A collection device for reaction by-products in semiconductor processing that improves collection space efficiency

Abstract

To provide an apparatus for collecting reaction by-products for a semiconductor manufacturing process with improved collection space efficiency.SOLUTION: According to the present invention, there is provided an apparatus for collecting by-products for a semiconductor manufacturing process with improved collection space efficiency. The apparatus includes an internal collection tower that has a multi-stage structure including an upper-end collection part, an intermediate collection part, and a lower-end collection part and collects the reaction by-products while changing a flow path direction of introduced exhaust gas, by maximally using a limited space in a housing, such that the by-products are mainly collected by the intermediate collection part including outer peripheral vertical blade plates at an outer periphery having an open structure to allow gas to smooth flow between an inner wall and an inner region of the housing, inner vertical blade plates having a lower height than the outer peripheral vertical blade plates, and a bottom plates, and then the by-products are accumulated in an internal space of the apparatus.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a reaction by-product collection device for a semiconductor process with improved collection space efficiency, and more particularly, to a collection device having an internal collection tower with a structure capable of storing reaction by-products collected in an inner space and an exhaust gas guide flow, so that reaction by-products contained in exhaust gas components discharged from a process chamber due to various changes in semiconductor manufacturing processes can be collected more efficiently within a limited collection space, thereby increasing the usage cycle. [Background technology]

[0002] Generally, semiconductor manufacturing processes consist of a fabrication process and an assembly process. The fabrication process is a process in which a thin film is deposited on a wafer in various process chambers, and the deposited thin film is selectively etched repeatedly to process a specific pattern to manufacture a semiconductor chip, while the assembly process is a process in which the chips manufactured in the fabrication process are separated into individual chips and then combined with lead frames to assemble them into a finished product.

[0003] At this time, the process of depositing a thin film on the wafer or etching the thin film deposited on the wafer is performed at high temperature by injecting precursor and reactive gases such as silane, arsine, boron chloride, and hydrogen into the process chamber through a gas injection system. During the process, various flammable gases, corrosive foreign matter, and harmful gases containing toxic components are generated in large quantities inside the process chamber.

[0004] In order to purify and release such harmful gases, a scrubber is installed downstream of the vacuum pump that creates a vacuum in the semiconductor manufacturing process chamber, which purifies the exhaust gas discharged from the process chamber and then releases it into the atmosphere.

[0005] However, because scrubbers mainly purify only gaseous reaction by-products, if the reaction by-products are discharged outside the process chamber and solidified, they may adhere to the exhaust line, causing an increase in exhaust pressure, leading to pump failure due to inflow into the vacuum pump, and wafer contamination due to the backflow of harmful gases into the process chamber.

[0006] Therefore, most semiconductor manufacturing equipment is provided with a reaction by-product collection device between the process chamber and the vacuum pump, which condenses the exhaust gas and collects it in the form of powder or solid.

[0007] Meanwhile, the reaction by-product collector is generally installed in a clean room in which a process chamber is installed if its capacity is small, and in a lower layer in which a pump is installed if its capacity is large, or in a separate layer between the upper layer in which the clean room is located and the lower layer in which the pump is located, to install the collector.

[0008] The reason for separating the installation is that the size of the collection device varies depending on the capacity, and so it may be installed separately due to the practical installation space problem within the factory. However, in the case of semiconductor production facilities that generate relatively small amounts of exhaust gas, a collection device with a small capacity, for example, a capacity capable of collecting about 10 to 20 kg of reaction by-products, is installed due to the size of the clean room and the problem of process interruption or contamination during maintenance.

[0009] Therefore, in the case of a collector having a small capacity, it is necessary to have a heater structure in which the inflowing exhaust gas does not condense at the inlet, and a structure in which the exhaust gas heated by the heater and flowing into the inside is retained in the internal collector for as long as possible to capture reaction by-products with high efficiency, and a structure in which the outflow of the captured reaction by-products through the exhaust port is minimized and only the gaseous exhaust gas from which the reaction by-products have been removed is discharged through the exhaust port.

[0010] For this reason, among conventional collection devices, collection devices with relatively small collection capacities have a small physical size, so in order to maximize collection efficiency, they usually have a structure in which a number of rectangular collection plates that constitute the internal collection tower are crossed in multiple layers to create a lattice structure, and each collection plate has a complex flow path through which exhaust gas flows via hole structures formed on the surface of the collection plate or spaces between adjacent collection plates, thereby increasing the time the exhaust gas remains inside and causing it to condense on the surface of the collection plate.

[0011] However, a collection device having an internal collection tower consisting of a lattice structure in which dense square-plane collection plates are intersected and a complex flow path structure provided by gas holes formed in the planar collection plate, rather has structural problems in that the effective collection space of the collection device cannot be efficiently utilized due to the internal collection tower structure for such a purpose, and the collection reaction occurs intensively on the outer collection plate or inner collection plate of the internal collection tower along the mainstream of the exhaust gas, causing the flow of exhaust gas to stagnate and making it difficult to supply exhaust gas smoothly, and the remaining unused collection space or collection plate cannot be efficiently utilized, which may reduce the collection efficiency. [Prior art documents] [Patent documents]

[0012] [Patent Document 1] Korean Patent Publication No. 10-1806480 (December 1, 2017) [Patent Document 2] Korean Patent Publication No. 10-0717837 (May 7, 2007) [Patent Document 3] Korean Patent Registration No. 10-0862684 (October 2, 2008) [Patent Document 4] Korean Patent Publication No. 10-1447629 (September 29, 2014) Summary of the Invention [Problem to be solved by the invention]

[0013] The present invention has been made to solve these problems, and its purpose is to provide a reaction by-product collection device in which exhaust gas flowing into the inside of the collection device is heated by a heater, and then guided downward through the peripheral part, and the flow of exhaust gas is guided through an internal collection tower consisting of an upper collection part, an intermediate collection part, and a lower collection part, thereby providing a multi-stage collection function, and the main reaction by-products are piled up in the inner space of the intermediate collection part, which has a gas flow structure with an inner wall of the housing and an open inner area, thereby increasing the efficiency of the collection space.

[0014] Another object of the present invention is to provide a reaction by-product collecting device that has a rectangular horizontal collecting plate having different areas and different sizes, shapes and arrangements of gas holes in each of the upper collecting section, the intermediate collecting section and the lower collecting section constituting the internal collecting tower, and that allows the trapped reaction by-products to pile up while continuously inducing the upper and lower flows of exhaust gas, thereby minimizing the exhaust gas in the upper part being directly discharged through the lower outlet or the trapped reaction by-products being easily piled up at the lower part and outflowing, thereby improving the collection space efficiency. [Means for solving the problem]

[0015] The present invention, which achieves the above-mentioned objects and solves the problems of the related art, provides a reaction by-product collection device for semiconductor processes, which is installed on an exhaust line between a process chamber and a vacuum pump, and causes exhaust gas discharged from the process chamber to flow into a housing, where it is heated by a heater and distributed, and reaction by-products are collected in an internal collection tower. The device is configured in multiple stages with an upper collection unit, an intermediate collection unit, and a lower collection unit, and collects reaction by-products while changing the flow direction of the exhaust gas flowing in by making maximum use of the limited space in the housing. The main collection is performed in the intermediate collection unit, which includes an outer vertical blade plate of an outer shell having an open structure to facilitate smooth gas flow between the inner wall of the housing and the inner region, an inner vertical blade plate having a lower height than the outer vertical blade plate, and a bottom plate, and the intermediate collection unit includes an internal collection tower formed to be stacked in the inner space of the intermediate collection unit. This is achieved by providing a reaction by-product collection device for semiconductor processes, which has improved collection space efficiency, characterized in that the device includes an upper collection unit, an intermediate collection unit, and a bottom plate, which have an open structure to facilitate smooth gas flow between the inner wall of the housing and the inner region, and an internal collection tower formed to be stacked in the inner space of the intermediate collection unit.

[0016] In a preferred embodiment, the upper collector includes a first horizontal collecting plate having a rectangular shape, in which a main gas hole and a plurality of auxiliary gas holes are formed around the main gas hole, and which guides the flow of exhaust gas descending from the heater toward the center and collects reaction by-products; a plurality of triangular collection plates arranged radially along the outer periphery of the upper surface of the first horizontal collection plate to collect reaction by-products; a folded-type collection plate that protrudes higher than the triangular collection plate at each of the four edges of the upper surface of the first horizontal collection plate, has an open structure so as not to obstruct the inflow of exhaust gas, and collects reaction by-products; The first horizontal collection plate may include a fastening rod protruding downward at each apex of the bottom surface of the first horizontal collection plate and fastened to the inner collection tower support base.

[0017] In a preferred embodiment, the bent type collection plate may include a pair of supports formed on the outer periphery of the upper surface of the first horizontal collection plate, and a connector connecting the upper ends of the supports to each other.

[0018] In a preferred embodiment, the triangular collection plate is configured as a right triangle with a vertical surface located toward the center, and the triangular collection plate can be positioned above a plurality of auxiliary holes arranged along the outer periphery and fastened to intersect with the vertical plate piece.

[0019] In a preferred embodiment, the intermediate collection section is a rectangular second horizontal collection plate having a main gas hole in the center of the surface and a plurality of auxiliary gas holes uniformly arranged in a square on the remaining entire surface, which guides the flow of exhaust gas and collects reaction by-products; a plurality of outer vertical blade plates arranged along the outer edge of the upper surface of the second horizontal collection plate, for collecting reaction by-products under an open installation structure so as not to block the flow of exhaust gas between the inner wall of the housing and the inner region; a plurality of inner vertical blade plates protruding from an inner region of an upper surface of the second horizontal collection plate at a height lower than that of the outer vertical blade plate to collect reaction by-products; a bottom plate that protrudes in a lattice shape from an inner region of an upper surface of the second horizontal collection plate at a height lower than that of the inner vertical blade plate to collect reaction by-products; inclined plates that cross horizontally between the outer vertical blade plates and are installed in multiple stages above and below to generate vortexes and collect reaction by-products; and a separation plate that protrudes downward from the bottom surface of the second horizontal collection plate, is supported by the lower collection unit, and is spaced at a certain distance to collect reaction by-products.

[0020] In a preferred embodiment, the outer vertical blade plate is formed in a shape narrower at the top than at the bottom, and has a right-angled triangular shape with a vertical outer side toward the inner wall of the housing, but can be arranged such that no surface is located toward the center and the surface is located toward the side so as to have an open structure between the inner wall of the housing and the inner region of the intermediate collection section.

[0021] In a preferred embodiment, the inner vertical blade plate is configured to have a cross-shaped cross section, and may be distributed such that the installation density decreases from the center of the second horizontal collection plate toward the peripheral outer vertical blade plate.

[0022] In a preferred embodiment, the separation plate is installed on the bottom surface of the second horizontal collection plate and protrudes in an “L”-shaped cross section so as to enclose from the inside the four fastening holes formed near the apexes, thereby supporting and spacing the intermediate collection unit from the lower collection unit, and can be configured to collect reaction by-products from the exhaust gas discharged through the fastening holes.

[0023] In a preferred embodiment, the lower collection section includes a rectangular third horizontal collection plate having a plurality of gas holes formed along an outer periphery thereof, which guides exhaust gas descending from an upper portion to the outer periphery and collects reaction by-products; A rectangular collection plate that is radially arranged on the upper surface of the third horizontal collection plate and has a plurality of gas holes formed on the surface to guide the exhaust gas to spread evenly and to collect reaction by-products while maximizing the exhaust gas contact surface; It is formed on the bottom surface of the third horizontal collection plate, and a large number of gas holes are formed on the surface to guide the exhaust gas to spread evenly, while collecting reaction by-products, and finally, it can be composed of a double-structure square frame collection plate consisting of a square frame-shaped outer collection plate and an inner collection plate to minimize the outflow through the exhaust port.

[0024] In a preferred embodiment, the housing has a storage groove formed around the gas exhaust port on the upper surface of the lower plate, the storage groove being lower than an upper end of the gas exhaust port and configured to store reaction by-products; A plurality of internal collection tower support bases are formed on the lower plate, and the lower and upper rods are stepped. The upper collection section, intermediate collection section, and lower collection section that constitute the internal collection tower can be spaced apart vertically to form a multi-stage configuration.

[0025] In a preferred embodiment, the heater includes a heater cap that is installed to communicate with a gas inlet formed in an upper plate of the housing and supplies the gas that has flowed in to the lower heater body; A heater body that heats exhaust gas descending from an upper portion and distributes the heat in a lateral direction through radially arranged heat dissipation fins; The heater body supplies the exhaust gas distributed by the heater body to the inner wall of the outer housing and guides it downward, and a rectangular heater plate has multiple gas holes formed on the periphery to guide the exhaust gas to the inner wall of the outer housing. Effect of the Invention

[0026] In the reaction by-product collection device according to the present invention having the above-mentioned features, exhaust gas flowing into the housing of the collection device through the inlet is guided to the lower heater through a heater cap so that it does not disperse to the surroundings in an unheated or condensed state. After the heated exhaust gas is distributed to the surroundings, it descends and passes through the internal collection tower consisting of the upper collection section, intermediate collection section, and lower collection section, and due to the smooth change of exhaust gas flow path and collection structure, collection reactions occur in multiple stages. In particular, the main collection of reaction by-products is piled up in the inner space of the intermediate collection section, which has a gas flow structure with an open inner wall and inner area of ​​the housing, and the exhaust gas that has passed through this is collected and reacted again in the lower collection section, and only the exhaust gas from which the reaction by-products have been removed is collected and reacted in the lower collection section. By configuring the reaction by-products to be discharged through an outlet, the conventional low-capacity reaction by-product collection device has a complex assembly structure of an internal collection tower in which a plurality of square planar collection plates are crossed to form a lattice structure to increase the collection area, and a gas hole structure formed in the planar plate, which causes exhaust gas stagnation and local collection reactions, causing reaction by-products to adhere to the periphery or pile up, narrowing or clogging the flow path, resulting in a rapid decrease in collection efficiency, and requiring replacement or cleaning even if there is sufficient effective collection space. This has the effect of preventing structural problems at the source, and making the most of the effective collection space in the collection device to provide a uniform collection reaction.

[0027] In addition, the present invention has an effect of minimizing the possibility of exhaust gas from the upper portion being directly discharged from the lower outlet or the possibility of the trapped reaction by-products being easily outflowed due to the accumulation of the trapped reaction by-products at the lower portion by providing horizontal collection plates having different areas and different sizes, shapes and arrangements of gas holes in each of the upper, intermediate and lower collection sections constituting the internal collection tower, thereby allowing the trapped reaction by-products to pile up while continuously inducing the upper and lower flows of the exhaust gas.

[0028] In addition, the present invention has an advantage that the lower collection section that constitutes the internal collection tower is located as close as possible to the lower plate of the housing, a storage groove section in which reaction by-products are piled up is formed in the lower plate, and exhaust gas flows from the outer periphery of the lower part of the lower collection section to the center, eliminating the need to protrude high into the inside of the housing in order to minimize easy outflow from the gas exhaust port. Therefore, the collection space of the intermediate collection section and the lower collection section is not reduced, and sufficient collection space can be secured.

[0029] As a result, the present invention is a useful invention that has the effect of increasing the usage cycle and increasing the efficiency of the semiconductor manufacturing process by collecting a large amount of reaction by-products contained in the exhaust gas for a long period of time by making maximum use of the limited collection space, even though the collection device is capable of processing a relatively small volume of reaction by-products. It is an invention that is expected to have great industrial application. [Brief description of the drawings]

[0030] [Figure 1] FIG. 2 is an exploded perspective view of a reaction by-product collection device according to one embodiment of the present invention. [Diagram 2] 1 is a cross-sectional view of a reaction by-product collection device according to an embodiment of the present invention; [Diagram 3] FIG. 2 is a perspective view showing an internal capture tower according to one embodiment of the present invention. [Figure 4] FIG. 2 is a bottom perspective view of an internal capture tower according to one embodiment of the present invention. [Diagram 5]FIG. 2 is an exemplary view showing an upper collector section of an internal collector according to an embodiment of the present invention. [Figure 6] FIG. 2 is an exemplary view showing an intermediate collection section of an internal collection tower according to an embodiment of the present invention. [Figure 7] FIG. 2 is an exemplary view showing a lower collector of an internal collector according to an embodiment of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0031] The configuration and operation of the embodiment of the present invention will be described in detail below with reference to the accompanying drawings. Note that, in describing the present invention, if it is determined that a detailed description of related publicly known functions or configurations may unnecessarily obscure the gist of the present invention, the detailed description will be omitted.

[0032] FIG. 1 is an exploded perspective view of a reaction by-product collection device according to one embodiment of the present invention, FIG. 2 is an exemplary cross-sectional view of a reaction by-product collection device according to one embodiment of the present invention, FIG. 3 is a perspective view showing an internal collection tower according to one embodiment of the present invention, FIG. 4 is a bottom side perspective view of an internal collection tower according to one embodiment of the present invention, FIG. 5 is an exemplary view showing an upper collection section of an internal collection tower according to one embodiment of the present invention, FIG. 6 is an exemplary view showing an intermediate collection section of an internal collection tower according to one embodiment of the present invention, and FIG. 7 is an exemplary view showing a lower collection section of an internal collection tower according to one embodiment of the present invention.

[0033] As shown in the figure, the collection device according to the present invention is a reaction by-product collection device for semiconductor processing, which is installed on an exhaust line between a process chamber and a vacuum pump and collects reaction by-products in exhaust gas discharged from the process chamber. It is composed of a housing 1 that receives and then discharges the inflowing exhaust gas, a heater 2 that distributes the inflowing exhaust gas to the outside so as to provide collection temperature conditions within the housing while preventing the inflowing exhaust gas from condensing at the inlet, and an inner collection tower 3 that is stacked in the inner space of the intermediate collection section 32, which is composed of an upper collection section 31, an intermediate collection section 32, and a lower collection section 33, and collects reaction by-products while changing the flow direction of the inflowing exhaust gas by making maximum use of the limited space within the housing. The main collection is performed in the intermediate collection section 32, which is composed of collection plates with an open structure to ensure smooth gas flow between the inner wall of the housing 1 and the inner area, and then the inner collection tower 3 is formed to be stacked in the inner space.

[0034] The collector collects solid-phase reaction products contained in exhaust gas discharged from a process chamber for manufacturing semiconductors under the following mechanism and temperature conditions.

[0035] TiCl 4(g) +nNH 3(g) →NH4Cl (s) +HCl (g) +TiCl4·nNH3

[0036] The reaction conditions under which the reaction by-products are collected by the above mechanism are such that the growth of the reaction by-products is reduced in a temperature range of the exhaust gas flowing into the collection device higher than 120°C, and therefore solid-phase reaction by-products are collected under temperature conditions that provide a region in the housing where the temperature is 120°C or lower.

[0037] In one embodiment, the collector is a small-capacity collector having a reaction by-product processing capacity of about 15 kg, and may be configured by being installed between the process chamber and the vacuum pump, although the present invention is not limited to such a processing capacity value.

[0038] A collection device having such a small reaction by-product processing capacity is usually installed in a clean room in which a process chamber for producing semiconductors using wafers is installed. Therefore, unlike a collection device installed on a layer below the layer in which the clean room is located, it is not possible to provide a large reaction by-product processing capacity and an environment for free replacement or repair. Therefore, in order to increase the usage cycle, the present invention is configured with a collection device having an internal collection tower structure that can make maximum use of the collection space described below.

[0039] The collection device according to the present invention is manufactured using materials such as titanium, stainless steel, and aluminum so as to prevent corrosion caused by exhaust gas discharged from the process chamber.

[0040] The housing 1 is a hollow rectangular box-shaped structure that stores gas so that exhaust gas flowing into the internal collection tower 3 installed inside is condensed and collected. The top is opened to accommodate the internal collection tower, and after installation, the top plate is covered and fixed using fastening means such as bolts.

[0041] The inner wall 11 of the housing may be configured to have a plurality of vortex plates 111 protruding inward along the periphery in multiple stages. When such vortex plates 111 are provided, the exhaust gas flowing into the inside of the housing collides with them to generate vortexes, thereby slowing down the flow of the exhaust gas and increasing the efficiency of collecting reaction by-products.

[0042] In other words, the vortex plate 111 installed on the inner wall of the housing, which is in direct contact with the external air, which has a relatively lower temperature than the internal temperature of the housing, is cooled by the thermally conducted external temperature, and the delayed exhaust gas is condensed and collected by the vortex.

[0043] The shape of the vortex plate 111 may be configured to protrude horizontally inward, or the ends may be bent at a certain angle either upward or downward, or may protrude to have a curved shape to generate more vortices.

[0044] The upper plate 12 forming the upper part of the housing functions as a lid covering the upper part of the housing, which is open at the top, and is formed with a gas inlet 121 protruding upward to allow exhaust gas to flow in, and is configured to receive a supply of exhaust gas discharged from the process chamber.

[0045] The upper plate is also provided with a heater power supply unit 25 including a temperature sensor for supplying power to a heater installed on the bottom surface thereof and for measuring the temperature for controlling the power supply in accordance with the internal temperature.

[0046] In addition, a cooling water flow passage 122 is formed in a groove shape on the upper surface of the upper plate to prevent the housing from being heated in response to the operation of a heater installed on the lower side of the upper plate inside the housing. The upper part of the cooling water flow passage is configured to be closed by a flow passage cover 123. In this case, the flow passage cover (not shown) may be fastened including a sealing process for watertightness, and the fastening method may be a known technique such as a fitting method, a welding method, a bolt fastening method, etc.

[0047] The cooling water flow passage 122 is configured so that cooling water supplied from an external cooling water tank (not shown) flows in through a cooling water inlet 124 and is then discharged from a cooling water outlet 125 to circulate. The cooling water flow passage is formed to have a boundary and not communicate with each other so that the inflowing cooling water and the outflowing cooling water do not mix with each other. The cooling water used may be water or a refrigerant.

[0048] A gas exhaust port 131 is formed at one location on the lower plate 13 forming the lower portion of the housing, and is used as a passage for discharging exhaust gas from which reaction by-products have been removed.

[0049] At this time, one or more storage grooves 132 are formed around the gas outlet 131 on the upper surface of the lower plate, lower than the upper end of the gas outlet, so that reaction by-products that have fallen after collection can be piled up. The formation of such storage grooves 132 minimizes the easy outflow of exhaust gas when it finally flows from the inner wall side of the housing to the gas outlet at the center at the bottom of the lower collection section of the internal collection tower.

[0050] Therefore, the gas exhaust port does not need to protrude high on the upper inside side of the housing, and the collection space of the intermediate collection section and the lower collection section is not reduced, so that a sufficient collection space can be secured.

[0051] Further, in the vicinity of each vertex of the upper surface of the lower plate 13, an internal collection tower support base 133 is formed so as to protrude upward.

[0052] Each of the at least four internal collection tower supports 133 has a two-stage structure consisting of a lower rod 133a and an upper rod 133b, but since the lower rod 133a has a larger diameter than the upper rod 133b, it has a step structure with a jaw formed therein.

[0053] The lower rod 133a is formed at a height such that the lower collection section of the internal collection tower is spaced a certain height from the upper surface of the lower plate, and the upper rod 133b is configured to penetrate fastening holes formed at four locations near each vertex of the third horizontal collection plate 331 of the lower collection section 33 and the second horizontal collection plate 321 of the intermediate collection section 32, and to fasten to the fastening rod 314 protruding from the bottom of the first horizontal collection plate 311 of the upper collection section 31.

[0054] At this time, the intermediate collection section 32 is in contact with the upper part of the lower collection section and is spaced apart from it by a certain distance via a separation plate 326 protruding downward from the second horizontal collection plate 321 .

[0055] Due to this fastening structure with the internal collection tower support 133, the upper collection section, intermediate collection section, and lower collection section of the internal collection tower are spaced apart from each other by a certain distance, providing a space through which exhaust gas can flow in multiple stages.

[0056] Heater 2 heats the exhaust gas flowing into the housing so that a temperature distribution region higher than 120°C is formed to prevent the exhaust gas from condensing and clogging in the lower region of the gas inlet, and distributes this to the outer periphery so that it descends to the inner wall of the housing and the internal collection tower, thereby forming a temperature distribution region lowered to 120°C or less, so that solid-phase reaction by-products contained in the exhaust gas can be captured and reacted on the inner wall of the housing and the internal collection tower.

[0057] For this purpose, a heater cap 21 is provided in contact with the bottom surface of the upper plate so as to communicate with the lower part of the gas inlet 121 formed in the upper plate of the housing, and is configured so that the exhaust gas that flows in does not disperse around the housing but gathers inside and falls to the lower part. The heater cap 21 has a cylindrical structure, but has an opening at the top and is donut-shaped at the bottom with an opening smaller than the top opening, so that the exhaust gas that flows in from the top is stored inside and then discharged to the heater body at the bottom through the center.

[0058] A heater body 22 having radially arranged heat dissipation fins 23 is provided at the bottom of the heater cap 21, and is configured to heat the exhaust gas descending from the top and distribute it laterally from inside the housing 1 via the radially arranged heat dissipation fins.

[0059] In addition, a square heater plate 24 is fastened to the lower part of the heater body 22, so that the exhaust gas distributed radially to the outer shell by the heat dissipation fins of the upper heater body blocks the initial flow of the exhaust gas directly downward and guides it to flow toward the inner wall of the outer housing 1, thereby helping it to flow downward from near the inner wall of the outer housing.

[0060] For this purpose, the size or area of ​​the heater plate 24 is formed to have an area smaller than the inner planar space of the housing.

[0061] In addition, the flow of exhaust gas through the heater plate 24 does not flow downward in a concentrated manner only at the ends, but multiple gas holes 24a are formed around both short sides in front of the ends, allowing some of the exhaust gas to flow downward toward the triangular collection plate 312.

[0062] When power is applied to the heat source of the heater body by the heater power supply unit 25 installed on the upper surface of the upper plate, the heat source generates heat to a temperature, for example, higher than 120° C. As the material of the heater, a material such as ceramic or inconel is used to prevent corrosion by exhaust gas.

[0063] The internal collection tower 3 is installed inside the housing and is configured to increase the flow path and residence time of the exhaust gas flowing in, while condensing the exhaust gas and collecting it as reaction by-products. The collection area is configured with a structure in which the collection area is separated into an upper collection section 31, an intermediate collection section 32, and a lower collection section 33 according to height, and is configured to collect the gas flowing into the housing in multiple stages. However, the efficiency of the collection space is increased by having the main reaction by-products pile up in the inner space of the intermediate collection section, which has an open gas flow structure between the inner wall of the housing and the inner area.

[0064] In addition, the internal collection tower is provided with rectangular horizontal collection plates having different areas and different sizes, shapes and arrangements of gas holes in each of the upper collection section, the intermediate collection section and the lower collection section, and is configured to directly collect reaction by-products while intermittently guiding the vertical flow direction of the exhaust gas together with the heater plate 24 of the heater, or to allow the collected reaction by-products to pile up, thereby minimizing the exhaust gas at the upper part being directly discharged from the lower outlet or the collected reaction by-products falling to the lower part and easily outflowing through the outlet.

[0065] In particular, the first horizontal collection plate of the upper collection section, which is installed at a certain distance below, is larger than the heater plate 24 of the heater, so that the main exhaust gas flow is formed to gather at the center and descend. The second and third horizontal collection plates of the intermediate and lower collection sections are larger than the heater plate 24 but slightly smaller than the first horizontal collection plate of the upper collection section, so that the second horizontal collection plate of the intermediate collection section induces a uniformly dispersed downward flow through the central gas hole and a plurality of uniformly arranged gas holes, allowing the exhaust gas to be sufficiently captured at the inner part of the intermediate collection section. The third horizontal collection plate of the lower collection section induces the uniformly descending exhaust gas to the outer periphery, and induces a downward gas flow through the gas holes arranged around the periphery and the ends, providing an opportunity to maximize the remaining reaction by-products.

[0066] In addition, the upper collection section 31, intermediate collection section 32, and lower collection section 33 that constitute the internal collection tower 3 are supported and fastened by an internal collection tower support base 133 consisting of a stepped lower rod 133a and an upper rod 133b, which protrude from the lower plate of the housing to ensure a gap between the upper and lower sections.

[0067] Specifically, the lower collecting section 33 of the internal collecting tower is supported by a lower rod 133a of the internal collecting tower support base 133 and is installed at a certain height apart from the upper surface of the lower plate.

[0068] The intermediate collection section 32 is in contact with and spaced apart from the upper surface of the third horizontal collection plate of the lower collection section 33 by a separation plate 326 protruding downward from the rectangular second horizontal collection plate.

[0069] In addition, the upper collection section 31 is fastened by screwing the fastening rod 314 protruding downward from the first horizontal collection plate to the upper rod 133b of the internal collection tower support base 133 which penetrates the lower collection section 33 and the intermediate collection section 32.

[0070] Due to this fastening structure with the internal collection tower support 133, the upper collection section, intermediate collection section, and lower collection section of the internal collection tower are spaced apart from each other by a certain distance, providing a space through which exhaust gas can flow in multiple stages.

[0071] The upper collection section 31 is formed with a main gas hole 311a and a plurality of auxiliary gas holes 311b, 311c located around the main gas hole 311a. The upper collection section 31 is composed of a rectangular first horizontal collection plate 311 which guides the flow of exhaust gas descending from the heater toward the center and collects reaction by-products, a plurality of triangular collection plates 312 which are arranged radially along the outer edge of the upper surface of the first horizontal collection plate and collect reaction by-products, bent collection plates 313 which protrude higher than the triangular collection plates at each of the four edges of the upper surface of the first horizontal collection plate and have an open structure so as not to obstruct the inflow of exhaust gas and collect reaction by-products, and fastening rods 314 which protrude downward at each vertex of the bottom surface of the first horizontal collection plate and are fastened to the internal collection tower support base 133 for fixation.

[0072] The main gas hole 311a formed in the first horizontal collection plate 311 is formed in the center as a long hole, and is configured so that the exhaust gas flows toward the inner periphery of the housing due to the heater, then descends and collides with the surface of the first horizontal collection plate 311 installed close to the inner wall of the housing, preventing most of the exhaust gas from directly descending to the lower side, while the main stream of the exhaust gas flows from the outer periphery to the center and descends toward the center of the lower intermediate collection section.

[0073] In addition, a plurality of auxiliary gas holes 311b arranged along the periphery of the main gas hole of the first horizontal collection plate 311 and a plurality of auxiliary gas holes 311c arranged along the outer periphery serve to partially reduce the amount and strength of the exhaust gas flowing into the main gas hole 311a and descending, and supply it downward to the intermediate collection section.

[0074] In one embodiment, among the multiple auxiliary gas holes 311c arranged along the outer periphery of the multiple auxiliary gas holes 311b arranged along the periphery of the main gas hole, the auxiliary gas holes 311c located on the short side are formed with openings having a relatively large diameter, and the auxiliary gas holes 311c located on the long side are formed with openings having a relatively small diameter, so that the overall downward discharge flow of exhaust gas can be uniformly distributed according to the area of ​​the rectangular first horizontal collection plate 311.

[0075] In addition, the flow of exhaust gas descending from the auxiliary gas holes 311b and 311c acts as a kind of air curtain when the exhaust gas supplied from the main gas hole 311a flows toward the outer shell, and as the different wind directions collide, a vortex is generated, slowing down the flow of exhaust gas. The flow of exhaust gas remains in the inner area of ​​the intermediate collection section, increasing the collection time, and at the same time, prevents the reaction by-products accumulated in the inner space from being discharged through the outer shell, allowing them to remain there.

[0076] The triangular collection plate 312 is configured as a right-angled triangle with the vertical surface located at the center, and the flow of exhaust gas flowing from the periphery to the inside is less loaded at the inlet, and the contact area increases toward the center of the inside, increasing the amount of collection and guiding the flow of exhaust gas evenly.

[0077] In this case, when the triangular collection plate 312 is arranged radially, it is positioned above a plurality of auxiliary holes 311c arranged along the outer periphery on the surface of the first horizontal collection plate, and has vertical plate pieces 312a having a relatively small area that are fastened to intersect at the auxiliary holes, so that it can be configured to collect reaction by-products while being delayed by vortexes generated by the collision of part of the exhaust gas flowing toward the center, and to cause some of the exhaust gas to descend.

[0078] The bent type collection plate 313 is configured to collect reaction by-products contained in the upper exhaust gas flowing into the space between the lower part of the heater plate 24 and the upper collection part 31 in order to make maximum use of the limited internal space of the collection device according to the present invention, which has a low collection capacity.

[0079] For this purpose, the first horizontal collection plate has a pair of supports 313a formed on the outer periphery of the first horizontal collection plate and a connector 313b connecting the upper ends of the supports, which form a U-shape, and the open structure allows for smooth exhaust flow while capturing reaction by-products contained in the exhaust gas passing through the upper portion without being captured by the lower triangular collection plate 312, thereby expanding the collection space by utilizing a limited space. In this case, the bent collection plate 313 is preferably formed as a molded body in which the supports 313a and the connector 313b connecting the upper ends of the supports are molded into one body. The separated supports 313a and the connector 313b may also be formed into one body by welding or fastening.

[0080] The fastening rod 314 is made of a hollow cylindrical tube, through which a bolt is inserted and fastened to a thread formed on the upper rod 133b of the inner collection tower support 133, which faces the lower end of the fastening rod 314.

[0081] The intermediate collection section 32 includes a rectangular second horizontal collection plate 321 having a main gas hole 321a at the center of the surface and a plurality of auxiliary gas holes 321b arranged in a square on the remaining entire surface, which guides the flow of exhaust gas and collects reaction by-products; a plurality of outer vertical blade plates 322 arranged along the outer edge of the upper surface of the second horizontal collection plate and collect reaction by-products under an open installation structure so as not to block the flow of exhaust gas between the inner wall of the housing and the inner region; a plurality of inner vertical blade plates 323 protruding from the inner region of the upper surface of the second horizontal collection plate at a height lower than that of the outer vertical blade plates 322 and collecting reaction by-products; The second horizontal collection plate 321 is made up of a bottom plate 324 which protrudes in a lattice shape at a height lower than the outer vertical blade plates 323 to collect reaction by-products, an inclined plate 325 which crosses horizontally between the outer vertical blade plates 322 and is installed in multiple stages above and below to generate vortexes and collect reaction by-products, and a separation plate 326 which protrudes downward from the bottom of the second horizontal collection plate 321 and is supported by the lower stage collection part while being spaced at a certain distance to collect reaction by-products. The surrounding outer vertical blade plate 322 has an open structure between the inner wall of the housing and the inner region, and is configured to collect reaction by-products and pile them up in the inner region while increasing space utilization due to the height difference between the inner vertical blade plates 323, thereby maximizing utilization of collection space.

[0082] The main gas hole 321a formed in the second horizontal collection plate 321 is smaller than the main gas hole 311a formed in the first horizontal collection plate 311 and is formed in the shape of a long hole in the center. Since the main gas hole 311a is smaller than the main gas hole in the upper collection section, the main stream of exhaust gas flowing in from above does not directly flow downward, but only partially flows downward. The remaining main stream of exhaust gas collides with the surface of the second horizontal collection plate 321 and flows in a lateral direction.

[0083] In addition, the multiple auxiliary gas holes 321b arranged in a square on the entire remaining surface except for the main gas hole 321a allow the exhaust gas that flows in from the main gas hole 311a formed in the first horizontal collection plate 311 of the upper collection part, collides with the surface and flows laterally, and the exhaust gas that descends from the multiple auxiliary gas holes 311b formed in the first horizontal collection plate 311 of the upper collection part and the multiple auxiliary gas holes 311c arranged along the outer periphery to undergo a collection process in the inner space of the intermediate collection part and descend evenly toward the lower collection part at the bottom.

[0084] Meanwhile, the total opening area of ​​the main gas hole 321a and the rectangularly arranged auxiliary gas holes 321b formed in the second horizontal collection plate 321 is smaller than the total surface area of ​​the second horizontal collection plate 321.

[0085] Therefore, exhaust gas flowing in from the upper upper collection section does not immediately flow into the lower lower collection section, but remains in the inner region of the intermediate collection section, and undergoes a process in which reaction by-products are collected by the outer vertical blade plate 322, the inner vertical blade plate 323, the bottom plate 324 and the inclined plate 325, before flowing down to the lower lower collection section.

[0086] Meanwhile, fastening holes 321c are formed at four locations near the apex of the second horizontal collection plate 321, and the upper rod 133b of the internal collection tower support base 133 passes through them to be fastened to the fastening rod 314 protruding downward from the upper collection section and supported.

[0087] The outer vertical blade plate 322 is configured to have an outer periphery with an open structure between the inner wall of the housing and the inner region of the intermediate collection section, and is installed so that its surface is not located on the central side but is located on the side so as not to block or collide with the flow of exhaust gas flowing from the upper collection section to the intermediate collection section while applying a load. This configuration is similar to a structure in which the outermost periphery serves as the inner wall of the housing and the collection plate protrudes inward, so it also plays a role in expanding the overall collection area inside the housing, and also provides the effect of guiding a portion of the downward exhaust gas flow that flows on the inner wall of the housing via the heater and the upper collection section to the inner region of the intermediate collection section.

[0088] The outer vertical blade plate 322 is formed in a shape narrower at the top than at the bottom, and has a right-angled triangular shape on the outside toward the inner wall of the housing, so that it is structured to capture more reaction by-products in the exhaust gas flowing in from the top as it goes to the bottom and inside.

[0089] In addition, since the outer vertical blade plate 322 is arranged along the outer periphery, the exhaust gas that descends to the center through the main gas hole of the upper collection section does not come into contact with the main gas hole first and collect the reaction by-products, which fundamentally prevents the area around the main gas hole from being clogged first.

[0090] In addition, even if the open area between adjacent outer vertical blade plates 322 narrows as reaction by-products are collected on the outer vertical blade plates 322, the open areas are installed sufficiently far apart, so that the flow of exhaust gas with the inner wall of the housing is sufficiently maintained, and the flow of exhaust gas descending from the upper side into the inside can be sufficiently maintained during the usage cycle.

[0091] The inner vertical blade plate 323 is configured to first contact the exhaust gas that has descended to the center through the main gas hole of the upper collection part, thereby collecting reaction by-products, and has a lower height than the outer vertical blade plate 322, thereby fundamentally preventing the vicinity of the main gas hole from being clogged first.

[0092] The inner vertical blade plate 323 has a rectangular structure with right angles on the top and bottom, and is configured to uniformly collect reaction by-products. It can be configured to have a cross-shaped cross section by intersecting with the inner vertical blade plate 323 on the other side, so that the reaction by-products can be dispersed in various directions or collected uniformly while forming vortices by contacting with the flowing exhaust gas.

[0093] In addition, in one embodiment, the inner vertical blade plates 323 may be distributed so that the installation density decreases from the center of the second horizontal collection plate 321 toward the peripheral outer vertical blade plate 322. In this configuration, a structure is provided in which the inner vertical blade plate 323 installed in the center collects reaction by-products from the exhaust gas descending through the main gas hole, and the outer vertical blade plate 322 at the periphery performs the main collection reaction.

[0094] The bottom plate 324 is disposed at the same interval as the outer vertical blade plate 322, and the bottom plate 324 on the long side and short side cross to form a lattice shape, forming a plurality of grooves together with the lower second horizontal collection plate 321, which serves to accommodate the exhaust gas descending from the upper part, cause a collection reaction, and accumulate the collected reaction by-products. By blocking the collected reaction by-products from floating and moving freely, the movement to the lower collection part and outflow through the outlet are minimized.

[0095] In addition, the protruding height of the bottom plate 324 is relatively lower than that of the inner vertical blade plate 323, so that it does not hinder the flow of exhaust gas in the inner region or hinder the capture reaction of the inner vertical blade plate 323 and the outer vertical blade plate 322.

[0096] The inclined plates 325 are installed in multiple stages, crossing horizontally between the outer vertical blade plates 322, so that exhaust gas flowing down along the inner wall of the housing collides with them to generate vortexes, which increases the time for collecting reaction by-products by delaying the flow. At the same time, the inclined plates 325 incline upwards toward the outer wall to guide the reaction by-products and exhaust gas to the inner region.

[0097] Similarly, it also plays a role in blocking exhaust gas remaining in the inner region from being discharged toward the inner wall side of the outer housing.

[0098] At this time, the inclined plate 325 has a plurality of holes 325a formed in the length direction, so that a vortex is generated by the speed difference without applying a large load to the flow of the descending exhaust gas, and some of the exhaust gas is caused to descend.

[0099] In addition, the inclined plates 325 installed in multiple vertical stages protrude further outward, allowing the reaction by-products falling downward to be piled up without being blocked by the inclined plates 325 in the upper stages and falling further downward.

[0100] The separation plate 326 is installed on the bottom surface of the second horizontal collection plate 321 and is installed to protrude in an L-shaped cross section so as to enclose the four fastening holes 321c formed near the apex from the inside. The separation plate 326 is configured to contact the lower collection part and support the intermediate collection part at a certain distance upward, and to collect reaction by-products from the exhaust gas initially discharged through the fastening holes 321c.

[0101] By providing the intermediate collection section, the exhaust gas flowing into the center from the upper collection section 31 is accommodated, and the main flow flows to the lower collection section through the main gas hole 321a in the center of the second horizontal collection plate 321, and the multiple auxiliary gas holes 321b arranged in a square on the remaining entire surface of the second horizontal collection plate 321 uniformly flow to the lower collection section, forming an overall uniform downward exhaust gas flow. Furthermore, a part of the exhaust gas flows to the outer shell through the space between the outer vertical blade plates 322, and then has an exhaust gas flow that descends along the inner wall of the housing.

[0102] As a result, the exhaust gas flowing into the inner space portion captures reaction by-products contained in the exhaust gas through the inner vertical blade plate 323, the outer vertical blade plate 322, and the bottom plate 324, and the captured reaction by-products are piled up in the inner space region, thereby making maximum use of the collection space of the collection device.

[0103] In one embodiment, the outer vertical blade plate, the inner vertical blade plate and the bottom plate may be configured using a cross assembly structure of a plurality of unit long side plates and a plurality of unit short side plates formed integrally with a pair of outer vertical blade plates and a pair of inner vertical blade plates and a bottom plate, and a plurality of unit long side plates and a plurality of unit short side plates formed integrally with a pair of outer vertical blade plates and a bottom plate.

[0104] For this purpose, vertical blade plates are formed on both side ends of a bottom plate forming a lower portion, and inner vertical blade plates smaller than the vertical blade plates are integrally formed at one location inside the bottom plate and another symmetrical location, and each unit long side plate and unit short side plate are provided. In this case, the pair of symmetrically formed inner vertical blade plates are formed at different locations from each of the adjacent unit long side plates and unit short side plates.

[0105] Similarly, the bottom plate forming the lower portion is provided with a unit long side plate and a unit short side plate each having a vertical blade plate integrally formed thereon at both side ends thereof.

[0106] Then, a plurality of unit short side plates are installed along the long side of the second horizontal collection plate 331, and a plurality of unit long side plates are installed and crossed along the short side. At both ends of the long side and short side, unit long side plates and unit short side plates without inner vertical blade plates are positioned, and a plurality of unit long side plates and unit short side plates with inner vertical blade plates are positioned at regular intervals between them.

[0107] In this case, the pair of symmetrically formed inner vertical blade plates may be arranged such that the inner long side plate and the inner short side plate are positioned closer to the center.

[0108] When this assembly is completed, the outer vertical blade plate is positioned along the periphery of the outer shell, the inner vertical blade plate with a cross-shaped cross section is positioned on the inside, and the bottom plate is also positioned in a lattice shape by intersecting with the outer vertical blade plate.

[0109] Furthermore, by installing an inner vertical blade plate with a cross-shaped cross section on the surface where the lattice structure is located near each vertex of the second horizontal collection plate 331, which has a lattice-like structure formed by intersecting bottom plates, an intermediate collection section as described above is provided.

[0110] Of course, alternative embodiments may be provided with intermediate collection portion shapes.

[0111] The lower collection section 33 is composed of a rectangular third horizontal collection plate 331 having a plurality of gas holes 331a formed along its outer periphery, which guides exhaust gas descending from the top to the outer periphery and collects reaction by-products; a rectangular collection plate 332 arranged radially on the upper surface of the third horizontal collection plate and having a plurality of gas holes 332a formed on its surface to guide exhaust gas to spread evenly and maximize the exhaust gas contact surface to collect reaction by-products; and a double-structure rectangular frame collection plate 333 formed on the bottom surface of the third horizontal collection plate and having a plurality of gas holes 333c formed on its surface to guide exhaust gas to spread evenly and collect reaction by-products, and finally consisting of a rectangular frame-shaped outer collection plate 333a and an inner collection plate 333b to minimize outflow through the exhaust port.

[0112] The third horizontal collection plate 331 has a plurality of gas holes 331a formed and arranged only on the periphery of its surface, so that the exhaust gas that descends through the main gas holes and auxiliary gas holes of the intermediate collection section is guided radially together with the square collection plate 332 so that it descends through the gas holes and ends of the periphery.

[0113] The rectangular collection plate 332 is radially arranged and has a large number of gas holes formed therein, which guides the exhaust gas radially and spreads uniformly, thereby uniformly collecting reaction by-products remaining in the exhaust gas.

[0114] The rectangular frame collection plate 333 is composed of a double layer of outer collection plate 333a and inner collection plate 333b, which are spaced apart at a regular interval and have different sizes, and its lower end is installed close to the lower plate of the housing so that exhaust gas flows only through gas holes 333c. Even if the collected reaction by-products fall and accumulate due to the height from the lower plate to the gas holes 333c, outflow through the gas outlet is minimized.

[0115] Moreover, the storage groove 132 formed on the lower plate, together with the double-structured rectangular frame collecting plate 333, provides a reaction by-product storage space, and a certain amount of reaction by-products is piled up, further minimizing outflow.

[0116] Meanwhile, fastening holes 331b are formed at four locations near the vertex of the third horizontal collection plate 331, and the upper rods 133b of the internal collection tower support base 133 pass through them. Since the diameter of these fastening holes 331b is smaller than that of the lower rods 133a of the internal collection tower support base 133, the lower collection portion is separated from the lower plate of the housing by the height of the lower rods 133a of the internal collection tower support base 133.

[0117] This ensures a space in which the rectangular frame collection plate 333 protruding below the third horizontal collection plate 331 can be installed.

[0118] In this case, the height of the separated lower space of the third horizontal collection plate 331 is formed to be the same as the height of the square frame collection plate 333 due to the height of the lower rod 133a of the internal collection tower support 133, so that there is almost no unnecessary space between the lower plate and the lower internal collection section, thereby maximizing the space utilization of the collection device while minimizing the outflow of reaction by-products through the gas exhaust port.

[0119] Next, the operation of the present invention configured as described above will be described.

[0120] The exhaust gas that flows into the inside through the inlet of the housing 1 constituting the collection device for collecting reaction by-products contained in the exhaust gas components discharged from the process chamber is guided by the heater cap 21 to the heater body 22 at the bottom so that it does not condense or disperse to the surroundings without being heated at the inlet.

[0121] Thereafter, the exhaust gas heated by the heater body 22 is distributed to the periphery by the heat dissipation fins 23 and the rectangular heater plate 24, and then flows downward.

[0122] The exhaust gas then passes through the internal collection tower 3, which has a structure in which the collection areas are separated into upper and lower collection sections 31, 32, and lower collection section 33, and collection reactions occur in multiple stages due to the smooth change in exhaust gas flow path and collection structure.

[0123] Only the exhaust gas from which the reaction by-products have been removed by the capture reaction is discharged through a lower exhaust port formed in the lower plate of the housing.

[0124] In the process of collecting exhaust gas, the upper collection section 31 is equipped with a bent collection plate 313 that has an open structure and collects reaction by-products, so that the collection reaction occurs without interfering with the inflow of exhaust gas flowing from the outer shell to the center, thereby increasing space efficiency. In the intermediate collection section 32, the main collection of reaction by-products occurs and is stacked due to an inner space structure that utilizes the height difference between the outer shell vertical blade plate 322, which has a gas flow structure with an open inner area and the inner wall of the housing, and the inner vertical blade plate 323 formed inside, thereby increasing space efficiency.

[0125] The present invention is not limited to the specific preferred embodiments described above, and various modifications can be made by anyone having ordinary knowledge in the technical field to which the invention pertains without departing from the gist of the present invention as claimed in the claims, and such modifications are within the scope of the claims. [Explanation of symbols]

[0126] 1. Housing 2 Heater 3. Internal collection tower 11 Inner wall 12 Upper Plate 13 Lower plate 21 Heater Cap 22 Heater body 23 Heat dissipation fin 24 Heater Plate 24a Gas Hall 25 Heater power supply 31 Upper collection section 32 Intermediate collection section 33 Lower collection section 111 Vortex Plate 121 Gas inlet 122 Cooling water flow path 123 Channel cover 124 Cooling water inlet 125 Cooling water outlet 131 Gas exhaust port 132 Storage Groove 133 Internal collection tower support 133a Lower bar 133b Upper bar 311 First horizontal collection plate 311a Main gas hole 311b, 311c Auxiliary gas hole 312 Triangular collection plate 312a Vertical plate piece 313 Bent type collection plate 313a Support 313b Concatenation 314 Fastening rod 321 Second horizontal collection plate 321a Main Gas Hall 321b Auxiliary gas hole 321c Concluding Hole 322 Outer vertical blade plate 323 Inner vertical blade plate 324 Bottom Plate 325 Inclined Plate Hall 325a 326 Partition Plate 331 Third horizontal collection plate 331a Gas Hall 331b Concluding Hole 332 Square collection plate 332a Gas Hall 333 Square frame collection plate 333a Outer collection plate 333b Inner collection plate 333c Gas Hall

Claims

1. A reaction by-product collection device for a semiconductor process, which is installed on an exhaust line between a process chamber and a vacuum pump, and which causes exhaust gas discharged from the process chamber to flow into a housing, heat it with a heater, distributes it, and collects reaction by-products in an internal collection tower, The device is configured in multiple stages with an upper collection section, an intermediate collection section, and a lower collection section, and collects reaction by-products while changing the flow direction of the exhaust gas flowing in by making maximum use of the limited space inside the housing. The main collection is performed in the intermediate collection section including an outer vertical blade plate of an outer shell having an open structure to facilitate smooth gas flow between the inner wall of the housing and the inner region, an inner vertical blade plate having a lower height than the outer vertical blade plate, and a bottom plate, and then includes an inner collection tower formed to be stacked in the inner space of the intermediate collection section. A reaction by-product collection device for semiconductor processing that improves collection space efficiency.

2. The upper collection section is a first horizontal collection plate having a rectangular shape, in which a main gas hole and a plurality of auxiliary gas holes are formed around the main gas hole, and which guides the flow of exhaust gas descending from the heater toward the center and collects reaction by-products; a plurality of triangular collection plates arranged radially along the outer periphery of the upper surface of the first horizontal collection plate to collect reaction by-products; a folded-type collection plate that protrudes higher than the triangular collection plate at each of the four edges of the upper surface of the first horizontal collection plate, has an open structure so as not to obstruct the inflow of exhaust gas, and collects reaction by-products; and a fastening rod protruding downward at each apex of the bottom surface of the first horizontal collection plate and fastened to the inner collection tower support base.

2. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 1.

3. The bent type collection plate is characterized in that it is composed of a pair of supports formed on the outer periphery of the first horizontal collection plate and a connector connecting upper ends of the supports to each other.

3. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 2.

4. The triangular collection plate is configured as a right triangle with a vertical surface located at the center, and the triangular collection plate is located above a plurality of auxiliary holes arranged along the outer periphery and fastened to intersect with the vertical plate piece.

3. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 2.

5. The intermediate collection section is a rectangular second horizontal collection plate having a main gas hole at the center of the plate and a plurality of auxiliary gas holes arranged in a rectangular pattern evenly on the remaining surface of the plate, which guides the flow of exhaust gas and collects reaction by-products; a plurality of outer vertical blade plates arranged along the outer edge of the upper surface of the second horizontal collection plate, and configured to collect reaction by-products under an open installation structure so as not to block the flow of exhaust gas between the inner wall of the housing and the inner region; a plurality of inner vertical blade plates protruding from an inner region of an upper surface of the second horizontal collection plate at a height lower than that of the outer vertical blade plate to collect reaction by-products; a bottom plate that protrudes in a lattice shape from an inner region of an upper surface of the second horizontal collection plate at a height lower than that of the inner vertical blade plate to collect reaction by-products; inclined plates that cross horizontally between the outer vertical blade plates and are installed in multiple stages up and down to generate vortexes and collect reaction by-products; a separation plate that protrudes downward from the bottom surface of the second horizontal collection plate and is supported by the lower collection unit while being spaced apart from the lower collection unit to collect reaction by-products, 2. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 1.

6. The outer vertical blade plate is formed in a shape narrower at the top than at the bottom, and has a right-angled triangular shape with a vertical outer side toward the inner wall of the housing, and is arranged such that the surface is not located toward the center but is located toward the side so as to have an open structure between the inner wall of the housing and the inner region of the intermediate collection section.

6. The apparatus for collecting reaction by-products for use in a semiconductor process, which has improved collection space efficiency, as claimed in claim 5.

7. The inner vertical blade plate is configured to have a cross-shaped cross section and is distributed so that the installation density decreases from the center of the second horizontal collection plate to the peripheral outer vertical blade plate.

6. The apparatus for collecting reaction by-products for use in a semiconductor process, which has improved collection space efficiency, as claimed in claim 5.

8. 6. The reaction by-product collecting device for a semiconductor process with improved collection space efficiency according to claim 5, wherein the separation plate is installed on a bottom surface of the second horizontal collection plate and protrudes in an L-shaped cross section to surround four fastening holes formed near the apex from the inside, to support and space the intermediate collection part from the lower collection part, and to collect reaction by-products from the exhaust gas discharged through the fastening holes.

9. The lower collection section is a rectangular third horizontal collection plate having a plurality of gas holes formed along the outer periphery thereof, which guides exhaust gas descending from the upper portion to the outer periphery and collects reaction by-products; a rectangular collection plate arranged radially on the upper surface of the third horizontal collection plate and having a plurality of gas holes formed on the surface to guide the exhaust gas to spread evenly and to collect reaction by-products while maximizing the exhaust gas contact surface; The trapping plate is formed on the bottom surface of the third horizontal trapping plate, and a number of gas holes are formed on the surface to guide the exhaust gas to spread evenly while trapping reaction by-products, and finally, the trapping plate is composed of a double-structure rectangular frame-shaped outer trapping plate and an inner trapping plate to minimize the outflow through the exhaust port.

2. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 1.

10. the housing has a storage groove formed around the gas outlet on the upper surface of the lower plate, the storage groove being lower than the upper level of the gas outlet and configured to store reaction by-products; The lower plate is provided with a plurality of inner collection tower support bases configured so that the lower rods and the upper rods are stepped, and the upper collection section, the intermediate collection section, and the lower collection section that constitute the inner collection tower are vertically spaced apart to form a multi-stage configuration.

2. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 1.

11. The heater includes a heater cap that is connected to a gas inlet formed in an upper plate of the housing and supplies the gas to a heater body at a lower portion. A heater body that heats exhaust gas descending from an upper portion and distributes the heat in a lateral direction through radially arranged heat dissipation fins; The heater body supplies the exhaust gas distributed by the heater body to the inner wall of the housing of the outer shell and guides it downward, and a rectangular heater plate is formed on the periphery thereof with a plurality of gas holes to guide the exhaust gas to the inner wall of the housing of the outer shell.

2. The apparatus for collecting reaction by-products for semiconductor processing, which has improved collection space efficiency as claimed in claim 1.

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