Powder film forming device and powder film forming method

Abstract

To provide a powder film forming device and powder film forming method that suppress generation of foreign matters.SOLUTION: A powder film forming device 5 comprises: a chamber 10 having an internal space 104 that includes an upper space 106 and a lower space 108, an exhaust hole 110 communicating with the upper space 106, and a lower-side introduction hole 118 communicating with the lower space 108; a vacuum pump 20; a disintegrating part 300 that disperses powder agglomerate; a raw material gas supply part 40 that supplies raw material gas to the lower space 108 via the lower-side introduction hole 118; and a control part 80 that controls rotation of the disintegrating part 300 and supply of raw material gas from the raw material gas supply part 40. Before raw material gas is supplied, the disintegrating part 300 is located on a top side in a vertical direction relative to the exhaust hole 110, and by supplying the raw material gas, the control part 80 causes the powder to form a film.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present disclosure relates to a powder film forming apparatus and a powder film forming method for forming a powder film. [Background technology]

[0002] As described in Patent Document 1, a fluidized bed apparatus is known that includes a processing vessel, a rotating rotor, a crushing mechanism, a draft tube, and a spray nozzle. The rotating rotor is disposed near the bottom of the processing vessel. The crushing mechanism is disposed above the rotating rotor and disperses agglomerates of powder and granular particles by mechanical crushing force. The draft tube is disposed above the crushing mechanism. Fluidizing gas introduced from the bottom of the processing vessel causes the powder and granular particles in the processing vessel to form a fluidized bed that rises through the space between the inner wall of the processing vessel and the draft tube and circulates downward inside the draft tube. The agglomerates of powder and granular particles that descend along the inside of the draft tube are dispersed by the crushing mechanism. The powder and granular particles that pass through the crushing mechanism are sent into the ascending air current of the fluidizing gas by the centrifugal force of the rotating rotor. The spray nozzle sprays a spray liquid toward the powder and granular particles circulating inside the processing vessel. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 4015593 Summary of the Invention [Problem to be solved by the invention]

[0004] When the fluidized bed apparatus described in Patent Document 1 is used for gas-phase film formation, such as ALD or CVD, instead of liquid-phase film formation, such as spray film formation, the mean free path of the film-forming raw material is longer than in liquid-phase film formation, resulting in film formation not only on the powder particles but also on the crushing mechanism. When the film formed on the crushing mechanism peels off, it becomes foreign matter. When this foreign matter adheres to the powder particles themselves or to the powder particles on which the film is formed, it degrades the properties of the powder particles themselves and the film formed on the powder particles. Note that ALD stands for atomic layer deposition. CVD stands for chemical vapor deposition.

[0005] The present disclosure aims to provide a powder film forming apparatus and a powder film forming method that suppress the generation of foreign matter. [Means for solving the problem]

[0006] The invention described in claim 1 is a powder film-forming apparatus for forming a film from powder, comprising: an internal space (104) including an upper space (106) that is a space on the top side in the vertical direction and a lower space (108) that is a space on the bottom side in the vertical direction and stores powder; a chamber (10) having an exhaust hole (110) communicating with the upper space and an introduction hole (118) communicating with the lower space; an exhaust unit (20) that reduces the pressure in the internal space and exhausts gas in the internal space through the exhaust hole; a disintegrating unit (300) that disperses agglomerates of powder by rotating; a raw material gas supply unit (40) that supplies raw material gas to the lower space through the introduction hole; and a control unit (80) that controls the rotation of the disintegrating unit and the supply of raw material gas from the raw material gas supply unit, wherein the disintegrating unit is located on the top side in the vertical direction relative to the exhaust hole before the raw material gas is supplied; and the control unit supplies the raw material gas to form a film from the powder.

[0007] The invention described in claim 7 is a powder film-forming method for forming a film from powder, comprising: a chamber (10) having an internal space (104) including an upper space (106) that is a space on the top side in the vertical direction and a lower space (108) that is a space on the bottom side in the vertical direction and stores powder; an exhaust hole (110) communicating with the upper space; and an inlet hole (118) communicating with the lower space; an exhaust unit (20) that reduces the pressure in the internal space and exhausts gas in the internal space through the exhaust hole; a disintegrating unit (300) that disperses agglomerates of powder by rotating; a raw material gas supply unit (40) that supplies raw material gas to the lower space through the inlet hole; and a control unit (80) that controls the rotation of the disintegrating unit and the supply of raw material gas from the raw material gas supply unit; and the powder film-forming method includes: positioning the disintegrating unit on the top side in the vertical direction relative to the exhaust hole before the raw material gas is supplied; and supplying the raw material gas, thereby forming a film from the powder.

[0008] As a result, the supplied raw material gas is exhausted through the exhaust hole before reaching the crushing section. This prevents film formation on the crushing section. Therefore, the generation of film-forming material on the crushing section that becomes foreign matter is suppressed. Therefore, the generation of foreign matter is suppressed.

[0009] The reference symbols in parentheses attached to each component indicate an example of the correspondence between the component and the specific components described in the embodiments described below. [Brief explanation of the drawings]

[0010] [Figure 1] FIG. 1 is a configuration diagram of a powder film forming apparatus according to a first embodiment. [Figure 2] 4 is a flowchart showing the processing of a control unit of the powder film forming apparatus. [Figure 3] 4 is a time chart showing the processing of the control unit. [Figure 4] FIG. 2 is a diagram showing the supply of an inert gas in the powder deposition apparatus. [Figure 5] FIG. [Figure 6] FIG. 10 is a diagram showing the movement of powder in the powder film forming apparatus of the second embodiment. [Figure 7] FIG. [Figure 8] FIG. 10 is a configuration diagram of a powder film forming apparatus according to a third embodiment. [Figure 9] 10 is a flowchart showing the processing of a control unit in the powder film forming apparatus of the fourth embodiment. [Figure 10] 10 is a flowchart showing the processing of a control unit. [Figure 11] 4 is a time chart showing the processing of the control unit. [Figure 12] FIG. 10 is a configuration diagram of a powder film forming apparatus according to a fifth embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0011] Hereinafter, embodiments will be described with reference to the drawings. In the following embodiments, identical or equivalent parts will be denoted by the same reference numerals, and description thereof will be omitted.

[0012] (First embodiment) The powder deposition apparatus of this embodiment is an apparatus that deposits powder using a gas phase deposition method such as ALD or CVD, and suppresses the generation of foreign matter. The powder deposition apparatus of the first embodiment uses ALD. The powder to be deposited is made of, for example, carbon.

[0013] 1 , the powder deposition apparatus 5 includes a chamber 10, a vacuum pump 20, an exhaust pipe 22, an exhaust valve 24, and a crusher 30. The powder deposition apparatus 5 further includes a source gas supply unit 40, a source gas pipe 42, a source gas valve 44, a reactant gas supply unit 50, a reactant gas pipe 52, a reactant gas valve 54, a purge gas supply unit 60, a purge gas pipe 62, and a purge gas valve 64. The powder deposition apparatus 5 also includes an inert gas supply unit 70, an inert gas pipe 72, an inert gas valve 74, and a control unit 80.

[0014] The chamber 10 is made of a metal such as stainless steel and has a shape of a container extending in the vertical direction. The chamber 10 further includes an upper chamber portion 100, a powder container 102, and an internal space 104.

[0015] The upper chamber portion 100 is the top portion of the chamber 10. The upper chamber portion 100 also forms an upper space 106. The upper space 106 is the top space of the space within the chamber 10. The upper chamber portion 100 also includes an exhaust hole 110, an exhaust filter 112, and an upper-side inlet hole 114.

[0016] The exhaust hole 110 communicates with the upper space 106 in a direction perpendicular to the vertical direction. An exhaust filter 112 is attached to the exhaust hole 110. The exhaust filter 112 has numerous holes that allow gas to pass through but prevent powder from passing through. In FIG. 1, the exhaust hole 110 is depicted with a dotted pattern to clearly show it.

[0017] The upper introduction hole 114 is located on the upper side in the vertical direction relative to the exhaust hole 110 and the crushing section 300 described below. Furthermore, the upper introduction hole 114 communicates with the upper space 106 in a direction perpendicular to the vertical direction.

[0018] The powder container 102 is a bottom-side portion of the chamber 10. The powder container 102 is connected to the upper chamber 100 in the vertical direction. The powder container 102 is fixed to the upper chamber 100 with fixing members such as screws (not shown). The powder container 102 is detached from the upper chamber 100 when the fixing members are removed. The powder container 102 also forms a lower space 108. The lower space 108 is a bottom-side space in the vertical direction within the chamber 10. The lower space 108 stores powder. The lower space 108 and the upper space 106 form an internal space 104. The powder container 102 also includes a lower filter 116 and a lower inlet hole 118.

[0019] The lower filter 116 is disposed in the lower space 108. The lower filter 116 has numerous holes that allow gas to pass through but prevent powder from passing through. When a film is formed on the powder, the powder is disposed on the lower filter 116. In FIG. 1, the lower filter 116 and the powder are depicted with a dotted pattern to clearly show them.

[0020] The lower introduction hole 118 is located on the bottom side in the vertical direction relative to the stored powder and the lower filter 116. Furthermore, the lower introduction hole 118 communicates with the lower space 108 in the vertical direction.

[0021] The vacuum pump 20 corresponds to an exhaust unit, and is connected to an exhaust hole 110 via an exhaust pipe 22. The vacuum pump 20 reduces the pressure in the internal space 104 and exhausts gas from the internal space 104 via the exhaust hole 110. The exhaust valve 24 is a control valve or a solenoid valve, and is attached to the exhaust pipe 22.

[0022] The crusher 30 has a crushing section 300 , a shaft section 302 , a crushing drive section 304 , a support section 306 and a guide section 308 .

[0023] The crushing unit 300 is disposed in the upper space 106. Furthermore, the crushing unit 300 is located above the exhaust hole 110 in the vertical direction and below the upper introduction hole 114 in the vertical direction. Therefore, before a film is formed on the powder, that is, in the initial state before the raw material gas and reactive gas described below are supplied, the crushing unit 300 is located between the exhaust hole 110 and the upper introduction hole 114 in the vertical direction. Furthermore, the crushing unit 300 has a plurality of protrusions and the like. Furthermore, the crushing unit 300 disperses agglomerates of the powder by rotating.

[0024] The shaft portion 302 is connected to the crushing portion 300 in the vertical direction. The shaft portion 302 also extends in the vertical direction.

[0025] The crushing drive unit 304 is a motor or the like, and is connected to the end of the shaft unit 302 protruding from the support unit 306 described below. Furthermore, the crushing drive unit 304 rotates the shaft unit 302. This causes the crushing unit 300 connected to the shaft unit 302 to rotate.

[0026] The support part 306 is formed, for example, in the shape of a plate extending in a direction perpendicular to the top-bottom direction. Furthermore, the crushing drive part 304 is disposed on top of the support part 306. Therefore, the support part 306 supports the crushing drive part 304. Furthermore, a hole is formed in the support part 306. A part of the shaft part 302 is inserted into the hole of the support part 306.

[0027] The guide unit 308, together with the support unit 306, closes the upper space 106. The guide unit 308 also includes, for example, a linear motor, a ball screw, and a rail (not shown). The axes of the ball screw and the rail extend in the vertical direction. Furthermore, a block (not shown) is attached to the ball screw and the rail. The support unit 306 is attached to this block. Then, when the linear motor of the guide unit 308 rotates, the ball screw of the guide unit 308 rotates. As a result, the block moves in the vertical direction along the rail. As a result, the support unit 306 attached to the block moves in the vertical direction. Therefore, the crushing drive unit 304 supported by the support unit 306 moves in the vertical direction. Therefore, the shaft unit 302 connected to the crushing drive unit 304 moves in the vertical direction. As a result, the crushing unit 300 connected to the shaft unit 302 moves in the vertical direction.

[0028] The raw material gas supply unit 40 has a cylinder or the like to store a raw material gas. The raw material gas is, for example, TMA. TMA is trimethylaluminum. The raw material gas supply unit 40 is connected to the lower inlet 118 via a raw material gas pipe 42. The raw material gas supply unit 40 supplies the raw material gas to the lower space 108 via the raw material gas pipe 42 and the lower inlet 118. The raw material gas valve 44 is a control valve or a solenoid valve, and is attached to the raw material gas pipe 42.

[0029] The reactive gas supply unit 50 has a cylinder or the like to store a reactive gas. The reactive gas is, for example, water vapor. The reactive gas supply unit 50 is connected to the lower inlet 118 via the reactive gas pipe 52. The reactive gas supply unit 50 supplies the reactive gas to the lower space 108 via the reactive gas pipe 52 and the lower inlet 118. The reactive gas valve 54 is a control valve or a solenoid valve, and is attached to the reactive gas pipe 52.

[0030] The purge gas supply unit 60 has a cylinder or the like and stores a purge gas. As will be described later, the purge gas is a gas that expels the source gas and the reaction gas from the internal space 104 and fluidizes the powder stored in the lower space 108, and is, for example, nitrogen. The purge gas supply unit 60 is connected to the lower side inlet 118 via a purge gas pipe 62. The purge gas supply unit 60 supplies the purge gas to the lower space 108 via the purge gas pipe 62 and the lower side inlet 118. The purge gas valve 64 is a control valve or a solenoid valve and is attached to the purge gas pipe 62.

[0031] The inert gas supply unit 70 has a cylinder or the like and stores an inert gas. The inert gas is, for example, nitrogen. The inert gas supply unit 70 is connected to the upper side inlet 114 via the inert gas piping 72. The inert gas supply unit 70 supplies the inert gas to the upper space 106 via the inert gas piping 72 and the upper side inlet 114. The supplied inert gas flows downward around the crushing unit 300, and therefore blocks the raw material gas and reaction gas flowing toward the crushing unit 300. The inert gas valve 74 is a control valve or a solenoid valve, and is attached to the inert gas piping 72.

[0032] The control unit 80 is mainly composed of a microcomputer and includes a CPU, ROM, flash memory, RAM, I / O, drive circuits, and bus lines connecting these components. The control unit 80 also executes a program stored in the ROM of the control unit 80. The control unit 80 controls the opening and closing of the exhaust valve 24 to control the evacuation of gas from the internal space 104 by the vacuum pump 20. The control unit 80 also controls the rotation of the crushing unit 300 by controlling the crushing drive unit 304. The control unit 80 also controls the movement of the crushing unit 300, shaft unit 302, crushing drive unit 304, and support unit 306 by controlling the linear drive motor of the guide unit 308. The control unit 80 also controls the supply of raw material gas from the raw material gas supply unit 40 by controlling the opening and closing of the raw material gas valve 44. The control unit 80 also controls the supply of reactant gas from the reactant gas supply unit 50 by controlling the opening and closing of the reactant gas valve 54. Furthermore, the control unit 80 controls the supply of purge gas from the purge gas supply unit 60 by controlling the opening and closing of the purge gas valve 64. The control unit 80 also controls the supply of inert gas from the inert gas supply unit 70 by controlling the opening and closing of the inert gas valve 74. Then, a film is formed on the powder by these controls. The film formation on the powder by these controls will be described later.

[0033] The powder film formation apparatus 5 of the first embodiment is configured as described above. Next, film formation on powder by execution of the program of the control unit 80 will be described with reference to the flowchart of FIG. 2 and the time chart of FIG. 3. The program of the control unit 80 is executed, for example, in the following cases. The following cases refer to when, as shown in FIG. 1, powder is placed on the lower filter 116 and placed in the powder container 102, and the powder container 102 is connected to the upper chamber 100, and a switch (not shown) that executes the program of the control unit 80 is pressed.

[0034] In step S100 of FIG. 2, the control unit 80 outputs a signal to the exhaust valve 24 to open it. This causes the exhaust valve 24 to open. As a result, the gas in the internal space 104 is exhausted, reducing the pressure in the internal space 104. At this time, the exhaust flow rate of the vacuum pump 20 and other factors are adjusted so that the powder stored in the lower space 108 does not flow. Also, at this time, the inert gas valve 74 is closed. The raw material gas valve 44 is closed. The reaction gas valve 54 is closed. The purge gas valve 64 is closed. The disintegrator 300 is stopped. Furthermore, at this time, the control unit 80 may heat the chamber 10 by controlling a heater (not shown) or the like so that the temperature of the chamber 10 reaches a predetermined temperature in order to facilitate adsorption of the gas described below.

[0035] In step S102 following step S100, the control unit 80 continues to output a signal to the exhaust valve 24 to open it. As a result, the exhaust valve 24 remains open. At this time, the exhaust flow rate of the vacuum pump 20 and the like are adjusted so that the powder stored in the lower space 108 does not flow. Also, at this time, the inert gas valve 74 is closed. The raw material gas valve 44 is closed. The reaction gas valve 54 is closed. The purge gas valve 64 is closed. The disintegrator 300 is stopped.

[0036] In step S104 following step S102, the control unit 80 outputs a signal to the inert gas valve 74 to open it. This causes the inert gas valve 74 to open. Therefore, as shown in FIG. 4, inert gas is supplied through the upper inlet 114. The supplied inert gas flows downward around the crushing unit 300, and therefore blocks the raw material gas and reactive gas, which will be described later, flowing toward the crushing unit 300. At this time, the exhaust valve 24 is open. The raw material gas valve 44 is closed. The reactive gas valve 54 is closed. The purge gas valve 64 is closed. The crushing unit 300 is stopped.

[0037] Returning to FIG. 2, in step S106 following step S104, the control unit 80 outputs a signal to the raw material gas valve 44 to open it. As a result, the raw material gas valve 44 is open during the period from time t1 to time t2 in FIG. 3. Therefore, the raw material gas from the raw material gas supply unit 40 is supplied to the lower space 108 through the raw material gas piping 42 and the lower-side inlet 118. The raw material gas supplied to the lower space 108 is adsorbed by the powder stored in the lower space 108. Note that during the period from time t1 to time t2, the exhaust valve 24 is open. The inert gas valve 74 is open. The reaction gas valve 54 is closed. The purge gas valve 64 is closed. The disintegrator 300 is stopped.

[0038] In step S108 following step S106, the control unit 80 outputs a signal to the raw material gas valve 44 to close the raw material gas valve 44. As a result, the raw material gas valve 44 closes at time t2. This stops the supply of raw material gas from the raw material gas supply unit 40. At this time, since the exhaust of gas from the internal space 104 continues, the raw material gas supplied to the lower space 108 and the gas generated by the adsorption reaction are exhausted through the exhaust hole 110.

[0039] In step S110 following step S108, the control unit 80 outputs a signal to the purge gas valve 64 to open it. As a result, the purge gas valve 64 is open during the period from time t3 to time t4. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower side inlet 118. This dilutes the raw material gas that has not been completely exhausted and remains in the lower space 108 and the gas generated by the adsorption reaction. Note that during the period from time t3 to time t4, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reaction gas valve 54 is closed. The disintegrator 300 is stopped.

[0040] In step S112 following step S110, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t4, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0041] In step S114 following step S112, the control unit 80 outputs a signal to the reactant gas valve 54 to open it. As a result, the reactant gas valve 54 is open during the period from time t5 to time t6. Therefore, the reactant gas from the reactant gas supply unit 50 is supplied to the lower space 108 through the reactant gas piping 52 and the lower inlet 118. The reactant gas supplied to the lower space 108 reacts with the raw material gas adsorbed to the powder stored in the lower space 108. As a result, a film equivalent to one atomic layer is formed on the powder. Note that during the period from time t5 to time t6, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The purge gas valve 64 is closed. The disintegrator 300 is stopped.

[0042] In step S116 following step S114, the control unit 80 outputs a signal to the reactant gas valve 54 to close it. As a result, the reactant gas valve 54 closes at time t6. This stops the supply of reactant gas from the reactant gas supply unit 50. At this time, since the exhaust of gas from the internal space 104 continues, the reactant gas supplied to the lower space 108 and the gas generated by the reaction with the reactant gas are exhausted through the exhaust hole 110.

[0043] In step S118 following step S116, the control unit 80 outputs a signal to the purge gas valve 64 to open it. As a result, the purge gas valve 64 is open during the period from time t7 to time t8. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower side inlet 118. This dilutes the reactive gas that has not been completely exhausted and remains in the lower space 108, and the gas generated by reaction with the reactive gas. Note that during the period from time t7 to time t8, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reactive gas valve 54 is closed. The disintegrator 300 is stopped.

[0044] In step S120 following step S118, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t8, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0045] In step S122 following step S120, the control unit 80 counts the number of film formations Nd by adding 1 to the number of film formations Nd. The number of film formations Nd is the number of times a series of processes from step S106 to step S120 has been performed.

[0046] In step S124 following step S122, the control unit 80 determines whether the number of times Nd of film formation counted in step S122 is equal to or greater than a film formation threshold value Nd_th. Note that the film formation threshold value Nd_th is set by experiment, simulation, or the like so that the film formed on the powder has a desired thickness.

[0047] If the number of times Nd of film formation is less than the film formation threshold value Nd_th, the film thickness formed on the powder does not reach the desired film thickness, and the control unit 80 returns to step S106. Furthermore, the processes from step S106 to step S124 are repeated until the number of times Nd of film formation reaches the film formation threshold value Nd_th, that is, until the film thickness formed on the powder reaches the desired film thickness.

[0048] Furthermore, when the number of times of film formation Nd is equal to or greater than the film formation threshold value Nd_th, the film thickness formed on the powder is equal to the desired film thickness. Therefore, the process of the control unit 80 proceeds to step S126.

[0049] In step S126 following step S124, the control unit 80 resets the number of times Nd of film formation counted in step S122 by setting it to zero. This allows repeated processing from step S106 to step S124 to achieve desired values ​​for both the film thickness of the film formed on the powder and the surface area ratio of the coated surface of the film formed on the powder, as described below.

[0050] In step S128 following step S126, the control unit 80 outputs a signal to the purge gas valve 64 to open the purge gas valve 64. As a result, the purge gas valve 64 is open during the period from time t9 to time t10. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower-side inlet 118. As a result, the film-forming powder stored in the lower space 108 flows within the lower space 108. The film-forming powder refers to powder that has been film-formed.

[0051] In step S130 following step S128, the control unit 80 outputs a signal to the guide unit 308 to drive the guide unit 308. As a result, the crushing unit 300, the shaft unit 302, the crushing drive unit 304, and the support unit 306 move from the upper space 106 to the lower space 108, as shown in Fig. 5. As a result, the crushing unit 300 comes into contact with the film forming powder stored in the lower space 108.

[0052] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to rotate the crushing drive unit 304. As a result, during the period from time t9 to time t10, the crushing drive unit 304 rotates, causing the crushing unit 300 to rotate. As the crushing unit 300 rotates, agglomerates of the film forming powder stored in the lower space 108 are dispersed. Furthermore, the supplied purge gas causes the film forming powder stored in the lower space 108 to flow within the lower space 108. This prevents agglomerates from being dispersed by the crushing unit 300. During the period from time t9 to time t10, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reactant gas valve 54 is closed.

[0053] 2, in step S132 following step S130, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t10, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0054] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to stop the rotation of the crushing drive unit 304. As a result, at time t10, the rotation of the crushing drive unit 304 stops, and the rotation of the crushing unit 300 stops. Furthermore, the dispersed film forming powder is stored in the lower space 108 by gravity.

[0055] The control unit 80 also outputs a signal to the guide unit 308 to drive the guide unit 308. As a result, the crushing unit 300, the shaft unit 302, the crushing drive unit 304, and the support unit 306 move from the lower space 108 to the upper space 106. As a result, the crushing unit 300 moves away from the film-forming powder stored in the lower space 108. Furthermore, the crushing unit 300 returns to its initial position, which is a position between the exhaust hole 110 and the upper-side introduction hole 114 in the vertical direction, as shown in FIG. 1 .

[0056] Returning to Fig. 2, in step S134 following step S132, the control unit 80 counts the number of times of crushing Nc by adding 1 to the number of times of crushing Nc. Note that the number of times of crushing Nc is the number of times a series of processes from step S106 to step S132 has been performed.

[0057] In step S136 following step S134, the control unit 80 determines whether the number of times of crushing Nc counted in step S134 is equal to or greater than the crushing threshold value Nc_th. The crushing threshold value Nc_th is set by experiment, simulation, or the like so that both the film thickness formed on the powder and the surface area ratio of the coating surface formed on the powder are desired values.

[0058] When the number of times of crushing Nc is less than the crushing threshold value Nc_th, both the film thickness of the film formed on the powder and the surface area ratio of the coated surface formed on the powder do not reach the desired values, and the control unit 80 returns to step S106. Furthermore, the processes from step S106 to step S136 are repeated until the number of times of crushing Nc reaches the crushing threshold value Nc_th, that is, until both the film thickness of the film formed on the powder and the surface area ratio of the coated surface formed on the powder reach the desired values.

[0059] Furthermore, when the number of times of crushing Nc is equal to or greater than the crushing threshold Nc_th, both the film thickness of the film formed on the powder and the surface area ratio of the coating surface formed on the powder are desired values. Therefore, the control unit 80 outputs a signal to the exhaust valve 24 to close the exhaust valve 24. As a result, the exhaust valve 24 closes at time t11. Furthermore, the control unit 80 outputs a signal to the inert gas valve 74 to close the inert gas valve 74. As a result, the inert gas valve 74 closes at time t11. Therefore, the processing of the control unit 80 ends. Thus, the film formation on the powder is completed.

[0060] As described above, the powder on which a film is formed by the powder film forming apparatus 5 of this embodiment is made of carbon. The source gas is TMA. The reactive gas is water vapor. Therefore, the film formed on the powder is made of alumina. This powder on which an alumina film is formed is used as a raw material for manufacturing a battery, for example. Furthermore, a battery manufactured using this powder on which an alumina film is formed as a raw material has improved electrode performance.

[0061] As described above, a film is formed on powder by executing the program in the control unit 80. Next, how the powder film forming apparatus 5 suppresses the generation of foreign matter will be described.

[0062] If the fluidized bed apparatus described in Patent Document 1 is used for gas-phase film formation, such as ALD or CVD, instead of liquid-phase film formation, such as spray film formation, the mean free path of the film-forming raw material becomes longer compared to liquid-phase film formation, resulting in film formation not only on the powder particles but also on the crushing mechanism. When the film formed on the crushing mechanism peels off, it becomes foreign matter. When this foreign matter adheres to the powder particles themselves or the coated powder particles, it degrades the properties of the powder particles themselves and the coated powder particles.

[0063] 1, in the powder deposition apparatus 5 of this embodiment, the raw material gas and the reactive gas are supplied to the lower space 108 through the lower introduction hole 118. Furthermore, before the raw material gas and the reactive gas are supplied, the crushing section 300 is located on the upper side in the vertical direction relative to the exhaust hole 110.

[0064] As a result, the supplied raw material gas and reactive gas are exhausted through the exhaust hole 110 before reaching the crushing section 300. This prevents film formation in the crushing section 300. Therefore, the generation of film-forming material in the crushing section 300 that becomes foreign matter is suppressed. Therefore, the generation of foreign matter is suppressed.

[0065] Furthermore, the powder film forming apparatus 5 of the first embodiment also provides the following effects.

[0066] [1-1] The control unit 80 controls the movement of the disintegrator 300. As shown in Fig. 5, the control unit 80 moves the disintegrator 300 into the lower space 108, brings it into contact with the powder stored in the lower space 108, and rotates it to disperse powder agglomerates. This makes it relatively easy to disperse powder agglomerates.

[0067] [1-2] The chamber upper part 100 includes an upper-side inlet 114. The upper-side inlet 114 is located on the upper side of the crushing part 300 in the vertical direction, and is connected to the upper space 106. The powder deposition apparatus 5 further includes an inert gas supply unit 70. The inert gas supply unit 70 supplies an inert gas to the upper space 106 through the upper-side inlet 114. The control unit 80 controls the supply of the inert gas from the inert gas supply unit 70. The control unit 80 also blocks the raw material gas and reactive gas from flowing toward the crushing part 300 by supplying the inert gas through the upper-side inlet 114.

[0068] This makes it difficult for the supplied raw material gas and reactive gas to reach the crushing section 300. This prevents film formation on the crushing section 300. This prevents the generation of film-forming material on the crushing section 300 that becomes foreign matter. This prevents the generation of foreign matter.

[0069] (Second embodiment) In the second embodiment, the control by the control unit 80 is different from that in the first embodiment. Also, the form of crushing by the crushing unit 300 is different from that in the first embodiment. Specifically, the processes of steps S128, S130, and S132 in the processing by the control unit 80 are different from those in the first embodiment. Other than these, the second embodiment is the same as the first embodiment.

[0070] In addition to the above controls, the control unit 80 controls the flow rate of the raw material gas from the raw material gas supply unit 40 by controlling the aperture of the raw material gas valve 44. The control unit 80 also controls the flow rate of the reactive gas from the reactive gas supply unit 50 by controlling the aperture of the reactive gas valve 54. Furthermore, the control unit 80 controls the flow rate of the purge gas from the purge gas supply unit 60 by controlling the aperture of the purge gas valve 64.

[0071] Then, in step S128 following step S126, the control unit 80 outputs a signal to the purge gas valve 64 to open the purge gas valve 64. This opens the purge gas valve 64. At this time, the control unit 80 also supplies a purge gas having a flow rate greater than the flow rates of the source gas and the reactant gas when the source gas and the reactant gas are supplied. This causes the film formation powder to move from the lower space 108 to the upper space 106, as shown in FIG. 6.

[0072] In step S130 following step S128, the control unit 80 outputs a signal to the crushing drive unit 304 to rotate the crushing drive unit 304, without causing the guide unit 308 to move the crushing unit 300, the shaft unit 302, the crushing drive unit 304, and the support unit 306. This causes the crushing drive unit 304 to rotate, and as shown in Fig. 7, the crushing unit 300 rotates. As the crushing unit 300 rotates, the agglomerates of the film-forming powder that have moved to the upper space 106 are dispersed.

[0073] In step S132 following step S130, the control unit 80 outputs a signal to the purge gas valve 64 to close the purge gas valve 64. This closes the purge gas valve 64. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0074] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to stop the rotation of the crushing drive unit 304. As a result, the rotation of the crushing drive unit 304 stops, and the rotation of the crushing unit 300 stops. Furthermore, the dispersed film forming powder is stored in the lower space 108 by gravity. Note that the processes from step S134 to step S136 following step S132 and the processes from step S100 to step S126 are the same as those in the first embodiment.

[0075] As described above, the control and processing of the control unit 80 in the powder film forming apparatus 5 of the second embodiment are performed. The second embodiment also provides the same effects as the first embodiment. The second embodiment also provides the following effects.

[0076] [2] The powder deposition apparatus 5 includes a purge gas supply unit 60. The purge gas supply unit 60 serves as a fluidizing gas supply unit that supplies purge gas to the lower space 108 through the lower inlet 118. The purge gas corresponds to a fluidizing gas. The control unit 80 supplies purge gas with a flow rate greater than the flow rates of the raw material gas and the reactive gas, thereby moving the powder from the lower space 108 to the upper space 106. The control unit 80 also rotates the disintegrator 300 to disperse the powder agglomerates that have moved to the upper space 106. This makes it relatively easy to disperse the powder agglomerates.

[0077] (Third embodiment) The third embodiment differs from the first embodiment in the shape of the chamber 10. Other than this, the third embodiment is similar to the first embodiment.

[0078] Specifically, the upper chamber portion 100 of the chamber 10 includes an upper space 106, an exhaust hole 110, an exhaust filter 112, and an upper side inlet hole 114, as well as a chamber inner wall 120, a first extension portion 121, and a second extension portion 122, as shown in FIG. 8.

[0079] The chamber inner wall 120 is an inner wall located in the upper chamber portion 100 between the exhaust hole 110 and the upper-side inlet hole 114 .

[0080] The first extension 121 is connected to the chamber inner wall 120. The first extension 121 extends from the chamber inner wall 120 in a direction intersecting the top-to-bottom direction, in this case, in a direction perpendicular to the top-to-bottom direction.

[0081] The second extension part 122 is connected to the side of the first extension part 121 opposite to the chamber inner wall 120. Furthermore, the second extension part 122 is located between the disintegration part 300 and the chamber inner wall 120 in a direction perpendicular to the top-bottom direction. The second extension part 122 also extends from the first extension part 121 in a direction intersecting the direction in which the first extension part 121 extends, in this case, in the top-bottom direction.

[0082] Furthermore, the first extension 121 and the second extension 122 guide the inert gas that has passed through the upper-side introduction hole 114. As a result, the first extension 121 and the second extension 122 cause the inert gas to flow upward in the vertical direction, and then downward in the vertical direction. Therefore, the first extension 121 and the second extension 122 cause the inert gas that has flowed downward to pass between the second extension 122 and the disintegration unit 300. As a result, the first extension 121 and the second extension 122 block the raw material gas and reactant gas that flow toward the disintegration unit 300.

[0083] The powder film forming apparatus 5 of the third embodiment is configured as described above. The third embodiment also achieves the same effects as the first embodiment. The third embodiment also achieves the following effects.

[0084] [3] Due to the guidance of the first extension portion 121 and the second extension portion 122, the inert gas is more likely to flow downward around the crushing section 300. This makes it easier to block the raw material gas and reactive gas flowing toward the crushing section 300. As a result, the supplied raw material gas and reactive gas are less likely to reach the crushing section 300, which suppresses film formation on the crushing section 300. Therefore, the generation of film-forming material on the crushing section 300 that becomes foreign matter is suppressed. Therefore, the generation of foreign matter is suppressed.

[0085] (Fourth embodiment) In the fourth embodiment, the processing of the control unit 80 differs from that of the first embodiment, as shown in the flowcharts of Figures 9 and 10 and the time chart of Figure 11. Other than this, the fourth embodiment is similar to the first embodiment.

[0086] The processes of steps S200, S202, and S204 in FIG. 9 are similar to the processes of steps S100, S102, and S104 in the first embodiment.

[0087] In step S206 following step S204, the control unit 80 outputs a signal to the raw material gas valve 44 to open it. As a result, the raw material gas valve 44 is open during the period from time t20 to time t21 in FIG. 11 . Therefore, the raw material gas from the raw material gas supply unit 40 is supplied to the lower space 108 through the raw material gas piping 42 and the lower-side inlet 118. The raw material gas supplied to the lower space 108 is adsorbed by the powder stored in the lower space 108. Note that during the period from time t20 to time t21, the exhaust valve 24 is open. The inert gas valve 74 is open. The reaction gas valve 54 is closed. The purge gas valve 64 is closed. The disintegrator 300 is stopped.

[0088] In step S208 following step S206, the control unit 80 outputs a signal to the raw material gas valve 44 to close it. As a result, the raw material gas valve 44 closes at time t21. This stops the supply of raw material gas from the raw material gas supply unit 40. At this time, since the exhaust of gas from the internal space 104 continues, the raw material gas supplied to the lower space 108 and the gas generated by the adsorption reaction are exhausted through the exhaust hole 110.

[0089] In step S210 following step S208, the control unit 80 outputs a signal to the purge gas valve 64 to open the purge gas valve 64. As a result, the purge gas valve 64 is open during the period from time t22 to time t23. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower-side inlet 118. This causes the adsorbent powder stored in the lower space 108 to flow within the lower space 108. Note that the adsorbent powder is powder to which the source gas is adsorbed.

[0090] In step S212 following step S210, the control unit 80 outputs a signal to the guide unit 308 to drive the guide unit 308. As a result, the crushing unit 300, the shaft unit 302, the crushing drive unit 304 and the support unit 306 move from the upper space 106 to the lower space 108. As a result, the crushing unit 300 comes into contact with the adsorbent powder stored in the lower space 108.

[0091] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to rotate the crushing drive unit 304. As a result, during the period from time t22 to time t23, the crushing drive unit 304 rotates, causing the crushing unit 300 to rotate. As the crushing unit 300 rotates, agglomerates of the adsorbent powder stored in the lower space 108 are dispersed. Furthermore, the supplied purge gas causes the adsorbent powder stored in the lower space 108 to flow within the lower space 108. This prevents agglomerates from being dispersed by the crushing unit 300. During the period from time t22 to time t23, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reactant gas valve 54 is closed.

[0092] In step S214 following step S212, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t23, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0093] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to stop the rotation of the crushing drive unit 304. As a result, at time t23, the rotation of the crushing drive unit 304 stops, and the rotation of the crushing unit 300 stops. Furthermore, the dispersed adsorbent powder is stored in the lower space 108 by gravity.

[0094] The control unit 80 also outputs a signal to the guide unit 308 to drive the guide unit 308. As a result, the crushing unit 300, the shaft unit 302, the crushing drive unit 304, and the support unit 306 move from the lower space 108 to the upper space 106. As a result, the crushing unit 300 moves away from the adsorbent powder stored in the lower space 108. Furthermore, the crushing unit 300 returns to its initial position, which is a position between the exhaust hole 110 and the upper-side introduction hole 114 in the vertical direction.

[0095] In step S216 following step S214, the control unit 80 counts the raw material count Nm by adding 1 to the raw material count Nm. Note that the raw material count Nm is the number of times the series of processes from step S206 to step S214 has been performed.

[0096] In step S218 following step S216, the control unit 80 determines whether the raw material count Nm counted in step S210 is equal to or greater than a raw material threshold Nm_th. The raw material threshold Nm_th is set by experiment, simulation, or the like so that the ratio of the surface area of ​​the surface where the raw material gas is adsorbed onto the powder becomes a desired surface area ratio.

[0097] If the number of feed counts Nm is less than the raw material threshold value Nm_th, the ratio of the surface area of ​​the surface where the raw material gas is adsorbed onto the powder does not reach the desired surface area ratio, and the control unit 80 returns to step S206. Furthermore, the processes from step S206 to step S218 are repeated until the number of feed counts Nm reaches the raw material threshold value Nm_th, that is, until the ratio of the surface area of ​​the surface where the raw material gas is adsorbed onto the powder reaches the desired surface area ratio.

[0098] Furthermore, when the raw material count Nm is equal to or greater than the raw material threshold Nm_th, the ratio of the surface area of ​​the surface where the raw material gas is adsorbed onto the powder is the desired ratio, so the control unit 80 proceeds to step S220.

[0099] In step S220 following step S218, the control unit 80 resets the number of times Nm of raw material feeding counted in step S216 by setting it to 0. This allows the repeated processing from step S206 to step S218 to achieve the desired film thickness formed on the powder, as will be described later.

[0100] In step S222 following step S220, the control unit 80 outputs a signal to the purge gas valve 64 to open it. As a result, the purge gas valve 64 is open during the period from time t24 to time t25. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower side inlet 118. This dilutes the raw material gas that has not been completely exhausted and remains in the lower space 108 and the gas generated by the adsorption reaction. Note that during the period from time t24 to time t25, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reaction gas valve 54 is closed. The disintegrator 300 is stopped.

[0101] In step S224 following step S222, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t25, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0102] 10, which follows step S224, the control unit 80 outputs a signal to the reactant gas valve 54 to open it. As a result, the reactant gas valve 54 is open from time t26 to time t27. Therefore, the reactant gas from the reactant gas supply unit 50 is supplied to the lower space 108 through the reactant gas piping 52 and the lower inlet 118. The reactant gas supplied to the lower space 108 reacts with the raw material gas adsorbed to the powder stored in the lower space 108. As a result, one atomic layer of film is formed on the powder. Note that from time t26 to time t27, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The purge gas valve 64 is closed. The disintegrator 300 is stopped.

[0103] In step S228 following step S226, the control unit 80 outputs a signal to the reactant gas valve 54 to close it. As a result, the reactant gas valve 54 closes at time t27. This stops the supply of reactant gas from the reactant gas supply unit 50. At this time, since the exhaust of gas from the internal space 104 continues, the reactant gas supplied to the lower space 108 and the gas generated by the reaction with the reactant gas are exhausted through the exhaust hole 110.

[0104] In step S230 following step S228, the control unit 80 outputs a signal to the purge gas valve 64 to open the purge gas valve 64. As a result, the purge gas valve 64 is open during the period from time t28 to time t29. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower-side introduction hole 118. As a result, the film forming powder stored in the lower space 108 flows within the lower space 108.

[0105] In step S232 following step S230, the control unit 80 outputs a signal to the guide unit 308 to drive the guide unit 308. As a result, the crushing unit 300, the shaft unit 302, the crushing drive unit 304, and the support unit 306 move from the upper space 106 to the lower space 108. As a result, the crushing unit 300 comes into contact with the film forming powder stored in the lower space 108.

[0106] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to rotate the crushing drive unit 304. As a result, during the period from time t28 to time t29, the crushing drive unit 304 rotates, causing the crushing unit 300 to rotate. As the crushing unit 300 rotates, agglomerates of the film forming powder stored in the lower space 108 are dispersed. Furthermore, the supplied purge gas causes the film forming powder stored in the lower space 108 to flow within the lower space 108. This prevents agglomerates from being dispersed by the crushing unit 300. During the period from time t28 to time t29, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reactant gas valve 54 is closed.

[0107] In step S234 following step S232, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t29, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0108] Furthermore, the control unit 80 outputs a signal to the crushing drive unit 304 to stop the rotation of the crushing drive unit 304. As a result, at time t29, the rotation of the crushing drive unit 304 stops, and the rotation of the crushing unit 300 stops. Furthermore, the dispersed film forming powder is stored in the lower space 108 by gravity.

[0109] Furthermore, the control unit 80 outputs a signal to the guide unit 308 to drive the guide unit 308. As a result, the crushing unit 300, the shaft unit 302, the crushing drive unit 304, and the support unit 306 move from the lower space 108 to the upper space 106. As a result, the crushing unit 300 moves away from the film forming powder stored in the lower space 108. Furthermore, the crushing unit 300 returns to its initial position, which is a position between the exhaust hole 110 and the upper-side introduction hole 114 in the vertical direction.

[0110] In step S236 following step S234, the control unit 80 counts the number of reaction times Nr by adding 1 to the number of reaction times Nr. The number of reaction times Nr is the number of times the series of processes from step S226 to step S234 has been performed.

[0111] In step S238 following step S236, the control unit 80 determines whether the number of reactions Nr counted in step S236 is equal to or greater than a reaction threshold Nr_th. The reaction threshold Nr_th is set by experiment, simulation, or the like so that the ratio of the surface area of ​​the coated surface formed on the powder becomes a desired ratio of the surface area.

[0112] If the reaction count Nr is less than the reaction threshold Nr_th, the proportion of the surface area of ​​the coated surface formed on the powder does not match the desired proportion of the surface area, and the control unit 80 returns to step S226. Furthermore, steps S226 to S238 are repeated until the reaction count Nr reaches the reaction threshold Nr_th, i.e., until the proportion of the surface area of ​​the coated surface formed on the powder matches the desired proportion of the surface area.

[0113] Furthermore, when the reaction count Nr is equal to or greater than the reaction threshold Nr_th, the proportion of the surface area of ​​the coated surface formed on the powder is equal to the desired surface area proportion, and therefore the process of the control unit 80 proceeds to step S240.

[0114] In step S240 following step S238, the control unit 80 resets the number of reactions Nr counted in step S236 by setting it to 0. This allows the repeated processing from step S226 to step S238 to achieve the desired film thickness formed on the powder, as will be described later.

[0115] In step S242 following step S240, the control unit 80 outputs a signal to the purge gas valve 64 to open it. As a result, the purge gas valve 64 is open during the period from time t30 to time t31. Therefore, the purge gas from the purge gas supply unit 60 is supplied to the lower space 108 through the purge gas piping 62 and the lower side inlet 118. This dilutes the reaction gas that has not been completely exhausted and remains in the lower space 108, and the gas generated by reaction with the reaction gas. Note that during the period from time t30 to time t31, the exhaust valve 24 is open. The inert gas valve 74 is open. The raw material gas valve 44 is closed. The reaction gas valve 54 is closed. The disintegration unit 300 is stopped.

[0116] In step S244 following step S242, the control unit 80 outputs a signal to close the purge gas valve 64 to the purge gas valve 64. As a result, at time t31, the purge gas valve 64 closes. As a result, the supply of purge gas from the purge gas supply unit 60 stops.

[0117] In step S246 following step S244, the control unit 80 counts the number of times of film formation Nd by adding 1 to the number of times of film formation Nd. Here, the number of times of film formation Nd is the number of times a series of processes from step S206 to step S244 has been performed.

[0118] In step S248 following step S246, the control unit 80 determines whether the number of times Nd of film formation counted in step S246 is equal to or greater than the film formation threshold value Nd_th. As described above, the film formation threshold value Nd_th is set by experiment, simulation, or the like so that the film thickness formed on the powder is a desired thickness.

[0119] If the number of times Nd of film formation is less than the film formation threshold value Nd_th, the film thickness formed on the powder does not reach the desired film thickness, and the control unit 80 returns to step S206. Furthermore, the processes from step S206 to step S248 are repeated until the number of times Nd of film formation reaches the film formation threshold value Nd_th, that is, until the film thickness formed on the powder reaches the desired film thickness.

[0120] Furthermore, when the number of film formations Nd is equal to or greater than the film formation threshold Nd_th, the film thickness formed on the powder is the desired film thickness. Therefore, the control unit 80 outputs a signal to the exhaust valve 24 to close the exhaust valve 24. As a result, the exhaust valve 24 closes at time t32. Furthermore, the control unit 80 outputs a signal to the inert gas valve 74 to close the inert gas valve 74. As a result, the inert gas valve 74 closes at time t32. Therefore, the processing of the control unit 80 ends. Thus, the film formation on the powder is completed.

[0121] As described above, the powder film forming apparatus 5 of the fourth embodiment forms a film on powder by executing the program in the control unit 80. The fourth embodiment also provides the same effects as the first embodiment.

[0122] (Fifth embodiment) The powder deposition apparatus 5 of the first embodiment uses ALD. In contrast, the powder deposition apparatus 5 of the fifth embodiment uses CVD. In this case, as shown in FIG. 12 , the powder deposition apparatus 5 does not include a reactive gas supply unit 50, a reactive gas pipe 52, or a reactive gas valve 54. The powder deposition apparatus 5 forms a film on powder using only a source gas, without using a reactive gas.

[0123] The powder film forming apparatus 5 of the fifth embodiment is configured as described above. The fifth embodiment also provides the same effects as the first embodiment.

[0124] (Other embodiments) The present disclosure is not limited to the above-described embodiments, and appropriate modifications can be made to the above-described embodiments. Furthermore, it goes without saying that the elements constituting the embodiments in the above-described embodiments are not necessarily essential unless they are specifically stated as essential or are considered to be clearly essential in principle.

[0125] The controller and the method described herein may be implemented by a special-purpose computer configured with a processor and memory programmed to perform one or more functions embodied in a computer program. Alternatively, the controller and the method described herein may be implemented by a special-purpose computer configured with a processor configured with one or more dedicated hardware logic circuits. Alternatively, the controller and the method described herein may be implemented by one or more special-purpose computers configured with a processor and memory programmed to perform one or more functions in combination with a processor configured with one or more hardware logic circuits. Furthermore, the computer program may be stored as instructions executed by a computer on a computer-readable non-transitory tangible storage medium.

[0126] In the first to fourth embodiments, the powder film formation apparatus 5 forms a powder film using ALD. However, the powder film formation apparatus 5 is not limited to using ALD, and may form a powder film using, for example, MLD. Furthermore, the powder film formation apparatus 5 may form a powder film using a film formation method in which a source gas and a reactive gas are alternately supplied. Note that MLD is an abbreviation for molecular layer deposition.

[0127] In each of the above embodiments, the purge gas supply unit 60 and the inert gas supply unit 70 are separate entities. However, the purge gas supply unit 60 and the inert gas supply unit 70 may be integrated into one body.

[0128] The above embodiments may be combined as appropriate. [Explanation of symbols]

[0129] 10 Chambers 20 Vacuum Pump 40 Raw material gas supply section 80 Control Unit 104 Interior Space 106 Upper space 108 Lower Space 110 Exhaust vent 118 Lower side inlet 300 Crushing section

Claims

1. A powder film forming apparatus for forming a powder film, a chamber (10) having an internal space (104) including an upper space (106) which is a space on the top side in the vertical direction and a lower space (108) which is a space on the bottom side in the vertical direction and in which the powder is stored, an exhaust hole (110) which communicates with the upper space, and an introduction hole (118) which communicates with the lower space; an exhaust unit (20) that reduces the pressure in the internal space and exhausts gas in the internal space through the exhaust hole; a crushing unit (300) that disperses agglomerates of the powder by rotating; a raw material gas supply unit (40) that supplies a raw material gas to the lower space through the introduction hole; a control unit (80) that controls the rotation of the disintegration unit and the supply of the raw material gas from the raw material gas supply unit; Equipped with the crushing unit is located on the upper side in the vertical direction relative to the exhaust hole before the raw material gas is supplied, The control unit controls the supply of the raw material gas to form a film from the powder.

2. The powder film forming apparatus further includes a reactive gas supply unit (50) that supplies a reactive gas to the lower space through the introduction hole, The control unit supplying the raw material gas to cause the raw material gas to be adsorbed onto the powder; 2. The powder film forming apparatus according to claim 1, wherein the reactive gas is supplied to cause the source gas adsorbed on the powder to react with the reactive gas, thereby forming a film from the powder.

3. The control unit Controlling the movement of the crushing unit; 3. The powder deposition apparatus according to claim 1, wherein the crushing unit is moved into the lower space, brought into contact with the powder stored in the lower space, and rotated to disperse agglomerates of the powder.

4. The powder deposition apparatus further includes a fluidizing gas supply unit (60) that supplies a fluidizing gas to the lower space through the introduction hole, The control unit controlling the flow rate of the raw material gas from the raw material gas supply unit and the flow rate of the fluidizing gas from the fluidizing gas supply unit; 3. A powder deposition apparatus according to claim 1, wherein the powder is moved from the lower space to the upper space by supplying the fluidizing gas at a flow rate greater than the flow rate of the raw material gas when the raw material gas is supplied, and the powder agglomerates that have moved to the upper space are dispersed by rotating the crushing section.

5. The chamber has an upper introduction hole (114) located on the upper side in the vertical direction relative to the crushing section and communicating with the upper space, The powder deposition apparatus further includes an inert gas supply unit (70) that supplies an inert gas to the upper space through the upper-side introduction hole, The control unit Controlling the supply of the inert gas from the inert gas supply unit; 3. The powder film-forming apparatus according to claim 1, wherein the inert gas is supplied through the upper introduction hole, thereby blocking the raw material gas flowing toward the crushing section.

6. The chamber comprises: an inner wall (120) located between the exhaust hole and the upper inlet hole; A first extension portion (121) extending from the inner wall in a direction intersecting the top-bottom direction; a second extension portion (122) located between the crushing portion and the inner wall in a direction perpendicular to the top-bottom direction and extending from the first extension portion in a direction intersecting the direction in which the first extension portion extends; and 6. The powder film forming apparatus of claim 5, wherein the first extension portion and the second extension portion guide the inert gas that has passed through the upper side inlet hole, causing the inert gas to flow upward in the vertical direction, and then downward in the vertical direction, and by passing the inert gas between the second extension portion and the crushing portion, the raw material gas flowing toward the crushing portion is blocked.

7. A powder film-forming method for forming a powder film, comprising: a chamber (10) having an internal space (104) including an upper space (106) which is a space on the top side in the vertical direction and a lower space (108) which is a space on the bottom side in the vertical direction and in which the powder is stored, an exhaust hole (110) which communicates with the upper space, and an introduction hole (118) which communicates with the lower space; an exhaust unit (20) that reduces the pressure in the internal space and exhausts gas in the internal space through the exhaust hole; a crushing unit (300) that disperses agglomerates of the powder by rotating; a raw material gas supply unit (40) that supplies a raw material gas to the lower space through the introduction hole; a control unit (80) that controls the rotation of the disintegration unit and the supply of the raw material gas from the raw material gas supply unit; Prepare The crushing unit is positioned on the upper side in the vertical direction relative to the exhaust hole before the raw material gas is supplied, A powder film forming method for forming a film from the powder by supplying the raw material gas.

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