Method for producing nanowires
JP7632897B2Active Publication Date: 2025-02-19MICROSOFT TECHNOLOGY LICENSING LLC
Patent Information
- Application Number
- JP2022543694
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2020-02-25
- Filing Date
- 2021-01-05
- Publication Date
- 2025-02-19
- Estimated Expiration
- 2041-01-05
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Abstract
A method for fabricating nanowires includes providing a sacrificial substrate, providing a patterned mask layer on the sacrificial substrate, providing nanowires on the sacrificial substrate through openings in the patterned mask layer, and removing the sacrificial substrate. Because the sacrificial substrate is used to grow the nanowires and is subsequently removed, the material of the sacrificial substrate is selected to be lattice-matched to the material of the nanowires, regardless of its electrical properties. Thus, high-quality nanowires can be grown and operated without the degradation of properties that typically occurs when using a lattice-matched substrate.
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Citation Information
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