Atomization device

Abstract

To provide an atomization device which performs primary atomization which utilizes collision energy of a jetted material at a maximum and secondary atomization in which the material is ground in a gap between a sphere and a sphere holder.SOLUTION: An atomization device includes: a jet chamber 5 in which a material M is processed and which has a front chamber holder 10 disposed at the material M introduction side and a rear chamber holder 11 disposed at the material M discharge side; a sphere 14 with which the material M collides; and nozzle holders 15, 16 which are disposed in the jet chamber 5, house the sphere 14, and include a protection holder 15 disposed at the material M introduction side and a sphere holder 16 disposed at the material M discharge side.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to an atomizer that atomizes raw material injected at high pressure from a nozzle. [Background technology]

[0002] 2. Description of the Related Art Conventionally, there has been known an atomizing device that atomizes particles of a raw material by utilizing the impact generated when the raw material is injected at high pressure.

[0003] The fluid impact device described in Japanese Patent No. 3686528 (hereinafter referred to as "Patent Document 1") utilizes the impact force on a hard body. In the fluid impact device of Patent Document 1, a high-pressure fluid injected from an injection nozzle is made to impact a hard sphere rotatably supported in an eccentric state within a chamber. Then, the ball is rotated to release the impact force by the ball's rotation, and the atomization process is performed.

[0004] The atomization device described in JP 2010-36119 A (hereinafter, "Patent Document 2") has a chamber that holds, at the front and rear, a ball holder that is placed in a housing and rotatably supports a spherical hard body.

[0005] The atomization device described in Japanese Patent No. 5086203 (hereinafter referred to as "Patent Document 3") atomizes the raw material by spraying it onto a rotatably supported sphere, and has a chamber that sets the diameter and length of the flow path within the chamber under specific conditions. Summary of the Invention [Problem to be solved by the invention]

[0006] In Patent Document 1, the collision energy of the raw material under high pressure may damage part of the surface of the sphere. Therefore, it is necessary to secure a distance between the nozzle and the sphere, which increases the collision distance. This prioritizes the life of the chamber over atomization.

[0007] In Patent Documents 2 and 3, if the hard body is spherical or has a curved collision surface and a space is formed around the collision point where the fluid can escape, the collision distance can be set to substantially 0 mm and the outlet opening of the high-speed flow path can be brought into contact with the collision point of the hard body. In this case, the collision energy becomes large and efficient atomization can be achieved. However, although Patent Documents 2 and 3 disclose a structure for supporting the hard body, they do not disclose a specific chamber structure.

[0008] The object of the present invention is to provide an atomization device which performs primary atomization by making maximum use of the collision energy of the injected raw material, and secondary atomization by grinding the raw material in the gap between the spheres and the sphere holder. [Means for solving the problem]

[0009] The first aspect of the present invention is An injection chamber for processing a feedstock, comprising: a front chamber holder disposed on the side where the raw material is introduced; a rear chamber holder disposed on the discharge side of the raw material; an ejection chamber having A sphere that collides the raw material; a nozzle holder disposed within the ejection chamber and configured to receive the sphere, A protective holder disposed on the introduction side of the raw material; A sphere holder disposed on the discharge side of the raw material; A nozzle holder having It is an atomization device having the above structure. Effect of the Invention

[0010] The atomization device of the present invention can perform primary atomization by making maximum use of the collision energy of the injected raw material, and secondary atomization by grinding the raw material in the gap between the spheres and the sphere holder. [Brief description of the drawings]

[0011] [Figure 1]FIG. 1 is a diagram showing the configuration of an atomization device according to an embodiment of the present invention; [Diagram 2] 1 is a cross-sectional view of an ejection chamber according to an embodiment; [Diagram 3] Detail cross-sectional view of an injection chamber according to an embodiment. [Figure 4] 1 is a cross-sectional view of an injection chamber of an embodiment before adjusting the impact distance; [Diagram 5] 1 is a cross-sectional view of an injection chamber of an embodiment after adjusting the impact distance. [Figure 6] FIG. 1 is a cross-sectional view of an ejection chamber according to an embodiment before and after eccentric position adjustment; [Figure 7] FIG. 13 is a cross-sectional view of an embodiment of an ejection chamber after eccentric position adjustment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] Hereinafter, the embodiments will be described with reference to the drawings as appropriate.

[0013] 1, the atomization device 1 of this embodiment performs pulverization, dispersion, emulsification, etc. of a raw material M to be processed. The atomization device 1 has a raw material tank 2, a liquid supply pump P, a pressure booster 3, a high-pressure filter 4, an injection chamber 5, a heat exchanger 6, and an outlet 7.

[0014] The raw material tank 2 stores the raw material M. The shape and size of the raw material tank 2 can be changed in consideration of the physical properties (acidity, alkalinity), amount, etc. of the raw material M. The liquid supply pump P supplies the raw material M supplied from the raw material tank 2 to the pressure booster 3.

[0015] The pressure intensifier 3 increases or decreases the pressure in the pressurizing chamber by reciprocating the piston, thereby increasing the pressure of the fluid passing through the atomization device 1 within the range of 10 to 300 MPa. The high-pressure filter 4 removes contaminants such as coarse particles and impurities present in the raw material M pressurized by the pressure booster 3.

[0016] 2 to 7, the ejection chamber 5 ejects the raw material M from which contaminants such as coarse particles and impurities have been removed by the high-pressure filter 4, from the nozzle tip 12. As a result, the ejection chamber 5 primarily atomizes the raw material M. The nozzle tip 12 ejects the raw material M by arranging an orifice or the like inside.

[0017] The injection chamber 5 has a front chamber holder 10 and a rear chamber holder 11. The front chamber holder 10 is disposed on the introduction side of the raw material M. The raw material M is introduced from a chamber holder introduction port 10a formed on the introduction side of the front chamber holder 10. The chamber holder introduction port 10a communicates with a nozzle tip 12. The inner diameter of the chamber holder introduction port 10a is larger than that of the nozzle tip 12. The raw material M can be introduced sequentially into the chamber holder introduction port 10a.

[0018] The front chamber holder 10 has a groove on the discharge side. It is desirable that a part or all of the nozzle tip 12 is embedded in the groove of the front chamber holder 10. The intermediate support member 13 has a groove on the lead-in side. It is desirable that a part or all of the nozzle tip 12 on the side opposite to the part embedded in the front chamber holder 10 is embedded in the groove of the intermediate support member 13.

[0019] A gap is provided when connecting the front chamber holder 10 and the intermediate support member 13. The front chamber holder 10 may have a through hole 10b so that raw material M leaking into this gap does not remain in the small parts of the ejection chamber 5. The through hole 10b may be a hole that allows the raw material M to escape from the gap formed by the front chamber holder 10 and the intermediate support member 13 to a minimum extent.

[0020] The rear chamber holder 11 is disposed on the discharge side of the raw material M. The front chamber holder 10 and the rear chamber holder 11 are connected by a fixing device (not shown) to keep the inside of the injection chamber 5 sealed. The fixing device may be one that connects the front chamber holder 10 and the rear chamber holder 11 by arranging projections and recesses on the inside of the front chamber holder 10 and the rear chamber holder 11, or one that fixes them from the outside.

[0021] The injection chamber 5 has therein a nozzle holder that houses a sphere 14 against which the raw material M is collided. The nozzle holder has a protective holder 15 and a sphere holder 16. The protective holder 15 is disposed on the introduction side of the raw material M. The sphere holder 16 is disposed on the discharge side of the raw material M. The protective holder 15 and the sphere holder 16 are fitted and fixed inside the front chamber holder 10 and the rear chamber holder 11. The sphere 14 is disposed in the space formed inside the protective holder 15 and the sphere holder 16.

[0022] A nozzle receiving member 17 is disposed on the rear side of the sphere holder 16. Inside the sphere holder 16, the raw material M is collided with the spheres 14 to perform atomization processing. Thereafter, when discharging the processed raw material M to the discharge port 7, it becomes difficult to maintain the pressurized state inside the injection chamber 5 if the raw material M is discharged directly. Therefore, the processed raw material M is temporarily received inside the nozzle receiving member 17. Then, the processed raw material M is discharged from the chamber holder discharge port 11a formed on the rear side of the rear chamber holder 11.

[0023] The sphere holder 16 has an outlet on the discharge side that is connected to the outlet 7. As shown in FIG. 3, the sphere holder 16 has multiple sphere holder outlets (16c, 16d) on the discharge side of the storage groove 16a. If the sphere holder 16 has only one sphere holder outlet, the sphere holder outlet may be blocked by the sphere 14. Therefore, it is preferable that the sphere holder 16 has multiple sphere holder outlets (16c, 16d). The sphere holder 16 of this embodiment has a first sphere holder outlet 16c and a second sphere holder outlet 16d. The first sphere holder outlet 16c and the second sphere holder outlet 16d discharge the processed raw material M to the outlet 7. For example, when the sphere 14 is fitted in the sphere holder 16, it is preferable to form each sphere holder outlet (16c, 16d) at a position spaced apart above or below the center line L1 of the sphere 14.

[0024] The nozzle receiving member 17 temporarily stores the processed raw material M discharged from the sphere holder outlets (16c, 16d) and then discharges it from the outlet 7. The nozzle receiving member 17 has a nozzle receiving member storage ring 17a and a nozzle receiving member outlet 17b. The nozzle receiving member storage ring 17a defines a space for temporarily storing the processed raw material M discharged from the sphere holder outlets (16c, 16d). The nozzle receiving member outlet 17b is connected to the outlet 7 and discharges the processed raw material M stored in the nozzle receiving member storage ring 17a.

[0025] The spheres 14 atomize the raw material M. The spheres 14 desirably have a size that matches the shape of the receiving groove 16a of the sphere holder 16. The size of the spheres 14 is 0.1 to 20 mm, more preferably 10 to 20 mm. In order to minimize the inclusion of contaminants such as coarse particles and impurities, the material of the spheres 14 is desirably resin or ceramic. The shape of the spheres 14 is a perfect circle, an ellipse, or the like, and is preferably a perfect circle. By applying various coatings to the surfaces of the spheres 14, it is possible to realize increased hardness and improved wear resistance.

[0026] An intermediate support member 13 may be disposed between the front chamber holder 10 and the rear chamber holder 11. The intermediate support member 13 fixes the nozzle tip 12 and the protective holder 15 while providing cushioning. The raw material M is sprayed from the nozzle tip 12 under high pressure. Therefore, by stably supporting the nozzle tip 12, the atomization performance is stabilized. The nozzle tip 12 is supported by the intermediate support member 13, and the intermediate support member 13 and the front chamber holder 10 are fixed, so that the intermediate support member 13 can be firmly fixed while providing a cushioning function. The intermediate support member 13 also fixes the front chamber holder 10 and the rear chamber holder 11 while providing cushioning.

[0027] The intermediate support member 13 has a recess 15a that accommodates the sphere 14. This makes it possible to shorten the distance between the nozzle tip 12 and the sphere 14. The recess 15a only needs to be large enough to accommodate a portion of the sphere 14.

[0028] The sphere holder 16 has a receiving groove 16a for receiving the sphere 14. The sphere 14 rotates while being supported within the receiving groove 16a, and the collision energy of the raw material M against the sphere 14 is dispersed. The storage groove 16a has a spherical shape. When the raw material M in a high pressure state collides with the sphere 14, the sphere 14 rotates in the storage groove 16a, and the raw material M is crushed in the gap between the sphere 14 and the storage groove 16a. The storage groove 16a may have a shape that matches the shape of the sphere 14. The storage groove 16a is not limited to a spherical shape, and may be a curved shape or a polygonal shape.

[0029] 2 and 3, the depth of the storage groove 16a is shallower than the diameter of the sphere 14. The sphere 14 is stably stored in the storage groove 16a by a portion of the sphere 14 protruding from the storage groove 16a. This allows secondary atomization by grinding the raw material M to be performed. A part of the sphere 14 protruding from the accommodation groove 16a is accommodated in the recessed portion 15a. This stabilizes the position of the sphere 14. As shown in FIG. 3, the outer circumferential line L3 of the sphere 14, which starts from the front end of the sphere 14 in a cross-sectional view, is located forward of the opening line L4 of the intermediate support member 13. This stabilizes the position of the sphere 14 in the sphere holder 16. In other words, if the accommodation groove 16a of the sphere holder 16 is deep, the sphere 14 moves unnecessarily inside the accommodation groove 16a, and the number of collisions between the surface of the accommodation groove 16a and the surface of the sphere 14 increases. Therefore, the sphere 14 and the accommodation groove 16a are easily damaged. On the other hand, the outer circumferential line L3 of the sphere 14 is located forward of the opening line L4 of the intermediate support member 13, so that the width within which the sphere 14 can move is restricted, and the position of the sphere 14 is stabilized. As a result, the gap between the spheres 14 and the storage groove 16a is stabilized, and the raw material M passing through the gap is evenly atomized. The spheres 14 rotate within the storage groove 16a while protruding from the storage groove 16a. This prevents the spheres 14 from being directly impacted by the raw material M in a high pressure state, reducing damage caused by the collision.

[0030] A curved portion protective film 16b is formed on the surface of the storage groove 16a. This makes it possible to suppress damage caused by collision or friction between the sphere 14 and the storage groove 16a. The curved portion protective film 16b is a member or film made of a material harder than the sphere 14. The curved portion protective film 16b is attached to the surface of the storage groove 16a. The curved portion protective film 16b is not limited to being attached externally, and the atomization of the raw material M may be promoted by providing dimples or roughening to the surface of the accommodation groove 16a.

[0031] As with the storage groove 16a, a protective film or the like may also be formed on the surface of the depression 15a. When a portion of the sphere 14 is stored in the depression 15a, there is a possibility that the surface of the storage groove 16a and the sphere 14 may come into contact with each other due to the reaction of the high-pressure raw material M colliding with the sphere 14. By forming a protective film on the surface of the depression 15a, damage due to collision or friction between the depression 15a and the sphere 14 can be suppressed.

[0032] As shown in FIG. 4 and FIG. 5, the injection chamber 5 may have collision distance adjustment parts 11b, 13a. The collision distance adjustment parts 11b, 13a adjust the distance between the front chamber holder 10 and the rear chamber holder 11 to adjust the collision distance of the raw material M to the sphere 14. For example, a recess 13a is formed on the outside of the intermediate support member 13, and a protrusion 11b is formed on the inside of the rear chamber holder 11. The collision distance can be changed by meshing the recess 13a and the protrusion 11b and adjusting their positions in the front and rear directions. FIG. 4 shows the injection chamber 5 having the shortest collision distance. From this state, by adjusting the collision distance adjustment parts 13a, 11b, the distance between the front chamber holder 10 and the rear chamber holder 11 becomes larger, as shown in FIG. 5, and the collision distance becomes longer.

[0033] If the protection holder 15 and the sphere holder 16 are no longer sealed due to the adjustment of the collision distance, the treatment cannot be performed within the specified pressure range. For this reason, it is desirable to provide a collision distance adjustment connector 18 at the contact portion between the protection holder 15 and the sphere holder 16. The collision distance adjustment connector 18 may be a connector that expands and contracts in conjunction with the collision distance adjustment parts 13a and 11b, or a connector that expands and contracts without being linked to them.

[0034] As shown in FIG. 6 and FIG. 7, the sphere holder 16 may have a storage section 16e that stores the sphere 14, and eccentric position adjustment sections 16f and 16g. The eccentric position adjustment sections 16f and 16g adjust the collision position of the raw material M with the sphere 14 by adjusting the position of the storage section 16e. For example, the eccentric position of the storage section 16e can be changed in the vertical direction by adjusting the eccentric position adjustment section (handle for eccentricity adjustment) 16g. In addition, the sphere holder 16 has a connecting section 16h for adjusting the eccentric position so that the raw material M does not enter the inside as the storage section 16e moves up and down. The sphere 14 rotates in the sphere holder 16 by eccentrically aligning the center line L1 of the sphere 14 with the center line L2 of the intermediate support member 13. FIG. 6 shows a state in which the collision position of the raw material M is eccentric with respect to the sphere 14. By adjusting the eccentric position adjusting parts 16g and 16h, the position of the sphere 14 arranged in the housing part 16e is lowered as shown in FIG.

[0035] The heat exchanger 6 adjusts the temperature of the raw material M after the atomization process so that the temperature is appropriate. For most raw materials M, excessively high temperatures can adversely affect the physical properties. For this reason, it is desirable to adjust the temperature of the raw material M to 5 to 35°C.

[0036] The discharge port 7 discharges the raw material M processed in the injection chamber 5. When the raw material M is processed only once, the raw material M discharged from the discharge port 7 is stored in a recovery tank (not shown). When the raw material M is processed multiple times, the raw material M discharged from the discharge port 7 is returned to the injection chamber 5, and after the raw material M is subjected to atomization processing again, the raw material M discharged from the discharge port 7 is stored in a recovery tank (not shown).

[0037] The atomization process procedure in the atomization device 1 of this embodiment will be described below. First, the raw material M to be treated is charged into the raw material tank 2 and adjusted to a slurry state. Next, the raw material M in the raw material tank 2 is supplied to the pressure intensifier 3 by the liquid supply pump P. The supplied raw material M is pressurized by the pressure intensifier 3. The pressurized raw material M passes through a high-pressure filter 4, and is then supplied to the injection chamber 5 and injected. This process may be repeated multiple times.

[0038] Here, the procedure of the atomization process in the ejection chamber 5 will be described in detail.

[0039] First, the raw material M ejected from the nozzle tip 12 is caused to collide with the sphere 14. As a result, the raw material M is primarily atomized. In addition, the raw material M is ejected not toward the center of the sphere 14, but toward an eccentric position of the sphere 14. As a result, when the raw material M collides with the sphere 14, the sphere 14 rotates within the sphere holder 16. The storage groove 16a of the sphere holder 16 has a curved shape similar to the curved surface of the sphere 14. Therefore, the sphere 14 rotates without excessively colliding with the storage groove 16a. As the sphere 14 rotates, the raw material M is ground in the gap between the sphere 14 and the storage groove 16a, and is secondarily atomized.

[0040] As described above, the present invention is not limited to the above-described embodiment, and it goes without saying that the present invention can be modified appropriately without departing from the spirit and scope of the present invention. [Explanation of symbols]

[0041] 1 Atomization device 2 Raw material tank 3. Booster 4 High Pressure Filter 5. Injection chamber 6 Heat exchanger 7 Outlet 10 Front chamber holder 10a Chamber holder inlet 11 Rear chamber holder 11a Chamber holder outlet 11b Collision distance adjustment part (convex part) 12 Nozzle Tip 13 Intermediate support member 13a Collision distance adjustment part (recess) 14 Sphere 15 Protective holder 15a Recess 16 Sphere Holder 16a Storage groove 16b Protective film for curved parts 16c First sphere holder outlet 16d Discharge port for second sphere holder 16e Storage section 16f Eccentric position adjustment part (screw part) 16g Eccentric position adjustment part (handle for eccentric adjustment) 16h Connection for eccentric position adjustment 17 Nozzle receiving member 17a Retention ring for nozzle receiving member 17b Nozzle receiving member outlet 18 Collision distance adjustment connection part L1 Center line of the sphere L2 Center line of intermediate support member L3 Outer perimeter of the sphere L4 Intermediate support member opening line M Raw material

Claims

1. An injection chamber for processing a feedstock, comprising: a front chamber holder disposed on the side where the raw material is introduced; a rear chamber holder disposed on the discharge side of the raw material; an ejection chamber having A sphere that collides the raw material; a nozzle holder disposed within the ejection chamber and configured to receive the sphere, A protective holder disposed on the introduction side of the raw material; A sphere holder disposed on the discharge side of the raw material; A nozzle holder having An atomization device having the above structure.

2. an intermediate support member disposed between the front chamber holder and the rear chamber holder; The intermediate support member has a recess for receiving the sphere. The atomization device according to claim 1 .

3. The sphere holder has an accommodation groove for accommodating the sphere.

3. The atomization device according to claim 1 or 2.

4. The receiving groove has a spherical shape. The atomizing device according to claim 3.

5. A curved portion protective film is formed on the surface of the accommodation groove. The atomization device according to claim 3.

6. In a cross-sectional view, an outer circumferential line of the sphere originating from a front end of the sphere is located forward of an opening line of the intermediate support member. The atomization device according to claim 2.

7. Further comprising a nozzle receiving member arranged on the rear side of the sphere holder.

3. The atomization device according to claim 1 or 2.

8. The apparatus further includes a collision distance adjustment unit that adjusts a distance between the front chamber holder and the rear chamber holder to adjust a collision distance of the raw material with the sphere.

3. The atomization device according to claim 1 or 2.

9. the sphere holder has a receiving portion for receiving the sphere, The apparatus further includes an eccentric position adjustment unit that adjusts the collision position of the raw material with the sphere by adjusting the position of the storage unit.

3. The atomization device according to claim 1 or 2.

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