deformation of the textile structure, to be imaged relatively sharply onto the E / M sensor.Thus, properties and / or states of the moving planar sub-area (T1) of the textile structure (T) are still recorded even if the planar sub-area (T1) of the textile structure (T) is not completely pressed against the stitch plate (SP) in the ideal stretched state.

[0066] If the machine has a conveyor with at least two conveyor rows (TR1, TR2, TR3), the housing is preferably arranged between two adjacent conveyor rows (TR1, TR2, TR3).

[0067] This also contributes to the compactness of the detector module.

[0068] Preferably, the forward propagation path (PF1) and the return propagation path (PF2) pass through an optical capsule (OK) or an optical block, respectively. By using an optical capsule (OK) or an optical block, all passive optical elements traversed by the two light propagation paths can be arranged in fixed relative positions. Therefore, no adjustment of the passive optical elements is required.

[0069] Preferably the optical capsule (OK) or optical block contains at least one lens (L1, L2) and at least one beam deflection means (SA1).

[0070] The resulting optical system enables, on the one hand, illumination of the sub-area T1 of the underside of the textile structure T by the E / M source EMQ via the forward propagation path PF1, and on the other hand, optical imaging of object points of the sub-area T1 of the underside of the textile structure T via the reverse propagation path PF2 onto image points on the E / M sensor EMS. Preferably, the optical block is formed as a monoblock of transparent material, preferably glass or polymer, wherein the at least one beam deflection means (SA1) is preferably a totally reflecting interface between the transparent material of the monoblock and the atmospheric air, and the at least one lens (L1, L2) is preferably a curved surface of the monoblock made of transparent material.

[0071] Preferably the optical capsule (OK) or optical block is arranged in the housing (G), wherein the optical capsule (OK) or optical block is preferably fixed in the housing (G).

[0072] Preferably, both the E / M source EMQ and the E / M sensor EMS are fixed to the common circuit board GP at defined locations in a defined orientation.

[0073] Preferably, the common circuit board GP is fixed to the housing G at a defined location and in a defined orientation.

[0074] Preferably, the optical capsule OK or the optical block is fixed to the housing G at a defined location and in a defined orientation.

[0075] These respective arrangements at a defined location and in a defined, fixed orientation form a robust optic and thus a robust detector module DM consisting of an E / M source EMQ, an E / M sensor EMS, and passive optical elements. To solve this problem, the invention also provides a method for sewing, embroidering, or quilting, particularly using a machine as defined in the preceding paragraphs, which comprises: a) Moving up and down a needle bar (NS) arranged above a stitch plate (SP), to which a needle (N) is attached, the needle having an eye with an upper thread held therein, wherein the needle (N) and the eye with the upper thread are repeatedly moved from top to bottom and back through an opening / recess (A0) in the stitch plate (SP); and b) simultaneously rotating or moving back and forth, synchronized with the up and down movement of the needle bar (NS), a hook system (GS) arranged below the stitch plate (SP), to which a hook is attached having a hook point, wherein the hook system (GS) provides a lower thread and wherein the hook with the hook point takes the upper thread and joins it with the lower thread;c) Simultaneously moving a planar section (T1) of a textile structure (T) in a stretched state and pressed against a textile structure support area (TA) adjacent to the stitch plate (SP) and / or against the stitch plate (SP) in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP), such that the planar section (T1) lies flat against the stitch plate (SP), whereby stitches joining the upper and lower threads are formed on the textile structure (T), characterized by d) detecting a property and / or state of the moving planar section (T1) of the textile structure (T) by means of a detector module (DM); and e) adapting an operating mode of the machine (M) depending on the detected property or state of the moving planar section (T1) of the textile structure (T) by means of a control unit (SE1).

[0076] By adjusting the operating mode of the machine according to the invention, the aforementioned irregularities, which usually lead to an impairment of the sewing, embroidery or quilting result, can be compensated for, thereby avoiding or reducing the impairment.

[0077] Preferably, the detector module (DM) detects both a property and a state of the moving planar sub-area of ​​the textile structure (T), and the control unit (SE1) adapts an operating mode of the machine (M) depending on both the detected property and the detected state of the moving planar sub-area (T1) of the textile structure (T).

[0078] By taking into account both a property, i.e. an inherent characteristic of the textile structure, and a condition, i.e. a characteristic of the textile structure resulting from the sewing, knitting or quilting process, impairments occurring during sewing, embroidery or quilting can be avoided or reduced even better.

[0079] Preferably, the detected property of the moving planar textile structure (T) has at least one of the following aspects: a texture, in particular a weave structure or a color structure, an end or an edge, a bead, a weave defect or a weave damage of the textile structure (T). Preferably, the detected state of the moving planar textile structure (T) has at least one of the following aspects: a speed, in particular parallel to the plane of the stitch plate, a deformation, in particular orthogonal to the plane of the stitch plate.

[0080] Preferably, the detector module control unit (SE1) is used to effect at least one machine stop, in particular with needle (N) at the top or with needle (N) in the textile structure (T), or an adjustment of a stitch frequency (f) of the needle (N) depending on the nature, in particular the fabric structure or the color structure, the end or the edge, the bead, the fabric defect or the fabric damage, or the speed of the moving planar part area (T1) of the textile structure (T).

[0081] When the machine is stopped with the needle up, the textile structure can be shifted or moved away from the needle plate, whereas when the machine is stopped with

[0082] The needle allows the fabric to be twisted around the needle. This facilitates sewing, embroidery, or quilting.

[0083] Preferably, the needle stitch frequency (f) is adjusted to the speed or magnitude of the speed (v) such that the instantaneous needle stitch frequency (f) remains essentially proportional to the instantaneous speed or magnitude of the speed (v) of the textile structure (T). Preferably, a proportionality factor between the needle stitch frequency (f) and the speed magnitude (v) is set as required.

[0084] This ensures that the product of sewing, embroidery or quilting has a uniform stitch length even with uneven movement speed of the textile structure during sewing, embroidery or quilting.

[0085] This adjustability allows for the production of items with both short and long stitch lengths while maintaining a constant movement speed of the fabric during sewing, embroidery, or quilting. Furthermore, this adjustability makes sewing, embroidery, or quilting easier for the user.

[0086] Further advantages, features and application possibilities of the invention will become apparent from the following description of a non-restrictive embodiment with reference to the drawing, wherein: Fig. 1 a perspective view of a section of a sewing machine according to the invention (see Fig. 11 ) showing an upper part and a lower part in a first state (view from the front left); Fig. 2 The perspective view of the section of the sewing machine according to the invention is shown in a second state, in which the lower part is open; (view also from the front left); Fig. 3 another perspective view along a vertical xy-plane (see Fig. 2 ) cut lower opened part of the sewing machine according to the invention shows, (view from front right); Fig. 4 a perspective view of two assemblies of the sewing machine according to the invention in their relative positions (without other parts of the sewing machine) shows; Fig. 5 the perspective view along another vertical xy-plane (see Fig. 4 ) shows the two assemblies of the sewing machine according to the invention cut in their relative positions (without other parts of the sewing machine); Fig. 6 another perspective view of the second, lower of the two assemblies of Fig. 4 shows from a different perspective; Fig. 7 the perspective view of the second, lower of the two assemblies of Fig. 4 shown in a partially disassembled state (exploded view); Fig. 8 the perspective view of the second, lower of the two assemblies of Fig. 4 shown in an even more disassembled state (exploded view); Fig. 9 a perspective view of the two assemblies of Fig. 4 as well as showing a further, third assembly in its relative positions; Fig. 10 an enlarged sectional view of part of the two cut assemblies of Fig. 5 with a view orthogonal to the vertical xy-section plane of Fig. 4 as well as a textile structure in its intended use; and Fig. 11 A general perspective view of a sewing machine according to the invention is shown, in which the dashed-framed part of the view of the Fig. 1 corresponds.

[0087] In Fig. 1 Figure 1 shows a perspective view (viewed from the front left) of a partial area of ​​a sewing machine M according to the invention, with an upper part and a lower part in a first state.

[0088] In the upper part of the machine, a needle bar NS, which can be moved up and down, is positioned above a stitch plate SP. A needle N is attached to the needle bar and has an eyelet for holding an upper thread. The stitch plate SP has an opening or recess A0 (see Fig. 4 ) for the needle N and the eyelet to pass through the stitch plate SP from top to bottom and back from bottom to top.

[0089] The machine M also contains in the lower part of the machine, behind a closing flap VK and concealed by this flap, a rotatable or reciprocating gripper system GS arranged below the stitch plate SP (see Fig. 2 , Fig. 3 , Fig. 9 ), to which a gripper (not shown) is attached, which has a gripper tip (not shown) for taking the upper thread.

[0090] A planar sub-area T1 of a textile structure T (see Fig. 10 ) can be pressed in a stretched state against a textile structure support area TA adjacent to the stitch plate SP and / or against the stitch plate SP, and thereby in a plane parallel to the stitch plate SP at a speed v (see Fig. 10 ) are moved relative to the needle plate SP. The flat sub-area T1 lies flat against the needle plate SP.

[0091] The machine M also contains a detector module DM (see Fig. 3 , Fig. 4 , Fig. 5 , Fig. 8 , Fig. 10 ) with which a property and / or a state of the moving planar sub-area T1 of the textile structure T (see Fig. 10 ) can be detected. The machine M also contains a detector module control unit SE1 (see Fig. 8 ), with which an operating mode of the machine M can be adapted depending on the detected property or state of the moving planar sub-area T1 of the textile structure T.

[0092] The detector module DM (see Fig. 3 , Fig. 4 , Fig. 10 ) is located in an area below the SP stitch plate and next to the GS gripper system (see Fig. 3 ) arranged.

[0093] A double arrow next to the needle bar NS indicates the up and down movement of the needle bar NS and the needle N attached to it, in particular a cyclic movement with a frequency f.

[0094] Furthermore, a first feed dog row TR1, a second feed dog row TR2, and a third feed dog row 3 can be seen in the needle plate SP. A passage area DB1 can also be seen, through which an electromagnetic signal can pass from bottom to top and from top to bottom through the needle plate SP.

[0095] In Fig. 2 The perspective view (viewed from the front left) of the section of the sewing machine M according to the invention is shown in a second state in which the lower part is opened by folding down the closure flap VK.

[0096] Fig. 2 differs from Fig. 1 only because in Fig. 1 Elements of the lower part, which were previously hidden by the folded-up locking flap VK, are now visible.

[0097] All reference marks in Fig. 1 shown elements of the Fig. 1 correspond to the in Fig. 2 elements shown by the same reference symbols Fig. 2 .

[0098] In Fig. 2 One can also see a housing G, in which the detector module DM is contained (see Fig. 6 , Fig. 7 , Fig. 8 ). In addition, a gripper system GS, partially concealed by the housing G, can be seen.

[0099] The housing G also contains a common circuit board GP, or a common circuit board GP that forms part of the housing G. On the common circuit board GP, the detector module control unit SE1 and a bobbin thread monitoring unit (SE2) are arranged side by side (see Fig. 8 ).

[0100] In Fig. 3 is another perspective view (this time looking from the front right) of the image along a vertical xy-plane (see Fig. 2 ) cut lower opened part of the sewing machine M according to the invention.

[0101] All reference marks in Fig. 1 and Fig. 2 shown elements of the Fig. 1 and Fig. 2 correspond to the in Fig. 3 elements shown by the same reference symbols Fig. 3 .

[0102] In Fig. 3 Furthermore, a beam path within the detector module DM can be seen, schematically represented by the dark lines.

[0103] The beam path establishes, on the one hand, an EMQ from an E / M source (e.g., light-emitting diode or laser diode, see Fig. 8 ) emitted electromagnetic forward signal S1 (see Fig. 10 ), which can pass through the stitch plate SP at the passage area DB1 of the stitch plate SP to an underside of the textile structure T facing the stitch plate SP.

[0104] On the other hand, the beam path represents an electromagnetic return signal S2 reflected or scattered from the underside of the textile structure T (see Fig. 10 ), which is from an E / M sensor EMS (e.g. CCD sensor, CMOS sensor, Fig. 8 ) is absorbed.

[0105] In Fig. 4 A perspective view of two assemblies of the sewing machine M according to the invention is shown in their relative positions (without other parts of the sewing machine).

[0106] The first, upper assembly is the needle plate SP. It contains the opening or recess A0 for the needle N to pass through the needle plate SP. It also contains the passage area DB1 for the passage of the forward signal S1 and the return signal S2.

[0107] The second, lower assembly is the housing G with the common circuit board GP, on which the E / M source EMQ (e.g. light-emitting diode or laser diode) and the E / M sensor EMS (e.g. CCD sensor, CMOS sensor) as well as the detector module control unit SE1 and the lower thread monitoring unit SE2 are arranged side by side (see Fig. 8 ).

[0108] In Fig. 5 is the perspective view along another vertical xy-plane (see Fig. 4 ) shown the two assemblies of the sewing machine M according to the invention in their relative positions (without other parts of the sewing machine).

[0109] One can distinguish between the E / M source EMQ (e.g., light-emitting diode or laser diode, see Fig. 8 ) and the transmission area DB1 the forward signal S1 of the beam path as well as between the transmission area DB1 and the E / M sensor EMS (e.g. CCD sensor, CMOS sensor, Fig. 8 ) the return signal S2 of the beam path.

[0110] The beam path passes through a first lens L1, a deflection area (mirror) AB and a second lens L2.

[0111] The beam path also includes a field stop (not shown), in particular a viewing field stop and / or illuminated field stop, and a stray light stop (not shown).

[0112] In Fig. 6 This is another perspective view of the second, lower assembly or housing G of Fig. 4 shown from a different perspective.

[0113] An optical capsule (OK) or optical block integrated into the upper part of the housing G can be seen, containing the optical elements through which the beam path passes. The optical capsule (OK) or optical block is precisely fixed to the housing G in a defined position relative to the common circuit board (GP) by means of a locking element (VE). The optics contained in the optical capsule (OK) or optical block, together with the E / M source (EMQ), the E / M sensor (EMS), and the detector module control unit (SE1) on the common circuit board (GP), form the Fig. 8 ) the detector module DM.

[0114] The housing G also contains formations F1, F2, F3, which, together with complementary formations (not shown) of the sewing machine M, enable a proper fit of the housing G into the sewing machine M.

[0115] In Fig. 7 is the perspective view of the second, lower of the two assemblies of Fig. 4 Shown in a partially disassembled state (exploded view).

[0116] Separately from the housing G, the optical capsule OK or optical block and the locking element VE can be seen. The locking element VE has formations F4, F5, F6 which, together with complementary formations (not shown) of the housing G, enable a precise fit of the optical capsule OK or optical block into the housing G.

[0117] In Fig. 8 is the perspective view of the second, lower of the two assemblies of Fig. 4 Shown in a further disassembled state (exploded view). All reference symbols in Fig. 6 and Fig. 7 shown elements of the Fig. 6 and Fig. 7 correspond to the in Fig. 8 elements shown by the same reference symbols Fig. 8 .

[0118] In Fig. 8 Furthermore, the common circuit board GP can be seen separately from the housing G, on which the E / M source EMQ (e.g. light-emitting diode or laser diode) and the E / M sensor EMS (e.g. CCD sensor, CMOS sensor) as well as the detector module control unit SE1 and the underthread monitoring unit SE2 are arranged together next to each other.

[0119] In Fig. 9 is a perspective view of the two assemblies of Fig. 4 as well as a further, third assembly shown in their relative positions.

[0120] The first assembly that can be seen is the needle plate SP with its opening or recess A0 for the passage of the needle N and with its passage area DB1 for the passage of the forward signal S1 and the return signal S2.

[0121] The second assembly visible is the housing G with its common circuit board GP, of which only the back side facing away from the populated side is visible.

[0122] Finally, a third assembly, a gripper system GS, can be identified (without gripper or gripper not shown). Similar to in Fig. 2 is the GS gripper system in Fig. 9 partially obscured by housing G. In Fig. 10 is an enlarged sectional view of part of the two cut assemblies of Fig. 5 with a view orthogonal to the vertical xy-section plane of Fig. 4 as well as a textile structure T in its intended operation.

[0123] The cross-sectional view shows the stitch plate SP with its passage area DB1 and the textile structure T1 on the stitch plate SP.

[0124] In this process, a planar sub-area T1 of the textile structure T is pressed against the stitch plate SP in a more or less stretched state and moved in a plane parallel to the stitch plate SP at a speed v relative to the stitch plate SP.

[0125] In the beam path, one can see a forward propagation path PF1, which corresponds to the forward signal S1, and a reverse propagation path PF2, which corresponds to the reverse signal S2.

[0126] Furthermore, the optical capsule OK or optical block, which is arranged in a defined position in the housing G, can be seen in a sectional view, as well as the locking element VE, with which the optical capsule OK or optical block is locked in its position in the housing G.

[0127] The optical capsule OK, or optical block, contains a first lens L1, a beam deflection device SA1 (mirror), and a second lens L2. In the optical block variant, the optical block consists of a transparent material, in particular glass or a polymer. The optical block thus forms a monoblock of glass or polymer. The beam deflection device SA1 is formed by a totally reflecting interface between the transparent material and the atmospheric air.

[0128] The optics contained in the optical capsule OK enable, on the one hand, the illumination of the sub-area T1 of the underside of the textile structure T by the E / M source EMQ via the forward propagation path PF1, and on the other hand, the optical imaging of object points of the sub-area T1 of the underside of the textile structure T via the reverse propagation path PF2 onto image points on the E / M sensor EMS.

[0129] Fig. 11 shows an overall perspective view of a sewing machine M according to the invention, in which the dashed-framed part of the view of the Fig. 1 This corresponds to the sewing machine M, which essentially has a base plate BP, a vertical column VS extending upwards from the base plate BP, a lower arm UA extending horizontally away from a lower area of ​​the vertical column VS, and an upper arm OA extending away from an upper area of ​​the vertical column VS.

[0130] At the free end of the lower arm UA, a stitch plate SP and a closure cap VK can be seen. At the free end of the upper arm OA, there is a sewing head NK.

[0131] At the lower end of the sewing head NK in the upper part of the machine M is the needle bar NS, which can be moved up and down and to which the needle N is attached, which has an eyelet for holding an upper thread (see Fig. 2 ). Furthermore, a presser foot NF can be identified.

[0132] Behind the locking cap VK in the lower part of the machine M and below the stitch plate SP is the rotatable or reciprocating gripper system GS (see Fig. 2 ).

[0133] In the upper section of the vertical column VS is a loudspeaker LS, and in the center of the upper arm OA is a screen BS. Furthermore, a mechanical interface MS can be seen in the base plate BP, to which a toggle lever (not shown) for operating the machine M can be connected.

[0134] A first type of control element BE1, in the form of a first and a second rotary knob, is arranged at the top of the vertical column VS. A second type of control element BE2, in the form of a first and a second push button, is also arranged at the top of the vertical column VS, below the first type of control element BE1.

[0135] A third type of control element BE3 in the form of five snap fasteners, a fourth type of control element BE4 in the form of four snap fasteners, and a fifth type of control element BE5 in the form of a slider are arranged on the upper arm OA to the right of the sewing head NK. LIST OF REFERENCE MARKS

[0136] M Sewing, embroidery or quilting machine / Sewing machine / Machine N K Sewing head V S Vertical column O Upper arm U Lower arm V K Closure cap / flap N F Sewing foot B Base plate B Screen M Mechanical interface / connection BE1 First type of control / knob BE2 Second type of control / push button BE3 Third type of control / push button BE4 Fourth type of control / push button BE5 Fifth type of control / slider L S Speaker S Stitch plate T Fabric support area (adjacent to stitch plate) N S Needle bar G S Hook system A0 Stitch plate opening / recess (needle passage and, if applicable,DM signal transmission) DB1 Pass-through area of ​​the needle plate (DM signal transmission) DB2 Pass-through area of ​​the needle plate (DM signal transmission) A1 Opening / recess of the needle plate (DM signal transmission) A2 Opening / recess of the needle plate (DM signal transmission) N Needle with eyelet G Housing F1 First formation F2 Second formation F3 Third formation T Textile structure T1 Planar section of the textile structure DM Detector module (EMQ, EMS and optics) SE Control unit EMQ E / M source (light source, LED, laser) EMS E / M sensor (CCD sensor, CMOS sensor) S1 Forward signal (from EMQ to the moving textile structure) S2 Return signal (from moving textile structure back to EMS) PF1 Forward propagation path PF2 Return propagation path v (magnitude of) velocity of the textile structure relative to the needle plate f Stitch frequency of the Needle SE1 Detector module control unit SE2 Further control unit GP Common circuit board TR1 First feeder row TR2 Second feeder row TR3 Third feeder row OK Optical capsule orOptical block L1 first lens L2 second lens V locking element F4 fourth formation F5 fifth formation F6 sixth formation.

Claims

1. Sewing, embroidery or quilting machine (M) comprising: - a needle bar (NS) arranged above a stitch plate (SP), movable up and down, to which a needle (N) is attached, having an eye for receiving an upper thread; - a rotatable or reciprocating hook system (GS) arranged below the stitch plate (SP), to which a hook is attached, having a hook point for taking the upper thread; - wherein the stitch plate (SP) has an opening ora recess (A0) for the needle (N) and eyelet to pass through the needle plate (SP) from top to bottom and back; and - wherein a planar partial area (T1) of a textile structure (T) in a stretched state can be pressed against a textile structure support area (TA) adjacent to the needle plate (SP) and / or against the needle plate (SP) and moved in a plane parallel to the needle plate (SP) at a speed (V) relative to the needle plate (SP), so that the planar partial area (T1) lies flat against the needle plate (SP), . characterized by the fact thatThe machine (M) also includes: - a detector module (DM) with which a property and / or state of the moving planar sub-area (T1) of the textile structure (T) can be detected; and - a control unit (SE) with which an operating mode of the machine (M) can be adapted depending on the detected property or state of the moving planar sub-area (T1) of the textile structure (T).

2. Machine according to claim 1, characterized by the fact that the detector module (DM) is arranged in an area below the needle plate and / or flush with the upper surface of the needle plate (SP), wherein the detector module (DM) is preferably arranged next to the gripper system (GS).

3. Machine (M) according to one of claims 1 or 2, characterized by the fact thatThe detector module (DM) can detect a property, in particular a fabric structure or a color structure, an end or an edge, a bead, a fabric defect or a fabric damage, AND a speed or a deformation of the moving planar sub-area (T1) of the textile structure (T).

4. Machine (M) according to claim 3, characterized by the fact that with the detector module control unit (SE1) at least one machine stop can be effected, in particular with needle (N) at the top or with needle (N) in the textile structure (T), and / or an adjustment of a stitch frequency (f) of the needle (N) depending on the nature, in particular the fabric structure or the color structure, the end or the edge, the bead, the fabric defect or the fabric damage, or the speed of the moving planar part area (T1) of the textile structure (T).

5. Machine (M) according to one of claims 1 to 4, characterized by the fact thatThe detector module (DM) comprises the following components: on the one hand, an E / M source (EMQ) that can emit an electromagnetic forward signal (S1) which can pass through the textile structure support area (TA) and / or the stitch plate (SP) at a first penetration area (DB1) of the textile structure support area (TA) and / or the stitch plate (SP) to an underside of the planar sub-area (T1) of the textile structure (T) facing the textile structure support area (TA) and / or the stitch plate (SP), and can be directed onto the underside of the planar sub-area (T1) in order to generate an electromagnetic return signal (S2) reflected or scattered from the underside of the moving planar sub-area (T1); and on the other hand, an E / M sensor (EMS) that detects the electromagnetic return signal (S2) reflected or scattered from the underside of the moving planar sub-area (T1).can absorb scattered electromagnetic return signal (S2) which can pass through the textile structure support area (TA) and / or the stitch plate (SP) at the first passage area (DB1) or at a second passage area of ​​the textile structure support area (TA) and / or the stitch plate (SP) towards the E / M sensor (EMS).

6. Machine according to claim 5, characterized by the fact thatin a forward propagation path (PF1) of the forward signal (S1) extending from the E / M source (EMQ) to the underside of the planar sub-area (T1), at least one first beam deflection means (SA1) is arranged as a component of the detector module (DM); and / or that in a reverse propagation path (PF2) of the reverse signal (S2) extending from the underside of the planar sub-area (T1) to the E / M sensor (EMS), at least one second beam deflection means is arranged as a component of the detector module (DM); and wherein, in particular, the forward propagation path (PF1) and / or the reverse propagation path (PF2) has at least one aperture.

7. Machine according to claim 6, characterized by the fact thatthe forward propagation path (PF1) and the return propagation path (PF2) are identical or congruent at least along a common sub-area along the forward propagation path (PF1) and along the return propagation path, wherein the forward signal (S1) can traverse the sub-area (TPF) in a first direction and the return signal (S2) can traverse the sub-area (TPF) in a second direction opposite to the first direction.

8. Machine according to one of claims 5 to 7, characterized by the fact thata) a distance measured along an upper surface of the textile structure support area (TA) and / or the stitch plate (SP) between the opening / recess (A0) for the passage of the needle (N) and a passage area (DB1) is less than 30 mm, preferably less than 25 mm, more preferably less than 20 mm and most preferably less than 15 mm; and / or b) a passage area (DB1 and / or DB2) is located between two adjacent feed dog rows (TR1, TR2, TR3) of the stitch plate (SP).

9. Machine according to one of claims 5 to 8, characterized by the fact that a) the first passage area (DB1) and / or the second passage area are formed by an opening permeable to the first signal (S1) and to the second signal (S2) in the textile structure support area (TA) adjacent to the stitch plate (SP) and / or in the stitch plate (SP); and / orb) the first passage area (DB1) and / or the second passage area are formed by a window permeable to the first signal (S1) and to the second signal (S2) in the textile structure support area (TA) adjacent to the needle plate (SP) and / or in the needle plate (SP); and / or c) the textile structure support area (TA) adjacent to the needle plate (SP) and / or the needle plate (SP) is formed from a material permeable to the first signal (S1) and to the second signal (S2).

10. Machine according to one of claims 5 to 9, characterized by the fact that the detector module (DM) has a housing (G) in which the components of the detector module (DM) are arranged, wherein the components are preferably fixed in the housing (G).

11. Machine according to one of claims 5 to 10, characterized by the fact thatthe forward propagation path (PF1) and the reverse propagation path (PF2) pass through an optical capsule (OK) or through an optical block; wherein preferably the optical capsule (OK) or the optical block has at least one lens (L1, L2) and at least one beam deflection means (SA1).

12. Machine according to claim 11, characterized by the fact that the optical block is formed as a monoblock made of light-transmitting material, preferably glass or polymer, wherein the at least one beam deflection means (SA1) is preferably a totally reflecting interface between the light-transmitting material of the monoblock and the atmospheric air, and the at least one lens (L1, L2) is preferably a curved surface of the monoblock made of light-transmitting material.

13. A method for sewing, embroidering, or quilting, in particular using a machine (M) according to any one of claims 1 to 12, comprising: a) moving up and down a needle bar (NS) arranged above a stitch plate (SP), to which a needle (N) is attached, the needle having an eye with an upper thread held therein, wherein the needle (N) and the eye with the upper thread are repeatedly moved from top to bottom and back through an opening or recess (A0) in the stitch plate (SP); and b) simultaneously rotating or moving back and forth, synchronized with the up and down movement of the needle bar (NS), a hook system (GS) arranged below the stitch plate (SP), to which a hook having a hook point is attached, wherein the hook system provides a bobbin thread and wherein the hook with the hook point takes the upper thread and joins it with the bobbin thread;c) Simultaneously moving a planar partial area (T1) of a textile structure (T) in a stretched state and pressed against a textile structure support area (TA) adjacent to the stitch plate (SP) and / or against the stitch plate (SP) in a plane parallel to the stitch plate (SP) at a speed (v) relative to the stitch plate (SP), so that the planar partial area (T1) lies flat against the stitch plate (SP), whereby stitches uniting the upper thread and the lower thread are formed on the textile structure (T); characterized by d) Detecting a property and / or state of the moving planar sub-area (T1) of the textile structure (T) by means of a detector module (DM); and e) Adapting an operating mode, in particular an operating mode of the machine (M), depending on the detected property or state of the moving planar sub-area (T1) of the textile structure (T) by means of a control unit (SE1).

14. Method according to claim 13, characterized by the fact that the property of the moving planar textile structure (T) has at least one of the following aspects: a texture, in particular a fabric structure or a color structure, an end or an edge, a bead, a fabric defect or a fabric damage of the textile structure (T); and / or that the state of the moving planar textile structure (T) has at least one of the following aspects: a speed, in particular parallel to the plane of the stitch plate, a deformation, in particular orthogonal to the plane of the stitch plate (SP), an elongation, in particular parallel to the plane of the stitch plate (SP).

15. Method according to claim 13 or 14, characterized by the fact thatwith the control unit (SE) at least one machine stop is effected, in particular with needle (N) at the top or with needle (N) in the textile structure (T), and / or an adjustment of a stitch frequency (f) of the needle (N) depending on the property and / or the state of the moving planar part area (T1) of the textile structure (T).

Images