Reticle container with reduced edge buildup plating

Abstract

The reticle container includes a cover and a base plate having contact surfaces configured to contact each other when the reticle container is assembled. A relief area is provided adjacent to at least one of the contact surfaces. The relief area is such that plating provided in the relief area does not contact the other of the cover or base plate when the reticle container is assembled. The relief area can include structures such as beveled areas, recesses, and radiused areas. The relief area can optionally further function as a lobber during the electroplating process.

Description

[Technical Field]

[0001] SUMMARY The present disclosure relates to reticle containers, and particularly to reticle containers plated with materials such that edge buildup during plating is reduced. [Background technology]

[0002] The reticle container can be plated, for example, to improve its surface finish. Plating the reticle container can include plating the contact surfaces of the reticle container. The contact surfaces can be positioned and configured such that their electrical properties and physical structure result in the generation of edge buildup during plating, providing areas of increased plating thickness on certain portions of the contact surfaces. These areas of increased plating thickness are areas that experience wear and can lead to the generation of particulate material that can contaminate the contents of the reticle container. Summary of the Invention

[0003] SUMMARY The present disclosure relates to reticle containers, and particularly to reticle containers plated with materials such that edge buildup during plating is reduced.

[0004] By shaping the cover and / or base plate of a reticle container so that edge buildup is reduced by the physical shape and / or electrical properties of the cover and / or base plate (which act as a "robber"), the amount of particulates generated by edge buildup friction can be reduced, improving the cleanliness of the reticle container. Additionally or alternatively, the cover and / or base plate can be shaped so that edge buildup occurs away from contact surfaces, so that edge buildup does not contact and therefore does not significantly contribute to particle generation, also improving the cleanliness of the reticle container. A cleaner reticle container resulting from addressing edge buildup during plating improves yield and reduces losses in reticle processing, such as photolithography, including extreme ultraviolet (EUV) photolithography. Reducing edge buildup can improve the plating process of reticle container components, allowing plating to be successfully performed with less precise plating equipment or its controls. Furthermore, this can simplify the plating process by reducing or eliminating the need for external robbers during the plating process.

[0005] In one embodiment, the reticle container includes a cover and a base plate. At least one of the cover or base plate includes a base material and a coating layer on the base material. At least one of the cover or base plate includes a contact surface and at least one of a first relief area adjacent to at least a portion of the outer periphery of the contact surface or a second relief area adjacent to at least a portion of the inner periphery of the contact surface. At least one of the first relief area and the second relief area is configured to avoid contact between the cover and the base plate when the reticle container is assembled, and to allow the cover and the base plate to contact at the contact surface.

[0006] In one embodiment, the first relief area or the second relief area is a recessed area relative to the contact surface. In one embodiment, the first relief area or the second relief area has a beveled edge. In one embodiment, the first relief area or the second relief area of ​​the second relief surface comprises a radiused area. In one embodiment, the transition from the contact surface to the first relief area or the transition from the contact surface to the second relief area is radiused. In one embodiment, the transition from the contact surface to the second relief area comprises a beveled edge. In one embodiment, the first relief area or the second relief area has a depth relative to the contact surface of at least 0.1 millimeters (mm).

[0007] In one embodiment, the reticle container includes a first relief area, the first relief area surrounding the outer periphery of the contact surface, hi one embodiment, the reticle container includes a second relief area, the second relief area surrounding the inner periphery of the contact surface.

[0008] In one embodiment, a method for manufacturing a reticle container includes providing a cover and a base plate. At least one of the cover or base plate includes a contact surface and at least one of a first relief area adjacent to at least a portion of the outer periphery of the contact surface or a second relief area adjacent to at least a portion of the inner periphery of the contact surface. The method further includes applying a coating to at least one of the cover or base plate. The first relief area and the second relief area are each configured to avoid contact between the cover and base plate when the reticle container is assembled and to allow the cover and base plate to contact at the contact surface.

[0009] In one embodiment, applying the coating comprises electroplating. In one embodiment, at least one of the first relief area and the second relief area functions as a lobber during electroplating. In one embodiment, applying the coating comprises multiple separate applications of electroplating.

[0010] In one embodiment, the first relief area or the second relief area includes a beveled edge. In one embodiment, the first relief area or the second relief area includes a radiused edge. In one embodiment, the first relief area or the second relief area is a recess having a depth relative to the contact surface of at least 0.1 millimeters (mm).

[0011] In one embodiment, at least one of the cover and the base plate includes a first relief area, the first relief area surrounding the outer periphery of the contact surface, hi one embodiment, at least one of the cover and the base plate includes a second relief area, the second relief area surrounding the inner periphery of the contact surface. [Brief explanation of the drawings]

[0012] [Figure 1] FIG. 2 is an exploded view of a reticle container according to one embodiment. [Figure 2] FIG. 2 is a perspective view of a cover for a reticle container according to one embodiment. [Figure 3] 1 is a perspective view of a base plate of a reticle container according to one embodiment. [Figure 4] 1 is a cross-sectional view of a reticle container according to one embodiment. [Figure 5] 1 is a cross-sectional view of a reticle container according to one embodiment. [Figure 6] 1 is a flowchart of a method according to one embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0013] SUMMARY The present disclosure relates to reticle containers, and particularly to reticle containers plated with materials such that edge buildup during plating is reduced.

[0014] 1 shows an exploded view of a reticle container according to one embodiment. Reticle container 100 includes a cover 102 and a base plate 104. A reticle 106 can be accommodated within an interior space defined by cover 102 and base plate 104. Cover 102 includes a cover contact surface (not shown), and base plate 104 includes a base plate contact surface 108. Base plate 104 includes a first relief area 110 and a second relief area 112.

[0015] The reticle container 100 is a container configured to hold a reticle 106, such as a reticle for processing, such as photolithography, e.g., extreme ultraviolet (EUV) processing. The reticle container 100 can be used to transport and / or store reticles. In one embodiment, the reticle container 100 is an EUV reticle container. In one embodiment, the reticle container 100 is a storage pod for storing the reticle 106 before, during, or after processing. In one embodiment, the reticle container 100 is received by a load port of an EUV processing system and opened so that the reticle 106 can be added or removed from the reticle container 100. The reticle container 100 holds the reticle 106 within an interior space within the reticle container 100.

[0016] The cover 102 forms a first container segment of the reticle container 100. The cover 102 forms a portion of an interior space configured to accommodate the reticle 106. At least some surfaces of the cover 102 can be formed by plating a material onto a base material of the cover 102.

[0017] Base plate 104 forms a second container segment of reticle container 100. When combined with cover 102, base plate 104 forms an interior space capable of housing reticle 106. At least some surfaces of base plate 104 can be formed by plating a material onto the base material of cover 102.

[0018] Reticle 106 is a reticle contained within reticle container 100. Reticle 106 may be any suitable reticle, such as a reticle processed by methods such as photolithography, including extreme ultraviolet (EUV) photolithography.

[0019] Base plate contact surface 108 is a surface of base plate 104 that is configured to contact a corresponding surface on cover 102 when reticle container 100 is assembled.

[0020] The first relief area 110 can be located outside the base plate contact surface 108. The first relief area 110 can be configured to avoid the cover 102 when the reticle container 100 is assembled. Avoiding the cover 102 can include avoiding contact between edge buildups of plating on one or both of the cover 102 and the base plate 104. The size and shape of the first relief area 110 can be any suitable shape and size that achieves avoidance of the cover 102. For example, the first relief area 110 can be a groove or depression in the surface of the base plate 104. In one embodiment, the first relief area 110 is a depression having a depth of at least 0.1 millimeters (mm) relative to the contact surface and a width in the range of 2 mm to 4 mm. In one embodiment, the first relief area 110 includes a beveled edge. In one embodiment, the transition from the base plate contact surface 108 to the first relief area 110 is radiused. In one embodiment, the first relief area 110 can be spaced apart from the base plate contact surface 108. In one embodiment, the first relief area 110 is directly adjacent to the base plate contact surface 108. In one embodiment, the first relief area 110 is electrically connected to the base plate contact surface 108.

[0021] The second relief area 112 is located inside the base plate contact surface 108. The second relief area 112 can be configured to avoid the cover 102 when the reticle container 100 is assembled. Avoiding the cover 102 can include avoiding contact between edge buildup of plating on one or both of the cover 102 and the base plate 104. For example, the second relief area 112 can be a groove or depression in the surface of the base plate 104. The size and shape of the second relief area 112 can be any suitable shape and size that achieves avoidance of the cover 102. In one embodiment, the second relief area 112 is a depression having a depth of at least 0.1 millimeters (mm) relative to the contact surface and a width in the range of 2 mm to 4 mm. In one embodiment, the second relief area 112 includes a beveled edge. In one embodiment, the transition from the base plate contact surface 108 to the second relief area 112 is radiused. In one embodiment, the second relief area 112 can be spaced apart from the base plate contact surface 108. In one embodiment, the second relief area 112 is directly adjacent to the base plate contact surface 108. In one embodiment, the second relief area 112 is electrically connected to the base plate contact surface 108.

[0022] 2 illustrates a perspective view of a cover for a reticle container according to one embodiment. Cover 200 includes a cover contact surface 202, a first relief area 204, a first transition portion 206, a second relief area 208, and a second transition portion 210.

[0023] Cover 200 is a cover for a reticle container and is configured to define an interior space when combined with a base plate, such as base plate 300 described below and shown in FIG. 3, in which the interior space can accommodate a reticle.

[0024] The cover contact surface 202 may be provided on the exterior of the portion of the cover 200 that defines the interior space. The cover contact surface 202 is configured to contact a base plate when a reticle container including the cover 200 is assembled. In one embodiment, the cover contact surface 202 may be a continuous flat surface. In one embodiment, the cover contact surface 202 may include multiple areas of a flat surface, each configured to contact a base plate. The cover contact surface 202 may include a surface formed of a material plated on the base material of the cover 200.

[0025] The first relief area 204 is located outward from the cover contact surface 202. In one embodiment, the first relief area 204 can be located adjacent to at least a portion of the cover contact surface 202. In one embodiment, the first relief area 204 can surround the exterior of the cover contact surface 202. The first relief area 204 is an area of ​​the cover 200 configured to avoid contact with a base plate when the cover 200 is assembled with the base plate to form a reticle container, such as the reticle container 100 shown in FIG. 1 and described above. Avoidance of the base plate by the first relief area 204 can include avoidance of contact between edge buildup of plating formed on one or both of the cover 200 and the base plate. The first relief area 204 can include an area recessed relative to the cover contact surface 202. In one embodiment, the first relief area 204 is an indentation relative to the cover contact surface 202 having a depth of at least 10 micrometers (μm) and a width of at least 50 μm. In one embodiment, the first relief area 204 is a depression relative to the cover contact surface 202 having a depth of at least 0.1 millimeters (mm) and a width in the range of 2 mm to 4 mm. In one embodiment, the first relief area 204 is a sloped surface relative to the cover contact surface 202 such that the first relief area 204 forms a beveled edge adjacent at least a portion of the cover contact surface 202. In one embodiment, the first relief area 204 can be spaced apart from the cover contact surface 202. In one embodiment, the first relief area 204 is directly adjacent to the cover contact surface 202. In one embodiment, the first relief area 204 and the cover contact surface 202 are electrically connected to each other.

[0026] The first transition 206 is a transition from the cover contact surface 202 to the first relief area 204. In one embodiment, the first transition 206 is a step from the cover contact surface 202 to the relatively recessed first relief area 204. In one embodiment, the first transition 206 is a corner where the beveled surface of the first relief area 204 intersects with the cover contact surface 202. In one embodiment, the first transition 206 can include a radius at one or more corners included in or formed by the first transition 206, for example.

[0027] The second relief area 208 is located inwardly of the cover contact surface 202. In one embodiment, the second relief area 208 can be located adjacent to at least a portion of the cover contact surface 202. In one embodiment, the second relief area 208 can be surrounded by the interior of the cover contact surface 202. The second relief area 208 is an area of ​​the cover 200 configured to avoid contact with a base plate when the cover 200 is assembled with the base plate to form a reticle container, such as the reticle container 100 shown in FIG. 1 and described above. Avoidance of the base plate by the second relief area 208 can include avoidance of contact between edge buildup of plating formed on one or both of the cover 200 and the base plate. The second relief area 208 can include an area recessed relative to the cover contact surface 202. In one embodiment, the first relief area 204 is an indentation with a depth of at least 10 micrometers (μm) relative to the cover contact surface 202. In one embodiment, the second relief area 208 is a depression with a depth of at least 0.1 millimeters (mm) relative to the cover contact surface 202. In one embodiment, the second relief area 208 is a sloped surface relative to the cover contact surface 202 such that the second relief area 208 forms a beveled edge that surrounds at least a portion of the cover contact surface 202. In one embodiment, the second relief area 208 can be spaced apart from the cover contact surface 202. In one embodiment, the second relief area 208 is directly adjacent to the cover contact surface 202. In one embodiment, the second relief area 208 and the cover contact surface 202 are electrically connected to each other.

[0028] The second transition 210 is a transition from the cover contact surface 202 to the second relief area 208. In one embodiment, the second transition 210 is a step from the cover contact surface 202 to the relatively recessed second relief area 208. In one embodiment, the second transition 210 is a corner where the beveled surface of the second relief area 208 intersects with the cover contact surface 202. In one embodiment, the second transition 210 can include a radius, for example, on one or more corners included in or formed by the second transition 210.

[0029] 3 shows a perspective view of a base plate of a reticle container according to one embodiment. Base plate 300 includes a base plate contact surface 302, a first relief area 304, a first transition portion 306, a second relief area 308, and a second transition portion 310.

[0030] The base plate contact surface 302 can be provided on the exterior of a portion of the base plate 300 that defines an interior space when the base plate 300 is joined to a cover, such as the cover 200 described above and shown in FIG. 2 . The base plate contact surface 302 is configured to contact a cover at a cover contact surface, such as the cover contact surface 202 described above and shown in FIG. 2 , when a reticle container including the base plate 300 is assembled. In one embodiment, the base plate contact surface 302 can be a continuous flat surface. In one embodiment, the base plate contact surface 302 can include multiple areas of a flat surface, each configured to contact a cover. The base plate contact surface 302 can include a surface formed of a material plated on the base material of the base plate 300.

[0031] The first relief area 304 can be located outside the base plate contact surface 302. In one embodiment, the first relief area 304 can be located just outside the base plate contact surface 302. In one embodiment, the first relief area 304 can encompass the exterior of the base plate contact surface. The first relief area 304 is an area of ​​the base plate 300 configured to avoid contact with a cover when the base plate 300 is assembled with the cover to form a reticle container, such as the reticle container 100 shown in FIG. 1 and described above. Avoidance of the cover by the first relief area 304 can include avoidance of contact between edge buildup of plating formed on one or both of the cover and the base plate 300. The first relief area 304 can include an area recessed relative to the base plate contact surface 302. In one embodiment, the first relief area 304 is an indentation relative to the base plate contact surface 302 having a depth of at least 0.1 millimeters (mm) and a width in the range of 2 mm to 4 mm. In one embodiment, the first relief area 304 is a surface that is angled relative to the base plate contact surface 302 so as to form a beveled edge that surrounds the base plate contact surface 302 .

[0032] The first transition 306 is a transition from the base plate contact surface 302 to the first relief area 304. In one embodiment, the first transition 306 is a step from the base plate contact surface 302 to the relatively recessed first relief area 304. In one embodiment, the second transition 310 is a corner where the beveled surface of the first relief area 304 intersects with the base plate contact surface 302. In one embodiment, the first transition 306 can include a radius, for example, at one or more corners included in or formed by the first transition 306.

[0033] The second relief area 308 is located inside the base plate contact surface 302. In one embodiment, the second relief area 308 can be located just inside the base plate contact surface 302. In one embodiment, the second relief area 308 can be surrounded by the interior of the base plate contact surface 302. The second relief area 308 is an area of ​​the base plate 300 configured to avoid contact with a cover when the base plate 300 is assembled with the cover to form a reticle container, such as the reticle container 100 shown in FIG. 1 and described above. Avoidance of the cover by the second relief area 308 can include avoidance of contact between edge buildup of plating formed on one or both of the cover and the base plate 300. The second relief area 308 can include an area recessed relative to the base plate contact surface 302. In one embodiment, the second relief area 308 is an indentation relative to the base plate contact surface 302 having a depth of at least 0.1 millimeters (mm) and a width in the range of 2 mm to 4 mm. In one embodiment, the second relief area 308 is a surface that is angled relative to the base plate contact surface 302 so as to form a beveled edge that surrounds the base plate contact surface 302 .

[0034] The second transition 310 is a transition from the base plate contact surface 302 to the second relief area 308. In one embodiment, the second transition 310 is a step from the base plate contact surface 302 to the relatively recessed second relief area 308. In one embodiment, the second transition 310 is a corner where the beveled surface of the second relief area 308 intersects with the base plate contact surface 302. In one embodiment, the second transition 310 can include a radius, for example, on one or more corners included in or formed by the second transition 310.

[0035] 4 shows a cross-sectional view of a reticle container according to one embodiment. Reticle container 400 includes a cover 402 and a base plate 404. Cover 402 includes a cover contact surface 406, a first relief area 408, and a second relief area 410. Base plate 404 includes a base plate contact surface 412.

[0036] The cover 402 forms a portion of the reticle container 400. When combined with the base plate 404, the cover 402 and the base plate 404 define an interior space configured to accommodate a reticle. The cover 402 includes a cover contact surface 406. The cover contact surface 406 is a portion of the cover 402 configured to contact the base plate 404 when the reticle container 400 is assembled. The cover contact surface 406 may be one or more flat surfaces positioned toward the base plate 404. The cover contact surface 406 may be a plated surface formed on the base material of the cover 402.

[0037] The exterior of the cover contact surface 406 includes a first relief area 408. The first relief area 408 is on a side of the cover contact surface 406 opposite the interior space defined by the cover 402 and the base plate 404. In the embodiment shown in FIG. 4, the first relief area 408 is recessed relative to the cover contact surface 406. In one embodiment, the first relief area 408 can have a depth of at least 0.1 millimeters (mm) relative to the cover contact surface 406 and a width in the range of 2 mm to 4 mm. As shown in FIG. 4, the transition from the cover contact surface 406 to the first relief area 408 can be radiused, with radiused corners formed where the first relief area 408 is recessed from the cover contact surface 406. In one embodiment, the transition from the cover contact surface 406 to the first relief area 408 can include a beveled edge, a sharp corner, or the like.

[0038] A second relief area 410 is provided on the interior side of the cover contact surface 406. The second relief area 410 is on a side of the cover contact surface 406 that faces the interior space defined by the cover 402 and the base plate 404. In the embodiment shown in FIG. 4, the second relief area 410 is recessed relative to the cover contact surface 406. In one embodiment, the second relief area 410 can have a depth of at least 0.1 millimeters (mm) relative to the cover contact surface 406 and a width in the range of 2 mm to 4 mm. As shown in FIG. 4, the transition from the cover contact surface 406 to the second relief area 410 can be radiused, with radiused corners formed where the second relief area 410 is recessed from the cover contact surface 406. In one embodiment, the transition from the cover contact surface 406 to the second relief area 410 can include a beveled edge, a sharp corner, or the like.

[0039] The base plate 404 is configured to be bonded to the cover 402 to form the reticle container 400. The base plate 404 includes a base plate contact surface 412 configured to contact the cover contact surface 406 when the cover 402 is bonded to the base plate 404. The base plate contact surface 412 is a flat area located corresponding to the position of the cover contact surface 406.

[0040] 4 shows first relief area 408 and second relief area 410 provided around cover contact surface 406, it will be appreciated that corresponding relief areas may alternatively or additionally be formed around base plate contact surface 412. For example, relief areas may be provided on base plate 404, on the inside and outside of base plate contact surface 412, by providing trenches or grooves on the inside and outside of base plate contact surface 412.

[0041] 5 shows a cross-sectional view of a reticle container according to one embodiment. Reticle container 500 includes a cover 502 and a base plate 504. Cover 502 includes a cover contact surface 506, a first relief area 508, and a second relief area 510. Base plate 504 includes a base plate contact surface 512.

[0042] The cover 502 forms a portion of the reticle container 500. When combined with the base plate 504, the cover 502 and the base plate 504 define an interior space configured to accommodate a reticle. The cover 502 includes a cover contact surface 506. The cover contact surface 506 is a portion of the cover 502 configured to contact the base plate 504 when the reticle container 500 is assembled. The cover contact surface 506 may be one or more flat surfaces positioned toward the base plate 504. The cover contact surface 506 may be a plated surface formed on the base material of the cover 502.

[0043] The exterior of the cover contact surface 506 includes a first relief area 508. The first relief area 508 is on a side of the cover contact surface 506 away from the interior space defined by the cover 502 and the base plate 504. In the embodiment shown in FIG. 5, the first relief area 508 is an angled surface relative to the cover contact surface 506 such that the first relief area 508 provides a beveled edge surrounding the contact surface 506. This angle can be any suitable angle that allows the first relief area 508 to avoid contact with the base plate 504, including avoidance of contact between platings, such as edge buildup of plating on one or both of the cover 502 and the base plate 504. As shown in FIG. 5, the transition from the cover contact surface 506 to the first relief area 508 can be a corner formed by the intersection of the cover contact surface 506 and the first relief area 508. In one embodiment, the transition from the cover contact surface 506 to the first relief area 508 may be radiused.

[0044] A second relief area 510 is provided on the interior side of the cover contact surface 506. The second relief area 510 is on the side of the cover contact surface 506 that faces the interior space defined by the cover 502 and the base plate 504. In the embodiment shown in FIG. 5, the second relief area 510 is an angled surface relative to the cover contact surface 506 such that the second relief area 510 provides a beveled edge surrounding the contact surface 506. This angle can be any suitable angle that allows the second relief area 510 to avoid contact with the base plate 504, including avoidance of contact between platings, such as edge buildup of plating on one or both of the cover 502 and the base plate 504. As shown in FIG. 5, the transition from the cover contact surface 506 to the second relief area 510 can be a corner formed by the intersection of the cover contact surface 506 and the second relief area 510. In one embodiment, the transition from the cover contact surface 506 to the second relief area 510 may be radiused.

[0045] Base plate 504 is configured to be bonded to cover 502 to form reticle container 500. Base plate 504 includes a base plate contact surface 512 configured to contact cover contact surface 506 when cover 502 is bonded to base plate 504. Base plate contact surface 512 is a flat area located corresponding to the position of cover contact surface 506.

[0046] 5 shows first relief area 508 and second relief area 510 provided around cover contact surface 506, it will be appreciated that corresponding relief areas may alternatively or additionally be formed around base plate contact surface 512. For example, relief areas may be provided on base plate 504, on the inside and outside of base plate contact surface 512, by providing trenches or grooves on the inside and outside of base plate contact surface 512.

[0047] 6 shows a flowchart of a method according to one embodiment. Method 600 includes providing a cover or base plate 602, applying an electric charge to the cover or base plate 604, and plating the cover or base plate 606. In an embodiment, method 600 can be applied to both the cover of a reticle container and the base plate of a reticle container.

[0048] The cover or base plate provided at 602 can include a contact surface, a first relief area outside the contact surface, and a second relief area inside the contact surface. In one embodiment, the cover or base plate provided at 602 is a solid piece of base material. A non-limiting example of the base material is aluminum. In one embodiment, a cover, such as cover 200 shown in FIG. 2 and described above, can be provided at 602. In one embodiment, a base plate, such as base plate 300 shown in FIG. 3 and described above, can be provided at 602. The contact surface and first and second relief areas on the cover or base plate provided at 602 can conform to any of the contact surfaces and relief areas described herein, including, but not limited to, recessed areas from the contact surface, beveled edges, etc. In one embodiment, the transition from the contact surface to the first relief area and / or second relief area can be radiused.

[0049] At 604, an electric charge is applied to the cover or base plate. The electric charge can be supplied via any suitable means for electroplating. During application of the electric charge to the cover or base plate at 604, features such as the first relief area and / or the second relief area can affect the distribution of the electric charge within the cover or base plate. In one embodiment, the first relief area and / or the second relief area act as lobbers, reducing the electric charge at the interface boundaries and thus reducing plating formation at the edges of the interface.

[0050] In one embodiment, the first relief area has plating with a first depth, and the contact area between the cover and base plate has plating with a second depth, the second depth being less than the first depth. The second relief area may have plating with a third depth, the second depth being less than the third depth. In some embodiments, plating on the relief area helps to make the thickness of the plating on the contact area more uniform. The relief area can inhibit preferential deposition of plating material on the edges of the contact area. This can allow for a flatter, more uniform contact area compared to a plated contact area lacking a proximal relief area.

[0051] The first and second relief regions may be in electrical communication with the contact region. For example, the first and second relief regions may have a shared potential that is applied to the first and second relief regions and the contact region during plating. The current per unit of surface area tends to be higher in the relief region compared to the contact region. This higher current per unit area may be related to a relative increase in plating material during plating of the cover or base plate. Because the relief region is at the edge of the plating region, it tends to accumulate a greater amount of plating material. In contrast, the contact region tends to have a more uniform deposition due to the presence of the relief region.

[0052] At 606, plating is applied to the cover or base plate. The plating is formed on the cover or base plate by electroplating resulting from the application of an electric charge to the cover or base plate at 604. When the first relief area and / or the second relief area function as a robber, the reduction in electric charge at the interface boundary can reduce plating buildup at the edge of the interface. In one embodiment, applying plating to the cover or base plate at 606 can include multiple plating steps. In one embodiment, the plating applied to the cover or base plate at 606 can include one or more of EN plating, bright nickel plating, and / or chrome.

[0053] Aspects: It is understood that any of embodiments 1-9 can be combined with any of embodiments 10-20.

[0054] Aspect 1. A reticle container comprising a cover and a base plate, at least one of the cover or the base plate includes a base material and a coating layer on the base material; At least one of the cover or the base plate has a contact surface and a first relief area adjacent at least a portion of the periphery of the contact surface; or a second relief area adjacent at least a portion of the inner periphery of the contact surface; and A reticle container, wherein at least one of the first relief area and the second relief area is each configured to avoid contact between the cover and the base plate when the reticle container is assembled, and the cover and the base plate contact at their contact surfaces.

[0055] Embodiment 2. The reticle container of embodiment 1, wherein the first relief area or the second relief area is a recessed area relative to the contact surface.

[0056] Embodiment 3. The reticle container of embodiment 1, wherein the first relief area or the second relief area is a beveled edge.

[0057] Embodiment 4. The reticle container of embodiment 1, wherein the first relief area or the second relief area of ​​the second relief surface comprises a radiused area.

[0058] Embodiment 5. A reticle container according to any one of embodiments 1 to 4, wherein the transition from the contact surface to the first relief area or the transition from the contact surface to the second relief area is radiused.

[0059] Embodiment 6. The reticle container of any of embodiments 1-5, wherein the transition from the contact surface to the second relief region includes a beveled edge.

[0060] Embodiment 7. The reticle container of any of embodiments 1-6, wherein the first relief area or the second relief area has a depth relative to the contact surface of at least 0.1 millimeters (mm).

[0061] Embodiment 8. The reticle container of any of embodiments 1-7, including a first relief area, the first relief area surrounding the periphery of the contact surface.

[0062] Embodiment 9. The reticle container of embodiment 1, including a second relief area, the second relief area being surrounded by an inner periphery of the contact surface.

[0063] Embodiment 10. A method of manufacturing a reticle container, comprising: providing a cover and a base plate, wherein at least one of the cover or the base plate has a contact surface and a first relief area adjacent at least a portion of the periphery of the contact surface; or a second relief area adjacent at least a portion of the inner periphery of the contact surface; and applying a coating to at least one of the cover or the base plate; wherein at least one of the first relief area and the second relief area is each configured to avoid contact between the cover and the base plate when the reticle container is assembled, and the cover and the base plate contact at a contact surface.

[0064] Embodiment 11 The method of embodiment 10, wherein applying the coating comprises electroplating.

[0065] Embodiment 12. The method of embodiment 11, wherein at least one of the first relief area and the second relief area functions as a robar during electroplating.

[0066] Embodiment 13. The method of embodiment 11, wherein applying the coating comprises multiple separate applications of electroplating.

[0067] Embodiment 14. The method of any one of embodiments 10-13, wherein the first relief area or the second relief area comprises a beveled edge.

[0068] Embodiment 15. The method of any of embodiments 10-14, wherein the first relief area or the second relief area comprises a radiused edge.

[0069] Embodiment 16. The method of any one of embodiments 10-15, wherein the first relief area or the second relief area is a recess having a depth relative to the contact surface of at least 0.1 millimeters (mm).

[0070] Embodiment 17. The method of any one of embodiments 10-16, wherein at least one of the cover and the base plate includes a first relief area, the first relief area surrounding the periphery of the contact surface.

[0071] Embodiment 18. The method of any one of embodiments 10-17, wherein at least one of the cover and the base plate includes a second relief area, the second relief area being surrounded by the inner periphery of the contact surface.

[0072] The examples disclosed in this application should be considered in all respects as illustrative and not restrictive. The scope of the present invention is indicated by the appended claims, rather than the foregoing description, and all changes that come within the meaning and range of equivalence of the claims are intended to be embraced therein.

Claims

1. A reticle container comprising a cover and a base plate, at least one of the cover or the base plate includes a base material and a coating layer on the base material; At least one of the cover or the base plate has a contact surface and a first relief area adjacent at least a portion of the periphery of said contact surface; a second relief area adjacent at least a portion of the inner periphery of the contact surface; and A reticle container, wherein each of the at least one of the first relief area and the second relief area is configured to avoid contact between the cover and the base plate when the reticle container is assembled, and the cover and the base plate contact at the contact surface.

2. The reticle container of claim 1 , wherein the first relief area or the second relief area is a recessed area relative to the contact surface.

3. The reticle container of claim 1 , wherein the first relief area or the second relief area is a beveled edge.

4. The reticle container of claim 1 , wherein the first relief area or the second relief area of ​​the second relief surface comprises a radiused area.

5. The reticle container of claim 1 , wherein a transition from the contact surface to the first relief area or a transition from the contact surface to the second relief area is radiused.

6. The reticle container of claim 1 , wherein the transition from the contact surface to the second relief area includes a beveled edge.

7. 10. The reticle container of claim 1, wherein the first relief area or the second relief area has a depth relative to the contact surface of at least 0.1 millimeters (mm).

8. The reticle container of claim 1 , including the first relief area, the first relief area surrounding the periphery of the contact surface.

9. The reticle container of claim 1 , including the second relief area, the second relief area being surrounded by the inner periphery of the contact surface.

10. 1. A method for manufacturing a reticle container, comprising: providing a cover and a base plate, at least one of the cover or the base plate having a contact surface and a first relief area adjacent at least a portion of the periphery of said contact surface; a second relief area adjacent at least a portion of the inner periphery of the contact surface; providing a cover and base plate including at least one of: applying a coating to at least one of the cover or the base plate; wherein the first relief area and the second relief area are each configured to avoid contact between the cover and the base plate when the reticle container is assembled, and the cover and the base plate contact at the contact surface.

11. The method of claim 10 , wherein applying the coating comprises electroplating.

12. The method of claim 11 , wherein at least one of the first relief area and the second relief area functions as a lobber during the electroplating.

13. The method of claim 11 , wherein applying the coating comprises multiple individual applications of the electroplating.

14. The method of claim 10 , wherein the first relief area or the second relief area comprises a beveled edge.

15. The method of claim 10 , wherein the first relief area or the second relief area includes a radiused edge.

16. The method of claim 10 , wherein the first relief area or the second relief area is a recess having a depth relative to the contact surface of at least 0.1 millimeters (mm).

17. The method of claim 10 , wherein the at least one of the cover and the base plate includes the first relief area, the first relief area surrounding the periphery of the contact surface.

18. The method of claim 10 , wherein the at least one of the cover and the base plate includes the second relief area, the second relief area being surrounded by the inner periphery of the contact surface.

Images