Substrate processing apparatus

Abstract

To provide a substrate processing apparatus which can save environmental resources.SOLUTION: A substrate processing apparatus (100) processes a substrate. The substrate processing apparatus (100) includes a plurality of pipes flowing a fluid therein. The plurality of pipes include at least one inside virgin material pipe (2a). The inside virgin material pipe (2a) has an inner layer (21) and an outer layer (22). The inner layer (21) contains a virgin material (20a) of a fluororesin. The outer layer (22) is formed outside the inner layer (21). The outer layer (22) contains a recycled material (20b) of a fluororesin. The inside of the inner layer (21) flows a fluid therein.SELECTED DRAWING: Figure 2A-B

Description

[Technical field]

[0001] The present invention relates to a substrate processing apparatus. [Background technology]

[0002] The substrate processing apparatus includes piping for circulating a processing liquid and piping for circulating a gas. The piping for circulating a processing liquid is made of a fluororesin molded product (see, for example, Patent Document 1). Of the piping for circulating a gas, the piping arranged under a chemical liquid atmosphere is made of a fluororesin molded product. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2020-155649 A Summary of the Invention [Problem to be solved by the invention]

[0004] However, there is a greater demand than ever before for the conservation of environmental resources. Because the raw materials for fluororesin are natural products and the amount of these resources is limited, there is also a demand to conserve the raw materials (environmental resources) used for fluororesin.

[0005] The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus capable of saving environmental resources. [Means for solving the problem]

[0006] According to one aspect of the present invention, a substrate processing apparatus processes a substrate. The substrate processing apparatus includes a plurality of pipes through which a fluid flows. The plurality of pipes includes at least one inner virgin material pipe. The inner virgin material pipe has an inner layer and an outer layer. The inner layer contains a virgin fluororesin material. The outer layer is formed on the outside of the inner layer. The outer layer contains a recycled fluororesin material. The fluid flows inside the inner layer.

[0007] In one embodiment, the substrate processing apparatus further includes a substrate processing section that performs substrate processing on the substrate. The substrate processing section has a chamber that accommodates the substrate. The plurality of pipes include a chamber outer pipe. The chamber outer pipe is disposed outside the chamber. The chamber outer pipe distributes the fluid to be supplied to the substrate processing section. The chamber outer pipe includes the inner virgin material pipe.

[0008] In one embodiment, the substrate processing apparatus further includes a nozzle. The nozzle is disposed within the chamber. The nozzle ejects the fluid within the chamber. The plurality of pipes includes an intra-chamber supply pipe. The intra-chamber supply pipe is disposed within the chamber. The intra-chamber supply pipe distributes the fluid to be supplied to the nozzle. The intra-chamber supply pipe includes a virgin material pipe. At least an inner surface and an outer surface of the virgin material pipe are made of a virgin material of a fluororesin.

[0009] In one embodiment, the substrate processing apparatus further includes a substrate processing unit and a fluid cabinet. The substrate processing unit performs substrate processing on the substrate. The fluid cabinet contains a liquid to be supplied to the substrate processing unit. The substrate processing unit has a chamber that contains the substrate. The plurality of pipes include a recovery pipe. The recovery pipe recovers the liquid discharged from the substrate processing unit to the fluid cabinet. The recovery pipe includes an external chamber recovery pipe arranged outside the chamber. The external chamber recovery pipe includes the inner virgin material pipe.

[0010] In one embodiment, the recovery pipe includes an intra-chamber recovery pipe disposed within the chamber. The intra-chamber recovery pipe includes a virgin material pipe. At least an inner surface and an outer surface of the virgin material pipe are made of a virgin material such as a fluororesin.

[0011] In one embodiment, the inner virgin material pipe further includes a barrier layer formed between the inner layer and the outer layer.

[0012] In one embodiment, the thickness of the inner layer is less than the thickness of the outer layer.

[0013] In one embodiment, the inner virgin material pipe is colored.

[0014] In one embodiment, the plurality of pipes include virgin material pipes having at least an inner surface and an outer surface made of a virgin material of fluororesin, and the virgin material pipes have a color different from that of the inner virgin material pipe.

[0015] According to another aspect of the present invention, a substrate processing apparatus processes a substrate. The substrate processing apparatus includes a plurality of pipes through which a fluid flows. The plurality of pipes includes at least one inner recycled material pipe. The inner recycled material pipe has an inner layer and an outer layer. The inner layer contains a recycled material of a fluororesin. The outer layer is formed on the outside of the inner layer. The outer layer contains a virgin material of a fluororesin. The fluid flows inside the inner layer.

[0016] In one embodiment, the substrate processing apparatus further includes a substrate processing unit that performs substrate processing on the substrate. The substrate processing unit has a chamber that accommodates the substrate. The plurality of pipes includes a discharge pipe that discharges the fluid from the substrate processing unit. The discharge pipe includes an intra-chamber discharge pipe that is disposed within the chamber. The intra-chamber discharge pipe includes the inner regenerator pipe.

[0017] In one embodiment, the exhaust pipe includes an external exhaust pipe arranged outside the chamber. The external exhaust pipe includes a recycled material pipe made of a recycled material of a fluororesin.

[0018] In one embodiment, the inner recycled material pipe further includes a barrier layer formed between the inner layer and the outer layer.

[0019] In one embodiment, the thickness of the outer layer is less than the thickness of the inner layer.

[0020] In one embodiment, the inner recycled material pipe is colored.

[0021] In one embodiment, the plurality of pipes includes recycled material pipes made of recycled material of fluororesin, the recycled material pipes are colored, and at least one of the inner recycled material pipes and the recycled material pipes is marked. Effect of the Invention

[0022] The substrate processing apparatus according to the present invention can conserve environmental resources. [Brief description of the drawings]

[0023] [Figure 1] 1 is a schematic diagram of a substrate processing apparatus according to an embodiment of the present invention; [Figure 2A-B] FIG. 2A shows a cross-section of an inner virgin material piping provided in a substrate processing apparatus according to an embodiment of the present invention, and FIG. 2B shows a cross-section of an inner recycled material piping provided in a substrate processing apparatus according to an embodiment of the present invention. [Figure 3A-B] FIG. 3A shows a cross-section of a virgin material pipe provided in a substrate processing apparatus according to an embodiment of the present invention, and FIG. 3B shows a cross-section of a recycled material pipe provided in a substrate processing apparatus according to an embodiment of the present invention. [Figure 4] 1 is a cross-sectional view illustrating a schematic configuration of a substrate processing section included in a substrate processing apparatus according to an embodiment of the present invention. [Diagram 5] 1 is a diagram showing a part of a configuration of a substrate processing apparatus according to an embodiment of the present invention; [Figure 6A-B] FIG. 6A is a diagram showing a modified example of the inner virgin material piping, and FIG. 6B is a diagram showing a modified example of the inner recycled material piping. [Figure 7A-D] FIG. 7A shows a modified example of the inner virgin material piping, FIG. 7B shows a modified example of the inner recycled material piping, FIG. 7C shows virgin material piping, and FIG. 7D shows a modified example of the recycled material piping. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0024] Hereinafter, an embodiment of the substrate processing apparatus of the present invention will be described with reference to the drawings (FIGS. 1 to 7D). However, the present invention is not limited to the following embodiment, and can be embodied in various forms without departing from the gist of the present invention. Note that where the description is repeated, it may be omitted as appropriate. Also, in the drawings, the same or corresponding parts are denoted by the same reference symbols, and description will not be repeated.

[0025] The "substrate" to be processed in the substrate processing apparatus according to the present invention can be a semiconductor wafer, a glass substrate for a photomask, a glass substrate for a liquid crystal display, a glass substrate for a plasma display, a substrate for an FED (Field Emission Display), a substrate for an optical disk, a substrate for a magnetic disk, and a substrate for a magneto-optical disk. In the following, an embodiment of the present invention will be described mainly taking as an example a case in which a disk-shaped semiconductor wafer is the substrate to be processed, but the substrate processing apparatus according to the present invention can be similarly applied to various substrates other than the above-mentioned semiconductor wafer. Furthermore, the shape of the substrate is not limited to a disk shape, and the substrate processing apparatus according to the present invention can be applied to substrates of various shapes.

[0026] Fig. 1 is a schematic diagram of a substrate processing apparatus 100 according to the present embodiment. More specifically, Fig. 1 is a schematic plan view of the substrate processing apparatus 100 according to the present embodiment. The substrate processing apparatus 100 processes substrates W. The substrate processing apparatus 100 according to the present embodiment is a single-wafer type apparatus, and processes the substrates W one by one using a processing liquid. The substrate processing apparatus 100 is, for example, a cleaning apparatus or an etching apparatus.

[0027] As shown in FIG. 1, the substrate processing apparatus 100 includes a plurality of substrate processing units 300, a fluid cabinet 410, a plurality of fluid boxes 420, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a controller 400.

[0028] Each load port LP accommodates multiple substrates W in a stacked state. The indexer robot IR transports the substrates W between the load port LP and the center robot CR. The center robot CR transports the substrates W between the indexer robot IR and the substrate processing unit 300. Note that a placement stage (path) on which the substrate W is temporarily placed may be provided between the indexer robot IR and the center robot CR, and the device may be configured to indirectly transfer the substrate W between the indexer robot IR and the center robot CR via the placement stage.

[0029] The substrate processing units 300 form a plurality of towers TW (four towers TW in FIG. 1). The towers TW are arranged to surround the center robot CR in a plan view. Each tower TW includes a plurality of substrate processing units 300 (three substrate processing units 300 in FIG. 1) stacked vertically.

[0030] The fluid cabinet 410 contains a fluid. The fluid includes a processing liquid. Alternatively, the fluid may include a processing liquid and a gas, or may include only a gas. In this embodiment, the fluid cabinet 410 contains a processing liquid and a gas. The gas includes, for example, an inert gas. The inert gas is, for example, nitrogen gas. The processing liquid is not particularly limited as long as it is a liquid that contacts the substrate W. The processing liquid may include, for example, a chemical liquid and a rinse liquid.

[0031] The chemicals are, for example, dilute hydrofluoric acid (DHF), hydrofluoric acid (HF), hydrofluoric nitric acid (hydrofluoric acid and nitric acid (HNO 3 )), buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), phosphoric acid (H 3 PO 4 ), sulfuric acid, acetic acid, nitric acid, hydrochloric acid, ammonia water, hydrogen peroxide water, organic acids (e.g., citric acid, oxalic acid), organic alkalis (e.g., TMAH: tetramethylammonium hydroxide), sulfuric acid / hydrogen peroxide water mixture (SPM), ammonia / hydrogen peroxide water mixture (SC1), hydrochloric acid / hydrogen peroxide water mixture (SC2), isopropyl alcohol (IPA), methanol, ethanol, hydrofluoroether (HFE), surfactants, or corrosion inhibitors.

[0032] The rinse liquid is, for example, deionized water (DIW). In other words, the rinse liquid may be so-called "ultrapure water". However, the rinse liquid is not limited to deionized water. For example, the rinse liquid may be carbonated water, electrolytic ionized water, hydrogen water, ozone water, ammonia water, or diluted hydrochloric acid water (for example, hydrochloric acid water with a concentration of about 10 ppm to 100 ppm).

[0033] Each of the fluid boxes 420 corresponds to one of the towers TW. The processing liquid and gas in the fluid cabinet 410 are supplied to all the substrate processing units 300 included in the corresponding tower TW via any of the fluid boxes 420. That is, the fluid cabinet 410 contains the fluid to be supplied to the substrate processing units 300.

[0034] Each of the substrate processing units 300 performs substrate processing on the substrate W. In this embodiment, each of the substrate processing units 300 processes the substrate W using a processing liquid. For example, each of the substrate processing units 300 performs an etching process or a cleaning process on the substrate W.

[0035] The control device 400 controls the operation of each part of the substrate processing apparatus 100. For example, the control device 400 controls the substrate processing unit 300, the load port LP, the indexer robot IR, and the center robot CR. The control device 400 includes a control unit 401 and a storage unit 402.

[0036] The control unit 401 controls the operation of each unit of the substrate processing apparatus 100 based on various information stored in the storage unit 402. The control unit 401 has, for example, a processor. The control unit 401 may have a CPU (Central Processing Unit) or an MPU (Micro Processing Unit) as the processor. Alternatively, the control unit 401 may have a general-purpose computing device or a dedicated computing device.

[0037] The storage unit 402 stores various types of information for controlling the operation of the substrate processing apparatus 100. For example, the storage unit 402 stores various types of data and various computer programs. The various types of data include recipe data. The recipe data indicates a recipe that specifies the processing content, processing conditions, and processing procedure of the substrate W. In the recipe, various setting values ​​are set as processing conditions.

[0038] The storage unit 402 includes a main storage device. The main storage device includes, for example, a semiconductor memory. The storage unit 402 may further include an auxiliary storage device. The auxiliary storage device includes, for example, at least one of a semiconductor memory and a hard disk drive. The storage unit 402 may include a removable medium.

[0039] Next, the inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d provided in the substrate processing apparatus 100 of this embodiment will be described with reference to Figures 2A, 2B, 3A, and 3B. Figure 2A is a diagram showing a cross section of the inner virgin material pipe 2a provided in the substrate processing apparatus 100 of this embodiment. Figure 2B is a diagram showing a cross section of the inner recycled material pipe 2b provided in the substrate processing apparatus 100 of this embodiment. Figure 3A is a diagram showing a cross section of the virgin material pipe 2c provided in the substrate processing apparatus 100 of this embodiment. Figure 3B is a diagram showing a cross section of the recycled material pipe 2d provided in the substrate processing apparatus 100 of this embodiment.

[0040] As shown in FIG. 2A, the substrate processing apparatus 100 includes an inner virgin material pipe 2a. As shown in FIG. 2B, the substrate processing apparatus 100 includes an inner recycled material pipe 2b. As shown in FIG. 3A, the substrate processing apparatus 100 includes a virgin material pipe 2c. As shown in FIG. 3B, the substrate processing apparatus 100 includes a recycled material pipe 2d. The inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d are tubular members that allow fluid to flow. Specifically, the inner virgin material pipe 2a allows processing liquid or gas to flow. Similarly, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d allow processing liquid or gas to flow.

[0041] As shown in Fig. 2A, the inner virgin material pipe 2a has an inner layer 21 and an outer layer 22. The outer layer 22 is formed on the outside of the inner layer 21. In this embodiment, the inner virgin material pipe 2a is a two-layer pipe. The inner virgin material pipe 2a is manufactured by, for example, an extrusion molding method.

[0042] The inner layer 21 of the inner virgin material pipe 2a contains a fluororesin virgin material 20a. Specifically, the inner layer 21 of the inner virgin material pipe 2a is composed of a fluororesin virgin material 20a. The fluororesin virgin material 20a refers to new fluororesin.

[0043] The inner layer 21 forms a flow path 20r. Specifically, the inner space of the inner layer 21 becomes the flow path 20r. Therefore, in the inner virgin material pipe 2a, the virgin material 20a made of fluororesin is exposed to the flow path 20r. A fluid (treatment liquid or gas) flows through the flow path 20r. That is, the fluid flows inside the inner layer 21.

[0044] The outer layer 22 of the inner virgin material pipe 2a contains the recycled fluororesin material 20b. Specifically, the outer layer 22 of the inner virgin material pipe 2a is composed of the recycled fluororesin material 20b. Therefore, in the inner virgin material pipe 2a, the recycled fluororesin material 20b is exposed to the atmosphere surrounding the inner virgin material pipe 2a.

[0045] The thickness Th1 (wall thickness) of the inner layer 21 of the inner virgin material pipe 2a is smaller than the thickness Th2 (wall thickness) of the outer layer 22 of the inner virgin material pipe 2a. Therefore, the amount of fluororesin used in the inner virgin material pipe 2a can be reduced compared to when, for example, the thickness Th1 of the inner layer 21 and the thickness Th2 of the outer layer 22 are equal. Therefore, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced, and environmental resources can be saved.

[0046] The inner diameter D1 of the inner virgin material pipe 2a is, for example, 4 [mm]. The outer diameter D2 of the inner virgin material pipe 2a is, for example, 6 [mm]. The wall thickness (Th1+Th2) of the inner virgin material pipe 2a is, for example, 1 [mm]. The thickness Th1 of the inner layer 21 of the inner virgin material pipe 2a is, for example, 0.2 [mm]. The thickness Th2 of the outer layer 22 of the inner virgin material pipe 2a is, for example, 0.8 [mm].

[0047] 2B, like the inner virgin material pipe 2a, the inner recycled material pipe 2b has an inner layer 21 and an outer layer 22. In this embodiment, the inner recycled material pipe 2b is a two-layer pipe.

[0048] The inner layer 21 of the inner recycled material pipe 2b contains a recycled material 20b of fluororesin. Specifically, the inner layer 21 of the inner recycled material pipe 2b is composed of a recycled material 20b of fluororesin. The inner layer 21 of the inner recycled material pipe 2b forms a flow path 20r, similar to the inner virgin material pipe 2a. Therefore, in the inner recycled material pipe 2b, the recycled material 20b of fluororesin is exposed to the flow path 20r.

[0049] The outer layer 22 of the inner recycled material pipe 2b contains a virgin fluororesin material 20a. Specifically, the outer layer 22 of the inner recycled material pipe 2b is composed of a virgin fluororesin material 20a. Therefore, in the inner recycled material pipe 2b, the virgin fluororesin material 20a is exposed to the atmosphere surrounding the inner recycled material pipe 2b.

[0050] The thickness Th3 (wall thickness) of the inner layer 21 of the inner recycled material pipe 2b is greater than the thickness Th4 (wall thickness) of the outer layer 22 of the inner recycled material pipe 2b. Therefore, the amount of fluororesin used in the inner recycled material pipe 2b can be reduced compared to when, for example, the thickness Th3 of the inner layer 21 and the thickness Th4 of the outer layer 22 are equal. Therefore, the amount of virgin fluororesin used in the substrate processing apparatus 100 can be reduced, thereby saving environmental resources.

[0051] The inner diameter D1 of the inner recycled material pipe 2b is, for example, 4 [mm]. The outer diameter D2 of the inner recycled material pipe 2b is, for example, 6 [mm]. The wall thickness (Th3+Th4) of the inner recycled material pipe 2b is, for example, 1 [mm]. The thickness Th3 of the inner layer 21 of the inner recycled material pipe 2b is, for example, 0.8 [mm]. The thickness Th4 of the outer layer 22 of the inner recycled material pipe 2b is, for example, 0.2 [mm].

[0052] As shown in Fig. 3A, in this embodiment, the virgin material pipe 2c is a tubular member made of a single layer of fluororesin. The virgin material pipe 2c forms a flow path 20r. Specifically, the inner space of the virgin material pipe 2c becomes the flow path 20r. Therefore, the fluid (treatment liquid or gas) flows inside the virgin material pipe 2c (flow path 20r).

[0053] The virgin material pipe 2c contains a virgin material 20a made of fluororesin. Specifically, the virgin material pipe 2c is made of a virgin material 20a made of fluororesin. Therefore, in the virgin material pipe 2c, the virgin material 20a made of fluororesin is exposed to the flow path 20r. Also, the virgin material 20a made of fluororesin is exposed to the atmosphere surrounding the virgin material pipe 2c.

[0054] The virgin material pipe 2c has an inner diameter D1 of, for example, 4 mm, an outer diameter D2 of, for example, 6 mm, and a wall thickness Th5 of, for example, 1 mm.

[0055] As shown in FIG. 3B, in this embodiment, the recycled material pipe 2d is a tubular member made of a single layer of fluororesin. The recycled material pipe 2d forms a flow path 20r, similar to the virgin material pipe 2c. Therefore, the fluid (treatment liquid or gas) flows inside the recycled material pipe 2d (flow path 20r).

[0056] The recycled material pipe 2d contains the recycled material 20b of fluororesin. Specifically, the recycled material pipe 2d is composed of the recycled material 20b of fluororesin. Therefore, in the recycled material pipe 2d, the recycled material 20b of fluororesin is exposed to the flow path 20r. Also, the recycled material 20b of fluororesin is exposed to the atmosphere surrounding the recycled material pipe 2d.

[0057] The inside diameter D1 of the recycled material pipe 2d is, for example, 4 mm. The outside diameter D2 of the recycled material pipe 2d is, for example, 6 mm. The wall thickness Th6 of the recycled material pipe 2d is, for example, 1 mm.

[0058] The fluororesin used in the inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d is, for example, polytetrafluoroethylene (PTFE), tetrafluoroethylene-perfluoroalkoxyethylene copolymer (PFA), tetrafluoroethylene-hexafluoropropylene copolymer (FEP), or tetrafluoroethylene-ethylene copolymer (ETFE).

[0059] For example, virgin and recycled PFA materials are used for the inner virgin material pipe 2a and inner recycled material pipe 2b through which the treatment liquid flows. Virgin PFA material is used for the virgin material pipe 2c through which the treatment liquid flows. Recycled PFA material is used for the recycled material pipe 2d through which the treatment liquid flows. Virgin and recycled PFA or PTFE materials are used for the inner virgin material pipe 2a and inner recycled material pipe 2b through which gas flows. Virgin PFA or PTFE material is used for the virgin material pipe 2c through which gas flows. Recycled PFA or PTFE material is used for the recycled material pipe 2d through which gas flows.

[0060] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 4. Fig. 4 is a cross-sectional view that typically shows the configuration of a substrate processing section 300 included in the substrate processing apparatus 100 of this embodiment.

[0061] 4, the substrate processing apparatus 300 includes a chamber 301, an FFU (fan filter unit) 302, a spin chuck 3, a spin motor unit 4, a first nozzle 5, a nozzle moving unit 6, a liquid receiving unit 7, a blocking member 8, a first lifting unit 76, and a second lifting unit 85. The substrate processing apparatus 100 further includes a first processing liquid line 11L, a second processing liquid line 12L, a first gas line 14L, a recovery line 15L, a drain line 16L, and an exhaust line 17L.

[0062] The chamber 301 has a substantially box-like shape and accommodates the spin chuck 3, the spin motor unit 4, the first nozzle 5, the nozzle moving unit 6, the liquid receiving unit 7, the blocking member 8, the first lifting unit 76, the second lifting unit 85, a part of the first processing liquid line 11L, a part of the second processing liquid line 12L, a part of the first gas line 14L, a part of the recovery line 15L, a part of the drainage line 16L, and a part of the exhaust line 17L.

[0063] The substrate W is loaded into the chamber 301. Thus, the chamber 301 accommodates the substrate W. The substrate W is processed in the chamber 301.

[0064] The FFU 302 is disposed outside the chamber 301. The FFU 302 blows air toward the inner space of the chamber 301, generating a downflow within the chamber 301.

[0065] More specifically, the FFU 302 blows air from within a clean room in which the substrate processing apparatus 100 is installed toward the inner space of the chamber 301. More specifically, the FFU 302 has blades, an electric motor, and a filter. The blades rotate to draw in air from within the clean room and blow the drawn air toward the inner space of the chamber 301. The electric motor rotates the blades. The filter filters the air blown by the rotating blades. As a result, air purified by the filter is blown toward the inner space of the chamber 301.

[0066] The spin chuck 3 holds the substrate W in a horizontal position. As shown in FIG. 4, the spin chuck 3 may have a spin base 31 and multiple chuck members 32. The spin base 31 is substantially disk-shaped and supports the multiple chuck members 32 in a horizontal position. The multiple chuck members 32 are disposed on the periphery of the spin base 31. The multiple chuck members 32 clamp the periphery of the substrate W. The multiple chuck members 32 hold the substrate W in a horizontal position. The operation of the multiple chuck members 32 is controlled by a control device 400 (a control unit 401).

[0067] The spin motor unit 4 rotates the spin chuck 3 and the substrate W together around a first rotation axis AX1 extending in the vertical direction. The control device 400 (control unit 401) controls the rotation of the substrate W by the spin motor unit 4. More specifically, the first rotation axis AX1 passes through the center of the spin base 31. The multiple chuck members 32 are arranged such that the center of the substrate W faces the center of the spin base 31. Therefore, the substrate W rotates around the center of the substrate W as the rotation center.

[0068] 4, the spin motor unit 4 may have a motor body 41 and a shaft 42. The shaft 42 is coupled to the spin base 31. The motor body 41 rotates the shaft 42. As a result, the spin base 31 rotates. The operation of the motor body 41 is controlled by a control device 400 (a control unit 401).

[0069] The first nozzle 5 is disposed in the chamber 301 and discharges a chemical liquid (fluid) within the chamber 301. Specifically, the first nozzle 5 discharges the chemical liquid from a position above the substrate W held by the spin chuck 3 toward the upper surface of the rotating substrate W. As the chemical liquid is discharged onto the upper surface of the rotating substrate W, a liquid film of the chemical liquid is formed on the upper surface of the substrate W. As a result, the upper surface of the substrate W is treated with the chemical liquid.

[0070] The first processing liquid line 11L supplies the chemical liquid to the first nozzle 5. As shown in Fig. 4, the first processing liquid line 11L has a first chemical liquid piping 111, a second chemical liquid piping 112, and a first on-off valve 113. The first chemical liquid piping 111 and the second chemical liquid piping 112 are tubular members through which the chemical liquid (liquid) flows.

[0071] First chemical liquid piping 111 is disposed outside chamber 301. First chemical liquid piping 111 circulates a chemical liquid (fluid) to be supplied to substrate processing section 300. Specifically, first chemical liquid piping 111 supplies a chemical liquid (liquid) to substrate processing section 300. A portion of first chemical liquid piping 111 is housed in fluid box 420 described with reference to FIG. 1. In this embodiment, inner virgin material piping 2a described with reference to FIG. 2A is used for first chemical liquid piping 111. First chemical liquid piping 111 is an example of "piping outside the chamber".

[0072] Second chemical liquid pipe 112 is housed in chamber 301. In other words, second chemical liquid pipe 112 is disposed in chamber 301. In this embodiment, virgin material pipe 2c described with reference to Fig. 3A is used for second chemical liquid pipe 112. Second chemical liquid pipe 112 is an example of "intra-chamber supply pipe".

[0073] Second chemical liquid piping 112 passes the chemical liquid (fluid) to be supplied to first nozzle 5. Specifically, the upstream end of second chemical liquid piping 112 is connected to the downstream end of first chemical liquid piping 111. Therefore, the chemical liquid flows from first chemical liquid piping 111 to second chemical liquid piping 112. Second chemical liquid piping 112 passes the chemical liquid that has flowed in from first chemical liquid piping 111 to first nozzle 5. For example, the upstream end of second chemical liquid piping 112 and the downstream end of first chemical liquid piping 111 may be connected via a joint.

[0074] The first on-off valve 113 is interposed in the first chemical liquid pipe 111. The first on-off valve 113 is housed in the fluid box 420 described with reference to FIG. 1. The first on-off valve 113 is switchable between an open state and a closed state. The control device 400 (control unit 401) controls the opening and closing operation of the first on-off valve 113. The actuator of the first on-off valve 113 is, for example, a pneumatic actuator.

[0075] The first on-off valve 113 controls the flow and stop of the flow of the chemical liquid (liquid) through the first chemical liquid piping 111 and the second chemical liquid piping 112. In other words, the first on-off valve 113 controls the supply of the chemical liquid to the first nozzle 5 and the stop of the supply.

[0076] The control device 400 (control unit 401) opens the first on-off valve 113 when supplying the chemical liquid to the substrate W. As a result, the chemical liquid flows through the first chemical liquid piping 111 and the second chemical liquid piping 112 toward the first nozzle 5, and the chemical liquid is discharged from the first nozzle 5 toward the substrate W.

[0077] The control device 400 (control unit 401) closes the first on-off valve 113 when stopping the discharge of the chemical liquid from the first nozzle 5. As a result, the flow of the chemical liquid through the first chemical liquid piping 111 and the second chemical liquid piping 112 is stopped, and the discharge of the chemical liquid from the first nozzle 5 is stopped.

[0078] According to the present embodiment, the inner virgin material pipe 2a is used for the first chemical liquid pipe 111, and the virgin material pipe 2c is used for the second chemical liquid pipe 112. The inner surfaces of the inner virgin material pipe 2a and the virgin material pipe 2c are cleaner than the inner surfaces of the inner recycled material pipe 2b and the recycled material pipe 2d, so the number of particles on the substrate W is less likely to increase compared to when the inner recycled material pipe 2b or the recycled material pipe 2d is used for the first chemical liquid pipe 111 and the second chemical liquid pipe 112.

[0079] In addition, the outer surface of the virgin material pipe 2c is cleaner than the outer surface of the inner virgin material pipe 2a. Therefore, by using the virgin material pipe 2c for the second chemical liquid pipe 112, the inside of the chamber 301 is less likely to be contaminated than when the inner virgin material pipe 2a is used for the second chemical liquid pipe 112. As a result, the number of particles on the substrate W is less likely to increase than when the inner virgin material pipe 2a is used for the second chemical liquid pipe 112.

[0080] Furthermore, according to this embodiment, by using inner virgin material piping 2a for first chemical liquid piping 111, the amount of virgin fluororesin material used in substrate processing apparatus 100 can be reduced, thereby saving environmental resources, compared to the case where virgin material piping 2c is used for first chemical liquid piping 111.

[0081] The nozzle moving unit 6 moves the first nozzle 5 along a horizontal plane. The nozzle moving unit 6 is controlled by the control device 400 (control unit 401). More specifically, the nozzle moving unit 6 moves the first nozzle 5 between a first retracted position and a processing position. The first retracted position is a position outside the spin chuck 3. For example, the first retracted position may be a position outside the liquid receiving unit 7. In this embodiment, the processing position is a position facing the center of the substrate W. The first nozzle 5 ejects the chemical liquid from the processing position toward the substrate W.

[0082] As shown in Fig. 4, the nozzle movement section 6 may have a nozzle arm 61, a nozzle base 62, and a nozzle movement mechanism 63. The nozzle base 62 extends in the vertical direction. A base end of the nozzle arm 61 is connected to the nozzle base 62. The nozzle arm 61 extends in the horizontal direction from the nozzle base 62. The nozzle arm 61 supports a first nozzle 5. The first nozzle 5 protrudes vertically downward from the nozzle arm 61.

[0083] The nozzle moving mechanism 63 rotates the nozzle base 62 in both forward and reverse directions about a second rotation axis AX2 extending in the vertical direction. As a result, the first nozzle 5 moves in a circumferential direction about the second rotation axis AX2. The nozzle moving mechanism 63 is controlled by the control device 400 (control unit 401). The actuator of the nozzle moving mechanism 63 may have, for example, an electric motor capable of rotating in both forward and reverse directions, and a reducer.

[0084] The blocking member 8 is located above the substrate W held by the spin chuck 3. A lower surface 81 of the blocking member 8 faces the upper surface of the substrate W held by the spin chuck 3. The lower surface 81 is, for example, circular. The diameter of the lower surface 81 is equal to or larger than the diameter of the substrate W and smaller than the inner diameter of the liquid receiving portion 7. In FIG. 4, hatching of the blocking member 8 is omitted.

[0085] The second lifting unit 85 raises and lowers the blocking member 8 between the second retracted position and the blocking position. The blocking position is a position lower than the second retracted position. Specifically, the blocking position is a position closer to the substrate W held by the spin chuck 3 than the second retracted position. FIG. 4 shows the blocking member 8 positioned at the second retracted position.

[0086] When the blocking member 8 moves from the second retracted position to the blocking position, a processing space is formed by the liquid receiving portion 7 and the blocking member 8. The processing space is a space that is substantially blocked off from the atmosphere outside the processing space. In other words, the processing space is a local space formed inside the chamber 301. The processing space is substantially blocked off from the atmosphere inside the chamber 301.

[0087] The second lifting section 85 is controlled by the control device 400 (control section 401). The actuator of the second lifting section 85 includes, for example, an electric motor capable of rotating in both forward and reverse directions, and a ball screw mechanism.

[0088] 4, the blocking member 8 has a second nozzle 82 and a third nozzle 83. Therefore, the second nozzle 82 and the third nozzle 83 are disposed in the chamber 301. The outlets of the second nozzle 82 and the third nozzle 83 open to a lower surface 81 of the blocking member 8. The outlets of the second nozzle 82 and the third nozzle 83 may be disposed at positions facing the center of the substrate W held by the spin chuck 3.

[0089] The second nozzle 82 discharges a rinsing liquid (fluid) into the chamber 301. Specifically, the second nozzle 82 discharges the rinsing liquid toward the upper surface of the substrate W. The third nozzle 83 discharges an inert gas (fluid) into the chamber. In this embodiment, the third nozzle 83 discharges nitrogen gas.

[0090] 4, the second processing liquid line 12L supplies a rinsing liquid to the second nozzle 82. Specifically, the second processing liquid line 12L has a first rinsing liquid pipe 121, a second rinsing liquid pipe 122, and a second on-off valve 123.

[0091] The first rinsing liquid piping 121 is disposed outside the chamber 301. The first rinsing liquid piping 121 circulates a rinsing liquid (fluid) to be supplied to the substrate processing unit 300. Specifically, the first rinsing liquid piping 121 supplies the rinsing liquid (liquid) to the substrate processing unit 300.

[0092] The second rinsing liquid piping 122 distributes the rinsing liquid (fluid) to be supplied to the second nozzle 82. Specifically, an upstream end of the second rinsing liquid piping 122 is connected to a downstream end of the first rinsing liquid piping 121. The second rinsing liquid piping 122 distributes the rinsing liquid flowing in from the first rinsing liquid piping 121 to the second nozzle 82.

[0093] In this embodiment, the first rinsing liquid pipe 121 uses the inner virgin material pipe 2a described with reference to Fig. 2A, and the second rinsing liquid pipe 122 uses the virgin material pipe 2c described with reference to Fig. 3A. The first rinsing liquid pipe 121 is an example of the "pipe outside the chamber", and the second rinsing liquid pipe 122 is an example of the "supply pipe inside the chamber". The configuration of the second processing liquid line 12L is substantially similar to that of the first processing liquid line 11L, and therefore a detailed description thereof will be omitted.

[0094] According to this embodiment, the inner virgin material pipe 2a is used for the first rinsing liquid pipe 121, and the virgin material pipe 2c is used for the second rinsing liquid pipe 122. Therefore, similar to the first processing liquid line 11L, the number of particles on the substrate W is unlikely to increase, and the inside of the chamber 301 is unlikely to be contaminated. Also, similar to the first processing liquid line 11L, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced, thereby saving environmental resources.

[0095] 4, the first gas line 14L supplies an inert gas to the third nozzle 83. In this embodiment, the first gas line 14L supplies nitrogen gas to the third nozzle 83. Specifically, the first gas line 14L has a first gas pipe 141, a second gas pipe 142, and a third on-off valve 143.

[0096] The first gas pipe 141 is disposed outside the chamber 301. The first gas pipe 141 circulates an inert gas (fluid) to be supplied to the substrate processing unit 300. Specifically, the first gas pipe 141 supplies nitrogen gas (gas) to the substrate processing unit 300.

[0097] The second gas pipe 142 distributes the inert gas (fluid) to be supplied to the third nozzle 83. Specifically, the upstream end of the second gas pipe 142 is connected to the downstream end of the first gas pipe 141. The second gas pipe 142 distributes the inert gas that has flowed in from the first gas pipe 141 to the third nozzle 83.

[0098] In this embodiment, the inner virgin material pipe 2a described with reference to Fig. 2A is used for the first gas pipe 141, and the virgin material pipe 2c described with reference to Fig. 3A is used for the second gas pipe 142. The first gas pipe 141 is an example of the "pipe outside the chamber", and the second gas pipe 142 is an example of the "supply pipe inside the chamber". The configuration of the first gas line 14L is substantially the same as that of the first processing liquid line 11L, and therefore a detailed description thereof will be omitted.

[0099] According to this embodiment, the inner virgin material pipe 2a is used for the first gas pipe 141, and the virgin material pipe 2c is used for the second gas pipe 142. Therefore, the inside of the chamber 301 is less likely to be contaminated compared to when the inner recycled material pipe 2b or recycled material pipe 2d is used for the first gas pipe 141 and the second gas pipe 142. As a result, the number of particles on the substrate W is less likely to increase compared to when the inner recycled material pipe 2b or recycled material pipe 2d is used for the first gas pipe 141 and the second gas pipe 142. In addition, by using the inner virgin material pipe 2a for the first gas pipe 141, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced compared to when the virgin material pipe 2c is used for the first gas pipe 141, and environmental resources can be saved.

[0100] The liquid receiving portion 7 receives the chemical liquid discharged from the substrate W. The liquid receiving portion 7 further receives the rinsing liquid discharged from the substrate W. In detail, the liquid receiving portion 7 includes a first liquid receiving portion 71 and a second liquid receiving portion 72. The first liquid receiving portion 71 is disposed inside the second liquid receiving portion 72. The first liquid receiving portion 71 receives the rinsing liquid discharged from the substrate W. The second liquid receiving portion 72 receives the chemical liquid discharged from the substrate W.

[0101] 4, the first liquid receiving portion 71 has a first guard portion 711 and a first cup portion 712. The second liquid receiving portion 72 has a second guard portion 721 and a second cup portion 722.

[0102] The first guard part 711 has a substantially cylindrical shape surrounding the spin chuck 3 and the spin motor part 4, and is disposed around the spin chuck 3 and the spin motor part 4. The first guard part 711 receives the rinsing liquid scattered from the substrate W that is rotating.

[0103] The first cup portion 712 forms an annular groove below the lower end of the first guard portion 711. In the first cup portion 712, the rinsing liquid that flows down from the inner circumferential surface of the first guard portion 711 is collected.

[0104] The second guard part 721 has a generally cylindrical shape that surrounds the first guard part 711, and is disposed around the first guard part 711. The second guard part 721 receives the chemical solution that splashes from the substrate W that is rotating.

[0105] Second cup portion 722 forms an annular groove below the lower end of second guard portion 721. In second cup portion 722, the medicinal liquid that flows down from the inner circumferential surface of second guard portion 721 is collected.

[0106] 4, the liquid receiving portion 7 further includes a third liquid receiving portion 73. The third liquid receiving portion 73 is a guard portion. A detailed description of the third liquid receiving portion 73 will be omitted.

[0107] The first lifting / lowering unit 76 lifts and lowers the first guard part 711, the second guard part 721, and the third liquid receiving part 73 (guard part) individually. The first lifting / lowering unit 76 is controlled by the control device 400 (control part 401). Specifically, the first lifting / lowering unit 76 lifts and lowers the first guard part 711, the second guard part 721, and the third liquid receiving part 73 (guard part) individually between a liquid receiving position and a third retracted position. The liquid receiving position is a position above the third retracted position. The first lifting / lowering unit 76 includes, for example, an electric motor that can rotate in both forward and reverse directions, and a ball screw mechanism. FIG. 4 shows the first guard part 711, the second guard part 721, and the third liquid receiving part 73 (guard part) located at the liquid receiving position.

[0108] The drain line 16L discharges the rinsing liquid collected in the first cup portion 712 to the outside of the substrate processing apparatus 300 (chamber 301). For example, the drain line 16L guides the rinsing liquid collected in the first cup portion 712 to a pipe connected to a waste liquid facility of a factory in which the substrate processing apparatus 100 is installed. That is, the drain line 16L discharges the rinsing liquid collected in the first cup portion 712 to the outside of the substrate processing apparatus 100. Alternatively, the drain line 16L may discharge the rinsing liquid collected in the first cup portion 712 to a drain tank disposed outside the substrate processing apparatus 300, or may discharge the rinsing liquid to the outside of the substrate processing apparatus 100 via the drain tank.

[0109] 4, the drainage line 16L has a first drainage pipe 161 and a second drainage pipe 162. The first drainage pipe 161 and the second drainage pipe 162 are tubular members through which a processing liquid (liquid) flows. The first drainage pipe 161 and the second drainage pipe 162 drain a chemical liquid (fluid) from the substrate processing unit 300 (chamber 301). The first drainage pipe 161 and the second drainage pipe 162 are examples of "drainage pipes".

[0110] The first drainage pipe 161 is accommodated in the chamber 301. In other words, the first drainage pipe 161 is disposed in the chamber 301. One end of the first drainage pipe 161 is connected to the bottom of the first cup portion 712. As a result, the rinsing liquid collected in the first cup portion 712 flows into the first drainage pipe 161. In this embodiment, the inner regenerating material pipe 2b described with reference to FIG. 2B is used for the first drainage pipe 161. The first drainage pipe 161 is an example of an "intra-chamber discharge pipe".

[0111] The second drainage pipe 162 is disposed outside the chamber 301. The upstream end of the second drainage pipe 162 is connected to the downstream end of the first drainage pipe 161. Therefore, the rinse liquid flows from the first drainage pipe 161 to the second drainage pipe 162. As a result, the rinse liquid (liquid) discharged from the substrate processing unit 300 (chamber 301) flows through the second drainage pipe 162. For example, the downstream end of the first drainage pipe 161 and the upstream end of the second drainage pipe 162 may be connected via a joint. In this embodiment, the regenerated material pipe 2d described with reference to FIG. 3B is used for the second drainage pipe 162. The second drainage pipe 162 is an example of an "external discharge pipe".

[0112] The second drainage pipe 162 distributes the rinsing liquid that has flowed into the second drainage pipe 162 via the first drainage pipe 161 to a pipe connected to a waste liquid facility of a factory in which the substrate processing apparatus 100 is installed. That is, the second drainage pipe 162 distributes the rinsing liquid collected in the first cup portion 712 to the outside of the substrate processing apparatus 100. Alternatively, the second drainage pipe 162 may distribute the rinsing liquid that has flowed into the second drainage pipe 162 via the first drainage pipe 161 to a drain tank disposed outside the substrate processing apparatus 300, or may distribute the rinsing liquid to the outside of the substrate processing apparatus 100 via the drain tank.

[0113] The outer surface of the inner recycled material pipe 2b is cleaner than the outer surfaces of the inner virgin material pipe 2a and the recycled material pipe 2d. Therefore, by using the inner recycled material pipe 2b for the first drainage pipe 161, the inside of the chamber 301 is less likely to be contaminated compared to when the inner virgin material pipe 2a or the recycled material pipe 2d is used for the first drainage pipe 161. As a result, the number of particles on the substrate W is less likely to increase compared to when the inner virgin material pipe 2a or the recycled material pipe 2d is used for the first drainage pipe 161.

[0114] Furthermore, according to this embodiment, by using the inner recycled material pipe 2b for the first drainage pipe 161 and the recycled material pipe 2d for the second drainage pipe 162, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced, thereby saving environmental resources, compared to the case where virgin material pipes 2c are used for the first drainage pipe 161 and the second drainage pipe 162.

[0115] Recovery line 15L guides the chemical liquid collected in second cup portion 722 to the outside of substrate processing unit 300 (chamber 301). More specifically, recovery line 15L guides the chemical liquid collected in second cup portion 722 to fluid cabinet 410 described with reference to FIG. 1. As a result, the chemical liquid collected in second cup portion 722 is recovered in fluid cabinet 410.

[0116] As shown in Fig. 4, the recovery line 15L has a first recovery pipe 151 and a second recovery pipe 152. The first recovery pipe 151 and the second recovery pipe 152 are tubular members through which a processing liquid (liquid) flows. The first recovery pipe 151 and the second recovery pipe 152 recover the chemical liquid (liquid) discharged from the substrate processing unit 300 (chamber 301) to the fluid cabinet 410 described with reference to Fig. 1. The first recovery pipe 151 and the second recovery pipe 152 are examples of "recovery pipes".

[0117] Specifically, first recovery pipe 151 is housed within chamber 301. In other words, first recovery pipe 151 is disposed within chamber 301. One end of first recovery pipe 151 is connected to the bottom of second cup portion 722. Therefore, the chemical liquid collected in second cup portion 722 flows into first recovery pipe 151. In this embodiment, virgin material pipe 2c described with reference to FIG. 3A is used for first recovery pipe 151. First recovery pipe 151 is an example of an "intra-chamber recovery pipe".

[0118] The second recovery pipe 152 is disposed outside the chamber 301. The upstream end of the second recovery pipe 152 is connected to the downstream end of the first recovery pipe 151. Therefore, the chemical liquid flows from the first recovery pipe 151 into the second recovery pipe 152. As a result, the chemical liquid (liquid) discharged from the substrate processing unit 300 (chamber 301) flows through the second recovery pipe 152. For example, the downstream end of the first recovery pipe 151 and the upstream end of the second recovery pipe 152 may be connected via a joint.

[0119] The second recovery pipe 152 distributes the chemical liquid that has flowed into the second recovery pipe 152 via the first recovery pipe 151 to the fluid cabinet 410 described with reference to Fig. 1. In this embodiment, the inner virgin material pipe 2a described with reference to Fig. 2A is used for the second recovery pipe 152. The second recovery pipe 152 is an example of the "outside-chamber recovery pipe".

[0120] According to this embodiment, the virgin material pipe 2c is used for the first recovery pipe 151, and the inner virgin material pipe 2a is used for the second recovery pipe 152. The chemical liquid flowing through the first recovery pipe 151 and the second recovery pipe 152 is recovered in the fluid cabinet 410 and reused for substrate processing. Therefore, compared to the case where the inner recycled material pipe 2b or the recycled material pipe 2d is used for the first recovery pipe 151 and the second recovery pipe 152, the number of particles on the substrate W is less likely to increase.

[0121] In addition, the outer surface of the virgin material pipe 2c is cleaner than the outer surfaces of the inner virgin material pipe 2a and the recycled material pipe 2d. Therefore, by using the virgin material pipe 2c for the first recovery pipe 151, the inside of the chamber 301 is less likely to be contaminated compared to when the inner virgin material pipe 2a or the recycled material pipe 2d is used for the first recovery pipe 151. As a result, the number of particles on the substrate W is less likely to increase compared to when the inner virgin material pipe 2a or the recycled material pipe 2d is used for the first recovery pipe 151.

[0122] Furthermore, according to this embodiment, by using the inner virgin material pipe 2a for the second recovery pipe 152, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced compared to the case where a virgin material pipe 2c is used for the second recovery pipe 152, thereby making it possible to conserve environmental resources.

[0123] The exhaust line 17L exhausts gas within the chamber 301 to the outside of the chamber 301. Specifically, the exhaust line 17L has a first exhaust pipe 171 and a second exhaust pipe 172. The first exhaust pipe 171 and the second exhaust pipe 172 are tubular members through which gas flows. The first exhaust pipe 171 and the second exhaust pipe 172 exhaust gas (fluid) from the substrate processing unit 300 (chamber 301). The first exhaust pipe 171 and the second exhaust pipe 172 are an example of "exhaust pipes".

[0124] The first exhaust pipe 171 is housed in the chamber 301. In other words, the first exhaust pipe 171 is disposed in the chamber 301. One end of the first exhaust pipe 171 communicates with the inner space of the chamber 301 at a position lower than the spin chuck 3. In this embodiment, the inner regenerated material pipe 2b described with reference to FIG. 2B is used for the first exhaust pipe 171. The first exhaust pipe 171 is an example of an "intra-chamber exhaust pipe".

[0125] The second exhaust pipe 172 is disposed outside the chamber 301. The upstream end of the second exhaust pipe 172 is connected to the downstream end of the first exhaust pipe 171. For example, the downstream end of the first exhaust pipe 171 and the upstream end of the second exhaust pipe 172 may be connected via a joint. In this embodiment, the regenerated material pipe 2d described with reference to FIG. 3B is used for the second exhaust pipe 172. The second exhaust pipe 172 is an example of an "external exhaust pipe to the chamber".

[0126] The gas in the first exhaust pipe 171 and the second exhaust pipe 172 is constantly sucked by an exhaust system (not shown) provided in a factory where the substrate processing apparatus 100 is installed. Therefore, when the substrate W is processed with the chemical liquid, the chemical liquid atmosphere in the chamber 301 is sucked to the upstream end of the first exhaust pipe 171 by the suction force of the exhaust system transmitted through the exhaust line 17L. As a result, the chemical liquid atmosphere in the chamber 301 is exhausted to the outside of the substrate processing apparatus 300 (chamber 301) through the exhaust line 17L. Similarly, when the processing space is formed by the blocking member 8 and the liquid receiving portion 7, the inert gas (nitrogen gas) introduced into the processing space is exhausted to the outside of the substrate processing apparatus 300 (chamber 301) through the exhaust line 17L.

[0127] According to this embodiment, by using the inner regenerated material pipe 2b for the first exhaust pipe 171, the inside of the chamber 301 is less likely to be contaminated, similar to the drainage line 16L. As a result, the number of particles on the substrate W is less likely to increase, similar to the drainage line 16L.

[0128] Furthermore, according to this embodiment, by using the inner recycled material piping 2b for the first exhaust piping 171 and the recycled material piping 2d for the second exhaust piping 172, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced, similar to the drainage line 16L, thereby saving environmental resources.

[0129] Next, substrate processing by the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 4. First, the control device 400 (controller 401) controls the center robot CR described with reference to Fig. 1 to load the substrate W to be processed into the chamber 301. Then, the control device 400 (controller 401) controls the spin chuck 3 to hold the substrate W loaded by the center robot CR on the spin chuck 3.

[0130] When the substrate W is held by the spin chuck 3, the control device 400 (controller 401) controls the spin motor unit 4 to rotate the spin chuck 3 and the substrate W together. The control device 400 (controller 401) also controls the first lifting unit 76 to move the second guard unit 721 and the third liquid receiving unit 73 (guard unit) from the third retracted position to the liquid receiving position while keeping the first guard unit 711 in the third retracted position. The control device 400 (controller 401) then controls the nozzle moving unit 6 to move the first nozzle 5 from the first retracted position to the processing position.

[0131] The control device 400 (control unit 401) moves the first nozzle 5 to the processing position, and then opens the first on-off valve 113. When the first on-off valve 113 opens, the chemical liquid is supplied to the first nozzle 5 via the first chemical liquid piping 111 and the second chemical liquid piping 112, and the chemical liquid is discharged from the first nozzle 5 toward the center of the rotating substrate W. As a result, a liquid film of the chemical liquid is formed on the upper surface of the substrate W, and the substrate W is processed by the chemical liquid.

[0132] The chemical liquid supplied to the rotating substrate W is discharged to the periphery of the substrate W. The chemical liquid discharged from the substrate W is received by the second guard portion 721. The chemical liquid received by the second guard portion 721 flows into the first recovery pipe 151 via the second cup portion 722. As a result, the chemical liquid discharged from the substrate W is recovered via the recovery line 15L into the fluid cabinet 410 described with reference to FIG. 1.

[0133] When a predetermined time has elapsed since the start of discharge of the chemical liquid, the control device 400 (control unit 401) closes the first on-off valve 113. When the first on-off valve 113 is in the closed state, the flow of the chemical liquid through the first chemical liquid piping 111 and the second chemical liquid piping 112 is stopped, and the discharge of the chemical liquid from the first nozzle 5 is stopped. As a result, the processing of the substrate W with the chemical liquid is completed.

[0134] After completing the processing of the substrate W with the chemical liquid, the control device 400 (control unit 401) controls the nozzle moving unit 6 to move the first nozzle 5 from the processing position to the first retract position.

[0135] When the control device 400 (control unit 401) moves the first nozzle 5 from the processing position to the first retracted position, it controls the second lifting unit 85 to move the blocking member 8 from the second retracted position to the blocking position to form a processing space. In addition, the control device 400 (control unit 401) controls the first lifting unit 76 to move the first guard unit 711 from the third retracted position to the liquid receiving position.

[0136] After forming the processing space, the control device 400 (control unit 401) opens the third on-off valve 143. As a result, nitrogen gas is supplied to the processing space from the third nozzle 83, and the atmosphere in the processing space is replaced from the air atmosphere to a nitrogen atmosphere.

[0137] After starting the supply of nitrogen gas, the control device 400 (control unit 401) opens the second on-off valve 123. When the second on-off valve 123 opens, the rinsing liquid is supplied to the second nozzle 82 via the first rinsing liquid piping 121 and the second rinsing liquid piping 122, and the rinsing liquid is discharged from the second nozzle 82 toward the center of the rotating substrate W. As a result, the chemical liquid remaining on the substrate W is washed away by the rinsing liquid, and a liquid film of the rinsing liquid is formed on the upper surface of the substrate W.

[0138] When a predetermined time has elapsed since the start of the discharge of the rinsing liquid, the control device 400 (control unit 401) closes the second on-off valve 123. When the second on-off valve 123 is in the closed state, the flow of the rinsing liquid through the first rinsing liquid piping 121 and the second rinsing liquid piping 122 is stopped, and the discharge of the rinsing liquid from the second nozzle 82 is stopped. As a result, the rinsing process is completed.

[0139] After stopping the discharge of the rinsing liquid, the control device 400 (control unit 401) controls the spin motor unit 4 to increase the rotation speed of the substrate W and rotate the substrate W at high speed. By rotating the substrate W at high speed, the rinsing liquid adhering to the substrate W is scattered from the substrate W, and the substrate W is dried. When a predetermined time has elapsed after increasing the rotation speed of the substrate W, the control device 400 (control unit 401) controls the spin motor unit 4 to stop the rotation of the substrate W. As a result, the drying process is completed.

[0140] Next, the substrate processing apparatus 100 of this embodiment will be described with reference to Fig. 5. Fig. 5 is a diagram showing a part of the configuration of the substrate processing apparatus 100 of this embodiment. As shown in Fig. 5, the substrate processing apparatus 100 further includes a storage tank 411, a recovery tank 156, a second gas line 18L, a circulation line 19L, and a valve drive unit 500.

[0141] The storage tank 411 is accommodated in the fluid cabinet 410. The storage tank 411 stores a chemical liquid. The circulation line 19L circulates the chemical liquid stored in the storage tank 411. Specifically, the circulation line 19L has a circulation pipe 191, a circulation pump 192, and a circulation filter 193.

[0142] The circulation pipe 191 is a tubular member through which a processing liquid (liquid) flows. The circulation pipe 191 is disposed outside the chamber 301. Specifically, one end and the other end of the circulation pipe 191 are connected to a storage tank 411. The circulation pipe 191 flows a chemical liquid (fluid) to be supplied to the substrate processing unit 300. A part of the circulation pipe 191 is housed in a fluid cabinet 410. The other part of the circulation pipe 191 is housed in a fluid box 420. In this embodiment, an inner virgin material pipe 2a is used for the circulation pipe 191. The circulation pipe 191 is an example of an "outside-chamber pipe".

[0143] The circulation pump 192 is interposed in the circulation pipe 191. The circulation pump 192 is housed in a fluid cabinet 410. The circulation pump 192 pumps the chemical liquid so that the chemical liquid flows through the circulation pipe 191 from one end to the other end of the circulation pipe 191. As a result, the chemical liquid circulates through the circulation pipe 191 via the storage tank 411. The circulation pump 192 is controlled by a control device 400 (a control unit 401).

[0144] The circulation filter 193 is disposed in the circulation pipe 191. The circulation filter 193 is housed in the fluid cabinet 410. The circulation filter 193 removes foreign matter from the chemical liquid flowing through the circulation pipe 191.

[0145] The recovery tank 156 is housed in the fluid cabinet 410. The recovery tank 156 stores the chemical liquid recovered by the recovery line 15L. The recovery line 15L distributes the chemical liquid recovered from the liquid receiving section 7 to the storage tank 411 via the recovery tank 156. Specifically, the recovery line 15L further includes a third recovery pipe 153, a recovery filter 154, and a recovery pump 155. The inner virgin material pipe 2a is used for the third recovery pipe 153. The third recovery pipe 153 is an example of the "outside-chamber recovery pipe".

[0146] The recovery filter 154 is disposed in the second recovery pipe 152. The recovery filter 154 removes foreign matter from the chemical liquid flowing through the second recovery pipe 152. The recovery filter 154 is housed in the fluid cabinet 410, for example.

[0147] The downstream end of the second recovery pipe 152 is connected to the recovery tank 156. Therefore, the second recovery pipe 152 allows the chemical liquid discharged from the substrate W to flow to the recovery tank 156.

[0148] The third recovery pipe 153 is housed in the fluid cabinet 410. One end of the third recovery pipe 153 is connected to the recovery tank 156. The other end of the third recovery pipe 153 is connected to the storage tank 411.

[0149] The recovery pump 155 is housed in the fluid cabinet 410. The recovery pump 155 is installed in the third recovery pipe 153. The recovery pump 155 pumps the chemical liquid so that the chemical liquid flows through the third recovery pipe 153 from one end to the other end of the third recovery pipe 153. As a result, the chemical liquid is recovered in the storage tank 411. The recovery pump 155 is controlled by the control device 400 (control unit 401).

[0150] 5, one end (downstream end) of first chemical liquid piping 111 is connected to second chemical liquid piping 112, and the other end (upstream end) of first chemical liquid piping 111 is connected to circulation piping 191. When first on-off valve 113 is opened, the chemical liquid that has flowed from circulation piping 191 into first chemical liquid piping 111 is supplied to first nozzle 5 via second chemical liquid piping 112. As a result, the chemical liquid is discharged from first nozzle 5. Note that first nozzle 5 may be formed by the end of second chemical liquid piping 112.

[0151] In this embodiment, the actuator of the first on-off valve 113 is a pneumatic actuator. The second gas line 18L supplies air to the actuator of the first on-off valve 113. The valve driving unit 500 changes the pressure of the air supplied to the actuator of the first on-off valve 113 via the second gas line 18L to open and close the first on-off valve 113. The valve driving unit 500 is controlled by the control device 400 (control unit 401). The valve driving unit 500 is, for example, a speed controller.

[0152] The second gas line 18L has a third gas pipe 181. The third gas pipe 181 is a tubular member through which air (gas) flows. In this embodiment, the regenerated material pipe 2d is used for the third gas pipe 181. A portion of the third gas pipe 181 is disposed in the fluid box 420.

[0153] 5, according to this embodiment, the inner virgin material pipe 2a is used for the circulation pipe 191. Therefore, compared with the case where the inner recycled material pipe 2b or the recycled material pipe 2d is used for the circulation pipe 191, the number of particles on the substrate W is less likely to increase.

[0154] Furthermore, according to this embodiment, since the inner virgin material pipe 2a is used for the circulation pipe 191, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced compared to the case where the virgin material pipe 2c is used for the circulation pipe 191. Therefore, environmental resources can be saved.

[0155] Moreover, according to this embodiment, the recycled material pipe 2d is used for the third gas pipe 181. Therefore, the amount of virgin fluororesin material used in the substrate processing apparatus 100 can be reduced compared to the case where the virgin material pipe 2c is used for the third gas pipe 181. Therefore, environmental resources can be saved.

[0156] Next, modified examples of the inner virgin material pipe 2a and the inner recycled material pipe 2b will be described with reference to Fig. 6A and Fig. 6B. Fig. 6A is a diagram showing a modified example of the inner virgin material pipe 2a. Fig. 6B is a diagram showing a modified example of the inner recycled material pipe 2b.

[0157] 6A, the inner virgin material pipe 2a may further have a barrier layer 23. The barrier layer 23 is formed between the inner layer 21 and the outer layer 22. The barrier layer 23 contains a resin material that is less permeable to gas than the inner layer 21 and the outer layer 22. Therefore, by providing the barrier layer 23, it becomes even more difficult for gas in the flow path 20r to leak out to the outside of the inner virgin material pipe 2a.

[0158] Similarly, the inner recycled material pipe 2b may further include a barrier layer 23 (FIG. 6B). By providing the barrier layer 23, it becomes even more difficult for the gas in the flow passage 20r to leak out of the inner recycled material pipe 2b.

[0159] An embodiment of the present invention has been described above with reference to the drawings (FIGS. 1 to 6B). According to this embodiment, piping containing the recycled material 20b made of fluororesin can be used for the piping of the substrate processing apparatus 100. Therefore, environmental resources can be saved.

[0160] The present invention is not limited to the above-mentioned embodiment, and can be implemented in various aspects without departing from the gist of the present invention. In addition, the components disclosed in the above-mentioned embodiment can be modified as appropriate. For example, some of all the components shown in one embodiment may be added to the components of another embodiment, or some of all the components shown in one embodiment may be deleted from the embodiment.

[0161] The drawings are mainly schematic illustrations of each component to facilitate understanding of the invention, and the thickness, length, number, spacing, etc. of each component shown in the drawings may differ from the actual ones due to the convenience of creating the drawings. Furthermore, the configurations of each component shown in the above embodiment are merely examples and are not particularly limited, and it goes without saying that various modifications are possible within a range that does not substantially deviate from the effects of the present invention.

[0162] For example, in the embodiment described with reference to FIG. 1 to FIG. 6B, the virgin material pipe 2c is a tubular member made of a single layer of fluororesin, but the virgin material pipe 2c is not particularly limited as long as at least the inner surface and the outer surface are made of the virgin material 20a of fluororesin. For example, the virgin material pipe 2c may have a layer made of the recycled material 20b of fluororesin between the inner surface and the outer surface. For example, the virgin material pipe 2c may be a tubular member made of three layers of fluororesin. Specifically, the virgin material pipe 2c may have an inner layer containing the virgin material 20a of fluororesin, an intermediate layer containing the recycled material 20b of fluororesin, and an outer layer containing the virgin material 20a of fluororesin. Alternatively, the virgin material pipe 2c may have a barrier layer between the inner surface and the outer surface, or may have an intermediate layer to which an inner marking is applied.

[0163] In the embodiment described with reference to FIG. 1 to FIG. 6B, the recycled material pipe 2d is a tubular member made of a single layer of fluororesin, but the recycled material pipe 2d is not particularly limited as long as at least the inner surface and the outer surface are made of the recycled material 20b of fluororesin. For example, the recycled material pipe 2d may have a layer made of fluororesin obtained by mixing the virgin material 20a of fluororesin and the recycled material 20b of fluororesin between the inner surface and the outer surface. For example, the recycled material pipe 2d may be a tubular member made of three layers of fluororesin. Specifically, the recycled material pipe 2d may have an inner layer containing the recycled material 20b of fluororesin, an intermediate layer containing the fluororesin obtained by mixing the virgin material 20a of fluororesin and the recycled material 20b of fluororesin, and an outer layer containing the recycled material 20b of fluororesin. Alternatively, the recycled material pipe 2d may have a barrier layer between the inner surface and the outer surface, or an intermediate layer to which an inner marking is applied.

[0164] 1 to 6B, a portion of the drainage line 16L (first drainage piping 161) is disposed inside the chamber 301, but substantially the entirety of the piping included in the drainage line 16L may be disposed outside the chamber 301. For example, when the first cup portion 712 is installed on the bottom wall of the chamber 301, substantially the entirety of the piping included in the drainage line 16L is disposed outside the chamber 301.

[0165] 1 to 6B, a portion of recovery line 15L (first recovery piping 151) is disposed inside chamber 301, but substantially all of the piping included in recovery line 15L may be disposed outside chamber 301. For example, when second cup portion 722 is installed on the bottom wall of chamber 301, substantially all of the piping included in recovery line 15L is disposed outside chamber 301.

[0166] In the embodiment described with reference to Figs. 1 to 6B, at least one of coloring and marking may be applied to at least one of the inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d.

[0167] Figures 7A, 7B, and 7D show an example in which coloring and marking are applied to the inner virgin material pipe 2a, the inner recycled material pipe 2b, and the recycled material pipe 2d, and Figure 7C shows an example in which coloring and marking are not applied to the virgin material pipe 2c. The cross-hatched areas in Figures 7A, 7B, and 7D represent colored translucent areas.

[0168] When coloring the inner virgin material pipe 2a, only one of the inner layer 21 and the outer layer 22 of the inner virgin material pipe 2a may be colored, or both the inner layer 21 and the outer layer 22 of the inner virgin material pipe 2a may be colored. The same applies when coloring the inner recycled material pipe 2b. In the example shown in Figures 7A and 7B, the outer layer 22 of the inner virgin material pipe 2a and the inner layer 21 of the inner recycled material pipe 2b are colored. The color of the inner layer 21 of the inner recycled material pipe 2b can be visually confirmed through the outer layer 22 of the inner recycled material pipe 2b.

[0169] When coloring two or more of the inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d, the colors may be different. In this case, the type or intensity of the color may be different, or the type and intensity of the color may be different. Figures 7A and 7D show an example in which the type of color is the same but the intensity of the color is different. When marking is applied to two or more of the inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d, the appearance of the marking may be different, as shown in Figures 7A, 7B, and 7D.

[0170] By making at least one of the presence or absence of coloring, the presence or absence of marking, the type of color, the color intensity, and the appearance of the marking different for the inner virgin material piping 2a, the inner recycled material piping 2b, the virgin material piping 2c, and the recycled material piping 2d, it is possible to visually determine whether the pipe is the inner virgin material piping 2a, the inner recycled material piping 2b, the virgin material piping 2c, or the recycled material piping 2d.

[0171] When coloring the inner virgin material pipe 2a, the inner virgin material pipe 2a may be colored entirely, or only a part of the inner virgin material pipe 2a may be colored. The same applies to the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d.

[0172] When the inner virgin material pipe 2a is colored, the colored portion of the inner virgin material pipe 2a may be translucent or opaque. In the former case, the transparency of the inner virgin material pipe 2a may be a transparency that allows the presence or absence of liquid in the inner virgin material pipe 2a to be visually discernible, or a transparency that does not allow the presence or absence of liquid to be visually discernible. The same applies to the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d.

[0173] When the inner virgin material pipe 2a is colored, a black coloring component different from fluororesin may be included in the colored portion of the inner virgin material pipe 2a. In this case, the inner virgin material pipe 2a is colored black with a depth corresponding to the concentration of the coloring component. When the concentration of the coloring component is low, the inner virgin material pipe 2a is colored gray (light black). The inner virgin material pipe 2a may be colored black with a transparency that allows the presence or absence of liquid in the inner virgin material pipe 2a to be visually identified. The coloring component may be a substance other than black, such as blue. The black coloring component may be carbon. In this case, the inner virgin material pipe 2a can be colored without increasing contaminants such as metals. The contents of this paragraph are also applicable to the case of coloring at least one of the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d.

[0174] When marking is applied, at least one of the inner virgin material pipe 2a, the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d includes a marking portion 30. The marking may include one or more marks 30a. The marks 30a may be any of letters, numbers, symbols, figures, and pictograms, or may be other than these.

[0175] 7A, 7B, and 7D show examples in which an identification symbol including one or more marks 30a is applied to the inner virgin material pipe 2a, the inner recycled material pipe 2b, and the recycled material pipe 2d. The dashed rectangles in FIGS. 7A, 7B, and 7D indicate an area including the marking portion 30. The rectangles are an example of a boundary line surrounding the identification symbol. Such a boundary line may be a line that can be identified by the naked eye, or may be a virtual line that does not actually exist. In the former case, the boundary line may or may not be part of the marking portion 30.

[0176] The circles, triangles, and squares in Figures 7A, 7B, and 7D represent different marks 30a. In the examples shown in Figures 7A, 7B, and 7D, the order of the marks 30a constituting one identification symbol is different for the inner virgin material pipe 2a, the inner recycled material pipe 2b, and the recycled material pipe 2d. Therefore, the difference in the marking parts 30 of the inner virgin material pipe 2a, the inner recycled material pipe 2b, and the recycled material pipe 2d can be visually identified. Even if the colors of the inner virgin material pipe 2a, the inner recycled material pipe 2b, and the recycled material pipe 2d are the same or similar, the inner virgin material pipe 2a, the inner recycled material pipe 2b, and the recycled material pipe 2d can be identified based on the difference in the marking parts 30.

[0177] When marking the inner virgin material pipe 2a, the marking portion 30 may be disposed on the outer surface of the inner virgin material pipe 2a, or may be disposed between the inner surface of the inner virgin material pipe 2a and the outer surface of the inner virgin material pipe 2a. The same applies when marking at least one of the inner recycled material pipe 2b, the virgin material pipe 2c, and the recycled material pipe 2d.

[0178] The marking portion 30 disposed between the inner surface and the outer surface is called an inner marking. As long as the inner marking can be visually identified through the outer surface, the inner marking may or may not have a portion of a different color from the outer surface. When the marking portion 30 is an inner marking, the marking portion 30 may be formed by laser processing. For example, the marking portion 30 may be formed by adjusting the focal position of the laser light between the inner surface and the outer surface during laser processing.

[0179] 1 to 6B, the spin chuck 3 is a clamping chuck, but the spin chuck 3 is not limited to a clamping chuck. For example, the spin chuck 3 may be a vacuum chuck.

[0180] In the embodiment described with reference to FIGS. 1 to 6B, the substrate processing apparatus 100 is a single-wafer type apparatus, but the substrate processing apparatus 100 may be a batch type apparatus.

[0181] 1 to 6B, the substrate processing apparatus 100 is an etching apparatus or a cleaning apparatus, but the substrate processing apparatus 100 is not particularly limited as long as it is an apparatus for processing a substrate. For example, the substrate processing apparatus 100 may be a coating apparatus, a developing apparatus, an exposure apparatus, a baking apparatus, or a film forming apparatus. [Industrial Applicability]

[0182] The present invention is useful in an apparatus for processing a substrate. [Explanation of symbols]

[0183] 2a: Inner virgin material piping 2b:Inner recycled material piping 2c: Virgin material piping 2d: Recycled material piping 5: First nozzle 20a: Virgin fluororesin material 20b: Recycled fluororesin material 20r: Flow path 21: Inner layer 22: Outer layer 23: Barrier layer 30: Marking section 82: Second nozzle 83: 3rd nozzle 100: Substrate processing apparatus 111: First chemical liquid pipe 112: Second chemical liquid piping 121: First rinse liquid piping 122: Second rinse liquid piping 141: First gas pipe 142: Second gas pipe 151: First recovery pipe 152: Second recovery pipe 153: 3rd recovery pipe 161: First drainage pipe 162: Second drainage pipe 171: First exhaust pipe 172: Second exhaust pipe 181: 3rd gas pipe 191: Circulation piping 300: Substrate processing section 301: Chamber 410: Fluid cabinet Th1: Thickness Th2: Thickness Th3: Thickness Th4: Thickness W: Substrate

Claims

1. A substrate processing apparatus for processing a substrate, A plurality of pipes for passing a fluid therethrough are provided, The plurality of pipes include at least one inner virgin material pipe having an inner layer containing a virgin material of a fluororesin and an outer layer formed on the outer side of the inner layer, The outer layer contains a recycled fluororesin material, The fluid flows inside the inner layer of the substrate processing apparatus.

2. a substrate processing unit that performs substrate processing on the substrate, The substrate processing unit has a chamber for accommodating the substrate, the plurality of pipes include an outside-chamber pipe that is disposed outside the chamber and through which the fluid to be supplied to the substrate processing unit flows; The substrate processing apparatus according to claim 1 , wherein the chamber outer piping includes the inner virgin material piping.

3. a nozzle disposed within the chamber to eject the fluid within the chamber; the plurality of pipes include an in-chamber supply pipe that is disposed within the chamber and through which the fluid to be supplied to the nozzle flows; The substrate processing apparatus according to claim 2 , wherein the intra-chamber supply pipe includes a virgin material pipe having at least an inner surface and an outer surface made of a virgin material such as a fluororesin.

4. a substrate processing unit that performs substrate processing on the substrate; a fluid cabinet for containing a liquid to be supplied to the substrate processing unit; Further comprising: The substrate processing unit has a chamber for accommodating the substrate, the plurality of pipes includes a recovery pipe that recovers the liquid discharged from the substrate processing unit into the fluid cabinet, the recovery pipe includes an outside-chamber recovery pipe disposed outside the chamber, The substrate processing apparatus according to claim 1 , wherein the chamber outer recovery pipe includes the inner virgin material pipe.

5. the recovery pipe includes an intra-chamber recovery pipe disposed within the chamber, The substrate processing apparatus according to claim 4 , wherein the intra-chamber recovery pipe includes a virgin material pipe having at least an inner surface and an outer surface made of a virgin fluororesin material.

6. The substrate processing apparatus according to claim 1 , wherein the inner virgin material pipe further comprises a barrier layer formed between the inner layer and the outer layer.

7. The substrate processing apparatus according to claim 1 , wherein the inner layer has a thickness smaller than a thickness of the outer layer.

8. The substrate processing apparatus according to claim 1 , wherein the inner virgin material pipe is colored.

9. The plurality of pipes include virgin material pipes having at least an inner surface and an outer surface made of a virgin material of a fluororesin, The substrate processing apparatus of claim 8 , wherein the virgin material pipe has a different color from the inner virgin material pipe.

10. A substrate processing apparatus for processing a substrate, A plurality of pipes for passing a fluid therethrough are provided, The plurality of pipes include At least one inner recycled material pipe having an inner layer containing a recycled material of a fluororesin and an outer layer formed on the outside of the inner layer, The outer layer contains a virgin fluororesin material, The fluid flows inside the inner layer of the substrate processing apparatus.

11. a substrate processing unit that performs substrate processing on the substrate, The substrate processing unit has a chamber for accommodating the substrate, the plurality of pipes includes a discharge pipe that discharges the fluid from the substrate processing unit, the exhaust piping includes an intra-chamber exhaust piping disposed within the chamber, The substrate processing apparatus of claim 10 , wherein the intra-chamber exhaust piping includes the inner regenerator piping.

12. the exhaust piping includes an external exhaust piping disposed outside the chamber, The substrate processing apparatus according to claim 11 , wherein the chamber external exhaust piping includes a recycled material piping made of a recycled material of fluororesin.

13. The substrate processing apparatus according to claim 10 , wherein the inner recycled material pipe further comprises a barrier layer formed between the inner layer and the outer layer.

14. The substrate processing apparatus according to claim 10 , wherein the outer layer has a thickness smaller than a thickness of the inner layer.

15. The substrate processing apparatus according to claim 10 , wherein the inner recycled material pipe is colored.

16. The plurality of pipes include recycled material pipes made of recycled fluororesin material, The recycled pipe is colored, The substrate processing apparatus according to claim 15 , wherein at least one of the inner recycled material pipe and the recycled material pipe is provided with a marking.

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