Multi-charge particle beam drawing device and method for drawing multi-charge particle

Abstract

To provide a device which can avoid unnecessary defect corrections when correcting excessive doses of defective beams across a drawing path of multiple drawing in multi-beam drawing.SOLUTION: The present invention includes: a dose determination unit for determining the position of a dose which is not zero in a proximity region including a defective position where a defective beam with an excessive dose of a multi-beam is to be applied for each processing region; a defective position dose data creation unit in which a dose for a defect is defined in the defective position when the dose which is not zero is defined; a pattern presence determination unit for determining the presence of a pattern by using dose data of each position for future irradiation for each unit region on a sample surface; and a drawing mechanism for skipping a unit region which has been determined to include no patterns by the pattern presence determination unit and moving to a unit region which has been determined to include a pattern on which drawing processing is to be performed, and performing correction to reduce an excessive dose caused by a defective dose in one of a plurality of drawing paths of multiple drawing in other drawing paths.SELECTED DRAWING: Figure 1

Claims

1. a beam forming mechanism for forming multiple charged particle beams; a dose data generating unit that generates dose data for each of a plurality of processing regions obtained by dividing the writing region on the sample surface, the dose data defining an individual dose amount at each position within the processing region; a dose determination unit that determines whether or not a position where a dose amount of a non-zero value is defined exists in a region nearby the defect position where the defect beam of the multi-charged particle beam is to be irradiated with an excessive dose amount for each of the processing regions; a defect position dose data creating unit that creates defect dose data in which a defect dose is defined at the defect position when a dose amount with a value other than zero is defined in the neighboring region; a pattern presence / absence determination unit that determines, for each unit area on the sample surface where an irradiation area of ​​the multi-charged particle beam is set, the presence or absence of a pattern in the unit area using dose data of each position to be irradiated in the unit area; a drawing mechanism that, when drawing a pattern on the sample using the multi-charged particle beam, skips a unit area determined by the pattern presence / absence determining unit as having no pattern and moves the unit area to be subjected to drawing processing to a next unit area determined as having a pattern, thereby correcting an excess dose caused by the defective beam in any one of a plurality of drawing passes of multiple drawing so as to reduce it in another drawing pass; A multi-charged particle beam lithography system equipped with the above.

2. a movable stage on which the sample is placed; a tracking deflector that performs tracking deflection of the multi-charged particle beam so that an irradiation area of ​​the multi-charged particle beam follows the movement of the stage; Furthermore, 2. The multi-charged particle beam drawing apparatus according to claim 1, wherein the unit area is set for each tracking control by the tracking deflection.

3. 3. The multi-charged particle beam drawing apparatus according to claim 1, wherein the pattern presence / absence determining unit determines whether a pattern exists in each unit area.

4. a storage device for storing a result of determining whether or not a pattern exists for each unit area; 3. The multi-charged particle beam drawing apparatus according to claim 1, wherein in a second or subsequent drawing pass of the multiple drawing passes of the multiple drawing, it is determined whether or not correction of an excess dose caused by the defect beam is required in that pass based on a result of determining whether or not a pattern exists for each unit area in a preceding pass.

5. 5. The multi-charged particle beam drawing apparatus according to claim 1, wherein the determination of the presence or absence of a pattern for each unit area is performed as a preprocessing before starting a drawing process.

6. forming a multi-charged particle beam; creating dose data for each of a plurality of processing regions into which the writing region on the sample surface is divided, the dose amount being defined for each position within the processing region; determining whether or not there is a position where a dose amount other than zero is defined in a nearby area including a defect position to be irradiated with a defect beam of the multi-charged particle beam that has an excessive dose amount for each of the processing areas; creating defect dose data in which a defect dose is defined at the defect position when a dose amount with a non-zero value is defined in the neighboring region; a step of determining, for each unit area on the sample surface where an irradiation area of ​​the multi-charged particle beam is set, whether or not a pattern exists in the unit area using dose data of each position to be irradiated in the unit area; a step of drawing a pattern on the sample using the multi-charged particle beam, skipping a unit area determined to have no pattern and moving the unit area to be subjected to drawing processing to a next unit area determined to have a pattern when performing the drawing, and correcting an excess dose caused by the defective beam in any one of a plurality of drawing passes of multiple drawing so as to reduce it in another drawing pass; A multi-charged particle beam writing method comprising:

7. performing tracking deflection of the multi-charged particle beam so that an irradiation area of ​​the multi-charged particle beam follows movement of a movable stage on which the sample is placed; 7. The multi-charged particle beam writing method according to claim 6, wherein the unit area is set for each tracking control by the tracking deflection.

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