Method and apparatus for coating powder or granular particles

JP2025505807APending Publication Date: 2025-02-28クレマー レイナー
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Patent Information

Application Number
JP2024548664
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2022-02-22
Filing Date
2023-01-02
Publication Date
2025-02-28

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Abstract

The present invention relates to a method and device for coating powdery or granular particles by gas flow sputtering using a hollow cathode acting as a target, which is placed in an evacuable container together with an anode and a collection container. To function efficiently and to be easy to handle, it is proposed that the powdery or granular particles to be coated are metered into an inlet opening and then allowed to fall freely through the vacuum interior of the hollow cathode at a distance of 0.3 m to 1 m and collected in a collection container below.
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Citation Information

Patent Citations

  • Coating large area substrate by gas flow sputtering

    DE19635669C1

  • Plasma-assisted particle surface modification especially for sputter coating, activation and etching of catalyst particles

    DE19804838A1