Modular Multi-Way Gas Mixing Block

Abstract

An exemplary modular gas block may include a body having an inlet end and an outlet end. The body may define a portion of a first gas path along a length of the body and a second gas path along a width of the body. The first gas path may include a channel segment defined in the body. The inlet end may define a gas inlet coupled to the first gas path. The body may define a first fluid port coupled to the first gas path. A fluid port of the first fluid port may be coupled to the gas inlet. The first fluid ports may be coupled to each other via respective channel segments. The top surface may define a side fluid port spaced from the first fluid port along the width and coupled to the first fluid port via the second gas path.

Description

[Technical field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims the benefit of and priority to U.S. patent application Ser. No. 63 / 318,771, entitled "MODULAR MULTI-DIRECTION GAS MIXING BLOCK," filed Mar. 10, 2022, the entire contents of which are incorporated herein by reference.

[0002]

[0002] The present technology relates to semiconductor processes and equipment. More specifically, the present technology relates to substrate processing systems and components. [Background technology]

[0003]

[0003] Semiconductor processing systems often use cluster tools to integrate multiple process chambers together. This configuration can facilitate performing several successive processing steps without removing the substrate from the controlled processing environment, or can allow similar processes to be performed on multiple substrates simultaneously in various chambers. These chambers can include, for example, degassing chambers, pre-treatment chambers, transfer chambers, chemical vapor deposition chambers, physical vapor deposition chambers, etch chambers, metrology chambers, and other chambers. The combination of chambers in the cluster tool, and the operating conditions and parameters under which these chambers operate, are selected to produce a particular structure using a particular process recipe and process flow.

[0004]

[0004] Processing systems often include a gas delivery assembly that can mix and / or deliver multiple process gases to the various chambers. The flow of these gases can be carefully controlled to ensure uniform gas flow into each processing chamber.

[0005]

[0005] Accordingly, there is a need for improved systems and methods that can be used to efficiently mix and / or deliver gases to a processing chamber under desired conditions. The present technology addresses these and other needs. Summary of the Invention

[0006] An exemplary modular gas block may include a block body having an inlet end and an outlet end. The block body may define a portion of a first gas path along a length of the block body and a second gas path along a width of the block body. The first gas path may include a plurality of channel segments defined within the block body. The inlet end of the block body may define a gas inlet fluidly coupled to the first gas path. The top surface of the block body may define a first plurality of fluid ports fluidly coupled to the first gas path. A first fluid port of the first plurality of fluid ports may be fluidly coupled to the gas inlet. At least some of the first plurality of fluid ports may be coupled to one another via respective ones of the plurality of channel segments. The top surface of the block body may define a side fluid port spaced from each of the first plurality of fluid ports along a width of the block body and coupled to each of the first plurality of fluid ports via the second gas path.

[0007] In some embodiments, the modular gas block may include a gas weld coupled to the gas inlet. The block body may include a first portion disposed at the inlet end and a second portion disposed at the outlet end. The first portion and the second portion may be spaced apart from one another along a length of the block body. The modular gas block may include a plurality of valves. Each of the plurality of valves may be coupled to at least two of the first plurality of fluid ports. At least two of the first plurality of fluid ports may include fluid ports that are not coupled to one another through one of the plurality of channel segments. The block body may define a side outlet port fluidly coupled to the side fluid port through a second gas path. The modular gas block may include one or more plugs in contact with the side outlet port and the side fluid port. Each of the plurality of channel segments may extend through a bottom surface of the block body to form an opening. A plug may be in contact with each opening to close a bottom surface of each of the plurality of channel segments. The block body may define a gas outlet proximate the outlet end. The modular gas block may include an additional block body coupled to a first side of the block body. The additional block body may define a portion of a third gas path along a length of the additional block body and may define a fourth gas path along a width of the additional block body. The additional block body may define an additional side outlet port fluidly coupled to the fourth gas path. The side outlet port and the additional side outlet port may be coupled to each other. The first gas path and the second gas path may be fluidly coupled to each other.

[0008] Some embodiments of the present technology may include a modular gas block. The modular gas block may include a block body having an inlet end and an outlet end. The block body may define a portion of a first gas path along a length of the block body and a second gas path along a width of the block body. The first gas path and the second gas path may be fluidly coupled to one another. The first gas path may include a plurality of channel segments defined in the block body. The inlet end of the block body may define a gas inlet fluidly coupled to the first gas path. A top surface of the block body may define a first plurality of fluid ports fluidly coupled to the first gas path. A first fluid port of the first plurality of fluid ports may be fluidly coupled to the gas inlet. At least some of the first plurality of fluid ports may be coupled to one another via respective ones of a plurality of channel segments. The top surface of the block body may define a side fluid port spaced from each of the first plurality of fluid ports along a width of the block body and coupled to each of the first plurality of fluid ports via a second gas pathway. The block body may define a gas outlet proximate the outlet end.

[0009] In some embodiments, the gas inlet may extend through an end face of the block body. Each of the plurality of channel segments may define a generally V-shaped flow path. The gas outlet may be formed in a bottom surface of the block body. The modular gas block may include a base. The block body may include a first portion disposed at the inlet end and a second portion disposed at the outlet end. The first portion and the second portion may be spaced apart from one another along a length of the substrate.

[0010] Some embodiments of the present technology may include a modular gas supply assembly. The assembly may include a plurality of modular gas blocks. Each of the plurality of modular gas blocks may include a block body having an inlet end and an outlet end. The block body may define a portion of a first gas path along a length of the block body and may define a second gas path along a width of the block body. The first gas path and the second gas path of a given block body may be fluidly coupled to one another. Each first gas path may include a plurality of channel segments defined within the block body. The inlet end of each block body may define a gas inlet fluidly coupled to the first gas path of the respective block body. A top surface of each block body may define a first plurality of fluid ports fluidly coupled to the first gas path of the respective block body. A first fluid port of the first plurality of fluid ports of each block body may be fluidly coupled to the gas inlet of the respective block body. At least some of the first plurality of fluid ports of each block body may be coupled to one another via respective ones of the plurality of channel segments of the respective block body. Each block body may define a side outlet port fluidly coupled to the second gas path. The side outlet port of each block body may be in contact with the side outlet port of at least one adjacent block body.

[0011] In some embodiments, the assembly may include a gas supply lumen coupled to an outlet of at least one of the plurality of modular gas blocks. The assembly may include a plurality of gas sources. Each of the plurality of gas sources may be coupled to a respective gas inlet of the plurality of modular gas blocks. One or both of a mass flow controller and a valve may be in contact with at least one of the first plurality of ports of each of the plurality of modular gas blocks.

[0012]

[0012] The above techniques may provide many advantages over conventional systems and techniques. For example, the treatment system may provide modular gas assembly components that can be easily assembled into manufactured customized gas assemblies. Additionally, the modular gas assembly components may facilitate mixing of different gases without requiring complex arrangements of welds, reducing the time, cost, and complexity of the gas supply assembly. These and other embodiments, as well as their many advantages and features, are described in more detail in conjunction with the following description and accompanying figures.

[0013] A further understanding of the nature and advantages of the disclosed technology may be realized by reference to the remaining portions of the specification and the drawings. [Brief description of the drawings]

[0014] [Figure 1] 1 is a schematic top view illustrating an exemplary processing system according to some embodiments of the present technique. [Diagram 2] 1 is a schematic isometric view of a transfer region of an exemplary chamber system in accordance with some embodiments of the present technique; [Diagram 3] 1 is a schematic isometric view of a transfer region of an exemplary chamber system in accordance with some embodiments of the present technique; [Figure 4] 1 is a schematic isometric view of a transfer region of an exemplary chamber system in accordance with some embodiments of the present technique; [Diagram 5] FIG. 1 is a schematic partial isometric view of a chamber system according to some embodiments of the present technique. [Figure 6] FIG. 1 is a schematic isometric view of an exemplary modular gas block in accordance with some embodiments of the present technique; [Figure 6A] FIG. 7 is a schematic cross-sectional front view of the modular gas block of FIG. [Figure 6B] FIG. 7 is a schematic cross-sectional side view of the modular gas block of FIG. [Figure 7]1 is a schematic cross-sectional side view of a gas supply assembly according to some embodiments of the present technique; [Figure 8] 1 is a schematic cross-sectional front view of a gas supply assembly according to some embodiments of the present technique; [Figure 9A] FIG. 1 is a schematic isometric view of an exemplary modular gas block in accordance with some embodiments of the present technology; [Figure 9B] FIG. 9B is a schematic top view of the modular gas block of FIG. 9A. [Figure 9C] FIG. 9B is a schematic side view of the modular gas block of FIG. 9A. [Figure 9D] FIG. 9B is a schematic bottom view of the modular gas block of FIG. 9A. [Figure 9E] 9E is a schematic cross-sectional side view of the modular gas block of FIG. 9A. [Figure 9F] FIG. 9B is a schematic cross-sectional front view of the modular gas block of FIG. 9A. [Figure 10] 1 is a schematic top view of multiple gas supply assemblies according to some embodiments of the present technique; [Figure 11] 1 is a schematic top view of a semiconductor processing system according to some embodiments of the present technique; DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0015]

[0032] Some figures are included as schematics. It should be understood that the figures are for illustrative purposes and should not be considered to scale or proportion unless a scale or proportion is explicitly stated. Furthermore, as schematics, the figures are provided to aid in understanding and may not include all aspects or information as compared to realistic representations and may include exaggerated material for illustrative purposes.

[0016]

[0033] In the accompanying figures, similar components and / or features may be labeled with the same reference label. Additionally, various components of the same type may be distinguished by following the reference label with a letter that distinguishes the similar components. If only a first reference label is used herein, the description is applicable to any one of the similar components having the same first reference label, regardless of the letter.

[0017]

[0034] Substrate processing may include time-consuming steps to add, remove, or otherwise modify materials on a wafer or semiconductor substrate. Efficient movement of substrates can reduce work wait times and increase substrate throughput. Additional chambers can be incorporated on the mainframe to increase the number of substrates processed in the cluster tool. Transfer robots and processing chambers can be continually added by extending the tool, but as the footprint of the cluster tool expands, space efficiency can decrease. Thus, the present technology can include cluster tools with an increased number of processing chambers within a defined footprint. To accommodate the limited footprint around the transfer robot, the technology can increase the number of processing chambers laterally outward from the robot. For example, some conventional cluster tools include one or two processing chambers positioned around a section of the transfer robot located in the center to maximize the number of chambers radially around the robot. The present technology can expand on this concept by incorporating additional chambers laterally outward as another row or group of chambers. For example, the techniques may be applied to cluster tools that include three, four, five, six or more processing chambers accessible at each of one or more robot access locations.

[0018]

[0035] A processing system may include a gas supply assembly for supplying various gases to a processing chamber. To eliminate the need to have different output supply lumens for each type of gas flowing to a given chamber or set of chambers, gas supply assemblies are often designed to mix and co-flow compatible gases to the chamber. Conventional gas supply assemblies supply gases to output welds along the length (or Y-axis) of the assembly. To facilitate the mixing of the various gases, conventional systems use an array of different welds, typically located below a gas block where valves, mass flow controllers, and / or other shutoff and / or flow throttling components may be attached. The network of welds can be complex and can cause problems in designing and manufacturing new gas supply assemblies, modifying existing gas supply assemblies, and / or repairing existing gas supply assemblies.

[0019]

[0036] Designing a new gas delivery assembly using conventional components requires engineers to design and / or weld the correct shapes and sizes to properly connect the various ports of the gas assembly while ensuring that the welds positioned below the gas block do not interfere with each other. Such fabrication can be tedious and involve the use of a significant number of different welds to achieve a functional assembly. Furthermore, the complexity of the weld structures precludes engineers from designing a basic assembly design that can be easily modified to accommodate new assembly designs. Instead, engineers must design each assembly from scratch. These issues can make designing and fabricating new assemblies time consuming (up to 15 weeks) and very expensive.

[0020]

[0037] When modifying (e.g., adding or removing a new gas source / gas stick) and / or repairing an existing gas delivery assembly, a technician must remove all of the upper components (valves, mass flow controllers, gas block, etc.) to access the welds. In many cases, it may be necessary to disassemble most or all of the gas assembly to add or remove a gas stick. It may also be necessary to completely redesign and / or replace the network of welds below the gas block to accommodate the mix of the newly added gas stick. In many cases, all of the welds from the previous version of the gas delivery assembly must be discarded, resulting in significant waste. Furthermore, if the modification and / or repair of the gas assembly affects the toxic gas stick, it may be necessary to replace the entire toxic gas stick to prevent toxic gas from leaking into the environment. These issues can make modifying or repairing an existing assembly time-consuming (up to 18 weeks) and very expensive.

[0021]

[0038] The present technology overcomes these problems by using a modular gas block that includes lumens that promote gas mixing in the X-direction between adjacent gas sticks. The lumens may eliminate the need for a network of welds at the bottom of the gas supply assembly, which may greatly simplify the design and manufacture of the gas supply assembly. All or most of the modular gas blocks may have the same geometry, which may simplify modifications to the gas supply assembly as simple as connecting or removing a gas stick to or from an existing gas supply assembly without exposing other flow paths. This may eliminate the risk of exposing a toxic gas stick and may also help reduce waste during the modification process. Additionally, a purge gas stick may be provided that may be used to clean all toxic gas flow paths, further reducing any risk of toxic gases during repairs of the gas supply assembly. The above features may significantly reduce the time (often less than 4-5 weeks) and costs associated with designing, manufacturing, and / or otherwise modifying a gas supply assembly.

[0022]

[0039] While the remaining disclosure will always identify a particular structure, such as a four-position chamber system, in which the structures and methods of the present invention may be employed, it will be readily understood that the systems and methods are equally applicable to any number of structures and devices that may benefit from the described structural capabilities. Thus, the present technology should not be considered limited to use with only any particular structure. Additionally, while an exemplary tool system is described to provide a foundation for the present technology, it should be understood that the present technology may be incorporated into any number of semiconductor processing chambers and tools that may benefit from some or all of the described processes and systems.

[0023]

[0040] 1 is a top view of one embodiment of a deposition, etch, bake, and cure chamber substrate processing tool or processing system 100 according to some embodiments of the present technology, in which a set of front-opening unified pods 102 provide substrates of various sizes that are received in a factory interface 103 by robotic arms 104a and 104b and placed in a load lock or low pressure holding area 106 before being transferred to one of the substrate processing regions 108 positioned in chamber systems or quad sections 109a-c, which may be substrate processing systems each having a transfer region fluidly coupled to multiple processing regions 108. Although a quad system is illustrated, it should be understood that standalone chambers, twin chambers, and other platforms incorporating multiple chamber systems are equally encompassed by the present technology. A second robot arm 110 housed in a transfer chamber 112 can be used to transport substrate wafers from the holding area 106 to the quad section 109 and vice versa, and the second robot arm 110 can be housed in each quad section or in a transfer chamber to which a processing system can be connected. Each substrate processing region 108 can be equipped to perform a number of substrate processing steps, including any number of deposition processes, including cyclical layer deposition, atomic layer deposition, chemical vapor deposition, physical vapor deposition, as well as etching, pre-cleaning, annealing, plasma treatment, degassing, orientation, and other substrate processes.

[0024]

[0041] Each quad section 109 may include a transfer region capable of receiving substrates from and handing off substrates to the second robot arm 110. The transfer region of the chamber system may be aligned with the transfer chamber having the second robot arm 110. In some embodiments, the transfer region may be laterally accessible to the robot. In a subsequent step, components of the transfer section may translate the substrate vertically to the processing region 108 thereon. Similarly, the transfer region may also be operable to rotate the substrate between positions within each transfer region. The substrate processing region 108 may include any number of system components for depositing, annealing, curing, and / or etching a material film on a substrate or wafer. In one configuration, two sets of processing regions, such as the processing regions in quad sections 109a and 109b, may be used to deposit material on the substrate, and a third set of processing chambers, such as the processing chambers or region in quad section 109c, may be used to cure, anneal, or process the deposited film. In another configuration, all three sets of chambers, such as all twelve chambers shown, can be configured for both depositing and / or curing a film on a substrate.

[0025]

[0042] As shown, the second robot arm 110 may include two arms for simultaneously delivering and / or retrieving multiple substrates. For example, each quad section 109 may include two accesses 107 along a surface of the housing of the transfer region that may be aligned laterally to the second robot arm. The accesses may be defined along a surface adjacent to the transfer chamber 112. In some embodiments as shown, the first access may be aligned to a first substrate support of the plurality of substrate supports of the quad section. Additionally, the second access may be aligned to a second substrate support of the plurality of substrate supports of the quad section. The first substrate support may be adjacent to the second substrate support, and the two substrate supports may define a first row of substrate supports in some embodiments. As shown in the illustrated configuration, the second row of substrate supports may be positioned laterally outward from the transfer chamber 112 and aft of the first row of substrate supports. The two arms of the second robot arm 110 may be spaced apart so that both arms can simultaneously enter a quad section or chamber system to deliver or retrieve one or two substrates to a substrate support in the transfer region.

[0026]

[0043] Any one or more of the transfer regions described may incorporate additional chambers separate from the fabrication system illustrated in the different embodiments. It will be understood that additional configurations of deposition, etching, annealing, and curing chambers for material films are envisioned for the processing system 100. Additionally, any number of other processing systems may be used with the present techniques, and these processing systems may incorporate transfer systems for performing any of the specific steps, such as moving the substrate. In some embodiments, a processing system that may provide access to multiple processing chamber regions while maintaining a vacuum environment in various sections, such as the holding and transfer areas described above, may allow steps to be performed in multiple chambers while maintaining a specific vacuum environment between individual processes.

[0027]

[0044] As mentioned above, the processing system 100, or more specifically, a quad section or chamber system incorporated into the processing system 100 or other processing systems, may include a transfer section positioned below the illustrated processing chamber region. FIG. 2 is a schematic isometric view of a transfer section of an exemplary chamber system 200 according to some embodiments of the present technology. FIG. 2 may illustrate additional aspects or variations of the transfer region aspects described above and may include any of the components or features described. The illustrated system may include a transfer region housing 205, which may be a chamber body as described further below, defining a transfer region in which a number of components may be included. The transfer region may further be defined at least in part from above by a processing chamber or region fluidly coupled to the transfer region, such as the processing chamber region 108 illustrated in the quad section 109 of FIG. 1. A sidewall of the transfer region housing may define one or more access locations 207 where substrates may be delivered and retrieved, such as by a second robot arm 110 as described above. The access location 207 may be a slit valve or other sealable access location, which in some embodiments includes a door or other sealing mechanism to provide a sealed environment within the transfer region housing 205. Although two such access locations 207 are illustrated, it should be understood that some embodiments may include only a single access location 207, as well as access locations on multiple sides of the transfer region housing. It should also be understood that the illustrated transfer section may be sized to accommodate any substrate size, including 200 mm, 300 mm, 450 mm, or larger or smaller substrates, and includes substrates featuring any number of geometries or shapes.

[0028]

[0045] Within the transfer region housing 205, there may be multiple substrate supports 210 positioned around the transfer region volume. Although four substrate supports are illustrated, it should be understood that any number of substrate supports are similarly encompassed by embodiments of the present technology. For example, approximately three, four, five, six, eight, or more substrate supports 210 may be accommodated in the transfer region according to embodiments of the present technology. The second robot arm 110 may transfer substrates to either or both of the substrate supports 210a or 210b through the access 207. Similarly, the second robot arm 110 may retrieve substrates from these locations. Lift pins 212 may protrude from the substrate support 210 to allow the robot to access the substrate underneath. The lift pins may be fixed to the substrate support, or fixed in a recessed location underneath the substrate support, or in some embodiments, the lift pins may also pass through the substrate support to raise and lower. The substrate support 210 may be vertically translatable and, in some embodiments, may extend to a processing chamber region of a substrate processing system, such as processing chamber region 108 positioned above the transfer region housing 205.

[0029]

[0046] The transfer region housing 205 may extend through an aperture in the transfer region housing as shown and may operate in conjunction with a laser, camera, or other monitoring device projecting or transmitting through an adjacent aperture to provide access 215 for an alignment system that may include an aligner that can determine whether a translated substrate is properly aligned. The transfer region housing 205 may also include a transfer device 220 that may be operated in a number of ways to position the substrate and move the substrate between the various substrate supports. In one embodiment, the transfer device 220 may move the substrate on the substrate supports 210a and 210b to the substrate supports 210c and 210d, which may allow additional substrates to be provided to the transfer chamber. Additional transfer operations may include rotating the substrate between the substrate supports for additional processing in the processing region thereon.

[0030]

[0047] The transfer apparatus 220 may include a central hub 225 that may include one or more shafts extending into the transfer chamber. An end effector 235 may be coupled to the shaft. The end effector 235 may include multiple arms 237 extending radially or laterally outward from the central hub. Although a central body from which the arms extend is illustrated, the end effector may further include separate arms, each coupled to a shaft or central hub, in various embodiments. In embodiments of the present technology, any number of arms may be included. In some embodiments, the number of arms 237 may be similar or equal to the number of substrate supports 210 included in the chamber. Thus, as illustrated, for four substrate supports, the transfer apparatus 220 may include four arms extending from the end effector. The arms may feature any number of shapes and profiles, such as linear or arcuate profiles, as well as any number of distal profiles, including hooks, rings, forks, or other designs for supporting the substrate and / or providing access to the substrate for alignment or engagement, etc.

[0031]

[0048] The end effector 235, or components or portions of the end effector, may be used to contact the substrate during transfer or movement. These components, as well as the end effector, may be made of or include a number of materials, including conductive and / or insulating materials. In some embodiments, the materials may be coated or plated to withstand contact with precursors or other chemicals that may pass from the processing chambers above into the transfer chamber.

[0032]

[0049] Additionally, materials may be provided or selected to withstand other environmental characteristics such as temperature. In some embodiments, the substrate support may be operable to heat the substrate disposed thereon. The substrate support may be configured to raise the temperature of the surface or substrate to about 100° C. or more, about 200° C. or more, about 300° C. or more, about 400° C. or more, about 500° C. or more, about 600° C. or more, about 700° C. or more, about 800° C. or more, or more. Any of these temperatures may be maintained during the process, and thus the components of the transfer apparatus 220 may be exposed to any of these stated or included temperatures. As a result, in some embodiments, any of the materials may be selected to accommodate these temperature regimes, and may include materials such as ceramics and metals, which may be characterized by relatively low coefficients of thermal expansion, or other beneficial properties.

[0033]

[0050] The coupling of the components may also be compatible with processes in high temperature and / or corrosive environments. For example, if the end effector and the terminal portion are each ceramic, the coupling may include press fittings, snap fittings, or other fittings that may not include additional materials such as bolts that may expand and contract with temperature and crack the ceramic. In some embodiments, the terminal portion may be continuous with the end effector and may be monolithically formed therewith. Any number of other materials that may facilitate the process or resistance during the process may be used and are encompassed by the present technology as well. The transfer device 220 may include numerous components and configurations that may facilitate multi-directional movement of the end effector, which may facilitate rotational movement as well as vertical or lateral movement in one or more aspects using drive system components to which the end effector may be coupled.

[0034]

[0051] 3 is a schematic isometric view of a transfer region of an exemplary chamber system 300 according to some embodiments of the present technology. The chamber system 300 may be similar to the transfer region of the chamber system 200 described above and may include similar components, including any of the components, features, or configurations described above. FIG. 3, in conjunction with the following figures, may also illustrate the coupling of certain components encompassed by the present technology.

[0035]

[0052] The chamber system 300 may include a chamber body 305 or housing defining a transfer region. Within the defined region, there may be a plurality of substrate supports 310 distributed within the chamber body, as described above. As described further below, each substrate support 310 may be vertically translatable along a central axis of the substrate support between a first position as shown and a second position where substrate processing may be performed. The chamber body 305 may define one or more accesses 307 through the chamber body. A transfer apparatus 335 may be positioned within the transfer region and configured to engage and rotate a substrate between the substrate supports 310 within the transfer region, as described above. For example, the transfer apparatus 335 may be rotatable about a central axis of the transfer apparatus to reposition the substrate. The transfer apparatus 335 may also be laterally translatable in some embodiments to further facilitate repositioning of the substrate on each substrate support.

[0036]

[0053] The chamber body 305 may include a top surface 306 that may provide support for the overlying components of the system. The top surface 306 may define a gasket groove 308 that may provide a seat for a gasket to provide a hermetic seal of the overlying components for vacuum processing. Unlike some conventional systems, the chamber system 300, and other chamber systems according to some embodiments of the present technique, may include an open transfer region within the processing chamber, where the processing region is formed above the transfer region. Because the transfer apparatus 335 forms the sweep area, supports or structures to separate the processing region may not be available. As a result, the present technique may use a lid structure thereon to form a separate processing region above the open transfer region, as described below. Thus, in some embodiments, a seal between the chamber body and the overlying components may only exist around the chamber body outer walls that define the transfer region, and internal bonding may not exist in some embodiments. The chamber body 305 may also define an aperture 315 that may facilitate exhaust flow from the processing region of the overlying structure. The top surface 306 of the chamber body 305 may also define one or more gasket grooves around the apertures 315 for sealing with overlying components. Additionally, the apertures may provide positioning features that may facilitate stacking of components in some embodiments.

[0037]

[0054] 4 is a schematic isometric view showing structures above a chamber system 300 according to some embodiments of the present technology. For example, in some embodiments, a first lid plate 405 may be seated on the chamber body 305. The first lid plate 405 may feature a first surface 407 and a second surface 409 opposite the first surface. The first surface 407 of the first lid plate 405 may be in contact with the chamber body 305 and may define an adjacent groove to cooperate with the groove 308 described above to form a gasket channel between components. The first lid plate 405 may also define an aperture 410 that may provide separation of regions above the transfer chamber to form a processing region for substrate processing.

[0038]

[0055] The apertures 410 may be defined through the first lid plate 405 and may be at least partially aligned to the substrate supports of the transfer region. In some embodiments, the number of apertures 410 may be equal to the number of substrate supports of the transfer region, and each aperture 410 may be axially aligned to a substrate support of the plurality of substrate supports. As described further below, the processing region may be at least partially defined by the substrate supports when vertically elevated to a second position in the chamber system. The substrate supports may extend through the openings 410 of the first lid plate 405. Thus, in some embodiments, the apertures 410 of the first lid plate 405 may be characterized by a diameter larger than the diameter of the associated substrate support. Depending on the amount of clearance, the diameter may be about 25% or less larger than the diameter of the substrate support, and in some embodiments may be about 20% or less larger than the diameter of the substrate support, about 15% or less larger, about 10% or less larger, about 9% or less larger, about 8% or less larger, about 7% or less larger, about 6% or less larger, about 5% or less larger, about 4% or less larger, about 3% or less larger, about 2% or less larger, about 1% or less larger, or less, thereby obtaining a minimum gap distance between the substrate support and the opening 410.

[0039]

[0056] The first lid plate 405 may also include a second surface 409 opposite the first surface 407. The second surface 409 may define a recessed ledge 415 that may form an annular recessed shelf through the second surface 409 of the first lid plate 405. The recessed ledge 415 may be defined around each aperture of the plurality of apertures 410 in some embodiments. The recessed shelf may provide support for the lid stack components as described further below. Additionally, the first lid plate 405 may define a second aperture 420 that may at least partially define a pumping channel from an overlying component described below. The second aperture 420 may be axially aligned with the aperture 315 of the chamber body 305 described above.

[0040]

[0057] 5 is a schematic partial isometric view of a chamber system 300 according to some embodiments of the present technology. The view may illustrate a partial cross section through two processing regions and a portion of a transfer region of the chamber system. For example, the chamber system 300 may be a quad section of the processing system 100 previously described and may include any of the components or systems previously described.

[0041]

[0058] The chamber system 300 may include a chamber body 305 that may extend therein as expanded throughout the figures and that defines a transfer region 502 including a substrate support 310 that may be vertically translatable as described above. A first lid plate 405 may be seated on the chamber body 305 and may define apertures 410 that form access for a processing region 504 formed with additional chamber system components. A lid stack 505 may be seated around or at least partially within each aperture, and the chamber system 300 may include a plurality of lid stacks 505 including a number of lid stacks equal to the number of apertures 410 among the plurality of apertures. Each lid stack 505 may be seated on the first lid plate 405 and may be seated on a shelf formed by a recessed ledge that penetrates a second surface of the first lid plate. The lid stacks 505 may at least partially define the processing region 504 of the chamber system 300.

[0042]

[0059] As shown, the processing region 504 may be vertically offset from the transfer region 502, but may be fluidly coupled to the transfer region. Additionally, the processing region may be isolated from the other processing regions. The processing region may be fluidly coupled to the other processing regions from below through the transfer region, but may be fluidly isolated from above. Each lid stack 505 may also be aligned to a substrate support in some embodiments. For example, as shown, lid stack 505a may be aligned over substrate support 310a, and lid stack 505b may be aligned over substrate support 310b. When raised to an operational position, such as the second position, the substrate supports may deliver substrates for separate processing in the separate processing regions. When in this position, each processing region 504 may be at least partially defined from below by an associated substrate support in the second position, as described further below.

[0043]

[0060] FIG. 5 also illustrates an embodiment in which a second lid plate 510 for the chamber system may be included. The second lid plate 510 may be coupled to each lid stack, which may be positioned between the first lid plate 405 and the second lid plate 510 in some embodiments. As described below, the second lid plate 510 may facilitate access to components of the lid stack 505. The second lid plate 510 may define a plurality of apertures 512 therethrough. Each aperture of the plurality of apertures may be defined to provide fluid access to a particular lid stack 505 or processing region 504. In some embodiments, an optional remote plasma unit 515 may be included in the chamber system 300 and may be supported by the second lid plate 510. In some embodiments, the remote plasma unit 515 may be fluidly coupled to each aperture 512 of the plurality of apertures through the second lid plate 510. Isolation valves 520 may be included along each fluid line to provide fluid control to each individual processing region 504. For example, as shown, aperture 512a may provide fluid access to lid stack 505a. Aperture 512a may also be axially aligned to any of the lid stack components, and in some embodiments, substrate support 310a, thereby axially aligned to each of the components associated with the individual processing regions, such as along a central axis passing through either the substrate support or the components associated with the particular processing region 504. Similarly, aperture 512b may provide fluid access to lid stack 505b, and in some embodiments may be aligned, including axially aligned to a component of the lid stack as well as substrate support 310b.

[0044]

[0061] 6 is a schematic isometric view illustrating an exemplary modular gas block 600 according to some embodiments of the present technology. The modular gas block 600 may be used as part of a gas supply assembly for mixing and / or delivering one or more gases to a semiconductor processing system for performing one or more process steps, such as deposition, etching, annealing, cleaning, and / or curing. As described in more detail below, multiple modular gas blocks 600 may be assembled to form gas paths that extend along both the length and width (or both the X-axis and Y-axis) of the gas supply assembly, thereby enabling multiple gases to be mixed and / or otherwise delivered to one or more processing systems.

[0045]

[0062] The gas block 600 may include a block body 605, which includes an upper portion 602 and a lower portion 604. As shown, each of the upper portion 602 and lower portion 604 has a generally rectangular prismatic shape, although other shapes may be used in various embodiments. The block body 605 (and each of the upper portion 602 and lower portion 604) may have a first end 606 and a second end 608, and an intermediate region 607 disposed between the first end 606 and the second end 608. A longitudinal axis of the block body 605 may extend through the first end 606 and the second end 608. The first end 606 of the upper portion 602 may extend beyond the first end 606 of the lower portion 604 such that the first end 606 of the upper portion 602 forms an overhang relative to the lower portion 604. The second end 608 of the lower portion 604 may extend beyond the second end 608 of the upper portion 602 such that the second end 608 of the lower portion 604 forms a ledge with respect to the upper portion 602. As such, the cross section of the block body 605 may have a generally Z-shape in some embodiments. The shape of the block body 605 may depend on the adjacent block geometries (such as the end block geometries). For example, the block body 605 may have a T-shape, a Z-shape, an inverted Z-shape, a mirror Z-shape, and / or other shapes in various embodiments.

[0046]

[0063] In some embodiments, a lower surface of the first end 606 of the upper portion 602 and an upper surface of the second end 608 of the lower portion 604 may be substantially coplanar. Such a design may allow multiple modular gas blocks 600 to be coupled to one another along the x-direction (such that the first end 606 of one modular gas block 600 is coupled to the second end 608 of another modular gas block 600) with the respective upper and lower surfaces of adjacent modular gas blocks 600 being substantially coplanar with one another. In some embodiments, to facilitate such a design, the first end 606 of the upper portion 602 and the second end 608 of the lower portion 604 may be substantially the same thickness, however, coplanar coupling of multiple modular gas blocks 600 may be facilitated even if the first end 606 of the upper portion 602 and the second end 608 of the lower portion 604 have different thicknesses, so long as the lower surface of the first end 606 of the upper portion 602 and the upper surface of the second end 608 of the lower portion 604 are substantially coplanar.

[0047]

[0064] FIG. 6A is a schematic cross-sectional front view (e.g., a cross-section taken along the y-axis) illustrating the modular gas block 600. The block body 605 may define a number of fluid channels that may be used to transport process gases and / or purge gases to respective processing systems. For example, as shown in FIG. 6A, the block body 605 may define a first fluid channel 610 extending in a direction substantially parallel to a longitudinal axis of the block body 605. The first fluid channel 610 may be designed to transport gases between adjacent modular gas blocks 600 along a width (or x-axis) of the gas supply assembly. The first fluid channel 610 may include and / or be fluidly coupled to a first fluid port 615, a second fluid port 620, and / or a third fluid port 625. The first fluid port 615 may extend through an upper surface of the second end 608 of the lower portion 604. As described below, the first fluid port 615 may be used to fluidly couple adjacent modular gas blocks 600 along the width of the gas supply assembly. The second fluid port 620 may extend through an upper surface of the middle region 607 of the top 602. The second fluid port 620 may be in contact with a flow regulator, such as a valve, mass flow controller, and / or other device that may be seated on the modular gas block 600 and may control, regulate, and / or otherwise affect flow through the gas assembly. The third fluid port 625 may extend through a lower surface of the first end 606 of the top 602. As described below, the third fluid port 625 may be used to fluidly couple adjacent modular gas blocks 600 along the width of the gas supply assembly.

[0048]

[0065] 6B is a schematic cross-sectional side view (e.g., a cross-section taken along the x-axis) illustrating the modular gas block 600. The block body 605 may define a second fluid channel 630 extending transversely to the longitudinal axis and the first fluid channel 610 for transporting gas between adjacent modular gas blocks 600 along the length (or y-axis) of the gas supply assembly. The second fluid channel 630 may include and / or be fluidly coupled to the second fluid port 620 and the fourth fluid port 635. Each of the second fluid port 620 and the fourth fluid port 635 may extend through a top surface of the block body 605, such as in the middle region 607. In some embodiments, additional fluid ports may be provided. For example, one or more fluid ports may be defined in a sidewall of the block body 605 and may function as fluid inlets and / or outlets for the gas supply assembly. For example, the fluid ports formed in the sidewall of the block body 605 may be coupled to a gas source that introduces gas into the gas supply assembly and / or may be coupled to welds and / or other gas supply lumens that direct any gas from the gas supply assembly to one or more processing chambers and / or manifolds. The fourth fluid port 635, along with the second fluid port 620, may be in contact with flow regulators such as valves, mass flow controllers, and / or other devices that may be seated on the modular gas block 600 and that may control, regulate, and / or otherwise affect flow through the gas assembly. The second fluid channel 630 may be a single channel and / or may be divided into multiple segments. For example, as shown, a portion of the second fluid channel 630 extends from the fourth fluid port 635 to the second fluid port 620. The fluid channels 630 of adjacent modular gas blocks 600 may be coupled to each other via flow control devices coupled to the modular gas blocks 600 via the second fluid port 620 and the fourth fluid port 635.

[0049]

[0066] The first fluid channel 610 and the second fluid channel 630 may be separate from one another in some embodiments, while in other embodiments, the two fluid channels may be fluidically coupled to one another. For example, the first fluid channel 610 and the second fluid channel 630 may intersect at one or more points. In certain embodiments, the first fluid channel 610 and the second fluid channel 630 may intersect within the block body 605 proximate to a second fluid port 620 that may be shared by both fluid channels. Although two ports (second fluid port 620 and fourth fluid port 635) are illustrated extending through the top surface of the middle 607 for coupling with a flow regulator, it will be understood that other numbers of fluid ports may be provided in some embodiments, which may facilitate more complex flow designs (e.g., T-junctions, three-way valves, etc.).

[0050]

[0067] 6 , the block body 605 may define a number of fastener receptacles that may receive fasteners for securing multiple modular gas blocks 600 to one another and / or for securing flow regulators and / or other components to the modular gas block 600. For example, the first end 606 of the upper portion 602 and the second end 608 of the lower portion 604 may define a number of fastener receptacles 655 that may allow fasteners to be inserted through the receptacles 655 to couple the first end 606 of one modular gas block 600 to the second end 608 of another modular gas block 600. The middle region 607 and second end 608 of the upper portion 602 may each define a number of fastener receptacles 660 that may allow fasteners to be inserted through the receptacles 660 to couple a flow regulator to an upper surface of the block body 605.

[0051]

[0068] 7 is a schematic cross-sectional front view showing multiple modular gas blocks 600 coupled to form a portion of a gas supply assembly 700. As shown, the modular gas blocks 600 are coupled along the width (or x-axis) of the gas supply assembly 700 to form a fluid path extending along the width of the gas supply assembly 700. Although three modular gas blocks 600 are shown, it should be understood that the gas supply assembly 700 may include any number of modular gas supply blocks 600 in various embodiments. Additionally, one or more modular gas blocks 600 may be added or removed from the gas supply assembly to add or remove different gas sources.

[0052]

[0069] As shown, the first modular gas block 600a may be positioned between the second modular gas block 600b and the third modular gas block 600c. A first end 606 of the top portion 602 of the first modular gas block 600a may be positioned above and coupled to a second end 608 of the bottom portion 604 of the second modular gas block 600b. For example, the third fluid port 625 of the first modular gas block 600a may be coupled to the first fluid port 615 of the second modular gas block 600b, thereby fluidly coupling the first fluid channel 610 of the first modular gas block 600a and the second modular gas block 600b. A second end 608 of the lower portion 604 of the first modular gas block 600a may be positioned below and coupled to the first end 606 of the upper portion 602 of the third modular gas block 600c. For example, a first fluid port 615 of the first modular gas block 600a may be coupled to a third fluid port 635 of the third modular gas block 600c. When assembled, the modular gas blocks 600 in the gas supply assembly 700 may have top surfaces that are generally coplanar with one another and bottom surfaces that are generally coplanar with one another.

[0053]

[0070] As discussed above, any number of modular gas blocks 600 may be joined end-to-end to form the width of the gas supply assembly 700. The gas supply assembly 700 may include a proximal end (shown here as the left-most end) toward the first end 606 of each modular gas block 600 and a distal end (shown here as the right-most end) toward the second end 608 of each modular gas block 600. To seal the joined first fluid channels 610 of the modular gas blocks 600, the third fluid port 625 of the proximal-most modular gas block 600 (here, the second modular gas block 600b) and the first fluid port 615 of the distal-most modular gas block 600 (here, the third modular gas block 600c) may be blocked, such as by plugging, capping, and / or otherwise closing the respective third fluid port 625 and first fluid port 615 with an obstruction 705. To add a new gas stick to the gas supply assembly 700, the obstructions 705 (such as caps, plugs, and / or other obstructions) can be removed from the respective fluid ports on the modular gas blocks 600 on a given side (e.g., proximal or distal) of the gas supply assembly 700. Additional modular gas blocks 600 can then be interfaced with the exposed fluid ports to expand the gas supply assembly 700 to incorporate additional gas sticks. In some embodiments, the interface formed between at least some of the fluid ports of the coupled modular gas blocks 600 includes a sealing mechanism. For example, the interface between adjacent first and third fluid ports 615 and 625 can include O-rings, gaskets, C-seals, and / or other sealing mechanisms that can prevent gas from leaking from the first fluid channel 610 at various interfaces between adjacent modular gas blocks 600.

[0054]

[0071] 8 is a schematic cross-sectional side view showing multiple modular gas blocks 600 coupled to form a portion of a gas supply assembly 800. As shown, the modular gas blocks 600 are coupled along the length (or Y-axis) of the gas supply assembly 800 to form a fluid path extending along the length of the gas supply assembly 800. Each line of the modular gas blocks 600 along the y-direction may be considered a separate gas stick and coupled to a different gas source. Although three modular gas blocks 600 are illustrated, it will be understood that the gas supply assembly 800 may include any number of modular gas supply blocks 600 in various embodiments. Additionally, one or more modular gas blocks 600 may be added to or removed from the gas supply assembly to add or remove different gas sources.

[0055]

[0072] As shown, the first modular gas block 600d may be positioned between the second modular gas block 600e and the third modular gas block 600f. A first sidewall of the first modular gas block 600d may be positioned against a second sidewall of the second modular gas block 600e. For example, the fourth fluid port 635 of the first modular gas block 600d may be coupled to the second fluid port 620 of the second modular gas block 600e, such as via a valve and / or other flow control device, thereby fluidly coupling the second fluid channel 630 of the first modular gas block 600d and the second modular gas block 600e. A second sidewall of the first modular gas block 600d may be positioned against a first sidewall of the third modular gas block 600f. For example, the fourth fluid port 635 of the first modular gas block 600d may be coupled to the second fluid port 620 of the third modular gas block 600f via a flow regulator, thereby fluidly coupling the second fluid channels 630 of the first modular gas block 600d and the third modular gas block 600f. When assembled, the modular gas blocks 600 in the gas supply assembly 800 may have top surfaces that are generally coplanar with one another and bottom surfaces that are generally coplanar with one another. Interfacing valves with each modular gas block 600 at the second fluid port 620 and the fourth fluid port 635 may fully couple the second fluid channels 630 to one another.

[0056]

[0073] As described above, the side walls of any number of modular gas blocks 600 may be joined to form the length of the gas supply assembly 800. The gas supply assembly 800 may include a proximal end (shown here as the left-most end) toward a first side wall of each modular gas block 600 and a distal end (shown here as the right-most end) toward a second side wall of each modular gas block 600. The exposed second fluid port 620 and / or fourth fluid port 635 of the gas supply assembly 800 may be coupled to a gas source, a gas outlet, and / or may be closed in various embodiments. In some embodiments, the interface formed between at least some of the fluid ports of the coupled modular gas blocks 600 includes a sealing mechanism. For example, the coupling between the fourth fluid port 635 and / or the second fluid port 620 and the flow regulator may include O-rings, gaskets, C-seals, and / or other sealing mechanisms that may prevent gas from leaking from the second fluid channel 620 at various interfaces between adjacent modular gas blocks 600.

[0057]

[0074] In some embodiments, a gas stick may be formed from a single larger modular gas block, rather than being formed from multiple smaller modular gas blocks coupled along the y-direction as described above. For example, FIGS. 9A-9F show an exemplary embodiment of a modular gas block 900 from which an entire gas stick may be individually formed in accordance with some embodiments of the present technology. The modular gas block 900 may be used as part of a gas supply assembly for mixing and / or supplying one or more gases to a semiconductor processing system for performing one or more processing steps, such as deposition, etching, annealing, cleaning, and / or curing. As described in more detail below, the modular gas block 900 may define a flow path extending along the length (e.g., y-axis) of the modular gas assembly, and multiple modular gas blocks 900 may be coupled in a side-to-side manner to form a gas path extending along the width (e.g., x-axis) of the gas supply assembly. Such a design may enable a modular gas assembly formed from connected modular gas blocks 900 to facilitate delivery and / or mixing of multiple gases along one or both axes before delivery to one or more processing systems.

[0058]

[0075] The gas block 900 may include a block body 905, which includes an inlet end 902 and an outlet end 904. As shown, the inlet end 902 and the outlet end 904 each have a generally rectangular prismatic shape, although other shapes may be used in various embodiments. The inlet end 902 and the outlet end 904 may be formed as a continuous block in some embodiments, although as shown, the inlet end 902 and the outlet end 904 may be spaced apart along the length of the block body 905. For example, the inlet end 902 and the outlet end 904 may be formed from different portions (e.g., a first portion and a second portion, respectively) of the block body 905. In some embodiments, the gas block 900 may include a base 910 coupled to the inlet end 902 and the outlet end 904. For example, the inlet end 902 and / or the outlet end 904 may be seated on and / or formed as part of the base 910. In embodiments where the inlet end 902 and the outlet end 904 are separate pieces, the two ends may be spaced apart along the length of the base 910 such that the base 910 couples the two ends together. Although two pieces are illustrated, it should be understood that the gas block 900 may include any number of pieces. For example, the gas block 900 may include at least about one piece, at least about two pieces, at least about three pieces, at least about four pieces, or more pieces. Each piece may be the same size in some embodiments, while in other embodiments, one or more pieces may have different sizes. By way of example only, the inlet end 902 may be longer than the outlet end 904, while in some embodiments, the reverse configuration may be used. In some embodiments, the sides, bottom, and / or top of each piece may be substantially planar from one piece to another, while in other embodiments, one or more of the surfaces may be offset relative to a corresponding surface of another piece of the block body 905.

[0059]

[0076] In some embodiments, the block body 905 and / or portions thereof may have a generally rectangular shape. As shown, each portion of the block body 905 includes a generally rectangular main portion and a generally rectangular protrusion extending laterally outward from the main portion, although any other suitable geometry is possible in various embodiments. The shape of the block body 905 may depend on the adjacent block geometry. For example, the block body 905 may have a T-shape, a Z-shape, an inverted Z-shape, a mirror Z-shape, and / or other shape in various embodiments. The block body 905 may include another overhanging region and / or ledge that may be used to couple to an adjacent gas block.

[0060]

[0077] The block body 905 may define a number of ports that may be used to interface various components of the modular gas assembly with the gas block 900. For example, the inlet end 902 may define a gas inlet 915. As shown, the gas inlet 915 is defined in an end face 906 of the inlet end 902 of the block body 905, although other locations of the gas inlet 915 (such as the top face 907 or bottom face 908) are possible in various embodiments. A fluid source may be fluidly coupled to the gas inlet 915. For example, a gas weld 920 and / or other fluid supply lumen may be coupled to the gas inlet 915 to supply fluid to one or more fluid paths defined within the gas block 900. The block body 905 may define one or more gas outlets 925 proximate the outlet end 904 that allow gas passing through a fluid path to exit the gas block 900 for supply to one or more substrate processing systems. For example, as shown, the gas outlet 925 may be formed in and / or through the bottom surface 908 of the block body 905. Although not shown here, one or more gas welds and / or other gas supply lumens may be coupled to the gas outlet 925 for transporting gases from the various fluid paths to the processing chambers.

[0061]

[0078] The block body 905 may define multiple fluid ports 930 along the length of the block body 905. The fluid ports 930 may form part of a first gas path 940 that extends along the length (y-axis) of the gas block 900. The fluid ports 930 may be used to interface various flow control devices (mass flow controllers, valves, etc.) with the gas block 900. In some embodiments, each fluid port 930 may be formed in and / or through the top surface 907 of the block body 905. The fluid ports 930 may be linearly aligned along the longitudinal axis of the block body 905 in some embodiments, while in other embodiments, one or more of the fluid ports 930 may be offset relative to the longitudinal axis. In some embodiments, one or both of the gas inlet 915 and gas outlet 925 may be aligned with the fluid port 930 along the longitudinal axis, while in other embodiments, the gas inlet 915 and / or gas outlet 925 may be offset from the fluid port relative to the longitudinal axis. For example, as shown, the gas inlet 915 is aligned with the fluid port 930, but the gas outlet 925 is offset laterally from the fluid port 930. In such embodiments, a valve or other flow control device may direct gas from one fluid port 930 to a gas supply inlet (such as a side fluid port 930, described below) that is fluidly coupled to the gas outlet 925. The spacing between adjacent fluid ports 930 may be constant over the length of the gas block 900, or may vary in some embodiments. For example, as shown, the spacing between adjacent fluid ports 930 may be varied to accommodate different flow control devices, such as by having each fluid port 930 aligned with a corresponding port of a respective flow control device.

[0062]

[0079] The block body 905 may define at least one side fluid port 935 that may form a portion of a second gas path 945 extending along a width (x-axis) of the gas block 900. For example, the top surface 907 may define each side fluid port 935. Each side fluid port 935 may be positioned proximate to at least one of the fluid ports 930. For example, each side fluid port 935 may be spaced apart from a respective fluid port 930 along the width of the block body 905. This may allow a valve to fluidly couple each fluid port 930 to one of the side fluid ports 935 to fluidly couple the first gas path 940 and the second gas path 945 to facilitate mixing of gas between adjacent gas blocks 900. In this manner, at least some of the fluid ports 930 may be part of both the first gas path 940 and the second gas path 945, while other fluid ports 930 (and side fluid ports 935) may be part of a single gas path. Each side fluid port 935 may be associated with at least one corresponding side outlet port 950 defined in the block body 905. For example, each side outlet port 950 may be defined in a side 909 of the block body 905, which may allow the side outlet ports 950 of adjacent gas blocks 900 to be aligned and fluidly coupled with one another to promote gas mixing between the gas blocks 900. In some embodiments, each gas block 905 may include a side outlet port 950 on a single side 908, while in other embodiments, both sides 909 may include a side outlet port 950.

[0063]

[0080] FIG. 9E is a schematic cross-sectional front view (e.g., a cross-section taken along the y-axis) illustrating the modular gas block 900. As indicated above, the block body 905 may define at least a portion of a first gas path 940 (wherein the flow controllers may couple discontinuous portions of the first gas path 940 to provide a continuous flow path along the length of the gas block 900) that may extend along the length of the gas block 900. The first gas path 940 may include the gas inlet 915, gas outlet 925, and fluid port 930 described above. The first gas path 940 may also include multiple channel segments that may be used to transport process gases and / or purge gases to respective processing systems. For example, as shown in FIG. 9E, the block body 905 may define an inlet channel segment 960 that extends in a direction substantially parallel to the longitudinal axis of the block body 905. The inlet channel segment 960 may fluidly couple the gas inlet 915 to the first gas path 940 and may be designed to transport gas from the gas inlet 915 to the first fluid port 930. A number of channel segments 965 may extend between at least some adjacent pairs of the remaining fluid ports 930 to transport fluid entering one fluid port 930 to another fluid port 930. For example, as shown, each channel segment 965 may define a generally V-shaped flow path connecting two fluid ports 930. In some embodiments, each channel segment 965 may extend through the bottom surface 908 of the block body 905 and form an opening in the bottom surface 908. This may be done, for example, to facilitate the formation of the channel segment 965 during the manufacturing process. In such embodiments, a plug, cover, and / or other sealing mechanism may interface with each opening to close the bottom surface of the respective channel segment 965.

[0064]

[0081] As described above, flow control devices, such as valves, mass flow controllers, and / or other devices that may be seated on the modular gas block 900 and capable of controlling, regulating, and / or otherwise affecting flow through the gas assembly, may be coupled to two or more fluid ports 930 to form a first gas path 940 that defines a continuous flow path. For example, the flow control devices may be valves that control the flow of one or more gases through one or more fluid ports 930. The valves may include two or more ports coupled to corresponding fluid ports 930 to control the flow of gas. For example, fluid exiting one fluid port 930 may enter an inlet of a valve (or other flow control device) that may selectively control the flow of fluid into one or more fluid ports 930. The flow control devices may be used to couple two or more fluid ports 930 that are not coupled to each other through one of the channel segments 965. This may allow the flow control devices to couple separate fluid ports 930 / channel segments 965 / inlet channel segments 960 to form a continuous flow path from the gas inlet 915 to the gas outlet 925.

[0065]

[0082] 9F is a schematic cross-sectional side view (e.g., a cross-section taken along the x-axis) illustrating a modular gas block 900. As described above, the block body 905 may define at least one additional lateral gas path (e.g., second gas path 945) extending along at least a portion of the width of the block body 905 (e.g., transverse to the longitudinal axis of the block body 905 and / or transverse to the first gas path 940) to transport gas between adjacent modular gas blocks 900 and promote gas mixing. The gas block 900 may define at least about one lateral gas path, at least about two lateral gas paths, at least about three lateral gas paths, at least about four lateral gas paths, or more. The second gas path 945 may include one or more channel segments 970 extending between and fluidly coupling the at least one side fluid port 935 and the at least one side outlet port 950. The second gas path 945 may include at least one fluid port 930 that may be fluidly coupled to a side fluid port 935 and a side outlet port 950 via one or more flow control devices to form a continuous second gas path 945 along at least a portion of the width of the block body 905. For example, gas provided to the first gas path 940 may exit the fluid port 930 and enter a valve or other flow control device that may selectively provide at least a portion of the gas into the side fluid port 935. The gas may then exit the gas block 900 via the side outlet port 950 where it may enter an adjacent gas block 900, which may allow mixing of different gases in each gas block 900 before being flowed to the semiconductor processing chamber.

[0066]

[0083] 9A-9C , the block body 905 may define a number of fastener receptacles 975 that may receive fasteners for securing multiple modular gas blocks 900 together and / or for securing flow regulators (e.g., mass flow controllers, valves, etc.) and / or other components to the modular gas block 900. For example, a portion of the block body 905 proximate the one or more fluid ports 930 and / or the side fluid ports 935 may define a number of fastener receptacles 975 that may allow fasteners to be inserted through the receptacles 975 to couple one or more flow regulators to the top surface 907 of the block body 905.

[0067]

[0084] Often, multiple different gases may be supplied to a processing chamber. Some gases may be mixed before being introduced to the processing chamber, which may help reduce the complexity of the conduits extending between the gas sources and the processing chamber. The use of modular gas blocks 600 and / or 900 may allow for the design and assembly of easily customizable gas supply assemblies that may allow gases from one or more gas sources to flow to one or more processing chambers and / or to be mixed prior to supplying the gases to one or more processing chambers. FIG. 10 illustrates multiple gas supply assemblies 1000, each incorporating multiple modular gas blocks 1050 arranged along the width of the respective gas supply assembly 1000 to facilitate the supply and / or mixing of multiple gases. The modular gas blocks 1050 may be similar to the modular gas blocks 600 and 900 described herein and may include any of the features described therein. As shown, the modular gas blocks 1050 are coupled side-by-side along the width (or x-axis) of the gas supply assembly 1000 to form a fluid pathway that extends along the width of the gas supply assembly 1000. It should be understood that each gas supply assembly 1000 may include any number of modular gas supply blocks 1050 in various embodiments. Additionally, one or more modular gas blocks 1050 may be added to or removed from the gas supply assembly to add or remove different gas sources. In embodiments where the modular gas blocks 1050 are similar to the modular gas blocks 900, adding or removing a gas source may be as simple as adding or removing a single gas block. The end-most modular gas blocks 1050 of a given assembly 1000 may include unused side fluid ports (e.g., side fluid port 935) and / or side exit ports (e.g., side exit port 950). In the above embodiment, such unused ports may be blocked, such as by plugging, capping, and / or otherwise closing the respective ports with an obstruction, as described with respect to FIG.To add a new gas stick to the gas supply assembly 1000, an obstruction (such as a cap, plug, and / or other obstruction) can be removed from each fluid port on the modular gas block 1050 on a given side (e.g., proximal or distal) of the gas supply assembly 1000. An additional modular gas block 1050 can then be interfaced with the exposed fluid port to expand the gas supply assembly 1000 to incorporate the additional gas stick. In some embodiments, the interface formed between at least some of the fluid ports of the coupled modular gas blocks 1050 includes a sealing mechanism. For example, the interface between adjacent side outlet ports can include O-rings, gaskets, C-seals, and / or other sealing mechanisms that can prevent gas from leaking through various interfaces between adjacent modular gas blocks 1050.

[0068]

[0085] Each gas supply assembly 1000 may incorporate any of the features of the gas supply assemblies previously described, such as gas supply assemblies 700 and 800. For example, the second fluid channels 630 of the various modular gas blocks 1050 may supply gas from a gas source 1005 to an outlet 1010 of the gas supply assembly 1000 for subsequent supply to one or more processing chambers and / or manifolds. The first fluid channels 610 may allow mixing of gases flowing within some or all of the second fluid channels 610 along the width of the gas supply assembly 1000. The flow and / or mixing of gases through the various fluid channels of the modular gas blocks 1050 may be controlled using one or more flow regulators, such as valves 1015, mass flow controllers 1020, etc., which may each be coupled to each of the modular gas blocks 1050 via the second fluid port 620 and / or the fourth fluid port 635, or the fluid port 930 and / or the side fluid port 935, etc. For example, various valves 1015 can be used to control whether and / or how much of a particular gas (or mixture of gases) flows through a given fluid channel and / or gas pathway of a given modular gas block 1050. Some or all of the side outlet ports (e.g., side outlet ports 950) of adjacent gas blocks can be aligned and fluidly coupled to one another when coupled to one another to facilitate mixing of gases between different gas sticks.

[0069]

[0086] As shown, each gas supply assembly 1000 includes three or four gas sources 1005 (e.g., one per gas stick), which may include one or more purge gas sources 1005a. However, in other embodiments, other numbers of gas sources 1005 may be used, where some or all of the gas sources 1005 are purge gas sources 1005a. For example, a given gas supply assembly 1000 may include at least about one gas source 1005, at least about two gas sources 1005, at least about three gas sources 1005, at least about four gas sources 1005, at least about five gas sources 1005, at least about six gas sources 1005, or more. Each gas supply assembly 1000 may include an outlet 1010, such as an output welder, that may supply any combination of one or more gases from the gas supply assembly 1000 to one or more processing chambers and / or manifolds.

[0070]

[0087] By using modular gas blocks 1050 to form the gas supply assembly 1000, embodiments of the present invention can facilitate mixing of gas between adjacent gas sticks in the x-direction without using a network of welds at the bottom of the gas supply assembly, which can greatly simplify the design and manufacture of the gas supply assembly and reduce the time and costs associated therewith. In some embodiments, each block 1050 in the gas supply assembly 1000 can have the same geometry or design, which can simplify the construction of a given gas supply assembly 1000. In other embodiments, the gas supply assembly 1000 can include several different modular gas blocks (such as those similar to modular gas block 600 that include additional ports in the middle region 607 and / or those similar to modular gas block 900 that include different arrangements of ports and / or bonding geometries). In some embodiments, the modular gas blocks 1050 at the extreme proximal and / or distal ends of the width and / or length of the gas supply assembly 1000 can be different to accommodate connections with other components, such as welds from gas sources, outlets, etc. Such a modular design may allow different configurations of gas supply assemblies to be formed with a single type (or a small number of types) of modular gas block 1000 at hand.

[0071]

[0088] As discussed above, each gas supply assembly may include an outlet that supplies one or more mixed gases to one or more processing chambers and / or manifolds. For example, the gas supply assembly may be located remotely from (such as below) the processing chamber. The outlet may be coupled to a fluid line, such as a weld, that directs gas from the gas supply assembly to the processing chamber and / or manifold. FIG. 11 is a schematic top view of an embodiment of a semiconductor processing system 1100 according to some embodiments of the present technology. This view may include any of the components of the systems shown and described above and may show further aspects of any of the systems described above. It should also be understood that the illustration may depict exemplary components as found in any of the quad sections 109 described above.

[0072]

[0089] The semiconductor processing system 1100 may include a lid plate 1105, which may be similar to the second lid plate 510 described above. For example, the lid plate 1105 may define a number of apertures similar to the apertures 512 that provide access to a number of processing chambers positioned below the lid plate 1105. Each aperture of the plurality of apertures may be defined to provide fluid access to a particular lid stack, processing chamber, and / or processing region.

[0073]

[0090] A gas splitter assembly 1110 may be seated on the top surface of the lid plate 1105. For example, the gas splitter assembly 1110 may be centrally located between the apertures in the lid plate 1105. The gas splitter assembly 1110 may be fluidly coupled to multiple input welds 1115 each coupled to a respective outlet of a gas supply assembly, such as gas supply assemblies 700, 800, and 1000. The input welds 1115 may supply gas, such as precursor, plasma effluent, and / or purge gas, from multiple gas sources to the gas splitter assembly 1110. For example, each of the input welds 1115 may extend vertically from a gas supply assembly positioned below the lid plate 1105 and pass through a feedthrough plate 1120. A portion of the input welds 1115 above the feedthrough plate 1120 may be bent horizontally to direct gas toward the gas splitter assembly 1110. In some embodiments, some or all of the input weld 1115 may be disposed within a heater jacket 1119 that helps prevent heat loss along the length of the input weld 1115 .

[0074]

[0091] The gas splitter assembly 1110 can receive gas from an input weld 1115 and recursively split the gas flow into multiple gas outputs, each in contact with one or more valves 1127 that help control the flow of gas through a valve block 1125. For example, the valves 1127 can be actuated to control whether the purge gas and / or process gas is allowed to flow into the respective processing chamber or diverted from the processing chamber to another location in the system 1100. For example, the outlets of the gas splitter assembly 1110 can each be fluidly coupled to an output weld 1130, which can deliver the purge gas and / or process gas to an output manifold 1135 associated with a particular processing chamber. For example, the output manifold 1135 can be positioned over each aperture formed in the lid plate 1105 and can be fluidly coupled to a lid stack component to deliver one or more gases to a processing region of a respective processing chamber.

[0075]

[0092] In the foregoing specification, for purposes of explanation, numerous details have been set forth in order to provide an understanding of various embodiments of the present technology. However, it will be apparent to one skilled in the art that certain embodiments may be practiced without some of these details or with additional details.

[0076]

[0093] Although several embodiments have been disclosed, it will be recognized by those skilled in the art that various modifications, alternative structures, and equivalents may be used without departing from the spirit of the embodiments. Moreover, some well-known processes and elements have not been described so as not to unnecessarily obscure the present technology. Thus, the above specification should not be interpreted as limiting the scope of the present technology. Furthermore, although a method or process may be described sequentially or stepwise, it should be understood that the steps may be performed simultaneously or in an order different from that listed.

[0077]

[0094] Where a range of values ​​is provided, it is understood that each intervening value between the upper and lower limit of that range, to the smallest fraction of the unit of the lower limit, is also specifically disclosed, unless the context clearly dictates otherwise. Any narrower range between any stated value or unstated intervening value in a stated range and any other stated or intervening value in that stated range is included. The upper and lower limits of these smaller ranges may be independently included or excluded, and each range in which either or both limits are included in the smaller ranges is also included within the technology, subject to any specifically excluded limit in the stated range. Where a stated range includes one or both limits, ranges excluding either or both of those included limits are also included.

[0078]

[0095] As used in this specification and the appended claims, the singular forms "a," "an," and "the" include plural references unless the context clearly dictates otherwise. Thus, for example, a reference to "a plate" includes a plurality of such plates, and a reference to "an aperture" includes a reference to one or more apertures and equivalents thereof known to those skilled in the art, and so forth.

[0079]

[0096] Additionally, as used in this specification and the claims that follow, the terms "comprise," "comprising," "contain," "containing," "include," and "including" specify the presence of stated features, integers, components, or steps, but do not exclude the presence or addition of one or more other features, integers, components, steps, operations, or groups.

Claims

1. 1. A modular gas block, comprising: a block body having an inlet end and an outlet end, the block body defining a portion of a first gas path along a length of the block body and a second gas path along a width of the block body; the first gas path includes a plurality of channel segments defined within the block body; an inlet end of the block body defining a gas inlet fluidly coupled to the first gas path; a top surface of the block body defining a first plurality of fluid ports fluidly coupled to the first gas path; a first fluid port of the first plurality of fluid ports is fluidly coupled to the gas inlet; at least some of the first plurality of fluid ports are coupled to one another via respective ones of the plurality of channel segments; a top surface of the block body defining a side fluid port spaced from each of the first plurality of fluid ports along a width of the block body and coupled to each of the first plurality of fluid ports via the second gas path; Modular gas block.

2. a gas weld coupled to the gas inlet.

2. The modular gas block of claim 1.

3. the block body including a first portion disposed at the inlet end and a second portion disposed at the outlet end; the first portion and the second portion are spaced apart from one another along a length of the block body.

2. The modular gas block of claim 1.

4. a plurality of valves, each coupled to at least two of the first plurality of fluid ports; The modular gas block of claim 1 further comprising:

5. at least two of the first plurality of fluid ports include fluid ports that are not coupled to one another through one of a plurality of channel segments; 5. The modular gas block of claim 4.

6. the block body defining a side outlet port fluidly coupled to the side fluid port via the second gas path.

2. The modular gas block of claim 1.

7. further comprising one or more plugs in contact with the side outlet port and the side fluid port.

7. The modular gas block of claim 6.

8. each of the plurality of channel segments extending through a bottom surface of the block body to define an opening; a plug contacts each opening to close a bottom surface of each of the plurality of channel segments; 2. The modular gas block of claim 1.

9. The block body defines a gas outlet adjacent the outlet end.

2. The modular gas block of claim 1.

10. an additional block body coupled to a first side of the block body, the additional block body defining a portion of a third gas path along a length of the additional block body and defining a fourth gas path along a width of the additional block body; the additional block body defining an additional side outlet port fluidly coupled to the fourth gas path; the side outlet port and the additional side outlet port are coupled to each other; 2. The modular gas block of claim 1.

11. the first gas path and the second gas path are fluidly coupled to each other.

2. The modular gas block of claim 1.

12. 1. A modular gas block, comprising: a block body having an inlet end and an outlet end, the block body defining a portion of a first gas path along a length of the block body and a second gas path along a width of the block body; the first gas path and the second gas path are fluidly coupled to each other; the first gas path includes a plurality of channel segments defined within the block body; an inlet end of the block body defining a gas inlet fluidly coupled to the first gas path; a top surface of the block body defining a first plurality of fluid ports fluidly coupled to the first gas path; a first fluid port of the first plurality of fluid ports is fluidly coupled to the gas inlet; at least some of the first plurality of fluid ports are coupled to one another via respective ones of the plurality of channel segments; a top surface of the block body defining a side fluid port spaced from each of the first plurality of fluid ports along a width of the block body and coupled to each of the first plurality of fluid ports via the second gas path; The block body defines a gas outlet adjacent the outlet end. Modular gas block.

13. The gas inlet extends through an end face of the block body.

13. The modular gas block of claim 12.

14. Each of the plurality of channel segments defines a generally V-shaped flow path.

13. The modular gas block of claim 12.

15. The gas outlet is formed on the bottom surface of the block body.

13. The modular gas block of claim 12.

16. Further comprising a base; the block body including a first portion disposed at the inlet end and a second portion disposed at the outlet end; the first portion and the second portion are spaced apart from one another along a length of the base.

13. The modular gas block of claim 12.

17. 1. A modular gas supply assembly comprising: a plurality of modular gas blocks, each of the plurality of modular gas blocks comprising: a block body having an inlet end and an outlet end, the block body defining a portion of a first gas path along a length of the block body and a second gas path along a width of the block body; the first gas path and the second gas path of a given block body are fluidly coupled to one another; each first gas path includes a plurality of channel segments defined within the block body; an inlet end of each block body defining a gas inlet fluidly coupled to the first gas path of the respective block body; a top surface of each block body defining a first plurality of fluid ports fluidly coupled to the first gas path of the respective block body; a first fluid port of the first plurality of fluid ports of each block body is fluidly coupled to the gas inlet of the respective block body; at least some of the first plurality of fluid ports of each block body are coupled to one another via respective ones of the plurality of channel segments of the respective block body; each block body defining a side outlet port fluidly coupled to the second gas path; the side exit port of each block body is in contact with the side exit port of at least one adjacent block body; Modular gas supply assembly.

18. a gas supply lumen coupled to an outlet of at least one of the plurality of modular gas blocks; The modular gas supply assembly of claim 17 further comprising:

19. a plurality of gas sources, each coupled to the gas inlet of each of the plurality of modular gas blocks; The modular gas supply assembly of claim 17 further comprising:

20. one or both of a mass flow controller and a valve in contact with at least one of the first plurality of ports of each of the plurality of modular gas blocks; 20. The modular gas supply assembly of claim 17.

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