Display panel, manufacturing method, and display apparatus

Abstract

Disclosed in the embodiments of the present disclosure are a display panel, a manufacturing method, and a display apparatus. The display panel comprises: a substrate, which comprises a bending area and a non-bending area, the non-bending area comprising a display area having a plurality of sub-pixels; a first refractive index film layer, which is arranged on the substrate, the display area being provided with the first refractive index film layer; and a second refractive index film layer, which is arranged on the side of the first refractive index film layer facing away from the substrate, the second refractive index film layer covering the first refractive index film layer and filling a plurality of openings. The refractive index of the second refractive index film layer is greater than that of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the substrate does not overlap the bending area; the orthographic projection of the second refractive index film layer on the substrate has a first film layer boundary close to the bending area; the bending area has a first bending boundary close to the second refractive index film layer, a first distance between the first film layer boundary and the first bending boundary being greater than 0.

Description

[0002] The present disclosure relates to the technical field of display, and in particular to a display panel, a manufacturing method and a display apparatus. Background

[0003] With the development of display technology, consumers' demands for display panels are becoming more and more diversified and personalized. Display panels are favored by consumers because of their flexibility and portability. However, when the display panel is bent, the signal line in the bending region will be broken by tension, resulting in abnormal display of the display panel. Summary

[0004] Embodiments of the present disclosure provide a display panel, including: a base substrate, including a bending region and anon-bending region; where the non-bending region includes a display region with a plurality of sub-pixels; a first refractive index film layer on the base substrate, where the display region is provided with the first refractive index film layer, and the first refractive index film layer is provided with a plurality of openings, and the plurality of openings are correspondingly arranged with the plurality of sub-pixels; a second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate, where the second refractive index film layer covers the first refractive index film layer and fills at least part of the plurality of openings; where a refractive index of the second refractive index film layer is greater than a refractive index of the first refractive index film layer; an orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending region; and the orthographic projection of the second refractive index film layer on the base substrate has a first film boundary’ proximate to the bending region, and the bending region has a first bending boundary proximate to the second refractive index film layer, and a first distance between the first film boundary and the first bending boundary is greater than 0.

[0005] In some embodiments, the non-bending region includes: a first non-bending region and a second non-bending region; the first non-bending region and the second non-bending region are arranged at both sides of the bending region, and the first non-bending region includes the display region; the second refractive index film layer is arranged in the first non-bending region, and the orthographic projection of the second refractive index film layer on the base substrate covers the display region.

[0006] In some embodiments, the first non-bending region is provided with the first refractive index film layer, and an orthographic projection of the first refractive index film layer in the first non-bending region on the base substrate has a second film boundary proximate to the bending region, and a second distance between the second film boundary and the first bending boundary is greater than or equal to 0; and / or, the second non-bending region is provided with the first refractive index film layer, and an orthographic projection of the first refractive index film layer in the second non-bending region on the base substrate has a third film boundaiy proximate to the bending region, and the bending region has a second bending boundary distal to the second refractive index film layer, and a third distance between the third film boundary' and the second bending boundary- is greater than or equal to 0.

[0007] In some embodiments, the display panel further includes: a first optical film layer arranged between the first refractive index film layer and the base substrate; where an orthographic projection of the first optical film layer on the base substrate covers the display region.

[0008] In some embodiments, the orthographic projection of the first optical film layer on the base substrate does not overlap with the bending region; the first non-bending region is provided with the first optical film layer, and an orthographic projection of the first optical film layer in the first non-bending region on the base substrate has a fourth film boundary proximate to the bending region, and a fourth distance between the fourth film boundary' and the first bending boundary is greater than or equal to 0; and / or, the second non-bending region is provided with the first optical film layer, an orthographic projection of the first optical film layer in the second non-bending region on the base substrate has a fifth film boundary proximate to the bending region, the bending region has a second bending boundary distal to the second refractive index film layer, and a fifth distance between the fifth film boundary and the second bending boundary is greater than or equal to 0.

[0009] In some embodiments, the fourth film boundary is located between the first film boundary and the first bending boundary.

[0010] In some embodiments, the second film boundary is located between the fourth film boundary and the first bending boundary; or, the second film boundary is located between the fourth film boundary' and the first film boundary'; or, the first film boundary' is located between the second film boundary' and the first bending boundary, and the fourth film boundary is located between the second film boundary and the first film boundary; or, 2 the first film boundary is located between the second film boundary and the first bending boundary, and the second film boundary is located between the fourth film boundary and the first film boundary.

[0011] In some embodiments, the display panel further includes: a second optical film layer arranged between the first optical film layer and the base substrate; where an orthographic projection of the second optical film layer on the base substrate covers the display region.

[0012] In some embodiments, the orthographic projection of the second optical film layer on the base substrate does not overlap with the bending region; the first non-bending region is provided with the second optical film layer, and an orthographic projection of the second optical film layer in the first non-bending region on the base substrate has a sixth film boundary proximate to the bending region, and a sixth distance between the sixth film boundary and the first bending boundary is greater than or equal to 0; and / or, the second non-bending region is provided with the second optical film layer, and an orthographic projection of the second optical film layer in the second non-bending region on the base substrate has a seventh film boundary' proximate to the bending region, and the bending region has a second bending boundary distal to the second refractive index film layer, and a seventh distance between the seventh film boundary and the second bending boundary’ is greater than or equal to 0.

[0013] In some embodiments, the sixth film boundary is located between the fourth film boundary and the first film boundary; or, the sixth film boundary is located between the fourth film boundary’ and the second film boundary; or, the sixth film boundary is located between the fourth film boundary' and the first bending boundary.

[0014] In some embodiments, the display panel further includes: a touch insulating layer arranged between the second optical adhesive and the base substrate; where an orthographic projection of the touch insulating layer on the base substrate covers the display region.

[0015] In some embodiments, the orthographic projection of the touch insulating layer on the base substrate does not overlap with the bending region; the first non-bending region is provided with the touch insulating layer, and an orthographic projection of the touch insulating layer in the first non-bending region on the base substrate has an eighth film boundary proximate to the bending region, and an eighth distance between the eighth film boundary and the first bending boundary is greater than 0; and / or, the second non-bending region is provided with the touch insulating layer, and an orthographic projection of the touch insulating layer in the second non-bending region on the base substrate has a ninth 3 film boundary proximate to the bending region, and the bending region has a second bending boundary distal to the second refractive index film, and a ninth distance between the ninth film boundary and the second bending boundary is greater than or equal to 0.

[0016] In some embodiments, the eighth film boundary is located between the first film boundary and the sixth film boundary'; or, the eighth film boundary is located between the second film boundary and the sixth film boundary’; or, the eighth film boundary is located between the fourth film boundary and the sixth film boundary.

[0017] In some embodiments, the display panel further includes: a thin film encapsulation layer arranged between the base substrate and the touch insulating layer; where an orthographic projection of the thin film encapsulation layer on the base substrate covers the display region.

[0018] In some embodiments, the display panel further includes: a thin film transistor array layer on the base substrate; a first planarization layer on a side of the thin film transistor array layer facing away from the base substrate; a pixel defining layer on a side of the first planarization layer facing away from the base substrate; a light emitting device arranged in an opening of the pixel defining layer; the thin film encapsulation layer on a side of the light emitting device facing away from the base substrate; a first touch electrode film layer on a side of the thin film encapsulation layer facing away from the base substrate; the touch insulating layer on a side of the first touch electrode film layer facing away from the base substrate; a second touch electrode film layer on a side of the touch insulating layer facing away from the base substrate; the second optical film layer on a side of the second touch electrode film layer facing away from the base substrate; a black matrix and / or a color filter layer on a side of the second optical film layer facing away from the base substrate; the first optical film layer on a side of the black matrix and / or the color filter layer facing away from the base substrate; the first refractive index film layer on a side of the first optical film layer facing away from the base substrate; the second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate.

[0019] In some embodiments, the display panel further includes: a protective layer on a side of the first refractive index film layer facing away from the base substrate; where an orthographic projection of the protective layer on the base substrate covers the bending region, and the orthographic projection of the protective layer on the base substrate does not overlap with the orthographic projection of the second refractive index film layer on the base substrate.

[0020] In some embodiments, the display panel further includes: a first optical film layer arranged between the first refractive index film layer and the base substrate; a second optical film layer arranged between the first optical film layer and the base substrate; a touch insulating layer arranged between the second optical adhesive and the base substrate; a thin film encapsulation layer arranged between the base substrate and the touch insulating layer; a first inorganic layer arranged between the thin film encapsulation layer and the base substrate; a second inorganic layer arranged between the thin film encapsulation layer and the base substrate; where an orthographic projection of the first refractive index film layer on the base substrate covers the bending region and the second non-bending region; an orthographic projection of the first optical film layer on the base substrate covers the first nonbending region, the bending region and the second non-bending region; an orthographic projection of the second optical film layer on the base substrate covers the first nonbending region, the bending region and the second non-bending region; an orthographic projection of the touch insulating layer on the base substrate covers the first nonbending region, the bending region and the second non-bending region; an orthographic projection of the thin film encapsulation layer on the base substrate covers the display region; an orthographic projection of the first inorganic layer on the base substrate does not overlap with the bending region; and a boundary of the orthographic projection of the first inorganic layer on the base substrate proximate to the bending region is aligned with the bending region; an orthographic projection of the second inorganic layer on the base substrate does not overlap with the bending region.

[0021] In some embodiments, the display panel further includes: a plurality of signal lines; where the plurality of signal lines include a plurality of data lines, a low-voltage signal line, an initialization signal line, a plurality of clock signal lines and a high-voltage signal line; in the bending region, an orthographic projection of a region, where the low-voltage signal line is located, on the base substrate is arranged between orthographic projections of two adjacent regions on the 5 base substrate, wherein the orthographic projections of two adjacent regions are adjacent orthographic projections of: an orthographic projection of a region, where the plurality of data lines are located, on the base substrate; an orthographic projection of a region, where the initialization signal line is located, on the base substrate; an orthographic projection of a region, where the plurality of clock signal lines are located, on the base substrate; and an orthographic projection of a region, where the high-voltage signal line is located, on the base substrate.

[0022] Embodiments of the present disclosure provide a display apparatus, including the display panel in the above embodiments.

[0023] Embodiments of the present disclosure provide a method for manufacturing a display panel, including: forming a first refractive index film layer on a base substrate; where the base substrate includes a bending region and a non-bending region, the non-bending region includes a display region w ith a plurality of sub-pixels; the display region is provided with the first refractive index film layer, the first refractive index film layer is provided with a plurality of openings, and the plurality of openings are correspondingly arranged with the plurality' of sub-pixels; forming a second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate; where the second refractive index film layer covers the first refractive index film layer and fills at least part of the plurality of openings; where a refractive index of the second refractive index film layer is greater than a refractive index of the first refractive index film layer; an orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending region; and the orthographic projection of the second refractive index film layer on the base substrate has a first film boundary’ proximate to the bending region, and the bending region has a first bending boundary proximate to the second refractive index film layer, and a first distance between the first film boundary and the first bending boundary is greater than 0. Brief Description of Figures

[0024] FIG. 1 is a schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0025] FIG. 2 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0026] FIG. 3a is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0027] FIG. 3b is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0028] FIG. 4 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0029] FIG. 5 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0030] FIG. 6 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0031] FIG. 7 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0032] FIG. 8 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0033] FIG. 9 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0034] FIG. 10 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0035] FIG. 11 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0036] FIG. 12 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0037] FIG. 13a is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0038] FIG. 13b is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0039] FIG. 14a is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0040] FIG. 14b is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0041] FIG. 15 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure.

[0042] FIG. 16 is another schematic diagram of some structures of a display panel provided by embodiments of the present disclosure. Detailed Description

[0043] In order to make the purpose, technical solutions and advantages of embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of embodiments of the present 7 disclosure. Obviously, the described embodiments are some, but not all, of the embodiments of the present disclosure. And the embodiments and features in the embodiments of the present disclosure can be combined with each other without conflict. Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of the present disclosure.

[0044] Unless otherwise defined, technical terms or scientific terms used in this disclosure shall have the usual meaning understood by a person with ordinary skill in the art to which this disclosure belongs. Words such as "First", "second" used in the disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Words such as "including" or "comprising" refer to the components or objects that appear before the word, including those listed components or objects after the word and their equivalents, without excluding other components or objects. Words such as "connected" or "coupled" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect.

[0045] It should be noted that the sizes and shapes of the figures in the drawings do not reflect true proportions and are only intended to illustrate the present disclosure. And, the same or similar reference numbers throughout represent the same or similar components or elements having the same or similar functions.

[0046] In embodiments of the present disclosure, the display apparatus includes a display panel. The display panel includes a display region. The display region has a plurality of pixel units, and each pixel unit includes a plurality of sub-pixels. Each sub-pixel can include a light emitting device and a pixel driving circuit for driving the light emitting device to emit light. The light emitting device can include an anode, a light emitting functional layer and a cathode which are stacked. Further, the light emitting device can include at least one of: Organic Light Emitting Diode (OLED), Quantum Dot Light Emitting Diode (QLED), Micro LED and Mini LED. In addition, the pixel driving circuit generally includes a plurality of transistors such as the driving transistor, the switching transistors and the storage capacitor, and the specific structure and working principle of the pixel driving circuit can be the same as those in the related art, so the details are not repeated here.

[0047] The display apparatus in embodiments of the present disclosure can be a flexible display apparatus. The display panel can be a flexible display panel. Of course, the display apparatus in the embodiments of the disclosure can also be other forms of display apparatuses, and the display panel can also be other forms of display panels, which is not limited here.

[0048] In some embodiments, each pixel unit includes a red sub-pixel, a green sub-pixel, and a blue subpixel. The red sub-pixel includes a light emitting device displaying red, the green sub-pixel includes a light emitting device displaying green, and the blue sub-pixel includes a light emitting device displaying blue. 8

[0049] In some embodiments, as shown in FIG. 1, the display panel can include: a base substrate 100, a thin film transistor array layer 110 on the base substrate 100, a first planarization layer 150 on a side of the thin film transistor array layer 110 facing away from the base substrate 100, a pixel defining layer 120 on a side of the first planarization layer 150 facing away from the base substrate 100, and a light emitting device 130 arranged in an opening of the pixel defining layer 120, a thin film encapsulation layer 140 on a side of the light emitting device 130 facing away from the base substrate 100, a first touch electrode film layer 161 on a side of the thin film encapsulation layer 140 facing away from the base substrate 100, a touch insulating layer 170 on a side of the first touch electrode film layer 161 facing away from the base substrate 100, a second touch electrode film layer 162 on a side of the touch insulating layer 170 facing away from the base substrate 100, a second optical film layer 171 on a side of the second touch electrode film layer 162 facing away from the base substrate 100, a black matrix 174 on a side of the second optical film layer 171 facing away from the base substrate 100, a color filter layer 175 onaside of the black matrix 174 facing away from the base substrate 100, a first optical film layer 172 on a side of the color filter layer 175 facing away from the base substrate 100, a first refractive index film layer 180 on a side of the first optical film layer 172 facing away from the base substrate 100, a second refractive index film layer 190 on a side of the first refractive index film layer 180 facing away from the base substrate 100, and a cover plate 200 on a side of the second refractive index film layer 190 facing away from the base substrate 100.

[0050] In some embodiments, the first touch electrode film layer 161 and the second touch electrode film layer 162 are respectively provided with touch electrodes, so that the capacitive touch function can be realized by mutual capacitance technology. In addition, the orthographic projection of the touch electrode on the base substrate and the orthographic projection of the opening region of the sub-pixel on the base substrate do not overlap, so as to avoid affecting the display effect. Furthermore, the part of the touch electrodes in one of the first touch electrode film layer 161 and the second touch electrode film layer 162 can be connected through the via holes penetrating through the touch insulating layer 170.

[0051] In some embodiments, the base substrate 100 is also provided with a plurality of signal lines including a plurality of gate lines, a plurality of data lines, a plurality of initialization signal lines and a plurality of power signal lines. For example, the pixel driving circuits corresponding to the sub-pixels in one row are connected with one gate line, the pixel driving circuit corresponding to the sub-pixels in one column are connected with one data line, the pixel driving circuit corresponding to the sub-pixels in one column are connected with one initialization signal line, and the pixel driving circuit corresponding to the sub-pixels in one column are connected with one power signal line. In this way, corresponding signals can be input to the pixel driving circuit through these signal lines to control the pixel driving circuit to drive the light emitting device to emit light.

[0052] In some embodiments, a gate driving circuit connected with a plurality of gate lines is arranged on the base substrate, and a gate scanning signal is input to the gate lines through the gate driving circuit to control the transistors in the pixel driving circuit to be turned on and off. In some embodiments, the gate driving circuit includes the transistors or the capacitor, and the specific structure and working principle of the gate driving circuit can be the same as those m the related art, so the details are not repeated here.

[0053] In some embodiments, as shown in FIG. 1, the light emitting device 130 includes an anode 131, a light emitting functional layer 132, and a cathode 133, which are stacked.

[0054] In some embodiments, the pixel driving circuits and the gate driving circuits and the signal lines are formed in the thin film transistor array layer. In some embodiments, the thin film transistor array layer can include a semiconductor layer, a gate conductive layer, a capacitor electrode layer, a first conductive layer, and a second conductive layer. Moreover, a buffer layer is arranged between the semiconductor layer and the base substrate, a gate insulating layer is arranged between the semiconductor layer and the gate conductive layer, an interlayer dielectric layer is arranged between the gate conductive layer and the capacitor electrode layer, an interlayer insulating layer is arranged between the capacitor electrode layer and the first conductive layer, a second planarization layer is arranged between the first conductive layer and the second conductive layer, and a first planarization layer is arranged between the second conductive layer and the anode. In addition, the two film layers that need to be coupled are coupled with each other through the via holes penetrating through the insulating layer.

[0055] In some embodiments, the semiconductor layer includes the active layer in the transistor described above. The semiconductor layer can be formed by patterning the semiconductor material. The semiconductor layer can be used to form the active layer of the transistor. In some embodiments, the semiconductor layer can be made of amorphous silicon, polysilicon, oxide semiconductor materials, and the like. It should be noted that the source electrode region and the drain electrode region can be conductive regions doped with N-type impurities or P-type impurities.

[0056] In some embodiments, the gate electrode and the gate line in the transistor described above are included in the gate conductive layer. Among them, the gate electrodes of some transistors are reused as one electrode of the capacitor.

[0057] In some embodiments, another electrode of the capacitor mentioned above can be included in the capacitor electrode layer. Two electrodes with opposite area form a capacitor.

[0058] In some embodiments, the first conductive layer includes the above data lines.

[0059] In some embodiments, the second conductive layer includes the initialization signal lines and the power signal lines.

[0060] In some embodiments, the thin film encapsulation lay 140 can include a first inorganic encapsulation layer (e.g., a SiON layer), an organic encapsulation layer (e. g., an acrylic layer) and a second inorganic encapsulation layer (e.g., a SiN layer) which are stacked.

[0061] For example, as shown in FIG. 1. the black matrix 174 has a plurality of black matrix openings, the plurality of black matrix openings are arranged corresponding to the light emitting regions of a plurality of sub-pixels, and the color filter layer 175 covers each black matrix opening, and the colors of the color filter layers corresponding to different color sub-pixels are different. For example, the color of the color filter layer corresponding to the red sub-pixel is red, the color filter layer corresponding to the green subpixel is green, and the color filter layer corresponding to the blue sub-pixel is blue. With this arrangement, the display panel provided by embodiments of the present disclosure can realize a polarizer-free technology, that is, a COE (Color filter On Encapsulation) structure.

[0062] In some embodiments, as show n in FIG. 1, the display panel may further include a black matrix and / or a color filter layer. For example, the display panel only includes one of the black matrix or the color filter layer.

[0063] In some embodiments, with reference to FIG. 1, the display region is provided with the first refractive index film layer 180 and the second refractive index film layer 190. The first refractive index film layer 180 has a plurality of openings, the plurality of openings are arranged corresponding to the light emitting regions of the plurality of sub-pixel. The second refractive index film layer 190 covers the first refractive index film layer 180 and fills the openings of the first refractive index film layer 180. The refractive index of the second refractive index film layer 190 is greater than the refractive index of the first refractive index film layer 180, which can improve the light emitting angle of the light emitting device and increase the light emitting brightness. Referring to FIG. 1, the refractive index of the first refractive index film layer 180 is, for example, 1.47, the refractive index of the second refractive index film layer 190 is, for example, 1.7, the refractive index of the cover plate 200 is, for example, 1.5, and the refractive index of air is, for example, 1. Since the first refractive index film layer 180 is provided with openings corresponding to sub-pixels, the second refractive index film layer 190 covers the first refractive index film layer 180 and fills the openings of the first refractive index film layer 180, the light emitted from a side direction of the sub-pixel undergoes totally reflection at the boundary between the first refractive index film layer 180 and the second refractive index film layer 190, so that the light emitted from the side direction can be emitted positive direction, which improves the luminous efficiency and brightness.

[0064] The present disclosure does not limit the materials of the first refractive index film layer and the second refractive index film layer. For example, the first refractive index film layer can be made of the low refractive index optical glue, and the second refractive index film layer can be made of the high refractive index optical glue. In this way, the first refractive index film layer and the second refractive 11 index film layer can form an enhanced lens structure, so that the display panel provided by the embodiment of the present disclosure can form an EES (Efficiency Enhancement Structure) structure and improve the display effect.

[0065] In some embodiments, the display panel can drive the gate line in a unilateral manner, that is, only one side of the gate line is provided with a gate driving circuit. In some embodiments, as shown in FIG. 2, the display panel can also drive the gate lines in a bilateral manner, that is, the gate driving circuits 210a and 210b are respectively arranged on both sides of the gate line GA. Generally, it is also necessary to input corresponding signals to the gate driving circuits 210a and 210b to control the gate driving circuits to input gate scanning signals to the gate lines. The plurality of signal lines further include a plurality of clock signal lines, high-voltage signal lines and low-voltage signal lines connected with the gate driving circuits. For example, as shown in FIG. 2, the clock signal lines CK1 a and CK2a, a high-voltage signal line VGHa and a low-voltage signal line VGLa connected with the gate driving circuit 210a, and the clock signal lines CKlb and CK2b, a high-voltage signal line VGHb and a low-voltage signal line VGLb connected with the gate driving circuit 210b can be provided. In this way, the clock signal is transmitted to the gate driving circuit through the clock signal line, the high-voltage signal is input to the gate driving circuit through the high-voltage signal line, and the low-voltage signal is input to the gate driving circuit through the low-voltage signal line, so that the gate driving circuit is controlled to input the gate scanning signal to the gate lines.

[0066] In some embodiments, the display panel includes a bending region and a non-bending region, and the display region is arranged in the non-bending region. Usually, a plurality of signal lines in the display region need to pass through the bending region and be connected with the driving chip in a bonding manner, so that the driving chip can input corresponding signals to these signal lines to control the display panel to display the image. However, due to the high elastic modulus of the material of the second refractive index film layer, when the display panel is bent, the second refractive index film layer in the bending region will peel off or the organic layer below it will peel off, which will cause the signal line originally in the neutral layer to move up, which will lead to the signal line in the bending region being pulled and broken, thus causing the display panel to be abnormal.

[0067] Based on this, as shown in FIG. 3a to FIG. 4, in the display panel provided by embodiments of the present disclosure, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 does not overlap with the bending region WB, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 has a first film boundary SMI proximate to the bending region WB, and the bending region WB has a first bending boundary SB1 proximate to the second refractive index film layer 190. There is a first distance hl between the first film boundary SMI and the first bending boundaiy SB I. By making the first distance hl greater than 0, the first film boundary 12 SMI of the second refractive index film 190 is moved to a position with the first distance hl from the first bending boundary SB1 to prevent the first film boundary SMI from falling into the bending region WB, which is equivalent to not arranging the second refractive index film 190 in the bending region WB, to avoid the signal lines in the bending zone WB from being pulled and broken during the bending process due to the bending of the second refractive index film layer 190, thereby reducing the risk of signal lines breakage and improving display abnormalities.

[0068] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 4, the non-bending region can include a first non-bending region NWB1 and a second non-bending region NWB2, which are arranged at both sides of the bending region WB. The first non-bending region NWB1 includes the display region AA, and the second non-bending region NWB2 includes the bonding region with a plurality of bonding pads. Then, a plurality of signal lines in the first non-bending region NWB1 enter the second nonbending region NWB2 through the bending region WB, and are connected with the bonding pads one by one. Then, the plurality of bonding pads are connected with the driving chip through bonding, so that the driving chip can input corresponding signals to these signal lines through the bonding pads to control the display panel to display image.

[0069] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the second refractive index film layer 190 is arranged in the first non-bending region NWB I, and the second refractive index film layer 190 is not arranged in the second non-bending region NWB2. Moreover, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers the display region AA, and the orthographic projection of the first refractive index film layer 180 on the base substrate 100 has an overlapping region with the display region AA, thus improving the light emitting angle of the light emitting device and increasing the light emitting brightness.

[0070] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the first nonbending region NWB1 further includes a non-display region BB arranged between the display region AA and the bending region WB. The orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers not only the display region AA, but also part of the non-display region BB. In some embodiments, the present disclosure does not limit the first distance hl, for example, hl >0.8 mm, for example, hl can be 0.8 mm, 0.83 mm, 0.85 mm, 0.88 mm, 0.9 mm, 0.92 mm, 0.95 mm, etc.

[0071] It should be noted that, with reference to FIG. 4, the remaining boundaries of the display region AA (for example, BJ1, BJ2 and BJ3) are also correspondingly arranged with non-display regions BB, and signal lines and gate driving circuits are provided in these non-display regions BB. The orthographic projection of the second refractive index film layer 190 on the base substrate 100 further covers the nondisplay region BB corresponding to the remaining boundaries (for example, BJ1, BJ2, BJ3) of the display region AA, and the orthographic projection of the first refractive index film layer 180 on the base substrate 13 100 further covers the non-display region BB corresponding to the remaining boundaries (for example, BJ1, BJ2, BJ3) of the display region AA.

[0072] In order to avoid the influence of the first refractive index film layer 180 on the bending process of the bending region, in some embodiments of the present disclosure, as shown in FIGS. 3a, 3b and 5 to 7, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 cannot overlap with the bending region WB. In some embodiments, the first refractive index film layer 180 can be arranged in the first non-bending region NWB1, and the first refractive index film layer 180 cannot be arranged in the second non-bending region NWB2. Moreover, the orthographic projection of the first refractive index film layer 180 in the first non-bending region NWB1 on the base substrate 100 has a second film boundary SM2 proximate to the bending region WB, and there is a second distance h2 between the second film boundary SM2 and the first bending boundary SB1, so that the second distance 112 can be greater than or equal to 0. In some embodiments, the second distance h2 can be greater than 0, and then the second film boundary SM2 is arranged between the first film boundary SMI and the first bending boundary SB1. In some embodiments, the second film boundary' SM2 can be aligned with the first film boundary SMI, and the second distance h2 is equal to the first distance hl. In some embodiments, the second film boundary SM2 can be misaligned with the first film boundary SMI, and the second film boundary SM2 can be misaligned with the first bending boundary' SB1, so that the second distance h2 is smaller than the first distance hl. In some embodiments, the second distance h2 can be equal to 0, the second film boundary SM2 is aligned with the first bending boundary SB1.

[0073] In some embodiments, the second refractive index film layer can be provided only in the first non-bending region. In some embodiments, the second refractive index film layer can be provided in both the first non-bending region and the second non-bending region. For example, as shown in FIG. 3b, the orthographic proj ection of the first refractive index film layer 180 in the second non-bending region NWB2 on the base substrate 100 has a third film boundary SM3 proximate to the bending region WB, the bending region WB has a second bending boundary SB2 distal to the second refractive index film layer 190, and the third distance h3 between the third film boundary' SM3 and the second bending boundary SB2 can be greater than or equal to 0. In some embodiments, the third distance h3 can be equal to the second distance 112, or, the third distance h3 can be greater than or smaller than the second distance h2.

[0074] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the orthographic projection of the first optical film layer 172 on the base substrate 100 covers the display region AA. In some embodiments, the orthographic projection of the first optical film layer 172 on the base substrate 100 can further cover the non-display region BB corresponding to the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display region AA.

[0075] In order to avoid the influence of the first optical film layer 172 on the bending process of the bending region, in some embodiments of the present disclosure, as shown in FIGS. 3a, 3b and 5 to 7, the orthographic projection of the first optical film layer 172 on the base substrate 100 cannot overlap with the bending region WB. For example, the first non-bending region NWB1 can be provided with the first optical film layer 172, and the orthographic projection of the first optical film layer 172 in the first nonbending region NWB1 on the base substrate 100 has a fourth film boundary SM4 proximate to the bending region WB, and a fourth distance h4 can be provided between the fourth film boundary SM4 and the first bending boundary SB1, so that the fourth distance h4 can be greater than or equal to 0. In some embodiments, the fourth distance h4 can be greater than 0, and then the fourth film boundary7 SM4 is arranged between the first film boundary SM1 and the first bending boundary' SB I. In some embodiments, the fourth film boundary SM4 can be aligned with the first film boundary SMI, and the fourth distance h4 can be equal to the first distance hl. In some embodiments, the fourth film boundary' SM4 can be misaligned with the first film boundary SMI, and the fourth film boundary' SM4 can be misaligned with the first bending boundary' SB 1, so that the fourth distance h4 is smaller than the first distance hl. In some embodiments, the fourth distance h4 can be equal to 0, and the fourth film boundaiy SM4 can be aligned with the first bending boundaiy SB I.

[0076] For example, as shown in FIGS. 3a and 3b, the fourth film boundary SM4 can be arranged between the first film boundary SMI and the second film boundary' SM2, and the second film boundary SM2 is arranged between the fourth film boundary SM4 and the first bending boundary SB1, so that h2<h4<hl. In this way, the first refractive index film layer 180 can wrap around the fourth film boundary SM4 of the first optical film layer 172, and the amount of edge wrapping should be based on the mechanical influence range. In some embodiments, h2 can be >0.2mm, for example, H2 is 0.2 mm, 0.22 mm, 0.25 mm, 0.28 mm, 0.3 mm, etc.

[0077] In some embodiments, as shown in FIG. 5, the fourth film boundary SM4 can be arranged between the first film boundary SMI and the first bending boundary SB1, and the second film boundary SM2 is arranged between the fourth film boundary’ SM4 and the first film boundary SMI, so h4<h2<hl. In this way, the film boundary' of the first refractive index film layer 180 can be reduced to a flat position in the direction towards the display region AA, so as to prevent the risk of peeling in the bending process when the first refractive index film layer 180 is thin and the boundary of the first refractive index film layer 180 is proximate to the bending region WB.

[0078] In some embodiments, as shown in FIG. 6, the first film boundary' SMI can be arranged between the second film boundary' SM2 and the first bending boundary' SB1, and the fourth film boundary' SM4 is arranged between the second film boundary SM2 and the first film boundary' SMI, so that hl<h4<h2. In this way, the second refractive index film layer 190 can wrap the fourth film boundary SM4 of the first 15 optical film layer 172 and the second film boundary SM2 of the first refractive index film layer 180, and the amount of edge wrapping should be based on the mechanical influence range.

[0079] In some embodiments, as shown in FIG. 7, the first film boundary' SMI can be arranged between the second film boundary SM2 and the first bending boundary SB1, and the second film boundary' SM2 can be arranged betyveen the fourth film boundary SM4 and the first film boundary SMI, so that h 1 <h2<h4. With this arrangement, the second refractive index film layer 190 can be wrapped around the second film boundary SM2 of the first refractive index film layer 180, and the first refractive index film layer 180 can be wrapped around the fourth film boundary SM4 of the first optical film layer 172, and the amount of edge wrapping should be based on the mechanical influence range.

[0080] In some embodiments, the first optical film layer 172 can be arranged only in the first nonbending region NWB1. In some embodiments, the first optical film layer 172 can be arranged in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, both the first non-bending region NWB1 and the second nonbending region NWB2 are provided with the first optical film layer 172. The orthographic projection of the first optical film layer 172 in the second non-bending region NWB2 on the base substrate 100 has a fifth film boundary SM5 proximate to the bending region WB, and the bending region WB has a second bending boundary' SB2 distal to the second refractive index film layer 190, and there is a fifth distance h5 between the fifth film boundary SM5 and the second bending boundary SB2, so that the fifth distance h5 can be greater than or equal to 0. In some embodiments, the fifth distance h5 can be equal to the fourth distance h4. Of course, the fifth distance h5 can be greater than or smaller than the fourth distance h4.

[0081] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the orthographic projection of the second optical film layer 171 on the base substrate 100 can cover the display region AA. In some embodiments, the orthographic projection of the second optical film layer 171 on the base substrate 100 further covers the non-display region BB corresponding to the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display region AA.

[0082] In order to avoid the influence of the second optical film layer 171 on the bending process of the bending region, in some embodiments of the present disclosure, as shoyvn in FIGS. 3a, 3b and 5 to 7, the orthographic projection of the second optical film layer 171 on the base substrate 100 cannot overlap with the bending region WB. In some embodiments, the second optical film layer 171 can be arranged in the first non-bending region NWB1, and the orthographic projection of the second optical film layer 171 in the first non-bending region NWB1 on the base substrate 100 has a sixth film boundary SM6 proximate to the bending region WB. There is a sixth distance h6 between the sixth film boundary' SM6 and the first bending boundary SB1, and the sixth distance h6 can be greater than or equal to 0. For example, the sixth distance h6 can be greater than 0, and then the sixth film boundary' SM6 is arranged betyveen the first film 16 boundary SMI and the first bending boundary SB1. In some embodiments, the sixth film boundary SM6 can be aligned with the first film boundary SMI, and the sixth distance h6 is equal to the first distance hl. In some embodiments, the sixth film boundary SM6 can be misaligned with the first film boundary SMI, and the sixth film boundary SM6 can be misaligned with the first bending boundary SB I, so that the sixth distance h6 is smaller than the first distance hl. In some embodiments, the sixth distance h6 can be equal to 0, and the sixth film boundary SM6 can be aligned with the first bending boundary SB1.

[0083] In some embodiments, as shown in FIGS. 3a and 3b, the sixth film boundary7 SM6 can be arranged between the fourth film boundary SM4 and the first film boundary7 SMI, so h4<h6<hl. With this arrangement, the first optical film layer 172 can wrap the sixth film boundary7 SM6 of the second optical film layer 171, and the amount of edge wrapping should be based on the mechanical influence range.

[0084] In some embodiments, as shown in FIG. 5, the sixth film boundary SM6 can be arranged between the fourth film boundary SM4 and the second film boundary7 SM2, so that h4<h6<h2. With this arrangement, the first optical film layer 172 can wrap the sixth film boundary SM6 of the second optical film layer 171, and the amount of edge wrapping should be based on the mechanical influence range.

[0085] In some embodiments, as shown in FIGS. 6 and 7, the sixth film boundary SM6 can be arranged between the fourth film boundary SM4 and the first bending boundary7 SB1, and then h6<h4.

[0086] In some embodiments, the second optical film layer 171 can be arranged only in the first nonbending region NWB1. In some embodiments, the second optical film layer 171 can be arranged in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the orthographic projection of the second optical film layer 171 in the second non-bending region NWB2 on the base substrate 100 has a seventh film boundary7 SM7 proximate to the bending region WB, and the bending region WB has a second bending boundary SB2 distal to the second refractive index film layer 190. There is a seventh distance h7 between the seventh film boundary SM7 and the second bending boundary SB2, the seventh distance h7 can be greater than or equal to 0. In some embodiments, the seventh distance h7 can be equal to the sixth distance h6. Of course, the seventh distance h7 can be greater or smaller than the sixth distance h6.

[0087] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the orthographic projection of the touch insulating layer 170 on the base substrate 100 covers the display region AA. In some embodiments, the orthographic projection of the touch insulating layer 170 on the base substrate 100 further covers the non-display region BB corresponding to the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display region AA.

[0088] In order to avoid the influence of the touch insulating layer 170 on the bending process of the bending region, in some embodiments of the present disclosure, as shown in FIGS. 3a, 3b, and 5 to 7, the orthographic projection of the touch insulating layer 170 on the base substrate 100 cannot overlap with the 17 bending region WB. In some embodiments, a touch insulating layer 170 can be arranged in the first nonbending region NWB1, and the orthographic projection of the touch insulating layer 170 in the first nonbending region NWB1 on the base substrate 100 has an eighth film boundary SM8 proximate to the bending region WB, and there is an eighth distance h8 between the eighth film boundary SM8 and the first bending boundary SB1, the eighth distance h8 can be greater than 0. In some embodiments, the eighth distance h8 can be greater than 0, and then the eighth film boundary SM8 is arranged between the first film boundary SMI and the first bending boundary SB1. In some embodiments, the eighth film boundary SM8 can be aligned with the first film boundary7 SMI, and the eighth distance h8 is equal to the first distance hl. In some embodiments, the eighth film boundary7 SM8 can be misaligned with the first film boundary SMI, and the eighth film boundary7 SM8 can be misaligned with the first bending boundary- SB1, so that the eighth distance h8 is smaller than the first distance hl. In some embodiments, the eighth distance h8 can be equal to 0, and the eighth film boundary7 SM8 can be aligned with the first bending boundary SB1.

[0089] In some embodiments, as shown in FIGS. 3a and 3b, the eighth film boundary SM8 can be arranged between the first film boundary SMI and the sixth film boundary' SM6, and then h6<h8<hl.

[0090] In some embodiments, as shown in FIGS. 5 to 7, the eight film boundary can be arranged between the second film boundary SM2 and the sixth film boundary SM6, and then h6<h8<h2.

[0091] In some embodiments, as shown in FIGS. 6 and 7, the eight film boundary can be arranged between the fourth film boundary SM4 and the sixth film boundary SM6, and then h6<h8<h4.

[0092] In some embodiments, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the second optical film layer 171 can be w rapped around the eighth film boundary SM8 of the touch insulating layer 170, and the amount of edge wrapping should be based on the mechanical influence range.

[0093] In some embodiments, the touch insulating layer 170 can be arranged only in the first nonbending region NWB1. In some embodiments, the touch insulating layer 170 can be arranged in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the orthographic projection of the touch insulating layer 170 in the second non-bending region NWB2 on the base substrate 100 has a ninth film boundaiy SM9 proximate to the bending region WB, the bending region has the second bending boundaiy SB2 distal to the second refractive index film layer 190. There is a ninth distance h9 betw een the ninth film boundary7 SM9 and the second bending boundary SB2, and the ninth distance h9 can be greater than or equal to 0. In some embodiments, the ninth distance h9 can be equal to the eighth distance h8. Of course, it is also possible to make the ninth distance h9 larger or smaller than the eighth distance h8.

[0094] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 can cover the display region 18 AA. In some embodiments, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 further covers the non-display region BB corresponding to the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display region AA.

[0095] In some embodiments of the present disclosure, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the thin film encapsulation layer 140 is arranged in the first non-bendmg region NWBI. For example, the thin film encapsulation layer 140 can be arranged only in the first non-bending region NWBI. In addition, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 has a tenth film boundary SMI 0 proximate to the bending region WB, and there is atenth distance hl 0 between the tenth film boundary7 SM10 and the first bending boundary SB1, so that the tenth distance hlO can be greater than or equal to 0. In some embodiments, the tenth distance hl 0 can be greater than 0, and then the tenth film boundary' SMI 0 is arranged between the first film boundary' SMI and the first bending boundary SB1. In some embodiments, the tenth film boundary SM10 can be aligned with the first film boundary SMI, and the tenth distance hlO is equal to the first distance hl. In some embodiments, the tenth film boundary SM10 can be misaligned with the first film boundary SMI, and the tenth film boundary7 SM10 can be misaligned with the first bending boundary7 SB1, so that the tenth distance hlO is smaller than the first distance hl. In some embodiments, the tenth distance hlO can be equal to 0, and the tenth film boundary SMI0 can be aligned with the first bending boundary7 SB1.

[0096] In some embodiments, as shown in FIGS. 3a and 3b, the tenth film boundary7 SM10 can be arranged between the eighth film boundary SM8 and the first film boundary SMI, and then h8<h!0<hl.

[0097] In some embodiments, as shown in FIG. 5, the tenth film boundary SM10 can be arranged between the second film boundary SM2 and the first film boundary SMI, and then h2<hl0<hl.

[0098] In some embodiments, as shown in FIGS. 6 and 7, the tenth film boundary SMI0 can be arranged between the eighth film boundary SM8 and the fourth film boundary7 SM4, and then h8<hI0<h4.

[0099] In some embodiments, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the touch insulating layer 170 can be wrapped around the tenth film boundary SM10 of the thin film encapsulation layer 140, and the amount of edge wrapping should be based on the mechanical influence range. In addition, it is possible to wrap the touch insulation layer 170 around the thin film encapsulation layer 140 more. If the touch insulation layer 170 wraps less around the thin film encapsulation layer 140, there may be a risk of over etching the thin film encapsulation layer 140 when etching the touch insulation layer 170.

[00100] In some embodiments, the materials of the first optical film layer 172, the second optical film layer 171, the first refractive index film layer 180 and the second refractive index film layer 190 include, but are not limited to, organic materials.

[00101] It should be noted that, as shown in FIGS. 3a and 3b, the first refractive index film layer 180, the first optical film layer 172 and the second optical film layer 171 a adopt a structure where the upper film 19 layer wraps around the lower film layer, and the amount of edge wrapping should be based on the mechanical influence range. Moreover, after all wrapping is completed, the h2 should be at least 0.2 mm to ensure that there are no other film layers affecting the position of the signal line in the neutral layer in the bending area.

[00102] It should be noted that, as show n in FIG. 6, the boundaries of the thin film encapsulation layer 140, the touch insulating layer 170 and the second optical film layer 171 proximate to the bending region remain unchanged, that is, the second optical film layer 171 of the organic film layer wraps the touch insulating layer 170, and the remaining organic film layers, the first optical film layer 172, the first refractive index film layer 180 and the second refractive index film layer 190, are all retracted to a flat place within the boundaries of the thin film encapsulation layer 140. At the same time, the second refractive index film layer 190 wraps the first refractive index film layer 180 and the first optical film layer 172 to ensure that all the second optical film layer 171, the first optical film layer 172, the first refractive index film layer 180 and the second refractive index film lay er 190 in the bending region are removed. In addition, on the premise of ensuring that the touch insulating layer 170 is effectively protected, all other upper organic film layers are inwardly reduced, while maintaining the principle of the upper layer of the film wrapping the lower layer.

[00103] It should be noted that, as shown in FIG. 7, the first refractive index film layer 180 can be designed to wrap the first optical film layer 172.

[00104] It should be noted that, as shown in FIGS. 3a, 3b, and 5 to 7, the touch insulating layer 170 can be wrapped around the thin film encapsulation layer 140 more, and if the touch insulating layer 170 is wrapped around the thin film encapsulation layer 140 less, there may be a risk of over etching the thin film encapsulation layer 140 when etching the touch insulation layer 170.

[00105] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the display panel further includes a first inorganic layer 114 arranged between the thin film encapsulation layer 140 and the base substrate 100. The first inorganic layer 114 can include one or more of a buffer layer, a gate insulating layer, an interlayer dielectric layer, and an interlayer insulating layer. In order to avoid the influence of the first inorganic layer 114 on the bending process of the bending region, the orthographic projection of the first inorganic layer 114 on the base substrate 100 cannot overlap with the bending region WB, and the boundary of the orthographic projection of the first inorganic layer 114 on the base substrate 100 proximate to the bending region WB is aligned with the bending region WB. In some embodiments, the orthographic projection of the first inorganic layer 114 on the base substrate 100 covers the display region AA. In some embodiments, the orthographic projection of the first inorganic layer 114 on the base substrate 100 further covers the non-display region BB corresponding to the remaining boundaries (for example, BJI. BJ2, BJ3) of the display region AA.

[00106] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the display panel further includes a second inorganic layer 113 arranged between the thin film encapsulation layer 140 and the base substrate 100. The second inorganic layer 113 can include one or more of a buffer layer, a gate insulating layer, an interlayer dielectric layer and an interlayer insulating layer except the first inorganic layer 114. In order to avoid the influence of the second inorganic layer 113 on the bending process of the bending region, the orthographic projection of the second inorganic layer 113 on the base substrate 100 cannot overlap with the bending region WB.

[00107] In some embodiments, as shown in FIG. 3a to FIG. 8, the first non-bending region NWB1 is provided with a second inorganic layer 113, and the orthographic projection of the second inorganic layer 113 in the first non-bending region NWB1 on the base substrate 100 has an eleventh film boundary' SMI I proximate to the bending region WB, and there is an eleventh distance hl 1 between the eleventh film boundary SMI 1 and the first bending boundary SB1, and the eleventh distance hl 1 can be greater than or equal to 0. In some embodiments, the eleventh distance hl 1 can be greater than 0, and then the eleventh film boundary SM11 is arranged between the first film boundary SMI and the first bending boundary' SB1. In some embodiments, the eleventh film boundary' SMI 1 can be aligned with the first film boundary' SMI, and the eleventh distance hl I is equal to the first distance hl. In some embodiments, the eleventh film boundary SMI I can be misaligned with the first film boundary' SMI, and the eleventh film boundary SM11 can be misaligned with the first bending boundary SB 1, so that the eleventh distance hl 1 is smaller than the first distance hl. In some embodiments, the eleventh distance hll can be equal to 0, and the eleventh film boundary SMI 1 can be aligned with the first bending boundary SB1.

[00108] In some embodiments, as shown in FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the eleventh film boundary SMII can be arranged between the first film boundary SMI and the first bending boundary SBI, and then hl l<hl.

[00109] In some embodiments, as shown in FIGS. 3a and 3b, the eleventh film boundary’ SM11 can be arranged between the second film boundary SM2 and the fourth film boundary SM4, and then h2<hl l<h4.

[00110] In some embodiments, as shown in FIG. 5, the eleventh film boundary SMI 1 can also be aligned with the fourth film boundary' SM4, and hl l=h4.

[00111] In some embodiments, as shown rn FIG. 6, the eleventh film boundary SMII can be arranged between the sixth film boundary’ SM6 and the first bending boundary’ SBI, and then hl I<h4<h2.

[00112] In some embodiments, as shown in FIG. 7, the eleventh film boundary SMII can be arranged between the sixth film boundary SM6 and the first bending boundary SBI, and then hl Kh2<h4.

[00113] In some embodiments, the second inorganic layer 113 can be arranged only in the first nonbending region NWB1. In some embodiments, the second inorganic layer 113 can be arranged rn both the first non-bending region NWBI and the second non-bending region NWB2. For example, as shown in 21 FIG. 3a, FIG. 3b, and FIG. 5 to FIG. 7, the second inorganic layer 113 is arranged in the second nonbending region NWB2, and the orthographic projection of the second inorganic layer 113 in the second non-bending region NWB2 on the base substrate 100 has a twelfth film boundary SM12 proximate to the bending region WB, and there is a twelfth distance hI2 between the twelfth film boundary SMI2 and the second bending boundary SB2, and the twelfth distance hl2 can be greater than or equal to 0.

[00114] In some embodiments, the twelfth distance h!2 can be equal to the eleventh distance hll. Of course, the twelfth distance hl2 can be larger or smaller than the eleventh distance hll.

[00115] In some embodiments of the present disclosure, as shown in FIG. 3a to FIG. 8, the display panel can further include a protective layer 173 arranged on a side of the first refractive index film layer 180 facing away from the base substrate 100, and arranged between the first refractive index film layer 180 and the cover plate. The orthographic projection of the protective layer 173 on the base substrate 100 covers the bending region WB, so that the bending region can be protected, and the orthographic projection of the protective layer 173 on the base substrate 100 does not overlap with the orthographic projection of the second refractive index film layer 190 on the base substrate 100. It should be noted that the elastic modulus of the protective layer 173 is low, and the influence on the position of the signal line in the neutral layer can be ignored, which means that the signal line will not be broken due to the provision of the protective layer 173.

[00116] In some embodiments, as shown in FIGS. 3a and 3b, the orthographic projection of the protective layer 173 on the base substrate 100 can further cover the part of the orthographic projection of the first refractive index film layer 180 on the base substrate 100 proximate to the bending region WB.

[00117] In some embodiments, as shown in FIGS. 3a and 3b, the protective layer 173 can be arranged in contact with the first film boundary SMI of the second refractive index film 190. In some embodiments, as shown in FIGS. 5 to 7, there can be a certain distance LI between the protective layer 173 and the first film boundary SMI of the second refractive index film 190, and LI is smaller than hl. In some embodiments, the upper surface of the protective layer 173 can be slightly higher than the upper surface of the second refractive index film layer 190, which is beneficial to protect the second refractive index film layer 190 from being affected during the assembly process. Of course, the upper surface of the protective layer 173 can be slightly lower than the upper surface of the second refractive index film layer 190.

[00118] In some embodiments, as shown in FIG. 3a to FIG. 8, the second refractive index film layer 190 covers at least the thin film encapsulation layer 140 and / or the touch insulating layer 170 in the first nonbending region NWB1.

[00119] In some embodiments, as shown in FIGS. 5 to 7, the orthographic projection of the protective layer 173 on the base substrate 100 cannot overlap with the orthographic projection of the first refractive index film layer 180 on the base substrate 100.

[00120] In some embodiments, as shown in FIG. 8, the orthographic projection of the first refractive index film layer 180 on the base substrate 100 can cover the bending region WB and the second nonbending region NWB2. Due to the elastic modulus of the first refractive index film layer 180 is low, the problem of peeling can be ignored, which makes the signal lines originally in the neutral layer move downward, the signal lines are in a compressed state during the bending process, and the signal lines are not easy to break under the compressed state.

[00121] In some embodiments, as shown in FIG. 8, the orthographic projection of the first optical film layer 172 on the base substrate 100 can cover the first non-bending region NWB1, the bending region WB and the second non-bending region NWB2. This can further make the signal lines onginally in the neutral layer move downward, the signal lines are in a compressed state during the bending process, and the signal lines are not easy to break under the compressed state.

[00122] In some embodiments, as shown in FIG. 8, the orthographic projection of the second optical film layer 171 on the base substrate 100 can cover the first non-bending region NWB1, the bending region WB and the second non-bending region NWB2. This can further make the signal lines onginally in the neutral layer move downward, the signal lines are in a compressed state during the bending process, and the signal lines are not easy to break under the compressed state.

[00123] In some embodiments, as shown in FIG. 8, the orthographic projection of the touch insulating layer 170 on the base substrate 100 can cover the first non-bending region NWB1, the bending region WB and the second non-bending region NWB2. This can further make the signal lines onginally m the neutral layer move downward, the signal lines are in a compressed state during the bending process, and the signal lines are not easy to break under the compressed state.

[00124] It should be noted that, as shown in FIGS. 1, 3a, 3b and 5 to 8, 112 represents the second planarization layer and 111 represents the second conductive layer.

[00125] In some embodiments, the second inorganic layer 113, the second inorganic layers 113, 112, the second planarization layer 112, and the second conductive layer 111 can be part of the structure of the thin film transistor array layer 110, that is, the second inorganic layer 113, the second inorganic layers 113, 112, the second planarization layer 112, and the second conductive layer 111 are formed at the same time during the formation of the thin film transistor array layer 110. Of course, the thin film transistor array layer 110 can further include other metal film layers or insulating layer structures needed to form the driving light emitting element 130, which will not be described in detail here.

[00126] In order to block the flow of the organic encapsulation layer in the thin film encapsulation layer 140 and improve the encapsulation effect, a blocking dam is arranged around the display region AA. In some embodiments of the present disclosure, as shown in FIG. 9, the first non-bending region NWB1 further includes at least two blocking dams (such as 176 and 177) surrounding the display region AA, and the blocking dams (such as 176 and 177) are arranged in the non-display region BB. Among them, the number of blocking dams can be two, three, four or more, which is not limited here. FIG. 9 takes two blocking dams as an example, that is, two blocking dams are provided: a first blocking dam 176 and a second blocking dam 177. The first blocking dam 176 is arranged around the display region AA, and the second blocking dam 177 is annularly arranged on the periphery of the first blocking dam 176.

[00127] In some embodiments, the first blocking dam 176 and the second blocking dam 177 can be manufactured at the same time when the first planarization layer 150 and the pixel defining layer 120 are manufactured, so that the first blocking dam 176 and the second blocking dam 177 are formed by a laminated structure of the pixel defining layer 120 and the first planarization layer 150, and the process flow is reduced.

[00128] In some embodiments, the first blocking dam and the second blocking dam can be manufactured at the same time when the pixel defining layer is manufactured, so that the first blocking dam and the second blocking dam are integrated with the pixel defining layer, and the process flow is reduced. In some embodiments, the first blocking dam and the second blocking dam can be manufactured at the same time when the first planarization layer is manufactured, so that the first blocking dam and the second blocking dam are integrated with the first planarization layer, and the process flow is reduced.

[00129] In some embodiments of the present disclosure, as shown in FIG. 9, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 can cover the orthographic projection of all blocking dams on the base substrate 100, so that the second refractive index film layer 190 can completely cover the display region AA. In addition, the orthographic projection of the first refractive index film layer 180 on the base substrate 100 can cover the orthographic projection of all blocking dams on the base substrate 100, so that the first refractive index film layer 180 can completely cover the display region AA. For example, as shown in FIG. 9, the orthographic projections of the second refractive index film layer 190 and the first refractive index film layer 180 on the base substrate 100 cover the orthographic projections of the first blocking dam and the second blocking dam on the base substrate 100.

[00130] In some embodiments of the present disclosure, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 cannot overlap with the side of at least one blocking dam proximate to the bending region WB, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers the orthographic projection of the 24 remaining side of all blocking dams on the base substrate 100. For example, as shown in FIG. 10, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 does not overlap with the orthographic projection of the side of the second blocking dam 177 proximate to the bending region WB on the base substrate 100, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers the orthographic projection of the remaining sides of the first blocking dam 176 and the second blocking dam 177 on the base substrate 100.

[00131] In some embodiments of the present disclosure, in a region proximate to the bending region WB, the first film boundary SMI of the second refractive index film layer 190 can be located between the second blocking daml77 and the first blocking dam 176, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers the orthographic projection of the remaining sides of all blocking dams on the base substrate 100.

[00132] In some embodiments of the present disclosure, as shown in FIG. 10, in a region proximate to the bending region WB, the distance between the first film boundary SMI of the second refractive index film layer 190 and the second blocking dam 177 can be smaller than the distance hl between the first film boundary SMI of the second refractive index film layer 190 and the bending region WB, so that the second refractive index film layer 190 has sufficient buffer space to avoid splitting.

[00133] In some embodiments of the present disclosure, as shown in FIG. 10, the width of the bending region WB is greater than the distance between the first film boundary SMI of the second refractive index film layer 190 and the bending region WB (that is, the first distance hl), so that the bending of the bending region avoids the second refractive index film layer 190 (high elastic modulus) and avoids splitting.

[00134] In some embodiments, as shown in FIG. 4, in the bending region WB and the non-bending region, all multiple data lines are arranged in the middle region of the base substrate 100, and the clock signal lines (such as CKla, CK2a, CKlb, CK2b), the initialization signal lines (such as VINITa, VINITb), the high-voltage signal lines (such as VGHa, VGHb) and the low-voltage signal lines (such as VGLa, VGHB) are arranged on both sides of the data line DA in sequence, and the signal lines are also arranged in a symmetrical structure. That is, the orthographic projection of the region where all the data lines DA are located on the base substrate 100 is arranged in the middle region of the base substrate 100. In both sides of the orthographic projection of the region where the data lines DA is located, the orthographic projection of the region where the clock signal lines (such as CKla, CK2a, CKlb and CK2b) are located on the base substrate 100, the orthographic projection of the region where the initialization signal lines (such as VINITa and VINITb) are located on the base substrate 100, the orthographic proj ection of the region where the high-voltage signal lines (such as VGHa and VHGB) are located on the base substrate 100 and the orthographic projection of the region where the low-voltage signal lines (such as VGLa, VGLb) are located on the base substrate 100 can be arranged in sequence. Due to the low-voltage signal is usually at the outermost side in the bending region WB, proximate to the edge of the base substrate. Cracks may appear after bending in the bending region, which will cause water vapor to enter through the cracks. However, the voltage (negative value) transmitted on the low-voltage signal line is usually low, which leads to a large pressure difference between the low-voltage signal line and the signal line proximate to the low-voltage signal line. Under the operation of reliability double 85 (for example, the reliability test of 85% humidity and 85% temperature), the low-voltage signal line is corroded and disconnected, resulting in a black screen.

[00135] In order to further reduce the corrosion and disconnection of the low-voltage signal lines, as shown in FIG. 10, in the bending region WB, the orthographic projection of the region where the low-voltage signal lines (such as VGLa and VGLb) are located on the base substrate 100 can be arranged between the orthographic projection of the region where the plurality of data lines DA are located on the base substrate 100 and the edge of the base substrate 100. In this way, the region where the low-voltage signal lines (such as VGLa and VGLb) are located is moved inward, and the water and oxygen are blocked by other signal lines while the low-voltage signal lines are distal to the edge of the base substrate 100.

[00136] In some embodiments, as shown in FIG. 10, in the bending region WB, in the row direction of the pixel units, there is a distance Hl a between the orthographic projection of the region where the low-voltage signal lines VGLa are located on the base substrate 100 and the edge of the base substrate 100. The specific value of Hlais not limited in this disclosure. In some embodiments, 832 um<Hla<2000 urn. For example, Hla can be selected from 850 urn, 900 urn, 1000 um, 1100 urn, 1500 urn, 1800 um, 2000 um, etc.

[00137] In some embodiments, as shown in FIG. 10, in the bending region WB, in the row direction of the pixel units, there is a distance Hlb between the orthographic projection of the region where the low-voltage signal lines VGLb are located on the base substrate 100 and the edge of the base substrate 100. The specific value of Hlb is not limited in this disclosure. In some embodiments, 832 um<Hlb<2000 um. For example, Hlb can be selected from 850 um, 900 um, 1000 um, 1100 um, 1500 um, 1800 um, 2000 um, etc.

[00138] In some embodiments, Hla and Hlb can be the same, and a symmetrical arrangement can be achieved.

[00139] In some embodiments, in the bending region, the orthographic projection of the region where the low-voltage signal line is located on the base substrate can be arranged between the orthographic projection of the region where a plurality of data lines are located and the orthographic projection of the region where the clock signal lines are located on the base substrate. For example, as shown in FIG. 10, the orthographic projection of the region where the low-voltage signal line VGLa is located is arranged between the orthographic projection of the region where the plurality of data lines DA are located and the 26 orthographic projection of the region where the clock signal lines CKla and CK2a are located. The orthographic projection of the region where the low-voltage signal line VGLb is located on the base substrate 100 is arranged between the orthographic projection of the region where the plurality of data lines DA are located on the base substrate 100 and the orthographic projection of the region where the clock signal lines CK lb and CK2b are located on the base substrate 100.

[00140] In some embodiments, in the bending region, the orthographic proj ection of the region where the low-voltage signal line is located on the base substrate can be arranged between the orthographic projection of the region where the clock signal lines are located on the base substrate and the orthographic projection of the region w here the initialization signal line is located on the base substrate.

[00141] In some embodiments, in the bending region, the orthographic proj ection of the region where the low-voltage signal line is located on the base substrate can be arranged between the orthographic projection of the region where the initialization signal line is located on the base substrate and the orthographic projection of the region where the high-voltage signal line is located on the base substrate.

[00142] In some embodiment of the present disclosure, the display panel further includes at least one dummy signal line arranged between the plurality of signal lines and the edge of the base substrate. Based on this, one or more dummy signal lines are designed to block water and oxygen and prevent reliable corrosion. Understandably, the dummy signal line is a trace without any signal input, and it is a trace in a floating state.

[00143] In some embodiments, as shown in FIG. 11, in the bending region WB, six dummy signal lines DUMa are arranged between the orthographic projection of the region where the low-voltage signal line VGLa is located on the base substrate 100 and the edge of the base substrate 100, and six dummy signal lines DUMb are arranged between the orthographic projection of the region where the low-voltage signal line VGLb is located on the base substrate 100 and the edge of the base substrate 100. That is, the number of dummy signal lines on the left and right sides is the same, which realizes symmetrical setting. Of course, the number of dummy signal lines on the left and right sides can also be different, so it is not limited here.

[00144] In some embodiments, as shown in FIG. 12, in the bending region WB, six dummy signal lines DUMa are arranged between the orthographic projection of the region where the high-voltage signal line VGHa is located on the base substrate 100 and the edge of the base substrate 100, and six dummy signal lines DUMb are arranged between the orthographic projection of the region where the high-voltage signal line VGHb is located on the base substrate 100 and the edge of the base substrate 100. That is, the number of dummy signal lines on the left and right sides is the same, which realizes symmetrical setting.

[00145] FIG. 11 and FIG. 12 are only illustrated by setting six dummy signal lines on the left and right sides respectively. In practical application, the number of dummy signal lines can be arranged to 1, 2, 4, 8, 10, 15 or 20, and the number of dummy signal lines is not limited in the disclosure. 27

[00146] In some embodiments, as shown in FIGS. 13a and 13b, in the bending region WB, a plurality of data lines DA can be arranged in the first conductive layer, and low-voltage signal lines VGLa, VGLb, initialization signal lines VINITa, Vinitrb, a plurality' of clock signal lines CKla, CK2a and CKlb, CK2b, and high-voltage signal lines VGHa, VHB can be arranged in the second conductive layer.

[00147] In some embodiments, as shown in FIGS. 14a and 14b, in the bending region WB, a plurality of data lines DA and low-voltage signal lines VGLa and VGLb can be arranged in the first conductive layer, which can further reduce the corrosion and disconnection of the low-voltage signal lines. In addition, the initialized signal lines VINITa and VINITb, a plurality ofclock signal lines CKla, CK2a, CKlb and CK2b, and the high-voltage signal lines VGHa and VGHb are provided in the second conductive layer.

[00148] In some embodiments, in the bending region, the low-voltage signal line includes a first low-voltage signal line and a second low-voltage signal line that are connected with each other. The plurality of data lines and the first low-voltage signal line are arranged in the first conductive layer, and the second low-voltage signal line, the initialization signal lines, the plurality of clock signal lines and the high-voltage signal lines are arranged in the second conductive layer, so that the corrosion disconnection of the low-voltage signal lines can be further reduced. For example, as shown in FIG. 15, the low-voltage signal line VGLa includes a first low-voltage signal line VGLla and a second low-voltage signal line VGL2a which are connected with each other, and the low-voltage signal line VGLb includes a first low-voltage signal line VGLlb and a second low-voltage signal line VGL2b which are connected with each other. The first low-voltage signal lines VGLlb and VGLlb are arranged in the first conductive layer and the second low-voltage signal lines VGL2a and VGL2b are arranged in the second conductive layer. The first low-voltage signal line VGLla and the second low--voltage signal line VGL2a are connected with each other through a via hole penetrating the insulating layer, and the first low-voltage signal line VGLlb and the second low -voltage signal line VGL2b are connected with each other through a via hole penetrating the insulating layer.

[00149] When the dummy signal lines are provided, the dummy signal lines and the low-voltage signal line can be arranged in the same layer. For example, as shown in FIGS. 13a and 13b, the low-voltage signal lines VGLa and VGLb and the dummy signal lines DUMa and DUMb are all arranged in the second conductive layer. For example, as shown in FIGS. 14a and 14b, the low-voltage signal lines VGLa and VGLb and the dummy signal lines DUMa and DUMb are all arranged in the first conductive layer.

[00150] It should be noted that, in the bending region, the first conductive layer can be arranged between the second planarization layer 112 and the second inorganic layer 113.

[00151] In some embodiments, the thickness of the layer where the low-voltage signal line is located can be increased by 10%~30% over the original set thickness A, so that the thickness of the layer where the low-voltage signal line is located ranges from A*110% to A* 130%, and the signal line impedance can be reduced. Moreover, this scheme can be realized through the process without changing the mask.

[00152] In some embodiments, the thickness of the layer where the low-voltage signal line is located can be A* 110%, A* 115%, A* 120%, A* 125% or A* 130%, which is not limited here. For example, A is 6000 A, and the thickness of the layer where the low-voltage signal line is located is 7000 A.

[00153] In some embodiments, as show n in FIG. 16, the portion of the low-voltage signal line VGLb in the bending region WB includes a plurality of low-voltage sub-signal lines VGLZb arranged at intervals. Furthermore, one end of the low-voltage sub-signal line is connected with the low-voltage signal line VGLb in the first non-bending region NWB1, and the other end of the low-voltage sub-signal line is connected with the low-voltage signal line VGLb in the second non-bending region NWB2. It should be noted that, FIG. 16 only illustrates the example of the low voltage signal line VGLb and the setting of eight low voltage sub-signal lines VGLZb, and the number of the low-voltage sub-signal lines VGLZb can be determined according to the requirements of practical applications. Moreover, the low-voltage signal line VGLa can be arranged in the same way, which is not repeated here.

[00154] Based on the same inventive concept, embodiments of the disclosure also provide a method for manufacturing the display panel, which includes the following steps: forming a first refractive index film layer on a base substrate, and forming a second refractive index film lay on a side of the first refractive index film lay facing away from the base substrate. The base substrate includes a bending region and a non-bending region; the non-bending region includes a display region with a plurality of sub-pixels; the display region is provided with the first refractive index film layer, and the first refractive index film layer has a plurality of openings, and the plurality of openings and the plurality of sub-pixels are correspondingly arranged. Moreover, the second refractive index film layer covers the first refractive index film layer and fills at least part of the openings. And the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer. The orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending region, and the orthographic projection of the second refractive index film layer on the base substrate has a first film boundary proximate to the bending region, and the bending region has a first bending boundary proximate to the second refractive index film layer, and the first distance between the first film boundary and the first bending boundary is greater than 0.

[00155] In some embodiments, as shown in FIG. 1, a thin film transistor array layer 110, a first planarization layer 150, a pixel defining layer 120, a light emitting device 130, a thin film encapsulation layer 140, a first touch electrode film layer 161, atouch insulating layer 170, a second touch electrode film layer 162, a second optical film layer 171, a black matrix 174, and a color filter layer 175 are sequentially formed on a base substrate. Among them, the structure and relative position of each film layer can refer to the above description and will not be repeated here.

[00156] Based on the same inventive concept, embodiments of the disclosure also provide a display apparatus, including the display panel provided by the embodiments of the disclosure. The principle of solving the problem of the display apparatus is similar to that of the aforementioned display panel, so the implementation of the display apparatus can refer to the implementation of the aforementioned display panel, and the repetition is not repeated here.

[00157] In some embodiments of the present disclosure, the display apparatus can be any product or component with display function, such as a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, etc. Other essential components of the display apparatus should be understood by those skilled in the art, and will not be repeated here, nor should they be taken as limitations to the present disclosure.

[00158] Although the preferred embodiments of the present disclosure have been described, those skilled in the art will be able to make additional changes and modifications to these embodiments once the basic inventive concepts are apparent. Therefore, it is intended that the appended claims be construed to include the preferred embodiments and all changes and modifications that fall within the scope of the disclosure.

[00159] Evidently those skilled in the art can make various modifications and variations to the present disclosure without departing from the spirit and scope of the present disclosure. Thus the present disclosure is also intended to encompass these modifications and variations therein as long as these modifications and variations to the present disclosure come into the scope of the claims of the present disclosure and their equivalents.

Claims

1. A display panel, comprising:a base substrate, comprising a bending region and a non-bending region; wherein the non-bending region comprises a display region with a plurality of sub-pixels;a first refractive index film layer on the base substrate, wherein the display region is provided with the first refractive index film layer, and the first refractive index film layer is provided with a plurality of openings, and the plurality of openings are correspondingly arranged with the plurality of sub-pixels;a second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate, wherein the second refractive index film layer covers the first refractive index film layer and fills at least part of the plurality of openings;wherein a refractive index of the second refractive index film layer is greater than a refractive index of the first refractive index film layer;an orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending region; andthe orthographic projection of the second refractive index film layer on the base substrate has a first film boundary proximate to the bending region, and the bending region has a first bending boundary proximate to the second refractive index film layer, and a first distance between the first film boundary and the first bending boundary is greater than 0.

2. The display panel according to claim 1, wherein the non-bending region comprises: a first nonbending region and a second non-bending region;the first non-bending region and the second non-bending region are arranged at both sides of the bending region, and the first non-bending region comprises the display region;the second refractive index film layer is arranged in the first non-bending region, and the orthographic projection of the second refractive index film layer on the base substrate covers the display region.

3. The display panel according to claim 2, wherein the first non-bending region is provided with the first refractive index film layer, and an orthographic projection of the first refractive index film layer in the first non-bending region on the base substrate has a second film boundary proximate to the bending region, and a second distance between the second film boundary and the first bending boundary is greater than or equal to 0; and / or,the second non-bending region is provided with the first refractive index film layer, and an orthographic projection of the first refractive index film layer in the second non-bending region on the base substrate has a third film boundary proximate to the bending region, and the bending region has a second bending boundary distal to the second refractive index film layer, and a third distance between the third film boundary’ and the second bending boundary is greater than or equal to 0.

4. The display panel according to any one of claims 1 to 3, further comprising: a first optical film layer arranged between the first refractive index film layer and the base substrate;wherein an orthographic projection of the first optical film layer on the base substrate covers the display region.

5. The display panel according to claim 4, wherein the orthographic projection of the first optical film layer on the base substrate does not overlap with the bending region;the first non-bending region is provided with the first optical film layer, and an orthographic projection of the first optical film layer in the first non-bending region on the base substrate has a fourth film boundary proximate to the bending region, and a fourth distance between the fourth film boundary and the first bending boundary is greater than or equal to 0; and / or,the second non-bending region is provided with the first optical film layer, an orthographic projection of the first optical film layer in the second non-bending region on the base substrate has a fifth film boundary proximate to the bending region, the bending region has a second bending boundary distal to the second refractive index film layer, and a fifth distance between the fifth film boundary and the second bending boundary is greater than or equal to 0.

6. The display panel according to claim 5, wherein the fourth film boundary is located between the first film boundary and the first bending boundary.

7. The display panel according to claim 6, wherein the second film boundary is located between the fourth film boundary and the first bending boundary; or,the second film boundary is located between the fourth film boundary7 and the first film boundary'; or,the first film boundaiy is located between the second film boundary7 and the first bending boundaiy, and the fourth film boundaiy is located between the second film boundary' and the first film boundary; or,the first film boundary is located between the second film boundary and the first bending boundary, and the second film boundary is located between the fourth film boundary and the first film boundary7.

8. The display panel according to any one of claims 4 to 7, further comprising: a second optical film layer arranged between the first optical film layer and the base substrate;wherein an orthographic projection of the second optical film layer on the base substrate covers the display region.

9. The display panel according to claim 8, wherein the orthographic projection of the second optical film layer on the base substrate does not overlap with the bending region;the first non-bending region is provided with the second optical film layer, and an orthographic projection of the second optical film layer in the first non-bending region on the base substrate has a sixth film boundaiy proximate to the bending region, and a sixth distance between the sixth film boundaiy and the first bending boundary is greater than or equal to 0; and / or,the second non-bending region is provided with the second optical film layer, and an orthographic projection of the second optical film layer in the second non-bending region on the base substrate has a seventh film boundary proximate to the bending region, and the bending region has a second bending boundary distal to the second refractive index film layer, and a seventh distance between the seventh film boundary and the second bending boundary’ is greater than or equal to 0.

10. The display panel according to claim 9, wherein the sixth film boundary is located between the fourth film boundary and the first film boundary; or,the sixth film boundary is located between the fourth film boundary and the second film boundary; or,the sixth film boundaiy is located between the fourth film boundary' and the first bending boundary.

11. The display panel according to any one of claims 8 to 10, further comprising: a touch insulating layer arranged between the second optical adhesive and the base substrate;wherein an orthographic projection of the touch insulating layer on the base substrate covers the display region.

12. The display panel according to claim 11, wherein the orthographic projection of the touch insulating layer on the base substrate does not overlap with the bending region;the first non-bending region is provided with the touch insulating layer, and an orthographic projection of the touch insulating layer in the first non-bending region on the base substrate has an eighth film boundary proximate to the bending region, and an eighth distance between the eighth film boundary and the first bending boundary is greater than 0; and / or,the second non-bending region is provided with the touch insulating layer, and an orthographic projection of the touch insulating layer in the second non-bending region on the base substrate has a ninth film boundary' proximate to the bending region, and the bending region has a second bending boundary distal to the second refractive index film, and a ninth distance between the ninth film boundary and the second bending boundary is greater than or equal to 0.

13. The display panel according to claim 12, wherein the eighth film boundary is located between the first film boundary and the sixth film boundary’; or,the eighth film boundaiy is located between the second film boundary and the sixth film boundary; or,the eighth film boundary is located between the fourth film boundary and the sixth film boundary.

14. The display panel according to any one of claims 11 to 13, further comprising: a thin film encapsulation layer arranged between the base substrate and the touch insulating layer;wherein an orthographic projection of the thin film encapsulation layer on the base substrate coversthe display region.

15. The display panel according to claim 14, further comprising:a thin film transistor array layer on the base substrate;a first planarization layer on a side of the thin film transistor array layer facing away from the base substrate;a pixel defining layer on a side of the first planarization layer facing away from the base substrate;a light emitting device arranged in an opening of the pixel defining layer;the thin film encapsulation layer on a side of the light emitting device facing away from the base substrate;a first touch electrode film layer on a side of the thin film encapsulation layer facing away from the base substrate;the touch insulating layer on a side of the first touch electrode film layer facing away from the base substrate;a second touch electrode film layer on a side of the touch insulating layer facing away from the base substrate;the second optical film layer on a side of the second touch electrode film layer facing away from the base substrate;a black matrix and / or a color filter layer on a side of the second optical film layer facing away from the base substrate;the first optical film layer on a side of the black matrix and / or the color filter layer facing away from the base substrate;the first refractive index film layer on a side of the first optical film layer facing away from the base substrate;the second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate.

16. The display panel according to any one of claims 1 to 15, further comprising a protective layer on a side of the first refractive index film layer facing away from the base substrate;wherein an orthographic projection of the protective layer on the base substrate covers the bending region, and the orthographic projection of the protective layer on the base substrate does not overlap with the orthographic projection of the second refractive index film layer on the base substrate.

17. The display panel according to claim 2, further comprising:a first optical film layer arranged between the first refractive index film layer and the base substrate;a second optical film layer arranged between the first optical film layer and the base substrate;a touch insulating layer arranged between the second optical adhesive and the base substrate;a thin film encapsulation layer arranged between the base substrate and the touch insulating layer;34a first inorganic layer arranged between the thin film encapsulation layer and the base substrate;a second inorganic layer arranged between the thin film encapsulation layer and the base substrate;wherein an orthographic projection of the first refractive index film layer on the base substrate covers the bending region and the second non-bending region;an orthographic projection of the first optical film layer on the base substrate covers the first nonbending region, the bending region and the second non-bending region;an orthographic projection of the second optical film layer on the base substrate covers the first nonbending region, the bending region and the second non-bending region;an orthographic projection of the touch insulating layer on the base substrate covers the first nonbending region, the bending region and the second non-bending region;an orthographic projection of the thin film encapsulation layer on the base substrate covers the display region;an orthographic projection of the first inorganic layer on the base substrate does not overlap with the bending region; and a boundary of the orthographic projection of the first inorganic layer on the base substrate proximate to the bending region is aligned with the bending region;an orthographic projection of the second inorganic layer on the base substrate does not overlap with the bending region.

18. The display panel according to any one of claims 1 to 17, further comprising: a plurality of signal lines; wherein the plurality of signal lines comprise a plurality of data lines, a low-voltage signal line, an initialization signal line, a plurality of clock signal lines and a high-voltage signal line;in the bending region, an orthographic projection of a region, where the low-voltage signal line is located, on the base substrate is arranged between orthographic projections of two adjacent regions on the base substrate, wherein the orthographic projections of two adjacent regions are adjacent orthographic projections of: an orthographic projection of a region, where the plurality of data lines are located, on the base substrate; an orthographic projection of a region, where the initialization signal line is located, on the base substrate; an orthographic projection of a region, where the plurality of clock signal lines are located, on the base substrate; and an orthographic projection of a region, where the high-voltage signal line is located, on the base substrate.

19. A display apparatus, comprising the display panel according to any one of claims 1 to 18.

20. A method for manufacturing a display panel, comprising:forming a first refractive index film layer on a base substrate; wherein the base substrate comprises a bending region and a non-bending region, the non-bending region comprises a display region with a plurality of sub-pixels; the display region is provided with the first refractive index film layer, the firstrefractive index film layer is provided with a plurality of openings, and the plurality of openings are correspondingly arranged with the plurality of sub-pixels;forming a second refractive index film layer on a side of the first refractive index film layer facing away from the base substrate; wherein the second refractive index film layer covers the first refractive index film layer and fills at least part of the plurality of openings;wherein a refractive index of the second refractive index film layer is greater than a refractive index of the first refractive index film layer;an orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending region; andthe orthographic projection of the second refractive index film layer on the base substrate has a first film boundary proximate to the bending region, and the bending region has a first bending boundaiy proximate to the second refractive index film layer, and a first distance between the first film boundary and the first bending boundary is greater than 0.

Images