Stage apparatus and charged particle beam apparatus using the same

Abstract

To provide a stage device capable of detecting abnormality such as wear of a driving mechanism by using a sensor incorporated in an actuator while lowering the floor of the driving mechanism for driving a stage in a Z direction with a relatively simple configuration.SOLUTION: A sample stage configured to support a sample, an XY mechanism configured to move the sample stage in a horizontal direction, and a Z mechanism configured to move the sample stage in a vertical direction, the Z mechanism being disposed in the horizontal direction, the sample stage driving device includes an actuator having a built-in sensor capable of detecting an operation amount of the actuator, a conversion mechanism configured to convert an output of the actuator from a horizontal direction to a vertical direction by elastic deformation, a spring element configured to connect the sample stage and the conversion mechanism, and a guide element configured to suppress movement of the conversion mechanism in the horizontal direction.SELECTED DRAWING: Figure 2B

Description

[Technical Field]

[0001] The present invention relates to the configuration of a stage device and its control, and in particular to a technique that is effective when applied to a charged particle beam device that requires high-speed and high-precision focusing by driving a sample stage in the Z direction. [Background technology]

[0002] Charged particle beam devices such as electron microscopes used in the manufacture, measurement, and inspection of semiconductor wafers are provided with a stage that moves the position of a sample so that the electron beam can be irradiated onto a desired position on the sample. Such a stage is equipped with a drive mechanism for moving the sample in at least two directions (X and Y directions) to move the sample in two dimensions (X and Y directions).

[0003] In some cases, it may be necessary to position the sample in the direction (Z direction) perpendicular to the two directions (X and Y directions) mentioned above, for example, when focusing is performed by moving the sample stage in the Z direction instead of adjusting it using the electron optical system.

[0004] Background art in this technical field includes, for example, technology such as that disclosed in Patent Document 1. Patent Document 1 discloses "a mechanism that uses a sensor-integrated piezoelectric actuator to correct deformation of a stage guide base caused by driving the stage."

[0005] In Patent Document 1, the stage guide is deformed and translated to perform positioning so as to maintain the gap between the driven stage and the stage guide and the flatness of the upper surface of the stage guide. [Prior art documents] [Patent documents]

[0006] [Patent Document 1] Japanese Patent Application Laid-Open No. 2005-79373 Summary of the Invention [Problem to be solved by the invention]

[0007] The technology in Patent Document 1 makes it possible to correct deformation of the table that holds the table. However, in the case of a Z mechanism in which the table and actuator are directly connected, the actuator needs to be large to ensure a stroke in the Z direction, which results in a higher center of gravity of the table and increased vibration. When vibration increases, the time required for positioning increases, posing a problem of reduced throughput.

[0008] Furthermore, when the table and actuator are directly connected, it is not possible to detect changes in posture due to looseness or wear of parts, which can lead to a "field of view misalignment" where the position to be measured differs from the actual measurement position due to the tilt of the table.

[0009] Therefore, an object of the present invention is to provide a stage device with a relatively simple configuration, which has a low-profile drive mechanism that drives the stage in the Z direction, and which is capable of detecting abnormalities such as wear in the drive mechanism using a sensor built into the actuator, and a charged particle beam device using the same. [Means for solving the problem]

[0010] In order to solve the above problems, the present invention provides a sample stage that supports a sample, an XY mechanism that moves the sample stage horizontally, and a Z mechanism that moves the sample stage vertically, wherein the Z mechanism has an actuator that is arranged horizontally and has a built-in sensor that can detect its own movement amount, a conversion mechanism that converts the output of the actuator from the horizontal direction to the vertical direction by elastic deformation, a spring element that connects the sample stage and the conversion mechanism, and a guide element that suppresses the horizontal movement of the conversion mechanism, and is characterized in that the sample stage is driven vertically by controlling the output of the actuator based on the output of the sensor. [Effects of the Invention]

[0011] According to the present invention, it is possible to realize a stage device with a relatively simple configuration that has a low-profile drive mechanism for driving a stage in the Z direction, and that is capable of detecting abnormalities such as wear in the drive mechanism using a sensor incorporated in the actuator, and a charged particle beam device using the same.

[0012] This enables high-speed and high-precision focusing by driving the sample stage in the Z direction in an electron microscope, for example, which can contribute to improving image quality and throughput.

[0013] Problems, configurations, and effects other than those described above will become apparent from the following description of the embodiments. [Brief explanation of the drawings]

[0014] [Figure 1] 1 is a diagram showing a schematic configuration of a charged particle beam device according to a first embodiment of the present invention. [Figure 2A] FIG. 10 is a diagram schematically illustrating a conventional actuator direct-coupled Z mechanism. [Figure 2B] FIG. 2 is a diagram showing a Z mechanism (hinge type) of the present invention. [Figure 3] 2C is a diagram schematically showing the operation (action) of the conversion mechanism in the Z mechanism of FIG. 2B. [Figure 4A] FIG. 10 is a diagram schematically illustrating an output transmission path of a hinge system. [Figure 4B] FIG. 10 is a diagram schematically illustrating an output transmission path of a hinge system. [Figure 5] 1 is a diagram showing an example of the structure of an XYZ stage equipped with a Z mechanism (hinge type) of the present invention. [Figure 6] FIG. 10 is a diagram showing the relationship between the applied voltage and the drive amount in a piezoelectric actuator. [Figure 7A] FIG. 10 is a diagram showing a method for calibrating the table attitude using an external sensor. [Figure 7B] FIG. 10 is a diagram showing a method for calibrating the table attitude using an external sensor. [Figure 8] 10A and 10B are diagrams illustrating an example of the structure of a Z stage according to a second embodiment of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0015] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In the drawings, the same components are designated by the same reference numerals, and detailed description of overlapping parts will be omitted. [Example]

[0016] First Embodiment A stage apparatus according to a first embodiment of the present invention and a charged particle beam apparatus using the same will be described with reference to FIGS. 1 to 7B.

[0017] First, in order to make the present invention easier to understand, the background art of the present invention and the problems in the prior art will be described in more detail.

[0018] In recent years, semiconductor device inspection equipment has become required to inspect the entire surface of wafers at high speed in order to inspect photomasks for defects, in line with the trend toward finer design rules. To meet this demand, electron microscopes, for example, are being required to be equipped with a function for quickly focusing the electron beam, i.e., autofocusing (hereafter referred to as AF).

[0019] To perform AF by driving the stage, a Z-stage that positions the sample in the vertical direction (Z direction) is required in addition to a conventional XY stage that positions the sample in the horizontal plane (XY plane). However, with conventional general Z-stages, the height of the mechanism increases as the stroke is extended, which raises the center of gravity and requires space. Therefore, it is necessary to develop a Z-stage that is low-profile and capable of fine positioning.

[0020] The following embodiments relate to a stage device that is configured with a Z mechanism equipped with a conversion mechanism that converts horizontal output to vertical output in an XYZ direction positioning stage. A typical XY stage equipped with a Z mechanism uses a wedge mechanism, which poses problems of increased heat generation and vibration due to increased moving mass and reduced rigidity.

[0021] The stage structure of the present invention achieves Z movement using a Z mechanism equipped with a conversion mechanism that converts horizontal output into vertical output. This allows the stage to have a lower center of gravity than a direct-coupled Z mechanism, and at the same time provides a stage structure that enables abnormality detection using a sensor equipped on the actuator.

[0022] Next, a charged particle beam device to which the present invention is applied will be described with reference to Fig. 1. Fig. 1 is a diagram showing a schematic configuration of the charged particle beam device of this embodiment.

[0023] In this embodiment, a semiconductor measurement device (hereinafter referred to as critical dimension SEM) will be described as an example of a charged particle beam device. In the critical dimension SEM, an electron optical system column 101 is mounted on a sample chamber 112, and the sample chamber 112 is supported by an anti-vibration mount 113. An electron beam is irradiated onto a wafer 106 from the electron optical system column 101, an image of a pattern on the wafer 106 is captured, and the line width of the pattern and shape accuracy are measured.

[0024] A stage with a table 105 as the movable part is mounted in the sample chamber 112, and a chuck 108 for mounting a wafer 106 to be observed is fixed to the table 105. The table 105 is supported by guides 107, and stage coordinates are obtained by measuring the position of a mirror 111 with a laser interferometer 104, and positioning is controlled by a controller 109. The height of the top surface of the wafer 106 can be measured with a sample height measurement sensor 116.

[0025] In order to move the chuck 108 in the vertical direction (Z direction) and change the distance between the chuck 108 and the electron optical system barrel 101, the table 105 needs to have the function of moving in the vertical direction (Z direction) in addition to moving horizontally.

[0026] Furthermore, if deformation or vibration occurs in the table 105, the relative distance between the chuck 108 and the mirror 111 fluctuates, causing image shift or image vibration when the position of the observation point on the wafer 106 is controlled using laser measurement values ​​from the laser interferometer 104.

[0027] However, if the table 105 displaces or vibrates without deformation, the relative distance between the chuck 108 and the mirror 111 does not change, and the electron beam is shifted by the amount of displacement of the current position measurement value of the stage obtained by measuring the position of the mirror 111, thereby making it possible to prevent the displacement or vibration of the table 105 from causing image shift or image shaking.

[0028] A conventional, general actuator-directly coupled Z stage mechanism will be described with reference to Figure 2A, which is a diagram showing a schematic diagram of a conventional actuator-directly coupled Z mechanism.

[0029] As shown in FIG. 2A, in a conventional Z mechanism, in order to drive a top table 201 in the Z direction, the degrees of freedom in the X and Y directions are constrained by a guide 204, and driving in the Z direction is performed by an actuator 205.

[0030] The actuator 205 may be an electromagnetic motor, a piezoelectric actuator, a magnetostrictive actuator, an ultrasonic motor, or the like. When performing micro-distance movement with these actuators, a piezoelectric actuator is generally used. Since the stroke of an actuator suitable for micro-movement is approximately 1000 ppm relative to the actuator size, the size of the actuator itself must be increased to obtain a long stroke. This increases the stage center of gravity 206, which can lead to deterioration of vibration characteristics and increased measurement errors.

[0031] The Z mechanism of the present invention will be described with reference to Figure 2B. Figure 2B is a diagram showing a schematic diagram of the Z mechanism of the present invention. Hereinafter, this system will be referred to as the "hinge system."

[0032] As shown in Fig. 2B, in the hinge system of the present invention, unlike the direct coupling system of Fig. 2A, actuator 205 is arranged in the horizontal direction (XY direction), and the horizontal output (XY direction output) of actuator 205 is converted to the vertical direction (Z direction) and output via elastic hinge 211. The output converted to the vertical direction (Z direction) by elastic hinge 211 is transmitted to the table via spring element 212, such as a leaf spring, to drive the table in the Z direction. Furthermore, horizontal movement is suppressed by restraining the table in the horizontal direction with guide element 213.

[0033] Here, the spring element 212 is not limited to a leaf spring, and any spring element such as a coil spring can be used as a component. At the same time, the guide element 213 is not limited to a rolling guide or leaf spring, and may be any element that can restrain in the horizontal direction and ensure freedom in the vertical direction (Z direction).

[0034] As described above, by using a mechanism that converts output from the horizontal direction (XY direction) to the vertical direction (Z direction), it is possible to ensure a long stroke while lowering the stage center of gravity 206 and reducing the stage height (Z mechanism height) 207.

[0035] The elastic hinge 211 (301) that converts horizontal output into vertical output will be described in detail using Figure 3. Figure 3 is a diagram that schematically shows the operation (action) of the conversion mechanism in the Z mechanism of Figure 2B. In Figure 3, the elastic hinge 301 is fixed to a fixed block or the like (not shown).

[0036] 3, when elastic hinge 301 fixed to a fixed block or the like receives a horizontal output in the X direction from actuator 302 at the lower end of the hinge, the entire hinge elastically deforms as shown in elastically deformed hinge 301', converting the horizontal (X direction) output into a vertical (Z direction) output. The output converted into the vertical (Z direction) direction is transmitted to table 303 via spring element 304 held by guide element 305, enabling vertical drive.

[0037] At this time, by making the horizontal input point and the vertical output point point contact the elastic hinge 301, it is possible to eliminate the vertical deviation at the horizontal input point and the horizontal deviation at the vertical output point that occur due to the elastic deformation of the conversion mechanism by sliding.

[0038] The shape of the elastic hinge 301 is not limited to the shape shown in Fig. 3, and any shape that can convert horizontal output to vertical output by elastic deformation is applicable. In addition, by appropriately selecting the input position of the horizontal output and the output position of the vertical output, it is possible to arbitrarily convert the displacement magnification.

[0039] It is desirable to configure the elastic hinge 301 so that the intersection of the extension line of the input surface of the elastic hinge 301, to which the output of the actuator 302 is input, and the extension line of the output surface of the elastic hinge 301, to which the output of the actuator 302 converted in the vertical direction is output, becomes the pseudo center of rotation of the elastic hinge 301, and the pseudo center of rotation is located at the fixed part of the elastic hinge 301.

[0040] 4A and 4B, the principle of detecting an external force input from the table 404 side in the hinge system of the present invention will be described. Both Fig. 4A and Fig. 4B are diagrams schematically showing the output transmission path of the hinge system. Fig. 4B shows the case where wear has occurred in the elastic hinge 402.

[0041] Consider the output transmission path from actuator 401 to table 404, as shown in Figure 4A. Elastic hinge 402 (rigid body model equivalent to elastic hinge) that transmits the output only changes the direction of the output, and can therefore be considered a rigid body with a certain length. Therefore, the force input to actuator 401 depends on the reaction force generated by spring element 403 that connects table 404 and elastic hinge 402. In other words, when table 404 is deformed and tilted by an external force, spring element length (normal spring length) 406 fluctuates, and the spring reaction force changes.

[0042] This reaction force causes a minute displacement in the actuator 401, and this displacement is read by the built-in sensor 405. This makes it possible to detect fluctuations in the table reaction force due to tilt, etc. This sensor 405 may be a strain sensor, for example.

[0043] 4B, when wear occurs between elastic hinge 402 and actuator 401 or spring element 403, it is equivalent to a change in rigid body length 407'. When rigid body length 407' changes, spring element length 406' also fluctuates at the same time, causing a change in spring reaction force. Therefore, as in the normal state shown in FIG. 4A, wear can be detected by a change in the output of sensor 405.

[0044] An example of an XY stage equipped with a hinge-type Z stage that uses a piezoelectric actuator as the actuator will be described with reference to Fig. 5. Fig. 5 is a diagram showing an example of the structure of an XYZ stage equipped with the Z mechanism (hinge type) of the present invention.

[0045] 5, Y table 503 is guided in the Y direction by Y guide 504, and X table 501 is guided in the X direction by X guide 502. A conversion mechanism 507 and a piezo actuator 506 are mounted on X table 501, and a mirror (bar mirror) 111 and a chuck 108 are fixed to top table 201. Top table 201 can be positioned in the Z direction by a Z mechanism 508 constituted by conversion mechanism 507 and piezo actuator 506.

[0046] It is possible to place the Z stage including the Z mechanism 508 below the XY mechanism, but if the XY mechanism, which has a large mass, is operated in the Z axis direction, which is the direction of gravity, the high load makes it difficult to operate quickly. In the structural example shown in Figure 5, by placing the Z stage above the XY mechanism, the movable mass of the Z axis is reduced, enabling the Z mechanism 508 to operate quickly.

[0047] The principle of estimating the amount of wear from the sensor output will be explained using Figure 6. Figure 6 is a diagram showing the relationship between the applied voltage and the drive amount in a piezoelectric actuator.

[0048] When driving in the vertical direction using Z mechanism 508, variations in the Z-direction output occur relative to the actuator output due to variations in the parts within the mechanism and wear of the components. In the case of a conventional actuator-directly coupled Z mechanism such as that shown in Figure 2A, the force applied to the actuator is constant, so wear and rattle cannot be detected by the sensor within the actuator.

[0049] Therefore, by incorporating a spring element into the Z mechanism, as in the Z mechanism (hinge type) of the present invention shown in FIG. 2B, it is possible to detect wear and estimate the amount of wear using the sensor output provided in the actuator.

[0050] The relationship between the force that a piezoelectric actuator can output and the amount of extension is determined by the force applied to the actuator body. The force applied to the actuator corresponds to the force input to the actuator by the spring element 304 via the elastic hinge 301 in the Z mechanism (hinge system) of the present invention.

[0051] In FIG. 6, reference numeral 601 denotes a line showing the relationship between the force generated before the occurrence of wear and the amount of elongation, and reference numeral 602 denotes a line when the force applied to the actuator fluctuates due to wear.

[0052] As shown in Figure 6, when the force applied to the actuator fluctuates, the actuator extension amounts 603 and 604 differ when the same voltage is applied. Symbol 603 is the drive amount when a constant voltage is applied under normal conditions, and symbol 604 is the drive amount when a constant voltage is applied during wear.

[0053] Therefore, by comparing the sensor output (amount of extension of the piezo actuator) when a specific voltage is applied before wear occurs (during assembly) with the sensor output when the same voltage is applied when wear occurs (during operation), it is possible to measure the fluctuation in the force applied to the piezo actuator and estimate the amount of wear of the Z mechanism 508.

[0054] This processing is performed by an arithmetic device (calculation unit) such as controller 109 in Fig. 1. That is, the arithmetic device (calculation unit) such as controller 109 calculates the amount of wear and rattle of Z mechanism 508 using the output of sensor 405 when the stage device is assembled and the output of sensor 405 while the stage device is in operation.

[0055] A method for calibrating the table attitude using an external sensor will be described with reference to Figures 7A and 7B. Figures 7A and 7B are diagrams showing a method for calibrating the table attitude using an external sensor.

[0056] Figure 7A shows a case where the X-direction movement amount fluctuates due to component variations within the Z mechanism, resulting in deformation of the table. While actuators 701A and 701B are driven a fixed distance using sensors 702A and 702B, sample height 704 is measured at multiple points on the sample using sensor 703, which can measure the height of the sample's upper surface. The resulting sample height 704 includes variations in each of Z mechanisms 706A and 706B during measurement. Therefore, the drive amounts (extension amounts) 708A and 708B of actuators 701A and 701B are corrected so that sample height 704 remains constant across the entire surface of the sample.

[0057] 7B, by correcting drive amounts (extension amounts) 708A', 708B' of actuators 701A, 701B, it is possible to perform posture calibration taking into account component variations and wear of Z mechanisms 706A, 706B. Furthermore, using the sensor outputs and applied voltages of 702A, 702B during calibration, wear of Z mechanisms 706A, 706B can be detected by the following procedure.

[0058] First, the voltage used during calibration is applied to each of actuators 701A and 701B, and the sensor output of each of sensors 702A and 702B is obtained. At this time, if the output of sensors 702A and 702B differs from the output during calibration, an imbalance has occurred in the load balance of table 705, making it possible to detect wear or rattle within the Z mechanism. In this case, since a worn Z mechanism is supported by other Z mechanisms via table 705, the spring reaction force becomes smaller, making it possible to identify the worn Z mechanism.

[0059] As explained above, the stage device of this embodiment is provided with a sample stage (chuck 108, top table 201) that supports the sample (wafer 106, 203), an XY mechanism (X table 501, X guide 502, Y table 503, Y guide 504) that moves the sample stage in the horizontal direction, and Z mechanisms 508, 706A, 706B that move the sample stage in the vertical direction. The Z mechanisms are arranged in the horizontal direction and are equipped with sensors 405, 702A, 703B that can detect the amount of movement of the Z mechanisms themselves. The actuators 205, 302, 401, 701A, 701B each incorporate a sensor 02B, a conversion mechanism (elastic hinges 211, 301, conversion mechanism 507) that converts the output of the actuator from the horizontal direction to the vertical direction by elastic deformation, spring elements 212, 304 that connect the sample stage and the conversion mechanism, and guide elements 213, 305 that suppress horizontal movement of the conversion mechanism, and the sample stage is driven vertically by controlling the output of the actuator based on the output of the sensor.

[0060] Furthermore, a plurality of Z mechanisms 508, 706A, and 706B are provided, and the sample stage (chuck 108, top table 201) is held by the plurality of Z mechanisms.

[0061] Furthermore, based on the amount of wear of Z mechanisms 508, 706A, 706B calculated by an arithmetic unit (calculation unit) such as controller 109, the outputs of actuators 205, 302, 401, 701A, 701B are corrected.

[0062] Furthermore, the sample height measured by the external sensor (sample height measuring sensor 116, 703) is compared with the output of the sensors 405, 702A, 702B under specific conditions, and the outputs of the actuators 205, 302, 401, 701A, 701B are corrected based on the comparison results. [Example]

[0063] Second Embodiment A stage device according to a second embodiment of the present invention will be described with reference to Fig. 8. Fig. 8 is a diagram showing an example of the structure of the Z stage of this embodiment, in which the number of Z mechanisms 508 is three.

[0064] In the first embodiment (FIG. 5), an example of a configuration in which four Z mechanisms 508 are arranged is shown, but it is also possible to provide three Z mechanisms 508, as in this embodiment (FIG. 8).

[0065] As in the case where there are four Z mechanisms 508, even if there is variation in the amount of extension between the Z mechanisms 508, it is possible to calculate the table plane using the sensor output and suppress deformation of the table 105.

[0066] The present invention is not limited to the above-described embodiments and includes various modifications. For example, the above-described embodiments have been described in detail to clearly explain the present invention, and the present invention is not necessarily limited to those including all of the described configurations. Furthermore, it is possible to replace part of the configuration of one embodiment with the configuration of another embodiment, or to add the configuration of another embodiment to the configuration of one embodiment. Furthermore, it is possible to add, delete, or replace part of the configuration of each embodiment with other configurations. [Explanation of symbols]

[0067] 101...Electron optical system lens barrel 104...Laser interferometer 105,303,404,705…table 106,203...wafer 107... Guide 108...Zipper 109...Controller 111,202...Mirror 112...Sample chamber 113...Vibration isolation mount 114...Tabletop 115...Laser interferometer optical axis 116,703...Sample height measurement sensor 201...Top table 204... Guide 205, 302, 401, 701A, 701B... Actuators 206...Stage center of gravity 207...Stage height (Z mechanism height) 211,301...Elastic hinge 212, 304...Spring element (leaf spring) 213,305...Guide elements (guides) 301'...Elastic hinge during elastic deformation 402...Rigid body model equivalent to an elastic hinge 402'...Rigid body model equivalent to an elastic hinge during wear 403...Spring element 403'...Spring element when worn 405, 702A, 702B...Sensors 406...Normal spring element length 406'...Spring element length when worn 407...Normal rigid body length 407'...Rigid body length when worn 501…X Table 502…X Guide 503...Y table 504...Y guide 506...Piezoelectric actuator 507...Conversion mechanism 508,706A,706B…Z mechanism 601...Relationship between applied voltage and actuator drive amount under normal conditions 602...Relationship between applied voltage and actuator drive amount during wear 603...Drive amount when a constant voltage is applied under normal conditions 604...Drive amount when a constant voltage is applied during wear 704...Sample height 708A, 708B, 708A', 708B'...actuator drive amount (extension amount).

Claims

1. a sample stage for supporting the sample; an XY mechanism for moving the sample stage in a horizontal direction; a Z mechanism for moving the sample stage in a vertical direction; The Z mechanism is an actuator that is arranged horizontally and has a built-in sensor that can detect its own movement amount; a conversion mechanism that converts the output of the actuator from a horizontal direction to a vertical direction by elastic deformation; a spring element connecting the sample stage and the conversion mechanism; a guide element that suppresses horizontal movement of the conversion mechanism, a stage device for driving the sample stage in the vertical direction by controlling the output of the actuator based on the output of the sensor;

2. 2. The stage apparatus according to claim 1, A plurality of the Z mechanisms are provided, A stage device characterized in that the sample stage is held by the plurality of Z mechanisms.

3. 2. The stage apparatus according to claim 1, 10. A stage device according to claim 9, wherein the output of the actuator is transmitted to the conversion mechanism by point contact between the actuator and the conversion mechanism.

4. 2. The stage apparatus according to claim 1, The stage device is characterized in that the actuator is a piezoelectric actuator.

5. 2. The stage apparatus according to claim 1, The stage apparatus is characterized in that the sensor is a strain sensor.

6. 2. The stage apparatus according to claim 1, a calculation unit that calculates the amount of wear and rattle of the Z mechanism using the output of the sensor when the stage device is assembled and the output of the sensor while the stage device is in operation.

7. 7. The stage apparatus according to claim 6, a stage device that corrects the output of the actuator based on the amount of wear of the Z mechanism calculated by the calculation unit;

8. 2. The stage apparatus according to claim 1, A stage device characterized in that it compares the height of a sample measured by an external sensor with the output of said sensor under specific conditions, and corrects the output of said actuator based on the result of said comparison.

9. 2. The stage apparatus according to claim 1, A stage device characterized in that the conversion mechanism is configured so that the intersection of an extension line of the input surface of the conversion mechanism, to which the output of the actuator is input, and an extension line of the output surface of the conversion mechanism, to which the output of the actuator converted into the vertical direction is output, becomes a pseudo center of rotation of the conversion mechanism, and the pseudo center of rotation is located at a fixed part of the conversion mechanism.

10. A charged particle beam device comprising the stage device according to claim 1 .

Images