Chemical and / or electrolytic surface treatment systems for substrates

Abstract

The present disclosure relates to a system for chemical and / or electrolytic surface treatment of a substrate comprising a catholyte chamber, an anolyte chamber, a distributor and a catholyte outlet. The distributor is arranged in the catholyte chamber, which is separated from the anolyte chamber by a membrane. The membrane is inclined with respect to the distributor. The distributor comprises a jet opening for dispensing catholyte onto the substrate to be treated and a drain opening for draining the catholyte from a reaction space between the distributor and the substrate. The catholyte outlet is arranged in an eccentric position in the catholyte chamber.

Description

[Technical field]

[0001] The present disclosure relates to a system for the chemical and / or electrolytic surface treatment of a substrate. [Background technology]

[0002] When carrying out chemical and / or electrolytic surface treatment of substrates, in particular electroplating processes in the microelectronics industry, it becomes increasingly important to protect the chemical electrolyte mixtures, which are complex, expensive and often contain oxidation-sensitive additives, from being consumed by side reactions instead of being available for the deposition process itself. Such side reactions, which result in expensive electrolyte losses and other problems, such as increased chemical waste, are often due to oxidation processes caused by contact of the electrolyte additives with the anode or, less considered, by contact of the electrolyte with air (containing oxygen).

[0003] This problem is particularly acute for some specific plating processes - e.g., gold (Au), SnAg, Cu and / or other metals - that use expensive chemical electrolyte mixtures that contain oxidation-sensitive additive molecules that can oxidize and become unusable when in contact with the anode or air (which contains oxygen).

[0004] At the same time, performing surface treatments such as electroplating processes in the microelectronics industry to required standards means achieving an extremely uniform deposition profile as quickly as possible across the entire surface area of ​​the substrate.

[0005] Often complex and expensive equipment must be designed, reliably constructed, operated and maintained to ensure adequate distribution of plating electrolyte and current distribution over the surface to achieve high processing rates, particularly with high uniformity at the same time. For example, to achieve this, known systems are generally constructed to ensure particularly good rotationally symmetric drainage of electrolyte from the plating chamber.

[0006] However, hardware features provided in electroplating chambers to improve desired plating uniformity and plating speed, such as HSP systems (high speed plating), symmetric electrolyte drainage systems, or dual electrolyte plating systems (anolyte and catholyte), can result in electroplating chambers with exceptionally large exterior dimensions. Summary of the Invention [Problem to be solved by the invention]

[0007] There is therefore a need for improved systems for chemical and / or electrolytic surface treatment of substrates in terms of deposition uniformity at high rates and / or protection of the electrolytic mixture and / or a system configured to allow for a smaller size and / or simplified construction than prior art systems. [Means for solving the problem]

[0008] One or more of these problems are solved by the subject matter of the independent claims of the present disclosure. Further embodiments are incorporated in the dependent claims.

[0009] The system for chemical and / or electrolytic surface treatment of a substrate comprises a catholyte chamber, an anolyte chamber, a distributor and a catholyte outlet. The distributor is disposed in the catholyte chamber, which is separated from the anolyte chamber by a membrane. The membrane is inclined relative to the distributor. The membrane may be inclined to merge and remove gas bubbles generated at the anode. The removal of the gas bubbles may be assisted by an anolyte flow. The distributor comprises a jet opening for dispensing catholyte onto the substrate and a drain opening for draining the catholyte from a reaction space between the distributor and the substrate. The catholyte outlet is disposed in an eccentric position in the catholyte chamber.

[0010] The advantage of this configuration is that the system allows to ensure high speed deposition uniformity and protection of the electrolytic mixture, i.e. the anolyte and catholyte, as well as simplification and / or size reduction of the system, due to the claimed synergistic effects. The concentric arrangement allows the system to be simplified. Ideal uniformity can be provided together with other features. Moreover, the membrane allows a good separation of the anolyte and catholyte regions. Especially in combination with other features, the system may allow optimal processing in terms of uniformity and speed, especially when used in conjunction with the jet and discharge openings. Thus, the combination of the claimed features can simultaneously synergistically provide an ideal configuration in terms of system size / complexity as well as uniformity and high speed processing.

[0011] The chemical and / or electrolytic surface treatment of the substrate may include electrolytic plating processes, particularly electrolytic plating of gold (Au), SnAg, Cu, and / or other metals.

[0012] The substrate may include a conductive plate, a membrane substrate, an essentially flat metal or metallized sample, etc. The substrate may be held in a substrate holder.

[0013] For electrolytic surface treatment of a substrate, the substrate and the anode are connected via a current supply so as to function primarily as a cathode and an anode.

[0014] The anolyte and the catholyte are liquids that provide the function of an electrolyte.

[0015] The term "membrane" may be understood as a selective barrier that allows some moieties (such as small molecules, ions, other small particles, etc.) to pass while stopping or at least reducing the passage of others.

[0016] When the system is adjusted for its intended use, the membrane may be inclined relative to a horizontal plane. The distributor may be arranged horizontally when the system is adjusted for its intended use. This is an optional embodiment. In the present disclosure, this means that the jet openings and the exhaust openings are arranged in a horizontally arranged array. This is an optional embodiment. The jet openings and / or the exhaust openings may be arranged to extend vertically when the system is adjusted for its intended use, in particular when the distributor is arranged horizontally. The system may be configured to hold a substrate parallel to the distributor, in particular in a parallel arrangement, when the system is adjusted for its intended use.

[0017] The eccentric position may refer to the center of the distributor, particularly a centerline extending vertically when the system is adjusted for the intended application. The eccentric position may refer to the center of the distributor, particularly a centerline extending perpendicularly to the longitudinal direction of the distributor. When the distributor has a cylindrical shape, the center referred to by the eccentricity may be the axis of the cylinder.

[0018] The membrane may be a permeable ion-selective anode membrane. The membrane may be configured to prevent certain particles or bubbles from the anode region, such as particles generated at the anode, from entering the catholyte and reaching the substrate, and to prevent certain particles from the cathode region, such as particles present in the catholyte, from entering the anode region and reaching the anode, while allowing ions to be exchanged between the anode and cathode regions of the system. The membrane may nevertheless contribute to the efficiency of the surface treatment by allowing the passage of electric current and the supply of metal ions. However, the surface treatment using the membrane is synergistically improved when combined with the features described in other claims.

[0019] An eccentric arrangement may allow for a simpler / less complicated, more robust and reliable - in particular allowing for less expensive manufacture - system for draining catholyte from the catholyte chamber. In addition, asymmetric electrolyte drainage allows the electroplating chamber to be constructed to be very compact. Another factor that may allow the electroplating chamber to be constructed to be very compact is the special configuration of the distributor in terms of resistance. This may be based on a geometric optimization of the current paths through the distributor. The use of such a system may lead to non-uniformity if not combined with the features recited in other claims.

[0020] The jet openings, especially when used in conjunction with drain holes and optionally a drain ring, allow for a particularly uniform distribution of the catholyte through the jet openings towards the substrate.

[0021] Moreover, the drain hole and optional drain ring, particularly in combination with the inclined membrane, allow efficient utilization of the eccentric catholyte drain described above.

[0022] Thus, the claimed features, each having its own advantage, have been found to act synergistically to provide further improvements.

[0023] The catholyte chamber may have a side extending essentially perpendicular to a longitudinal direction of the distribution body. The catholyte outlet may be located in the side of the catholyte chamber.

[0024] The side surface may, for example, be a sidewall of the catholyte chamber.

[0025] The longitudinal direction of the distributor may be one of a number of directions along which the jet openings and / or the discharge openings are arranged, and may extend horizontally when the distributor is arranged horizontally.

[0026] The catholyte outlet may be located below the distributor, in particular in a side of the catholyte chamber, when the system is adjusted for its intended use. In other words, the catholyte outlet may be located between the distributor and the catholyte chamber, in particular in a side of the catholyte chamber. More specifically, the catholyte outlet may communicate with the catholyte chamber at a position below the distributor, when the system is adjusted for its intended use. In other words, the catholyte outlet may communicate with the catholyte chamber at a position between the distributor and the membrane.

[0027] The cross-section of the catholyte chamber may have a wedge-shaped shape.

[0028] This means that the height of the catholyte chamber increases from the face of the catholyte chamber towards the face opposite to said face of the catholyte chamber.The wedge shape may be at least partly brought about by an inclined arrangement of the membrane.

[0029] The catholyte chamber may have a wedge-shaped configuration and be positioned such that a lower end of the catholyte chamber is tilted off-horizontal when positioned for its intended use.

[0030] An advantage of such a configuration is that it may be easier to collect catholyte at one end of the wedge, for example the lowest point of the catholyte chamber from which the catholyte drains.

[0031] Therefore, effective discharge is possible by using only one outlet.

[0032] The cross-sectional shape of the wedge-shaped catholyte chamber may have a long side and a short side, and the catholyte outlet may be located within the long side of the catholyte chamber.

[0033] In particular, the catholyte outlet may be located at the lower end of the long side, in particular when the system is adjusted for its intended use.

[0034] As an example, the top of the catholyte chamber may be positioned horizontally, particularly when the system is adjusted for its intended use, such that the long side of the catholyte chamber extends further downward than the short side.

[0035] An advantage of such a configuration is that it may be easier to collect catholyte at one point in the catholyte chamber, for example the lowest point of the catholyte chamber from which the catholyte drains.

[0036] Therefore, effective discharge is possible by using only one outlet.

[0037] The catholyte outlet may be located at a position that does not have rotational symmetry in the catholyte chamber.

[0038] The axis about which the position is not rotationally symmetric may be an axis perpendicular to the substrate surface and extending through the center of the substrate. This means that the catholyte outlet does not have to be configured and arranged such that the catholyte can be discharged from the chamber evenly around the substrate. For example, the catholyte outlet does not have to be ring-shaped. Rather, the outlet may be configured and arranged such that only one side of the chamber for the catholyte is located. This simplifies the overall system configuration.

[0039] In known systems, such an arrangement would not achieve the required uniformity, whereas the system of the present disclosure still allows for uniform deposition by the inflow of the catholyte by a jet and its discharge through the discharge holes of the distributor.

[0040] The catholyte chamber may comprise a drainage ring disposed around the distributor to drain the catholyte from a reaction space between the distributor and the substrate.

[0041] This means that a partial flow of the catholyte is discharged via the discharge ring, which may then be used as an open outlet, by way of example, to maintain a constant catholyte level in the reaction space and to vent any gas bubbles generated or transported in the reaction space. This venting method can be assisted by a rotating substrate holder.

[0042] The drain opening and / or the drain ring may be configured to drain the catholyte essentially perpendicular to a surface of the substrate to be processed.

[0043] Vertical drainage is particularly efficient at removing catholyte from the reaction space, resulting in improved uniformity.

[0044] In particular such a configuration of the drain opening and / or drain ring may be used in conjunction with a system configured such that the substrate is positioned horizontally when the system is adjusted for its intended application, in which case the opening and / or the drain ring may drain the catholyte vertically, such that the drainage is optimally gravity assisted.

[0045] The jet opening can be configured to dispense the catholyte essentially perpendicularly to the substrate to be treated, which allows the surface treatment result to be particularly uniform, even more uniform results being achievable by using a rotating substrate holder.

[0046] The discharge openings may extend from a surface of the distributor facing the substrate to a rear surface of the distributor, the rear surface being located opposite the surface facing the substrate.

[0047] This means that the catholyte flows directly through the distributor to an area where it can be easily collected and / or discharged.

[0048] The jet opening may be at least one cathode inlet that extends partially into the distributor from a surface of the distributor facing the substrate and is arranged on a side of the distributor.

[0049] This arrangement allows for optimal catholyte supply to the jet orifices, making the surface treatment very uniform.

[0050] The catholyte chamber may include a protective gas system that provides a protective gas curtain between the catholyte and the surrounding atmosphere.

[0051] For example, the protective gas system may comprise a gas inlet, a plurality of gas inlets arranged in a common plane facing each other, the or each gas inlet being configured to introduce gas into the area where the protective gas curtain is formed.

[0052] The protective gas system may also include an outlet for the gas.

[0053] Nitrogen may for example be used as a protective gas, but other types of gas may also be used, in particular a gas that prevents oxygen from the surrounding atmosphere from entering the chamber.

[0054] By using the protective gas system, the catholyte can be protected from degradation, particularly oxidation or other chemical reactions, and in particular, by using the protective gas system, oxygen-sensitive additives in the catholyte can be effectively protected from oxidizing compositions.

[0055] The system may further include a catholyte circulation system for circulating the catholyte in the catholyte chamber and an anolyte circulation system for circulating the anolyte in the anolyte chamber, the catholyte circulation system being separate from the anolyte circulation system.

[0056] The circulation system may comprise storage tanks for the catholyte and the anolyte, and a transport device, such as a pump, that drives the circulation of the catholyte and the anolyte throughout the system. Using separate circulation systems ensures reliable separation of the catholyte and the anolyte throughout the system. Furthermore, the circulation ensures bubble separation in the cathode / anode storage tanks as well as in the lines upstream of the cathode / anode storage tanks.

[0057] The membrane is permeable to electric current and metal ions, allowing for efficient surface treatment.

[0058] A switchably separated anode may be provided, arranged and configured to allow the electric field of the anode to be set to the size of the substrate, and the anode may be configured for one or more different substrate sizes.

[0059] The anolyte chamber may comprise at least one inner anolyte inlet - and optionally further inner or outer anolyte inlets - and at least one inner anolyte outlet that is selectable to adjust anolyte flow to different substrate dimensions, In other words, there may be multiple inlets and / or outlets, e.g. different inlets for different anolyte regions configured to allow independent activation of each of the multiple anolyte regions.

[0060] The at least one anolyte outlet may for example be provided at the highest point in the anolyte chamber. That is, the anolyte chamber may for example be arranged to ensure that any gas bubbles that may arise during operation are recoverable at the highest point. The system may in particular be configured such that the gas bubbles, for example mainly originating from the anode, may be removed via the anolyte outlet, for example assisted by an anolyte circulation flow. Alternatively or additionally, optionally the anolyte outlet may also be arranged at the lowest point of the anolyte chamber. That is, the anolyte outlet may be arranged to allow removal of any particles that may arise from the anolyte chamber. Due to the above features, gas bubbles and / or particles may be easily removed from the anolyte chamber. Each of the highest point and the lowest point refers to an orientation of the system for its intended operation.

[0061] For example, the inner anolyte inlet may be located closer to the center of the anolyte chamber than the outer anolyte inlet. The anolyte outlet may be located, for example, opposite the outer anolyte inlet, so that when the anolyte enters via the inner anolyte inlet and travels on its way to the anolyte outlet, it covers a shorter distance compared to anolyte entering via the outer anolyte inlet. This means that by selecting the inner anolyte inlet or the outer anolyte inlet, the anolyte flow can be tailored to different substrate sizes.

[0062] The system may have a height in the range 50-350mm.

[0063] In one example, the system may have a height in the range of 50-80 mm, preferably 60-70 mm, which allows in particular to make the overall device compact while at the same time allowing reliable protection of the anolyte and catholyte and fast and uniform surface treatment with the configurations specified in this disclosure. The height refers to the system when deployed for its intended use.

[0064] In one example - for example when tablets (eg Cu, SnAg) are used - the system may have a height in the range 200mm to 350mm - in particular 200mm to 350mm.

[0065] In other cases, for example when an inert anode is used, the system may have a height in the range of 50 mm to 200 mm, more preferably in particular 80 mm to 120 mm.

[0066] The height may refer, for example, to the combined height of the anolyte chamber, the catholyte chamber, and the reaction space.

[0067] The system is a modular system, and one or more components of the system may be provided with rapidly changing configurations that allow for efficient adaptation of the system to, for example, different substrate sizes or different process requirements. For example, a removable funnel may be provided. An optional funnel may be used between the segmented anodes to guide the electric field inside the anode chamber when two or more different substrate sizes are placed.

[0068] It shall be understood that a preferred embodiment of the present disclosure can also be any combination of the dependent claims with the independent claims.

[0069] These and other aspects of the disclosure will be apparent from and elucidated with reference to the embodiments described hereinafter. [Brief description of the drawings]

[0070] Exemplary embodiments of the present disclosure are described below with reference to the accompanying drawings. [Figure 1a] 1A and 1B illustrate schematic and exemplary cross-sectional side views of a system for chemical and / or electrolytic surface treatment of a substrate according to one embodiment. [Figure 1b] 1A and 1B illustrate schematic and exemplary cross-sectional side views of a system for chemical and / or electrolytic surface treatment of a substrate according to one embodiment. [Diagram 2]FIG. 2 shows, diagrammatically and exemplarily, an expanded view of a portion of the system of FIG. 1a or 1b. [Figure 3a] 1 shows a schematic of the flow of catholyte and anolyte through the system of FIG. 1a or 1b. [Figure 3b] 1 shows a schematic of the flow of catholyte and anolyte through the system of FIG. 1a or 1b. [Figure 3c] 1 shows a schematic of the flow of catholyte and anolyte through the system of FIG. 1a or 1b. [Figure 4] 1A and 1B illustrate schematic and exemplary cross-sectional side views of a system for chemical and / or electrolytic surface treatment of a substrate, according to one embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0071] 1a and 2 show, in a schematic and exemplary manner, an embodiment of a system 10 for chemical and / or electrolytic surface treatment of a substrate 11 according to the present disclosure. When the system is in use, the substrate 11 may be held in a substrate holder, which for illustrative purposes is not shown here and is not part of the system of the present disclosure.

[0072] The system comprises a catholyte chamber 12 for catholyte 13 and an anolyte chamber 14 for anolyte 15. The catholyte chamber 12 is separated from the anolyte chamber 14 by a membrane 18 inclined relative to a distributor 16 disposed within the catholyte chamber 12. The membrane 18 can be, for example, a membrane permeable to electric current and metal ions.

[0073] It is noted that in the present disclosure, the anolyte chamber may have one anolyte region or may have multiple anolyte regions, e.g., with anodes and funnels separated between them. When the anolyte chamber has multiple anolyte regions, the regions may be configured to be activated independently of each other. For example, there may be an inner region and an outer region, and the inner region may be activated independently of the outer region, e.g., the inner region may be activated when the outer region is deactivated, or may be activated when the outer region is activated. In other words, the system may be configured for selective activation of the inner and outer regions, e.g., the inner and outer regions may be activated together or independently of each other, based on automatic and / or user selection. For example, the inner region may be selectively activated alone or together with the outer region. There may be multiple inlets and / or outlets, e.g., different inlets for each different anolyte region, particularly configured to allow for independent activation of the anolyte regions.

[0074] 1a, the anolyte chamber 14 is shown with an inner anolyte inlet 14a, an outer anolyte inlet 14b, and an anolyte outlet 14c, which are selectable to tailor the flow of anolyte 15 to different substrate sizes. The different anode regions may be filled with pellets, which may be, for example, Cu pellets or SnAg pellets.

[0075] In this embodiment, the catholyte chamber 12 has, for example, a wedge shape in cross section. In this embodiment, for example, the wedge-shaped catholyte chamber 12 has, for example, a longer side 12a and a shorter side 12b in cross section. However, the catholyte chamber 12 may have other cross-sectional shapes.

[0076] The system further comprises a catholyte outlet 17. The catholyte outlet 17 is arranged in the catholyte chamber 12 at an eccentric position 20. More specifically, in this embodiment, the catholyte outlet 17 is arranged in one of the sides of the catholyte chamber 12, by way of example in the longer side 12a of the catholyte chamber 12. The catholyte outlet 17 is also arranged in the catholyte chamber 12 at a position 20 that is not rotationally symmetric. However, other configurations are also contemplated.

[0077] As can be seen, the catholyte outlet 17 can be located at a position below the distribution body 16, in particular at a side of the catholyte chamber, when the system is adjusted for its intended use. In other words, the catholyte outlet 17 can be located between the distribution body 16 and the membrane 18, in particular at a side of the catholyte chamber. More specifically, the catholyte outlet 17 can open into the catholyte chamber at a position below the distribution body 16, in other words, the catholyte outlet 17 can open into the catholyte chamber at a position between the distribution body 16 and the membrane 18, when the system is adjusted for its intended use.

[0078] The catholyte chamber 12 may optionally include a protective gas system 12d that provides a protective gas curtain 22 between the catholyte and the ambient atmosphere 23. Protective gas may also be injected into the anolyte and catholyte storage tanks.

[0079] The protective gas system 12d may be configured to provide a protective gas curtain 22 between the catholyte and the ambient atmosphere 23. The protective gas system 12d may include an inlet for a protective gas, such as nitrogen, and an outlet for the protective gas and / or other gases, such as gases generated as part of the process.

[0080] As mentioned above, the system further includes a distributor 16 disposed within the catholyte chamber 12 . Between the distributor 16 and the substrate 11 a reaction space 19 is arranged.

[0081] The distributor 16 comprises a jet opening 16a for dispensing the catholyte 13 onto the substrate 11 to be processed. In particular, the jet opening 16a may be configured to dispense the catholyte 13 substantially vertically onto the substrate 11 to be processed. However, directions that deviate from the vertical direction are conceivable.

[0082] In FIG. 1 a , the jet opening 16 a is shown as extending only partially into the distributor 16 from the substrate-facing surface 16 c of the distributor 16 and leading to a catholyte inlet 16 e located on a side surface 16 f of the distributor 16 .

[0083] The distributor further comprises an outlet opening 16 b for draining the catholyte 13 from the reaction space 19 between the distributor 16 and the substrate 11 .

[0084] In Figure 1a the discharge openings 16b are shown as extending from the substrate-facing surface 16c of the distribution body 16 to a rear surface 16d of the distribution body 16 opposite the substrate-facing surface 16c, however other configurations are contemplated.

[0085] However, off-perpendicular orientations are possible.

[0086] The above-mentioned sides 12a and 12b of the catholyte chamber 12 may extend essentially perpendicular to the substrate-facing surface 16c.

[0087] The longitudinal direction 21 of the distribution body 16 is indicated in FIG. 1 a by a dashed line. In this particular example, the above-mentioned side surfaces 12 a and 12 b of the catholyte chamber 12 may extend essentially perpendicular to the longitudinal direction 21 of the distribution body 16.

[0088] In Figure 1a, merely by way of example, a system 10 is shown in which the catholyte chamber 12 comprises a drain ring 12c arranged around the distributor 16 for draining the catholyte 13 from the reaction space 19 between the distributor 16 and the substrate 11. The drain ring 12c is configured to drain the catholyte 13 substantially perpendicular to the surface of the substrate 11a being processed.

[0089] Optionally, system 10 may include a catholyte circulation system 24 for circulating catholyte 13 in catholyte chamber 12 and an anolyte circulation system 25 for circulating anolyte 15 in anolyte chamber 14. As shown in Figure 1a, the circulation system may include catholyte tank 24a and anolyte tank 25a, and pumps or other transport devices (not shown). Arrows 24b represent, only generally, the direction of catholyte flow and arrows 25b represent the direction of anolyte flow. Catholyte circulation system 24 is separate from anolyte circulation system 25.

[0090] In this context, it should be noted that in the figure, due to the 2D representation of a 3D system, the anolyte inlet and the catholyte inlet overlap, i.e. the anolyte inlet (flow direction indicated by arrow 25b) is shown as being located in front of the line of sight of the catholyte inlet (flow direction indicated by arrow 24b).

[0091] FIG. 1b shows a system like that described above in the context of FIG. 1a. The presence and movement of gas bubbles 27 is shown in said FIG. 1b. Furthermore, it can be seen that the catholyte and anolyte do not completely fill the cells, and thus a liquid level 28 exists in the respective cells. As mentioned above, protective gas may also be injected into the anolyte and catholyte tanks. In this embodiment, the injection of N2 is shown by the arrows. The gas bubbles are exhausted from the cells through the respective vents. Exemplary pumps 29 for pumping the catholyte and anolyte and an in-line gas extractor 30, which helps to remove the gas bubbles, are also shown in FIG. 1b.

[0092] Figure 2 shows, diagrammatically and exemplarily, an enlarged view of a portion of the system of Figure 1a or 1b. In particular, Figure 2 serves to allow an enlarged view of a portion of the system including the distributor 16 and the membrane 18. The membrane carrier plate 18a is shown as well. It should be noted that the membrane may be supported in both directions and that the catholyte chamber 12, if intended for operation, includes a support plate that is the upper support.

[0093] Figures 3a-c show, for illustrative purposes, schematic flow of catholyte and anolyte through a system according to the present disclosure, particularly through the system of Figure 1a or 1b. As mentioned above, the anolyte chamber 14 can include an internal anolyte inlet 14a, an external anolyte inlet 14b, and an anolyte outlet 14c, which are selectable to tailor the flow of anolyte 15 to different substrate sizes. In the case of Figure 3a, the internal anolyte inlet 14a is selected, while in Figure 3b, the internal anolyte inlet and the external anolyte inlet are selected together.

[0094] It should be noted that in Figures 3a and 3b, to avoid cluttered views, the flow of catholyte is only shown from the point where it leaves the reaction space, and Figure 3c shows the flow of catholyte into and through the distributor.

[0095] It should be noted that the systems of Figures 1-3 also include an anode and a cathode, which have been omitted to avoid cluttering the illustrations.

[0096] It should be noted that in general, the size of the cathode may be selected to match the anode size and the wafer size in a preferred embodiment.

[0097] Figure 4 shows, in a schematic and exemplary manner, a cross-sectional side view of a system for chemical and / or electrolytic surface treatment of a substrate according to one embodiment. The system is configured similarly to that shown in Figures 1 to 4. However, the height 26 is smaller than in said figures. This helps to show that a particularly compact construction is possible with the claimed system 10.

[0098] By way of example, the system 10 may have a height 26 in the range of 50-80 mm, preferably 60-70 mm, although other dimensions are contemplated.

[0099] As an example, the system 10 may have a height 26 in the range of 50 mm to 350 mm. In one embodiment, for example, if pellets are used (e.g., Cu, SnAg), the height may preferably range from 200 mm to 350 mm, more preferably from 230 mm to 260 mm. In another example, if an inert anode is used, the height may preferably range from 50 mm to 200 mm, more preferably from 80 mm to 120 mm.

[0100] The height may refer, for example, to the combined height of the anolyte chamber, the catholyte chamber, and the reaction space.

[0101] While the present disclosure has been illustrated and described in detail in the drawings and the foregoing description, such illustration and description are to be considered as illustrative or exemplary and not restrictive. The present disclosure is not limited to the disclosed embodiments. Other variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed disclosure, from a study of the drawings, the disclosure, and the dependent claims.

[0102] In the claims, the word "comprising" does not exclude other elements or steps, and the indefinite article ("a" or "an") does not exclude a plurality. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage. Any reference signs in the claims should not be interpreted as limiting the scope.

Claims

1. 1. A system for chemical and / or electrolytic surface treatment of a substrate, comprising: a catholyte chamber; anolyte chamber, A distributor; a catholyte outlet; The distributor is disposed within the catholyte chamber; The catholyte chamber is separated from the anolyte chamber by a membrane. The membrane is inclined relative to the distributor; the distributor comprises a jet opening for distributing the catholyte onto the substrate to be processed and a discharge opening for discharging the catholyte from a reaction space between the distributor and the substrate; the catholyte outlet is eccentrically positioned in the catholyte chamber; system.

2. 2. The system of claim 1, the catholyte chamber has a side extending essentially perpendicular to a longitudinal direction of the distribution body; the catholyte outlet is disposed within the side of the catholyte chamber; system.

3. 3. The system of claim 1 or 2, wherein a cross-section of the catholyte chamber has a wedge-shaped shape.

4. 4. The system according to claim 2 or 3, the cross-sectional shape of the wedge-shaped catholyte chamber has a long side and a short side; the catholyte outlet is disposed within the long side of the catholyte chamber; system.

5. 5. The system of claim 1, wherein the catholyte outlet is located at a position that does not have rotational symmetry in the catholyte chamber.

6. 6. The system according to claim 1, wherein the catholyte chamber comprises a drainage ring arranged around the distributor to drain the catholyte from the reaction space between the distributor and the substrate.

7. A system according to any one of claims 1 to 6, the drain opening and / or the drain ring are configured to drain the catholyte essentially perpendicular to the surface of the substrate to be treated; and / or the exhaust ring is configured as an open outlet for exhausting catholyte from the reaction space and / or as a vent for gas bubbles generated or transported within the reaction space, In particular with a rotating substrate holder, system.

8. The system of any one of claims 1 to 7, wherein the jet opening is configured to dispense the catholyte essentially perpendicular to the substrate to be processed.

9. A system according to any one of claims 1 to 8, wherein the discharge opening extends from a surface of the distribution body facing the substrate to a rear surface of the distribution body, the rear surface of the distribution body being located opposite the surface facing the substrate.

10. A system according to any one of claims 1 to 9, wherein the jet opening extends only partially into the distributor from a surface of the distributor facing the substrate and defines at least one cathode inlet arranged on a side of the distributor.

11. The system according to any one of the preceding claims, wherein the catholyte chamber comprises a protective gas system providing a protective gas curtain between the catholyte and the surrounding atmosphere.

12. A system according to any one of claims 1 to 11, a catholyte circulation system for circulating the catholyte in the catholyte chamber, and an anolyte circulation system for circulating the anolyte in the anolyte chamber; In particular, the catholyte circulation system is separated from the anolyte circulation system, the catholyte chamber is configured to circulate the catholyte to promote separation of gas bubbles in the catholyte tank; and / or the anolyte chamber is configured to circulate the anolyte to promote separation of gas bubbles in the anolyte tank; and / or a first bubble separator located upstream of the anolyte storage tank and / or a second bubble separator located upstream of the catholyte storage tank; system.

13. A system according to any one of claims 1 to 12, the membrane is tilted to combine and / or remove any gas bubbles generated at the anode; and / or The membrane is permeable to electric current and metal ions. system.

14. A system according to any one of claims 1 to 13, the anolyte chamber comprises at least one internal anolyte inlet and at least one internal anolyte outlet that is selectable to adjust anolyte flow to different substrate sizes; In particular, the anolyte outlet is configured to allow the removal of air bubbles generated at the anode, in particular by the anode circulation system; system.

15. A system according to any one of claims 1 to 14, comprising: having a height in the range of 50 to 350 mm; In particular, it has a height in the range from 200 mm to 350 mm, in particular in the range from 200 mm to 260 mm, or in the range from 50 mm to 200 mm, in particular in the range from 80 mm to 120 mm; system.

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