Article and method of manufacturing article

Abstract

An object of the present invention is to provide an article having excellent wear resistance and a method for producing the article.SOLUTION: The article of the present invention includes a base material containing aluminum atoms, an underlying layer, and a surface treatment layer containing carbon atoms, in which the underlying layer is a layer containing silicon atoms and oxygen atoms, and an a value of the underlying layer calculated by a predetermined method A is - 0.5240 to - 0.5000.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to an article and a method for making an article. [Background technology]

[0002] In recent years, there has been a demand for technologies that make surfaces of articles less susceptible to fingerprints and that make them easier to remove stains, in order to improve performance such as appearance and visibility. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes an article including a substrate, a silicon dioxide layer that is a vapor-deposited film, and a surface-treated layer formed using a silane-based surface treatment agent. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] International Publication No. 2023 / 017830 Summary of the Invention [Problem to be solved by the invention]

[0005] There is a demand for improved abrasion resistance in articles including a surface-treated layer formed using a surface treatment agent. The present inventors have studied the article described in Patent Document 1 and found that there is room for further improvement in abrasion resistance.

[0006] The present invention has been made in view of the above circumstances, and the problem to be solved by the present invention is to provide an article having excellent abrasion resistance. Another problem to be solved by the present invention is to provide a method for producing an article having excellent abrasion resistance. [Means for solving the problem]

[0007] The present invention includes the following aspects. [1] An article comprising a substrate containing aluminum atoms, an underlayer, and a surface treatment layer containing carbon atoms, wherein the underlayer is a layer containing silicon atoms and oxygen atoms, and the a value of the underlayer calculated by Method A described below is −0.5240 to −0.5000. [2] The article according to [1], wherein the atomic ratio of fluorine atoms to carbon atoms on the surface of the surface treatment layer, calculated by X-ray photoelectron spectroscopy, is 0.65 or less. [3] The article according to [1] or [2], wherein the substrate is a glass substrate. [4] The article according to any one of [1] to [3], wherein the surface treatment layer is a layer that does not contain fluorine atoms. [5] The article according to any one of [1] to [4], wherein the surface treatment layer is a layer formed using a surface treatment agent containing at least one selected from the group consisting of a compound represented by formula (1-1) described later, a compound represented by formula (1-2) described later, and a compound represented by formula (2) described later. [6] [7] The article according to any one of [1] to [5], wherein the thickness of the underlayer is 1 to 100 nm. The article according to any one of [1] to [6], which is an optical article. [8] The article according to any one of [1] to [7], which is a display or a touch panel. [9] A method for producing an article, comprising: applying a primer layer-forming composition containing a silane compound having a silicon atom and a hydrolyzable group and an acid onto a substrate containing aluminum to form a coating film; allowing the coating film to stand; and applying a surface treatment agent containing a compound containing a carbon atom onto the coating film that has been left standing, thereby forming a primer layer and a surface treatment layer, wherein the time for allowing the coating film to stand is 10 to 60 minutes, and the content of the acid contained in the primer layer-forming composition is 1.00 × 10 in mass ratio with respect to the total mass of the primer layer-forming composition. -4 ~1.00×10 -5 A method for manufacturing an article.

[10] The silane compound is represented by the formula (1A) 1 ) and a compound represented by the following formula (1A 2 The method for producing the article according to [9], wherein the compound 1A is at least one compound selected from the group consisting of compounds having a structure represented by the formula:

[11] The silane compound is represented by the formula (2B 1 ), a compound represented by the formula (2B 2 ), a compound represented by the formula (2C 1 ), a compound represented by the formula (2C 2 The method for producing an article according to

[10] , further comprising at least one compound selected from the group consisting of a compound represented by formula (2A) and a compound having a structure represented by formula (2D) described below.

[12] The silane compound includes the compound (1A) and the compound represented by the formula (2B 1 ) and the compound represented by the above formula (2B 2 (2B) at least one compound selected from the group consisting of compounds represented by The method for producing an article according to

[11] , wherein the compound (2B) has a ratio of the number of carbon atoms contained in the alkyl group or alkylene chain to the number of silicon atoms of 1 or less.

[13] The method for producing an article according to

[12] , wherein the ratio of the number of carbon atoms contained in the alkyl or alkylene chain in compound (2B) to the total number of silicon atoms in compound (1A) and compound (2B) is 0.005 to 0.1.

[14] The method for producing an article according to any one of [9] to

[13] , wherein the undercoat layer-forming composition further contains an organic solvent.

[15] The method for producing an article according to any one of [9] to

[14] , wherein the temperature of the coating film when left standing is 20 to 40°C.

[16] The method for producing an article according to any one of [9] to

[15] , wherein the compound containing carbon atoms does not contain a fluorine atom.

[17] The method for producing an article according to any one of [9] to

[16] , wherein the surface treatment agent contains at least one selected from the group consisting of a compound represented by formula (1-1) described later, a compound represented by formula (1-2) described later, and a compound represented by formula (2) described later.

[18] The method for producing an article according to any one of [9] to

[17] , wherein the substrate is a glass substrate. [Effects of the Invention]

[0008] According to the present invention, an article having excellent abrasion resistance is provided. The present invention also provides a method for producing an article having excellent wear resistance. [Brief explanation of the drawings]

[0009] [Figure 1] 1 is a graph showing an example of a depth profile B obtained by depth direction measurement using time-of-flight secondary ion mass spectrometry in method A for calculating the a-value of an underlayer. [Figure 2] 1 is an example of a graph used in a method A for calculating the a-value of a base layer. DETAILED DESCRIPTION OF THE INVENTION

[0010] In this specification, numerical ranges indicated using "to" include the numerical values ​​before and after "to" as the minimum and maximum values, respectively. In the numerical ranges described in stages in this specification, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. Furthermore, in the numerical ranges described in this specification, the upper or lower limit value of the numerical range may be replaced with a value shown in the examples. The term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. When a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) and group (X), respectively. Compound (X) may also be referred to as compound X. The "number average molecular weight" (Mn) is the polystyrene-equivalent molecular weight measured by gel permeation chromatography (GPC) using tetrahydrofuran as an eluent, with a calibration curve prepared using polystyrene polymers of known molecular weight. "Fluoroalkyl group" is a general term that includes perfluoroalkyl groups and partial fluoroalkyl groups. "Perfluoroalkyl group" refers to a group in which all hydrogen atoms of an alkyl group have been substituted with fluorine atoms. "Partial fluoroalkyl group" refers to an alkyl group in which one or more hydrogen atoms have been substituted with fluorine atoms and which also has one or more hydrogen atoms. In other words, a fluoroalkyl group is an alkyl group that has one or more fluorine atoms. This also applies to fluoroalkylene groups. The term "organic group" refers to a hydrocarbon group that may have a substituent and may have a heteroatom or other bond in the carbon chain. The term "hydrocarbon group" refers to an aliphatic hydrocarbon group (such as a straight-chain alkylene group, a branched alkylene group, or a cycloalkylene group), an aromatic hydrocarbon group (such as a phenylene group), or a group consisting of a combination thereof. The term "organo(poly)siloxane residue" means an organosiloxane residue or an organopolysiloxane residue. In this specification, "Me" may refer to a methyl group. When the same symbol is present in one chemical formula, the same symbol may represent the same structure as each other, or may represent different structures within a specified range.

[0011] [Goods] The article of the present invention includes a substrate containing aluminum atoms, an underlayer, and a surface-treated layer containing carbon atoms. The underlayer is a layer containing silicon atoms and oxygen atoms, and has an a value of −0.5240 to −0.5000 calculated by Method A described below. Each component of the article of the present invention will be described in detail below.

[0012] <Base material> As noted above, the substrate contains aluminum atoms. Examples of materials for the substrate containing aluminum atoms (hereinafter simply referred to as "substrate") include glass, sapphire, and ceramics, as well as composite materials of these materials with other materials. Examples of other materials include metals, resins, semiconductors, stone, fibers, nonwoven fabrics, paper, wood, fur, natural leather, artificial leather, and ceramics.

[0013] The substrate is preferably a glass substrate. Examples of the material for the glass substrate include aluminosilicate glass. The glass substrate may be chemically strengthened. The substrate preferably has a plate shape.

[0014] Examples of the substrate include substrates that are required to be imparted with water repellency. Examples of the substrate include substrates that may be used by coming into contact with other articles (e.g., a stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The above-mentioned glass substrate is preferred as a material for the substrate for a touch panel.

[0015] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the underlayer and further improves the abrasion resistance of the surface-treated layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the underlayer.

[0016] <Underlayer> The underlayer is a layer that contains silicon atoms and oxygen atoms and has an a value of −0.5240 to −0.5000 as calculated by the following method A.

[0017] Method A: Time-of-flight secondary ion mass spectrometry (TOF-SIMS) was used to measure Bi5 as the primary ion. ++, and sputter ions C 60 ++ Using this, depth direction measurement is performed using negative secondary ion detection from the surface of the surface treatment layer side toward the substrate. - The peak originating from AlO appears at 43 m / z. - The peak originating from SiO3 appears at 76 m / z - The peak originating from Si2O5 appears at 136 m / z - The peak originating from Si3O7 appears at 196 m / z - The peak originating from Si4O9 appears at 256 m / z - The peak originating from SiO and the peak appearing at 316 m / z 11 - A depth profile A is created by plotting the change in peak area of ​​each of the derived peaks. Next, the sputtering time is plotted on the horizontal axis, and the peak area of ​​each peak is calculated as SiO3 - A depth profile B is created with the SiO3 normalized intensity of each peak divided by the peak area of ​​the peak of interest as the vertical axis. In depth profile B, C 60 ++ Since the start of sputtering using C - The point where the SiO3 normalized intensity of the peak derived from AlO becomes 0.100 or less for the first time is the starting point A. - The point where the SiO3 normalized intensity of the peak derived from the SiO3 peak first becomes 0.010 or more is defined as end point B, and the SiO3 peak in region X, which is the depth region between start point A and end point B, is defined as end point B. - Peak derived from Si2O5 - Peak derived from Si3O7 - Peak derived from Si4O9 - Peaks derived from and SiO 11 - The average SiO3 normalized intensity of the peaks derived from each sample is calculated. SiO3 - , Si2O5 - , Si3O7 - , Si4O9 - and SiO 11 - [SiO3+n1(SiO2)]- In the orthogonal coordinate system, the horizontal axis is n1 when expressed in the chemical formula of SiO3, and the vertical axis is the logarithm with the base 10 of the average value of the SiO3 normalized intensity. - Point 1 is plotted at the position that represents the logarithm with base 10 of the average value of the SiO3 normalized intensity of the peak derived from the SiO3. - Point 2 is plotted at the position that represents the logarithm to the base 10 of the average value of the SiO3 normalized intensity of the peak derived from the SiO3. - Point 3 is plotted at the position that indicates the logarithm with base 10 of the average value of the SiO3 normalized intensity of the peak derived from the SiO3. - Point 4 is plotted at the position that indicates the logarithm with base 10 of the average value of the SiO3 normalized intensity of the peak derived from the SiO3. 11 - Point 5 is plotted at a position that indicates the logarithm with a base of 10 of the average value of the SiO3 normalized intensity of the peak derived from the sample. An approximate line with an intercept of 0 is derived from the five points from point 1 to point 5, and the slope of the derived approximate line is taken as the a value.

[0018] The above method A is a method for measuring C by TOF-SIMS. - , AlO - , SiO3 - , Si2O5 - , Si3O7 - , Si4O9 - , and SiO 11 - This method focuses on each negative secondary ion and calculates the a value based on the measurement results of each negative secondary ion in the underlayer. FIG. 1 shows an example of a depth profile B created by method A. In depth profile B, starting point A corresponds to the depth position of the interface between the surface treatment layer and the base layer, and end point B corresponds to the depth position of the interface between the base layer and the substrate. Therefore, region X between starting point A and end point B in depth profile B corresponds to the region in the depth direction where the base layer exists. Note that region X includes starting point A and end point B.

[0019] Next, within the region X defined above, SiO3 - , Si2O5 - , Si3O7 - , Si4O9 - and SiO 11 - The average of the SiO3 normalized intensity of the peaks derived from each of the above is calculated, and the logarithm of each average value is calculated with the base 10. Note that in depth profiles A and B, if the number of plots of each negative secondary ion in region X is less than five, C 60 ++ It is preferable to increase the number of plots by appropriately changing the sputtering conditions using C and adjusting the sputtering rate. 60 ++ Increasing the sputtering raster size slows down the sputtering rate, allowing for an increased number of plots. FIG. 2 shows an example of a graph in which points 1 to 5 are plotted on an orthogonal coordinate system with n1 as the horizontal axis and the logarithm with the base 10 of the average value of the SiO3 normalized intensity as the vertical axis. SiO3 - , Si2O5 - , Si3O7 - , Si4O9 - and SiO 11 - The five types of negative secondary ions are [SiO3+n1(SiO2)] - In this chemical formula, n1 corresponds to n1 on the horizontal axis, and the vertical axis for each point is a logarithm with a base of 10 of the average value of the SiO3 normalized intensity in region X. From the plot of five points corresponding to each negative secondary ion, an approximated line (shown by a dashed line in Figure 2) with an intercept of 0 is derived, and the a value is found from the slope of the approximated line. The approximated line may be found, for example, using the "approximate curve" function of Microsoft Excel (registered trademark), a spreadsheet software from Microsoft Corporation.

[0020] The reason why the article of the present invention, in which the underlayer contains silicon atoms and oxygen atoms and the a value of the underlayer is −0.5240 to −0.5000, has the effect of having excellent abrasion resistance is not clear in detail, but is presumed to be as follows. The a value calculated by Method A is considered to be an index showing the continuity of the Si-O-Si three-dimensional network structure in the underlayer. More specifically, when the continuity of the Si-O-Si three-dimensional network structure in the underlayer is high, the Si X O Y It is thought that the probability of generating fragment ions increases, and the a value approaches 0. Conversely, if the continuity of the Si-O-Si three-dimensional network is reduced due to the presence of silanol groups, etc. in the underlayer, Si with a large n1 X O Y It is believed that the probability of fragment ions occurring decreases and the a value becomes more negative. Here, when the a value of the underlayer is -0.5240 or more, the continuity of the Si-O-Si three-dimensional network structure within the underlayer is increased, the strength of the underlayer is improved, and as a result, it is believed that the wear resistance of the article is improved. Furthermore, when the a-value of the underlayer is -0.5000 or less, a suitable amount of reactive groups, such as silanol groups (Si-OH), which contribute to bonding with the surface treatment layer, is present in the underlayer, which is believed to result in improved adhesion between the underlayer and the surface treatment layer and further improved abrasion resistance of the article.

[0021] From the above viewpoints, the a value of the underlayer is preferably from −0.5220 to −0.5100, more preferably from −0.5210 to −0.5140, and even more preferably from −0.5200 to −0.5140. The a value of the underlayer can be adjusted, for example, by the composition of the underlayer-forming composition and the method for forming the underlayer, more specifically, the content of acid contained in the underlayer-forming composition and the time for which the coating film made of the underlayer-forming composition is left standing.

[0022] The underlayer is a layer containing silicon and oxygen, and preferably contains an oxide containing silicon. The underlayer preferably contains a hydrolysis condensate of a silane compound, which will be described later.

[0023] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the lower limit, the adhesion of the underlayer to the surface treatment layer is improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer with a transmission electron microscope (TEM).

[0024] (Method for forming base layer) The underlayer may be formed, for example, by applying a composition for forming an underlayer containing a silane compound having a silicon atom onto the substrate.

[0025] Examples of a method for applying the underlayer-forming composition to form the underlayer include a wet coating method. Specific examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0026] Since it is easier to form an undercoat layer having an a value within a predetermined range, it is preferable to apply the composition for forming an undercoat layer to a substrate to form a coating film, and then dry the coating film. Since it becomes easier to form a primer layer having an a value within a predetermined range, it is preferable to apply the primer layer-forming composition to a substrate to form a coating film, allow the coating film to stand, and then apply a surface treatment agent to the coating film to form a surface treatment layer. The time for which the coating film is left to stand after the undercoat layer-forming composition is applied to form the coating film and before the surface treatment agent is applied to the coating film is, for example, 10 to 70 minutes, preferably 10 to 60 minutes, more preferably 10 to 50 minutes, and even more preferably 10 to 40 minutes. The temperature at which the coating film is left standing is, for example, 20 to 50°C, preferably 20 to 40°C, and more preferably 20 to 30°C.

[0027] (Composition for forming base layer) The components contained in the undercoat layer-forming composition include, for example, a silane compound having a silicon atom (hereinafter, sometimes simply referred to as a "silane compound"), a catalyst, a liquid medium, and water. In particular, the composition for forming an undercoat layer preferably contains at least a silane compound (more preferably a silane compound having a silicon atom and a hydrolyzable group) and an acid. The components contained in the composition for forming the undercoat layer will be described in more detail.

[0028] [Silane Compound] The silane compound may be an organic silane or an inorganic silane. Specific examples of the silane compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes. The silane compound is preferably a compound other than silica. The silane compound may be a low molecular weight compound having a molecular weight of less than 1,000, or may be a high molecular weight compound having a number average molecular weight of 1,000 or more.

[0029] The silane compound is preferably a compound having a silicon atom and a hydrolyzable group. A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. Examples of the hydrolyzable group include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, an amino group, and -ON=CR. r2. Examples of the alkoxy group include an isocyanato group (-NCO), a carboxy group, and a hydroxyl group. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms. R r are each independently an alkyl group having 1 to 10 carbon atoms.

[0030] Among them, the silane compound is represented by the following formula (1A 1 ) and a compound represented by the following formula (1A 2 It is preferable that the compound (1A) contains at least one compound (1A) selected from the group consisting of compounds containing a structure represented by the formula (1A): Six 31 4(1A 1 ) -(SiH2NH) m1 - (1A 2 ) Formula (1A 1 ), X 31 are each independently an alkoxy group, an isocyanato group, a halogen atom, a carboxy group, or a hydroxyl group. Formula (1A 2 In the formula, m1 is an integer that gives the compound a number average molecular weight of 3,000 to 100,000.

[0031] Compound (1A) is highly reactive, and therefore when compound (1A) is contained in a composition for forming an undercoat layer, the adhesion between the substrate and the undercoat layer and the adhesion between the undercoat layer and the surface treatment layer are improved, resulting in improved abrasion resistance of the surface treatment layer.

[0032] X 31 The number of carbon atoms in the alkoxy group represented by the following formula is preferably 1 to 4, more preferably 1 to 2. Examples of the alkoxy group include a methoxy group and an ethoxy group. X 31Examples of the halogen atom represented by the formula (I) include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, with a chlorine atom being preferred. Formula (1A 1 In terms of the balance between the stability of the compound represented by X) and the ease of hydrolysis, 31 is preferably an alkoxy group or an isocyanato group.

[0033] Formula (1A 1 ) include, for example, tetramethoxysilane, tetraethoxysilane, tetraisocyanatosilane, tetrachlorosilane, and tetrabromosilane.

[0034] Formula (1A 2 The compound having a number average molecular weight of 3,000 to 100,000 is represented by the formula (1A 2 When the composition for forming an undercoat layer contains a compound having a structure represented by formula (1A), the adhesion between the substrate and the undercoat layer and the adhesion between the undercoat layer and the surface treatment layer are improved, and as a result, the abrasion resistance of the surface treatment layer is improved. 2 This is thought to be because the silane compound produced from the compound containing the structure represented by (I) has an excellent balance between the reaction sites and film-forming properties, and the reaction with the reactive silyl groups contained in the surface treatment layer proceeds, thereby improving the adhesion between the surface treatment layer and the underlayer.

[0035] The composition for forming an undercoat layer is a compound represented by the formula (1A 1 When the compound represented by formula (1A) is included, 1 ) may contain a hydrolyzate or hydrolyzed condensate of a compound represented by the formula (I). Formula (1A 1 The hydrolyzate of the compound represented by the formula (1A 1 ) in which part or all of the hydrolyzable groups of the compound represented by the formula (I) are hydrolyzed. Formula (1A 1 The hydrolysis condensate of the compound represented by the formula (1A 1 or a compound produced by condensation of hydrolyzates of a compound represented by formula (1A 1) and another compound.

[0036] The composition for forming an undercoat layer is a compound represented by the formula (1A 2 When the composition for forming an undercoat layer contains a compound having a structure represented by formula (1A 2 The compound may contain a hydrolyzate or a hydrolyzed condensate of a compound containing a structure represented by the formula (1). The definitions of the hydrolysate and hydrolysis condensate are as described above.

[0037] Formula (1A 1 ) and a compound represented by formula (1A 2 ) is easily hydrolyzed in a composition for forming an underlayer, and it is difficult to identify its molecular structure in the composition for forming an underlayer. Therefore, in this specification, a composition for forming an underlayer containing compound (1A) can also be said to be a "composition for forming an underlayer prepared using compound (1A)."

[0038] The silane compound is represented by the following formula (2B 1 ), a compound represented by the following formula (2B 2 ), a compound represented by the following formula (2C 1 ), a compound represented by the following formula (2C 2 It is preferable that the compound further contains at least one selected from the group consisting of a compound represented by formula (2A) and a compound having a structure represented by formula (2D):

[0039] R 20 Six 32 3(2B 1 ) X 33 3Si-(CH2) m3 -SiX 33 3(2B 2 ) R 30 Six 34 2nd Round 31 (2C 1 ) R 32 X 35 2Si-(CH2) m3 -SiX 352nd Round 33 (2C 2 ) -(SiR 40 R 41 -NR 42 ) k3 - (2D)

[0040] Formula(2B 1 ), (2B 2 ), formula (2C 1 ), formula (2C 2 ), and in formula (2D), R 20 , R 30 , R 31 , R 32 , R 33 , R 40 and R 41 are each independently an alkyl group, R 42 are each independently a hydrogen atom or an alkyl group, X 32 , X 33 , X 34 and X 35 are each independently an alkoxy group, an isocyanato group, a halogen atom, a carboxy group, or a hydroxyl group, Each m3 is independently an integer of 1 or greater. k3 is an integer that gives the number average molecular weight of the compound of 3,000 to 100,000.

[0041] The composition for forming an undercoat layer further contains, in addition to the compound (1A), a compound represented by the formula (2B 1 ), a compound represented by formula (2B 2 ), a compound represented by formula (2C 1 ), a compound represented by formula (2C 2 When the surface treatment layer contains at least one selected from the group consisting of a compound represented by formula (1A) and a compound having a structure represented by formula (2D), durability is improved. This is thought to be because bonding between the reactive silyl groups contained in the surface treatment layer and the reaction sites of the silane compound generated from compound (1A) is further promoted, improving adhesion between the surface treatment layer and the underlayer.

[0042] Formula(2B1 ), (2B 2 ), formula (2C 1 ), formula (2C 2 ), and in formula (2D), R 20 , R 30 , R 31 , R 32 , R 33 , R 40 , R 41 , and R 42 The alkyl group represented by the formula (I) may be a linear alkyl group, a branched alkyl group, or a cyclic alkyl group. The alkyl group is preferably a linear alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 4, and more preferably 1 to 2. X 32 , X 33 , X 34 and X 35 A preferred embodiment of the alkoxy group represented by X 31 The preferred embodiments are the same as those of the alkoxy group represented by the following formula: X 32 , X 33 , X 34 and X 35 A preferred embodiment of the halogen atom represented by X 31 The preferred embodiments are the same as those of the halogen atom represented by the following formula: Formula(2B 2 In the formula (I), m3 is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 or 2. Formula (2C 2 In the formula (I), m3 is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 or 2. In formula (2D), R 42 is preferably a hydrogen atom.

[0043] Formula(2B 1 ) include, for example, methyltrimethoxysilane, methyltrichlorosilane, and methyltriethoxysilane. Formula(2B 2Examples of the compound represented by the formula (2C) include bistriethoxysilylmethane, bistrimethoxysilylmethane, bistrichlorosilylmethane, bistrimethoxysilylethane, bistrichlorosilylethane, and bistriethoxysilylethane. 1 ) include, for example, dimethyldimethoxysilane, dimethyldiethoxysilane, and dichlorodimethylsilane. Formula (2C 2 ) include, for example, bis(methyldichlorosilyl)methane, bis(methyldichlorosilyl)ethane, bis(methyldimethoxysilyl)methane, bis(methyldimethoxysilyl)ethane, bis(methyldiethoxysilyl)methane, and bis(methyldiethoxysilyl)ethane. Examples of compounds containing a structure represented by formula (2D) include DURAZANE 1033 manufactured by Merck and poly(1,1-dimethylsilazane) telomer manufactured by Gelest.

[0044] The compound having the structure represented by formula (2D) has a number average molecular weight of 3,000 to 100,000. Therefore, when the compound having the structure represented by formula (2D) is contained in the composition for forming the undercoat layer, the adhesion between the substrate and the undercoat layer and the adhesion between the undercoat layer and the surface treatment layer are improved, resulting in improved abrasion resistance of the surface treatment layer.

[0045] The composition for forming an undercoat layer is a compound represented by the formula (2B 1 When the composition for forming an undercoat layer contains a compound represented by the formula (2B 1 ) may contain a hydrolyzate or hydrolyzed condensate of a compound represented by the formula (I). Similarly, the composition for forming the undercoat layer may be a compound represented by the formula (2B 2 ), a compound represented by formula (2C 1 ), a compound represented by formula (2C 2 ) and hydrolysates and hydrolysis condensates of compounds containing a structure represented by formula (2D).

[0046] Formula(2B 1 ), a compound represented by formula (2B2 ), a compound represented by formula (2C 1 ), a compound represented by formula (2C 2 ) and compounds containing a structure represented by formula (2D) are easily hydrolyzed in the composition for forming an undercoat layer, and it is difficult to identify their molecular structures in the composition for forming an undercoat layer. Therefore, in this specification, the formula (2B 1 ), a compound represented by formula (2B 2 ), a compound represented by formula (2C 1 ), a compound represented by formula (2C 2 The composition for forming an undercoat layer containing a compound represented by formula (2B) and a compound having a structure represented by formula (2D) is 1 ), a compound represented by formula (2B 2 ), a compound represented by formula (2C 1 ), a compound represented by formula (2C 2 The compound represented by formula (2D) may be used to form an undercoat layer.

[0047] In order to further improve the abrasion resistance of the surface treatment layer, the silane compound is selected from the group consisting of the above-mentioned compound (1A) and a compound represented by the formula (2B 1 ) and a compound represented by formula (2B 2 ), and it is preferable that the ratio of the number of carbon atoms contained in the alkyl group or alkylene chain to the number of silicon atoms in the compound (2B) is 1 or less.

[0048] The combination of compound (1A) and compound (2B) further improves the adhesion between the surface treatment layer and the undercoat layer, resulting in even more excellent abrasion resistance.

[0049] In compound (2B), when the ratio of the number of carbon atoms contained in the alkyl group or alkylene chain to the number of silicon atoms (hereinafter also referred to as "ratio A") is low, the adhesion between the surface treatment layer and the underlayer is further improved, resulting in even better abrasion resistance. The ratio A is preferably equal to or less than 5, more preferably equal to or less than 3, even more preferably equal to or less than 2, and particularly preferably equal to or less than 1. There are no particular restrictions on the lower limit of the ratio A, and it is, for example, 0.5.

[0050] For example, methyltrimethoxysilane and methyltriethoxysilane have a ratio A of 1. Bistriethoxysilylethane has a ratio A of 1. Bistriethoxysilylmethane has a ratio A of 0.5.

[0051] When the silane compound contains compound (1A) and compound (2B), the ratio of the number of carbon atoms contained in the alkyl group or alkylene chain in the second compound below to the total number of silicon atoms in compound (1A) and compound (2B) is preferably 0.005 to 0.1.

[0052] When the ratio of the number of carbon atoms contained in the alkyl group or alkylene chain in compound (2B) to the total number of silicon atoms in compound (1A) and compound (2B) (hereinafter also referred to as "ratio B") is 0.005 to 0.1, the adhesion between the surface treatment layer and the underlayer is further improved, resulting in even more excellent abrasion resistance.

[0053] The ratio B is preferably 0.005 to 0.1, and more preferably 0.01 to 0.1. In particular, when the compound (2B) is methyltrimethoxysilane, the ratio B is preferably 0.01 to 0.05. When the compound (2B) is bistriethoxysilylmethane, the ratio B is preferably 0.03 to 0.08. When the compound (2B) is bistriethoxysilylethane, the ratio B is preferably 0.03 to 0.07.

[0054] The content of the silane compound is preferably from 0.01 to 20% by mass, more preferably from 0.1 to 10% by mass, based on the total mass of the composition for forming an undercoat layer. The content of the silane compound described in this specification is the content when the silane compound is converted into SiO2 based on the number of silicon atoms contained in the silane compound (SiO2 equivalent concentration).

[0055] The type and content of the silane compound contained in the composition for forming the undercoat layer can be analyzed using thermal desorption spectroscopy (TDS), time-of-flight secondary ion mass spectroscopy (TOF-SIMS), X-ray photoelectron spectroscopy (XPS), nuclear magnetic resonance spectroscopy (NMR), or the like.

[0056] 〔catalyst〕 The undercoat layer-forming composition may contain, and preferably contains, a catalyst to promote condensation between hydrolysates of the undercoat layer-forming composition. The catalyst may be any of an acid catalyst, an alkali catalyst, an amine catalyst, and a metal complex catalyst. Examples of acid catalysts include nitric acid, acetic acid, formic acid, maleic acid, trifluoroacetic acid, hydrochloric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of alkali catalysts include sodium hydroxide, potassium hydroxide, and ammonia. Examples of amine catalysts include methylamine, dimethylamine, trimethylamine, and tetramethylhexanediamine. Examples of metal complex catalysts include acetylacetonate complexes of Ni, Pt, Pd, Al, and Rh. The content of the catalyst is preferably 0.01 to 5 mass % based on the total amount of Si atoms contained in the silane compound.

[0057] Among these, the composition for forming a base layer more preferably contains an acid, and further preferably contains at least one acid selected from the group consisting of nitric acid, hydrochloric acid, sulfuric acid, acetic acid, and phosphoric acid. The content of the acid contained in the composition for forming a base layer is 5.00 × 10 in mass ratio with respect to the total mass of the composition for forming a base layer. -6 ~5.00×10 -4 is preferred, and 1.00 x 10 -5 ~1.00×10 -4 is more preferred.

[0058] [Liquid medium] The undercoat layer-forming composition preferably contains a liquid medium other than water (hereinafter, sometimes simply referred to as "liquid medium"). Examples of the liquid medium include the same liquid medium that may be contained in the surface treatment agent described below. Among them, the liquid medium contained in the composition for forming an undercoat layer is preferably an alcohol-based organic solvent, and more preferably a mixed solvent consisting of two or more alcohol-based organic solvents. The carbon number of the alcohol-based organic solvent is preferably 1 to 4, more preferably 1 to 3.

[0059] The content of the liquid medium is preferably 80 to 99.99 mass %, more preferably 90 to 99.9 mass %, based on the total mass of the composition for forming an undercoat layer.

[0060] 〔water〕 The underlayer-forming composition may contain water. The water contained in the underlayer-forming composition may be consumed in the hydrolysis of the silane compound. The content of water contained in the undercoat layer forming composition is preferably 0.02 to 39.2 mass %, more preferably 0.2 to 19.6 mass %, based on the total mass of the undercoat layer forming composition. The content of water is preferably 100 to 300 mass %, more preferably 100 to 200 mass %, based on the total amount of Si atoms contained in the silane compound.

[0061] The composition for forming the undercoat layer may contain other components in addition to the above components, as long as the effects of the present invention are not impaired.

[0062] <Surface treatment layer> The article of the present invention includes a surface treatment layer that includes carbon atoms. The surface treatment layer may be formed on a part of the surface of the underlayer or on the entire surface of the underlayer, and may be spread over the surface of the underlayer in the form of a film or may be scattered in the form of dots. The surface treatment layer may be, for example, a layer formed using a surface treatment agent made of an organic compound.

[0063] On the surface of the surface treatment layer, the ratio of the molar amount (number of atoms) of fluorine atoms to the molar amount (number of atoms) of carbon atoms (fluorine atoms / carbon atoms) calculated by X-ray photoelectron spectroscopy (XPS) is preferably 0.65 or less, more preferably 0.62 or less, and even more preferably 0.30 or less, in order to obtain a more excellent abrasion resistance of the article. The ratio of the molar amount of fluorine atoms to the molar amount of carbon atoms may be 0.00 or more. Details of the method for determining the above ratio by XPS are described in the Examples below.

[0064] In one embodiment, the surface treatment layer is preferably a layer that does not contain fluorine atoms, in order to provide an article with better abrasion resistance. A layer that does not contain fluorine atoms means that when the surface treatment layer is measured by depth direction analysis using XPS using ion sputtering, the ratio of the molar amount of fluorine atoms to the molar amount of carbon atoms is 0.00 in both cases.

[0065] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0066] (surface treatment agent) The surface treatment agent will be described in detail below.

[0067] Compounds used in the surface treatment agent include organic compounds having a reactive group such as a reactive silyl group (hereinafter also referred to as "specific compounds"). In one embodiment, the specific compound includes a first compound having an organo(poly)siloxane residue and a reactive silyl group, and a second compound having a hydrocarbon group having 4 or more carbon atoms that is not directly bonded to an oxygen atom and may have a functional group or a substituent, and a reactive silyl group, without having an organo(poly)siloxane residue. The surface treatment agent may contain the first compound alone, the second compound alone, or a combination of the first compound and the second compound. In either case, the first compound may be used alone or in combination of two or more types, and the second compound may be used alone or in combination of two or more types. When a compound having a reactive silyl group is used as the surface treatment agent, the surface treatment layer formed may contain the reactive silyl groups in a state in which some or all of the reactive silyl groups have been hydrolyzed and the silanol groups have undergone a dehydration condensation reaction.

[0068] (1st compound) The first compound has an organo(poly)siloxane residue and a reactive silyl group.

[0069] [Organo(poly)siloxane residue] The first compound contains an organo(poly)siloxane residue. The first compound may contain one or more organo(poly)siloxane residues. When the first compound contains two or more organo(poly)siloxane residues, the two or more organo(poly)siloxane residues may be the same or different.

[0070] Examples of the organo(poly)siloxane residue include linear organo(poly)siloxane residues, cyclic organo(poly)siloxane residues, and cage-shaped organo(poly)siloxane residues. Of these, the organo(poly)siloxane residue is preferably a linear organo(poly)siloxane residue, and more preferably a divalent linear organo(poly)siloxane residue.

[0071] Examples of the organo(poly)siloxane residue include linear organo(poly)siloxane residues represented by the following formula (B1) or (B2): Of these, the organo(poly)siloxane residue represented by formula (B1) is preferred.

[0072] *-[Si(R 11 )2-O] r11 -Si(R 11 )2-* (B1) In formula (B1), R 11 are each independently a hydrocarbon group, r11 is a number greater than or equal to 0, * indicates the bonding site with the adjacent atom.

[0073] *-[Si(R 12 )2-O] r12 -Si(R 12 )2-* (B2) In formula (B2), R 12 are each independently a hydrocarbon group or T 1 -Q 1 -[Si(R 11 )2-O] r11 - and T 1 are each independently a monovalent group, Q 1 each independently represents a single bond, an ethereal oxygen atom, —C(═O)—, or an alkylene group, r11 is a number greater than or equal to 0, each r12 is independently a number of 1 or more; * indicates the bonding site with the adjacent atom.

[0074] In formula (B1), R 11Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred. Furthermore, the aromatic hydrocarbon group is preferably a phenyl group.

[0075] In formulas (B1) and (B2), r11 and r12 are each preferably a number from 1 to 600, more preferably a number from 1 to 500, still more preferably a number from 3 to 500, particularly preferably a number from 9 to 50, extremely preferably a number from 11 to 30, and most preferably a number from 11 to 25.

[0076] In formula (B2), R 12 are each independently a hydrocarbon group or T 1 -Q 1 -(SiR 11 2-O) r11 -, and a hydrocarbon group is preferred. Details of the hydrocarbon group are as follows: 11 The hydrocarbon group is the same as the hydrocarbon group represented by the following formula:

[0077] T 1 are each independently a monovalent group, and specific embodiments thereof are as described below in formula (1-1). 1 is the same as: Q 1 A specific embodiment of the formula (1-1) is Q 1 is the same as:

[0078] [Reactive Silyl Group] The number of reactive silyl groups contained in the first compound is 1 or more, and from the viewpoint of further improving the abrasion resistance of the surface treatment layer, is preferably 2 to 18, more preferably 2 to 12, still more preferably 2 to 8, and particularly preferably 2 to 4. The number of reactive silyl groups may be 1.

[0079] The reactive silyl group means a group in which a reactive group is bonded to a Si atom. The reactive group is preferably a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group.

[0080] A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, a hydrolyzable silyl group becomes a silanol group represented by Si-OH through a hydrolysis reaction. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0081] Examples of the hydrolyzable group include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, an amino group, and -ON=CR. r 2 and an isocyanato group (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms. r are each independently an alkyl group having 1 to 10 carbon atoms. Examples of the group having a hydrolyzable group include a group in which a hydrolyzable group is bonded to a linking group, such as an alkylene group, -O-, or a combination thereof. Examples of groups having a hydrolyzable group include alkoxyalkyleneoxy groups. The alkoxyalkyleneoxy group is preferably a group in which an alkoxy group having 1 to 4 carbon atoms is bonded to a carbon atom of an alkyleneoxy group having 1 to 10 carbon atoms. Specific examples of the alkoxyalkyleneoxy group include a 2-methoxyethoxy group.

[0082] The reactive silyl group is preferably a group represented by the following formula (S1). -Si(R)n L 3-n (S1)

[0083] In formula (S1), Each R is independently a monovalent hydrocarbon group, Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; each n is independently an integer of 0 to 2.

[0084] When a molecule contains a plurality of reactive silyl groups, the plurality of reactive silyl groups may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that the plurality of reactive silyl groups are the same.

[0085] Each R is independently a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group. R preferably has 1 to 6 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 or 2 carbon atoms.

[0086] Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. Details of the hydrolyzable group are as described above.

[0087] Among these, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom from the viewpoint of ease of production of the compound. L is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, from the viewpoint of less outgassing during coating and better storage stability of the compound.

[0088] Each n is independently an integer of 0 to 2, preferably 0 or 1, and more preferably 0. When a plurality of Ls are present, the adhesion of the surface treatment layer to the substrate becomes stronger.

[0089] When n is 1 or less, multiple Ls present in one molecule may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that multiple Ls are the same. When n is 2, multiple Rs present in one molecule may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable that multiple Rs are the same.

[0090] From the viewpoint of excellent uniformity and durability of the surface treatment layer, the reactive silyl group is preferably an alkoxysilyl group or a trichlorosilyl group. From the viewpoint of ease of handling of by-products generated in the reaction with the substrate, the reactive silyl group is more preferably an alkoxysilyl group. As the alkoxysilyl group, a dialkoxysilyl group or a trialkoxysilyl group is preferred, and a trialkoxysilyl group is more preferred.

[0091] The reactive silyl group may also be a group represented by the following formula (S2). >SiL2(S2) L is the same as L in formula (S1).

[0092] Examples of the first compound include a compound having a chain organo(poly)siloxane residue and a reactive silyl group linked to only one end of the chain organo(poly)siloxane residue (hereinafter also referred to as "first compound S"), and a compound having a chain organo(poly)siloxane residue and reactive silyl groups linked to both ends of the chain organo(poly)siloxane residue (hereinafter also referred to as "first compound D"). As the first compound, the first compound S may be used alone, the first compound D may be used alone, or a combination of the first compound S and the first compound D may be used. In either case, the first compound S may be used alone or in combination of two or more types, and the first compound D may be used alone or in combination of two or more types.

[0093] (1st compound S) The first compound S has a linear organo(poly)siloxane residue and a reactive silyl group linked to only one end of the linear organo(poly)siloxane residue. In this specification, the term "a reactive silyl group linked to only one end of the linear organo(poly)siloxane residue" refers to a reactive silyl group linked to only one end of the linear organo(poly)siloxane residue, either directly or indirectly via another chemical structure.

[0094] [Linear organo(poly)siloxane residue] The first compound S contains a linear organo(poly)siloxane residue. The first compound S may contain one linear organo(poly)siloxane residue or two or more linear organo(poly)siloxane residues. When the first compound S contains two or more linear organo(poly)siloxane residues, the two or more linear organo(poly)siloxane residues may be the same or different. When the first compound S contains two or more linear organo(poly)siloxane residues, it is sufficient that there is no linear organo(poly)siloxane residue having reactive silyl groups linked to both terminals, and that at least one linear organo(poly)siloxane residue has a reactive silyl group linked to one terminal.

[0095] Details of the linear organo(poly)siloxane residue are as described above in the section on the linear organo(poly)siloxane residue contained in the first compound. In particular, the linear organo(poly)siloxane residue is preferably represented by formula (B1) or (B2), and more preferably represented by formula (B1).

[0096] [Reactive Silyl Group] Details of the reactive silyl group are as described above in the section on the reactive silyl group contained in the first compound. The number of reactive silyl groups contained in the first compound S is one or more per terminal of the linear organo(poly)siloxane residue, and from the viewpoint of further improving the abrasion resistance of the surface treatment layer, it is preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, and particularly preferably 1 to 6 per terminal of the linear organo(poly)siloxane residue. In one embodiment, the number of reactive silyl groups contained in the first compound S is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, and particularly preferably 2 to 6 per terminal of the linear organo(poly)siloxane residue. The number of reactive silyl groups may be one per terminal of the linear organo(poly)siloxane residue.

[0097] (1st compound D) The first compound D has a linear organo(poly)siloxane residue and reactive silyl groups linked to both ends of the linear organo(poly)siloxane residue. In this specification, "reactive silyl groups linked to both ends of the linear organo(poly)siloxane residue" refers to reactive silyl groups linked to both ends of the linear organo(poly)siloxane residue directly or indirectly via other chemical structures.

[0098] [Linear organo(poly)siloxane residue] The first compound D contains a linear organo(poly)siloxane residue. The first compound D may contain one linear organo(poly)siloxane residue or two or more linear organo(poly)siloxane residues. When the first compound D contains two or more linear organo(poly)siloxane residues, the two or more linear organo(poly)siloxane residues may be the same or different. When the first compound D contains two or more linear organo(poly)siloxane residues, it is sufficient that reactive silyl groups are linked to both terminal sides of at least one linear organo(poly)siloxane residue.

[0099] Details of the linear organo(poly)siloxane residue are as described above in the section on the linear organo(poly)siloxane residue contained in the first compound. In particular, the linear organo(poly)siloxane residue is preferably represented by formula (B1) or (B2), and more preferably represented by formula (B1).

[0100] [Reactive Silyl Group] Details of the reactive silyl group are as described above in the section on the reactive silyl group contained in the first compound. The number of reactive silyl groups contained in the first compound D is one or more per terminal of the linear organo(poly)siloxane residue, and from the viewpoint of further improving the abrasion resistance of the surface treatment layer, is preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, and particularly preferably 1 to 6 per terminal of the linear organo(poly)siloxane residue. In one embodiment, the number of reactive silyl groups contained in the first compound D is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, and particularly preferably 2 to 6 per terminal of the linear organo(poly)siloxane residue. The number of reactive silyl groups may be one per terminal of the linear organo(poly)siloxane residue.

[0101] (Second compound) The second compound has a hydrocarbon group having 4 or more carbon atoms that does not have an organo(poly)siloxane residue and is not directly bonded to an oxygen atom, and may have a functional group or a substituent, and a reactive silyl group. Examples of organo(poly)siloxane residues not contained in the second compound include organo(poly)siloxane residues represented by formula (B1) and formula (B2) contained in the first compound.

[0102] Examples of the second compound include a compound having a reactive silyl group linked to only one end of the hydrocarbon group (hereinafter also referred to as "second compound S"), and a compound having a reactive silyl group linked to each end of the hydrocarbon group (hereinafter also referred to as "second compound D"). As the second compound, the second compound S may be used alone, the second compound D may be used alone, or a combination of the second compound S and the second compound D may be used. In either case, the second compound S may be used alone or in combination of two or more types, and the second compound D may be used alone or in combination of two or more types. In particular, in the second compound, it is preferable that the reactive silyl group is linked to only one end of the hydrocarbon group.

[0103] [Reactive Silyl Group] The second compound contains a reactive silyl group. Preferred embodiments of the reactive silyl group contained in the second compound are the same as the preferred embodiments of the reactive silyl group contained in the first compound.

[0104] [Hydrocarbon group] The second compound contains a hydrocarbon group that is not directly bonded to an oxygen atom and has 4 or more carbon atoms and may have a functional group or a substituent. The "number of carbon atoms in the hydrocarbon group" does not include the number of carbon atoms in the functional group or substituent.

[0105] Hereinafter, a hydrocarbon group having 4 or more carbon atoms that is not directly bonded to an oxygen atom and that may have a functional group or a substituent will also be referred to as a "hydrocarbon group M". The second compound may contain, in addition to the hydrocarbon group M, a hydrocarbon group directly bonded to an oxygen atom. However, the second compound must contain a hydrocarbon group M. Therefore, a compound containing only a hydrocarbon group directly bonded to an oxygen atom and a reactive silyl group (e.g., Si(OCH2CH3)4) does not fall under the category of the second compound.

[0106] The hydrocarbon group M may or may not have a functional group or a substituent. Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Of these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. The hydrocarbon group preferably has 4 to 50 carbon atoms, more preferably 8 to 40 carbon atoms, and particularly preferably 10 to 40 carbon atoms.

[0107] Examples of the functional group or substituent that the hydrocarbon group M may have include an amide group and an ester group.

[0108] Among these, the hydrocarbon group M is preferably an unsubstituted hydrocarbon group that is not directly bonded to an oxygen atom.

[0109] In the second compound, the hydrocarbon group and the reactive silyl group may be bonded directly to each other, or may be bonded to each other via another group.

[0110] [Compound represented by formula (1-1)] In one embodiment, the specific compound is preferably a compound represented by the following formula (1-1). [T 1 -Q 1 -([Si(R 11 )2-O] r11 -Si(R 11 )2) s11 ] p11 -A 11 -[Si(R) n L 3-n ] q11 (1-1) In formula (1-1), T 1 are each independently a monovalent group that does not contain a reactive silyl group, Q 1 each independently represents a single bond, an ethereal oxygen atom, —C(═O)—, or an alkylene group, R 11 are each independently a hydrocarbon group, Each r11 is independently a number equal to or greater than 0, Each s11 independently represents 0 or 1; p11 is an integer equal to or greater than 1, A 11 is a (p11+q11)-valent linking group, q11 is an integer equal to or greater than 1, R is independently a hydrocarbon group; Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; each n is independently an integer of 0 to 2.

[0111] In formula (1-1), R 11 and r11 is R in formula (B1) 11 and r11. R, L, and n are the same as R, L, and n in formula (S1).

[0112] In formula (1-1), T 1 is a monovalent group that does not contain a reactive silyl group. T 1 Examples include alkyl groups, T 11 3M 1 -(where M 1 is Si, Sn, or Ge, and T 11 are each independently a hydrocarbon group or a trialkylsilyloxy group. 11 3M 1 -R 1 -(where M 1 is Si, Sn, or Ge, and T 11 are each independently a hydrocarbon group or a trialkylsilyloxy group, and R 1 is an alkylene group), a monovalent cyclic (poly)siloxane residue or a monovalent cage (poly)siloxane residue, and a combination of a monovalent cyclic (poly)siloxane residue or a monovalent cage (poly)siloxane residue with a divalent hydrocarbon group. In formula (1-1), s11 is 0 and Q 1 If is a single bond, T 1 is T 11 3M 1 - is preferred.

[0113] T 1The alkyl group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, and is preferably a linear alkyl group or a branched alkyl group. The alkyl group may have 1 carbon atom or 2 or more carbon atoms. When the alkyl group has 2 or more carbon atoms, the number of carbon atoms is preferably 2 to 30, more preferably 3 to 28, and even more preferably 4 to 22.

[0114] T 11 3M 1 - and T 11 3M 1 -R 1 -M in 1 As the element, Si or Ge is preferable, and Si is more preferable.

[0115] T 11 3M 1 - and T 11 3M 1 -R 1 -T in 11 As the group, an alkyl group or a trialkylsilyloxy group is preferable, a methyl group, a butyldimethylsilyloxy group, a trimethylsilyloxy group, or a triethylsilyloxy group is more preferable, and a methyl group or a trimethylsilyloxy group is even more preferable. T 11 3M 1 - and T 11 3M 1 -R 1 -In the three T 11 may be the same or different.

[0116] R 1 As the alkylene group, an alkylene group having 1 to 20 carbon atoms is preferable, an alkylene group having 1 to 10 carbon atoms is more preferable, an alkylene group having 1 to 5 carbon atoms is even more preferable, and an ethylene group is particularly preferable.

[0117] In one embodiment, T 1is preferably an alkyl group, a trialkylsilyl group, a dialkylmono(trialkylsilyloxy)silyl group, a monoalkylbis(trialkylsilyloxy)silyl group, or a trialkylgermanium group, and more preferably a trimethylsilyl group, a dimethyl(trimethylsilyloxy)silyl group, a monomethylbis(trimethylsilyloxy)silyl group, or a trimethylgermanium group.

[0118] The monovalent cyclic (poly)siloxane residue is preferably a group represented by the following formula (T1). In formula (T1), R T are each independently a hydrocarbon group or a hydrocarbon group having a substituent, s is an integer of 1 to 4.

[0119] [ka]

[0120] R T Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group.

[0121] R T Among the hydrocarbon groups represented by the formula (I), the alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 1 to 4. Specifically, the alkyl group is preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and more preferably a methyl group.

[0122] R TExamples of the hydrocarbon group contained in the hydrocarbon group having a substituent represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group contained in the substituted alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 2 to 4.

[0123] R T Examples of the substituent in the hydrocarbon group having a substituent represented by the formula (I) include a halogen atom, a hydroxyl group, an alkoxy group, a trialkylsilyl ether group, a trialkylsilyl group, an amino group, a nitro group, a cyano group, a sulfonyl group, and a trifluoromethyl group.

[0124] Multiple R T may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0125] Examples of the monovalent cyclic (poly)siloxane residue include the following groups.

[0126] [ka]

[0127] The monovalent cage-like (poly)siloxane residue is preferably a group represented by the following formula (T2). In formula (T2), R 5 are each independently a hydrocarbon group or a trialkylsilyloxy group.

[0128] [ka]

[0129] R 5Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but is preferably a linear alkyl group or a branched alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, an n-butyl group, or an isobutyl group, and even more preferably an isobutyl group.

[0130] R 5 The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but is preferably a linear alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group. 5 When is a trialkylsilyloxy group, the three alkylsilyloxy groups may be the same or different from one another, but from the viewpoint of ease of production, it is preferable that they are the same.

[0131] Examples of the monovalent cage-like (poly)siloxane residue include the following groups:

[0132] [ka]

[0133] Examples of the divalent hydrocarbon group in the combination of a monovalent cyclic (poly)siloxane residue or a monovalent cage-like (poly)siloxane residue with a divalent hydrocarbon group include alkylene groups. The alkylene group preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 5 carbon atoms.

[0134] In formula (1-1), Q 1 are each independently a single bond, an ethereal oxygen atom (—O—), —C(═O)—, or an alkylene group, and are preferably a single bond or an ethereal oxygen atom. In addition, in formula (1-1), when s11 is 0, Q 1 is preferably a single bond, an ethereal oxygen atom (—O—), or —C(═O)—.

[0135] In formula (1-1), p11 is an integer of 1 or more, preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1. If p11 is 2 or more, multiple [T 1 -Q 1 -([Si(R 11 )2-O] r11 -Si(R 11 )2) s11 ] may be the same or different from each other.

[0136] In formula (1-1), A 11 is a (p11+q11)-valent linking group. 11 Examples of the alkylene group include alkylene groups, organo(poly)siloxane residues, polyalkylene oxide groups, and combinations thereof; and combinations of these with (p11+1)-valent groups and / or (q11+1)-valent groups. The alkylene group may or may not have an etheric oxygen atom and may be an alkylene group having 1 to 30 carbon atoms, preferably an alkylene group having 1 to 20 carbon atoms. The organo(poly)siloxane residue may be a group represented by the above formula (B1). The polyalkylene oxide group may be a group represented by the formula (XO): m Here, X is independently an alkylene group having 1 to 5 carbon atoms, and m is an integer of 1 or more. The number of carbon atoms in X is preferably 1 to 4, and more preferably 2 or 3. m is preferably 1 to 200, more preferably 1 to 20, and even more preferably 1 to 10. In one embodiment, A 11 As the formula A[Si(R) n L 3-n ] q1 In the above formula, A includes a (p11+q11)-valent group.

[0137] In formula (1-1), q11 is an integer of 1 or greater, preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, particularly preferably 1 to 6, and extremely preferably 1 to 4. In one embodiment, q11 is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, particularly preferably 2 to 6, and extremely preferably 2 to 4. q11 may be 1. When q11 is an integer of 2 or more, multiple [Si(R) n L 3-n ] may be the same or different from each other.

[0138] In one embodiment, T in formula (1-1) 1 is preferably a trialkylsilyl group or an alkyl group, and more preferably a trimethylsilyl group or a methyl group. Q 1 is preferably a single bond or an ethereal oxygen atom. R 11 is preferably a methyl group. r11 is preferably 2-600, more preferably 3-500, further preferably 6-50, particularly preferably 6-30, and most preferably 6-25. Preferably, s11 is 1. p11 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 1. A 11 is an alkylene group having 1 to 30 carbon atoms, or a group (3-1A) to Si(R) n L 3-n is preferably an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A-4) to Si(R) n L 3-n It is more preferable that the group is a group excluding q11 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably an integer of 1 to 3.

[0139] In one embodiment, T in formula (1-1) 1 is preferably a trialkylsilyl group, a dialkylmono(trialkylsilyloxy)silyl group, a monoalkylbis(trialkylsilyloxy)silyl group, or a trialkylgermanium group, and more preferably a dimethyl(trimethylsilyloxy)silyl group, a monomethylbis(trimethylsilyloxy)silyl group, or a trimethylgermanium group. If s11 is 0, Q 1 is preferably a single bond. If s11 is 1, then Q 1 is preferably an ethereal oxygen atom, r is preferably 0, and R 11 is preferably a methyl group. p11 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 1. A 11 is an alkylene group having 1 to 30 carbon atoms, or a group (3-1A) to Si(R) n L 3-n is preferably an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A-4) to Si(R) n L 3-n It is more preferable that the group is a group excluding q11 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably an integer of 1 to 3.

[0140] [Compound represented by formula (1-2)] In one embodiment, the specific compound is preferably represented by the following formula (1-2). [L 3-n (R) n Si] q12 -A 12 -[Si(R 12 )2-O] r12 -Si(R 12 )2-A 12 -[Si(R) n L3-n ] q12 (1-2) In formula (1-2), R 12 are each independently a hydrocarbon group or T 1 -Q 1 -(SiR 11 2-O) r11 - and T 1 are each independently a monovalent group, Q 1 each independently represents a single bond, an ethereal oxygen atom, —C(═O)—, or an alkylene group, R 11 are each independently a hydrocarbon group, Each r11 is independently a number of 1 or more, each r12 is independently a number of 1 or more; A 12 are each independently a (q12+1)-valent linking group, Each q12 is independently an integer of 1 or more, R is independently a hydrocarbon group; Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; each n is independently an integer of 0 to 2.

[0141] In formula (1-2), R 12 and r12 is R in formula (B2) 12 and r11. R, L, and n are the same as R, L, and n in formula (S1).

[0142] In formula (1-2), A 12 Examples of the alkylene group include an alkylene group, an organo(poly)siloxane residue, a polyalkylene oxide group, and combinations thereof; and combinations of these with a (q12+1)-valent group. The alkylene group may or may not have an etheric oxygen atom, and may be an alkylene group having 1 to 30 carbon atoms, preferably an alkylene group having 1 to 20 carbon atoms. The organo(poly)siloxane residue may be a group represented by the above formula (B1) or (B2). The polyalkylene oxide group may be a group represented by the formula (XO): m Here, X is independently an alkylene group having 1 to 5 carbon atoms, and m is an integer of 1 or more. The number of carbon atoms in X is preferably 1 to 4, and more preferably 2 or 3. m is preferably 1 to 100, more preferably 1 to 10, and even more preferably 1 to 5. In one embodiment, A 12 As the formula A[Si(R) n L 3-n ] q1 Among A in the above formula, a (q12+1)-valent group is exemplified.

[0143] Each q12 is independently an integer of 1 or greater, and is independently preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, particularly preferably 1 to 6, and extremely preferably 1 to 4. In one embodiment, q12 is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, particularly preferably 2 to 6, and extremely preferably 2 to 4. q12 may be 1. When q12 is an integer of 2 or more, multiple [Si(R) n L 3-n ] may be the same or different from each other.

[0144] In one embodiment, R 12 is preferably a methyl group. r12 is preferably 2-600, more preferably 3-500, further preferably 6-50, particularly preferably 6-30, and most preferably 6-25. A 12 is an alkylene group having 1 to 30 carbon atoms, or a group (3-1A) to Si(R) n L 3-nis preferably an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A-4) to Si(R) n L 3-n It is more preferable that the group is a group excluding q12 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 2 or 3.

[0145] [Partial structures of formula (1-1) and formula (1-2)] Hereinafter, A in formula (1-1) 11 -[Si(R) n L 3-n ] q11 and A in formula (1-2) 12 -[Si(R) n L 3-n ] q12 A preferred embodiment of the formula (1-1) will be described in detail below. 11 -[Si(R) n L 3-n ] q11 and A in formula (1-2) 12 -[Si(R) n L 3-n ] q12 Inclusive of A[Si(R) n L 3-n ] q1 This indicates: However, in the case of formula (1-1), A is a (p11+q11)-valent group, and in the case of formula (1-2), A is a (q12+1)-valent group.

[0146] A[Si(R) n L 3-n ] q1 The group represented by the formula (3-1A) is preferably a group represented by the formula (3-1A) or a group represented by the formula (3-1B), and more preferably a group represented by the formula (3-1A).

[0147] -Q a -A 31 (-Q b -Si(R) n L 3-n ) h (-R 31 )i (3-1A) -Q c -[CH2C(R 32 )(-Q d -Si(R) n L 3-n )] y -R 33 (3-1B) In the formula (3-1A) and the formula (3-1B), the definitions of R, L, and n are as described above.

[0148] In formula (3-1A), Q a is a single bond or a divalent linking group. Examples of the divalent linking group include a divalent hydrocarbon group, a divalent heterocyclic group, -O-, -S-, -SO2-, and -N(R d )-, -C(=O)-, -Si(R a )2- and groups formed by combining two or more of these. The divalent hydrocarbon group may be a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, or an alkynylene group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic, and examples thereof include alkylene groups. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 4 to 20, and particularly preferably 5 to 15. The divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group. Alternatively, the group may be an alkenylene group having 2 to 20 carbon atoms or an alkynylene group having 2 to 20 carbon atoms. Above R a is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. d is a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). Examples of groups combining two or more of these include -OC(=O)-, -C(=O)O-, -C(=O)S-, -C(=O)N(R d )-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -N(R d)C(=O)O-, -OC(=O)N(R d )-, -SO2N(R d )-, -N(R d )SO2-, -C(=O)N(R d )-, an alkylene group having -N(R d )C(=O)-, an alkylene group having -OC(=O)N(R d )-, an alkylene group having an etheric oxygen atom, an alkylene group having -S-, an alkylene group having -OC(=O)-, an alkylene group having -C(=O)O-, an alkylene group having -C(=O)S-, an alkylene group having -N(R d )-, an alkylene group having -N(R d )C(=O)N(R d )-, an alkylene group having -SON(R d )- and alkylene groups -Si(R a )2-phenylene group -Si(R a )2 are listed.

[0149] In formula (3-1A), A 31 represents a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organo(poly)siloxane residue, or a group having a (h+i+1)-valent ring. The alkylene group may have -O-, a silphenylene skeleton group, a divalent organo(poly)siloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organo(poly)siloxane residue, and a dialkylsilylene group. A 31 The alkylene group represented by the following formula (I) preferably has 1 to 20 carbon atoms, and more preferably has 1 to 10 carbon atoms. Examples of the divalent to octavalent organo(poly)siloxane residue include a divalent organo(poly)siloxane residue and a (w2+1)-valent organo(poly)siloxane residue described below.

[0150] In formula (3-1A), A 31 When Q is a group having a (h+i+1)-valent ring,a , (-Q b -Si(R) n L 3-n ) and R 31 is directly bonded to an atom constituting the ring, provided that the ring is a ring other than an organopolysiloxane ring. A 31 The ring in may be any of a monocycle, a fused polycycle, a bridged ring, a spiro ring, and an aggregate polycycle, and the atoms constituting the ring may be a carbocycle consisting of only carbon atoms, or a heterocycle consisting of carbon atoms and a heteroatom having a valence of two or more. In addition, the bond between the atoms constituting the ring may be a single bond or a multiple bond. Furthermore, the ring may be an aromatic ring or a non-aromatic ring. The monocycle is preferably a 4- to 8-membered ring, more preferably a 5- or 6-membered ring. The fused polycycle is preferably a fused polycycle in which two or more 4- to 8-membered rings are fused, more preferably a fused polycycle in which two or three rings selected from 5- and 6-membered rings are bonded, and more preferably a fused polycycle in which one or two rings selected from 5- and 6-membered rings are bonded to one 4-membered ring. The bridged ring is preferably a bridged ring in which the longest ring is a 5- or 6-membered ring, and the spiro ring is preferably a spiro ring consisting of two 4- to 6-membered rings. The assembled polycycle is preferably an assembled polycycle in which two or three rings selected from 5- and 6-membered rings are bonded via a single bond, 1 to 3 carbon atoms, or one heteroatom with a valence of 2 or 3. In the assembled polycycle, each ring may contain Q. a , (-Q b -Si(R) n L 3-n ) and R 31 (when i=1 or more) is preferably bonded. The heteroatoms constituting the ring are preferably nitrogen, oxygen, and sulfur atoms, and more preferably nitrogen and oxygen atoms. The number of heteroatoms constituting the ring is preferably 3 or less. When the number of heteroatoms constituting the ring is 2 or more, the heteroatoms may be different.

[0151] A 31In terms of ease of production of the compound and further improved abrasion resistance of the surface treatment layer, the ring in the formula (I) is preferably one selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heterocycle, a fused ring formed by condensing two or three of these rings, a bridged ring having a 5- or 6-membered ring as the largest ring, and an assembled polycycle having two or more of these rings and in which the linking group is a single bond, an alkylene group having 3 or less carbon atoms, an oxygen atom, or a sulfur atom. Preferred rings are a benzene ring, a 5- or 6-membered aliphatic ring, a 5- or 6-membered heterocycle having a nitrogen atom or an oxygen atom, and a fused ring of a 5- or 6-membered carbocycle with a 4- to 6-membered heterocycle. Specific examples of the ring include the rings shown below, a 1,3-cyclohexadiene ring, a 1,4-cyclohexadiene ring, an anthracene ring, a cyclopropane ring, a decahydronaphthalene ring, a norbornene ring, a norbornadiene ring, a furan ring, a pyrrole ring, a thiophene ring, a pyrazine ring, a morpholine ring, an aziridine ring, an isoquinoline ring, an oxazole ring, an isoxazole ring, a thiazole ring, an imidazole ring, a pyrazole ring, a pyran ring, a pyridazine ring, a pyrimidine ring, and an indene ring. Rings having an oxo group (=O) are also shown below.

[0152] [ka]

[0153] A 31 The bond that does not constitute the ring of the atom that constitutes the ring in a , (-Q b -Si(R) n L 3-n ) or R 31 The bond bonded to the carbon atom is a bond bonded to the alkyl group. If there are any remaining bonds, the remaining bonds are bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an ethereal oxygen atom between carbon atoms), a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, and an oxo group (=O). In addition, one of the carbon atoms constituting the ring is Q a , (-Q b-Si(R) n L 3-n ) or R 31 If there are two bonds to one of the carbon atoms, a and (-Q b -Si(R) n L 3-n ) may be bonded, and two (-Q b -Si(R) n L 3-n ) may be bonded. Q a and (-Q b -Si(R) n L 3-n ) or R 31 It is preferable that the h (-Q b -Si(R) n L 3-n ) may be bonded to different ring carbon atoms, and two of them may be bonded to one ring carbon atom, and two (-Q b -Si(R) n L 3-n There may be two or more ring-constituting carbon atoms to which i R 31 may be bonded to different ring carbon atoms, two of which may be bonded to one ring carbon atom, and two R 31 There may be two or more ring-constituting carbon atoms to which is bonded.

[0154] Among them, A 31 From the viewpoint of improving the abrasion resistance of the surface treatment layer, is preferably a carbon atom, a nitrogen atom, a silicon atom, a tetravalent to octavalent organo(poly)siloxane residue, or a group having a (h+i+1)-valent ring, and more preferably a carbon atom.

[0155] In formula (3-1A), Q b is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q a This is the same as the definition explained in

[0156] Among them, Q bis preferably an alkylene group which may have an etheric oxygen atom. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, and still more preferably 2 to 20, and may also have 2 to 10, 2 to 6, or 2 to 5 carbon atoms. Examples include 2, 3, 8, 9, and 11 carbon atoms. The number of carbon atoms may also be 1 to 10.

[0157] In formula (3-1A), R 31 is a hydrogen atom, a hydroxyl group, or an alkyl group. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and still more preferably 1 carbon atom.

[0158] A 31 is a single bond or an alkylene group, h is 1 and i is 0; A 31 is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h+i=2 is satisfied; A 31 is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and h+i=3 is satisfied; A 31 When is a divalent to octavalent organo(poly)siloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. A 31 is a group having a (h+i+1)-valent ring, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. (-Q b -Si(R) n L 3-n If there are two or more (-Q b -Si(R) n L 3-n ) may be the same or different. 31 If there are two or more, two or more (-R 31 ) may be the same or different.

[0159] In particular, it is preferable that i is 0 in order to improve the abrasion resistance of the surface treatment layer.

[0160] In formula (3-1B), Q c is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q a This is the same as the definition explained in

[0161] In formula (3-1B), R 32 is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom in view of ease of producing the compound. The alkyl group is preferably a methyl group.

[0162] In formula (3-1B), Q d is a single bond or an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6. From the viewpoint of ease of production of the compound, Q d is preferably a single bond or -CH2-.

[0163] In formula (3-1B), R 33 is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom in view of ease of producing the compound.

[0164] y is an integer of 1 to 10, and preferably an integer of 1 to 6. Two or more [CH2C(R 32 )(-Q d -Si(R) n L 3-n )] may be the same or different.

[0165] As the group (3-1A), the groups (3-1A-1) to (3-1A-7) are preferred.

[0166] -(A 32 ) s1 -Q b1 -Si(R) n L 3-n (3-1A-1) -(A 33 ) s2 -Q a2 -N[-Q b2-Si(R) n L 3-n ]2(3-1A-2) -Q a3 -Si(R g )[-Q b3 -Si(R) n L 3-n ]2(3-1A-3) -[Q e ] s4 -Q a4 -(O) t4 -C[-(O) u4 -Q b4 -Si(R) n L 3-n ] 3-w1 (-R 31 ) w1 (3-1A-4) -Q a5 -Si[-Q b5 -Si(R) n L 3-n ]3(3-1A-5) -[Q e ] v -Q a6 -Z a [-Q b6 -Si(R) n L 3-n ] w2 (3-1A-6) -[Q e ] s4 -Q a4 -(O) t4 -Z c [-(OQ b4 ) u4 -Si(R) n L 3-n ] w3 (-OH) w4 (3-1A-7) In the formulas (3-1A-1) to (3-1A-7), R, L, and n are defined as above.

[0167] Among these, the group (3-1A) is preferably the group (3-1A-4).

[0168] In the group (3-1A-1), A 32 -O-, -S-, -N(R d)-, -C(=O)-, -C(=O)O-, -C(=O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -OC(=O)N(R d )- or -C(=O)N(R d )-; or a combination of these with a divalent linking group (wherein N in the formula is Q b1 (join to). R d The definition of is as described above. s1 is 0 or 1.

[0169] A 32 However, -O-, -S-, -N(R d )-, -C(=O)-, -C(=O)O-, -C(=O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -OC(=O)N(R d )- or -C(=O)N(R d )- and a divalent linking group, the divalent linking group is Si(R 11 )2 or Si(R 12 )2. Divalent linking groups include alkylene groups, organo(poly)siloxane residues, polyalkylene oxide groups, and combinations thereof.

[0170] Q b1 is a single bond or an alkylene group. The alkylene group may have -O-, a silphenylene skeleton group, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organo(poly)siloxane residue, and a dialkylsilylene group. When the alkylene group has -O-, a silphenylene skeleton group, a divalent organo(poly)siloxane residue, or a dialkylsilylene group, it is preferable that these groups be present between carbon atoms. Q b1 The alkylene group represented by the following formula has preferably 1 to 30 carbon atoms, more preferably 1 to 20, still more preferably 2 to 20, and particularly preferably 2 to 6. The number of carbon atoms may also be 1 to 10.

[0171] In the group (3-1A-2), A 33 -O-, -S-, -N(R d )-, -C(=O)-, -C(=O)O-, -C(=O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -OC(=O)N(R d )- or -C(=O)N(R d )-; or a combination of these with a divalent linking group. R d The definition of is as described above. s2 is 0 or 1. s2 is preferably 0 in view of ease of production of the compound.

[0172] A 33 However, -O-, -S-, -N(R d )-, -C(=O)-, -C(=O)O-, -C(=O)S-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -OC(=O)N(R d )- or -C(=O)N(R d )- and a divalent linking group, the divalent linking group is Si(R 11 )2 or Si(R 12 )2. Divalent linking groups include alkylene groups, organo(poly)siloxane residues, polyalkylene oxide groups, and combinations thereof.

[0173] Q a2 represents a single bond, an alkylene group, -C(=O)-, or an etheric oxygen atom between carbon atoms of an alkylene group having two or more carbon atoms, -C(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)N(R d )-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -N(R d )C(=O)O-, -OC(=O)N(R d )-, -SO2N(R d )-, -N(R d )SO2-, -C(=O)N(R d )- or -NH-. a2 The alkylene group represented by the following formula (I) preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, further preferably 1 to 6 carbon atoms, and particularly preferably 1 to 3 carbon atoms. Q a2 An etheric oxygen atom is present between carbon atoms of an alkylene group having two or more carbon atoms, represented by -C(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)N(R d )-, -N(R d )C(=O)-, -N(R d )C(=O)N(R d )-, -N(R d )C(=O)O-, -OC(=O)N(R d )-, -SO2N(R d )-, -N(R d )SO2-, -C(=O)N(R d The group having — or —NH— preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0174] Q a2 is preferably a single bond in terms of ease of production of the compound.

[0175] Q b2is an alkylene group or a group having a divalent organo(poly)siloxane residue, an etheric oxygen atom, or -NH- between carbon atoms of an alkylene group having two or more carbon atoms. Q b2 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b2 The number of carbon atoms in the group having a divalent organo(poly)siloxane residue, an etheric oxygen atom or an —NH— between carbon atoms of the alkylene group having 2 or more carbon atoms, represented by the following formula, is preferably 2 to 10, and more preferably 2 to 6.

[0176] Q b2 As the bond, -CH2CH2CH2- and -CH2CH2OCH2CH2CH2- are preferred in terms of ease of compound production (however, the right side bonds to Si).

[0177] Two [-Q b2 -Si(R) n L 3-n ] may be the same or different.

[0178] In the group (3-1A-3), Q a3 is a single bond or an alkylene group which may have an etheric oxygen atom. a3 is preferably a single bond. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms.

[0179] R g is a hydrogen atom, a hydroxyl group, or an alkyl group. R g From the viewpoint of ease of production of the compound, a hydrogen atom or an alkyl group is preferred as the alkyl group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and is further preferably a methyl group.

[0180] Q b3 is an alkylene group, or a group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in an alkylene group having two or more carbon atoms. Q b3 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b3 The number of carbon atoms in the group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the following formula, is preferably 2 to 20, more preferably 2 to 10, and still more preferably 2 to 6. Q b3 is preferably -CH2CH2-, -CH2CH2CH2-, or -CH2CH2CH2CH2CH2CH2CH2CH2CH2- from the viewpoint of ease of production of the compound.

[0181] Two [-Q b3 -Si(R) n L 3-n ] may be the same or different.

[0182] In the group (3-1A-4), Q e is -C(=O)O-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(=O)- or -C(=O)N(R d )-; or a combination of these with a divalent linking group. Q e However, -C(=O)O-, -SO2N(R d )-, -N(R d )SO2-, -N(R d )C(=O)- or -C(=O)N(R d )- and a divalent linking group, the divalent linking group is Si(R 11 )2 or Si(R 12)2. Divalent linking groups include alkylene groups, organo(poly)siloxane residues, polyalkylene oxide groups, and combinations thereof. R 31 The definition of is as described above. When w1 is 1 or 2, R 31 is preferably a hydrogen atom. s4 is 0 or 1. Q a4 is a single bond or an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, still more preferably 1 to 6 carbon atoms, and particularly preferably 1 to 3 carbon atoms. t4 is 0 or 1 (however, Q a4 is a single bond, the value is 0. -Q a4 -(O) t4 As -, from the viewpoint of ease of production of the compound, when s4 is 0, a single bond, -CH2O-, -CH2OCH2-, -CH2OCH2CH2O-, -CH2OCH2CH2OCH2-, or -CH2OCH2CH2CH2CH2OCH2- is preferred, and when s4 is 1, a single bond, -CH2-, or -CH2CH2- is preferred.

[0183] Q b4 is an alkylene group, and the alkylene group is —O—, —C(═O)N(R d )-(R d The definition of is as described above.) may have a silphenylene skeleton group, a divalent organo(poly)siloxane residue or a dialkylsilylene group. When the alkylene group has an -O- or silphenylene skeleton group, it is preferable that the -O- or silphenylene skeleton group is present between carbon atoms. d )-, dialkylsilylene group or divalent organo(poly)siloxane residue, carbon atom-carbon atom or (O) u4 It is preferable that the group is present at the terminal on the side that bonds to the hydroxyl group. Q b4 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0184] u4 is 0 or 1. -(O) u4 -Q b4 As -, -CH2CH2-, -CH2CH2CH2-, -CH2OCH2CH2CH2-, -CH2OCH2CH2CH2CH2CH2-, -OCH2CH2CH2-, -OSi(CH3)2CH2CH2CH2-, -OSi(CH3)2OSi(CH3)2CH2CH2CH2-, -CH2CH2CH2Si(CH3)2PhSi(CH3)2CH2CH2- are preferred in terms of ease of production of the compounds (however, the right side is bonded to Si).

[0185] w1 is an integer of 0 to 2, preferably 0 or 1, and more preferably 0. [-(O) u4 -Q b4 -Si(R) n L 3-n If there are two or more [-(O) u4 -Q b4 -Si(R) n L 3-n ] may be the same or different. R 31 If there are two or more, two or more (-R 31 ) may be the same or different.

[0186] In the group (3-1A-5), Q a5 is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. Q a5As the group, -OCH2CH2CH2-, -OCH2CH2OCH2CH2CH2-, -CH2CH2-, and -CH2CH2CH2- are preferred in terms of ease of production of the compound (where the right side bonds to Si).

[0187] Q b5 is an alkylene group, or a group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in an alkylene group having two or more carbon atoms. Q b5 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b5 The number of carbon atoms in the group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the following formula, is preferably 2 to 20, more preferably 2 to 10, and still more preferably 2 to 6. Q b5 As the aryl group, -CH2CH2CH2- and -CH2CH2OCH2CH2CH2- are preferred in terms of ease of compound production (however, if the right side is Si(R) n L 3-n Binds to.

[0188] Three [-Q b5 -Si(R) n L 3-n ] may be the same or different.

[0189] Q in group (3-1A-6) e is as defined in the group (3-1A-4) above. v is 0 or 1.

[0190] Q a6 is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. Q a6 As the alkyl group, -CH2OCH2CH2CH2-, -CH2OCH2CH2OCH2CH2CH2-, -CH2CH2-, and -CH2CH2CH2- are preferred in terms of ease of production of the compound (however, when the right side is Z, a Binds to.

[0191] Z a is a (w2+1)-valent organo(poly)siloxane residue, or a (w2+1)-valent group having an alkylene group between the organo(poly)siloxane residues. w2 is an integer from 2 to 7. Examples of the (w2+1)-valent organo(poly)siloxane residue and the (w2+1)-valent group having an alkylene group between the organo(poly)siloxane residues include the following groups, where R a * indicates a binding site.

[0192] [ka]

[0193] Q b6 is an alkylene group, or a group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in an alkylene group having two or more carbon atoms. Q b6 The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q b6The number of carbon atoms in the group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the following formula, is preferably 2 to 20, more preferably 2 to 10, and still more preferably 2 to 6. Q b6 As the alkyl group, -CH2CH2- and -CH2CH2CH2- are preferred in terms of ease of production of the compound. w2 [-Q b6 -Si(R) n L 3-n ] may be the same or different.

[0194] In the group (3-1A-7), Z c is a (w3+w4+1) valent hydrocarbon group. w3 is an integer equal to or greater than 4. w4 is an integer equal to or greater than 0. Q e , s4, Q a4 , t4, Q b4 The definitions and preferred ranges of u4 and u5 are the same as those of each symbol in the group (3-1A-4).

[0195] Z c may be composed of a hydrocarbon chain, and may have an etheric oxygen atom between carbon atoms of the hydrocarbon chain, and is preferably composed of a hydrocarbon chain. Z c The valence of the alkyl group is preferably from 5 to 20, more preferably from 5 to 10, still more preferably from 5 to 8, and particularly preferably from 5 to 6. Z c The number of carbon atoms is preferably 3 to 50, more preferably 4 to 40, and even more preferably 5 to 30. w3 is preferably 4 to 20, more preferably 4 to 16, still more preferably 4 to 8, and particularly preferably 4 or 5. w4 is preferably 0 to 10, more preferably 0 to 8, still more preferably 0 to 6, particularly preferably 0 to 3, and most preferably 0 to 1. [-(OQ b4 ) u4 -Si(R) n L 3-nIf there are two or more ], there are two or more [-(OQ b4 ) u4 -Si(R) n L 3-n ] may be the same or different.

[0196] Formula A[Si(R) n L 3-n ] q1 A in the formula may be any of the groups (g2-1) to (g2-7).

[0197] [ka]

[0198] (-A 1 -Q 12 -) e1 C(R e2 ) 4-e1-e2 (-Q 22 -) e2 (g2-2) -A 1 -Q 13 -N(-Q 23 -)2(g2-3) (-A 1 -Q 14 -) h1 Z 4 (-Q 24 -) h2 (g2-4) (-A 1 -Q 15 -) i1 Si(R e3 ) 4-i1-i2 (-Q 25 -) i2 (g2-5) -A 1 -Q 26 - (g2-6) -A 1 -Q 12 -CH(-Q 22 -)-Si(R e3 ) 3-i3 (-Q 25 -) i3 (g2-7)

[0199] However, in formulas (g2-1) to (g2-7), A 1 The side is Si(R 11 )2 or Si(R 12 )2 and Q 22 , Q 23 , Q 24 , Q 25 or Q 26 The side is [-Si(R) n L 3-n ] is combined with A 1 is a single bond, -C(=O)NR 6 -, -C(=O)-, -OC(=O)O-, -NHC(=O)O-, -NHC(=O)NR 6 -, -O- or SO2NR 6 -It is. Q 11 represents a single bond, -O-, an alkylene group, or -C(=O)NR between carbon atoms of an alkylene group having two or more carbon atoms. 6 -, -C(=O)-, -NR 6 - or a group having O-. Q 12 represents a single bond, an alkylene group, or a —C(═O)NR bond between carbon atoms in an alkylene group having two or more carbon atoms. 6 -, -C(=O)-, -NR 6 - or O-, and A is Q 12 If there are two or more, there are two or more Q 12 may be the same or different. Q 13 is a single bond (where A 1 is -C(=O)-.) An alkylene group, an alkylene group having 2 or more carbon atoms, with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 Q is a group having - or -O-, or a group having -C(=O)- at the N-terminal of the alkylene group. 14 Q 14 Z bonded to 4 If the atom in is a carbon atom, then Q 12 and Q 14 Z bonded to 4 If the atom in is a nitrogen atom, Q 13 and A is Q14 If there are two or more, there are two or more Q 14 may be the same or different. Q 15 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 - or -O-, and A is Q 15 If there are two or more, there are two or more Q 15 may be the same or different. Q 22 is an alkylene group, an alkylene group having two or more carbon atoms, with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 a group having - or -O-, and -C(=O)NR at the end of the alkylene group not connected to Si; 6 -, -C(=O)-, -NR 6 A group having - or -O-, or an alkylene group having 2 or more carbon atoms having -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 - or -C(=O)NR at the end that has O- and is not connected to Si 6 -, -C(=O)-, -NR 6 - or -O-, and A is Q 22 If there are two or more, there are two or more Q 22 may be the same or different. Q 23 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 - or -O-, and two Q 23 may be the same or different. Q 24 Q 24 Z bonded to 4 If the atom in is a carbon atom, then Q 22 and Q 24 Z bonded to 4 If the atom in is a nitrogen atom, Q 23 and A is Q 24If there are two or more, there are two or more Q 24 may be the same or different. Q 25 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 - or -O-, and A is Q 25 If there are two or more, there are two or more Q 25 may be the same or different. Q 26 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 - or a group having -O-. Q 22 , Q 23 , Q 24 , Q 25 , Q 26 When is an alkylene group, it preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 6 carbon atoms. Z 4 Q 14 has a carbon atom or nitrogen atom to which Q is directly bonded, 24 is a group having a (h1+h2)-valent ring structure having a carbon atom or nitrogen atom to which is directly bonded. R e1 is a hydrogen atom or an alkyl group, and A is R e1 If there are two or more, there are two or more R e1 may be the same or different. R e2 is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group. R e3 is an alkyl group. 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0200] d1 is an integer of 0 to 3, and is preferably 1 or 2. d2 is an integer of 0 to 3, and is preferably 1 or 2. d1+d2 is an integer of 1 to 3. d3 is an integer of 0 to 3, and is preferably 0 or 1. d4 is an integer of 0 to 3, and is preferably 2 or 3. d3+d4 is an integer between 1 and 3. d1+d3 is an integer of 1 to 5, and is preferably 1 or 2. d2+d4 is an integer of 1 to 5, and is preferably 4 or 5. e1+e2 is 3 or 4. e1 is an integer of 1 to 3, and is preferably 1 or 2. e2 is an integer of 1 to 3, and is preferably 2 or 3. h1 is an integer of 1 or more, and is preferably 1 or 2. h2 is an integer of 1 or more, and is preferably 2 or 3. i1+i2 is 3 or 4. i1 is an integer of 1 to 3, and is preferably 1 or 2. i2 is an integer of 1 to 3, and is preferably 2 or 3. i3 is 2 or 3.

[0201] Q 11 , Q 12 , Q 13 , Q 14 , Q 15 , Q 22 , Q 23 , Q 24 , Q 25 and Q 26 The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further improving the abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0202] Z 4The ring structure in Z includes the ring structures described above, and the preferred embodiments are also the same. 4 The ring structure in 14 YaQ 24 is directly bonded to the ring structure, for example, an alkylene group is connected to the ring structure, and Q is 14 YaQ 24 are never connected.

[0203] R e1 , R e2 or R e3 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. R e2 The number of carbon atoms in the alkyl group portion of the acyloxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. h1 is preferably 1 to 6, more preferably 1 to 4, still more preferably 1 or 2, and particularly preferably 1, in terms of ease of production of the compound and further superior abrasion resistance of the surface treatment layer. h2 is preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3, in terms of ease of production of the compound and further superior abrasion resistance of the surface treatment layer.

[0204] Formula A[Si(R) n L 3-n ] q1 Other forms of A in the above formula include groups (g2-8) to (g2-14).

[0205] [ka]

[0206] (-A 1 -Q 12 -) e1 C(R e2 ) 4-e1-e2 (-Q 22 -G 1 ) e2 (g2-9) -A 1-Q 13 -N(-Q 23 -G 1 )2(g2-10) (-A 1 -Q 14 -) h1 Z 4 (-Q 24 -G 1 ) h2 (g2-11) (-A 1 -Q 15 -) i1 Si(R e3 ) 4-i1-i2 (-Q 25 -G 1 ) i2 (g2-12) -A 1 -Q 26 -G 1 (g2-13) -A 1 -Q 12 -CH(-Q 22 -G 1 )-Si(R e3 ) 3-i3 (-Q 25 -G 1 ) i3 (g2-14)

[0207] However, in formulas (g2-8) to (g2-14), A 1 The side is Si(R 11 )2 or Si(R 12 )2 and G 1 The side is [-Si(R) n L 3-n ] is combined with

[0208] G 1 is the following group (g3), and A has two or more G 1 may be the same or different. 1 The symbols other than are the same as those in formulas (g2-1) to (g2-7). -Si(R 13 ) 3-k3 (-Q 3 -) k3 (g3) However, in the group (g3), the Si side is Q22 , Q 23 , Q 24 , Q 25 and Q 26 Connect to Q 3 The side is [-Si(R) n L 3-n ]. R 13 is an alkyl group. 3 is an alkylene group, an alkylene group having two or more carbon atoms, with -C(=O)NR between carbon atoms. 6 -, -C(=O)-, -NR 6 - or -O-, or (OSi(R 9 )2) p -O- and 2 or more Q 3 may be the same or different. k3 is 2 or 3. R 6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. R 9 is an alkyl group, a phenyl group, or an alkoxy group, and two R 9 may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, 2 or more (OSi(R 9 )2) may be the same or different.

[0209] Q 3 The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, from the viewpoint of ease of production of the compound and further improved abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R 13 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. R 9 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. R9 The number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, in terms of excellent storage stability of the compound. p is preferably 0 or 1.

[0210] [Compound represented by formula (2)] In one embodiment, the specific compound contained in the surface treatment agent includes a compound represented by the following formula (2). R f -R 21 -L 2 -(R 22 -X 2 ) q2 (2) In formula (2), R f is a perfluoroalkyl group, -C(X 20 )F2, -C(X 20 )2F, -SF5, -OCF3, -SCF3, fluorovinyl group, fluoroethynyl group, -NX 21 X 22 a fluorine-containing group selected from the group consisting of a monovalent cyclic hydrocarbon group containing a fluorine atom, and a monovalent heterocyclic group containing a fluorine atom; X 20 are each independently H, Cl, Br, or I, and X 21 is a fluoroalkyl group, and X 22 is an alkyl group or a fluoroalkyl group. R 21 is a polyoxyalkylene chain or R f -L 21 At least one of the -CH2- groups in the alkylene group may be an ethereal oxygen atom (-O-), -C(=O)-, or -N(X 23 )-, a polyoxyfluoroalkylene chain, and an arylene group. 23 is a hydrogen atom, an alkyl group, or a fluoroalkyl group. L 21 are each independently an alkylene group. L2 is a single bond or a (q2+1)-valent group. R 22 are each independently a single bond, an alkylene group, or an alkylene group having an etheric oxygen atom. X 2 are each independently a reactive group. q2 is an integer of 1 to 10. R f If there are multiple R f may be the same or different from each other. However, q2 is 1 and L 2 is a single bond, R 22 is a single bond. Also, R f If -SF5, R 21 is R f does not have an arylene group at a position directly bonding to

[0211] In compound (2), one end of the compound has a fluorine-containing group R f is located at the other end, and a reactive group, X 2 are placed. When the surface treatment layer is formed using the compound (2), the reactive group of the compound (2) is likely to be located on the substrate side, and the fluorine-containing group R f is more likely to be placed.

[0212] R f is a perfluoroalkyl group, -C(X 20 )F2, -C(X 20 )2F, -SF5, -OCF3, -SCF3, fluorovinyl group, fluoroethynyl group, -NX 21 X 22 a fluorine-containing group selected from the group consisting of a monovalent cyclic hydrocarbon group containing a fluorine atom, and a monovalent heterocyclic group containing a fluorine atom.

[0213] R fThe number of carbon atoms in the perfluoroalkyl group is preferably 1 to 6, more preferably 1 to 4, and even more preferably 1 to 3. When the perfluoroalkyl group has 3 or more carbon atoms, the perfluoroalkyl group having 3 or more carbon atoms may be linear or may have a branched or cyclic structure. R f In this case, -C(X 20 )F2 and -C(X 20 )X on 2F 20 is H, Cl, Br, or I. In addition, -C(X 20 )2F, two X 20 may be the same or different. R f Specific examples of the fluorovinyl group in the formula (I) include CF2=CF-, CF2=CH-, CFH=CF-, CFH=CH-, and CH2=CF-. R f -NX 21 X 22 In X 21 is a fluoroalkyl group, and X 22 is an alkyl group or a fluoroalkyl group. 21 and X 22 The number of carbon atoms in the fluoroalkyl group in X is preferably 1 to 6, more preferably 1 to 4, and even more preferably 1 to 3. When the fluoroalkyl group has 3 or more carbon atoms, the fluoroalkyl group having 3 or more carbon atoms may be linear or may have a branched or cyclic structure. 22 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 4, and still more preferably 1 to 3. When the alkyl group has 3 or more carbon atoms, the alkyl group having 3 or more carbon atoms may be linear or may have a branched or cyclic structure.

[0214] The monovalent cyclic hydrocarbon group containing a fluorine atom refers to a group in which at least one hydrogen atom contained in the cyclic hydrocarbon group is substituted with a fluorine atom or a substituent containing a fluorine atom. All hydrogen atoms contained in the cyclic hydrocarbon group may be substituted with fluorine atoms or a substituent containing a fluorine atom. In the monovalent cyclic hydrocarbon group containing a fluorine atom, the cyclic hydrocarbon group may be an alicyclic hydrocarbon group or an aromatic hydrocarbon group. The cyclic hydrocarbon constituting the monovalent cyclic hydrocarbon group containing a fluorine atom may be a single ring, a fused ring, or a bridged ring. The cyclic hydrocarbon constituting the monovalent cyclic hydrocarbon group containing a fluorine atom may be a ring having a polyhedral structure such as tetrahedrane, cubane, dodecahedrane, or fullerene.

[0215] Preferred embodiments of the monovalent cyclic hydrocarbon group containing a fluorine atom include groups (g-1) to (g-4).

[0216] [ka]

[0217] In group (g-1), p1 is an integer of 1 or more, In group (g-2), p2 is an integer of 1 or more, In the group (g-3), R y1 is a monovalent substituent, and R y1 contains a fluorine atom, p3 and p4 are both integers of 0 or more, and p3+p4 is an integer of 1 or more; y1 does not contain a fluorine atom, p3 is an integer of 1 or more, and p4 is an integer of 0 or more; In the group (g-4), R y2 is a monovalent substituent, and R y2 contains a fluorine atom, p5 and p6 are both integers of 0 or more, and p5+p6 is an integer of 1 or more; y2 does not contain a fluorine atom, p5 is an integer of 1 or more, and p6 is an integer of 0 or more; In the groups (g-1) to (g-4), * represents R 21 This is the bonding position with

[0218] The group (g-1) is a monovalent group having a fullerene C60 derivative in which p1 hydrogen atoms are substituted with fluorine atoms. p1 is an integer of 1 or more, preferably an integer of 1 to 59, and more preferably an integer of 8 to 59.

[0219] The group (g-2) is a monovalent group having a cubane ring in which hydrogen atoms are substituted with p2 fluorine atoms. p2 is an integer of 1 or more, preferably an integer of 1 to 7, and more preferably an integer of 4 to 7.

[0220] The group (g-3) is a group consisting of p3 hydrogen atoms, p4 fluorine atoms, and p4 R y1 is a monovalent group having a benzene ring substituted with R y1 Specific examples of the monovalent substituent in the formula (X) include halogen atoms other than fluorine atoms (e.g., Cl, Br, I), alkyl groups which may have an etheric oxygen atom between carbon atoms, alkenyl groups, alkoxy groups, perfluoroalkyl groups, -C(X 20 )F2, -C(X 20 )2F, -SF5, -OCF3, -SCF3, a fluorovinyl group, a fluoroethynyl group, or -NX 21 X 22 is. The number of carbon atoms in the alkyl group, alkenyl group, alkoxy group, and perfluoroalkyl group in the monovalent substituent is preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. When the number of carbon atoms in these groups is 3 or more, these groups may be linear or may have a branched or cyclic structure. Specific examples of the fluorovinyl group in the monovalent substituent include R f The specific examples of the fluorovinyl group are the same as those in the above. -C(X 20 )F2 and -C(X 20 )2F, X 20 is H, Cl, Br, or I. In addition, -C(X 20 )2F, two X 20 may be the same or different. -NX 21X 22 In X 21 is a fluoroalkyl group, and X 22 is an alkyl group or a fluoroalkyl group. 21 and X 22 The number of carbon atoms in the fluoroalkyl group in X is preferably 1 to 6, more preferably 1 to 4, and even more preferably 1 to 3. When the fluoroalkyl group has 3 or more carbon atoms, the fluoroalkyl group having 3 or more carbon atoms may be linear or may have a branched or cyclic structure. 22 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 4, and still more preferably 1 to 3. When the alkyl group has 3 or more carbon atoms, the alkyl group having 3 or more carbon atoms may be linear or may have a branched or cyclic structure. R y1 contains a fluorine atom, p3 and p4 are both integers of 0 or greater, and p3+p4 is an integer of 1 or greater. In this case, p3 is preferably an integer of 0 to 5, more preferably an integer of 2 to 5. Furthermore, p4 is preferably an integer of 0 to 5, more preferably an integer of 0 to 3. Furthermore, p3+p4 is preferably 1 to 5, more preferably 1 to 5. R y1 does not contain a fluorine atom, p3 is an integer of 1 or greater, and p4 is an integer of 0 or greater. In this case, p3 is preferably an integer of 1 to 5, more preferably an integer of 1 to 3, and p4 is preferably an integer of 0 to 5, more preferably an integer of 0 to 2, with the proviso that p3+p4 is 5 or less.

[0221] The group (g-4) is a group consisting of p5 hydrogen atoms, p6 fluorine atoms, and p6 R y2 is a monovalent group having an adamantane ring substituted with R y2 Specific examples and preferred embodiments of the monovalent substituent in R y1 The same applies to the monovalent substituent in the above. R y2contains a fluorine atom, p5 and p6 are both integers of 0 or greater, and p5+p6 is an integer of 1 or greater. In this case, p5 is preferably an integer of 0 to 15, more preferably an integer of 1 to 3. Furthermore, p6 is preferably an integer of 0 to 14, more preferably an integer of 3 to 12. Furthermore, p5+p6 is preferably 1 to 15, more preferably 1 to 10. R y2 does not contain a fluorine atom, p5 is an integer of 1 or greater, and p6 is an integer of 0 or greater. In this case, p5 is preferably an integer of 1 to 15, more preferably an integer of 1 to 3, and p6 is preferably an integer of 0 to 14, more preferably an integer of 3 to 12, with the proviso that p5+p6 is 15 or less.

[0222] The monovalent heterocyclic group containing a fluorine atom means a group in which at least one hydrogen atom contained in a heterocyclic group is substituted with a fluorine atom or a substituent containing a fluorine atom. In the monovalent heterocyclic group containing a fluorine atom, the heterocyclic group may be aromatic or non-aromatic. Specific examples of heteroatoms contained in the monovalent heterocyclic group containing a fluorine atom include N, O, and S. Specific examples of the heterocycle constituting the monovalent heterocyclic group containing a fluorine atom include non-aromatic heterocycles such as pyrrolidine, piperidine, tetrahydrofuran, tetrahydropyran, dioxane, and quinuclidine, and aromatic heterocycles such as furan, pyrrole, thiophene, pyridine, triazine, triazole, pyrazole, thiazole, and benzothiazole.

[0223] R 21 is a polyoxyalkylene chain or R f -L 21 At least one of the -CH2- groups in the alkylene group may be an ethereal oxygen atom (-O-), -C(=O)-, or -N(X 23 )-, a polyoxyfluoroalkylene chain, and an arylene group. X 23is a hydrogen atom, an alkyl group, or a fluoroalkyl group. L 21 are each independently an alkylene group. However, R f If -SF5, R 21 is R f does not have an arylene group at a position directly bonding to

[0224] R 21 The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 24. The number of carbon atoms in the alkylene group does not include the number of carbon atoms in the arylene group and the substituent. R 21 When the alkylene group in the formula (I) has 3 or more carbon atoms, the alkylene group may be linear or may have a branched or cyclic structure.

[0225] R 21 is an etheric oxygen atom, -C(=O)-, -N(X 23 When the alkylene group has a divalent linking group selected from alkylene groups such as methyl hydroxyl group, ... X 23 is a hydrogen atom, an alkyl group, or a fluoroalkyl group. 23 The alkylene group and fluoroalkylene group represented by the formula: 22 The alkylene group and the fluoroalkylene group may be the same as those represented by the following formula: Specific examples of the arylene group include a phenylene group and a naphthylene group, with the phenylene group being preferred.

[0226] R 21 may have a polyoxyalkylene chain (hereinafter also referred to as "chain A2") as a substituent. R 21 When the alkyl group has chains A2, the number of chains A2 is preferably 1 to 3, more preferably 1 or 2, and even more preferably 1.

[0227] The number of constituent atoms of the main chain in chain A2 is preferably 10 or more, more preferably 12 or more, even more preferably 16 or more, and particularly preferably 18 or more, from the viewpoint of obtaining a surface treatment layer having excellent water repellency. Furthermore, the number of constituent atoms of the main chain in chain A2 is preferably 500 or less, more preferably 250 or less, even more preferably 100 or less, and particularly preferably 50 or less, from the viewpoint of obtaining a surface treatment layer having even more excellent friction durability. The number of constituent atoms of the main chain in chain A2 is preferably 10 to 500, more preferably 12 to 250, even more preferably 16 to 100, and particularly preferably 18 to 50. When compound (2) has two or more chains A2, the number of atoms constituting the main chain in the two or more chains A2 may be the same as or different from each other. The number of atoms constituting the main chain of the chain A2 means the total number of carbon atoms and oxygen atoms constituting the main chain of the polyoxyalkylene chain.

[0228] The polyoxyalkylene chain is preferably represented by the following formula (A2). (OX h ) X30 ···(A2) In formula (A2), X h are each independently an alkylene group, and X30 is an integer of 2 or greater.

[0229] The number of carbon atoms in the alkylene group is preferably 1 to 6, more preferably 2 to 4, and even more preferably 2, from the viewpoint of improving the oil repellency of the surface treatment layer. The alkylene group may be linear, branched, or cyclic. Among these, from the viewpoint of improving the oil repellency of the surface treatment layer, linear or branched groups are preferred, and linear groups are more preferred.

[0230] (OX h ) specific examples include -OCH2-, -OC2H4-, -OC3H6-, -OC4H8-, -OC5H 10 -, -OC6H 12 -, -OCH(CH3)CH2-, -OCH(CH3)CH2CH2-, -O-cycloC4H6-, -O-cycloC5H8-, and -O-cycloC6H 10- are some examples. Here, -cycloC4H6- means a cyclobutanediyl group, and -cycloC5H8- means a cyclopentanediyl group. 10 - means a cyclohexanediyl group.

[0231] (OX h The repeating number X30 of ) is an integer of 2 or more, preferably an integer of 3 or more, more preferably an integer of 3 to 200, still more preferably an integer of 5 to 150, particularly preferably an integer of 5 to 100, and most preferably an integer of 5 to 50. The 30 X's contained in formula (A2) h may be the same or different. h ) X30 is two or more types (OX h ) may be included.

[0232] From the viewpoint of improving the oil repellency of the surface treatment layer, the polyoxyalkylene chain preferably contains an oxyethylene unit represented by OC2H4, more preferably contains two or more oxyethylene units, and further preferably contains oxyethylene units in the range of 2 to 200. From the viewpoint of improving the oil repellency of the surface treatment layer, the polyoxyalkylene chain preferably contains a polyoxyethylene chain, and is more preferably a polyoxyethylene chain.

[0233] R 21 In the case where the alkylene group is R f -L 21 When compound (2) has R f may be the same or different. R 21 In the case where the alkylene group is R f -L 21 - If you have R f -L 21 The number of - is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 3. R f -L 21 -R inf The definition and preferred embodiment of R shown in formula (2) f This is the same as the definition of R f -L 21 -L in 21 is an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 20, more preferably 1 to 10, and still more preferably 1 to 8. When the alkylene group has 3 or more carbon atoms, the alkylene group having 3 or more carbon atoms may be linear or may have a branched or cyclic structure.

[0234] R 21 When R has a substituent, the polyoxyalkylene chain and R f -L 21 - may have at least one of the above, or may have both.

[0235] R 21 is preferably an alkylene group, an alkylene group in which at least one -CH2- is replaced by an ethereal oxygen atom, or an alkylene group in which at least one -CH2- is replaced by a polyoxyfluoroalkylene chain.

[0236] The polyoxyfluoroalkylene chain contains a plurality of units represented by formula (A3). (OX f ) ···(A3) X f is a fluoroalkylene group having one or more fluorine atoms. The fluoroalkylene group preferably has 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms, and even more preferably 1 or 2 carbon atoms. The fluoroalkylene group having two or more carbon atoms may be linear or branched, but is preferably linear. The fluoroalkylene group may be a group in which all hydrogen atoms in the fluoroalkylene group have been substituted with fluorine atoms (perfluoroalkylene group).

[0237] The repeating number mA3 of the unit (A3) contained in the polyoxyfluoroalkylene chain is 2 or more, and is more preferably an integer of 2 to 200, further preferably an integer of 5 to 150, and particularly preferably an integer of 5 to 100. The polyoxyfluoroalkylene chain may contain two or more types of units (A3). In order to obtain a film with excellent fingerprint smudge removal properties, the polyoxyfluoroalkylene chain is preferably a poly(oxyfluoroalkylene) chain mainly composed of units (A3) which are oxyperfluoroalkylene groups. (OX f ) mA3 In the poly(oxyfluoroalkylene) chain represented by the formula (I), the ratio of the number of units (A3) that are oxyperfluoroalkylene groups to the total number of units (A3) is preferably 50 to 100%, more preferably 80 to 100%, and particularly preferably 90 to 100%.

[0238] L 2 is a single bond or a (q2+1)-valent group. The (q2+1)-valent group may have a heteroatom such as N, O, S, or Si, and may have a branch point. L 2 R in 21 and R 22 The atoms bonded to are preferably each independently N, O, S, Si, a carbon atom constituting a branch point, or a carbon atom having a hydroxyl group or an oxo group (═O). L 2 When is a single bond, R in formula (2) 21 and R 22 is directly bonded. Also, q2 is 1, and L 2 is a single bond, R 22 is a single bond, and R in formula (2) 21 and X 2 is directly bonded.

[0239] L 2 When L is a trivalent or higher valent group, 2 has at least one branch point (hereinafter referred to as "branch point P1") selected from the group consisting of C, N, Si, a ring structure, and a (q2+1)-valent organopolysiloxane residue.

[0240] When N is the branch point P1, the branch point P1 is expressed as *-N(-**)2, for example. 21 is the bond on the side, and ** is R 22 It is the connecting hand on the side. When C is a branch point P1, the branch point P1 is, for example, *-C(-**)3 or *-CR 29 (-**)2, where * and ** are the same as when N is the branch point P1, and R 29 is a monovalent group, and examples thereof include a hydrogen atom, a hydroxyl group, an alkyl group, and an alkoxy group. When Si is the branch point P1, the branch point P1 can be, for example, *-Si(-**)3 or *-SiR 29 (-**)2, where * and ** are the same as when N is the branch point P1, and R 29 is the same as when C is the branch point P1.

[0241] The ring structure constituting the branch point P1 is preferably one selected from the group consisting of 3- to 8-membered aliphatic rings, 3- to 8-membered aromatic rings, 3- to 8-membered heterocycles, and fused rings consisting of two or more of these rings, from the viewpoint of ease of synthesis and superior abrasion durability, light resistance, and chemical resistance of the surface treatment layer, and more preferably a ring structure shown in the following formula: The ring structure may have a substituent such as a halogen atom, an alkyl group (which may contain an ethereal oxygen atom between carbon atoms), a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, or an oxo group (═O).

[0242] [ka]

[0243] Examples of the organopolysiloxane residue constituting the branch point P1 include the following groups: 25 R is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group. 25The alkyl group and alkoxy group preferably have 1 to 10 carbon atoms, and more preferably 1 carbon atom.

[0244] [ka]

[0245] Divalent or higher L 2 is -C(=O)N(R 26 )-, -C(=O)O-, -C(=O)-, -C(OH)-, -O-, -N(R 26 )-, -S-, -OC(=O)O-, -NHC(=O)O-, -NHC(=O)N(R 26 )-, -SO2N(R 26 )-, -N(R 26 )SO2-, -Si(R 26 )2-, -OSi(R 26 )2-, -Si(CH3)2-Ph-Si(CH3)2-, and a divalent organopolysiloxane residue (hereinafter referred to as "bond B1"). However, R 26 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group, and Ph is a phenylene group. 26 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of compound (2).

[0246] Examples of the divalent organopolysiloxane residue include groups of the following formula: However, R in the following formula 27 is a hydrogen atom, an alkyl group, an alkoxy group, or a phenyl group. 27 The alkyl group and alkoxy group preferably have 1 to 10 carbon atoms, and more preferably 1 carbon atom.

[0247] [ka]

[0248] As the bond B1, from the viewpoint of ease of synthesis, -C(=O)NR 26 -, -C(=O)-, and -NR 26 In order to further improve the light resistance and chemical resistance of the surface treatment layer, at least one bond selected from the group consisting of - is preferred, and -C(=O)NR 26 - or -C(=O)- is more preferred.

[0249] Divalent L 2 As for R 21 and R 22 It is preferable that the atoms bonded to R are each independently an N, O, S, or Si atom, or a carbon atom having a hydroxyl group or an oxo group (=O). 21 and R 22 It is preferable that the atoms adjacent to each of the two or more valent L are constituent elements of the bond B1. 2 Specific examples of the bond B1 include one or more bonds B1 (e.g., *-B1-**, *-B1-R 28 -B1-**) are listed. However, R 28 is a single bond or a divalent organic group, and * is R 21 is the bond on the side, and ** is R 22 It is the connecting hand on the side.

[0250] Trivalent or higher L 2 is R 21 and R 22 It is preferable that the atoms bonded to R are each independently N, O, S, Si, a carbon atom constituting a branch point, or a carbon atom having a hydroxyl group or an oxo group (=O). 21 and R 22 It is preferable that the atoms adjacent to each of the L groups are constituent elements of the bond B1 or the branch point P1. 2 A specific example of this is one or more branch points P1 (e.g., {*-P1(-**) q2}), a combination of one or more branch points P1 and one or more bonds B1 (for example, {*-B1-R 28 -P1(-**) q2}, {*-B1-R 28 -P1(-R 28 -B1-**) q2}), where R28 is a single bond or a divalent organic group, and * is R 21 is the bond on the side, and ** is R 22 It is the connecting hand on the side.

[0251] Above R 28 Examples of the divalent organic group in the formula (I) include divalent aliphatic hydrocarbon groups (such as alkylene groups and cycloalkylene groups) and divalent aromatic hydrocarbon groups (such as phenylene groups), and the hydrocarbon group may have a bond B1 between carbon atoms. The divalent organic group preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms, and even more preferably 1 to 4 carbon atoms.

[0252] The above L 2 As the group, a group represented by any one of the following formulae (E1) to (E7) is preferred in terms of ease of production of compound (2).

[0253] [ka] -E1-C(RE2)3-e3(-E22-)e3...Formula (E2) -E2-N(-E23-)2...Formula (E3) -E3-Z1(-E24-)e4...Formula (E4) -E2-Si(RE3)3-e3(-E25-)e3...Formula (E5) -E1-E26- ...Formula (E6) -E1-CH(-E22-)-Si(RE3)3-e5(-E25-)e5...Formula (E7) However, in formulas (E1) to (E7), the E1, E2 or E3 side is connected to R21 in formula (2), and the E22, E23, E24, E25 or E26 side is connected to R22. wherein E1 is a single bond, -B5-, -B6-R40-, or -B6-R40-B5-, R40 is an alkylene group or a group having -C(=O)NRE6-, -C(=O)-, -NRE6-, or -O- between carbon atoms of an alkylene group having 2 or more carbon atoms, B5 is -C(=O)NRE6-, -C(=O)-, -NRE6-, or -O-, and B6 is -C(=O)NRE6-, -C(=O)-, or -NRE6-; E2 is a single bond or -B6-R40-; E3 is E1 when the atom in Z1 to which E3 is bonded is a carbon atom, and is E2 when the atom in Z1 to which E3 is bonded is a nitrogen atom; E11 is a single bond, -O-, an alkylene group, or an alkylene group having 2 or more carbon atoms and having -C(=O)NRE6-, -C(=O)-, -NRE6-, or -O- between carbon atoms, E22 is a single bond, -B5-, -R40-B6- or -B5-R40-B6-, and when there are two or more E22s, the two or more E22s may be the same or different; E23 is a single bond or -R40-B6-, and two E23s may be the same or different. E24 is E22 when the atom in Z1 to which E24 is bonded is a carbon atom, and is E23 when the atom in Z1 to which E24 is bonded is a nitrogen atom; when there are two or more E24s, the two or more E24s may be the same or different; E25 is a single bond or -R40-B6-, and when two or more E25s are present, the two or more E25s may be the same or different. E26 is a single bond or -R40-B6-; Z1 is a group having a (e4+1)-valent ring structure having a carbon atom or nitrogen atom to which E3 is directly bonded and a carbon atom or nitrogen atom to which E24 is directly bonded, RE1 is a hydrogen atom or an alkyl group, and when there are two or more RE1, the two or more RE1 may be the same or different, RE2 is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group; RE3 is an alkyl group, RE6 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group; e1 is an integer of 0 to 2, e2 is an integer of 0 to 3, and e1+e2 is an integer of 1 to 5; e3 is an integer from 1 to 3, e4 is an integer equal to or greater than 1, e5 is an integer from 1 to 3. Note that e1+e2=q2, e3=q2, e4=q2, and e5+1=q2.

[0254] R 40 The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4, from the viewpoints of ease of production of compound (2) and further improving the friction durability, light resistance, and chemical resistance of the surface treatment layer. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0255] The ring structure in Z1 includes the ring structures described above, and the preferred embodiments are also the same. Note that, since E24 is directly bonded to the ring structure in Z1, for example, an alkylene group is not bonded to the ring structure and E24 is not bonded to the alkylene group.

[0256] The number of carbon atoms in the alkyl group of RE1, RE2 or RE3 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of compound (2). The number of carbon atoms in the alkyl group moiety of the acyloxy group of RE2 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of compound (2). e4 is preferably 2 to 6, more preferably 2 to 4, and even more preferably 2 or 3, in terms of ease of production of compound (2) and further improved abrasion durability and fingerprint stain removability of the surface treatment layer.

[0257] L 2 Other examples of the group include groups represented by any of the following formulae (E11) to (E17).

[0258] [ka] -E1-C(RE2)3-e3(-E22-EG)e3...Formula (E12) -E2-N(-E23-EG)2...Formula (E13) -E3-Z1(-E24-EG)e4...Formula (E14) -E2-Si(RE3)3-e3(-E25-EG)e3...Formula (E15) -E1-E26-EG...Formula (E16) -E1-CH(-E22-EG)-Si(RE3)3-e5(-E25-EG)e5...Formula (E17)

[0259] However, in the formulas (E11) to (E17), the E1, E2, or E3 side is connected to R21 in the formula (2), and E G The side of L2 is connected to R22. EG is the following formula (EG), and two or more EGs in L2 may be the same or different. E G The symbols other than are the same as those in formulas (E1) to (E7). -Si(R 23 ) 3-k (-E 3 -) k ...Equation(E G ) However, the formula (E G ) The Si side is connected to E22, E23, E24, E25 or E26, and E 3 Side is R 22 Connect to R 23 is an alkyl group. 3 is a single bond or -R 45 -B 6 -wherein R 45 represents an alkylene group or an alkylene group having two or more carbon atoms with -C(=O)NR between carbon atoms. 46 -, -C(=O)-, -NR 46 - or a group having -O-, or -(OSi(R 24 )2) p -O- and 2 or more E 3may be the same or different. k is 2 or 3. R 46 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. 24 is an alkyl group, a phenyl group, or an alkoxy group, and two R 24 may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, 2 or more (OSi(R 24 )2) may be the same or different.

[0260] E 3 The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4, from the viewpoints of ease of production of compound (2) and further improving the friction durability, light resistance, and chemical resistance of the surface treatment layer. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R 23 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of compound (2). R 24 The number of carbon atoms in the alkyl group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of compound (2). R 24 The number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, in view of excellent storage stability of compound (2). p is preferably 0 or 1.

[0261] R 22 is a single bond, an alkylene group, or an alkylene group having an etheric oxygen atom. R 22 In the case where there are multiple R 22 may be the same or different from each other. R 22The number of carbon atoms in the alkylene group and the alkylene group having an etheric oxygen atom is preferably 1 to 20, and more preferably 1 to 15. When the number of carbon atoms in the alkylene group or the alkylene group having an etheric oxygen atom is 3 or more, the alkylene group having 3 or more carbon atoms or the alkylene group having an etheric oxygen atom may be linear or may have a branched or cyclic structure. In the alkylene group having an etheric oxygen atom, L 2 The atom bonded to may be an ethereal oxygen atom, or an ethereal oxygen atom may exist between carbon atoms.

[0262] R22 is preferably a group represented by the following formula (H1). *-(O)a4-(Rg11O)a5-Rg12-** ···(H1) however, Rg11 is an alkylene group having 1 to 12 carbon atoms, and when there are multiple Rg11, the multiple Rg11 may be the same or different from each other, Rg12 is an alkylene group having 1 to 15 carbon atoms, a4 is 0 or 1, a5 is an integer equal to or greater than 0, * is a bond to L2, ** is X 2 is the bond that bonds to

[0263] When a4 is 0, the atom having the bond * is a carbon atom, and when a4 is 1, the atom having the bond * is an oxygen atom. In compound (2), a4 may be either 0 or 1 and may be appropriately selected from the viewpoint of ease of synthesis, etc. a5 is the number of repetitions of Rg11O, and is preferably 0 to 6, more preferably 0 to 3, and even more preferably 0 to 1, from the viewpoint of durability as a surface treatment layer. The alkylene group of Rg11 may be a linear or branched alkylene group having 1 to 12 carbon atoms, preferably an alkylene group having 1 to 6 carbon atoms, and more preferably an alkylene group having 1 to 3 carbon atoms. In addition, the alkylene group is preferably a linear alkylene group. The alkylene group of Rg12 may be a linear or branched alkylene group having 1 to 12 carbon atoms, preferably an alkylene group having 2 to 6 carbon atoms, and more preferably an alkylene group having 2 to 3 carbon atoms. The alkylene group is also preferably a linear alkylene group.

[0264] When L2 is a single bond, -R21-L2-(R22-X 2 )q2 can be expressed by the following formula (RL-1). *-R43-(OR44)y4-X 2 ...Formula (RL-1) however, R43 is a single bond or an alkylene group having 1 to 20 carbon atoms, R44 is an alkylene group having 1 to 6 carbon atoms, and when there are a plurality of R44s, the plurality of R44s may be the same or different from each other, y4 is an integer equal to or greater than 0, * is a bond that bonds to Rf in formula (2). However, when R43 is a single bond, y4 is an integer of 1 or more. When R43 is a single bond, the compound (2) has a structure in which the terminal O of (OR44)y4 is directly bonded to Rf in the formula (2). When y4 is 0, compound (2) is such that R43 is X 2 It has a structure that directly binds to

[0265] X 2 is a group having a reactive group, and X 2 Due to the reactivity of (I), compound (2) exhibits various functions, such as improving adhesion to the surface of a substrate, imparting photocurability or thermosetting property to compound (2), imparting acidity or alkalinity to compound (2), adjusting the solubility of compound (2) in a specific solvent, and functioning as a precursor for synthesizing other compounds.

[0266] X 2Specific examples of the above include -Ar, -SR10, -NOR10, -C(=O)R10, -N(R10)2, -N+(R10)3X3, -C≡N, -C(=NR10)-R10, -N+≡N, -N=NR10, -C(=O)OR10, -C(=O)OX5, -C(=O)X4, -C(=O)OC(=O)R10, -SO2R10, -SO3H, -SO3X5, -OP(=O)(-OR1 0)2, -OP(=O)(-OR10)(-OX5), -N=C=O, -SiRa1z1Ra113-z1, -C(R10)=C(R10)2, -C≡C(R10), -C(=O)N(R10)2, -N(R10)C(=O)R10, -Si(R10)2-O-Si(R10)3, -NH-C(=O)R10, -C(=O)NHR10, -I, and groups represented by the following.

[0267] [ka]

[0268] however, R 10 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 6 carbon atoms, an optionally substituted fluoroalkyl group having 1 to 6 carbon atoms, or an optionally substituted aryl group, Ar is an optionally substituted aryl group, X3 is a halide ion, X4 is a halogen atom, X5 is an alkali metal ion or an ammonium ion; Ra1 is a hydrolyzable group or a hydroxyl group, Ra11 is a hydrocarbon group, z1 is an integer from 1 to 3, When there are a plurality of R10, Ra1 or Ra11, the plurality of R10, Ra1 or Ra11 may be the same or different.

[0269] R 10The fluoroalkyl group in X has 1 to 6 carbon atoms, and preferably 1 to 3 carbon atoms. The fluoroalkyl group may have other substituents. 2 Compound (2) having a fluoroalkyl group as the substituent is a compound with a high fluorine content, and has excellent properties such as a low refractive index, a low dielectric constant, water and oil repellency, heat resistance, chemical resistance, chemical stability, transparency, etc. Examples of the substituent that the fluoroalkyl group may have include a halogen atom such as a chlorine atom, and the same as those exemplified as the functionality-imparting group T described below. Ar and R 10 The aryl group in the formula (I) includes a phenyl group, a naphthyl group, etc., and may further have a substituent. The substituent that the aryl group may have includes a halogen atom such as a fluorine atom or a chlorine atom, an alkyl group having 1 to 6 carbon atoms, and the same groups as those exemplified as the functionality-imparting group T. R 10 The alkyl group in the formula (I) has 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms. The alkyl group may have another substituent. Examples of the substituent that the alkyl group may have include a halogen atom such as a chlorine atom, and the same groups as those exemplified as the functionality-imparting group T described below.

[0270] X 2 Compound (2) having a reactive group such as a hydroxy group, N-hydroxy group, aldehyde group, ketone group, amino group, quaternary ammonium group, nitrile group, imino group, diazo group, carboxy group, carboxylate, acid anhydride group, sulfo group, sulfonate, phosphoric acid group, or phosphate (hereinafter, these groups may be referred to as "functionality-imparting group T") is endowed with various properties such as acidity, alkalinity, and hydrophilicity by the functionality-imparting group T, and imparts functions such as improved solubility in specific solvents and improved adhesion to specific substrates. Examples of counter ions for the quaternary ammonium group include halide ions. Examples of counter ions for the carboxylate, sulfonate, and phosphate include alkali metal ions and ammonium ions. X 2Compound (2) having a group with a carbon-carbon double bond as the reactive group can be combined with a photoinitiator or the like to prepare a photocurable composition, and the cured coating film obtained from the composition has both water and oil repellency and hard coat properties. Examples of the group with a carbon-carbon double bond include an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, an acryloyloxy group, a methacryloyloxy group, and an olefin. Also, X 2 Compound (2) having an isocyanate group, an epoxy group, a glycidyl group, an oxetanyl group, or a mercapto group as a reactive group can be combined with an epoxy curing agent to prepare a thermosetting or photocurable composition, and the cured coating film obtained from the composition has both water and oil repellency and hard coat properties. X 2 The amide bond, ester bond, ether bond, thioether bond, siloxane bond, and urea bond in 2 It is a bond that connects an alkyl group, a fluoroalkyl group, an aryl group, a heteroaryl group, etc. contained in the above. Other functionality-imparting groups may be further provided via these bonds.

[0271] Reactive group X of compound (2) 2 As the alkyl group, a hydroxy group, an amino group, or a group having a carbon-carbon double bond is preferred from the viewpoints of synthesis, chemical stability, adhesion to a substrate, etc. Furthermore, among groups having a carbon-carbon double bond, an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, or an olefin is preferred.

[0272] In addition, when compound (2) is used as a surface treatment agent for forming a surface treatment layer having excellent durability such as friction resistance, X 2 is preferably a reactive silyl group. The reactive silyl group is preferably a group represented by the above formula (S1). Preferred embodiments of the reactive silyl group represented by formula (S1) are as described above.

[0273] X in one molecule of compound (2) 2The number q2 may be 1 to 10, and from the viewpoint of ease of synthesis and ease of handling of compound (2), q2 is preferably 1 to 6, more preferably 1 to 3. When two or more X 2 In the case where there is X 2 may have the same structure as each other or may have different structures.

[0274] -R in Equation (2) 21 -L 2 -(R 22 -X 2 ) q2 It is preferred that the group does not contain a fluorine atom.

[0275] The surface treatment agent preferably contains, as the specific compound, a compound selected from the group consisting of a compound represented by formula (1-1), a compound represented by formula (1-2), and a compound represented by formula (2). The surface treatment agent may contain any one of the compounds represented by formula (1-1), the compounds represented by formula (1-2), and the compounds represented by formula (2) alone, or may contain a combination of two or more compounds selected from the compounds represented by formula (1-1), the compounds represented by formula (1-2), and the compounds represented by formula (2). In any case, the compound represented by formula (1-1) may be used alone or in combination of two or more, the compound represented by formula (1-2) may be used alone or in combination of two or more, and the compound represented by formula (2) may be used alone or in combination of two or more.

[0276] The number average molecular weight (Mn) of the specific compound is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. If Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. If Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range, and the solubility is improved, resulting in excellent handling properties during film formation.

[0277] The surface treatment agent may contain impurities such as by-products produced in the manufacturing process of the specific compound.

[0278] The content of the specific compound contained in the surface treatment agent is preferably 0.001 to 50 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total mass of the surface treatment agent. In the case of a surface treatment agent used in a wet coating method, the content of the specific compound may be 0.01 to 10 mass%, 0.02 to 5 mass%, 0.03 to 3 mass%, or 0.05 to 2 mass%, relative to the total mass of the surface treatment agent. The content of the specific compound is preferably 5 to 65 mass %, more preferably 10 to 60 mass %, or may be 20 to 60 mass %, or may be 30 to 50 mass %, based on the total solid content of the surface treatment agent.

[0279] (liquid medium) The surface treatment agent may contain a liquid medium. The liquid medium may be one type only, or two or more types.

[0280] The liquid medium is preferably an organic solvent. Examples of organic solvents include compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms. Specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of the ether-based organic solvent include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane. Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol Examples of suitable ethanol include propylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate. Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, and dipropylene glycol monobutyl. ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether. Specific examples of the alcohol-based organic solvent include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0281] Examples of the organic solvent include halogen-based organic solvents, nitrogen-containing compounds, sulfur-containing compounds, siloxane compounds, and fluorine-containing organic solvents.

[0282] Specific examples of halogen-based organic solvents include 1,2-dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0283] Examples of the nitrogen-containing compound include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0284] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0285] Examples of the siloxane compound include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0286] The fluorine-containing organic solvents include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., CF 13 CH2CH3 (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFE) (e.g., perfluoropropyl methyl ether (C3F7OCH3) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C4F9OCH3) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C4F9OC2H5) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl Examples of suitable perfluoroalkyl ethers include alkyl perfluoroalkyl ethers (wherein the perfluoroalkyl group and alkyl group may be linear or branched) such as alkyl ether (C2F5CF(OCH3)C3F7) (e.g., Novec (trademark) 7300 manufactured by Sumitomo 3M Limited), CF3CH2OCF2CHF2 (e.g., Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (e.g., 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (e.g., Amorea (registered trademark) AS-300 manufactured by AGC Corporation), and Opteon (registered trademark) SF01, SF05, SF10, SF30, SF33, SF70, SF79, and SF80 manufactured by Chemours).

[0287] The content of the liquid medium is preferably 50 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, relative to the total mass of the surface treatment agent. In the case of a surface treatment agent used in a wet coating method, the content of the liquid medium may be 90 to 99.99 mass%, 95 to 99.98 mass%, 97 to 99.97 mass%, or 98 to 99.95 mass%, relative to the total mass of the surface treatment agent.

[0288] (Other ingredients) The surface treatment agent may contain other components in addition to the liquid medium, as long as the effects of the present invention are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of the reactive silyl groups, which are added when the surface treatment agent contains a specific compound having a reactive silyl group.

[0289] As the catalyst, any appropriate acid or base, transition metal (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compound having an unshared electron pair in the molecular structure, nitrogen-containing compound (e.g., sulfoxide compound, aliphatic amine compound, aromatic amine compound, phosphoric acid amide compound, amide compound, urea compound), etc. can be used. Acid catalysts include, for example, acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of the base catalyst include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0290] Other components include metal compounds having a hydrolyzable group. When the surface treatment agent contains a specific metal compound, the lubricity and antifouling properties of the surface treatment layer can be further improved.

[0291] The content of other components that may be contained in the surface treatment agent is preferably 10% by mass or less, more preferably 1% by mass or less, based on the total mass of the surface treatment agent. When the surface treatment agent contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, based on the total mass of the surface treatment agent.

[0292] The total content of the specific compound and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total mass of the surface treatment agent. The solid content concentration of the surface treatment agent is a value calculated from the mass before heating and the mass after heating for 4 hours in a convection dryer at 120°C.

[0293] (Method for forming surface treatment layer) Methods for forming the surface treatment layer include dry coating and wet coating.

[0294] Dry coating methods include vacuum deposition, CVD, PVD, sputtering, and the like. Vacuum deposition is preferred as a dry coating method in terms of suppressing decomposition of the compound and simplifying the equipment. For vacuum deposition, a pellet-like substance may be used in which a porous metal such as iron or steel is impregnated with the compound. A composition containing the compound and a liquid medium may be impregnated into a porous metal such as iron or steel, and the liquid medium may be dried to produce a pellet-like substance impregnated with the compound.

[0295] Examples of the wet coating method include the methods mentioned above as the method for applying the composition for forming the undercoat layer, such as spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0296] In order to improve the abrasion resistance of the surface treatment layer, if necessary, an operation for promoting the reaction between the specific compound and the underlayer may be carried out, such as heating, humidification, or light irradiation. For example, a surface treatment layer is formed on the surface of a substrate using a surface treatment agent containing a specific compound having a reactive silyl group, and the substrate on which the surface treatment layer has been formed is heated in a moist atmosphere, thereby promoting reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups and the like on the surface of the underlayer and silanol groups, and the formation of siloxane bonds through the condensation reaction of the silanol groups. After the surface treatment layer is formed, compounds in the surface treatment layer that are not chemically bonded to other compounds or the underlayer may be removed as needed. Examples of the removal method include pouring a solvent over the surface treatment layer and wiping it off with a cloth soaked in the solvent.

[0297] [Production method] Examples of methods for manufacturing the article include a method in which a composition for forming a base layer is applied to a substrate containing aluminum to form a coating film, and a surface treatment agent is applied to the formed coating film to form a base layer and a surface treatment layer.

[0298] Among these, as a method for producing an article, from the viewpoint of being able to produce an article having excellent abrasion resistance, a method for producing an article is a method in which a base layer-forming composition containing a silane compound having a silicon atom and a hydrolyzable group and an acid is applied to a substrate containing aluminum to form a coating film, the coating film is allowed to stand, and a surface treatment agent containing a compound containing a carbon atom is applied to the coating film that has been allowed to stand, thereby forming a base layer and a surface treatment layer, wherein the time for allowing the coating film to stand is 10 to 60 minutes, and the content of the acid contained in the base layer-forming composition is 5.00 × 10 in mass ratio to the total mass of the base layer-forming composition. -6 ~5.00×10 -4 A method in which: In the above-mentioned production method, preferred embodiments of the base material, the composition for forming the underlayer, the method for forming the underlayer, the surface treatment agent, and the method for forming the surface treatment layer are as described above.

[0299] [Use of the item] The article of the present invention may be an optical article having a surface treatment layer as the outermost layer. Examples of optical articles include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic EL displays, inorganic thin-film EL dot matrix displays, rear projection displays, vacuum fluorescent displays (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0300] Examples of optical articles include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio, game devices, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Other examples of optical articles include front protective plates, antireflection plates, polarizing plates, and antiglare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MOs; optical fibers; and display surfaces of watches and clocks. In particular, the optical article is preferably a display or a touch panel.

[0301] The article of the present invention may be a medical device or a medical material. The article of the present invention may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0302] When the article of the present invention is an optical article, the material constituting the surface of the substrate is a material for optical articles, such as glass or transparent plastic. Furthermore, when the article of the present invention is an optical article, a functional layer such as a hard coat layer or an antireflection layer may be formed on the surface (outermost layer) of the substrate. The antireflection layer may be either a single-layer antireflection layer or a multi-layer antireflection layer. Examples of inorganic materials that can be used in the antireflection layer include SiO2, SiO, ZrO2, TiO2, TiO, Ti2O3, Ti2O5, Al2O3, Ta2O5, Ta3O5, Nb2O5, HfO2, Si3N4, CeO2, MgO, Y2O3, SnO2, MgF2, and WO3. These inorganic materials may be used alone or in combination (e.g., as a mixture) of two or more of them. When a multilayer antireflection layer is used, it is preferable to use SiO2 and / or SiO as the outermost layer. When the article of the present invention is an optical glass component for a touch panel, a transparent electrode, such as a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). In addition, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications. [Example]

[0303] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Examples 1, 13 to 18, 21 and 22, 24 to 31, and 41 to 45 are working examples, Examples 2 to 7 are comparative examples, and Examples 11 and 12, 19 and 20, 23, and 32 to 33 are reference examples.

[0304] [Synthesis Example 1] <Synthesis of Compound 1-1> (CH3)3Si-(OSi(CH3)2) n -(CH2) 10—COOH (10 g), 2,2-diallyl-4-penten-1-amine (1.71 g), 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride (1.98 g), triethylamine (1.44 mL), 4-dimethylaminopyridine (84 mg), and dichloromethane (30 mL) were mixed and stirred for 24 hours at 25° C. The mixture was diluted with dichloromethane, washed with hydrochloric acid and water, and then concentrated under reduced pressure to obtain compound 1-1 (8.88 g). Compound 1-1 is (CH3)3Si-(OSi(CH3)2) n -(CH2) 10 The compound was represented by -CONH-CH2C(CH2CH=CH2)3. In compound 1-1, the average value of n was 19. The structure of compound 1-1 was confirmed by the following NMR data.

[0305] 1 H-NMR (CDCl3, 400 MHz) δ[ppm]: -0.20-0.25 (m), 1.45-1.59 (m, 2H), 1.20-1.48 (m, 14H), 1.53-1.65 (m, 2H), 2.03 (d, 2H, 7.6Hz), 2.16 (t, 2H, 7.6Hz), 3.20 (d, 2H, 6.4Hz), 5.05-5.14 (m, 6H), 5.51-5.60 (m, 1H), 5.80-5.93 (m, 3H). 13 C-NMR (CDCl3, 133 MHz) δ[ppm]: 0.2, 1.0, 1.8, 18.3, 23.2, 29.3, 29.4, 29.6, 30.3, 33.5, 37.1, 40.0, 40.1, 45.0, 118.1, 134.2, 172.9.

[0306] <Synthesis of Compound 1-2> Compound 1-1 (2 g), toluene (10 mL), a xylene solution of Karstedt's catalyst (2%, 0.29 mL), aniline (46 mg), and trimethoxysilane (1.43 mL) were mixed. The mixture was stirred at 25°C for 24 hours and then concentrated under reduced pressure to give compound 1-2 (2.21 g). Compound 1-2 is (CH3)3Si-(OSi(CH3)2) n -(CH2) 10 The compound was represented by -CONH-CH2C{CH2CH2CH2Si(OCH3)3}3. In compound 1-2, the average value of n was 19. The structure of compound 1-2 was confirmed by the following NMR data.

[0307] 1 H-NMR (CDCl3, 400 MHz) δ[ppm]: -0.2-0.21 (m), 0.41-0.65 (m, 8H), 1.10-1.50 (m, 26H), 1.55-1.65 (m, 2H), 2.14 (t, 2H, 7.2 Hz), 3.09 (d, 2H, 6.0 Hz), 3.45-3.62 (m, 27H), 5.67-5.75 (m, 1H) 13 C-NMR (CDCl3, 133 MHz) δ[ppm]: 0.1, 1.0, 1.7, 9.5, 16.1, 18.2, 23.2, 26.0, 29.4, 29.4, 29.6, 30.2, 33.4, 37.0, 38.1, 39.1, 43.6, 50.4, 173.0.

[0308] [Synthesis Example 2] <Synthesis of Compound 2-1> Dichloromethane (100 g) and trichloroisocyanuric acid (14 g) were added to 1,1,1,3,5,5,5-heptamethyltrisiloxane (10 g) and stirred at 25°C for 3 hours. The reaction mixture was then filtered to remove insoluble matter, and the filtrate was evaporated to remove low-boiling components. Water (20 g), tetrahydrofuran (THF, 40 g), and triethylamine (10 g) were added to the resulting crude liquid and stirred at 25°C for 2 hours. Extraction was performed with hexane and water, and the low-boiling components were removed by evaporation. The resulting crude liquid was purified by flash column chromatography using silica gel (eluent: hexane / ethyl acetate) to obtain compound 2-1 (8.3 g). The structure of compound 2-1 was confirmed by the following NMR data.

[0309] [ka]

[0310] 1 H-NMR (400 MHz, CDCl3) δ: 2.41 (q, J = 7.2 Hz, 1H), 0.20 - 0.21 (m, 21H).

[0311] <Synthesis of Compound 2-2> Compound 2-1 (2.0 g) was added to THF (20 g) and cooled to 0°C. Then, a methyllithium solution (3.1 M in diethoxymethane) (2.7 mL) was added and stirred at 25°C for 10 minutes. Next, a solution of hexamethylcyclotrisiloxane (5.6 g) dissolved in THF (20 g) was added, and the mixture was stirred at 25°C for 4 hours. Next, chlorodimethylsilane (2.0 g) was added, and the mixture was stirred at 25°C for 1 hour. After extraction with hexane and water, low-boiling components were removed by distillation. The resulting crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) to obtain compound 2-2 (4.3 g). The average value of n in compound 2-2 was 9. The structure of compound 2-2 was confirmed by the following NMR data.

[0312] [ka]

[0313] 1 H-NMR (400 MHz, CDCl3) δ: 4.63 (p, J = 2.8 Hz, 1H), 0.11 (d, J = 2.8Hz, 6H), 0.09 - 0.12 (m, 75H).

[0314] <Synthesis of Compound 2-3> To compound 2-2 (2.3 g), dichloromethane (20 g) and 18-bromo-1-octadecene (0.75 g) were added and stirred until homogeneous. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg) was added and stirred at 25°C for 2 hours. After distilling off low-boiling components under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain compound 2-3 (1.8 g). In compound 2-3, the average value of n was 9. The structure of compound 2-3 was confirmed by the following NMR data.

[0315] [ka]

[0316] 1 H-NMR (400 MHz, CDCl3) δ: 3.33 (t, J = 6.9 Hz, 2H), 1.78 (dt, J = 14.5, 7.0 Hz, 2H), 1.42 - 1.08 (m, 30H), 0.45 (t, J = 7.7 Hz, 2H), 0.09 - 0.12 (m, 81H).

[0317] <Synthesis of Compound 2-4> Compound 2-3 (1.8 g) was added to THF (20 g), allyl magnesium chloride solution (2.0 M in THF) (20 mL), and copper(II) chloride (0.02 g) and stirred at 50°C for 2 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were removed by distillation under reduced pressure. Compound 2-4 (1.5 g) was obtained by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane). The average value of n in compound 2-4 was 9. The structure of compound 2-4 was confirmed by the following NMR data.

[0318] [ka]

[0319] 1 H-NMR (400 MHz, CDCl3) δ: 5.74 (ddt, J = 17.0, 10.2, 6.7 Hz, 1H), 5.01 - 4.76 (m, 2H), 2.07 - 1.87 (m, 2H), 1.41 - 0.97 (m, 34H), 0.45 (dd, J = 9.5, 5.9 Hz, 2H), 0.09 - 0.12 (m, 81H).

[0320] <Synthesis of Compound 2-5> Compound 2-4 (1.5 g) was dissolved in dichloromethane (10 g). Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.60 g) were added, and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain compound 2-5 (1.6 g). In compound 2-5, the average value of n was 9. The structure of compound 2-5 was confirmed by the following NMR data.

[0321] [ka]

[0322] 1 H-NMR (400 MHz, CDCl3) δ: 3.49 (s, 9H), 1.81 - 0.97 (m, 38H), 0.65 - 0.51 (m, 2H), 0.45 (dd, J = 9.8, 5.3 Hz, 2H) , 0.09 - 0.12 (m, 81H).

[0323] [Synthesis Example 3] <Synthesis of Compound 3-1> To 18-bromo-1-octadecene (10 g), dichloromethane (10 g), 1,1,1,3,3-pentamethyldisiloxane (15 g), and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 50 mg) were added, and the mixture was stirred at 25°C for 24 hours. After removing low-boiling components by distillation under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain compound 3-1 (12 g). The structure of compound 3-1 was confirmed by the following NMR data.

[0324] [ka]

[0325] 1 H-NMR (400 MHz, CDCl3) δ: 3.41 (t, J = 6.9 Hz, 2H), 1.85 (m, 2H), 1.49 - 1.04 (m, 30H), 0.50 (t, J = 7.6 Hz, 2H), 0.25 - -0.19 (m, 15H)

[0326] <Synthesis of Compound 3-2> 18-Bromo-1-octadecene (10 g) was added with THF (40 g) and magnesium (0.9 g) and stirred at 60 °C for 2 hours. The reaction mixture was filtered to obtain compound 3-2 (50 g). The product was confirmed to have a concentration of 0.4 M by titration with 1,10-phenanthroline.

[0327] [ka]

[0328] <Synthesis of Compound 3-3> Compound 3-1 (1 g) was added to THF (10 g), compound 3-2 (0.4 M) (20 mL), and copper(II) chloride (0.05 g) and stirred at 60 °C for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were removed by distillation under reduced pressure. Compound 3-3 (0.4 g) was obtained by flash column chromatography using 10% silver nitrate silica gel (eluent: hexane / dichloromethane). The structure of compound 3-3 was confirmed by the following NMR data.

[0329] [ka]

[0330] 1 H-NMR (400 MHz, CDCl3) δ:5.81 (ddt, J = 16.9, 10.2, 6.7 Hz, 1H), 5.22 - 4.68 (m, 2H), 2.21 - 1.85 (m, 2H), 1.54 - 1.00 (m, 64H), 0.50 (t, J = 7.1 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0331] <Synthesis of Compound 3-4> To compound 3-3 (0.4 g) dissolved in dichloromethane (10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added, and the mixture was stirred at 50°C for 2 hours. The solvent was removed by distillation under reduced pressure to obtain compound 3-4 (0.5 g). The structure of compound 3-4 was confirmed by the following NMR data.

[0332] [ka]

[0333] 1H-NMR (400 MHz, CDCl3) δ:3.57 (s, 9H), 1.54 - 1.00 (m, 68H), 0.77 - 0.61 (m, 2H), 0.50 (t, J = 7.6 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0334] [Synthesis Example 4] <Synthesis of Compound 4-1> Compound 4-1 was obtained according to the method described in [Synthesis of Compound 15B] of WO 2023 / 181863.

[0335] [ka]

[0336] [Synthesis Example 5] <Synthesis of Compound 5-1> Diethyl diallyl malonate (60.0 g) was added with lithium chloride (23.7 g), water (6.45 g), and dimethyl sulfoxide (263 g) and stirred at 160°C. After cooling to 25°C, water was added and the mixture was extracted with ethyl acetate. Hexane was added to the organic layer, which was washed with saturated brine and dried over sodium sulfate. After filtration, the solvent was distilled off to obtain compound 5-1 (39.5 g). The structure of compound 5-1 was confirmed by the following NMR data.

[0337] [ka]

[0338] 1 H-NMR (400 MHz, CDCl3) δ (ddt, J=17.1, 10.1, 7.0 Hz, 2H), 5.06-4.94 (m, 4H), 4.09 (m, 2H), 2.47 (ddd, J=14.0, 8.0, 6.1 Hz, 1H), 2.33 (dt, J=14.9, 7.5 Hz, 2H), 2.22 (dt, J=14.1, 6.5 Hz, 2H), 1.21 (t, J=7.1 Hz, 3H).

[0339] <Synthesis of Compound 5-2> Diisopropylamine (29.8 mL) was added to THF (260 mL) and cooled to -78 °C. A hexane solution of n-butyllithium (2.76 M, 96.6 mL) was added and the mixture was heated to 0 °C. After stirring at 0 °C, the mixture was cooled to -78 °C to prepare a THF solution of lithium diisopropylamide (LDA). Compound 5-1 (39.5 g) was added, followed by stirring, and then allyl bromide (24.1 mL) was added. The mixture was heated to 0 °C, 1 M hydrochloric acid (100 mL) was added, and THF was evaporated under reduced pressure. Extraction with dichloromethane was performed, followed by the addition of sodium sulfate. After filtration, the solvent was evaporated, and the mixture was subjected to flash column chromatography using silica gel (eluent: ethyl acetate / hexane) to obtain compound 5-2 (45.0 g). The structure of compound 5-2 was confirmed by the following NMR data.

[0340] [ka]

[0341] 1 H-NMR (400 MHz, CDCl3) δ 5.74-5.62 (m, 3H), 5.04 (dd, J=13.6, 1.9Hz, 6H), 4.10 ( m, 2H), 2.29 (d, J=7.4 Hz, 6H), 1.22 (t, J=7.1Hz, 3H).

[0342] <Synthesis of Compound 5-3> Compound 5-2 (45.0 g, 216 mmol) was added with THF (620 mL) and cooled to 0°C. A THF solution (104 mL) of lithium aluminum hydride was added and stirred. Water and a 15% by mass aqueous solution of sodium hydroxide were added, and the mixture was stirred at 25°C and then diluted with dichloromethane. After filtration, the solvent was distilled off, and flash column chromatography using silica gel (developing solvent: ethyl acetate / hexane) was performed to obtain compound 5-3 (31.3 g). The structure of compound 5-3 was confirmed by the following NMR data.

[0343] [ka]

[0344] 1 H-NMR (400 MHz, CDCl3) δ 5.90-5.76 (m, 3H), 5.10-5.02 (m, 6H), 3.38 (s, 2H), 2.03 (dt, J=7.5, 1.2Hz, 6H), 1.45 (s, 1H).

[0345] <Synthesis of Compound 5-4> Compound 5-3 (31.3 g), triphenylphosphine (64.3 g), and carbon tetrachloride (33.9 g) were added to acetonitrile (380 mL) and stirred at 90 °C. After concentration, ethyl acetate / hexane was added and stirred. After filtration and concentration, compound 5-4 (28.2 g) was obtained by distillation (70 °C, 3 hPa). The structure of compound 5-4 was confirmed by the following NMR data.

[0346] [ka]

[0347] 1 H-NMR (400MHz, CDCl3) δ 5.83-5.67 (m, 3H), 5.16-5.01 (m, 6H), 3.32 (s, 2H), 2.05 (dt, J=7.5, 1.1Hz, 6H).

[0348] <Synthesis of Compound 5-5> THF (35 mL) and iodine (0.180 g) were added to magnesium (2.36 g, 97.2 mmol) and stirred at 25° C. A solution of compound 5-4 (14.0 g) in THF (35 mL) was added, and the mixture was heated to reflux for 2 hours to obtain a solution of compound 5-5 (0.80 M).

[0349] [ka]

[0350] <Synthesis of Compound 5-6> 1-Bromo-4-chlorobutane (2.89 g), 1-phenyl-1-propyne (0.198 g), and CuCl (0.049 g) were added and stirred at 0°C. Compound 5-5 (0.80 M, 24.0 mL) was added and stirred. 1 M hydrochloric acid was added, and the mixture was extracted with dichloromethane, followed by addition of sodium sulfate. After filtration and concentration, compound 5-6 (3.45 g) was obtained by distillation (120°C, 3 hPa). The structure of compound 5-6 was confirmed by the following NMR data.

[0351] [ka]

[0352] 1 H-NMR (400MHz, CDCl3) δ 5.76 (ddt, J=16.8, 10.4, 7.4 Hz, 3H), 5.07-4.92 (m, 6H), 3.49 (t, J=6.8Hz, 2H), 1.94 (dt, J=7.4, 1.2Hz, 6H), 1.79-1.67 (m, 2H), 1.42-1.30 (m, 2H), 1.30-1.20 (m, 2H), 1.20-1.10 (m, 2H).

[0353] <Synthesis of Compounds 5-7> THF (2.6 mL) and iodine (14.0 mg) were added to magnesium (0.168 g) and stirred at 25° C. A solution of compound 5-6 (1.41 g) in THF (2.6 mL) was added, and the mixture was heated to reflux for 2 hours to obtain a solution of compound 5-7 (0.74 M).

[0354] [ka]

[0355] <Synthesis of Compounds 5-8> Trimethylchlorogermane (3.0 g) was added to a 0.74 M THF solution (20 mL) of compound 5-7, and the mixture was stirred at 50°C for 12 hours. Hydrochloric acid and hexane were added, and the organic layer was extracted. Low-boiling components were then removed by distillation. Compound 5-8 (0.75 g) was then obtained by flash column chromatography using silica gel (eluent: hexane / dichloromethane). The structure of compound 5-8 was confirmed by the following NMR data.

[0356] [ka]

[0357] 1 H-NMR (500MHz, CDCl3) δ 5.70 (ddt, J=16.9, 11.4, 7.4 Hz, 3H), 5.27-4.83 (m, 6H), 1.84 (dt, J=7.3, 1.0Hz, 6H), 1.44-0.71 (m, 10H), 0.13 (s, 9H).

[0358] <Synthesis of Compounds 5-9> Dichloromethane (10 g), compound 5-8 (0.75 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (1.5 g) were added and stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 1.25 g of compound 5-9. The structure of compound 5-9 was confirmed by the following NMR data.

[0359] [ka]

[0360] 1 H-NMR (500 MHz, CDCl3) δ 3.58 (s, 27H), 1.48-0.79 (m, 22H), 0.68 (t, J=9.4Hz, 6H), 0.13 (s, 9H).

[0361] [Synthesis Example 6] <Synthesis of Compound 6-1> Under a nitrogen atmosphere, trifluoromethyl trifluoromethanesulfonate (3.0 mL) was added to a mixture of silver(I) fluoride (1.3 g) and acetonitrile (20 mL) at -30°C, and the mixture was stirred at -30°C for 2 hours. 18-Bromo-1-octadecene (20 g) was added to the reaction mixture at -30°C, and the mixture was stirred at 25°C for 16 hours. Hexane and ion-exchanged water were added sequentially to the reaction mixture, and the mixture was separated. The organic layer was separated. The solvent and low-boiling components were removed by distillation under reduced pressure, and the mixture was purified by flash column chromatography using silica gel (eluent: hexane / ethyl acetate) to obtain 11 g of compound 6-1. The structure of compound 6-1 was confirmed by the following NMR data.

[0362] [ka]

[0363] 1 H-NMR(400MHz, CDCl3) δ:5.79 (m, 1H), 4.95 (m, 2H), 3.96 (t, 2H), 2.06 (m, 2H), 1.68 (m, 2H), 1.42 - 1.17 (m, 26H).

[0364] <Synthesis of Compound 6-2> Dichloromethane (10 g), compound 6-1 (1.5 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 8.3 mg), aniline (2.6 mg), and trimethoxysilane (0.50 g) were added, and the mixture was stirred at 40°C for 2 hours. The solvent was then distilled off under reduced pressure to obtain compound 6-2 (2.0 g). The structure of compound 6-2 was confirmed by the following NMR data.

[0365] [ka]

[0366] 1H-NMR(400MHz, CDCl3) δ:3.95 (t, 2H), 3.7 (s, 9H), 1.68 (m, 2H), 1.51 - 1.19 (m, 30H), 0.66 (m, 2H).

[0367] [Synthesis Example 7] <Synthesis of Compound 7-1> Under a nitrogen atmosphere, methanol (26 g) was added to sodium fluoride (0.45 g), and then 2,2,4,4,6,6,8,8,10,10-undecafluoro-3,5,7,9-tetraoxadecanoyl fluoride (2.0 g) was added while stirring at 0°C, and the mixture was stirred at 25°C for 1 hour. The reaction solution was filtered and concentrated using an evaporator to obtain compound 7-1 (2.0 g). The structure of compound 7-1 was confirmed by the following NMR data.

[0368] [ka]

[0369] 1 H-NMR (400.13MHz, CDCl3, TMS) δ(ppm): 4.0 (3H). 19 F-NMR (376.46MHz, CDCl3, CFCl3) δ(ppm) : -53 (2F), -55 (2F), -56 (2F), -57 (3F), -79 (2F).

[0370] <Synthesis of Compound 7-2> Dichloromethane (20 g) was added to 2-(undec-10-en-1-yl)tridec-12-en-1-amine (2.0 g), and compound 7-1 (1.5 g) was added with stirring. The mixture was stirred at 25°C for 12 hours. The reaction solution was concentrated using an evaporator and purified by silica gel column chromatography to obtain compound 7-2 (2.1 g). The structure of compound 7-2 was confirmed by the following NMR data.

[0371] [ka]

[0372] 1 H-NMR (400.13MHz, CDCl3, TMS) δ(ppm) : 6.6 (1H), 6.0 (2H), 5.1 (4H), 3.3 (2H), 2.1 (4H), 1.5-1.1 (33H). 19 F-NMR (376.46MHz, CDCl3, CFCl3) δ(ppm) : -53 (2F), -55 (2F), -56 (2F), -57 (3F), -80 (2F).

[0373] <Synthesis of Compound 7-3> Under a nitrogen atmosphere, compound 7-2 (1.0 g) was added with dichloromethane (3.0 g), platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (0.0156 g), and aniline (0.0034 g). Trimethoxysilane (0.41 g) was then slowly added with stirring, and the mixture was stirred at 25°C for 1 hour. The reaction solution was concentrated using an evaporator to obtain compound 7-3 (1.3 g). The structure of compound 7-3 was confirmed by the following NMR data.

[0374] [ka]

[0375] 1 H-NMR (400.13MHz, CDCl3, TMS) δ(ppm): 6.6 (1H), 3.6 (18H), 3.3 (2H), 1.5-1.1 (33H). 19 F-NMR (376.46MHz, CDCl3, CFCl3) δ(ppm): -53 (2F), -55 (2F), -56 (2F), -57 (3F), -80 (2F).

[0376] [Preparation of surface treatment agent] In a polypropylene container equipped with a stirrer and a thermometer, 0.05 mass% of compound 1-2 obtained in Synthesis Example 1 was added to 99.95 mass% of AP-11 (product name "Solmix AP-11" (manufactured by Japan Alcohol Sales Co., Ltd.), a mixture of 85 mass% of ethanol, 10 mass% of isopropyl alcohol, and 5 mass% of methanol), and the mixture was stirred at 25°C for 30 minutes to obtain surface treatment agent 1. Surface treatment agents 2 to 7 were obtained in the same manner as in the preparation of surface treatment agent 1, except that compounds 2 to 7 obtained in Synthesis Examples 2 to 7 were used instead of compound 1, respectively.

[0377] [Preparation of Undercoat Layer-Forming Composition] <Preparation Example 1> TEOS (Si(OEt)4, tetraethoxysilane), pure water, a 10% by mass aqueous solution of nitric acid, and AP-11 were mixed in a glass container equipped with a stirrer and a thermometer, and the mixture was stirred for 1 hour at 60° C. In the mixture, the contents of TEOS, pure water, and the 10% by mass aqueous solution of nitric acid were 6% by mass (Si equivalent concentration), 11.3% by mass, and 0.54% by mass, respectively, relative to the total mass of the mixture, with the remainder being AP-11. Next, AP-11 was further added to the mixture to obtain a base layer-forming composition a1. In the base layer-forming composition a1, the TEOS content was 0.40 mass% in terms of Si concentration relative to the total mass of the base layer-forming composition a1, and the acid content relative to the total mass of the base layer-forming composition a1 was 4.82 × 10 mass ratio. -4 It was.

[0378] <Preparation Examples 2 to 12> Compositions a2 to a6 for forming an undercoat layer were each prepared in the same manner as in Preparation Example 1, except that the amount of 10% by mass nitric acid aqueous solution added was changed so that the content of the acid catalyst (nitric acid) relative to the total mass of the composition for forming an undercoat layer was the amount shown in the table below. As the silane compound, BTM ((EtO)3Si-CH2-Si(OEt)3, bistriethoxysilylmethane), BTE ((EtO)3Si-CH2CH2-Si(OEt)3, bistriethoxysilylethane) or MTMS (CH3-Si(OEt)3, methyltrimethoxysilane) was added to the mixture along with TEOS shown in the table below, and the amount of each silane compound added was changed so that the content of each silane compound relative to the total mass of the composition for forming the undercoat layer was the amount shown in the table below.Compositions a7 to a9 for forming the undercoat layer were each prepared in the same manner as in Preparation Example 1, except that the amount of each silane compound added was changed so that the content of each silane compound relative to the total mass of the composition for forming the undercoat layer was the amount shown in the table below. A composition for forming an undercoat layer a10 was prepared in the same manner as in Preparation Example 1, except that TMOS (Si(OCH3)4, tetramethoxysilane) was used instead of TEOS. Undercoat layer-forming compositions a11 and a12 were prepared in the same manner as in Preparation Example 1, except that ethanol (EtOH) and butyl acetate were used instead of AP-11, respectively.

[0379] [Example 1] A glass substrate (water contact angle: 5 degrees, 100 mm x 100 mm) whose surface had been cleaned by plasma treatment was used. 2 mL of the above-mentioned composition a1 for forming a base layer was applied to the surface of the glass substrate by spin coating to form a coating film. The formed coating film was then left to stand for 30 minutes in a thermo-hygrostat set at a temperature of 25°C and a relative humidity of 50%RH. Immediately after the standing period, surface treatment agent 1 was applied to the coating film by spray coating, and the film was heat-treated at 140°C for 30 minutes. At this time, the amount of surface treatment agent 1 applied relative to the surface area of ​​the glass substrate was 0.0074 mL / cm. 2 The amount of surface treatment agent 1 applied was adjusted so that the coating amount was 100%. The sample was then held for 16 hours in a thermo-hygrostat set at a temperature of 60°C and a relative humidity of 90%RH. The surface of the coating film formed by the application of surface treatment agent 1 was wiped with a paper cloth soaked in ethanol, yielding an article of Example 1 in which the substrate, primer layer, and surface treatment layer were arranged in this order. The table below shows the thickness of the undercoat layer and the thickness of the surface treatment layer for each example article.

[0380] [Example 2] The article of Example 2 was obtained in the same manner as Example 1, except that composition a2 for forming a base layer was used instead of composition a1 for forming a base layer, and the formed coating film was left to stand at 25°C for 30 minutes, and then left to stand at 850°C for 8 hours in a nitrogen atmosphere with a dew point temperature of -20°C or less.

[0381] [Example 3] An underlayer made of silicon oxide was formed on the surface of a glass substrate (water contact angle: 5 degrees or less, 100 mm x 100 mm) whose surface had been cleaned by plasma treatment, by the following method. 30 g of silicon oxide (Canon Optron) was placed as a deposition material (deposition source) in a molybdenum boat in a vacuum deposition apparatus (ULVAC VTR-350M), and a glass substrate was placed in the vacuum deposition apparatus. The vacuum deposition apparatus was heated to 5 × 10 -3 The chamber was evacuated to a pressure of 100 Pa or less. The boat carrying the silicon oxide was heated to 2,000°C, and vacuum deposition was carried out on the glass substrate to form a 10 nm thick underlayer made of silicon oxide. Next, a surface treatment layer was formed on the formed underlayer in the same manner as in Example 1, thereby obtaining an article of Example 3.

[0382] [Examples 4-7] The articles of Examples 4 and 5 were obtained in the same manner as in Example 1, except that the composition a2 for forming a base layer was used instead of the composition a1 for forming a base layer, and the standing time from the formation of the coating film of the composition a2 for forming a base layer until the application of the surface treatment agent was changed to the time shown in Table 1. The articles of Examples 6 and 7 were obtained in the same manner as in Example 1, except that the compositions a3 and a4 for forming a base layer were used instead of the composition a1 for forming a base layer.

[0383] [Examples 11-19] The articles of Examples 11 to 19 were obtained in the same manner as Example 1, except that the standing time of the coating film of the primer layer-forming composition a1 was changed to the time shown in the table below, and that surface treatment agent 2 was used instead of surface treatment agent 1. In Example 11, the coating film of the primer layer-forming composition a1 was not stood still, and surface treatment agent 2 was applied onto the coating film immediately after its formation.

[0384] [Examples 20-23 and 26-31] Articles of Examples 20 to 23 and 26 to 31 were obtained in the same manner as in Example 15, except that one of compositions a3 to 12 for forming a base layer was used instead of composition a1 for forming a base layer.

[0385] [Examples 24 and 25] The articles of Examples 24 and 25 were obtained in the same manner as in Example 15, except that when the coating film of the undercoat layer forming composition a1 was left standing, the temperature of the thermo-hygrostat was set to the temperature shown in Table 2.

[0386] [Examples 32 and 33] An article of Example 32 was obtained in the same manner as in Example 2, except that Surface Treatment Agent 2 was used instead of Surface Treatment Agent 1. An article of Example 33 was obtained in the same manner as in Example 3, except that Surface Treatment Agent 2 was used instead of Surface Treatment Agent 1.

[0387] [Examples 41-45] Articles of Examples 41 to 45 were obtained in the same manner as in Example 15, except that surface treatment agents 3 to 7 were used instead of surface treatment agent 2, respectively.

[0388] [measurement] [a value] For each example article, negative secondary ion depth profile measurement was performed using TOF-SIMS according to the above-mentioned Method A, and the a-value of the underlayer was calculated. Details of Method A have already been explained. Detailed measurement conditions for TOF-SIMS are described below. <Measuring equipment> ION-TOF "TOF.SIMS5" <Primary ions> Type: Bi5 ++ Current: 0.03 pA (current when cycle time is 100 μs) Acceleration voltage: 25kV Raster size: 200 x 200 μm 2 Resolution: 256 x 256 pixels Cycle time: 100μs · Mode: High Current Bunched Mode <Sputtered ion> · Type: C 60 ++ · Current: 0.8 nA (current when cycle time is 100 μs) · Acceleration voltage: 10 kV · Raster size: 400 × 400 μm 2 · Resolution: 256 × 256 pixels · Mode: Non interlaced Sputtering Mode

[0389] 〔F content rate〕 For the surface treatment layer of each example article, by X-ray photoelectron spectroscopy (XPS) using monochromatic AlKα rays, with the angle (detection angle) between the surface of the surface treatment layer and the detector being 45°, the area intensity of the F1s peak and the area intensity of the C1s peak were obtained. Using the obtained area intensity of the C1s peak, area intensity of the F1s peak, relative sensitivity coefficient of the C1s peak, and relative sensitivity coefficient of the F1s peak, the atomic ratio F / C of fluorine atoms to carbon atoms was calculated. The detailed analysis conditions of XPS are as follows. The atomic ratio F / C of the surface treatment layer possessed by each example article is shown in the table described later. Note that for the surface treatment layers possessed by the articles of Examples 1 to 7, Examples 11 to 33, and Examples 41 to 43, the F1s peak was not detected by XPS, and the atomic ratio F / C was 0.00.

[0390] <XPS apparatus> · Manufactured by ULVAC-PHI, Inc., "Quantera SXM" <Measurement conditions> · X-ray: Monochromatic AlKα rays · Pass Energy: 224 eV · Step Size: 0.4 eV · Detection angle: 45° Peak acquisition procedure: XPS measurement was performed under conditions where "Acquisition Lower" was set to 678.00 eV, "Acquisition Width" was set to 20.000 eV, and "No. Of Sweeps" was set to 32 to acquire the F1s peak. Subsequently, XPS measurement was performed under conditions where "Acquisition Lower" was set to 277.00 eV, "Acquisition Width" was set to 25.000 eV, and "No. Of Sweeps" was set to 6 to acquire the C1s peak. Analysis software: ULVAC-PHI "MultiPak" Background determination method: Shirley method Relative sensitivity factor of F1s peak (Corrected RSF value of MultiPak): 222.725 Relative sensitivity factor of C1s peak (Corrected RSF value of MultiPak): 69.454

[0391] [evaluation] <Initial water contact angle> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of each example article, and the initial water contact angle (°) was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The 2θ method was used to calculate the water contact angle. A larger initial water contact angle indicates better water repellency of the surface treatment layer. The measurement results of the initial water contact angle are shown in each table.

[0392] <Water contact angle after abrasion test> For the surface treatment layer of each example, a reciprocating traverse tester (manufactured by KNT Corporation) was used in accordance with JIS L0849:2013 (ISO 105-X12:2001) to measure the water contact angle (°) after a friction test in which steel wool Bonstar (count: #0000, dimensions: 5mm x 10mm x 10mm) was reciprocated 1,000 times at a load of 9.8N and a speed of 80 rpm. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle described above. Each table shows the water contact angle (°) after the friction test and the water contact angle retention rate (%). The water contact angle retention rate is the ratio (%) of the water contact angle after the friction test to the initial water contact angle of the surface treatment layer. A higher water contact angle retention rate of the surface treatment layer means that the performance degradation due to friction is smaller and the surface treatment layer has better abrasion resistance.

[0393] In each table, the "Content (% by mass)" column for "Base layer forming composition" indicates the content (% by mass) of the silane compound relative to the total mass of the base layer forming composition. Regarding the notation in the "Content (% by mass)" column for Examples 26 to 28, the value in (1) indicates the content (% by mass) of TEOS in terms of Si, and the value in (2) indicates the content (% by mass) of BTM, BTE, or MTMS in terms of Si. The "acid amount" column indicates the mass ratio of the content of the acid catalyst to the total mass of the composition for forming an undercoat layer.

[0394] [Table 1]

[0395] [Table 2]

[0396] [Table 3]

[0397] [Table 4]

[0398] [Table 5]

[0399] As shown in the table above, it was confirmed that the articles of Examples 1, 13 to 18, 21 to 22, 24 to 31, and 41 to 45 had higher water contact angle retention rates and superior abrasion resistance compared to the articles of Examples 2 to 7. [Industrial Applicability]

[0400] The article of the present invention has excellent abrasion resistance. The article of the present invention can be used, for example, as display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, nanoimprint technology, and the like. The article of the present invention can also be used as bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like for transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the article of the present invention can be used as outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. It can also be used as various indoor equipment such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. It can also be used as jigs, interior walls, piping, and the like in factories. It can also be used as goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, play equipment, and soccer balls. It can also be used as various packaging materials such as food packaging, cosmetic packaging, and the interior of pots. They can also be used as optical components in car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, anti-reflection films, and the like.

Claims

1. a substrate containing aluminum atoms; A base layer and a surface treatment layer comprising carbon atoms, the underlayer is a layer containing silicon atoms and oxygen atoms, The article has an a value of the underlayer calculated by Method A of −0.5240 to −0.5000. Method A: Time-of-flight secondary ion mass spectrometry was used to measure Bi as a primary ion. ５ ＋＋ to sputter ions C ６０ ＋＋ Using the above, depth direction measurement is performed by detecting negative secondary ions from the surface of the surface treatment layer toward the substrate. － The peak derived from AlO appears at 43 m / z － The peak derived from SiO appears at 76 m / z ３ － The peak derived from Si appears at 136 m / z ２ O ５ － The peak derived from Si appears at 196 m / z ３ O ７ － The peak derived from Si appears at 256 m / z ４ O ９ － The peak originating from Si and appearing at 316 m / z ５ O １１ － The change in the peak area of ​​each peak derived from the SiO2 is plotted to create a depth profile A. Then, the sputtering time is plotted on the horizontal axis, and the peak area of ​​each peak is plotted on the horizontal axis. ３ － The SiO of each peak obtained by dividing the peak area of ​​the derived peak by the peak area of ​​the ３ A depth profile B is created with the normalized intensity on the vertical axis. In the depth profile B, C ６０ ＋＋ After starting sputtering using the C － SiO ３ The point at which the normalized strength first becomes 0.100 or less is designated as starting point A, and the AlO － SiO ３ The point where the normalized intensity becomes 0.010 or more for the first time is set as an end point B, and the SiO ３ － The peak derived from the Si ２ O ５ － The peak derived from the Si ３ O ７ － The peak derived from the Si ４ O ９ － The peaks derived from the Si ５ O １１ － SiO ３ The average value of the normalized intensity is calculated for each. SiO ３ － , Si ２ O ５ － , Si ３ O ７ － , Si ４ O ９ － and Si ５ O １１ － [SiO ３ +n1(SiO ２ )] － The horizontal axis represents n1 when expressed by the chemical formula ３ In an orthogonal coordinate system in which the logarithm of the average value of the normalized intensity is taken as the vertical axis, n1 is 0, and the SiO ３ － SiO ３ Point 1 is plotted at a position that indicates the logarithm of the average value of the normalized intensity with the base 10, and n1 is 1 and the Si ２ O ５ － SiO ３ Point 2 is plotted at a position that indicates the logarithm of the average value of the normalized intensity with the base 10, and n1 is 2 and the Si ３ O ７ － SiO ３ Point 3 is plotted at a position that indicates the logarithm of the average value of the normalized intensity with the base 10, and n1 is 3 and the Si ４ O ９ － SiO ３ Point 4 is plotted at the position representing the logarithm of the average value of the normalized intensity with the base 10, and n1 is 4 and the Si ５ O １１ － SiO ３ Point 5 is plotted at a position that indicates the logarithm with base 10 of the average value of the normalized intensity, and an approximate line with an intercept of 0 is derived from the five points 1 to 5, and the slope of the derived approximate line is taken as the a value.

2. 2. The article according to claim 1, wherein the atomic ratio of fluorine atoms to carbon atoms on the surface of the surface treatment layer is 0.65 or less, as calculated by X-ray photoelectron spectroscopy.

3. The article according to claim 1 or 2, wherein the substrate is a glass substrate.

4. The article according to claim 1 or 2, wherein the surface treatment layer is a layer that does not contain fluorine atoms.

5. The surface treatment layer is a layer formed using a surface treatment agent containing at least one selected from the group consisting of a compound represented by the following formula (1-1), a compound represented by the following formula (1-2), and a compound represented by the following formula (2): The article according to claim 1 or 2. [T １ -Q １ -([Si(R １１ ) ２ -O] ｒ１１ -Si(R １１ ) ２ ) ｓ１１ ] ｐ１１ -A １１ -[Si(R) ｎ L ３－ｎ ] ｑ１１ (1-1) In formula (1-1), T １ are each independently a monovalent group that does not contain a reactive silyl group, Q １ each independently represents a single bond, an ethereal oxygen atom, —C(═O)—, or an alkylene group, R １１ are each independently a hydrocarbon group, Each r11 is independently a number of 0 or more, Each s11 independently represents 0 or 1; p11 is an integer of 1 or more, A １１ is a (p11+q11)-valent linking group, q11 is an integer of 1 or more, R is independently a hydrocarbon group; L each independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; Each n is independently an integer of 0 to 2. [L ３－ｎ (R) ｎ Si] ｑ１２ -A １２ -[Si(R １２ ) ２ -O] ｒ１２ -Si(R １２ ) ２ -A １２ -[Si(R) ｎ L ３－ｎ ] ｑ１２ (1-2) In formula (1-2), R １２ are each independently a hydrocarbon group, Each r12 is independently a number of 1 or more, A １２ is a (q+1)-valent linking group, Each q12 is independently an integer of 1 or more, R is independently a hydrocarbon group; L each independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; Each n is independently an integer of 0 to 2. R ｆ -R ２１ -L ２ -(R ２２ -X ２ ) ｑ２ (2) In formula (2), R ｆ is a perfluoroalkyl group, -C(X ２０ ) F ２ , -C(X ２０ ) ２ F, -SF ５ , -OCF ３ , -SCF ３ , fluorovinyl group, fluoroethynyl group, -NX ２１ X ２２ a fluorine-containing group selected from the group consisting of a monovalent cyclic hydrocarbon group containing a fluorine atom, and a monovalent heterocyclic group containing a fluorine atom; X ２０ are each independently H, Cl, Br, or I; X ２１ is a fluoroalkyl group, X ２２ is an alkyl group or a fluoroalkyl group, R ２１ is a polyoxyalkylene chain or R ｆ -L ２１ an alkylene group which may have - as a substituent, and the alkylene group has at least one -CH ２ - is an etheric oxygen atom, -C(=O)-, -N(X ２３ )-, a polyoxyfluoroalkylene chain, and an arylene group, and X ２３ is a hydrogen atom, an alkyl group, or a fluoroalkyl group, L ２１ are each independently an alkylene group, L ２ is a single bond or a (q2+1)-valent group, R ２２ each independently represents a single bond, an alkylene group, or an alkylene group having an etheric oxygen atom, X ２ are each independently a reactive group, q2 is an integer from 1 to 10, R ｆ If there are multiple R ｆ may be the same or different from each other. However, q2 is 1 and L ２ is a single bond, R ２２ is a single bond. ｆ -SF ５ If R ２１ is R ｆ does not have an arylene group at a position directly bonding to

6. The article according to claim 1 or 2, wherein the underlayer has a thickness of 1 to 100 nm.

7. 3. The article of claim 1 or 2, which is an optical article.

8. The article according to claim 1 or 2, which is a display or a touch panel.

9. a composition for forming an undercoat layer, which contains a silane compound having a silicon atom and a hydrolyzable group and an acid, is applied onto a substrate containing aluminum to form a coating film; The coating film is allowed to stand, a surface treatment agent containing a compound containing a carbon atom is applied onto the coating film that has been left standing to form an underlayer and a surface treatment layer, The coating film is allowed to stand for 10 to 60 minutes, The content of the acid contained in the composition for forming a base layer is 1.00 × 10 in terms of mass ratio with respect to the total mass of the composition for forming a base layer. －４ ~1.00 x 10 －５ A method for manufacturing an article.

10. The silane compound is represented by the following formula (1A １ ) and a compound represented by the following formula (1A ２ The method for producing an article according to claim 9, wherein the compound 1A is at least one compound selected from the group consisting of compounds having a structure represented by the formula: SiX ３１ ４ (1A １ ) -(SiH ２ () ｍ１ - (1A ２ ) Formula (1A １ ) Medium, X ３１ are each independently an alkoxy group, an isocyanato group, a halogen atom, a carboxy group, or a hydroxyl group. Formula (1A ２ In the formula (I), m1 is an integer that gives the compound a number average molecular weight of 3,000 to 100,000.

11. The silane compound is The following formula (2B １ ), a compound represented by the following formula (2B ２ ), a compound represented by the following formula (2C １ ), a compound represented by the following formula (2C ２ 11. The method for producing an article according to claim 10, further comprising at least one compound selected from the group consisting of a compound represented by formula (2D) and a compound having a structure represented by formula (2D): R ２０ SiX ３２ ３ (2B １ ) X ３３ ３ Si-(CH ２ ) ｍ３ -SiX ３３ ３ (2B ２ ) R ３０ SiX ３４ ２ R ３１ (2C １ ) R ３２ X ３５ ２ Si-(CH ２ ) ｍ３ -SiX ３５ ２ R ３３ (2C ２ ) -(SiR ４０ R ４１ -NR ４２ ) ｋ３ - (2D) Formula (2B) １ (2B) ２ Formula (2C) １ Formula (2C) ２ ), and in formula (2D), R ２０ , R ３０ , R ３１ , R ３２ , R ３３ , R ４０ and R ４１ are each independently an alkyl group, R ４２ are each independently a hydrogen atom or an alkyl group, X ３２ , X ３３ , X ３４ and X ３５ are each independently an alkoxy group, an isocyanato group, a halogen atom, a carboxy group, or a hydroxyl group, Each m3 is independently an integer of 1 or more. In formula (2D), k3 is an integer that gives the compound a number average molecular weight of 3,000 to 100,000.

12. The silane compound is selected from the group consisting of the compound 1A and the compound represented by the formula (2B １ ) and a compound represented by the formula (2B ２ and at least one compound 2B selected from the group consisting of compounds represented by The method for producing an article according to claim 11 , wherein the compound 2B has a ratio of the number of carbon atoms contained in the alkyl group or alkylene chain to the number of silicon atoms of 1 or less.

13. The method for producing an article according to claim 12, wherein a ratio of the number of carbon atoms contained in the alkyl or alkylene chain in compound 2B to the total number of silicon atoms in compound 1A and compound 2B is 0.005 to 0.

1.

14. The method for manufacturing an article according to any one of claims 9 to 13, wherein the undercoat layer-forming composition further contains an organic solvent.

15. The method for producing an article according to any one of claims 9 to 13, wherein the temperature of the coating film when left standing is 20 to 40°C.

16. The method for producing an article according to any one of claims 9 to 13, wherein the compound containing carbon atoms does not contain a fluorine atom.

17. The method for producing an article according to any one of claims 9 to 13, wherein the surface treatment agent comprises at least one selected from the group consisting of a compound represented by the following formula (1-1), a compound represented by the following formula (1-2), and a compound represented by the following formula (2): [T １ -Q １ -([Si(R １１ ) ２ -O] ｒ１１ -Si(R １１ ) ２ ) ｓ１１ ] ｐ１１ -A １１ -[Si(R) ｎ L ３－ｎ ] ｑ１１ (1-1) In formula (1-1), T １ are each independently a monovalent group that does not contain a reactive silyl group, Q １ each independently represents a single bond, an ethereal oxygen atom, —C(═O)—, or an alkylene group, R １１ are each independently a hydrocarbon group, Each r11 is independently a number of 0 or more, Each s11 independently represents 0 or 1; p11 is an integer of 1 or more, A １１ is a (p11+q11)-valent linking group, q11 is an integer of 1 or more, R is independently a hydrocarbon group; L each independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; Each n is independently an integer of 0 to 2. [L ３－ｎ (R) ｎ Si] ｑ１２ -A １２ -[Si(R １２ ) ２ -O] ｒ１２ -Si(R １２ ) ２ -A １２ -[Si(R) ｎ L ３－ｎ ] ｑ１２ (1-2) In formula (1-2), R １２ are each independently a hydrocarbon group, Each r12 is independently a number of 1 or more, A １２ is a (q+1)-valent linking group, Each q12 is independently an integer of 1 or more, R is independently a hydrocarbon group; L each independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; Each n is independently an integer of 0 to 2. R ｆ -R ２１ -L ２ -(R ２２ -X ２ ) ｑ２ (2) In formula (2), R ｆ is a perfluoroalkyl group, -C(X ２０ ) F ２ , -C(X ２０ ) ２ F, -SF ５ , -OCF ３ , -SCF ３ , fluorovinyl group, fluoroethynyl group, -NX ２１ X ２２ a fluorine-containing group selected from the group consisting of a monovalent cyclic hydrocarbon group containing a fluorine atom, and a monovalent heterocyclic group containing a fluorine atom; X ２０ are each independently H, Cl, Br, or I; X ２１ is a fluoroalkyl group, X ２２ is an alkyl group or a fluoroalkyl group, R ２１ is a polyoxyalkylene chain or R ｆ -L ２１ an alkylene group which may have - as a substituent, and the alkylene group has at least one -CH ２ - is an etheric oxygen atom, -C(=O)-, -N(X ２３ )-, a polyoxyfluoroalkylene chain, and an arylene group, and X ２３ is a hydrogen atom, an alkyl group, or a fluoroalkyl group, L ２１ are each independently an alkylene group, L ２ is a single bond or a (q2+1)-valent group, R ２２ each independently represents a single bond, an alkylene group, or an alkylene group having an etheric oxygen atom, X ２ are each independently a reactive group, q2 is an integer from 1 to 10, R ｆ If there are multiple R ｆ may be the same or different from each other. However, q2 is 1 and L ２ is a single bond, R ２２ is a single bond. ｆ -SF ５ If R ２１ is R ｆ does not have an arylene group at a position directly bonding to

18. The method for manufacturing an article according to any one of claims 9 to 13, wherein the substrate is a glass substrate.

Images