Metal getter in vaporizer for impurity removal

Abstract

A metal getter in a vaporizer, as well as related systems and methods, are provided. The vaporizer comprises a container having an outlet. The container is configured to discharge metal halide vapor through the outlet. The vaporizer comprises a metal getter located in the container between the inlet and the outlet. When oxygen-containing species are present in the container, the impurity content of the metal halide vapor discharged from the container is less than the impurity content of the precursor vapor discharged from a container without a metal getter.

Description

Technical Field

[0001] This disclosure relates to the use of metal getters in vaporizers for impurity removal, as well as related systems and methods.

[0002] Cross - Reference to Related Applications This application claims the benefit of 35 USC 119 to U.S. Provisional Patent Application No. 63 / 526,434, filed Jul. 12, 2023, the disclosure of which is hereby incorporated by reference in its entirety.

Background Art

[0003] The presence of impurities in precursors used for semiconductor manufacturing can cause defects and unwanted process variations. Providing precursors with impurity levels low enough remains an ongoing challenge.

[0004] Summary Some embodiments relate to vaporizers. In some embodiments, a vaporizer comprises a container having an outlet. In some embodiments, the container contains a vaporizable precursor that, when vaporized, produces a metal halide vapor. In some embodiments, the container contains an oxygen - containing species. In some embodiments, the container contains a metal getter. In some embodiments, the metal getter is configured to reduce the impurity content of the metal halide vapor exiting through the outlet of the container to less than 1 volume % of impurities relative to the total volume of the metal halide vapor.

[0005]

[0005] Several embodiments relate to methods for vaporization. In some embodiments, the method includes obtaining a vaporizer. In some embodiments, the vaporizer comprises a container having an inlet and an outlet. In some embodiments, the container contains a vaporizable precursor. In some embodiments, the container contains an oxygen-containing species. In some embodiments, the container comprises a metal getter. In some embodiments, the method includes vaporizing the vaporizable precursor to produce a metal halide vapor. In some embodiments, the metal getter is configured to reduce the impurity content of the metal halide vapor exiting through the outlet of the container to less than 1 volume percent of impurities relative to the total volume of the metal halide vapor.

[0006] Some embodiments of this disclosure are described with reference to the accompanying drawings, for illustrative purposes only. While specific references to the drawings are made below, it should be emphasized that the embodiments shown herein are illustrative and are for illustrative purposes only. In this regard, the descriptions accompanying the drawings will make it clear to those skilled in the art how such embodiments of the disclosure may be carried out. [Brief explanation of the drawing]

[0007] [Figure 1] These are schematic diagrams of cross-sectional views of a container according to several embodiments. [Figure 2] This is a schematic diagram of a cross-sectional view of a vaporizer according to several embodiments. [Figure 3] This is a flowchart of a method for vaporization according to several embodiments. [Figure 4] This is a schematic diagram of a cross-sectional view of a vaporizer according to several embodiments. [Modes for carrying out the invention]

[0008]

[0011] Of these disclosed advantages and improvements, other purposes and benefits of this disclosure will become apparent from the following description in relation to the accompanying drawings. Detailed embodiments of this disclosure are disclosed herein. However, it should be understood that the disclosed embodiments are merely illustrative examples of the disclosure, which can be embodied in various forms. In addition, each example given with respect to the various embodiments of this disclosure is intended to be illustrative and is not limited thereto.

[0009] Previous patent documents and publications referenced herein are incorporated in their entirety by reference.

[0010] Throughout the specification and claims, unless the context expressly indicates otherwise, the following terms have the meanings expressly associated herein. The phrases “in one embodiment,” “in an embodiment,” and “in some embodiments” as used herein may refer to the same embodiment, but not necessarily the same embodiment. Furthermore, the phrases “n another embodiment” and “n another embodiment” as used herein may refer to different embodiments, but not necessarily different embodiments. All embodiments of this disclosure are intended to be combinable without departing from the scope or spirit of this disclosure.

[0011] As used herein, the term “based on” is not exclusive and may refer to additional elements not explicitly stated unless the context explicitly indicates otherwise. In addition, throughout the specification, the meanings of “a,” “an,” and “the” include plural references. The meaning of “in” includes both “in” and “on.”

[0012]

[0015] Figure 1 is a schematic cross-sectional view of a vaporizer 100 according to several embodiments. The vaporizer 100 may include a container 102 having an outlet 106. The container 102 may define the internal volume 108 of the vaporizer 100. In some embodiments, the container 102 is completely enclosed. In some embodiments, the container 102 includes a lid 114 that is coupled to or detachably coupled to the container body, and the lid 114, when fitted to the container body, defines the internal volume 108 of the vaporizer 100. In some embodiments, the outlet 106 is located within the lid 114. The container 102 may contain, or be configured to contain, a vaporizable precursor that, when vaporized, produces a precursor vapor, the precursor being, for example, a metal halide vapor that can be discharged through the outlet. In some embodiments, the vaporizer 100 includes at least one tray 110 located within the internal volume 108 of the container 102. In some embodiments, at least one tray 110 is configured to contain a vaporizable precursor. At least one of the at least one tray 110 may include a base portion 116 and a side wall 118 extending upward from the outer edge of the base portion 116. At least one tray 110 may be configured to contact the inner surface of the container 102.

[0013] The metal getter 112 may be located inside the container 102. In some embodiments, the metal getter 112 is provided in fluid communication with the precursor vapor. In some embodiments, the metal getter 112 is located inside the container 102 such that at least a portion of the vaporizable precursor comes into contact with at least a portion of the metal getter 112 when vaporized. In some embodiments, the metal getter 112 is located between the vaporizable precursor and the outlet 106. In some embodiments, the metal getter 112 is located between at least one tray 110 and the outlet 106. In some embodiments, at least one tray 110 is one of a plurality of stacked trays located inside the container, and the tray is the top tray of the plurality of stacked trays. In some embodiments, at least one tray 110 may comprise a base portion and a side wall extending upward from the outer edge of the base portion. In some embodiments, the metal getter 112 comes into contact with at least a portion of the upper surface of the side wall of at least one tray 110. In some embodiments, the metal getter 112 contacts at least a portion of the surface of the base portion of at least one tray 110. In some embodiments, the metal getter 112 contacts at least a portion of the upper surface of the base portion of at least one tray 110. In some embodiments, the metal getter 112 is different from at least one tray 110.

[0014] The presence of a metal getter 112 within the internal volume of the vaporizer 100 unexpectedly improves the purity level of the precursor vapor (e.g., metal halide vapor). In some embodiments, for example, when oxygen-containing species and / or metal halide impurities are present in the container 102, the impurity content of the precursor vapor (e.g., metal halide vapor) discharged from the container 102 is lower (e.g., at least 5%, 10%, 15%, 20%, 25%, 30%, 35%, 45%, or 50% lower) than the impurity content of the metal halide vapor discharged from the same or similar container without the metal getter. Non-limiting examples of oxygen-containing species include at least one of H2O(v) (water vapor), O2, or any combination thereof. Non-limiting examples of metal halide impurities include any substance containing a halide. As used herein, impurity content may refer to a volume percentage of at least one impurity based on the total volume of the precursor vapor.

[0015] The impurity content of the precursor vapor discharged from container 102 may be less than 1 volume% (e.g., 0.000001% to 1%) of at least one impurity relative to the total volume of the precursor vapor. In some embodiments, the impurity content of the precursor vapor discharged from the container 102 is such that, relative to the total volume of the precursor vapor, at least one impurity is present in a volume of 0.000001%~1%, 0.000001%~0.8%, 0.000001%~0.6%, 0.000001%~0.5%, 0.000001%~0.4%, 0.000001%~0.2%, 0.000001%~0.1%, 0.000001%~0.08%, 0.000001%~0.06%, 0.000001%~0.05%, 0.000001%~0.04%, 0.000001%~0.02%, 0.000 0.001%~0.01%, 0.000001%~0.008%, 0.000001%~0.006%, 0.000001%~0.005%, 0.000001%~0.004%, 0.000001%~0.002%, 0.002%~1%, 0.004%~1%, 0.005%~1%, 0 It may be 0.006%~1%, 0.008%~1%, 0.01%~1%, 0.02%~1%, 0.04%~1%, 0.05%~1%, 0.06%~1%, 0.08%~1%, 0.1%~1%, 0.2%~1%, 0.4%~1%, 0.5%~1%, 0.6%~1%, or 0.8%~1%.

[0016] The metal getter can be provided in any suitable form. In some embodiments, for example, the metal getter 112 has the form of at least one of powder, a plurality of chunks, beads, or any combination thereof. In some embodiments, the metal getter has the form of at least one of sheet, foil, or any combination thereof. In some embodiments, the metal getter 112 includes a metal plate. In some embodiments, the metal getter 112 includes a metal sheet. In some embodiments, the metal getter 112 includes a metal foil. In some embodiments, the metal getter 112 includes fibrous metal. In some embodiments, the metal getter 112 includes a sintered metal disc. In some embodiments, the metal getter 112 is a tray 110. In some embodiments, the metal getter 112 does not have side walls. In some embodiments, the dimensions of the metal getter 112 (e.g., width, length, diameter, radius, etc.) are smaller than the dimensions of the container 102 (e.g., width, length, diameter, radius, etc.). It will be appreciated that the metal getter 112 may have other shapes, dimensions, and forms without departing from the scope of this disclosure.

[0017]

[0020] The thickness of the metal getter 112 may be in the range of 5 microns to 1000 microns, or any range or subdivision between 5 microns and 1000 microns. For example, in some embodiments, the thickness of the metal getter 112 may be 5 microns to 1000 microns, 5 microns to 950 microns, 5 microns to 900 microns, 5 microns to 850 microns, 5 microns to 800 microns, 5 microns to 750 microns, 5 microns to 700 microns, 5 microns to 650 microns, 5 microns to 600 microns, 5 microns to 550 microns, 5 microns to 500 microns, 5 microns to 450 microns, 5 microns to 400 microns, 5 microns to 350 microns, 5 microns to 300 microns, 5 microns to 250 microns, 5 microns to 200 microns, 5 microns to 150 microns, 5 microns to 100 microns, 5 microns to 50 microns, 5 microns to 40 microns, 5 microns to 30 microns, 5 microns to 20 microns The micron ranges from 5 to 10 microns, 50 to 1000 microns, 100 to 1000 microns, 150 to 1000 microns, 200 to 1000 microns, 250 to 1000 microns, 300 to 1000 microns, 350 to 1000 microns, 400 to 1000 microns, 450 to 1000 microns, 500 to 1000 microns, 550 to 1000 microns, 600 to 1000 microns, 650 to 1000 microns, 700 to 1000 microns, 750 to 1000 microns, 800 to 1000 microns, 850 to 1000 microns, 900 to 1000 microns, or 950 to 1000 microns.

[0018] The average particle size of the metal getter 112 can be in the range of 5 microns to 500 microns, or any range or subdivision between 5 microns and 500 microns. In some embodiments, the average particle size of the metal getter 112 is in the range of 5 microns to 450 microns, 5 microns to 400 microns, 5 microns to 350 microns, 5 microns to 300 microns, 5 microns to 250 microns, 5 microns to 200 microns, 5 microns to 150 microns, 5 microns to 100 microns, 5 microns to 50 microns, 5 microns to 500 microns, 50 microns to 500 microns, 100 microns to 500 microns, 5 microns to 500 microns, 150 microns to 500 microns, 200 microns to 500 microns, 5 microns to 500 microns, 250 microns to 500 microns, 300 microns to 500 microns, 5 microns to 500 microns, 350 microns to 500 microns, 400 microns to 500 microns, or 450 microns to 500 microns.

[0019] In some embodiments, the metal getter 112 has a first surface and a second surface opposite the first surface. In some embodiments, the metal getter 112 defines a plurality of holes extending from the first surface to the second surface. In some embodiments, the plurality of holes are arranged in a symmetrical pattern. In some embodiments, the plurality of holes are arranged in an asymmetrical pattern.

[0020] As used herein, the term “substantially pure” refers to a substance in which at least one impurity is present in an amount of less than 5% by volume (or weight) relative to the total volume (or total weight) of the substance. For example, the term “substantially pure” could refer to a substance in which at least one impurity is present in an amount of less than 5%, less than 4%, less than 3%, less than 2%, less than 1%, less than 0.1%, less than 0.01%, less than 0.001%, or less than 0.0000001% by volume (or weight) relative to the total volume (or total weight) of the substance. In some embodiments, the term “substantially pure” refers to a substance in which, if at least one impurity is present, it is not present in a detectable level. In some embodiments, the term “substantially pure” refers to a substance in which, if at least one impurity is present, it is present in a negligible level.

[0021] As used herein, the term “substantially free” refers to a substance in which at least one impurity is present in an amount of less than 5% by volume (or weight) relative to the total volume (or total weight) of the substance. For example, the term “substantially pure” could refer to a substance in which at least one impurity is present in an amount of less than 5%, less than 4%, less than 3%, less than 2%, less than 1%, less than 0.1%, less than 0.01%, less than 0.001%, or less than 0.0000001% by volume (or weight) relative to the total volume (or total weight) of the substance. In some embodiments, the term “substantially pure” refers to a substance in which, if at least one impurity is present, it is not present at a detectable level. In some embodiments, the term “substantially pure” refers to a substance in which, if at least one impurity is present, it is present at a negligible level.

[0022]

[0025] The vaporizable precursor may be a solid vaporizable precursor, or it may exist in another phase (e.g., at least one of solid, liquid, gas, or vapor), or any combination thereof. The vaporizable precursor may include a metal halide. The metal halide may include at least one of aluminum halides, hafnium halides, zirconium halides, titanium halides, silicon halides, or phosphorus halides, or any combination thereof. In some embodiments, the aluminum halide includes at least one of aluminum chloride (e.g., AlCl, AlCl3, or their hydrates), aluminum bromide (e.g., AlBr, AlBr3, Al2Br6, or their hydrates), aluminum fluoride (e.g., AlF, AlF3, or their hydrates), or aluminum iodide (e.g., AlI, AlI3, or their hydrates), or any combination thereof. In some embodiments, the hafnium halide includes at least one of hafnium(IV) chloride (HfCl4), hafnium(IV) bromide (HfBr4), hafnium(IV) iodide (HfI4), hafnium(IV) fluoride (HfF4), hafnium(III) chloride (HfCl3), hafnium(III) bromide (HfBr3), hafnium(III) iodide (HfI3), hafnium(III) fluoride (HfF3), or any combination thereof. In some embodiments, the zirconium halide includes at least one of ZrCl3, ZrCl4, their hydrates, or any combination thereof. In some embodiments, the titanium halide includes at least one of TiCl4, TiBr4, TiF4, TiI4, TiCl3, TiBr3, TiF3, TiCl2, TiBr2, TiI2, their hydrates, or any combination thereof. In some embodiments, the silicon halide includes at least one of SiCl4, SiBr4, SiF4, SiI4, their hydrates, or any combination thereof. In some embodiments, the phosphorus halide includes at least one of PF5, PCl5, PBr5, PBr7, PI5, their hydrates, or any combination thereof.

[0023] The precursor vapor may contain metal halide vapor. The metal halide vapor may contain at least one of aluminum halide, hafnium halide, zirconium halide, titanium halide, silicon halide, phosphorus halide, or any combination thereof. In some embodiments, the aluminum halide includes at least one of aluminum chloride (e.g., AlCl, AlCl3, hydrates thereof, etc.), aluminum bromide (e.g., AlBr, AlBr3, Al2Br6, hydrates thereof, etc.), aluminum fluoride (e.g., AlF, AlF3, hydrates thereof, etc.), aluminum iodide (e.g., AlI, AlI3, hydrates thereof, etc.), or any combination thereof. In some embodiments, the hafnium halide includes at least one of hafnium(IV) chloride (HfCl4), hafnium(IV) bromide (HfBr4), hafnium(IV) iodide (HfI4), hafnium(IV) fluoride (HfF4), hafnium(III) chloride (HfCl3), hafnium(III) bromide (HfBr3), hafnium(III) iodide (HfI3), hafnium(III) fluoride (HfF3), or any combination thereof. In some embodiments, the zirconium halide includes at least one of ZrCl3, ZrCl4, hydrates thereof, or any combination thereof. In some embodiments, the titanium halide includes at least one of TiCl4, TiBr4, TiF4, TiI4, TiCl3, TiBr3, TiF3, TiCl2, TiBr2, TiI2, hydrates thereof, or any combination thereof. In some embodiments, the silicon halide includes at least one of SiCl4, SiBr4, SiF4, SiI4, hydrates thereof, or any combination thereof. In some embodiments, the phosphorus halide includes at least one of PF5, PCl5, PBr5, PBr7, PI5, hydrates thereof, or any combination thereof.

[0024] The metal getter may include at least one of aluminum, aluminum alloy, hafnium, zirconium, titanium, silicon, or phosphorus, or any combination thereof. In some embodiments, the metal getter may include at least one of substantially pure aluminum, aluminum alloy, substantially pure hafnium, substantially pure zirconium, substantially pure titanium, substantially pure silicon, or substantially pure phosphorus, or any combination thereof. In some embodiments, the metal getter may further include an inert material. In some embodiments, the inert material includes carbon, silica, or any combination thereof. In some embodiments, the metal getter may substantially not include at least one of Mg, Ti, Si, Zr, Hf, Cr, Zr, or V, or any combination thereof.

[0025] In some embodiments, the aluminum material includes at least one of aluminum powder, one or more aluminum chunks, one or more aluminum beads, aluminum sheets, aluminum foil, aluminum plates, aluminum fibers, sintered aluminum discs, or any combination thereof. In some embodiments, the substantially pure aluminum material includes at least one of substantially pure Al powder, substantially pure one or more aluminum chunks, substantially pure one or more aluminum beads, substantially pure aluminum sheets, substantially pure aluminum foil, substantially pure aluminum plates, substantially pure aluminum fibers, substantially pure sintered aluminum discs, or any combination thereof. In some embodiments, the aluminum alloy material includes at least one of 443 series aluminum alloys, 444 series aluminum alloys, 1050 series aluminum alloys, 2011 series aluminum alloys, or any combination thereof. In some embodiments, the aluminum alloy material includes at least one of Fe, Ni, Cu, or any combination thereof. In some embodiments, the aluminum alloy material is substantially free of impurity-forming metals. In some embodiments, the impurity-forming metal includes at least one of Mg, Ti, Si, Zr, Hf, Cr, and Zr, or any combination thereof. In some embodiments, the metal getter is formed from a substantially pure aluminum material. In some embodiments, the metal getter is formed from a substantially pure aluminum alloy material.

[0026] In some embodiments, the hafnium material includes at least one of hafnium powder, one or more hafnium chunks, one or more hafnium beads, a hafnium sheet, a hafnium foil, a hafnium plate, hafnium fibers, a sintered hafnium disk, or any combination thereof. In some embodiments, the substantially pure hafnium material includes at least one of substantially pure hafnium powder, substantially pure one or more hafnium chunks, substantially pure one or more hafnium beads, substantially pure hafnium sheet, substantially pure hafnium foil, substantially pure hafnium plate, substantially pure hafnium fibers, substantially pure sintered hafnium disk, or any combination thereof. In some embodiments, the metal getter is formed from a substantially pure hafnium material.

[0027]

[0030] In some embodiments, the zirconium material includes at least one of zirconium powder, one or more zirconium chunks, one or more zirconium beads, a zirconium sheet, a zirconium foil, a zirconium plate, zirconium fibers, a sintered zirconium disk, or any combination thereof. In some embodiments, the substantially pure zirconium material includes at least one of substantially pure zirconium powder, substantially pure one or more zirconium chunks, substantially pure one or more zirconium beads, substantially pure zirconium sheet, substantially pure zirconium foil, substantially pure zirconium plate, substantially pure zirconium fibers, substantially pure sintered zirconium disk, or any combination thereof. In some embodiments, the metal getter does not include a substantially pure zirconium material.

[0028] In some embodiments, the titanium material includes at least one of titanium powder, one or more titanium chunks, one or more titanium beads, titanium sheets, titanium foil, titanium plates, titanium fibers, sintered titanium discs, or any combination thereof. In some embodiments, the substantially pure titanium material includes at least one of substantially pure titanium powder, substantially pure one or more titanium chunks, substantially pure one or more titanium beads, substantially pure titanium sheets, substantially pure titanium foil, substantially pure titanium plates, substantially pure titanium fibers, substantially pure sintered titanium discs, or any combination thereof. In some embodiments, the metal getter is formed from substantially pure titanium material. In some embodiments, the metal getter does not contain aluminum, vanadium, or aluminum and vanadium. In some embodiments, the metal getter is substantially aluminum-free. In some embodiments, the metal getter is substantially vanadium-free. In some embodiments, the metal getter is substantially aluminum and vanadium-free.

[0029] In some embodiments, the silicon material includes at least one of silicon powder, one or more silicon chunks, one or more silicon beads, silicon sheets, silicon foil, silicon plates, silicon fibers, sintered silicon discs, or any combination thereof. In some embodiments, the substantially pure silicon material includes at least one of substantially pure silicon powder, substantially pure one or more silicon chunks, substantially pure one or more silicon beads, substantially pure silicon sheets, substantially pure silicon foil, substantially pure silicon plates, substantially pure silicon fibers, substantially pure sintered silicon discs, or any combination thereof. In some embodiments, the metal getter is formed from the substantially pure silicon material.

[0030] In some embodiments, the phosphorus material includes at least one of phosphorus powder, one or more phosphorus chunks, one or more phosphorus beads, phosphorus sheets, phosphorus foil, phosphorus plates, phosphorus fibers, sintered phosphorus discs, or any combination thereof. In some embodiments, the substantially pure phosphorus material includes at least one of substantially pure phosphorus powder, substantially pure one or more phosphorus chunks, substantially pure one or more phosphorus beads, substantially pure phosphorus sheets, substantially pure phosphorus foil, substantially pure phosphorus plates, substantially pure phosphorus fibers, substantially pure sintered phosphorus discs, or any combination thereof. In some embodiments, the metal getter is formed from the substantially pure phosphorus material.

[0031] In some embodiments, the vaporizable precursor comprises aluminum halide, and the metal getter comprises substantially pure aluminum material. In some embodiments, the vaporizable precursor comprises at least one of AlCl, AlCl3, AlBr, AlBr3, Al2Br6, AlF, AlF3, AlI, AlI3, or any combination thereof, and the metal getter comprises substantially pure aluminum material. In some embodiments, the vaporizable precursor comprises aluminum halide, and the metal getter comprises aluminum alloy material. In some embodiments, the vaporizable precursor comprises AlCl3, and the metal getter comprises aluminum alloy material. In some embodiments, the metal halide vapor comprises aluminum halide, and the metal getter comprises substantially pure aluminum material. In some embodiments, the metal halide vapor comprises at least one of AlCl, AlCl3, AlBr, AlBr3, Al2Br6, AlF, AlF3, AlI, AlI3, or any combination thereof, and the metal getter comprises substantially pure aluminum material. In some embodiments, the metal halide vapor contains aluminum halide, and the metal getter contains an aluminum alloy material. In some embodiments, the metal halide vapor contains AlCl3, and the metal getter contains an aluminum alloy material.

[0032]

[0035] In some embodiments, the vaporizable precursor comprises a hafnium halide, and the metal getter comprises a substantially pure hafnium material. In some embodiments, the vaporizable precursor comprises at least one of HfCl4, HfBr4, HfI4, HfF4, HfCl3, HfBr3, HfI3, HfF3, or any combination thereof, and the metal getter comprises a substantially pure hafnium material. In some embodiments, the metal halide vapor comprises a hafnium halide, and the metal getter comprises a substantially pure hafnium material. In some embodiments, the metal halide vapor comprises at least one of HfCl4, HfBr4, HfI4, HfF4, HfCl3, HfBr3, HfI3, HfF3, or any combination thereof, and the metal getter comprises a substantially pure hafnium material.

[0033] In some embodiments, the vaporizable precursor comprises zirconium halide, and the metal getter comprises substantially pure zirconium material. In some embodiments, the vaporizable precursor comprises ZrCl3, ZrCl4, or any combination thereof, and the metal getter comprises substantially pure zirconium material. In some embodiments, the metal halide vapor comprises zirconium halide, and the metal getter comprises substantially pure zirconium material. In some embodiments, the metal halide vapor comprises ZrCl3, ZrCl4, or any combination thereof, and the metal getter comprises substantially pure zirconium material.

[0034] In some embodiments, the vaporizable precursor comprises titanium halide, and the metal getter comprises substantially pure titanium material. In some embodiments, the vaporizable precursor comprises at least one of TiCl4, TiBr4, TiF4, TiI4, TiCl3, TiBr3, TiF3, TiCl2, TiBr2, TiI2, or any combination thereof, and the metal getter comprises substantially pure titanium material. In some embodiments, the metal halide vapor comprises titanium halide, and the metal getter comprises substantially pure titanium material. In some embodiments, the metal halide vapor comprises at least one of TiCl4, TiBr4, TiF4, TiI4, TiCl3, TiBr3, TiF3, TiCl2, TiBr2, TiI2, or any combination thereof, and the metal getter comprises substantially pure titanium material.

[0035] In some embodiments, the vaporizable precursor comprises a silicon halide, and the metal getter comprises a substantially pure silicon material. In some embodiments, the vaporizable precursor comprises at least one of SiCl4, SiBr4, SiF4, SiI4, or any combination thereof, and the metal getter comprises a substantially pure silicon material. In some embodiments, the metal halide vapor comprises a silicon halide, and the metal getter comprises a substantially pure silicon material. In some embodiments, the metal halide vapor comprises at least one of SiCl4, SiBr4, SiF4, SiI4, or any combination thereof, and the metal getter comprises a substantially pure silicon material.

[0036] In some embodiments, the vaporizable precursor comprises a phosphorus halide, and the metal getter comprises a substantially pure phosphorus material. In some embodiments, the vaporizable precursor comprises at least one of PF5, PCl5, PBr5, PBr7, PI5, or any combination thereof, and the metal getter comprises a substantially pure phosphorus material. In some embodiments, the metal halide vapor comprises a phosphorus halide, and the metal getter comprises a substantially pure phosphorus material. In some embodiments, the metal halide vapor comprises at least one of PF5, PCl5, PBr5, PBr7, PI5, or any combination thereof, and the metal getter comprises a substantially pure phosphorus material.

[0037]

[0040] Figure 2 is a schematic cross-sectional view of a vaporizer 200 according to several embodiments. The vaporizer 200 may comprise a container 202 having an inlet 204 and an outlet 206. The container 202 may define the internal space 208 of the vaporizer 200. In some embodiments, the container 202 is completely enclosed. In some embodiments, the container 202 comprises a lid 214 coupled to or detachably coupled to the container body, the lid 214 defining the internal space 208 of the vaporizer 200 when fitted to the container body. In some embodiments, at least one of the inlet 204 and outlet 206, or any combination thereof, is located within the lid 214. The container 202 may contain, or be configured to contain, a vaporizable precursor, which, when vaporized, produces precursor vapor (e.g., metal halide vapor that can be discharged through the outlet, but is not limited to such vapor). In some embodiments, the vaporizer 200 comprises at least one tray 210 located within the internal space 208 of the container 202. In some embodiments, at least one of the trays 210 is configured to contain a vaporizable precursor. At least one of the at least one tray 210 may comprise a base portion 216 and a side wall 218 extending upward from the outer edge of the base portion 216. At least one of the trays 210 may be configured to contact the inner surface of the container 202. In some embodiments, a metal getter 212 is located between the uppermost tray of at least one of the trays 210 and the outlet 206.

[0038] Figure 3 is a flow chart of a method for vaporization according to several embodiments. As shown in Figure 3, in some embodiments, the method includes obtaining a vaporizer 302. In some embodiments, the vaporizer comprises a container having an inlet and an outlet. In some embodiments, the vaporizer comprises a metal getter located within the container. In some embodiments, the container contains a vaporizable precursor that, when vaporized, produces a metal halide vapor. In some embodiments, the container is configured to discharge the metal halide vapor through an outlet. In some embodiments, the method includes vaporizing at least a portion of the vaporizable precursor to produce a precursor vapor 304. In some embodiments, when oxygen species or metal halide impurities are present in the container, the impurity content of the precursor vapor discharged from the container is less than the impurity content of the precursor vapor discharged from a container without a metal getter.

[0039] Figure 4 is a schematic cross-sectional view of a vaporizer 400 according to several embodiments. In Figure 4, the getter 412 also functions as a tray. The vaporizer 400 may comprise a container 402 having an inlet 404 and an outlet 406. The container 402 may define the internal space 408 of the vaporizer 400. In some embodiments, the container 402 is completely enclosed. In some embodiments, the container 402 comprises a lid 414 coupled to or detachably coupled to the container body, the lid 414 defining the internal space 408 of the vaporizer 400 when fitted to the container body. In some embodiments, at least one of the inlet 404 and outlet 406, or any combination thereof, is located within the lid 414. The container 402 may contain, or be configured to contain, a vaporizable precursor, which, when vaporized, produces precursor vapor (e.g., metal halide vapor that can be discharged through the outlet, but is not limited to such vapor). In this embodiment, the vaporizer 400 includes at least one tray 410 located within the internal space 408 of the container 402. At least one tray 410 is configured to contain a vaporizable precursor. At least one tray 410 also serves as a getter. At least one of the at least one tray 410 may comprise a base portion 416 and a side wall 418 extending upward from the outer edge of the base portion 416. At least one tray 410 may be configured to contact the inner surface of the container 402. In one embodiment, the tray 410 is formed from a 443 series aluminum alloy, a 444 series aluminum alloy, a 1050 series aluminum alloy, or a 2011 series aluminum alloy so that it can function as a getter 412.

[0040] manner The following describes various aspects: It should be understood that one or more of the features described in one or more of the following aspects can be combined with one or more of the other aspects. ·Aspect 1 A vaporizer equipped with a container having an outlet, wherein the container is A vaporizable precursor that produces metal halide vapor when vaporized. Oxygen-containing species, and Metal Getter A vaporizer comprising a metal getter configured to reduce the impurity content of the metal halide vapor exiting through the outlet of the container to less than 1 volume percent of impurities relative to the total volume of the metal halide vapor. • Feature 2 The aforementioned container Container body, and A lid that is detachably attached to the container body, Equipped with, When the lid is fitted to the container body, it defines the internal volume of the container body. The outlet of the container is located inside the lid. A vaporizer as described in Embodiment 1. ·Aspect 3 A tray located inside the container Furthermore, The tray is configured to support the vaporizable precursor, The metal getter is located within the container between the tray and the outlet. The tray is different from the metal getter. A vaporizer according to embodiment 1 or 2. • Feature 4 The vaporizer according to embodiment 3, wherein the tray is one of a plurality of stacked trays located inside the container, and the tray is the uppermost tray of the plurality of stacked trays. • Phenomenon 5 The aforementioned tray Base part, and Side wall extending upward from the outer edge of the base portion Equipped with, The metal getter is located in at least a portion of the tray. A vaporizer as described in Embodiment 3. • Phenomenon 6 The vaporizer according to embodiment 5, wherein the metal getter is in contact with at least a portion of the upper surface of the side wall of the tray. • Phenomenon 7 The vaporizer according to embodiment 6, wherein the metal getter is in contact with at least a portion of the upper surface of the base portion of the tray. • Aspect 8 A vaporizer according to any one of embodiments 1 to 7, wherein the width of the metal getter is smaller than the width of the container. • 9th aspect The vaporizer according to any one of embodiments 1 to 8, wherein the metal getter is in the form of at least one of powder, chunks, or beads, or any combination thereof. ·Aspect 10 The vaporizer according to any one of embodiments 1 to 9, wherein the metal getter does not have a side wall. ·Aspect 11 The vaporizer according to any one of embodiments 1 to 10, wherein the metal getter includes a metal plate. ·Aspect 12 The vaporizer according to any one of embodiments 1 to 11, wherein the metal getter includes a metal sheet. ·Aspect 13 The vaporizer according to any one of embodiments 1 to 12, wherein the metal getter includes a metal foil. ·Aspect 14 The vaporizer according to any one of embodiments 1 to 13, wherein the metal getter includes a fibrous metal. Appearance 15 The vaporizer according to any one of embodiments 1 to 14, wherein the metal getter includes a sintered metal disc. ·Aspect 16 The metal getter has a first surface and a second surface facing the first surface, The vaporizer according to any one of embodiments 1 to 15, wherein the metal getter defines a plurality of holes extending from the first surface of the metal getter to the second surface of the metal getter. ·Aspect 17 A vaporizer according to embodiment 1, further comprising an inlet. • Aspect 18 The vaporizer according to embodiment 1, wherein the getter is a tray. ·Aspect 19 The vaporizer according to any one of embodiments 1 to 18, wherein the metal getter is formed from a substantially pure Al material, an aluminum alloy material, a substantially pure hafnium material, a substantially pure zirconium material, a substantially pure titanium material, a substantially pure silicon material, or a substantially pure phosphorus material. · Feature 20 A vaporizer according to any one of embodiments 1 to 19, wherein the metal getter is formed from a 443 series aluminum alloy, a 444 series aluminum alloy, a 1050 series aluminum alloy, or a 2011 series aluminum alloy. ·Aspect 21 The vaporizer according to any one of embodiments 1 to 20, wherein the metal getter substantially does not contain at least one of Mg, Ti, Si, Zr, Hf, Cr, Zr, V, or any combination thereof. • Feature 22 The vaporizer according to any one of embodiments 1 to 21, wherein the oxygen-containing species includes at least one of H2O and O2, or any combination thereof. ·Aspect 23 A vaporizer according to any one of embodiments 1 to 22, wherein the impurity content of the metal halide vapor is 0.000001% to 1% by volume relative to the total volume of the metal halide vapor. ·Personal Description 24 A vaporizer according to any one of embodiments 1 to 23, wherein the metal halide vapor contains AlCl3 and the metal getter contains substantially pure Al material. • Specifics 25 A vaporizer according to any one of embodiments 1 to 24, wherein the metal halide vapor contains AlCl3 and the metal getter contains an Al alloy material. · Feature 26 The vaporizer according to embodiment 25, wherein the Al alloy material includes a 443 series aluminum alloy, a 444 series aluminum alloy, a 1050 series aluminum alloy, or a 2011 series aluminum alloy. · Feature 27 The vaporizer according to embodiment 25, wherein the Al alloy material substantially does not contain impurity-forming metals. • Feature 28 The vaporizer according to embodiment 27, wherein the impurity-forming metal includes at least one of Mg, Ti, Si, Zr, Hf, Cr, and Zr, or a combination thereof. · Feature 29 The vaporizer according to embodiment 25, wherein the Al alloy material includes at least one of Fe, Ni, and Cu, or any combination thereof. ·Aspect 30 A vaporizer according to any one of embodiments 1 to 29, wherein the metal halide vapor contains HfCl4 and the metal getter contains a substantially pure Hf material. ·Aspect 31 A vaporizer according to any one of embodiments 1 to 30, wherein the metal halide vapor contains ZrCl4 and the metal getter contains a substantially pure Zr material. ·Aspect 32 A vaporizer according to any one of embodiments 1 to 31, wherein the metal halide vapor contains TiCl4 and the metal getter contains a substantially pure Ti material. ·Aspect 33 A vaporizer according to any one of embodiments 1 to 32, wherein the metal getter does not contain Al, V, or Al and V. ·Aspect 34 A vaporizer according to any one of embodiments 1 to 33, wherein the metal halide vapor contains SiCl4 and the metal getter contains a substantially pure Si material. ·Aspect 35 The vaporizer according to any one of embodiments 1 to 34, wherein the metal getter further comprises an inert material. ·Aspect 36 The vaporizer according to embodiment 35, wherein the inert material comprises carbon, silica, or any combination thereof.

[0041] It should be understood that details, particularly with respect to the constituent materials used, as well as the shape, size, and arrangement of the components, can be modified without departing from the scope of this disclosure. This specification and the embodiments described herein are illustrative, and the true scope and spirit of this disclosure are shown by the following claims.

Claims

1. A vaporizer equipped with a container having an outlet, wherein the container is A vaporizable precursor that produces metal halide vapor when vaporized. Oxygen-containing species, and Metal Getter A vaporizer comprising a metal getter configured to reduce the impurity content of the metal halide vapor discharged through the outlet of the container to less than 1 volume percent of impurities relative to the total volume of the metal halide vapor.

2. The aforementioned container Container body, and A lid that is detachably attached to the container body, Equipped with, When the lid is fitted to the container body, it defines the internal volume of the container body. The outlet of the container is located inside the lid. The vaporizer according to claim 1.

3. A tray located inside the container Furthermore, The tray is configured to support the vaporizable precursor, The metal getter is located within the container between the tray and the outlet. The tray is different from the metal getter. The vaporizer according to claim 1.

4. The vaporizer according to claim 3, wherein the tray is one of a plurality of stacked trays located inside the container, and the tray is the uppermost tray of the plurality of stacked trays.

5. The aforementioned tray Base part, and Side wall extending upward from the outer edge of the base portion Equipped with, The metal getter is located in at least a portion of the tray. The vaporizer according to claim 3.

6. The vaporizer according to claim 5, wherein the metal getter is in contact with at least a portion of the upper surface of the side wall of the tray.

7. The vaporizer according to claim 6, wherein the metal getter contacts at least a portion of the upper surface of the base portion of the tray.

8. The vaporizer according to claim 1, wherein the width of the metal getter is smaller than the width of the container.

9. The vaporizer according to claim 1, wherein the metal getter is in the form of at least one of powder, chunks, or beads, or any combination thereof.

10. The vaporizer according to claim 1, wherein the metal getter does not have a side wall.

11. The vaporizer according to claim 1, wherein the metal getter includes a metal plate.

12. The vaporizer according to claim 1, wherein the metal getter includes a metal sheet.

13. The vaporizer according to claim 1, wherein the metal getter includes a metal foil.

14. The vaporizer according to claim 1, wherein the metal getter includes a fibrous metal.

15. The vaporizer according to claim 1, wherein the metal getter includes a sintered metal disc.

16. The metal getter has a first surface and a second surface facing the first surface, The vaporizer according to claim 1, wherein the metal getter defines a plurality of holes extending from the first surface of the metal getter to the second surface of the metal getter.

17. The vaporizer according to claim 1, further comprising an inlet.

18. The vaporizer according to claim 1, wherein the getter is a tray.

19. The vaporizer according to claim 1, wherein the metal getter is formed from substantially pure Al material, aluminum alloy material, substantially pure hafnium material, substantially pure zirconium material, substantially pure titanium material, substantially pure silicon material, or substantially pure phosphorus material.

20. The vaporizer according to claim 1, wherein the metal getter is formed from a 443 series aluminum alloy, a 444 series aluminum alloy, a 1050 series aluminum alloy, or a 2011 series aluminum alloy.

21. The vaporizer according to claim 1, wherein the metal getter substantially does not contain at least one of Mg, Ti, Si, Zr, Hf, Cr, Zr, V, or any combination thereof.

22. The oxygen-containing species is H ２ O, O ２ The vaporizer according to claim 1, comprising at least one of these, or any combination thereof.

23. The vaporizer according to claim 1, wherein the impurity content of the metal halide vapor is 0.000001% to 1% by volume relative to the total volume of the metal halide vapor.

24. The aforementioned metal halide vapor is AlCl ３ The vaporizer according to claim 1, wherein the metal getter comprises a substantially pure Al material.

25. The aforementioned metal halide vapor is AlCl ３ The vaporizer according to claim 1, wherein the metal getter comprises an Al alloy material.

26. The vaporizer according to claim 25, wherein the Al alloy material includes a 443 series aluminum alloy, a 444 series aluminum alloy, a 1050 series aluminum alloy, or a 2011 series aluminum alloy.

27. The vaporizer according to claim 25, wherein the Al alloy material substantially does not contain impurity-forming metals.

28. The vaporizer according to claim 27, wherein the impurity-forming metal includes at least one of Mg, Ti, Si, Zr, Hf, Cr, and Zr, or a combination thereof.

29. The vaporizer according to claim 25, wherein the Al alloy material includes at least one of Fe, Ni, and Cu, or any combination thereof.

30. The aforementioned metal halide vapor is HfCl ４ The vaporizer according to claim 1, wherein the metal getter comprises a substantially pure Hf material.

31. The metal halogen vapor is ZrCl ４ The vaporizer according to claim 1, wherein the metal getter comprises substantially pure Zr material.

32. The aforementioned metal halide vapor is TiCl ４ The vaporizer according to claim 1, wherein the metal getter comprises substantially pure Ti material.

33. The vaporizer according to claim 1, wherein the metal getter does not contain Al, V, or Al and V.

34. The metal halide vapor is SiCl ４ The vaporizer according to claim 1, wherein the metal getter comprises a substantially pure Si material.

35. The vaporizer according to claim 1, wherein the metal getter further comprises an inert material.

36. The vaporizer according to claim 35, wherein the inert material comprises carbon, silica, or any combination thereof.

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