Film forming device
The film deposition apparatus addresses the issue of tablet dropping by using a mechanical fall prevention mechanism in the hearth mechanism, ensuring continuous film deposition with a simpler structure and effective plasma guidance.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-09-03
- Publication Date
- 2026-03-13
AI Technical Summary
Existing film forming apparatuses face complications in preventing tablets from dropping during continuous film formation due to the need for complex structures and control systems, which increase size and complexity.
A film deposition apparatus with a hearth mechanism that holds tablets vertically and includes a supply unit with a fall prevention mechanism that supports tablets mechanically, preventing them from falling by using a simple mechanical action.
Enables continuous film deposition with a simpler structure by preventing tablets from falling and maintaining plasma guidance, thus avoiding damage to the hearth mechanism.
Smart Images

Figure 2026046840000001_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to a film forming apparatus.
Background Art
[0002] As a film forming apparatus, as described in Patent Document 1, a film forming apparatus that forms a film material on an object by an ion plating method is known. This film forming apparatus generates plasma in a chamber using a plasma gun and sublimates the film material in the chamber. The film material adheres to the substrate and continuously accumulates, whereby a film grows and is formed on the substrate.
Prior Art Documents
Patent Documents
[0003]
Patent Document 1
Summary of the Invention
Problems to be Solved by the Invention
[0004] Here, in the above-described film forming apparatus, the tablet of the film material is supplied by pushing it up from below with a push rod against the holding portion of the main hearth. When adding a new tablet to the holding portion, it is necessary to lower the push rod. At this time, the lowermost tablet of the holding portion is in a state where it is not supported from below and drops. Therefore, in order to continuously supply the tablets and perform continuous film forming operation, a structure for preventing the tablets from dropping is required. However, when adopting a dropping prevention structure having a control system, the structure becomes complicated and the size increases.
[0005] Therefore, an object of the present invention is to provide a film forming apparatus that can prevent tablets from dropping from the hearth mechanism with a simple structure. [[ID=四十]]
Means for Solving the Problems
[0006] The film deposition apparatus according to the present invention is a film deposition apparatus for forming a film deposition material on an object by the RPD method, comprising: a hearth mechanism for holding tablets of the film deposition material and evaporating the tablets by guiding plasma; and a supply unit for supplying tablets to the hearth mechanism from below, wherein the hearth mechanism has a holding unit for holding a plurality of tablets in a vertically aligned state, and the supply unit comprises a fall prevention mechanism for preventing existing tablets in the holding unit from falling when supplying new tablets to the holding unit, wherein the fall prevention mechanism supports the tablets by mechanical action.
[0007] In the film deposition apparatus according to the present invention, the hearth mechanism has a holding section that holds a plurality of tablets arranged vertically. When the uppermost tablet in the holding section is destroyed by film deposition, the supply section supplies a new tablet to the holding section. The supply section is equipped with a fall prevention mechanism. When supplying a new tablet to the holding section, the fall prevention mechanism prevents existing tablets in the holding section from falling. Therefore, the supply section can smoothly and continuously supply new tablets while preventing existing tablets from falling. This enables continuous film deposition operation. Furthermore, the fall prevention mechanism supports the tablets by mechanical action. Therefore, the fall prevention mechanism can have a simpler structure compared to mechanisms that use control or the like. As a result, tablets can be prevented from falling from the hearth mechanism with a simple structure.
[0008] The fall prevention mechanism may maintain a state in which the tablet is always in contact with the inner surface of the holding part of the hearth mechanism. In this case, it is possible to prevent the tablet from coming out of the current path of the hearth mechanism. Therefore, it is possible to prevent the plasma that should be directed to the tablet from entering the hearth mechanism and damaging it.
[0009] The fall prevention mechanism may include an elastic member that applies pressure to the tablet. In this case, the fall can be easily prevented mechanically without the need for control systems or other means.
[0010] The fall prevention mechanism comprises a main body and a pressing part that presses against the tablet, and the pressing part may be rotatably supported by the main body via a rotating shaft. In this case, the pressing part can press against the tablet with a stable and simple operation, which is rotation around the rotating shaft.
[0011] The pressing portion may be supported by a rotating shaft at its lower end. In this case, when a tablet rises from below relative to the holding portion, the pressing portion can rotate around the rotating shaft at its lower end, being pushed aside by the tablet. This allows the supply portion to smoothly supply a new tablet to the holding portion. [Effects of the Invention]
[0012] According to the present invention, it is possible to prevent tablets from falling from the hearth mechanism with a simple structure. [Brief explanation of the drawing]
[0013] [Figure 1] This is a schematic cross-sectional view of a film deposition apparatus according to an embodiment of the present invention. [Figure 2] This is a schematic diagram illustrating the structure surrounding the main hearth 17 in the film deposition apparatus. [Figure 3] This is a schematic diagram illustrating the operation of the supply unit. [Figure 4] This is a schematic diagram illustrating the operation of the supply unit. [Figure 5] This is a perspective view of the main hearth from below. [Figure 6] This is a deployed perspective view of the fall prevention mechanism. [Modes for carrying out the invention]
[0014] A film deposition method and a film deposition apparatus according to one embodiment of the present invention will be described below with reference to the attached drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant explanations are omitted.
[0015] First, with reference to Figure 1, the configuration of the film deposition apparatus according to an embodiment of the present invention will be described. Figure 1 is a schematic cross-sectional view showing the configuration of the film deposition apparatus 1. As shown in Figure 1, the film deposition apparatus 1 of this embodiment is an RPD (Reactive Plasma Deposition) film deposition apparatus used in the RPD (Reactive Plasma Deposition) method, which is a type of so-called ion plating method. A characteristic of the RPD method is that the plasma generated at high density using a plasma gun 7 is introduced into the film deposition material Ma by a hearth mechanism 2, thereby performing both the sublimation of the material and the ionization of the sublimated material particles in the same mechanism. Because the RPD method uses high-density plasma, the ionization rate of the material particles is high, and a thinner film that is denser and has stronger adhesion to the substrate can be deposited compared to the general ion plating method. For the sake of explanation, Figure 1 shows an XYZ coordinate system. The Y-axis direction is the direction in which the central axis of the plasma gun 7 extends. The Z-axis direction is the position where the substrate and the hearth mechanism, which will be described later, face each other. The X-axis direction is the direction perpendicular to the Y-axis and Z-axis directions.
[0016] The film deposition apparatus 1 may be a so-called horizontal film deposition apparatus in which the substrate 11 (object) is placed in the chamber 10 and transported so that the thickness direction of the substrate 11 is approximately vertical. In this case, the X and Y axis directions are horizontal, and the Z axis direction is vertical and in the thickness direction. Alternatively, the film deposition apparatus 1 may be a so-called vertical film deposition apparatus in which the substrate 11 is placed in the chamber 10 and transported so that the thickness direction of the substrate 11 is horizontal (Z axis direction in Figure 1). In this case, the Z axis direction is horizontal and in the thickness direction of the substrate 11, the Y axis direction is horizontal, and the X axis direction is vertical. The film deposition apparatus according to one embodiment of the present invention will be described below using a horizontal film deposition apparatus as an example.
[0017] The film deposition apparatus 1 comprises a chamber 10 (chamber), a transport mechanism 3, and a film deposition mechanism 14.
[0018] Chamber 10 is a member for accommodating substrate 11 and performing film formation processing. Chamber 10 has a transfer chamber 10a for transferring substrate 11 on which a film of film-forming material Ma is to be formed, a film-forming chamber 10b for diffusing film-forming material Ma, and a plasma port 10c for receiving plasma P irradiated in a beam shape from plasma gun 7 into chamber 10. Transfer chamber 10a, film-forming chamber 10b, and plasma port 10c communicate with each other. Transfer chamber 10a is set along a predetermined transfer direction (arrow A in the figure) (in the Y-axis direction). Also, chamber 10 is made of a conductive material and is connected to the ground potential.
[0019] Film-forming chamber 10b has, as wall portions 10W, a pair of side walls along the transfer direction (arrow A), a pair of side walls 10h, 10i along the direction (Z-axis direction) intersecting the transfer direction (arrow A), and a bottom wall 10j arranged to intersect the X-axis direction.
[0020] Transfer mechanism 3 transfers substrate holding member 16 that holds substrate 11 in a state facing film-forming material Ma in the transfer direction (arrow A). For example, substrate holding member 16 is a frame that holds the outer peripheral edge of substrate 11. Transfer mechanism 3 is constituted by a plurality of transfer rollers 15 installed in transfer chamber 10a. Transfer rollers 15 are arranged at equal intervals along the transfer direction (arrow A) and transfer substrate holding member 16 in the transfer direction (arrow A) while supporting it. Note that for substrate 11, a plate-like member such as a glass substrate or a plastic substrate is used.
[0021] Subsequently, the configuration of film-forming mechanism 14 will be described in detail. Film-forming mechanism 14 attaches particles generated as a result of sublimation of film-forming material Ma to substrate 11 by the ion plating method. Film-forming mechanism 14 has plasma gun 7, steering coil 5, hearth mechanism 2, and ring hearth 6.
[0022] The plasma gun 7 is, for example, a pressure gradient type plasma gun, and its main body is connected to the deposition chamber 10b via a plasma port 10c provided on the side wall of the deposition chamber 10b. The plasma gun 7 generates plasma P in the chamber 10. The plasma P generated in the plasma gun 7 is emitted in a beam-like manner from the plasma port 10c into the deposition chamber 10b. As a result, plasma P is generated in the deposition chamber 10b.
[0023] The plasma gun 7 generates plasma by discharging an argon gas introduced through the cathode 60. A first intermediate electrode (grid) 61 and a second intermediate electrode (grid) 62 are concentrically arranged between the cathode 60 and the plasma port 10c. The first intermediate electrode 61 contains a ring-shaped permanent magnet 61a for focusing the plasma P. The second intermediate electrode 62 also contains an electromagnet coil 62a for focusing the plasma P. In this embodiment, the first intermediate electrode 61 is positioned closer to the cathode 60 than the second intermediate electrode 62, but the relative positions may be reversed.
[0024] The steering coil 5 is located around the plasma port 10c, to which the plasma gun 7 is mounted. The steering coil 5 guides the plasma P into the deposition chamber 10b. The steering coil 5 is energized by supplying current from a power supply (not shown) for the steering coil.
[0025] The hearth mechanism 2 holds the film deposition material Ma. The hearth mechanism 2 is located within the film deposition chamber 10b of the chamber 10 and is positioned in the negative direction of the Z-axis when viewed from the transport mechanism 3. The hearth mechanism 2 has a main hearth 17, which is either a main anode that guides the plasma P emitted from the plasma gun 7 to the film deposition material Ma or a main anode that guides the plasma P emitted from the plasma gun 7 back to itself. The configuration of the main hearth will be described later.
[0026] The ring hearth 6 is an auxiliary anode having an electromagnet for inducing plasma P. The ring hearth 6 is positioned around the holding portion 21 of the main hearth 17 that holds the film deposition material Ma. The ring hearth 6 has an annular coil 20, an annular permanent magnet portion 9, and an annular container 12, with the coil 20 and permanent magnet portion 9 housed in the container 12. In this embodiment, the permanent magnet portion 9 and coil 20 are arranged in the negative Z direction as viewed from the transport mechanism 3, but they may also be arranged in the negative Z direction, with the coil 20 and permanent magnet portion 9. The ring hearth 6 controls the direction of the plasma P incident on the film deposition material Ma or the direction of the plasma P incident on the main hearth 17 according to the magnitude of the current flowing through the coil 20.
[0027] The gas supply unit 40 supplies carrier gas and oxygen gas into the chamber 10. For example, noble gases such as argon and helium are used as the carrier gas. The gas supply unit 40 is located outside the chamber 10 and supplies the raw material gas into the chamber 10 through a gas supply port provided in the side wall of the deposition chamber 10b (for example, side wall 10h). The gas supply unit 40 supplies carrier gas and oxygen gas at flow rates based on control signals from the control unit.
[0028] The power supply 80 supplies current to the plasma gun 7. This causes the plasma gun 7 to discharge at a predetermined discharge current. The power supply 80 is connected to the plasma gun 7, which is the cathode, and the main hearth 17, which is the anode. The power supply 80 supplies current based on a control signal from the control unit 90. The control unit 90 is a device that controls the entire film deposition apparatus 1.
[0029] Next, with reference to Figure 2, the configuration of the main hearth 17 will be described in detail. In the following description, the Z-axis direction will be considered as the vertical direction, with the positive side of the Z-axis direction being the upper side and the negative side being the lower side. The main hearth 17 has the function of holding tablets TB of the film deposition material Ma and sublimating the film deposition material Ma. The main hearth 17 has a cylindrical holding portion 21 that extends in the vertical direction. Since the main hearth 17 is maintained at a positive potential relative to the ground potential of the chamber 10, the main hearth 17 can act as an electrode (anode) in the discharge and attract plasma P. A through hole 22 is formed in the holding portion 21 of the main hearth 17 into which this plasma P is injected, for filling tablets TB of the film deposition material Ma. The surface SF of the leading edge of the film deposition material Ma is exposed to the film deposition chamber 10b (see Figure 1) at one end of this through hole 17b.
[0030] As the film deposition material Ma, conductive materials such as ITO (tin oxide-doped indium oxide) and IWO (tungsten oxide-doped indium oxide) are used. When the film deposition material Ma is made of a conductive material, when plasma P is irradiated onto the main hearth 17, the plasma P is directly incident on the film deposition material Ma, the surface SF of the leading edge of the film deposition material Ma is heated and sublimated, and the film deposition material particles Mb ionized by the plasma P diffuse into the film deposition chamber 10b (see Figure 1). The film deposition material particles Mb diffused in the film deposition chamber 10b are ionized by the plasma P and move to the upper side of the film deposition chamber 10b, and adhere to the surface of the substrate 11 in the transport chamber 10a (see Figure 1). The tablets TB of the film deposition material Ma are solid objects molded into a cylindrical shape of a predetermined length, and multiple tablets TB are filled into the holding section 21 at one time. The holding section 21 holds multiple tablets TB arranged vertically. Then, in response to the sublimation of the film deposition material Ma, the tablets TB are sequentially pushed out from the bottom of the hearth mechanism 2 so that the tip of the leading tablet TB maintains a predetermined positional relationship with the upper end of the holding part 21, so that the film deposition (sublimation) rate remains constant.
[0031] The main hearth 17 has a flange portion 23 that extends outward from the holding portion 21. The flange portion 23 is located at an intermediate position in the vertical direction of the holding portion 21. The flange portion 23 has a disc shape. The holding portion 21 has a cylindrical tube portion 24 that protrudes downward from the flange portion 23 (see also Figure 5). The lower end 24a of the tube portion 24 is open to allow insertion of a new tablet TB. The lower end 23a of the flange portion 23 is provided with a fall prevention mechanism 30 to prevent the tablet TB held in the holding portion 21 from falling. The fall prevention mechanism 30 prevents the tablet TB from falling through the opening at the lower end 23a of the tube portion 24. The detailed configuration of the fall prevention mechanism 30 will be described later.
[0032] The film deposition material Ma may be an insulating material such as silicon oxide or tin oxide. When the film deposition material Ma is an insulating material, the plasma P is incident on the upper end portion 21a of the holding portion 21. As a result, the holding portion 21 is heated, which heats the film deposition material Ma and causes it to sublimate.
[0033] Next, the configuration of the supply unit 41 will be described with reference to Figures 3 and 4. The supply unit 41 is a mechanism that supplies tablets TB to the holding unit 21 of the hearth mechanism 2 from below. As shown in Figures 3 and 4, the supply unit 41 includes a replenishment unit 42, a transfer unit 43, a pressing unit 44, and a fall prevention mechanism 30.
[0034] The replenishment unit 42 is a mechanism for replenishing and storing tablets TB supplied to the hearth mechanism 2. The replenishment unit 42 is located below the holding unit 21 of the hearth mechanism 2, at a position spaced apart in the Y-axis direction. The replenishment unit 42 comprises a storage unit 46, a push-up rod 47, and a guide unit 48. The storage unit 46 is a container for storing tablets TB. The storage unit 46 has a rotatable disc-shaped turntable 46a inside. The turntable 46a rotates around a rotation axis CL1 that extends in the vertical direction. Multiple holders for holding tablets TB are provided on the outer edge of the turntable 46a. In this way, the turntable 46a stores multiple tablets TB in the storage unit 46 by holding them with these holders (see Figure 3(a)). The push-up rod 47 and the guide unit 48 are provided near the negative end of the storage unit 46 in the Y-axis direction. The push-up rod 47 pushes the tablet TB held on the turntable 46a upward (see Figure 3(b)). The guide section 48 guides the tablet TB, which has been pushed up by the push-up rod 47, to the upper part of the storage section 46 (see Figure 3(b)).
[0035] The transfer unit 43 is a mechanism for transferring tablets TB from the replenishment unit 42 to the holding unit 21 of the main hearth 17. The transfer unit 43 has a turntable 43a. The positive end of the turntable 43a in the Y-axis direction is positioned above the guide unit 48, and the negative end of the turntable 43a in the Y-axis direction is positioned below the holding unit 21. The turntable 43a rotates about the central axis CL2. A holder for holding tablets TB is provided on the outer edge of the turntable 46a. As a result, the turntable 43a receives the tablets TB coming out from the upper end of the guide unit 48 at the position of the positive end in the Y-axis direction (see Figure 3(b)). By rotating, the turntable 43a positions the tablets TB below the lower end 24a of the holding unit 21 (see Figure 4(b)).
[0036] The pushing part 44 is a component that fills the holding part 21 by pushing up the tablets TB that have been transported by the transfer part 43. The pushing part 44 is positioned below the lower end 24a of the holding part 21 and extends in the vertical direction. The pushing part 44 comprises a pushing rod 44a that extends in the vertical direction and is movable in the vertical direction, and a contact member 44b that contacts the tablets TB. The pushing rod 44a moves the contact member 44b in the vertical direction by the driving force of a drive unit (not shown). In the state before transfer by the transfer part 43 (state in Figures 3(a) and 3(b)), the contact member 44b penetrates the holder of the tablets TB and supports the lowest tablet TB of the holding part 21 from below. As the upper end of the uppermost tablet TB disappears due to evaporation, the pushing part 44 pushes up all the tablets TB from below. During transfer by the transfer unit 43 (as shown in Figures 4(a) and 4(b)), the contact member 44b moves to a position lower and further away from the turntable 43a.
[0037] The operation of the supply unit 41, configured as described above, will now be explained. As shown in Figure 3(a), first, in the replenishment unit 42, the turntable 46a rotates, positioning the tablet TB to be supplied in a location opposite the push-up rod 47. Next, as shown in Figure 3(b), the push-up rod 47 pushes up the tablet TB, and it is held by the turntable 43a of the transfer unit 43 via the guide unit 48. Next, as shown in Figure 4(a), the contact member 44b of the push-up part 44 moves downward, separating downward from the turntable 43a. At this time, the lowest tablet TB of the holding unit 21 is suspended in mid-air at its lower end 24a, but it is prevented from falling by the fall prevention mechanism 30. Next, as shown in Figure 4(b), the turntable 43a rotates, positioning a new tablet TB below the lowest tablet TB of the holding unit 21. The contact member 44b supports the new tablet TB from below. Furthermore, as the uppermost tablet TB evaporates, the contact member 44b pushes the lowermost tablet TB upward.
[0038] Next, the fall prevention mechanism 30 will be described with reference to Figures 2, 5, and 6. Figure 5 is a perspective view of the main hearth 17 from below. Figure 6 is an unfolded perspective view of the fall prevention mechanism 30. The fall prevention mechanism 30 is a mechanism that supports the tablet TB by mechanical action. Mechanical action means supporting the tablet TB solely by the supporting force exerted by the mechanical structure, without using any driving force such as electrical force or hydraulics. Therefore, the fall prevention mechanism 30 does not receive any control signals to switch between supporting and releasing the tablet TB. As shown in Figures 5 and 6, the fall prevention mechanism 30 comprises a main body 31, a pressing part 32, an elastic member 33, support members 34A and 34B, and a back member 36.
[0039] The main body portion 31 is the base member of the fall prevention mechanism 30. As shown in Figure 5, the main body portion 31 has a rectangular parallelepiped base portion 37 with its longitudinal direction in the Y-axis direction, and a projection portion 38 that protrudes from the lower surface of the base portion 37 and extends in the Y-axis direction. The upper surface of the base portion 37 is fixed to the lower end 23a of the flange portion 23 (see Figure 2). The projection portion 38 extends in the Y-axis direction from the center position in the X-axis direction on the lower surface of the base portion 37 (see also Figure 5). The projection portion 38 has a pair of support portions 39 at the negative end in the Y-axis direction for supporting the pressing portion 32. The pair of support portions 39 are support pieces that extend from the negative end in the Y-axis direction to the negative side in the Y-axis direction at the lower end side of the main body portion 31. The pair of support portions 39 are spaced apart from each other in the X-axis direction and have through holes for supporting the rotating shaft 51. The rotating shaft 51 is a cylindrical member that extends in the X-axis direction.
[0040] The pressing portion 32 is a member that presses the tablet TB. The pressing portion 32 is rotatably supported on the main body portion 31 via a rotating shaft 51. The pressing portion 32 has a base portion 52 and a contact portion 53 that contacts the tablet TB. The base portion 52 is a member that is positioned opposite the negative end of the main body portion 31 in the Y-axis direction at a position spaced apart on the negative side in the Y-axis direction. The lower end of the base portion 52 is positioned so as to be sandwiched between a pair of support portions 39. The rotating shaft 51, supported by the pair of support portions 39, is inserted into a through hole 52a near the lower end of the base portion 52. As a result, the pressing portion 32 is supported by the rotating shaft 51 at its lower end. The contact portion 53 has a curved surface 53a that curves so as to protrude toward the negative side in the Y-axis direction when viewed from the X-axis direction (as shown in Figure 2). The curved surface 53a can enter the internal space of the cylindrical portion 24 through the opening 24b formed on the side surface of the cylindrical portion 24 (see Figures 2 and 5). Furthermore, below the curved surface 53a of the contact portion 53, an inclined surface 53b is formed that slopes upward as it moves toward the negative side in the Y-axis direction. A portion of the inclined surface 53b can also enter the internal space of the cylindrical portion 24 through the opening 24b.
[0041] An elastic member 33 is positioned between the negative end of the main body 31 in the Y-axis direction and the pressing portion 32. The elastic member 33 is a spring member that expands and contracts in the Y-axis direction. The elastic member 33 is supported while being housed in the hole a of the main body 31 and the hole 32a of the pressing portion 32 (see Figure 2). With this configuration, the pressing portion 32 rotates towards the positive side in the Y-axis direction around the rotation axis 51 at the lower end due to the elastic force of the elastic member 33. The elastic member 33 applies a pressing force to the tablet TB via the pressing portion 32.
[0042] Support member 34A supports the main body 31 at a position adjacent to the main body 31 on the negative side in the X-axis direction. Support member 34B supports the main body 31 at a position adjacent to the main body 31 on the positive side in the X-axis direction. Support members 34A and 34B have a base portion 34a extending downward from the lower surface 23a of the flange portion 23, and a projection portion 34b projecting toward the main body 31 in the X-axis direction from the lower end of the base portion 34a. Support members 34A and 34B extend in the Y-axis direction along the main body 31. The upper surface of the base portion 34a of support members 34A and 34B is fixed to the flange portion 23 (see Figure 5). The projection portion 34b of support members 34A and 34B supports the vicinity of the edges on both sides in the X-axis direction of the lower surface of the base portion 37 of the main body 31.
[0043] The rear member 36 is a member that supports the main body 31 from the positive side in the Y-axis direction. The rear member 36 is fixed so as to cover the positive side in the Y-axis direction of the main body 31 and the support members 34A and 34B. The rear member 36 has an adjustment portion 36a on the negative side in the Y-axis direction. The adjustment portion 36a is the part that contacts the main body 31, and by adjusting the thickness of the adjustment portion 36a, the position of the main body 31 in the Y-axis direction can be finely adjusted.
[0044] Next, the operation of the fall prevention mechanism 30 will be described. As shown in Figure 2, when the tablet TB is filled into the cylindrical portion 24 of the holding portion 21, the curved surface 53a of the pressing portion 32 contacts the outer circumferential surface of the tablet TB near the positive end in the Y-axis direction. At this time, the pressing portion 32 applies a pressing force to the tablet TB toward the negative side in the Y-axis direction by the elastic force of the elastic member 33. As a result, the pressing portion 32 supports the tablet TB by pressing it against the inner circumferential surface 21b of the holding portion 21. In this way, the fall prevention mechanism 30 maintains a state in which the tablet TB is always in contact with the inner circumferential surface 21b of the holding portion 21 of the Haas mechanism 2.
[0045] In Figure 2, the curved surface 53a when the tablet TB is not present in the cylindrical portion 24 is shown by a dashed line. In this way, the curved surface 53a extends further inward into the internal space than the side surface of the tablet TB. When a new tablet TB is inserted from the lower end 24a of the cylindrical portion 24 in this state, the upper corner of the tablet TB comes into contact with the inclined surface 53b of the pressing portion 32. Here, the pressing portion 32 is supported by the rotation axis 51 at its lower end. Therefore, as the tablet TB moves upward, the inclined surface 53b and the curved surface 53a are pushed aside by the corner of the tablet TB as they rotate around the rotation axis 51. When the curved surface 53a overcomes the corner of the tablet TB, it presses against the outer surface of the tablet TB.
[0046] Next, the operation and effects of the film deposition apparatus 1 according to this embodiment will be described.
[0047] In the film deposition apparatus 1 according to this embodiment, the hearth mechanism 2 has a holding section 21 that holds a plurality of tablets TB arranged vertically. When the uppermost tablet TB in the holding section 21 is destroyed by film deposition, the supply section 41 supplies new tablets TB to the holding section 21. The supply section 41 is equipped with a fall prevention mechanism 30. When supplying new tablets TB to the holding section 21, the fall prevention mechanism 30 prevents existing tablets TB in the holding section 21 from falling. Therefore, the supply section 41 can smoothly and continuously supply new tablets TB while preventing existing tablets TB from falling. This enables continuous film deposition operation. Furthermore, the fall prevention mechanism 30 supports the tablets TB by mechanical action. Therefore, the fall prevention mechanism 30 can have a simpler structure compared to a mechanism using control or the like. As described above, it is possible to prevent tablets TB from falling from the hearth mechanism 2 with a simple structure.
[0048] The fall prevention mechanism 30 may maintain a state in which the tablet TB is always in contact with the inner circumferential surface 21b of the holding portion 21 of the hearth mechanism 2. In this case, it is possible to prevent the tablet TB from coming out of the current path of the hearth mechanism 2. Therefore, it is possible to prevent the plasma that should be guided to the tablet TB from being incident on the hearth mechanism 2 and damaging the hearth mechanism 2.
[0049] The fall prevention mechanism 30 may include an elastic member 33 that applies a pressing force to the tablet TB. In this case, the fall can be easily prevented mechanically without the use of control systems or the like.
[0050] The fall prevention mechanism 30 comprises a main body 31 and a pressing part 32 for pressing the tablet TB. The pressing part 32 may be rotatably supported on the main body 31 via a rotating shaft 51. In this case, the pressing part 32 can press the tablet TB with a stable and simple operation, by rotating around the rotating shaft 51.
[0051] The pressing portion 32 may be supported by the rotating shaft 51 at its lower end. In this case, when a tablet TB rises from below relative to the holding portion 21, the pressing portion 32 can rotate around the rotating shaft 51 at its lower end, being pushed aside by the tablet TB. This allows the supply portion 41 to smoothly supply a new tablet TB to the holding portion 21.
[0052] The present invention is not limited to the embodiments of the film deposition apparatus described above.
[0053] The position, size, orientation, angle, etc., of each component of the film deposition apparatus described above may be changed as appropriate without departing from the spirit of the present invention. For example, the emission direction of the plasma gun 7 does not have to be parallel to the Y axis, and may be inclined. The magnetic field generating unit does not have to include the ring hearth, plasma gun electrodes, and steering coil, and some may be omitted.
[0054] The configuration of the fall prevention mechanism 30 described above is merely an example and may be modified as appropriate. For example, in addition to a spring member, a rubber member or the like may be used as the elastic member. Also, the rotating shaft 51 that supports the pressing part 32 does not have to support the lower end of the pressing part 32, but may support the central position or the upper position in the height direction. Furthermore, the pressing part 32 may be a mechanism that reciprocates in the Y-axis direction instead of a mechanism that rotates around the rotating shaft 51. [Explanation of symbols]
[0055] 1...Film deposition apparatus, 2...Hearth mechanism, 21...Holding part, 21a...Inner circumferential surface, 30...Fall prevention mechanism, 33...Elastic member, 31...Main body part, 32...Pressing part, 41...Supply part, 51...Rotating shaft.
Claims
1. A film deposition apparatus for forming a film deposition material on an object using the RPD method, A hearth mechanism that holds the tablet of the film-forming material and evaporates the tablet by guiding plasma, The system includes a supply unit that supplies the tablet to the hearth mechanism from below, The Haas mechanism has a holding section that holds a plurality of the tablets in an orderly manner in the vertical direction. The supply unit includes a fall prevention mechanism that prevents existing tablets from falling out of the holding unit when supplying new tablets to the holding unit, The aforementioned fall prevention mechanism is a film deposition apparatus that supports the tablet by mechanical action.
2. The film deposition apparatus according to claim 1, wherein the fall prevention mechanism maintains a state in which the tablet is always in contact with the inner circumferential surface of the holding portion of the hearth mechanism.
3. The film-forming apparatus according to claim 1, wherein the fall prevention mechanism has an elastic member that applies a pressing force to the tablet.
4. The aforementioned fall prevention mechanism comprises a main body and a pressing part for pressing the tablet, The film-forming apparatus according to claim 1, wherein the pressing portion is rotatably supported on the main body via a rotating shaft.
5. The film-forming apparatus according to claim 4, wherein the pressing portion is supported on the rotating shaft at its lower end.
Citation Information
Patent Citations
Material feeding device for vacuum film formation
JP1999043763A