Stage apparatus, substrate processing apparatus, and method for manufacturing article

Abstract

To provide a stage apparatus capable of reducing adverse effects on a substrate processing result.SOLUTION: A stage apparatus includes: a driving part that moves a holding part holding a substrate; a linear motor which is capable of reducing reaction force generated by driving of the driving part and which includes a movable element and a stator; and a gas supply part that injects air to the movable element from two directions that hold the movable element therebetween.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a stage apparatus, a substrate processing apparatus, and a method for manufacturing an article. [Background technology]

[0002] In the manufacturing process of semiconductor devices, liquid crystal display devices, and the like, a motor is sometimes used to reduce a reaction force generated due to driving a stage that holds and moves a substrate, as disclosed in Patent Document 1. This motor for reducing the reaction force includes a mover and a stator, and the mover is integrated with the stage. This mover is supported in a cantilevered state by the stage, with one end in the direction in which a thrust for reducing the reaction force is generated being connected to the stage, and the other end is paired with the stator and generates a thrust for reducing the reaction force. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 11-168064 Summary of the Invention [Problem to be solved by the invention]

[0004] Here, if a mover included in a motor for reducing reaction force is supported in a cantilevered state by the stage, this mover is likely to vibrate when the stage is driven. This vibration of the mover also causes the stage, which is integrated with the mover, to vibrate, resulting in vibration and positional deviation of the stage. This causes positional deviation of the substrate held by the stage. This positional deviation of the substrate affects the processing results of the substrate (alignment accuracy, overlay accuracy).

[0005] SUMMARY OF THE PRESENT DISCLOSURE An object of the present invention is to provide a stage device capable of reducing adverse effects on the processing results (alignment accuracy, overlay accuracy) of a substrate. [Means for solving the problem]

[0006] In order to achieve the above object, a stage device as one aspect of the present invention is characterized in having a drive unit that moves a holding unit that holds a substrate, a linear motor that is capable of reducing the reaction force generated by driving the drive unit and includes a mover and a stator, and a gas supply unit that blows gas onto the mover from two directions sandwiching the mover.

[0007] Further objects or other aspects of the present invention will become apparent from the embodiments described below with reference to the drawings. Effect of the Invention

[0008] According to the present invention, it is possible to provide a stage device that is capable of reducing adverse effects on the processing results of a substrate. [Brief description of the drawings]

[0009] [Figure 1] FIG. 2 is a perspective view of a stage device in the first embodiment. [Diagram 2] FIG. 2 is a diagram showing the stage device as seen from the -Y direction side in the first embodiment. [Diagram 3] 5A and 5B are schematic diagrams showing a mechanism for reducing vibration of a mover in the first embodiment. [Figure 4] FIG. 11 is a schematic diagram of an exposure apparatus in a second embodiment. [Diagram 5] 10 is a flowchart of a method for manufacturing an article in a third embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. Note that the following embodiment does not limit the invention according to the claims. Although the embodiment describes a number of features, not all of these features are essential to the invention, and the features may be combined in any manner. Furthermore, in the drawings, the same reference numbers are used for the same or similar configurations, and duplicated descriptions are omitted.

[0011] In addition, in this specification and drawings, directions are basically indicated by an XYZ coordinate system in which the vertical direction is the Z axis and the horizontal plane perpendicular to the vertical direction is the XY plane, and the axes are mutually orthogonal. However, if an XYZ coordinate system is shown in each drawing, that coordinate system takes precedence.

[0012] A specific configuration will be described below for each embodiment.

[0013] First Embodiment FIG. 1 is a perspective view of a stage device 100 in this embodiment. FIG. 2 is a view of the stage device 100 in this embodiment as viewed from the -Y direction side. In FIG. 2, the support portion 51 on the -Y direction side of the reaction force processing linear motor stator 41 is not shown. The stage device 100 constitutes, for example, a part of an exposure apparatus that exposes a pattern of an original (mask, reticle) onto a substrate via a projection optical system. The exposure apparatus is, for example, a step-and-repeat type or a step-and-scan type exposure apparatus.

[0014] In the stage device 100 of this embodiment, vibration isolators 8 are arranged at three locations on a base frame 6 that is the base of the stage device 100. However, the number of vibration isolators 8 does not have to be three. The vibration isolators 8 are damping mechanisms that include air springs or coil springs, and reduce the effects of external vibrations on the stage device 100. A frame 80 is arranged on the vibration isolators 8, and a base plate 5 that serves as a running surface for the movable part is arranged on the frame 80. Note that, although an example in which the frame 80 is arranged on the vibration isolators 8 is shown in this embodiment, the base plate 5 may be arranged directly on the vibration isolators 8.

[0015] Stage device 100 in this embodiment includes a Y movable part (Y slider 13L, Y slider 13R), an X movable part (X linear motor mover 22), a Y linear motor (Y linear motor 10L, Y linear motor 10R), and an X linear motor 20 (drive unit). The Y linear motor is a moving means for moving the Y movable part (Y slider 13L, Y slider 13R) in the Y axis direction, and the X linear motor 20 is a moving means for moving the X movable part (X linear motor mover 22) in the X axis direction. Y slider 13L on the -X direction side with respect to the position of X linear motor mover 22 and Y slider 13R on the +X direction side with respect to the position of X linear motor mover 22 move in the Y axis direction on base plate 5 so that their positions in the Y axis direction are the same. X linear motor mover 22 moves in the X-axis direction on base 5 along X linear motor stator 21 which is integrated with Y slider 13L and Y slider 13R. Here, since X linear motor stator 21 is integrated with Y slider 13L and Y slider 13R, it moves in the Y direction in conjunction with the Y direction position of the Y movable part (Y slider 13L, Y slider 13R).

[0016] Hydrostatic bearings (air bearings) 15 are provided on the surfaces (backsides) of Y sliders 13L and 13R facing the base plate 5, and a hydrostatic bearing (air bearing) (not shown) is provided on the surface (backside) of X linear motor mover 22 facing the base plate 5. The hydrostatic bearing is a means for levitating an object using air pressure and supporting the object in a non-contact manner. Base plate 5 includes XY guide surface 5a that receives gas ejected from the hydrostatic bearing and supports the Y movable part and X movable part in a non-contact manner.

[0017] The Y linear motor includes a Y linear motor 10L and a Y linear motor 10R. The Y linear motor 10L is a linear motor for moving the Y slider 13L, and the Y linear motor 10R is a linear motor for moving the Y slider 13R. The Y linear motor 10L has a Y linear motor stator 11L integrated with the base plate 5, and a Y linear motor mover 12L integrated with the Y slider 13L. The Y linear motor 10R has a Y linear motor stator 11R integrated with the base plate 5, and a Y linear motor mover 12R integrated with the Y slider 13R. The Y linear motor stator 11L and the Y linear motor stator 11R have coil arrays arranged in the Y-axis direction, and the Y linear motor mover 12L and the Y linear motor mover 12R are U-shaped frames equipped with multi-pole magnets (not shown) facing each other.

[0018] By passing a current through each coil of Y linear motor stator 11L and Y linear motor stator 11R, a thrust in the Y direction is generated in Y linear motor mover 12L and Y linear motor mover 12R. This thrust causes Y linear motor mover 12L and Y linear motor mover 12R to move, which causes the Y movable parts integrated with Y linear motor mover 12L and Y linear motor mover 12R, respectively, to move along the Y linear motor stators.

[0019] Here, by changing the direction and magnitude of the current flowing through each coil of Y linear motor stators 11L and Y linear motor stators 11R, the direction and magnitude of the thrust can be changed, and a thrust of a desired magnitude can be generated in a desired direction. This makes it possible to move the Y movable part while controlling its acceleration and deceleration, and adjust the position of the Y movable part.

[0020] The X linear motor 20 includes an X linear motor stator 21 and an X linear motor mover 22. The X linear motor mover 22 is a hollow frame body having a multi-pole magnet (not shown) on its inner surface. The X linear motor stator 21 has a coil array arranged in the X-axis direction. By passing a current through each coil of the X linear motor stator 21, a thrust in the X direction is generated in the X linear motor mover 22. This thrust causes the X linear motor mover 22 to move along the X linear motor stator 21. A hydrostatic bearing (air bearing) (not shown) is provided inside the X linear motor mover 22, and this hydrostatic bearing keeps the X linear motor stator 21 and the X linear motor mover 22 in a non-contact state.

[0021] Here, the direction and magnitude of thrust can be changed by changing the direction and magnitude of the current flowing through each coil of X linear motor stator 21, and thrust of a desired magnitude can be generated in a desired direction. This makes it possible to move the X moving part while controlling its acceleration and deceleration, and adjust the position of the X moving part.

[0022] There is a fine-motion top plate 25 on the upper surface of the X-linear motor mover 22, and the fine-motion top plate 25 can finely drive a chuck (holding portion) (not shown) capable of holding a substrate W. The fine-motion top plate 25 can be driven in the X-axis direction, the Y-axis direction, and the Z-axis direction, and in the rotational directions of each axis (θx, θy, θz).

[0023] The fine adjustment top 25 is provided with an X bar mirror 27 and a Y bar mirror 28. The position of the fine adjustment top 25 in the X direction can be measured by the X bar mirror 27 and the X interferometer 3x. The position of the fine adjustment top 25 in the Y direction can be measured by the Y bar mirror 28 and the Y interferometer 3y. The laser beam 4x and the laser beam 4y emitted from the X interferometer 3x and the Y interferometer 3y each contain a plurality of light beams (beams) used for position measurement, and these multiple light beams are emitted so that their optical paths are parallel to each other. By emitting two parallel light beams (beams), it is possible to detect not only the movement amount ΔX, ΔY and the position (X, Y) of the fine adjustment top 25, but also the rotation components (rotation angles) θx, θy, θz.

[0024] Stage device 100 of the present embodiment is equipped with a control unit 9 for controlling stage device 100, and controls the movement of the Y movable part and the X movable part based on position information of micro-motion top board 25 acquired by X interferometer 3x and Y interferometer 3y. Control unit 9 also controls not only the movement of the Y movable part and the X movable part, but also the drive of reaction force processing linear motor 40 (movement of the mover) which will be described later, and the supply of gas from gas supply unit 50.

[0025] The control unit 9 includes a processing unit, a bus, a ROM, a RAM, and a storage device, and each component functions according to a program. The processing unit is a processing device that performs calculations for control according to the program and controls each component connected to the bus. This processing unit can be configured by a CPU, a PLD such as an FPGA, an ASIC, or a combination of all or part of these. The ROM is a memory dedicated to reading data, and stores programs and data. The RAM is a memory for reading and writing data, and is used to store programs and data. The RAM is used for temporarily storing data such as the results of calculations by the CPU. The storage device is also used to store programs and data. The storage device is also used as a temporary storage area for programs and data of the operating system (OS) of the control unit 9. The storage device is slower in inputting and outputting data than the RAM, but is capable of storing large amounts of data. It is desirable for the storage device to be a non-volatile storage device that can store data as permanent data so that the stored data can be referenced for a long period of time. The storage device is mainly configured by a magnetic storage device (HDD), but may also be a device that reads and writes data by loading external media such as CDs, DVDs, and memory cards.

[0026] Incidentally, the control unit 9 may be configured integrally with the other parts of the stage device 100 (in a common housing), or may be configured separately from the other parts of the stage device 100 (in a different housing).

[0027] Stage device 100 in this embodiment has a reaction force processing linear motor 40. This reaction force processing linear motor 40 is a linear motor for reducing a reaction force generated when the X movable part moves in the X direction. When the X movable part moves in the X direction, the reaction force causes vibration or rotation due to a rotation moment in base plate 5, and a position shift of substrate W occurs during exposure processing of substrate W. This affects the processing result of substrate W (alignment accuracy, overlay accuracy). By reducing the reaction force generated against the movement (e.g., step movement) of the X movable part in the X direction by reaction force processing linear motor 40, it is possible to reduce adverse effects on the processing result of substrate W. Reaction force processing linear motor 40 includes reaction force processing linear motor stator 41 supported by stator support portion 7a and reaction force processing linear motor mover 42 coupled to Y slider 13L. This reaction force processing linear motor stator 41 and reaction force processing linear motor mover 42 face each other. Further, the reaction force processing linear motor mover 42 is disposed at a position where it is vibration-isolating by the vibration isolating section 8, and the reaction force processing linear motor stator 41 is disposed at a position where it is not vibration-isolating by the vibration isolating section 8.

[0028] The reaction force processing linear motor stator 41 is a U-shaped frame body having multi-pole magnets 41m facing each other in the Z-axis direction. Four multi-pole magnets 41m are arranged, each extending in the Y direction (the moving direction of the reaction force processing linear motor mover 42). The two multi-pole magnets 41m on the +Z direction side of the position of the reaction force processing linear motor mover 42 are arranged at intervals in the X-axis direction. Similarly, the two multi-pole magnets 41m on the -Z direction side of the position of the reaction force processing linear motor mover 42 are also arranged at intervals in the X-axis direction. The reaction force processing linear motor mover 42 has a coil array in which a plurality of coils are arranged in the Y direction. By passing a current through each coil of the reaction force processing linear motor mover 42, a thrust in the X direction is generated in the reaction force processing linear motor mover 42, and this thrust reduces the reaction force generated by the movement of the X movable part.

[0029] Here, by changing the direction and magnitude of the current flowing through each coil of the reaction force processing linear motor mover 42, the direction and magnitude of the thrust can be changed, and a thrust of a desired magnitude can be generated in a desired direction. For example, when the X movable part moves in the +X direction, a reaction force is generated in the -X direction, so that the direction of the current flowing through the coil is adjusted so that the reaction force processing linear motor mover 42 generates a thrust in the +X direction to reduce this reaction force. Also, when it is desired to increase the thrust to be generated, it is sufficient to increase the current flowing through the coil, and when it is desired to decrease the thrust to be generated, it is sufficient to decrease the current flowing through the coil. The magnitude of the thrust generated by the reaction force processing linear motor 40 can be adjusted, for example, by estimating the magnitude of the reaction force to be generated, so that a thrust of the same magnitude as the estimated reaction force is generated.

[0030] Here, in this embodiment, an example is shown in which the reaction force processing linear motor 40 is disposed on the -X direction side with respect to the positions of the X movable part and the Y slider 13L, but it may be disposed on the +X direction side with respect to the positions of the X movable part and the Y slider 13R. Alternatively, the reaction force processing linear motor may be disposed so as to reduce the reaction force generated due to the movement of the Y movable part in the Y direction. When the Y movable part (Y slider 13L, Y slider 13R) moves in the Y axis direction, a reaction force is generated in each of the Y linear motor stator 11L and the Y linear motor stator 11R. Therefore, the reaction force processing linear motor is disposed at a position corresponding to each of the Y linear motor stator 11L and the Y linear motor stator 11R. For example, in order to reduce the reaction force generated in the Y linear motor stator 11L, the reaction force processing linear motor stator is disposed on the base plate 5 or the Y linear motor stator 11L, and the reaction force processing linear motor mover is disposed at a position corresponding to the reaction force processing linear motor stator. Furthermore, in order to reduce the reaction force generated by Y linear motor stator 11R, a reaction force processing linear motor stator is placed on base 5 or Y linear motor stator 11R, and a reaction force processing linear motor mover is placed in a position corresponding to the reaction force processing linear motor stator. In this way, by placing a total of two reaction force processing linear motors, one at a position corresponding to Y linear motor stator 11L and one at a position corresponding to Y linear motor stator 11R, it is possible to reduce the reaction force generated due to the movement of the Y movable part.

[0031] Alternatively, a plurality of reaction force processing linear motors 40 may be provided and disposed at both a position for reducing the reaction force generated due to the movement of the X movable part in the X direction and a position for reducing the reaction force generated due to the movement of the Y movable part in the Y direction. Specifically, both reaction force processing linear motor 40 for reducing the reaction force generated in the X movable part as shown in Fig. 1 and the reaction force processing linear motor for reducing the reaction force generated due to the movement of the Y movable part in the Y direction described above may be disposed.

[0032] In addition, the arrangement of the coil and magnet is not limited to the above example, and the coil and magnet may be arranged in the opposite manner to the above example. Specifically, the reaction force processing linear motor mover 42 may include a multi-pole magnet, and the reaction force processing linear motor stator 41 may include a coil.

[0033] Here, the reaction force processing linear motor mover 42, which is integrated with the end of the Y movable part, is in a state in which one side (the +X direction side of the reaction force processing linear motor mover 42) is supported by the Y movable part. In other words, the reaction force processing linear motor mover 42 is supported by the stage (Y movable part) in a cantilevered state. When the reaction force processing linear motor mover 42 is supported in a cantilevered state, the reaction force processing linear motor mover 42 is more likely to vibrate in the Z direction due to the movement of the stage (movement of the Y movable part or the X movable part) than when it is supported on both sides. Since the reaction force processing linear motor mover 42 and the Y movable part are integrated, the vibration of the reaction force processing linear motor mover 42 causes a positional deviation or vibration in the Y movable part and the X movable part, and a positional deviation of the substrate W occurs during the exposure processing of the substrate W. This positional deviation of the substrate W affects the processing result of the substrate W (alignment accuracy, overlay accuracy).

[0034] Then, the reaction force processing linear motor mover 42 vibrates, and thus the distance between the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41 in the direction in which they face each other (Z direction) changes. When the distance between the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41 in the direction in which they face each other (Z direction) becomes shorter, the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41 may interfere with each other (contact). Since the reaction force processing linear motor mover 42 and the Y movable part are integrated, the interference between the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41 causes positional deviation and vibration in the Y movable part and the X movable part, and the positional deviation of the substrate W occurs during the exposure processing of the substrate W. This positional deviation of the substrate W affects the processing result of the substrate W (alignment accuracy, overlay accuracy).

[0035] Therefore, in the stage device 100 of this embodiment, gas is blown onto the reaction force processing linear motor mover 42 from two directions by the gas supply unit 50 arranged at a position sandwiching the reaction force processing linear motor mover 42. Specifically, the gas supply units 50 are provided on the +Z direction side and the -Z direction side of the reaction force processing linear motor mover 42, respectively, and gas is blown onto the reaction force processing linear motor mover 42 from two directions (+Z direction and -Z direction with respect to the position of the reaction force processing linear motor mover 42). The gas blown from the gas supply unit 50 is, for example, clean dry air (CDA). This makes it possible to reduce the vibration of the reaction force processing linear motor mover 42. In other words, the vibration of the reaction force processing linear motor mover 42 is reduced more when the gas is blown from the gas supply unit 50 than when the gas is not blown from the gas supply unit 50. Furthermore, it is also possible to reduce the possibility of interference (contact) between the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41. Due to these actions, it is possible to reduce adverse effects on the processing results (alignment accuracy, overlay accuracy) of the substrate W.

[0036] One end of the support 51 is integrated with the gas supply unit 50, and the other end of the support 51 is integrated with a member (base plate 5) that is vibration-isolated by the vibration isolator 8. The gas supply unit 50 is supported at both ends in the Y direction by the support 51, and is disposed on the +Z direction side and the -Z direction side of the reaction force processing linear motor mover 42, respectively. In this embodiment, the gas supply unit 50 is disposed in the space between the multi-pole magnets 41m in the X direction. By disposing the gas supply unit 50 in a space where no member or the like was disposed, the space can be effectively utilized to prevent the reaction force processing linear motor stator 41 from becoming large. The gas supply unit 50 is hollow, and a plurality of holes are provided on the surface of the gas supply unit 50, and the gas supplied to the hollow portion from a pump (not shown) is blown onto the reaction force processing linear motor mover 42 through the plurality of holes. The gas is blown by the gas supply unit 50 to the reaction force processing linear motor mover 42 from two directions (+Z direction and -Z direction) in the direction in which the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41 face each other (Z direction). The blowing of gas from the gas supply unit 50 reduces vibration of the reaction force processing linear motor mover 42.

[0037] The control unit 9 controls the amount and timing of gas blown from the gas supply unit 50. The control unit 9 may control the gas supply unit 50 to constantly blow gas, or may control the gas supply unit 50 to blow gas appropriately by detecting the vibration of the reaction force processing linear motor mover 42. In addition, when the vibration of the reaction force processing linear motor mover 42 can be predicted, the control unit 9 may control the blowing of gas from the gas supply unit 50 by feedforward control based on the prediction. This prediction may be performed by, for example, a simulation, or may be based on information on the vibration of the reaction force processing linear motor mover 42 when the Y movable part or the X movable part is moved, which is obtained by performing an experiment in advance.

[0038] In this embodiment, the vibration of the reaction force processing linear motor mover 42 is reduced in a non-contact manner by blowing gas from the gas supply unit 50. As a result, the method of reducing the vibration of the mover in this embodiment does not generate mechanical friction compared to a method of reducing vibration by mechanical means, and does not impede the movement of the reaction force processing linear motor mover 42 and the Y movable part in the Y direction.

[0039] Here, the distance between the gas supply unit 50 and the reaction force processing linear motor mover 42 in the opposing direction is preferably equal to or less than the maximum amplitude (e.g., the extendable distance) of the vibration isolation unit 8. This is because shortening the distance between the gas supply unit 50 and the reaction force processing linear motor mover 42 can enhance the effect of reducing vibration of the reaction force processing linear motor mover 42 when the gas supply unit 50 blows gas.

[0040] In this embodiment, the gas supply unit 50 is coupled to the base plate 5 via the support unit 51. As a result, the gas supply unit 50 is disposed at a position where it is vibration-free by the vibration isolator 8, similar to the reaction force processing linear motor mover 42. Therefore, even if the reaction force processing linear motor mover 42 is vibration-free by the vibration isolator 8 in the direction in which they face each other (Z direction), the gas supply unit 50 can blow gas at a position linked to the position of the vibration-free reaction force processing linear motor mover 42.

[0041] FIG. 3 is a schematic diagram showing a mechanism for reducing vibration of the movable element in this embodiment. FIG. 3(a) shows an example in which the linear motor movable element 42 for reaction force processing vibrates in a direction (Z direction) opposite to each other due to the movement of the stage (movement of the Y movable part or the X movable part). In this embodiment, the vibration of the linear motor movable element 42 for reaction force processing is reduced by blowing gas onto the linear motor movable element 42 for reaction force processing from the +Z direction and the -Z direction by the gas supply unit 50 as shown in FIG. 3(b). When vibration is received as shown in FIG. 3(c), the position of the linear motor stator 41 for reaction force processing changes, and the linear motor movable element 42 for reaction force processing is vibration-reduced by the vibration-reducing unit 8, and the relative position with the linear motor stator 41 for reaction force processing changes. Even in such a case, the gas supply unit 50 blows gas at a position linked to the position of the linear motor movable element 42 for reaction force processing, since the gas supply unit 50 is vibration-reduced by the vibration-reducing unit 8 together with the linear motor movable element 42 for reaction force processing. Furthermore, as shown in FIG. 3(d), even if the base plate 5 is tilted due to, for example, the step movement of the X movable part, and the reaction force processing linear motor mover 42 is tilted, the gas supply unit 50 blows gas at a position linked to the tilt of the reaction force processing linear motor mover 42.

[0042] For example, when the gas supply unit 50 is provided to the reaction force processing linear motor stator 41, the reaction force processing linear motor stator 41 is disposed at a position where it is not isolated by the vibration isolation unit 8, and therefore the position of the gas supply unit 50 is not isolated by the vibration isolation unit 8. In other words, the gas supply unit 50 blows gas onto the reaction force processing linear motor mover 42 at a position that is not linked to the position of the reaction force processing linear motor mover 42 in the mutually opposing direction (Z direction) that is isolated by the vibration isolation unit 8. If the gas supply unit 50 blows gas onto the reaction force processing linear motor mover 42 at the above-mentioned non-linked position (inappropriate position), it is not possible to appropriately damp the reaction force processing linear motor mover 42. The appropriate position is ideally a position where the distance between the reaction force processing linear motor mover 42 and the gas supply unit 50 in the mutually opposing direction (Z direction) is the same value on the +Z direction side and the -Z direction side. An inappropriate position is, for example, a position where the difference in distance between the reaction force processing linear motor mover 42 and the gas supply unit 50 in the mutually opposing directions (Z direction) between the +Z direction side and the -Z direction side of the reaction force processing linear motor mover 42 is outside the allowable range. Furthermore, when the gas supply unit 50 is provided on the reaction force processing linear motor stator 41, the relative positions of the reaction force processing linear motor mover 42 and the gas supply unit 50 change due to vibration isolation by the vibration isolation unit 8. This may cause interference (contact) between the reaction force processing linear motor mover 42 and the gas supply unit 50. In this embodiment, the gas supply unit 50 is supported by a support unit 51 separate from the reaction force processing linear motor stator 41, and is disposed at a position where it is isolated by the vibration isolation unit 8. This does not cause the above-mentioned problem. In this embodiment, the gas supply unit 50 is coupled to the base 5 via the support unit 51, but the gas supply unit 50 may be integrated with the frame 80 via the support unit 51.

[0043] In addition, the gas supply unit 50 and the support unit 51 in this embodiment are separate from the reaction force processing linear motor mover 42. For example, when the gas supply unit 50 is coupled to the +Z direction side surface and the -Z direction side surface of the reaction force processing linear motor mover 42, the vibration of the reaction force processing linear motor mover 42 can be reduced by blowing gas onto the reaction force processing linear motor stator 41. At this time, since the gas supply unit 50 and the reaction force processing linear motor mover 42 are integrated, the gas supply unit 50 can blow gas from a position linked to the position of the reaction force processing linear motor mover 42 in the mutually opposing direction (Z direction). However, by coupling the gas supply unit 50 to the reaction force processing linear motor mover 42, the weight of the reaction force processing linear motor mover 42 increases. Because the reaction force processing linear motor mover 42 is integrated with the Y movable part, it increases the weight of the Y movable part, affecting the movement speed of the Y movable part and affecting the number of substrates W processed per unit time (throughput). In this embodiment, the gas supply unit 50 and support unit 51 are separate from the reaction force processing linear motor mover 42, so that the above-mentioned problems do not occur.

[0044] Moreover, it is preferable that the distance between the gas supply unit 50 and the reaction force processing linear motor stator 41 is equal to or greater than the maximum amplitude of the vibration isolator 8. This is because, by making the distance between the gas supply unit 50 and the reaction force processing linear motor stator 41 equal to or greater than the maximum amplitude of the vibration isolator 8, the possibility of interference between the gas supply unit 50 and the reaction force processing linear motor stator 41 can be reduced.

[0045] Here, the term "separate" in this embodiment refers to a state in which the members are not directly connected (not fastened or bonded, etc.). Alternatively, the term "separate" in this embodiment refers to a relationship in which the members are not in contact with each other when they are in a reference position (a position in which both members are not vibrating). That is, in this embodiment, the gas supply unit 50, the reaction force processing linear motor mover 42, and the reaction force processing linear motor stator 41 are not directly connected to each other. The gas supply unit 50, the reaction force processing linear motor mover 42, and the reaction force processing linear motor stator 41 are arranged so as to be in non-contact with each other when they are in the reference position, and are separate from each other. It is to be noted that not only are they in non-contact with each other when they are in the reference position, but preferably, the gas supply unit 50, the reaction force processing linear motor mover 42, and the reaction force processing linear motor stator 41 are always in non-contact with each other. In addition, in this embodiment, an example has been shown in which the gas supply unit 50 reduces the vibration of the linear motor mover 42 for reaction force processing, but as long as the vibration of the mover can be reduced, the application is not limited to mechanisms for reaction force processing.

[0046] In addition, in the present embodiment, an example in which the stage device 100 constitutes a part of a projection optical system has been shown, but the stage device 100 may constitute a part of a drawing device that draws on a substrate using, for example, an electron beam or an ion beam to form a pattern on the substrate. Alternatively, the stage device 100 may constitute a part of another exposure device, for example, an imprint device that forms a pattern on the substrate by molding an imprint material on the substrate using a mold. Alternatively, the stage device 100 may constitute a part of another substrate processing device that processes a substrate W such as a wafer or glass, such as an ion implantation device, a development device, an etching device, a film formation device, an annealing device, a sputtering device, or a deposition device. Also, the stage device 100 may constitute a part of a planarization device that planarizes a composition on a substrate using a flat plate.

[0047] In this embodiment, the stator support 7a is disposed on the base frame 6 in the example of FIG. 1, but may be installed on the floor independently of the base frame 6. Also, in the example of FIG. 1, two stator support parts 7a are disposed side by side with a gap in the Y-axis direction, but the number of stator support parts 7a may be one. For example, one of the two stator support parts 7a spaced apart in the Y-axis direction in FIG. 1 may be removed, and the other may be disposed at the center position in the Y-axis direction of the reaction force processing linear motor stator 41. Alternatively, one stator support part 7a having a length in the Y-axis direction approximately equal to that of the reaction force processing linear motor stator 41 may be disposed.

[0048] According to this embodiment, it is possible to reduce vibration of the reaction force processing linear motor mover 42. Furthermore, it is also possible to reduce the possibility of interference (contact) between the reaction force processing linear motor mover 42 and the reaction force processing linear motor stator 41. Due to these actions, it is possible to reduce adverse effects on the processing results (alignment accuracy, overlay accuracy) of the substrate W.

[0049] <Second embodiment> 4 is a schematic diagram of exposure apparatus 200 in this embodiment. Exposure apparatus 200 has an illumination optical system 2 that irradiates light, a projection optical system 3, a reticle stage 14 that can be driven while holding a reticle 4, and a stage device 100 that can be driven while holding a substrate W. In this embodiment, an example is shown in which a controller 9 that controls stage device 100 controls each component of exposure apparatus 200, but each component of exposure apparatus 200 other than stage device 100 may also be controlled by a separate controller.

[0050] The reticle 4 is, for example, an original plate in which a pattern to be transferred (for example, a circuit pattern) is formed on the surface of quartz glass with chrome. The substrate W is, for example, single crystal silicon, and the substrate W transported to the exposure apparatus 200 has a photosensitive material (resist) applied on its surface.

[0051] In the exposure apparatus 200, exposure light from a light source (not shown) illuminates the reticle 4 via the illumination optical system 2. The light transmitted through the reticle 4 is irradiated onto the substrate W via the projection optical system 3. At this time, light from a pattern formed on the reticle 4 forms an image on the surface of the substrate W, and the substrate W (photosensitive material) is exposed to the pattern image. The exposure apparatus 200 thus exposes the shot area on the substrate W, and similarly exposes each of the multiple shot areas. Note that in this embodiment, the exposure apparatus 200 has been taken as an example of the substrate processing apparatus, and an example has been described in which the processing section that processes (exposes) the substrate W is the illumination optical system 2 and the projection optical system 3. However, the substrate W may be processed by a processing section in another substrate processing apparatus including the stage apparatus 100.

[0052] According to this embodiment, the substrate W can be processed in a state where the vibration of the reaction force processing linear motor movable element 42 in the stage device 100 is reduced. This makes it possible to reduce adverse effects on the processing results of the substrate W (alignment accuracy, overlay accuracy).

[0053] <Third embodiment> The present embodiment is characterized in that an article is manufactured using the above-described stage apparatus 100.

[0054] 5 is a flowchart of a method for manufacturing an article in this embodiment. First, a holding step (S110) is performed in which a substrate W is held by a stage device. Next, a vibration reduction step (S120) is performed in which vibrations generated when the substrate W held in the holding step is moved is performed. Then, a formation step (S130) is performed in which a pattern is formed on the substrate W held in the holding step, and a manufacturing step (S140) is performed in which an article is manufactured from the substrate W on which the pattern has been formed in the formation step.

[0055] Here, stage device 100 that holds substrate W has a drive unit that moves a holder that holds the substrate, a linear motor that can reduce the reaction force generated by driving the drive unit and includes a mover and a stator, and a gas supply unit 50. The gas supply unit 50 blows gas onto the mover from two directions that sandwich the mover. In the vibration reduction step, vibration is reduced by blowing gas from the gas supply unit 50.

[0056] Products manufactured by this manufacturing method include, for example, semiconductor IC elements, liquid crystal display elements, color filters, MEMS, and the like.

[0057] In the forming step, for example, a substrate (silicon wafer, glass plate, etc.) coated with a photosensitive material is exposed to light by an exposure apparatus (lithography apparatus) to form a pattern on the substrate.

[0058] The manufacturing process includes, for example, developing a substrate (photosensitive material) on which a pattern is formed, etching the developed substrate, removing the resist, dicing, bonding, and packaging. According to this manufacturing method, it is possible to manufacture products of higher quality than conventional methods.

[0059] The disclosure of this specification includes the following stage apparatus, substrate processing apparatus, and method for manufacturing an article.

[0060] [Item 1] a drive unit that moves a holder that holds the substrate; a linear motor capable of reducing a reaction force generated by driving the driving unit and including a mover and a stator; a gas supply unit that blows gas onto the movable element from two directions on either side of the movable element; A stage device comprising:

[0061] [Item 2] The gas is blown from the gas supply unit to reduce vibration of the movable element. 2. The stage apparatus according to item 1,

[0062] [Item 3] A support part for supporting the gas supply part, 3. The stage device according to item 1 or 2, wherein the support portion is a separate body from the mover and the stator.

[0063] [Item 4] 4. The stage device according to any one of items 1 to 3, wherein the mover is integrated with the drive section.

[0064] [Item 5] 5. The stage device according to any one of items 1 to 4, wherein the stator, the mover, and the gas supply unit are not in contact with each other.

[0065] [Item 6] It has a vibration isolation section that can reduce vibrations from the floor, the movable element, the gas supply unit, and the support unit are disposed at positions where they are vibration-isolated by the vibration-isolating unit, and the stator is disposed at a position where they are not vibration-isolated by the vibration-isolating unit. 4. The stage apparatus according to item 3,

[0066] [Item 7] A surface plate is disposed on a vibration isolator capable of reducing vibration from a floor, The mover is coupled to a member on the base plate, The support is coupled to the base. 4. The stage apparatus according to item 3,

[0067] [Item 8] The gas supply unit extends in a moving direction of the movable element. 8. The stage device according to any one of items 1 to 7, wherein:

[0068] [Item 9] 9. The stage device according to any one of items 1 to 8, wherein a distance between the gas supply unit and the mover is shorter than a distance between the stator and the mover.

[0069] [Item 10] 10. The stage device according to any one of items 1 to 9, wherein the distance between the gas supply unit and the stator is greater than the maximum amplitude of a vibration isolation unit capable of reducing vibrations from a floor.

[0070] [Item 11] The gas supply unit is hollow, and a plurality of holes are provided on a surface of the gas supply unit, 11. The stage device according to any one of items 1 to 10, wherein the gas supplied into the hollow space is blown onto the mover through the plurality of holes.

[0071] [Item 12] 12. The stage device according to any one of items 1 to 11, wherein the gas supply unit is disposed in a space between two magnets included in the stator.

[0072] [Item 13] 13. The stage device according to any one of items 1 to 12, further comprising a control unit that controls at least one of the amount and timing of the gas blown from the gas supply unit.

[0073] [Item 14] a stage device capable of holding and driving a substrate; a processing section for performing processing on the substrate, The stage device includes: a drive unit that moves a holder that holds the substrate; a linear motor capable of reducing a reaction force generated by driving the driving unit and including a mover and a stator; and a gas supply unit that blows gas onto the movable element from two directions across the movable element. The substrate processing apparatus according to claim 1,

[0074] [Item 15] a holding step of holding the substrate on the stage device; a vibration reduction step of reducing vibrations that occur when the substrate held in the holding step is moved; a forming step of forming a pattern on the substrate held in the holding step; a manufacturing process for manufacturing an article from the substrate on which the pattern is formed in the forming process; Including, The stage device includes: a drive unit that moves a holder that holds the substrate; a linear motor capable of reducing a reaction force generated by driving the driving unit and including a mover and a stator; a gas supply unit that blows gas onto the movable element from two directions across the movable element, In the vibration reducing step, the vibration is reduced by blowing the gas from the gas supply unit. A method for producing an article.

[0075] The invention is not limited to the above-described embodiments, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention.

Claims

1. a drive unit that moves a holder that holds the substrate; a linear motor capable of reducing a reaction force generated by driving the driving unit and including a mover and a stator; a gas supply unit that blows gas onto the movable element from two directions across the movable element; A stage device comprising:

2. The gas is blown from the gas supply unit to reduce vibration of the movable element.

2. The stage apparatus according to claim 1 .

3. A support part for supporting the gas supply part, 2. The stage device according to claim 1, wherein the support portion is a separate body from the movable element and the stator.

4. 2. The stage device according to claim 1, wherein the movable element is integral with the driving section.

5. 2. The stage device according to claim 1, wherein the stator, the mover, and the gas supply unit are not in contact with one another.

6. It has a vibration isolation section that can reduce vibrations from the floor, the movable element, the gas supply unit, and the support unit are disposed at positions where they are vibration-isolated by the vibration-isolating unit, and the stator is disposed at a position where they are not vibration-isolated by the vibration-isolating unit.

4. The stage apparatus according to claim 3.

7. A surface plate is disposed on a vibration isolator capable of reducing vibration from a floor, The mover is coupled to a member on the base plate, The support is coupled to the base.

4. The stage apparatus according to claim 3.

8. The gas supply unit extends in a moving direction of the movable element.

2. The stage apparatus according to claim 1 .

9. 2. The stage apparatus according to claim 1, wherein a distance between said gas supply unit and said movable element is shorter than a distance between said stator and said movable element.

10. 2. The stage device according to claim 1, wherein the distance between said gas supply unit and said stator is greater than a maximum amplitude of a vibration isolator capable of reducing vibrations from a floor.

11. The gas supply unit is hollow, and a plurality of holes are provided on a surface of the gas supply unit, 2. The stage device according to claim 1, wherein the gas supplied into the hollow space is blown onto the movable element through the plurality of holes.

12. 2. The stage apparatus according to claim 1, wherein the gas supply unit is disposed in a space between two magnets included in the stator.

13. 2. The stage device according to claim 1, further comprising a control unit that controls at least one of an amount of the gas blown from the gas supply unit and a timing of the blowing.

14. a stage device capable of holding and driving a substrate; a processing section for performing processing on the substrate, The stage device includes: a drive unit that moves a holder that holds the substrate; a linear motor capable of reducing a reaction force generated by driving the driving unit and including a mover and a stator; and a gas supply unit that blows gas onto the movable element from two directions across the movable element. The substrate processing apparatus according to claim 1,

15. a holding step of holding the substrate on the stage device; a vibration reduction step of reducing vibrations that occur when the substrate held in the holding step is moved; a forming step of forming a pattern on the substrate held in the holding step; a manufacturing process for manufacturing an article from the substrate on which the pattern is formed in the forming process; Including, The stage device includes: a drive unit that moves a holder that holds the substrate; a linear motor capable of reducing a reaction force generated by driving the driving unit and including a mover and a stator; a gas supply unit that blows gas onto the movable element from two directions across the movable element, In the vibration reducing step, the vibration is reduced by blowing the gas from the gas supply unit. A method for producing an article comprising the steps of:

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