Developing method, developing apparatus, and storage medium

The use of a developing fluid containing a weak acid gas and mist in a controlled environment addresses the challenges of substrate development, achieving improved processing efficiency and uniformity in substrate processing systems.

JP2026015177APending Publication Date: 2026-01-29TOKYO ELECTRON LTD
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Patent Information

Application Number
JP2025062250
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-10-25
Filing Date
2025-04-04
Publication Date
2026-01-29

AI Technical Summary

Technical Problem

Existing substrate processing systems face challenges in achieving effective substrate development using conventional methods, particularly in the transition from resist film exposure to development, which can be improved by utilizing a developing fluid containing a weak acid gas and mist.

Method used

A developing method that involves supplying a development fluid generated from a weak acid gas and mist into a processing space to develop substrates, with controlled concentration, using a developing unit equipped with a showerhead and exhaust systems to manage gas distribution and temperature adjustment.

Benefits of technology

The method enables efficient and effective substrate development, ensuring uniform gas distribution and temperature control, thereby enhancing the development process.

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Abstract

To excellently develop a substrate by using a developing fluid containing at least one of gas and mist of weak acid.SOLUTION: A developing method includes a step of developing a substrate on which a resist film is formed and an exposure process is performed, wherein the step of developing develops the substrate in a processing space by supplying a developing fluid into the processing space, the developing fluid being generated from a developing liquid, containing at least one of a gas and a mist of a weak acid, and having an adjusted concentration of the weak acid.SELECTED DRAWING: Figure 12
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Citation Information

Patent Citations

  • Substrate processing system and substrate processing method

    JP2024017881A