Atomic layer deposition coating system for gas line interior walls

Abstract

Provided herein are embodiments of an apparatus for coating a plurality of gas lines. In some embodiments, the apparatus for coating a plurality of gas lines via an ALD process includes an oven having a housing defining an interior volume configured to accommodate the plurality of gas lines, the housing having a door configured to transfer the plurality of gas lines into and out of the interior volume, a plurality of inlet ports disposed through a first wall of the housing, a plurality of exhaust ports disposed through a second wall of the housing, a fluid panel disposed outside the oven and coupled to the plurality of inlet ports via corresponding ones of a plurality of fluid distribution assemblies, and a foreline disposed outside the oven and coupled to the plurality of exhaust ports.

Description

[Technical Field]

[0001] FIELD OF THE DISCLOSURE Embodiments of the present disclosure generally relate to deposition equipment. [Background technology]

[0002] Various manufacturing processes expose semiconductor process chamber components to high temperatures, high-energy plasmas, corrosive halogen gases, high stresses, and combinations thereof. Such harsh conditions can erode and / or corrode chamber components, thereby increasing defects. Reducing defects improves the erosion and / or corrosion resistance of components in such harsh environments.

[0003] Protective coatings are commonly deposited on chamber components by various methods, such as thermal spraying, sputtering, ion-assisted deposition (IAD), plasma spraying, or vapor deposition techniques. However, such techniques cannot adequately deposit coatings into some features of chamber components that have high aspect ratios or complex shapes. In some cases, specialized equipment must be used to direct precursor gases into the complex internal features of gas lines and other components of the gas distribution system, which can result in low-quality and / or non-conformal films.

[0004] Accordingly, the present inventors have provided an improved method and apparatus for coating the interior walls of gas lines. Summary of the Invention

[0005] Provided herein are embodiments of an apparatus for coating multiple gas lines. In some embodiments, the apparatus for coating multiple gas lines via an ALD process includes an oven having a housing defining an interior volume configured to store the multiple gas lines, the housing having a door configured to transport the multiple gas lines into and out of the interior volume, a plurality of inlet ports disposed through a first wall of the housing, each of the multiple inlet ports configured to couple to a first end of a corresponding one of the multiple gas lines, a plurality of exhaust ports disposed through a second wall of the housing, each of the multiple exhaust ports configured to couple to a second end of a corresponding one of the multiple gas lines, a fluid panel disposed outside the oven and coupled to the multiple inlet ports via a corresponding one of the multiple fluid distribution assemblies, and a foreline disposed outside the oven and coupled to the multiple exhaust ports.

[0006] In some embodiments, an apparatus for coating a plurality of gas lines via an ALD process includes: an oven having a housing defining an interior volume configured to store the plurality of gas lines, the housing having a door configured to transport the plurality of gas lines into and out of the interior volume; a plurality of vertically spaced-apart inlet ports disposed through a first wall of the housing, each of the plurality of inlet ports configured for coupling to a first end of a corresponding one of the plurality of gas lines; a plurality of vertically spaced-apart exhaust ports disposed through a second wall of the housing, each of the plurality of exhaust ports configured for coupling to a second end of a corresponding one of the plurality of gas lines; a fluid panel disposed outside the oven and coupled to the plurality of inlet ports via a corresponding one of the plurality of fluid distribution assemblies; and a foreline disposed outside the oven and coupled to the plurality of exhaust ports.

[0007] In some embodiments, a method for simultaneously coating the interiors of multiple gas lines includes installing multiple gas lines in an oven; coupling a first end of each of the multiple gas lines to a corresponding one of multiple inlet ports of the oven; coupling a second end of each of the multiple gas lines to a corresponding one of multiple exhaust ports of the oven; and flowing one or more process fluids from the multiple inlet ports through the multiple gas lines to the multiple exhaust ports to coat interior walls of the multiple gas lines via an ALD process.

[0008] Other and further embodiments of the present disclosure are described below.

[0009] Embodiments of the present disclosure, briefly summarized above and described in more detail below, can be understood by reference to the exemplary embodiments of the present disclosure that are illustrated in the accompanying drawings. However, the accompanying drawings depict only typical embodiments of the present disclosure and therefore should not be considered limiting in scope, as the present disclosure may admit of other equally effective embodiments. [Brief explanation of the drawings]

[0010] [Figure 1] FIG. 1 shows a schematic diagram of an apparatus for coating multiple gas lines, according to at least some embodiments of the present disclosure. [Figure 2] FIG. 1 illustrates a schematic top isometric view of an apparatus for coating multiple gas lines, according to at least some embodiments of the present disclosure. [Figure 3] FIG. 1 illustrates an isometric view of a rack disposed in an interior volume, according to at least some embodiments of the present disclosure. [Figure 4] FIG. 1 illustrates an isometric view of a lifting fixture, according to at least some embodiments of the present disclosure. [Figure 5]FIG. 1 shows a schematic top view of a fluid distribution assembly, according to at least some embodiments of the present disclosure. [Figure 6] FIG. 1 illustrates a schematic side view of a foreline, in accordance with at least some embodiments of the present disclosure. [Figure 7] FIG. 1 shows a schematic side view of an oven, according to at least some embodiments of the present disclosure. [Figure 8] FIG. 1 illustrates a flowchart of a method for simultaneously coating the interior of multiple gas lines, according to at least some embodiments of the present disclosure. DETAILED DESCRIPTION OF THE INVENTION

[0011] To facilitate understanding, like reference numerals have been used, where possible, to designate like elements common to the figures. The figures are not drawn to scale and may be simplified for clarity. Elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.

[0012] Provided herein are embodiments of an apparatus for coating multiple gas lines via atomic layer deposition (ALD) techniques. The ALD technique can deposit AlO films on the interior walls (e.g., the interior of the gas lines) of various configurations and sizes, for example, having length-to-diameter or depth-to-width ratios of about 10:1 to about 300:1. x It is advantageously used to deposit films such as Al2O3. x The film advantageously reduces particle generation from gas lines during use and improves gas line life. The apparatus may include an oven configured for simultaneously coating multiple gas lines or weldments. Such an arrangement advantageously increases throughput and reduces precursor consumption.

[0013] The precursors used for coating can be organometallic or inorganic chemicals, such as TMA, HO, and ozone, maintained at a specified temperature and vapor pressure in an ampoule. Depending on the process regime pressure and temperature, deposition is carried out under surface-reaction-limited conditions to obtain conformal coatings and good step coverage, for example, at temperatures of about 300 degrees Celsius and pressures ranging from about 1 Torr to about 100 Torr. The process pressure is optimized by gas flow and throttle valve position and controlled in conjunction with a roughing pump. The system outlet is connected to a dedicated roughing pump. A throttle valve located along the system exhaust line is used to allow slow, gentle pumping through the roughing pump.

[0014] FIG. 1 shows a schematic diagram of an apparatus 100 for coating multiple gas lines, according to at least some embodiments of the present disclosure. The apparatus 100 generally includes an oven 102 having a housing 106 defining an interior volume 110 configured to store multiple gas lines 112. The multiple gas lines 112 may be held in the oven 102 in any suitable manner. For example, as shown in FIG. 1, the multiple gas lines 112 may be arranged on multiple trays 108 (described in more detail below). Alternatively, in some embodiments, the multiple gas lines 112 may be suspended or held from a sidewall of the housing 106. In other examples, the multiple gas lines 112 may be arranged on a rotating device disposed in the interior volume 110. The oven 102 is configured to facilitate coating the multiple gas lines 112 via an atomic layer deposition (ALD) process. The oven 102 may advantageously coat the interior walls of multiple gas lines 112 having various shapes and sizes that may otherwise be difficult to coat.

[0015] The oven 102 includes a plurality of inlet ports 114 and a plurality of exhaust ports 118. In some embodiments, the plurality of inlet ports 114 are disposed through a first wall 122 of the housing 106. The plurality of inlet ports 114 are coupled to a fluid panel 120 for supplying process fluids to the oven 102. A first end of each of the plurality of gas lines 112 is fluidly coupled to one of the plurality of inlet ports 114 via one of a plurality of first conduits 162. In some embodiments, the plurality of exhaust ports 118 are disposed through a second wall 126 of the housing 106. A second end of each of the plurality of gas lines 112 is fluidly coupled to one of the plurality of exhaust ports 118 via one of a plurality of second conduits 164. The plurality of exhaust ports 118 are coupled to a foreline 128 for exhausting process fluids from the plurality of gas lines 112. Thus, during use, each of the plurality of gas lines 112 acts as an individual ALD chamber disposed in the oven 102 configured to provide temperature and pressure conditions to facilitate good film coverage on the interior walls of the plurality of gas lines 112.

[0016] In some embodiments, the oven 102 includes one or more recirculation inlet ports 132 and recirculation output ports 134 to facilitate heating and cooling of the interior volume 110. One or more blowers 142 may be coupled to the housing 106 to supply a gas, such as nitrogen gas. For a heating cycle, the gas may be heated via a heating element 138 and then transported from the heating element 138 to the interior volume 110 via a conduit 136. The conduit 136 may be coupled to the one or more blowers 142 to flow the heated gas into the interior volume 110. The recirculation output port 134 may divert the gas via a conduit 168 back to the heating element 138 for reheating and recirculation. In some embodiments, the interior volume 110 is maintained at about 250 to about 350 degrees Celsius during processing.

[0017] In the cooling cycle, the gas picks up heat from the multiple gas lines 112 and transfers the heated gas via conduit 168 to heating element 138, which may act as a heat exchanger to cool the heated gas. The cooled gas may then be returned into interior volume 110 via conduit 136 and one or more blowers 142. In some embodiments, one or more recirculation inlet ports 132 consist of two such ports.

[0018] The fluid panel 120 is generally disposed external to the oven 102 and is coupled to the plurality of inlet ports 114, for example, via corresponding ones of the plurality of fluid distribution assemblies 130. The fluid panel 120 may house process fluid sources for performing the coating processes described herein. A plurality of process fluid supply lines may extend from the fluid panel 120 to each of the plurality of fluid distribution assemblies 130. For example, in some embodiments, the plurality of process fluid supply lines comprises a first process fluid supply line 144, a second process fluid supply line 146, and a third process fluid supply line 148. In some embodiments, the first process fluid supply line 144 comprises a trimethylaluminum (TMA) supply line. In some embodiments, the second process fluid supply line 146 comprises a nitrogen gas supply line. In some embodiments, the third process fluid supply line 148 comprises a water supply line. In some embodiments, the apparatus 100 includes a purge source 140 coupled to the fluid panel 120 for purging the plurality of process fluid supply lines as needed. In some embodiments, purge source 140 comprises ozone and is coupled to fluid panel 120 via supply line 124 .

[0019] The foreline 128 (described in more detail below) is generally disposed external to the oven 102 and is coupled to the plurality of exhaust ports 118. For example, the foreline 128 may be fixed to the exterior surface of the housing 106. The foreline 128 is coupled to a pump 150 configured to facilitate evacuating the interior volume of the plurality of gas lines 112. The foreline 128 may include an isolation valve 152 for maintenance and safety purposes. One or more normally closed valves 156 may be coupled to the foreline 128 to prevent evacuating the plurality of gas lines 112 when not desired during the coating process.

[0020] The apparatus 100 may include additional racking to facilitate loading and unloading of the plurality of trays 108 and the plurality of gas lines 112. For example, the apparatus may include a loading rack 160. The loading rack 160 may include structures or features configured to hold the plurality of trays 108. The plurality of gas lines 112 may be arranged or assembled on corresponding trays of the plurality of trays 108 on the loading rack 160 prior to transfer to the oven 102. In some embodiments, each tray of the plurality of trays 108 is transferred individually from the loading rack 160 to the interior volume 110. In some embodiments, the entire loading rack 160, along with the plurality of gas lines 112, may be placed in the oven 102 for processing. In some embodiments, the apparatus may include an unloading rack 170 having structures or features for holding the plurality of trays 108 after processing. The unloading rack 170 may facilitate easy removal of the treated or coated plurality of gas lines 112. Once the plurality of gas lines 112 are disconnected, an empty one of the plurality of trays 108 may be transferred to the loading rack 160 for reuse.

[0021] FIG. 2 shows a schematic top isometric view of an apparatus for coating multiple gas lines, according to at least some embodiments of the present disclosure. The housing 106 of the oven 102 generally includes one or more openings for transferring the multiple gas lines 112. For example, the housing 106 may include one or more doors 206 configured for transferring the multiple gas lines 112 into and out of the interior volume 110. FIG. 2 shows a set of two doors located on a single wall of the housing 106. However, in some embodiments, the one or more doors 206 may be located on multiple walls of the housing. The one or more doors 206 may form a seal (not shown) with the housing 106 in a suitable manner, for example, via one or more O-rings. In some embodiments, the apparatus 100 is configured to orient the multiple gas lines 112 in a vertically spaced arrangement.

[0022] In some embodiments, the multiple inlet ports 114 are oriented and spaced apart in the vertical direction. In some embodiments, the multiple fluid distribution assemblies 130 are oriented and spaced apart in the vertical direction. For example, each of the multiple fluid distribution assemblies 130 may be positioned adjacent to or near a corresponding one of the multiple inlet ports 114. In some embodiments, the first process fluid supply line 144 includes a first integrated line 208 extending from the fluid panel 120 and multiple branches 248 extending from the first integrated line 208 to the multiple fluid distribution assemblies 130. In some embodiments, the second process fluid supply line 146 includes a second integrated line 210 extending from the fluid panel 120 and multiple second branches 230 extending from the second integrated line 210 to the multiple fluid distribution assemblies 130. In some embodiments, the third process fluid supply line 148 includes a third integrated line 218 extending from the fluid panel 120 and a plurality of third branches 228 extending from the third integrated line 218 to a plurality of fluid distribution assemblies 130.

[0023] As described above, each of the plurality of inlet ports 114 is configured for coupling to a first end of a corresponding one of the plurality of gas lines 112. In some embodiments, the plurality of inlet ports 114 are positioned near the one or more doors 206 to facilitate access to and connection to the plurality of first conduits 162. In some embodiments, a plurality of trays 108 are positioned in the interior volume 110 to hold the plurality of gas lines 112.

[0024] In some embodiments, the plurality of exhaust ports 118 are oriented in a vertically spaced relationship. Each of the plurality of exhaust ports 118 is configured to couple to a second end of a corresponding one of the plurality of gas lines 112. In some embodiments, the plurality of exhaust ports 118 are positioned near the one or more doors 206 to facilitate access and connection to the plurality of second conduits 164. During processing, the interior volume of the plurality of gas lines 112 is not exposed to the interior volume 110 of the oven 102.

[0025] In some embodiments, the oven 102 has a width 212 of about 5 to about 9 feet. In some embodiments, the oven 102 has a length 214 of about 4 to about 7 feet. In some embodiments, the oven 102 has a height 216 of about 4 to about 7 feet. The trays 108 may be sized to suitably hold the gas lines 112 within the interior volume 110 of the oven 102. One or more elevator guides 220 may be provided near one or more doors 206 to assist an elevator (e.g., elevator 400) in aligning, loading, or unloading the trays 108.

[0026] FIG. 3 shows an isometric view of a rack disposed in the interior volume, according to at least some embodiments of the present disclosure. In some embodiments, the rack of multiple trays 108 may include multiple slots 310 (one shown in FIG. 3 ). Each of the multiple slots 310 may be configured to receive a pin 302 extending from a side wall of the housing 106, such as from the second wall 126. Each of the pins 302 may be in the multiple slots 310 to facilitate supporting and retaining the multiple trays 108. In some embodiments, for each tray of the multiple trays 108, the first wall 122 may include one or more pins 302 extending from the second wall 126 and aligned along a common horizontal plane. In some embodiments, the multiple trays 108 comprise a frame 303 and a grid 304 or mesh extending across the frame 303.

[0027] 4 shows an isometric view of a lifting device 400 according to at least some embodiments of the present disclosure. The lifting device 400 generally includes a fixed portion 410 and a lifting portion 420, which can be raised or lowered relative to the fixed portion 410. In some embodiments, the lifting portion 420 can include a support arm, such as a fork 430, configured to support one of the trays 108. In some embodiments, the lifting portion 420 can be moved manually via a handle 418. In some embodiments, the lifting portion 420 can be moved via an electronic actuator, a pulley system, gears and chains, or the like.

[0028] 5 shows a schematic top view of a fluid distribution assembly according to at least some embodiments of the present disclosure. In some embodiments, the multiple fluid distribution assemblies 130 include multiple process fluid supply lines that converge into a single inlet line 510 coupled to each of the multiple inlet ports 114. In some embodiments, the multiple fluid distribution assemblies include a Y-weld 508 configured to merge multiple process fluids while minimizing chemical vapor deposition in the Y-weld 508.

[0029] For example, in some embodiments, a first process fluid supply line 144 containing a first fluid may be coupled to a first conduit 512 having a first valve 542 for controlling the flow of the first fluid through the first conduit 512. In some embodiments, a second process fluid supply line 146 may be coupled to a first carrier conduit 514 having a first mass flow controller 544 for controlling the flow of a second fluid through the first carrier conduit 514. The first conduit 512 may be coupled to the first carrier conduit 514 through a first three-port pulse valve 532. The first carrier conduit 514 may provide a carrier gas or a purge gas. The first process fluid may include a mixture of the first and second fluids. A first process fluid line 526 has one end coupled to the first three-port pulse valve 532 and another end coupled to a junction 550 of a Y-weldment 508. The first three-port pulse valve 532 may be configured to pulse the first fluid into the first process fluid line 526 (and thus into one of the multiple inlet ports 114). In some embodiments, the first three-port pulse valve 532 is configured to provide a continuous flow from the first carrier conduit 514 and a pulsed flow from the first conduit 512. The first exhaust line 524 may extend from the first conduit 512 to a foreline, such as the foreline 128 of the apparatus 100 or a separate foreline. The first exhaust line 524 may include a first exhaust valve 554 that is normally closed.

[0030] In some embodiments, a third process fluid supply line 148 containing a third fluid may be coupled to a third conduit 518 having a third valve 548 for controlling the flow of the third fluid through the third conduit 518. In some embodiments, a second process fluid supply line 146 may be coupled to a second carrier conduit 516 having a second mass flow controller 546 for controlling the flow of the second fluid through the second carrier conduit 516. The third conduit 518 may be coupled to the second carrier conduit 516 through a second three-port pulse valve 534. The second carrier conduit 516 may provide a carrier gas or a purge gas. The second process fluid may include a mixture of the third fluid and the second fluid. A second process fluid line 528 is coupled at one end to the second three-port pulse valve 534 and at another end to a junction 550 of the Y-weldment 508. The second three-port pulse valve 534 can be configured to pulse the third fluid into the second process fluid line 528 (and thus into one of the multiple inlet ports 114). In some embodiments, the second three-port pulse valve 534 is configured to provide a continuous flow from the second carrier conduit 516 and a pulsed flow from the third conduit 518.

[0031] A second exhaust line 522 may extend from the third conduit 518 to a foreline, such as the foreline 128 or a separate foreline, of the apparatus 100. The second exhaust line 522 may include a normally closed second exhaust valve 552. The first process fluid line 526 and the second process fluid line 528 merge into a single inlet line 510. In some embodiments, the single inlet line 510 includes a manometer for measuring the pressure in the single inlet line 510 and is configured to send the pressure data to a system controller 700 of the apparatus 100 for controlling the flow rate and pulse rate of the process gas.

[0032] In some embodiments, the purge source 140 extends to a purge conduit 506 for purging various conduits of the gas distribution assembly. In some embodiments, the purge conduit 506 extends from a second exhaust line 522 and includes a purge valve 536 for controlling the flow of purge gas. In some embodiments, the purge conduit 506 flows ozone (O). In some embodiments, the first fluid includes trimethylaluminum. In some embodiments, the second fluid includes nitrogen. In some embodiments, the third fluid includes HO.

[0033] FIG. 6 shows a side view of a foreline according to at least some embodiments of the present disclosure. In some embodiments, a normally-closed valve 610 is disposed between the foreline 128 and each of the plurality of exhaust ports 118. Thus, during use, the normally-closed valve 610 can be actuated to an open position when pumping down of each one of the plurality of gas lines 112 is desired. In some embodiments, a purge line 650 is coupled to the foreline 128 to provide a purge gas, such as nitrogen gas, to the foreline 128. The purge gas can be provided from a purge gas source 620. The purge line 650 is generally coupled to the foreline 128 upstream of one of the normally-closed valves 610. In some embodiments, the purge gas is provided from the fluid panel 120. The purge gas can advantageously reduce or prevent unwanted deposition or coating of the interior walls of the foreline 128 as process fluids from the plurality of gas lines 112 pass through the foreline 128. In some embodiments, the purge line 650 includes a check valve 612 to prevent reverse flow.

[0034] The foreline 128 may include various components to aid in pressure control and measurement. For example, in some embodiments, the foreline 128 includes a throttle valve 618 downstream of the normally closed valve 610 to maintain a desired pressure in the foreline 128. In some embodiments, the foreline 128 includes a pressure switch 602 with a desired pressure setpoint to aid in regulating and pumping down the foreline 128. In some embodiments, the pressure switch 602 is located downstream of the isolation valve 152. The foreline 128 may include a manometer 616 for measuring the pressure in the foreline 128. In some embodiments, the foreline 128 includes a manual valve 604. The manual valve 604 may be located downstream of the isolation valve 152. In some embodiments, the foreline 128 includes a trap 606 to contain particulate contaminants and extend the life of the pump 150. The trap 606 may include a mesh or suitable filter media to capture particulate contaminants. In some embodiments, the trap 606 is located downstream of the shut-off valve 152. In some embodiments, the trap 606 is located downstream of the manometer 616.

[0035] FIG. 7 shows a schematic side view of an oven according to at least some embodiments of the present disclosure. A system controller 700 controls operation of the apparatus 100 by controlling computers (or controllers) associated with the oven 102, the fluid panel 120, the fluid distribution assembly 130, and components connected to the foreline 128. The system controller 700 generally includes a central processing unit (CPU) 702, a memory 704, and support circuits 706. The CPU 702 may be one of any form of general-purpose computer having one or more processors that can be used in an industrial environment. The support circuits 706 are conventionally coupled to the CPU 702 and may include cache, clock circuits, an input / output subsystem, a power supply, etc. Software routines, such as the processing methods described above, may be stored in the memory 704 and, when executed by the CPU 702, transform the CPU 702 into the system controller 700. The software routines may also be stored and / or executed by a second controller (not shown) located remotely from the apparatus 100.

[0036] In operation, system controller 700 enables data collection and feedback from each component of device 100 to optimize performance of device 100, and provides instructions to the system components to perform the methods described herein. For example, memory 704 may be a non-transitory computer-readable storage medium having instructions that, when executed by CPU 702 (or system controller 700), perform the methods described herein.

[0037] For example, the system controller 700 may be used to verify whether one gas line of the plurality of gas lines 112 is present and connected to the inlet port 114 and the exhaust port 118. For example, the plurality of inlet ports 114 may include a first input port 712, a second input port 714, a third input port 716, a fourth input port 718, and a fifth input port 720. The plurality of exhaust ports 118 may correspondingly include a first exhaust port 712', a second exhaust port 714', a third exhaust port 716', a fourth exhaust port 718', and a fifth exhaust port 720'. On the input side, an inlet sensor 740 may be coupled to each port of the plurality of inlet ports 114. The inlet sensor 740 is configured to provide the system controller 700 with a signal indicating whether one gas line of the plurality of gas lines 112 is connected to that inlet port. Similarly, on the exhaust side, an output sensor 750 may be coupled to each port of the plurality of exhaust ports 118. The output sensor 750 is configured to provide a signal to the system controller 700 indicating whether one of the plurality of gas lines 112 is connected to its exhaust port. By way of example, as shown in FIG. 7 , the first gas line 112′ may be connected to the fifth input port 720 and the fifth exhaust port 720′, the second gas line 112″ may be connected to the fourth input port 718 and the third exhaust port 716′, and the third gas line 112′″ may be connected to the third input port 716 and the first exhaust port 712′. In such an embodiment, the system controller 700 may recognize that the second exhaust port 714′ and the fourth exhaust port 718′ are not coupled to any gas lines and, therefore, maintain the normally-closed valves 610 associated with the second exhaust port 714′ and the fourth exhaust port 718′ in a closed position. Similarly, the valves in the fluid distribution assembly 130 associated with the first input port 712 and the second inlet port 714 will remain closed.

[0038] In some embodiments, the input manometer 504 may provide pressure readings to the system controller 700 to control the flow of fluid to the multiple inlet ports 114. In some embodiments, the manometer 616 on the foreline 128 may provide pressure readings to the system controller 700, which may facilitate actuation of various valves coupled to the foreline 128 to control and regulate the pressure.

[0039] 8 shows a flowchart of a method 800 for simultaneously coating the interiors of multiple gas lines, according to at least some embodiments of the present disclosure. At 802, method 800 includes placing multiple gas lines (e.g., multiple gas lines 112) in an oven (e.g., oven 102). In some embodiments, the installation of the multiple gas lines in the oven is performed via a rotating lifting device (e.g., lifting device 400). The multiple gas lines may be suspended from a sidewall of the oven or placed on various fixtures or stands disposed in the oven. In some embodiments, the multiple gas lines may be placed on trays (e.g., multiple trays 108).

[0040] At 804, method 800 includes coupling a first end of each of the plurality of gas lines to a corresponding one of a plurality of inlet ports of the oven (e.g., the plurality of inlet ports 114). The plurality of inlet ports may be oriented and spaced apart vertically or horizontally. At 806, method 800 includes coupling a second end of each of the plurality of gas lines to a corresponding one of a plurality of exhaust ports of the oven (e.g., the plurality of exhaust ports 118).

[0041] At 808, method 800 includes flowing one or more process fluids from multiple inlet ports, through multiple gas lines, to multiple exhaust ports to coat the interior walls of the multiple gas lines via an ALD process. The one or more process fluids may be supplied via a fluid panel (e.g., fluid panel 120). In some embodiments, a fluid distribution assembly (e.g., fluid distribution assembly 130) may be used to mix and supply the one or more process fluids. In some embodiments, the fluid distribution assembly provides the process fluids at a desired interval, in a desired ratio, or at a desired pulse rate. For example, the fluid distribution assembly may be configured to pulse a first fluid at a rate of less than about 200 milliseconds and a second fluid at a rate of about 200 milliseconds. In some embodiments, ozone is flowed through the conduits of the fluid distribution assembly 130 to clean or purge the conduits before or after flowing one or more process fluids through the conduits. In some embodiments, a 1-4 second purge may be performed after the pulsed first fluid. In some embodiments, a 1-4 second purge may be performed after the pulsed third fluid. In some embodiments, the interior walls of the plurality of gas lines are coated with a coating, such as an aluminum oxide coating, having a thickness of about 4000 to about 6000 angstroms.

[0042] In some embodiments, the one or more process fluids include nitrogen, trimethylaluminum (TMA), and HO. In some embodiments, the interior volume 110 of the oven 102 is heated to between about 200 and about 500 degrees Celsius during processing. In some embodiments, a pressure within the plurality of gas lines is maintained between about 1 and about 100 Torr during processing. The interior volume of the oven may be maintained at a pressure between about 1.5 and about 650 Torr, for example, between about 1.5 and about 10 Torr. In some embodiments, the method 800 includes flowing an inert gas through the interior volume of the oven while flowing the one or more process fluids.

[0043] In some embodiments, a valve (e.g., normally-closed valve 610) is coupled to each of the plurality of exhaust ports. In some embodiments, method 800 includes maintaining the valve closed while coupling a first end of each of the plurality of gas lines to a second end of each of the plurality of gas lines. Method 800 may include opening the valve while performing the ALD process. Method 800 may include opening only the valves coupled to the gas lines during the ALD process and maintaining the valves not connected to the gas lines closed. In some embodiments, oven 102 is cooled to about 30 to about 70 degrees Celsius after processing is completed.

[0044] While the forgoing is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope thereof.

Claims

1. 1. An apparatus for coating a plurality of gas lines via an ALD process, comprising: an oven having a housing defining an interior volume configured to accommodate the plurality of gas lines, the housing having one or more doors configured to transfer the plurality of gas lines into and out of the interior volume; a plurality of inlet ports disposed through a first wall of the housing, each of the plurality of inlet ports configured to couple to a first end of a corresponding one of the plurality of gas lines; a plurality of exhaust ports disposed through a second wall of the housing, each of the plurality of exhaust ports configured to couple to a second end of a corresponding one of the plurality of gas lines and configured to be coupled to a foreline disposed outside the oven; a fluid panel disposed outside the oven and coupled to the plurality of inlet ports via corresponding ones of a plurality of fluid distribution assemblies; An apparatus comprising:

2. The apparatus of claim 1 , wherein the plurality of fluid distribution assemblies are oriented in a vertically spaced apart manner.

3. 10. The apparatus of claim 1, further comprising a foreline disposed outside the oven, and a normally closed valve disposed between the foreline and each of the plurality of exhaust ports.

4. The apparatus of claim 1 , wherein each of the plurality of fluid distribution assemblies includes a plurality of process fluid supply lines that converge into a single inlet line coupled to each of the plurality of inlet ports.

5. 5. The apparatus of claim 4, wherein the plurality of process fluid supply lines include a nitrogen gas supply line, a water supply line, and a trimethylaluminum (TMA) supply line.

6. 6. The apparatus of claim 1, wherein the plurality of discharge ports are oriented in a vertically spaced apart manner.

7. The apparatus of claim 1 , wherein the foreline includes a trap for containing particulate contaminants.

8. 6. The apparatus of claim 1, wherein the apparatus is configured to orient the plurality of gas lines in a vertically spaced apart arrangement.

9. The apparatus of claim 1 , further comprising a plurality of trays disposed within the interior volume for holding the plurality of gas lines.

10. 6. The apparatus of claim 1, wherein the plurality of inlet ports are oriented in a vertically spaced-apart relationship and the plurality of exhaust ports are oriented in a vertically spaced-apart relationship.

11. The apparatus of claim 1 , wherein the oven includes a recirculation input port and a recirculation output port.

12. 6. The apparatus of claim 1, wherein the plurality of fluid distribution assemblies includes a Y-weld configured to merge multiple process fluids while minimizing chemical vapor deposition in the Y-weld.

13. The apparatus of claim 1 , wherein the plurality of inlet ports and the plurality of exhaust ports are located near the one or more doors.

14. 6. The apparatus of any one of claims 1 to 5, wherein the oven has a width of about 4 to about 7 feet (1.22 to about 2.13 meters).

15. 1. A method for simultaneously coating the interior of multiple gas lines, comprising: Installing multiple gas lines in the oven; coupling a first end of each of the plurality of gas lines to a corresponding one of a plurality of inlet ports of the oven; coupling a second end of each of the plurality of gas lines to a corresponding one of a plurality of exhaust ports of the oven; flowing one or more process fluids from the plurality of inlet ports through the plurality of gas lines to the plurality of exhaust ports to coat interior walls of the plurality of gas lines via an ALD process; A method comprising:

16. 16. The method of claim 15, wherein the one or more process fluids comprise nitrogen, trimethylaluminum (TMA), and ozone.

17. 16. The method of claim 15, wherein the placing of the plurality of gas lines in the oven is performed via a rotary lifting device.

18. 16. The method of claim 15, further comprising: a valve coupled to each of the plurality of exhaust ports; closing the valve while the first end of each of the plurality of gas lines and the second end of each of the plurality of gas lines are coupled; and opening the valve while the ALD process is running.

19. 16. The method of claim 15, further comprising flowing an inert gas through the interior volume of the oven while flowing the one or more process fluids.

20. 20. A non-transitory computer readable medium having instructions stored thereon that, when executed via one or more processors, cause the method of any one of claims 15 to 19 to be performed.

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