Stage device, exposure device, and article manufacturing method

Abstract

To provide a stage device that can measure the position of an object in a simple manner.SOLUTION: A stage device according to the present invention comprises: a stage that has an object placement surface on which a first object is placed; a driving unit that moves the stage in a first plane parallel to the object placement surface; a first measurement unit that has a first light projection unit that projects first measurement light on a first side face extending in a first direction in the first plane formed on the first object, and a first light receiving element that receives the first measurement light reflected on the first side face, and measures a first position of the first side face in a second direction in the first plane from a result of light reception performed by the first light receiving element, and a first angle of the first side face in the first plane; and a control unit that controls the driving unit on the basis of the first position and the first angle measured by the first measurement unit.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a stage apparatus, an exposure apparatus, and a method for manufacturing an article. [Background technology]

[0002] Conventionally, in exposure apparatuses, pre-alignment is performed to position a substrate by measuring the position of the side surface formed on the substrate and then using a stage device to control the drive of the substrate stage on which the substrate is placed based on the measured position of the side surface. Patent Document 1 discloses a stage device that projects measurement light onto a predetermined point on the side of a substrate, receives the measurement light reflected at the predetermined point on a light-receiving surface, and determines the position of the substrate from the intensity distribution of the measurement light on the light-receiving surface. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2017-116868 Summary of the Invention [Problem to be solved by the invention]

[0004] In the stage device disclosed in Patent Document 1, in order to determine the position of a substrate having a rectangular substrate surface in a plane parallel to the substrate surface, the positions of at least three points are determined, including two points on a first side surface of the substrate and one point on a second side surface perpendicular to the first side surface. That is, the stage device has a complex structure because it is provided with at least three measurement units that measure the positions of predetermined points on the side surface of the substrate.

[0005] SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a stage device that can simply measure the position of an object. [Means for solving the problem]

[0006] The stage device according to the present invention is characterized by comprising: a stage having an object placement surface on which a first object is placed; a drive unit that moves the stage within a first plane parallel to the object placement surface; a first light-projecting unit that projects first measurement light onto a first side surface extending in a first direction within the first plane formed on the first object; and a first measurement unit that has a first light-receiving element that receives the first measurement light reflected by the first side surface and measures a first position of the first side surface in a second direction within the first plane and a first angle of the first side surface within the first plane from the light-receiving result at the first light-receiving element; and a control unit that controls the drive unit based on the first position and first angle measured by the first measurement unit. [Effects of the Invention]

[0007] According to the present invention, it is possible to provide a stage device that can simply measure the position of an object. [Brief explanation of the drawings]

[0008] [Figure 1] FIG. 2 is a schematic top view of the stage device according to the first embodiment. [Figure 2] FIG. 2 is a partially enlarged schematic side view of the stage device according to the first embodiment. [Figure 3] 5A and 5B are diagrams showing examples of the intensity distribution of reflected light acquired at a light receiving unit in the stage device according to the first embodiment. [Figure 4] 5A and 5B are diagrams showing examples of the intensity distribution of reflected light acquired at a light receiving unit in the stage device according to the first embodiment. [Figure 5] 5A and 5B are diagrams showing examples of positions of peaks detected by a light receiving unit in the stage device according to the first embodiment. [Figure 6] 5A and 5B are diagrams showing examples of positions of peaks detected by a light receiving unit in the stage device according to the first embodiment. [Figure 7] FIG. 10 is a schematic top view of a stage device according to a second embodiment. [Figure 8]10A and 10B are diagrams showing examples of the intensity distribution of reflected light acquired at a light receiving unit in the stage device according to the second embodiment. [Figure 9] 10A and 10B are diagrams showing examples of positions of peaks detected by a light receiving unit in a stage device according to a second embodiment. [Figure 10] FIG. 10 is a schematic top view of a stage apparatus according to a modified example of the second embodiment. [Figure 11] FIG. 1 is a schematic cross-sectional view of an exposure apparatus that includes a stage apparatus according to the first or second embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0009] The stage device according to this embodiment will be described in detail below with reference to the accompanying drawings. Note that the drawings may be drawn at a scale different from the actual scale in order to facilitate understanding of this embodiment. In the following, the direction perpendicular to the substrate mounting surface on which the substrate 2 is mounted on the substrate stage 6 is defined as the Z direction, two directions perpendicular to each other in a plane perpendicular to the Z direction are defined as the X direction (fourth direction) and the Y direction (second direction), and the rotation direction around the Z direction is defined as the θ direction.

[0010] [First embodiment] 2. Description of the Related Art Conventionally, exposure apparatuses have been used in photolithography processes included in manufacturing processes for devices such as semiconductor elements, liquid crystal display elements, image pickup elements, and thin-film magnetic heads. Specifically, in an exposure apparatus, an image of a pattern formed on a mask is projected and exposed onto a substrate, such as a wafer or glass plate, coated with a photosensitive agent such as photoresist.

[0011] In such exposure apparatuses, a so-called pre-alignment process is performed in which the position of the substrate is determined by measuring the position of the side of the substrate before the substrate is positioned with high precision by measuring the position of a mark formed on the substrate placed on the substrate stage. As a measurement device for measuring the position of the side surface of a substrate, for example, an optical measurement device is known that measures the position of the side surface of the substrate by irradiating the side surface with measurement light.

[0012] Such optical measurement devices are capable of detecting the position of the side surface of a substrate with high accuracy without contact, and are therefore effectively used to measure the position of the side surface of substrates such as thin glass plates, which are particularly prone to deformation. Conventionally, a transmission type measurement device is known that irradiates measurement light from below so that it passes through the side surface of a substrate, and detects the measurement light with a sensor located above, thereby measuring the position of the side surface of the substrate. Further, a reflection type measuring device is conventionally known that measures the position of a side surface of a substrate by irradiating the side surface of the substrate with measuring light and detecting the measuring light reflected by the side surface with a sensor.

[0013] In conventional pre-alignment for a substrate having a rectangular substrate surface, three such measurement devices are used to measure the positions of two points on a first side of the substrate and one point on a second side perpendicular to the first side. In other words, by using three measurement devices to measure the positions of two points on a first side of a rectangular substrate surface and one point on a second side perpendicular to the first side, the position of the substrate in a plane parallel to the substrate surface and the angle around an axis perpendicular to the plane can be calculated.

[0014] As described above, pre-alignment in a conventional stage apparatus requires at least three measurement devices, each having an illumination unit, an optical system, and a sensor, and therefore costs are not sufficiently reduced. Furthermore, such optical measuring devices require adjustment of the optical axis, adjustment of the arrangement, etc., which increases the number of steps required to assemble and adjust at least three measuring devices.

[0015] Furthermore, in recent years, in order to produce a plurality of products on a single production line, it has become necessary to perform exposure on a plurality of types of substrates that are different in size and orientation in an exposure apparatus. In a stage device used in a conventional exposure apparatus, the locations of the at least three measurement devices are determined in advance according to the size of the substrate to be placed on the stage device.

[0016] Therefore, it is difficult to measure the position of the side surface of each of a plurality of types of substrates that are different in size and orientation, that is, the position of each of the plurality of types of substrates. In other words, to measure the side positions of multiple types of substrates with different sizes and orientations, it is necessary to provide a driving device to move the measuring device or to increase the number of measuring devices, which increases costs and labor. Therefore, an object of this embodiment is to provide a stage device that can measure the position of the side surface of each of a plurality of types of substrates that are different in size and orientation while suppressing costs and man-hours.

[0017] FIG. 1 shows a schematic top view of a stage device 1 according to the first embodiment. The stage device 1 according to this embodiment is provided with a measurement unit that measures the position of the side of a substrate 2 (first object) on which a device such as a semiconductor element, a liquid crystal display element, an imaging element, or a thin-film magnetic head is formed when the device is manufactured. Specifically, the stage device 1 according to this embodiment includes a substrate support unit 3, a first measurement unit 4, a second measurement unit 5, a substrate stage 6 (stage), and a control unit 17.

[0018] The substrate support section 3 is configured to support the substrate 2 by vacuum or electromagnetic attraction on an attraction surface (object placement surface) having a rectangular shape in the XY plane (first plane). The suction surface of the substrate support portion 3 has a sufficiently large area to support by suction each of a plurality of substrates 2 having substrate surfaces with different areas.

[0019] The first measurement unit 4 has a first light projecting unit 4a that projects measurement light (first measurement light) toward a first side surface 2b on the negative Y-direction side of the two side surfaces of the substrate 2 perpendicular to the Y-direction. The first measurement unit 4 also has a first light receiving unit 4b (first light receiving element) that receives the measurement light reflected by the first side surface 2b of the substrate 2. As will be described later, the first measurement unit 4 is configured to measure the position Y (first position) of the substrate 2, specifically the first side surface 2b, in the Y direction and the angle θ in the XY plane.

[0020] The second measurement unit 5 has a second light projecting unit 5a that projects measurement light (second measurement light) toward a second side surface 2c on the negative X-direction side of the two side surfaces of the substrate 2 perpendicular to the X-direction. The second measurement unit 5 also has a second light receiving unit 5b (second light receiving element) that receives the measurement light reflected by the second side surface 2c of the substrate 2. As will be described later, the second measurement unit 5 is configured to measure the position X (second position) of the substrate 2, specifically the second side surface 2c, in the X direction.

[0021] The substrate stage 6 has the substrate support part 3, the first measurement part 4 and the second measurement part 5 mounted thereon, and is configured to be movable within the XY plane. The control unit 17 is configured to control the operation of each component of the stage device 1 according to this embodiment, specifically the substrate support unit 3, the first measurement unit 4, the second measurement unit 5, and the substrate stage 6. For example, the control unit 17 is configured to control a driving unit (not shown) that moves the substrate stage 6 within the XY plane based on the measurement results obtained by the first measurement unit 4 and the second measurement unit 5, specifically, the measured position X, position Y, and angle θ of the substrate 2.

[0022] Next, a specific method for measuring the position of the substrate 2 in the stage device 1 according to this embodiment will be described. In the stage device 1 according to this embodiment, a substrate 2 having, for example, a rectangular substrate surface is supported by a substrate support portion 3 of a substrate stage 6.

[0023] At this time, as shown in Figure 1, the first side surface 2b of the substrate 2 is parallel to the first side surface 3b (first end) on the negative Y-direction side of the two sides of the substrate support part 3 that are perpendicular to the Y-direction, and is positioned on the negative Y-direction side. In addition, the second side surface 2c of the substrate 2 is parallel to the second side surface 3c (second end portion) on the negative X-direction side of the two side surfaces of the substrate support portion 3 perpendicular to the X-direction, and is positioned on the negative X-direction side.

[0024] That is, in the stage device 1 according to this embodiment, the substrate 2 protrudes from the substrate support portion 3 so that only a portion of the substrate 2 is supported by the substrate support portion 3, and the remaining portion of the substrate 2 is not supported by the substrate support portion 3. In other words, in the stage device 1 according to this embodiment, the position of the substrate stage 6 in the XY plane when the substrate 2 is placed is controlled by the control unit 17 so that part of the substrate 2 protrudes from the substrate support part 3.

[0025] Specifically, in the stage device 1 according to this embodiment, as shown in FIG. 1, the substrate 2 is placed on the substrate support portion 3 so that it protrudes from the substrate support portion 3 by a distance RX in the X direction and by a distance RY in the Y direction. Hereinafter, the position of the substrate 2 that protrudes from the substrate support part 3 by the distance RX in the X direction and by the distance RY in the Y direction may be referred to as the reference position of the substrate 2 on the substrate support part 3. At this time, the distances RX and RY are determined so that a part of the substrate 2 protrudes from the substrate support part 3 even if the substrate 2 is placed on the substrate support part 3 deviating from the target position.

[0026] As shown in Figure 1, the first light receiving portion 4b is positioned so that when the substrate 2 is placed on the substrate support portion 3 so that it protrudes a distance RY in the Y direction, the first side surface 2b of the substrate 2 coincides with the center of the light receiving surface in the Y direction. In addition, the second light receiving portion 5b is positioned so that when the substrate 2 is placed on the substrate support portion 3 so that it protrudes by a distance RX in the X direction, the second side surface 2c of the substrate 2 coincides with the center of the light receiving surface in the X direction. In addition, the first side surface 2b and the second side surface 2c of the substrate 2 are connected to each other at the corner 2a, and the first side surface 3b and the second side surface 3c of the substrate support 3 are connected to each other at the corner 3a.

[0027] FIG. 2 shows a partially enlarged schematic side view of the stage device 1 according to this embodiment. 2, the following description will be given of the configuration of the first measurement unit 4. The second measurement unit 5 has the same configuration as the first measurement unit 4, except that the second measurement unit 5 is provided with a second light receiving unit 5b as a line sensor instead of the first light receiving unit 4b as an area sensor. That is, the following description using FIG. 2 also applies to the second measurement unit 5, and therefore the description thereof will be omitted.

[0028] The first light projecting unit 4a provided in the first measurement unit 4 is formed of a first light source 7a and a first lens 8a, and is disposed so as to face the first side surface 2b of the substrate 2 in the Y direction. In other words, the optical axis of the first light projecting unit 4a is parallel to the Y direction. Regarding the position of the first light-projecting unit 4a in the X direction, it is sufficient that the first light-projecting unit 4a is provided so that the light emitted from the first light-projecting unit 4a and reflected by the first side surface 2b of the substrate 2 can be received by the first light-receiving unit 4b.

[0029] The first light source 7a provided in the first light projecting unit 4a is configured to project a light beam having a wavelength of, for example, 500 to 1200 nm. The first lens 8a provided in the first light projecting unit 4a is configured to convert the light beam emitted from the first light source 7a into a parallel light beam having a circular shape. Specifically, it is preferable to use a collimator lens as the first lens 8a, which can obtain a light beam with high parallelism, but this is not limited to this and any lens can be used as long as it can collect the light beam emitted from the first light source 7a and guide it to the first side surface 2b of the substrate 2.

[0030] The light beam emitted from the first light source 7a is preferably converted into a parallel light beam in the XY plane by the first lens 8a, but does not necessarily have to be converted into a parallel light beam in the YZ plane. Furthermore, the cross-sectional shape of the collimated light beam formed by the first lens 8a is not limited to a circle. For example, if it is undesirable for the collimated light beam to be irradiated onto unnecessary areas on the first side surface 2b of the substrate 2, the collimated light beam may be formed into a rectangular shape having a width in the X direction of the light-receiving surface of the first light-receiving unit 4b and a height substantially equal to the thickness of the substrate 2.

[0031] The first light receiving unit 4b is, for example, a CCD (Charge Coupled Device) image sensor or a CMOS (Complementary Metal Oxide Semiconductor) image sensor. That is, the first light receiving section 4b is formed of an area sensor in which a plurality of pixels are arranged two-dimensionally.

[0032] Specifically, the first light receiving unit 4b is arranged such that a plurality of pixel groups, each having a plurality of pixels arranged along the Y direction on the light receiving surface, are arranged along the X direction. The first light receiving unit 4b is provided on the substrate stage 6 so as to be located below the first side surface 2b of the substrate 2 in the Z direction.

[0033] The first light receiving unit 4b receives the measurement light projected from the first light projecting unit 4a and reflected by the first side surface 2b of the substrate 2, and converts the intensity distribution of the received measurement light within the light receiving surface into an electrical signal. Here, in order to accurately determine the position in the Y direction of the first side surface 2b of the substrate 2 and the angle θ in the XY plane in the stage device 1 of this embodiment, it is necessary to detect the peak signal of the intensity distribution of the reflected light acquired by the first light receiving unit 4b. Therefore, it is preferable that the first side surface 2b of the substrate 2 is subjected to a predetermined processing such as chamfering.

[0034] Furthermore, if the first light-projecting portion 4a and the first light-receiving portion 4b are arranged so as to be largely separated from the corner portion 3a of the substrate support portion 3 on the positive side in the X direction, problems may occur. In other words, with such an arrangement, if the substrate surface of the substrate 2 is small, there is a risk that the light beam from the first light-emitting unit 4a will not be irradiated onto the first side surface 2b of the substrate 2, or that the reflected light reflected by the first side surface 2b of the substrate 2 will not be received by the first light-receiving unit 4b. Therefore, in the stage device 1 according to this embodiment, it is preferable to arrange the first light-emitting unit 4a and the first light-receiving unit 4b so that they are close to the corner 3a of the substrate support unit 3 in the X direction.

[0035] 3(a) and (b) respectively show examples of the light receiving results, i.e., the intensity distribution of reflected light, obtained on the light receiving surfaces of the first light receiving unit 4b and the second light receiving unit 5b when the substrate 2 is placed at a reference position on the substrate support unit 3 in the stage device 1 according to this embodiment. In addition, in FIGS. 3(a) and (b), the intensity of the reflected light is represented by shading.

[0036] As shown in FIG. 3(a), when the substrate 2 is placed at the reference position on the substrate support 3, a high brightness is detected in multiple pixels that are located at the center in the Y direction and aligned along the X direction on the light receiving surface of the first light receiving unit 4b. Furthermore, as shown in FIG. 3(b), when the substrate 2 is placed at the reference position on the substrate support part 3, a high brightness is detected in at least one pixel located near the center in the X direction on the light receiving surface of the second light receiving part 5b.

[0037] On the other hand, Figures 4(a) and (b) respectively show examples of the intensity distribution of reflected light acquired on the light receiving surfaces of the first light receiving unit 4b and the second light receiving unit 5b when the substrate 2 is placed at a position shifted from the reference position on the substrate support unit 3 in the stage device 1 of this embodiment. In addition, in FIGS. 4(a) and (b), the intensity of the reflected light is represented by shading.

[0038] Specifically, in the example shown in Figures 4(a) and (b), the substrate 2 on the substrate support part 3 is shifted from the reference position by a predetermined distance on the negative side in the X direction and the positive side in the Y direction, and is shifted by a predetermined angle on the positive side in the θ direction. In other words, in the example shown in Figures 4(a) and (b), the first side surface 2b of the substrate 2 extends along a predetermined direction (first direction) in the XY plane, and the second side surface 2c of the substrate 2 extends along a direction (third direction) perpendicular to the predetermined direction.

[0039] As shown in Figure 4(a), when the substrate 2 on the substrate support part 3 is shifted a predetermined distance from the reference position in the positive Y direction, a high brightness is detected at a position shifted from the center in the Y direction to the positive side on the light receiving surface of the first light receiving part 4b. Furthermore, as shown in FIG. 4(a), when the substrate 2 on the substrate support 3 is displaced from the reference position by a predetermined angle in the positive θ direction, a high brightness is detected in multiple pixels aligned along a direction tilted by a predetermined angle in the positive θ direction from the X direction.

[0040] As shown in FIG. 4(b), when the substrate 2 is shifted by a predetermined distance from the reference position on the substrate support part 3 toward the negative X-direction, a high luminance is detected at a position shifted toward the negative X-direction from the center on the light receiving surface of the second light receiving part 5b. That is, the positions where high brightness is detected on the light receiving surfaces of the first light receiving unit 4b and the second light receiving unit 5b change depending on the X coordinate, Y coordinate, and θ coordinate of the position where the substrate 2 is placed on the substrate support unit 3.

[0041] Therefore, in the stage device 1 according to this embodiment, the position of the substrate 2 can be measured based on the intensity distribution of the reflected light obtained on the light receiving surfaces of the first light receiving unit 4b and the second light receiving unit 5b. Specifically, first, a peak P is detected for the luminance of a plurality of pixels arranged along each column in the Y direction in the intensity distribution of the reflected light acquired on the light receiving surface of the first light receiving unit 4b.

[0042] Furthermore, a peak P is detected for the luminance of a plurality of pixels arranged along the X direction with respect to the intensity distribution of the reflected light acquired on the light receiving surface of the second light receiving unit 5b. The detection of the peak P is performed by an arithmetic unit that performs arithmetic processing of the signal acquired by the first light receiving unit 4b provided in the first measurement unit 4, and an arithmetic unit that performs arithmetic processing of the signal acquired by the second light receiving unit 5b provided in the second measurement unit 5.

[0043] The calculation unit can detect, as the peak P, the pixel with the highest brightness among a plurality of pixels arranged in a predetermined direction, for example. The calculation unit can also detect the position where the brightness is maximum as peak P by fitting the change in brightness between each of multiple pixels arranged along a predetermined direction with a predetermined function. At this time, among the detected peaks P, peaks P having a luminance lower than a predetermined threshold value may be excluded as peaks P due to noise.

[0044] 5(a) and 6(a) show the positions of peaks P (maximum brightness pixels) in each column detected in the intensity distributions of reflected light shown in FIGS. 3(a) and 4(a), respectively. Also, FIGS. 5(b) and 6(b) show the positions of peaks P detected in the intensity distributions of the reflected light shown in FIGS. 3(b) and 4(b), respectively.

[0045] Then, the position Y of the substrate 2 in the Y direction can be obtained from the position in the Y direction of the midpoint of the line segment passing through the peak P in each detected column as shown in FIG. 5(a) or FIG. 6(a). In other words, the amount of deviation of the substrate 2 from the reference position on the substrate support part 3 in the Y direction can be calculated from the amount of deviation of the midpoint of the line segment from the center of the light receiving surface of the first light receiving part 4b in the Y direction.

[0046] Furthermore, the angle θ (first angle) of the substrate 2 in the θ direction, that is, the amount of rotation of the substrate 2 in the θ direction, can be calculated from the angle that the direction parallel to the line segment makes with the X direction. At this time, the resolution of the calculated angle θ changes depending on the number of pixels arranged along the X direction.

[0047] For example, to calculate the angle θ with a resolution of 0.003 degrees, 15,000 or more pixels must be arranged along the X direction. That is, in the stage device 1 according to this embodiment, it is preferable that the number of pixels arranged along the X direction is 15,000 or more.

[0048] Then, the position X of the substrate 2 in the X direction can be obtained from the position of the detected peak P as shown in FIG. 5(b) or FIG. 6(b). In other words, the amount of deviation of the substrate 2 from the reference position on the substrate support part 3 in the X direction can be calculated from the amount of deviation of the position of the peak P from the center of the light receiving surface of the second light receiving part 5b in the X direction.

[0049] As described above, in the stage device 1 according to this embodiment, the position Y of the substrate 2 in the Y direction and the angle θ in the θ direction are measured by the first measurement unit 4 having the first light receiving unit 4b formed from an area sensor. The position X of the substrate 2 in the X direction is measured by a second measurement unit 5 having a second light receiving unit 5b formed from a line sensor.

[0050] That is, in the stage device 1 according to this embodiment, the position X in the X direction, the position Y in the Y direction, and the angle θ in the θ direction of the substrate 2 can be measured using two measurement units, the first measurement unit 4 and the second measurement unit 5, which are fewer than in the past. In other words, with the stage device 1 according to this embodiment, pre-alignment can be performed with a simpler configuration than conventional ones, without being affected by the size or orientation of the substrate 2.

[0051] In the stage device 1 according to this embodiment, before detecting the peak P from the intensity distribution of the reflected light acquired by each of the first light receiving unit 4b and the second light receiving unit 5b, preprocessing such as noise removal and edge enhancement may be performed on the intensity distribution of the reflected light. Furthermore, in the stage device 1 according to this embodiment, a peak P is detected from the intensity distribution of the reflected light acquired by each of the first light receiving unit 4b and the second light receiving unit 5b, and the position of the substrate 2 is calculated from the position of the detected peak P, but this is not limited to this. That is, by treating the intensity distribution of the reflected light acquired by each of the first light receiving unit 4b and the second light receiving unit 5b as a mark, a known mark can be detected for the intensity distribution of the reflected light, and the position of the substrate 2 can be calculated from the center of gravity of the detected mark.

[0052] In addition, in the stage device 1 according to this embodiment, the intensity distribution of the reflected light at each of the first light receiving unit 4b and the second light receiving unit 5b when the substrate 2 is placed at a reference position on the substrate support unit 3 may be acquired in advance. The position of the substrate 2 may be calculated by comparing the intensity distribution of the reflected light acquired by the first light receiving unit 4b and the second light receiving unit 5b with the intensity distribution of the reflected light that has been acquired in advance.

[0053] Furthermore, in the stage device 1 according to this embodiment, a line sensor is used as the second light receiving unit 5b, but this is not limiting, and an area sensor may also be used as in the first light receiving unit 4b. Furthermore, although the stage device 1 according to this embodiment is configured to position the substrate 2 used in an exposure apparatus, it is not limited to this and may also be used to position a predetermined object.

[0054] Furthermore, the stage device 1 according to this embodiment is configured to position a substrate 2 having a rectangular substrate surface, but is not limited to this and may be configured to position a substrate 2 having a polygonal substrate surface with at least one side surface formed thereon. Furthermore, in stage device 1 according to this embodiment, the position X of substrate 2 in the X direction is measured using second measurement unit 5, but this is not limiting, and control unit 17 may acquire position X from the outside as a parameter.

[0055] Furthermore, the stage device 1 according to this embodiment is provided with a first light receiving unit 4b that receives measurement light reflected by the first side surface 2b and a second light receiving unit 5b that receives measurement light reflected by the second side surface 2c, but is not limited to this. That is, in the stage device 1 according to this embodiment, the first light receiving unit 4b may receive both the measurement light reflected by the first side surface 2b and the measurement light reflected by the second side surface 2c.

[0056] [Second embodiment] FIG. 7 shows a schematic top view of a stage device 11 according to the second embodiment. The stage device 11 of this embodiment does not have a second measurement unit 5 and has the same configuration as the stage device 1 of the first embodiment, except that the first measurement unit 4 is positioned differently. Therefore, the same components are given the same reference numerals and their explanations are omitted.

[0057] As shown in Figure 7, in the stage device 11 of this embodiment, the first light-projecting unit 4a of the first measurement unit 4 is positioned on the negative Y-direction side of the substrate 2 so as to project measurement light toward the vicinity of the corner 2a of the first side 2b of the substrate 2 when it is positioned at the reference position. The first light receiving section 4 b of the first measurement section 4 is disposed so as to receive the measurement light reflected by the vicinity of the corner 2 a of the first side surface 2 b of the substrate 2 .

[0058] At this time, the first light receiving portion 4b is disposed so that the corner 2a of the substrate 2 coincides with the center of the light receiving surface when the first light receiving portion 4b is disposed at a reference position in the XY plane. This allows the first measurement unit 4 to measure the position Y in the Y direction of the substrate 2, the position X in the X direction, and the angle θ in the XY plane, as will be described later.

[0059] Figure 8(a) shows an example of the intensity distribution of reflected light acquired on the light receiving surface of the first light receiving unit 4b when the substrate 2 is placed at a reference position on the substrate support unit 3 in the stage device 11 of this embodiment. On the other hand, Figure 8(b) shows an example of the intensity distribution of reflected light acquired on the light receiving surface of the first light receiving unit 4b when the substrate 2 is placed at a position shifted from the reference position on the substrate support unit 3 in the stage device 11 of this embodiment. In addition, in FIGS. 8(a) and (b), the intensity of the reflected light is represented by shading.

[0060] As shown in Figure 8(a) or (b), a portion of the parallel light beam emitted from the first light-projecting unit 4a is reflected by the first side surface 2b of the substrate 2, while the remainder travels straight without being irradiated onto the substrate 2. The light reflected by the first side surface 2b of the substrate 2 is received by the first light receiving section 4b, and the intensity distribution of the reflected light can be obtained.

[0061] That is, in the stage device 11 according to this embodiment, the intensity distribution of the reflected light from a part near the corner 2a of the first side surface 2b of the substrate 2 can be obtained in the first light receiving section 4b. Then, from the acquired intensity distribution of the reflected light, the position X of the corner 2a of the substrate 2 in the X direction, the position Y of the first side surface 2b in the Y direction, and the angle θ in the XY plane can be calculated.

[0062] Specifically, peaks P are detected for the luminance of a plurality of pixels arranged along each column in the Y direction for the intensity distribution of reflected light acquired on the light receiving surface of the first light receiving unit 4b. Among the detected peaks P, peaks P having a luminance lower than a predetermined threshold value are excluded as peaks P due to noise.

[0063] 9(a) and (b) show the positions of peaks P in each column detected in the intensity distribution of the reflected light shown in FIGS. 8(a) and (b), respectively. As shown in FIG. 9(a) or (b), the position Y of the substrate 2 in the Y direction can be obtained from the position of the midpoint of the line segment that passes through the peak P in each row.

[0064] In other words, the amount of deviation of the substrate 2 from the reference position on the substrate support part 3 in the Y direction can be calculated from the amount of deviation of the midpoint of the line segment from the center of the light receiving surface of the first light receiving part 4b in the Y direction. Furthermore, the angle θ of the substrate 2 in the θ direction, that is, the amount of rotation of the substrate 2 in the θ direction, can be calculated from the angle that the direction parallel to the line segment makes with the X direction.

[0065] Furthermore, the position X of the substrate 2 in the X direction can be obtained from the position of the end (third position) on the negative side of the X direction of the line segment that passes through the peak P. In other words, the amount of deviation of the substrate 2 from the reference position on the substrate support part 3 in the X direction can be calculated from the amount of deviation of the end part from the center of the light receiving surface of the first light receiving part 4b in the X direction.

[0066] As described above, in the stage device 11 according to this embodiment, the position X in the X direction, the position Y in the Y direction, and the angle θ in the θ direction of the substrate 2 are measured by the first measurement unit 4 having the first light receiving unit 4b formed from an area sensor. That is, the position X in the X direction, the position Y in the Y direction, and the angle θ in the θ direction of the substrate 2 can be measured using only the first measurement unit 4, which is less than that of the conventional stage device 1 and the first embodiment. In other words, with stage device 11 according to this embodiment, pre-alignment can be performed with a simpler configuration than conventional stage device 1 and stage device 1 according to the first embodiment, without being affected by the size or orientation of substrate 2.

[0067] Incidentally, in the stage device 11 according to this embodiment, the first measurement unit 4 that measures the position of the predetermined substrate 2 is provided, but the present invention is not limited to this. That is, for example, consider the case where two substrates 2 and 2' (second objects) are placed on a substrate support 3 as shown in FIG.

[0068] In this case, a first measurement unit 4 and a second measurement unit 4' (third measurement unit) may be provided, and the first measurement unit 4 may measure the position of the substrate 2, while the second measurement unit 4' may measure the position of the substrate 2'. Specifically, the light-projecting section 4a' (third light-projecting section) of the second measuring section 4' projects measurement light (third measurement light) toward the vicinity of the corner 2a' of the side surface (third side surface) extending in the X direction (fifth direction) formed on the substrate 2'.

[0069] Furthermore, the light receiving portion 4b' (third light receiving element) receives the measurement light reflected by the vicinity of the corner 2a' of the side surface. Then, from the light reception results at the light receiving section 4b', the position X in the X direction, the position Y in the Y direction (third position) of the substrate 2', and the angle θ (second angle) in the XY plane can be measured. This allows the control unit 17 to control a drive unit (not shown) that moves the substrate stage 6 from the position X, position Y and angle θ of the substrate 2' measured by the second measurement unit 4'.

[0070] Furthermore, in the stage device 11 according to this embodiment, a first measurement unit 4 is provided for measuring the position of the substrate 2 placed on the substrate support unit 3 in a first orientation in which the long side is parallel to the X direction, but this is not limited to this. That is, in addition to the first measurement unit 4, a second measurement unit 4' may be provided to measure the position of the substrate 2 placed on the substrate support unit 3 in a second orientation in which the long side is parallel to the Y direction.

[0071] [Exposure equipment] FIG. 11 shows a schematic cross-sectional view of an exposure apparatus 900 that is equipped with a stage apparatus according to the first or second embodiment.

[0072] The exposure apparatus 900 includes a lamp lighting device 401 (light source), an illumination optical system 402, a slit 403, an imaging optical system 404, an original stage 405, a projection optical system 406, and a substrate stage 6 controlled by a stage device according to the first or second embodiment.

[0073] The lamp lighting device 401 is a light source that emits ultraviolet light, such as a high-pressure mercury lamp. The illumination optical system 402 includes a first bending mirror 501 , a first condenser lens 502 , a fly's-eye lens 503 , a second condenser lens 504 , and a second bending mirror 505 . The original stage 405 is a mask stage that holds the original M, and can be driven in the Y direction shown in FIG.

[0074] The projection optical system 406 is configured to project and transfer a pattern drawn on the original M onto the substrate 2 coated with a photosensitive agent. The exposure apparatus 900 uses a projection optical system 406 that is an Offner type optical system. In the case of an Offner optical system, the original M is illuminated in an arc shape to ensure a good image area. The illumination shape of the exposure light that reaches the substrate 2 also has an arc shape. The light that passes through the original M is reflected in this order by the trapezoidal mirror 601, the concave mirror 602, the convex mirror 603, the concave mirror 602, and the trapezoidal mirror 601, before reaching the substrate 2, and the pattern on the original M is transferred onto the substrate 2.

[0075] The substrate stage 6 is a wafer stage that holds the substrate 2, and is driven in the Y direction in synchronization with the original stage 405, thereby exposing the substrate 2. The substrate stage 6 can be driven in the X direction as well as the Y direction, and when exposing a plurality of panels on the substrate 2, the substrate stage 6 is driven in both the X and Y directions to perform exposure.

[0076] The exposure light emitted from the lamp lighting device 401 passes through an illumination optical system 402 , a slit 403 and an imaging optical system 404 , and then irradiates the original M placed on an original stage 405 . The exposure light transmitted through the original M passes through the projection optical system 406 and irradiates the substrate 2 placed on the substrate stage 6, and the exposure area on the substrate 2 is exposed.

[0077] [Production method] Next, a method for manufacturing an article using an exposure apparatus 900 equipped with a stage apparatus according to the first or second embodiment will be described.

[0078] The products manufactured here include semiconductor devices, display devices, color filters, optical components, and MEMS (Micro Electro Mechanical Systems). For example, a semiconductor device is manufactured through a pre-process for creating a circuit pattern on a substrate 2 and a post-process including a processing step for completing the circuit chip created in the pre-process as a finished product.

[0079] The pre-processing includes an exposure process in which a substrate 2 coated with a photosensitive agent is exposed using an exposure apparatus 900 equipped with a stage apparatus according to the first or second embodiment, and a development process in which the photosensitive agent exposed by the exposure process is developed. Then, a circuit pattern is formed on the substrate 2 by performing an etching process, an ion implantation process, etc. using the developed photosensitive agent pattern as a mask.

[0080] By repeating these steps of exposure, development, etching, etc., a circuit pattern consisting of multiple layers is formed on the substrate 2. In the post-process, the substrate 2 on which the circuit pattern is formed is diced, and chip mounting, bonding and inspection processes are carried out.

[0081] A display device is manufactured through a process of forming a transparent electrode. The process of forming a transparent electrode includes a step of applying a photosensitive agent to a glass substrate 2 on which a transparent conductive film has been vapor-deposited, and a step of exposing the substrate 2 on which the photosensitive agent has been applied using an exposure apparatus 900 equipped with a stage apparatus according to the first or second embodiment. The step of forming the transparent electrode also includes a step of developing the exposed photosensitive agent.

[0082] The method for manufacturing an article according to this embodiment is more advantageous than conventional methods in at least one of the performance, quality, productivity, and production costs of the article.

[0083] Although the preferred embodiments have been described above, the present invention is not limited to these embodiments and various modifications and changes are possible within the scope of the gist thereof.

[0084] The disclosure of this embodiment includes the following configurations and methods. (Configuration 1) A stage device comprising: a stage having an object placement surface on which a first object is placed; a drive unit that moves the stage within a first plane parallel to the object placement surface; a first light-projecting unit that projects a first measurement light onto a first side surface extending in a first direction within the first plane formed on the first object; and a first measurement unit that has a first light-receiving element that receives the first measurement light reflected by the first side surface, and measures a first position of the first side surface in a second direction within the first plane and a first angle of the first side surface within the first plane from the light-receiving result at the first light-receiving element; and a control unit that controls the drive unit based on the first position and first angle measured by the first measurement unit. (Configuration 2) The stage device according to configuration 1, wherein the first light receiving element is an area sensor. (Configuration 3) A stage device according to configuration 1 or 2, characterized in that the first object has a rectangular shape with a second side surface extending in a third direction perpendicular to the first direction within the first plane, and the control unit acquires a second position of the second side surface in a fourth direction perpendicular to the second direction within the first plane, and controls the drive unit based on the first position and first angle measured by the first measurement unit and the acquired second position. (Configuration 4) A stage device according to Configuration 3, further comprising a second light-projecting unit that projects second measurement light onto a second side surface of the first object, and a second light-receiving element that receives the second measurement light reflected by the second side surface, and a second measurement unit that measures a second position from the light-receiving result at the second light-receiving element, and a control unit that acquires the second position measured by the second measurement unit. (Configuration 5) The stage device according to configuration 4, wherein the second light receiving element is a line sensor. (Configuration 6) A stage device according to Configuration 3, characterized in that the first measurement unit measures a third position of the end of the first side in a fourth direction, and the control unit acquires the third position measured by the first measurement unit as the second position. (Configuration 7) A stage device according to any one of configurations 3 to 6, characterized in that the first object is placed on the object placing surface so that a first side surface protrudes a predetermined distance from a first end of the object placing surface on a predetermined side in the second direction, and a second side surface protrudes a predetermined distance from a second end of the object placing surface on a predetermined side in the fourth direction. (Configuration 8) A stage device described in any one of configurations 1 to 7, characterized in that the first measurement unit determines the first position and the first angle from the intensity distribution of the first measurement light on the light receiving surface of the first light receiving element. (Configuration 9) A stage device according to Configuration 8, characterized in that the first light receiving element is arranged so that a plurality of pixel groups, each having a plurality of pixels arranged along the second direction on the light receiving surface, are arranged along a fourth direction perpendicular to the second direction within the first plane. (Configuration 10) A stage device according to Configuration 9, characterized in that the first measurement unit determines a maximum brightness pixel in each pixel group, which has the maximum brightness, and determines the position in the second direction of the midpoint of a line segment formed by the determined maximum brightness pixels as the first position. (Configuration 11) The stage device according to configuration 10, wherein the first measurement unit determines the angle formed by the direction parallel to the line segment with respect to the fourth direction as the first angle. (Configuration 12) The stage device according to configuration 10 or 11, wherein the first measurement unit excludes maximum brightness pixels having brightness less than a predetermined threshold value from the determined plurality of maximum brightness pixels. (Configuration 13) The stage device according to any one of Configurations 9 to 12, wherein the number of pixel groups arranged along the fourth direction in the first light receiving element is 15,000 or more. (Configuration 14) The stage device according to any one of configurations 1 to 13, wherein the first light projecting unit projects a parallel light beam in a first plane onto the first side surface as the first measurement light. (Configuration 15) The stage device according to any one of configurations 1 to 14, wherein the optical axis of the first light projecting unit is parallel to the second direction. (Configuration 16) The stage device according to any one of configurations 1 to 15, wherein the first light receiving element is arranged so that the light receiving surface is parallel to the first plane. (Configuration 17) A stage device according to any one of configurations 1 to 16, wherein the object placement surface is configured to allow a first object and a second object to be placed thereon, the stage device has a third light-projecting unit that projects third measurement light onto a third side surface extending in a fifth direction within a first plane formed on the second object, and a third light-receiving element that receives the third measurement light reflected by the third side surface, and is equipped with a third measurement unit that measures a third position of the third side surface in a second direction and a second angle within the first plane from the light-receiving result at the third light-receiving element, and the control unit controls the drive unit based on the third position and second angle measured by the third measurement unit. (Configuration 18) A stage device comprising: a stage having an object placement surface on which an object is placed; a drive unit that moves the stage within a first plane parallel to the object placement surface; a light projecting unit that projects first measurement light onto a first side surface extending in a first direction within the first plane formed on the object; a first measurement unit that has an area sensor that receives the first measurement light reflected by the first side surface and measures the amount of deviation of the first side surface from a reference position within the first plane; and a control unit that controls the drive unit based on the amount of deviation measured by the first measurement unit. (Configuration 19) An exposure apparatus that projects an image of a pattern of an original onto a substrate and exposes the substrate, characterized in that it includes a substrate stage on which the substrate is placed, which is controlled by a stage device described in any one of Configurations 1 to 18. (Method 1) A method for manufacturing an article, comprising the steps of exposing a substrate using the exposure apparatus according to Configuration 19, developing the exposed substrate, and processing the developed substrate to obtain an article. [Explanation of symbols]

[0085] 1 Stage device 2. Substrate (first object) 2b First aspect 3. Substrate support part (object placement surface) 4. First measurement section 4a First light emitting unit 4b First light receiving element 6 Substrate stage (stage) 17 Control Unit

Claims

1. a stage having an object placement surface on which a first object is placed; a drive unit that moves the stage within a first plane that is parallel to the object placement surface; a first measurement unit including a first light-projecting unit that projects a first measurement light onto a first side surface that extends in a first direction within the first plane formed on the first object, and a first light-receiving element that receives the first measurement light reflected by the first side surface, and that measures a first position of the first side surface in a second direction within the first plane and a first angle of the first side surface within the first plane from a light-receiving result of the first light-receiving element; a control unit that controls the drive unit based on the first position and the first angle measured by the first measurement unit; A stage device comprising:

2. 2. A stage apparatus according to claim 1, wherein the first light receiving element is an area sensor.

3. the first object has a rectangular shape with a second side surface formed thereon, the second side surface extending in a third direction perpendicular to the first direction within the first plane; The control unit obtaining a second position of the second side in a fourth direction perpendicular to the second direction within the first plane; 2. The stage apparatus according to claim 1, wherein the driving unit is controlled based on the first position and the first angle measured by the first measurement unit and the acquired second position.

4. a second measurement unit including a second light-projecting unit that projects second measurement light onto the second side surface of the first object and a second light-receiving element that receives the second measurement light reflected by the second side surface, and that measures the second position from a light-receiving result of the second light-receiving element; 4. The stage apparatus according to claim 3, wherein the control unit acquires the second position measured by the second measurement unit.

5. 5. A stage apparatus according to claim 4, wherein the second light receiving element is a line sensor.

6. the first measurement unit measures a third position of an end of the first side surface in the fourth direction; 4. The stage apparatus according to claim 3, wherein the control unit acquires the third position measured by the first measurement unit as the second position.

7. 4. The stage device according to claim 3, wherein the first object is placed on the object placing surface such that the first side surface protrudes a predetermined distance from a first end of the object placing surface on a predetermined side in the second direction, and the second side surface protrudes a predetermined distance from a second end of the object placing surface on a predetermined side in the fourth direction.

8. 2. The stage apparatus according to claim 1, wherein the first measurement unit determines the first position and the first angle from an intensity distribution of the first measurement light on the light receiving surface of the first light receiving element.

9. 9. The stage device according to claim 8, wherein the first light-receiving element is arranged so that a plurality of pixel groups, each having a plurality of pixels arranged along the second direction on the light-receiving surface, are arranged along a fourth direction perpendicular to the second direction within the first plane.

10. The first measurement unit A maximum brightness pixel is determined for each pixel group; 10. The stage apparatus according to claim 9, wherein the position in the second direction of the midpoint of a line segment formed by the determined plurality of maximum luminance pixels is determined as the first position.

11. 11. The stage apparatus according to claim 10, wherein the first measurement unit determines an angle formed between a direction parallel to the line segment and the fourth direction as the first angle.

12. 11. The stage apparatus according to claim 10, wherein the first measurement unit excludes, from the determined plurality of maximum brightness pixels, the maximum brightness pixels whose brightness is smaller than a predetermined threshold value.

13. 10. The stage device according to claim 9, wherein the number of the pixel groups arranged along the fourth direction in the first light receiving element is 15,000 or more.

14. 2. The stage apparatus according to claim 1, wherein the first light projecting unit projects a parallel light beam in the first plane onto the first side surface as the first measurement light.

15. 2. The stage device according to claim 1, wherein the optical axis of said first light projecting unit is parallel to said second direction.

16. 2. A stage apparatus according to claim 1, wherein the first light receiving element is disposed so that a light receiving surface thereof is parallel to the first plane.

17. the object placement surface is configured to allow the first object and the second object to be placed thereon; the stage device comprises a third measurement unit having a third light-projecting unit that projects third measurement light onto a third side surface that is formed on the second object and extends in a fifth direction within the first plane, and a third light-receiving element that receives the third measurement light reflected by the third side surface, and that measures a third position of the third side surface in the second direction and a second angle within the first plane from a light-receiving result at the third light-receiving element; 2. The stage apparatus according to claim 1, wherein the control unit controls the drive unit based on the third position and the second angle measured by the third measurement unit.

18. a stage having an object placement surface on which an object is placed; a drive unit that moves the stage within a first plane that is parallel to the object placement surface; a first measurement unit including a light projecting unit that projects a first measurement light onto a first side surface that extends in a first direction within the first plane formed on the object, and an area sensor that receives the first measurement light reflected by the first side surface, and that measures a deviation amount of the first side surface from a reference position within the first plane; a control unit that controls the drive unit based on the amount of deviation measured by the first measurement unit; A stage device comprising:

19. An exposure apparatus that projects an image of a pattern of an original onto a substrate and exposes the substrate, An exposure apparatus comprising: a substrate stage on which the substrate is placed, the substrate stage being controlled by the stage device according to claim 1 .

20. exposing the substrate using the exposure apparatus according to claim 19; developing the exposed substrate; processing the developed substrate to obtain an article; A method for manufacturing an article, comprising:

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