Housing for workpiece holding unit etc.

Abstract

The article according to this design is the housing of a work holding unit etc. which is attached to and used in a polishing apparatus for polishing wafers in the manufacture of semiconductors etc. When in use, as shown in the reference figures 1 and 2 showing the state of use, guide rails are attached to the left and right on the front side of this article, and holding parts for a work (polishing object) and a dresser are accommodated in the recess on the bottom surface side of this article. Further, a swing adjustment part is attached to the peripheral surface of this article. When the work holding unit etc. is attached to the polishing apparatus main body, as shown in the reference figure 3 showing the state of use, a work and a dresser are held on the lower surface of the work holding unit etc., and the holding parts for the work and the dresser move up and down along the guide rails. At that time, by adjusting the swing adjustment part attached to the peripheral surface of this article, it is possible to adjust so that the work and the dresser become horizontal.

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