Imprinting Equipment

JP2024527829A5Pending Publication Date: 2025-07-25KONINKLIJKE PHILIPS NV
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Patent Information

Application Number
JP2024503565
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2021-07-21
Filing Date
2022-07-19
Publication Date
2025-07-25

AI Technical Summary

Technical Problem

Existing imprint lithography machines face challenges in accurately controlling the imprint gap and maintaining uniformity over larger wafer sizes, such as 300mm, due to insufficient rigidity and thermal management issues, leading to reduced process quality and longer heating/cooling times.

Method used

A two-part frame chuck manipulator with separate long-stroke and short-stroke drivers, combined with a spring arrangement and kinematic coupling, allows for precise control of the imprint gap and chuck position, along with a hollow chuck design for thermal management and a semi-automatic stamp loading mechanism.

Benefits of technology

Enables accurate and stable imprinting on larger wafers with reduced thermal mass, improved process gap control, and efficient loading/unloading, enhancing the quality and throughput of the imprint process.

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Abstract

The imprint apparatus comprises a first carrier carrying a flexible stamp and a second carrier movable relative to the first carrier, the second carrier being configured to carry a substrate having a resist layer. The first carrier and the second carrier are arranged such that the flexible stamp can be brought into contact with the substrate. The second carrier comprises a main frame which is moved in the Z-axis direction (relative to a reference frame) by a main actuator, and a chuck having a set of three chuck actuators, each having a stroke smaller than the stroke of the main actuator, which translate a portion of the chuck in the Z-axis direction relative to the main frame. The Z-axis movement of the chuck is split into two stages by separate long-stroke and short-stroke drivers. This allows a very rigid support to be provided, where the imprint gap control is precise.
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