Liquid material vaporization apparatus and operation setting method thereof

Abstract

To provide a liquid material vaporization apparatus capable of increasing the capacity of a tank to enjoy the benefit therefrom while securing conventional performance.SOLUTION: A liquid material vaporization apparatus operates such that, in a gas generation mode, a liquid material is supplied to a tank 1 through a supply path R1 via a first on-off valve V1 set to a predetermined first opening degree, and operates such that, in a purge mode, a purge gas is introduced into the tank 1 through the supply path R1 via the first on-off valve V1 set to a second opening degree that is larger than the first opening degree.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a liquid material vaporizer for heating and vaporizing a liquid material and an operation setting method thereof.

Background Art

[0002] Conventionally, as shown in Patent Document 1, a liquid material vaporizer has been developed that generates a gas used in a semiconductor manufacturing process or the like by vaporizing a liquid material.

[0003] Such a liquid material vaporizer, as shown in FIG. 2, includes a tank 11, a supply path R11 for supplying the liquid material to the tank 11, a heater for heating the liquid material in the tank 11 (not shown as it is attached to the tank 11), a gas lead-out path R12 for leading out the vaporized gas of the liquid material generated by heating in the tank 11, and a flow controller 12 for FB-controlling the flow rate of the vaporized gas flowing through the gas lead-out path R12 to a predetermined value. These devices are housed or held in a housing 13 of a unified size, although it cannot be said to be standardized.

[0004] During operation in the mode of generating the vaporized gas and supplying it to an external device (gas generation mode), the on-off valve V12 provided in the gas lead-out path R12 opens, and the vaporized gas generated by heater heating is led through the gas lead-out path R12 to a target device such as a semiconductor process chamber while the flow rate is controlled by the flow controller 12.

[0005] A sensor 14 for detecting the liquid level (amount of liquid) of the liquid material is provided in the tank 11. During the gas generation mode, when the amount of liquid in the tank 11 drops below a predetermined value due to the derivation of the vaporized gas, the on-off valve V11 for supplying the liquid material provided in the supply path R11 opens, and the liquid material is supplied to the tank 11. Further, when the amount of liquid in the tank 11 exceeds the predetermined value due to the supply of the liquid material, the on-off valve V11 closes, and the supply of the liquid material stops. In this way, during the gas generation mode, while the vaporized gas at a constant flow rate is derived by the flow controller 12, the storage amount of the liquid material in the tank 11 is controlled to be constant.

[0006] Fig. 3 exemplifies a time-series graph showing the relationship between the derivation flow rate of the vaporized gas and the supply timing of the liquid material to the tank 11 in the gas generation mode.

[0007] From this graph, it can be seen that the derivation flow rate of the vaporized gas fluctuates slightly at the timing when the liquid material is supplied. One of the factors is considered to be that the supply of the liquid material causes changes in the pressure and temperature in the tank 11.

[0008] Conventionally, in order to suppress fluctuations in the temperature and pressure in the tank, which are one of the factors causing fluctuations in the derivation flow rate of the vaporized gas, an on-off valve V11 for supplying the liquid material is used, and the opening degree in its open state is set to be a certain value or less, so that a large amount of liquid material does not flow into the tank 11 at one time.

[0009] On the other hand, when purging the liquid material and vaporized gas that have been in the tank 11 until then for the purpose of removing the liquid material vaporization device, etc. (in the purge mode), purge gas is introduced into the tank 11 from the supply path R11 and discharged through the gas derivation path R12 and the flow controller 12. Conventionally, a bypass R14 is provided in this supply path R11, and an on-off valve V14 for discharging purge gas provided in this bypass R14 is also opened so that the purge gas is discharged not only through the on-off valve V11 for supplying the liquid material, but also through the on-off valve V14. This allows a large flow rate of purge gas to flow, enabling reliable purging in a short time.

[0010] In the figure, reference numeral 15 denotes a preheater that preheats the liquid material immediately before it is supplied to the tank 11, and reference numeral 16 denotes a pressure sensor that measures the pressure inside the tank 11. [Prior art documents] [Patent documents]

[0011] [Patent Document 1] Patent Publication No. 2022-135920 Summary of the Invention [Problem to be solved by the invention]

[0012] Meanwhile, if the capacity of the tank is increased, it is possible to enjoy advantages such as being able to use a float sensor, which has high operational reliability, to detect the amount of liquid material stored in the tank.

[0013] However, as mentioned above, the size of the housing is fixed to a certain extent, so it is difficult to simply increase the tank capacity while maintaining the conventional configuration. For example, if a simple measure such as omitting some of the components other than the tank is taken, problems such as an increase in the range of fluctuation in the output flow rate of vaporized gas may arise.

[0014] The present invention has been made in consideration of the above problems, and aims to provide a liquid material vaporization device that can enjoy the benefits of having a larger tank capacity while maintaining the same performance as conventional devices. [Means for solving the problem]

[0015] That is, the liquid material vaporization device of the present invention is as follows.

[0016] [1] It includes a tank, a supply path for supplying a liquid material to the tank, and a first on-off valve provided on the supply path. In the gas generation mode, the liquid material operates to be supplied from the supply path to the tank through the first on-off valve set to a predetermined first opening degree. In the purge mode, the purge gas operates to be introduced into the tank through the first on-off valve set to a second opening degree larger than the first opening degree from the supply path. A liquid material vaporization device characterized by this.

[0017] If it is such a thing, since the first on-off valve has two functions of a conventional on-off valve for liquid material supply and an on-off valve for purge gas discharge, the number of parts can be reduced, and accordingly, the capacity of the tank can be increased.

[0018] As a result, the reliability of detecting the liquid level in the tank can be improved, for example, a float sensor can be used as the liquid level sensor.

[0019] Furthermore, since the tank capacity becomes larger and a large amount of liquid material can be stored inside, even if the liquid material is supplied to the tank in the same amount as before (in other words, even if the flow rate of the derived vapor gas is the same as before), the change in the pressure and temperature inside the tank due to this is reduced. Therefore, it can be configured without using a preheater for preheating the liquid material, and combined with this point, the tank capacity can be further increased.

[0020] Also, in the gas generation mode, since the opening degree (first opening degree) of the first on-off valve can be set small so that only a liquid material with a flow rate below a certain level flows into the tank, the fluctuations in the pressure and temperature inside the tank can be suppressed. As a result, the fluctuation in the flow rate of the derived vapor gas can be ensured as before.

[0021] On the other hand, in the purge mode, since the opening degree (the second opening degree) of the first on-off valve can be set large to allow a large amount of purge gas to flow, the certainty and shortening of the purge can be ensured as in the conventional case even in this mode.

[0022] [2] It further includes a float sensor for detecting the storage amount of the liquid material in the tank, The liquid material vaporization device according to [1], wherein in the gas generation mode, the opening and closing of the first on-off valve is controlled according to the detection signal of the float sensor.

[0023] If it is such a thing, the detection certainty of the storage amount of the liquid material in the tank is improved.

[0024] [3] The liquid material vaporization device according to [1] or [2], wherein the first opening degree is configured to be changeable.

[0025] If it is such a thing, the opening degree (the first opening degree) of the first on-off valve in the gas generation mode can be set to an optimal opening degree according to the type of the liquid material and the flow rate of the vaporized gas led out.

[0026] [4] An operation setting method for a liquid material vaporization device including a tank, a supply path for supplying a liquid material to the tank, and a first on-off valve provided on the supply path, In the gas generation mode, the first on-off valve is set to a predetermined first opening degree, and the liquid material vaporization device is operated so that the liquid material is supplied from the supply path to the tank through the first on-off valve and vaporizes in the tank. On the other hand, In the purge mode, the first on-off valve is set to a second opening degree larger than the first opening degree, and the liquid material vaporization device is operated so that the purge gas is introduced into the tank through the first on-off valve. A method for setting the operation of a liquid material vaporization device, characterized in that.

[0027] If it is such a thing, the same effect as that of [1] can be obtained.

[0028] [5] The operation setting method of the liquid material vaporization device according to [4], which changes the first opening degree at least according to the type of the liquid material.

[0029] If it is such a thing, the opening degree (first opening degree) of the first on-off valve in the gas generation mode can be set to an optimal opening degree according to the type of the liquid material.

Effect of the Invention

[0030] According to the present invention, while enjoying the merit of increasing the capacity of the tank, the conventional performance can be ensured.

Brief Description of the Drawings

[0031]

Figure 1

Figure 2

Figure 3

Mode for Carrying Out the Invention

[0032] Hereinafter, the liquid material vaporization device according to an embodiment of the present invention will be described with reference to the drawings.

[0033] As shown in FIG. 1, the liquid material vaporization device 100 of the present embodiment includes a tank 1, a supply path R1 for supplying a liquid material to the tank 1, a heater for heating the liquid material in the tank 1 (not shown because it is attached to the tank 1), a sensor mechanism 4 provided in the tank 1 for detecting the liquid amount (liquid level) of the liquid material, a gas lead-out path R2 for leading out the vaporization gas of the liquid material generated by heating in the tank 1, a flow controller 2 for FB-controlling the flow rate of the vaporization gas flowing through the gas lead-out path R2 to a predetermined value, and a housing 3 for housing and holding these components.

[0034] The tank 1 is a hollow one formed of, for example, SUS having a rectangular parallelepiped shape.

[0035] The supply path R1 is formed by drilling a tube body or a block body. One end thereof is connected to the bottom surface of the tank 1, and the other end is connected to a first port P1 provided in the housing 3. This first port P1 is connected to a liquid material source (not shown) via a tube or a pipe.

[0036] Also, a single first on-off valve V1 that can uniquely control the flow of the fluid flowing through the supply path R1 is provided on the supply path R1. Here, a pneumatic valve type on-off valve that can be remotely operated is used as the first on-off valve V1, but it is not limited thereto.

[0037] The sensor mechanism 4 includes two float sensors 41 and 42 here. These float sensors 41 and 42 include a float body that is held so as to be vertically movable within a predetermined height range, and detect whether or not the float body is floating due to the buoyancy of the liquid material in the tank 1. Here, one float sensor 41 functions as a low-level sensor that detects whether or not the liquid material in the tank 1 is below a predetermined lower limit value, and the other float sensor 42, whose vertical movement range of the float body is set at a higher position, functions as a high-level sensor that detects whether or not the liquid material in the tank 1 exceeds a predetermined upper limit amount. That is, here, these two float sensors 41 and 42 can detect three states of whether the liquid material in the tank 1 is less than the lower limit value, between the lower limit value and the upper limit value, or exceeds the upper limit value.

[0038] The gas outlet path R2 is formed by drilling a tube body or a block body. One end thereof is connected to the upper surface of the tank, and the other end is connected to a second port P2 provided in the housing 3. This second port P2 is connected to a target device such as a semiconductor process chamber (not shown) via a tube or a pipe.

[0039] Also, a second on-off valve V2 is provided on this gas guide path R2. As this second on-off valve V2, a pneumatic valve type that can be remotely operated for opening and closing is used here, but it is not limited to this.

[0040] The flow controller 2 is provided between the second on-off valve V2 and the second port P2 on the gas guide path R2, and controls the mass flow rate of the fluid flowing through this gas guide path R2 here. This flow controller 2 includes a flow control valve (not shown) and, for example, a thermal type flow sensor, and the opening degree of the flow control valve is FB-controlled so that the measured flow rate measured by this flow sensor approaches a preset set flow rate.

[0041] Further, the liquid material vaporizer further includes a purge gas introduction path R3 for introducing purge gas into the flow controller 2. This purge gas introduction path R3 is formed by drilling a tube body or a block body. One end thereof is connected to the middle of the gas guide path R2, more specifically, between the second on-off valve V2 and the flow controller 2, and the other end is connected to a third port P3 provided on the housing 3. This third port P3 is connected to a purge gas source (not shown) via a tube or a pipe body.

[0042] Also, a third on-off valve V3 is provided on this purge gas introduction path R3. As this third on-off valve V3, a pneumatic valve type that can be remotely operated for opening and closing is used here, but it is not limited to this. Note that this purge gas introduction path R3 can be used when only the flow controller 2 is purged. At this time, the second on-off valve V2 is closed, the third on-off valve V3 is opened, and the purge gas introduced from the purge gas introduction path R3 passes through the flow controller 2 and is discharged from the second port P2.

[0043] Also, in the same figure, reference numeral 6 indicates a pressure sensor that measures the pressure in the tank 1.

[0044] Thus, the first opening / closing valve V1 in this embodiment can be switched between a closed state and an open state, and the opening degree in the open state can be switched between a first opening degree and a second opening degree that is larger than the first opening degree. The switching between the closed state and the open state can be performed remotely based on an electric signal, and the first opening degree and the second opening degree can be switched by manually operating an operating unit such as a knob provided on the body of the first opening / closing valve V1. An opening / closing valve that can be switched between the first opening degree and the second opening degree remotely may be used.

[0045] Next, the operation of the liquid material vaporizing apparatus 100 configured as above will be described.

[0046] As described in the Background of the Invention section, this liquid material vaporizer 100 operates in at least two modes: a gas generation mode and a purge mode.

[0047] In the gas generation mode, the second opening / closing valve V2 provided in the gas outlet passage R2 is opened by a command signal from a control device (not shown), and the vaporized gas generated by heating with the heater in the tank 1 is led to a target device such as a semiconductor process chamber through the gas outlet passage R2 and the second port P2 while the flow rate is controlled to a constant value by the flow rate controller 2. At this time, the third opening / closing valve V3 is closed.

[0048] On the other hand, when the amount of liquid in the tank 1 falls below the lower limit due to the discharge of the vaporized gas, the control device receives a detection signal and sends an open signal to the first opening / closing valve V1 provided in the supply line R1 to open the supply line R1. This allows the liquid material to be supplied to the tank 1. Also, when the amount of liquid in the tank 1 becomes equal to or greater than the upper limit due to the supply of the liquid material, the control device receives a detection signal and sends a close signal to the first opening / closing valve V1 to close the supply line R1. This stops the supply of the liquid material to the tank 1.

[0049] In the open state of the first on-off valve V1 in this gas generation mode, the opening degree is set to the first opening degree by manually operating the operation unit in advance.

[0050] In the purge mode, according to the command signal from the control device, the internal control valve of the flow controller 2, the first on-off valve V1, and the second on-off valve V2 are all in the open state. Then, the purge gas introduced from the first port P1 is introduced into the tank 1 through the supply path R1 and the first on-off valve V1, and from there, it is discharged from the second port P2 through the gas outlet path R2, the second on-off valve V2, and the flow controller 2.

[0051] In the open state of the first on-off valve V1 in this purge mode, the opening degree is set to the second opening degree by manually operating the operation unit in advance.

[0052] According to the above configuration, since the first on-off valve V1 has both functions of the conventional on-off valve for liquid material supply and the on-off valve for purge gas discharge, the number of parts can be reduced, and accordingly, the capacity of the tank 1 can be increased without changing the size of the housing 3.

[0053] As a result, as in this embodiment, a float sensor can be used, and the certainty of detecting the liquid level in the tank can be improved.

[0054] Furthermore, since the tank capacity is large and a large amount of liquid material can be stored inside, even if the liquid material is supplied to the tank 1 in the same amount as before (in other words, even if the flow rate of the vaporized gas derived is the same as before), the change in the pressure and temperature inside the tank 1 due to this is reduced. Therefore, it can be configured without using a preheater for preheating the liquid material, and combined with this point, the tank capacity can be increased.

[0055] In addition, in the gas generation mode, the opening degree (first opening degree) of this first on-off valve V1 is small, and when supplying the liquid material to the tank 1, only the liquid material with a flow rate below a certain level flows into the tank 1. Therefore, fluctuations in the pressure and temperature inside the tank 1 can be suppressed, and fluctuations in the flow rate of the vaporized gas derived can be suppressed as before.

[0056] On the other hand, in the purge mode, since the opening degree (second opening degree) of the first on-off valve V1 is large, a large amount of purge gas can flow, ensuring the certainty and shortening of the purge time.

[0057] Note that the present invention is not limited to the above-described embodiment.

[0058] For example, the first opening degree and the second opening degree may be changed according to the type of the liquid material, the amount of the vaporized gas derived, and the like.

[0059] Also, in the above embodiment, the preheater was not provided, but this may be provided, or instead of the preheater, a heater for heating the first on-off valve and / or the supply path may be provided.

[0060] In addition, the present invention can be variously modified within a range not contrary to its gist.

Explanation of Reference Numerals

[0061] 100... Liquid material vaporization device 1... Tank R1... Supply path R2... Gas derivation path R3... Purge gas introduction path V1... First on-off valve

Claims

1. a tank, a supply path for supplying a liquid material to the tank, and a first opening / closing valve provided on the supply path; In a gas generation mode, the liquid material is supplied from the supply path to the tank through the first opening / closing valve set to a predetermined first opening degree, A liquid material vaporization device characterized in that in a purge mode, purge gas is introduced into the tank from the supply path through the first opening / closing valve, which is set to a second opening degree larger than the first opening degree.

2. The tank further includes a float sensor for detecting an amount of the liquid material stored in the tank.

2. The liquid material vaporizing device according to claim 1, wherein in the gas generating mode, opening and closing of a first opening and closing valve is controlled in accordance with a detection signal of the float sensor.

3. 3. The liquid material vaporizing device according to claim 1, wherein the first opening degree is changeable.

4. 1. A method for setting an operation of a liquid material vaporizing apparatus including a tank, a supply path for supplying a liquid material to the tank, and a first opening / closing valve provided on the supply path, the method comprising the steps of: In a gas generation mode, the first opening / closing valve is set to a predetermined first opening degree, and the liquid material is supplied from the supply path through the first opening / closing valve to the tank and vaporized in the tank by operating the liquid material vaporizer. The method for setting the operation of a liquid material vaporization apparatus is characterized in that, in a purge mode, the first opening / closing valve is set to a second opening degree larger than the first opening degree, and the liquid material vaporization apparatus is operated so that purge gas is introduced into the tank through the first opening / closing valve.

5. 5. The method for setting an operation of a liquid material vaporizer according to claim 4, wherein the first opening degree is changed depending on at least the type of liquid material.

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