Coating processing device, coating processing method, coating processing program, and storage medium

Abstract

To provide a technique that can suppress the generation of streak-like irregularities in an aggregation of functional liquid.SOLUTION: A coating processing device according to one aspect of the present disclosure comprises a substrate holding unit, a discharge head, and a control unit. The substrate holding unit holds and moves a substrate with multiple pixels arranged in a matrix. The discharge head has multiple nozzles that discharge functional liquid and discharges the functional liquid onto the multiple pixels of the substrate held by the substrate holding unit from the nozzles. The control unit controls each unit. The control unit executes first processing, second processing and third processing. The first processing obtains a discharge amount for each nozzle under uniform discharge conditions. The second processing obtains correction parameters of the discharge conditions for each nozzle such that a difference in the total amount of the functional liquid filled for each pixel becomes small on the basis of a result of the first processing. The third processing discharges the functional liquid from the multiple nozzles onto the multiple pixels of the substrate while applying fluctuations to the correction parameter obtained for each nozzle.SELECTED DRAWING: Figure 12

Description

[Technical field]

[0001] The present disclosure relates to a coating processing apparatus, a coating processing method, a coating processing program, and a storage medium. [Background technology]

[0002] Conventionally, there is known a coating processing apparatus that applies droplets of a functional liquid to a transported substrate by an inkjet method. For example, a coating processing apparatus is disclosed that includes a transport mechanism that holds and moves the substrate, and a plurality of ejection heads that drop droplets of the functional liquid from above onto the substrate held by the transport mechanism (see Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2021-007906 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique capable of suppressing the occurrence of streaky irregularities in a collection of functional liquid. [Means for solving the problem]

[0005] A coating processing apparatus according to an embodiment of the present disclosure includes a substrate holding unit, a discharge head, and a control unit. The substrate holding unit holds and moves a substrate having a plurality of pixels arranged in a matrix. The discharge head has a plurality of nozzles for discharging a functional liquid, and discharges the functional liquid from the nozzles onto the plurality of pixels of the substrate held by the substrate holding unit. The control unit controls each unit. The control unit also performs a first process, a second process, and a third process. The first process determines a discharge amount for each nozzle under uniform discharge conditions. The second process determines, based on a result of the first process, correction parameters for the discharge conditions for each nozzle such that a difference in the total amount of the functional liquid filled for each pixel is reduced. The third process discharges the functional liquid from the plurality of nozzles onto the plurality of pixels of the substrate while fluctuating the correction parameters determined for each nozzle. Effect of the Invention

[0006] According to the present disclosure, it is possible to prevent streaky irregularities from occurring in the aggregate of functional fluid. [Brief description of the drawings]

[0007] [Figure 1] FIG. 1 is a left side view showing a schematic configuration of a coating treatment apparatus according to an embodiment. [Diagram 2] FIG. 2 is a plan view showing a schematic configuration of the coating treatment apparatus according to the embodiment. [Diagram 3] FIG. 3 is a plan view of the carriage according to the embodiment. [Figure 4] FIG. 4 is a perspective view of the ejection head according to the embodiment, as viewed obliquely from below. [Diagram 5] FIG. 5 is a flowchart illustrating an example of a processing procedure of the coating processing apparatus according to the embodiment. [Figure 6] FIG. 6 is a diagram showing an example of the distribution of the ejection amount ejected from each nozzle before the correction process is performed. [Figure 7] FIG. 7 is a diagram showing an example of driving waveform signals with different driving voltages. [Figure 8]FIG. 8 is a diagram illustrating an example of nozzle correction parameters according to the embodiment. [Figure 9] FIG. 9 is a diagram showing an example of the transition in the first direction of the total amount of a plurality of functional liquids filled in each of a plurality of pixels. [Figure 10] FIG. 10 is a diagram showing an example of the result of FFT processing of the transition of the total amount of a plurality of functional liquids in the first direction. [Figure 11] FIG. 11 is a diagram for explaining an example of a coating process according to an embodiment. [Figure 12] FIG. 12 is a diagram for explaining an example of a coating process according to an embodiment. [Figure 13] FIG. 13 is a diagram for explaining another example of the coating process according to the embodiment. [Figure 14] FIG. 14 is a flowchart illustrating an example of a processing procedure of the coating processing performed by the coating processing apparatus according to the first modified example of the embodiment. [Figure 15] FIG. 15 is a flowchart illustrating an example of a processing procedure of the coating processing performed by the coating processing apparatus according to the second modification of the embodiment. [Figure 16] FIG. 16 is a flowchart illustrating an example of a processing procedure of the coating processing performed by the coating processing apparatus according to the third modification of the embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, with reference to the attached drawings, embodiments of the coating processing apparatus, coating processing method, coating processing program, and storage medium disclosed in the present application will be described in detail. Note that the present disclosure is not limited to the embodiments shown below. It should be noted that the drawings are schematic, and the dimensional relationships and ratios of each element may differ from the reality. Furthermore, there may be parts in which the dimensional relationships and ratios of each element differ between the drawings.

[0009] Conventionally, there has been known a coating processing apparatus that applies droplets of a functional liquid to a transported substrate by an inkjet method. For example, a coating processing apparatus has been disclosed that includes a transport mechanism that adsorbs and holds the substrate while moving it, and a plurality of ejection heads that drop droplets of the functional liquid from above onto the substrate held by the transport mechanism.

[0010] On the other hand, the above-mentioned conventional technology has room for further improvement in that streaky unevenness occurs in the aggregate of functional films formed by the coating process. Therefore, it is hoped that a technology can be realized that overcomes the above-mentioned problems and suppresses the occurrence of streaky unevenness in the aggregate of functional liquid.

[0011] <Configuration of Coating Treatment Device> First, the configuration of a coating treatment apparatus 1 according to an embodiment will be described with reference to Fig. 1 to Fig. 3. Fig. 1 is a left side view showing a schematic configuration of the coating treatment apparatus 1 according to an embodiment, and Fig. 2 is a plan view showing a schematic configuration of the coating treatment apparatus 1 according to an embodiment.

[0012] In the following, in order to clarify the positional relationships, the mutually perpendicular X-axis, Y-axis, and Z-axis directions are defined, the Y-axis direction is the transport direction of the substrate S, and the positive Z-axis direction is the vertical upward direction.

[0013] In addition, in this disclosure, the front-to-rear direction is defined as the positive Y-axis direction being the front and the negative Y-axis direction being the rear, the left-to-right direction is defined as the positive X-axis direction being the right and the negative X-axis direction being the left, and the up-down direction is defined as the positive Z-axis direction being the up and the negative Z-axis direction being the down.

[0014] The coating processing apparatus 1 is a drawing apparatus that performs drawing on the substrate S by an inkjet method while transporting the substrate S along a transport direction. The substrate S is, for example, a substrate used in a flat panel display.

[0015] The coating processing apparatus 1 is accommodated in a chamber room 100. An inert gas (such as nitrogen gas) is supplied to the chamber room 100. The coating processing apparatus 1 discharges a functional liquid onto the substrate S in an inert gas atmosphere to perform drawing on the substrate S. Note that the coating processing apparatus 1 may be an apparatus that is not accommodated in the chamber room 100.

[0016] In addition to ink, the functional liquid includes liquids that form a hole injection layer (HIL) and a hole transport layer (HTL). The functional liquid also includes multiple types of inks that are different in color. For example, the functional liquid includes R (red), G (green), and B (blue) inks.

[0017] 2, an electric room 101 in which a control device 9 and the like are housed is provided adjacent to the chamber room 100. Also, the chamber room 100 is provided with an exchange room 102 for exchanging a functional liquid tank (not shown) in which a functional liquid is stored.

[0018] 1 and 2, the coating processing apparatus 1 includes a stand 2, a pair of first guide rails 3, a substrate transport mechanism 4, a pair of second guide rails 5, a coating unit 6, an inspection mechanism 7, and a control device 9. The substrate transport mechanism 4 is an example of a substrate holding unit.

[0019] The stand 2 is disposed so as to extend along the transport direction (Y-axis direction) of the substrate S. The upper surface of the stand 2 is horizontal.

[0020] The pair of first guide rails 3 are disposed on the upper surface of the stand 2. The pair of first guide rails 3 extend linearly along the transport direction of the substrate S. The pair of first guide rails 3 are disposed spaced apart in the horizontal direction (X-axis direction) perpendicular to the transport direction.

[0021] The substrate transport mechanism 4 holds the substrate S and moves the held substrate S along the transport direction (Y-axis direction). Specifically, the substrate transport mechanism 4 includes a stage 40, a rotating unit 41, and a moving unit .

[0022] Stage 40 is, for example, a vacuum suction stage, and suctions the lower surface (the surface opposite to the surface to be drawn) of substrate S. Rotating unit 41 is provided below stage 40, and rotates stage 40 around a vertical axis (Z axis).

[0023] A work alignment camera (not shown) that captures an image of an alignment mark of the substrate S on the stage 40 is provided above the stage 40. The rotating unit 41 corrects the position of the substrate S by rotating based on the image captured by the work alignment camera.

[0024] The moving unit 42 is provided below the rotating unit 41 and supports the rotating unit 41 and the stage 40. The moving unit 42 is attached to the pair of first guide rails 3 and is movable along the pair of first guide rails 3 by a driving unit (not shown) provided on at least one of the pair of first guide rails 3, such as a linear motor.

[0025] The substrate transport mechanism 4 can move the moving part 42 along the pair of first guide rails 3, thereby moving the stage 40 and the substrate S held by suction on the stage 40 along the transport direction (Y-axis direction).

[0026] Further, at the end of the substrate transport mechanism 4 on the negative side in the Y-axis direction, there is provided a carry-in / out section 10 into which the substrate S is carried in from the outside by a substrate carry-in / out mechanism (not shown) and into which the substrate S is carried out to the outside.

[0027] 2, the pair of second guide rails 5 extend linearly in a direction (X-axis direction) perpendicular to the transport direction of the substrate S. The pair of second guide rails 5 are disposed at an interval in the transport direction (Y-axis direction) of the substrate S. The pair of second guide rails 5 are disposed on supports 5a that are disposed above the frame 2 and at a position higher than the stage 40.

[0028] The pair of second guide rails 5 extend outward (to the sides) of the gantry 2 in a plan view. On the sides of the gantry 2 and between the pair of second guide rails 5, for example, a maintenance unit 50 is disposed.

[0029] The maintenance unit 50 performs maintenance of the discharge head 63, which will be described later, and eliminates or prevents discharge defects of the discharge head 63. The application unit 6, which will be described later, is movable between a drawing position, which is a position above the stand 2, and a maintenance position, which is above the maintenance unit 50.

[0030] A plurality of coating units 6 are arranged along a direction (X-axis direction) perpendicular to the transport direction of the substrate S. For example, three coating units 6 are arranged along the X-axis direction. The number of coating units 6 is not limited to three. Each coating unit 6 includes a carriage plate 60, a carriage rotation unit 61, a carriage 62, and a plurality of discharge heads 63.

[0031] The carriage plate 60 is attached to the pair of second guide rails 5. The carriage plate 60 is movable along the pair of second guide rails 5 by a drive unit (not shown) provided on at least one of the pair of second guide rails 5, such as a linear motor.

[0032] 1, the carriage rotating part 61 is disposed below the carriage plate 60. The carriage rotating part 61 is attached to the center of the carriage plate 60 in the transport direction (Y-axis direction). A carriage 62 is attached to the lower end of the carriage rotating part 61. The carriage rotating part 61 supports the carriage 62 so as to be rotatable around a vertical axis (Z-axis).

[0033] The carriage rotation unit 61 rotates the carriage 62 about an axis parallel to the vertical direction based on an image captured by a carriage alignment camera (not shown) provided on the stage 40. This corrects the position of the carriage 62.

[0034] The multiple ejection heads 63 are provided on the carriage 62. Each ejection head 63 is connected to a functional liquid tank (not shown) via a supply tube (not shown), receives the functional liquid from the functional liquid tank via the supply tube, and ejects droplets of the functional liquid onto the substrate S. Each ejection head 63 can eject, for example, multiple types of functional liquid.

[0035] Fig. 3 is a plan view of a carriage 62 according to an embodiment. The carriage 62 is, for example, a flat plate-like member and has a plurality of openings 62a. For example, in the example shown in Fig. 3, the carriage 62 has a total of 12 openings 62a arranged in a matrix along the main transport direction and the secondary transport direction.

[0036] Although an example in which twelve openings 62a are provided in the carriage 62 has been shown here, the number of openings 62a may be more or less than twelve.

[0037] Each of the openings 62a accommodates an ejection head 63. The ejection head 63 is mounted on the carriage 62 so as to cover the opening 62a. The ejection heads 63 are arranged at intervals in the transport direction (Y-axis direction) of the substrate S and in a direction perpendicular to the transport direction (X-axis direction), for example. A detailed configuration of the ejection head 63 will be described later.

[0038] Returning to the description of Figures 1 and 2, the inspection mechanism 7 receives droplets of functional liquid using the inspection film 73 and inspects the droplet ejection state. The inspection film 73 is a water-repellent inspection film. Specifically, the inspection film 73 is an inspection film whose surface (the surface onto which droplets are ejected) has water-repellency.

[0039] The inspection mechanism 7 includes a moving unit 70 , an inspection table 71 , a film feed unit 72 , an inspection film 73 , and an imaging unit 74 .

[0040] The moving unit 70 is attached to the pair of first guide rails 3. The moving unit 70 is movable along the pair of first guide rails 3 by a drive unit (not shown) provided on at least one of the pair of first guide rails 3.

[0041] The moving unit 70 moves among a discharge position, an imaging position, and a standby position that are set along the transport direction of the substrate S. The discharge position is a position below the multiple discharge heads 63. The imaging position is a position below the imaging unit 74. The standby position is a position outside the coating unit 6.

[0042] The inspection table 71 is attached to the center of the upper surface of the moving unit 70. The inspection table 71 moves together with the moving unit 70. That is, the inspection table 71 moves between a discharge position, an imaging position, and a waiting position. The length of the inspection table 71 is longer than the discharge area where droplets of the functional liquid are discharged onto each inspection film 73 by the application unit 6.

[0043] The inspection table 71 has an adsorption plate (not shown) on the upper surface. The adsorption plate of the inspection table 71 is made of, for example, a porous material. A suction device (not shown) is also housed inside the inspection table 71. The inspection table 71 adsorbs the inspection film 73 by sucking the adsorption plate with the suction device.

[0044] The film feed unit 72 is provided above the moving unit 70. The film feed unit 72 feeds the test film 73 (test medium) that receives the test droplets discharged from the multiple discharge heads 63 in the left-right direction (the direction perpendicular to the transport direction).

[0045] 1, the imaging unit 74 is attached to the second guide rail 5 via a base 74a. A moving mechanism (not shown) for moving the imaging unit 74 in the left-right direction is provided on the base 74a. The imaging unit 74 is attached to, for example, the second guide rail 5 located at the front of the pair of second guide rails 5.

[0046] The imaging unit 74 captures an image of the droplets of the functional liquid discharged onto the inspection film 73. Note that a plurality of imaging units 74 may be provided, and the droplets of the functional liquid discharged onto the inspection film 73 may be captured by the plurality of imaging units 74. In this case, the imaging unit 74 may be fixed to the second guide rail 5 without being movable in the left-right direction.

[0047] In the inspection mechanism 7, the droplet discharge state (eg, the amount of functional liquid discharged) in the discharge head 63 is inspected based on the result of imaging the droplets of the functional liquid discharged onto the inspection film 73 by the imaging unit 74.

[0048] 2 is, for example, a computer, and includes a control unit 91 and a storage unit 92. The storage unit 92 is realized by, for example, a semiconductor memory element such as a random access memory (RAM) or a flash memory, or a storage device such as a hard disk or an optical disk.

[0049] The control unit 91 includes a microcomputer and various circuits including a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM, an input / output port, etc. The CPU of the microcomputer realizes control of each part in the coating processing apparatus 1 by reading and executing a program stored in the ROM.

[0050] The program may be recorded in a computer-readable storage medium and installed from the storage medium into the storage unit 92 of the control device 9. Examples of computer-readable storage media include a hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnet optical disk (MO), and a memory card.

[0051] <Configuration of ejection head> Next, a configuration example of the ejection head 63 according to the embodiment will be described with reference to Fig. 4. Fig. 4 is a perspective view of the ejection head 63 according to the embodiment, as viewed obliquely from below.

[0052] 4, the ejection head 63 has, for example, a head body 63a and a flange portion 63b protruding laterally from the head body 63a. The ejection head 63 is inserted, for example, from above the carriage 62 (see FIG. 3) into the opening 62a (see FIG. 3). As a result, the head body 63a of the ejection head 63 is disposed within the opening 62a.

[0053] Furthermore, the flange portion 63b of the ejection head 63 comes into contact with the upper surface of the carriage 62. This causes the ejection head 63 to be locked to the carriage 62. Furthermore, while the ejection head 63 is locked to the carriage 62, the ejection head 63 is fixed by a fixing portion (not shown) provided on the carriage 62.

[0054] The ejection head 63 is, for example, a nozzle head of a piezoelectric type or a resistance heating type, etc. A plurality of nozzles 64 are formed on a lower surface 63c of the head main body 63a. The plurality of nozzles 64 are, for example, arranged in a line at equal intervals along the first direction D1.

[0055] The first direction D1 is a direction intersecting the scanning direction Ds (for example, a direction perpendicular to the scanning direction Ds), for example, the X-axis direction. The scanning direction Ds is a direction in which the substrate S is scanned, for example, the Y-axis positive direction when the substrate S moves forward.

[0056] The head body 63a has a pump section (not shown) that includes a cavity for storing functional liquid, a piezoelectric element for changing the volume of the cavity, a vibration plate, etc., and by applying a voltage to the piezoelectric element to vibrate the vibration plate, the volume of the cavity is changed and droplets of the functional liquid are ejected from each ejection hole.

[0057] Additionally, the ejection head 63 is provided with a functional liquid introduction section that is connected to a functional liquid tank via a supply tube, and a head substrate that is connected to a control device 9 (see FIG. 2) via a flexible flat cable.

[0058] The arrangement of the multiple nozzles 64 in the ejection head 63 according to the embodiment is not limited to the example shown in FIG. 4, and multiple rows of the multiple nozzles 64 aligned along the first direction D1 may be arranged side by side along the scanning direction Ds.

[0059] <Details of coating process> Next, details of the coating process performed by the coating processing apparatus 1 according to the embodiment will be described with reference to Fig. 5 to Fig. 13. Fig. 5 is a flowchart showing an example of a processing procedure of the coating process performed by the coating processing apparatus 1 according to the embodiment.

[0060] As shown in FIG. 5, first, the control unit 91 (see FIG. 2) operates the application unit 6 (see FIG. 2) and the inspection mechanism 7 (see FIG. 2), etc., to eject functional liquid from each nozzle 64 (see FIG. 4) under uniform ejection conditions to the inspection mechanism 7 (step S101).

[0061] In the processing of step S101, for example, the control unit 91 sets the drive voltage of all nozzles 64 to the same voltage (for example, a voltage that is 100% of a given voltage Vh) and ejects droplets of functional liquid from all nozzles 64 onto the test film 73 (see FIG. 2).

[0062] Then, the control unit 91 captures the droplets of the functional liquid discharged onto the inspection film 73 with the imaging unit 74, and analyzes the captured image to determine the amount (volume, weight, etc.) of each droplet. In this way, the control unit 91 measures the discharge amount of each nozzle 64 under uniform discharge conditions (step S102). The process of step S102 is an example of a first process.

[0063] An example of the results measured in the process of step S102 is shown in Fig. 6. Fig. 6 is a diagram showing an example of the distribution of the ejection amount ejected from each nozzle 64 (see Fig. 4) before the correction process is performed. Note that the horizontal axis in the graph of Fig. 6 represents the nozzle number, which is numbered so that the numbers gradually increase from one end to the other end for the multiple nozzles 64 lined up in a row.

[0064] Moreover, the process of step S102 does not necessarily have to be performed based on the process of step S101. For example, a scale capable of measuring the weight of droplets with high accuracy may be separately provided in the coating processing apparatus 1, and the control unit 91 may measure the discharge amount of each nozzle 64 under uniform discharge conditions by discharging droplets of the functional liquid from each nozzle 64 onto the scale.

[0065] Returning to the description of Fig. 5, following the process of step S102, the control unit 91 derives correction parameters for the ejection conditions for each nozzle 64 based on the results of the measurement performed in the process of step S102 (step S103). The process of step S103 is an example of a second process.

[0066] The correction parameters for each nozzle 64 derived in the processing of step S103 are parameters that correct the ejection conditions for each nozzle 64 so as to reduce the difference in the total amount of functional liquid filled for each pixel P (see FIG. 12) of the substrate S (see FIG. 2).

[0067] For example, in the correction process according to the embodiment, first, the control unit 91 divides each nozzle 64 into a plurality of groups based on the discharge amount under uniform discharge conditions for all the target nozzles 64. For example, as shown in Fig. 6, when the minimum discharge amount is A1 and the maximum discharge amount is A5 for all the target nozzles 64, the control unit 91 divides each nozzle 64 into a plurality of groups (for example, four) by discharge amount.

[0068] For example, the control unit 91 assigns the nozzles 64 in the range of discharge amounts A1 to A2 to COM1, the nozzles 64 in the range of discharge amounts A2 to A3 to COM2, the nozzles 64 in the range of discharge amounts A3 to A4 to COM3, and the nozzles 64 in the range of discharge amounts A4 to A5 to COM4. Note that the discharge amounts A2, A3, and A4 are values ​​calculated, for example, by the following formulas (1) to (3). A2=A1+(A5-A1)×(1 / 4) ···(1) A3=A1+(A5-A1)×(1 / 2) ···(2) A4=A1+(A5-A1)×(3 / 4) ···(3)

[0069] That is, in the correction process according to this embodiment, as shown in FIG. 6, the control unit 91 divides all the target nozzles 64 into groups COM1 to COM4, ​​starting from the group with the smallest discharge amount to the group with the largest discharge amount.

[0070] The control unit 91 then corrects the drive voltage of each of the nozzles 64 belonging to COM1 to COM4 according to the group they belong to. For example, as shown in Fig. 7, the drive voltage of the nozzles 64 belonging to COM1, which is a group having the smallest ejection volume under equivalent ejection conditions, is corrected so that the drive voltage is the highest (for example, 100% of a given voltage Vh).

[0071] Furthermore, for nozzles 64 belonging to COM2, a group that has a larger discharge volume than COM1 under the same discharge conditions, the drive voltage is corrected to be lower than that of COM1 (for example, 97.5% of the given voltage Vh).

[0072] Furthermore, for nozzles 64 belonging to COM3, a group that has a larger discharge volume than COM2 under the same discharge conditions, the drive voltage is corrected to be lower than that of COM2 (for example, 95.0% of the given voltage Vh).

[0073] Furthermore, for nozzles 64 belonging to COM4, ​​which is the group with the greatest ejection volume under equivalent ejection conditions, the drive voltage is corrected so that it becomes the lowest (for example, 92.5% of the given voltage Vh).

[0074] Moreover, the storage unit 92 according to the embodiment (see FIG. 2) has a table in which a plurality of types (24 types in the figure) of waveform numbers are preset, each of which defines the drive voltages for COM1 to COM4, ​​as shown in FIG. 8. In the example shown in FIG. 7, each of the nozzles 64 belonging to COM1 to COM4 is driven by the drive voltage defined for waveform number 1 in FIG.

[0075] The ejection head 63 according to the embodiment can eject the functional liquid onto the pixel P of the substrate S while changing the waveform number defined in the table of FIG. 8 for each ejection (one shot) of the functional liquid.

[0076] For example, for a certain shot, the control unit 91 specifies the waveform number as 5. In this case, the nozzles 64 belonging to COM1 eject the functional liquid at a voltage that is 99.6% of the given voltage Vh, and the nozzles 64 belonging to COM4 eject the functional liquid at a voltage that is 92.1% of the given voltage Vh.

[0077] Furthermore, in the next shot, for example, the control unit 91 specifies the waveform number as 6. In this case, the nozzles 64 belonging to COM1 eject the functional liquid at a voltage that is 99.5% of the given voltage Vh, and the nozzles 64 belonging to COM4 eject the functional liquid at a voltage that is 92.0% of the given voltage Vh.

[0078] Returning to the explanation of Fig. 5, following the process of step S103, the control unit 91 calculates, by calculation process, the transition of the total amount of the plurality of functional liquids filled in each pixel P in the first direction D1 (see Fig. 11) when the correction parameters obtained in the process of step S103 are applied (step S104).

[0079] In the present disclosure, each pixel P may be filled with a given amount of functional liquid by one discharge, or may be filled with a given amount of functional liquid by multiple discharges. Furthermore, when a given functional liquid is filled by multiple discharges, the functional liquid may be discharged from the same nozzle 64 to one pixel P, or may be discharged from different nozzles 64 to one pixel P. Therefore, in the present disclosure, the amount of functional liquid filled in a pixel P is collectively referred to as the "total amount of functional liquid."

[0080] Fig. 9 is a diagram showing an example of the transition in the first direction D1 (see Fig. 11) of the total amount of multiple functional liquids filled in each of multiple pixels P (see Fig. 12). Note that the horizontal axis in the graph in Fig. 9 represents pixel numbers, which are numbered so that the numbers gradually increase from the pixel P corresponding to the first nozzle number to the pixel P corresponding to the last nozzle number, for multiple pixels P lined up in the first direction D1.

[0081] Therefore, the graph in FIG. 9 corresponds to the transition in the first direction D1 of the total amount of a plurality of functional liquids filled in each of a plurality of pixels P.

[0082] As shown in FIG. 9, the total amount of functional liquid ejected onto each pixel P varies less than the amount ejected under the equivalent ejection conditions shown in FIG. 6 because the above-mentioned correction parameters are applied to each nozzle 64.

[0083] On the other hand, it is difficult to completely eliminate the variation in the total amount of functional liquid ejected onto each pixel P by simply applying the above-mentioned correction parameters. Note that, as the correction parameters applied in the process of step S104, a given waveform number (such as waveform number 1) is applied from the table shown in FIG.

[0084] Returning to the explanation of Fig. 5, following the processing of step S104 described above, the control unit 91 performs a Fast Fourier Transform (FFT) process on the transition of the total amount of the functional liquid in the first direction D1 obtained in the processing of step S104 (step S105).

[0085] As a result, the control unit 91 calculates the peak period (the frequency at which the peak is observed) of the transition of the total amount of the functional liquid in the first direction D1 and the amplitude of this peak period (step S106). The processes of steps S105 and S106 are an example of a fourth process.

[0086] Fig. 10 is a diagram showing an example of the result of FFT processing of the transition of the total amount of a plurality of functional liquids in the first direction D1. For example, in the example of Fig. 10, when the size of one pixel P is used as a unit of length, peak periods are observed at positions of 40 and 50 pixels P, and the amplitude of the peak periods is about 1(%).

[0087] Returning to the description of Fig. 5, following the process of step S106, the control unit 91 operates a substrate carry-in / out mechanism (not shown) to carry-in the substrate S into the carry-in / out unit 10. Then, the control unit 91 operates the substrate transport mechanism 4 to hold the substrate S on the substrate transport mechanism 4 (step S107).

[0088] Next, the control unit 91 moves the substrate S along the scanning direction Ds (step S108), and ejects the functional liquid from each nozzle 64 onto a plurality of pixels P of the moving substrate S while fluctuating the correction parameters (step S109). The process of step S109 is an example of a third process.

[0089] 11 and 12 are diagrams for explaining an example of a coating process according to an embodiment. As shown in Fig. 11, in the coating process according to the embodiment, the control unit 91 (see Fig. 2) moves the substrate S along the scanning direction Ds (step S01).

[0090] Then, the control unit 91 ejects functional liquid from each nozzle 64 onto each pixel P (see FIG. 12) of the substrate S moving along the scanning direction Ds (step S02) while applying the correction parameters obtained in the processing of step S103 described above.

[0091] However, as described above, simply applying one correction parameter (for example, the parameter of waveform number 1) makes it difficult to completely eliminate the variation in the total amount of functional liquid ejected onto each pixel P, as shown in Figure 9.

[0092] Therefore, when the substrate S is moved in the scanning direction Ds and functional liquid is ejected from each nozzle 64 while continuously applying one correction parameter, streaky unevenness along the scanning direction Ds occurs in the collection of functional liquid due to slight unevenness as can be seen in Figure 9.

[0093] Therefore, in an embodiment, as shown in FIG. 12, the control unit 91 (see FIG. 2) ejects functional liquid onto each of a plurality of pixels P arranged in the scanning direction Ds while fluctuating the correction parameters between the pixels P (step S03).

[0094] For example, the control unit 91 ejects the functional liquid one after another onto the substrate S moving in the scanning direction Ds while changing the waveform number back and forth within a given range (for example, the range from waveform number 10 to waveform number 20).

[0095] Then, in a region R1 where a plurality of pixels P are arranged along the scanning direction Ds, the same amount of functional liquid is not discharged onto each pixel P, but a fluctuating amount of functional liquid is discharged onto each pixel P from the nozzle 64.

[0096] Therefore, compared to a case where a coating process is performed while continuously applying one correction parameter, streaky unevenness along the scanning direction Ds in the collection of functional liquid becomes less noticeable. Therefore, according to the embodiment, it is possible to suppress the occurrence of streaky unevenness in the collection of functional liquid.

[0097] Furthermore, in the embodiment, the functional liquid may be ejected from the multiple nozzles 64 onto the multiple pixels P while imparting a fluctuation to the correction parameters that is greater than the amplitude of the peak period determined in the process of step S106 (approximately 1% in the example of FIG. 10).

[0098] This makes it possible to make the intensity of unevenness in the pixels P aligned along the scanning direction Ds greater than the intensity of unevenness (corresponding to the amplitude of the peak period) in the pixels P aligned along the first direction D1, making the streaky unevenness in the scanning direction Ds even less noticeable. Therefore, according to the embodiment, the occurrence of streaky unevenness can be further suppressed.

[0099] Furthermore, as described above, when the correction parameters are fluctuated by changing the waveform number back and forth within a given range, the functional liquid may be ejected so that the correction parameters do not follow a monotonically repetitive variation pattern.

[0100] For example, if fluctuations are imparted to the correction parameters in a monotonically repetitive variation pattern, streaky unevenness may occur in the functional liquid collection along the first direction D1 due to the monotonically repetitive variation pattern.

[0101] Therefore, in this embodiment, the occurrence of streaky unevenness can be further suppressed by ejecting the functional liquid so that the correction parameters do not follow a monotonically repetitive variation pattern.

[0102] In addition, in an embodiment, when fluctuating the correction parameters using a repetitive variation pattern, the fluctuations may be provided with a repetition period that is different from the peak period of the transition of the total amount of functional liquid in the first direction D1 obtained by the processing of step S106.

[0103] For example, in the example of Figure 10, periods of 40 and 50 were observed in the progression of the total amount of multiple functional liquids in the first direction D1, so in this case, it is advisable to give the correction parameter a fluctuation by setting a value other than 40 or 50 as the repeating period.

[0104] In this way, by making the period of change in the total amount of functional liquid in the first direction D1 and the period of change in the total amount of functional liquid in the scanning direction Ds different, the occurrence of streaky unevenness can be further suppressed.

[0105] In addition, in an embodiment, when fluctuating the correction parameters using a repetitive variation pattern, the fluctuations may be imparted with a repetition period of a value that is not related to the peak period of the change in the total amount of functional liquid in the first direction D1 obtained by the processing of step S106.

[0106] For example, in the example of Figure 10, periods of 40 and 50 were observed in the change in the total amount of multiple functional liquids in the first direction D1, so in this case, it is advisable to give the correction parameter a fluctuation by setting the repeating period to a value less than 40 that does not match the common divisor of 40 and 50.

[0107] In this way, by not correlating the period of change in the total amount of functional liquid in the first direction D1 with the period of change in the total amount of functional liquid in the scanning direction Ds, the occurrence of streaky unevenness can be further suppressed.

[0108] In addition, in an embodiment, functional liquid may be ejected from multiple nozzles 64 onto multiple pixels P, respectively, using waveform numbers of correction parameters randomly selected for each shot from the waveform numbers of multiple correction parameters shown in Figure 8.

[0109] In this way, by imparting randomness to the transition of the total amount of functional liquid in the scanning direction Ds (that is, by not imparting periodicity), the occurrence of streaky unevenness can be further suppressed.

[0110] In addition, in the embodiment, even when the discharge process is performed using the waveform number of the correction parameter randomly selected for each shot, the functional liquid may be discharged while giving the correction parameter a fluctuation larger than the amplitude of the peak cycle obtained in the process of step S106. This makes it possible to further suppress the occurrence of streaky unevenness.

[0111] In the present disclosure, the method of ejecting the functional liquid from the multiple nozzles 64 onto the multiple pixels P of the substrate S while fluctuating the correction parameters for each nozzle 64 is not limited to the example in FIG.

[0112] 11, first, the control unit 91 moves the substrate S along the scanning direction Ds (step S01). Then, the control unit 91 ejects the functional liquid from each nozzle 64 onto each pixel P of the substrate S moving along the scanning direction Ds while applying the correction parameters obtained in the process of step S103 described above (step S02).

[0113] 13, the control unit 91 (see FIG. 2) ejects the functional liquid onto each of the pixels P arranged in the first direction D1 while fluctuating the correction parameter between the pixels P (step S13). FIG. 13 is a diagram for explaining another example of the coating process according to the embodiment.

[0114] For example, among the regions R2 onto which the multiple nozzles 64 collectively discharge in one shot, the functional liquid is discharged onto a specific region R2a with the driving voltage of the same group as the groups COM1 to COM4 that were divided in the process of step S103 described above.

[0115] That is, in the specific region R2a, the nozzles 64 belonging to COM1 eject functional liquid at the drive voltage of COM1 set in the table of Fig. 8. Similarly, in the specific region R2a, the nozzles 64 belonging to COM2 to COM4 eject functional liquid at the drive voltages of COM2 to COM4 set in the table of Fig. 8, respectively.

[0116] On the other hand, for another specific region R2b, the functional liquid is discharged with a driving voltage that is partly or entirely different from the groupings COM1 to COM4 that were grouped in the process of step S103 described above.

[0117] For example, in a specific region R2b, the nozzles 64 belonging to COM1 eject functional liquid with a drive voltage of COM2, COM3, or COM4, ​​which is different from COM1 set in the table of FIG.

[0118] 8. Similarly, in the specific region R2b, the nozzles 64 belonging to COM2 to COM4 eject functional liquid with driving voltages in groups different from those of COM2 to COM4 set in the table of FIG.

[0119] Furthermore, for yet another specific region R2c, the functional fluid may be ejected with the driving voltage of the same group as that of COM1 to COM4 grouped in the processing of step S103 described above, or the functional fluid may be ejected with the driving voltage of a different group in part or in whole.

[0120] 13, by discharging the functional liquid while fluctuating the correction parameters between the pixels P aligned in the first direction D1, the shape of the unevenness itself seen in Fig. 9 can be changed for each shot. Therefore, according to the embodiment, it is possible to suppress streaky unevenness that occurs along the scanning direction Ds due to such unevenness.

[0121] Also, in the embodiment, in the process of step S104 described above, the change in the total amount of the multiple functional liquids filled in each pixel P in the first direction D1 when the correction parameters are applied may be calculated by a calculation process.

[0122] This makes it possible to easily obtain the transition of the total amount of the plurality of functional liquids in the first direction D1.

[0123] Returning to the description of Fig. 5, the control unit 91 moves the substrate S, all of whose pixels P have been filled with the functional liquid by the processes of steps S108 and S109 described above, to the load / unload unit 10, and unloads the substrate S from the load / unload unit 10 (step S110). This completes a series of coating processes for the substrate S.

[0124] <Variation 1> Next, various modified examples of the embodiment will be described with reference to Fig. 14 to Fig. 16. Fig. 14 is a flow chart showing an example of a processing procedure of a coating process performed by a coating processing apparatus 1 according to a first modified example of the embodiment.

[0125] In the first modification, first, the control unit 91 (see FIG. 2) operates the application unit 6 (see FIG. 2) and the inspection mechanism 7 (see FIG. 2) to eject functional liquid from each nozzle 64 (see FIG. 4) to the inspection mechanism 7 under uniform ejection conditions (step S201). Then, the control unit 91 measures the ejection amount of each nozzle 64 under the uniform ejection conditions (step S202). The process of step S202 is another example of the first process.

[0126] Next, the control unit 91 derives correction parameters for the ejection conditions for each nozzle 64 based on the results of the measurement in the process of step S202 (step S203). The process of step S203 is another example of the second process.

[0127] The details of the process of steps S201 to S203 are similar to those of steps S101 to S103 described above, and therefore a detailed description thereof will be omitted.

[0128] Next, the control unit 91 ejects a given amount of the functional liquid onto each pixel P of the substrate S at an ejection amount corrected using the correction parameters obtained in the process of step S203 (step S204).

[0129] Next, the control unit 91 measures the transition of the total amount of functional liquid in the first direction D1 by measuring the total amount of functional liquid in a liquid state at each pixel P on the substrate S that has been processed in step S204 (step S205).

[0130] In the processing of step S205, for example, the amount of swelling of the functional liquid filled in pixel P can be quantified using the scattering intensity of oblique light inspection, thereby making it possible to measure the total amount of functional liquid in liquid state filled in pixel P.

[0131] Next, the control unit 91 performs a fast Fourier transform process on the transition of the total amount of functional liquid in the first direction D1 obtained in the process of step S205 (step S206). As a result, the control unit 91 calculates the peak period of the transition of the total amount of functional liquid in the first direction D1 and the amplitude of this peak period (step S207). The processes of steps S206 and S207 are another example of the fourth process.

[0132] Next, the control unit 91 operates a substrate loading / unloading mechanism (not shown) to load the substrate S into the loading / unloading unit 10. Then, the control unit 91 operates the substrate transport mechanism 4 to hold the substrate S on the substrate transport mechanism 4 (step S208).

[0133] Next, the control unit 91 moves the substrate S along the scanning direction Ds (step S209), and ejects the functional liquid from each nozzle 64 onto a plurality of pixels P of the moving substrate S while fluctuating the correction parameters (step S210). The process of step S210 is another example of the third process.

[0134] Finally, the control unit 91 moves the substrate S, all of whose pixels P have been filled with the functional liquid by the processes of steps S209 and S210 described above, to the load / unload unit 10, and unloads the substrate S from the load / unload unit 10 (step S211).

[0135] This completes a series of coating processes for the substrate S. The details of the processes in steps S206 to S211 are similar to those in steps S105 to S110 described above, and therefore detailed description thereof will be omitted.

[0136] In this way, in Modification 1, the transition of the total amount of functional liquid in the first direction D1 is found by ejecting the functional liquid from the nozzle 64 onto the actual substrate S and actually measuring the amount of functional liquid in a liquid state inside the pixel P.

[0137] This makes it possible to accurately determine the transition of the total amount of functional liquid in the first direction D1, thereby effectively preventing the occurrence of streaky unevenness.

[0138] <Variation 2> FIG. 15 is a flowchart showing an example of a processing procedure of the coating processing performed by the coating processing apparatus 1 according to the second modification of the embodiment.

[0139] In the second modification, first, the control unit 91 (see FIG. 2) operates the application unit 6 (see FIG. 2) and the inspection mechanism 7 (see FIG. 2) to eject functional liquid from each nozzle 64 (see FIG. 4) to the inspection mechanism 7 under uniform ejection conditions (step S301). Then, the control unit 91 measures the ejection amount of each nozzle 64 under the uniform ejection conditions (step S302). The process of step S302 is another example of the first process.

[0140] Next, the control unit 91 derives correction parameters for the ejection conditions for each nozzle 64 based on the results of the measurement in the process of step S302 (step S303). The process of step S303 is another example of the second process.

[0141] The details of the process in steps S301 to S303 are similar to those in steps S101 to S103 described above, and therefore a detailed description thereof will be omitted.

[0142] Next, the control unit 91 ejects a given amount of the functional liquid onto each pixel P of the substrate S at an ejection amount corrected using the correction parameters obtained in the process of step S303 (step S304).

[0143] Next, the control unit 91 performs drying and baking processes on the substrate S that has been processed in step S304, and measures the change in the total amount of functional liquid in the first direction D1 by measuring the film thickness of the functional liquid in the dried state of each pixel P (step S305).

[0144] In the processing of step S305, for example, the reflection intensity of the base film, which changes depending on the film thickness of the functional liquid filled in pixel P, can be quantified using an ellipsometer or the like, thereby making it possible to measure the film thickness of the functional liquid filled in pixel P.

[0145] Next, the control unit 91 performs a fast Fourier transform process on the transition of the total amount of functional liquid in the first direction D1 obtained in the process of step S305 (step S306). As a result, the control unit 91 calculates the peak period of the transition of the total amount of functional liquid in the first direction D1 and the amplitude of this peak period (step S307). The processes of steps S306 and S307 are another example of the fourth process.

[0146] Next, the control unit 91 operates a substrate carry-in / out mechanism (not shown) to carry the substrate S into the carry-in / out unit 10. Then, the control unit 91 operates the substrate transport mechanism 4 to hold the substrate S on the substrate transport mechanism 4 (step S308).

[0147] Next, the control unit 91 moves the substrate S along the scanning direction Ds (step S309), and ejects the functional liquid from each nozzle 64 onto a plurality of pixels P of the moving substrate S while fluctuating the correction parameters (step S310). The process of step S310 is another example of the third process.

[0148] Finally, the control unit 91 moves the substrate S, all of whose pixels P have been filled with the functional liquid by the processes of steps S309 and S310 described above, to the load / unload unit 10, and unloads the substrate S from the load / unload unit 10 (step S311).

[0149] This completes a series of coating processes for the substrate S. The details of the processes in steps S306 to S311 are similar to those in steps S105 to S110 described above, and therefore detailed description thereof will be omitted.

[0150] In this way, in the second modification, the transition of the total amount of functional liquid in the first direction D1 is obtained by ejecting the functional liquid from the nozzle 64 onto the actual substrate S and measuring the film thickness of the functional liquid in a dry state.

[0151] This makes it possible to accurately determine the transition of the total amount of functional liquid in the first direction D1, thereby effectively preventing the occurrence of streaky unevenness.

[0152] <Modification 3> FIG. 16 is a flowchart showing an example of a processing procedure of the coating processing performed by the coating processing apparatus 1 according to the third modification of the embodiment.

[0153] In the third modification, first, the control unit 91 (see FIG. 2) operates the application unit 6 (see FIG. 2) and the inspection mechanism 7 (see FIG. 2) to eject functional liquid from each nozzle 64 (see FIG. 4) to the inspection mechanism 7 under uniform ejection conditions (step S401). Then, the control unit 91 measures the ejection amount of each nozzle 64 under the uniform ejection conditions (step S402). The process of step S402 is another example of the first process.

[0154] Next, the control unit 91 derives correction parameters for the ejection conditions for each nozzle 64 based on the results of the measurement in the process of step S402 (step S403). The process of step S403 is another example of the second process.

[0155] The details of the process in steps S401 to S403 are similar to those in steps S101 to S103 described above, and therefore a detailed description thereof will be omitted.

[0156] Next, the control unit 91 ejects a given amount of functional liquid onto each pixel P of the substrate S at an ejection amount corrected using the correction parameters obtained in the process of step S403 (step S404).

[0157] Next, the control unit 91 uses the substrate S processed in step S404 to fabricate a light-emitting device in which each pixel P can emit light, and measures the change in the total amount of functional liquid in the first direction D1 by measuring the emission intensity of each pixel P (step S405).

[0158] In the process of step S405, for example, the emission intensity of each pixel P can be quantified by capturing an image of each emitting pixel P using a high-sensitivity camera or the like.

[0159] Next, the control unit 91 performs a fast Fourier transform process on the transition of the total amount of functional liquid in the first direction D1 obtained in the process of step S405 (step S406). As a result, the control unit 91 calculates the peak period of the transition of the total amount of functional liquid in the first direction D1 and the amplitude of this peak period (step S407). The processes of steps S406 and S407 are another example of the fourth process.

[0160] Next, the control unit 91 operates a substrate loading / unloading mechanism (not shown) to load the substrate S into the loading / unloading unit 10. Then, the control unit 91 operates the substrate transport mechanism 4 to hold the substrate S on the substrate transport mechanism 4 (step S408).

[0161] Next, the control unit 91 moves the substrate S along the scanning direction Ds (step S409), and ejects the functional liquid from each nozzle 64 onto a plurality of pixels P of the moving substrate S while fluctuating the correction parameters (step S410). The process of step S410 is another example of the third process.

[0162] Then, the control unit 91 moves the substrate S, all of whose pixels P have been filled with the functional liquid by the processes of steps S409 and S410 described above, to the load / unload unit 10, and unloads the substrate S from the load / unload unit 10 (step S411).

[0163] This completes a series of coating processes for the substrate S. The details of the processes in steps S406 to S411 are similar to those in steps S105 to S110 described above, and therefore a detailed description thereof will be omitted.

[0164] In this way, in Modification 3, the change in the total amount of functional liquid in the first direction D1 is obtained by ejecting the functional liquid from the nozzle 64 onto an actual substrate S and measuring the emission intensity of a pixel P incorporated in a light-emitting device.

[0165] This makes it possible to accurately determine the transition of the total amount of functional liquid in the first direction D1, thereby effectively preventing the occurrence of streaky unevenness.

[0166] The coating processing apparatus 1 according to the embodiment includes a substrate holding unit (substrate transport mechanism 4), a discharge head 63, and a control unit 91. The substrate holding unit (substrate transport mechanism 4) holds and moves a substrate S having a plurality of pixels P arranged in a matrix. The discharge head 63 has a plurality of nozzles 64 for discharging a functional liquid, and discharges the functional liquid from the nozzles 64 to a plurality of pixels P of the substrate S held by the substrate holding unit (substrate transport mechanism 4). The control unit 91 controls each unit. The control unit 91 performs a first process (step S102), a second process (step S103), and a third process (step S109). The first process (step S102) determines the discharge amount for each nozzle 64 under uniform discharge conditions. The second process (step S103) determines correction parameters for the discharge conditions for each nozzle such that the difference in the total amount of functional liquid filled for each pixel P is reduced based on the result of the first process (step S102). In the third process (step S109), the functional liquid is ejected from the multiple nozzles 64 onto the multiple pixels P of the substrate S while fluctuating the correction parameters determined for each nozzle 64. This makes it possible to suppress the occurrence of streaky unevenness in the collection of functional liquid.

[0167] Moreover, in the coating processing apparatus 1 according to the embodiment, the control unit 91 discharges the functional liquid while fluctuating the correction parameters of the nozzles 64 onto a plurality of pixels P aligned in the same direction as the scanning direction Ds of the substrate S. This makes it possible to suppress the occurrence of streaky unevenness along the scanning direction Ds in the aggregate of the functional liquid.

[0168] Furthermore, in the coating processing apparatus 1 according to the embodiment, the control unit 91 ejects the functional liquid to a plurality of pixels P aligned in the same direction as the scanning direction Ds of the substrate S so that the correction parameters of the nozzle 64 do not follow a monotonically repetitive variation pattern. This makes it possible to suppress the occurrence of streaky unevenness along the first direction D1 in the aggregate of the functional liquid.

[0169] Furthermore, in the coating processing apparatus 1 according to the embodiment, the control unit 91 ejects the functional liquid from the nozzle 64 to a plurality of pixels P aligned in the same direction as the scanning direction Ds of the substrate S, using a correction parameter randomly selected from a plurality of correction parameters for each pixel P. This makes it possible to further suppress the occurrence of streaky unevenness.

[0170] Moreover, in the coating processing apparatus 1 according to the embodiment, the control unit 91 discharges the functional liquid while fluctuating the correction parameters of the nozzles 64, respectively, onto the pixels P aligned in a direction intersecting the scanning direction Ds of the substrate S. This makes it possible to prevent streaky unevenness from occurring in the aggregate of the functional liquid.

[0171] In addition, in the coating processing apparatus 1 according to the embodiment, the nozzles 64 located in the discharge head 63 are aligned along a first direction D1 intersecting with the scanning direction Ds of the substrate S. The control unit 91 also performs a fourth process (steps S105 and S106). The fourth process performs a fast Fourier transform process on the transition in the first direction D1 of the total amount of the functional liquids filled in each of the pixels P when the correction parameters obtained by the second process are applied, and obtains a peak period and an amplitude of the peak period of the transition. In addition, the third process (step S109) applies a fluctuation larger than the amplitude of the peak period to the correction parameters, while discharging the functional liquid from the nozzles 64 onto the pixels P of the substrate S. This makes it possible to further suppress the occurrence of streaky unevenness.

[0172] Furthermore, in the coating processing apparatus 1 according to the embodiment, the control unit 91 ejects the functional liquid onto a plurality of pixels P aligned in the same direction as the scanning direction Ds of the substrate S in such a way that the correction parameters of the nozzles 64 do not fluctuate in a pattern having the same period as the period of the transition. This makes it possible to further suppress the occurrence of streaky unevenness.

[0173] Furthermore, in the coating processing apparatus 1 according to the embodiment, in the fourth process, the control unit 91 determines the transition in the first direction D1 of the total amount of the functional liquids filled in each of the pixels P by a calculation process based on the discharge amount of each nozzle 64 determined in the first process. This makes it possible to simply determine the transition in the total amount of the functional liquids in the first direction D1.

[0174] Furthermore, in the coating processing apparatus 1 according to the embodiment, in the fourth process, the control unit 91 determines the transition in the first direction D1 of the total amount of the functional liquids filled in each of the pixels P by measuring the total amount of the functional liquids in a liquid state filled in each of the pixels P. This allows the transition in the total amount of the functional liquid in the first direction D1 to be determined with high accuracy, thereby effectively suppressing the occurrence of streaky unevenness.

[0175] Furthermore, in the coating processing apparatus 1 according to the embodiment, in the fourth process, the control unit 91 determines the transition in the first direction D1 of the total amount of the functional liquids filled in each of the pixels P by measuring the film thickness of the functional liquids in a dried state filled in each of the pixels P. This allows the transition in the total amount of the functional liquid in the first direction D1 to be determined with high accuracy, thereby effectively suppressing the occurrence of streaky unevenness.

[0176] Furthermore, in the coating processing apparatus 1 according to the embodiment, in the fourth process, the control unit 91 determines the transition in the first direction D1 of the total amount of the functional liquids filled in each of the pixels P by measuring the emission intensity of the pixels P filled with the functional liquids. This allows the transition in the total amount of the functional liquid in the first direction D1 to be determined with high accuracy, thereby effectively suppressing the occurrence of streaky unevenness.

[0177] The coating method according to the embodiment includes a first step (step S102), a second step (step S103), and a third step (step S109). In the first step (step S102), the discharge amount of each nozzle 64 under uniform discharge conditions is obtained in the discharge head 63. The discharge head 63 has a plurality of nozzles 64 that discharge the functional liquid, and discharges the functional liquid from the nozzles 64 to a plurality of pixels P of the substrate S, which is held by a substrate holding unit (substrate transport mechanism 4) and has a plurality of pixels P arranged in a matrix. In the second step (step S103), based on the result of the first step (step S102), correction parameters of the discharge conditions for each nozzle 64 are obtained so that the difference in the total amount of the functional liquid filled for each pixel P is reduced. In the third step (step S109), the functional liquid is discharged from the plurality of nozzles 64 to a plurality of pixels P of the substrate S while fluctuating the correction parameters obtained for each nozzle 64. This makes it possible to suppress the occurrence of streaky unevenness in the aggregate of the functional liquid.

[0178] Although the embodiments of the present disclosure have been described above, the present disclosure is not limited to the above embodiments, and various modifications are possible without departing from the spirit of the present disclosure. For example, in the above embodiments, an example is shown in which the substrate transport mechanism 4 has a mechanism for adsorbing and holding the substrate S, but the present disclosure is not limited to such an example, and for example, the substrate transport mechanism for holding and transporting the substrate S may be a mechanism for transporting the substrate S while floating it.

[0179] The disclosed embodiments should be considered to be illustrative and not restrictive in all respects. Indeed, the above-described embodiments may be embodied in various forms. Furthermore, the above-described embodiments may be omitted, substituted, or modified in various forms without departing from the scope and spirit of the appended claims. [Explanation of symbols]

[0180] 1 Coating treatment equipment 4. Substrate transport mechanism (an example of a substrate holder) 9 Control device 63 Discharge Head 64 Nozzles 91 Control Unit Ds Scanning direction D1 1st direction S-substrate P pixels

Claims

1. a substrate holding unit that holds and moves a substrate having a plurality of pixels arranged in a matrix; an ejection head having a plurality of nozzles for ejecting a functional liquid, the functional liquid being ejected from the nozzles onto the plurality of pixels of the substrate held by the substrate holding unit; A control unit for controlling each unit; Equipped with The control unit is a first process for determining a discharge amount for each nozzle under uniform discharge conditions; a second process for determining a correction parameter for the ejection condition for each of the nozzles based on a result of the first process so as to reduce a difference in the total amount of the functional liquid filled for each of the pixels; a third process of ejecting the functional liquid from the plurality of nozzles onto the plurality of pixels of the substrate while fluctuating the correction parameters obtained for each of the nozzles. Coating processing equipment.

2. The control unit is The functional liquid is discharged onto the plurality of pixels arranged in the same direction as the scanning direction of the substrate while fluctuating the correction parameters of the nozzles. The coating treatment device according to claim 1 .

3. The control unit is The functional liquid is discharged onto the plurality of pixels arranged in the same direction as the scanning direction of the substrate so that the correction parameters of the nozzles do not have a monotonically repetitive variation pattern. The coating treatment apparatus according to claim 2 .

4. The control unit is The functional liquid is discharged from the nozzle to the plurality of pixels arranged in the same direction as the scanning direction of the substrate, using the correction parameter randomly selected for each of the pixels from the plurality of correction parameters. The coating treatment apparatus according to claim 2 .

5. The control unit is The functional liquid is discharged onto the plurality of pixels arranged in a direction intersecting a scanning direction of the substrate while fluctuating the correction parameters of the plurality of nozzles. The coating treatment device according to any one of claims 1 to 4.

6. the nozzles located on the discharge head are aligned along a first direction intersecting a scanning direction of the substrate, The control unit is a fourth process of performing a fast Fourier transform process on a transition in the first direction of a total amount of the plurality of functional liquids filled in each of the plurality of pixels when the correction parameter obtained by the second process is applied, to obtain a peak period and an amplitude of the peak period of the transition; The third process includes discharging the functional liquid from the nozzles onto the pixels of the substrate while applying a fluctuation to the correction parameter that is greater than the amplitude of the peak period. The coating treatment device according to any one of claims 1 to 4.

7. The control unit is The functional liquid is discharged to the plurality of pixels arranged in the same direction as the scanning direction of the substrate so that the correction parameters of the nozzles do not have a variation pattern having the same period as the period of the transition. The coating treatment device according to claim 6 .

8. The control unit is In the fourth process, a change in a total amount of the plurality of functional liquids filled in each of the plurality of pixels in the first direction is calculated based on the ejection amount of each of the nozzles calculated in the first process. The coating treatment device according to claim 6 .

9. The control unit is In the fourth process, a change in a total amount of the plurality of functional liquids filled in each of the plurality of pixels in the first direction is obtained by measuring a total amount of the functional liquid in a plurality of liquid states filled in each of the plurality of pixels. The coating treatment device according to claim 6 .

10. The control unit is In the fourth process, a change in a total amount of the plurality of functional liquids filled in each of the plurality of pixels in the first direction is obtained by measuring a film thickness of the plurality of functional liquids in a dry state filled in each of the plurality of pixels. The coating treatment device according to claim 6 .

11. The control unit is In the fourth process, a change in a total amount of the plurality of functional liquids filled in the plurality of pixels in the first direction is obtained by measuring a light emission intensity of the plurality of pixels filled with the plurality of functional liquids, respectively. The coating treatment device according to claim 6 .

12. a first step of determining a discharge amount for each nozzle under uniform discharge conditions in a discharge head having a plurality of nozzles for discharging a functional liquid, the discharge head being held by a substrate holding part and configured to discharge the functional liquid from the nozzles onto a plurality of pixels of a substrate having a plurality of pixels arranged in a matrix; a second step of determining a correction parameter for the ejection conditions for each of the nozzles based on a result of the first step, so as to reduce a difference in the total amount of the functional liquid filled for each of the pixels; a third step of ejecting the functional liquid from the nozzles onto the pixels of the substrate while fluctuating the correction parameters determined for each nozzle; A coating treatment method comprising the steps of:

13. The third step comprises: The functional liquid is discharged onto the plurality of pixels arranged in the same direction as the scanning direction of the substrate while fluctuating the correction parameters of the nozzles. The coating method according to claim 12.

14. The third step comprises: The functional liquid is discharged onto the plurality of pixels arranged in the same direction as the scanning direction of the substrate so that the correction parameters of the nozzles do not follow a repetitive variation pattern. The coating method according to claim 13.

15. The third step comprises: The functional liquid is discharged from the nozzle to the plurality of pixels arranged in the same direction as the scanning direction of the substrate, using the correction parameter randomly selected for each of the pixels from the plurality of correction parameters. The coating method according to claim 13.

16. The third step comprises: The functional liquid is discharged onto the plurality of pixels arranged in a direction intersecting a scanning direction of the substrate while fluctuating the correction parameters of the plurality of nozzles. The coating method according to any one of claims 12 to 15.

17. the nozzles located on the discharge head are aligned along a first direction intersecting a scanning direction of the substrate, a fourth step of performing a fast Fourier transform process on a transition in the first direction of a total amount of the plurality of functional liquids filled in each of the plurality of pixels when the correction parameter obtained in the second step is applied, to obtain a peak period and an amplitude of the peak period of the transition, The third step includes discharging the functional liquid from the nozzles onto the pixels of the substrate while applying a fluctuation to the correction parameter that is greater than the amplitude of the peak period. The coating method according to any one of claims 12 to 15.

18. The third step comprises: The functional liquid is discharged to the plurality of pixels arranged in the same direction as the scanning direction of the substrate so that the correction parameters of the nozzles do not have a variation pattern having the same period as the period of the transition. The coating method according to claim 17.

19. a substrate holding unit that holds and moves a substrate having a plurality of pixels arranged in a matrix; an ejection head having a plurality of nozzles for ejecting a functional liquid, the functional liquid being ejected from the nozzles onto the plurality of pixels of the substrate held by the substrate holding unit; For a coating treatment device equipped with a first step of determining a discharge amount for each nozzle under uniform discharge conditions; a second step of calculating a correction parameter for the ejection condition for each of the nozzles based on a result of the first step, the correction parameter reducing a difference in the total amount of the functional liquid filled for each of the pixels; a third step of ejecting the functional liquid from the plurality of nozzles onto the plurality of pixels of the substrate while fluctuating the correction parameters determined for each of the nozzles. Coating treatment program.

20. A computer-readable storage medium storing a program that operates on a computer and controls a coating treatment device, The program causes a computer to control the coating processing device so as to perform the coating processing method according to any one of claims 12 to 15 when the program is executed. storage medium.

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