Drawing apparatus

Abstract

To suppress building up of heat inside an upper area of a drawing head cover while suppressing complication of an apparatus structure.SOLUTION: In a drawing head cover 5 of a drawing apparatus 1, a gas supply port 53 is provided at a position opposing a projection optical system 45 in a horizontal direction. Further, gas directed from a gas supply part 6 toward the inside of the drawing head cover 5 passes through the gas supply port 53. A gas discharge port 54 is provided closer to an illumination optical system 43 side than a spatial light modulation part 44 regarding a direction along an optical axis J1 of a drawing head 41. Gas supplied from the gas supply port 53 into the drawing head cover 5 is discharged from the gas discharge port 54. This makes it possible to suppress building up of heat inside an upper area of the drawing head cover 5 while suppressing complication of a structure of the drawing apparatus 1.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a drawing apparatus that draws a pattern by irradiating a substrate with light. [Background technology]

[0002] Conventionally, when drawing a pattern on a printed circuit board, a semiconductor board, or the like (hereinafter referred to as a "board"), a drawing device has been used that directly draws a pattern by irradiating a photosensitive material formed on the board with modulated light and scanning the irradiated area of ​​the light.

[0003] In such a drawing device, if the temperature of the projection optical system fluctuates in the drawing head that emits light toward the substrate, there is a possibility that the magnification, focus position, drawing position, etc. will fluctuate. Therefore, in the drawing device of Patent Document 1, the temperature of the lenses that make up the projection optical system is monitored, and temperature-regulating air is supplied into a housing that covers the multiple drawing heads of the drawing unit, thereby maintaining the temperature of the projection optical system at a desired temperature.

[0004] Furthermore, when an L-shaped drawing head is fixed in contact with the upper and side surfaces of a gate-shaped support (so-called a gantry) as in the drawing device of Patent Document 2, heat from a light source provided on the upper part of the drawing head (i.e., the part of the drawing head that contacts the upper surface of the support) may be trapped inside the housing, causing the support to thermally deform and changing the light irradiation position on the substrate. Meanwhile, Patent Document 3 discloses a technology in which, in the light irradiation section of an exposure device, a housing that houses a light source, etc. and a housing that houses an optical system such as a fly's eye lens that guides light from the light source to the substrate are separately provided, and the inside of the housing that houses the light source, etc. is air-cooled, and the housing that houses the optical system is sealed to make the inside positive pressure, thereby preventing outgassing, etc. generated from the photosensitive material during exposure from adhering to the optical system. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Patent No. 6117594 [Patent Document 2] JP 2006-259204 A [Patent Document 3] JP 2011-134760 A Summary of the Invention [Problem to be solved by the invention]

[0006] Incidentally, as in Patent Document 3, if the light source and the optical system are housed in separate housings and a mechanism for independently controlling the atmosphere in the internal space of each housing is provided, heat buildup in the housing housing the light source is suppressed, but the drawing head becomes larger and its structure becomes more complex. On the other hand, if the light source and the optical system are housed in one housing and cooling air is supplied to the light source side, the air may flow to the optical system side and contaminate the optical system.

[0007] The present invention has been made in consideration of the above problems, and has an object to prevent heat from building up inside the upper part of the drawing head cover while suppressing the complication of the device structure in the drawing device. [Means for solving the problem]

[0008] A first aspect of the present invention is a drawing apparatus for drawing a pattern by irradiating light onto a substrate, the drawing apparatus comprising: a stage for holding a substrate, a drawing head for irradiating modulated light onto an upper surface of the substrate, a support for supporting the drawing head above the stage, a scanning mechanism for moving the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate, and a gas supply for supplying gas into the drawing head. The drawing head comprises a spatial light modulation unit for modulating and emitting light from a light source, an illumination optical system for directing the light from the light source to the spatial light modulation unit, a projection optical system for directing the light from the spatial light modulation unit to the upper surface of the substrate, and a drawing head cover for accommodating the spatial light modulation unit, the illumination optical system, and the projection optical system. The drawing head cover is provided with a gas supply port that is provided at a position horizontally opposite the projection optical system and through which gas passes from the gas supply unit toward the inside of the drawing head cover, and a gas exhaust port that is provided on the illumination optical system side of the spatial light modulation unit in a direction along the optical axis of the drawing head and through which gas supplied from the gas supply port to the inside of the drawing head cover is exhausted.

[0009] A second aspect of the present invention is a drawing apparatus of the first aspect, wherein the drawing head cover further includes another gas exhaust port provided at a lower end of the drawing head cover and through which gas supplied from the gas supply port to the inside of the drawing head cover is exhausted.

[0010] A third aspect of the present invention is the drawing apparatus of the second aspect, wherein a flow rate of the gas exhausted from the gas exhaust port is smaller than a flow rate of the gas supplied from the gas supply unit.

[0011] A fourth aspect of the present invention is a drawing apparatus according to any one of the first to third aspects, wherein a blowing mechanism is provided near the gas exhaust port to blow gas from the inside to the outside of the drawing head cover through the gas exhaust port.

[0012] A fifth aspect of the present invention is a drawing device according to any one of the first to third aspects (or any one of the first to fourth aspects), wherein the gas exhaust port is located at an end of the drawing head cover opposite the spatial light modulation unit in a portion of the drawing head cover that is closer to the illumination optical system than the spatial light modulation unit in a direction along the optical axis of the drawing head.

[0013] A sixth aspect of the present invention is a drawing apparatus according to any one of the first to third aspects (or any one of the first to fifth aspects), wherein a gas diffusion section is provided near the gas supply port to diffuse the gas supplied to the gas supply port in a direction perpendicular to the gas flow direction.

[0014] A seventh aspect of the present invention is the drawing device according to any one of the first to third aspects (or any one of the first to sixth aspects), wherein the drawing head includes the light source disposed on the opposite side of the spatial light modulation unit across the illumination optical system in a direction along the optical axis of the drawing head, a liquid cooling unit that uses a liquid to cool the light source within the drawing head cover, and It further comprises: Effect of the Invention

[0015] According to the present invention, it is possible to prevent the structure of the device from becoming complicated, and also to prevent heat from building up inside the upper part of the drawing head cover. [Brief description of the drawings]

[0016] [Figure 1] FIG. 1 is a perspective view showing a drawing device according to an embodiment. [Diagram 2] FIG. [Diagram 3] FIG. 4 is a side view of a gas flow path. [Figure 4] FIG. [Diagram 5] FIG. 13 is a side view of another imaging head. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0017] FIG. 1 is a perspective view showing a drawing apparatus 1 according to one embodiment of the present invention. The drawing apparatus 1 is a direct drawing apparatus that draws a pattern by irradiating a photosensitive material on a substrate 9 with spatially modulated light in a substantially beam shape and scanning the irradiated area of ​​the light on the substrate 9. In FIG. 1, three mutually orthogonal directions are indicated by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction (i.e., an up-down direction). The same applies to other figures.

[0018] The substrate 9 is, for example, a printed circuit board having a substantially rectangular flat plate shape. On the (+Z) main surface (hereinafter also referred to as "upper surface 91") of the substrate 9, a resist film formed of a photosensitive material is provided on a copper layer. In the drawing device 1, a circuit pattern is drawn (i.e., formed) on the resist film of the substrate 9. The type, shape, etc. of the substrate 9 may be changed in various ways.

[0019] The drawing apparatus 1 includes a stage 21, a stage moving mechanism 22, an alignment unit 3, a drawing unit 4, and a gas supply unit 6. The stage 21 is a substantially rectangular flat member disposed below the alignment unit 3 and the drawing unit 4 (i.e., on the (-Z) side). The stage 21 includes a substrate holding unit 25 that holds a horizontal substrate 9 from below. The substrate holding unit 25 is, for example, a vacuum chuck that holds the lower surface of the substrate 9 by suction. The substrate holding unit 25 may have a structure other than a vacuum chuck, and may be, for example, a mechanical chuck. An upper surface 91 of the substrate 9 placed on the substrate holding unit 25 is substantially perpendicular to the Z direction and substantially parallel to the X direction and the Y direction.

[0020] The stage moving mechanism 22 is a moving mechanism that moves the stage 21 relatively to the alignment unit 3 and the drawing unit 4 in a horizontal direction (i.e., a direction approximately parallel to the upper surface 91 of the substrate 9). The stage moving mechanism 22 is attached on the upper surface of the base 11 and is supported from below by the base 11. The stage moving mechanism 22 includes a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 supports the stage 21 from below and linearly moves the stage 21 in the X direction along the guide rail. The first moving mechanism 23 supports the second moving mechanism 24 from below and linearly moves the stage 21 together with the second moving mechanism 24 in the Y direction along the guide rail. The driving sources of the first moving mechanism 23 and the second moving mechanism 24 are, for example, linear servo motors or motors attached to ball screws. The structures of the first moving mechanism 23 and the second moving mechanism 24 may be variously modified.

[0021] The drawing apparatus 1 may be provided with a stage rotation mechanism that rotates the stage 21 about a rotation axis extending in the Z direction. The drawing apparatus 1 may also be provided with a stage lifting mechanism that moves the stage 21 in the Z direction. For example, a servo motor can be used as the stage rotation mechanism. For example, a linear servo motor can be used as the stage lifting mechanism. The structures of the stage rotation mechanism and the stage lifting mechanism may be modified in various ways.

[0022] The alignment unit 3 includes a plurality of alignment cameras 31. In the example shown in FIG. 1, two alignment cameras 31 are arranged in the X direction, but only the alignment camera 31 on the (+X) side is shown. Each alignment camera 31 is supported above the stage 21 and the stage movement mechanism 22 by a support 40 that is provided across the stage 21 and the stage movement mechanism 22. The support 40 is, for example, a single metal member provided at one position in the Y direction. In the example shown in FIG. 1, the support 40 is a gate-shaped member (a so-called gantry) that is provided across the stage 21 and the stage movement mechanism 22, and is erected on the upper surface of the base 11.

[0023] 1, the two alignment cameras 31 are attached to the (+Y) side surface of the support unit 40. Of the two alignment cameras 31, for example, one alignment camera 31 is fixed to the support unit 40, and the other alignment camera 31 is movable in the X direction on the support unit 40. This makes it possible to change the distance in the X direction between the two alignment cameras 31. Note that the number of alignment cameras 31 in the alignment unit 3 may be one, or three or more.

[0024] Each alignment camera 31 captures an image of an alignment mark (not shown) provided in advance on an upper surface 91 of the substrate 9. In the drawing device 1, alignment of the substrate 9 (i.e., correction of the relative position of the substrate 9 with respect to the drawing head 41 described later) is performed based on the image of the alignment mark acquired by the alignment camera 31.

[0025] The drawing unit 4 includes a plurality of drawing heads 41 (six in the example shown in FIG. 1) arranged in the X direction. The plurality of drawing heads 41 have approximately the same structure. Each drawing head 41 includes an optical modulator that irradiates modulated (i.e., spatially modulated) light downward. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by the above-mentioned support unit 40. In the example shown in FIG. 1, the six drawing heads 41 are attached to the support unit 40. Note that the above-mentioned alignment camera 31 may be supported by a support unit different from the support unit 40 to which the drawing heads 41 are attached.

[0026] In the example shown in FIG. 1, the six drawing heads 41 are arranged in a substantially straight line substantially parallel to the X direction. The positions of the six drawing heads 41 in the Y direction and the Z direction are substantially the same. The gas supply unit 6 supplies gas to the inside of each of the six drawing heads 41. The gas is preferably a temperature-adjusted gas. The multiple drawing heads 41 do not necessarily need to be arranged in a straight line, and may be arranged, for example, in a staggered manner. When the drawing heads 41 are arranged in a staggered manner, for example, the multiple drawing heads 41 are arranged substantially parallel to the X direction at a first position in the Y direction, and at a second position adjacent to the (-Y) side of the first position, a drawing head 41 is arranged between each of the multiple drawing heads 41 in the X direction. In addition, the number of drawing heads 41 in the drawing unit 4 may be one or more than two.

[0027] In the drawing device 1, pattern drawing on the substrate 9 is performed by a so-called multi-pass method. Specifically, while modulated light from the multiple drawing heads 41 of the drawing unit 4 is irradiated onto the upper surface 91 of the substrate 9, the first moving mechanism 23 of the stage moving mechanism 22 moves the substrate 9 in the Y direction to pass under the drawing heads 41. As a result, the irradiation area of ​​the light from the multiple drawing heads 41 is scanned in the Y direction on the substrate 9, and drawing on the substrate 9 is performed. Next, the second moving mechanism 24 moves the substrate 9 stepwise by a predetermined distance in the X direction. Then, the first moving mechanism 23 moves the substrate 9 in the Y direction, and the drawing heads 41 irradiate the substrate 9 with light in parallel with the movement again, thereby performing drawing on the substrate 9. In the drawing device 1, the irradiation of light on the substrate 9 moving in the Y direction and the step movement of the substrate 9 in the X direction are alternately performed, thereby performing drawing on the substrate 9.

[0028] In the following description, the Y direction is also referred to as the "main scanning direction" or "scanning direction", and the X direction is also referred to as the "sub-scanning direction" or "width direction". The main scanning direction and the sub-scanning direction are directions that are approximately parallel to the upper surface 91 of the substrate 9. In the stage movement mechanism 22, the first movement mechanism 23 is a main scanning mechanism that moves the stage 21 relatively to the drawing head 41 in the main scanning direction. The second movement mechanism 24 is a sub-scanning mechanism that moves the stage 21 relatively to the drawing head 41 in the sub-scanning direction.

[0029] In the drawing apparatus 1, drawing on the substrate 9 may be performed by a single pass method (also called a one-pass method) in which drawing of a pattern on the substrate 9 is completed by moving the substrate 9 relatively to the drawing head 41 only once in the Y direction. In this case, sub-scanning of the substrate 9 by the second moving mechanism 24 (i.e., step movement in the X direction) is not performed when drawing the pattern. In other words, the stage moving mechanism 22 is a scanning mechanism that moves the stage 21 at least in the scanning direction relative to the drawing head 41.

[0030] 2 is an enlarged side view of one drawing head 41 viewed from the (+X) side. The drawing head 41 includes a light source unit 42, an illumination optical system 43, a spatial light modulation unit 44, a projection optical system 45, a liquid cooling unit 46, and a drawing head cover 5. The light source unit 42, the illumination optical system 43, the spatial light modulation unit 44, the projection optical system 45, and the liquid cooling unit 46 are housed inside the drawing head cover 5. In FIG. 2, in order to facilitate understanding of the drawing, the drawing head cover 5 is shown in cross section, and the internal structure of the drawing head cover 5 is shown by solid lines. In addition, FIG. 2 also shows a support unit 40.

[0031] 2, the drawing head cover 5 is a member having a substantially L-shape in a side view. The drawing head cover 5 includes a first cover part 51 extending substantially parallel to the Z direction, and a second cover part 52 extending substantially parallel to the Y direction from an upper end of the first cover part 51. The first cover part 51 and the second cover part 52 are, for example, substantially rectangular tubular in shape. The internal space of the first cover part 51 and the internal space of the second cover part 52 are in communication with each other.

[0032] The first cover part 51 is attached to a side surface 401 on the (-Y) side of the support part 40, and protrudes upward from an upper surface 402 of the support part 40. The side surface 401 of the support part 40 is a substantially flat surface substantially perpendicular to the Y direction, and the upper surface 402 of the support part 40 is a substantially flat surface substantially perpendicular to the Z direction. The lower end of the first cover part 51 is located between the lower end and the upper surface 402 of the support part 40 in the Z direction. In the example shown in FIG. 2, about half of the portion of the first cover part 51 on the (-Z) side is in contact with the side surface 401 on the (-Y) side of the support part 40, and about half of the portion of the first cover part 51 on the (+Z) side extends from the upper surface 402 of the support part 40 to the (+Z) side.

[0033] The second cover part 52 is attached to the upper surface 402 of the support part 40, and protrudes to the (+Y) side beyond the (+Y) side side surface of the support part 40. In the example shown in Fig. 2, about half of the second cover part 52 on the (-Y) side is in contact with the upper surface 402 of the support part 40 on the support part 40, and about half of the second cover part 52 on the (+Y) side extends from the (+Y) side side surface of the support part 40 to the (+Y) side. The (-Y) side end of the second cover part 52 is connected to the upper end part of the first cover part 51 from the (+Y) side.

[0034] The light source unit 42 and the liquid cooling unit 46 are disposed approximately at the center in the Y direction inside a portion of the second cover unit 52 that protrudes from the support unit 40 to the (+Y) side. The projection optical system 45 is disposed inside a portion of the second cover unit 52 that is located on the support unit 40 (i.e., a portion attached to the upper surface 402 of the support unit 40) and extends approximately parallel to the Y direction. Note that the end of the projection optical system 45 on the (-Y) side may be located inside the first cover unit 51.

[0035] The spatial light modulation section 44 is disposed at the end of the first cover section 51 on the (+Z) side. The projection optical system 45 is disposed inside a portion of the first cover section 51 facing the support section 40 in the Y direction (i.e., a portion attached to a side surface 401 on the (-Y) side of the support section 40), and extends approximately parallel to the Z direction. In the example shown in FIG. 2, the lower end of the first cover section 51 is open, and the lower end of the projection optical system 45 protrudes downward from a lower end opening 55 of the first cover section 51. Note that a focus sensor or the like used for focus adjustment of the drawing head 41 may be provided near the lower end of the projection optical system 45.

[0036] The light emitted from the light source unit 42 enters the illumination optical system 43 along a predetermined optical axis J1 of the drawing head 41, and is guided to the spatial light modulation unit 44 via the illumination optical system 43 and a mirror 47, etc. In FIG. 2, the optical axis J1 is depicted by a dashed line. The spatial light modulation unit 44 modulates the light from the light source unit 42 and emits it toward the projection optical system 45. The modulated light emitted from the spatial light modulation unit 44 is guided by the projection optical system 45 to an upper surface 91 (see FIG. 1) of the substrate 9 located below the drawing head 41 (i.e., in the (-Z) direction).

[0037] The light source unit 42 includes a light source 421 such as an LED (Light Emitting Diode) or an LD (Laser Diode). The light source 421 is disposed on the opposite side of the illumination optical system 43 from the spatial light modulation unit 44 in the direction along the optical axis J1 of the drawing head 41 (i.e., the (+Y) side of the illumination optical system 43). The light source 421 is cooled by the liquid cooling unit 46 using a liquid. The liquid cooling unit 46 includes a pipe 461 through which a liquid coolant such as water flows, and a heat exchanger 462 provided in the middle of the pipe 461. The heat exchanger 462 is disposed at a position in contact with or close to the light source 421, and cools the light source 421 by transferring heat from the light source 421 to the coolant flowing inside. The pipe 461 is connected to, for example, a radiator (not shown) provided outside the drawing head cover 5. The heat received by the coolant from the light source 421 is dissipated by the radiator.

[0038] 2, one light source 421 is illustrated, but the number of light sources 421 provided in the light source section 42 may be multiple. For example, multiple light sources 421 emitting light of different wavelengths may be provided in the light source section 42. In this case, when drawing a pattern on the substrate 9, one or more light sources 421 are selected and used from the multiple light sources 421 according to the type of photosensitive material on the substrate 9, etc. Note that the light source 421 provided in the light source section 42 is not limited to an LED and an LD, and various types of light sources can be used.

[0039] The illumination optical system 43 includes optical elements such as a plurality of lenses arranged substantially parallel to the Y direction. The spatial light modulation unit 44 includes an optical modulator such as a DMD (Digital Micro Mirror Device) or a GLV (Grating Light Valve) (registered trademark of Silicon Light Machines, Sunnyvale, California). The optical modulator may be one other than the DMD and GLV. The projection optical system 45 includes optical elements such as a plurality of lenses arranged substantially parallel to the Z direction.

[0040] In the drawing head cover 5, the side surface on the (+X) side and the side surface on the (-X) side of the second cover part 52 are substantially flat surfaces substantially perpendicular to the X direction, and a gas exhaust port 54 is provided on each of these sides. FIG. 2 illustrates the gas exhaust port 54 provided on the side surface on the (-X) side of the second cover part 52. The gas exhaust port 54 is an opening penetrating the second cover part 52 in the X direction. The shape of the gas exhaust port 54 as viewed from the (+X) side is, for example, substantially circular. The second cover part 52 does not directly communicate with the space around the drawing head 41 except for the gas exhaust port 54, and is isolated from the surrounding space. The shape of the gas exhaust port 54 may be changed in various ways. The number of gas exhaust ports 54 provided on each of the side surfaces on the (+X) side and the (-X) side of the second cover part 52 may be one or more than two. The gas exhaust port 54 may be provided on only one of the side surface on the (+X) side and the side surface on the (-X) side of the second cover part 52.

[0041] In the example shown in FIG. 2, the gas exhaust port 54 is disposed at an end portion on the (+Y) side of the second cover part 52. In other words, the gas exhaust port 54 is located at an end portion opposite to the spatial light modulation part 44 in a portion of the second cover part 52 closer to the illumination optical system 43 side (i.e., on the (+Y) side) than the spatial light modulation part 44 in the direction along the optical axis J1 of the drawing head 41. Specifically, the gas exhaust port 54 is disposed near the light source part 42 on the (+Y) side than the light source part 42 (i.e., on the opposite side of the illumination optical system 43 across the light source part 42 in the direction along the optical axis J1 of the drawing head 41). The gas exhaust port 54 is disposed at the upper portion of each of the side surface on the (+X) side and the side surface on the (-X) side of the second cover part 52.

[0042] A blower mechanism 56 is provided near the gas exhaust port 54. The blower mechanism 56 is, for example, an axial fan rotated by a motor or the like, and blows gas from the inside of the drawing head cover 5 to the outside through the gas exhaust port 54. The blower mechanism 56 is, for example, disposed so as to overlap with the gas exhaust port 54 when viewed from the (+X) side. The blower mechanism 56 is, for example, attached to a side surface of the drawing head cover 5 outside the drawing head cover 5. The blower mechanism 56 may be attached to a side surface of the drawing head cover 5 inside the drawing head cover 5, or may be fitted into the gas exhaust port 54. The blower mechanism 56 does not necessarily need to be an axial fan, and may have another structure (for example, a centrifugal fan, etc.).

[0043] In the drawing head 41, the gas exhaust port 54 may be provided on the upper surface and / or the lower surface of the second cover part 52 instead of or in addition to the (+X) side surface and the (-X) side surface of the second cover part 52. Alternatively, the gas exhaust port 54 may be provided on the (+Y) side surface of the second cover part 52 instead of or in addition to the (+X) side surface and the (-X) side surface of the second cover part 52.

[0044] In the drawing device 1, the arrangement of the gas exhaust port 54 may be changed in various ways as long as it is provided closer to the illumination optical system 43 than the spatial light modulation unit 44 in the direction along the optical axis J1 of the drawing head 41. For example, the gas exhaust port 54 may be provided at the same position as a part of the light source unit 42 in the Y direction. Alternatively, the gas exhaust port 54 may be provided between the light source unit 42 and the illumination optical system 43 in the Y direction, or may be provided at the same position as a part of the illumination optical system 43 in the Y direction. In either case, the gas exhaust port 54 may be provided on the side surface on the (+X) side and / or the side surface on the (-X) side of the second cover unit 52, or may be provided on the upper surface and / or the lower surface of the second cover unit 52.

[0045] In the drawing head cover 5, a groove 511 extending approximately parallel to the X direction is provided on the side surface of the (-Y) side of the first cover part 51. On the side surface of the (-Y) side of the first cover part 51, the groove 511 is recessed from the surrounding area toward the (+Y) side. The side surface of the (+Y) side of the groove 511 is an approximately flat surface that is approximately perpendicular to the Y direction, and a gas supply port 53 is provided on the side surface. The gas supply port 53 is an opening that penetrates the first cover part 51 in the Y direction and is located at the same height in the Z direction as a part of the projection optical system 45. The gas supply port 53 is provided at a position facing the part of the projection optical system 45 in the horizontal direction (in this case, the Y direction). The shape of the gas supply port 53 as viewed from the (+Y) side is, for example, approximately rectangular. The shape of the gas supply port 53 may be changed in various ways.

[0046] A gas flow path 61 of the gas supply unit 6 is disposed in the groove 511 of the drawing head cover 5. The gas flow path 61 is a duct extending approximately parallel to the X direction, and its cross section perpendicular to the X direction has an approximately rectangular shape. The gas flow path 61 faces the gas supply port 53 of the drawing head 41 in the Y direction, and covers the entire gas supply port 53 from the (-Y) side. The gas supply port 53 is substantially isolated from the space around the drawing head 41 by the gas flow path 61, and the space inside the first cover part 51 and the space around the drawing head 41 do not substantially communicate with each other through the gas supply port 53. The space inside the first cover part 51 is directly communicated with the space around the drawing head 41 substantially only through the lower end opening 55 described above.

[0047] The gas flow path 61 is connected to a gas supply source (not shown) via a pipe 62. The gas supply source is usually provided outside the drawing apparatus 1. The gas supplied to the gas flow path 61 is, for example, compressed air. As the gas, various gases other than compressed air may be used. A temperature adjustment unit 63 is provided in the middle of the pipe 62, which adjusts the temperature of the gas supplied from the gas supply source to the gas flow path 61 between the gas supply source and the gas flow path 61. As the temperature adjustment unit 63, for example, a known temperature adjustment device of a Peltier type or a heat pump type can be used.

[0048] FIG. 3 is a view of the (+Y) side of the gas flow passage 61 as viewed from the (+Y) side. In FIG. 3, the gas supply port 53 facing the gas flow passage 61 in the Y direction is also shown by a broken line. The (+Y) side of the gas flow passage 61 is a substantially flat surface substantially perpendicular to the Y direction, and a gas delivery section 64 facing the gas supply port 53 of the drawing head cover 5 in the Y direction is provided on the side. The gas delivery section 64 is disposed near the gas supply port 53 on the (-Y) side of the gas supply port 53. The gas delivery section 64 is provided with a plurality of small through holes 641 that penetrate the (+Y) side of the gas flow passage 61 and communicate with the internal space of the gas flow passage 61. In the gas delivery section 64 illustrated in FIG. 3, a large number of substantially circular through holes 641 are substantially evenly distributed in an area facing the gas supply port 53 in the Y direction. For example, a punching metal is used as the gas delivery section 64.

[0049] 2 toward the gas supply port 53 in the (+Y) direction, passes through the gas supply port 53, and flows into the inside of the first cover part 51. In the gas delivery part 64, the gas supplied to the gas supply port 53 is delivered through a plurality of dispersed through-holes 641 (see FIG. 3), and is diffused in a direction perpendicular to the flow direction of the gas (i.e., the (+Y) direction). In other words, the gas delivery part 64 is a gas diffusion part that diffuses the gas supplied to the gas supply port 53 in a direction perpendicular to the flow direction of the gas.

[0050] The gas that has flowed into the first cover part 51 from the gas supply port 53 collides with the projection optical system 45 and flows around the projection optical system 45. Since the temperature of the gas is adjusted to a relatively low predetermined temperature by the temperature adjustment part 63 as described above, the projection optical system 45 is cooled by the gas and maintained at a desired temperature.

[0051] 4, a portion of the gas supplied from the gas supply port 53 to the inside of the first cover part 51 flows in the (-Z) direction within the first cover part 51, as shown by the arrow with the reference symbol 81 in Fig. 4, and is discharged to the outside of the drawing head cover 5 from a lower end opening 55 provided at the lower end of the first cover part 51. This makes it possible to prevent vapor of a solvent or the like (i.e., outgassing) generated from the photosensitive material applied to the upper surface 91 of the substrate 9 from adhering to the lower end of the projection optical system 45 or entering the inside of the drawing head cover 5 from the lower end opening 55.

[0052] Another part of the gas supplied from the gas supply port 53 to the inside of the first cover part 51 flows in the (+Z) direction in the first cover part 51 as shown by the arrow with the reference symbol 82, and flows into the inside of the second cover part 52 at the upper end part of the first cover part 51. Then, as shown by the arrow with the reference symbol 83, the gas flows in the (+Y) direction in the second cover part 52, and is discharged from the gas exhaust port 54 to the outside of the drawing head cover 5. In other words, the other part of the gas supplied from the gas supply port 53 to the inside of the first cover part 51 flows along the optical axis J1 (see FIG. 2) of the drawing head 41 in the opposite direction to the traveling direction of the light in the drawing head 41, and is discharged from the gas exhaust port 54. This makes it possible to prevent heat generated from the spatial light modulation part 44, the illumination optical system 43, the light source part 42, and the like from being trapped in the internal space in the upper part of the first cover part 51 and the second cover part 52.

[0053] As described above, part of the gas supplied from the gas supply port 53 to the inside of the drawing head cover 5 is discharged from the lower end opening 55 of the first cover part 51, and the other part of the gas is discharged from the gas exhaust port 54 of the second cover part 52. That is, the flow rate of the gas discharged from the gas exhaust port 54 and the flow rate of the gas discharged from the lower end opening 55 are each less than the flow rate of the gas supplied from the gas supply unit 6 to the inside of the drawing head cover 5.

[0054] In the present embodiment, the gas supplied from the gas supply port 53 to the inside of the drawing head cover 5 is substantially discharged only from the gas exhaust port 54 and the lower end opening 55 which is another gas exhaust port, and is not discharged from other parts of the drawing head cover 5. This makes it possible to increase the flow rate of the gas flowing from the gas supply port 53 to the gas exhaust port 54. As a result, it is possible to further suppress the buildup of heat in the internal space in the upper part of the first cover part 51 and the second cover part 52.

[0055] As described above, the drawing apparatus 1, which draws a pattern by irradiating light onto the substrate 9, includes the stage 21, the drawing head 41, the support unit 40, a scanning mechanism (i.e., the stage moving mechanism 22), and the gas supply unit 6. The stage 21 holds the substrate 9. The drawing head 41 irradiates an upper surface 91 of the substrate 9 with modulated light. The support unit 40 supports the drawing head 41 above the stage 21. The stage moving mechanism 22 moves the stage 21 relative to the drawing head 41 in a scanning direction parallel to the upper surface 91 of the substrate 9. The gas supply unit 6 supplies gas into the inside of the drawing head 41.

[0056] The drawing head 41 includes an illumination optical system 43, a spatial light modulation unit 44, a projection optical system 45, and a drawing head cover 5. The spatial light modulation unit 44 modulates and emits light from a light source 421. The illumination optical system 43 guides the light from the light source 421 to the spatial light modulation unit 44. The projection optical system 45 guides the light from the spatial light modulation unit 44 to an upper surface 91 of a substrate 9. The drawing head cover 5 accommodates the illumination optical system 43, the spatial light modulation unit 44, and the projection optical system 45 inside.

[0057] The imaging head cover 5 includes a gas supply port 53 and a gas exhaust port 54. The gas supply port 53 is provided at a position facing the projection optical system 45 in the horizontal direction. Gas flowing from the gas supply unit 6 toward the inside of the imaging head cover 5 passes through the gas supply port 53. The gas exhaust port 54 is provided on the illumination optical system 43 side of the spatial light modulation unit 44 in the direction along the optical axis J1 of the imaging head 41. The gas supplied from the gas supply port 53 to the inside of the imaging head cover 5 is exhausted from the gas exhaust port 54.

[0058] This makes it possible to suppress heat build-up inside the upper part of the drawing head cover 5 (the upper part of the first cover part 51 and the second cover part 52 in the above example) while suppressing complication of the device structure of the drawing device 1 compared to a case where the first cover part 51 and the second cover part 52 are isolated and a blowing mechanism is provided for each. Therefore, it is possible to suppress deformation of the support part 40 that supports the drawing head 41 due to heat transferred from the drawing head 41. As a result, it is possible to improve the drawing accuracy of the pattern on the substrate 9 in the drawing device 1. In addition, in the drawing device 1, the gas used for adjusting the temperature of the projection optical system 45 is reused for exhausting the atmosphere above the drawing head 41, thereby further suppressing complication of the device structure of the drawing device 1 and also reducing the running cost of the drawing device 1.

[0059] As described above, it is preferable that the imaging head cover 5 further includes another gas exhaust port (the lower end opening 55 in the above example) provided at the lower end of the imaging head cover 5. The gas supplied from the gas supply port 53 to the inside of the imaging head cover 5 is exhausted from the other gas exhaust port. This makes it possible to prevent the above-mentioned outgas from adhering to the lower end of the projection optical system 45 or entering the inside of the imaging head cover 5 from the lower end opening 55.

[0060] As described above, it is preferable that the flow rate of the gas discharged from the gas exhaust port 54 is less than the flow rate of the gas supplied from the gas supply unit 6. This makes it possible to preferably realize the discharge of the gas from the lower end opening 55, which is another gas exhaust port. As a result, it is possible to preferably prevent the outgas from adhering to the lower end of the projection optical system 45 or from entering the inside of the drawing head cover 5 from the lower end opening 55.

[0061] As described above, it is preferable to provide a blower mechanism 56 near the gas exhaust port 54 to send gas from the inside to the outside of the drawing head cover 5 through the gas exhaust port 54. This can promote the exhaust of gas from the gas exhaust port 54. As a result, it is possible to further prevent heat from building up inside the upper part of the drawing head cover 5.

[0062] As described above, the gas exhaust port 54 is preferably located at the end opposite to the spatial light modulation unit 44 in a portion (the second cover portion 52 in the above example) closer to the illumination optical system 43 than the spatial light modulation unit 44 in the direction along the optical axis J1 of the drawing head 41 in the drawing head cover 5. This allows the gas to flow over substantially the entire length of the second cover portion 52 in the Y direction from the end on the (-Y) side to the end on the (+Y) side of the second cover portion 52. As a result, the buildup of heat inside the upper portion of the drawing head cover 5 can be further suppressed. In addition, the gas flow in the upper portion of the first cover portion 51 and the second cover portion 52 passes from the spatial light modulation unit 44 around the illumination optical system 43, and further around the light source portion 42 to the gas exhaust port 54. Therefore, the atmosphere around the light source portion 42 is suppressed from moving to the periphery of the illumination optical system 43, and the illumination optical system 43 can be suppressed from being contaminated by the atmosphere around the light source portion 42.

[0063] As described above, it is preferable to provide a gas diffusion section (gas delivery section 64 in the above example) near the gas supply port 53, which diffuses the gas supplied to the gas supply port 53 in a direction perpendicular to the gas flow direction. This can improve the uniformity of the gas flow from the gas supply port 53 to the projection optical system 45. As a result, the temperature of the projection optical system 45 can be efficiently adjusted. In addition, it is preferable that the temperature of the gas supplied from the gas supply port 53 to the inside of the drawing head cover 5 is adjusted. This can suitably adjust the temperature of the projection optical system 45.

[0064] As described above, it is preferable that the drawing head 41 further includes the light source 421 and the liquid cooling unit 46. The light source 421 is disposed on the opposite side of the illumination optical system 43 from the spatial light modulation unit 44 in the direction along the optical axis J1 of the drawing head 41. The liquid cooling unit 46 cools the light source 421 by using a liquid inside the drawing head cover 5. This makes it possible to efficiently cool the light source 421, thereby making it possible to suppress an increase in the temperature inside the drawing head cover 5 due to heat generated from the light source 421.

[0065] The rendering device 1 described above can be modified in various ways.

[0066] For example, in the drawing head 41, the light source 421 may be cooled by a cooling unit having a structure different from that of the liquid cooling unit 46. Also, a cooling unit for cooling the light source 421 does not necessarily have to be provided.

[0067] In the drawing device 1, the light source for drawing a pattern does not necessarily have to be provided inside the drawing head cover 5. For example, light emitted from a light source provided outside the drawing head cover 5 may be guided to the inside of the drawing head cover 5 by an optical fiber or the like, and then guided to the illumination optical system 43 inside the drawing head cover 5. In this case, the portion of the optical fiber or the like that is housed inside the drawing head cover 5 is the light source unit 42 described above.

[0068] The structure of the gas supply unit 6 is not limited to the above example and may be modified in various ways. For example, the gas diffusion unit does not necessarily have to be the gas delivery unit 64 of the gas flow path 61 as long as it is disposed near the gas supply port 53. For example, a substantially flat member (for example, punched metal) in which a plurality of through holes are distributed may be attached as a gas diffusion unit on the (+Y) side of the gas flow path 61 and the (-Y) side of the gas supply port 53 in the groove portion 511 of the first cover portion 51. In this case, for example, a substantially rectangular opening having substantially the same shape as the gas supply port 53 may be provided on the side surface on the (+Y) side of the gas flow path 61, and gas may be delivered from the opening toward the gas supply port 53. In addition, the substantially flat gas diffusion unit may be disposed in the drawing head cover 5 on the (+Y) side of the gas supply port 53, or may be provided in the gas supply port 53. In addition, the shape of the through hole provided in the gas diffusion unit may be, for example, a slit shape extending substantially linearly substantially parallel to the X direction and / or the Z direction.

[0069] The above-mentioned gas diffusion unit may be omitted from the imaging apparatus 1. The air blowing mechanism 56 may also be omitted from the imaging apparatus 1.

[0070] In the drawing head 41, the lower end of the projection optical system 45 may not protrude from the first cover part 51, and the entire projection optical system 45 may be housed inside the first cover part 51. In this case, the lower end opening 55 of the first cover part 51 may be closed by a light-transmitting member that transmits light emitted from the projection optical system 45 toward the substrate 9. In other words, the lower end opening 55, which is another gas exhaust port described above, may not be provided. When the lower end opening 55 of the first cover part 51 is closed, the flow rate of gas exhausted from the gas exhaust port 54 may be approximately the same as the flow rate of gas supplied from the gas supply part 6.

[0071] The shapes of the drawing head 41 and the drawing head cover 5, and the manner in which the drawing head 41 is supported by the support part 40 may be changed in various ways. For example, the second cover part 52 of the drawing head cover 5 does not have to protrude from the support part 40 to the (+Y) side. In addition, the shapes of the drawing head 41 and the drawing head cover 5 in a side view do not necessarily have to be approximately L-shaped.

[0072] For example, as shown in FIG. 5, the shape of the drawing head 41a and the drawing head cover 5a in a side view may be a substantially rectangular belt extending linearly substantially parallel to the Z direction. In this case, inside the substantially rectangular parallelepiped drawing head cover 5a, the light source unit 42, the illumination optical system 43, the spatial light modulation unit 44, and the projection optical system 45 are arranged in this order from the (+Z) side to the (-Z) side. The gas exhaust port 54a is provided on the (+X) side and / or (-X) side of the drawing head cover 5a on the (+Z) side of the spatial light modulation unit 44. This makes it possible to suppress heat build-up inside the upper part of the drawing head cover 5a (i.e., the part above the spatial light modulation unit 44) while suppressing the complication of the device structure of the drawing device 1 in a substantially similar manner to the above. The gas exhaust port 54a may be provided on the (+Y) side and / or (-Y) side of the drawing head cover 5a.

[0073] In the drawing head 41a, the gas exhaust port 54a is preferably provided at the end of the drawing head cover 5a on the (+Z) side. In this case, the gas exhaust port 54a may be provided at the end face (i.e., the upper face) on the (+Z) side of the drawing head cover 5a. This can further prevent heat from building up inside the upper part of the drawing head cover 5a.

[0074] It is sufficient that the stage 21 is moved relatively to the drawing head 41 in the main scanning direction by the first moving mechanism 23. Therefore, for example, the stage 21 may be fixed, and above the stage 21, the drawing head 41 may be moved in the main scanning direction by the first moving mechanism 23. Similarly, the drawing head 41 may be moved in the sub-scanning direction by the second moving mechanism 24.

[0075] The above-mentioned substrate 9 is not necessarily limited to a printed circuit board. The drawing device 1 may draw a pattern on, for example, a semiconductor substrate, a substrate for a semiconductor package, a glass substrate for a flat panel display device such as a liquid crystal display device or a plasma display device, a glass substrate for a photomask, a substrate for a solar panel, or the like.

[0076] The configurations in the above-described embodiment and each of the modified examples may be combined as appropriate as long as they are not mutually inconsistent. [Explanation of symbols]

[0077] 1 Drawing device 5,5a Drawing head cover 6 Gas supply section 9 Substrate 21 Stage 22 Stage movement mechanism 40 Support part 41, 41a Drawing head 43 Illumination optical system 44 Spatial light modulation section 45 Projection optical system 46 Liquid cooling section 53 Gas supply port 54,54a Gas exhaust port 55 Bottom opening 56 Blower mechanism 64 Gas delivery section 91 (Top of board) 421 Light source J1 optical axis

Claims

1. A drawing apparatus that draws a pattern by irradiating a substrate with light, a stage for holding the substrate; a drawing head that irradiates modulated light onto an upper surface of the substrate; a support portion that supports the drawing head above the stage; a scanning mechanism that moves the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate; a gas supply unit that supplies gas to the inside of the drawing head; Equipped with The drawing head includes: a spatial light modulation unit that modulates light from a light source and emits the modulated light; an illumination optical system that guides light from the light source to the spatial light modulation unit; a projection optical system that guides light from the spatial light modulation unit to the upper surface of the substrate; a drawing head cover that accommodates the spatial light modulation unit, the illumination optical system, and the projection optical system therein; Equipped with The drawing head cover is a gas supply port provided at a position facing the projection optical system in a horizontal direction and through which gas passes from the gas supply unit toward the inside of the drawing head cover; a gas exhaust port that is provided closer to the illumination optical system than the spatial light modulation unit in a direction along the optical axis of the imaging head, and through which the gas supplied from the gas supply port into the imaging head cover is exhausted; A drawing device comprising:

2. 2. The drawing device according to claim 1, The drawing head cover further includes another gas exhaust port provided at a lower end of the drawing head cover and for exhausting the gas supplied from the gas supply port into the inside of the drawing head cover.

3. 3. The drawing device according to claim 2, A drawing apparatus in which the flow rate of the gas discharged from the gas outlet is lower than the flow rate of the gas supplied from the gas supply unit.

4. 4. The drawing device according to claim 1, The drawing apparatus further comprises a blower mechanism provided near the gas outlet for blowing gas from the inside of the drawing head cover to the outside through the gas outlet.

5. 4. The drawing device according to claim 1, the gas exhaust port is located at an end of the drawing head cover opposite the spatial light modulation unit in a portion of the drawing head cover that is closer to the illumination optical system than the spatial light modulation unit in a direction along the optical axis of the drawing head.

6. 4. The drawing device according to claim 1, The imaging apparatus further comprises a gas diffusion section disposed near the gas supply port, the gas diffusion section diffusing the gas supplied to the gas supply port in a direction perpendicular to the gas flow direction.

7. 4. The drawing device according to claim 1, The drawing head includes: the light source is disposed on the opposite side of the illumination optical system from the spatial light modulation unit in a direction along the optical axis of the imaging head; a liquid cooling unit that cools the light source using a liquid within the drawing head cover; The drawing device further comprises:

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