Composition, method for producing the same, optical film, method for producing the optical film, layer, method for forming the same, optical filter, optical element, solid-state imaging device, and camera module

Abstract

To provide a composition excellent in appearance and re-dispersibility, the composition having high visible light transmittance and low near-infrared transmittance, and being capable of forming an optical film or an optical filter which exhibits excellent durability and bending resistance even under a high-temperature and high-humidity environment.SOLUTION: The present invention relates to a composition (D) including a light-absorptive compound (A) including a phosphonic acid component and a copper component, and a cyclic olefin polymer (B1), wherein, in the composition (D), the weight-average molecular weight (Mw) of the whole cyclic olefin polymer (B1), as measured by gel permeation chromatography (GPC) in terms of polystyrene, is from 150,000 to 1,000,000.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a composition, a method for producing a composition, an optical film, a method for producing an optical film, a layer, a method for producing a layer, an optical filter, an optical element, a solid-state imaging device, and a camera module. [Background technology]

[0002] Solid-state imaging devices such as video cameras, digital still cameras, and mobile phones with camera functions use CCD and CMOS image sensors, which are solid-state imaging elements for capturing color images. These solid-state imaging elements use silicon photodiodes in their light-receiving sections that are sensitive to near-infrared light, which is imperceptible to the human eye. These solid-state imaging elements require luminosity correction to display natural colors as seen by the human eye, and often use optical filters (e.g., near-infrared cut filters) that selectively transmit or block light in specific wavelength ranges.

[0003] Filters manufactured by various methods have been used as such near-infrared cut filters. For example, known are absorbing glass optical filters that use absorbing glass in which copper oxide is dispersed in phosphate glass as a substrate (see, for example, Patent Document 1), and optical filters in which a near-infrared absorbing dye is added to a resin film (see, for example, Patent Document 2).

[0004] In recent years, with the advancement of the performance of solid-state imaging devices, there has been a strong demand for reducing ghosts and flare in camera images. It is known that improving the near-infrared absorption performance of optical filters is effective in reducing ghosts and flare, and as near-infrared cut filters that can achieve this, optical filters configured to have a resin layer containing a near-infrared absorbing dye on an absorbing glass substrate (e.g., see Patent Document 3), optical filters in which multiple types of near-infrared absorbing dyes are added to a resin film (e.g., see Patent Document 4), and optical filters having a resin layer containing a copper phosphonate complex and a near-infrared absorbing dye on a transparent glass substrate (e.g., see Patent Document 5) have been proposed. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] International Publication No. 2011 / 071157 [Patent Document 2] Japanese Patent Application Laid-Open No. 2011-100084 [Patent Document 3] International Publication No. 2014 / 030628 [Patent Document 4] Japanese Patent Application Publication No. 2019-032371 [Patent Document 5] Japanese Patent Application Publication No. 2020-129150 Summary of the Invention [Problem to be solved by the invention]

[0006] However, optical filters using absorbing glass cannot avoid the problem of "cracks" when the optical filter is dropped, and a configuration in which a wide range of near-infrared wavelengths is absorbed only by a near-infrared absorbing dye results in a significant decrease in visible light transmittance. In addition, optical filters using a copper phosphonate complex and a near-infrared absorbing dye are known to be capable of achieving excellent spectral characteristics (achieving both high visible light transmittance and low near-infrared transmittance). However, conventional optical filters have had issues with the durability of the copper phosphonate complex under high-temperature and high-humidity conditions, and no filters suitable for practical use have been obtained. Furthermore, it has been found that compositions containing conventional copper phosphonate complexes sometimes do not have a highly transparent appearance, and sometimes become opaque and turbid when redispersed in a solvent, and that there is room for improvement in terms of appearance and redispersibility.

[0007] The present invention has been made in view of the above, and an object of the present invention is to provide a composition that is excellent in appearance and redispersibility, has high visible light transmittance and low near-infrared transmittance, and can be used to form optical films and optical filters that are excellent in durability and flex resistance even in high-temperature, high-humidity environments. [Means for solving the problem]

[0008] As a result of extensive research into solving the above problems, the present inventors have found that the above problems can be solved by the following configuration examples, and have thus completed the present invention.

[0009] [1] Composition (D), The composition (D) contains a light-absorbing compound (A) containing a phosphonic acid component and a copper component, and a cyclic olefin polymer (B1), the cyclic olefin polymer (B1) in the composition (D) as a whole has a weight average molecular weight (Mw) of 150,000 to 1,000,000 in terms of polystyrene, as measured by gel permeation chromatography (GPC); Composition (D).

[0010] [2] The content of solids in the composition (D) is 2 to 85 mass %, the content of the polymer (B1) is 1 to 80 mass% relative to 100 mass% of the composition (D), the content of the polymer (B1) is 0.1 to 7 parts by mass relative to 1 part by mass of the compound (A); [1] Composition (D) described in [1].

[0011] [3] The composition (D) according to [1] or [2], wherein the polymer (B1) is a polymer obtained using at least one monomer selected from the group consisting of a monomer represented by the following formula (X0) and a monomer represented by the following formula (Y0):

[0012] [ka] [In formula (X0), R x1 ~R x4 are each independently an atom or group selected from the following (i') to (ix'), and k x , m x and px are each independently an integer of 0 to 4. (i') Hydrogen atom (ii') Halogen atom (iii') trialkylsilyl group (iv') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms and having a linking group containing an oxygen atom, a sulfur atom, a nitrogen atom, or a silicon atom. (v') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms (vi') Polar groups (excluding (iv')). (vii')R x1 and R x2 and R form one alkylidene group, or x3 and R x4 and R that are not involved in the alkylidene group constitute one alkylidene group. x1 ~R x4 are each independently an atom or group selected from (i') to (vi'). (viii')R x1 and R x2 and R form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are attached, or x3 and R x4 and R 1 , together with the carbon atoms to which they are bonded, form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring (however, R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 x1 ~R x4 are each independently an atom or group selected from (i') to (vi'). (ix')R x2 and R x3 and R which are not involved in the hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are bonded constitute a monocyclic hydrocarbon ring or heterocyclic ring (however, R x1 and R x4 are each independently an atom or group selected from (i') to (vi') above.

[0013] [ka] [In formula (Y0), Ry1 and R y2 are each independently an atom or group selected from (i') to (vi') above, or R y1 and R y2 and form, together with the carbon atoms to which they are bonded, a monocyclic or polycyclic alicyclic hydrocarbon, an aromatic hydrocarbon, or a heterocyclic ring, and k y and p y are each independently an integer of 0 to 4.

[0014] [4] The composition (D) according to any one of [1] to [3], further comprising an ultraviolet absorbing compound (U).

[0015] [5] The composition (D) according to any one of [1] to [4] further contains a dye (C) other than the compound (A).

[0016] [6] Composition (D) according to any one of [1] to [5], wherein the transmission spectrum of composition (D) (where the transmission spectrum of composition (D) is adjusted so that the transmittance at a wavelength of 800 nm is 10%±1%) satisfies the following requirements (i) to (iv): (i) The average transmittance in the wavelength range of 800 to 1100 nm is 10% or less. (ii) The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. (iii) A first cutoff wavelength in the wavelength range of 680 to 780 nm, at which the transmittance is 50%. (iv) A second cutoff wavelength in the wavelength range of 320 to 380 nm, at which the transmittance is 50%.

[0017] [7] The composition (D) according to [6], wherein the transmission spectrum further satisfies the following requirement (v): (v) The standard deviation of the transmittance in the wavelength range of 900 to 1100 nm is 0.5% or less.

[0018] [8] A method for producing the composition (D) according to any one of [1] to [7], a step 1 of mixing a copper compound, a phosphonic acid compound, and a first solvent (S11) to prepare a liquid (r1) containing the compound (A); a step 2 of mixing the polymer (B1) with a second solvent (S2) to prepare a liquid (r2) containing the polymer (B1); Step 3 of mixing the liquid (r1) obtained in step 1 with the liquid (r2) obtained in step 2, or mixing the compound (A) obtained by separation from the liquid (r1) obtained in step 1 with the liquid (r2) obtained in step 2, to prepare a liquid (r3) containing the compound (A) and the polymer (B1); and Step 4: Mixing the liquid (r3) obtained in step 3 with a third solvent (S13) to prepare a composition (D). Including, The content of solids in the composition (D) is 2 to 50 mass %, the content of the polymer (B1) is 1 to 30 mass% relative to 100 mass% of the composition (D), the content of the polymer (B1) relative to 1 part by mass of the compound (A) is 0.5 to 7 parts by mass, The content of the third solvent (S13) relative to 100 mass% of all solvents contained in the composition (D) is 0 mass% or more and less than r0 mass% (where r0 is the content of the third solvent (S13) at which the second solvent (S2) and the third solvent (S13) form an azeotropic mixture when the content of the third solvent (S13) is r0 mass% or more). A method for producing composition (D).

[0019] [9] The solubility parameter SP2 of the second solvent (S2) is 7 to 11 (cal / cm 3 ) 1 / 2 and The solubility parameter SP3 of the third solvent (S13) is 10 to 16 (cal / cm 3 ) 1 / 2 [8] The method for producing the composition (D) according to [8],

[0020]

[10] The method for producing composition (D) according to [8] or [9], wherein the transmission spectrum of composition (D), standardized so that the transmittance at a wavelength of 900 nm is 10%, satisfies the following requirements (p) to (s): (p) The average transmittance in the wavelength range of 460 to 580 nm is 65% or more. (q) The standard deviation of transmittance in the wavelength range of 850 to 1100 nm is 1% or less. (r) A first cutoff wavelength in the wavelength range of 730 to 790 nm, at which the transmittance is 50%. (s) A second cutoff wavelength in the wavelength range of 330 to 450 nm, at which the transmittance is 50%.

[0021]

[11] The method for producing the composition (D) according to

[10] , wherein the transmission spectrum further satisfies the following requirements (t) and (u): (t) When the wavelength showing the maximum transmittance in the wavelength range of 400 to 700 nm is λM [nm], the average increase in transmittance per unit wavelength in the transmittance spectrum in the wavelength range of 400 to λM [nm] is 0.18 [% / nm] or less. (u) Wavelength λ at which the transmittance is 30% in the wavelength range of 300 to 1000 nm S [nm] and λ L [nm] exists (however, λ S <λ L ), λ S ~λ L When measuring the transmittance at each wavelength in 1 nm increments, the skewness of the transmittance is -1.5 or more.

[0022]

[12] An optical film formed from the composition (D) according to any one of [1] to [7].

[0023]

[13] A method for producing an optical film, comprising forming an optical film using the composition (D) obtained by the method for producing the composition (D) according to any one of [8] to

[11] .

[0024]

[14] A layer (D1) formed from the composition (D) according to any one of [1] to [7], which has a transmission spectrum that satisfies the following requirements (I) to (V): (I) The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. (II) The average transmittance in the wavelength range of 800 to 1100 nm is 5% or less. (III) A third cutoff wavelength in the wavelength range of 680 to 730 nm, at which the transmittance is 50%. (IV) A fourth cutoff wavelength in the wavelength range of 340 to 400 nm, at which the transmittance is 50%. (V) The transmittance at a wavelength of 950 nm is 1% or less.

[0025]

[15] A method for producing a layer (D1), comprising forming the layer (D1) using a composition (D) obtained by the method for producing a composition (D) according to any one of [8] to

[11] , wherein the composition (D) has a transmission spectrum, standardized so that the transmittance at a wavelength of 850 nm is 1%, which satisfies the following requirements (IX) to (XIII): (IX) The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. (X) The average transmittance in the wavelength range of 850 to 1100 nm is 3% or less. (XI) A third cutoff wavelength in the wavelength range of 690 to 750 nm, at which the transmittance is 50%. (XII) A fourth cutoff wavelength in the wavelength range of 325 to 385 nm, at which the transmittance is 50%. (XIII) The transmittance at a wavelength of 950 nm is 3% or less.

[0026]

[16] An optical filter having a layer (D1) formed from the composition (D) according to any one of [1] to [7].

[0027]

[17] a layer (D1) formed from the composition (D) according to any one of [1] to [7]; and a layer (D2) formed from a composition (D2) containing a dye (C) other than the compound (A), a polymer (B2-1), and at least one compound selected from the group consisting of a curable compound (B2-2) that is cured by light or heat. Optical filter.

[0028]

[18] The optical filter according to

[16] or

[17] , having a dielectric multilayer film.

[0029]

[19] An optical element comprising the optical filter according to any one of

[16] to

[18] .

[0030]

[20] A solid-state imaging device comprising the optical filter according to any one of

[16] to

[18] .

[0031] [twenty one] A camera module having the optical filter according to any one of

[16] to

[18] . [Effects of the Invention]

[0032] According to the present invention, a composition having excellent appearance and redispersibility can be provided. Furthermore, according to the present invention, a composition having excellent flowability can be provided, and by using the composition, a desired layer (film, etc.) can be easily formed. Furthermore, according to the present invention, it is possible to provide an optical film and an optical filter that have high visible light transmittance and low near-infrared transmittance, and that are excellent in durability and bending resistance even in a high-temperature, high-humidity environment. [Brief explanation of the drawings]

[0033] [Figure 1] FIG. 1 is a schematic diagram showing an example of an optical element, a solid-state imaging device, or a module having an optical filter according to the present invention. [Figure 2]FIG. 2 is a schematic diagram showing an example of an optical element, solid-state imaging device, or module having an optical filter according to the present invention without a lens. [Figure 3] FIG. 3 shows the spectral transmittance spectrum of the composition 1 obtained in Example A1. [Figure 4] FIG. 4 shows the spectral transmittance spectrum of the composition 3 obtained in Example A3. [Figure 5] FIG. 5 shows the spectral transmittance spectrum of composition 5 obtained in Example A5. [Figure 6] FIG. 6 shows the spectral transmittance spectrum of the composition 6 obtained in Example A6. [Figure 7] FIG. 7 shows the spectral transmittance spectrum of the layer (D1-A1) obtained in Example A1. [Figure 8] FIG. 8 shows the spectral transmittance spectrum of the layer (D1-A3) obtained in Example A3. [Figure 9] FIG. 9 shows the spectral transmittance spectrum of the layer (D1-A6) obtained in Example A6. [Figure 10] FIG. 10 shows the spectral transmittance spectrum of the layer (D1-A8) obtained in Example A8. [Figure 11] FIG. 11 shows the spectral transmittance spectrum of the substrate obtained in Example P1. [Figure 12] FIG. 12 shows the spectral transmittance spectrum of the substrate obtained in Example P2. [Figure 13] FIG. 13 shows the spectral transmittance spectrum of the substrate obtained in Example P3. [Figure 14] FIG. 14 shows the spectral transmittance spectrum of the substrate obtained in Example P4. [Figure 15] FIG. 15 shows the spectral transmittance spectrum of the optical filter obtained in Example P1. [Figure 16] FIG. 16 shows the spectral transmittance spectrum of the optical filter obtained in Example P2. [Figure 17] FIG. 17 shows the spectral transmittance spectrum of the optical filter obtained in Example P3. [Figure 18]FIG. 18 shows the spectral transmittance spectrum of the optical filter obtained in Example P4. [Figure 19] FIG. 19 shows the spectral transmittance spectrum of the optical filter obtained in Example P5. [Figure 20] FIG. 20 shows the spectral transmittance spectra of compositions A210, A211, A212, A213, A214 and A215. [Figure 21] FIG. 21 shows the spectral transmittance spectra of layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214) and (D1-A215). [Figure 22] FIG. 22 shows the spectral transmittance spectra of compositions A240, A241, A242, A243, A244 and A245. [Figure 23] FIG. 23 shows the spectral transmittance spectra of layers (D1-A240), (D1-A241), (D1-A242), (D1-A243), (D1-A244) and (D1-A245). [Figure 24] FIG. 24 shows the spectral transmittance spectra of compositions A250, A251, A252, A253, A254 and A255. [Figure 25] FIG. 25 shows the spectral transmittance spectra of layers (D1-A250), (D1-A251), (D1-A252), (D1-A253), (D1-A254) and (D1-A255). [Figure 26] FIG. 26 shows the spectral transmittance spectrum of the substrate obtained in Example P10. [Figure 27] FIG. 27 shows the spectral transmittance spectrum of the substrate obtained in Example P11. [Figure 28] FIG. 28 shows the spectral transmittance spectrum of the optical filter obtained in Example P10. [Figure 29] FIG. 29 shows the spectral transmittance spectrum of the optical filter obtained in Example P11. [Figure 30] FIG. 30 shows the spectral transmittance spectrum of the substrate obtained in Example P12. DETAILED DESCRIPTION OF THE INVENTION

[0034] The present invention will be described in detail below. The following description may be based on exemplary embodiments of the present invention, but the present invention is not limited to such embodiments.

[0035] In this specification, the use of "to" to indicate a range of values ​​means that the values ​​before and after it are included as the lower and upper limits. In this specification, the use of "to" to indicate a range of numerical values ​​means that the units written before or after it indicate the same units unless otherwise specified.

[0036] In the embodiments of the present invention, "transmit" refers to a transmittance of preferably 50% or more, more preferably 60% or more, and even more preferably 70% or more at a target wavelength or wavelength range. "Shielding" refers to a transmittance of preferably less than 10%, more preferably less than 5%, and even more preferably less than 1% at a target wavelength or wavelength range. Furthermore, "light" refers to all light unless otherwise specified. In this specification, unless otherwise specified, the "content of Y in X" has the same meaning as the content (% by mass) of Y relative to 100% by mass of X.

[0037] ≪Composition (D)≫ Composition (D) according to one embodiment of the present invention (hereinafter also referred to as "the composition") contains a light-absorbing compound (A) containing a phosphonic acid component and a copper component, and a cyclic olefin polymer (B1), and the cyclic olefin polymer (B1) as a whole in the composition has a weight average molecular weight (Mw) of 150,000 to 1,000,000 in terms of polystyrene, as measured by gel permeation chromatography (GPC).

[0038] Composition (D) (hereinafter also referred to as "Composition 1") according to one embodiment of the present composition is a composition in which the solid content in Composition 1 is 2 to 85 mass %, the content of the polymer (B1) relative to 100 mass % of Composition 1 is 1 to 80 mass %, and the content of the polymer (B1) relative to 1 mass part of the compound (A) is 0.1 to 7 mass parts.

[0039] Furthermore, composition (D) (hereinafter also referred to as "composition 2") according to another embodiment of the present composition is a composition obtained by a production method including the following steps 1 to 4, and the solid content in composition 2 is 2 to 50 mass%, the content of polymer (B1) relative to 100 mass% of composition 2 is 1 to 30 mass%, the content of polymer (B1) relative to 1 part by mass of compound (A) is 0.5 to 7 parts by mass, and the content of third solvent (S13) relative to 100 mass% of all solvents contained in composition 2 is 0 mass% or more but less than r0 mass% (where r0 is the content of third solvent (S13) at which the second solvent (S2) and the third solvent (S13) form an azeotropic mixture when the content of third solvent (S13) is r0 mass% or more).

[0040] The present composition can suppress the aggregation of the compound (A) in the composition and suppress the deterioration of the light-absorbing compound (A). In addition, the present composition has excellent appearance and redispersibility. Furthermore, when the present composition, particularly the present compositions 1 and 2, is used to form an optical film or layer (D1) by a solvent casting method or the like, it is possible to achieve uniform casting onto a carrier (support), a preferable drying speed under specified conditions, and suppress unevenness and haze within the optical film or layer (D1).

[0041] The solid content in the present composition is preferably 2 to 85 mass %, more preferably 3 to 82 mass %, and even more preferably 4 to 82 mass %. The solid content in the present composition 1 is 2 to 85 mass %, preferably 8 to 82 mass %, and more preferably 10 to 82 mass %. The solid content in the present composition 2 is 2 to 50 mass %, preferably 3 to 40 mass %, and more preferably 3 to 35 mass %. When the solid content is within the above range, the present composition (including the present compositions 1 and 2) can be easily obtained with excellent fluidity, and optical films or layers with excellent flatness can be easily formed. If the solid content is too low, the solvent that evaporates during the formation of an optical film or layer may cause convection, which may reduce the flatness of the optical film or layer that is formed. If the solid content is too high, the fluidity of the composition may be reduced, which may make it difficult to form an optical film or layer with a flat surface. Since the content of the third solvent (S13) in the present composition 2 is within the above range, even if the solid content of the present composition 2 is relatively lower than that of the present composition or the present composition 1, it is possible to form an optical film or layer having high transparency, such as low haze. The "solid content in the composition" may also be referred to as the "solid content ratio of the composition."

[0042] The solid content of the composition is the dry mass of the composition, and is the content of components other than the solvent in the composition, and is determined as follows. The mass M1 of this composition is measured. Next, the composition with mass M1 is heated in a heating oven and dried, leaving only the solids. The weight m1 of the remaining solids is measured. The value m1 / M1 x 100 is the content of solids in this composition (solids ratio of this composition).

[0043] The present compositions other than present composition 1 and present composition 2 may be solid compositions from which the solvent has been removed, and such solid compositions are also one embodiment of the present composition. Specific forms of the solid composition include, for example, granules, powder, and pellets. When distributing the composition on the market, a solid composition can be distributed on the market more easily and cost-effectively than a composition containing a solvent. The solid composition can be easily returned to a liquid state by re-dispersing it in a solvent such as the second solvent (S2) described below.

[0044] <Light-absorbing compound (A)> The light-absorbing compound (A) is a compound containing a phosphonic acid component and a copper component, and is not particularly limited as long as it contains these components, but is preferably a copper complex containing a phosphonic acid component. The compound (A) used in the present composition may be one type or two or more types.

[0045] Compound (A) can be synthesized using a copper compound and phosphonic acid (phosphonic acid compound) as raw materials. However, it is extremely difficult to clarify the reaction process between the copper compound and the phosphonic acid compound in detail and to identify the structure of the resulting reaction product (compound (A)). For these reasons, compound (A) is referred to as a compound containing a phosphonic acid component and a copper component. Compound (A) is, for example, a copper phosphonate compound, e.g., a complex of a phosphonic acid compound and a copper compound.

[0046] Compound (A) may be, for example, a compound containing a phosphonic acid component, a phosphate ester component, and a copper component (e.g., a phosphonic acid-phosphate ester-copper compound), a mixture of a compound containing a phosphonic acid component and a copper component and a compound containing a phosphonic acid component, a phosphate ester component, and a copper component, or a complex of these compounds. These compounds (A) have a wide absorption band in the (near) infrared region, and by using the compounds (A), it is possible to easily form an optical film or layer (D1) that has a low transmittance in the (near) infrared region but a high transmittance for visible light.

[0047] Furthermore, phosphonic acid, phosphinic acid, phosphate ester, phosphoric acid, phosphinic acid, metaphosphoric acid, pyrophosphoric acid, and the like are all compounds containing a phosphorus atom, and compound (A) may contain, in addition to phosphonic acid, at least one component selected from phosphinic acid, phosphate ester, phosphoric acid, phosphinic acid, metaphosphoric acid, pyrophosphoric acid, and the like.

[0048] The content of compound (A) in the present composition is preferably 1 to 60 mass %, more preferably 1.5 to 40 mass %, and even more preferably 2 to 35 mass %. When the content of compound (A) is within the above range, compound (A) is less likely to aggregate and is appropriately dispersed in the composition, and when an optical film or layer (D1) is formed from the composition, compound (A) is less likely to aggregate during formation of the optical film or layer (D1), and an optical film or layer (D1) in which compound (A) is sufficiently dispersed can be formed, and therefore an optical film or layer (D1) having desired spectral characteristics can be easily formed.

[0049] (Copper component) The copper component is a component derived from a copper compound, which is a raw material used in synthesizing compound (A), and is a concept that includes copper ions, copper complexes, and compounds containing copper. The copper component contained in the compound (A) may be one type or two or more types.

[0050] The copper component may have favorable absorption properties for a portion of light in the near-infrared region. Specifically, it is believed that excellent near-infrared absorption properties are exhibited by selectively absorbing light of wavelengths in the near-infrared region corresponding to the energy due to the transition of electrons in the d orbital of the divalent copper ion. The copper component may have, for example, a hexacoordinated structure with one or more types of ligands, and such a copper component is expected to have improved absorption ability for light in the near-infrared region.

[0051] The raw material for the copper component is not particularly limited, but examples thereof include copper compounds of organic acids such as copper acetate, copper benzoate, copper pyrophosphate, and copper stearate, and hydrates of these copper compounds. One or more of these may be used.

[0052] The content of the copper component in compound (A) is preferably 5 to 60 mass%, more preferably 8 to 50 mass%, and even more preferably 10 to 40 mass%, in terms of the copper atom content, from the viewpoint that a compound having excellent light absorption ability in the near-infrared region can be easily obtained.

[0053] (phosphonic acid component) The phosphonic acid component is a component derived from phosphonic acid (phosphonic acid compound), which is a raw material used in synthesizing compound (A). The phosphonic acid component contained in the compound (A) may be one type or two or more types.

[0054] Examples of the phosphonic acid compound include a compound represented by the following formula (a1) and a compound represented by the following formula (a2). As the phosphonic acid compound, one or more compounds represented by the following formula (a1) may be used, one or more compounds represented by the following formula (a2) may be used, or one or more compounds represented by the following formula (a1) and one or more compounds represented by the following formula (a2) may be used.

[0055] For example, compound (A) obtained using a compound represented by the following formula (a1) has a high light absorption ability in the wavelength range of 800 to 1200 nm, but tends to have a low light absorption ability at wavelengths of 700 nm and around 350 nm. Therefore, the light transmitted through an optical film or layer (D1) using compound (A) may be slightly insufficient in terms of matching with human visual sensitivity. On the other hand, compound (A) obtained using the compound represented by the following formula (a2) tends to have a relatively low light absorption ability in the wavelength range of 800 to 1200 nm, but a relatively high light absorption ability at wavelengths of 700 nm and around 350 nm. In order to complement these properties, the present composition preferably contains a compound (A) using a compound represented by the following formula (a1) and a compound represented by the following formula (a2), and it is also preferable to use a compound (A) using a compound represented by the following formula (a1) in combination with a compound (A) using a compound represented by the following formula (a2).

[0056] [ka]

[0057] In formula (a1), R1 is an alkyl group or a halogenated alkyl group in which at least one hydrogen atom in the alkyl group has been substituted with a halogen atom. When the phosphonic acid compound represented by the formula (a1) is used as a raw material for synthesizing the compound (A), the long-wavelength side of the transmission band of the optical film or layer (D1) formed from the present composition containing the obtained compound (A) is around 700 nm, and the optical film or layer (D1) is likely to have the desired transmittance characteristics.

[0058] Examples of the phosphonic acid compound represented by the formula (a1) include methylphosphonic acid, ethylphosphonic acid, n-propylphosphonic acid, isopropylphosphonic acid, n-butylphosphonic acid, isobutylphosphonic acid, sec-butylphosphonic acid, tert-butylphosphonic acid, n-hexylphosphonic acid, and bromomethylphosphonic acid.

[0059] [ka]

[0060] In formula (a2), R2 is an aryl group or an aryl group in which at least one hydrogen atom has been substituted with at least one selected from a halogen atom, a nitro group, and a hydroxy group. When the phosphonic acid compound represented by the formula (a2) is used as a raw material in synthesizing the compound (A), the optical film or layer (D1) formed from the present composition containing the obtained compound (A) is more likely to have the desired transmittance characteristics.

[0061] Examples of the phosphonic acid compound represented by the formula (a2) include phenylphosphonic acid, bromophenylphosphonic acid, benzylphosphonic acid, fluorophenylphosphonic acid, iodophenylphosphonic acid, nitrophenylphosphonic acid, hydroxyphenylphosphonic acid, tolylphosphonic acid, xylylphosphonic acid, and naphthylphosphonic acid.

[0062] The content of the phosphonic acid component in compound (A) is preferably 10 to 80 mass%, more preferably 15 to 70 mass%, and even more preferably 20 to 60 mass%, from the viewpoint that a compound having excellent light transmission ability in the visible light region can be easily obtained.

[0063] (phosphate ester component) The compound (A) may further contain a phosphate ester component, and preferably contains a phosphate ester component, from the viewpoint that aggregation of the compound (A) in the solvent can be further suppressed. When the compound (A) contains a phosphate ester component, the phosphate ester component acts to facilitate appropriate dispersion of the compound (A) in the present composition and in the optical film or layer (D1) formed from the present composition.

[0064] The phosphate ester component may function as a dispersant for the compound (A), and a part of it may react with a metal component such as a copper component to form a compound. For example, the phosphate component may partially form a complex with the copper component.

[0065] The phosphate component is a component derived from a phosphate compound, which is a raw material that can be used when synthesizing compound (A). The compound (A) may contain one type of phosphate ester component or two or more types of phosphate ester components.

[0066] Examples of the phosphate ester compound include compounds having a polyoxyalkyl group, such as a phosphate diester represented by the following formula (b1) and a phosphate monoester represented by the following formula (b2), and may be a phosphate ester in which these are mixed in any ratio.

[0067] [ka] [In the formula, R 21 , R 22 and R3 each independently represents -(CH2CH2O) n R4 is a monovalent functional group, n is an integer of 1 to 25, R4 is an alkyl group having 6 to 25 carbon atoms, and R 21 , R 22 and R3 may be the same group or different groups.]

[0068] Examples of the phosphate ester compounds include PLYSURF A208N (polyoxyethylene alkyl (C12, C13) ether phosphate ester), PLYSURF A208F (polyoxyethylene alkyl (C8) ether phosphate ester), PLYSURF A208B (polyoxyethylene lauryl ether phosphate ester), PLYSURF A219B (polyoxyethylene lauryl ether phosphate ester), PLYSURF A212C (polyoxyethylene tridecyl ether phosphate ester), and PLYSURF A215C (polyoxyethylene tridecyl ether phosphate ester), all manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.; and NIKKOL DDP-2 (polyoxyethylene alkyl ether phosphate ester), NIKKOL DDP-4 (polyoxyethylene alkyl ether phosphate ester), and NIKKOL DDP-6 (polyoxyethylene alkyl ether phosphate ester), all manufactured by Nikko Chemicals Co., Ltd.

[0069] When compound (A) contains a phosphate ester component, the content of the phosphate ester component in compound (A) is preferably 10 to 80 mass%, more preferably 15 to 70 mass%, and even more preferably 20 to 60 mass%, from the viewpoint of being able to further suppress aggregation of compound (A) in the solvent.

[0070] (Method for synthesizing compound (A)) The synthesis method of compound (A) is not particularly limited, but for example, compound (A) can be synthesized by mixing and stirring the copper compound, the phosphonic acid compound, and, if necessary, the phosphate ester compound. In this synthesis, it is preferable to use a solvent (hereinafter also referred to as "first solvent (S11)"). When the phosphate ester compound is used, the compound (A) is preferably synthesized by mixing and stirring a solution a obtained by mixing and stirring the copper compound and the phosphate ester compound dissolved in the first solvent (S11), and a solution b obtained by mixing and stirring the phosphonic acid compound dissolved in the first solvent (S11). The amount of each raw material used in the synthesis is preferably such that the content of the component derived from each raw material in compound (A) falls within the above-mentioned range.

[0071] The first solvent (S11) is not particularly limited, and examples thereof include methanol, ethanol, n-propanol, isopropanol (isopropyl alcohol), n-butanol, isobutanol, 2-butanol, tert-butanol, n-pentanol, isopentanol, 2-methylbutanol, 2-pentanol, tert-pentanol, 3-methoxybutanol, n-hexanol, 2-methylpentanol, 1-hexanol, 2-hexanol, 2-ethylbutanol, 1-heptanol, 2-heptanol, 3-heptanol, n-octanol, 2-ethylhexanol, 2-octanol, n-nonyl alcohol, 2, Examples of suitable solvents include alcohols such as 6-dimethyl-4-heptanol, n-decanol, cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol, and diacetone alcohol; ketones such as heptanone, cyclopentanone, and cyclohexanone; hydrocarbons such as cyclopentane, cyclohexane, xylene, and toluene; amides such as dimethylformamide and dimethylacetamide; heterocyclic compounds such as tetrahydrofuran (THF) and oxetane; and chlorinated solvents such as methylene chloride (dichloromethane), chloroform, dichloroethane, tetrachloroethane, and dichlorobenzene. The first solvent (S11) may be used alone or in combination of two or more.

[0072] The first solvent (S11) may be a poor solvent for the compound (A) so that the reaction product (compound (A)) precipitates when the liquids a and b are mixed and stirred. By using such a poor solvent, the solid content of the compound (A) can be easily separated from the solvent and extracted.

[0073] The solubility parameter (SP1) of the first solvent (S11) used in the synthesis of the compound (A) is preferably 9 to 17, more preferably 10 to 16, and even more preferably 11 to 15. The unit of the solubility parameter value in this specification is [(cal / cm 3 ) 1 / 2 ], and in the following, this unit will be omitted. By using the first solvent (S11) having a solubility parameter (SP1) within the above range, compound (A) can be easily separated and extracted by purification or the like from a liquid containing compound (A) synthesized by the above method or the like.

[0074] Examples of the first solvent (S11) having the above SP1 value include the above-mentioned alcohols, particularly methanol (SP value = 14.5), ethanol (SP value = 12.7), n-propanol (SP value = 12.4), isopropanol (SP value = 11.5), and n-butanol (SP value = 11.3).

[0075] The solubility parameters in this specification are values ​​based on the Hansen solubility parameter (HSP), and it is known that the solubility parameters of compounds contained in a system are compared to estimate the solubility and dispersibility of two types of compounds. It is generally known that when the solubility parameters of two types of compounds are close to each other, high solubility and dispersibility can be expected, and conversely, when the solubility parameters are far apart, high solubility and dispersibility cannot be expected. HSP is calculated based on the following three parameters (unit: MPa) 0.5 ) is composed of δD: Energy due to intermolecular dispersion forces δP: Energy due to intermolecular dipole interactions δH: Energy due to hydrogen bonds between molecules The method for calculating ΔD, ΔP, and ΔH in HSP is not particularly limited, and calculations may be performed by inputting the chemical structure into software, or may be performed experimentally. The software used to calculate HSP is not particularly limited, but examples thereof include HSP analysis software (Hansen Solubility Parameter in Practice (HSPiP), 4th Edition 4.0.07).

[0076] Compound (A) can be obtained as a solid compound (A) by mixing and stirring the solution a and solution b, and separating the resulting reaction product from the first solvent (S11) by, for example, filtration. The solid reaction product thus separated may then be added to a poor solvent for the reaction product, stirred for several minutes to several hours, and the resulting precipitate may be separated from the solvent by filtration or the like. This reprecipitation and separation by filtration may be repeated once or more than once. In addition, the compound (A) may be, for example, a reaction product containing the first solvent (S11) obtained by mixing and stirring the liquid a and the liquid b, which may be used as it is as a raw material when preparing the present composition.

[0077] It should be noted that compound (A) does not necessarily contain components other than the phosphonic acid component and the copper component. For example, water and acetate ions (CH3COO - ) can also coordinate to copper ions, so the reaction product may contain these and the first solvent (S11). Even with multiple purification steps, the first solvent (S11) may not be completely removed (content = 0%) in some cases.

[0078] <Polymer (B1)> The present composition contains a cyclic olefin polymer (B1) such that the entire polymer (B1) in the composition has a polystyrene-equivalent weight average molecular weight (Mw) [hereinafter simply referred to as "Mw"] of 150,000 to 1,000,000, as measured by gel permeation chromatography (GPC). The polymer (B1) used in the present composition may be one type or two or more types. The present composition may be a composition containing, as the polymer (B1), only one polymer having an Mw of 150,000 to 1,000,000, or may be a composition containing two or more polymers (B1) in which the total Mw of these polymers (B1) is 150,000 to 1,000,000.

[0079] The Mw of the entire polymer (B1) in the composition is 150,000 to 1,000,000, preferably 200,000 to 900,000, and more preferably 400,000 to 850,000. The total polymer (B1) in the composition has a polystyrene-equivalent number average molecular weight (Mn) measured by GPC of preferably 60,000 to 200,000, more preferably 100,000 to 200,000, and even more preferably 140,000 to 180,000. When the Mw and / or Mn of the polymer (B1) is within the above range, the fluidity of the composition becomes suitable for forming an optical film or layer (D1), and the optical film or layer (D1) can be peeled off from the substrate without breaking or causing defects, so that the optical film or layer (D1) can be easily formed.

[0080] The Mw and Mn of each polymer (B1) can be specifically measured by the method described in the examples below. When two or more polymers (B1) are used, the Mw and Mn of the entire polymer (B1) are values ​​obtained by measuring the Mw and Mn of a polymer mixture obtained by mixing these two or more polymers (B1) by the method described in the examples below.

[0081] The cyclic olefin polymer (B1) is preferably a polymer obtained using at least one monomer selected from the group consisting of a monomer represented by the following formula (X0) and a monomer represented by the following formula (Y0), or a polymer (B1-H) obtained by hydrogenating the polymer.

[0082] [ka]

[0083] In formula (X0), R x1 ~R x4 are each independently an atom or group selected from the following (i') to (ix'), and k x , m x and p x are each independently an integer of 0 to 4. (i') Hydrogen atom (ii') Halogen atom (iii') trialkylsilyl group (iv') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms and having a linking group containing an oxygen atom, a sulfur atom, a nitrogen atom, or a silicon atom. (v') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms (vi') Polar groups (excluding (iv')). (vii')R x1 and R x2 and R form one alkylidene group, or x3 and R x4 and R that are not involved in the alkylidene group constitute one alkylidene group. x1 ~R x4 are each independently an atom or group selected from (i') to (vi'). (viii')R x1 and R x2 and R form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are attached, or x3 and R x4 and R 1 , together with the carbon atoms to which they are bonded, form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring (however, R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 x1 ~R x4 are each independently an atom or group selected from (i') to (vi'). (ix')R x2 and R x3 and R which are not involved in the hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are bonded constitute a monocyclic hydrocarbon ring or heterocyclic ring (however, R x1 and R x4 are each independently an atom or group selected from (i') to (vi').

[0084] [ka]

[0085] In formula (Y0), R y1and R y2 are each independently an atom or group selected from (i') to (vi') above, or R y1 and R y2 and form, together with the carbon atoms to which they are bonded, a monocyclic or polycyclic alicyclic hydrocarbon, an aromatic hydrocarbon, or a heterocyclic ring, and k y and p y are each independently an integer of 0 to 4.

[0086] The (ii') halogen atom includes a fluorine atom, a chlorine atom, and a bromine atom.

[0087] The (iii') trialkylsilyl group includes a trialkylsilyl group having 1 to 12 carbon atoms, and preferably a trialkylsilyl group having 1 to 6 carbon atoms. Examples of such a trialkylsilyl group include a trimethylsilyl group, a triethylsilyl group, and a triisopropylsilyl group.

[0088] Examples of the linking group containing an oxygen atom, sulfur atom, nitrogen atom, or silicon atom include a carbonyl group (-CO-), an oxycarbonyl group (-OCO-), a carbonyloxy group (-COO-), a sulfonyl group (-SO2-), an ether bond (-O-), a thioether bond (-S-), an imino group (-NH-), an amide bond (-NHCO-, -CONH-), and a siloxane bond (-OSi(R)2- (wherein R is an alkyl group such as methyl, ethyl, etc.)), and the substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms in (iv') may be a group containing a plurality of these linking groups. Among these, the carbonyloxy group (*-COO-) and the siloxane bond (-OSi(R)2-) are preferred in terms of excellent adhesion and cohesion with the dielectric multilayer film, and the dispersibility and solubility of the compound (A), where * is bonded to the ring of formula (X0).

[0089] The substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms is preferably a substituted or unsubstituted hydrocarbon group having 1 to 15 carbon atoms, and examples thereof include alkyl groups such as methyl, ethyl, and propyl; cycloalkyl groups such as cyclopentyl and cyclohexyl; aromatic hydrocarbon groups such as phenyl, biphenyl, and phenylethyl; and alkenyl groups such as vinyl, allyl, and propenyl. Of these groups, methyl and ethyl groups are preferred in terms of heat resistance and stability. Examples of the substituent on the hydrocarbon group having 1 to 30 carbon atoms include a hydroxy group and a halogen atom.

[0090] Examples of the (vi') polar group include a hydroxy group; an alkoxy group having 1 to 10 carbon atoms, such as a methoxy group and an ethoxy group; a carbonyloxy group, such as an acetoxy group, a propionyloxy group and a benzoyloxy group; a cyano group; an amino group; an acyl group; a sulfo group; and a carboxy group.

[0091] Also, R x1 and R x2 and one alkylidene group consisting of R x3 and R x4 Examples of the alkylidene group formed by the above include a methylidene group, an ethylidene group, and a propylidene group.

[0092] R x1 and R x2 and R form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are attached. x3 and R x4 and R are a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring formed together with the carbon atoms to which they are attached, and x2 and R x3 and a monocyclic hydrocarbon ring or heterocyclic ring formed by bonding with each other, R y1 and R y2However, examples of the monocyclic or polycyclic alicyclic hydrocarbon, aromatic hydrocarbon, or heterocycle formed together with the carbon atoms to which they are bonded include cyclopropylene, cyclobutylene, cyclopentylene, cyclohexylene, cycloheptylene, cyclobutenylene, cyclopentenylene, cyclohexenylene, phenylene, and naphthylene.

[0093] k x , m x , p x , k y , and p y are each independently preferably an integer of 0 to 3. More preferably, k x +m x +p x is an integer of 0 to 4, more preferably k x +m x +p x is an integer of 0 to 2, and particularly preferably k x +m x +p x is 1. k y +p y is preferably an integer of 0 to 4, and k y +p y More preferably, m is an integer of 0 to 2. x is 0 and k x +p x The use of a cyclic olefin monomer in which is 1 is preferred because it gives a polymer (B1) that has a high glass transition temperature and excellent mechanical strength.

[0094] Specific examples of the cyclic olefin monomer represented by the formula (X0) or (Y0) include the compounds shown below.

[0095] Bicyclo[2.2.1]hept-2-ene (norbornene) 5-Methyl-bicyclo[2.2.1]hept-2-ene 5-Ethyl-bicyclo[2.2.1]hept-2-ene 5-Propylbicyclo[2.2.1]hept-2-ene 5-Butylbicyclo[2.2.1]hept-2-ene 5-t-Butylbicyclo[2.2.1]hept-2-ene 5-Isobutylbicyclo[2.2.1]hept-2-ene 5-Pentylbicyclo[2.2.1]hept-2-ene 5-Hexylbicyclo[2.2.1]hept-2-ene 5-heptylbicyclo[2.2.1]hept-2-ene 5-Octylbicyclo[2.2.1]hept-2-ene 5-Decylbicyclo[2.2.1]hept-2-ene 5-Dodecylbicyclo[2.2.1]hept-2-ene 5-Cyclohexyl-bicyclo[2.2.1]hept-2-ene 5-phenyl-bicyclo[2.2.1]hept-2-ene 5-(4-biphenyl)-bicyclo[2.2.1]hept-2-ene 5-Methoxycarbonyl-bicyclo[2.2.1]hept-2-ene 5-Phenoxycarbonyl-bicyclo[2.2.1]hept-2-ene 5-Phenoxyethylcarbonyl-bicyclo[2.2.1]hept-2-ene 5-Phenylcarbonyloxy-bicyclo[2.2.1]hept-2-ene 5-Methyl-5-methoxycarbonyl-bicyclo[2.2.1]hept-2-ene 5-Methyl-5-phenoxycarbonyl-bicyclo[2.2.1]hept-2-ene 5-Methyl-5-phenoxyethylcarbonyl-bicyclo[2.2.1]hept-2-ene 5-Vinyl-bicyclo[2.2.1]hept-2-ene 5-Ethylidene-bicyclo[2.2.1]hept-2-ene 5-Trimethoxysilyl-bicyclo[2.2.1]hept-2-ene 5-Triethoxysilyl-bicyclo[2.2.1]hept-2-ene 5,5-Dimethyl-bicyclo[2.2.1]hept-2-ene 5,6-Dimethyl-bicyclo[2.2.1]hept-2-ene 5-Fluoro-bicyclo[2.2.1]hept-2-ene 5-Chloro-bicyclo[2.2.1]hept-2-ene 5-Bromo-bicyclo[2.2.1]hept-2-ene 5,6-Difluoro-bicyclo[2.2.1]hept-2-ene 5,6-Dichloro-bicyclo[2.2.1]hept-2-ene 5,6-Dibromo-bicyclo[2.2.1]hept-2-ene 5-Hydroxy-bicyclo[2.2.1]hept-2-ene 5-Hydroxyethyl-bicyclo[2.2.1]hept-2-ene 5-Cyano-bicyclo[2.2.1]hept-2-ene 5-Amino-bicyclo[2.2.1]hept-2-ene

[0096] Tricyclo[4.3.0.1 2,5 ]Deca-3-ene Tricyclo[4.4.0.1 2,5 ]Undec-3-ene 7-Methyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Ethyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Cyclohexyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-phenyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-(4-biphenyl)-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7,8-Dimethyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7,8,9-trimethyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene ·8-Methyl-tricyclo[4.4.0.1 2,5 ]Undec-3-ene 8-phenyl-tricyclo[4.4.0.1 2,5 ]Undec-3-ene 7-Fluoro-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Chloro-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Bromo-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7,8-Dichloro-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7,8,9-Trichloro-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Chloromethyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Dichloromethyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Trichloromethyl-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Hydroxy-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-Cyano-tricyclo[4.3.0.1 2,5 ]Deca-3-ene 7-amino-tricyclo[4.3.0.1 2,5 ]Deca-3-ene

[0097] Tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene Pentacyclo[7.4.0.1 2,5 .1 8,11 .0 7,12 ]pentadec-3-ene ·8-Methyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Ethyl-tetracyclo[4.4.0.12,5 .1 7,10 ]dodec-3-ene ·8-Cyclohexyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene 8-phenyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-(4-biphenyl)-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Methoxycarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene 8-Phenoxycarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Phenoxyethylcarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Phenylcarbonyloxy-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Methyl-8-methoxycarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Methyl-8-phenoxycarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Methyl-8-phenoxyethylcarbonyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Vinyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Ethylidene-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8,8-dimethyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8,9-dimethyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene 8-Fluoro-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-chloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene 8-Bromo-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8,8-Dichloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8,9-Dichloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8,8,9,9-Tetrachloro-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Hydroxy-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Hydroxyethyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Methyl-8-hydroxyethyl-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Cyano-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene ·8-Amino-tetracyclo[4.4.0.1 2,5 .1 7,10 ]dodec-3-ene

[0098] When a compound having a structure containing at least one atom of at least one kind selected from oxygen, sulfur, nitrogen, and silicon atoms in its molecule (hereinafter also referred to as a "polar structure") is used as the monomer, it has advantages such as excellent dispersibility of the compound (A) and excellent adhesion and cohesion with other materials (dielectric multilayer films, etc.). In particular, when R x1 and R x3 are each independently a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms, preferably a hydrogen atom or a methyl group, and R x2 or R x4 The polymer (B1) obtained by polymerizing a compound in which one of R is a group having a polar structure and the other is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms has low water (humidity) absorption, and is therefore preferred. y1 or R y2 The polymer (B1) obtained by polymerizing a compound in which one of the groups having a polar structure and the other is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms has low water (humid) absorption, and is therefore preferred. Furthermore, a monomer in which the group having a polar structure is a group represented by the following formula (Z0) is preferably used because the resulting polymer (B1) is easily balanced between heat resistance and water (humid) absorption.

[0099] -(CH2) z COOR···(Z0) (In formula (Z0), R is a substituted or unsubstituted hydrocarbon group having 1 to 15 carbon atoms, and z is 0 or an integer of 1 to 10.)

[0100] In the formula (Z0), the smaller the value of z, the higher the glass transition temperature of the resulting hydrogenated product of polymer (B1) (polymer (B1-H)) and the more excellent its heat resistance; therefore, z is preferably 0 or an integer of 1 to 3, and further, a monomer in which z is 0 is preferred in terms of ease of synthesis. Furthermore, as R in the formula (Z0) has a larger number of carbon atoms, the water (wet) absorption of polymer (B1-H) tends to decrease, but the glass transition temperature also tends to decrease; therefore, from the viewpoint of maintaining heat resistance, a hydrocarbon group having 1 to 10 carbon atoms is preferred, and a hydrocarbon group having 1 to 6 carbon atoms is particularly preferred.

[0101] In the formula (X0), it is preferable that an alkyl group having 1 to 3 carbon atoms, particularly a methyl group, is bonded to the carbon atom to which the group represented by the formula (Z0) is bonded, since this tends to make it easier to balance the heat resistance and water (humidity) absorption of the resulting polymer (B1). x is 0 and k x +p x The compound in which is 1 is preferably used because it has high reactivity, can give a polymer (B1) in high yield, can give a polymer (B1-H) with high heat resistance, and is industrially easily available.

[0102] The polymer (B1) may be a polymer obtained by copolymerizing the above-mentioned monomer with another monomer copolymerizable with the above-mentioned monomer within a range that does not impair the effects of the present invention.

[0103] Examples of these other monomers include cyclic olefins such as cyclobutene, cyclopentene, cycloheptene, cyclooctene, and cyclododecene, and non-conjugated cyclic polyenes such as 1,4-cyclooctadiene, dicyclopentadiene, and cyclododecatriene. These other monomers may be used alone or in combination of two or more.

[0104] The method for polymerizing the monomer is not particularly limited as long as it is possible to polymerize the monomer, and examples thereof include ring-opening polymerization and addition polymerization.

[0105] The polymer obtained by the ring-opening polymerization reaction usually has an olefinic unsaturated bond in its molecule. Furthermore, the polymer obtained by the addition polymerization reaction may also have an olefinic unsaturated bond in its molecule. Thus, if an olefinic unsaturated bond is present in the polymer molecule, the olefinic unsaturated bond may cause deterioration such as coloration or gelation over time. Therefore, it is preferable to carry out a hydrogenation reaction to convert the olefinic unsaturated bond into a saturated bond. The hydrogenation reaction yields a polymer (B1-H).

[0106] The hydrogenation reaction can be carried out by a conventional method. Specifically, the hydrogenation reaction can be carried out by adding a known hydrogenation catalyst to a solution of a polymer having an olefinically unsaturated bond, and then reacting the solution with hydrogen gas at preferably normal pressure to 300 atmospheres, more preferably 3 to 200 atmospheres, at preferably 0 to 200°C, more preferably 20 to 180°C.

[0107] The hydrogenation rate of the polymer (B1-H) is 500 MHz, 1 The proportion of hydrogen added to olefinically unsaturated bonds measured by H-NMR is usually 50% or more, preferably 70% or more, more preferably 90% or more, particularly preferably 98% or more, and most preferably 99% or more. A higher hydrogenation proportion is preferable because the layer containing the polymer (B1-H) can have excellent stability against heat and light and can maintain stable properties for a long period of time.

[0108] The content of the polymer (B1) in the present composition is preferably 1 to 80 mass %, more preferably 1.5 to 75 mass %, and even more preferably 2 to 70 mass %, relative to 100 mass % of the present composition. The content of the polymer (B1) in the present composition 1 is 1 to 80 mass %, preferably 1.5 to 80 mass %, more preferably 2 to 70 mass %, relative to 100 mass % of the present composition 1. Furthermore, the content of the polymer (B1) in the present composition 2 is 1 to 30 mass %, preferably 1.5 to 25 mass %, more preferably 2 to 20 mass %, relative to 100 mass % of the present composition 2. When the content of polymer (B1) in the composition is within the above range, a composition having excellent appearance and redispersibility can be easily obtained, and in the composition, compound (A) is not likely to aggregate and is appropriately dispersed. When an optical film or layer (D1) is formed from the composition, compound (A) is not likely to aggregate during formation of the optical film or layer (D1), and an optical film or layer (D1) in which compound (A) is sufficiently dispersed can be formed. Therefore, an optical film or layer (D1) having desired spectral properties can be easily formed.

[0109] In the present composition, the content of polymer (B1) relative to 1 part by mass of compound (A) is preferably 0.1 to 7 parts by mass, more preferably 0.2 to 7 parts by mass, and even more preferably 0.3 to 6 parts by mass. In the present composition 1, the content of the polymer (B1) relative to 1 part by mass of the compound (A) is 0.1 to 7 parts by mass, preferably 0.2 to 7 parts by mass, and more preferably 0.3 to 6 parts by mass. In the present composition 2, the content of the polymer (B1) relative to 1 part by mass of the compound (A) is 0.5 to 7 parts by mass, preferably 0.8 to 6 parts by mass, and more preferably 1 to 5 parts by mass. When the content of polymer (B1) relative to 1 part by mass of compound (A) is within the above range, a composition having excellent appearance and redispersibility can be easily obtained, and in the composition, compound (A) is not likely to aggregate and is appropriately dispersed. When an optical film or layer (D1) is formed from the composition, compound (A) is not likely to aggregate during formation of the optical film or layer (D1), and an optical film or layer (D1) in which compound (A) is sufficiently dispersed can be formed. Therefore, an optical film or layer (D1) having desired spectral properties can be easily formed.

[0110] <Other ingredients> The present composition may contain components other than the compound (A) and polymer (B1) as long as the effects of the present invention are not impaired. Furthermore, the present compositions 1 and 2 may contain components other than the compound (A), polymer (B1), and solvent as long as the effects of the present invention are not impaired. Examples of the other components include a dye (C) other than the compound (A), an ultraviolet-absorbing compound (U), a solvent (e.g., at least one selected from the first solvent (S11), the second solvent (S2), and the third solvent (S13)), a light stabilizer, a silane coupling agent, an antioxidant, an adhesion promoter, a fluorescence quencher, a polymer other than the polymer (B1), a plasticizer, and a filler. Furthermore, when an optical film or layer (D1) is formed from the composition by cast molding or the like, other components that facilitate the formation of the optical film or layer (D1) include a leveling agent, an antifoaming agent, a release promoter, and the like. These other components may each be used alone or in combination of two or more.

[0111] These other components may be mixed with the compound (A) and the polymer (B1) when preparing the composition, or may be added when synthesizing the compound (A) or the polymer (B1).

[0112] Examples of polymers other than the polymer (B1) include polyether polymers, polyimide polymers, polyester polymers, polycarbonate polymers, polyamide (aramid) polymers, polyarylate polymers, polysulfone polymers, polyethersulfone polymers, polyparaphenylene polymers, polyamideimide polymers, polyethylene naphthalate (PEN) polymers, fluorinated aromatic polymer polymers, (modified) acrylic polymers, and epoxy polymers. Specific examples of these polymers include resins described in WO 2019 / 168090. As a polymer other than the polymer (B1), the polymer (B2-1) described below may be used. In the present composition, the content of polymers other than polymer (B1) per 100 parts by mass of polymer (B1) is preferably 50 parts by mass or less, more preferably 40 parts by mass or less, and even more preferably 5 parts by mass or more and 30 parts by mass or less.

[0113] [Dye (C)] The dye (C) is not particularly limited as long as it is a compound other than the compound (A) and the ultraviolet-absorbing compound (U) described below, and may be appropriately selected from conventionally known dyes depending on the intended use of the composition. When the dye (C) is used in the present composition, the dye (C) used in the present composition may be one type or two or more types.

[0114] The dye (C) is preferably a visible light absorber or a (near) infrared absorber, and is preferably a (near) infrared absorber that has the ability to sufficiently transmit light in the visible light region (e.g., 430 to 580 nm) and sufficiently absorb light in the near-infrared wavelength region (e.g., 700 to 1100 nm). The dye (C) is preferably a solvent-soluble dye compound.

[0115] The coloring matter (C) may be any of inorganic compounds, organic compounds, and organic-inorganic compounds without any particular limitation, and for example, various known compounds used as dyes or coloring matters can be used. Examples of these compounds include azo compounds, azomethine compounds, azopyridone compounds, pyrazolone azo compounds, indole compounds, anthraquinone compounds, quinophthalone compounds, coumarin compounds, dipyrromethene compounds, pyrrolopyrrole compounds, diketopyrrolopyrrole compounds, diphenylmethane compounds, triarylmethane compounds, xanthene compounds, acridine compounds, polymethine compounds, oxonol compounds, merocyanine compounds, arylidene compounds, benzylidene compounds, cyanine compounds, squarylium compounds, croconium compounds, perylene compounds, dioxazine compounds, phthalocyanine compounds, porphyrin compounds, tetraazaporphyrin compounds, subphthalocyanine compounds, metal chelate compounds thereof, and metal dithiolate compounds. The polymethine compounds are polymethine compounds excluding oxonol compounds, merocyanine compounds, arylidene compounds, benzylidene compounds, cyanine compounds, squarylium compounds, and croconium compounds, and the phthalocyanine compounds are phthalocyanine compounds excluding porphyrin compounds and tetraazaporphyrin compounds.

[0116] Among these, at least one selected from azomethine compounds, azopyridone compounds, pyrazolone azo compounds, indole compounds, anthraquinone compounds, coumarin compounds, dipyrromethene compounds, triarylmethane compounds, xanthene compounds, polymethine compounds, merocyanine compounds, benzylidene compounds, cyanine compounds, squarylium compounds, croconium compounds, perylene compounds, dioxazine compounds, phthalocyanine compounds, porphyrin compounds, tetraazaporphyrin compounds, subphthalocyanine compounds, and metal chelate compounds thereof is preferred, More preferred is at least one selected from azomethine compounds, azopyridone compounds, pyrazolone azo compounds, indole compounds, coumarin compounds, dipyrromethene compounds, triarylmethane compounds, xanthene compounds, polymethine compounds, merocyanine compounds, cyanine compounds, squarylium compounds, croconium compounds, phthalocyanine compounds, porphyrin compounds, tetraazaporphyrin compounds, subphthalocyanine compounds, and metal chelate compounds thereof.

[0117] Specific dye structures are described in, for example, "New Edition Dye Handbook" (edited by the Society of Organic Synthetic Chemistry; Maruzen, 1970) and "Dye Handbook" (edited by Okawara et al.; Kodansha, 1986).

[0118] When the composition contains the dye (C), the content thereof is preferably 0.05 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, and even more preferably 0.2 to 2 parts by mass, per 100 parts by mass of the polymer (B1). When the content of the dye (C) is within the above range, the light absorption properties of the dye (C) are fully exhibited, and an optical film or layer (D1) having desired optical properties can be easily formed.

[0119] [Ultraviolet absorbing compound (U)] The composition may contain an ultraviolet absorbing compound (U) that absorbs at least part of the light in the (near) ultraviolet region. When the present composition contains the compound (U), deterioration of the polymer (B1) and the compound (A) can be suppressed. When compound (U) is used in the present composition, the compound (U) used in the present composition may be one type or two or more types.

[0120] The compound (U) is preferably selected from the viewpoints of absorbing light in a desired wavelength range, being compatible with a specific solvent, dispersing well in the composition, and having excellent environmental resistance, etc. In addition, in order to broaden the ultraviolet absorption width, two or more compounds (U) having different maximum absorption wavelengths may be used.

[0121] Examples of the compound (U) include benzophenone-based compounds, benzotriazole-based compounds, salicylic acid-based compounds, cyanoacrylate-based compounds and triazine-based compounds. Specific examples of compound (U) include the compounds described in paragraphs

[0258] to

[0259] of JP-A No. 2012-18395 and the compounds described in JP-A No. 2007-72163.

[0122] Compound (U) may be a commercially available product, and examples of such commercially available products include Tinuvin PS, Tinuvin 99-2, Tinuvin 234, Tinuvin 326, Tinuvin 329, Tinuvin 900, Tinuvin 928, Tinuvin 400, Tinuvin 405, Tinuvin 460, Tinuvin 477, Tinuvin 479, and Tinuvin 1577 (all manufactured by BASF).

[0123] When the present composition contains the compound (U), the content thereof is preferably 0.1 to 5 parts by mass per 100 parts by mass of the polymer (B1). When the content of compound (U) is within the above range, the light absorption properties of compound (U) are fully exhibited, and an optical film or layer (D1) having desired optical properties can be easily formed.

[0124] [Solvent (Second Solvent (S2))] The present composition may contain a second solvent (S2) within the range that does not impair the effects of the present invention, and preferably contains a second solvent (S2). The present composition 1 and the present composition 2 preferably contain one or more second solvents (S2). When the second solvent (S2) is used in the present composition, the second solvent (S2) used in the present composition may be one type or two or more types.

[0125] The composition may contain a first solvent (S11) that can be used in synthesizing the compound (A). When the composition contains the first solvent (S11), the content thereof is preferably 5% by mass or less, more preferably 3% by mass or less, even more preferably 1% by mass or less, particularly preferably 0.5% by mass or less, and most preferably less than 0.1% by mass.

[0126] The second solvent (S2) is not particularly limited, and examples thereof include methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, 2-butanol, tert-butanol, n-pentanol, isopentanol, 2-methylbutanol, 2-pentanol, tert-pentanol, 3-methoxybutanol, n-hexanol, 2-methylpentanol, 1-hexanol, 2-hexanol, 2-ethylbutanol, 1-heptanol, 2-heptanol, 3-heptanol, n-octanol, 2-ethylhexanol, 2-octanol, n-nonyl alcohol, 2,6-dimethyl-4-heptanol, n-decanol, and cyclohexanol. Examples of suitable solvents include alcohols such as cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol, and diacetone alcohol; ketones such as acetone, heptanone, cyclopentanone, and cyclohexanone; hydrocarbons such as pentane, hexane, cyclohexane, xylene, and toluene; amides such as dimethylformamide and dimethylacetamide; heterocyclic compounds such as tetrahydrofuran (THF) and oxetane; chlorinated solvents such as methylene chloride (dichloromethane), chloroform, dichloroethane, tetrachloroethane, and dichlorobenzene; ethers such as diethyl ether; and esters such as ethyl formate and methyl acetate.

[0127] The second solvent (S2) may be determined taking into consideration the properties of the polymer (B1), the stability of the composition, the stability of the process for forming the optical film or layer (D1), the properties required for the optical film or layer (D1), and the like. When a solution casting method or the like is used to form the optical film or layer (D1), the second solvent (S2) is preferably a solvent with a low boiling point (for example, a chlorine-based solvent).

[0128] When the optical film or layer (D1) is formed by the solution casting method, the optical film or layer (D1) is formed by removing the solvent after casting, so it is preferable to select a solvent with a relatively low boiling point as the second solvent (S2).In this case, the boiling point of the second solvent (S2) is preferably 115°C or lower, more preferably 70°C or lower, and even more preferably 60°C or lower. Furthermore, if a solvent with a high boiling point is used as the second solvent (S2), there is a possibility that an excessive amount of solvent will remain in the optical film or layer (D1) when the optical film or layer (D1) is formed. If such an optical film or layer (D1) with a large amount of residual solvent is used in a camera module, some of the solvent may evaporate, causing adverse effects on electronic and optical components. On the other hand, if the boiling point of the second solvent (S2) is less than 30°C, the solvent may evaporate during preparation of the present composition, causing an increase in viscosity or a significantly shortened pot life. In view of the above, the boiling point of the second solvent (S2) is preferably 30 to 115°C, more preferably 35 to 70°C, and even more preferably 35 to 60°C. Preferred examples of such second solvents (S2) include acetone (56°C), chloroform (61°C), methylene chloride (40°C), diethyl ether (35°C), ethyl formate (52°C), THF (66°C), hexane (69°C), methanol (65°C), methyl acetate (57°C), pentane (36°C), methyl ethyl ketone (80°C), and toluene (111°C).

[0129] When the present composition and the present composition 1 contain the second solvent (S2), the content thereof is preferably such that the content of the solid content in the present composition falls within the above-mentioned range, specifically, preferably 15 to 85% by mass, more preferably 20 to 70% by mass. When the present composition 2 contains the second solvent (S2), the content thereof is preferably such that the solid content in the present composition 2 falls within the above-mentioned range, specifically, preferably 50 to 98% by mass, more preferably 60 to 96% by mass.

[0130] When the present composition contains a second solvent (S2), the solubility parameter (SP2) of the second solvent (S2) is preferably 7 to 11, more preferably 8.5 to 10.5. The second solvent (S2) having the above SP2 value is preferably a compound selected from acetone (SP value = 9.9), chloroform (SP value = 9.4), methylene chloride (SP value = 9.7), diethyl ether (SP value = 7.4), hexane (SP value = 7.3), methyl acetate (SP value = 9.6), pentane (SP value = 7.0), THF (SP value = 9.4), and toluene (SP value = 8.8). Among these, compounds selected from acetone, chloroform, methylene chloride, THF, and toluene are more preferred due to their low boiling points. When such a second solvent (S2) is selected, it is expected that the solubility parameter of the second solvent is close to that of compound (A), and therefore compound (A) can be dispersed well.

[0131] [Solvent (Third solvent (S13))] This composition (as well as this composition 1 and this composition 2) may contain a third solvent (S13) within the range that does not impair the effects of the present invention, and preferably contains a third solvent (S13). The present composition 2 preferably contains at least one solvent (S1) selected from the group consisting of a first solvent (S11) and a third solvent (S13), and a second solvent (S2). When a third solvent (S13) is used in the present composition, the third solvent (S13) used in the present composition may be one type or two or more types.

[0132] The third solvent (S13) is not particularly limited, and examples thereof include methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, 2-butanol, tert-butanol, n-pentanol, isopentanol, 2-methylbutanol, 2-pentanol, tert-pentanol, 3-methoxybutanol, n-hexanol, 2-methylpentanol, 1-hexanol, 2-hexanol, 2-ethylbutanol, 1-heptanol, 2-heptanol, 3-heptanol, n-octanol, 2-ethylhexanol, 2-octanol, n-nonyl alcohol, and 2,6-dimethyl-4-heptanol. Examples of suitable solvents include alcohols such as n-decanol, cyclohexanol, methylcyclohexanol, 3,3,5-trimethylcyclohexanol, benzyl alcohol, and diacetone alcohol; ketones such as heptanone, cyclopentanone, and cyclohexanone; hydrocarbons such as (n-)heptane, (n-)pentane, cyclopentane, cyclohexane, xylene, and toluene; amides such as dimethylformamide and dimethylacetamide; heterocyclic compounds such as tetrahydrofuran (THF) and oxetane; and chlorinated solvents such as methylene chloride (dichloromethane), chloroform, dichloroethane, tetrachloroethane, and dichlorobenzene.

[0133] The third solvent (S13) is preferably a solvent different from the second solvent (S2), and is capable of forming an azeotropic mixture with the second solvent (S2). Azeotropy is a phenomenon in which the liquid phase and the gas phase have the same composition when a liquid mixture boils. Such a mixture is called an azeotropic mixture, and a composition that can form an azeotrope is called an azeotropic composition (hereinafter, the azeotropic composition is expressed in terms of the content of the second solvent (S2) in the mixture), and the boiling point at this point is called the azeotropic point. For example, according to the Table of Azeotropes and Nonazeotropes (Advances in Chemistry; American Chemical Society: Washington, DC, 1973), when acetone is used as the second solvent (S2), it can form an azeotropic mixture with compounds such as pentane (boiling point = 36.15°C; azeotropic point = 31.9°C; azeotropic composition = 21% by mass), cyclopentanone (boiling point = 49.3°C; azeotropic point = 41.0°C; azeotropic composition = 36% by mass), cyclohexane (boiling point = 80.75°C; azeotropic point = 53.0°C; azeotropic composition = 67% by mass), (n-)hexane (boiling point = 68.8°C; azeotropic point = 49.7°C; azeotropic composition = 53.5% by mass), and (n-)heptane (boiling point = 98.4°C; azeotropic point = 55.85°C; azeotropic composition = 89.5% by mass). When chloroform is used as the second solvent (S2), it can form an azeotropic mixture with compounds such as methanol (boiling point = 64.7°C; azeotropic point = 53.43°C; azeotropic composition = 87.4% by mass), ethanol (boiling point = 78.3°C; azeotropic point = 59.35°C; azeotropic composition = 93% by mass), isopropyl alcohol (boiling point = 82.45°C; azeotropic point = 60.8°C; azeotropic composition = 95.5% by mass), and hexane (boiling point = 68.95°C; azeotropic point = 59.95°C; azeotropic composition = 72% by mass). When methylene chloride is used as the second solvent (S2), it can form an azeotropic mixture with compounds such as methanol (boiling point = 64.65°C; azeotropic point = 37.8°C; azeotropic composition = 92.7% by mass), ethanol (boiling point = 78.3°C; azeotropic point less than 39.85°C; azeotropic composition more than 95% by mass), and cyclopentane (boiling point = 49.3°C; azeotropic point = 38.0°C; azeotropic composition = 70% by mass). When tetrahydrofuran is used as the second solvent (S2), it can form an azeotrope with a compound such as hexane (boiling point = 68.9°C; azeotropic point = 63°C; azeotropic composition = 53.5% by mass).

[0134] Since the present composition contains the polymer (B1) having the above Mw, depending on the types and ratios of the compounds contained in the composition, the composition may become cloudy or lose its clear appearance during or after preparation. Furthermore, when a layer (D1) or the like is formed from the composition, the resulting layer (D1) or the like may have a large haze. When the present composition contains an appropriate amount of a specific third solvent (S13) in combination with the second solvent (S2), the transparency of the appearance of the present composition is improved, and when a layer (D1) or the like is formed, the effect of suppressing an increase in haze of the formed layer (D1) or the like can be easily obtained.

[0135] Furthermore, when the present composition contains a third solvent (S13), the solubility parameter (SP3) of the third solvent (S13) is preferably larger than the solubility parameter (SP2) of the second solvent (S2), and is preferably 10 to 16, more preferably 11 to 15. By adding an appropriate amount of a third solvent (S13) having the above SP3 value, the appearance transparency of the composition can be further improved and the haze value of a layer (D1) formed from the composition can be further reduced. In particular, by adding an appropriate amount of a third solvent (S3) that can form an azeotrope with the second solvent (S2) and has a specific solubility parameter (SP3) to the present composition containing the second solvent (S2), the transparency of the present composition can be further improved, and when a layer (D1) or the like is formed from the present composition, the haze of the layer (D1) or the like can be reduced.

[0136] The third solvent (S13) may be the same as or different from the first solvent (S11). The case where the third solvent (S13) is the same as the first solvent (S11) refers to, for example, the case where ethanol is used as the first solvent (S11) when preparing the compound (A), and then ethanol is used as the third solvent (S13) to be added to the composition after mixing with the second solvent (S2). The case where the third solvent (S13) is a solvent different from the first solvent (S11) refers to, for example, a case where ethanol is used as the first solvent (S11) when preparing compound (A), and methanol is used as the third solvent (S13) to be added to the composition after mixing with the second solvent (S2).

[0137] The first solvent (S11) and the third solvent (S13) may be collectively referred to as solvent (S1), because the first solvent (S11) and the third solvent (S13) may be required to be poor solvents for the compound (A). The first solvent (S11) and the third solvent (S13) may both be alcohols. When a solid fraction of compound (A) obtained by purifying the liquid obtained in the synthesis method of compound (A) is used as compound (A) used in preparing the present composition, the first solvent (S11) is almost absent in the present composition, and it may be said that solvent (S1) is almost entirely occupied by the third solvent (S13). When the first solvent (S11) and the third solvent (S13) are the same solvent, the first solvent (S11) and the third solvent (S13) are usually indistinguishable from each other in the present composition.

[0138] Hereinafter, the content of the third solvent (S13) in all solvents contained in this composition (solvent (S1) [= solvent (S11) + solvent (S13)] + solvent (S2)) (the content of the third solvent (S13) relative to 100% by mass of all solvents) is defined as η. In addition, when it is considered that the solvent (S1) contained in the present composition does not contain the first solvent (S11) (for example, when the content of the first solvent (S11) is less than 0.1 mass%), the content of the solvent (S1) in all solvents contained in the present composition can be considered to be the content η of the third solvent (S13) in all solvents contained in the present composition.

[0139] The upper limit r0 of the content η of the third solvent (S13) is preferably an amount related to the range in which the mixture consisting of the second solvent (S2) and the third solvent (S13) forms an azeotropic mixture. Specifically, r0 is preferably the content of the third solvent (S13) that forms an azeotropic mixture with the second solvent (S2) and the third solvent (S13) when the content of the third solvent (S13) is r0% by mass or more (when the composition essentially consists of the second solvent (S2) and the third solvent (S13), the amount is 100% by mass minus the azeotropic composition, which is the content of the second solvent (S2)). Therefore, the content η of the third solvent (S13) in this composition and this composition 1 is preferably 0% by mass or more and less than 0% by mass, with the lower limit being more preferably 1.5% by mass or more, and even more preferably 2.0% by mass or more. Furthermore, the content η of the third solvent (S13) in this composition 2 is 0% by mass or more and less than 0% by mass, with the lower limit being preferably 1.5% by mass or more, and even more preferably 2.0% by mass or more. The upper limit of the content η of the third solvent (S13) in this composition (including this composition 1 and this composition 2) varies depending on the type of the second solvent (S2) and the third solvent (S13), but is preferably 8.0% by mass or less, more preferably 7.0% by mass or less, and even more preferably 6.5% by mass or less. When the content η of the third solvent (S13) is within the above range, an optical filter or layer (D1) having good optical properties with sufficiently low haze can be easily obtained. If the content η of the third solvent (S13) is r0 mass% or more, the appearance transparency of the composition may decrease, or when a layer (D1) or the like is formed, the haze of the layer (D1) or the like may increase.

[0140] [Light stabilizer] The present composition may contain a light stabilizer for the purpose of suppressing deterioration of the polymer (B1) and the compound (A) due to the action of light including ultraviolet light. When a light stabilizer is used in the present composition, the light stabilizer used in the present composition may be one type or two or more types.

[0141] Examples of light stabilizers include hindered amine light stabilizers (HALS). Examples of the hindered amine light stabilizer include the Adeka Stab series manufactured by ADEKA Corporation.

[0142] When the composition contains a light stabilizer, the content thereof is preferably 0.001 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 5 parts by mass, per 100 parts by mass of polymer (B1), from the viewpoint of being able to sufficiently suppress deterioration of polymer (B1) and compound (A), etc.

[0143] [Silane coupling agent] The composition may also include a silane coupling agent. It is believed that the use of a silane coupling agent can strengthen the bond between the compound (A) and the polymer (B1) in the composition, thereby improving weather resistance, etc. Furthermore, for example, when an optical film or layer (D1) is formed from the composition on an adherend (e.g., an inorganic support such as glass), peeling between the support and the optical film or layer (D1) can be suppressed. When a silane coupling agent is used in the present composition, the silane coupling agent used in the present composition may be one type or two or more types.

[0144] Examples of the silane coupling agent include alkoxysilane monomers and hydrolysates thereof. Examples of the alkoxysilane monomer include tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-aminopropyltriethoxysilane, N-2-(aminoethyl)-3-aminopropyltrimethoxysilane, N-2-(aminoethyl)-N'-2-(aminoethyl)-3-aminopropyltriethoxysilane, 3-anilinopropyltrimethoxysilane, vinyltrimethoxysilane, N-2-(N-vinylbenzylaminoethyl)-3-aminopropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane.

[0145] When the present composition contains a silane coupling agent, the content thereof is preferably 0.1 to 20 parts by mass, more preferably 1 to 10 parts by mass, per 100 parts by mass of polymer (B1), from the viewpoints that the present composition having excellent weather resistance can be easily obtained and an optical film or layer (D1) having excellent adhesion to an adherend can be easily formed.

[0146] <Method of manufacturing the present composition> The composition can be produced by mixing the compound (A), the polymer (B1), and, if necessary, the other components described above. Although the order of mixing is not particularly limited, it is preferable to mix and stir the solution obtained by dissolving the polymer (B1) in an appropriate amount of the second solvent (S2) with the compound (A) obtained as described above. In this case, it is preferable to stir at room temperature for about 5 to 60 minutes, for example, to the extent that no aggregates or lumps are visible in the obtained composition.

[0147] The second solvent (S2) may be removed to a certain extent from the composition obtained as described above by distillation or the like, including for the purpose of adjusting the concentration of compound (A) in the resulting composition. The distillation is preferably carried out at a temperature at or near the boiling point of the second solvent (S2) to be removed, or at or above the boiling point. However, distillation at temperatures above 85°C, for example, may cause thermal damage to compound (A). Therefore, when carrying out the distillation, it is preferable to carry out the distillation at a temperature of 85°C or lower. On the other hand, depending on the boiling point of the selected second solvent (S2), distillation accompanied by reduced pressure (vacuum distillation) may be carried out in order to lower the effective boiling point.

[0148] When preparing the present composition 2, it is preferable to adjust the content of the second solvent (S2) as necessary, and then mix in the third solvent (S13).

[0149] One embodiment of the present composition and the method for producing the present composition 1 preferably includes the following steps 1 to 4, and the method for producing the present composition 2 preferably includes the following steps 1 to 4. Step 1: Mixing a copper compound, a phosphonic acid compound, and a first solvent (S11) to prepare a liquid (r1) containing the compound (A). Step 2: A step of mixing the polymer (B1) with a second solvent (S2) to prepare a liquid (r2) containing the polymer (B1). Step 3: A step of mixing the liquid (r1) obtained in step 1 with the liquid (r2) obtained in step 2, or mixing the compound (A) obtained by separation from the liquid (r1) obtained in step 1 with the liquid (r2) obtained in step 2, to prepare a liquid (r3) containing the compound (A) and the polymer (B1). Step 4: Mixing the liquid (r3) obtained in Step 3 with a third solvent (S13) to prepare the composition.

[0150] [Process 1] In step 1, a copper compound, a phosphonic acid compound, and a first solvent (S11) are mixed to prepare a liquid (r1) containing the compound (A). When preparing the liquid (r1), the phosphate ester compound may be mixed in as needed. The method for this step 1 is not particularly limited, but for example, the method described in the section above (Method for synthesizing compound (A)) can be used.

[0151] [Process 2] In step 2, the polymer (B1) is mixed with a second solvent (S2) to prepare a liquid (r2) containing the polymer (B1). At this time, it is preferable to dissolve the polymer (B1) in an appropriate amount of the second solvent (S2).

[0152] [Step 3] In step 3, a liquid (r3) containing the compound (A) and the polymer (B1) is prepared. The method for preparing the solution (r3) is not particularly limited, but For example, a method of preparing liquid (r3) by mixing liquid (r1) obtained in step 1 with liquid (r2) obtained in step 2; A method of preparing a liquid (r3) by mixing the compound (A) obtained by separating it from the liquid (r1) obtained in the step 1 with the liquid (r2) obtained in the step 2. Examples include: That is, as compound (A), the liquid (r1) obtained in step 1 may be used as is, or compound (A) separated from liquid (r1) may be used. A method for separating compound (A) from liquid (r1) includes, for example, removing the first solvent (S11) by filtration or the like to obtain solid compound (A). Furthermore, the obtained solid compound (A) may be added to a poor solvent for compound (A), stirred for several minutes to several hours, and the re-precipitated precipitate may be separated from the solvent by filtration or the like. This re-precipitation and separation by filtration may be repeated once or more than once.

[0153] The liquid (r3) obtained in step 3 may be used as is, or, for example, a desolvated purified product obtained by removing the first solvent (S11) contained in the liquid (r3) by distillation or the like may be used. Furthermore, the obtained desolvated purified product may be added with the second solvent (S2) and purified by distillation or the like. This addition of the second solvent (S2) and purification by distillation or the like may be repeated two or more times. Furthermore, before carrying out the following step 4, it is preferable to adjust the content of the second solvent (S2) in the liquid (r3) by mixing the second solvent (S2) with the purified product after solvent removal, if necessary.

[0154] [Step 4] In step 4, the present composition is prepared by mixing the liquid (r3) obtained in step 3 with a third solvent (S13). In step 4, it is preferable to mix the third solvent (S13) so that the contents of the solids and polymer (B1) contained in composition 1 are within the above-mentioned ranges, and so that the contents of the third solvent (S13) in the solids, polymer (B1) and total solvent contained in composition 2 are within the above-mentioned ranges.

[0155] <Optical properties of the composition> When the composition is in a liquid state with the compound (A) dispersed therein, it may have a certain transmission spectrum, and it is preferable that the composition 2 satisfies the following requirements (i) to (iv), which are characteristics related to the transmission spectrum. In particular, the composition 2 preferably satisfies the following requirements (p) to (s).

[0156] The characteristics of the transmission spectrum of the composition are measured, for example, by placing the composition in a transparent quartz cell such that the physical optical path length of light passing through the composition is 1±0.25 mm, where the physical optical path length is the length that does not take into account the refractive index of the medium. Here, the characteristics relating to the transmission spectrum of the present composition are those measured using a measurement sample in an environment at a temperature of 25±5°C, with the amount of solvent adjusted (by removing or adding solvent) as necessary so that the transmittance at a wavelength of 800 nm is 10±1%. Specifically, the measurement is performed by the method described in "Measurement of the transmission spectrum of the composition - 1" in the Examples below. On the other hand, the characteristics of the transmission spectrum of Composition 2 are evaluated based on a transmission spectrum standardized so that the transmittance at a wavelength of 900 nm is 10%. Specifically, the standardized transmission spectrum is obtained by the method described in "Measurement of Transmission Spectrum of Composition - 2" in the following Examples.

[0157] Requirement (i): The average transmittance in the wavelength range of 800 to 1100 nm is 10% or less. The average value of the transmittance is preferably 8% or less, more preferably 6% or less. By using the present composition having an average transmittance in the wavelength range of 800 to 1100 nm within the above range, an optical film or layer (D1) having sufficient infrared shielding properties can be easily formed, and an imaging device or the like having the optical film or layer (D1) can make the light reaching the imaging element close to the visual sensitivity of humans, who generally do not perceive light in the infrared range.

[0158] In the present invention, the average value of the transmittances for wavelengths A to B nm (average transmittance) is obtained by measuring the transmittances at each wavelength from A nm to B nm in 1 nm increments, and dividing the sum of the transmittances by the number of measured transmittances (wavelength range, B-A+1).

[0159] Requirement (ii): The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. By using the present composition having an average transmittance in the wavelength range of 460 to 580 nm within the above range, an optical film or layer (D1) having excellent transmittance to light in the visible light region can be easily formed, and an imaging device or the like having the optical film or layer (D1) can easily obtain brighter images.

[0160] Requirement (iii): The first cutoff wavelength at which the transmittance is 50% is present in the wavelength range of 680 to 780 nm. By using the present composition having a first cutoff wavelength within the above range, an optical film or layer (D1) having excellent shielding properties for light in the infrared region can be easily formed, and an imaging device or the like having the optical film or layer (D1) can make the light reaching the imaging element into light with a visual sensitivity close to that of humans, who generally do not perceive light in the infrared region.

[0161] Requirement (iv): The second cutoff wavelength at which the transmittance is 50% is present in the wavelength range of 320 to 380 nm. By using the present composition having a second cutoff wavelength within the above range, an optical film or layer (D1) having excellent blocking properties for light in the ultraviolet region can be easily formed, and an imaging device or the like having the optical film or layer (D1) can make the light reaching the imaging element closer to the visual sensitivity of humans, who generally do not perceive light in the ultraviolet region, and can also reduce the effects of color bleeding such as purple fringing caused by the inclusion of light with short wavelengths in the light reaching the imaging element.

[0162] In addition to the above requirements (i) to (iv), the present composition may also satisfy the following requirements (v) to (vii), and preferably satisfies the following requirements (v) to (vii).

[0163] Requirement (v): The standard deviation of the transmittance in the wavelength range of 900 to 1100 nm is 0.5% or less. The standard deviation is preferably 0.3% or less. When adjusting the concentration or amount of compound (A) to increase the absorbance of light in the wavelength range of 800 to 1200 nm, the absorbance of light in this range can be easily reduced if the transmittance in the wavelength range of 900 to 1100 nm has a smaller variation and the transmission spectrum is flatter. If the standard deviation exceeds the range, even if the transmittance of light in the wavelength range of 800 to 1200 nm is sufficiently reduced, the reduction in transmittance in some wavelength ranges may not be sufficient.

[0164] In the present invention, the standard deviation of the transmittance at wavelengths A to B nm is the standard deviation of the transmittance when the transmittance is measured at each wavelength from A nm to B nm in 1 nm increments.

[0165] Requirement (vi): In the wavelength range of 300 to 1200 nm, the width of the wavelength band in which the transmittance is 50% or more is 350 to 420 nm. Requirement (vi) specifies the width of the so-called transmission band. When the wavelength width is within the above range, the transmission band such as the visible light range becomes sufficiently long, making it difficult for a part of the transmission band to be blocked, and also making it easier to sufficiently block light outside the transmission band.

[0166] Requirement (vii): The average transmittance in the wavelength range of 1100 to 1200 nm is 10% or less. The average value of the transmittance is preferably 8% or less. Compositions containing compound (A) tend to have high transmittance for light having a wavelength of 1100 nm or more, but the present composition can easily satisfy requirement (vii). Compositions satisfying requirement (vii) tend to be able to sufficiently reduce the transmittance for light having a wavelength of 800 to 1100 nm, and also to suppress the transmittance for light having a wavelength of 1100 nm or more.

[0167] Requirement (p): The average transmittance in the wavelength range of 460 to 580 nm is 65% or more. The average transmittance is preferably 75% or more, and more preferably 78% or more. By using the present composition 2, whose average transmittance in the wavelength range of 460 to 580 nm is within the above range, it is possible to easily form an optical film or layer (D1) that has excellent transmittance for light in the visible light region, even if the transmittance in the wavelength range of around 900 nm or longer is sufficiently low.

[0168] Requirement (q): The standard deviation of the transmittance in the wavelength range of 850 to 1100 nm is 1% or less. The standard deviation of the transmittance is preferably 0.7% or less, and more preferably 0.5% or less. By using the present composition 2, whose standard deviation of transmittance in the wavelength range of 850 to 1100 nm is within the above range, it is possible to easily form an optical film or layer (D1) having uniform light absorption in the wavelength range that is required to be shielded. If the standard deviation exceeds the above range, for example, even if the transmittance of light in the wavelength range of 800 to 1200 nm is sufficiently reduced, the reduction in transmittance in some wavelength ranges may not be sufficient.

[0169] In the present invention, the standard deviation of the transmittance at wavelengths A to B nm is the standard deviation of the transmittance when the transmittance is measured at each wavelength from A nm to B nm in 1 nm increments.

[0170] Requirement (r): The optical fiber has a first cutoff wavelength at which the transmittance is 50% in the wavelength range of 730 to 790 nm. The first' cutoff wavelength is preferably within a wavelength range of 740 to 780 nm, and more preferably within a wavelength range of 740 to 770 nm. By using the present composition 2 having a first' cutoff wavelength within the above range, an optical film or layer (D1) having excellent shielding properties for light in the infrared region can be easily formed, and an imaging device or the like having the optical film or layer (D1) can make the light reaching the imaging element into light with a visual sensitivity close to that of humans, who generally do not perceive light in the infrared region.

[0171] Requirement (s): The optical fiber has a second' cutoff wavelength in the wavelength range of 330 to 450 nm, at which the transmittance is 50%. The second' cutoff wavelength is preferably within a wavelength range of 340 to 380 nm, and more preferably within a wavelength range of 350 to 380 nm. By using the present composition 2 having a second' cutoff wavelength within the above range, an optical film or layer (D1) having excellent blocking properties for light in the ultraviolet region can be easily formed, and an imaging device or the like having the optical film or layer (D1) can make the light reaching the imaging element closer to the visual sensitivity of humans, who generally do not perceive light in the ultraviolet region, and can also reduce the effects of color bleeding such as purple fringing caused by the inclusion of light with short wavelengths in the light reaching the imaging element.

[0172] In addition to the above requirements (p) to (s), the present composition 2 more preferably satisfies the following requirement (t) or (u), and even more preferably satisfies the following requirements (t) and (u).

[0173] Requirement (t): When the wavelength showing the maximum transmittance in the wavelength range of 400 to 700 nm is λM [nm], the average increase in transmittance per unit wavelength in the transmittance spectrum in the wavelength range of 400 to λM [nm] is 0.18 [% / nm] or less. The increase in transmittance per unit wavelength of the transmittance spectrum is preferably 0.16 [% / nm] or less, and more preferably 0.14 [% / nm] or less. By forming an optical film or layer (D1) using the present composition 2, whose increase in transmittance per unit wavelength in the transmittance spectrum is within the above range, it is possible to suppress a decrease in transmittance in the visible light region, particularly on the short wavelength side. The increase in transmittance per unit wavelength in the transmittance spectrum represents the first derivative when the transmittance shown in the transmission spectrum is treated as a function of wavelength when the transmittance is measured at each wavelength from 400 [nm] to λM [nm] in 1 nm increments.

[0174] Requirement (u): The wavelength λ at which the transmittance becomes 30% in the wavelength range of 300 to 1000 nm S [nm] and λ L [nm] exists (however, λ S <λ L ), λ S ~λ LWhen the transmittance is measured at each wavelength in 1 nm increments, the skewness of the transmittance is -1.5 or more. The skewness is preferably −1.5 to −0.7. When the present composition 2 having a distortion within the above range is used to form an optical film or a layer (D1), it is possible to suppress the phenomenon in which the transmission spectrum of the obtained optical film or layer (D1) tails off from the transmission edge on the short wavelength side to an even shorter wavelength side, which contributes to improving the sharp cut properties on the short wavelength side of the optical film or layer (D1) and improving the shielding properties on the short wavelength side.

[0175] Optical Films and Layers (D1) The optical film and layer (D1) according to the present invention are formed from the present composition. The optical film refers to a film obtained by forming the present composition using a conventionally known method, and is synonymous with layer (D1). Therefore, the following description of layer (D1) can also be applied to the optical film. Hereinafter, the optical film and layer (D1) will also be referred to as "layer (D1) and the like."

[0176] When the layer (D1) etc. is used for mounting in an imaging device or a camera module, for example, a thinner layer (D1) etc. is advantageous for reducing the height of the imaging device or camera module. On the other hand, if the layer (D1) etc. is too thin, for example, rigidity and mechanical strength are significantly reduced, which may make handling of the layer (D1) etc. difficult. Considering these, the thickness of the layer (D1) etc. is preferably 300 μm or less, more preferably 20 to 280 μm, and even more preferably 35 to 250 μm.

[0177] When the present composition containing compound (A) is used to form a layer (D1) etc., the resulting transmission spectrum changes depending on the thickness of the layer (D1) etc. For example, when it is desired to further reduce the transmittance in the wavelength range of 800 to 1100 nm, the thickness of the layer (D1) etc. can be increased, and when it is desired to increase the transmittance in part of the visible light region of wavelengths of 460 to 580 nm, the thickness of the layer (D1) etc. can be decreased, and so on. In this way, the thickness can be adjusted according to the desired transmittance characteristics.

[0178] When the layer (D1) etc. has a thickness of 300 μm or less, it may have, and preferably has, the following properties (I) to (V) in the transmission spectrum when light is incident at an incident angle of 0° on the main surface (the surface having the largest area) of the layer (D1) etc. Here, the characteristics relating to the transmission spectrum of the layer (D1) etc. formed from the present composition other than the present composition 2, particularly the following characteristics (I) to (VIII), can be specifically obtained by the method described in "Measurement of transmission spectrum of layer-1" in the following examples.

[0179] Property (I): The average transmittance in the wavelength range of 460 to 580 nm is 80% or more, preferably 85% or more. An imaging device or the like having a layer (D1) or the like that satisfies the characteristic (I) increases the luminous flux of light in the visible light range that passes through the layer (D1) or the like and reaches the imaging element or the like, and can easily form a brighter image.

[0180] Property (II): The average transmittance in the wavelength range of 800 to 1100 nm is 5% or less, preferably 3% or less. The layer (D1) etc. that satisfies the characteristic (II) can sufficiently block light in the near-infrared region, and an imaging device etc. having the layer (D1) etc. can make the light that reaches the imaging element etc. close to the visual sensitivity of humans, who generally do not perceive light in the near-infrared region.

[0181] Property (III): A third cutoff wavelength at which the transmittance is 50% is present in the wavelength range of 680 to 730 nm, and the third cutoff wavelength is preferably in the range of 680 to 720 nm. The layer (D1) etc. having the third cutoff wavelength within the above range has excellent shielding properties for light in the near-infrared region, and an imaging device etc. having the layer (D1) etc. can make the light reaching the imaging element etc. close to the visual sensitivity of humans, who generally do not perceive light in the near-infrared region. The absolute value of the difference between the third cutoff wavelength and the first cutoff wavelength is preferably 10 to 60 nm, and more preferably 15 to 55 nm. Layers (D1) etc. in which the absolute value of the difference between the third cutoff wavelength and the first cutoff wavelength is within the above range do not undergo significant aggregation of compound (A) over time and have an excellent shelf life.

[0182] Property (IV): A fourth cutoff wavelength at which the transmittance is 50% is present in the wavelength range of 340 to 400 nm. The fourth cutoff wavelength is preferably in the range of 350 to 400 nm, and more preferably in the range of 360 to 400 nm. The layer (D1) etc. that satisfies the characteristic (IV) has excellent blocking properties for light in the ultraviolet range, and an imaging device etc. having the layer (D1) etc. can make the light that reaches the imaging element etc. close to the visual sensitivity of humans, who generally do not perceive light in the ultraviolet range, and can also reduce the effects of color bleeding such as purple fringing that occurs when light that reaches the imaging element etc. contains light with short wavelengths.

[0183] Property (V): The transmittance at a wavelength of 950 nm is 1% or less, preferably 0.5% or less, and more preferably 0.2% or less. The layer (D1) etc. that satisfies the characteristic (V) can block light in the near-infrared region with wavelengths of 900 to 1100 nm to a level where the near-infrared rays do not have any adverse effects.

[0184] Furthermore, when the layer (D1) etc. has a thickness of 300 μm or less, it may have, and preferably has, the following properties (VI) to (VIII) in the transmission spectrum when light is incident at an incident angle of 0° on the main surface of the layer (D1 etc.). These properties are indicators of the ability to block light in the infrared region, and may be important as evaluation indicators for the layer (D1 etc.).

[0185] Characteristics (VI): Transmittance at a wavelength of 800 nm is 3% or less Property (VII): Transmittance at a wavelength of 1000 nm is 0.5% or less Property (VIII): Transmittance at wavelength of 1100 nm is 0.5% or less

[0186] The layer (D1) etc. formed from the present composition 2 may have the following properties (IX) to (XIII) in the transmission spectrum when light is incident at an incident angle of 0° on the main surface (the surface with the largest area) of the layer (D1) etc., when the layer (D1) etc. has a thickness of 300 μm or less, and preferably has the following properties (IX) to (XIII). The layer (D1) and the like formed from the present composition 2 may further have the following properties (XIV) to (XVI), and preferably have the following properties (XIV) to (XVI). These properties (XIV) to (XVI) are indices that represent the ability to shield light in the infrared region, and may be considered important as evaluation indices for the layer (D1) and the like. Here, the characteristics relating to the transmission spectrum of the layer (D1) formed from the present composition 2 are evaluated based on the transmission spectrum standardized so that the transmittance at a wavelength of 850 nm is 1%. Specifically, the standardized transmission spectrum is obtained by the method described in "Measurement of transmission spectrum of layer - 2" in the following examples.

[0187] Property (IX): The average transmittance in the wavelength range of 460 to 580 nm is 80% or more, preferably 85% or more. An imaging device or the like having a layer (D1) or the like that satisfies the characteristic (IX) increases the luminous flux of light in the visible light range that passes through the layer (D1) or the like and reaches the imaging element or the like, and can easily form a brighter image.

[0188] Property (X): The average value of the transmittance in the wavelength range of 850 to 1100 nm is 3% or less, preferably 1.5% or less. The layer (D1) etc. that satisfies the characteristic (X) can sufficiently block light in the near-infrared region, and an imaging device etc. having the layer (D1) etc. can make the light that reaches the imaging element etc. close to the visual sensitivity of humans, who generally do not perceive light in the near-infrared region.

[0189] Property (XI): The third cutoff wavelength at which the transmittance is 50% is in the wavelength range of 690 to 750 nm, and the third cutoff wavelength is preferably in the range of 700 to 740 nm. The layer (D1) etc. that satisfies the property (XI) has excellent shielding properties for light in the near-infrared region, and an imaging device etc. having the layer (D1) etc. can make the light that reaches the imaging element etc. close to the visual sensitivity of humans, who generally do not perceive light in the near-infrared region. The absolute value of the difference between the third' cutoff wavelength and the first' cutoff wavelength is preferably 10 to 60 nm, more preferably 15 to 55 nm. Layers (D1) etc. in which the absolute value of the difference between the 3' cutoff wavelength and the 1' cutoff wavelength is within the above range do not undergo significant aggregation of compound (A) over time and have an excellent shelf life.

[0190] Property (XII): A fourth cutoff wavelength at which the transmittance is 50% is in the wavelength range of 325 to 385 nm. The fourth cutoff wavelength is preferably in the range of 335 to 375 nm, and more preferably in the range of 340 to 370 nm. The layer (D1) etc. that satisfies the characteristic (XII) has excellent blocking properties for light in the ultraviolet range, and an imaging device etc. having the layer (D1) etc. can make the light that reaches the imaging element etc. close to the visual sensitivity of humans, who generally do not perceive light in the ultraviolet range, and can also reduce the effects of color bleeding such as purple fringing that occurs when light that reaches the imaging element etc. contains light with short wavelengths.

[0191] Property (XIII): The transmittance at a wavelength of 950 nm is 3% or less, preferably 2% or less, and more preferably 1.5% or less. The layer (D1) etc. that satisfies the property (XIII) can block light in the near-infrared region with wavelengths of 900 to 1100 nm to a level where the near-infrared rays do not have any adverse effects.

[0192] Property (XIV): Transmittance at a wavelength of 800 nm is 6% or less Characteristics (XV): Transmittance at a wavelength of 1000 nm is 1.5% or less Property (XVI): Transmittance at wavelength of 1100 nm is 1.5% or less

[0193] <Method for forming layer (D1) etc.> The method for forming the layer (D1) etc. is not particularly limited, and they can be formed by any conventionally known method except for using the present composition.

[0194] Examples of methods for forming the single layer (D1) include melt molding, casting, extrusion, and calendering. Among these, when the layer (D1) is used for an optical component, the melt molding and casting methods are preferred in consideration of the smoothness, low haze, and mass productivity required for the optical component, as well as the thermal properties of the compound (A) contained in the composition.

[0195] Melt molding Specific examples of the melt molding include a method of melt-kneading the present composition to obtain pellets and then melt-molding the composition; a method of melt-molding the present composition; a method of removing the solvent from the present solvent-containing liquid composition to obtain pellets and then melt-molding the pellets, etc. Examples of the melt molding method include injection molding, melt extrusion molding, and blow molding.

[0196] ·Casting method In the casting method, for example, the liquid composition of the present invention is cast onto the main surface of a support such as a smooth glass plate or a metal belt using a dispenser, a die, or the like, and then dried to form a coating film, which is then peeled off from the support, thereby forming a layer (D1) or the like. If necessary, the peeled layer (D1) or the like may be post-cured.

[0197] The main surface of the support onto which the present composition is cast may be coated with, for example, a release promoter (e.g., a surface treatment agent containing a fluorine compound) to make it easier to release the resulting coating film from the support.

[0198] In order to form a layer (D1) or the like having a predetermined thickness, for example, a frame (frame) of any shape may be placed on the main surface of the support, and a predetermined amount of the present composition may be cast into the frame, thereby controlling the thickness of the layer (D1) or the like to be formed.

[0199] Furthermore, a method for forming the layer (D1) etc. suitable for mass production involves, for example, applying the present composition containing a solvent using a slit die or the like onto a support such as a smooth metal belt that is continuously moved by a plurality of rollers or the like, evaporating at least a portion of the solvent on the support, and drying and solidifying the applied composition to form a coating film, and then peeling the coating film from the support to form the layer (D1) etc. If necessary, the obtained layer (D1) etc. may be passed through, for example, an oven to nearly completely evaporate the solvent (post-cure). The obtained layer (D1) etc. may be stretched as necessary and may be wound up on a winding roller or the like.

[0200] Optical Filter The optical filter according to the present invention (hereinafter also referred to as "the present filter") is a filter having the layer (D1), and it is preferable that the present filter further has a dielectric multilayer film, since an optical filter having the desired optical properties can be easily obtained. Note that, hereinafter, layers (films) other than the dielectric multilayer film constituting the present filter will also be referred to as "substrate (i)". The filter may contain one layer (D1), or may contain two or more layers (D1) that may be the same or different.

[0201] In terms of enabling the effects of the present invention to be more effectively exhibited, the present filter is preferably a so-called near-infrared cut filter that transmits light in the visible light region and blocks light in the near-infrared region, or a so-called dual bandpass filter that transmits light in the visible light region and part of light in the near-infrared region and blocks light in the near-infrared region other than the part of light in the near-infrared region that is desired to be transmitted, and is more preferably a near-infrared cut filter.

[0202] When the present filter is used for applications in which it is mounted in an imaging device or a camera module, for example, a thinner filter is advantageous for reducing the profile of the imaging device or camera module. On the other hand, if the thickness of the present filter is excessively thin, for example, the rigidity and mechanical strength may be significantly reduced. Considering these points, the thickness of the present filter is preferably 60 to 300 μm, more preferably 70 to 280 μm, and even more preferably 80 to 250 μm.

[0203] <Base material (i)> The substrate (i) is not particularly limited as long as it has the layer (D1), and may be a single layer or a multilayer. The substrate (i) may also have one or more layers of at least one type selected from an overcoat layer and a functional film.

[0204] The substrate (i) is preferably a substrate (i-1) containing, as the layer (D1), a layer (D1-1) containing the compound (A), the polymer (B1), and the dye (C), or The substrate (i) is preferably a substrate (i-2) containing, as the layer (D1), a layer (D1-2) that does not contain the dye (C) and a layer (D2) that contains a dye (C) other than the compound (A) and does not contain the compound (A).

[0205] The substrate (i-1) may have two or more layers (D1-1), and may further have one or more layers of at least one type of layer selected from the layer (D1-2) and the layer (D2). The substrate (i-2) may have two or more layers (D1-2) or two or more layers (D2). The layers (D1-1) and (D1-2) are the same as the layers described in the section of the layer (D1), except that they may or may not contain the dye (C).

[0206] The substrate (i) may have a layer (D1) laminated on a glass support, and preferably has a layer (D2) laminated thereon. In such a substrate (i), the order in which the glass support, layer (D1), and layer (D2) are laminated is not particularly important, and each of the glass support, layer (D1), and layer (D2) may be two or more layers. The glass support is not particularly limited, but examples thereof include glass supports made of fluorophosphate glass, near-infrared absorbing glass (e.g., absorbing glass obtained by adding CuO or the like to phosphate glass), soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, sapphire glass, etc. The "phosphate glass" also includes silicophosphate glass, in which part of the glass skeleton is composed of SiO2.

[0207] The thickness of the substrate (i) can be appropriately selected depending on the desired application and is not particularly limited, but it is desirable to appropriately select the thickness so as to reduce the incidence angle dependency of the resulting optical filter, and it is preferably 20 to 300 μm, more preferably 35 to 280 μm, and particularly preferably 50 to 250 μm. When the thickness of the substrate (i) is within the above range, the optical filter using the substrate (i) can be made thinner and lighter, and can be suitably used for various applications such as solid-state imaging devices.

[0208] Although it depends on the application of the present filter, it is preferable that the substrate (i) satisfies the following (α) to (ε), where (α) to (ε) relate to the transmittance when measuring light incident from a direction of 0° to the main surface of the substrate (i).

[0209] (α): Within the wavelength range of 320 to 450 nm, preferably 330 to 435 nm, and more preferably 350 to 420 nm, there exists a wavelength at which the transmittance ranges from less than 50% to more than 50%.

[0210] (β): The average transmittance in the wavelength range of 430 to 570 nm (visible region) is 70% or more, preferably 72.5% or more, and more preferably 75% or more. Since a higher average transmittance is preferable, the upper limit is not particularly limited and may be 100%.

[0211] (γ): Within the wavelength range of 600 to 700 nm, there exists a wavelength (IR50) at which the transmittance is between more than 50% and less than 50%. IR50 is preferably 610 nm or more, more preferably 615 nm or more, even more preferably 620 nm or more, particularly preferably 630 nm or more, preferably less than 700 nm, more preferably 690 nm or less, even more preferably less than 690 nm, particularly preferably 685 nm or less. When such wavelengths exist, it is possible to easily obtain a substrate (i) that combines broad and steep near-infrared absorption with high visible light transmittance, and it is possible to selectively and efficiently cut out unnecessary near-infrared light. In addition, when a dielectric multilayer film is formed on the substrate (i), it is possible to reduce the incidence angle dependency of the optical properties in the visible light wavelength to near-infrared wavelength region, and it is possible to easily obtain good camera images with reduced ghosts and color shading.

[0212] (δ): The average transmittance at wavelengths of 700 to 800 nm is 1% or less, preferably 0.75% or less, and more preferably 0.5% or less.

[0213] (ε): At wavelengths of 800 to 1100 nm, the maximum transmittance is 40% or less, preferably 35% or less, and more preferably 30% or less.

[0214] [Layer (D2)] The layer (D2) is not particularly limited as long as it contains the dye (C) and does not contain the compound (A). However, it is preferable that the layer (D2) is formed from a composition (D2) containing the dye (C) and at least one selected from a polymer (B2-1) and a curable compound (B2-2) that is cured by light or heat. The present filter having layer (D2) can achieve a steeper cutoff characteristic due to the absorption characteristics of dye (C) than the present filter containing compound (A) but not dye (C), and the spectral characteristics tend to change less depending on the angle of incidence of light incident on the present filter.

[0215] When the layer (D2) is used, for example, in an application in which it is mounted in an imaging device or a camera module, a thinner layer (D2) is advantageous for reducing the height of the imaging device or camera module. On the other hand, if the layer (D2) is excessively thin, the concentration of the dye (C) in the layer (D2) may have to be increased to achieve the target spectral characteristics, which may result in problems such as precipitation of the dye (C) or storage stability. Considering these, the thickness of the layer (D2) is preferably 1 to 120 μm, more preferably 2 to 110 μm, and even more preferably 3 to 100 μm.

[0216] [Dye (C)] The dye (C) is the same as the dye (C) described in the section on the present composition. The dye (C) used in the composition (D2) may be one type or two or more types.

[0217] The content of the dye (C) in the composition (D2) is preferably 0.05 to 10 parts by mass, more preferably 0.75 to 5 parts by mass, and even more preferably 0.1 to 2 parts by mass, per 100 parts by mass of the total of the polymer (B2-1) and the curable compound (B2-2). When the content of the dye (C) is within the above range, the light absorption properties of the dye (C) are fully exhibited, and the present filter having the formed layer (D2) has the desired optical properties.

[0218] [Polymer (B2-1)] The polymer (B2-1) is not particularly limited as long as it is a polymer other than the curable compound (B2-2) described below. When the polymer (B2-1) is used in the composition (D2), the polymer (B2-1) used may be one type or two or more types.

[0219] Examples of the polymer (B2-1) include polymers having a glass transition temperature (Tg) of preferably 110 to 380°C, more preferably 110 to 370°C, and particularly preferably 120 to 360°C, from the viewpoints of ensuring thermal stability and moldability of the layer (D2) and easily obtaining a layer capable of forming a dielectric multilayer film by high-temperature deposition at a deposition temperature of about 100°C or higher. Furthermore, it is particularly preferable for the polymer (B2-1) to have a Tg of 140° C. or higher, since this allows the dielectric multilayer film to be formed by vapor deposition at a higher temperature.

[0220] As the polymer (B2-1), it is desirable to use a polymer that has a total light transmittance (JIS K 7375:2008) of preferably 75 to 95%, more preferably 78 to 95%, and particularly preferably 80 to 95% when formed into a 0.1 mm thick plate made of the polymer. By using the polymer (B2-1) having a total light transmittance within the above range, a layer (D2) or an optical filter having excellent transparency can be easily obtained.

[0221] The weight average molecular weight (Mw) of the polymer (B2-1) measured by gel permeation chromatography (GPC) in terms of polystyrene is preferably 15,000 to 350,000, more preferably 30,000 to 250,000, and the number average molecular weight (Mn) is preferably 10,000 to 150,000, more preferably 20,000 to 100,000.

[0222] Examples of the polymer (B2-1) include cyclic (poly)olefin polymers, polyether polymers, polyimide polymers, polyester polymers, polycarbonate polymers, polyamide (aramid) polymers, polyarylate polymers, polysulfone polymers, polyethersulfone polymers, polyparaphenylene polymers, polyamideimide polymers, polyethylene naphthalate (PEN) polymers, fluorinated aromatic polymer polymers, (modified) acrylic polymers, and epoxy polymers. Specific examples of these polymers include resins described in WO 2019 / 168090. As the polymer (B2-1), the polymer (B1) may be used.

[0223] When the composition (D2) contains the polymer (B2-1), the content thereof is preferably 5 to 30% by mass, more preferably 10 to 25% by mass, from the viewpoint of the viscosity (coatability) of the composition (D2) and the like.

[0224] [Curable compound (B2-2)] The curable compound (B2-2) is not particularly limited as long as it is a compound that is cured by light or heat. When the compound (B2-2) is used in the composition (D2), the compound (B2-2) used may be one type or two or more types.

[0225] Examples of the compound (B2-2) include epoxy compounds, allyl ester curable compounds, silsesquioxane photocurable compounds, acrylic photocurable compounds, acrylic thermosetting compounds, and vinyl photocurable compounds. Among these, epoxy compounds, silsesquioxane photocurable compounds, acrylic photocurable compounds, and acrylic thermosetting compounds are preferred.

[0226] The compound (B2-2) is preferably a compound such that the total light transmittance (JIS K 7375:2008) of a 0.1 mm thick layer (D2) obtained from a composition (D2) containing the compound (B2-2) is preferably 75 to 95%, more preferably 78 to 95%, and particularly preferably 80 to 95%.

[0227] As the compound (B2-2), a compound capable of forming a layer (D2) having a glass transition temperature (Tg) of preferably 110 to 380°C, more preferably 110 to 370°C, and even more preferably 120 to 360°C is desirable, for example, from the viewpoints of ensuring thermal stability and formability of the layer (D2) and easily obtaining a layer capable of forming a dielectric multilayer film by high-temperature deposition performed at a deposition temperature of about 100°C or higher. Furthermore, it is more preferable to use a compound capable of forming a layer (D2) having a Tg of 140° C. or higher, since this makes it possible to obtain a layer (D2) that can be molded or treated at high temperatures.

[0228] (epoxy compounds) Examples of the epoxy compounds include unsaturated compounds having an oxiranyl group, such as (meth)acrylic acid oxiranyl (cyclo)alkyl esters, α-alkylacrylic acid oxiranyl (cyclo)alkyl esters, and glycidyl ether compounds having an unsaturated bond; and unsaturated compounds having an oxetanyl group, such as (meth)acrylic acid esters having an oxetanyl group.

[0229] Examples of (meth)acrylic acid oxiranyl(cyclo)alkyl esters include glycidyl (meth)acrylate, 2-methylglycidyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate glycidyl ether, 3,4-epoxybutyl (meth)acrylate, 6,7-epoxyheptyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate, and 3,4-epoxycyclohexylmethyl (meth)acrylate. Examples of the α-alkylacrylic acid oxiranyl(cyclo)alkyl ester include glycidyl α-ethylacrylate, glycidyl α-n-propylacrylate, glycidyl α-n-butylacrylate, 6,7-epoxyheptyl α-ethylacrylate, and 3,4-epoxycyclohexyl α-ethylacrylate. Examples of the glycidyl ether compound having an unsaturated bond include o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, and p-vinylbenzyl glycidyl ether. Examples of (meth)acrylic acid esters having an oxetanyl group include 3-((meth)acryloyloxymethyl)oxetane, 3-((meth)acryloyloxymethyl)-3-ethyloxetane, 3-((meth)acryloyloxymethyl)-2-methyloxetane, 3-((meth)acryloyloxyethyl)-3-ethyloxetane, 2-ethyl-3-((meth)acryloyloxyethyl)oxetane, 3-methyl-3-(meth)acryloyloxymethyloxetane, and 3-ethyl-3-(meth)acryloyloxymethyloxetane.

[0230] Among these, glycidyl methacrylate, 2-methylglycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, 3-methacryloyloxymethyl-3-ethyloxetane, 3-methyl-3-methacryloyloxymethyloxetane, and 3-ethyl-3-methacryloyloxymethyloxetane are particularly preferred in terms of polymerizability, etc.

[0231] (Silsesquioxane-based photocurable compound) The silsesquioxane-based photocurable compound is preferably a compound represented by the following formula (1). [RSiO 3 / 2 ] n (1) (In formula (1), R is an organic functional group having one of a (meth)acryloyl group, a glycidyl group, an oxetanyl group, and a vinyl group, and n is 8, 10, 12, or 14.)

[0232] Furthermore, as the silsesquioxane-based photocurable compound, a compound obtained by hydrolyzing a silicon compound represented by the following formula (2) in the presence of an organic polar solvent and a basic catalyst while simultaneously condensing a portion of the compound, and then further re-condensing the obtained hydrolysis product in the presence of a non-polar solvent and a basic catalyst is also preferred. RSiX3(2) (In formula (2), R is an organic functional group having one of a (meth)acryloyl group, a glycidyl group, an oxetanyl group, and a vinyl group, and X is a hydrolyzable group.)

[0233] Examples of the organic functional group having any one of a (meth)acryloyl group, a glycidyl group, an oxetanyl group, and a vinyl group in formulas (1) and (2) include organic functional groups represented by the following formulas (3), (4), (5), and (6).

[0234] [ka] (In formulas (3) and (4), m is an integer of 1 to 3, and in formula (3), R1 is a hydrogen atom or a methyl group.)

[0235] [ka] (In formula (6), R 5 , R 6 , R 7 , R 8 and R 9 are each independently a hydrogen atom, a fluorine atom, an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a perfluoroalkyl group having 1 to 4 carbon atoms, and n is an integer of 1 to 6.

[0236] (acrylic photocurable compound) Examples of the acrylic photocurable compound include trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, dicyclopentanyl (meth)acrylate, phenoxyethyl (meth)acrylate, glycerin tri(meth)acrylate, tris(2-hydroxyethyl)isocyanurate tri(meth)acrylate, ethylene glycol di(meth)acrylate, 1,3-butadiene Examples of the hydroxyl group-containing (meth)acrylates include hexanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, and bis(2-hydroxyethyl)isocyanurate di(meth)acrylate; poly(meth)acrylates which are ethylene oxide or propylene oxide adducts to the hydroxyl groups of these; oligoester (meth)acrylates having two or more (meth)acryloyl groups in the molecule; oligoether (meth)acrylates; oligourethane (meth)acrylates; and oligoepoxy (meth)acrylates.

[0237] Among these, tricyclodecane dimethanol di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, pentaerythritol tetra(meth)acrylate, and ditrimethylolpropane tetra(meth)acrylate are preferred.

[0238] Commercially available acrylic photocurable compounds include, for example, Aronix, manufactured by Toagosei Co., Ltd. M-400, M-408, M-450, M-305, M-309, M-310, M-315, M-320, M-350, M-360, M-20 8, M-210, M-215, M-220, M-225, M-233, M-240, M-245, M-260, M-270, M-1100, M- KAYARAD manufactured by Nippon Kayaku Co., Ltd. D-310, D-330, DPHA, DPCA-20, DPCA-30, DPCA-60, DPCA-120, DN-0075, DN-2475, SR-295, SR-355, SR-399E, SR-494, SR-9041, SR-368, SR-41 5, SR-444, SR-454, SR-492, SR-499, SR-502, SR-9020, SR-9035, SR-111, SR-212, SR-213, SR-230, SR-259, SR-268, SR-272, SR-344, SR-349 , SR-601, SR-602, SR-610, SR-9003, PET-30, T-1420, GPO-303, TC-120S, HDDA, NPGDA, TPGDA, PEG400DA, MANDA, HX-220, HX-620, R-551, R-7 12, R-167, R-526, R-551, R-712, R-604, R-684, TMPTA, THE-330, TPA-320, TPA-330, KS-HDDA, KS-TPGDA, KS-TMPTA; Light acrylate manufactured by Kyoeisha Chemical Co., Ltd. PE-4A, DPE-6A, DTMP-4A; FA-511AS, FA-512AS manufactured by Resonac Co., Ltd.; and NK Ester A-TMM-3LM-N, A-DPH manufactured by Shin-Nakamura Chemical Co., Ltd.

[0239] When an acrylic photocurable compound is used as the compound (B2-2), a photopolymerization initiator is usually used together with the acrylic photocurable compound. When an acrylic photocurable compound is used as the compound (B2-2), a composition (D2) containing an acrylic photocurable compound and a photopolymerization initiator may be used, or a composition (D2) containing a cured product obtained by reacting and curing an acrylic photocurable compound with a photopolymerization initiator may be used.

[0240] The photopolymerization initiator is preferably a compound that can be decomposed by light irradiation to generate radicals and initiate polymerization of an acrylic photocurable compound, and specific examples thereof include acetophenone, acetophenone benzyl ketal, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1,2-diphenylethan-1-one, xanthone, fluorenone, benzaldehyde, fluorene, anthraquinone, triphenylamine, carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4,4'-dimethoxybenzophenone, 4,4'-diaminobenzophenone, benzoin propyl ether, benzoin ethyl ether, benzil dimethyl ketal, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropional, and the like. propan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, thioxanthone, diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1,4-(2-hydroxyethoxy)phenyl-(2-hydroxy-2-propyl)ketone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis-(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, oligo(2-hydroxy-2-methyl-1-(4-(1-methylvinyl)phenyl)propanone).

[0241] Examples of commercially available photopolymerization initiators include Irgacure 184, 369, 651, 500, 819, 907, 784, 2959, CGI1700, CGI1750, CGI1850, CG24-61, Darocur 1116, 1173, and Lucirin TPO, all manufactured by BASF; Ubecryl P36, all manufactured by UCB; and Ezacure KIP150, KIP65LT, KIP100F, KT37, KT55, KTO46, and KIP75 / B, all manufactured by Fratelli Lamberti.

[0242] The amount of the photopolymerization initiator used is preferably 0.5 to 15% by mass, and more preferably 1 to 8% by mass, relative to 100 parts by mass of the acrylic photocurable compound, in order to be able to sufficiently cure the acrylic photocurable compound.

[0243] (Acrylic thermosetting compound) The acrylic thermosetting compound is not particularly limited, but is preferably a copolymer (a12) obtained by using at least one compound (a1) selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides and at least one compound (a2) selected from the group consisting of oxiranyl-group-containing unsaturated compounds and oxetanyl-group-containing unsaturated compounds. Such copolymer (a12) can be produced by radical copolymerization of an unsaturated mixture containing compounds (a1) and (a2) in a solvent in the presence of a polymerization initiator.

[0244] Compound (a1) is a radically polymerizable unsaturated carboxylic acid and / or unsaturated carboxylic acid anhydride, and examples thereof include monocarboxylic acids, dicarboxylic acids, anhydrides of dicarboxylic acids, mono[(meth)acryloyloxyalkyl]esters of polycarboxylic acids, mono(meth)acrylates of polymers having carboxy groups and hydroxyl groups at both ends, polycyclic compounds having carboxy groups, and anhydrides thereof.

[0245] Examples of unsaturated compounds having an oxiranyl group include glycidyl (meth)acrylate, α-ethyl glycidyl (meth)acrylate, α-n-propyl glycidyl (meth)acrylate, α-n-butyl glycidyl (meth)acrylate, 3,4-epoxybutyl (meth)acrylate, 6,7-epoxyheptyl (meth)acrylate, α-ethyl-6,7-epoxyheptyl (meth)acrylate, 3,4-epoxycyclohexyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, and p-vinylbenzyl glycidyl ether. Among these, glycidyl methacrylate, 6,7-epoxyheptyl methacrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, 3,4-epoxycyclohexyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, and the like are preferred from the viewpoints of copolymerization reactivity and enhancing the heat resistance and chemical resistance of the resulting layer (D2). Examples of the oxetanyl group-containing unsaturated compound include compounds in which the oxiranyl group of the unsaturated compound having an oxiranyl group is substituted with an oxetanyl group.

[0246] In copolymer (a12), the ratio of the mass of the structural units derived from compound (a2) to the mass of the structural units derived from compound (a1) ((a2) / (a1)) is preferably 1 or more, more preferably 1.1 or more, and even more preferably 1.2 or more. When (a2) / (a1) is within the above range, it is possible to easily obtain a composition (D2) that has high low-temperature storage stability, can be stored for a long period of time, and is excellent in heat resistance, chemical resistance, and the like.

[0247] The content of the structural units derived from compound (a2) is preferably 10% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on 100% by mass of all structural units constituting copolymer (a12). When the content of the structural unit is within the above range, a composition (D2) that has high low-temperature storage stability, can be stored for a long period of time, and is excellent in heat resistance, chemical resistance, and the like can be easily obtained.

[0248] The copolymer (a12) may contain, in addition to the compounds (a1) and (a2), a structural unit derived from another unsaturated compound (a3) ​​copolymerizable therewith.

[0249] The compound (a3) ​​is not particularly limited as long as it is an unsaturated compound having radical polymerizability, and examples thereof include (meth)acrylic acid alkyl esters, (meth)acrylic acid cyclic alkyl esters, (meth)acrylic acid aryl esters, unsaturated dicarboxylic acid diesters, (meth)acrylic acid esters having a hydroxyl group, bicyclo unsaturated compounds, maleimide compounds, unsaturated aromatic compounds, conjugated dienes, unsaturated compounds having at least one skeleton selected from a tetrahydrofuran skeleton, a furan skeleton, a tetrahydropyran skeleton, a pyran skeleton, and a (poly)alkylene glycol skeleton, and unsaturated compounds having a phenolic hydroxyl group.

[0250] The content of the structural units derived from compound (a1) is preferably 5 to 40% by mass, and more preferably 5 to 25% by mass, relative to 100% by mass of the total of the structural units derived from compounds (a1), (a2), and (a3), in order to facilitate the formation of a layer (D2) that has excellent heat resistance and chemical resistance.

[0251] The content of the structural units derived from compound (a2) is preferably 10 to 80% by mass, and more preferably 20 to 60% by mass, relative to 100% by mass of the total of the structural units derived from compounds (a1), (a2), and (a3), in order to facilitate the formation of a layer (D2) that has excellent heat resistance and chemical resistance.

[0252] When an unsaturated compound having an alicyclic structure is used as compound (a3), the content of the structural units derived from the unsaturated compound is preferably 10 to 80% by mass, and more preferably 20 to 60% by mass, relative to 100% by mass of the total of the structural units derived from compounds (a1), (a2), and (a3), in order to facilitate the formation of a layer (D2) having superior heat resistance.

[0253] The weight average molecular weight Mw of the acrylic thermosetting compound in terms of polystyrene is preferably 2×10 3 ~1×10 5 , more preferably 5 × 10 3 ~5×10 4 is. The molecular weight distribution (Mw / Mn) of the acrylic thermosetting compound is preferably 5.0 or less, and more preferably 3.0 or less.

[0254] The acrylic thermosetting compound can be synthesized, for example, by polymerizing the compound (a1), the compound (a2), and the compound (a3) ​​in a suitable solvent in the presence of a radical polymerization initiator.

[0255] [Additives] The composition (D2) may contain additives other than the dye (C), polymer (B2-1) and compound (B2-2) as long as the effects of the present invention are not impaired. Examples of the additives include the ultraviolet absorbing compound (U), solvents, light stabilizers, silane coupling agents, antioxidants, adhesion promoters, fluorescence quenchers, plasticizers, and fillers. When the layer (D2) is formed from the composition (D2) by cast molding or the like, additives such as a leveling agent, an antifoaming agent, and a release promoter can be used to facilitate the formation of the layer (D2). These additives may be used alone or in combination of two or more.

[0256] These additives may be mixed with the dye (C), the polymer (B2-1) and the compound (B2-2) when preparing the composition (D2), or may be added when synthesizing the polymer (B2-1) or the compound (B2-2).

[0257] (solvent) The composition (D2) is preferably prepared by mixing the dye (C) with at least one selected from the polymer (B2-1) and the compound (B2-2) in one or more solvents.

[0258] Examples of the solvent include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, and cyclohexanone; Esters such as ethyl acetate and butyl acetate; Alcohols such as isopropyl alcohol and ethyl alcohol; Aromatic hydrocarbons such as benzene, toluene, xylene, methoxybenzene, and 1,2-dimethoxybenzene; phenols such as phenol and parachlorophenol; Halogenated hydrocarbons such as chloroform, dichloromethane, dichloroethane, tetrachloroethane, trichloroethylene, tetrachloroethylene, and chlorobenzene; diethylene glycol alkyl ethers such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene glycol ethyl methyl ether; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, and propylene glycol mono-n-butyl ether; propylene glycol monoalkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol mono-n-propyl ether acetate, and propylene glycol mono-n-butyl ether acetate; Methyl 2-methoxypropionate, Ethyl 2-methoxypropionate, n-Propyl 2-methoxypropionate, n-Butyl 2-methoxypropionate, Methyl 2-ethoxypropionate, Ethyl 2-ethoxypropionate, n-Propyl 2-ethoxypropionate, n-Butyl 2-ethoxypropionate, Methyl 2-n-propoxypropionate, Ethyl 2-n-propoxypropionate, n-Propyl 2-n-propoxypropionate, n-Butyl 2-n-propoxypropionate, Methyl 2-n-butoxypropionate, Ethyl 2-n-butoxypropionate, n-Propyl 2-n-butoxypropionate, n-Butyl 2-n-butoxypropionate, 3-Methoxypropionic acid alkyl alkoxypropionates such as methyl, ethyl 3-methoxypropionate, n-propyl 3-methoxypropionate, n-butyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, n-propyl 3-ethoxypropionate, n-butyl 3-ethoxypropionate, methyl 3-n-propoxypropionate, ethyl 3-n-propoxypropionate, n-propyl 3-n-propoxypropionate, n-butyl 3-n-propoxypropionate, methyl 3-n-butoxypropionate, ethyl 3-n-butoxypropionate, n-propyl 3-n-butoxypropionate, and n-butyl 3-n-butoxypropionate;

[0259] When an acrylic photocurable compound is used as composition (D2), it is preferable to use a solvent so that the viscosity of composition (D2) is usually 0.1 to 50,000 mPa·sec / 25°C, preferably 0.5 to 10,000 mPa·sec / 25°C.

[0260] (Leveling agent) The leveling agent is not particularly limited, but examples thereof include silicone-based and fluorine-based leveling agents. When a leveling agent is used, the leveling agent used may be one type or two or more types. Examples of silicone leveling agents include polydimethylsiloxane, polymethylalkylsiloxane, polyether-modified polydimethylsiloxane, and polysiloxane having a (meth)acrylic group. When a leveling agent is used, the amount used is preferably 10% by mass or less, and more preferably 3% by mass or less, based on 100% by mass of the solid content of the composition (D2).

[0261] (antioxidant) Examples of the antioxidant include hindered phenol-based, sulfur-based, and phosphorus-based antioxidants. When an antioxidant is used, the antioxidant may be used alone or in combination of two or more kinds. When an antioxidant is used, the amount used is preferably 10% by mass or less, more preferably 3% by mass or less, based on 100% by mass of the solid content of the composition (D2).

[0262] [Method for forming layer (D2)] The method for forming the layer (D2) is not particularly limited, and the layer (D2) can be formed by a conventionally known method except for using the composition (D2). When a polymer such as the polymer (B2-1) is used as the composition (D2), the layer (D2) can be formed by the same method as the method for forming the layer (D1).

[0263] When a photocurable compound such as the acrylic photocurable compound is used as the composition (D2), the layer (D2) can be formed by curing the composition (D2) by irradiating it with light, preferably ultraviolet light or an electron beam. For example, when ultraviolet light is irradiated, the irradiation dose of ultraviolet light is preferably 0.01 to 10 J / cm 2 , more preferably 0.1 to 2 J / cm 2In addition, for example, when irradiating with an electron beam, the irradiation conditions of the electron beam are preferably an acceleration voltage of 10 to 300 kV and an electron density of 0.02 to 0.30 mA / cm. 2 The electron beam irradiation dose is preferably 1 to 10 Mrad. When a photocurable composition (D2) containing a solvent is used, it is preferable to dry the solvent (volatile component) at, for example, 0 to 200° C., and then irradiate with light.

[0264] [Method for producing substrate (i)] The method for producing the substrate (i) is not particularly limited, and the substrate (i) can be produced by a conventionally known method. When the substrate (i) is a single layer of the layer (D1), the substrate (i) can be produced by the same method as the method for forming the layer (D1). When the substrate (i) has, for example, layers (D1) and (D2), it can be produced by a method including the following lamination methods a to c.

[0265] Lamination method a A method in which the layer (D1) and the layer (D2) are formed independently in advance by the same method as above, and the formed layer (D1) and layer (D2) are bonded directly to each other or to each other via an adhesive layer. In this case, the layer (D2) is preferably a layer formed from a composition (D2) using the polymer (B2-1). Examples of the direct lamination method include a method in which a solvent that dissolves both the polymers contained in the layer (D1) and the layer (D2) is applied to the lamination surface of the layer (D1) and / or the layer (D2), and the two layers are laminated together and dried. The adhesive layer is not particularly limited as long as it can bond the layer (D1) and the layer (D2), and examples thereof include a thermoplastic resin layer, a photocurable resin layer, and a thermosetting resin layer. The following adhesive layers also include similar layers. Among these, the method of bonding via a thermoplastic resin layer is particularly preferred because it results in less cure shrinkage during lamination, etc. When bonding via a thermoplastic resin layer, for example, a method can be used in which a resin solution obtained by dissolving a thermoplastic resin in a solvent that is soluble in both the polymers contained in layer (D1) and layer (D2) is applied to layer (D1) and / or layer (D2), and the two layers are laminated together and dried.

[0266] ·Lamination method b A method in which a layer (D1) is formed in advance by the same method as above, and then a composition (D2) is applied onto the formed layer (D1), and the applied composition (D2) is heated to form a layer (D2). In this case, the layer (D2) is preferably a layer formed from a composition (D2) using a thermosetting compound such as an acrylic thermosetting compound. In this method 2, an intermediate layer may be provided on the layer (D1) before applying the layer (D2), and the surface of the layer (D1) may be subjected to a desired surface treatment (e.g., a surface treatment such as a corona treatment or a plasma treatment).

[0267] The coating method is not particularly limited, and any known method can be used, such as spraying, roll coating, rotary coating (spin coating), slit die coating (slit coating), bar coating, and printing (e.g., inkjet printing). Similar methods can also be used for the following coating methods.

[0268] The heating conditions for applying heat may be appropriately set depending on the composition (D2) and layer (D1) used, and examples include heating at a temperature of 120 to 200° C. for 5 minutes to 1 hour.

[0269] Examples of the intermediate layer include a thermoplastic resin layer, a photocurable resin layer, and a thermosetting resin layer. The following intermediate layers also include similar layers.

[0270] ·Lamination method c A method in which a layer (D1) is formed in advance by the same method as above, and then a composition (D2) is applied onto the formed layer (D1), and the applied composition (D2) is irradiated with light to form a layer (D2). In this case, the layer (D2) is preferably a layer formed from a composition (D2) using a photocurable compound such as an acrylic photocurable compound. In this method 2, an intermediate layer may be provided on the layer (D1) before applying the layer (D2), and the surface of the layer (D1) may be subjected to a desired surface treatment.

[0271] The irradiation conditions for the light irradiation may be, for example, the same as the conditions for the ultraviolet ray or electron beam irradiation described in the section on the method for forming the layer (D2).

[0272] In the lamination methods a to c, the layer (D1) and / or the layer (D2) may be two or more layers. An adhesive layer or an intermediate layer may be provided between two or more layers (D1) or between two or more layers (D2) in the same manner as above. In addition, in lamination method b or c, the order of forming layer (D1) and layer (D2) may be reversed, that is, layer (D2) may be formed first, and then layer (D1) may be formed on the formed layer (D2).

[0273] [Overcoat layer and functional film] The substrate (i) may have an overcoat layer or a functional film (for example, an anti-reflection film, a hard coat film, or an anti-static film) within the range that does not impair the effects of the present invention.

[0274] The thickness of the overcoat layer or functional film is preferably 0.1 to 20 μm, more preferably 0.5 to 10 μm, and particularly preferably 0.7 to 5 μm.

[0275] The material for forming the overcoat layer or functional film may be a composition containing, as a main component, the polymer used in the layer (D1) or layer (D2), provided that the overcoat layer or functional film does not contain the compound (A) or the dye (C). The overcoat layer or functional film may be formed by laminating as in the lamination method a, or by coating as in the lamination method b or c.

[0276] The method for producing the substrate (i) having an overcoat layer or a functional film is not particularly limited, and the substrate can be produced by a conventionally known method. For example, a method in which at least one coating agent selected from an antireflection agent, an overcoat agent, an intermediate layer agent, an antistatic agent, etc. is applied to an adherend on which the overcoat layer or functional film is to be formed using a bar coater or the like, and then cured by ultraviolet irradiation or the like can be mentioned. Before the application, the adherend may be subjected to a surface treatment such as a corona treatment or a plasma treatment in order to improve the adhesion of the overcoat layer or functional film to be formed.

[0277] Examples of the coating agent include coating agents containing ultraviolet (UV) / electron beam (EB) curable compounds and thermosetting compounds. Specific examples of these compounds include vinyl-based, urethane-based, urethane acrylate-based, acrylate-based, epoxy-based, and epoxy acrylate-based compounds.

[0278] The coating agent may also contain a polymerization initiator. As the polymerization initiator, a known photopolymerization initiator or thermal polymerization initiator can be used, or a photopolymerization initiator and a thermal polymerization initiator can be used in combination. One type of polymerization initiator may be used, or two or more types may be used. The blending ratio of the polymerization initiator is preferably 0.1 to 10 mass%, more preferably 0.5 to 10 mass%, and even more preferably 1 to 5 mass%, when the total amount of the coating agent is taken as 100 mass%. When the blending ratio of the polymerization initiator is within this range, a coating agent with excellent curing properties and ease of handling can be easily obtained, and an overcoat layer or functional film with the desired hardness can be easily obtained.

[0279] Furthermore, an organic solvent may be added to the coating agent, and known solvents can be used as the organic solvent. Specific examples of the organic solvent include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; esters such as ethyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate; ethers such as ethylene glycol monomethyl ether and diethylene glycol monobutyl ether; aromatic hydrocarbons such as benzene, toluene, and xylene; and amides such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone. These organic solvents may be used alone or in combination of two or more.

[0280] [Dielectric multilayer film] The dielectric multilayer film may be a laminate in which high refractive index material layers and low refractive index material layers are alternately stacked. Although it depends on the application of the present filter, when the present filter is used as a filter that blocks at least a part of near-infrared rays, the dielectric multilayer film is preferably a laminate capable of reflecting near-infrared rays.

[0281] The dielectric multilayer film may be provided on one side or both sides of the substrate (i). Providing a dielectric multilayer film on one side of the substrate (i) is advantageous in terms of production cost and ease of production. Furthermore, providing a dielectric multilayer film on both sides of the substrate (i) makes it possible to easily obtain an optical filter that has high strength and is resistant to warping and twisting. When using this filter for solid-state imaging devices, etc., a filter with little warping and twisting is preferred, and therefore it is preferable to provide a dielectric multilayer film on both sides of the substrate (i).

[0282] The high refractive index material layer can be made of a material having a refractive index of 1.7 or more, and typically has a refractive index of 1.7 to 2.5. Examples of such materials include those containing titanium oxide, zirconium oxide, tantalum pentoxide, niobium pentoxide, lanthanum oxide, yttrium oxide, zinc oxide, zinc sulfide, indium oxide, or the like as the main component, with a small amount of tin oxide and / or cerium oxide (for example, 0 to 10% by mass of the main component).

[0283] The low refractive index material layer can be made of a material having a refractive index of 1.6 or less, and typically has a refractive index of 1.2 to 1.6, such as silica, alumina, lanthanum fluoride, magnesium fluoride, and sodium aluminum hexafluoride.

[0284] The method for laminating the high refractive index material layers and the low refractive index material layers is not particularly limited as long as a dielectric multilayer film is formed by laminating these material layers. For example, a dielectric multilayer film in which high refractive index material layers and low refractive index material layers are alternately laminated can be formed directly on the substrate (i) by a CVD method, a sputtering method, a vacuum deposition method, an ion-assisted deposition method, an ion plating method, or the like.

[0285] When the dielectric multilayer film is designed to reflect near-infrared rays, the thickness of each of the high-refractive index material layers and the low-refractive index material layers is preferably 0.1λ to 0.5λ, where λ (nm) is the wavelength of the near-infrared rays to be blocked. The value of λ (nm) is, for example, 700 to 1400 nm, preferably 750 to 1300 nm. When the thickness is within this range, the optical film thickness (nd), calculated by multiplying the refractive index (n) by the film thickness (d) (n × d) by λ / 4, is approximately the same as the thickness of each of the high-refractive index material layers and the low-refractive index material layers. This tends to facilitate control over the blocking and transmission of specific wavelengths based on the relationship between the optical properties of reflection and refraction.

[0286] The total number of high refractive index material layers and low refractive index material layers in the dielectric multilayer film is preferably 6 to 70 layers for the entire filter, and more preferably 10 to 60. When the thickness of each layer, the thickness of the dielectric multilayer film as the entire filter, and the total number of layers are within the above ranges, sufficient manufacturing margins can be ensured, and warping of the filter and cracks in the dielectric multilayer film can be reduced.

[0287] By appropriately selecting the types of materials constituting the high refractive index material layer and the low refractive index material layer, the thickness of each of the high refractive index material layer and the low refractive index material layer, the order of lamination, and the number of laminations in accordance with the absorption characteristics of the substrate (i), it is possible to easily obtain a filter that ensures sufficient transmittance in the visible light region, has sufficient light-blocking properties in the near-infrared region, and has reduced reflectance when near-infrared light is incident from an oblique direction.

[0288] <Uses of this filter> The present filter has a high visible light transmittance and a low near-infrared transmittance, and also has excellent durability and flex resistance even in a high-temperature, high-humidity environment, because it has the layer (D1).

[0289] By using this filter, it is possible to obtain good camera images with good RGB balance and reduced ghosting and color shading. Therefore, this filter is useful for correcting the visibility of solid-state imaging elements such as CCD and CMOS image sensors in camera modules. This filter is particularly useful for digital still cameras, smartphone cameras, mobile phone cameras, digital video cameras, wearable device cameras, PC cameras, surveillance cameras, automotive cameras, televisions, car navigation systems, personal digital assistants, video game consoles, portable game consoles, fingerprint authentication systems, digital music players, etc. Furthermore, this filter is also useful as a heat-blocking filter attached to glass panels in automobiles, buildings, etc.

[0290] <Optical element, solid-state imaging device, and camera module> The optical element, solid-state imaging device and camera module according to the present invention are not particularly limited as long as they include the present filter, and may have any conventionally known configuration. A suitable example of the solid-state imaging device is a camera module. Here, the solid-state imaging device and camera module are image sensors equipped with solid-state imaging elements such as CCD or CMOS image sensors, and can be used specifically for applications such as digital still cameras, cameras for smartphones, cameras for mobile phones, cameras for wearable devices, and digital video cameras.

[0291] The optical element, solid-state imaging device, and camera module may be configured with a lens as shown in FIG. 1, or may be configured without a lens as shown in FIG. An example of the arrangement of components when this filter is used in an optical element, solid-state imaging device, or module is shown in Figure 1. In Figure 1, this filter 1 is configured together with a lens 32 and an imaging element (image sensor) 24. The optical filter 1 may be located in front of the lens 32 (on the opposite side of the lens 32 from the imaging element 24) as shown in Figure 1(A), or behind the lens 32 (on the imaging element 24 side of the lens 32) as shown in Figure 1(B). Furthermore, this filter may be used in a lensless solid-state imaging device using an optical element 33 that functions as a lens, such as a Fresnel zone plate, a Fresnel lens, or a metalens, as shown in FIG. 2(A). [Example]

[0292] The present invention will be described in more detail below based on examples, but the present invention is not limited to these examples in any way.

[0293] (Measurement of weight average molecular weight (Mw) and number average molecular weight (Mn)) Measurement was carried out using gel permeation chromatography (GPC) (manufactured by Tosoh Corporation, trade name: HLC-8320-GPC) under the following conditions. Columns: 2 G2000HXL, 1 G3000HXL, 1 G4000HXL Eluent: tetrahydrofuran (Fujifilm Wako Pure Chemical Industries, Ltd.) Flow rate: 1.0mL / min Sample concentration: 1.0% by mass Sample injection volume: 100 μL Column temperature: 40℃ Detector: differential refractometer Standard material: monodisperse polystyrene

[0294] <Polymer B1-1> 8-methyl-8-methoxycarbonyltetracyclo[4.4.0.1] represented by the following formula (a) 2,5 .1 7,10 80 g of dodec-3-ene (hereinafter also referred to as "DNM"), 0.22 g of 1-hexene (molecular weight regulator), and 320 g of toluene (solvent for ring-opening polymerization reaction) were charged into a reaction vessel purged with nitrogen, and the resulting toluene solution of the monomer was heated to 100°C. Separately, a toluene solution (1.45 mL) prepared by mixing triisobutylaluminum (138 μmol) and dibutyl ether (69 μmol) at room temperature, and a 0.1 mol / L toluene solution (0.46 mL) of tungsten hexachloride were prepared. To the toluene solution of the monomer, a toluene solution containing triisobutylaluminum and dibutyl ether, and a toluene solution of tungsten hexachloride were added in that order to initiate the polymerization reaction. After one hour of polymerization, 0.1 mL of water and 0.4 mL of methanol were added as reaction terminators to obtain a toluene solution of ring-opened polymer. The monomer conversion was measured and found to be 98%.

[0295] [ka]

[0296] The obtained toluene solution of the ring-opened polymer and 80 g of toluene were charged into an autoclave, and 66 mg of RuHCl(CO)[(C6H5)3]3 was added to the solution, and the mixture was heated under a hydrogen gas pressure of 100 kg / cm 2The mixture was heated and stirred for 3 hours at a reaction temperature of 165°C to carry out a hydrogenation reaction. The resulting reaction solution (hydrogenated polymer solution) was cooled, and then the hydrogen gas pressure was released. The resulting reaction solution was poured into a large amount of methanol to separate and recover a coagulated product, which was then dried to obtain a hydrogenated polymer. The resulting polymer had an Mn of 78,000 and an Mw of 162,000. The resulting polymer is designated polymer B1-1.

[0297] <Polymer B1-2> A solution of a ring-opened polymer with a monomer conversion rate of 98% and a hydrogenated polymer with an Mn of 135,000 and an Mw of 342,000 were obtained by carrying out the same procedure as in the synthesis example of polymer B1-1, except that the amount of 1-hexene used was changed to 0.12 g. This hydrogenated polymer is designated polymer B1-2.

[0298] <Polymer B1-3> A ring-opened polymer solution with a monomer conversion rate of 98% and a hydrogenated polymer with an Mn of 177,000 and an Mw of 568,000 were obtained by carrying out the same procedure as in the synthesis example of polymer B1-1, except that the amount of 1-hexene used was changed to 0.058 g. This hydrogenated polymer is designated polymer B1-3.

[0299] <Polymer B1-4> 100 g of DNM, 18 g of 1-hexene, and 300 g of toluene were charged into a nitrogen-purged reaction vessel, and the resulting solution was heated to 80°C. Next, 0.2 g of a toluene solution of triethylaluminum (0.6 mol / L) and 0.9 g of a toluene solution of methanol-modified tungsten hexachloride (concentration: 0.025 mol / L) were added as polymerization catalysts to the solution in the reaction vessel. The resulting solution was heated and stirred at 80°C for 3 hours to undergo ring-opening polymerization, yielding a ring-opened polymer solution. The polymerization conversion rate in this polymerization reaction was 97%. The obtained ring-opened polymer solution and 100 g of toluene were charged into an autoclave, and 83 mg of RuHCl(CO)[(C6H5)3]3 was added to the solution, and the mixture was heated under a hydrogen gas pressure of 100 kg / cm 2The mixture was heated and stirred for 3 hours at a reaction temperature of 165°C to carry out a hydrogenation reaction. The resulting reaction solution (hydrogenated polymer solution) was cooled, and then the hydrogen gas pressure was released. The resulting reaction solution was poured into a large amount of methanol to separate and recover a coagulated product, which was then dried to obtain a hydrogenated polymer. The resulting polymer had an Mn of 32,000, an Mw of 137,000, and a glass transition temperature (Tg) of 165°C. The resulting polymer is designated polymer B1-4.

[0300] <Polymer B1-5> 50 g of DNM, 27 mg of 1-hexene (molecular weight modifier) ​​and 400 g of toluene (solvent for ring-opening polymerization reaction) were charged into a reaction vessel purged with nitrogen, and the obtained toluene solution of the monomer was heated to 100°C. Separately, a toluene solution (1.88 mL) prepared by mixing triisobutylaluminum (188 μmol) and dibutyl ether (94 μmol) at room temperature, and a 0.1 mol / L toluene solution (1.08 mL) of tungsten hexachloride were prepared. To the toluene solution of the monomer, a mixed solution of triisobutylaluminum and dibutyl ether and a toluene solution of tungsten hexachloride were added in that order to initiate the polymerization reaction. After one hour of polymerization, 0.05 mL of water and 0.32 mL of methanol were added as reaction terminators to obtain a toluene solution of ring-opened polymer. The monomer conversion was measured and found to be 98%. The obtained toluene solution of the ring-opened polymer and 200 g of toluene were charged into an autoclave, and 31 mg of RuHCl(CO)[(C6H5)3]3 was added to the solution. The mixture was heated under a hydrogen gas pressure of 100 kg / cm 2 The mixture was heated and stirred for 2 hours at a reaction temperature of 165°C to carry out a hydrogenation reaction. The resulting reaction solution (hydrogenated polymer solution) was cooled, and then the hydrogen gas pressure was released. The resulting reaction solution was poured into a large amount of methanol to separate and recover a coagulated product, which was then dried to obtain a hydrogenated polymer. The resulting polymer had an Mn of 104,000 and an Mw of 808,000. The resulting polymer is designated polymer B1-5.

[0301] <Polymer B2-1-1> ZEONOR (Mn: 18,000, Mw: 38,000) manufactured by Zeon Corporation was used as polymer B2-1-1.

[0302] <Polymer B2-1-2> A reactor equipped with a thermometer, stirrer, and reflux condenser was charged with 14,863 parts by mass of ion-exchanged water and 5,772 parts by mass of 48% sodium hydroxide aqueous solution, and 2,148 parts by mass of 1,1-bis(4-hydroxyphenyl)cyclohexane and 4 parts by mass of sodium hydrosulfite were dissolved therein. 8,518 parts by mass of methylene chloride was then added, and 1,000 parts by mass of phosgene was then blown in over 60 minutes at 23-27°C while stirring. After the phosgene blow-in was completed, 38 parts by mass of p-tert-butylphenol was added, followed by 2 parts by mass of triethylamine. The reaction was terminated by stirring at 20-27°C for 40 minutes. The methylene chloride layer containing the product was washed with dilute hydrochloric acid and pure water, and the methylene chloride was evaporated to obtain a polycarbonate having a repeating unit represented by the following formula (7). The viscosity-average molecular weight of the resulting polycarbonate was 21,000 and the glass transition temperature (Tg) was 174°C. The resulting polycarbonate is designated as Polymer B2-1-2.

[0303] [ka]

[0304] <Polymer B2-2-1> A flask equipped with a condenser and a stirrer was pre-charged with 7 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by mass of diethylene glycol ethyl methyl ether per 100 parts by mass of an unsaturated mixture containing 20% ​​by mass of methacrylic acid, 30% by mass of glycidyl methacrylate, and 50% by mass of methyl methacrylate. 100 parts by mass of an unsaturated mixture containing 20% ​​by mass of methacrylic acid, 30% by mass of glycidyl methacrylate, and 50% by mass of methyl methacrylate was added to the mixture, and after replacing the atmosphere with nitrogen, gentle stirring was initiated. The temperature of the solution was raised to 70°C and maintained at this temperature for 4 hours to terminate the polymerization. The reaction product solution was then added dropwise to a large amount of methanol to coagulate the reaction product. The coagulated product was washed with water, redissolved in tetrahydrofuran, and coagulated again with a large amount of methanol. This redissolution-coagulation procedure was repeated three times, and the resulting coagulated product was vacuum-dried at 60°C for 48 hours to obtain the target polymer B2-2-1.

[0305] [Example A1] 4.88 g of copper acetate monohydrate (hereinafter also referred to as "CAM", manufactured by Kanto Chemical Co., Inc.) and 195.12 g of ethanol (manufactured by Kanto Chemical Co., Inc., EL grade for electronics industry) as a first solvent (S11) were mixed and stirred for 3 hours to obtain a copper acetate solution. Next, 2.572 g of a phosphate ester compound (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., product name: Plysurf A208N) was added to the obtained copper acetate solution and stirred for 30 minutes to obtain a copper acetate-phosphate ester solution, solution a1. Next, 2.886 g of n-butylphosphonic acid (hereinafter also referred to as "BPA") and 40 g of ethanol, which is the first solvent (S11), were added and stirred for 10 minutes to obtain liquid b1, which is a phosphonic acid solution.

[0306] While stirring solution A1, solution B1 was added to solution A1, and the mixture was stirred at room temperature for 15 minutes to allow the reaction to proceed, yielding solution C1, a phosphate ester-phosphonic acid-copper solution. It was visually confirmed that solid matter, presumably produced by the reaction, had precipitated in solution C1. The reaction product is believed to be a compound containing some or all of the phosphonic acid, phosphate ester, and copper components. The precipitated solution c1 was subjected to suction filtration to obtain a solid reaction product. The solid reaction product was added to 200 g of ethanol, stirred at room temperature for 10 minutes, and then subjected to suction filtration again to obtain a solid purified compound A-1.

[0307] 3.22 g of polymer B1-1 was added to 80 g of toluene as a second solvent (S2) and stirred at room temperature for 10 minutes to obtain a solution. Compound A-1 was added to the obtained solution and stirred at room temperature for another 10 minutes to obtain liquid d1 in which compound A-1 was dispersed in the solution. In liquid d1, no solid matter of compound A-1 was visible, and compound A-1 was in a dispersed state. This suggests that solid compound A-1 also contains a certain amount of phosphate ester, which has a dispersing effect, and that the phosphate ester contributes to the dispersion of compound A-1 in the toluene solvent.

[0308] Thereafter, the d1 solution was placed in a flask, and while heating in an oil bath (Tokyo Rikakikai Co., Ltd., model: OSB-2100) set to a temperature of 60 ° C., a solvent removal treatment was carried out using a rotary evaporator (Tokyo Rikakikai Co., Ltd., model: N-1110SF), thereby purifying the d1 solution. At this time, using a vacuum pump, the pressure in the flask was gradually reduced from normal pressure, taking care to prevent bumping, and the pressure was finally reduced to 100 hPa. Thereafter, the operation was terminated after confirming that the amount of solvent had decreased to a certain extent, and 11.45 g of composition 1 was obtained. It was confirmed that the composition 1 contained dispersed compound A-1 containing phosphonic acid, phosphate ester, and part or all of the copper component, and that the appearance of the composition 1 was transparent green. In Table 1, compositions that had a transparent green appearance were marked with "O" in "Appearance."

[0309] In the above process, the use of copper acetate monohydrate as a copper component source is thought to have produced acetic acid as a by-product in conjunction with the production of compound A-1 (particularly a copper phosphonate compound). However, the resulting composition 1 did not have the characteristic odor of acetic acid, suggesting that acetic acid had been sufficiently removed. This is thought to be the result of the effective precipitation of compound A-1 by the reaction with a poor solvent such as ethanol, the purification or washing process by filtration, and the solvent removal process by distillation.

[0310] (Calculation of solid content in composition) 10 g (M1) of composition 1 was accurately weighed and placed in an aluminum petri dish whose mass had been measured in advance, and the petri dish was then placed on a hot plate with a surface temperature set to 180°C. The dish was allowed to stand for approximately 10 minutes, and it was confirmed that the liquid components in the dish had almost completely evaporated. The mass of the dish containing the dried composition 1 was measured, and the mass of the solids (m1) was calculated by subtracting the mass of the dish from the measured mass, and the solids content (% by mass) in composition 1 was calculated as m1 / M1 × 100.

[0311] The solid content of Composition 1 was 80.3% by mass. If the components other than the solid content (m1) are considered to be solvents, the content of solvents in Composition 1 is calculated to be 19.7% by mass. Furthermore, when composition 1 is taken as 100 mass%, the added polymer B1-1 is 28.1 mass% from the mass of the added polymer B1-1 and the mass of the obtained composition 1, so compound A-1 is calculated to be 52.2 mass% by subtracting 19.7 mass% of the solvent and 28.1 mass% of polymer B1-1. When compound A-1 is considered to be entirely a copper complex compound, compound A-1 (copper complex compound) contained in composition 1 is calculated to be 52.2 mass%. The ratio of compound A-1 (copper complex compound) to the solid content of composition 1 was 0.65, and the ratio of compound A-1 (copper complex compound) to polymer B1-1 was 1.86.

[0312] (Evaluation of redispersibility) To confirm whether composition 1 has redispersibility, the amount of solvent (second solvent) was adjusted to 10 mass % solids content of composition 1 using the same solvent as used for distillation, and composition 1 was redispersed. As a result, composition 1 after redispersion had a green, highly transparent appearance and was in a good state without opaque turbidity, confirming that it had good redispersibility. In Table 1, compositions that were visually observed under sufficiently bright lighting and showed high redispersibility without turbidity and high transparency were indicated with a circle.

[0313] (Measurement of transmission spectrum of composition - 1) Composition 1 was placed in a quartz cell (Starna Scientific, model number: 20 / C / Q1, optical path length: 1 mm, optical path width: 10 mm, external dimensions: length 3.5 mm, width 12.5 mm, height 45 mm, capacity: 0.31 mL), and using an ultraviolet-visible-near-infrared spectrophotometer (JASCO Corporation, model number: V770), the surface of the quartz cell was irradiated with light at an incident angle of 0°, and the transmittance for each wavelength in the wavelength range of 300 to 1200 nm was measured. The concentration of the composition 1 of the sample for measuring the transmission spectrum was adjusted by adding an appropriate amount of the same solvent as the second solvent used in preparing the composition 1 so that the transmittance at a wavelength of 800 nm was 10%±1%. The transmission spectrum of Composition 1 is shown in Figure 3. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 2.

[0314] (Preparation of Layer (D1)) 0.1 g of a surface antifouling coating agent (Daikin Industries, Ltd., product name: Optool DSX, active ingredient concentration: 20% by mass) and 19.9 g of a hydrofluoroether-containing liquid (3M, product name: Novec 7100) were mixed and stirred for 5 minutes to prepare a fluorination treatment agent (active ingredient concentration: 0.1% by mass). This fluorination treatment agent was applied to one main surface of a borosilicate glass substrate (SCHOTT, product name: D263 T eco) measuring 130 mm x 100 mm x 0.70 mm. The glass substrate was then left at room temperature for 24 hours to dry the coating of the fluorination treatment agent. The glass surface was then lightly wiped with a dust-free cloth impregnated with Novec 7100 to remove excess fluorination treatment agent. In this manner, a fluorination-treated substrate was produced. Next, Composition 1 was applied to a 50 mm × 50 mm area in the center of the fluorine-treated main surface of the prepared fluorine-treated substrate using a dispenser to form a coating film. The obtained coating film was thoroughly dried in a room temperature, low humidity environment, and then baked at 85°C for 3 hours. The obtained coating film was then peeled off from the substrate to prepare a layer (D1-A1) that was an optical film with a thickness of 155 μm.

[0315] (Measurement of layer transmission spectrum - 1) Using an ultraviolet-visible-near-infrared spectrophotometer (manufactured by JASCO Corporation, model number: V770), the main surface of the obtained layer (D1-A1) was irradiated with light at an incident angle of 0°, and the transmittance of the layer (D1-A1) for each wavelength in the wavelength range of 300 to 1200 nm was measured. The transmission spectrum of the layer (D1-A1) is shown in Figure 7. Table 3 shows the parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum.

[0316] [Example A2] Compound (reaction product) A-2 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as the raw materials for compound A (reaction product) and the composition in Example A1. Also, 12.33 g of composition 2 was prepared, having a solid content of 76.6 mass% and a solvent content of 23.4 mass%. The content of compound A-2 (copper complex compound) in composition 2 was 49.8 mass%, the content of polymer B1-2 was 26.8 mass%, the ratio of compound A-2 (copper complex compound) to the solid content of composition 2 was 0.65, and the ratio of compound A-2 (copper complex compound) to polymer B1-2 was 1.85. The appearance and redispersibility of Composition 2 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0317] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-2 3.31g Second solvent (S2): toluene

[0318] [Example A3] Compound A-3 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as compound A (reaction product) and raw materials for the composition in Example A1. Also, 15.22 g of composition 3 was prepared, having a solid content of 75.9 mass% and a solvent content of 24.1 mass%. The content of compound A-3 (copper complex compound) in composition 3 was 41.7 mass%, the content of polymer B1-1 was 34.2 mass%, the ratio of compound A-3 (copper complex compound) to the solid content of composition 3 was 0.55, and the ratio of compound A-3 (copper complex compound) to polymer B1-1 was 1.22. The appearance and redispersibility of Composition 3 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0319] The transmission spectrum of Composition 3 was measured under the same conditions and by the same method as in Example A1. The transmission spectrum of Composition 3 is shown in Figure 4. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 2. Furthermore, a layer (D1-A3) with a thickness of 182 μm was prepared under the same conditions and by the same method as in Example A1, and the transmission spectrum of the layer (D1-A3) was measured. The transmission spectrum of the layer (D1-A3) according to Example A3 is shown in Figure 8. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 3.

[0320] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.780g Phosphate ester: Plysurf A208F (Dai-ichi Kogyo Seiyaku Co., Ltd.) 3.086 g Polymer (B1): Polymer B1-1 5.20 g Second solvent (S2): toluene

[0321] [Example A4] Compound A-4 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as compound A (reaction product) and raw materials for the composition in Example A1. Also, 19.08 g of composition 4 was prepared, having a solid content of 78.7 mass% and a solvent content of 21.3 mass%. The content of compound A-4 (copper complex compound) in composition 4 was 31.2 mass%, the content of polymer B1-2 was 47.5 mass%, the ratio of compound A-4 (copper complex compound) to the solid content of composition 4 was 0.40, and the ratio of compound A-4 (copper complex compound) to polymer B1-2 was 0.66. The appearance and redispersibility of Composition 4 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0322] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-2 9.06g Second solvent (S2): toluene

[0323] [Example A5] Compound A-5 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as compound A (reaction product) and raw materials for the composition in Example A1. Also, 37.88 g of composition 5 was prepared, having a solid content of 80.7 mass% and a solvent content of 19.3 mass%. The content of compound A-5 (copper complex compound) in composition 5 was 16.1 mass%, the content of polymer B1-1 was 64.6 mass%, the ratio of compound A-5 (copper complex compound) to the solid content of composition 5 was 0.20, and the ratio of compound A-5 (copper complex compound) to polymer B1-1 was 0.25. The appearance and redispersibility of Composition 5 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0324] The transmission spectrum of Composition 5 was measured under the same conditions and by the same method as in Example A1. The transmission spectrum of Composition 5 is shown in Figure 5. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 2.

[0325] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-1 24.47g Second solvent (S2): toluene

[0326] [Example A6] In Example A1, the following raw materials were used as the raw materials for compound A (reaction product) and composition, and the purification (vacuum distillation) conditions for d1 solution were changed as follows. Compound A-6 was obtained under the same conditions and method as in Example A1, and the solid content was 81.9% by mass, and the solvent content was 18.1% by mass. 11.30 g of composition 6 was prepared. The content of compound A-6 (copper complex compound) in composition 6 was 52.9% by mass, the content of polymer B1-3 was 29.0% by mass, the ratio of compound A-6 (copper complex compound) to the solid content of composition 6 was 0.65, and the ratio of compound A-6 (copper complex compound) to polymer B1-3 was 1.82. The appearance and redispersibility of Composition 6 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0327] The transmission spectrum of Composition 6 was measured under the same conditions and by the same method as in Example A1. The transmission spectrum of Composition 6 is shown in Figure 6. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 2. Furthermore, a layer (D1-A6) with a thickness of 168 μm was prepared under the same conditions and by the same method as in Example A1, and the transmission spectrum of the layer (D1-A6) was measured. The transmission spectrum of the layer (D1-A6) according to Example A6 is shown in Figure 9. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 3.

[0328] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-3 3.28g Second solvent (S2): methylene chloride

[0329] Purification (vacuum distillation) conditions Oil bath temperature: 30℃ Pressure inside distillation vessel: 500 hPa

[0330] [Example A7] In Example A1, the following raw materials were used as the raw materials for compound A (reaction product) and composition, and the purification (vacuum distillation) conditions for d1 solution were changed as follows. Compound A-7 was obtained under the same conditions and method as in Example A1, and 14.23 g of composition 7 was prepared, with a solid content of 75.8% by mass and a solvent content of 24.2% by mass. The content of compound A-7 (copper complex compound) in composition 7 was 42.1% by mass, the content of polymer B1-1 was 33.7% by mass, the ratio of compound A-7 (copper complex compound) to the solid content of composition 7 was 0.55, and the ratio of compound A-7 (copper complex compound) to polymer B1-1 was 1.25. The appearance and redispersibility of Composition 7 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0331] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-1 4.80g Second solvent (S2): methylene chloride

[0332] Purification (vacuum distillation) conditions Oil bath temperature: 30℃ Pressure inside distillation vessel: 500 hPa

[0333] [Example A8] In Example A1, the following raw materials were used as the raw materials for compound A (reaction product) and composition, and the purification (vacuum distillation) conditions for d1 solution were changed as follows. Compound A-8 was obtained under the same conditions and method as in Example A1, and 24.14 g of composition 8 was prepared, with a solid content of 68.4% by mass and a solvent content of 31.6% by mass. The content of compound A-8 (copper complex compound) in composition 8 was 28.1% by mass, the content of polymer B1-2 was 40.3% by mass, the ratio of compound A-8 (copper complex compound) to the solid content of composition 8 was 0.41, and the ratio of compound A-8 (copper complex compound) to polymer B1-2 was 0.70. The appearance and redispersibility of Composition 8 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0334] Furthermore, a layer (D1-A8) with a thickness of 126 μm was prepared under the same conditions and by the same method as in Example A1, and the transmission spectrum of the layer (D1-A8) was measured. The transmission spectrum of the layer (D1-A8) according to Example A8 is shown in Figure 10. In addition, parameters at specific wavelengths or wavelength ranges that can be seen from the transmission spectrum are shown in Table 3.

[0335] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 3.284g Phosphate ester: NIKKOL DDP-2 (Nikko Chemicals Co., Ltd.) 3.088g Polymer (B1): Polymer B1-2 9.74g Second solvent (S2): methylene chloride

[0336] Purification (vacuum distillation) conditions Oil bath temperature: 30℃ Pressure inside distillation vessel: 500 hPa

[0337] [Example A9] In Example A1, Compound A-9 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 16.50 g of Composition 9 was prepared, having a solid content of 56.9 mass% and a solvent content of 43.1 mass%. The content of Compound A-9 (copper complex compound) in Composition 9 was 36.0 mass%, the content of Polymer B1-3 was 20.9 mass%, the ratio of Compound A-9 (copper complex compound) to the solid content of Composition 9 was 0.63, and the ratio of Compound A-9 (copper complex compound) to Polymer B1-3 was 1.72. The appearance and redispersibility of Composition 9 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0338] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-3 3.45g Second solvent (S2): toluene

[0339] [Example A10] In Example A1, the following raw materials were used as raw materials for compound A (reaction product) and the composition. When polymer (B1) was mixed with toluene as the second solvent (S2) to obtain a solution, 26.1 mg of ultraviolet-absorbing compound (U-1) was added. Compound A-9 was obtained under the same conditions and method as in Example A1. 21.52 g of composition 10 was also prepared. The solid content was 54.6 mass% and the solvent content was 45.4 mass%. The content of compound A-10 (copper complex compound) in composition 10 was 24.3 mass%, the content of polymer B1-3 was 30.3 mass%, the ratio of compound A-10 (copper complex compound) to the solid content of composition 10 was 0.45, the ratio of compound A-10 (copper complex compound) to polymer B1-3 was 0.80, and the ratio of ultraviolet-absorbing compound (U-1) to polymer B1-3 was 4.0 × 10 -3 It was. The appearance and redispersibility of Composition 10 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0340] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: Methylphosphonic acid 2.019g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-3 6.52g UV absorbing compound (U-1) 26.1mg Second solvent (S2): toluene

[0341] [Example A11] In Example A1, Compound A-11 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. 25.72 g of Composition 11 was prepared, with a solid content of 65.7 mass% and a solvent content of 34.3 mass%. The content of Compound A-11 (copper complex compound) in Composition 11 was 22.0 mass%, the content of Polymer B1-1 was 43.7 mass%, the ratio of Compound A-11 (copper complex compound) to the solid content of Composition 11 was 0.33, and the ratio of Compound A-11 (copper complex compound) to Polymer B1-1 was 0.50. The appearance and redispersibility of Composition 11 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0342] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: Ethyl phosphonic acid 2.259g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-1 11.25g Second solvent (S2): toluene

[0343] [Example A12] In Example A1, Compound A-12 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 16.33 g of Composition 12 was prepared, having a solid content of 65.1 mass% and a solvent content of 34.9 mass%. The content of Compound A-12 (copper complex compound) in Composition 12 was 41.2 mass%, the content of Polymer B1-1 was 23.9 mass%, the ratio of Compound A-12 (copper complex compound) to the solid content of Composition 12 was 0.63, and the ratio of Compound A-12 (copper complex compound) to Polymer B1-1 was 1.72. The appearance and redispersibility of Composition 12 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0344] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 3.284g Phosphate ester: NIKKOL DDP-2 3.088g Polymer (B1): Polymer B1-1 3.91g Second solvent (S2): toluene

[0345] [Example A13] In Example A1, Compound A-13 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 16.75 g of Composition 13 was prepared, with a solid content of 62.8 mass% and a solvent content of 37.2 mass%. The content of Compound A-13 (copper complex compound) in Composition 13 was 39.6 mass%, the content of Polymer B1-2 was 23.2 mass%, the ratio of Compound A-13 (copper complex compound) to the solid content of Composition 13 was 0.63, and the ratio of Compound A-13 (copper complex compound) to Polymer B1-2 was 1.71. The appearance and redispersibility of Composition 13 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0346] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 3.334g Phosphate ester: NIKKOL DDP-2 2.984g Polymer (B1): Polymer B1-2 3.88g Second solvent (S2): toluene

[0347] [Example A14] In Example A1, the following raw materials were used as the raw materials for compound A (reaction product) and the composition, and 36.1 mg of ultraviolet-absorbing compound (U-1) was added when polymer (B1) was mixed with toluene as the second solvent (S2) to obtain a solution. Compound A-14 was obtained under the same conditions and method as in Example A1, and 24.93 g of composition 14 was prepared, having a solids content of 62.1 mass% and a solvent content of 37.9 mass%. The content of compound A-14 (copper complex compound) in composition 14 was 25.9 mass%, the content of polymer B1-4 was 36.2 mass%, the ratio of compound A-14 (copper complex compound) to the solids content of composition 14 was 0.42, the ratio of compound A-14 (copper complex compound) to polymer B1-4 was 0.71, and the ratio of ultraviolet-absorbing compound (U-1) to polymer B1-4 was 4.0 × 10 -3 It was. The appearance and redispersibility of Composition 14 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0348] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-hexylphosphonic acid 3.472g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-4 9.03g UV absorbing compound (U-1) 36.1mg Second solvent (S2): toluene

[0349] [Example A15] In Example A1, Compound A-15 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 30.02 g of Composition 15 was prepared, having a solid content of 35.0 mass% and a solvent content of 65.0 mass%. The content of Compound A-15 (copper complex compound) in Composition 15 was 19.3 mass%, the content of Polymer B1-3 was 15.7 mass%, the ratio of Compound A-15 (copper complex compound) to the solid content of Composition 15 was 0.55, and the ratio of Compound A-15 (copper complex compound) to Polymer B1-3 was 1.23. The appearance and redispersibility of Composition 15 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0350] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.943g Phosphate ester: Plysurf A208N 2.315g Polymer (B1): Polymer B1-3 4.71g Second solvent (S2): toluene

[0351] [Example A16] In Example A1, Compound A-16 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 70.25 g of Composition 16 was prepared, having a solid content of 40.3 mass% and a solvent content of 59.7 mass%. The content of Compound A-16 (copper complex compound) in Composition 16 was 8.2 mass%, the content of Polymer B1-1 was 32.1 mass%, the ratio of Compound A-16 (copper complex compound) to the solid content of Composition 16 was 0.20, and the ratio of Compound A-16 (copper complex compound) to Polymer B1-1 was 0.26. The appearance and redispersibility of Composition 16 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0352] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.943g Phosphate ester: Plysurf A208N 2.315g Polymer (B1): Polymer B1-1 22.53g Second solvent (S2): toluene

[0353] [Example A17] In Example A1, Compound A-17 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 44.81 g of Composition 17 was prepared, having a solid content of 20.6 mass% and a solvent content of 79.4 mass%. The content of Compound A-17 (copper complex compound) in Composition 17 was 13.3 mass%, the content of Polymer B1-2 was 7.3 mass%, the ratio of Compound A-17 (copper complex compound) to the solid content of Composition 17 was 0.64, and the ratio of Compound A-17 (copper complex compound) to Polymer B1-2 was 1.81. The appearance and redispersibility of Composition 17 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0354] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-2 3.28g Second solvent (S2): toluene

[0355] [Example A18] In Example A1, Compound A-18 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 63.57 g of Composition 18 was prepared, with a solid content of 17.8 mass% and a solvent content of 82.2 mass%. The content of Compound A-18 (copper complex compound) in Composition 18 was 9.5 mass%, the content of Polymer B1-3 was 8.3 mass%, the ratio of Compound A-18 (copper complex compound) to the solid content of Composition 18 was 0.53, and the ratio of Compound A-18 (copper complex compound) to Polymer B1-3 was 1.14. The appearance and redispersibility of Composition 18 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0356] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-3 5.29g Second solvent (S2): toluene

[0357] [Example A19] In Example A1, Compound A-19 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as compound A (reaction product) and raw materials for the composition. 23.88 g of composition 19 was prepared, having a solids content of 70.6 mass% and a solvent content of 29.4 mass%. The content of compound A-19 (copper complex compound) in composition 19 was 24.0 mass%, the total content of polymers B1-1 and B1-2 was 46.6 mass%, the ratio of compound A-19 (copper complex compound) to the solids content of composition 19 was 0.34, and the ratio of compound A-19 (copper complex compound) to the total of polymers B1-1 and B1-2 was 0.51. The appearance and redispersibility of Composition 19 were evaluated under the same conditions and by the same method as in Example A1, and both were found to be good. The results are shown in Table 1.

[0358] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: Ethyl phosphonic acid 2.259g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): 11.14 g of a mixture of 50% by mass of polymer B1-1 and polymer B1-2 Second solvent (S2): toluene

[0359] [Example A20] In Example A1, Compound A-20 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as Compound A (reaction product) and raw materials for the composition. Also, 12.31 g of Composition 20 was prepared, having a solid content of 64.2 mass% and a solvent content of 35.8 mass%. The content of Compound A-20 (copper complex compound) in Composition 20 was 48.3 mass%, the content of Polymer B1-2 was 15.9 mass%, the ratio of Compound A-20 (copper complex compound) to the solid content of Composition 20 was 0.75, and the ratio of Compound A-20 (copper complex compound) to Polymer B1-2 was 3.03. The appearance and redispersibility of Composition 20 were evaluated under the same conditions and by the same method as in Example A1. Composition 20 was a green, transparent liquid with no visible aggregation, and was judged to have no problem in appearance (rating: ○). However, upon redispersion of Composition 20, slight aggregation of the components constituting Composition 20 was observed in the liquid, and although this is acceptable depending on the application and specifications, it was judged that the redispersibility was slightly inferior to Compositions 1 to 19, and this was marked as △ in Table 1.

[0360] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-2 1.96g Second solvent (S2): toluene

[0361] [Comparative Example a1] Compound A-21 was obtained under the same conditions and by the same method as in Example A1, except that the following raw materials were used as compound A (reaction product) and raw materials for the composition in Example A1, and polymer (B1) was not added. Also, 10.31 g of composition 21 was prepared, having a solid content of 57.7 mass% and a solvent content of 42.3 mass%. The content of compound A-21 (copper complex compound) in composition 21 was 57.7 mass%, and the ratio of compound A-21 (copper complex compound) to the solid content of composition 21 was 1. The appearance and redispersibility of Composition 21 were evaluated under the same conditions and by the same method as in Example A1. Composition 21 was a green, transparent liquid in which no aggregation or the like was observed, and the appearance was judged to be satisfactory (evaluation: ○). However, when redispersing composition 21, aggregation of the components constituting composition 21 was observed in the liquid, and the redispersibility could not be said to be good, and this result was indicated as × in Table 1. This suggests that if polymer (B1) is not used, aggregation will occur during redispersion, and an appropriate composition will not be obtained.

[0362] raw materials First solvent (S11): Ethanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): None Second solvent (S2): toluene

[0363] [Table 1]

[0364] The abbreviations in Table 1 represent the following compounds: CAM: Copper acetate monohydrate BPA: n-butylphosphonic acid MPA: methylphosphonic acid EPA: Ethylphosphonic acid HPA: n-hexylphosphonic acid A208N: Phosphate ester (Plysurf A208N) DDP-2: Phosphate ester (NIKKOL DDP-2) Ultraviolet absorbing compound (U-1): A compound represented by the following formula (U-1) (maximum absorption wavelength in dichloromethane: 364 nm)

[0365] [ka]

[0366] [Table 2]

[0367] [Table 3]

[0368] [Example A21 (Preparation of Example A21 Group of Compositions)] 4.88 g of copper acetate monohydrate (hereinafter also referred to as "CAM", manufactured by Kanto Chemical Co., Inc.) and 195.12 g of ethanol (manufactured by Kanto Chemical Co., Inc., EL grade for electronics industry) as a first solvent (S11) were mixed and stirred for 3 hours to obtain a copper acetate solution. Next, 2.572 g of a phosphate ester compound (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., product name: Plysurf A208N) was added to the obtained copper acetate solution and stirred for 30 minutes to obtain a copper acetate-phosphate ester solution, solution a1. Next, 2.886 g of n-butylphosphonic acid (hereinafter also referred to as "BPA") and 40 g of ethanol, which is the first solvent (S11), were added and stirred for 10 minutes to obtain liquid b1, which is a phosphonic acid solution.

[0369] While stirring solution A1, solution B1 was added to solution A1, and the mixture was stirred at room temperature for 15 minutes to allow the reaction to proceed, yielding solution C1, a phosphate ester-phosphonic acid-copper solution. It was visually confirmed that solid matter, presumably produced by the reaction, had precipitated in solution C1. The reaction product is believed to be a compound containing some or all of the phosphonic acid, phosphate ester, and copper components. The precipitated solution c1 was subjected to suction filtration to obtain a solid reaction product. The solid reaction product was added to 200 g of ethanol, stirred at room temperature for 10 minutes, and then subjected to suction filtration again to obtain a purified solid compound A-21.

[0370] 10.00 g of polymer B1-1 was added to 80 g of methylene chloride (hereinafter also referred to as "DCM") as a second solvent (S2) and stirred at room temperature for 30 minutes to obtain a solution. Compound A-21 was added to the obtained solution and stirred at room temperature for another 30 minutes to obtain liquid d1 in which compound A-21 was dispersed in the solution. In liquid d1, no solid matter of Compound A-21 was visible, and Compound A-21 was in a dispersed state. This suggests that solid Compound A-21 also contains a certain amount of phosphate ester, which has a dispersing effect, and that the phosphate ester contributes to the dispersion of Compound A-21 in the methylene chloride solvent.

[0371] The d1 solution was then placed in a flask and heated in an oil bath (Tokyo Rikakikai Co., Ltd., model: OSB-2100) set to 60°C. A rotary evaporator (Tokyo Rikakikai Co., Ltd., model: N-1110SF) was used to remove the solvent, purifying the d1 solution. A vacuum pump was used to gradually reduce the pressure in the flask from normal pressure, taking care to prevent bumping. The second solvent (S2), methylene chloride, was then added, and the same process was repeated to perform a second desolvation process. The first solvent (S11), ethanol, was then removed, completing the process. The second solvent (S2), methylene chloride, was further added and stirred thoroughly so that the solids content of the resulting desolvated purified product was approximately 20 to 70%, yielding composition A21. It was confirmed that the composition A21 contained dispersed compound A-21 containing phosphonic acid, phosphate ester, and some or all of the copper component.

[0372] In the above process, the use of copper acetate monohydrate as a copper source is thought to have produced acetic acid as a by-product in conjunction with the production of compound A-21 (particularly a compound containing phosphonic acid and copper). However, the resulting composition A21 did not have the characteristic odor of acetic acid, suggesting that the acetic acid had been sufficiently removed. This is thought to be the result of the effective precipitation of compound A-21 by the reaction with a poor solvent such as ethanol, the purification or washing process by filtration, and the solvent removal process by distillation.

[0373] (Calculation of solid content in composition) The solid content of the compositions of Example A21 was measured by the same method as that described in Example A1. This method was also used when measuring the solid content ratio of the compositions in each group of Examples A22 to A31 below.

[0374] Furthermore, assuming that the content of polymer B1-1 in composition A21 is the same as the added mass of polymer B1-1 (10.00 g), the mass of compound A-21 can be determined by subtracting the added mass of polymer B1-1 from m1, which is the solid content mass of composition A21. The ratio of the mass of compound A-21 to the mass of the solid content of composition A21 was calculated to be 0.4, and the ratio of the mass of polymer B1-1 to the mass of compound A-21 was calculated to be 1.49. Details of composition A21 are shown in Table 4.

[0375] (composition analysis) Based on the calculated solid content ratio of composition A21, methylene chloride was further added to composition A21 to adjust the solid content ratio to 10.0 mass % to obtain liquid composition A210.

[0376] Composition analysis of liquid composition A210 by gas chromatography-mass spectrometry (GC-MS) revealed that the mass of the first solvent (S11) relative to 100% by mass of all solvents contained in liquid composition A210 was 0.1% by mass or less. This suggests that the content of the first solvent (S11) in liquid composition A210 is sufficiently small, and that the first solvent (S11), which is a poor solvent, was sufficiently removed by the solvent removal treatment using a series of evaporators. In the following Examples A22 to A31, when the first solvent (S11) is removed by the same method, the content of the first solvent (S11) in the resulting composition is considered to be almost negligible. In other words, in Examples A21 to A31, the content of the first solvent (S11) is significantly smaller than the contents of the second solvent (S2) and the third solvent (S13), and is considered to be negligible.

[0377] Specifically, the composition analysis was carried out by the following method. 1.0 g of composition A210 was taken and diluted exactly 10 times with the second solvent (S2). 1.0 g of the internal standard solution was accurately weighed and mixed with 9.0 g of the 10-fold diluted solution. 1.5 g of this mixture and 100 μL of a silylating agent (N,O-bis(trimethylsilyl)trifluoroacetamide (containing 10% by mass of chlorotrimethylsilane), manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were accurately weighed and placed in a 2 mL vial for GC-MS measurement. The vial was then capped and thoroughly shaken. The resulting vial sample was analyzed in Sim mode using an Agilent 8890GC, 5977GC / MSD (sample injection volume 1 μL, split ratio 30:1, Agilent VF-5ms column, column flow rate 1 mL / min, oven temperature 65 °C). The concentration of the first solvent (S11) was quantified by the internal standard method using a standard solution that had been measured in advance. This method was also used when analyzing the compositions of each group of Examples A22 to A31 below.

[0378] (Preparation of Compositions A211, A212, A213, A214 and A215) Compositions A211, A212, A213, A214, and A215 were prepared by adding different amounts of methanol (Kanto Chemical Co., Inc., EL grade for electronics industry) as a third solvent (S13) to composition A210. When the content of methanol in all solvents contained in composition A210 (the mass % of the third solvent (S13) relative to 100 mass % of all solvents) is defined as η [mass %], the η for compositions A211, A212, A213, A214, and A215 were 2.1 mass %, 4.3 mass %, 6.4 mass %, 8.5 mass %, and 10.6 mass %, respectively. It was observed that compositions A211, A212, A213, A214 and A215 had improved transparency compared to liquid composition A210. Table 5 shows the solid content ratios of liquid compositions A211, A212, A213, A214 and A215, and the content of the third solvent (S13) in all solvents contained in these compositions.

[0379] (Measurement of transmission spectrum of composition - 2) Liquid compositions A210, A211, A212, A213, A214, or A215 were placed in a quartz cell (Starna Scientific, model number: 20 / C / Q1, light path length: 1 mm, light path width: 10 mm, external dimensions: length 3.5 mm, width 12.5 mm, height 45 mm, capacity: 0.31 mL), and the transmittance for each wavelength in the range of 300 to 1200 nm was measured using an ultraviolet-visible-near-infrared spectrophotometer (JASCO Corporation, model number: V770) at an ambient temperature of 25°C ± 5°C, by irradiating the surface of the quartz cell with light at an incident angle of 0°. Further, the transmittance for each wavelength in the wavelength range of 300 to 1200 nm was measured in the same manner, except that a quartz cell filled with only the second solvent (S2) was used instead of the composition. The spectral transmittance at each wavelength of the transmission spectrum obtained using a quartz cell filled with only the second solvent (S2) was set to 100%, and the spectral transmittance at each wavelength obtained using a quartz cell filled with each composition was corrected to obtain the corrected transmission spectrum of each composition.

[0380] Next, the transmission spectrum of the composition after correction was standardized by the following method so that the transmittance at a wavelength of 900 nm was 10% (a standardized transmission spectrum was obtained). From the transmission spectrum of the composition after correction, the transmittance T(λ) at each wavelength is calculated using the formula T(λ) = 100 × e -α(λ) The absorbance α(λ) for each wavelength was calculated according to the formula, while the standardized absorbance α'(900) was calculated from the transmittance T(900) = 10. Next, the standardization coefficient k of the absorbance was calculated by k = α(900) / α'(900). Finally, the standardized transmittance T'(λ) = 100 × e -k · α(λ) was calculated to obtain the transmission spectrum of the standardized transmittance.

[0381] The optical properties of liquid compositions A210, A211, A212, A213, A214, and A215 were evaluated based on the standardized transmission spectra. Table 6 shows the parameters at specific wavelengths or wavelength ranges that can be observed from the standardized transmission spectra. The optical properties of the compositions in each group of Examples A22 to A25 below were also evaluated based on this standardized transmission spectrum. The transmission spectra of liquid compositions A210, A211, A212, A213, A214 and A215 are shown in FIG.

[0382] (Preparation of Layers (D1-A21) Group) 0.1 g of a surface antifouling coating agent (Daikin Industries, Ltd., product name: Optool DSX, active ingredient concentration: 20% by mass) and 19.9 g of a hydrofluoroether-containing liquid (3M, product name: Novec 7100) were mixed and stirred for 5 minutes to prepare a fluorination treatment agent (active ingredient concentration: 0.1% by mass). This fluorination treatment agent was applied to one main surface of a borosilicate glass substrate (SCHOTT, product name: D263 T eco) measuring 130 mm x 100 mm x 0.70 mm. The glass substrate was then left at room temperature for 24 hours to dry the coating of the fluorination treatment agent. The glass surface was then lightly wiped with a dust-free cloth impregnated with Novec 7100 to remove excess fluorination treatment agent. In this manner, a fluorination-treated substrate was produced. Next, a liquid composition A210, A211, A212, A213, A214, or A215 was applied to a 50 mm x 50 mm area in the center of the fluorine-treated main surface of the prepared fluorine-treated substrate using a dispenser to form a coating. The resulting coating was thoroughly dried at room temperature in a low-humidity environment and then baked at 85°C for 3 hours. The resulting coating was then peeled off from the substrate to produce layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214), and (D1-A215), which are optical films with a thickness of 100 μm.

[0383] (Measurement of layer transmission spectrum - 2) Using an ultraviolet-visible-near-infrared spectrophotometer (manufactured by JASCO Corporation, model number: V770), the main surfaces of the obtained layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214), and (D1-A215) were irradiated with light at an incident angle of 0°, and the transmittance of the layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214), and (D1-A215) for each wavelength in the range of 300 to 1200 nm was measured at an ambient temperature of 25°C ± 5°C.

[0384] Next, the actually measured transmission spectrum was standardized by the following method so that the transmittance at a wavelength of 850 nm in the actually measured transmission spectrum was 1% (a standardized transmission spectrum was obtained). From the measured transmission spectrum of the composition, the transmittance T(λ) at each wavelength is calculated using the formula T(λ) = 100 × e -β(λ) The absorbance β(λ) for each wavelength was calculated according to the formula, while the standardized absorbance β'(850) was calculated from the transmittance T(850) = 1. Next, the standardization coefficient p of the absorbance was calculated by p = β(850) / β'(850). Finally, the standardized transmittance T'(λ) = 100 × e -p · β(λ) was calculated to obtain the transmission spectrum of the standardized transmittance.

[0385] The optical properties of layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214), and (D1-A215) were evaluated based on the normalized transmission spectra, and the parameters at specific wavelengths or wavelength ranges that can be seen from the normalized transmission spectra are shown in Table 7. The optical properties of the layers obtained from the compositions of each of the following Examples A22 to A25 were also evaluated based on this standardized transmission spectrum. The transmission spectra of layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214) and (D1-A215) are shown in FIG.

[0386] (Layer haze measurement) The haze values ​​of the resulting layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214), and (D1-A215) were measured using a haze meter (Murakami Color Research Laboratory Co., Ltd., product name: HM-65L2) in accordance with JIS K 7136:2000. This method was also used when measuring the haze of the layers in each group of Examples D1-A22 to A31 below.

[0387] Here, a haze value of 0.4% or less was evaluated as "A," a haze value of more than 0.4% and less than or equal to 0.6% was evaluated as "B," a haze value of more than 0.6% and less than or equal to 1.0% was evaluated as "C," and a haze value of more than 1.0% was evaluated as "D." The evaluation results are shown in Table 8. A haze rating of A indicates that a layer is most suitable for use as an optical filter, a layer with a haze rating of B is suitable for use as an optical filter, a layer with a haze rating of C can be used as an optical filter under certain conditions (such as limited applications, not requiring high image quality, or requiring additional processing including surface polishing), and a layer with a haze rating of D is not suitable for use as an optical filter.

[0388] The haze measurements of the layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), (D1-A214), and (D1-A215) indicate that the layers formed using compositions A210, A211, A212, and A213 have favorable haze characteristics for optical filter materials. In particular, the layers (D1-A211), (D1-A212), and (D1-A213) formed using compositions A211, A212, and A213 have more favorable haze characteristics. This suggests that the presence of a certain amount of methanol added as a third solvent (S13) relative to the total solvent components contained in the composition is effective. When an appropriate amount of methanol is added to composition A210 as a third solvent (S13), the transparency of the composition increases in compositions A211, A212, A213, A214, and A215. Methanol acts as a poor solvent that tends to precipitate compound A-21, but in the presence of a cyclic olefin polymer (B1) having a specific molecular weight, some kind of interaction occurs, suppressing the aggregation of compound A-21 and increasing its dispersibility, although the reason is not clear.

[0389] Compositions A214 and A215, which contain a relatively high content of the third solvent (S13) in all solvents contained in the liquid composition, maintain favorable dispersibility in the composition state, but the layer formed from the composition has increased haze and is rated D. The reason for this is thought to be as follows. It is generally known that an azeotropic composition is formed when the ratio of methanol to methylene chloride in a mixed solution of the third solvent (S13) and the second solvent (S2) is 7.3 mass %. Therefore, by controlling the amount of methanol to less than 7.3 mass % of the total solvent contained in a liquid composition consisting of methylene chloride and methanol, it is possible to remove the solvent from the liquid composition and form a layer without leaving methanol as the final solvent when the solvent evaporates. In the liquid composition, it is desirable that a certain amount of alcohol is contained in the solvent. However, if only alcohol remains during the process of evaporating the solvent to form a layer, significant aggregation and whitening of the layer will occur, which is considered to be undesirable. Based on these findings, it is considered effective to set the content of methanol in the total solvent contained in a liquid composition consisting of methylene chloride and methanol to an amount (less than 7.3% by mass) that does not result in an azeotropic mixture of methylene chloride and methanol.

[0390] Because liquid composition A210 does not contain the third solvent (S13), methanol, the haze-reducing effect of including alcohol as a poor solvent is not achieved, resulting in a slightly higher haze for layer (D1-A210). The methanol content of the total solvent in compositions A214 and A215 is 8.5% by mass and 10.6% by mass, respectively, which is higher than the 7.3% by mass mentioned above. It is assumed that methanol remains when the solvent in the composition evaporates to form the layer, and that this causes a portion of compound A-21 to aggregate, resulting in a higher haze value. Furthermore, comparing the transmission spectra of layers (D1-A214) and (D1-A215) with those of the other layers reveals a decrease in transmittance, particularly in the visible light range.

[0391] When methanol is used as the third solvent (S13) in a composition containing a cyclic olefin polymer (B1) having a specific molecular weight and containing methylene chloride as the main solvent, the content of the third solvent (S13) in the total solvents contained in the composition is desirably 0.0% by mass or more and less than 7.3% by mass in order to obtain a layer (optical filter) with suitable optical properties. In particular, a content of 0.0 to 6.4% by mass is preferred to obtain a layer (optical filter) with effective optical properties, and a content of 2.1 to 6.4% by mass is even more preferred to obtain a layer (optical filter) with sufficiently low haze and good optical properties.

[0392] 21 and Table 7, the layers (D1-A210), (D1-A211), (D1-A212), (D1-A213), and (D1-A214) satisfy requirements (IX) to (XIII), but the layer (D1-A215) does not satisfy requirement (IX). Furthermore, Table 8 shows that the layers (D1-A210), (D1-A211), (D1-A212), and (D1-A213) have haze values ​​evaluated as B or higher, and are therefore suitable for use in optical filters. However, the layers (D1-A214) and (D1-A215) have haze values ​​evaluated as D, and are therefore not suitable for use in optical filters. For these reasons, the use of compositions A210, A211, A212, or A213 makes it possible to form optical filters with standard performance and a wide range of applications, while the use of compositions A211, A212, and A213 makes it possible to form optical filters that meet higher performance requirements.

[0393] Example A22 (Preparation of Examples A22 of Compositions and Layers (D1-A22)) A liquid composition A22 containing compound (reaction product) A-22 was obtained under the same conditions and by the same method as those used for the preparation of composition example A21, except that the following raw materials were used as the raw materials for the composition. The solid content of composition A22 was calculated, and the ratio of the mass of compound (copper complex compound) A-22 to the mass of the solid content of composition A22 was calculated to be 0.41, and the ratio of the mass of polymer B1-1 to the mass of compound A-22 was calculated to be 1.44. Based on the calculated solid content of composition A22, methylene chloride was further added to composition A22 to adjust the solid content to 20.0 mass% to obtain composition A220. Methanol (Kanto Chemical Co., Inc., EL grade for electronics industry) was further added to composition A220 as a third solvent (S13), as described below, to obtain compositions A221, A222, A223, A224, and A225. Details of each composition are shown in Tables 4 and 5.

[0394] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): B1-1 10.00g Second solvent (S2): methylene chloride Third solvent (S13): methanol Solid content ratio of composition: 20.0% by mass (A220), 19.7% by mass (A221), 19.3% by mass (A222), 19.0% by mass (A223), 18.7% by mass (A224), 18.4% by mass (A225) Content (η) of the third solvent (S13) in all solvents contained in the composition: 0.0 mass% (A220), 2.2 mass% (A221), 4.4 mass% (A222), 6.7 mass% (A223), 8.9 mass% (A224), 11.1 mass% (A225)

[0395] Next, layers (D1-A22) (layers (D1-A220), (D1-A221), (D1-A222), (D1-A223), (D1-A224), and (D1-A225)) were prepared from each composition in the same manner as for the layers (D1-A21). The haze of these layers (D1-A22) was measured. The results are shown in Table 8.

[0396] Example A23 (Preparation of Examples A23 of Compositions and Layers (D1-A23)) A liquid composition A23 containing compound (reaction product) A-23 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as the raw materials for the composition. The solid content of composition A23 was calculated, and the ratio of the mass of compound A-23 to the mass of the solid content of composition A23 was calculated to be 0.40, and the ratio of the mass of polymer B1-2 to the mass of compound A-23 was calculated to be 1.50. Based on the calculated solid content of composition A23, methylene chloride was further added to composition A23 to adjust the solid content to 5.0 mass% to obtain composition A230. Methanol (Kanto Chemical Co., Inc., EL grade for electronics industry) was further added to composition A230 as a third solvent (S13), as described below, to obtain compositions A231, A232, A233, and A234. Details of each composition are shown in Tables 4 and 5.

[0397] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N (Dai-ichi Kogyo Seiyaku Co., Ltd.) 2.572 g Polymer (B1): B1-2 10.00g Second solvent (S2): methylene chloride Third solvent (S13): methanol Solid content ratio of the composition: 5.0% by mass (A230), 4.9% by mass (A231), 4.8% by mass (A232), 4.7% by mass (A233), 4.6% by mass (A234) Content (η) of the third solvent (S13) in all solvents contained in the composition: 0.0 mass% (A230), 2.1 mass% (A231), 4.3 mass% (A232), 6.4 mass% (A233), 8.5 mass% (A234)

[0398] Next, layers (D1-A23) (layers (D1-A230), (D1-A231), (D1-A232), (D1-A233), and (D1-A224)) were prepared from each composition in the same manner as for the layers (D1-A21). The haze of these layers (D1-A23) was measured. The results are shown in Table 8.

[0399] Example A24 (Preparation of Examples A24 of Compositions and Layers (D1-A24)) A liquid composition A24 containing compound (reaction product) A-24 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as the raw materials for the composition. The solid content of composition A24 was calculated, and the ratio of the mass of compound A-24 to the mass of the solid content of composition A24 was calculated to be 0.41, and the ratio of the mass of polymer B1-2 to the mass of compound A-24 was calculated to be 1.45. Based on the calculated solid content of composition A24, methylene chloride was further added to composition A24 to adjust the solid content to 15.0 mass% to obtain composition A240. Methanol (Kanto Chemical Co., Inc., EL grade for electronics industry) was further added to composition A240 as a third solvent (S13), as described below, to obtain compositions A241, A242, A243, A244, and A245. Details of each composition are shown in Tables 4 and 5. In the same manner as in the case of the composition A21 group, normalized transmission spectra were obtained for compositions A240, A241, A242, A243, A244, and A245. The normalized transmission spectra of these compositions are shown in Figure 22, and the properties observed from the spectra are shown in Table 6.

[0400] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): B1-2 10.00g Second solvent (S2): methylene chloride Third solvent (S13): methanol Solid content ratio of the composition: 15.0 mass% (A240), 14.7 mass% (A241), 14.5 mass% (A242), 14.2 mass% (A243), 14.0 mass% (A244), 13.8 mass% (A245) Content (η) of the third solvent (S13) in all solvents contained in the composition: 0.0 mass% (A240), 2.1 mass% (A241), 4.2 mass% (A242), 6.4 mass% (A243), 8.5 mass% (A244), 10.7 mass% (A245)

[0401] Next, layers (D1-A24) group (layers (D1-A240), (D1-A241), (D1-A242), (D1-A243), (D1-A244) and (D1-A245)) were prepared from each composition in the same manner as for the layer (D1-A21) group. The normalized transmission spectra of these layers (D1-A24) were obtained and are shown in Figure 23, and the properties observed from the spectra are listed in Table 7. The haze of these layers (D1-A24) was also measured, and the results are shown in Table 8.

[0402] Example A25 (Preparation of Examples A25 of Compositions and Layers (D1-A25)) A liquid composition A25 containing compound (reaction product) A-25 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as the raw materials for the composition. The solid content of composition A25 was calculated, and the ratio of the mass of compound A-25 to the mass of the solid content of composition A25 was calculated to be 0.40, and the ratio of the mass of polymer B1-2 to the mass of compound A-25 was calculated to be 1.49. Based on the calculated solid content of composition A25, methylene chloride was further added to composition A25 to adjust the solid content to 10.0 mass% to obtain composition A250. Ethanol (Kanto Chemical Co., Ltd., EL grade for electronics industry) was further added to composition A250 as a third solvent (S13), as described below, to obtain compositions A251, A252, A253, A254, and A255. Details of each composition are shown in Tables 4 and 5. In the same manner as in the case of the composition A21 group, normalized transmission spectra were obtained for compositions A250, A251, A252, A253, A254, and A255. The normalized transmission spectra of these compositions are shown in Figure 24, and the properties observed from the spectra are shown in Table 6.

[0403] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.886g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): B1-2 10.00g Second solvent (S2): methylene chloride Third solvent (S13): Ethanol Solid content ratio of the composition: 10.0% by mass (A250), 9.8% by mass (A251), 9.7% by mass (A252), 9.6% by mass (A253), 9.5% by mass (A254), 9.4% by mass (A255) Content (η) of the third solvent (S13) in all solvents contained in the composition: 0.0 mass% (A250), 1.0 mass% (A251), 2.0 mass% (A252), 4.0 mass% (A253), 4.5 mass% (A254), 7.0 mass% (A255)

[0404] Next, the layers (D1-A25) group (layers (D1-A250), (D1-A251), (D1-A252), (D1-A253), (D1-A254) and (D1-A255)) were prepared from each composition in the same manner as in the preparation of the layers (D1-A21). The normalized transmission spectra of these layers (D1-A25) were obtained and are shown in Figure 25, and the properties observed from the spectra are listed in Table 7. The haze of these layers (D1-A25) was also measured, and the results are shown in Table 8.

[0405] The content of the third solvent (S13), which forms an azeotropic mixture with methylene chloride as the second solvent (S2) and ethanol as the third solvent (S13), is 5.0 mass % or more. Therefore, based on the above considerations, it is suitable for producing an optical filter to set the content η of ethanol, which is the third solvent (S13), in all solvents contained in a composition in which the solvent is methylene chloride and ethanol to 0 mass% or more and less than 5.0 mass%, and it is more preferable to set η to 0 to 4.5 mass%, or even 2.1 to 4.5 mass%. Furthermore, as can be seen from FIG. 25 and Table 7, the layers (D1-A250), (D1-A251), (D1-A252), (D1-A253) and (D1-A254) satisfy the requirements (IX) to (XIII). However, while composition A255 maintains high transparency, layer (D1-A255) becomes opaque and almost impossible to see through, and therefore cannot be said to be suitable for use in optical devices and the like.

[0406] Example A26 (Preparation of Example A26 Group of Compositions and Layers (D1-A261)) A liquid composition A26 containing compound (reaction product) A-26 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as raw materials for the composition. The solid content ratio of composition A26 was calculated, and the ratio of the mass of compound A-26 to the mass of the solid content of composition A26 was calculated to be 0.43, and the ratio of the mass of polymer B1-1 to the mass of compound A-26 was calculated to be 1.32. Based on the calculated solid content of composition A26, methylene chloride was further added to composition A26 to adjust the solid content to 10.0 mass% to obtain composition A260. Ethanol (Kanto Chemical Co., Inc., EL grade for electronics industry) was further added to composition A260 as a third solvent (S13), as described below, to obtain composition A261, which has a solid content of 9.7 mass%. Details of each composition are shown in Tables 4 and 5.

[0407] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 3.284g Phosphate ester: NIKKOL DDP-2 (Nikko Chemicals Co., Ltd.) 3.088g Polymer (B1): Polymer B1-1 10.00g Second solvent (S2): methylene chloride Third solvent (S13): Ethanol Solid content ratio of the composition: 10.0% by mass (A260), 9.7% by mass (A261) Content (η) of the third solvent (S13) in the total solvents contained in the composition: 0.0 mass% (A260), 4.0 mass% (A261)

[0408] Next, a layer (D1-A261) was produced from the composition A261 in the same manner as in the production of the layer (D1-A21) group. The haze of the layer (D1-A261) was measured. The results are shown in Table 8.

[0409] Example A27 (Preparation of Example A27 Group of Compositions and Layers (D1-A271)) A liquid composition A27 containing compound (reaction product) A-27 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as raw materials for the composition. The solid content of composition A27 was calculated, and the ratio of the mass of compound A-27 to the mass of the solid content of composition A27 was calculated to be 0.39, and the ratio of the mass of polymer B1-1 to the mass of compound A-27 was calculated to be 1.57. Based on the calculated solid content of composition A27, methylene chloride was further added to composition A27 to adjust the solid content to 10.0 mass% to obtain composition A270. Ethanol (Kanto Chemical Co., Ltd., EL grade for electronics industry) was further added to composition A270 as a third solvent (S13), as described below, to obtain composition A271, which has a solid content of 9.7 mass%. Details of each composition are shown in Tables 4 and 5.

[0410] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: Ethyl phosphonic acid 2.259g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-1 10.00g Second solvent (S2): methylene chloride Third solvent (S13): Ethanol Solid content ratio of the composition: 10.0% by mass (A270), 9.7% by mass (A271) Content (η) of the third solvent (S13) in the total solvents contained in the composition: 0.0 mass% (A270), 4.0 mass% (A271)

[0411] Next, a layer (D1-A271) was produced from the composition A271 in the same manner as in the production of the layer (D1-A21) group. The haze of the layer (D1-A271) was measured. The results are shown in Table 8.

[0412] Example A28 (Preparation of Example A28 Group of Compositions and Layers (D1-A281)) A liquid composition A28 containing compound (reaction product) A-28 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as raw materials for the composition. The solid content ratio of composition A28 was calculated, and the ratio of the mass of compound A-28 to the mass of the solid content of composition A28 was calculated to be 0.42, and the ratio of the mass of polymer B1-1 to the mass of compound A-28 was calculated to be 1.37. Based on the calculated solid content of composition A28, methylene chloride was further added to composition A28 to adjust the solid content to 10.0 mass% to obtain composition A280. Methanol (Kanto Chemical Co., Ltd., EL grade for electronics industry) was further added to composition A280 as a third solvent (S13), as described below, to obtain composition A281, which had a solid content of 9.5 mass%. Details of each composition are shown in Tables 4 and 5.

[0413] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-hexylphosphonic acid 3.472g Phosphate ester: Plysurf A208N 2.572g Polymer (B1): Polymer B1-1 10.00g Second solvent (S2): methylene chloride Third solvent (S13): methanol Solid content ratio of the composition: 10.0% by mass (A280), 9.5% by mass (A281) Content (η) of the third solvent (S13) in the total solvents contained in the composition: 0.0 mass% (A280), 6.0 mass% (A281)

[0414] Next, a layer (D1-A281) was produced from the composition A281 in the same manner as in the production of the layer (D1-A21) group. The haze of the layer (D1-A281) was measured. The results are shown in Table 8.

[0415] Example A29 (Preparation of Example A29 Group of Compositions and Layers (D1-A290)) A liquid composition A29 containing compound (reaction product) A-29 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as raw materials for the composition. The solid content ratio of composition A29 was calculated, and the ratio of the mass of compound A-29 to the mass of the solid content of composition A29 was calculated to be 0.26, and the ratio of the mass of polymer B1-2 to the mass of compound A-29 was calculated to be 2.89. Based on the calculated solid content of composition A29, methylene chloride was further added to composition A29 to adjust the solid content to 10.0 mass % to obtain composition A290. Details of each composition are shown in Tables 4 and 5.

[0416] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-2 20.00g Second solvent (S2): methylene chloride Third solvent (S13): None Solid content of the composition: 10.0% by mass (A290) Content (η) of the third solvent in the total solvent contained in the composition: 0% by mass (A290)

[0417] Next, a layer (D1-A290) was prepared from the composition A290 in the same manner as in the preparation of the layer (D1-A21). The haze of the layer (D1-A290) was measured. The results are shown in Table 8.

[0418] Example A30 (Preparation of Example A30 Group of Compositions and Layers (D1-A301)) A liquid composition A30 containing compound (reaction product) A-30 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as raw materials for the composition. The solid content ratio of composition A30 was calculated, and the ratio of the mass of compound A-30 to the mass of the solid content of composition A30 was calculated to be 0.19, and the ratio of the mass of polymer B1-2 to the mass of compound A-30 was calculated to be 4.33. Based on the calculated solid content of composition A30, methylene chloride was further added to composition A30 to adjust the solid content to 10.0 mass% to obtain composition A300. Methanol (Kanto Chemical Co., Inc., EL grade for electronics industry) was further added to composition A300 as a third solvent (S13), as described below, to obtain composition A301, which had a solid content of 9.5 mass%. Details of each composition are shown in Tables 4 and 5.

[0419] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-2 30.00g Second solvent (S2): methylene chloride Third solvent (S13): methanol Solid content ratio of the composition: 10.0% by mass (A300), 9.5% by mass (A301) Content (η) of the third solvent in the total solvent components contained in the composition: 0% by mass (A300), 6.0% by mass (A301)

[0420] Next, a layer (D1-A301) was produced from the composition A301 in the same manner as in the production of the layer (D1-A21) group. The haze of the layer (D1-A301) was measured. The results are shown in Table 8.

[0421] Example A31 (Preparation of Example A31 Group of Compositions and Layers (D1-A311)) A liquid composition A31 containing compound (reaction product) A-31 was obtained under the same conditions and by the same method as in the preparation of composition example A21, except that the following raw materials were used as raw materials for the composition. The solid content ratio of composition A31 was calculated, and the ratio of the mass of compound A-31 to the mass of the solid content of composition A31 was calculated to be 0.41, and the ratio of the mass of polymer B1-3 to the mass of compound A-31 was calculated to be 1.45. Methanol (Kanto Chemical Co., Inc., EL grade for electronics industry) was further added as a third solvent (S13) to this composition A31, as described below, to obtain composition A311 having a solids ratio of 30.7 mass %. Details of each composition are shown in Tables 4 and 5.

[0422] raw materials First solvent (S11): methanol Copper acetate monohydrate 4.88g Phosphonic acid: n-butylphosphonic acid 2.835g Phosphate ester: Plysurf A208N 2.829g Polymer (B1): Polymer B1-3 10.0 g Second solvent (S2): methylene chloride Third solvent (S13): methanol Solid content of the composition: 30.7% by mass (A311) Content (η) of the third solvent in the total solvent contained in the composition: 6.0% by mass (A311)

[0423] Next, a layer (D1-A311) was produced from the composition A311 in the same manner as in the production of the layer (D1-A21) group. The haze of the layer (D1-A311) was measured. The results are shown in Table 8.

[0424] [Table 4]

[0425] The abbreviations in Table 4 represent the following compounds: CAM: Copper acetate monohydrate EtOH: ethanol MeOH: Methanol BPA: n-butylphosphonic acid EPA: Ethylphosphonic acid HPA: n-hexylphosphonic acid A208N: Phosphate ester (Plysurf A208N) DDP-2: Phosphate ester (NIKKOL DDP-2) DCM: methylene chloride Compound A / Solid content of composition: Ratio of the mass of compound (A) to the mass of the solid content of composition (D) Polymer B1 / Compound A: Ratio of the mass of polymer (B1) to the mass of compound (A) Compound A / Polymer B1: Ratio of the mass of compound (A) to the mass of polymer (B1)

[0426] [Table 5]

[0427] The abbreviations in Table 5 represent the following compounds: EtOH: ethanol MeOH: Methanol η: Ratio of the mass of the third solvent (S13) to the mass of all solvents contained in the composition Solid content ratio: The amount of solid content in the composition Polymer B1 / Composition: Ratio of the mass of polymer (B1) contained in the composition to the mass of the composition Compound A / Solid content of composition: mass ratio of compound (A) contained in the composition to the solid content of the composition Polymer B1 / Compound A: Ratio of the mass of polymer (B1) to the mass of compound (A) Compound A / Polymer B1: Ratio of the mass of compound (A) to the mass of polymer (B1)

[0428] [Table 6]

[0429] [Table 7]

[0430] [Table 8]

[0431] <Example D1-1> As shown in Table 9, 100 parts by mass of polymer B1-1, 50 parts by mass of compound A-8 obtained in Example A8, and dichloromethane as a solvent were mixed to prepare a solution (layer (D1)-forming composition D1-1) with a solid content of 20% by mass.

[0432] <Examples D1-2 to D1-7, Examples D1-10 to D1-13, Comparative Examples D1-8 to D1-9> Compositions D1-2 to D1-13 for forming layer (D1) were prepared in the same manner as in Example D1-1, except that in Example D1-1, the types and amounts of polymer (B1), polymer (B2), compound (A), and other compound, ultraviolet-absorbing compound (U), were changed as shown in Table 9. In Example D1-4, the Mn of the 1:1 mixture of polymer B1-2 and polymer B1-4 was 84,000 and the Mw was 260,000.

[0433] <Liquidity> The fluidity of the composition was evaluated by measuring the viscosity using a capillary rheometer (Malvern Instruments, m-VROCi) at a temperature of 15°C and a shear rate of 100 (1 / s). The results are shown in Table 9. The viscosity is preferably 8,000 to 18,000 mPa·s, and more preferably 10,000 to 15,000 mPa·s.

[0434] [Table 9]

[0435] The abbreviations in Table 9 represent the following compounds. Ultraviolet absorbing compound (U-2): A compound represented by the following formula (U-2) (maximum absorption wavelength in dichloromethane: 363 nm)

[0436] [ka]

[0437] <Preparation example D2-1> As shown in Table 10, 100 parts by mass of polymer B1-4, 0.07 parts by mass of near-infrared absorbing dye C-1, 0.07 parts by mass of near-infrared absorbing dye C-2, and dichloromethane as a solvent were mixed to prepare a solution (layer (D2)-forming composition D2-1) with a solids concentration of 20% by mass.

[0438] <Preparation example D2-2> A composition D2-2 for forming layer (D2) was prepared in the same manner as in Preparation Example D2-1, except that the type and amount of the near-infrared absorbing dye used in Preparation Example D2-1 was changed as shown in Table 10.

[0439] <Preparation example D2-3> A composition D2-3 for forming layer (D2) was prepared in the same manner as in Preparation Example D2-1, except that the ultraviolet absorbing compounds (U-1) and (U-2) were added in the amounts shown in Table 10.

[0440] [Table 10]

[0441] The near-infrared absorbing dye C-1 in Table 10 is a compound represented by the following formula (C-1) (maximum absorption wavelength in dichloromethane: 711 nm).

[0442] [ka]

[0443] Near-infrared absorbing dye C-2 in Table 10 is a compound represented by the following formula (C-2) (maximum absorption wavelength in dichloromethane: 738 nm).

[0444] [ka]

[0445] Near-infrared absorbing dye C-3 in Table 10 is a compound represented by the following formula (C-3) (maximum absorption wavelength in dichloromethane: 715 nm).

[0446] [ka]

[0447] Near-infrared absorbing dye C-4 in Table 10 is a compound represented by the following formula (C-4) (maximum absorption wavelength in dichloromethane: 776 nm).

[0448] [ka]

[0449] <Preparation example D2-4> A solution having a solids concentration of 22% by mass (layer (D2)-forming composition D2-4) was prepared by mixing 100 parts by mass of polymer B2-2-1, 0.70 parts by mass of the near-infrared absorbing dye C-1, 0.70 parts by mass of the near-infrared absorbing dye C-2, 0.40 parts by mass of KF-643 manufactured by Shin-Etsu Chemical Co., Ltd. as a surfactant, 1.8 parts by mass of γ-glycidoxypropyltrimethoxysilane as an adhesion promoter, and cyclopentanone and dichloromethane as solvents.

[0450] <Preparation example D2-5> 100 parts by mass of tricyclodecane dimethanol diacrylate, 5 parts by mass of 1-hydroxycyclohexyl phenyl ketone, 1.40 parts by mass of the near-infrared absorbing dye C-1, 1.40 parts by mass of the near-infrared absorbing dye C-2, 0.20 parts by mass of KF-643 manufactured by Shin-Etsu Chemical Co., Ltd. as a surfactant, and methyl ethyl ketone as a solvent were mixed to prepare a solution (composition D2-5 for forming layer (D2)) with a solids concentration of 35% by mass.

[0451] <Preparation example E1> 100 parts by mass of tricyclodecane dimethanol diacrylate, 5 parts by mass of 1-hydroxycyclohexyl phenyl ketone, 0.20 parts by mass of KF-643 manufactured by Shin-Etsu Chemical Co., Ltd. as a surfactant, and methyl ethyl ketone as a solvent were mixed to prepare a solution (composition E1) with a solids concentration of 35% by mass.

[0452] [Example P1] The layer (D1)-forming composition D1-1 was cast onto a smooth glass plate, dried at 20° C. for 8 hours, and then peeled off from the glass plate. The peeled coating film was further dried under reduced pressure at 120° C. for 8 hours to produce a layer (D1) D1-1 having a thickness of 0.10 mm, a length of 60 mm, and a width of 60 mm.

[0453] The layer (D2)-forming composition D2-1 was cast onto a smooth glass plate, dried at 20° C. for 8 hours, and then peeled off from the glass plate. The peeled coating film was further dried under reduced pressure at 100° C. for 8 hours to produce a layer (D2) D2-1 having a thickness of 0.05 mm, a length of 60 mm, and a width of 60 mm.

[0454] Methyl-n-pentyl ketone was applied to layer D1-1 using a bar coater to a liquid film thickness of 2.0 μm, and then layer D2-1 was laminated onto the surface coated with methyl-n-pentyl ketone using a laminator (manufactured by Ubon Co., Ltd., product name: Lamyman IKO-650E) to produce substrate EX1-Sub with a thickness of 0.15 mm.

[0455] Composition E1 was applied to one of the main surfaces of substrate EX1-Sub using a bar coater, and heated in an oven at 70°C for 2 minutes to volatilize and remove the solvent. At this time, the application conditions of the bar coater were adjusted so that the thickness after drying would be 2 µm. Next, a conveyor-type exposure machine was used to expose the film (exposure dose 500 mJ / cm 2 , 200 mW) to cure the composition E1 and form an overcoat layer on the substrate EX1-Sub. Similarly, an overcoat layer made of composition E1 was formed on the other main surface of the substrate EX1-Sub to obtain the substrate EX1-Stack (a lamination method similar to the lamination method for the substrates described above is hereinafter also referred to as "lamination method 1"). The spectral transmittance of this substrate was measured using a model "V-7300" manufactured by JASCO Corporation. The obtained transmission spectrum is shown in FIG. 11.

[0456] Next, a dielectric multilayer film (I) was formed on one of the main surfaces of the obtained substrate EX1-Stack (on the overcoat layer formed on layer (D2)), and a dielectric multilayer film (II) was further formed on the other main surface of the substrate (on the overcoat layer formed on layer (D1)), thereby producing an optical filter with a thickness of approximately 0.159 mm.

[0457] Dielectric multilayer film (I) is made by alternately laminating silica (SiO2) layers and titania (TiO2) layers at a deposition temperature of 100°C (26 layers in total). Dielectric multilayer film (II) is made by alternately laminating silica (SiO2) layers and titania (TiO2) layers at a deposition temperature of 100°C (20 layers in total). In both dielectric multilayer films (I) and (II), the silica and titania layers are alternately laminated from the substrate side in the order titania layer, silica layer, titania layer, silica layer, titania layer, silica layer, with the silica layer being the outermost layer of the optical filter.

[0458] The dielectric multilayer films (I) and (II) (hereinafter, this design may be referred to as "Design 1") were designed as follows. The thickness and number of each layer were optimized using optical thin film design software (EssentialMacleod, manufactured by ThinFilmCenter) in accordance with the wavelength-dependent characteristics of the refractive index of the substrate so as to achieve an anti-reflection effect in the visible light region and the desired cut performance in the near-infrared region. When performing optimization, the input parameters (target values) to the software in this Example P1 were as shown in Table 11 below.

[0459] [Table 11]

[0460] As a result of optimizing the film structure, in Example P1, the dielectric multilayer film (I) was a multilayer vapor deposition film with 26 layers, consisting of alternating silica layers with physical film thicknesses of approximately 31 to 157 nm and titania layers with physical film thicknesses of approximately 10 to 95 nm. The dielectric multilayer film (II) was a multilayer vapor deposition film with 20 layers, in which silica layers with a physical thickness of about 37 to 194 nm and titania layers with a physical thickness of about 12 to 114 nm were alternately laminated. Table 12 shows an example of an optimized film configuration.

[0461] [Table 12]

[0462] <Bending resistance> The bending resistance of the obtained layer (D1) was evaluated using a TQC cylindrical mandrel bending tester manufactured by Cortec Co., Ltd., and the mandrel diameter Φ (mm) at which the optical filter broke was calculated. The results are shown in Table 15. Note that the case where the optical filter did not break even when a Φ2 mm mandrel was used was recorded as "no cracks."

[0463] <Optical properties> The transmittance of light incident perpendicularly to the main surface of the obtained optical filter was measured using a "V-7300" spectrometer manufactured by JASCO Corporation, and the average transmittance at wavelengths of 450 to 580 nm and the average transmittance at wavelengths of 800 to 1000 nm were calculated. The results are shown in Table 15, and the obtained transmission spectrum is shown in Figure 15.

[0464] <Durability> The optical filter, cut into 3 cm squares, was placed in a constant temperature and humidity oven (Espec Corp.: SH-222) set to 85°C / 85% RH and allowed to stand for 1000 hours. After 1000 hours, the spectral characteristics in each wavelength region were measured using a "V-7300," and the average transmittance in the wavelength range of 450 to 580 nm and the average transmittance in the wavelength range of 800 to 1000 nm were calculated. The results are shown in Table 15. The durability of the optical filter can be evaluated from the difference in the average transmittance values ​​before and after placing the filter in the constant temperature and humidity oven.

[0465] [Example P2] A substrate EX2-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, layer (D1) forming composition D1-2 was used to prepare layer (D1) forming composition D1-2 instead of layer (D1) forming composition D1-1. The spectral transmittance of the prepared substrate was measured in the same manner as in Example P1, and the obtained transmission spectrum is shown in FIG. The optical filter thus produced was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15, and the obtained transmission spectrum is shown in FIG.

[0466] [Example P3] A substrate EX3-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, layer (D1) forming composition D1-3 was used to prepare layer (D1) forming composition D1-1 instead of layer (D1) forming composition D1-3. The spectral transmittance of the prepared substrate was measured in the same manner as in Example P1, and the obtained transmission spectrum is shown in FIG. The optical filter thus produced was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15, and the obtained transmission spectrum is shown in FIG.

[0467] [Example P4] Layer (D1)-forming composition D1-3 was cast onto a smooth glass plate, dried at 20°C for 8 hours, and then peeled off from the glass plate. The peeled coating film was further dried under reduced pressure at 120°C for 8 hours to produce layer D1-3A having a thickness of 0.10 mm, length of 60 mm, and width of 60 mm. Furthermore, layer D1-3B having a thickness of 0.10 mm, length of 60 mm, and width of 60 mm was produced using the same procedure.

[0468] Methyl-n-pentyl ketone was applied to layer D1-3A using a bar coater to a liquid film thickness of 2.0 μm, and then layer D1-3B was laminated onto the surface coated with methyl-n-pentyl ketone using a laminator (manufactured by Ubon Co., Ltd., product name: Lamyman IKO-650E) to produce layer D1-3 as layer (D1).

[0469] Composition E1 was applied to one of the main surfaces of layer D1-3 using a bar coater, and heated in an oven at 70°C for 2 minutes to volatilize and remove the solvent. At this time, the application conditions of the bar coater were adjusted so that the thickness after drying would be 2 µm. Next, a conveyor-type exposure machine was used to expose the film (exposure dose 500 mJ / cm 2 , 200 mW) to cure the composition E1 and form an intermediate layer on the layer D1-3. Similarly, an overcoat layer made of the composition E1 was formed on the other main surface of the layer D1-3, forming an overcoat layer on the layer D1-3.

[0470] Next, composition D2-4 for forming layer (D2) was applied onto the intermediate layer using a bar coater so that the thickness after drying would be 10 μm, and the mixture was heated in an oven at 70°C for 3 minutes to evaporate and remove the solvent.Then, the mixture was heated in an oven at 150°C for 20 minutes to form layer D2-4 on the intermediate layer.

[0471] Furthermore, composition E1 was applied onto the layer D2-4 using a bar coater, and heated in an oven at 70°C for 2 minutes to volatilize and remove the solvent. At this time, the application conditions of the bar coater were adjusted so that the thickness after drying would be 2 µm. Next, a conveyor-type exposure machine was used to expose the film (exposure dose 500 mJ / cm 2 , 200 mW) to cure the composition E1 and form an overcoat layer on the layer D2-4, thereby obtaining a substrate EX4-Stack (a lamination method similar to the lamination method for the substrate described above is also referred to as "lamination method 2" below). The spectral transmittance of the prepared substrate was measured in the same manner as in Example P1, and the obtained transmission spectrum is shown in FIG.

[0472] In the same manner as in Example P1, an optical filter was produced by forming a dielectric multilayer film (I) on one of the main surfaces of the substrate EX4-Stack (on the overcoat layer formed on layer D2-4) and forming a dielectric multilayer film (II) on the other main surface of the substrate EX4-Stack. Using the prepared optical filter, various properties were evaluated in the same manner as in Example P1. The results are shown in Table 15, and the obtained transmission spectrum is shown in Figure 18.

[0473] [Example P5] In Example P1, the layer (D1) forming composition D1-4 was used in place of the layer (D1) forming composition D1-1 to produce a layer D1-4 having a thickness of 0.20 mm.

[0474] Composition E1 was applied to one of the main surfaces of layer D1-4 using a bar coater, and heated in an oven at 70°C for 2 minutes to volatilize and remove the solvent. At this time, the application conditions of the bar coater were adjusted so that the thickness after drying would be 2 µm. Next, a conveyor-type exposure machine was used to expose the film (exposure dose 500 mJ / cm 2 , 200 mW) to cure the composition E1 and form an intermediate layer on the layer D1-4. Similarly, an overcoat layer made of the composition E1 was formed on the other main surface of the layer D1-4.

[0475] Next, composition D2-5 for forming layer (D2) was applied onto the intermediate layer using a bar coater so that the thickness after drying would be 5 μm, and the layer was heated in an oven at 70°C for 3 minutes to evaporate and remove the solvent, and then heated in an oven at 150°C for 20 minutes to form layer D2-5.

[0476] Furthermore, composition E1 was applied onto the layer D2-5 using a bar coater, and heated in an oven at 70°C for 2 minutes to volatilize and remove the solvent. At this time, the application conditions of the bar coater were adjusted so that the thickness after drying would be 2 µm. Next, a conveyor-type exposure machine was used to expose the film (exposure dose 500 mJ / cm 2 , 200 mW) to cure the composition E1 and form an overcoat layer on the layer D2-5, thereby obtaining a substrate EX5-Stack (a lamination method similar to the lamination method for the substrate described above is also referred to as "lamination method 3" below).

[0477] Next, a dielectric multilayer film (III) was formed on one of the main surfaces of the obtained substrate EX5-Stack (on the overcoat layer formed on layer D2-5), and a dielectric multilayer film (IV) was further formed on the other main surface of the substrate, thereby producing an optical filter with a thickness of approximately 0.213 mm.

[0478] Dielectric multilayer film (III) is formed by alternately laminating silica (SiO2) layers and titania (TiO2) layers at a deposition temperature of 100°C (38 layers in total). Dielectric multilayer film (IV) is formed by alternately laminating silica (SiO2) layers and titania (TiO2) layers at a deposition temperature of 100°C (8 layers in total). In both dielectric multilayer films (III) and (IV), the silica and titania layers are alternately laminated in the following order from the substrate side: titania layer, silica layer, titania layer, silica layer, titania layer, silica layer, with the silica layer being the outermost layer of the optical filter.

[0479] The dielectric multilayer films (III) and (IV) (hereinafter also referred to as "Design 2") were designed in the same manner as in Example P1, except that the input parameters for optimization were set as shown in Table 13 below.

[0480] [Table 13]

[0481] As a result of optimizing the film structure, in Example P5, the dielectric multilayer film (III) was a multilayer vapor deposition film with 38 layers, consisting of alternating silica layers with physical film thicknesses of approximately 27 to 174 nm and titania layers with physical film thicknesses of approximately 10 to 101 nm. The dielectric multilayer film (IV) was a multilayer vapor deposition film with eight layers, in which silica layers with a physical thickness of about 12 to 107 nm and titania layers with a physical thickness of about 12 to 78 nm were alternately laminated. Table 14 shows an example of an optimized film configuration.

[0482] [Table 14]

[0483] The optical filter thus produced was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15, and the obtained transmission spectrum is shown in Figure 19.

[0484] [Example P6] Layer (D1)-forming composition D1-5 was cast onto a smooth glass plate, dried at 20°C for 8 hours, and then peeled off from the glass plate. The peeled coating film was further dried under reduced pressure at 120°C for 8 hours to produce layer D1-5A having a thickness of 0.10 mm, length of 60 mm, and width of 60 mm. Furthermore, layer D1-5B having a thickness of 0.10 mm, length of 60 mm, and width of 60 mm was produced using the same procedure.

[0485] Methyl-n-pentyl ketone was applied to layer D1-5A using a bar coater to a liquid film thickness of 2.0 μm, and then layer D1-5B was laminated onto the surface coated with methyl-n-pentyl ketone using a laminator (manufactured by Ubon Co., Ltd., product name: Lamyman IKO-650E) to produce layer D1-5 as layer (D1).

[0486] A substrate EX6-Stack and an optical filter were prepared in the same manner as in Example P1, except that the prepared layer D1-5 was used instead of the layer D1-1 in Example P1, and the layer (D2)-forming composition D2-2 was used instead of the layer (D2)-forming composition D2-1 in Example P1. The optical filter thus prepared was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15.

[0487] [Example P7] A substrate EX7-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, the layer (D1) forming composition D1-6 was used to prepare the layer (D1) forming composition D1-1 instead of the layer (D1) forming composition D1-6. The optical filter thus prepared was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15.

[0488] [Example P8] A substrate EX8-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, layer (D1) forming composition D1-7 was used to prepare layer (D1) forming composition D1-1 instead of layer (D1) forming composition D1-7. The optical filter thus prepared was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15.

[0489] [Example P9] A substrate EX9-Stack and an optical filter were prepared in the same manner as in Example P8, except that in Example P8, layer (D2) forming composition D2-3 was used to prepare layer (D2) forming composition D2-3 instead of layer (D2) forming composition D2-1. The optical filter thus prepared was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15.

[0490] [Example P10] In Example P1, the layer (D1)-forming composition D1-1 was replaced with the liquid composition A211 (hereinafter referred to as the layer (D1)-forming composition D1-A211) prepared above to prepare a layer D1-A211 having a thickness of 0.10 mm, a length of 60 mm, and a width of 60 mm. Except for this, the layer (D2)-forming composition D2-2 was replaced with the layer (D2)-forming composition D2-1 to prepare the layer D2-2, and the substrate EX10-Stack and the optical filter were prepared in the same manner as in Example P1. The spectral transmittance of the prepared substrate was measured in the same manner as in Example P1, and the obtained transmission spectrum is shown in FIG. The optical filter thus produced was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15, and the obtained transmission spectrum is shown in FIG.

[0491] [Example P11] A substrate EX11-Stack and an optical filter were prepared in the same manner as in Example P10, except that in Example P10, the layer (D1)-forming composition D1-A211 was replaced with the liquid composition A242 prepared above (hereinafter referred to as the layer (D1)-forming composition D1-A242) to prepare a layer D1-A242 having a thickness of 0.10 mm, a length of 60 mm, and a width of 60 mm. The spectral transmittance of the prepared substrate was measured in the same manner as in Example P1, and the obtained transmission spectrum is shown in FIG. The optical filter thus produced was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15, and the obtained transmission spectrum is shown in FIG.

[0492] [Example P12] A substrate EX12-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, layer (D1)-forming composition D1-1 was replaced with layer (D1)-forming composition D1-10 to prepare layer D1-10, and the thickness of layer D2-1 was set to 75 μm. The spectral transmittance of the prepared substrate was measured in the same manner as in Example P1, and the obtained transmission spectrum is shown in FIG. The optical filters thus prepared were evaluated for various properties in the same manner as in Example P1. The results are shown in Table 15.

[0493] [Example P13] A substrate EX13-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, the layer (D1)-forming composition D1-11 was used to prepare the layer (D1)-forming composition D1-11. The optical filters thus prepared were evaluated for various properties in the same manner as in Example P1. The results are shown in Table 15.

[0494] [Example P14] A substrate EX14-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, the layer (D1)-forming composition D1-12 was used to prepare the layer (D1)-forming composition D1-12 instead of the layer (D1)-forming composition D1-1. The optical filters thus prepared were evaluated for various properties in the same manner as in Example P1. The results are shown in Table 15.

[0495] [Example P15] A substrate EX15-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, the layer (D1)-forming composition D1-13 was used to prepare the layer (D1)-forming composition D1-13 instead of the layer (D1)-forming composition D1-1. The optical filters thus prepared were evaluated for various properties in the same manner as in Example P1. The results are shown in Table 15.

[0496] [Comparative Example P1] A substrate CEX1-Stack and an optical filter were prepared in the same manner as in Example P1, except that in Example P1, layer (D1) forming composition D1-8 was used to prepare layer (D1) forming composition D1-8 instead of layer (D1) forming composition D1-1. The optical filter thus prepared was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15.

[0497] [Comparative Example P2] A substrate CEX2-Stack and an optical filter were prepared in the same manner as in Example P9, except that in Example P9, layer D1-9 was prepared using layer (D1) forming composition D1-9 instead of layer (D1) forming composition D1-7. The optical filter thus prepared was used to evaluate various properties in the same manner as in Example P1. The results are shown in Table 15.

[0498] [Table 15] [Explanation of symbols]

[0499] 1. Optical filter 24. Image sensor 25...Image sensor frame 26...frame 31.. Enclosure 32...Lens 33. Lens replacement optical elements such as Fresnel zone plates and Fresnel lenses

Claims

1. Composition (D), The composition (D) contains a light-absorbing compound (A) containing a phosphonic acid component and a copper component, and a cyclic olefin polymer (B1), the cyclic olefin polymer (B1) in the composition (D) as a whole has a weight average molecular weight (Mw) of 150,000 to 1,000,000 in terms of polystyrene, as measured by gel permeation chromatography (GPC); Composition (D).

2. The content of solids in the composition (D) is 2 to 85 mass %, the content of the polymer (B1) relative to 100% by mass of the composition (D) is 1 to 80% by mass, the content of the polymer (B1) relative to 1 part by mass of the compound (A) is 0.1 to 7 parts by mass; The composition (D) according to claim 1.

3. The polymer (B1) is a compound represented by the following formula (X 0 ) and a monomer represented by the following formula (Y 0 2. The composition (D) according to claim 1, which is a polymer obtained using at least one monomer selected from the group consisting of monomers represented by the formula: 【Chemical 1】 [Formula (X 0 ) Medium, R x1 ~R x4 are each independently an atom or group selected from the following (i') to (ix'), and k x , m x and p x are each independently an integer of 0 to 4. (i') a hydrogen atom (ii') a halogen atom (iii') a trialkylsilyl group (iv') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms and having a linking group containing an oxygen atom, a sulfur atom, a nitrogen atom, or a silicon atom. (v') a substituted or unsubstituted hydrocarbon group having 1 to 30 carbon atoms (vi') Polar group (excluding (iv')) (vii') R x1 and R x2 and form one alkylidene group, or R x3 and R x4 and form one alkylidene group (however, R x1 ~R x4 are each independently an atom or group selected from (i') to (vi'). (viii') R x1 and R x2 and R form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring together with the carbon atom to which they are attached, or x3 and R x4 and form a monocyclic or polycyclic hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are bonded (provided that R not involved in the hydrocarbon ring or heterocyclic ring x1 ~R x4 are each independently an atom or group selected from (i') to (vi'). (ix') R x2 and R x3 and form a monocyclic hydrocarbon ring or heterocyclic ring together with the carbon atoms to which they are bonded (provided that R not involved in the hydrocarbon ring or heterocyclic ring x1 and R x4 are each independently an atom or group selected from (i') to (vi'). 【Chemistry 2】 [Formula (Y 0 ) Medium, R y1 and R y2 are each independently an atom or group selected from (i') to (vi') above, or R y1 and R y2 and form, together with the carbon atoms to which they are bonded, a monocyclic or polycyclic alicyclic hydrocarbon, an aromatic hydrocarbon, or a heterocyclic ring, and k y and p y are each independently an integer of 0 to 4.

4. The composition (D) according to claim 1, further comprising an ultraviolet absorbing compound (U).

5. The composition (D) according to claim 1, further comprising a dye (C) other than the compound (A).

6. The composition (D) according to claim 1, wherein the transmission spectrum of the composition (D) (wherein the transmission spectrum of the composition (D) is adjusted so that the transmittance at a wavelength of 800 nm is 10%±1%) satisfies the following requirements (i) to (iv): (i) The average transmittance in the wavelength range of 800 to 1100 nm is 10% or less. (ii) The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. (iii) has a first cutoff wavelength in the wavelength range of 680 to 780 nm, at which the transmittance is 50%; (iv) A second cutoff wavelength in the wavelength range of 320 to 380 nm at which the transmittance is 50%.

7. The composition (D) according to claim 6, wherein the transmission spectrum further satisfies the following requirement (v): (v) The standard deviation of the transmittance in the wavelength range of 900 to 1100 nm is 0.5% or less.

8. A method for producing the composition (D) of claim 1, comprising: Step 1: mixing a copper compound, a phosphonic acid compound, and a first solvent (S11) to prepare a liquid (r1) containing the compound (A); a step 2 of mixing the polymer (B1) with a second solvent (S2) to prepare a liquid (r2) containing the polymer (B1); Step 3 of mixing the liquid (r1) obtained in step 1 with the liquid (r2) obtained in step 2, or mixing the compound (A) obtained by separation from the liquid (r1) obtained in step 1 with the liquid (r2) obtained in step 2, to prepare a liquid (r3) containing the compound (A) and the polymer (B1); and Step 4: Mixing the liquid (r3) obtained in step 3 with a third solvent (S13) to prepare a composition (D). Including, The content of solids in the composition (D) is 2 to 50 mass %, the content of the polymer (B1) relative to 100% by mass of the composition (D) is 1 to 30% by mass, the content of the polymer (B1) relative to 1 part by mass of the compound (A) is 0.5 to 7 parts by mass, The content of the third solvent (S13) relative to 100% by mass of all solvents contained in the composition (D) is 0% by mass or more. 0 Less than mass% (however, r 0 is the content of the third solvent (S13) is r 0 % by mass or more, the second solvent (S2) and the third solvent (S13) form an azeotropic mixture. Method for producing composition (D).

9. The solubility parameter SP2 of the second solvent (S2) is 7 to 11 (cal / cm 3 ) 1 / 2 and The solubility parameter SP3 of the third solvent (S13) is 10 to 16 (cal / cm 3 ) 1 / 2 The method for producing the composition (D) according to claim 8, wherein

10. The method for producing composition (D) according to claim 8, wherein the transmission spectrum of composition (D), which is standardized so that the transmittance at a wavelength of 900 nm is 10%, satisfies the following requirements (p) to (s): (p) The average transmittance in the wavelength range of 460 to 580 nm is 65% or more. (q) The standard deviation of the transmittance in the wavelength range of 850 to 1100 nm is 1% or less. (r) having a first cutoff wavelength at which the transmittance is 50% in the wavelength range of 730 to 790 nm; (s) having a second cutoff wavelength in the wavelength range of 330 to 450 nm at which the transmittance is 50%;

11. The method for producing composition (D) according to claim 10, wherein the transmission spectrum further satisfies the following requirements (t) and (u): (t) When the wavelength showing the maximum transmittance in the wavelength range of 400 to 700 nm is λM [nm], the average increase in transmittance per unit wavelength of the transmittance spectrum in the wavelength range of 400 to λM [nm] is 0.18 [% / nm] or less. (u) Wavelength λ at which the transmittance is 30% in the wavelength range of 300 to 1000 nm S [nm] and λ L [nm] exists (where λ S <λ L ), λ S ~λ L When the transmittance is measured at each wavelength in 1 nm increments, the skewness of the transmittance is -1.5 or more.

12. An optical film formed from the composition (D) according to any one of claims 1 to 7.

13. A method for producing an optical film, comprising forming an optical film using the composition (D) obtained by the method for producing the composition (D) according to any one of claims 8 to 11.

14. A layer (D1) formed from the composition (D) according to any one of claims 1 to 7, which has a transmission spectrum that satisfies the following requirements (I) to (V): (I) The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. (II) The average transmittance in the wavelength range of 800 to 1100 nm is 5% or less. (III) A third cutoff wavelength in the wavelength range of 680 to 730 nm at which the transmittance is 50%. (IV) A fourth cutoff wavelength in the wavelength range of 340 to 400 nm, at which the transmittance is 50%. (V) The transmittance at a wavelength of 950 nm is 1% or less.

15. A method for producing a layer (D1), comprising forming the layer (D1) using a composition (D) obtained by the method for producing a composition (D) according to any one of claims 8 to 11, wherein the composition (D) has a transmission spectrum standardized to have a transmittance of 1% at a wavelength of 850 nm and satisfies the following requirements (IX) to (XIII): (IX) The average transmittance in the wavelength range of 460 to 580 nm is 80% or more. (X) The average transmittance in the wavelength range of 850 to 1100 nm is 3% or less. (XI) A third cutoff wavelength at which the transmittance is 50% is in the wavelength range of 690 to 750 nm. (XII) A fourth cutoff wavelength at which the transmittance is 50% is in the wavelength range of 325 to 385 nm. (XIII) The transmittance at a wavelength of 950 nm is 3% or less.

16. An optical filter having a layer (D1) formed from the composition (D) according to claim 1.

17. A layer (D1) formed from the composition (D) according to claim 1; a layer (D2) formed from a composition (D2) containing a dye (C) other than the compound (A), a polymer (B2-1), and at least one compound selected from the group consisting of a curable compound (B2-2) that is cured by light or heat; Optical filter.

18. 17. The optical filter according to claim 16, comprising a dielectric multilayer film.

19. An optical element comprising the optical filter according to any one of claims 16 to 18.

20. A solid-state imaging device comprising the optical filter according to any one of claims 16 to 18.

21. A camera module comprising the optical filter according to any one of claims 16 to 18.

Images