Chemical mechanical polishing device

Abstract

To provide: a novel chemical mechanical polishing device; and a novel processing method for the chemical mechanical polishing device.SOLUTION: A chemical mechanical polishing device of the present disclosure includes one or more component parts. The one or more component parts include a surface treatment layer formed using a fluoropolyether group-containing compound.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present disclosure relates to a chemical mechanical polishing apparatus. [Background technology]

[0002] Chemical mechanical polishing is widely used as a method for polishing wafers, such as semiconductor wafers, and is capable of flattening the surface by using both physical polishing and chemical polishing.

[0003] As such a CMP apparatus, Patent Document 1 describes a chemical mechanical polishing apparatus that uses a polishing pad to polish an object to be polished attached to a polishing head, and that performs a hydrophobic treatment on the surfaces of each component of the chemical mechanical polishing apparatus that is located at a position higher than the upper surface of the polishing pad. It also describes that the hydrophobic treatment involves applying a fluorocarbon-based water-repellent paint to form a fluorocarbon-based polymer.

[0004] Patent Document 2 describes an external clamp ring for a chemical mechanical polishing carrier head, the external clamp ring comprising a cylindrical body having a cylindrical outer wall and a cylindrical inner wall, and a hydrophobic layer disposed on the cylindrical outer wall of the body, the hydrophobic layer being a silicone-based It is stated that the coating material may be formed from a PTFE-based coating material or a carbon-containing material.

[0005] Patent Document 3 describes a silicone rubber molded article having a contact surface with an object, the surface with which the article comes into contact being fluorinated to reduce the rolling resistance coefficient, and describes that the silicone rubber molded article can be used as an elastic membrane for holding wafers in a chemical mechanical polishing device. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] JP 2003-179021 A [Patent Document 2] JP 2018-531804 A [Patent Document 3] JP 2020-2183 A Summary of the Invention [Problem to be solved by the invention]

[0007] The present disclosure aims to provide a new chemical mechanical polishing apparatus and a new method for processing the chemical mechanical polishing apparatus. [Means for solving the problem]

[0008] The present disclosure provides the following aspects. [1] One or more components are included, A chemical mechanical polishing apparatus, wherein one or more of said components have a surface treatment layer formed using a compound containing a fluoropolyether group. [2] The chemical mechanical polishing apparatus according to [1], wherein the fluoropolyether group-containing compound includes a fluoropolyether group-containing silane compound. [3] The fluoropolyether group-containing silane compound is represented by the following formula (1) or (2): [ka] [In formula: R F1 Each occurrence independently represents Rf 1 -R F -O q - and; R F2 is -Rf 2 p -R F -O q - and; Rf 1 C, which may be substituted by one or more fluorine atoms, independently at each occurrence; 1-16 is an alkyl group; Rf 2 C may be substituted with one or more fluorine atoms. 1-6 is an alkylene group; R F is independently at each occurrence a divalent fluoropolyether group; p is 0 or 1; q, independently at each occurrence, is 0 or 1; R Si is independently in each occurrence a monovalent group containing a silicon atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group is bonded; At least one R Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto; X A each independently represents a single bond or a divalent to decavalent organic group; α is an integer from 1 to 9; β is an integer from 1 to 9; Each γ is independently an integer from 1 to 9. The chemical mechanical polishing apparatus according to [1] or [2], comprising at least one fluoropolyether group-containing silane compound represented by the following formula: [4] The chemical mechanical polishing apparatus according to any one of [1] to [3], wherein the surface treatment layer has a thickness of 1 nm or more and 20 nm or less. [5] the chemical mechanical polishing apparatus includes a platen, a rotating shaft connected to the platen, a polishing pad disposed on the platen, a polishing head disposed on the polishing pad, an arm portion of the polishing head to which the polishing head is fixed, a polishing slurry supplying unit, an arm portion of the polishing slurry supplying unit to which the polishing slurry supplying unit is fixed, a polishing unit cover, and a discharge groove; The chemical mechanical polishing apparatus according to any one of [1] to [4], wherein one or more selected from the group consisting of the platen, the polishing head, and the polishing slurry supply unit have a surface treatment layer. [6] The chemical mechanical polishing apparatus includes a platen, a rotating shaft connected to the platen, a polishing pad disposed on the platen, a polishing head disposed on the polishing pad, an arm portion of the polishing head to which the polishing head is fixed, a polishing slurry supplying unit, an arm portion of the polishing slurry supplying unit to which the polishing slurry supplying unit is fixed, a polishing unit cover, a discharge groove, a conditioner disk disposed on the polishing pad, and an arm portion of the conditioner disk to which the conditioner disk is fixed; The chemical mechanical polishing apparatus according to any one of [1] to [5], wherein one or more selected from the group consisting of the platen, the rotating shaft, the polishing head, the arm portion of the polishing head, the polishing slurry supply portion, the arm portion of the polishing slurry supply portion, the polishing portion cover, the discharge groove, and the arm portion of the conditioner disc have a surface treatment layer. [7] A method for treating a chemical mechanical polishing apparatus, comprising applying a surface treatment agent to a surface of one or more components of the chemical mechanical polishing apparatus to form a surface treatment layer, the surface treatment agent comprising a fluoropolyether group-containing compound. [8] Contains a fluoropolyether group-containing compound, A surface treatment agent that is applied to the surface of one or more components included in a chemical mechanical polishing apparatus to form a surface treatment layer. Effect of the Invention

[0009] The present disclosure may provide a new chemical mechanical polishing apparatus and a new method of operating the chemical mechanical polishing apparatus. [Brief description of the drawings]

[0010] [Figure 1] FIG. 1 is a schematic diagram illustrating an example of a chemical mechanical polishing apparatus. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] (First embodiment: chemical mechanical polishing apparatus) The chemical mechanical polishing apparatus of the present disclosure includes one or more components having a surface treatment layer formed using a fluoropolyether group-containing compound.

[0012] According to the present disclosure, a new chemical mechanical polishing apparatus can be provided.

[0013] In the chemical mechanical polishing method, typically, a polishing slurry containing abrasive grains such as silicon dioxide and a basic compound is used. When such a polishing slurry adheres to the surface of the chemical mechanical polishing apparatus, it may solidify and affect the polishing performance. In a preferred embodiment, the chemical mechanical polishing apparatus of the present disclosure has good workability of the polishing slurry (e.g., resilience and / or removability of the polishing slurry), and in a more preferred embodiment, the workability is good even after a time has passed since the polishing slurry was adhered. Although the present disclosure should not be interpreted as being limited to a particular theory, the reason why such an effect is achieved in the chemical mechanical polishing apparatus of the present disclosure is considered to be as follows.

[0014] That is, in the chemical mechanical polishing apparatus of the present disclosure, one or more of the components have a surface treatment layer formed by using a compound containing fluoropolyether groups. Therefore, it is considered that the adhesion of polishing slurry can be suppressed, and the interaction with the solidified matter of polishing slurry can be suppressed, and the workability, especially the workability after time has passed, can be improved. On the other hand, in the conventional surface treatment layer, fluorinated products of fluorocarbon polymers and silicone rubber are used, and the components that can be surface treated may be limited, and it may be difficult to sufficiently suppress the adhesion of polishing slurry.

[0015] The chemical mechanical polishing apparatus disclosed herein typically comprises a rotatable platen, a polishing pad placed on the platen, a polishing head placed on the polishing pad, a polishing head arm portion that fixes the polishing head, a polishing slurry supply portion, a polishing portion cover, and a discharge groove.

[0016] The platen is typically formed in a disk shape and is connected to a rotating shaft disposed below the platen. The platen rotates as the rotating shaft rotates. A polishing pad is fixed to the top of the platen, and a polishing slurry is supplied onto the polishing pad from a polishing slurry supply unit.

[0017] The polishing head may be formed in a disk shape having a smaller diameter than the base plate and may be connected to an arm portion of the polishing head disposed above the polishing head. The arm portion may include a rotating shaft (not shown), and the rotating direction of the rotating shaft of the arm portion may be opposite to the rotating direction of the rotating shaft of the base plate.

[0018] The polishing head may be provided with a head body, a pressing member for pressing the object to be polished downward (to the polishing pad), and a buffer member disposed between the object to be polished and the pressing member.

[0019] The polishing unit cover may be disposed on the outer periphery of the surface plate, and a drain groove may be disposed between the polishing unit cover and the surface plate.

[0020] In one embodiment, in this chemical mechanical polishing apparatus, the object to be polished can be attached to the polishing head. The object to be polished rotates together with the polishing head, and the polishing head presses one side of the object to be polished onto the rotating platen with a predetermined pressure while rotating. In addition, a polishing slurry is supplied from a polishing slurry supply unit onto the platen (on the polishing pad), and the polishing slurry penetrates between the platen (polishing pad) and the object to be polished, so that one side of the object to be polished can be polished flat.

[0021] The polishing slurry supplied onto the rotating platen is delivered to the polishing head and can be discharged from a discharge groove disposed between the polishing section cover and the platen.

[0022] The chemical mechanical polishing apparatus may further include a conditioner disc disposed on the polishing pad, and a conditioner disc arm portion for fixing the conditioner disc.

[0023] The conditioner disc may be formed on a disk having a smaller diameter than the surface plate and may be connected to an arm portion of the conditioner disc disposed above the surface plate. The arm portion of the conditioner disc may have a rotating shaft (not shown), and the rotating direction of the rotating shaft of the arm portion may be opposite to the rotating direction of the rotating shaft of the surface plate.

[0024] In one embodiment, when such a conditioner disk is provided, the conditioner disk can grind (dress) the surface of the polishing pad, thereby suppressing clogging of the polishing pad that may occur due to abrasive grains of the polishing slurry entering the pores of the polishing pad, and maintaining the polishing performance.

[0025] One or more of the above components has a surface treatment layer formed using a fluoropolyether group-containing compound.

[0026] Such components preferably include one or more selected from a surface plate, a polishing head, and a polishing slurry supply unit, more preferably include one or more selected from a surface plate, a rotating shaft of the surface plate, a polishing head, an arm part of the polishing head, a polishing slurry supply unit, an arm part of the polishing slurry supply unit, a polishing unit cover, an exhaust groove, and an arm part of a conditioner disk, but are not limited thereto. In one embodiment, such components preferably do not include a polishing pad and a conditioner disk.

[0027] Hereinafter, this embodiment will be described in more detail with reference to the chemical mechanical polishing apparatus shown in Fig. 1. Note that in Fig. 1, the surface treatment layer is not shown.

[0028] In the chemical mechanical polishing apparatus shown in Fig. 1, a platen 6a is connected to a rotating shaft 6b. A polishing pad 5 is fixed to the upper part of the platen 6a, and a polishing slurry is supplied onto the polishing pad 5 from a polishing slurry supplying unit 9. The polishing slurry supplying unit 9 is connected to an arm unit 10 disposed above it.

[0029] A polishing head 3 and a conditioner disc 7 are disposed on the polishing pad 5. The polishing head 3 is formed to have a smaller diameter than the surface plate 6a, and is connected to an arm portion 4 disposed above the polishing head 3. An object to be polished 2 is attached to the polishing head 3. The conditioner disc 7 is formed to have a smaller diameter than the surface plate 6a, and preferably to have a smaller diameter than the polishing head 3. The conditioner disc is connected to an arm portion 8 disposed above the conditioner disc.

[0030] A polishing section cover 12 is disposed on the outer periphery of the surface plate 6 a, and a discharge groove 11 is disposed between the surface plate 6 a and the polishing section cover 12.

[0031] In the chemical mechanical polishing apparatus 1 shown in FIG. 1, when the platen 6a fixed to the polishing pad 5 starts to rotate, the polishing slurry is dropped from the polishing slurry supply unit 9. At this time, the polishing slurry supply unit 9 drops the polishing slurry onto the polishing pad 5 and starts to oscillate. This oscillation is a semicircular arc between the approximate center and the outer periphery of the platen 6a. When the polishing slurry is uniformly dropped onto the polishing pad 5 of the platen 6a and covers the entire surface of the polishing pad 5, the polishing head 3 to which the polished object 2 is fixed rotates and presses the surface of the polished object 2 against the polishing pad 5. At this time, the surface of the polished object 2 adsorbed to the polishing head 3 can oscillate in a direction horizontal to the upper surface of the polishing pad 5 and can be polished flat.

[0032] The polishing slurry is silica (SiO 2 ) and potassium hydroxide (KOH), ammonium hydroxide (NH 4 The abrasive may contain a basic compound such as dimethylaminopropylamine (DMSO) and an aqueous medium (typically water), and may be a suspension of the abrasive, the basic compound, and the aqueous medium. The particle size of the abrasive may be 0.1 μm or less.

[0033] In the chemical mechanical polishing apparatus 1 shown in FIG. 1, it is preferable that one or more selected from the table 6a, the polishing head 3, and the polishing slurry supply unit 9 have the above-mentioned surface treatment layer, and it is more preferable that one or more selected from the group consisting of the table 6a, the rotating shaft 6b of the table 6a, the polishing head 3, the arm unit 4 of the polishing head, the polishing slurry supply unit 9, the arm unit 10 of the polishing slurry supply unit, the polishing unit cover 12, the discharge groove 11, the conditioner disc 7, and the arm unit 8 of the conditioner disc have the above-mentioned surface treatment layer.

[0034] The thickness of the surface treatment layer may be preferably 1 nm or more and 20 nm or less, more preferably 1 nm or more and 10 nm or less, and further preferably 5 nm or more and 10 nm or less.

[0035] The surface treatment layer may be formed by applying a surface treatment agent containing a fluoropolyether group-containing compound according to the structure and material of the component to be treated. In one embodiment, the surface treatment agent may contain a compound having an acrylic group or an epoxy group, or a polyimide-based compound, in addition to the fluoropolyether group-containing compound. In this embodiment, the fluoropolyether group-containing compound is preferably a compound having an acrylic group or an epoxy group, or a compound having a functional group that can react with a polyimide-based compound.

[0036] In a preferred embodiment, the surface treatment layer can be formed using a fluoropolyether group-containing compound.The fluoropolyether group-containing compound can be, for example, a compound having a group (fluoropolyether group) in which one or more hydrogen atoms contained in polyether group are replaced with fluorine atoms.

[0037] Preferably, the fluoropolyether group-containing compound includes a fluoropolyether group-containing silane compound. By including a fluoropolyether group-containing silane compound, even when a polishing slurry adheres to the surface treatment layer, the generation of particles can be suppressed.

[0038] The fluoropolyether group-containing silane compound is preferably represented by the following formula (1) or (2): [ka] [In formula: R F1 Each occurrence independently represents Rf 1 -R F -O q - and; R F2 is -Rf 2 p -R F -O q - and; Rf 1 C, which may be substituted by one or more fluorine atoms, independently at each occurrence; 1-16 is an alkyl group; Rf 2 C may be substituted with one or more fluorine atoms. 1-6 is an alkylene group; R F is independently at each occurrence a divalent fluoropolyether group; p is 0 or 1; q, independently at each occurrence, is 0 or 1; R Si is independently in each occurrence a monovalent group containing a silicon atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group is bonded; At least one R Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto; X A each independently represents a single bond or a divalent to decavalent organic group; α is an integer from 1 to 9; β is an integer from 1 to 9; Each γ is independently an integer from 1 to 9. The fluoropolyether group-containing silane compound is represented by the formula:

[0039] In the above formula (1), R F1 Each occurrence independently represents Rf 1 -R F -O q - or a fluoroalkyl group. F1 is preferably Rf 1 -R F -O q In another embodiment, R F1 is preferably a fluoroalkyl group. F1 Rf 1 -R F -O q When the formula (1) is -, the compound represented by formula (1) contains a fluoropolyether group and corresponds to a fluoropolyether group-containing silane compound.

[0040] In the above formula (2), R F2 is -Rf 2 p -R F -O q - or a fluoroalkylene group. F2 is preferably Rf 2 p -R F -O q In another embodiment, R F2 is preferably a fluoroalkylene group. F2 Rf 2 p -R F -O q When the formula (2) is -, the compound represented by formula (2) contains a fluoropolyether group and corresponds to a fluoropolyether group-containing silane compound.

[0041] In the above formula, Rf 1 C, which may be substituted by one or more fluorine atoms, independently at each occurrence; 1-16 It is an alkyl group.

[0042] C which may be substituted by one or more fluorine atoms 1-16 "C" in alkyl group1-16 The "alkyl group" may be a straight chain or a branched chain, and is preferably a straight chain or branched chain C 1-6 Alkyl groups, especially C 1-3 is preferably a straight-chain C 1-6 Alkyl groups, especially C 1-3 It is an alkyl group.

[0043] Above Rf 1 is preferably C substituted by one or more fluorine atoms 1-16 is an alkyl group, more preferably CF 2 HC 1-15 A perfluoroalkylene group, more preferably C 1-16 It is a perfluoroalkyl group.

[0044] Above C 1-16 The perfluoroalkyl group may be linear or branched, and is preferably a linear or branched C 1-6 Perfluoroalkyl groups, especially C 1-3 A perfluoroalkyl group, more preferably a linear C 1-6 Perfluoroalkyl groups, especially C 1-3 Perfluoroalkyl groups, specifically -CF 3 , -CF 2 CF 3 , or -CF 2 CF 2 CF 3 It is.

[0045] In the above formula, Rf 2 C may be substituted with one or more fluorine atoms. 1-6 It is an alkylene group.

[0046] C which may be substituted by one or more fluorine atoms 1-6 "C" in the alkylene group 1-6 The "alkylene group" may be a straight chain or a branched chain, and is preferably a straight chain or branched C 1-3 It is preferably a linear alkylene group. 1-3It is an alkylene group.

[0047] Above Rf 2 is preferably C substituted by one or more fluorine atoms 1-6 is an alkylene group, more preferably C 1-6 A perfluoroalkylene group, more preferably C 1-3 It is a perfluoroalkylene group.

[0048] Above C 1-6 The perfluoroalkylene group may be linear or branched, and is preferably a linear or branched C 1-3 A perfluoroalkylene group, more preferably a linear C 1-3 Perfluoroalkylene groups, specifically -CF 2 -, -CF 2 CF 2 - or -CF 2 CF 2 CF 2 -It is.

[0049] In the above formula, p is 0 or 1. In one embodiment, p is 0. In another embodiment, p is 1.

[0050] In the above formula, q is, independently at each occurrence, 0 or 1. In one embodiment, q is 0. In another embodiment, q is 1.

[0051] In the above formulas (1) and (2), R F is independently at each occurrence a divalent fluoropolyether group.

[0052] R F is preferably -(OC h1 R Fa 2h1 ) h3 -(OC h2 R Fa 2h2-2 ) h4 - [In formula: RFa is independently at each occurrence a hydrogen atom, a fluorine atom, or a chlorine atom; h1 is an integer from 1 to 6, h2 is an integer from 4 to 8; h3 is an integer equal to or greater than 0, h4 is an integer equal to or greater than 0, However, the number of repeating units of h3 and h4 is 1 or more, preferably 2 or more, and more preferably 5 or more, and the order of the repeating units enclosed in parentheses with h3 and h4 is arbitrary in the formula. It may contain a group represented by:

[0053] In one embodiment, R F R can be linear or branched. F is preferably of the formula: -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - [In formula: R Fa is independently at each occurrence a hydrogen atom, a fluorine atom, or a chlorine atom; a, b, c, d, e, and f are each independently an integer of 0 to 200, and the sum of a, b, c, d, e, and f is 1 or more. The order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula. However, all R Fa is a hydrogen atom or a chlorine atom, at least one of a, b, c, e and f is 1 or greater.] It is a group represented by the following formula:

[0054] RFa is preferably a hydrogen atom or a fluorine atom, more preferably a fluorine atom. However, all R Fa is a hydrogen atom or a chlorine atom, at least one of a, b, c, e and f is 1 or greater.

[0055] Preferably, a, b, c, d, e and f may each independently be an integer of 0 to 100.

[0056] The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more. The sum of a, b, c, d, e and f is preferably 200 or less, more preferably 100 or less, and even more preferably 60 or less, and may be, for example, 50 or less or 30 or less.

[0057] These repeating units may be linear or branched, and may contain a ring structure. For example, -(OC 6 F 12 )- is -(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF 2 CF 2CF(CF 3 ))-etc. -(OC 5 F 10 )- is -(OCF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 ))-etc. -(OC 4 F 8 )- is -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 ) 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )-and-(OCF 2 CF(C 2 F 5 ))-. -(OC 3 F 6)-(i.e., in the above formula, R Fa is a fluorine atom) is -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )-and-(OCF 2 CF(CF 3 ))-. -(OC 2 F 4 )- is -(OCF 2 CF 2 )-and-(OCF(CF 3 ))-.

[0058] In one embodiment, the repeating unit is linear. By making the repeating unit linear, the surface slip property, abrasion resistance, etc. of the surface treatment layer can be improved.

[0059] In one embodiment, the repeating unit is a branched chain. By making the repeating unit a branched chain, the dynamic friction coefficient of the surface treatment layer can be increased.

[0060] In one embodiment, R F may include a ring structure.

[0061] The ring structure may be a three-, four-, five-, or six-membered ring as described below.

[0062] [ka] [In the formula, * indicates the bond position.]

[0063] The ring structure may be preferably a four-, five-, or six-membered ring, more preferably a four-, or six-membered ring.

[0064] The repeating unit having a ring structure may preferably be the following unit.

[0065] [ka] [In the formula, * indicates the bond position.]

[0066] In one embodiment, the repeating unit is linear. By making the repeating unit linear, the surface slip property, abrasion resistance, etc. of the surface treatment layer can be improved.

[0067] In one embodiment, the repeating unit is a branched chain. By making the repeating unit a branched chain, the dynamic friction coefficient of the surface treatment layer can be increased.

[0068] In one embodiment, R F represents, independently in each occurrence, a group represented by any one of the following formulas (f1) to (f6). -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) [In the formula, d is an integer of 1 to 200, and e is 0 or 1.]; -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) [In the formula, c and d each independently represent an integer of 0 or more and 30 or less, and e and f each independently represent an integer of 1 or more and 200 or less, The sum of c, d, e, and f is 2 or more, The order of occurrence of each repeat unit enclosed in parentheses with the subscript c, d, e, or f is arbitrary in the formula. -(R 6 -R 7 ) g - (f3) [In the formula, R 6 is OCF 2 Or O.C.2 F 4 and R 7 is O.C. 2 F 4 , O.C. 3 F 6 , O.C. 4 F 8 , O.C. 5 F 10 and O.C. 6 F 12 or a combination of two or three groups independently selected from these groups; g is an integer from 2 to 100; -(R 6 -R 7 ) g -R r -(R 7’ -R 6’ ) g’ - (f4) [In the formula, R 6 is OCF 2 Or O.C. 2 F 4 and R 7 is O.C. 2 F 4 , O.C. 3 F 6 , O.C. 4 F 8 , O.C. 5 F 10 and O.C. 6 F 12 or a combination of two or three groups independently selected from these groups; R 6’ is OCF 2 Or O.C. 2 F 4 and R 7’ is O.C. 2 F 4 , O.C. 3 F 6 , O.C. 4 F 8 , O.C. 5 F 10 and O.C. 6 F 12or a combination of two or three groups independently selected from these groups; g is an integer from 2 to 100; g' is an integer from 2 to 100, R r teeth,

[0069] [ka] (In the formula, * indicates the bond position.) .]; -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) [In the formula, e is an integer of 1 or more and 200 or less, a, b, c, d, and f are each independently an integer of 0 or more and 200 or less, and the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.] -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6) [In the formula, f is an integer of 1 or more and 200 or less, a, b, c, d, and e are each independently an integer of 0 or more and 200 or less, and the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.]

[0070] In the above formula (f1), d is preferably an integer of 5 to 200, more preferably 10 to 100, and further preferably 15 to 50, for example, an integer of 25 to 35. 3 F 6 is preferably (OCF 2 CF 2 CF 2 ), (OCF(CF 3 )CF 2 ) or (OCF 2 CF(CF 3 )), more preferably (OCF 2 CF 2 CF 2 ) in the above formula (f1). 2 F 4 ) is preferably (OCF 2 CF 2 ) or (OCF(CF 3 )), more preferably (OCF 2 CF 2 In one embodiment, e is 0. In another embodiment, e is 1.

[0071] In the above formula (f2), e and f are each independently an integer of preferably 5 to 200, more preferably 10 to 200. The sum of c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more. In one embodiment, the above formula (f2) is preferably -(OCF 2 CF 2 CF 2 CF 2 ) c -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2) e -(OCF 2 ) f In another embodiment, formula (f2) is a group represented by -(OC 2 F 4 ) e -(OCF 2 ) f - may be a group represented by the formula:

[0072] In the above formula (f3), R 6 Preferably, OC 2 F 4 In the above (f3), R 7 Preferably, OC 2 F 4 , O.C. 3 F 6 and O.C. 4 F 8 or a combination of two or three groups independently selected from these groups, more preferably OC 3 F 6 and O.C. 4 F 8 is a group selected from 2 F 4 , O.C. 3 F 6 and O.C. 4 F 8 Examples of the combination of two or three groups independently selected from the group consisting of, but not limited to, -OC 2 F 4 O.C. 3 F 6 -, -OC 2 F 4 O.C. 4 F 8 -, -OC 3 F 6 O.C. 2 F 4 -, -OC 3 F 6 O.C. 3 F 6 -, -OC 3 F 6 O.C. 4 F 8 -, -OC 4 F 8 O.C.4 F 8 -,-OC 4 F 8 OC 3 F 6 -,-OC 4 F 8 OC 2 F 4 -,-OC 2 F 4 OC 2 F 4 OC 3 F 6 -,-OC 2 F 4 OC 2 F 4 OC 4 F 8 -,-OC 2 F 4 OC 3 F 6 OC 2 F 4 -,-OC 2 F 4 OC 3 F 6 OC 3 F 6 -,-OC 2 F 4 OC 4 F 8 OC 2 F 4 -,-OC 3 F 6 OC 2 F 4 OC 2 F 4 -,-OC 3 F 6 OC 2 F 4 OC 3 F 6 -,-OC 3 F 6 OC 3 F 6 OC 2 F 4 -、and -OC 4 F 8 OC 2 F 4 OC 2 F 4In the above formula (f3), g is preferably an integer of 3 or more, more preferably an integer of 5 or more. The above g is preferably an integer of 50 or less. In the above formula (f3), OC 2 F 4 , O.C. 3 F 6 , O.C. 4 F 8 , O.C. 5 F 10 and O.C. 6 F 12 may be either linear or branched, and is preferably linear. In this embodiment, the above formula (f3) is preferably -(OC 2 F 4 -OC 3 F 6 ) g -or- (OC 2 F 4 -OC 4 F 8 ) g -It is.

[0073] In the above formula (f4), R 6 , R 7 and g have the same meanings as those described in the above formula (f3) and have the same embodiments. 6’ , R 7’ and g' are R 6 , R 7 and g have the same meaning and behavior. r is preferably

[0074] [ka] [In the formula, * indicates the bond position.] and more preferably

[0075] [ka] [In the formula, * indicates the bond position.] It is.

[0076] In the above formula (f5), e is preferably an integer of 1 or more and 100 or less, more preferably an integer of 5 or more and 100 or less. The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

[0077] In the above formula (f6), f is preferably an integer of 1 or more and 100 or less, more preferably an integer of 5 or more and 100 or less. The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

[0078] In one embodiment, the R F is a group represented by the above formula (f1).

[0079] In one embodiment, the R F is a group represented by the above formula (f2).

[0080] In one embodiment, the R F is a group represented by the above formula (f3).

[0081] In one embodiment, the R F is a group represented by the above formula (f4).

[0082] In one embodiment, the R F is a group represented by the above formula (f5).

[0083] In one embodiment, the R F is a group represented by the above formula (f6).

[0084] In one embodiment, the fluoropolyether group-containing silane compound contained in the surface treatment layer preferably contains a structure represented by the above formula (f1), (f2), (f3), (f5) or (f6), more preferably contains a structure represented by the above formula (f1) or (f2), and even more preferably contains a structure represented by the above formula (f1), from the viewpoint of the slipperiness of the surface treatment layer.

[0085] In another embodiment, the fluorine-containing silane compound that may be contained in the surface treatment layer preferably contains a structure represented by the above formula (f1), (f2), (f3), (f4), (f5) or (f6), more preferably contains a structure represented by the above formula (f1) or (f2), and even more preferably contains a structure represented by the above formula (f2).

[0086] Above R F In the formula, the ratio of e to f (hereinafter referred to as "e / f ratio") is 0.1 to 10, preferably 0.2 to 5, more preferably 0.2 to 2, even more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85. By making the e / f ratio 10 or less, the slipperiness, abrasion resistance, and chemical resistance (e.g., resistance to artificial sweat) of the surface treatment layer obtained from this compound are further improved. The smaller the e / f ratio, the more improved the slipperiness and abrasion resistance of the surface treatment layer. On the other hand, by making the e / f ratio 0.1 or more, the stability of the compound can be further improved. The larger the e / f ratio, the more improved the stability of the compound.

[0087] R F1 The fluoroalkyl group represented by the formula (I) is a group in which a hydrogen atom contained in an alkyl group is replaced with a fluorine atom, and may be linear or branched. F1 The fluoroalkyl group represented by the formula (I) is preferably 1-50 Fluoroalkyl groups, more preferably C 1-20 Fluoroalkyl groups, more preferably C 1-16 Fluoroalkyl groups, such as C 1-10 Fluoroalkyl groups, and also C 1-6 Fluoroalkyl groups, especially C 1-3 In one embodiment, R F1 is a perfluoroalkyl group in which all hydrogen atoms are replaced with fluorine atoms. In this embodiment, the perfluoroalkyl group is preferably a linear or branched C 1-50 Perfluoroalkyl groups, more preferably linear or branched C1-20 Perfluoroalkyl groups, more preferably linear or branched C 1-16 Perfluoroalkyl groups, for example linear or branched C 1-10 Perfluoroalkyl groups, as well as linear or branched C 1-6 Perfluoroalkyl groups, especially linear or branched C 1-3 It may be a perfluoroalkyl group.

[0088] R F2 The fluoroalkylene group represented by the formula (I) is a group in which a hydrogen atom contained in an alkylene group is replaced with a fluorine atom, and may be linear or branched. F2 The fluoroalkylene group represented by the formula 1-50 Fluoroalkylene groups, more preferably C 1-20 Fluoroalkylene groups, more preferably C 1-16 Fluoroalkylene groups, for example, C 1-10 Fluoroalkylene groups, further C 1-6 Fluoroalkylene groups, especially C 1-3 In one embodiment, R F2 is a perfluoroalkylene group in which all hydrogen atoms are substituted with fluorine atoms. In this embodiment, the perfluoroalkylene group is preferably a linear or branched C 1-50 Perfluoroalkylene groups, more preferably linear or branched C 1-20 Perfluoroalkylene groups, more preferably linear or branched C 1-16 Perfluoroalkylene groups, for example linear or branched C 1-10 Perfluoroalkylene groups, as well as linear or branched C 1-6 Perfluoroalkylene groups, especially linear or branched C 1-3 It may be a perfluoroalkylene group.

[0089] In the above fluoropolyether group-containing silane compound, R F1 and RF2 The number average molecular weight of the portion is not particularly limited, but is, for example, 500 to 30,000, preferably 1,500 to 30,000, and more preferably 2,000 to 10,000. F1 and R F2 The number average molecular weight of 19 The value is measured by F-NMR.

[0090] In another embodiment, R F1 and R F2 The number average molecular weight of the portion may be from 500 to 30,000, preferably from 1,000 to 20,000, more preferably from 2,000 to 15,000, even more preferably from 2,000 to 10,000, for example from 3,000 to 6,000.

[0091] In another embodiment, R F1 and R F2 The number average molecular weight of the portion may be from 4,000 to 30,000, preferably from 5,000 to 10,000, and more preferably from 6,000 to 10,000.

[0092] In the above formulas (1) and (2), R Si is independently in each occurrence a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a silicon atom to which a monovalent organic group is bonded, and at least one R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0093] Here, the term "hydrolyzable group" refers to a group that can undergo a hydrolysis reaction, i.e., a group that can be eliminated from the main skeleton of a compound by a hydrolysis reaction. Examples of the hydrolyzable group include -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, halogen (wherein R j is a substituted or unsubstituted C 1-4 (representing an alkyl group) and the like.

[0094] In a preferred embodiment, R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0095] In a preferred embodiment, R Si is represented by the following formula (S1), (S2), (S3), or (S4): [ka] It is a group represented by the following formula:

[0096] In the above formula, R 11 is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0097] R 11 is preferably, independently at each occurrence, a hydrolyzable group.

[0098] R 11 is preferably, independently at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (wherein R j is a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). j Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R j is a methyl group, and in another embodiment, R j is an ethyl group.

[0099] In the above formula, R12 is independently at each occurrence a hydrogen atom or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above-mentioned hydrolyzable groups.

[0100] R 12 In the above, the monovalent organic group is preferably C 1-20 is an alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0101] In the above formula, n1 is (SiR 11 n1 R 12 3-n1 ) units are each independently an integer of 0 to 3. Si is a group represented by formula (S1) or (S2), R at the terminal of formula (1) and formula (2) Si In the portion (hereinafter also simply referred to as the “terminal portion” of formula (1) and formula (2)), n1 is 1 to 3 (SiR 11 n1 R 12 3-n1 ) unit is present. That is, in such a terminal portion, all n1s do not become 0 at the same time. In other words, in the terminal portion of formula (1) and formula (2), there is at least one Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0102] n1 is (SiR 11 n1 R 12 3-n1 ) units are each independently preferably an integer of 1 to 3, more preferably 2 or 3, and even more preferably 3.

[0103] In the above formula, X 11 is independently at each occurrence a single bond or a divalent organic group. Such a divalent organic group is preferably -R 28 -O x -R 29 -(In the formula, R 28 and R 29 each occurrence independently represents a single bond or C 1-20is an alkylene group, and x is 0 or 1. 1-20 The alkylene group may be linear or branched, but is preferably linear. 1-20 The alkylene group is preferably 1-10 Alkylene group, more preferably C 1-6 Alkylene group, more preferably C 1-3 It is an alkylene group.

[0104] In one embodiment, X 11 may each independently in each occurrence be -C 1-6 Alkylene-OC 1-6 Alkylene- or -OC 1-6 It is alkylene.

[0105] In a preferred embodiment, X 11 each occurrence independently represents a single bond or a straight-chain C 1-6 An alkylene group, preferably a single bond or a straight chain C 1-3 An alkylene group, more preferably a single bond or a straight chain C 1-2 It is preferably a linear C 1-2 It is an alkylene group.

[0106] In the above formula, R 13 is independently at each occurrence a hydrogen atom or a monovalent organic group. Such a monovalent organic group is preferably 1-20 It is an alkyl group. 1-20 The alkyl group may be straight or branched chain, but is preferably straight chain.

[0107] In a preferred embodiment, R 13 each occurrence independently represents a hydrogen atom or a straight-chain C 1-6 is an alkyl group, preferably a hydrogen atom or a straight-chain C 1-3 It is an alkyl group, preferably a hydrogen atom or a methyl group.

[0108] In the above formula, t in each occurrence is independently an integer of 2 or greater.

[0109] In a preferred embodiment, t is independently in each occurrence an integer from 2 to 10, preferably an integer from 2 to 6.

[0110] In the above formula, R 14 each occurrence independently represents a hydrogen atom, a halogen atom or -X 11 -SiR 11 n1 R 12 3-n1 The halogen atom is preferably an iodine atom, a chlorine atom or a fluorine atom, more preferably a fluorine atom. In a preferred embodiment, R 14 is a hydrogen atom.

[0111] In the above formula, R 15 is each independently in each occurrence a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.

[0112] In one embodiment, R 15 is each independently at each occurrence an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms.

[0113] In a preferred embodiment, R 15 is a single bond.

[0114] In one embodiment, formula (S1) is formula (S1-a) below. [ka] [In the formula, R 11 , R 12 , R 13 , X 11 and n1 are as defined above in formula (S1); t1 and t2, in each occurrence, are each independently an integer of 1 or greater, preferably an integer of 1 to 10, more preferably an integer of 2 to 10, for example, an integer of 1 to 5 or an integer of 2 to 5; The order of occurrence of each repeating unit enclosed in parentheses with t1 and t2 is arbitrary in the formula.

[0115] In a preferred embodiment, formula (S1) is formula (S1-b) below. [ka] [In the formula, R 11 , R 12 , R 13 , X 11 , n1 and t are as defined above in formula (S1).

[0116] In the above formula, R a1 may each independently in each occurrence be -Z 1 -SiR 21 p1 R 22 q1 R 23 r1 It is.

[0117] Above Z 1 is independently an oxygen atom or a divalent organic group in each occurrence. 1 The structure written as is shown on the right side (SiR 21 p1 R 22 q1 R 23 r1 )

[0118] In a preferred embodiment, Z 1 is a divalent organic group.

[0119] In a preferred embodiment, Z 1 is Z 1 Preferably, in formula (S3), (Si-Z) does not include a compound that forms a siloxane bond with the Si atom to which it is bonded. 1 --Si) does not contain a siloxane bond.

[0120] Above Z 1 is preferably C 1-6 Alkylene group, -(CH2 ) z1 -O-(CH 2 ) z2 - (wherein z1 is an integer of 0 to 6, for example, an integer of 1 to 6, and z2 is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z3 -Phenylene-(CH 2 ) z4 - (wherein z3 is an integer of 0 to 6, for example, an integer of 1 to 6, and z4 is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6 It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0121] In a preferred embodiment, Z 1 is C 1-6 Alkylene group or -(CH 2 ) z3 -Phenylene-(CH 2 ) z4 -, preferably -phenylene-(CH 2 ) z4 -It is. 1 is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0122] In another preferred embodiment, the Z 1 is C 1-3 In one embodiment, Z is an alkylene group. 1 -CH 2 CH 2 CH 2 In another embodiment, Z 1 -CH 2 CH 2 --It could be.

[0123] Above R 21 may each independently in each occurrence be -Z 1’ -SiR21’ p1’ R 22’ q1’ R 23’ r1’ It is.

[0124] Above Z 1’ is independently an oxygen atom or a divalent organic group in each occurrence. 1’ The structure written as is shown on the right side (SiR 21’ p1’ R 22’ q1’ R 23’ r1’ )

[0125] In a preferred embodiment, Z 1’ is a divalent organic group.

[0126] In a preferred embodiment, Z 1’ is Z 1’ Preferably, in formula (S3), (Si-Z) does not include a compound that forms a siloxane bond with the Si atom to which it is bonded. 1’ --Si) does not contain a siloxane bond.

[0127] Above Z 1’ is preferably C 1-6 Alkylene group, -(CH 2 ) z1’ -O-(CH 2 ) z2’ - (wherein z1' is an integer of 0 to 6, for example, an integer of 1 to 6, and z2' is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z3’ -Phenylene-(CH 2 ) z4’ - (wherein z3' is an integer of 0 to 6, for example, an integer of 1 to 6, and z4' is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0128] In a preferred embodiment, Z 1’ is C 1-6 Alkylene group or -(CH 2 ) z3’ -Phenylene-(CH 2 ) z4’ -, preferably -phenylene-(CH 2 ) z4’ -It is. 1’ is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0129] In another preferred embodiment, the Z 1’ is C 1-3 In one embodiment, Z is an alkylene group. 1’ -CH 2 CH 2 CH 2 In another embodiment, Z 1’ -CH 2 CH 2 --It could be.

[0130] Above R 21’ may each independently in each occurrence be -Z 1” -SiR 22” q1” R 23” r1” It is.

[0131] Above Z 1” is independently an oxygen atom or a divalent organic group in each occurrence. 1” The structure written as is shown on the right side (SiR 22” q1” R 23” r1” )

[0132] In a preferred embodiment, Z 1” is a divalent organic group.

[0133] In a preferred embodiment, Z1” is Z 1” Preferably, in formula (S3), (Si-Z) does not include a compound that forms a siloxane bond with the Si atom to which it is bonded. 1” --Si) does not contain a siloxane bond.

[0134] Above Z 1” is preferably C 1-6 Alkylene group, -(CH 2 ) z1” -O-(CH 2 ) z2” - (wherein z1" is an integer of 0 to 6, for example, an integer of 1 to 6, and z2" is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z3” -Phenylene-(CH 2 ) z4” - (wherein z3" is an integer of 0 to 6, for example, an integer of 1 to 6, and z4" is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6 It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0135] In a preferred embodiment, Z 1” is C 1-6 Alkylene group or -(CH 2 ) z3” -Phenylene-(CH 2 ) z4” -, preferably -phenylene-(CH 2 ) z4” -It is. 1” is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0136] In another preferred embodiment, the Z 1” is C 1-3 In one embodiment, Z is an alkylene group. 1” -CH2 CH 2 CH 2 In another embodiment, Z 1” -CH 2 CH 2 --It could be.

[0137] Above R 22” is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0138] Above R 22” is preferably, independently at each occurrence, a hydrolyzable group.

[0139] Above R 22” is preferably, independently at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (wherein R j is a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). j Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R j is a methyl group, and in another embodiment, R j is an ethyl group.

[0140] Above R 23” is independently at each occurrence a hydrogen atom or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above-mentioned hydrolyzable groups.

[0141] Above R 23” In the above, the monovalent organic group is preferably C1-20 is an alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0142] The above q1″ is independently an integer of 0 to 3 in each occurrence, and the above r1″ is independently an integer of 0 to 3 in each occurrence. The sum of q1″ and r1″ is (SiR 22” q1” R 23” r1” ) units, it is 3.

[0143] The above q1" is (SiR 22” q1” R 23” r1” ) units are each independently preferably an integer of 1 to 3, more preferably 2 or 3, and even more preferably 3.

[0144] Above R 22’ is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0145] R 22’ is preferably, independently at each occurrence, a hydrolyzable group.

[0146] R 22’ is preferably, independently at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (wherein R j is a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). jExamples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R j is a methyl group, and in another embodiment, R j is an ethyl group.

[0147] Above R 23’ is independently at each occurrence a hydrogen atom or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above-mentioned hydrolyzable groups.

[0148] R 23’ In the above, the monovalent organic group is preferably C 1-20 is an alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0149] The above p1' is independently an integer of 0 to 3 in each occurrence, q1' is independently an integer of 0 to 3 in each occurrence, and r1' is independently an integer of 0 to 3 in each occurrence. The sum of p', q1' and r1' is (SiR 21’ p1’ R 22’ q1’ R 23’ r1’ ) units, it is 3.

[0150] In one embodiment, p1' is 0.

[0151] In one embodiment, p1' is (SiR 21’ p1’ R 22’ q1’ R 23’ r1’ ) units may each independently be an integer of 1 to 3, an integer of 2 to 3, or 3. In a preferred embodiment, p1' is 3.

[0152] In one embodiment, q1' is (SiR 21’ p1’ R 22’ q1’ R 23’ r1’ ) units each independently represents an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0153] In one embodiment, p1' is 0 and q1' is (SiR 21’ p1’ R 22’ q1’ R 23’ r1’ ) units each independently represents an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0154] Above R 22 is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0155] R 22 is preferably, independently at each occurrence, a hydrolyzable group.

[0156] R 22 is preferably, independently at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (wherein R j is a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). j Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R j is a methyl group, and in another embodiment, Rj is an ethyl group.

[0157] Above R 23 is independently at each occurrence a hydrogen atom or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above-mentioned hydrolyzable groups.

[0158] R 23 In the above, the monovalent organic group is preferably C 1-20 is an alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0159] The above p1 is independently an integer of 0 to 3 in each occurrence, q1 is independently an integer of 0 to 3 in each occurrence, and r1 is independently an integer of 0 to 3 in each occurrence. The sum of p1, q1, and r1 is (SiR 21 p1 R 22 q1 R 23 r1 ) units, it is 3.

[0160] In one embodiment, p1 is 0.

[0161] In one embodiment, p1 is (SiR 21 p1 R 22 q1 R 23 r1 ) units may each independently be an integer of 1 to 3, an integer of 2 to 3, or 3. In a preferred embodiment, p1 is 3.

[0162] In one embodiment, q1 is (SiR 21 p1 R 22 q1 R 23 r1 ) units each independently represents an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0163] In one embodiment, p1 is 0 and q1 is (SiR 21 p1 R 22 q1 R 23 r1 ) units each independently represents an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0164] In the above formula, R b1 is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0165] Above R b1 is preferably, independently at each occurrence, a hydrolyzable group.

[0166] Above R b1 is preferably, independently at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (wherein R j is a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). j Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R j is a methyl group, and in another embodiment, R j is an ethyl group.

[0167] In the above formula, R c1 is independently at each occurrence a hydrogen atom or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above-mentioned hydrolyzable groups.

[0168] Above R c1 In the above, the monovalent organic group is preferably C 1-20 is an alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0169] The above k1 is independently an integer of 0 to 3 in each occurrence, l1 is independently an integer of 0 to 3 in each occurrence, and m1 is independently an integer of 0 to 3 in each occurrence. The sum of k1, l1, and m1 is (SiR a1 k1 R b1 l1 R c1 m1 ) units, it is 3.

[0170] In one embodiment, k1 is (SiR a1 k1 R b1 l1 R c1 m1 ) units are each independently an integer of 1 to 3, preferably 2 or 3, and more preferably 3. In a preferred embodiment, k1 is 3.

[0171] In the above formulas (1) and (2), R Si When is a group represented by formula (S3), preferably, at least two Si atoms to which hydroxyl groups or hydrolyzable groups are bonded are present in the terminal portions of formulas (1) and (2).

[0172] In a preferred embodiment, the group represented by formula (S3) is -Z 1 -SiR 22 q1 R 23 r1 (wherein q1 is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1 is an integer of 0 to 2); -Z 1’ -SiR 22’ q1’ R 23’ r1’(wherein q1' is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1' is an integer of 0 to 2), or -Z 1” -SiR 22” q1” R 23” r1” (wherein q1″ is an integer of 1 to 3, preferably 2 or 3, more preferably 3, and r1″ is an integer of 0 to 2). Z 1 , Z 1’ , Z 1” , R 22 , R 23 , R 22’ , R 23’ , R 22” , and R 23” has the same meaning as above.

[0173] In a preferred embodiment, in formula (S3), R 21’ When present, at least one, and preferably all, R 21’ In the above formula, q1″ is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0174] In a preferred embodiment, in formula (S3), R 21 When present, at least one, and preferably all, R 21 In the above formula, p1' is 0, and q1' is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0175] In a preferred embodiment, in formula (S3), R a1 When present, at least one, and preferably all, R a1 In the above formula, p1 is 0, and q1 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0176] In a preferred embodiment, in formula (S3), k1 is 2 or 3, preferably 3; p1 is 0; and q1 is 2 or 3, preferably 3.

[0177] R d1may each independently in each occurrence be -Z 2 -CR 31 p2 R 32 q2 R 33 r2 It is.

[0178] Z 2 In each occurrence, each independently represents a single bond, an oxygen atom, or a divalent organic group. 2 The structure written as is shown on the right side (CR 31 p2 R 32 q2 R 33 r2 )

[0179] In a preferred embodiment, Z 2 is a divalent organic group.

[0180] Above Z 2 is preferably C 1-6 Alkylene group, -(CH 2 ) z5 -O-(CH 2 ) z6 - (wherein z5 is an integer of 0 to 6, for example, an integer of 1 to 6, and z6 is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z7 -Phenylene-(CH 2 ) z8 - (wherein z7 is an integer of 0 to 6, for example, an integer of 1 to 6, and z8 is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6 It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0181] In a preferred embodiment, Z 2 is C 1-6Alkylene group or -(CH 2 ) z7 -Phenylene-(CH 2 ) z8 -, preferably -phenylene-(CH 2 ) z8 -It is. 2 is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0182] In another preferred embodiment, the Z 2 is C 1-3 In one embodiment, Z is an alkylene group. 2 -CH 2 CH 2 CH 2 In another embodiment, Z 2 -CH 2 CH 2 --It could be.

[0183] R 31 may each independently in each occurrence be -Z 2’ -CR 32’ q2’ R 33’ r2’ It is.

[0184] Z 2’ In each occurrence, each independently represents a single bond, an oxygen atom, or a divalent organic group. 2’ The structure written as is shown on the right side (CR 32’ q2’ R 33’ r2’ )

[0185] Above Z 2’ is preferably C 1-6 Alkylene group, -(CH 2 ) z5’ -O-(CH 2 ) z6’ -(wherein z5' is an integer of 0 to 6, for example, an integer of 1 to 6, and z6' is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z7’ -Phenylene-(CH 2 )z8’ - (wherein z7' is an integer of 0 to 6, for example, an integer of 1 to 6, and z8' is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6 It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0186] In a preferred embodiment, Z 2’ is C 1-6 Alkylene group or -(CH 2 ) z7’ -Phenylene-(CH 2 ) z8’ -, preferably -phenylene-(CH 2 ) z8’ -It is. 2’ is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0187] In another preferred embodiment, the Z 2’ is C 1-3 In one embodiment, Z is an alkylene group. 2’ -CH 2 CH 2 CH 2 In another embodiment, Z 2’ -CH 2 CH 2 --It could be.

[0188] Above R 32’ may each independently in each occurrence be -Z 3 -SiR 34 n2 R 35 3-n2 It is.

[0189] Above Z 3 In each occurrence, each independently represents a single bond, an oxygen atom, or a divalent organic group. 3The structure written as is shown on the right side (SiR 34 n2 R 35 3-n2 )

[0190] In one embodiment, Z 3 is an oxygen atom.

[0191] In one embodiment, Z 3 is a divalent organic group.

[0192] Above Z 3 is preferably C 1-6 Alkylene group, -(CH 2 ) z5” -O-(CH 2 ) z6” -(wherein z5" is an integer of 0 to 6, for example, an integer of 1 to 6, and z6" is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z7” -Phenylene-(CH 2 ) z8” - (wherein z7" is an integer of 0 to 6, for example, an integer of 1 to 6, and z8" is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6 It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0193] In a preferred embodiment, Z 3 is C 1-6 Alkylene group or -(CH 2 ) z7” -Phenylene-(CH 2 ) z8” -, preferably -phenylene-(CH 2 ) z8” -It is. 3 is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0194] In another preferred embodiment, the Z 3 is C 1-3 In one embodiment, Z is an alkylene group. 3 -CH 2 CH 2 CH 2 In another embodiment, Z 3 -CH 2 CH 2 --It could be.

[0195] Above R 34 is independently at each occurrence a hydroxyl group or a hydrolyzable group.

[0196] R 34 is preferably, independently at each occurrence, a hydrolyzable group.

[0197] R 34 is preferably, independently at each occurrence, -OR j , -OCOR j , -ON=CR j 2 , -NR j 2 , -NHR j , -NCO, or halogen (wherein R j is a substituted or unsubstituted C 1-4 alkyl group), more preferably -OR j (i.e., an alkoxy group). j Examples of R include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl. Among these, alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred. In one embodiment, R j is a methyl group, and in another embodiment, R j is an ethyl group.

[0198] Above R 35is independently at each occurrence a hydrogen atom or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above-mentioned hydrolyzable groups.

[0199] Above R 35 In the above, the monovalent organic group is preferably C 1-20 is an alkyl group, more preferably C 1-6 It is preferably an alkyl group, more preferably a methyl group.

[0200] In the above formula, n2 is (SiR 34 n2 R 35 3-n2 ) units are each independently an integer of 0 to 3. Si is a group represented by formula (S4), n2 is 1 to 3 in the terminal portion of formula (1) and formula (2) (SiR 34 n2 R 35 3-n2 ) unit is present. That is, in such a terminal portion, all n2s do not become 0 at the same time. In other words, in the terminal portion of formula (1) and formula (2), there is at least one Si atom to which a hydroxyl group or a hydrolyzable group is bonded.

[0201] n2 is (SiR 34 n2 R 35 3-n2 ) units are each independently preferably an integer of 1 to 3, more preferably 2 or 3, and even more preferably 3.

[0202] Above R 33’ is independently at each occurrence a hydrogen atom, a hydroxyl group, or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above hydrolyzable groups.

[0203] Above R 33’ In the above, the monovalent organic group is preferably C 1-20 Alkyl group or -(C s H 2s ) t1 -(OC s H2s ) t2 (wherein s is an integer of 1 to 6, preferably an integer of 2 to 4; t1 is 1 or 0, preferably 0; and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), more preferably C 1-20 Alkyl groups, more preferably C 1-6 An alkyl group, particularly preferably a methyl group, is preferred.

[0204] In one embodiment, R 33’ is a hydroxyl group.

[0205] In another embodiment, R 33’ is a monovalent organic group, preferably C 1-20 is an alkyl group, more preferably C 1-6 It is an alkyl group.

[0206] The above q2' is independently an integer of 0 to 3 in each occurrence, and the above r2' is independently an integer of 0 to 3 in each occurrence. The sum of q2' and r2' is not more than (CR 32’ q2’ R 33’ r2’ ) units, it is 3.

[0207] q2' is (CR 32’ q2’ R 33’ r2’ ) units are each independently preferably an integer of 1 to 3, more preferably 2 or 3, and even more preferably 3.

[0208] R 32 may each independently in each occurrence be -Z 3 -SiR 34 n2 R 35 3-n2 This is -Z 3 -SiR 34 n2 R 35 3-n2 is the above R 32’ This has the same meaning as described above.

[0209] Above R 33 is independently at each occurrence a hydrogen atom, a hydroxyl group, or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above hydrolyzable groups.

[0210] Above R 33 In the above, the monovalent organic group is preferably C 1-20 Alkyl group or -(C s H 2s ) t1 -(OC s H 2s ) t2 (wherein, s is each occurrence independently an integer of 1 to 6, preferably an integer of 2 to 4; t1 is 1 or 0, preferably 0; and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), more preferably C 1-20 Alkyl groups, more preferably C 1-6 An alkyl group, particularly preferably a methyl group, is preferred.

[0211] In one embodiment, R 33 is a hydroxyl group.

[0212] In another embodiment, R 33 is a monovalent organic group, preferably C 1-20 is an alkyl group, more preferably C 1-6 It is an alkyl group.

[0213] The above p2 is independently an integer of 0 to 3 in each occurrence, q2 is independently an integer of 0 to 3 in each occurrence, and r2 is independently an integer of 0 to 3 in each occurrence. The sum of p2, q2, and r2 is (CR 31 p2 R 32 q2 R 33 r2 ) units, it is 3.

[0214] In one embodiment, p2 is 0.

[0215] In one embodiment, p2 is (CR 31 p2 R 32 q2 R 33 r2 ) units may each independently be an integer of 1 to 3, an integer of 2 to 3, or 3. In a preferred embodiment, p2 is 3.

[0216] In one embodiment, q2 is (CR 31 p2 R 32 q2 R 33 r2 ) units each independently represents an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0217] In one embodiment, p2 is 0 and q2 is (CR 31 p2 R 32 q2 R 33 r2 ) units each independently represents an integer of 1 to 3, preferably an integer of 2 or 3, and more preferably 3.

[0218] Above R e1 may each independently in each occurrence be -Z 3 -SiR 34 n2 R 35 3-n2 This is -Z 3 -SiR 34 n2 R 35 3-n2 is the above R 32’ This has the same meaning as described above.

[0219] Above R f1 is independently at each occurrence a hydrogen atom, a hydroxyl group, or a monovalent organic group. Such monovalent organic groups are monovalent organic groups other than the above hydrolyzable groups.

[0220] Above R f1 In the above, the monovalent organic group is preferably C1-20 Alkyl group or -(C s H 2s ) t1 -(OC s H 2s ) t2 (wherein s is an integer of 1 to 6, preferably an integer of 2 to 4; t1 is 1 or 0, preferably 0; and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), more preferably C 1-20 Alkyl groups, more preferably C 1-6 An alkyl group, particularly preferably a methyl group, is preferred.

[0221] In one embodiment, R f1 is a hydroxyl group.

[0222] In another embodiment, R f1 is a monovalent organic group, preferably C 1-20 is an alkyl group, more preferably C 1-6 It is an alkyl group.

[0223] The above k2 is independently an integer of 0 to 3 in each occurrence, l2 is independently an integer of 0 to 3 in each occurrence, and m2 is independently an integer of 0 to 3 in each occurrence. The sum of k2, l2, and m2 is (CR d1 k2 R e1 l2 R f1 m2 ) units, it is 3.

[0224] In the above formulas (1) and (2), R Si When is a group represented by formula (S4), preferably, at least two Si atoms to which hydroxyl groups or hydrolyzable groups are bonded are present in the terminal portions of formulae (1) and (2).

[0225] In one embodiment, R Si is a group represented by formula (S4), n2 is 1 to 3, preferably 2 or 3, and more preferably 3 (SiR 34 n2 R35 3-n2 ) units are present in each terminal portion of formula (1) and formula (2) by 2 or more, for example, 2 to 27, preferably 2 to 9, more preferably 2 to 6, further preferably 2 to 3, and particularly preferably 3.

[0226] In a preferred embodiment, in formula (S4), R 32’ When present, at least one, and preferably all, R 32’ In the above formula, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0227] In a preferred embodiment, in formula (S4), R 32 When present, at least one, and preferably all, R 32 In the above formula, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0228] In a preferred embodiment, in formula (S4), R e1 When present, at least one, and preferably all, R a1 In the above formula, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

[0229] In a preferred embodiment, in formula (S4), k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.

[0230] Above R g1 and R h1 may each independently in each occurrence be -Z 4 -SiR 11 n1 R 12 3-n1 , -Z 4 -SiR a1 k1 R b1 l1 R c1 m1 , -Z 4 -CR d1 k2 R e1l2 R f1 m2 Here, R 11 , R 12 , R a1 , R b2 , R c1 , R d1 , R e1 , R f1 , n1, k1, l1, m1, k2, l2, and m2 are as defined above.

[0231] In a preferred embodiment, R g1 and R h1 are each independently -Z 4 -SiR 11 n1 R 12 3-n1 It is.

[0232] Above Z 4 In each occurrence, each independently represents a single bond, an oxygen atom, or a divalent organic group. 4 The structure written as is shown on the right side (SiR 11 n1 R 12 3-n1 )

[0233] In one embodiment, Z 4 is an oxygen atom.

[0234] In one embodiment, Z 4 is a divalent organic group.

[0235] Above Z 4 is preferably C 1-6 Alkylene group, -(CH 2 ) z5” -O-(CH 2 ) z6” -(wherein z5" is an integer of 0 to 6, for example, an integer of 1 to 6, and z6" is an integer of 0 to 6, for example, an integer of 1 to 6), or -(CH 2 ) z7” -Phenylene-(CH 2 ) z8”- (wherein z7" is an integer of 0 to 6, for example, an integer of 1 to 6, and z8" is an integer of 0 to 6, for example, an integer of 1 to 6). 1-6 The alkylene groups may be linear or branched, but are preferably linear. These groups may contain, for example, fluorine atoms, C 1-6 Alkyl group, C 2-6 Alkenyl groups, and C 2-6 It may be substituted by one or more substituents selected from alkynyl groups, but is preferably unsubstituted.

[0236] In a preferred embodiment, Z 4 is C 1-6 Alkylene group or -(CH 2 ) z7” -Phenylene-(CH 2 ) z8” -, preferably -phenylene-(CH 2 ) z8” -It is. 3 is such a group, light resistance, particularly ultraviolet resistance, can be improved.

[0237] In another preferred embodiment, the Z 4 is C 1-3 In one embodiment, Z is an alkylene group. 4 -CH 2 CH 2 CH 2 In another embodiment, Z 4 -CH 2 CH 2 --It could be.

[0238] In one embodiment, R Si is a group represented by formula (S2), (S3), (S4) or (S5). These compounds are capable of forming a surface treatment layer having high surface slip properties.

[0239] In one embodiment, R Siis a group represented by formula (S3), (S4) or (S5). These compounds have multiple hydrolyzable groups at one end, and therefore can form a surface treatment layer that adheres strongly to a substrate and has high abrasion resistance.

[0240] In one embodiment, R Si is a group represented by formula (S3) or (S4). These compounds can have multiple hydrolyzable groups branched from one Si atom or C atom at one end, and therefore can form a surface treatment layer with even higher abrasion resistance.

[0241] In one embodiment, R Si is a group represented by formula (S1).

[0242] In one embodiment, R Si is a group represented by formula (S2).

[0243] In one embodiment, R Si is a group represented by formula (S3).

[0244] In one embodiment, R Si is a group represented by formula (S4).

[0245] In one embodiment, R Si is a group represented by formula (S5).

[0246] In the above formulas (1) and (2), X A The fluoropolyether moiety (R ) mainly provides water repellency and surface slipperiness. F1 and R F2 ) and a portion (R Si ) is interpreted as a linker connecting the X A may be a single bond or any other group, so long as the compounds represented by formulae (1) and (2) can exist stably.

[0247] In the above formula (1), α is an integer of 1 to 9, and β is an integer of 1 to 9. These α and β are XA The sum of α and β can vary depending on the valence of X A For example, X A When X is a decavalent organic group, the sum of α and β is 10, and for example, α can be 9 and β can be 1, α can be 5 and β can be 5, or α can be 1 and β can be 9. A When is a divalent organic group, α and β are 1.

[0248] In the above formula (2), γ is an integer of 1 to 9. γ is X A That is, γ can vary depending on the valence of X A is the valence of 1 minus 0.

[0249] X A each independently represents a single bond or a divalent to decavalent organic group;

[0250] Above X A The divalent to decavalent organic group in is preferably a divalent to octavalent organic group. In one embodiment, the divalent to decavalent organic group is preferably a divalent to tetravalent organic group, more preferably a divalent organic group. In another embodiment, the divalent to decavalent organic group is preferably a trivalent to octavalent organic group, more preferably a trivalent to hexavalent organic group.

[0251] In one embodiment, X A is a single bond or a divalent organic group, α is 1, and β is 1.

[0252] In one embodiment, X A is a single bond or a divalent organic group, and γ is 1.

[0253] In one embodiment, X A is a trivalent to hexavalent organic group, α is 1, and β is 2 to 5.

[0254] In one embodiment, X A is a trivalent to hexavalent organic group, and γ is 2 to 5.

[0255] In one embodiment, X Ais a trivalent organic group, α is 1, and β is 2.

[0256] In one embodiment, X A is a trivalent organic group and γ is 2.

[0257] X A When is a single bond or a divalent organic group, formulas (1) and (2) are represented by the following formulas (1') and (2'). [ka]

[0258] In one embodiment, X A is a single bond.

[0259] In another embodiment, X A is a divalent organic group.

[0260] In one embodiment, X A Examples of the group include a single bond and the group represented by the following formula: -(R 51 ) p5 -(X 51 ) q5 - [In formula: R 51 is a single bond, -(CH 2 ) s5 - or an o-, m- or p-phenylene group, preferably -(CH 2 ) s5 - and s5 is an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, and even more preferably 1 or 2; X 51 is -(X 52 ) l5 - represents X 52 each occurrence independently represents -O-, -S-, o-, m-, or p-phenylene group, -C(O)O-, -Si(R 53 ) 2 -, -(Si(R 53 ) 2 O)m5 -Si(R 53 ) 2 -,-CONR 54 -,-O-CONR 54 -, -NR 54 - and -(CH 2 ) n5 represents a group selected from the group consisting of -, R 53 represents, independently at each occurrence, a phenyl group; C 1-6 Alkyl group or C 1-6 represents an alkoxy group, preferably a phenyl group or 1-6 is an alkyl group, more preferably a methyl group; R 54 each occurrence independently represents a hydrogen atom, a phenyl group, or C 1-6 represents an alkyl group (preferably a methyl group); m5, in each occurrence, is independently an integer from 1 to 100, preferably an integer from 1 to 20; n5, in each occurrence, is independently an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3; l5 is an integer from 1 to 10, preferably an integer from 1 to 5, and more preferably an integer from 1 to 3; p5 is 0 or 1; q5 is 0 or 1; wherein at least one of p5 and q5 is 1, and the order of the repeating units enclosed in parentheses with p5 or q5 is arbitrary. Here, X is a divalent organic group represented by the formula: A (Typically X A Hydrogen atoms of C 1-3 Alkyl group and C 1-3 In a preferred embodiment, X A is not substituted with these groups.

[0261] In a preferred embodiment, the X A are each independently -(R 51 )p5 -(X 51 ) q5 -R 52 -It is. 52 is a single bond, -(CH 2 ) t5 - or an o-, m- or p-phenylene group, preferably -(CH 2 ) t5 t5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3. 52 (Typically R 52 Hydrogen atoms of C 1-3 Alkyl group and C 1-3 In a preferred embodiment, R 56 is not substituted with these groups.

[0262] Preferably, the above X A are each independently Single bond, C 1-20 An alkylene group, -R 51 -X 53 -R 52 -or -X 54 -R 52 - [In the formula, R 51 and R 52 has the same meaning as above, X 53 teeth, -O-, -S-, -C(O)O-, -CONR 54 -, -O-CONR 54 -, -Si(R 53 ) 2 -, -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -, -O-(CH2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -, -O-(CH 2 ) u5 -Si(R 53 ) 2 -O-Si(R 53 ) 2 -CH 2 CH 2 -Si(R 53 ) 2 -O-Si(R 53 ) 2 -, -O-(CH 2 ) u5 -Si(OCH 3 ) 2 OSi(OCH 3 ) 2 -, -CONR 54 -(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -, -CONR 54 -(CH 2 ) u5 -N(R 54 )- or -CONR 54 -(o-, m- or p-phenylene)-Si(R 53 ) 2 - (In the formula, R 53 , R 54 and m5 are as defined above; u5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3. X 54 teeth, -S-, -C(O)O-, -CONR 54 -, -O-CONR 54 -, -CONR 54 -(CH 2 ) u5 -(Si(R 54 ) 2 O) m5 -Si(R 54 ) 2 -, -CONR 54 -(CH 2 ) u5 -N(R 54 )- or -CONR 54 -(o-, m- or p-phenylene)-Si(R 54 ) 2 - (In the formula, each symbol has the same meaning as above.) represents.] It could be.

[0263] More preferably, the above X A are each independently Single bond, C 1-20 An alkylene group, -(CH 2 ) s5 -X 53 -, -(CH 2 ) s5 -X 53 -(CH 2 ) t5 - -X 54 -or -X 54 -(CH 2 ) t5 - [where, X 53 , X 54 , s5 and t5 are as defined above.] It is.

[0264] More preferably, the above X A are each independently Single bond, C 1-20 An alkylene group, -(CH 2 ) s5 -X53 -(CH 2 ) t5 -or -X 54 -(CH 2 ) t5 - [In the formula, each symbol has the same meaning as above.] It could be.

[0265] In a preferred embodiment, the X A are each independently Single bond C 1-20 An alkylene group, -(CH 2 ) s5 -X 53 -or -(CH 2 ) s5 -X 53 -(CH 2 ) t5 - [In the formula, X 53 -O-, -CONR 54 - or -O-CONR 54 - and R 54 each occurrence independently represents a hydrogen atom, a phenyl group, or C 1-6 represents an alkyl group, s5 is an integer from 1 to 20; t5 is an integer from 1 to 20. It could be.

[0266] In a preferred embodiment, the X A are each independently -(CH 2 ) s5 -O-(CH 2 ) t5 - -CONR 54 -(CH 2 ) t5 - [In the formula, R 54 each occurrence independently represents a hydrogen atom, a phenyl group, or C 1-6represents an alkyl group, s5 is an integer from 1 to 20; t5 is an integer from 1 to 20. It could be.

[0267] In one embodiment, the X A are each independently Single bond, C 1-20 An alkylene group, -(CH 2 ) s5 -O-(CH 2 ) t5 -, -(CH 2 ) s5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -(CH 2 ) t5 -, -(CH 2 ) s5 -O-(CH 2 ) u5 -(Si(R 53 ) 2 O) m5 -Si(R 53 ) 2 -(CH 2 ) t5 -or -(CH 2 ) s5 -O-(CH 2 ) t5 -Si(R 53 ) 2 -(CH 2 ) u5 -Si(R 53 ) 2 -(C v H 2v )- [In the formula, R 53 m5, s5, t5 and u5 are the same as defined above, and v5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3.] It is.

[0268] In the above formula, -(C v H 2v )- may be a straight chain or a branched chain, for example, -CH 2 CH 2 -, -CH 2 CH 2 CH 2 -, -CH(CH 3 )-, -CH(CH 3 )CH 2 --It could be.

[0269] Above X A are each independently a fluorine atom, C 1-3 Alkyl group and C 1-3 Fluoroalkyl groups (preferably C 1-3 perfluoroalkyl groups). In one embodiment, X A is non-substituted.

[0270] Furthermore, the above X A The left side of each equation is R F1 or R F2 and the right side is R Si Bind to.

[0271] In one embodiment, X A are each independently -OC 1-6 It may be other than an alkylene group.

[0272] In another embodiment, X A Examples of the groups include the following: [ka] [ka] [In the formula, R 41 are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or 1-6 an alkoxy group, preferably a methyl group; D is -CH 2 O(CH 2) 2 -, -CH 2 O(CH 2 ) 3 -, -CF 2 O(CH 2 ) 3 -, -(CH 2 ) 2 -, -(CH 2 ) 3 -, -(CH 2 ) 4 -, -CONH-(CH 2 ) 3 -, -CON(CH 3 )-(CH 2 ) 3 -, -CON(Ph)-(CH 2 ) 3 - (wherein Ph means phenyl), and [ka] (In the formula, R 42 are each independently a hydrogen atom, C 1-6 or C 1-6 represents an alkoxy group, preferably a methyl group or a methoxy group, and more preferably a methyl group. is a group selected from E is -(CH 2 ) n - (n is an integer from 2 to 6), D is the R of the molecular backbone F1 or R F2 and E is R Si Binds to .]

[0273] Above X A Specific examples include: Single bond, -CH 2 OCH 2 -, -CH 2 O(CH 2 )2 - -CH 2 O(CH 2 ) 3 - -CH 2 O(CH 2 ) 4 - -CH 2 O(CH 2 ) 5 - -CH 2 O(CH 2 ) 6 - -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 - -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 - -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 2 Si(CH 3 ) 2 (CH 2 ) 2 - -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 3 Si(CH 3 ) 2 (CH 2) 2 -、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 10 Si(CH 3 ) 2 (CH 2 ) 2 -、 -CH 2 O(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 20 Si(CH 3 ) 2 (CH 2 ) 2 -、 -CH 2 OCF 2 CHFOCF 2 -、 -CH 2 OCF 2 CHFOCF 2 CF 2 -、 -CH 2 OCF 2 CHFOCF 2 CF 2 CF 2 -、 -CH 2 OUCH 2 CF 2 CF 2 OCF 2 -、 -CH 2 OUCH 2 CF 2 CF 2 OCF 2 CF 2 -、 -CH 2 OUCH 2 CF 2 CF 2 OCF 2 CF 2 CF 2 -、 -CH 2 OUCH 2 CF 2 CF 2 OCF (CF 3 ) CF 2 OCF 2 -、 -CH 2 OUCH 2 CF 2 CF 2 OCF (CF 3 ) CF 2 OCF 2 CF 2 -、 -CH 2 OUCH 2 CF 2 CF 2 OCF (CF 3 ) CF 2 OCF 2 CF 2 CF 2 -、 -CH 2 OUCH 2 CHFCF 2 OCF 2 -、 -CH 2 OUCH 2 CHFCF 2 OCF 2 CF 2 -、 -CH 2 OUCH 2 CHFCF 2 OCF 2 CF 2 CF 2 -、 -CH 2 OUCH 2 CHFCF 2 OCF (CF 3 ) CF 2 OCF 2 -、 -CH 2 OUCH 2 CHFCF 2 OCF (CF 3 ) CF 2 OCF 2 CF 2 -、 -CH 2 OUCH2 CHFCF 2 OCF(CF 3 )CF 2 OCF 2 CF 2 CF 2 -、 -CH 2 OCF 2 CHFOCF 2 CF 2 CF 2 -C(O)NH-CH 2 -、 -CH 2 AND 2 (CH 2 ) 7 CH 2 Si(AND 3 ) 2 OSi(AND 3 ) 2 (CH 2 ) 2 Si(AND 3 ) 2 OSi(AND 3 ) 2 (CH 2 ) 2 -、 -CH 2 AND 2 CH 2 CH 2 Si(AND 3 ) 2 OSi(AND 3 ) 2 (CH 2 ) 3 -、 -CH 2 AND 2 CH 2 CH 2 Si(AND 2 CH 3 ) 2 OSi(AND 2 CH 3 ) 2 (CH 2 ) 3 -、 -CH 2 AND 2 CH 2 CH 2 Si(AND 3 ) 2OSi(OCH 3 ) 2 (CH 2 ) 2 - -CH 2 OCH 2 CH 2 CH 2 Si(OCH 2 CH 3 ) 2 OSi(OCH 2 CH 3 ) 2 (CH 2 ) 2 - -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 2 - -CH 2 - -(CH 2 ) 2 - -(CH 2 ) 3 - -(CH 2 ) 4 - -(CH 2 ) 5 - -(CH 2 ) 6 - -CO- -CONH- -CONH-CH 2 - -CONH-(CH 2 ) 2 - -CONH-(CH 2 ) 3 - -CONH-(CH 2 ) 4 - -CONH-(CH 2 ) 5 - -CONH-(CH 2 ) 6 - -CON(CH 3)-CH 2 -, -CON(CH 3 )-(CH 2 ) 2 -, -CON(CH 3 )-(CH 2 ) 3 -, -CON(CH 3 )-(CH 2 ) 4 -, -CON(CH 3 )-(CH 2 ) 5 -, -CON(CH 3 )-(CH 2 ) 6 -, -CON(Ph)-CH 2 where Ph means phenyl, -CON(Ph)-(CH 2 ) 2 where Ph means phenyl, -CON(Ph)-(CH 2 ) 3 where Ph means phenyl, -CON(Ph)-(CH 2 ) 4 where Ph means phenyl, -CON(Ph)-(CH 2 ) 5 where Ph means phenyl, -CON(Ph)-(CH 2 ) 6 where Ph means phenyl, -CONH-(CH 2 ) 2 NH(CH 2 ) 3 -, -CONH-(CH 2 ) 6 NH(CH 2 ) 3 -, -CH 2 O-CONH-(CH 2 ) 3 -, -CH 2 O-CONH-(CH) 2 ) 6 - -S-(CH 2 ) 3 - -(CH 2 ) 2 S(CH 2 ) 3 - -CONH-(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 - -CONH-(CH 2 ) 3 Si(CH 3 ) 2 OSi(CH 3 ) 2 OSi(CH 3 ) 2 (CH 2 ) 2 - -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 2 Si(CH 3 ) 2 (CH 2 ) 2 - -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 3 Si(CH 3 ) 2 (CH 2 ) 2 - -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH3 ) 2 O) 10 Si(CH 3 ) 2 (CH 2 ) 2 - -CONH-(CH 2 ) 3 Si(CH 3 ) 2 O(Si(CH 3 ) 2 O) 20 Si(CH 3 ) 2 (CH 2 ) 2 - -C(O)O-(CH 2 ) 3 - -C(O)O-(CH 2 ) 6 - -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 2 - -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -CH(CH 3 )-、 -CH 2 -O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -(CH 2 ) 3 - -CH 2-O-(CH 2 ) 3 -Si(CH 3 ) 2 -(CH 2 ) 2 -Si(CH 3 ) 2 -CH(CH 3 )-CH 2 -, -OCH 2 -, -O(CH 2 ) 3 -, -OCFHCF 2 -, [ka] etc.

[0274] In yet another embodiment, X A are each independently represented by the formula: -(R 16 ) x1 -(CFR 17 ) y1 -(CH 2 ) z1 In the formula, x1, y1 and z1 each independently represent an integer of 0 to 10, the sum of x1, y1 and z1 is 1 or more, and the order of the repeating units enclosed in parentheses in the formula is arbitrary.

[0275] In the above formula, R 16 represents, independently at each occurrence, an oxygen atom, phenylene, carbazolylene, -NR 18 -(In the formula, R 18 represents a hydrogen atom or an organic group) or a divalent organic group. 18 is an oxygen atom or a divalent polar group.

[0276] The above-mentioned "divalent polar group" is not particularly limited, but examples thereof include -C(O)-, -C(=NR 19 )- and -C(O)NR 19 - (wherein R 19represents a hydrogen atom or a lower alkyl group. The "lower alkyl group" is, for example, an alkyl group having 1 to 6 carbon atoms, such as methyl, ethyl, and n-propyl, which may be substituted with one or more fluorine atoms.

[0277] In the above formula, R 17 are each independently a hydrogen atom, a fluorine atom or a lower fluoroalkyl group, preferably a fluorine atom, in each occurrence. The "lower fluoroalkyl group" is, for example, a fluoroalkyl group having 1 to 6 carbon atoms, preferably a fluoroalkyl group having 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group, a pentafluoroethyl group, and further preferably a trifluoromethyl group.

[0278] In yet another embodiment, X A Examples of include the following groups: [ka] [In the formula, R 41 are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or 1-6 The alkoxy group is preferably a methyl group; each X A In the group, any one of T may be an R F1 or R F2 The following groups are attached to: -CH 2 O(CH 2 ) 2 -, -CH 2 O(CH 2 ) 3 -, -CF 2 O(CH 2 ) 3 -, -(CH 2 ) 2 -, -(CH 2 ) 3 -, -(CH2 ) 4 -, -CONH-(CH 2 ) 3 -, -CON(CH 3 )-(CH 2 ) 3 -, -CON(Ph)-(CH 2 ) 3 - (wherein Ph means phenyl), or [ka] [In the formula, R 42 are each independently a hydrogen atom, C 1-6 or C 1-6 represents an alkoxy group, preferably a methyl group or a methoxy group, and more preferably a methyl group. Some of the other Ts are R in the molecular backbone. Si and if present, each remaining T is independently a methyl group, a phenyl group, or a C 1-6 It is an alkoxy group, a radical scavenger group, or an ultraviolet absorbing group.

[0279] The radical scavenging group is not particularly limited as long as it can capture radicals generated by light irradiation, and examples thereof include residues of benzophenones, benzotriazoles, benzoic acid esters, phenyl salicylates, crotonic acids, malonic acid esters, organoacrylates, hindered amines, hindered phenols, and triazines.

[0280] The ultraviolet absorbing group is not particularly limited as long as it can absorb ultraviolet light, and examples thereof include residues of benzotriazoles, hydroxybenzophenones, esters of substituted and unsubstituted benzoic acid or salicylic acid compounds, acrylates or alkoxycinnamates, oxamides, oxanilides, benzoxazinones, and benzoxazoles.

[0281] In a preferred embodiment, preferred radical scavenging groups or ultraviolet absorbing groups include [ka] Examples include:

[0282] In this embodiment, X A may each independently be a trivalent to decavalent organic group.

[0283] In yet another embodiment, X A Examples of include the following groups: [ka] [In the formula, R 25 , R 26 and R 27 are each independently a divalent to hexavalent organic group, R 25 At least one R F1 Binds to R 26 and R 27 Each has at least one R Si Binds to .]

[0284] In one embodiment, the R 25 is a single bond, C 1-20 Alkylene group, C 3-20 Cycloalkylene group, C 5-20 Arylene group, -R 57 -X 58 -R 59 -, -X 58 -R 59 - or -R 57 -X 58 -. Above, R 57 and R 59 are each independently a single bond, C 1-20 Alkylene group, C 3-20 Cycloalkylene group, or C 5-20 The above X is an arylene group. 58 is -O-, -S-, -CO-, -O-CO- or -COO-.

[0285] In one embodiment, the R 26 and R 27are each independently a hydrocarbon or a group having at least one atom selected from N, O and S at the end or in the main chain of the hydrocarbon, and preferably 1-6 Alkyl group, -R 36 -R 37 -R 36 -, -R 36 -CHR 38 2 -, etc. Here, R 36 are each independently a single bond or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms. 37 is N, O or S, preferably N or O. 38 -R 45 -R 46 -R 45 -, -R 46 -R 45 -or-R 45 -R 46 - Here, R 45 are each independently an alkyl group having 1 to 6 carbon atoms. 46 is N, O or S, preferably O.

[0286] In this embodiment, X A may each independently be a trivalent to decavalent organic group.

[0287] In yet another embodiment, X A For example, [ka] [where, X a is a single bond or a divalent organic group. Examples of the group represented by the formula:

[0288] Above X a is a single bond or a divalent linking group directly bonded to the isocyanuric ring. X ais preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a sulfide bond, and more preferably a single bond, an alkylene group having 1 to 10 carbon atoms, or a divalent organic group having 1 to 10 carbon atoms containing at least one bond selected from the group consisting of an ether bond, an ester bond, an amide bond, and a sulfide bond.

[0289] X a The formula is as follows: -(CX 121 X 122 ) x1 -(X a1 ) y1 -(CX 123 X 124 ) z1 - (In the formula, X 121 ~X 124 are each independently H, F, OH, or -OSi(OR 121 ) 3 (Wherein, three R 121 are each independently an alkyl group having 1 to 4 carbon atoms; Above X a1 is -C(=O)NH-, -NHC(=O)-, -O-, -C(=O)O-, -OC(=O)-, -OC(=O)O-, or -NHC(=O)NH- (the left side of each bond is CX 121 X 122 ), x1 is an integer from 0 to 10, y1 is 0 or 1, and z1 is an integer from 1 to 10. A group represented by the following formula is more preferred.

[0290] Above X a1 As the alkyl group, -O- or -C(=O)O- is preferable.

[0291] Above X a The formula is as follows: -(CF 2 ) m11 -(CH 2 ) m12 -O-(CH 2 )m13 - (In the formula, m11 is an integer of 1 to 3, m12 is an integer of 1 to 3, and m13 is an integer of 1 to 3.) A group represented by -(CF 2 ) m14 -(CH 2 ) m15 -O-CH 2 CH(OH)-(CH 2 ) m16 - (In the formula, m14 is an integer of 1 to 3, m15 is an integer of 1 to 3, and m16 is an integer of 1 to 3.) A group represented by -(CF 2 ) m17 -(CH 2 ) m18 - (In the formula, m17 is an integer of 1 to 3, and m18 is an integer of 1 to 3.) A group represented by -(CF 2 ) m19 -(CH 2 ) m20 -O-CH 2 CH(OSi(OCH 3 ) 3 )-(CH 2 ) m21 - (In the formula, m19 is an integer of 1 to 3, m20 is an integer of 1 to 3, and m21 is an integer of 1 to 3.) or a group represented by -(CH 2 ) m22 - (In the formula, m22 is an integer of 1 to 3.) A group represented by the following formula is particularly preferred.

[0292] Above X a As the above, although not particularly limited, specifically, -CH 2 -, -C 2 H 4 -, -C 3 H 6 -, -C 4 H 8 -, -C4 H 8 -O-CH 2 -,-CO-O-CH 2 -CH(OH)-CH 2 -, -(CF 2 ) n5 -(n5 is an integer from 0 to 4), -(CF 2 ) n5 -(CH 2 ) m5 -(n5 and m5 each independently represents an integer of 0 to 4), -CF 2 CF 2 CH 2 OCH 2 CH(OH)CH 2 -, -CF 2 CF 2 CH 2 OCH 2 CH(OSi(OCH 3 ) 3 )CH 2 - etc.

[0293] In this embodiment, X A may each independently be a di- or trivalent organic group.

[0294] The fluoropolyether group-containing silane compound represented by the above formula (1) or formula (2) is not particularly limited, but may be 5×10 2 ~1×10 5 Within this range, it is preferable from the viewpoint of wear resistance that the average molecular weight is 2,000 to 32,000, more preferably 2,500 to 12,000. Note that the "average molecular weight" refers to a number average molecular weight, and the "average molecular weight" is 19 The value is measured by F-NMR.

[0295] The surface treatment layer can be preferably formed using a surface treatment agent containing the fluoropolyether group-containing compound.

[0296] The content of the fluoropolyether group-containing silane compound represented by the above formula (1) or (2) can be preferably 90% by mass or more and 100% by mass or less, more preferably 95% by mass or more and 100% by mass or less, based on 100% by mass of the total fluoropolyether group-containing silane compounds.

[0297] The content of the fluoropolyether group-containing silane compound is preferably 0.02 to 40.0 mass%, more preferably 0.02 to 30.0 mass%, further preferably 0.04 to 25.0 mass%, and particularly preferably 0.05 to 20.0 mass% in 100 mass% of the surface treatment agent. By setting the content of the fluoropolyether group-containing silane compound within the above range, higher water and oil repellency can be obtained. In the composition of the present disclosure, the non-volatile content may be the portion excluding the solvent from the total amount of the composition.

[0298] The content of the fluoropolyether group-containing compound is preferably 0.02 to 40.0 mass%, more preferably 0.02 to 30.0 mass%, further preferably 0.04 to 25.0 mass%, and particularly preferably 0.05 to 20.0 mass%, in 100 mass% of the surface treatment agent. By setting the content of the fluoropolyether group-containing compound within the above range, higher water and oil repellency can be obtained.

[0299] The surface treatment agent may further contain a solvent. By containing a solvent, the composition has good handleability. When a layer is formed using such a composition, the formed layer can be a continuous thin film. In addition, such a composition can contribute to the formation of a thin film of any thickness.

[0300] The solvent is not particularly limited, but examples thereof include perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (e.g., perfluorohexane, perfluoromethylcyclohexane, and perfluoro-1,3-dimethylcyclohexane); polyfluoroaromatic hydrocarbons (e.g., bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C 6 F 13CH 2 CH 3 (e.g., Asahiklin® AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora® H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C 3 F 7 OCH 3 ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ethyl ether (C 4 F 9 O.C. 2 H 5 ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C 2 F 5 CF(OCH 3 ) C 3 F 7 ) (e.g., Novec™ 7300 from Sumitomo 3M Limited) (wherein the perfluoroalkyl group and the alkyl group can be linear or branched), or CF 3 CH 2 OCF 2 CHF 2 (For example, Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.)). These solvents can be used alone or as a mixture of two or more. Among them, hydrofluoroethers are preferred, and perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and / or perfluorobutyl ethyl ether (C 4 F 9 O.C. 2 H 5 ) is particularly preferred.

[0301] The boiling point (atmospheric pressure) of the solvent may be preferably less than 105°C, more preferably 90°C or less, and even more preferably 80°C or less. When the solvent has a boiling point in the above range, the surface treatment agent of the present disclosure is relatively easily vaporized without applying heat or the like when applied to a substrate, and the time and energy required for the surface treatment process can be reduced. The lower limit of the boiling point is not particularly limited, but may be, for example, 30°C or more, preferably 50°C or more.

[0302] The content of the solvent may be preferably 50 to 99.7 mass%, more preferably 60 to 99.7 mass%, further preferably 70 to 99.7 mass%, and particularly preferably 80 to 99.7 mass%, based on 100 mass% in total of the surface treatment agent.

[0303] The surface treatment agent of the present disclosure may further contain a (non-reactive) fluoropolyether compound that can be understood as a fluorine-containing oil, preferably a perfluoro(poly)ether compound (collectively referred to below as "fluorine-containing oil"), a (non-reactive) silicone compound that can be understood as a silicone oil (hereinafter referred to as "silicone oil"), alcohols, catalysts, surfactants, polymerization inhibitors, sensitizers, etc. The other components are components different from the above-mentioned fluorine-containing silane compound and solvent.

[0304] The fluorine-containing oil is not particularly limited, but examples thereof include compounds represented by the following general formula (4) (perfluoro(poly)ether compounds). Rf 5 -(OC 4 F 8 ) a” -(OC 3 F 6 ) b” -(OC 2 F 4 ) c” -(OCF 2 ) d” -Rf 6 (4) In the formula, Rf 5 C may be substituted by one or more fluorine atoms.1-16 Alkyl groups (preferably C 1-16 Rf represents a perfluoroalkyl group; 6 C may be substituted by one or more fluorine atoms. 1-16 Alkyl groups (preferably C 1-16 perfluoroalkyl group), a fluorine atom or a hydrogen atom, Rf 5 and Rf 6 More preferably, each independently represents C 1-3 It is a perfluoroalkyl group. a", b", c" and d" respectively represent the number of four types of repeating units of perfluoro(poly)ether constituting the main skeleton of the polymer, and are each independently an integer of 0 to 300, and the sum of a", b", c" and d" is greater than 30, preferably 40 to 300, and more preferably 50 to 300. The order of the repeating units enclosed in parentheses with the subscript a", b", c" or d" is arbitrary in the formula. Of these repeating units, -(OC 4 F 8 )- is -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF(CF 3 ))-, -(OC(CF 3 ) 2 CF 2 )-, -(OCF 2 C(CF 3 ) 2 )-, -(OCF(CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )-and (OCF 2 CF(C 2 F 5))-, but preferably -(OCF 2 CF 2 CF 2 CF 2 )-. -(OC 3 F 6 )- is -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )-and (OCF 2 CF(CF 3 ))-, preferably -(OCF 2 CF 2 CF 2 )-. -(OC 2 F 4 )- is -(OCF 2 CF 2 )- and (OCF(CF 3 ))-, but preferably -(OCF 2 CF 2 )-.

[0305] Examples of the perfluoro(poly)ether compound represented by the above general formula (4) include compounds represented by the following general formulas (4a) and (4b) (which may be one type or a mixture of two or more types). Rf 5 -(OCF 2 CF 2 CF 2 ) b” -Rf 6 (4a) Rf 5 -(OCF 2 CF 2 CF 2 CF 2 ) a” -(OCF 2 CF 2 CF 2 ) b” -(OCF 2 CF 2 ) c” -(OCF 2 ) d” -Rf 6 (4b) In these formulas, Rf 5 and Rf 6 is as defined above; in formula (4a), b" is an integer of 1 or more and 100 or less; in formula (4b), a" and b" are each independently an integer of 0 or more and 30 or less, and c" and d" are each independently an integer of 1 or more and 300 or less. The order of occurrence of each repeating unit enclosed in parentheses with the subscripts a", b", c", and d" is arbitrary in the formula.

[0306] From another perspective, the fluorine-containing oil is represented by the general formula Rf 3 -F(where Rf 3 is C 5-16 It may be a compound represented by the formula: embedded image which is a perfluoroalkyl group. It may also be a chlorotrifluoroethylene oligomer.

[0307] The above-mentioned fluorinated oil may have a number average molecular weight of preferably 1000 or more, more preferably 1500 or more, and even more preferably 2000 or more. The above-mentioned fluorinated oil may have a number average molecular weight of preferably 30000 or less, more preferably 20000 or less, and even more preferably 10000 or less. The molecular weight of the fluorinated oil may be measured using GPC.

[0308] The fluorine-containing oil may be contained in an amount of, for example, 0 to 50 mass%, preferably 0 to 30 mass%, more preferably 0 to 5 mass% relative to the surface treatment agent. In one embodiment, the surface treatment agent of the present disclosure is substantially free of fluorine-containing oil. "Substantially free of fluorine-containing oil" means that the surface treatment agent does not contain any fluorine-containing oil or may contain a very small amount of fluorine-containing oil.

[0309] In one embodiment, the number average molecular weight of the fluorine-containing oil may be smaller than the number average molecular weight of the fluorine-containing silane compound.By setting the number average molecular weight in this range, the surface treatment layer obtained from the compound can be prevented from decreasing in transparency, and a cured product having high abrasion resistance and high surface slipperiness can be formed.

[0310] The fluorine-containing oil contributes to improving the surface slip properties of the layer formed by the surface treatment agent of the present disclosure.

[0311] The silicone oil may be, for example, a linear or cyclic silicone oil having 2,000 or less siloxane bonds. The linear silicone oil may be a so-called straight silicone oil or a modified silicone oil. The straight silicone oil may be dimethyl silicone oil, methylphenyl silicone oil, or methylhydrogen silicone oil. The modified silicone oil may be a straight silicone oil modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, or alcohol. The cyclic silicone oil may be, for example, cyclic dimethylsiloxane oil.

[0312] In the surface treatment agent of the present disclosure, such silicone oil may be contained in an amount of, for example, 0 to 300 parts by mass, preferably 50 to 200 parts by mass, per 100 parts by mass of the total of the fluoropolyether group-containing compounds (if two or more types are used, the total of these, the same applies below).

[0313] The silicone oil contributes to improving the surface slipperiness of the surface treatment layer.

[0314] Examples of the alcohols include alcohols having 1 to 6 carbon atoms which may be substituted with one or more fluorine atoms, such as methanol, ethanol, isopropanol, tert-butanol, CF 3 CH 2 OH, CF 3 CF 2 CH 2 OH, (CF 3 ) 2 The addition of these alcohols to the surface treatment agent improves the stability of the surface treatment agent and also improves the compatibility of the fluoropolyether group-containing compound with the solvent.

[0315] The alcohol is preferably contained in the surface treatment agent in an amount of 0.1 to 5 times, more preferably 0.5 to 3 times, and even more preferably 0.8 to 1.2 times the molar ratio of the metal compound. By setting the content ratio of the alcohol in the above range, the stability of the surface treatment layer can be further improved.

[0316] Examples of the catalyst include acids (eg, acetic acid, trifluoroacetic acid, etc.), bases (eg, ammonia, triethylamine, diethylamine, etc.), transition metals (eg, Ti, Ni, Sn, etc.), and the like.

[0317] The catalyst promotes the hydrolysis and dehydration condensation of the fluoropolyether group-containing silane compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent of the present disclosure.

[0318] Other examples of the other components include tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriacetoxysilane in addition to the above.

[0319] (Second embodiment: Processing method for chemical mechanical polishing apparatus) A method for treating a chemical mechanical polishing apparatus is also within the scope of this disclosure.

[0320] The method of the present disclosure for processing a chemical mechanical polishing apparatus includes: applying a surface treatment agent to one or more components of a chemical mechanical polishing apparatus to form a surface treatment layer; The surface treatment agent includes a fluoropolyether group-containing compound.

[0321] According to the above-mentioned processing method, a new chemical mechanical polishing apparatus having a surface treatment layer can be provided. According to the above-mentioned processing method, in a preferred embodiment, the workability of the polishing slurry is good, and in a more preferred embodiment, the chemical mechanical polishing apparatus having good workability even after a time has passed since the adhesion of the polishing slurry can be provided.

[0322] The above-mentioned chemical mechanical polishing apparatus, surface treatment agent, surface treatment layer, and fluoropolyether group-containing compound are respectively the same as the chemical mechanical polishing apparatus, surface treatment agent, surface treatment layer, and fluoropolyether group-containing compound described in the first embodiment, and all of the configurations described in the first embodiment can be applied to this embodiment.

[0323] A surface treatment agent is applied to the surface of one or more components of the chemical mechanical polishing apparatus to form a surface treatment layer. This can preferably provide the workability of polishing slurry, more preferably the workability of polishing slurry after a long time has elapsed. In a preferred embodiment, the formation of such a surface treatment layer can further provide one or more properties selected from water repellency, oil repellency, slipperiness, fingerprint adhesion, antifouling, antireflection, antifogging, etc.

[0324] The surface treatment agent can be applied to one or more surfaces of the component parts of the chemical mechanical polishing apparatus so as to coat the surfaces. The coating method is not particularly limited. For example, a wet coating method and a dry coating method can be used, and the wet coating method is preferably used.

[0325] Examples of wet coating techniques include dip coating, spin coating, brush coating, flow coating, spray coating, roll coating, gravure coating and similar techniques, with spray coating being preferred.

[0326] In one embodiment, the layer formation of the surface treatment agent is preferably carried out so that the surface treatment agent of the present disclosure is present together with a catalyst for hydrolysis and dehydration condensation in the layer. Conveniently, in the case of a wet coating method, the catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure immediately before applying the surface treatment agent to the substrate surface after diluting the surface treatment agent of the present disclosure with a solvent.

[0327] The catalyst may be any suitable acid or base. Examples of the acid catalyst include acetic acid, formic acid, and trifluoroacetic acid. Examples of the base catalyst include ammonia and organic amines.

[0328] After the surface treatment agent is applied, it may be dried as necessary. Such drying promotes hydrolysis and dehydration condensation of the fluoropolyether group-containing silane compound described below, and can remove the solvent and the like.

[0329] The above precursor layer may be dried at a temperature of preferably 0°C or more and 60°C or less, more preferably 5°C or more and 50°C or less, and even more preferably 10°C or more and 30°C or less, for a time period of preferably 1 hour or more and 48 hours or less, more preferably 3 hours or more and 24 hours or less, and even more preferably 6 hours or more and 12 hours or less.

[0330] The thickness of the above-mentioned surface treatment layer is not particularly limited.The thickness of the above-mentioned surface treatment layer is preferably 1nm or more and 20nm or less, more preferably 1nm or more and 10nm or less, preferably 5nm or more and 10nm or less, from the viewpoint of the property of polishing slurry, preferably the workability of polishing slurry after a long time, and furthermore optical performance, wear resistance and antifouling.

[0331] The present disclosure can provide a new chemical mechanical polishing apparatus and a new method for processing a chemical mechanical polishing apparatus, and can provide a chemical mechanical polishing apparatus that preferably has good workability for polishing slurry, and more preferably has good workability even after time has passed since the polishing slurry was deposited. EXAMPLES

[0332] The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these.

[0333] Manufacturing Example 1 The formula: CF 3 -(CF 2 O) 22 -(CF 2 CF2 O) 24 -CF 2 CH 2 OCH 2 CH 2 CH 2 Si{CH 2 CH 2 CH 2 Si(OCH 3 ) 3} 3 A fluoropolyether group-containing compound represented by the following formula was dissolved in Novec HFE7200 (manufactured by 3M) to a concentration of 0.1 mass % to prepare surface treatment agent 1.

[0334] Manufacturing Example 2 The formula: CF 3 CF 2 CF 2 O-(CF 2 CF 2 CF 2 O) 25 -(CH 2 CH 2 Si(OCH 3 ) 3 ) 3 -H A fluoropolyether group-containing compound represented by the following formula was dissolved in Novec HFE7200 (manufactured by 3M) to a concentration of 0.1 mass % to prepare surface treatment agent 2.

[0335] Production Example 3 The formula: CF 3 CF 2 CF 2 CF 2 CF 2 CF 2 -CH 2 CH 2 -Si-(OCH 3 ) 3 A surface treatment agent 1 was prepared by dissolving the compound represented by the following formula in Novec HFE7200 (manufactured by 3M) to a concentration of 0.1 mass %.

[0336] Example 1 The composition obtained in Production Example 1 was applied onto a stainless steel substrate (SUS304) so ​​that the coating thickness was 10 nm. The substrate was left at room temperature for 3 minutes and then heated at 150°C for 30 minutes to form a film (surface treatment layer) and obtain a substrate.

[0337] Example 2 A film (surface treatment layer) was formed in the same manner as in Example 1, except that the surface treatment agent shown in Table 1 was used, to obtain a substrate.

[0338] Comparative Example 1 A stainless steel substrate (SUS304) was used as it was as the base material.

[0339] Comparative Example 2 A film (surface treatment layer) was formed in the same manner as in Example 1, except that the surface treatment agent shown in Table 1 was used and the heating conditions were changed to 60° C. for 3 hours, to obtain a substrate.

[0340] Comparative Example 3 A treated layer was formed in the same manner as in Example 1, except that the surface treatment agent or treatment agent shown in Table 1 was used, and a substrate was obtained. As the treatment agent 4, a PTFE dispersion paint was used. As the PTFE dispersion paint, a polyamideimide dispersion of PTFE resin with a particle diameter of 25 μm was used. Specifically, an NMP dispersion was used in which the PTFE resin was 20 parts by mass per 100 parts by mass of polyamideimide resin. The dispersion was applied to SUS to a film thickness of 100 μm, and heated at 180° C. for 40 minutes and at 230° C. for 40 minutes to obtain an evaluation sample.

[0341] (Evaluation of the elasticity of polishing slurry) The polishing slurry was applied to the substrate of each of the examples and comparative examples in a tilted state. When the polishing slurry flowed down, the resilience was evaluated as ◯, and when the polishing slurry did not flow down, the resilience was evaluated as ×. GLANZOX 3900 was used as the polishing slurry.

[0342] (Evaluation of removability of polishing slurry) In the embodiment and comparative example, the substrate is placed horizontally, and 1g of polishing slurry is dropped onto the surface. After leaving it overnight, it is washed with water, and the appearance of the substrate is confirmed and the water contact angle is measured. When the polishing slurry and its solidified matter can be removed with water, it is evaluated as removability ◯, and when it cannot be removed, it is evaluated as removability ×. GLANZOX 3900 is used as the polishing slurry.

[0343] The results are shown in Table 1.

[0344] [Table 1]

[0345] Examples 1 and 2 are examples of the present disclosure, and both the repellency and removability of the slurry were good, and the generation of particles in the areas where the polishing slurry was attached was also suppressed.

[0346] Comparative Example 1 is an example in which a surface treatment layer was not formed, and the repellency and removability of the slurry were not fully satisfactory. Comparative Example 2 is an example in which a surface treatment agent containing a fluorocarbon compound but not a fluoropolyether group-containing compound was used, and the slurry removability was poor, and generation of particles was confirmed. Comparative Example 3 is an example in which a mixture of fluorocarbon particles and resin was used without containing a fluoropolyether group-containing compound, and generation of particles was confirmed. [Industrial Applicability]

[0347] The present disclosure can provide a new chemical mechanical polishing apparatus and a new method for processing a chemical mechanical polishing apparatus, and can provide a chemical mechanical polishing apparatus that preferably has good workability for polishing slurry, and more preferably has good workability even after time has passed since the polishing slurry was deposited. [Explanation of symbols]

[0348] 1 Chemical mechanical polishing equipment 2 Object to be polished 3 Polishing Heads 4 Arm part of polishing head 5 Polishing Pads 6a Surface Plate 6b Rotation axis of the surface plate 7 Conditioner Disc 8 Conditioner disc arm 9. Polishing slurry supply section 10 Arm part of polishing slurry supply part 11 Discharge groove 12 Polishing section cover

Claims

1. One or more components are included, A chemical mechanical polishing apparatus, wherein one or more of said components have a surface treatment layer formed using a compound containing a fluoropolyether group.

2. The chemical mechanical polishing apparatus of claim 1 , wherein the fluoropolyether group-containing compound comprises a fluoropolyether group-containing silane compound.

3. The fluoropolyether group-containing silane compound is represented by the following formula (1) or (2): 【Chemistry 1】 [In the formula: R Ｆ１ is independently at each occurrence Rf １ -R Ｆ -O ｑ - and R Ｆ２ is -Rf ２ ｐ -R Ｆ -O ｑ - and Rf １ each occurrence independently represents a C which may be substituted by one or more fluorine atoms; １－１６ is an alkyl group; Rf ２ C optionally substituted with one or more fluorine atoms １－６ is an alkylene group; R Ｆ is independently at each occurrence a divalent fluoropolyether group; p is 0 or 1; q, independently at each occurrence, is 0 or 1; R Ｓｉ is independently in each occurrence a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded; At least one R Ｓｉ is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded; X Ａ each independently represents a single bond or a divalent to decavalent organic group; α is an integer from 1 to 9; β is an integer from 1 to 9; Each γ is independently an integer from 1 to 9.

3. The chemical mechanical polishing apparatus of claim 2, further comprising at least one fluoropolyether group-containing silane compound represented by the formula:

4. 4. The chemical mechanical polishing apparatus according to claim 1, wherein the surface treatment layer has a thickness of 1 nm or more and 20 nm or less.

5. the chemical mechanical polishing apparatus includes a platen, a rotating shaft connected to the platen, a polishing pad disposed on the platen, a polishing head disposed on the polishing pad, an arm portion of the polishing head to which the polishing head is fixed, a polishing slurry supplying unit, an arm portion of the polishing slurry supplying unit to which the polishing slurry supplying unit is fixed, a polishing unit cover, and a discharge groove; 4. The chemical mechanical polishing apparatus according to claim 1, wherein one or more selected from the group consisting of said platen, said polishing head, and said polishing slurry supply unit have a surface treatment layer.

6. The chemical mechanical polishing apparatus includes a platen, a rotating shaft connected to the platen, a polishing pad disposed on the platen, a polishing head disposed on the polishing pad, an arm portion of the polishing head to which the polishing head is fixed, a polishing slurry supplying unit, an arm portion of the polishing slurry supplying unit to which the polishing slurry supplying unit is fixed, a polishing unit cover, a discharge groove, a conditioner disk disposed on the polishing pad, and an arm portion of the conditioner disk to which the conditioner disk is fixed; The chemical mechanical polishing apparatus of any one of claims 1 to 3, wherein one or more selected from the group consisting of the platen, the rotating shaft, the polishing head, the arm portion of the polishing head, the polishing slurry supply portion, the arm portion of the polishing slurry supply portion, the polishing portion cover, the discharge groove, and the arm portion of the conditioner disk have a surface treatment layer.

7. A method for treating a chemical mechanical polishing apparatus, comprising applying a surface treatment agent to a surface of one or more components of the chemical mechanical polishing apparatus to form a surface treatment layer, the surface treatment agent comprising a fluoropolyether group-containing compound.

8. Contains a fluoropolyether group-containing compound, A surface treatment agent that is used to apply to the surface of one or more components included in a chemical mechanical polishing apparatus to form a surface treatment layer.

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